A cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning

Abstract

The present invention discloses a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning, which relates to the technical field of PCBA and semiconductor cleaning equipment. In order to solve the problems that the discharge amount of rinsing water is huge, which not only easily causes serious environmental pollution, but also fails to effectively save water resources, and the large amount of water used makes the use cost of enterprises remain high. After the rinsing water of the present invention undergoes multi-stage overflow, it is finally discharged into the designed rinsing wastewater recycling device. The rinsing wastewater is then treated by multi-stage reverse osmosis and reused repeatedly, reducing the discharge of rinsing water by more than 95%, achieving the function of zero discharge within a long time. Not only is the discharge amount of rinsing water reduced, no serious environmental pollution is caused, but also water resources can be effectively saved, and the water resource use cost of enterprises is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of PCBA and semiconductor cleaning equipment, and particularly to a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning. Background Art

[0002] PCBA and semiconductor cleaning machines are professional equipment designed for problems such as flux residue in PCBA and semiconductor production.

[0003] Functionally, it can accurately remove various harmful substances such as flux residues on the surfaces of PCBA and semiconductor components. By adopting advanced cleaning technologies such as spraying and ultrasonic cleaning, the comprehensiveness and high efficiency of cleaning are ensured, avoiding the corrosion of components by residual flux and affecting the performance and reliability of PCBA and semiconductors.

[0004] In terms of structural design, the equipment is compact and reasonably laid out. It has multi-stage cleaning tanks and can sequentially perform different processes such as cleaning, rinsing, and drying to meet different cleaning requirements. It is equipped with an automated control system that can accurately control parameters such as cleaning time, temperature, and pressure to ensure the consistency and stability of the cleaning effect.

[0005] In the application field, it widely serves industries such as PCBA and semiconductor manufacturing, and electronic packaging. Whether it is a large-scale chip manufacturing enterprise or a small electronic packaging factory, it can be used to improve product quality and production efficiency. PCBA and semiconductor flux residue cleaning machines play an indispensable role in the PCBA and semiconductor production processes with their professional and efficient characteristics, providing strong support for the development of the industry.

[0006] However, existing PCBA and semiconductor cleaning machines have many drawbacks. When cleaning PCBA and semiconductors, the amount of rinsing water discharged is large, which not only easily causes serious environmental pollution but also fails to effectively save water resources. The large amount of water consumption makes the usage cost of enterprises remain high. From the perspectives of environmental protection and economic cost, it is urgent to optimize and improve the performance of PCBA and semiconductor cleaning machines.

[0007] Therefore, a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning is needed. Summary of the Invention

[0008] In order to solve all or part of the above problems, the object of the present invention is to provide a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning, so as to solve the problem that the amount of discharged rinsing water is huge, which not only easily causes serious environmental pollution but also fails to effectively save water resources, and the large amount of water consumption makes the usage cost of enterprises remain high.

[0009] To achieve the above object, the present invention provides the following technical solution: A cleaning machine for zero discharge of rinsing water in PCBA and semiconductor cleaning, characterized in that it includes a machine shell and a feeding section assembly and a discharging section assembly arranged at both ends of the machine shell. A conveying assembly is arranged inside the feeding section assembly, the machine shell and the discharging section assembly. A cleaning mechanism is arranged inside the machine shell. The conveying path of the conveying assembly passes through the middle of the cleaning mechanism. A cleaning liquid tank, an ST liquid tank assembly and a rinsing liquid tank assembly are installed at the lower end of the cleaning mechanism. Rinsing liquid is conveyed in the rinsing liquid tank assembly, and the overflow of the rinsing liquid tank assembly flows into the ST liquid tank assembly to form ST liquid. The ST liquid tank assembly includes an ST three-liquid tank and an ST four-liquid tank. The rinsing liquid tank assembly includes a first rinsing liquid tank and a second rinsing liquid tank. Rinsing water zero-discharge circulation mechanisms are arranged at the output ends of the ST three-liquid tank, the ST four-liquid tank, the first rinsing liquid tank and the second rinsing liquid tank. The waste liquid in the ST three-liquid tank, the ST four-liquid tank, the first rinsing liquid tank and the second rinsing liquid tank is discharged into the inner side of the rinsing water zero-discharge circulation mechanism and filtered.

[0010] Further, the cleaning mechanism includes a first feeding isolation section, a first cleaning assembly, a second cleaning assembly, a third cleaning assembly, a first air knife assembly, an ST first assembly, an ST first cutting assembly, an ST second assembly, an ST second cutting assembly, an ST third assembly, an ST third cutting assembly, a second feeding isolation section, an ST fourth assembly, an ST fourth cutting assembly, a first rinsing assembly, a second rinsing assembly, a second air knife assembly, a third rinsing assembly, a third air knife assembly, a first drying assembly, a second drying assembly and a discharging isolation section, which are sequentially arranged inside the machine shell from the feeding section assembly to the discharging section assembly.

[0011] Further, the cleaning liquid tank provides cleaning liquid for the cleaning mechanism. The cleaning liquid forms a closed loop between the cleaning liquid tank, the first cleaning assembly, the second cleaning assembly and the third cleaning assembly. An ST liquid tank assembly is arranged below the ST first assembly, the ST first cutting assembly, the ST second assembly, the ST second cutting assembly, the ST third assembly, the ST third cutting assembly, the second feeding isolation section, the ST fourth assembly and the ST fourth cutting assembly. The ST liquid tank assembly is composed of an ST first liquid tank, an ST second liquid tank, an ST third liquid tank and an ST fourth liquid tank. The ST first liquid tank, the ST second liquid tank, the ST third liquid tank and the ST fourth liquid tank respectively provide liquid for the ST first assembly, the ST second assembly, the ST third assembly and the ST fourth assembly. The ST first liquid tank catches the liquid flowing down from the ST first assembly and the ST first cutting assembly. The ST second liquid tank catches the liquid flowing down from the ST second assembly and the ST second cutting assembly. The ST third liquid tank catches the liquid flowing down from the ST third assembly and the ST third cutting assembly. The ST fourth liquid tank catches the liquid flowing down from the second feeding isolation section, the ST fourth assembly and the ST fourth cutting assembly.

[0012] Further, a rinsing liquid tank assembly is provided below the first rinsing assembly, the second rinsing assembly, the second air knife assembly, the third rinsing assembly, the third air knife assembly, the first drying assembly, the second drying assembly, and the board output isolation section. The rinsing liquid tank assembly is composed of a first rinsing liquid tank, a second rinsing liquid tank, and a third rinsing liquid tank. The filtered rinsing water is recycled into the ST fourth liquid tank, the first rinsing liquid tank, and the second rinsing assembly;

[0013] The first rinsing liquid tank, the second rinsing liquid tank, and the third rinsing liquid tank respectively provide corresponding liquids for the first rinsing assembly, the second rinsing assembly, and the third rinsing assembly;

[0014] The first rinsing liquid tank catches the liquid flowing down from the first rinsing assembly, the second rinsing liquid tank catches the liquid flowing down from the second rinsing assembly and the second air knife assembly, and the third rinsing liquid tank catches the liquid flowing down from the third rinsing assembly, the third air knife assembly, the first drying assembly, the second drying assembly, and the board output isolation section. The sewage collected from the ST third liquid tank, the ST fourth liquid tank, the first rinsing liquid tank, and the second rinsing liquid tank is transported into the pipeline provided at the lower end of the rinsing liquid tank assembly and then transported to the input end of the rinsing water zero-discharge recycling mechanism. The rinsing wastewater in the third rinsing liquid tank (433) can be directly discharged when needed;

[0015] An appropriate amount of rinsing water is continuously replenished into the third rinsing liquid tank. An overflow port is provided between the third rinsing liquid tank and the second rinsing liquid tank, and the excess rinsing water in the third rinsing liquid tank will overflow into the second rinsing liquid tank; an overflow port is provided between the second rinsing liquid tank and the first rinsing liquid tank, and the excess rinsing water in the second rinsing liquid tank will overflow and be filtered into the first rinsing liquid tank;

[0016] An overflow port is provided between the first rinsing liquid tank and the ST fourth liquid tank, and the excess rinsing water in the first rinsing liquid tank will overflow and be filtered into the ST fourth liquid tank. After the rinsing water overflows into the ST fourth liquid tank, it is called ST liquid.

[0017] The ST fourth liquid tank is provided with an overflow port, and the excess ST liquid in the ST fourth liquid tank will overflow and then be pumped into the ST third liquid tank by a pneumatic diaphragm pump; an overflow port is provided between the ST third liquid tank and the ST second liquid tank, and the excess ST liquid in the ST third liquid tank will overflow and be filtered into the ST second liquid tank; an overflow port is provided between the ST second liquid tank and the ST first liquid tank, and the excess ST liquid in the ST second liquid tank will overflow and be filtered into the ST first liquid tank; the ST first liquid tank is provided with an overflow port, and the excess ST liquid in the ST first liquid tank will overflow and be collected and transported into the pipeline provided at the lower end of the ST liquid tank assembly (42) and then transported into the pipeline provided at the lower end of the output end of the rinsing liquid tank assembly (43).

[0018] Further, on the pipeline provided at the lower end of the rinsing liquid tank assembly, there are ST three - liquid tank zero - discharge ball valve, ST four - liquid tank zero - discharge ball valve and first rinsing liquid tank zero - discharge ball valve. The rinsing water zero - discharge circulation mechanism includes a first zero - discharge water pump. The ST three - liquid tank zero - discharge ball valve, ST four - liquid tank zero - discharge ball valve and first rinsing liquid tank zero - discharge ball valve are connected in parallel and then connected to the inlet of the first zero - discharge water pump. At the output end of the first zero - discharge water pump, there is a first zero - discharge cotton filter. At the output end of the first zero - discharge cotton filter, there is a second zero - discharge water pump. At the output end of the second zero - discharge water pump, there is a first DTRO filter membrane;

[0019] The first DTRO filter membrane has two outlets. At the output end of the first outlet, there are arranged a first DTRO filter membrane regulating valve, a first DTRO filter membrane flowmeter and a first DTRO filter membrane selector switch in sequence;

[0020] When the first DTRO filter membrane selector switch selects the first side, the filtered and recovered liquid flows back into the ST four - liquid tank. When the first DTRO filter membrane selector switch selects the other side, the filtered and recovered liquid flows back into the first rinsing liquid tank;

[0021] The recovered liquid from the second outlet of the first DTRO filter membrane passes through a check valve and a second DTRO filter membrane flowmeter, then is connected in parallel with the pipeline behind the second DTRO filter membrane flowmeter, and then enters the first spray pipe assembly on the second rinsing component.

[0022] Further, the first rinsing liquid tank and the second rinsing liquid tank are respectively provided with a second first rinsing liquid tank zero - discharge ball valve and a second rinsing liquid tank zero - discharge ball valve. The second first rinsing liquid tank zero - discharge ball valve and the second rinsing liquid tank zero - discharge ball valve are connected in parallel and then connected to the inlet of the third zero - discharge water pump. At the output end of the third zero - discharge water pump, there is a second zero - discharge cotton filter. At the output end of the second zero - discharge cotton filter, there is a fourth zero - discharge water pump. At the output end of the fourth zero - discharge water pump, there is a second DTRO filter membrane;

[0023] The second DTRO filter membrane has two outlets. At the output end of the first outlet, there are arranged a second DTRO filter membrane regulating valve, a second DTRO filter membrane flowmeter and a second DTRO filter membrane selector switch in sequence;

[0024] When the second DTRO filter membrane selector switch selects the first side, the filtered and recovered liquid flows back into the first rinsing liquid tank. When the second DTRO filter membrane selector switch selects the other side, the filtered and recovered liquid flows back into the second rinsing liquid tank;

[0025] The recovered liquid from the second outlet of the second DTRO filter membrane passes through a check valve and a second DTRO filter membrane flowmeter, then is connected in parallel with the pipeline behind the second DTRO filter membrane flowmeter, and then enters the first spray pipe assembly on the second rinsing component.

[0026] Further, the DTRO filter membrane 1 and the DTRO filter membrane 2 have the same structure. The DTRO filter membrane 1 includes an input pipe, a filter barrel, a coarse filter membrane, a fine filter DTRO filter membrane, and an output pipe. One end of the upper side of the filter barrel is provided with the input pipe, and the input pipe is connected to the output end of the zero-discharge water pump 2. One end of the lower side of the filter barrel is provided with the output pipe, and the output end of the output pipe is divided into two paths for conveying. The coarse filter membrane and the fine filter DTRO filter membrane are both installed inside the filter barrel.

[0027] Further, the DTRO filter membrane 1 further includes an input end control valve plate, an output end control valve plate, an electric telescopic rod, and a transmission rod. The input end control valve plate and the output end control valve plate are both installed inside the filter barrel. The input end control valve plate is located between the coarse filter membrane and the output end of the input pipe, and the output end control valve plate is located between the fine filter DTRO filter membrane and the input end of the output pipe. A first tooth is fixedly arranged on the transmission rod, and a first gear is arranged on both the input end control valve plate and the output end control valve plate.

[0028] Further, the DTRO filter membrane 1 further includes a protective shell, a piston sleeve, a guide disk, a transmission column, a connecting column, a compression spring, a compression column, and a piston disk. The electric telescopic rod is installed inside the protective shell. One end of the protective shell is provided with the piston sleeve, and one end of the piston sleeve is provided with the guide disk. The output end of the guide disk is connected to the filter barrel in a communicating manner. One end of the transmission column is connected to the driving end of the electric telescopic rod, and the other end of the transmission column is provided with the connecting column. A compression spring is installed inside one end of the connecting column, one end of the compression spring is provided with the compression column, and one end of the compression column is provided with the piston disk. The piston disk is located inside the piston sleeve.

[0029] Further, a second tooth is also fixedly arranged on the transmission rod. Waste water centralized discharge pipes are installed on the filter barrel between the fine filter DTRO filter membrane and the coarse filter membrane and between the coarse filter membrane and the input end control valve plate. Both of the two waste water centralized discharge pipes penetrate through the electric telescopic rod and the transmission column. A waste water centralized discharge valve plate is installed inside the waste water centralized discharge pipe, and a second gear is installed on the waste water centralized discharge valve plate.

[0030] Compared with the prior art, the beneficial effects of the present invention are:

[0031] A cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning proposed by the present invention. The PCBA and semiconductor are conveyed by a conveying assembly and cleaned by a cleaning mechanism. The cleaning liquid is recycled among a cleaning liquid tank, a first cleaning assembly, a second cleaning assembly, and a third cleaning assembly. The rinsing liquid is sequentially conveyed to a rinsing liquid tank assembly and an ST liquid tank assembly. After the rinsing water undergoes multi-stage overflow, it is finally discharged to a designed rinsing wastewater recycling device. The rinsing wastewater is then treated by multi-stage reverse osmosis and reused repeatedly, reducing the discharge of rinsing water by more than 95%, achieving the effect of zero discharge of rinsing water in a long time. Not only does the discharge of rinsing water decrease, which will not cause serious environmental pollution, but also water resources can be effectively saved, and the water resource usage cost of enterprises can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is an overall three-dimensional structural schematic diagram of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0033] Figure 2 is an overall internal planar structural schematic diagram of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0034] Figure 3 is a schematic diagram of the principle of the rinsing water zero discharge recycling mechanism of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0035] Figure 4 is a three-dimensional structural schematic diagram of a DTRO filter membrane I of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0036] Figure 5 is a partially cut-away three-dimensional structural schematic diagram of a DTRO filter membrane I of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0037] Figure 6 is an internal structural three-dimensional structural schematic diagram of a DTRO filter membrane I of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention;

[0038] Figure 7 is based on the Figure 6 internal three-dimensional structural schematic diagram of a DTRO filter membrane I of the cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning of the present invention.

[0039] In the figure:

[0040] 01. Cabinet; 1. Infeed section assembly; 2. First infeed isolation section; 3. First cleaning assembly; 4. Second cleaning assembly; 5. Third cleaning assembly; 6. First air knife assembly; 7. First ST assembly; 8. First ST cutting assembly; 9. Second ST assembly; 10. Second ST cutting assembly; 11. Third ST assembly; 12. Third ST cutting assembly; 13. Second infeed isolation section; 14. Fourth ST assembly; 15. Fourth ST cutting assembly; 16. First rinsing assembly; 17. Second rinsing assembly; 18. Second air knife assembly; 19. Third rinsing assembly; 20. Third air knife assembly; 21. First drying assembly; 22. Second drying assembly; 23. Outfeed isolation section; 24. Outfeed section assembly;

[0041] 41. Cleaning liquid tank; 42. ST liquid tank assembly; 421. First ST liquid tank; 422. Second ST liquid tank; 423. Third ST liquid tank; 424. Fourth ST liquid tank; 43. Rinsing liquid tank assembly; 431. First rinsing liquid tank; 432. Second rinsing liquid tank; 433. Third rinsing liquid tank; 44. Conveyor assembly; 45. First spray pipe assembly; 46. Second spray pipe assembly; 47. Air blowing mechanism;

[0042] 48. Rinsing water zero-discharge recycling mechanism; 480. ST four-liquid tank zero-discharge ball valve; 481. ST four-liquid tank zero-discharge ball valve; 482. Rinsing first liquid tank zero-discharge ball valve one; 483. Zero-discharge water pump one; 484. Zero-discharge water pump one regulating valve; 485. Zero-discharge cotton filter one; 486. Zero-discharge water pump two; 487. Zero-discharge accumulator one; 488. DTRO filter membrane one; 4881. Input pipe; 4882. Filter barrel; 4883. Coarse filter membrane; 4884. Fine filter DTRO filter membrane; 4885. Output pipe; 4886. Input end control valve plate; 48861. Gear one; 4887. Output end control valve plate; 4888. Electric telescopic rod; 4889. Transmission rod; 48891. Tooth one; 48892. Tooth two; 48810. Protective shell; 48811. Piston sleeve; 48812. Flow guide plate; 48813. Transmission column; 48814. Connecting column; 48815. Extrusion spring; 48816. Extrusion column; 48817. Piston disc; 48818. Waste water centralized discharge pipe; 488181. Waste water centralized discharge valve plate; 488182. Gear two; 489. DTRO filter membrane one regulating valve; 4810. DTRO filter membrane one flowmeter one; 4811. DTRO filter membrane one selection switch; 4812. Rinsing first liquid tank zero-discharge ball valve two; 4813. Rinsing second liquid tank zero-discharge ball valve; 4814. Zero-discharge water pump three; 4815. Zero-discharge water pump three regulating valve; 4816. Zero-discharge cotton filter two; 4817. Zero-discharge water pump four; 4818. Zero-discharge accumulator two; 4819. DTRO filter membrane two; 4820. DTRO filter membrane two regulating valve; 4821. DTRO filter membrane two flowmeter one; 4822. DTRO filter membrane two selection switch; 4823. DTRO filter membrane one flowmeter two; 4824. DTRO filter membrane two flowmeter two. Detailed implementation mode

[0043] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0044] As Figure 1 - Figure 2As shown in the figure, a cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning includes a machine shell 01, an inlet plate section assembly 1 and an outlet plate section assembly 24 provided at both ends of the machine shell 01. A conveying assembly 44 is provided inside the inlet plate section assembly 1, the machine shell 01 and the outlet plate section assembly 24. A cleaning mechanism is provided inside the machine shell 01. The cleaning mechanism includes an inlet plate isolation section 1 2, a cleaning component 1 3, a cleaning component 2 4, a cleaning component 3 5, an air knife component 1 6, an ST component 1 7, an ST cutting component 1 8, an ST component 2 9, an ST cutting component 2 10, an ST component 3 11, an ST cutting component 3 12, an inlet plate isolation section 2 13, an ST component 4 14, an ST cutting component 4 15, a rinsing component 1 16, a rinsing component 2 17, an air knife component 2 18, a rinsing component 3 19, an air knife component 3 20, a drying component 1 21, a drying component 2 22 and an outlet plate isolation section 23, which are sequentially arranged inside the machine shell 01 from the inlet plate section assembly 1 to the outlet plate section assembly 24. The conveying path of the conveying assembly 44 passes through the middle of the cleaning mechanism and runs through the entire cleaning machine.

[0045] The conveying assembly 44 conveys the object to be cleaned into the cleaning machine, starts from the inlet plate section assembly 1, passes through the cleaning mechanism and outputs from the outlet plate section assembly 24, thus completing the cleaning, ST cleaning, rinsing and drying processes of the object to be cleaned.

[0046] As Figure 1 - Figure 2 As shown in the figure, a cleaning liquid tank 41 is provided below the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5 and the air knife component 1 6. The cleaning liquid tank 41 provides cleaning liquid for the cleaning component 1 3, the cleaning component 2 4 and the cleaning component 3 5. The cleaning liquid tank 41 provides cleaning liquid for the cleaning mechanism. The cleaning liquid forms a closed loop among the cleaning liquid tank 41, the cleaning component 1 3, the cleaning component 2 4 and the cleaning component 3 5. The cleaning liquid tank 41 also catches the cleaning liquid flowing down from the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5 and the air knife component 1 6 above, and conveys the contaminated cleaning liquid into the pipeline provided at the lower end of the waste liquid output end of the ST liquid tank assembly 42.

[0047] Below the ST first component 7, ST first cut component 8, ST second component 9, ST second cut component 10, ST third component 11, ST third cut component 12, the second inlet board isolation section 13, ST fourth component 14 and ST fourth cut component 15, there is an ST liquid tank assembly 42. The ST liquid tank assembly 42 consists of an ST first liquid tank 421, an ST second liquid tank 422, an ST third liquid tank 423 and an ST fourth liquid tank 424. The ST first liquid tank 421, the ST second liquid tank 422, the ST third liquid tank 423 and the ST fourth liquid tank 424 are welded into an internally independent whole. The ST first liquid tank 421, the ST second liquid tank 422, the ST third liquid tank 423 and the ST fourth liquid tank 424 respectively provide liquid for the ST first component 7, the ST second component 9, the ST third component 11 and the ST fourth component 14. The ST first liquid tank 421 also catches the liquid flowing down from the ST first component 7 and the ST first cut component 8; the ST second liquid tank 422 also catches the liquid flowing down from the ST second component 9 and the ST second cut component 10; the ST third liquid tank 423 also catches the liquid flowing down from the ST third component 11 and the ST third cut component 12. The ST fourth liquid tank 424 catches the liquid flowing down from the second inlet board isolation section 13, the ST fourth component 14 and the ST fourth cut component 15;

[0048] The contaminated liquid collected by the ST first liquid tank 421, the ST second liquid tank 422, the ST third liquid tank 423 and the ST fourth liquid tank 424 is transported into the pipeline set at the lower end of the ST liquid tank assembly 42 and then into the pipeline set at the lower end of the waste liquid output end of the rinsing liquid tank assembly 43.

[0049] The rinsing third liquid tank 433 has been replenishing an appropriate amount of rinsing water. There is an overflow port between the rinsing third liquid tank 433 and the rinsing second liquid tank (432). The excess rinsing water in the rinsing third liquid tank 433 will overflow into the rinsing second liquid tank (432); there is an overflow port between the rinsing second liquid tank (432) and the rinsing first liquid tank 431. The excess rinsing water in the rinsing second liquid tank (432) will overflow and filter into the rinsing first liquid tank 431;

[0050] There is an overflow port between the rinsing first liquid tank 431 and the ST fourth liquid tank 424. The excess rinsing water in the rinsing first liquid tank 431 will overflow and filter into the ST fourth liquid tank 424. After the rinsing water overflows into the ST fourth liquid tank 424, it is called ST liquid.

[0051] The ST fourth liquid tank 424 is provided with an overflow port. The excess ST liquid in the ST fourth liquid tank 424 will overflow and then be pumped into the ST third liquid tank 423 by a pneumatic diaphragm pump; there is an overflow port between the ST third liquid tank 423 and the ST second liquid tank 422. The excess ST liquid in the ST third liquid tank 423 will overflow and filter into the ST second liquid tank 422; there is an overflow port between the ST second liquid tank 422 and the ST first liquid tank 421. The excess ST liquid in the ST second liquid tank 422 will overflow and filter into the ST first liquid tank 421;

[0052] The ST-1 liquid tank 421 is provided with an overflow port, and the excess ST liquid in the ST-1 liquid tank 421 will overflow, collect and be transported into the pipeline arranged at the lower end of the ST liquid tank assembly 42 and then into the pipeline arranged at the lower end of the output end of the rinse liquid tank assembly 43.

[0053] There is a rinse liquid tank assembly 43 arranged below the first rinse assembly 16, the second rinse assembly 17, the second air knife assembly 18, the third rinse assembly 19, the third air knife assembly 20, the first drying assembly 21, the second drying assembly 22 and the board output isolation section 23. The rinse liquid tank assembly 43 is composed of a first rinse liquid tank 431, a second rinse liquid tank 432 and a third rinse liquid tank 433 welded into an integrally internally independent whole.

[0054] The first rinse liquid tank 431, the second rinse liquid tank 432 and the third rinse liquid tank 433 respectively provide corresponding liquids for the first rinse assembly 16, the second rinse assembly 17 and the third rinse assembly 19.

[0055] The first rinse liquid tank 431 catches the liquid flowing down from the first rinse assembly 16, the second rinse liquid tank 432 catches the liquid flowing down from the second rinse assembly 17 and the second air knife assembly 18, and the third rinse liquid tank 433 catches the liquid flowing down from the third rinse assembly 19, the third air knife assembly 20, the first drying assembly 21, the second drying assembly 22 and the board output isolation section 23. The contaminated liquid collected by the ST-3 liquid tank 423, the ST-4 liquid tank 424, the first rinse liquid tank 431 and the second rinse liquid tank 432 is transported into the pipeline arranged at the lower end of the rinse liquid tank assembly 43 and then into the input end of the rinse water zero-discharge circulation mechanism 48.

[0056] A first spray pipe assembly 45 is arranged in each of the first cleaning assembly 3, the second cleaning assembly 4, the third cleaning assembly 5, the first rinse assembly 16, the second rinse assembly 17 and the third rinse assembly 19, which is used for cleaning the PCBA and semiconductor.

[0057] A second spray pipe assembly 46 is arranged in each of the ST-1 assembly 7, the ST-2 assembly 9, the ST-3 assembly 11 and the ST-4 assembly 14, which is used for cleaning the PCBA and semiconductor.

[0058] An air blowing mechanism 47 is arranged in each of the first air knife assembly 6, the ST cut-1 assembly 8, the ST cut-2 assembly 10, the ST cut-3 assembly 12, the ST cut-4 assembly 15, the second air knife assembly 18, the third air knife assembly 20, the first drying assembly 21 and the second drying assembly 22, which is used for blowing air on the surface of the PCBA and semiconductor to blow off the cleaning water on the surface of the PCBA and semiconductor, and the air blowing mechanisms 47 of the first drying assembly 21 and the second drying assembly 22 can blow out hot air to dry the PCBA and semiconductor.

[0059] Such as Figure 1 - Figure 3As shown, a ST three - liquid tank zero - discharge ball valve 480 is provided on the pipeline at the lower end of the ST three - liquid tank 423, and the ST three - liquid tank zero - discharge ball valve 480 is in the normally open state. A ST four - liquid tank zero - discharge ball valve 481 and a first rinsing liquid tank zero - discharge ball valve 482 are provided on the pipeline at the lower end of the ST four - liquid tank 424. The ST four - liquid tank zero - discharge ball valve 481 is in the normally open state, and the first rinsing liquid tank zero - discharge ball valve 482 is in the normally closed state.

[0060] The zero - discharge recycling mechanism 48 of the rinsing water includes a first zero - discharge water pump 483. The ST three - liquid tank zero - discharge ball valve 480, the ST four - liquid tank zero - discharge ball valve 481 and the first rinsing liquid tank zero - discharge ball valve 482 are connected in parallel and then connected to the inlet of the first zero - discharge water pump 483. A first zero - discharge cotton filter 485 is provided at the output end of the first zero - discharge water pump 483. The first zero - discharge cotton filter 485 is used to preferentially filter the largest particle impurities. A second zero - discharge water pump 486 is provided at the output end of the first zero - discharge cotton filter 485. A first DTRO filter membrane 488 is provided at the output end of the second zero - discharge water pump 486. A first zero - discharge accumulator 487 is provided on the pipeline between the second zero - discharge water pump 486 and the first DTRO filter membrane 488. The function of the first zero - discharge accumulator 487 is to release the stored energy when the system needs it to ensure the stable operation of the system.

[0061] The first DTRO filter membrane 488 is provided with two outlets. The output end of the first outlet is successively provided with a first DTRO filter membrane regulating valve 489, a first DTRO filter membrane flowmeter 4810 and a first DTRO filter membrane selector switch 4811.

[0062] When the first DTRO filter membrane selector switch 4811 selects the first side, most of the well - filtered and recycled liquid flows back into the ST four - liquid tank 424. When the first DTRO filter membrane selector switch 4811 selects the other side, a small part of the well - filtered and recycled liquid flows back into the first rinsing liquid tank 431, and the liquid flowing back into the ST four - liquid tank 424 is sufficient for ST washing.

[0063] A small part of the recycled liquid from the second outlet of the first DTRO filter membrane 488 passes through a check valve and a second DTRO filter membrane flowmeter 4823, and then is connected in parallel with the pipeline behind the second DTRO filter membrane flowmeter 4824, and then enters the first spray pipe assembly 45 on the second rinsing assembly 17.

[0064] A bypass pipeline is provided after the first zero - discharge water pump 483. A first zero - discharge water pump regulating valve 484 is installed on the bypass pipeline. The bypass pipeline communicates with the pipeline before the first zero - discharge water pump 483 again after passing through the first zero - discharge water pump regulating valve 484. Its main function is to regulate the pressure and flow rate of the first zero - discharge water pump 483.

[0065] As Figure 1 - Figure 3As shown in the figure, the first rinse liquid tank 431 and the second rinse liquid tank 432 are respectively provided with a zero-discharge ball valve two 4812 for the first rinse liquid tank and a zero-discharge ball valve 4813 for the second rinse liquid tank. The zero-discharge ball valve two 4812 for the first rinse liquid tank is in the normally open state, and the zero-discharge ball valve 4813 for the second rinse liquid tank is in the normally open state. The zero-discharge ball valve two 4812 for the first rinse liquid tank and the zero-discharge ball valve 4813 for the second rinse liquid tank are connected in parallel and then connected to the inlet of the zero-discharge water pump three 4814.

[0066] A zero-discharge cotton filter two 4816 is provided at the output end of the zero-discharge water pump three 4814. A zero-discharge water pump four 4817 is provided at the output end of the zero-discharge cotton filter two 4816. A DTRO filter membrane two 4819 is provided at the output end of the zero-discharge water pump four 4817. A zero-discharge accumulator two 4818 is provided on the pipeline between the zero-discharge water pump four 4817 and the DTRO filter membrane two 4819. The function of the zero-discharge accumulator two 4818 is to release the stored energy when the system needs it to ensure the stable operation of the system.

[0067] The DTRO filter membrane two 4819 is provided with two outlets. The output end of the first outlet is successively provided with a DTRO filter membrane two regulating valve 4820, a DTRO filter membrane two flowmeter one 4821, and a DTRO filter membrane two selector switch 4822.

[0068] When the DTRO filter membrane two selector switch 4822 selects the first side, the filtered and recovered good liquid flows back into the first rinse liquid tank 431. When the DTRO filter membrane two selector switch 4822 selects the other side, the filtered and recovered good liquid flows back into the second rinse liquid tank 432.

[0069] The recovered liquid from the second outlet of the DTRO filter membrane two 4819 passes through a check valve and a DTRO filter membrane two flowmeter two 4824, and then is connected in parallel with the pipeline behind the DTRO filter membrane one flowmeter two 4823, and then enters the first spray pipe assembly 45 on the second rinse assembly 17.

[0070] A bypass pipeline is provided after the zero-discharge water pump three 4814. A zero-discharge water pump three regulating valve 4815 is installed on the bypass pipeline. After passing through the zero-discharge water pump three regulating valve 4815, the bypass pipeline communicates with the pipeline before the zero-discharge water pump three 4814 again. Its main function is to regulate the pressure and flow rate of the zero-discharge water pump three 4814.

[0071] As Figure 2 - Figure 4As shown in the figure, the DTRO filter membrane 1 (488) and the DTRO filter membrane 2 (4819) have the same mechanism. The DTRO filter membrane 1 (488) includes an input pipe (4881), a filter barrel (4882), a coarse filter membrane (4883), a fine filter DTRO filter membrane (4884), and an output pipe (4885). One end of the upper side of the filter barrel (4882) is installed with the input pipe (4881), and the input pipe (4881) is connected to the output end of the zero-discharge water pump 2 (486). One end of the lower side of the filter barrel (4882) is installed with the output pipe (4885), and the output end of the output pipe (4885) is divided into two paths for transportation. The coarse filter membrane (4883) and the fine filter DTRO filter membrane (4884) are both installed inside the filter barrel (4882). The rinsing water enters from the input pipe (4881), filters large particles of impurities through the coarse filter membrane (4883), then filters fine impurities through the fine filter DTRO filter membrane (4884), and finally the filtered water is discharged from the output pipe (4885).

[0072] As Figure 4 - Figure 7 shown in the figure, the DTRO filter membrane 1 (488) further includes an input end control valve plate (4886), an output end control valve plate (4887), an electric telescopic rod (4888), and a transmission rod (4889). The input end control valve plate (4886) and the output end control valve plate (4887) are both installed inside the filter barrel (4882). The input end control valve plate (4886) is located between the coarse filter membrane (4883) and the output end of the input pipe (4881), and the output end control valve plate (4887) is located between the fine filter DTRO filter membrane (4884) and the input end of the output pipe (4885). When the electric telescopic rod (4888) is activated, it can drive the transmission rod (4889) to move. As the transmission rod (4889) moves, it can drive the input end control valve plate (4886) and the output end control valve plate (4887) to close simultaneously, making the space where the coarse filter membrane (4883) and the fine filter DTRO filter membrane (4884) are located airtight.

[0073] Furthermore, a first tooth (48891) is fixedly arranged on the transmission rod (4889), and a first gear (48861) is arranged on both the input end control valve plate (4886) and the output end control valve plate (4887). The movement of the transmission rod (4889) drives the first tooth (48891) to move, thereby driving the first gear (48861) to rotate 90°, realizing the rotational closing of the input end control valve plate (4886) and the output end control valve plate (4887). In the filtering state, both the input end control valve plate (4886) and the output end control valve plate (4887) are in the open state.

[0074] The DTRO filter membrane 488 further includes a protective case 48810, a piston sleeve 48811, a diversion disk 48812, a transmission column 48813, a connection column 48814, a compression spring 48815, a compression column 48816, and a piston disk 48817. The electric telescopic rod 4888 is installed inside the protective case 48810. One end of the protective case 48810 is provided with a piston sleeve 48811. One end of the piston sleeve 48811 is provided with a diversion disk 48812. The output end of the diversion disk 48812 is connected and communicated with the filter barrel 4882. One end of the transmission column 48813 is connected to the driving end of the electric telescopic rod 4888. The other end of the transmission column 48813 is provided with a connection column 48814. Inside the inner side of one end of the connection column 48814 is installed a compression spring 48815. One end of the compression spring 48815 is provided with a compression column 48816. One end of the compression column 48816 is provided with a piston disk 48817. The piston disk 48817 is located inside the piston sleeve 48811.

[0075] On the transmission rod 4889, there is also fixedly provided a second tooth 48892. On the filter barrel 4882 located between the fine filter DTRO filter membrane 4884 and the coarse filter membrane 4883 and between the coarse filter membrane 4883 and the input end control valve plate 4886, waste water centralized discharge pipes 48818 are installed. Both of the two waste water centralized discharge pipes 48818 penetrate through the electric telescopic rod 4888 and the transmission column 48813. And a chute is opened in the middle of the transmission column 48813 to facilitate the movement of the transmission column 48813 without impacting the waste water centralized discharge pipe 48818. Inside the waste water centralized discharge pipe 48818, a waste water centralized discharge valve plate 488181 is installed. On the waste water centralized discharge valve plate 488181, a second gear 488182 is installed.

[0076] Specifically, when the electric telescopic rod 4888 is activated to cause the input end control valve plate 4886 and the output end control valve plate 4887 to rotate and close, the transmission column 48813 drives the connecting column 48814, so that the extrusion column 48816 drives the piston disc 48817 to extrude the liquid inside the piston sleeve 48811. As a result, the liquid in the filter barrel 4882 flows from the fine filter DTRO filter membrane 4884 towards the coarse filter membrane 4883. Since the input end control valve plate 4886 and the output end control valve plate 4887 are preferably closed, and at this time, the second tooth 48892 has not yet engaged with the second gear 488182, the resistance of the liquid extruded when the piston disc 48817 slides in the piston sleeve 48811 increases. As a result, the extrusion spring 48815 is extruded in the reverse direction, and the extrusion spring 48815 starts to store energy. Before the extrusion spring 48815 is extruded to the maximum extent, the second tooth 48892 engages with the second gear 488182, and then the waste water centralized discharge valve plate 488181 is opened. At this time, under the reset of the extrusion spring 48815 and the continuous push of the electric telescopic rod 4888, the piston disc 48817 moves quickly. As a result, the liquid in the filter barrel 4882 quickly impacts the fine filter DTRO filter membrane 4884 and the coarse filter membrane 4883 in the reverse direction, performing an anti-blocking treatment on the fine filter DTRO filter membrane 4884 and the coarse filter membrane 4883. At the same time, the impurities flushed out quickly drain from the waste water centralized discharge pipe 48818. While achieving maximum zero discharge, the replacement of the fine filter DTRO filter membrane 4884 and the coarse filter membrane 4883 is greatly reduced. While reducing the complexity of manual operation and the cost of manual maintenance, the number of shutdowns due to filter replacement is reduced, further improving work efficiency.

[0077] It should be noted that in the description of the present application, it should be understood that the orientation or positional relationship indicated by terms such as "length", "thickness", "inner", "outer", "axial", "radial", etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention.

[0078] In addition, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device.

[0079] The above are only the preferred specific embodiments of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, making equivalent substitutions or changes, shall be covered by the protection scope of the present invention.

Claims

1. A cleaning machine for zero discharge of rinsing water used in PCBA and semiconductor cleaning, characterized in that, It includes a casing (01), a feed plate section assembly (1) and a discharge plate section assembly (24) provided at both ends of the casing (01). A conveying assembly (44) is provided inside the feed plate section assembly (1), the casing (01) and the discharge plate section assembly (24). A cleaning mechanism is provided inside the casing (01). The conveying path of the conveying assembly (44) passes through the middle of the cleaning mechanism. A cleaning liquid tank (41), an ST liquid tank assembly (42) and a rinsing liquid tank assembly (43) are installed at the lower end of the cleaning mechanism. A rinsing liquid is conveyed in the rinsing liquid tank assembly (43). The rinsing liquid in the rinsing liquid tank assembly (43) overflows and flows into the ST liquid tank assembly (42) to form ST liquid. The ST liquid tank assembly (42) includes an ST three-liquid tank (423) and an ST four-liquid tank (424). The rinsing liquid tank assembly (43) includes a first rinsing liquid tank (431) and a second rinsing liquid tank (432). Rinsing water zero-discharge recycling mechanisms (48) are provided at the output ends of the ST three-liquid tank (423), the ST four-liquid tank (424), the first rinsing liquid tank (431) and the second rinsing liquid tank (432). The waste liquid in the ST three-liquid tank (423), the ST four-liquid tank (424), the first rinsing liquid tank (431) and the second rinsing liquid tank (432) is discharged into the inner side of the rinsing water zero-discharge recycling mechanism (48) and filtered; The DTRO filter membrane one (488) includes a filter barrel (4882). A coarse filter membrane (4883) and a fine filter DTRO filter membrane (4884) are provided inside the filter barrel (4882). An input end control valve plate (4886) and an output end control valve plate (4887) are also provided inside the filter barrel (4882); The DTRO filter membrane one (488) further includes an electric telescopic rod (4888). A transmission column (48813) is provided at the driving end of the electric telescopic rod (4888). A connecting column (48814) is installed at the other end of the transmission column (48813). A compression spring (48815) is installed inside one end of the connecting column (48814). A compression column (48816) is installed at one end of the compression spring (48815). A piston disc (48817) is installed at one end of the compression column (48816). The piston disc (48817) is located inside a piston sleeve (48811) provided at the lower end of the piston disc (48817); Waste water centralized discharge pipes (48818) are installed on the filter barrel (4882) between the fine filter DTRO filter membrane (4884) and the coarse filter membrane (4883) and between the coarse filter membrane (4883) and the input end control valve plate (4886); The electric telescopic rod (4888) starts to drive the input end control valve plate (4886) and the output end control valve plate (4887) to close, sealing the space where the fine filter DTRO filter membrane (4884) and the coarse filter membrane (4883) are located. At the same time, it pushes the extrusion spring (48815) to drive the piston disk (48817) to extrude the liquid in the sealed space. At this time, the extrusion spring (48815) is compressed under the reaction force. Before the extrusion spring (48815) is squeezed to the maximum extent, the waste water concentrated discharge pipe (48818) opens, and the pressure in the closed space is released instantly. Under the combined thrust of the extrusion spring (48815) and the electric telescopic rod (4888), the liquid quickly backwashes the fine filter DTRO filter membrane (4884) and the coarse filter membrane (4883).

2. The cleaning machine for zero discharge of rinsing water used for PCBA and semiconductor cleaning according to claim 1, characterized in that, The cleaning mechanism includes an inlet plate isolation section 1 (2), a cleaning component 1 (3), a cleaning component 2 (4), a cleaning component 3 (5), an air knife component 1 (6), an ST component 1 (7), an ST cutting component 1 (8), an ST component 2 (9), an ST cutting component 2 (10), an ST component 3 (11), an ST cutting component 3 (12), an inlet plate isolation section 2 (13), an ST component 4 (14), an ST cutting component 4 (15), a rinsing component 1 (16), a rinsing component 2 (17), an air knife component 2 (18), a rinsing component 3 (19), an air knife component 3 (20), a drying component 1 (21), a drying component 2 (22), and an outlet plate isolation section (23) that are sequentially arranged from the inlet plate section component (1) to the outlet plate section component (24) inside the machine shell (01).

3. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 2, wherein, The cleaning liquid tank (41) provides cleaning liquid for the cleaning mechanism. The cleaning liquid forms a closed cycle among the cleaning liquid tank (41), the cleaning component 1 (3), the cleaning component 2 (4), and the cleaning component 3 (5). Below the ST component 1 (7), the ST cutting component 1 (8), the ST component 2 (9), the ST cutting component 2 (10), the ST component 3 (11), the ST cutting component 3 (12), the inlet plate isolation section 2 (13), the ST component 4 (14), and the ST cutting component 4 (15), there is an ST liquid tank assembly (42). The ST liquid tank assembly (42) is composed of an ST liquid tank 1 (421), an ST liquid tank 2 (422), an ST liquid tank 3 (423), and an ST liquid tank 4 (424). The ST liquid tank 1 (421), the ST liquid tank 2 (422), the ST liquid tank 3 (423), and the ST liquid tank 4 (424) respectively provide liquid for the ST component 1 (7), the ST component 2 (9), the ST component 3 (11), and the ST component 4 (14). The ST liquid tank 1 (421) catches the liquid flowing down from the ST component 1 (7) and the ST cutting component 1 (8). The ST liquid tank 2 (422) catches the liquid flowing down from the ST component 2 (9) and the ST cutting component 2 (10). The ST liquid tank 3 (423) catches the liquid flowing down from the ST component 3 (11) and the ST cutting component 3 (12). The ST liquid tank 4 (424) catches the liquid flowing down from the inlet plate isolation section 2 (13), the ST component 4 (14), and the ST cutting component 4 (15).

4. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 3, characterized in that, Below the first rinsing component (16), the second rinsing component (17), the second air knife component (18), the third rinsing component (19), the third air knife component (20), the first drying component (21), the second drying component (22) and the board output isolation section (23), there is a rinsing liquid tank assembly (43). The rinsing liquid tank assembly (43) consists of a first rinsing liquid tank (431), a second rinsing liquid tank (432) and a third rinsing liquid tank (433). The rinsing water filtered by the first rinsing liquid tank (431) and the second rinsing liquid tank (432) is recycled to the ST fourth liquid tank (424), the first rinsing liquid tank (431) and the interior of the second rinsing component (17). The rinsing wastewater in the third rinsing liquid tank (433) is directly discharged. The first rinsing liquid tank (431), the second rinsing liquid tank (432) and the third rinsing liquid tank (433) respectively provide corresponding liquids for the first rinsing component (16), the second rinsing component (17) and the third rinsing component (19). The first rinsing liquid tank (431) catches the liquid flowing down from the first rinsing component (16). The second rinsing liquid tank (432) catches the liquid flowing down from the second rinsing component (17) and the second air knife component (18). The third rinsing liquid tank (433) catches the liquid flowing down from the third rinsing component (19), the third air knife component (20), the first drying component (21), the second drying component (22) and the board output isolation section (23). The sewage collected by the ST third liquid tank (423), the ST fourth liquid tank (424), the first rinsing liquid tank (431) and the second rinsing liquid tank (432) is transported into the pipeline provided at the lower end of the rinsing liquid tank assembly (43) and then transported to the input end of the rinsing water zero - discharge recycling mechanism (48). An appropriate amount of rinsing water is continuously supplemented to the third rinsing liquid tank (433). An overflow port is provided between the third rinsing liquid tank (433) and the second rinsing liquid tank (432). The excess rinsing water in the third rinsing liquid tank (433) will overflow into the second rinsing liquid tank (432). An overflow port is provided between the second rinsing liquid tank (432) and the first rinsing liquid tank (431). The excess rinsing water in the second rinsing liquid tank (432) will overflow and be filtered into the first rinsing liquid tank (431). An overflow port is provided between the first rinsing liquid tank (431) and the ST fourth liquid tank (424). The excess rinsing water in the first rinsing liquid tank (431) will overflow and be filtered into the ST fourth liquid tank (424). The ST fourth liquid tank (424) is provided with an overflow port. The excess ST liquid in the ST fourth liquid tank (424) will overflow and then be pumped into the ST third liquid tank (423) by a pneumatic diaphragm pump. An overflow port is provided between the ST third liquid tank (423) and the ST second liquid tank (422). The excess ST liquid in the ST third liquid tank (423) will overflow and be filtered into the ST second liquid tank (422). An overflow port is provided between the ST second liquid tank (422) and the ST first liquid tank (421). The excess ST liquid in the ST second liquid tank (422) will overflow and be filtered into the ST first liquid tank (421). The ST-1 liquid tank (421) is provided with an overflow port. The excess ST liquid in the ST-1 liquid tank (421) will overflow and be collected and transported into the pipeline provided at the lower end of the ST liquid tank assembly (42) and then into the pipeline provided at the lower end of the output end of the rinsing liquid tank assembly (43).

5. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 4, wherein The pipeline provided at the lower end of the rinsing liquid tank assembly (43) is provided with an ST-3 liquid tank zero-discharge ball valve (480), an ST-4 liquid tank zero-discharge ball valve (481), and a first rinsing-1 liquid tank zero-discharge ball valve (482). The rinsing water zero-discharge recycling mechanism (48) includes a first zero-discharge water pump (483). The ST-3 liquid tank zero-discharge ball valve (480), the ST-4 liquid tank zero-discharge ball valve (481), and the first rinsing-1 liquid tank zero-discharge ball valve (482) are connected in parallel and then connected to the inlet of the first zero-discharge water pump (483). A first zero-discharge cotton filter (485) is provided at the output end of the first zero-discharge water pump (483). A second zero-discharge water pump (486) is provided at the output end of the first zero-discharge cotton filter (485). A first DTRO filter membrane (488) is provided at the output end of the second zero-discharge water pump (486); The first DTRO filter membrane (488) is provided with two outlets. The output end of the first outlet is successively provided with a first DTRO filter membrane regulating valve (489), a first DTRO filter membrane flowmeter (4810), and a first DTRO filter membrane selector switch (4811); When the first DTRO filter membrane selector switch (4811) is selected on the first side, the filtered and recycled good liquid flows back into the ST-4 liquid tank (424). When the first DTRO filter membrane selector switch (4811) is selected on the other side, the filtered and recycled good liquid flows back into the first rinsing liquid tank (431); The recycled liquid from the second outlet of the first DTRO filter membrane (488) passes through a check valve and a second DTRO filter membrane flowmeter (4823), and then is connected in parallel with the pipeline behind the second DTRO filter membrane flowmeter (4824), and then enters the first spray pipe assembly (45) on the second rinsing assembly (17).

6. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 1, wherein, The first rinsing liquid tank (431) and the second rinsing liquid tank (432) are respectively provided with a second rinsing-1 liquid tank zero-discharge ball valve (4812) and a second rinsing-2 liquid tank zero-discharge ball valve (4813). The second rinsing-1 liquid tank zero-discharge ball valve (4812) and the second rinsing-2 liquid tank zero-discharge ball valve (4813) are connected in parallel and then connected to the inlet of the third zero-discharge water pump (4814). A second zero-discharge cotton filter (4816) is provided at the output end of the third zero-discharge water pump (4814). A fourth zero-discharge water pump (4817) is provided at the output end of the second zero-discharge cotton filter (4816). A second DTRO filter membrane (4819) is provided at the output end of the fourth zero-discharge water pump (4817); The second DTRO filter membrane (4819) is provided with two outlets. The output end of the first outlet is successively provided with a second DTRO filter membrane regulating valve (4820), a second DTRO filter membrane flowmeter (4821), and a second DTRO filter membrane selector switch (4822); When the DTRO filter membrane two selection switch (4822) selects the first side, the filtered and recycled good liquid flows back to the first rinsing liquid tank (431). When the DTRO filter membrane two selection switch (4822) selects the other side, the filtered and recycled good liquid flows back to the second rinsing liquid tank (432). The recycled liquid from the second outlet of the DTRO filter membrane two (4819) passes through a check valve and the DTRO filter membrane two flowmeter two (4824), then is in parallel with the pipeline behind the DTRO filter membrane one flowmeter two (4823), and then enters the spray pipe assembly one (45) on the second rinsing assembly (17).

7. A cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 5 or 6, characterized in that, The DTRO filter membrane one (488) and the DTRO filter membrane two (4819) have the same mechanism. The DTRO filter membrane one (488) includes an input pipe (4881), a filter barrel (4882), a coarse filter membrane (4883), a fine filter DTRO filter membrane (4884), and an output pipe (4885). One end of the upper side of the filter barrel (4882) is installed with the input pipe (4881), and the input pipe (4881) is connected to the output end of the zero-discharge water pump two (486). One end of the lower side of the filter barrel (4882) is installed with the output pipe (4885), and the output end of the output pipe (4885) is divided into two paths for transportation.

8. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 7, wherein, The DTRO filter membrane one (488) further includes an input end control valve plate (4886), an output end control valve plate (4887), an electric telescopic rod (4888), and a transmission rod (4889). The input end control valve plate (4886) is located between the coarse filter membrane (4883) and the output end of the input pipe (4881). The output end control valve plate (4887) is located between the fine filter DTRO filter membrane (4884) and the input end of the output pipe (4885). A tooth one (48891) is fixedly arranged on the transmission rod (4889), and a gear one (48861) is arranged on both the input end control valve plate (4886) and the output end control valve plate (4887).

9. The cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 8, wherein, The DTRO filter membrane one (488) further includes a protective shell (48810), a piston sleeve (48811), a diversion disk (48812), a transmission column (48813), a connecting column (48814), a compression spring (48815), a compression column (48816), and a piston disk (48817). The electric telescopic rod (4888) is installed inside the protective shell (48810). One end of the protective shell (48810) is installed with the piston sleeve (48811). One end of the piston sleeve (48811) is installed with the diversion disk (48812). The output end of the diversion disk (48812) is connected and communicated with the filter barrel (4882). One end of the transmission column (48813) is connected to the driving end of the electric telescopic rod (4888).

10. A cleaning machine for zero discharge of rinsing water for PCBA and semiconductor cleaning according to claim 8, characterized in that, A second set of teeth (48892) is also fixedly provided on the transmission rod (4889). Both of the waste water centralized discharge pipes (48818) penetrate through the electric telescopic rod (4888) and the transmission column (48813). A waste water centralized discharge valve plate (488181) is installed inside the waste water centralized discharge pipe (48818), and a second gear (488182) is installed on the waste water centralized discharge valve plate (488181).

Images