Wafer processing cleaning device

Abstract

The present invention discloses a wafer processing cleaning device, comprising a bottom frame, wherein the four corners of the bottom frame are provided with upright columns extending upward, an upper frame is provided at one end of the column away from the bottom frame, the bottom frame, the upright columns and the upper frame form a mounting frame, and a mounting plate is provided in the mounting frame; a movable mechanism is installed on the mounting plate, a dust removal mechanism is provided below the movable mechanism, a pneumatic assembly is provided above the movable mechanism, the dust removal mechanism is connected to the pneumatic assembly via a conduit, and the dust removal mechanism, the movable mechanism and the pneumatic assembly are arranged in the mounting frame; the dust removal mechanism is connected to the movable mechanism via a second hanging slide, the dust removal mechanism comprises a dust removal head box, the bottom of the dust removal head box is provided with a bottom plate, the top of the dust removal head box is provided with an opening, and the opening at the top of the dust removal head box is provided with a box sealing cover; a positive pressure box extending upward from the bottom plate is provided in the dust removal head box. The present application adopts two fans to provide a positive pressure or negative pressure air source to achieve intelligent cleaning.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor production, and in particular to a cleaning device for wafer processing. Background Art

[0002] Wafers are silicon chips used in the manufacture of silicon semiconductor integrated circuits. During the semiconductor production process, wafers are placed in wafer boxes, which are then transported to different loading ports (Loadport) by the AMHS (Automatic Material Handling System). After a period of time, dust will remain on the surface of the carrier, affecting the yield of the wafer products.

[0003] In order to maintain the cleanliness of the carrier, the carrier of the semiconductor processing equipment needs to be cleaned regularly. The existing cleaning methods mostly use manual cleaning and brush cleaning. Manual cleaning needs to be performed when the equipment is repaired and maintained, which is time-consuming and labor-intensive, inefficient, and not conducive to the overall working environment. There is no way to control the cleanliness of the cleaning; brush cleaning is a contact method, which has the risk of scratching the carrier and generating static electricity. Summary of the Invention

[0004] In order to solve the problems existing in the prior art, the purpose of the present invention is to provide a cleaning device for wafer processing, which adopts non-contact suspended positive and negative airway cleaning. At the same time, the cleaning device realizes gas and electricity isolation and independent operation, thereby improving the stability and yield rate of product processing.

[0005] To achieve the above object, the present invention adopts the following technical solutions:

[0006] A wafer processing cleaning device includes a bottom frame, wherein four corners of the bottom frame are provided with upright columns extending upward, an upper frame is provided at one end of the column away from the bottom frame, and the bottom frame, the upright columns and the upper frame form a mounting frame, wherein a mounting plate is provided in the mounting frame; a moving mechanism is mounted on the mounting plate, a dust removal mechanism is provided below the moving mechanism, a pneumatic assembly is provided above the moving mechanism, the dust removal mechanism is connected to the pneumatic assembly via a conduit, and the dust removal mechanism, the moving mechanism and the pneumatic assembly are arranged in the mounting frame;

[0007] The dust removal mechanism is connected to the moving mechanism through a second hanging slide, and the dust removal mechanism includes a dust removal head box body, a bottom plate is provided at the bottom of the dust removal head box body, an opening is provided at the top of the dust removal head box body, and a box body sealing cover is provided at the opening at the top of the dust removal head box body; a positive pressure box extending upward from the bottom plate is provided in the dust removal head box body, and a separation distance is provided between the top of the positive pressure box and the top of the dust removal head box body;

[0008] A separation distance is provided between the outer wall of the positive pressure box and the inner wall of the dust removal head box, and a negative pressure cavity is provided on the outside of the positive pressure box, and the negative pressure cavity is provided between the inner wall of the dust removal head box and the outer wall of the positive pressure box;

[0009] The moving mechanism includes a first mounting slide rail and a first rack seat. The first rack seat and the first mounting slide rail are fixedly arranged under the mounting plate. The first mounting slide rail and the first rack seat are arranged on a side of the mounting plate away from the column. The first rack seat and the first mounting slide rail are arranged parallel to the mounting plate.

[0010] A slidable first hanging slide is hung on the first mounting slide rail, a first motor is fixed on the first hanging slide, and the first motor is connected to the first rack seat in a gearing transmission manner.

[0011] Furthermore, in some embodiments, a positive pressure sealing cover is provided at one end of the positive pressure box away from the bottom plate, an air inlet duct is provided on the positive pressure sealing cover and extends upward through the box body sealing cover, an end of the air inlet duct away from the positive pressure box extends above the box body sealing cover, an upper end of the air inlet duct is connected to a conduit, and the air inlet duct is in continuous connection with the positive pressure box;

[0012] An exhaust port is provided on the sealing cover of the box body, and the exhaust port is connected to the negative pressure chamber; the positive pressure box and the negative pressure chamber are respectively arranged in the dust removal head box body, and the positive pressure box and the negative pressure chamber are isolated from each other and do not communicate with each other;

[0013] The bottom surface of the positive pressure box is provided with a first dust-blowing slit that runs horizontally through the bottom plate, and a second dust-blowing slit is provided near the ends of both ends of the first dust-blowing slit, and the second dust-blowing slit is provided with a side-blowing distance from the top end of the first dust-blowing slit, and the second dust-blowing slit and the first dust-blowing slit are vertically connected to each other;

[0014] The ratio of positive pressure box height to dust collector box height is 2 / 3~3 / 4:1.

[0015] Furthermore, in some embodiments, a gas seat is provided below the first hanging slide, the gas seat is fixedly connected to the first hanging slide, the gas seat is perpendicularly arranged to the first mounting slide, and one end of the gas seat extends outside the mounting plate; a bearing wheel is provided at one end of the gas seat away from the mounting plate, the bearing wheel is provided on a supporting beam, and the supporting beam is provided between two adjacent columns;

[0016] A second mounting rail and a second rack seat are fixedly provided on a side of the pneumatic seat away from the first hanging slide seat, and the parallel second mounting rail, the second rack seat and the first mounting rail are arranged perpendicularly;

[0017] A slidable second hanging slide is mounted on the second mounting rail, a second motor is mounted on the second hanging slide, and the second motor is connected to the second rack seat in a gearing transmission manner;

[0018] A pneumatic component is provided on one side of the pneumatic seat away from the mounting plate, and the pneumatic component is arranged on the outer side of the mounting plate;

[0019] The air pressure component includes a negative pressure fan and a positive pressure fan. A negative pressure high-efficiency filter chamber is provided above the negative pressure fan, and the air suction port of the negative pressure high-efficiency filter chamber extends laterally and is arranged on the outside of the negative pressure fan.

[0020] The air suction port of the negative pressure high efficiency filter bin is connected to the air exhaust port of the dust removal mechanism through a duct, and the positive pressure fan is connected to the air inlet tube of the dust removal mechanism through another duct.

[0021] Furthermore, in some embodiments, a muffler box is provided on one side of the negative pressure fan, and the air outlet of the negative pressure fan is connected to the muffler box through a conduit;

[0022] A square honeycomb tube is provided in the muffler box, a plurality of through holes are provided on the square tube plate surface of the frame of the square honeycomb tube, and oblique honeycomb baffles intersecting each other are provided in the square honeycomb tube;

[0023] The oblique honeycomb baffles extend upward from the inner side wall of the square honeycomb tube, the oblique honeycomb baffles on both sides are arranged in an up-down staggered manner, the oblique honeycomb baffles on both sides cross each other, and the top parts of the oblique honeycomb baffles on both sides vertically overlap each other, and the intersecting oblique honeycomb baffles on both sides form an S-shaped air duct in the square honeycomb tube;

[0024] The negative pressure fan is provided with a lateral air outlet, which is connected to the silencer box through a duct.

[0025] Furthermore, in some embodiments, a first suction slit and a second suction slit are formed on the bottom surface of the negative pressure chamber and extend transversely through the bottom plate. The first suction slit, the second suction slit, and the first dust-blowing slit are arranged in parallel. The first suction slit is arranged close to the first dust-blowing slit, and the second suction slit is arranged away from the first dust-blowing slit. A separation distance is provided between the first suction slit and the second suction slit.

[0026] Two matching variable-section rods are provided on the bottom surface of the positive-pressure chamber of the positive-pressure box. The variable-section rods are arranged parallel to the first dust-blowing slit, and the two variable-section rods are respectively arranged on both sides of the first dust-blowing slit;

[0027] The variable-section rod is provided with an inwardly protruding compressed air bulge, and an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods, and a bulge spacing D2 is provided between the compressed air bulges on the opposite sides of the middle of the two variable-section rods, and the air inlet spacing D1 is greater than the bulge spacing D2; an air outlet spacing D3 is provided between the bottoms of the two corresponding variable-section rods, and a dust blowing spacing D4 is provided for the first dust blowing slot opened on the bottom surface of the positive pressure chamber, and the dust blowing spacing D4 is also the width of the first dust blowing slot; the air inlet spacing D1 = the air outlet spacing D3, and the air outlet spacing D3 is greater than the dust blowing spacing D4.

[0028] Furthermore, in some embodiments, the compressed airflow convex hull is a convex strip; or the compressed airflow convex hull is a long strip with an arc-shaped cross section; or the compressed airflow convex hull is a long strip with a short chord-shaped cross section;

[0029] The ratio of air inlet spacing D1 to convex hull spacing D2 is 5 to 10:1;

[0030] The air inlet spacing D1 = air outlet spacing D3; the ratio of dust blowing spacing D4 to convex hull spacing D2 is 1:1~1.5;

[0031] A third suction slit is provided on the bottom surface of the short sides of both sides of the negative pressure chamber and runs longitudinally through the bottom plate. The third suction slit is provided between the outer wall of the short sides of both sides of the positive pressure box and the inner wall of the dust removal head box. The third suction slit is provided in parallel with the second dust blowing slit.

[0032] The second dust blowing slot is arranged close to the inner wall of the short sides of both sides of the positive pressure box;

[0033] The ratio of the first dust blowing slit width: the first suction slit width: the second suction slit width is 1:4~5:4~5;

[0034] The ratio of the width of the second dust blowing slit to the width of the third suction slit is 1:4-5;

[0035] The ratio of the air volume of the first dust blowing slit to the air volume of the first suction slit is 1:1.5~3, and the air volume of the second suction slit is equal to the air volume of the first suction slit;

[0036] The ratio of the air volume of the second dust blowing slit to the air volume of the third suction slit is 1:1.5~3.

[0037] Furthermore, in some embodiments, the mounting plate is disposed in the middle of the mounting frame, one side of the mounting plate is connected to two adjacent columns, and the other side of the mounting plate is connected to the upper frame through a vertical plate; a vertical frame is provided between one end of the mounting plate close to the column and the bottom frame, and a supporting beam is provided between the two columns away from the mounting plate;

[0038] A pneumatic assembly is provided on the movable mechanism, the dust removal mechanism is connected to the pneumatic assembly through a conduit, and the dust removal mechanism, the movable mechanism and the pneumatic assembly are arranged in an installation frame; the box sealing cover is connected to the movable mechanism through a second hanging slide.

[0039] Furthermore, in some embodiments, the mounting plate is arranged in the middle of the mounting frame, one end of the mounting plate is fixedly arranged in the middle of two adjacent columns, and the other end of the mounting plate away from the columns is connected to the upper frame through a vertical plate; a vertical frame is provided between the end of the mounting plate close to the column and the bottom frame, and a supporting beam is provided between the two columns away from the mounting plate;

[0040] The gear on the output shaft of the first motor is connected to the first rack seat in a gearing transmission; the gear on the output shaft of the second motor is connected to the second rack seat in a gearing transmission;

[0041] A dust removal mechanism is suspended on one end of the second hanging slide away from the second mounting slide rail.

[0042] This application uses a non-contact dust removal head for cleaning and an automated cleaning device. The cleaning device of this application corresponds to the size of the chip box (chip wafer box) on the carrier to clean the carrier. The device of this application is placed on the chip carrier for cleaning. There are generally hundreds or thousands of wafer processing carriers (points) in the working environment. The working environment is equipped with an overhead crane system, and the overhead crane is loaded with a mobile fixture. When a station is cleaned, the overhead crane system transports the cleaning device of this application to the next idle station to be cleaned (carrier position); just follow the station route map and clean the idle stations one by one.

[0043] This application adopts a non-contact suspension + gas and electricity isolation design, which uses fluctuating airflow to blow dust → wind curtain barrier (negative pressure suction) to close the dust removal workspace; a high-efficiency filter is set on the suction fan (negative pressure fan) to (efficiently) filter the dust, and the two fans provide positive or negative pressure air sources without the need for an external air source; in addition, it is battery-powered and does not require an external power supply. The fan and motor are both 24 volts, and the entire device is isolated from external air and electricity. The two fans are set on a mounting track (transverse guide rail) and are movable. The fan and the dust removal head are connected through an air duct. The fan moves with the dust removal head. When the dust removal head (dust removal component) moves, the fan moves with it. The distance between the fan and the dust removal head will not become very large, which is conducive to avoiding contact with nearby plates and shafts and realizing intelligent cleaning.

[0044] The dust removal head (blowing and suction head) of the present application blows and cleans through the middle dust blowing gap and suctions through the surrounding suction gaps; the dust removal head is suspended on the carrier and has no contact. The middle dust blowing gap blows and the surrounding suction gaps suction, so the dust will not be exposed, and the negative pressure suction (suction gaps) around will not leak air, which can prevent dust from floating out.

[0045] The dust collector head has two suction slits (narrow suction channels) on each side, each wider than the dust-blowing slit. Air from the central dust-blowing slit in the dust collector head (working gun) diffuses to either side, where two suction slit air curtains are installed on each side to draw away dust. Dust-blowing slits and suction slits are added to the narrow sides of the dust collector head, creating a surrounding suction air curtain. This prevents dust from escaping the dust-blowing gun, improving cleaning efficiency and enhancing the automation level of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 Schematic diagram of an application of an embodiment of the present invention;

[0047] Figure 2 Schematic diagram of the structure of an embodiment of the present invention;

[0048] Figure 3 is a three-dimensional schematic diagram of an embodiment of the present invention;

[0049] Figure 4 A bottom view schematically showing an embodiment of the present invention;

[0050] Figure 5 This is a schematic structural diagram of the pneumatic component portion of an embodiment of the present invention;

[0051] Figure 6 This is a schematic structural diagram of the gas component seat portion of an embodiment of the present invention;

[0052] Figure 7 This is a schematic structural diagram of the negative pressure fan portion of an embodiment of the present invention;

[0053] Figure 8 This is a schematic structural diagram of the moving mechanism portion of an embodiment of the present invention;

[0054] Figure 9 A schematic diagram of wind direction according to an embodiment of the present invention;

[0055] Figure 10 This is a schematic diagram of the assembly of the dust removal mechanism of an embodiment of the present invention;

[0056] Figure 11 Schematic cross-section of the dust removal mechanism of an embodiment of the present invention;

[0057] Figure 12 This is a schematic structural diagram of the dust removal mechanism of an embodiment of the present invention;

[0058] Figure 13 for Figure 11 A schematic structural diagram of an embodiment of the invention;

[0059] Figure 14 for Figure 11 A schematic structural diagram of another embodiment of part A. DETAILED DESCRIPTION

[0060] In order to further understand the features, technical means, specific objectives and functions achieved by the present invention, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0061] Referring to the accompanying drawings, the present application includes a base frame 11. The four corners of the base frame 11 are provided with upright columns 12 extending upward. An upper frame 13 is provided at the end of the column 12 away from the base frame 11. The base frame 11, the columns 12, and the upper frame 13 form a mounting frame. A mounting plate 14 is provided within the mounting frame. The mounting plate 14 is disposed in the middle of the mounting frame. One end of the mounting plate 14 is fixedly disposed in the middle of two adjacent columns 12. The other end of the mounting plate 14 away from the columns 12 is connected to the upper frame 13 via an upright plate. An upright frame 16 is provided between the end of the mounting plate 14 near the column 12 and the base frame 11. A supporting beam 15 is provided between the two columns 12 away from the mounting plate 14. The base frame 11 is placed on a carrier 81.

[0062] A moving mechanism 21 is installed on the mounting plate 14, a dust removal mechanism 41 is provided below the moving mechanism 21, a pneumatic assembly 61 is provided above the moving mechanism 21, the dust removal mechanism 41 is connected to the pneumatic assembly 61 through a conduit 59, and the dust removal mechanism 41, the moving mechanism 21 and the pneumatic assembly 61 are arranged in the mounting frame.

[0063] The dust removal mechanism 41 includes a dust removal head box body 42, which is also a pressure-dividing bin; a bottom plate 49 is provided at the bottom of the dust removal head box body 42, and the dust removal head box body 42 and the bottom plate 49 are integrally formed; a box sealing cover 48 is provided at the top of the dust removal head box body 42.

[0064] Furthermore, in one embodiment, the top of the dust removal head housing 42 is provided with an opening, and a housing sealing cover 48 is provided at the opening at the top of the dust removal head housing 42, that is, the housing sealing cover 48 is a sealing cover plate of the dust removal head housing 42. A positive pressure box 44 extending upward from the bottom plate 49 is provided in the dust removal head housing 42, that is, a frame-shaped positive pressure box 44 is provided in the dust removal head housing 42; the top of the positive pressure box 44 is separated from the top of the dust removal head housing 42 by a separation distance, that is, a distance is provided between the top of the positive pressure box 44 away from the bottom plate 49 and the housing sealing cover 48; further, the ratio of the height of the positive pressure box 44 to the height of the dust removal head housing 42 is 2 / 3 to 3 / 4:1.

[0065] Furthermore, in one embodiment, a positive pressure sealing cover 46 (positive pressure chamber cover) is provided at one end of the positive pressure box 44 away from the bottom plate 49, and an air inlet duct 47 is provided on the positive pressure sealing cover 46, which extends upward and passes through the box body sealing cover 48. The end of the air inlet duct 47 away from the positive pressure box 44 extends above the box body sealing cover 48, and the upper end of the air inlet duct 47 is connected to the conduit 59, and the air inlet duct 47 is through-connected to the positive pressure box 44.

[0066] A separation distance is provided between the outer wall of the positive pressure box 44 and the inner wall of the dust removal head housing 42. The cavity between the inner wall of the dust removal head housing 42 and the outer wall of the positive pressure box 44 forms a negative pressure chamber 43. That is, a negative pressure chamber 43 is provided on the outer side of the positive pressure box 44, and the annular negative pressure chamber 43 is disposed within the dust removal head housing 42. An exhaust port 57 is provided on the housing sealing cover 48, and the exhaust port 57 is connected to the negative pressure chamber 43. The positive pressure box 44 and the negative pressure chamber 43 are respectively disposed within the dust removal head housing 42, and the positive pressure box 44 and the negative pressure chamber 43 are isolated from each other and do not communicate with each other.

[0067] The box sealing cover 48 is connected to the moving mechanism 21 via the second hanging slide 34 .

[0068] Furthermore, in one embodiment, the bottom surface of the plenum box 44 is provided with a first dust-blowing slit 54 that extends transversely through the bottom plate 49, and a second dust-blowing slit 56 is provided near the ends of the first dust-blowing slit 54, and the second dust-blowing slit 56 is provided with a side-blowing spacing (with a spacing distance) from the top of the first dust-blowing slit 54. The second dust-blowing slit 56 (side dust-blowing slit) and the first dust-blowing slit 54 (center dust-blowing slit) are vertically connected to each other; the first dust-blowing slit 54 and the second dust-blowing slit 56 are provided through the bottom plate 49 of the plenum box 44. That is, the first dust-blowing slit 54 and the second dust-blowing slit 56 are provided through the bottom plate 49, and the second dust-blowing slit 56 is provided near the inner wall of the short sides of the plenum box 44. The second dust-blowing slit 56 cannot be too close to the edge. There should be a spacing distance between the second dust-blowing slit 56 and the third suction slit 55 for blowing and sucking operations, so that the second dust-blowing slit 56 can blow to the side and outside, and the third suction slit 55 can fully suck away, avoiding air leakage and dust leakage.

[0069] Furthermore, in one embodiment, two matching variable-section rods 45 are provided on the bottom surface 51 of the positive pressure chamber of the positive pressure box 44. The variable-section rods 45 are arranged parallel to the first dust-blowing gap 54, and the two variable-section rods 45 are respectively arranged on both sides of the first dust-blowing gap 54.

[0070] The variable-section rod 45 is provided with a compressed air flow bulge 19 that bulges inward (towards each other, face to face), and an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods 45, and a bulge spacing D2 is provided between the compressed air flow bulges 19 on the opposite sides of the middle of the two variable-section rods 45, and the air inlet spacing D1>the bulge spacing D2; the matching bottoms of the two corresponding variable-section rods 45 are provided with an air outlet spacing D3, and the first dust blowing gap 54 opened on the bottom surface 51 of the positive pressure chamber is provided with a dust blowing gap D4, and the dust blowing gap D4 is also the width of the first dust blowing gap 54; the air inlet spacing D1=the air outlet spacing D3, and the air outlet spacing D3>the dust blowing gap D4.

[0071] The compressed airflow convex hull 19 is in the form of a convex strip; or the compressed airflow convex hull 19 is a long strip with an arc-shaped cross section; or the compressed airflow convex hull 19 is a long strip with a short chord-shaped cross section.

[0072] Variable-section rod 45: The compressed air passes through the variable-section air flow channel and the wide-narrow section variable flow channel, and through repeated compression and diffusion, a fluctuating airflow is generated, and a high-frequency and high-speed pulse airflow is generated at the outlet position (the first dust-blowing slit 54), so that the ultrafine particles are separated from the substrate and then sucked away and collected by the surrounding negative pressure airflow.

[0073] The ratio of air inlet spacing D1 to convex hull spacing D2 is 5 to 10:1;

[0074] Air inlet distance D1 = air outlet distance D3, D1 equals D3;

[0075] The ratio of dust blowing distance D4 to convex hull distance D2 is 1:1 to 1.5.

[0076] The size of the wind gap is D1=D3>D2≧D4, and the airflow passes through D1→D2→D3→D4 and undergoes air duct wide→narrow→wide→narrow air duct fluctuation changes, obtaining a high-frequency and high-speed pulse airflow, which impacts the dust blowing and sweeping at the outlet of the first dust blowing gap 54.

[0077] The bottom surface of the negative pressure chamber 43 is provided with a first suction slit 52 and a second suction slit 53 that extend transversely through the bottom plate 49. The first suction slit 52, the second suction slit 53, and the first dust-blowing slit 54 are arranged parallel to each other. The first suction slit 52 (inner suction slit) is arranged close to the first dust-blowing slit 54, and the second suction slit 53 (outer suction slit) is arranged away from the first dust-blowing slit 54. A separation distance is provided between the first suction slit 52 and the second suction slit 53. Furthermore, the first suction slit 52 and the second suction slit 53 are arranged transversely through the bottom plate 49 of the negative pressure chamber 43, that is, the first suction slit 52 and the second suction slit 53 are arranged transversely and parallel to each other on the bottom plate 49, and a separation distance is provided between the first dust-blowing slit 54 and the first suction slit 52.

[0078] A third suction slit 55 is provided on the bottom surface of the short sides on both sides of the negative pressure chamber 43, which penetrates the bottom plate 49 longitudinally. The third suction slit 55 is arranged between the outer wall of the short sides on both sides of the positive pressure box 44 and the inner wall of the dust removal head box 42. The third suction slit 55 is arranged parallel to the second dust blowing slit 56; further, the third suction slit 55 (side suction slit) extends downward through the bottom plate 49, and the third suction slit 55 is connected to the negative pressure chamber 43.

[0079] Furthermore, in one embodiment, the ratio of the width of the first dust blowing slit 54 : the width of the first suction slit 52 : the width of the second suction slit 53 is 1:4-5:4-5;

[0080] The ratio of the width of the second dust blowing slit 56 to the width of the third suction slit 55 is 1:4-5;

[0081] The first dust-blowing slit 54 and the second dust-blowing slit 56 have the same width, and the first suction slit 52 , the second suction slit 53 and the third suction slit 55 have the same width.

[0082] Furthermore, in one embodiment, the ratio of the air volume of the first dust blowing slit 54 to the air volume of the first suction slit 52 is 1:1.5-3, and the air volume of the second suction slit 53 is equal to the air volume of the first suction slit 31;

[0083] The ratio of the air volume of the second dust blowing slit 56 to the air volume of the third suction slit 55 is 1:1.5-3.

[0084] Furthermore, in one embodiment, a battery 58 is provided on the top of the mounting plate 14, and the battery 58 provides power to all power components. The moving mechanism 21 includes a first mounting rail 28 and a first rack seat 27. The first rack seat 27 and the first mounting rail 28 are fixedly mounted below the mounting plate 14. The first mounting rail 28 and the first rack seat 27 are arranged on the side of the mounting plate 14 away from the column 12. The first rack seat 27 and the first mounting rail 28 are arranged parallel to the mounting plate 14. A slidable first hanging slide 29 is hung on the first mounting rail 28, and a first motor 23 is fixed on the first hanging slide 29. The first motor 23 is connected to the first rack seat 27 in a gearing transmission manner; specifically, the gear on the output shaft of the first motor 23 is connected to the first rack seat 27 in a gearing transmission manner.

[0085] The first motor 23 drives the first hanging slide 29 to move back and forth on the first mounting slide rail 28 . The first motor 23 drives the first hanging slide 29 to move on the first rack seat 27 through the engagement of the gear on the output shaft.

[0086] Furthermore, in one embodiment, a pneumatic seat 22 is provided below the first suspension slide 29. The pneumatic seat 22 is fixedly connected to the first suspension slide 29 and is perpendicularly arranged to the first mounting rail 28. One end of the pneumatic seat 22 extends outside the mounting plate 14. A bearing wheel 25 is provided at the end of the pneumatic seat 22 away from the mounting plate 14. The bearing wheel 25 is mounted on a support beam 15, which is disposed between two adjacent columns 12. A second mounting rail 33 and a second rack seat 26 are fixedly provided on a side of the pneumatic seat 22 away from the first suspension slide 29. The parallel second mounting rail 33 and second rack seat 26 are perpendicularly arranged to the first mounting rail 28.

[0087] Furthermore, in one embodiment, a slidable second hanging slide 34 is hung on the second mounting rail 33, and a second motor 24 is provided on the second hanging slide 34. The second motor 24 is meshingly connected to the second rack seat 26; specifically, the gear on the output shaft of the second motor 24 is meshingly connected to the second rack seat 26.

[0088] Furthermore, in one embodiment, a dust removal mechanism 41 is suspended from one end of the second suspension slide 34 away from the second mounting rail 33. The second motor 24 drives the second suspension slide 34 to move back and forth on the second mounting rail 33. The second motor 24 drives the second suspension slide 34 to move on the second mounting rail 33 by engaging the gears on the output shaft. The first motor 23 and the second motor 24 drive the dust removal mechanism 41 to move forward, backward, left, right, and vertically and horizontally.

[0089] A pneumatic assembly 61 is provided on one side of the pneumatic seat 22 away from the mounting plate 14 . The pneumatic assembly 61 is disposed on the outer side of the mounting plate 14 .

[0090] Furthermore, in one embodiment, the air pressure component 61 includes a negative pressure fan 62 and a positive pressure fan 63. A negative pressure high-efficiency filter bin 66 is provided above the negative pressure fan 62, and the air suction port of the negative pressure high-efficiency filter bin 66 extends laterally and is arranged on the outside of the negative pressure fan 62.

[0091] Furthermore, in one embodiment, the air intake of the negative pressure high efficiency filter bin 66 is connected to the air outlet 57 of the dust removal mechanism 41 through a duct 59, and the positive pressure fan 63 is connected to the air inlet 47 of the dust removal mechanism 41 through another duct 59.

[0092] The positive-pressure fan 63 operates at a pressure of 5 to 12 kPa, while the negative-pressure fan 62 operates at a pressure of -6 to -1.5 kPa. The air volume ratio of the positive-pressure fan 63 to the negative-pressure fan 62 is 1:1.5 to 3. The positive-pressure fan 63 and the negative-pressure fan 62 are connected to the air inlet 47 and the exhaust port 57 of the dust removal mechanism 41 via a duct 59. This effectively traps dust during dust removal, trapping it within the clean space surrounding the dust removal head (dust removal mechanism 41), forming an air curtain that completely encloses the entire dust removal workspace.

[0093] A silencer box 65 is provided on one side of the negative pressure fan 62; specifically, a lateral air outlet 68 is provided on the negative pressure fan 62, and the lateral air outlet 68 is connected to the silencer box 65 through a duct 59; a square honeycomb tube 69 is provided in the silencer box 65, and a plurality of through holes are provided on the square tube plate surface of the frame of the square honeycomb tube 69, and the square honeycomb tube 69 is provided with oblique honeycomb baffles 71 that cross each other on the left and right.

[0094] The oblique honeycomb baffles 71 extend upward from the inner wall of the square honeycomb tube 69. The oblique honeycomb baffles 71 on both sides are arranged in an alternating manner and cross each other. The top parts of the oblique honeycomb baffles 71 on both sides overlap each other in the vertical direction (longitudinal direction), forming an S-shaped air duct in the square honeycomb tube 69 to reduce the impact effect of wind waves.

[0095] The above-described embodiments merely illustrate several implementations of the present invention, and while their descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that a person skilled in the art would be able to make numerous variations and improvements without departing from the spirit of the present invention, all of which fall within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be determined by the appended claims.

Claims

1. A wafer processing cleaning device, comprising: A bottom frame (11), wherein four corners of the bottom frame (11) are provided with upright posts (12) extending upward, an upper frame (13) is provided at one end of the upright post (12) away from the bottom frame (11), and the bottom frame (11), the upright post (12) and the upper frame (13) form an installation frame, wherein an installation plate (14) is provided in the installation frame; The invention is characterized in that a moving mechanism (21) is installed on the mounting plate (14), a dust removal mechanism (41) is provided below the moving mechanism (21), a pneumatic assembly (61) is provided above the moving mechanism (21), the dust removal mechanism (41) is connected to the pneumatic assembly (61) through a conduit (59), and the dust removal mechanism (41), the moving mechanism (21) and the pneumatic assembly (61) are arranged in a mounting frame; The dust removal mechanism (41) is connected to the moving mechanism (21) through the second hanging slide (34). The dust removal mechanism (41) includes a dust removal head box (42). The bottom of the dust removal head box (42) is provided with a bottom plate (49), the top of the dust removal head box (42) is provided with an opening, and the opening at the top of the dust removal head box (42) is provided with a box sealing cover (48); a positive pressure box (44) extending upward from the bottom plate (49) is provided in the dust removal head box (42), and a separation distance is provided between the top of the positive pressure box (44) and the top of the dust removal head box (42); A separation distance is provided between the outer wall of the positive pressure box (44) and the inner wall of the dust removal head box body (42); a negative pressure chamber (43) is provided on the outer side of the positive pressure box (44); and the negative pressure chamber (43) is provided between the inner wall of the dust removal head box body (42) and the outer wall of the positive pressure box (44); The moving mechanism (21) includes a first mounting slide rail (28) and a first rack seat (27). The first rack seat (27) and the first mounting slide rail (28) are fixedly arranged below the mounting plate (14). The first mounting slide rail (28) and the first rack seat (27) are arranged on a side of the mounting plate (14) away from the column (12). The first rack seat (27) and the first mounting slide rail (28) are arranged in parallel with the mounting plate (14). A slidable first hanging slide (29) is hung on the first hanging slide rail (28), a first motor (23) is fixed on the first hanging slide (29), and the first motor (23) is connected to the first rack seat (27) in a gearing transmission manner.

2. The wafer processing cleaning device according to claim 1, characterized in that: The positive pressure box (44) is provided with a positive pressure sealing cover (46) at one end away from the bottom plate (49), and an air inlet duct (47) extending upward and penetrating the box body sealing cover (48) is provided on the positive pressure sealing cover (46). The end of the air inlet duct (47) away from the positive pressure box (44) extends above the box body sealing cover (48), and the upper end of the air inlet duct (47) is connected to the conduit (59), and the air inlet duct (47) is connected to the positive pressure box (44); The box sealing cover (48) is provided with an air exhaust port (57), which is connected to the negative pressure chamber (43); the positive pressure box (44) and the negative pressure chamber (43) are respectively arranged in the dust removal head box (42), and the positive pressure box (44) and the negative pressure chamber (43) are isolated from each other and do not communicate with each other; The bottom surface of the positive pressure box (44) is provided with a first dust blowing slit (54) which runs through the bottom plate (49) in a transverse direction. The ends of the first dust blowing slit (54) are provided with matching symmetrical second dust blowing slits (56). The second dust blowing slit (56) is provided with a side blowing distance from the top end of the first dust blowing slit (54). The second dust blowing slit (56) and the first dust blowing slit (54) are vertically arranged to penetrate each other. The ratio of the height of the positive pressure box (44) to the height of the dust removal head box (42) is 2 / 3 to 3 / 4:

1.

3. The wafer processing cleaning device according to claim 1, characterized in that: A gas seat (22) is provided below the first hanging slide (29), the gas seat (22) is fixedly connected to the first hanging slide (29), the gas seat (22) is vertically arranged with the first mounting slide rail (28), and one end of the gas seat (22) extends outside the mounting plate (14); a bearing wheel (25) is provided at one end of the gas seat (22) away from the mounting plate (14), and the bearing wheel (25) is arranged on a supporting beam (15), and the supporting beam (15) is arranged between two adjacent columns (12); A second mounting rail (33) and a second rack seat (26) are fixedly provided on a side of the air component seat (22) away from the first hanging slide seat (29) and are parallel to each other. The parallel second mounting rail (33), the second rack seat (26) and the first mounting rail (28) are arranged vertically. A slidable second hanging slide (34) is hung on the second hanging slide rail (33), a second motor (24) is provided on the second hanging slide (34), and the second motor (24) is connected to the second rack seat (26) by gearing transmission; A pneumatic component (61) is provided on one side of the pneumatic seat (22) away from the mounting plate (14), and the pneumatic component (61) is arranged on the outer side of the mounting plate (14); The air pressure assembly (61) includes a negative pressure fan (62) and a positive pressure fan (63). A negative pressure high efficiency filter chamber (66) is provided above the negative pressure fan (62). The air suction port of the negative pressure high efficiency filter chamber (66) extends laterally and is arranged outside the negative pressure fan (62). The air inlet of the negative pressure high efficiency filter bin (66) is connected to the air outlet (57) of the dust removal mechanism (41) through a conduit (59), and the positive pressure fan (63) is connected to the air inlet tube (47) of the dust removal mechanism (41) through another conduit (59).

4. The wafer processing cleaning device according to claim 3, characterized in that: A muffler box (65) is provided on one side of the negative pressure fan (62), and the air outlet of the negative pressure fan (62) is connected to the muffler box (65) through a conduit (59); A square honeycomb tube (69) is provided in the muffler box (65), a plurality of through holes are provided on the square tube plate surface of the frame of the square honeycomb tube (69), and oblique honeycomb baffles (71) intersecting each other on the left and right are provided in the square honeycomb tube (69); The oblique honeycomb baffles (71) extend upwardly and obliquely from the inner side wall of the square honeycomb tube (69). The oblique honeycomb baffles (71) on both sides are arranged in an up-down staggered manner. The oblique honeycomb baffles (71) on both sides cross each other. The top portions of the oblique honeycomb baffles (71) on both sides overlap each other in the vertical direction. The crossed oblique honeycomb baffles (71) on both sides form an S-shaped air duct in the square honeycomb tube (69). The negative pressure fan (62) is provided with a lateral air outlet (68), and the lateral air outlet (68) is connected to the muffler box (65) through a conduit (59).

5. The wafer processing cleaning device according to claim 1, characterized in that: The bottom surface of the negative pressure chamber (43) is provided with a first suction slit (52) and a second suction slit (53) which are transversely passed through the bottom plate (49); the first suction slit (52), the second suction slit (53) and the first dust blowing slit (54) are arranged in parallel; the first suction slit (52) is arranged close to the first dust blowing slit (54), and the second suction slit (53) is arranged away from the first dust blowing slit (54); and a separation distance is provided between the first suction slit (52) and the second suction slit (53); Two matching variable-section rods (45) are provided on the bottom surface (51) of the positive-pressure chamber of the positive-pressure box (44). The variable-section rods (45) are arranged in parallel with the first dust-blowing slit (54). The two variable-section rods (45) are respectively arranged on both sides of the first dust-blowing slit (54). The variable-section rod (45) is provided with an inwardly protruding compressed air convex hull (19), an air inlet spacing D1 is provided between the tops of the two corresponding variable-section rods (45), a convex hull spacing D2 is provided between the compressed air convex hulls (19) on the opposite sides of the middle of the two variable-section rods (45), and the air inlet spacing D1 is greater than the convex hull spacing D2; an air outlet spacing D3 is provided between the bottoms of the two corresponding variable-section rods (45), a first dust-blowing slit (54) opened on the bottom surface (51) of the positive pressure chamber is provided with a dust-blowing spacing D4, and the dust-blowing spacing D4 is also the width of the first dust-blowing slit (54); the air inlet spacing D1 = the air outlet spacing D3, and the air outlet spacing D3 is greater than the dust-blowing spacing D4.

6. The wafer processing cleaning device according to claim 5, characterized in that: The compressed airflow convex hull (19) is a convex strip; or the compressed airflow convex hull (19) is a long strip with an arc-shaped cross section; or the compressed airflow convex hull (19) is a long strip with a short chord-shaped cross section; The ratio of air inlet spacing D1 to convex hull spacing D2 is 5 to 10:1; The air inlet spacing D1 = air outlet spacing D3; the ratio of dust blowing spacing D4 to convex hull spacing D2 is 1:1~1.5; A third suction slit (55) is provided on the bottom surface of the short sides of both sides of the negative pressure chamber (43) and is longitudinally penetrated through the bottom plate (49). The third suction slit (55) is arranged between the outer wall of the short sides of both sides of the positive pressure box (44) and the inner wall of the dust removal head box body (42). The third suction slit (55) is arranged in parallel with the second dust blowing slit (56). The second dust blowing slit (56) is provided close to the inner wall of the short sides of the positive pressure box (44); The ratio of the width of the first dust blowing slit (54): the width of the first suction slit (52): the width of the second suction slit (53) is 1:4-5:4-5; The ratio of the width of the second dust blowing slit (56) to the width of the third suction slit (55) is 1:4-5; The ratio of the air volume of the first dust blowing slit (54) to the air volume of the first suction slit (52) is 1:1.5-3, and the air volume of the second suction slit (53) is equal to the air volume of the first suction slit (52); The ratio of the air volume of the second dust blowing slit (56) to the air volume of the third suction slit (55) is 1:1.5-3.

7. The wafer processing cleaning device according to claim 1, characterized in that: The mounting plate (14) is arranged in the middle of the mounting frame, one side of the mounting plate (14) is connected to two adjacent columns (12), and the other side of the mounting plate (14) is connected to the upper frame (13) through a vertical plate; a vertical frame (16) is provided between one end of the mounting plate (14) close to the column (12) and the bottom frame (11), and a supporting beam (15) is provided between the two columns (12) away from the mounting plate (14); A pneumatic assembly (61) is provided on the upper surface of the movable mechanism (21); the dust removal mechanism (41) is connected to the pneumatic assembly (61) via a conduit (59); the dust removal mechanism (41), the movable mechanism (21) and the pneumatic assembly (61) are arranged in an installation frame; and the box sealing cover (48) is connected to the movable mechanism (21) via a second hanging slide (34).

8. The wafer processing cleaning device according to claim 1, characterized in that: The mounting plate (14) is arranged in the middle of the mounting frame, one end of the mounting plate (14) is fixedly arranged in the middle of two adjacent columns (12), and the other end of the mounting plate (14) away from the column (12) is connected to the upper frame (13) through a vertical plate; a vertical frame (16) is provided between the end of the mounting plate (14) close to the column (12) and the bottom frame (11), and a supporting beam (15) is provided between the two columns (12) away from the mounting plate (14); The gear on the output shaft of the first motor (23) is connected to the first rack seat (27) in a toothed transmission manner; the gear on the output shaft of the second motor (24) is connected to the second rack seat (26) in a toothed transmission manner; A dust removal mechanism (41) is suspended on one end of the second hanging slide (34) away from the second mounting slide rail (33).

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