Dual-mode coupling neutralizer in ion beam coating and etching equipment

Abstract

The invention discloses a dual-mode coupling neutralizer in ion beam coating and etching equipment, which comprises an outer electrode, an inner electrode and an extraction electrode plate, the outer electrode and the inner electrode are cylindrical, one end of each of the outer electrode and the inner electrode is provided with an opening, the outer electrode and the inner electrode are coaxially arranged, and the outer electrode and the inner electrode are combined to form a capacitor. A space between the outer electrode and the inner electrode forms a discharge space; the discharge space is connected with an inflation assembly used for introducing discharge gas into the discharge space. The lead-out electrode plate is mounted at the opening of the outer electrode and the opening of the inner electrode, and an electronic lead-out hole is formed in the lead-out electrode plate. The structure is simple, the purpose of pulling out electrons in a wide pressure range can be achieved, it is guaranteed that discharging is carried out under wide working pressure, no other consumables (only discharging gas) exist on the whole, cost is low, and the service life is long.

Description

Technical Field

[0001] The invention mainly relates to the technical field of ion beam coating / etching, and in particular to a dual-mode coupling neutralizer in ion beam coating and etching equipment. Background Art

[0002] Ion beam coating / etching equipment is a physical vapor deposition / etching equipment. It uses an ion source to generate ions and then extracts the ions to form an ion beam. The extracted ion beam hits the surface of the material to be plated (target material) to sputter out atoms, molecules or atomic groups on the surface of the target material, attach to the surface of the nearby workpiece, and form a thin film on the surface of the workpiece. This is ion beam coating; if the ion beam is directly hit on the surface of the workpiece, the surface material of the workpiece will be removed, which is ion beam etching. The gas generally used is Ar gas, and the extracted ions are Ar+ ions. These ions are positively charged. Since some workpieces or target materials are insulators, the charge of Ar+ ions cannot be transferred in time, and they will accumulate in the cavity to form a high potential. When the potential accumulates to a certain level, a discharge phenomenon will occur, which will break down the surface of the workpiece or target material and cause defects. In order to prevent this kind of sparking, a neutralizer is introduced. The so-called neutralizer is actually an electron source. It generates electrons and extracts them into the space of the ion beam, so that the number of positive and negative charges in the space where the ion beam is located is equal, and the space potential is in a zero potential state, thus avoiding the sparking phenomenon caused by the potential difference.

[0003] The neutralizer in the existing ion beam coating / etching equipment generally adopts three methods: one is to directly use tungsten filament heating to emit electrons; the second is hollow cathode, using materials with low electron overflow work to emit electrons, and then extracting the electrons; the third is to use radio frequency inductive coupling discharge to ionize the gas, generate ions and electrons, and then extract the electrons. The disadvantages of these three methods are as follows: the first is that the filament is directly exposed in the vacuum chamber and immersed in the extracted ion beam. The filament is bombarded by ions and has a short lifespan. In addition, the particles bombarded by the filament will adhere to the surface of the workpiece, causing the film composition to be impure; the second is that the material that emits electrons will be continuously consumed, and the emission capacity will gradually deteriorate, and the lifespan will also be limited; the third is that due to the low working vacuum degree of the ion beam coating / etching equipment, radio frequency discharge is difficult, and sometimes it is easy to pull out electrons during actual use, and sometimes it is necessary to increase the gas supply to pull out electrons. The working stability is poor, and a special discharge power supply is required, and the production cost is high. Summary of the invention

[0004] The technical problem to be solved by the present invention is: in view of the technical problems existing in the prior art, the present invention provides a dual-mode coupling neutralizer in an ion beam coating and etching device which has a simple structure and is easy to implement.

[0005] In order to solve the above technical problems, the technical solution proposed by the present invention is:

[0006] A dual-mode coupled neutralizer in an ion beam coating and etching device comprises an outer electrode, an inner electrode and an extraction electrode plate, wherein the outer electrode and the inner electrode are both cylindrical and have an opening at one end, the outer electrode and the inner electrode are coaxially arranged, the outer electrode and the inner electrode are combined to form a capacitor, and the space between the outer electrode and the inner electrode forms a discharge space; the discharge space is connected to a gas filling component for introducing a discharge gas into the discharge space; the extraction electrode plate is installed at the opening of the outer electrode and the inner electrode, and an electron extraction hole is provided on the extraction electrode plate.

[0007] As a further improvement of the above technical solution:

[0008] The openings of the outer electrode and the inner electrode are both trumpet-shaped, and the taper of the trumpet-shaped opening of the outer electrode is smaller than the taper of the trumpet-shaped opening of the inner electrode.

[0009] The trumpet-shaped opening of the inner electrode is provided with one or more pointed electrodes, and each of the pointed electrodes is close to the inner wall of the conical surface of the outer electrode.

[0010] It also includes a mounting assembly, on which the inner electrode and the outer electrode are both mounted.

[0011] The mounting assembly includes an insulating member, the other end of the outer electrode is fastened to the outer surface of an insulating member, a hole is provided inside the insulating member, and a first terminal is provided at one end of the inner electrode, and the first terminal passes through the hole of the insulating member and is sealed.

[0012] The hole is a threaded hole, and the first terminal is threadedly connected to the threaded hole to achieve axial movement of the inner electrode to adjust the distance between the tip electrode on the inner electrode and the conical surface of the outer electrode.

[0013] A cavity is provided inside the outer electrode, the cavity forms a water channel, and a water pipe joint connected to the water channel is provided outside the outer electrode.

[0014] A second terminal is arranged on the outer side of the outer electrode, and the water pipe joint is integrated with the second terminal.

[0015] The discharge gas is the same as the gas used in the ion source.

[0016] The discharge gas is argon gas.

[0017] Compared with the prior art, the advantages of the present invention are:

[0018] The dual-mode coupled neutralizer in the ion beam coating and etching equipment of the present invention forms a capacitor by combining an outer electrode and an inner electrode. Under low vacuum conditions, the capacitive impedance discharge between the outer electrode and the inner electrode is used to ionize the gas to generate plasma. The structure is simple and easy to implement.

[0019] The dual-mode coupled neutralizer in the ion beam coating and etching equipment of the present invention can also utilize tip discharge to ionize gas to generate plasma, and utilize tip discharge to generate plasma under high vacuum conditions.

[0020] The present invention combines the two modes of capacitive plate discharge and tip discharge, can work under high vacuum or low vacuum, can achieve the purpose of pulling out electrons within a wide pressure range (high and low vacuum), and ensures that the discharge is carried out under a wide working pressure.

[0021] The present invention as a whole has no other consumables but only discharge gas, and has low cost and long working life. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a three-dimensional structural diagram of the dual-mode coupled neutralizer in an embodiment of the present invention.

[0023] Figure 2 It is a cross-sectional structural diagram of the dual-mode coupled neutralizer of the present invention in an embodiment.

[0024] Figure 3 for Figure 2 A partial enlarged view of the .

[0025] Legend: 1. External electrode; 101. Cavity; 102. Second terminal; 103. Water pipe joint; 2. Internal electrode; 201. First terminal; 202. Tip electrode; 203. Discharge space; 204. Inflatable component; 3. Lead-out electrode plate; 301. Electron lead-out hole; 4. Mounting component; 401. Insulator. DETAILED DESCRIPTION

[0026] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments.

[0027] like Figure 1 and Figure 2As shown, the dual-mode coupled neutralizer in the ion beam coating and etching equipment of the embodiment of the present invention comprises an outer electrode 1, an inner electrode 2 and an extraction electrode plate 3. The outer electrode 1 and the inner electrode 2 are both cylindrical and have an opening at one end. The outer electrode 1 and the inner electrode 2 are coaxially arranged. The outer electrode 1 and the inner electrode 2 are combined to form a capacitor. The space between the outer electrode 1 and the inner electrode 2 forms a discharge space 203. The discharge space 203 is connected to a gas filling component 204 (such as a gas filling joint) for introducing a discharge gas into the discharge space 203. The extraction electrode plate 3 is installed at the opening of the outer electrode 1 and the inner electrode 2, and an electron extraction hole 301 is provided on the extraction electrode plate 3. Specifically, the discharge gas is introduced through the gas filling component 204, and a radio frequency or direct current voltage is applied to the inner electrode 2 and the outer electrode 1, so that plasma is generated by discharge in the discharge space 203, and then the plasma is extracted through the electron extraction hole 301 on the extraction electrode plate 3.

[0028] The dual-mode coupled neutralizer in the ion beam coating and etching equipment of the present invention forms a capacitor by combining an outer electrode 1 and an inner electrode 2. Under low vacuum conditions, the gas is ionized by using the capacitive impedance discharge between the outer electrode 1 and the inner electrode 2. The structure is simple and easy to implement.

[0029] In a specific embodiment, if Figure 3 As shown, the openings of the outer electrode 1 and the inner electrode 2 are both trumpet-shaped, and the taper of the trumpet-shaped opening of the outer electrode 1 is smaller than the taper of the trumpet-shaped opening of the inner electrode 2. The trumpet-shaped opening of the inner electrode 2 is provided with one or more tip electrodes 202, and each tip electrode 202 is close to the inner wall of the cone surface of the outer electrode 1. The distance between the tip electrode 202 and the inner wall of the cone surface of the outer electrode 1 is very close, and the tip discharge condition is achieved. Tip discharge ignition can be performed under high vacuum. Once ignition occurs, more electrons and ions will be generated, which will accelerate the discharge of the excitation capacitor, increase the electron concentration, and accelerate the probability of collision with the gas, so that high concentrations of ions and electrons are easily generated. Of course, under low vacuum, the capacitor discharge formed by the inner electrode 2 and the outer electrode 1 can directly excite the gas to produce plasma.

[0030] By combining the capacitive plate discharge and tip discharge modes, it can work under high vacuum or low vacuum, and can achieve the purpose of pulling out electrons within a wide pressure range (high and low vacuum), ensuring that the discharge is carried out under a wide working pressure.

[0031] In a specific embodiment, the inner electrode 2 and the outer electrode 1 are both mounted on a mounting assembly 4. Specifically, the mounting assembly 4 includes an insulating member 401, the other end of the outer electrode 1 is fastened to the outer surface of an insulating member 401, a hole is provided inside the insulating member 401, and a first terminal 201 is provided at one end of the inner electrode 2, and the first terminal 201 passes through the hole of the insulating member 401 and is sealed. The hole is a threaded hole, and the first terminal 201 is threadedly connected to the threaded hole to achieve the movement of the inner electrode 2 in the axial direction, so that the gap between the tip electrode 202 on the inner electrode 2 and the inner wall of the conical surface of the outer electrode 1 can be adjusted, such as increasing the discharge process window.

[0032] In addition, the lead-out electrode plate 3 is mounted on the open end face of the outer electrode 1 through another insulating seat. If a mounting post is provided on the open end face of the outer electrode 1, the corresponding insulating seat sleeve is mounted on the mounting post, and the lead-out electrode plate 3 is crimped on the insulating seat and fastened to the insulating seat through a pressing block threadedly connected to the insulating seat.

[0033] In a specific embodiment, a cavity 101 is provided inside the outer electrode 1, and the cavity 101 forms a water channel. A water pipe joint 103 connected to the water channel is provided outside the outer electrode 1. A second terminal 102 is provided outside the outer electrode 1, and the water pipe joint 103 is integrated with the second terminal 102, which has a simple structure and a high degree of integration. Cooling water is filled into the water channel through the water pipe joint 103 to achieve cooling of the outer electrode 1.

[0034] In a specific embodiment, the discharge gas is the same as the gas used in the ion source, such as argon (Ar). Since the discharge gas is the same as the gas used in the ion source, there is no other consumable material (only the discharge gas), and the working life is long.

[0035] The above are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should be regarded as the protection scope of the present invention.

Claims

1. A dual-mode coupled neutralizer in an ion beam coating and etching device, characterized in that: The invention comprises an outer electrode (1), an inner electrode (2) and an extraction electrode plate (3); the outer electrode (1) and the inner electrode (2) are both cylindrical and have an opening at one end; the outer electrode (1) and the inner electrode (2) are coaxially arranged; the outer electrode (1) and the inner electrode (2) are combined to form a capacitor; the space between the outer electrode (1) and the inner electrode (2) forms a discharge space (203); the discharge space (203) is connected to a gas filling component (204) for introducing a discharge gas into the discharge space (203); the extraction electrode plate (3) is installed at the openings of the outer electrode (1) and the inner electrode (2); the extraction electrode plate (3) is provided with an electron extraction hole (301).

2. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 1, characterized in that: The openings of the outer electrode (1) and the inner electrode (2) are both trumpet-shaped, and the taper of the trumpet-shaped opening of the outer electrode (1) is smaller than the taper of the trumpet-shaped opening of the inner electrode (2).

3. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 2, characterized in that: The trumpet-shaped opening of the inner electrode (2) is provided with one or more pointed electrodes (202), and each of the pointed electrodes (202) is close to the inner wall of the conical surface of the outer electrode (1).

4. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 1, 2 or 3, characterized in that: It also comprises a mounting assembly (4), on which the inner electrode (2) and the outer electrode (1) are both mounted.

5. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 4, characterized in that: The mounting assembly (4) comprises an insulating member (401), the other end of the outer electrode (1) is fastened to the outer surface of an insulating member (401), a hole is provided inside the insulating member (401), and one end of the inner electrode (2) is provided with a first terminal (201), and the first terminal (201) passes through the hole of the insulating member (401) and is sealed.

6. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 5, characterized in that: The hole is a threaded hole, and the first terminal (201) is threadedly connected to the threaded hole to achieve axial movement of the inner electrode (2) to adjust the distance between the tip electrode (202) on the inner electrode (2) and the conical surface of the outer electrode (1).

7. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 1, 2 or 3, characterized in that: A cavity (101) is provided inside the outer electrode (1), the cavity (101) forms a water channel, and a water pipe joint (103) connected to the water channel is provided outside the outer electrode (1).

8. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 7, characterized in that: A second terminal (102) is provided on the outer side of the outer electrode (1), and the water pipe connector (103) is integrated with the second terminal (102).

9. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 1, 2 or 3, characterized in that: The discharge gas is the same as the gas used in the ion source.

10. The dual-mode coupled neutralizer in the ion beam coating and etching equipment according to claim 9, characterized in that: The discharge gas is argon gas.

Images