Substrate processing apparatus

Abstract

The purpose of the present invention is to provide a substrate processing apparatus capable of appropriately discharging gas of a processing case. A substrate processing apparatus (1) is provided with a processing case (23A1), a holding unit (31), and a liquid supply unit (33). The holding part (31) is housed in the processing housing (23A1). The holding section (31) holds the substrate (W). The liquid supply unit (33) is housed in the processing case (23A1). The liquid supply unit (33) supplies a processing liquid to the substrate (W) held by the holding unit (31). A substrate processing apparatus (1) is provided with exhaust pipes (41A, 42A). The exhaust pipes (41A) and (42A) are respectively arranged on the sides of the processing housing (23A1). The exhaust pipes (41A) and (42A) discharge gas, respectively. The substrate processing apparatus (1) is provided with a switching mechanism (51A1). The switching mechanism (51Al) is disposed at the same height position as the processing housing (23A1). The switching mechanism (51Al) switches the exhaust passage of the processing housing (23A1) to one of the exhaust pipes (41A) and (42A).

Description

[0001] Information about divisional applications

[0002] This case is a divisional application. The parent case of the divisional application is an invention patent application with an application date of February 26, 2021, application number 202110220015.9, and invention name “Substrate Processing Device”. Technical Field

[0003] The present invention relates to a substrate processing device for processing a substrate. The substrate is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for an organic EL (Electroluminescence), a substrate for an FPD (Flat Panel Display), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, a substrate for a photomask, or a substrate for a solar cell. Background Art

[0004] Japanese Patent Publication No. 2019-16818 discloses a substrate processing system. In the following, the symbols recorded in Japanese Patent Publication No. 2019-16818 are marked in brackets. The substrate processing system 1 includes a processing unit 16 for processing a wafer W. The processing unit 16 includes a chamber 20, a substrate holding mechanism 30 and a processing fluid supply unit 40. The chamber 20 is a processing shell. The substrate holding mechanism 30 and the processing fluid supply unit 40 are arranged inside the chamber 20. The substrate holding mechanism 30 holds the wafer W. The processing fluid supply unit 40 supplies a processing fluid to the wafer W held by the substrate holding mechanism 30. The processing fluid is, for example, an alkaline processing liquid, an acidic processing liquid, and an organic processing liquid.

[0005] The substrate processing system 1 includes a second exhaust pipe 200, an exhaust switching unit 300, and three individual exhaust pipes 101, 102, and 103. The second exhaust pipe 200 connects the chamber 20 to the exhaust switching unit 300. The second exhaust pipe 200 includes a horizontal portion 201 and an ascending portion 202. The horizontal portion 201 is connected to the chamber 20. The horizontal portion 201 extends horizontally from the chamber 20. The ascending portion 202 extends upward from the horizontal portion 201. The ascending portion 202 has an upper end. The upper end of the ascending portion 202 is connected to the exhaust switching unit 300. The exhaust switching unit 300 is further connected to the three individual exhaust pipes 101, 102, and 103. The exhaust switching unit 300 connects the second exhaust pipe 200 to one of the three individual exhaust pipes 101, 102, and 103. The gas in the chamber 20 flows into one of the three individual exhaust pipes 101 , 102 , and 103 via the second exhaust pipe 200 .

[0006] For example, when the processing fluid supply unit 40 supplies an alkaline processing liquid, the exhaust switching unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 101. When the processing fluid supply unit 40 supplies an acidic processing liquid, the exhaust switching unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 102. When the processing fluid supply unit 40 supplies an organic processing liquid, the exhaust switching unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 103. As a result, when an alkaline processing liquid is used in the chamber 20, the individual exhaust pipe 101 exhausts the gas of the chamber 20. When an acidic processing liquid is used in the chamber 20, the individual exhaust pipe 102 exhausts the gas of the chamber 20. When an organic processing liquid is used in the chamber 20, the individual exhaust pipe 103 exhausts the gas of the chamber 20.

[0007] The exhaust switching unit 300 is arranged at a position higher than the processing unit 16. The rising portion 202 of the second exhaust pipe 200 extends to a position higher than the processing unit 16. Therefore, the mist contained in the gas is not easy to rise along the rising portion 202. The mist is not easy to rise to the exhaust switching unit 300. Therefore, the exhaust switching unit 300 can be protected from damage by the mist.

[0008] As described above, the exhaust switching unit 300 is arranged at a position higher than the processing unit 16. Therefore, the individual exhaust pipes 101, 102, 103 are also arranged at a position higher than the processing unit 16. Summary of the invention

[0009] [Problems to be solved by the invention]

[0010] However, the coating and developing device 1 shown in Japanese Patent Laid-Open No. 2019-16818 has the following problem. The chamber 20 and the exhaust switching unit 300 are connected through the second exhaust pipe 200. The exhaust switching unit 300 is arranged at a higher position than the processing unit 16, so the second exhaust pipe 200 has a rising portion 202. Therefore, the second exhaust pipe 200 is relatively long.

[0011] The gas in the chamber 20 always flows through the second exhaust pipe 200. For example, the second exhaust pipe 200 exhausts the gas in the chamber 20 regardless of whether an alkaline treatment liquid, an acidic treatment liquid, or an organic treatment liquid is used in the chamber 20.

[0012] As described above, the second exhaust pipe 200 is relatively long and exhausts various gases, so the second exhaust pipe 200 is easily contaminated. For example, crystals (salts) are easily generated inside the second exhaust pipe 200. For example, crystals are easily accumulated inside the second exhaust pipe 200.

[0013] If the second exhaust pipe 200 is contaminated, the gas cannot flow smoothly along the second exhaust pipe 200. That is, the second exhaust pipe 200 cannot smoothly exhaust the gas in the chamber 20. Therefore, it is necessary to regularly perform maintenance on the second exhaust pipe 200. The maintenance of the second exhaust pipe 200 includes, for example, cleaning the second exhaust pipe 200 or replacing the second exhaust pipe 200.

[0014] When the second exhaust duct 200 is maintained, the processing unit 16 cannot process the wafer W. When the second exhaust duct 200 is maintained, the substrate processing system 1 stops processing the wafer W. Therefore, the throughput of the substrate processing system 1 decreases.

[0015] The present invention has been made in view of the above situation, and an object of the present invention is to provide a substrate processing apparatus capable of appropriately exhausting gas from a processing housing.

[0016] [Technical means to solve the problem]

[0017] In order to achieve this object, the present invention adopts the following structure. That is, the present invention is a substrate processing device, which comprises: a first processing shell; a first holding part, which is arranged inside the first processing shell and holds the substrate; a first liquid supply part, which is arranged inside the first processing shell and supplies processing liquid to the substrate held by the first holding part; a first exhaust pipe, which is arranged on the side of the first processing shell and exhausts gas; a second exhaust pipe, which is arranged on the side of the first processing shell and exhausts gas; and a first switching mechanism, which is arranged at the same height as the first processing shell and switches the exhaust passage of the first processing shell to one of the first exhaust pipe and the second exhaust pipe.

[0018] The substrate processing apparatus includes a first processing housing, a first holding unit, and a first liquid supply unit. The substrate processing apparatus supplies processing liquid to a substrate in the first processing housing. That is, the substrate processing apparatus performs liquid processing on a substrate in the first processing housing.

[0019] The substrate processing apparatus includes a first exhaust pipe, a second exhaust pipe, and a first switching mechanism. The first switching mechanism switches the exhaust passage of the first processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the first switching mechanism switches to the following two states, one state is to connect the first processing housing to the first exhaust pipe and block the first processing housing from the second exhaust pipe, and the other state is to connect the first processing housing to the second exhaust pipe and block the first processing housing from the first exhaust pipe. When the exhaust passage of the first processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the first processing housing, and the second exhaust pipe does not exhaust gas from the first processing housing. When the exhaust passage of the first processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the first processing housing, and the second exhaust pipe does not exhaust gas from the first processing housing.

[0020] The first switching mechanism is arranged at the same height position as the first processing housing. Therefore, the flow path between the first processing housing and the first switching mechanism can be appropriately shortened. Therefore, contamination of the flow path between the first processing housing and the first switching mechanism can be appropriately suppressed. Thus, the gas flows smoothly from the first processing housing to the first switching mechanism. As a result, the gas of the first processing housing can be appropriately discharged.

[0021] The first exhaust pipe is arranged at the side of the first processing housing. Therefore, the first switching mechanism can be easily connected to the first exhaust pipe. The second exhaust pipe is arranged at the side of the first processing housing. Therefore, the first switching mechanism can be easily connected to the second exhaust pipe.

[0022] As described above, the substrate processing apparatus can appropriately exhaust the gas in the first processing housing.

[0023] In the substrate processing apparatus, the first switching mechanism is preferably arranged at a position equal to or lower than the upper end of the first holding portion. The first switching mechanism is relatively small in size. Therefore, the size of the substrate processing apparatus can be appropriately suppressed.

[0024] In the substrate processing apparatus, the first switching mechanism is preferably arranged at a position not overlapping with the first holding portion in a plan view, so that interference between the first switching mechanism and the first holding portion can be easily avoided.

[0025] In the substrate processing apparatus, preferably, the first exhaust pipe extends in a vertical direction, and the second exhaust pipe extends in a vertical direction, so that the installation space of the first exhaust pipe and the second exhaust pipe in a plan view can be appropriately reduced.

[0026] In the substrate processing apparatus, it is preferred that the substrate processing apparatus comprises: a transport space extending in a horizontal first direction and adjacent to the first processing housing; a transport mechanism disposed in the transport space and transporting the substrate to the first holding portion; a first piping space adjacent to the first processing housing and accommodating the first exhaust pipe and the second exhaust pipe; and the first processing housing and the first piping space are arranged in the first direction, and the first exhaust pipe and the second exhaust pipe are arranged in a second direction perpendicular to the first direction and horizontal. The substrate processing apparatus comprises a transport space and a transport mechanism. The transport space is adjacent to the first processing housing. Therefore, the transport mechanism can easily transport the substrate to the first holding portion. The substrate processing apparatus comprises a first piping space. Therefore, the first exhaust pipe and the second exhaust pipe can be appropriately arranged. The first piping space is adjacent to the first processing housing. Therefore, the first exhaust pipe and the second exhaust pipe can be arranged near the first processing housing. The transport space extends in the first direction. The first processing housing and the first piping space are arranged in the first direction. Therefore, the conveying space adjacent to the first processing housing and the first piping space adjacent to the first processing housing can be appropriately configured respectively. Therefore, the interference between the conveying mechanism and the first exhaust pipe and the second exhaust pipe can be appropriately prevented. The first piping space and the first processing housing are arranged in the first direction. The first exhaust pipe and the second exhaust pipe are arranged in the second direction. Therefore, the first exhaust pipe and the second exhaust pipe can be respectively arranged near the first processing housing.

[0027] In the substrate processing apparatus, preferably, at least a portion of the first switching mechanism is disposed in the first piping space. The first switching mechanism may be disposed near the first processing housing.

[0028] In the substrate processing apparatus, the first switching mechanism preferably includes: a first opening and closing portion that can be moved to a position where the first processing housing is connected to the first exhaust pipe and a position where the first processing housing is blocked from the first exhaust pipe; and a second opening and closing portion that is independent of the first opening and closing portion and can be moved to a position where the first processing housing is connected to the second exhaust pipe and a position where the first processing housing is blocked from the second exhaust pipe. The first opening and closing portion and the second opening and closing portion can move independently of each other. Therefore, the first switching mechanism can connect the first exhaust pipe and the second exhaust pipe to the first processing housing individually. The switching mechanism can block the first exhaust pipe and the second exhaust pipe from the first processing housing individually.

[0029] In the substrate processing apparatus, the first switching mechanism preferably includes a switching housing connected to the first processing housing and accommodating the first opening and closing portion and the second opening and closing portion. The switching housing can appropriately form a flow path from the first processing housing to the first opening and closing portion and the second opening and closing portion.

[0030] In the substrate processing apparatus, the switch housing preferably includes: an introduction portion connected to the first processing housing and extending in the first direction; and a distribution portion connected to the introduction portion, extending in the second direction, connected to both the first exhaust pipe and the second exhaust pipe, and accommodating both the first opening and closing portion and the second opening and closing portion. The introduction portion is connected to the first processing housing. Therefore, the gas can be easily introduced from the first processing housing to the switch housing. The introduction portion extends in the first direction. As described above, the transport space extends in the first direction. Therefore, the transport space adjacent to the first processing housing and the introduction portion connected to the first processing housing can be appropriately configured respectively. Therefore, interference between the transport mechanism and the introduction portion can be appropriately prevented. The distribution portion is connected to the introduction portion. The distribution portion is connected to the first exhaust pipe and the second exhaust pipe. Therefore, the gas can be easily discharged from the switch housing to the first exhaust pipe and the second exhaust pipe. The distribution portion accommodates both the first opening and closing portion and the second opening and closing portion. Therefore, the first switching mechanism can easily switch the exhaust passage of the first processing housing between the first exhaust pipe and the second exhaust pipe. The distribution unit extends in the second direction. As described above, the first exhaust pipe and the second exhaust pipe are arranged in the second direction. Therefore, the distribution unit can be easily connected to the first exhaust pipe and the second exhaust pipe.

[0031] In the substrate processing device, preferably, in a plan view, the distance between the introduction part and the transfer space is smaller than the distance between the first holding part and the transfer space. The introduction part is arranged at a position relatively close to the transfer space. Therefore, the gas can be smoothly introduced from the first processing shell into the switching shell.

[0032] In the substrate processing device, it is preferred that the substrate processing device comprises: a gas supply pipe for supplying gas to the first processing shell; and a second pipe space adjacent to the first processing shell for accommodating the gas supply pipe; and the first pipe space, the first processing shell and the second pipe space are arranged in sequence in the first direction. The substrate processing device comprises a gas supply pipe and a second pipe space. The second pipe space is adjacent to the first processing shell. Therefore, the gas supply pipe can easily supply gas to the first processing shell. The first pipe space, the first processing shell and the second pipe space are arranged in sequence in the first direction. Therefore, the first pipe space and the second pipe space are separated by the first processing shell. Therefore, the configuration of the first exhaust pipe and the second exhaust pipe is not restricted by the gas supply pipe. That is, the configuration freedom of the first exhaust pipe and the second exhaust pipe can be appropriately improved.

[0033] In the substrate processing device, preferably, the substrate processing device comprises: the second processing shell, which is arranged below the first processing shell; the second holding part, which is arranged inside the second processing shell and holds the substrate; the second liquid supply part, which is arranged inside the second processing shell and supplies processing liquid to the substrate held by the second holding part; and a second switching mechanism, which is arranged at the same height as the second processing shell and switches the exhaust passage of the second processing shell to one of the first exhaust pipe and the second exhaust pipe.

[0034] The substrate processing apparatus includes a second processing housing, a second holding unit, and a second liquid supply unit. Therefore, the substrate can be liquid processed inside the second processing housing. Therefore, the productivity of the substrate processing apparatus can be suitably improved.

[0035] The second processing housing is disposed below the first processing housing. Therefore, it is possible to preferably suppress an increase in the footprint of the substrate processing apparatus.

[0036] The substrate processing device is provided with a second switching mechanism. The second switching mechanism switches the exhaust passage of the second processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the second switching mechanism switches to the following two states, one state is to connect the second processing housing to the first exhaust pipe and block the second processing housing from the second exhaust pipe, and the other state is to connect the second processing housing to the second exhaust pipe and block the second processing housing from the first exhaust pipe. When the exhaust passage of the second processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the second processing housing, and the second exhaust pipe does not exhaust gas from the second processing housing. When the exhaust passage of the second processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the second processing housing, and the first exhaust pipe does not exhaust gas from the second processing housing. Therefore, in addition to exhausting the gas of the first processing housing, the first exhaust pipe also exhausts the gas of the second processing housing. In addition to exhausting the gas of the first processing housing, the second exhaust pipe also exhausts the gas of the second processing housing. Therefore, the structure of the substrate processing device can be simplified.

[0037] The second switching mechanism is arranged at the same height position as the second processing housing. Therefore, the flow path between the second processing housing and the second switching mechanism can be appropriately shortened. Therefore, the flow path between the second processing housing and the second switching mechanism can be appropriately suppressed from being contaminated. Thus, the gas flows smoothly from the second processing housing to the second switching mechanism. As a result, the gas of the second processing housing can be appropriately discharged.

[0038] As described above, the substrate processing apparatus appropriately exhausts the gas in the second processing housing in addition to exhausting the gas in the first processing housing.

[0039] In the substrate processing device, it is preferred that the second processing housing is arranged at the same position as the first processing housing when viewed from above, the second switching mechanism is arranged at the same position as the first switching mechanism when viewed from above, the first exhaust pipe extends in the vertical direction, and the second exhaust pipe extends in the vertical direction. The second processing housing is arranged at the same position as the first processing housing when viewed from above. The second switching mechanism is arranged at the same position as the first switching mechanism when viewed from above. Therefore, the relative position of the second processing housing and the second switching mechanism is roughly the same as the relative position of the first processing housing and the first switching mechanism. Therefore, the conditions of exhaust gas can be easily equalized between the first processing housing and the second processing housing. As a result, the quality of processing performed on the substrate between the first processing housing and the second processing housing can be appropriately equalized. The first exhaust pipe extends in the vertical direction. Therefore, the first switching mechanism and the second switching mechanism can be easily connected to the first exhaust pipe respectively. The second exhaust pipe extends in the vertical direction. Therefore, the first switching mechanism and the second switching mechanism can be easily connected to the second exhaust pipe, respectively.

[0040] In the substrate processing device, preferably, the substrate processing device comprises: a third processing shell, which is arranged at the same height as the first processing shell; a third holding part, which is arranged inside the third processing shell and holds the substrate; a third liquid supply part, which is arranged inside the third processing shell and supplies processing liquid to the substrate held by the third holding part; a third exhaust pipe, which is arranged on the side of the third processing shell and exhausts gas; a fourth exhaust pipe, which is arranged on the side of the third processing shell and exhausts gas; and a third switching mechanism, which is arranged at the same height as the third processing shell and switches the exhaust passage of the third processing shell to one of the third exhaust pipe and the fourth exhaust pipe.

[0041] The substrate processing apparatus includes a third processing housing, a third holding unit, and a third liquid supply unit. Therefore, the substrate can be subjected to liquid processing inside the third processing housing. Therefore, the productivity of the substrate processing apparatus can be suitably improved.

[0042] The third processing housing is arranged at the same height position as the first processing housing. The substrate processing apparatus includes a third switching mechanism, a third exhaust pipe, and a fourth exhaust pipe. The third switching mechanism switches the exhaust passage of the third processing housing to one of the third exhaust pipe and the fourth exhaust pipe. Specifically, the third switching mechanism switches to the following two states, one state is to connect the third processing housing to the third exhaust pipe and block the third processing housing from the fourth exhaust pipe, and the other state is to connect the third processing housing to the fourth exhaust pipe and block the third processing housing from the third exhaust pipe. When the exhaust passage of the third processing housing is the third exhaust pipe, the third exhaust pipe exhausts gas from the third processing housing, and the fourth exhaust pipe does not exhaust gas from the third processing housing. When the exhaust passage of the third processing housing is the fourth exhaust pipe, the fourth exhaust pipe exhausts gas from the third processing housing, and the third exhaust pipe does not exhaust gas from the third processing housing.

[0043] The third switching mechanism is arranged at the same height position as the third processing housing. Therefore, the flow path between the third processing housing and the third switching mechanism can be appropriately shortened. Therefore, the flow path between the third processing housing and the third switching mechanism can be appropriately suppressed from being contaminated. Thus, the gas flows smoothly from the third processing housing to the third switching mechanism. As a result, the gas of the third processing housing can be appropriately discharged.

[0044] The third exhaust pipe is arranged at the side of the third processing housing. Therefore, the third switching mechanism can be easily connected to the third exhaust pipe. The fourth exhaust pipe is arranged at the side of the third processing housing. Therefore, the third switching mechanism can be easily connected to the fourth exhaust pipe.

[0045] As described above, the substrate processing apparatus can appropriately exhaust the gas in the third processing housing.

[0046] In the substrate processing device, it is preferred that the substrate processing device comprises: a first pressure sensor for measuring the gas pressure on the primary side of the first switching mechanism; a first pressure adjustment mechanism for adjusting the gas pressure on the primary side of the first switching mechanism based on the detection result of the first pressure sensor; a third pressure sensor for measuring the gas pressure on the primary side of the third switching mechanism; and a third pressure adjustment mechanism for adjusting the gas pressure on the primary side of the third switching mechanism based on the detection result of the third pressure sensor. The substrate processing device comprises the first pressure sensor and the first pressure adjustment mechanism. Therefore, the pressure on the primary side of the first switching mechanism can be appropriately adjusted. Similarly, the substrate processing device comprises the third pressure sensor and the third pressure adjustment mechanism. Therefore, the pressure on the primary side of the third switching mechanism can be appropriately adjusted.

[0047] In the substrate processing apparatus, the first pressure regulating mechanism and the third pressure regulating mechanism preferably make the gas pressure on the primary side of the first switching mechanism equal to the gas pressure on the primary side of the third switching mechanism. The quality of processing performed on the substrate can be preferably made equal between the first processing housing and the third processing housing.

[0048] In the substrate processing apparatus, the substrate processing apparatus preferably comprises: a fifth exhaust pipe connected to the first exhaust pipe and the third exhaust pipe, exhausting the gas in the first exhaust pipe and the gas in the third exhaust pipe; and a sixth exhaust pipe connected to the second exhaust pipe and the fourth exhaust pipe, exhausting the gas in the second exhaust pipe and the gas in the fourth exhaust pipe. The structure of the substrate processing apparatus can be simplified.

[0049] In the substrate processing apparatus, it is preferred that the substrate processing apparatus comprises: a fifth pressure sensor for measuring the gas pressure inside the fifth exhaust pipe; a fifth pressure adjustment mechanism for adjusting the gas pressure inside the fifth exhaust pipe based on the detection result of the fifth pressure sensor; a sixth pressure sensor for measuring the gas pressure inside the sixth exhaust pipe; and a sixth pressure adjustment mechanism for adjusting the gas pressure inside the sixth exhaust pipe based on the detection result of the sixth pressure sensor. The substrate processing apparatus comprises the fifth pressure sensor and the fifth switching mechanism. Therefore, the pressure inside the fifth exhaust pipe can be appropriately adjusted. Similarly, the substrate processing apparatus comprises the sixth pressure sensor and the sixth switching mechanism. Therefore, the pressure inside the sixth exhaust pipe can be appropriately adjusted.

[0050] In the substrate processing apparatus, preferably, the fifth pressure sensor is disposed downstream of a connection position between the first exhaust pipe and the fifth exhaust pipe and a connection position between the third exhaust pipe and the fifth exhaust pipe, and the sixth pressure sensor is disposed downstream of a connection position between the second exhaust pipe and the sixth exhaust pipe and a connection position between the fourth exhaust pipe and the sixth exhaust pipe. The fifth pressure sensor can appropriately detect the exhaust pressure of the first exhaust pipe and the third exhaust pipe as a whole. The sixth pressure sensor can appropriately detect the exhaust pressure of the second exhaust pipe and the fourth exhaust pipe as a whole.

[0051] In the substrate processing device, preferably, the first liquid supply unit can supply the first processing liquid and the second processing liquid, and when the first liquid supply unit supplies the first processing liquid, the first switching mechanism switches the exhaust passage of the first processing shell to the first exhaust pipe, and when the first liquid supply unit supplies the second processing liquid, the first switching mechanism switches the exhaust passage of the first processing shell to the second exhaust pipe. When the first liquid supply unit supplies the first processing liquid, the first exhaust pipe exhausts the gas of the first processing shell. When the first liquid supply unit supplies the second processing liquid, the first exhaust pipe does not exhaust the gas of the first processing shell. Therefore, the internal contamination of the first exhaust pipe can be appropriately suppressed. Similarly, when the first liquid supply unit supplies the second processing liquid, the second exhaust pipe exhausts the gas of the first processing shell. When the first liquid supply unit supplies the first processing liquid, the second exhaust pipe does not exhaust the gas of the first processing shell. Therefore, the internal contamination of the second exhaust pipe can be appropriately suppressed. As a result, the gas in the first processing housing can be exhausted more appropriately. BRIEF DESCRIPTION OF THE DRAWINGS

[0052] For the purpose of illustrating the invention, several embodiments currently considered to be suitable are shown in the drawings, but it should be understood that the invention is not limited to the construction and arrangements shown in the drawings.

[0053] Figure 1 It is a top view showing the interior of the substrate processing apparatus according to the embodiment.

[0054] Figure 2 It is a right side view showing the structure of the central portion of the substrate processing apparatus in the width direction.

[0055] Figure 3 is a front view of the processing module.

[0056] Figure 4 It is a right side view showing the structure of the right part of the substrate processing apparatus.

[0057] Figure 5 It is a left side view showing the structure of the left part of the substrate processing apparatus.

[0058] Figure 6 is a top view of the processing unit.

[0059] Figure 7 is a side view of the processing unit.

[0060] Figure 8 is a front view of the switching mechanism.

[0061] Fig. 9 It is a system diagram of the exhaust passage from the processing shell.

[0062] Fig.10 It is a top view showing the upper part of the process module.

[0063] Fig.11 It is a control block diagram of a substrate processing apparatus.

[0064] Fig.12 It is a flowchart showing the action sequence for processing a substrate.

[0065] Fig.13 is a top view of a processing unit in a variant embodiment.

[0066] Fig.14 is a top view of a processing unit in a variant embodiment.

[0067] Fig.15 is a top view of a processing unit in a variant embodiment.

[0068] Fig.16 is a top view of a processing unit in a variant embodiment.

[0069] Fig.17 It is a top view showing the interior of the substrate processing apparatus in a modified embodiment.

[0070] Figure 1 8 is a front view of a switching mechanism according to a modified embodiment.

[0071] Fig.19A 4 is a side view of a switching mechanism according to a modified embodiment.

[0072] Fig.19B 4 is a side view of a switching mechanism according to a modified embodiment.

[0073] Fig. 20A It is a plan view showing an example of arrangement of wind speed sensors according to a modified embodiment.

[0074] Fig. 20B It is a plan view showing an example of arrangement of wind speed sensors according to a modified embodiment.

[0075] Fig.21A It is a plan view showing an example of arrangement of wind speed sensors according to a modified embodiment.

[0076] Fig.21B It is a plan view showing an example of arrangement of wind speed sensors according to a modified embodiment. DETAILED DESCRIPTION

[0077] Hereinafter, a substrate processing apparatus according to the present invention will be described with reference to the accompanying drawings.

[0078] <Overview of Substrate Processing Apparatus>

[0079] Figure 11 is a plan view showing the inside of a substrate processing apparatus according to an embodiment. The substrate processing apparatus 1 processes a substrate (eg, a semiconductor wafer).

[0080] The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for an organic EL (Electroluminescence), a substrate for an FPD (Flat Panel Display), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, a substrate for a photomask, or a substrate for a solar cell. The substrate W has a thin flat plate shape. The substrate W has a substantially circular shape when viewed from above.

[0081] The substrate processing apparatus 1 includes a transfer unit 3 and a processing module 11. The processing module 11 is connected to the transfer unit 3. The transfer unit 3 and the processing module 11 are arranged in a horizontal direction. The transfer unit 3 supplies a substrate W to the processing module 11. The processing module 11 processes the substrate W. The transfer unit 3 collects the substrate W from the processing module 11.

[0082] In this specification, for convenience, the horizontal direction in which the transfer conveying part 3 and the processing module 11 are arranged is referred to as the "front-to-back direction X". The direction from the processing module 11 toward the transfer conveying part 3 in the front-to-back direction X is referred to as the "front". The direction opposite to the front is referred to as the "rear". The horizontal direction orthogonal to the front-to-back direction X is referred to as the "width direction Y". One direction of the "width direction Y" is appropriately referred to as the "right". The direction opposite to the right is referred to as the "left". The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z". In each figure, the front, rear, right, left, top, and bottom are appropriately shown for reference.

[0083] When “front”, “rear”, “right”, and “left” are not particularly distinguished, they are referred to as “side”.

[0084] The transfer and conveying unit 3 includes a plurality of (eg, four) carrier placement units 4. The carrier placement units 4 are arranged in the width direction Y. Each carrier placement unit 4 places one carrier C. The carrier C accommodates a plurality of substrates W. The carrier C is, for example, a FOUP (frontopening unified pod).

[0085] The transfer conveying unit 3 includes a transfer space 5. The transfer space 5 is arranged behind the carrier mounting unit 4. The transfer space 5 extends in the width direction Y.

[0086] The transfer and conveying unit 3 includes a transport mechanism 6 . The transport mechanism 6 is provided in the transport space 5 . The transport mechanism 6 is disposed behind the carrier placement unit 4 . The transport mechanism 6 transports the substrate W. The transport mechanism 6 can store or retrieve the carrier C placed on the carrier placement unit 4 .

[0087] The process module 11 includes a transfer space 12A. The transfer space 12A is disposed in the center of the process module 11 in the width direction Y. The transfer space 12A extends in the front-rear direction X. The front portion of the transfer space 12A is connected to the transfer space 5 of the transfer conveyor 3 .

[0088] The processing module 11 includes a substrate placement unit 14A. The substrate placement unit 14A is provided in the transfer space 12A. The substrate placement unit 14A is disposed in the front portion of the transfer space 12A. The transfer mechanism 6 of the transfer conveyor unit 3 can also enter and exit the substrate placement unit 14A. The substrate W is placed in the substrate placement unit 14A.

[0089] The processing module 11 includes a transfer mechanism 16A. The transfer mechanism 16A is provided in the transfer space 12A. The transfer mechanism 16A transfers the substrate W. The transfer mechanism 16A can enter and exit the substrate placement portion 14A.

[0090] The processing module 11 includes processing units 21A1, 21B1, 21C1, and 21D1. The processing units 21A1 and 21B1 are arranged on the right side of the conveying space 12A. The processing units 21A1 and 21B1 are arranged in the front-rear direction X. The processing unit 21B1 is arranged behind the processing unit 21A1. The processing units 21C1 and 21D1 are arranged on the left side of the conveying space 12A. The processing units 21C1 and 21D1 are arranged in the front-rear direction X. The processing unit 21D1 is arranged behind the processing unit 21C1.

[0091] When the processing units 21A1, 21B1, 21C1, and 21D1 are not distinguished, they are referred to as processing units 21. Each processing unit 21 processes a substrate W. The processing performed by each processing unit 21 is the same.

[0092] The structure of the processing unit 21 will be briefly described. Each processing unit 21 includes a processing housing 23 .

[0093] Each processing unit 21 includes a holding portion 31. The holding portion 31 is provided inside the processing housing 23. The holding portion 31 holds the substrate W. Figure 1 The substrate W held by the holding portion 31 is indicated by a dotted line.

[0094] The processing unit 21 includes a liquid supply unit 33. The liquid supply unit 33 is provided inside the processing housing 23. The liquid supply unit 33 supplies the processing liquid to the substrate W held by the holding unit 31.

[0095] The conveyance mechanism 16A can enter and exit each processing unit 21. Specifically, the conveyance mechanism 16A can enter and exit the holding portion 31 of each processing unit 21.

[0096] Hereinafter, the process housing 23 of the process unit 21A1 is appropriately referred to as the process housing 23A1. Similarly, the process housings 23 of the process units 21B1, 21C1, and 21D1 are appropriately referred to as the process housings 23B1, 23C1, and 23D1. The process housings 23A1, 23B1, 23C1, and 23D1 are arranged at the same height.

[0097] The processing module 11 is provided with exhaust pipes 41A, 42A, and 43A. The exhaust pipes 41A, 42A, and 43A are all arranged outside the processing housing 23. The exhaust pipes 41A-43A are respectively arranged on the side of the processing housing 23A1. The exhaust pipes 41A-43A pass through the positions on the side of the processing housing 23A1 respectively. The exhaust pipes 41A-43A exhaust gases respectively. The exhaust pipes 41A-43A are not connected to each other. The exhaust pipes 41A-43A have exhaust passages separated from each other.

[0098] Similarly, the processing module 11 includes exhaust pipes 41B-43B, 41C-43C, 41D-43D. The exhaust pipes 41B-43B, 41C-43C, 41D-43D are respectively arranged on the sides of the processing housings 23B1, 23C1, 23D1. The exhaust pipes 41B-43B, 41C-43C, 41D-43D exhaust gas respectively.

[0099] The processing module 11 includes switching mechanisms 51A1, 51B1, 51C1, and 51D1. The switching mechanism 51A1 is disposed at substantially the same height as the processing housing 23A1. Similarly, the switching mechanisms 51B1, 51C1, and 51D1 are disposed at substantially the same height as the processing housings 23B1, 23C1, and 23D1, respectively.

[0100] The switching mechanism 51A1 switches the exhaust path of the process housing 23A1 to one of the exhaust pipes 41A to 43A. The switching mechanism 51A1 switches the exhaust path of the gas from the process housing 23A1 between the exhaust pipes 41A to 43A.

[0101] Specifically, the switching mechanism 51A1 switches to a first state, a second state, and a third state. In the first state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 41A, and blocks the processing housing 23A1 from the exhaust pipes 42A and 43A. In the second state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 42A, and blocks the processing housing 23A1 from the exhaust pipes 41A and 43A. In the third state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 43A, and blocks the processing housing 23A1 from the exhaust pipes 41A and 42A. In this way, the switching mechanism 51A1 is configured to connect the exhaust pipes 41A-43A individually to the processing housing 23A1, and to block the exhaust pipes 41A-43A individually from the processing housing 23A1.

[0102] Similarly, the switching mechanism 51B1 switches the exhaust passage of the processing housing 23B1 to one of the exhaust pipes 41B-43B. The switching mechanism 51C1 switches the exhaust passage of the processing housing 23C1 to one of the exhaust pipes 41C-43C. The switching mechanism 51D1 switches the exhaust passage of the processing housing 23D1 to one of the exhaust pipes 41D-43D.

[0103] exist Figure 1 , the switching mechanism 51A1 switches the exhaust passage of the processing housing 23A1 to the exhaust pipe 41A. The switching mechanism 51B1 switches the exhaust passage of the processing housing 23B1 to the exhaust pipe 41B. The switching mechanism 51C1 switches the exhaust passage of the processing housing 23C1 to the exhaust pipe 42C. The switching mechanism 51D1 switches the exhaust passage of the processing housing 23D1 to the exhaust pipe 43D.

[0104] Specifically, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 41A and blocks the processing housing 23A1 from the exhaust pipes 42A and 43A. The exhaust pipe 41A exhausts gas from the processing housing 23A1. The exhaust pipes 42A and 43A do not exhaust gas from the processing housing 23A1.

[0105] The switching mechanism 51B1 connects the processing housing 23B1 to the exhaust pipe 41B and blocks the processing housing 23B1 from the exhaust pipes 42B and 43B. The exhaust pipe 41B exhausts gas from the processing housing 23B1. The exhaust pipes 42B and 43B do not exhaust gas from the processing housing 23B1.

[0106] The switching mechanism 51C1 connects the processing housing 23C1 to the exhaust pipe 42C and blocks the processing housing 23C1 from the exhaust pipes 41C and 43C. The exhaust pipe 42C exhausts gas from the processing housing 23C1. The exhaust pipes 41C and 43C do not exhaust gas from the processing housing 23C1.

[0107] The switching mechanism 51D1 connects the processing housing 23D1 to the exhaust pipe 43D and blocks the processing housing 23D1 from the exhaust pipes 41D and 42D. The exhaust pipe 43D exhausts gas from the processing housing 23D1. The exhaust pipes 41D and 42D do not exhaust gas from the processing housing 23D1.

[0108] Here, the processing housing 23A1 is an example of the first processing housing in the present invention. The holding portion 31 of the processing unit 21A1 is an example of the first holding portion in the present invention. The liquid supply portion 33 of the processing unit 21A1 is an example of the first liquid supply portion in the present invention. The exhaust pipe 41A is an example of the first exhaust pipe in the present invention. The exhaust pipe 42A is an example of the second exhaust pipe in the present invention. The switching mechanism 51A1 is an example of the first switching mechanism in the present invention.

[0109] The processing housing 23B1 is an example of the third processing housing in the present invention. The holding portion 31 of the processing unit 21B1 is an example of the third holding portion in the present invention. The liquid supply portion 33 of the processing unit 21B1 is an example of the third liquid supply portion in the present invention. The exhaust pipe 41B is an example of the third exhaust pipe in the present invention. The exhaust pipe 42B is an example of the fourth exhaust pipe in the present invention. The switching mechanism 51B1 is an example of the third switching mechanism in the present invention.

[0110] The substrate processing apparatus 1 operates, for example, as follows. The transport mechanism 6 transports the substrate W from the carrier C on the carrier mounting portion 4 to the substrate mounting portion 14A. The transport mechanism 16A transports the substrate W from the substrate mounting portion 14A to the processing unit 21. Specifically, the transport mechanism 16A places the substrate W on the holding portion 31. The processing unit 21 performs liquid processing on the substrate W inside the processing housing 23. Each processing unit 21 processes one substrate W at a time. Specifically, the liquid supply portion 33 supplies the processing liquid to the substrate W held by the holding portion 31. After the substrate W is processed, the transport mechanism 16A transports the substrate W from the processing unit 21 to the substrate mounting portion 14A. The transport mechanism 6 transports the substrate W from the substrate mounting portion 14A to the carrier C on the carrier mounting portion 4.

[0111] When one processing unit 21 processes a substrate W, another processing unit 21 may process another substrate W. The number of processing units 21 that transport each substrate W is, for example, one.

[0112] When the substrate W is processed inside the processing housing 23, the switching mechanism 51 switches the exhaust path of the processing housing 23. For example, when the substrate W is processed, the switching mechanism 51A1 switches the exhaust path more than once. For example, the period of processing one substrate W in one processing housing 23 may include two or more of the first period, the second period, and the third period. Here, the first period is a period during which the first exhaust pipe exhausts the gas of the processing housing 23. The second period is a period during which the second exhaust pipe exhausts the gas of the processing housing 23. The third period is a period during which the third exhaust pipe exhausts the gas of the processing housing 23.

[0113] According to the substrate processing apparatus 1, the following effects can be obtained: That is, the switching mechanism 51A1 is disposed at substantially the same height as the processing housing 23A1, so that the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be shortened appropriately.

[0114] More specifically, the process housing 23A1 and the switching mechanism 51A1 are connected without using a pipe, so that the flow path between the process housing 23A1 and the switching mechanism 51A1 can be shortened appropriately.

[0115] Since the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be appropriately shortened, contamination of the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be appropriately suppressed. Therefore, the gas flows smoothly from the processing housing 23A1 to the switching mechanism 51A1. As a result, the gas in the processing housing 23A1 can be appropriately exhausted.

[0116] It is said that the switching time point is determined by, for example, the gas change time point and the delay time. Here, the switching time point is the time point when the switching mechanism 51 switches the exhaust passage. The gas change time point is the time point when the gas composition of the processing shell 23 changes. The delay time is the time required for the gas to reach the switching mechanism 51 from the processing shell 23. The shorter the flow path between the processing shell 23 and the switching mechanism 51, the shorter the delay time. The shorter the flow path between the processing shell 23 and the switching mechanism 51, the smaller the deviation of the delay time. As described above, according to the substrate processing device 1, the flow path between the processing shell 23A1 and the switching mechanism 51A1 can be appropriately shortened. Therefore, the delay time can be appropriately shortened. Furthermore, the deviation of the delay time can be appropriately suppressed. Therefore, the switching time point can be accurately determined. Therefore, the switching mechanism 51A1 can switch the exhaust passage of the processing shell 23A1 at an accurate time point.

[0117] The switching mechanism 51A1 is disposed at substantially the same height as the processing housing 23A1, so that the flow path between the processing housing 23A1 and the switching mechanism 51A1 extends substantially in the horizontal direction. Therefore, the gas flows more smoothly from the processing housing 23A1 to the switching mechanism 51A1. As a result, the gas in the processing housing 23A1 can be more appropriately exhausted.

[0118] Similarly, the switching mechanisms 51B1, 51C1, and 51D1 are disposed at substantially the same height positions as the processing housings 23B1, 23C1, and 23D1, respectively. Therefore, the gas in the processing housings 23A1, 23C1, and 23D1 can be exhausted more appropriately.

[0119] The exhaust pipe 41A is arranged on the side of the processing housing 23A1. Therefore, the switching mechanism 51A1 can be easily connected to the exhaust pipe 41A. The exhaust pipes 42A and 43A are also arranged on the side of the processing housing 23A1. Therefore, the switching mechanism 51A1 can be easily connected to the exhaust pipes 42A and 43A.

[0120] Similarly, exhaust pipes 41B-43B are arranged on the side of the processing housing 23B1. Therefore, the switching mechanism 51B1 can be easily connected to the exhaust pipes 41B-43B. Exhaust pipes 41C-43C are arranged on the side of the processing housing 23C1. Therefore, the switching mechanism 51C1 can be easily connected to the exhaust pipes 41C-43C. Exhaust pipes 41D-43D are arranged on the side of the processing housing 23D1. Therefore, the switching mechanism 51D1 can be easily connected to the exhaust pipes 41D-43D.

[0121] Hereinafter, the structure of the substrate processing apparatus 1 will be described in more detail.

[0122] <Transfer and Conveying Section 3>

[0123] Reference Figure 1 , 2 . Figure 2 1 is a right side view showing the structure of the central part of the substrate processing apparatus 1 in the width direction Y. The structure of the conveying mechanism 6 is described. The conveying mechanism 6 includes a hand 7 and a hand driving unit 8. The hand 7 supports a substrate W in a horizontal posture. The hand driving unit 8 is connected to the hand 7. The hand driving unit 8 moves the hand 7. The hand driving unit 8 moves the hand 7 in the front-back direction X, the width direction Y, and the vertical direction Z.

[0124] The structure of the hand driving part 8 is illustrated. The hand driving part 8 includes, for example, a rail 8a, a horizontal moving part 8b, a vertical moving part 8c, a rotating part 8d, and an advance-retract moving part 8e. The rail 8a is fixedly provided. The rail 8a is arranged at the bottom of the conveying space 5. The rail 8a extends in the width direction Y. The horizontal moving part 8b is supported on the rail 8a. The horizontal moving part 8b moves in the width direction Y relative to the rail 8a. The vertical moving part 8c is supported on the horizontal moving part 8b. The vertical moving part 8c moves in the vertical direction Z relative to the horizontal moving part 8b. The rotating part 8d is supported on the vertical moving part 8c. The rotating part 8d rotates relative to the vertical moving part 8c. The rotating part 8d rotates around a rotation axis parallel to the vertical direction Z. The advance-retract moving part 8e moves relative to the rotating part 8d. The advance-retract moving part 8e moves back and forth in one horizontal direction determined by the direction of the rotating part 8d. The advance-retract moving part 8e is connected to the hand 7. Since the hand driving unit 8 has such a configuration, the hand 7 can be parallel moved in the vertical direction Z. The hand 7 can be parallel moved in any horizontal direction. The hand 7 can be rotated in a horizontal plane.

[0125] <Overview of Processing Module 11>

[0126] Reference Figure 2 , 3 . Figure 3 is a front view of the processing module 11. Figure 3 The substrate loading unit 14A and the like are omitted from the illustration. The processing module 11 includes a transport space 12B in addition to the transport space 12A. The transport space 12B is arranged below the transport space 12A. The transport space 12B is also connected to the transport space 5 of the transfer conveyor unit 3. Although the illustration is omitted, the transport space 12B is arranged at the same position as the transport space 12A in a plan view.

[0127] When the transfer spaces 12A and 12B are not distinguished, they are referred to as the transfer space 12 .

[0128] The processing module 11 includes a partition wall 13. The partition wall 13 is disposed below the transfer space 12A and above the transfer space 12B. The partition wall 13 has a horizontal plate shape. The partition wall 13 partitions the transfer space 12A from the transfer space 12B.

[0129] Reference Figure 2 . The processing module 11 includes a substrate loading section 14B in addition to the substrate loading section 14A. The substrate loading section 14B loads the substrate W. The substrate loading section 14B is arranged below the substrate loading section 14A. The substrate loading section 14B is provided in the transport space 12B. The substrate loading section 14B is arranged in the front part of the transport space 12B. The transport mechanism 6 of the transfer conveyor 3 can also enter and exit the substrate loading section 14B. The transport mechanism 6, for example, transports the substrate W alternately to the substrate loading sections 14A and 14B.

[0130] The processing module 11 includes a transport mechanism 16B in addition to the transport mechanism 16A. The transport mechanism 16B is provided in the transport space 12B. The transport mechanism 16B transports the substrate W. The transport mechanism 16B can enter and exit the substrate placement portion 14B.

[0131] When the transport mechanisms 16A and 16B are not distinguished, they are referred to as the transport mechanism 16 .

[0132] Reference Figure 1 , 2 3. The structure of the transport mechanism 16 is described. The transport mechanism 16 includes a hand 17 and a hand driving unit 18. The hand 17 supports a substrate W in a horizontal position. The hand driving unit 18 is connected to the hand 17. The hand driving unit 18 moves the hand 17. The hand driving unit 18 moves the hand 17 in the front-back direction X, the width direction Y, and the vertical direction Z.

[0133] The structure of the hand drive unit 18 is illustrated. The hand drive unit 18 includes, for example, two pillars 18a, a vertical moving unit 18b, a horizontal moving unit 18c, a rotating unit 18d, and an advance and retreat moving unit 18e. The pillar 18a is fixedly provided. The pillar 18a is arranged at the side of the conveying space 12. The two pillars 18a are arranged in the front-to-back direction X. Each pillar 18a extends in the vertical direction Z. The vertical moving unit 18b is supported by the pillar 18a. The vertical moving unit 18b spans between the two pillars 18a and extends in the front-to-back direction X. The vertical moving unit 18b moves in the vertical direction Z relative to the pillar 18a. The horizontal moving unit 18c is supported by the vertical moving unit 18b. The horizontal moving unit 18c moves in the front-to-back direction X relative to the vertical moving unit 18b. The rotating unit 18d is supported by the horizontal moving unit 18c. The rotating unit 18d rotates relative to the horizontal moving unit 18c. The rotating part 18d rotates around a rotation axis parallel to the vertical direction Z. The advance-retract movement part 18e moves relative to the rotating part 18d. The advance-retract movement part 18e moves back and forth in a horizontal direction determined by the direction of the rotating part 18d. The advance-retract movement part 18e is connected to the hand 17. The hand driving part 18 is configured in this way, so that the hand 17 can move in parallel in the vertical direction Z. The hand 7 can move in parallel in any horizontal direction. The hand 7 can rotate in a horizontal plane.

[0134] Figure 41 is a right side view showing the structure of the right part of the substrate processing device 1. In addition to the processing unit 21A1, the processing module 11 also includes five processing units 21A2-21A6. The processing units 21A2-21A6 are respectively provided with processing shells 23A2-23A6. The processing shells 23A2-23A6 are arranged below the processing shell 23A1. The processing shells 23A1-23A6 are arranged from top to bottom. The processing shells 23A1-23A6 are arranged in a row in the vertical direction Z. Although not shown in the figure, the processing shells 23A2-23A6 are respectively arranged at the same position as the processing shell 23A1 when viewed from above. The processing shells 23A1-23A6 are alternately stacked.

[0135] Similarly, the processing module 11 includes processing units 21B2 to 21B6 in addition to the processing unit 21B1. The processing units 21B2 to 21B6 include processing housings 23B2 to 23B6, respectively. The relative positions of the processing housings 23B1 to 23B6 are the same as the relative positions of the processing housings 23A1 to 23A6.

[0136] Figure 5 1 is a left side view showing the structure of the left part of the substrate processing apparatus 1. The processing module 11 includes processing units 21C2-21C6 and 21D2-21D6 in addition to the processing units 21C1 and 21D1. The processing units 21C2-21C6 and 21D2-21D6 include processing housings 23C2-23C6 and 23D2-23D6, respectively. The processing housings 23C1-23C6 and 23D1-23D6 are respectively configured in the same manner as the processing housings 23A1-23A6.

[0137] Reference Figure 3 , 4 , 5. As described above, the processing housings 23A1, 23B1, 23C1, and 23D1 are arranged at the same height position. The processing housings 23A2-23A6, 23B2-23B6, 23C2-23C6, and 23D2-23D6 are also arranged in the same manner. That is, the processing housings 23An, 23Bn, 23Cn, and 23Dn are arranged at the same height position. Here, "n" is an integer from 1 to 6.

[0138] Reference Figure 3 The processing housings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3 are respectively arranged at the same height as the transfer space 12A. Therefore, the transfer mechanism 16A can enter and exit the processing housings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3.

[0139] The processing housings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6 are arranged at the same height as the transfer space 12B. Therefore, the transfer mechanism 16B can enter and exit the processing housings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6.

[0140] When the processing units 21A1-21A6 are not distinguished, they are referred to as processing unit 21A. When the processing units 21B1-21B6 are not distinguished, they are referred to as processing unit 21B. When the processing units 21C1-21C6 are not distinguished, they are referred to as processing unit 21C. When the processing units 21D1-21D6 are not distinguished, they are referred to as processing unit 21D. When the processing units 21A, 21B, 21C, and 21D are not distinguished, they are referred to as processing unit 21.

[0141] When the processing housings 23A1-23A6 are not distinguished, they are referred to as the processing housing 23A. When the processing housings 23B1-23B6 are not distinguished, they are referred to as the processing housing 23B. When the processing housings 23C1-23C6 are not distinguished, they are referred to as the processing housing 23C. When the processing housings 23D1-23D6 are not distinguished, they are referred to as the processing housing 23D. When the processing housings 23A, 23B, 23C, and 23D are not distinguished, they are referred to as the processing housing 23.

[0142] Reference Figure 1 Each of the processing housings 23 is adjacent to the transfer space 12 . Each of the processing housings 23A and 23B is disposed on the right side of the transfer space 12 . Each of the processing housings 23C and 23D is disposed on the left side of the transfer space 12 .

[0143] The processing module 11 includes first piping spaces 44A, 44B and second piping spaces 46A, 46B. The first piping spaces 44A, 44B and second piping spaces 46A, 46B are adjacent to the transfer space 12, respectively. The first piping spaces 44A, 44B and second piping spaces 46A, 46B are arranged on the right side of the transfer space 12.

[0144] The first piping space 44A, the processing housing 23A, and the second piping space 46A are arranged in the front-rear direction X. The first piping space 44A, the processing housing 23A, and the second piping space 46A are arranged in sequence. The first piping space 44A is arranged in front of the processing housing 23A. The first piping space 44A is adjacent to the processing housing 23A. The second piping space 46A is arranged at the rear of the processing housing 23A. The second piping space 46A is adjacent to the processing housing 23A.

[0145] The relative positions of the processing housing 23B, the first piping space 44B and the second piping space 46B are the same as the relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A. The first piping space 44B is arranged behind the second piping space 46A. The first piping space 44B is adjacent to the second piping space 46A.

[0146] The processing module 11 includes the first piping space 44C, 44D and the second piping space 46C, 46D. The first piping space 44C, 44D and the second piping space 46C, 46D are adjacent to the transport space 12, respectively. The first piping space 44C, 44D and the second piping space 46C, 46D are arranged on the left side of the transport space 12. The relative positions of the processing housing 23C, the first piping space 44C and the second piping space 46C are different only in direction from the relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A. The relative positions of the processing housing 23C, the first piping space 44C and the second piping space 46C are equivalent to rotating the relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A by 180 degrees around an axis parallel to the vertical direction Z. Therefore, the first piping space 44C is arranged at the rear of the processing housing 23C. The second piping space 46C is arranged at the front of the processing housing 23C. In this way, the relative positions of the processing housing 23C, the first piping space 44C and the second piping space 46C are the same as the relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A. The processing housing 23C, the first piping space 44C and the second piping space 46C are only arranged in a direction different from the processing housing 23A, the first piping space 44A and the second piping space 46A. The relative positions of the processing housing 23D, the first piping space 44D and the second piping space 46D are also the same as the relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A. The processing housing 23D, the first piping space 44D, and the second piping space 46D are different from the processing housing 23A, the first piping space 44A, and the second piping space 46A only in the orientation in which they are provided.

[0147] The first piping space 44A accommodates the exhaust pipes 41A-43A. In other words, the exhaust pipes 41A-43A are provided in the first piping space 44A. Similarly, the first piping space 44B accommodates the exhaust pipes 41B-43B. The first piping space 44C accommodates the exhaust pipes 41C-43C. The first piping space 44D accommodates the exhaust pipes 41D-43D.

[0148] Exhaust pipes 41A-43A are arranged in front of the processing housing 23A. Exhaust pipes 41B-43B are arranged in front of the processing housing 23B. Exhaust pipes 41C-43C are arranged at the rear of the processing housing 23C. Exhaust pipes 41D-43D are arranged at the rear of the processing housing 23D.

[0149] Exhaust pipes 41A-43A are arranged in the width direction Y. Exhaust pipes 41A-43A are adjacent to processing housing 23A, respectively. Similarly, exhaust pipes 41B-43B are arranged in the width direction Y. Exhaust pipes 41B-43B are adjacent to processing housing 23B, respectively. Exhaust pipes 41C-43C are arranged in the width direction Y. Exhaust pipes 41C-43C are adjacent to processing housing 23C, respectively. Exhaust pipes 41D-43D are arranged in the width direction Y. Exhaust pipes 41D-43D are adjacent to processing housing 23C, respectively.

[0150] The processing module 11 includes gas supply pipes 48A, 48B, 48C, and 48D. The gas supply pipe 48A is disposed in the second piping space 46A. The gas supply pipe 48A supplies gas (e.g., clean air) to the processing housing 23A. Similarly, the gas supply pipes 48B, 48C, and 48D are housed in the second piping spaces 46B, 46C, and 46D, respectively. The gas supply pipes 48B, 48C, and 48D supply gas to the processing housings 23B, 23C, and 23D, respectively.

[0151] Reference Figure 3 , 4 , 5. The exhaust pipes 41A-43A extend in the vertical direction Z. The exhaust pipes 41A-43A extend from the height position of the processing housing 23A1 to the height position of the processing housing 23A6. Similarly, the exhaust pipes 41B-43B, 41C-43C, and 41D-43D extend in the vertical direction Z.

[0152] Reference Figure 4 , 5 The air supply pipes 48A to 48D extend in the vertical direction, respectively. The air supply pipes 48A to 48D are disposed on the sides of the processing housings 23A to 23D, respectively.

[0153] The front-rear direction X is an example of the first direction in the present invention. The width direction Y is an example of the second direction in the present invention.

[0154] When the exhaust pipes 41A to 41D are not distinguished, the exhaust pipe 41 is referred to as the exhaust pipe 41. When the exhaust pipes 42A to 42D are not distinguished, the exhaust pipe 42 is referred to as the exhaust pipe 42. When the exhaust pipes 43A to 43D are not distinguished, the exhaust pipe 43 is referred to as the exhaust pipe 43. When the first piping space 44A, 44B, 44C, and 44D are not distinguished, the first piping space 44 is referred to as the first piping space 44. When the second piping space 46A, 46B, 46C, and 46D are not distinguished, the second piping space 46 is referred to as the second piping space 46. When the air supply pipes 48A to 48D are not distinguished, the air supply pipe 48 is referred to as the air supply pipe 48.

[0155] The first piping space 44 does not accommodate piping for supplying gas to the processing housing 23 , nor piping for supplying processing liquid to the processing unit 21 (liquid supply unit 33 ), nor piping for discharging processing liquid from the processing unit 21 .

[0156] The second pipe space 46 may contain, for example, a pipe for supplying the processing liquid to the processing unit 21 (liquid supply unit 33 ) or a pipe for discharging the processing liquid from the processing unit 21 .

[0157] Reference Figure 3 , 4 . As described above, the switching mechanism 51A1 is arranged at a height position substantially the same as that of the processing housing 23A1. The switching mechanism 51A1 overlaps with the processing housing 23A1 when viewed from the front. Specifically, the switching mechanism 51A1 as a whole overlaps with the processing housing 23A1 when viewed from the front. The relative position of the switching mechanism 51B1 and the processing housing 23B1 is the same as the relative position of the switching mechanism 51A1 and the processing housing 23A1. The relative positions of the switching mechanisms 51C1, 51D1 and the processing housings 23C1, 23D1 are also the same as the relative positions of the switching mechanism 51A1 and the processing housing 23A1.

[0158] In addition to the switching mechanism 51A1, the processing module 11 also includes switching mechanisms 51A2-51A6. The relative position of the switching mechanism 51A2 and the processing housing 23A2 is the same as the relative position of the switching mechanism 51A1 and the processing housing 23A1. Specifically, the switching mechanism 51A2 is arranged at a height position substantially the same as the processing housing 23A2. The switching mechanism 51A2 overlaps with the processing housing 23A2 when viewed from the front. Similarly, the relative positions of the switching mechanisms 51A3-51A6 and the processing housing 23A3-23A6 are the same as the relative positions of the switching mechanism 51A1 and the processing housing 23A1.

[0159] The switching mechanism 51A2 switches the exhaust passage of the processing housing 23A2 to one of the exhaust pipes 41A-43A. Similarly, the switching mechanisms 51A3-51A6 switch the exhaust passage of the processing housings 23A3-23A6 to one of the exhaust pipes 41A-43A. Thus, the exhaust pipes 41A-43A exhaust gas from the processing housings 23A1-23A6, respectively.

[0160] Reference Figure 4In addition to the switching mechanism 51B1, the processing module 11 also includes switching mechanisms 51B2-51B6. The relative positions of the switching mechanisms 51B2-51B6 and the processing housings 23B2-23B6 are the same as the relative positions of the switching mechanism 51B1 and the processing housing 23B1. The switching mechanisms 51B2-51B6 respectively switch the exhaust passages of the processing housings 23B2-23B6 to one of the exhaust pipes 41B-43B. Therefore, the exhaust pipes 41B-43B exhaust gas from the processing housings 23B1-23B6.

[0161] Reference Figure 5 In addition to the switching mechanism 51C1, the processing module 11 also includes switching mechanisms 51C2-51C6. The relative positions of the switching mechanisms 51C2-51C6 and the processing housings 23C2-23C6 are the same as the relative positions of the switching mechanism 51C1 and the processing housing 23C1. The switching mechanisms 51C2-51C6 respectively switch the exhaust passages of the processing housings 23C2-23C6 to one of the exhaust pipes 41C-43C. Therefore, the exhaust pipes 41C-43C exhaust gas from the processing housings 23C1-23C6.

[0162] In addition to the switching mechanism 51D1, the processing module 11 also includes switching mechanisms 51D2-51D6. The relative positions of the switching mechanisms 51D2-51D6 and the processing housings 23D2-23D6 are the same as the relative positions of the switching mechanism 51D1 and the processing housing 23D1. The switching mechanisms 51D2-51D6 respectively switch the exhaust passages of the processing housings 23D2-23D6 to one of the exhaust pipes 41D-43D. Therefore, the exhaust pipes 41D-43D exhaust gas from the processing housings 23D1-23D6.

[0163] Although not shown in the figure, the switching mechanisms 51A2-51A6 are respectively arranged at the same positions as the switching mechanism 51A1 in a plan view. Similarly, the switching mechanisms 51B2-51B6 are respectively arranged at the same positions as the switching mechanism 51B1 in a plan view. The switching mechanisms 51C2-51C6 are respectively arranged at the same positions as the switching mechanism 51C1 in a plan view. The switching mechanisms 51D2-51D6 are respectively arranged at the same positions as the switching mechanism 51D1 in a plan view.

[0164] When the switching mechanisms 51A1-51A6 are not distinguished, they are referred to as the switching mechanism 51A. When the switching mechanisms 51B1-51B6 are not distinguished, they are referred to as the switching mechanism 51B. When the switching mechanisms 51C1-51C6 are not distinguished, they are referred to as the switching mechanism 51C. When the switching mechanisms 51D1-51D6 are not distinguished, they are referred to as the switching mechanism 51D. When the switching mechanisms 51A, 51B, 51C, and 51D are not distinguished, they are referred to as the switching mechanism 51.

[0165] Reference Figure 1 . The switching mechanism 51 is disposed at a position that does not overlap with the holding portion 31 when viewed from above. At least a portion of the switching mechanism 51 is disposed outside the processing housing 23. At least a portion of the switching mechanism 51 is disposed on the side of the processing housing 23. At least a portion of the switching mechanism 51 is disposed in the first piping space 44. At least a portion of each switching mechanism 51A is disposed in the first piping space 44A. At least a portion of each switching mechanism 51B is disposed in the first piping space 44B. At least a portion of each switching mechanism 51C is disposed in the first piping space 44C. At least a portion of each switching mechanism 51D is disposed in the first piping space 44D.

[0166] <Configuration of Processing Unit 21>

[0167] Figure 6 is a top view of the processing unit 21. Figure 7 2 is a side view of the processing unit 21. As described above, each processing unit 21 includes a processing housing 23, a holding portion 31, and a liquid supply portion 33. Figure 1 In the figure, for convenience, the liquid supply unit 33 is briefly shown, so Figure 6 The liquid supply portion 33 shown is Figure 1 The liquid supply 33 shown is slightly different.

[0168] The structure of the processing housing 23 will be described. The processing housing 23 has a substantially box shape. The processing housing 23 has a substantially rectangular shape in plan view, front view, and side view.

[0169] Each processing housing 23 includes four side walls 25a, 25b, 25c, and 25d, an upper plate 25e, and a bottom plate 25f. The side walls 25a to 25d are each substantially vertical. The upper plate 25e and the bottom plate 25f are substantially horizontal.

[0170] Each processing housing 23 has a processing space 24 therein. The substrate W is processed in the processing space 24. The processing space 24 is partitioned by side walls 25a to 25d, an upper plate 25e, and a bottom plate 25f.

[0171] The side walls 25a and 25c extend in the front-rear direction X in a plan view. The side wall 25c is provided on the opposite side of the side wall 25a. The side walls 25b and 25d extend in the width direction Y in a plan view. The side walls 25b and 25d extend from the side wall 25a to the side wall 25c, respectively. The side wall 25d is provided on the opposite side of the side wall 25b.

[0172] The processing housing 23B has the same structure as the processing housing 23A. The processing housings 23C and 23D also have the same structure as the processing housing 23A. The processing housings 23C and 23D are only arranged in a direction different from that of the processing housing 23A. The processing housings 23C and 23D are equivalent to rotating the processing housing 23A 180 degrees around an axis parallel to the vertical direction Z. Therefore, in any one of the processing housings 23A-23D, the side wall 25a is connected to the conveying space 12. In any one of the processing housings 23A-23D, the side wall 25b is connected to the first piping space 44. In any one of the processing housings 23A-23D, the side wall 25d is connected to the second piping space 46.

[0173] The processing housing 23 has a substrate transfer port 27. The substrate transfer port 27 is formed in the side wall 25a. The substrate W can pass through the substrate transfer port 27. The substrate W moves between the outside of the processing housing 23 and the inside of the processing housing 23 through the substrate transfer port 27. Specifically, the substrate W moves between the transfer space 12 and the processing space 24 through the substrate transfer port 27.

[0174] Each processing unit 21 may include a shutter (not shown). The shutter is attached to the side wall 25a. The shutter opens and closes the substrate transfer port 27.

[0175] The holding portion 31 holds one substrate W in a horizontal posture. The holding portion 31 has an upper surface 31 a. The upper surface 31 a is substantially horizontal. The substrate W is placed on the upper surface 31 a.

[0176] Figure 6 , 7 denoted by a center point G. The center point G is the center position of the substrate W when the substrate W is held by the holding portion 31 .

[0177] Reference Figure 7 Each processing unit 21 further includes a rotation drive unit 32. The rotation drive unit 32 is disposed inside the processing housing 23. The rotation drive unit 32 is connected to the holding unit 31. The rotation drive unit 32 rotates the holding unit 31. The substrate W held by the holding unit 31 rotates integrally with the holding unit 31. The holding unit 31 and the substrate W rotate around a rotation axis Aw. The rotation axis Aw is, for example, an imaginary line parallel to the vertical direction Z. The rotation axis Aw passes through the center point G, for example.

[0178] Reference Figure 6 The liquid supply unit 33 supplies a first processing liquid, a second processing liquid, and a third processing liquid. The first processing liquid, the second processing liquid, and the third processing liquid are of different types. That is, the liquid supply unit 33 supplies a plurality of (three) types of processing liquids.

[0179] The first treatment liquid is classified as an acidic liquid, for example, and includes at least one of hydrofluoric acid, hydrochloric acid hydrogen peroxide solution, sulfuric acid, sulfuric acid hydrogen peroxide solution, nitric acid (a mixture of hydrofluoric acid and nitric acid), and hydrochloric acid.

[0180] The second treatment liquid is classified into, for example, an alkaline solution. The second treatment liquid includes, for example, at least one of an ammonia hydrogen peroxide solution (SC1), ammonia water, an ammonium fluoride solution, and tetramethylammonium hydroxide (TMAH).

[0181] The third processing liquid is classified into, for example, an organic liquid, and the organic liquid includes at least one of isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), and acetone.

[0182] The liquid supply unit 33 includes nozzles 34A, 34B, and 34C. The nozzles 34A, 34B, and 34C eject processing liquids, respectively. The nozzle 34A ejects, for example, the first processing liquid. The nozzle 34B ejects, for example, the second processing liquid. The nozzle 34C ejects, for example, the third processing liquid.

[0183] Each nozzle 34A, 34B, 34C has a linearly extending tube shape. The nozzles 34A, 34B, 34C include a tip portion 35A, 35B, 35C and a base portion 36A, 36B, 36C. The tip portions 35A, 35B, 35C each have a discharge port (not shown) for discharging the treatment liquid.

[0184] The liquid supply unit 33 includes base portions 37A, 37B, and 37C. The base portions 37A, 37B, and 37C support the nozzles 34A, 34B, and 34C, respectively. Specifically, the base portions 37A, 37B, and 37C are connected to the base end portions 36A, 36B, and 36C.

[0185] The base portion 37A further moves the nozzle 34A. For example, the base portion 37A rotates the nozzle 34A around a rotation axis that passes through the base portion 37A and is parallel to the vertical direction Z. Similarly, the base portions 37B and 37C respectively move the nozzles 34B and 34C.

[0186] The nozzle 34A can be moved to a processing position and a retreat position by the base portion 37A. When the nozzle 34A is at the processing position, the front end portion 35A (discharge port) is located above the substrate W held by the holding portion 31. When the nozzle 34A is at the processing position, the front end portion 35A (discharge port) overlaps with the substrate W held by the holding portion 31 in a plan view. When the nozzle 34A is at the retreat position, the nozzle 34A as a whole does not overlap with the substrate W held by the holding portion 31 in a plan view. Similarly, the nozzles 34B and 34C can be moved to the processing position and the retreat position, respectively. Figure 6 The nozzles 34A, 34B, and 34C are shown in the retracted position.

[0187] The base parts 37A to 37C are respectively arranged near the side wall 25c. The base part 37A is arranged at the corner where the side wall 25c and the side wall 25b are connected. The base parts 37B and 37C are arranged at the corner where the side wall 25c and the side wall 25d are connected.

[0188] Each processing unit 21 includes a cup 38 . The cup 38 is disposed around the holding portion 31 . The cup 38 surrounds the side of the substrate W held by the holding portion 31 . The cup 38 receives the processing liquid scattered from the substrate W held by the holding portion 31 .

[0189] Reference Figure 7 Each processing unit 21 includes a blowing unit 39. The blowing unit 39 supplies gas to the processing space 24. The blowing unit 39 is mounted on the upper plate 25e. The blowing unit 39 is disposed above the holding portion 31. The blowing unit 39 blows gas (for example, clean air) downward.

[0190] The blowing unit 39 is connected to the air supply pipe 48. The air supply pipe 48 supplies the blowing unit 39 with gas.

[0191] The relative positions of the processing housing 23, the holding part 31, and the liquid supply part 33 are the same among the processing units 21A to 21D. The relative positions of the processing housing 23, the holding part 31, and the liquid supply part 33 in the processing units 21C and 21D differ only in their orientation from those in the processing unit 21A.

[0192] <Structure of Switching Mechanism 51>

[0193] Reference Figure 6 , 7 The switching mechanism 51 includes a switching housing 53. The switching housing 53 is smaller than the processing housing 23. The switching housing 53 is connected to the processing housing 23. The switching housing 53 is further connected to the exhaust pipes 41-43. Each switching housing 53 extends in the horizontal direction. Each switching housing 53 is bent in a substantially L-shape when viewed from above. The switching housing 53 has a switching space 54 therein.

[0194] Each switching housing 53 includes an introduction portion 55. The introduction portion 55 is connected to the processing housing 23. The introduction portion 55 is connected to the side wall 25b of the processing housing 23.

[0195] The introduction portion 55 extends from the processing housing 23 in the front-rear direction X. The introduction portion 55 has a first end 55a and a second end 55b. The first end 55a corresponds to the upstream end of the switching space 54. The switching space 54 is open to the processing space 24 at the first end 55a. In this way, the switching housing 53 is connected to the processing housing 23 at the introduction portion 55. The gas flows from the processing housing 23 into the switching space 54 through the first end 55a.

[0196] The introduction part 55 penetrates the processing housing 23. The first end 55a is arranged inside the processing housing 23. That is, the first end 55a is arranged in the processing space 24. The second end 55b is arranged outside the processing housing 23. Specifically, the second end 55b is arranged in the first piping space 44.

[0197] The introduction portion 55 is disposed near the side wall 25a. On the other hand, the base portions 37A-37C are disposed near the side wall 25c. In other words, the introduction portion 55 is disposed near the transfer space 12. The base portions 37A-37C are disposed far from the transfer space 12.

[0198] The position of the introduction portion 55 and the like will be described with reference to the side wall 25 a . Figure 6 Indicates distances D1, D2, D3, and D4. Distance D1 is the distance between the introduction portion 55 and the side wall 25a when viewed from above. Distance D2 is the distance between the retaining portion 31 and the side wall 25a when viewed from above. Distance D3 is the distance between the center point G and the side wall 25a when viewed from above. Distance D4 is the distance between the base portion 37A and the side wall 25a when viewed from above. Distance D1 is smaller than distance D2. Distance D2 is smaller than distance D3. Distance D3 is smaller than distance D4.

[0199] Here, the side wall 25a is in contact with the conveying space 12. Therefore, the distances D1-D4 are approximate to the distances based on the conveying space 12. That is, the distance D1 is approximate to the distance between the introduction portion 55 and the conveying space 12 when viewed from above. The distance D2 is approximate to the distance between the holding portion 31 and the conveying space 12 when viewed from above. The distance D3 is approximate to the distance between the center point G and the conveying space 12 when viewed from above. The distance D4 is approximate to the distance between the base portion 37A and the conveying space 12 when viewed from above. Therefore, when viewed from above, the distance between the introduction portion 55 and the conveying space 12 is smaller than the distance between the holding portion 31 and the conveying space 12. When viewed from above, the distance between the holding portion 31 and the conveying space 12 is smaller than the distance between the center point G and the conveying space 12. When viewed from above, the distance between the center point G and the conveying space 12 is smaller than the distance between the base portion 37A and the conveying space 12.

[0200] Each switching case 53 includes a distribution portion 56. The distribution portion 56 is connected to the introduction portion 55. The distribution portion 56 is connected to the second end 55b of the introduction portion 55. The distribution portion 56 extends in the width direction Y.

[0201] The distribution unit 56 is disposed outside the processing housing 23. The distribution unit 56 is disposed in the first pipe space 44. The distribution unit 56 is disposed in the vicinity of the exhaust pipes 41-43.

[0202] The exhaust pipes 41-43 are connected to the processing housing 23. The exhaust pipes 41-43 are arranged between the processing housing 23 and the distribution unit 56 in a plan view. Specifically, the exhaust pipes 41-43 are connected to the side wall 25b of the processing housing 23. The exhaust pipes 41-43 are arranged between the side wall 25b and the distribution unit 56.

[0203] The distribution part 56 is connected to the exhaust pipes 41 to 43. The distribution part 56 is connected to the outer side of the exhaust pipes 41 to 43. The switching housing 53 is communicated to the exhaust pipes 41 to 43 in the distribution part 56.

[0204] Specifically, the exhaust pipe 41 has an opening 41k. The opening 41k is formed on the outer side of the exhaust pipe 41. The opening 41k is connected to the flow path in the exhaust pipe 41. The distribution unit 56 is connected to the portion of the exhaust pipe 41 located around the opening 41k. Thus, the switching space 54 is connected to the flow path in the exhaust pipe 41 through the opening 41k. Similarly, the exhaust pipes 42 and 43 have openings 42k and 43k, respectively. The distribution unit 56 is connected to the exhaust pipes 42 and 43 around the openings 42k and 43k.

[0205] Reference Figure 6 , 8 . Figure 8 51 is a front view of the switching mechanism 51. For convenience, Figure 8 The switching housing 53 is indicated by a dotted line. Each switching housing 53 has three opening and closing parts 61, 62, and 63. The opening and closing parts 61-63 are respectively arranged inside the switching housing 53. That is, the switching housing 53 accommodates the opening and closing parts 61-63. Specifically, the opening and closing parts 61-63 are respectively arranged inside the distribution part 56. The opening and closing parts 61-63 are arranged outside the processing housing 23. The opening and closing parts 61-63 are arranged in the first piping space 44. The opening and closing parts 61, 62, and 63 are respectively arranged at positions opposite to the openings 41k, 42k, and 43k. The opening and closing parts 61, 62, and 63 can be moved to a position where the openings 41k, 42k, and 43k are opened, and a position where the openings 41k, 42k, and 43k are closed.

[0206] exist Figure 6 , 8 In the embodiment, the opening and closing portion 61 is located at a position to open the opening 41 k, and the opening and closing portions 62 and 63 are located at positions to close the openings 42 k and 43 k, respectively.

[0207] When the opening 41k is opened by the opening 61, the exhaust pipe 41 is connected to the processing housing 23. When the opening 41k is closed by the opening 61, the exhaust pipe 41 is blocked from the processing housing 23. In this way, the position of the opening 41k opened by the opening 61 corresponds to the position of the opening 61 that connects the processing housing 23 to the exhaust pipe 41. The position of the opening 41k closed by the opening 61 corresponds to the position of the opening 61 that blocks the processing housing 23 from the exhaust pipe 41.

[0208] Similarly, when the openings 42k and 43k are opened by the openings 62 and 63, respectively, the exhaust pipes 42 and 43 are connected to the processing housing 23. When the openings 42k and 43k are closed by the openings 62 and 63, respectively, the exhaust pipes 42 and 43 are blocked from the processing housing 23. In this way, the positions of the openings 42k and 43k opened by the openings 62 and 63 correspond to the positions of the openings 62 and 63 that connect the processing housing 23 to the exhaust pipes 42-43. The positions of the openings 42k and 43k closed by the openings 62 and 63 correspond to the positions of the openings 62 and 63 that block the processing housing 23 from the exhaust pipes 42-43.

[0209] The opening and closing parts 61, 62, and 63 can move independently of each other. Therefore, the exhaust pipes 41, 42, and 43 can be connected to the processing housing 23 individually. The exhaust pipes 41, 42, and 43 can be blocked from the processing housing 23 individually.

[0210] The opening and closing parts 61, 62, and 63 have, for example, the following structure. The opening and closing part 61 has a substantially vertical flat plate shape. The opening and closing part 61 is configured to be able to swing around the rotation axis A1. The rotation axis A1 is an imaginary line parallel to the vertical direction Z. The rotation axis A1 passes through the first end of the opening and closing part 61. The opening and closing part 61 swings around the rotation axis A1. The opening and closing parts 62 and 63 also have the same structure as the opening and closing part 61. The opening and closing parts 62 and 63 swing around the rotation axes A2 and A3, respectively.

[0211] The opening and closing parts 61, 62, 63 are moved by a power source (for example, an electric motor) not shown. Here, the power source is not an element of the switching mechanism 51. The power source is an external element of the switching mechanism 51. The power source may be arranged outside the switching case 53, for example.

[0212] The opening and closing section 61 is an example of a first opening and closing section in the present invention. The opening and closing section 62 is an example of a second opening and closing section in the present invention.

[0213] As described above, the switching mechanism 51 is arranged at a position in a plan view so as not to overlap with the holding portion 31. The position of the switching mechanism 51 in a plan view will be described in detail.

[0214] Figure 6The imaginary circle E3r is indicated by a single dotted line. The imaginary circle E3r is centered at the center point G. The radius of the imaginary circle E3r is three times the radius of the substrate W. The switching mechanism 51 is arranged outside the imaginary circle E3r in a plan view. That is, the distance from the center point G to the switching mechanism 51 is greater than three times the radius of the substrate W in a plan view.

[0215] Figure 6 The imaginary circle E5r is indicated by a single dotted line. The imaginary circle E5r is centered at the center point G. The radius of the imaginary circle E5r is 5 times the radius of the substrate W. The switching mechanism 51 is arranged within the imaginary circle E5r in a plan view. That is, the distance from the center point G to the switching mechanism 51 is smaller than 5 times the radius of the substrate W in a plan view.

[0216] As described above, the switching mechanism 51 is disposed at substantially the same height position as the processing housing 23. The height position of the switching mechanism 51 will be described in further detail.

[0217] Reference Figure 7 . The switching mechanism 51 has an upper end P1 and a lower end Q1. The upper end P1 and the lower end Q1 correspond to the upper end and the lower end of the switching shell 53, respectively. The processing shell 23 has an upper end P2 and a lower end Q2. The upper end P2 corresponds to the upper surface of the upper plate 25e. The lower end Q2 corresponds to the lower surface of the bottom plate 25f. The upper end P1 is configured at a position equal to or lower than the upper end P2. Specifically, the upper end P1 is configured at a position lower than the upper end P2. The lower end Q1 is configured at a position equal to or higher than the lower end Q2. Specifically, the lower end Q1 is configured at a position higher than the lower end Q2.

[0218] The switching mechanism 51 is arranged at a position equal to or lower than the upper surface 31a of the holding portion 31. That is, the upper end P1 is arranged at a position equal to or lower than the upper surface 31a. Specifically, the upper end P1 is arranged at a position lower than the upper surface 31a. Here, the upper surface 31a of the holding portion 31 is an example of the upper end of the holding portion 31 in the present invention.

[0219] <Exhaust Passage Configuration>

[0220] Fig. 9 2 is a system diagram of an exhaust passage from the processing housing 23. The substrate processing apparatus 1 includes a pressure sensor 71A1. The pressure sensor 71A1 detects exhaust pressure. Specifically, the pressure sensor 71A1 measures the gas pressure on the primary side (upstream side) of the switching mechanism 51A1. The pressure sensor 71A1 measures the pressure of the gas flowing from the processing housing 23A1 into the switching mechanism 51A1.

[0221] The substrate processing apparatus 1 includes a pressure regulating mechanism 73A1. The pressure regulating mechanism 73 regulates the exhaust pressure. Specifically, the pressure regulating mechanism 73A1 regulates the gas pressure on the primary side of the switching mechanism 51A1. More specifically, the pressure regulating mechanism 73A1 regulates the gas pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71A1.

[0222] Similarly, the substrate processing apparatus 1 includes pressure sensors 71A2-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6. When the pressure sensors 71A1-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6 are not distinguished, they are referred to as pressure sensors 71. Each pressure sensor 71 detects exhaust pressure. Each pressure sensor 71 measures the gas pressure on the primary side of the switching mechanism 51.

[0223] The substrate processing apparatus 1 includes pressure adjustment mechanisms 73A2-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6. When the pressure adjustment mechanisms 73A1-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6 are not distinguished, they are referred to as pressure adjustment mechanisms 73. Each pressure adjustment mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0224] The substrate processing apparatus 1 includes exhaust pipes 81A, 82A, and 83A. The exhaust pipe 81A is connected to the exhaust pipes 41A and 41B. The exhaust pipe 81A exhausts the gas from the exhaust pipe 41A and the gas from the exhaust pipe 41B. The exhaust pipe 82A is connected to the exhaust pipes 42A and 42B. The exhaust pipe 82A exhausts the gas from the exhaust pipe 42A and the gas from the exhaust pipe 42B. The exhaust pipe 83A is connected to the exhaust pipes 43A and 43B. The exhaust pipe 83A exhausts the gas from the exhaust pipe 43A and the gas from the exhaust pipe 43B.

[0225] Similarly, the substrate processing apparatus 1 includes exhaust pipes 81B, 82B, and 83B. The connection relationship between the exhaust pipes 81B-83B and the exhaust pipes 41C-43C and 41D-43D is the same as the connection relationship between the exhaust pipes 81A-83A and the exhaust pipes 41A-43A and 41B-43B.

[0226] The substrate processing apparatus 1 includes a pressure sensor 84A. The pressure sensor 84A detects exhaust pressure. Specifically, the pressure sensor 84A measures the gas pressure inside the exhaust pipe 81A.

[0227] The substrate processing apparatus 1 includes a pressure adjustment mechanism 87A. The pressure adjustment mechanism 87A adjusts the exhaust pressure. Specifically, the pressure adjustment mechanism 87A adjusts the gas pressure inside the exhaust pipe 81A. More specifically, the pressure adjustment mechanism 87A adjusts the gas pressure inside the exhaust pipe 81A based on the detection result of the pressure sensor 84A.

[0228] Similarly, the substrate processing apparatus 1 includes pressure sensors 85A, 86A, 84B, 85B, and 86B. The pressure sensors 85A-86A and 84B-86B detect exhaust pressures, respectively. The pressure sensors 85A-86A and 84B-86B measure gas pressures inside exhaust pipes 82A-83A and 81B-83B, respectively.

[0229] The substrate processing apparatus 1 includes pressure adjustment mechanisms 88A, 89A, 87B, 88B, and 89B. The pressure adjustment mechanisms 88A-89A and 87B-89B adjust the gas pressure inside the exhaust pipes 82A-83A and 81B-83B based on the detection results of the pressure sensors 85A-86A and 84B-86B, respectively.

[0230] When exhaust pipes 81A and 81B are not distinguished, exhaust pipe 81 is referred to as exhaust pipe. When exhaust pipes 82A and 82B are not distinguished, exhaust pipe 82 is referred to as exhaust pipe 82. When exhaust pipes 83A and 83B are not distinguished, exhaust pipe 83 is referred to as exhaust pipe. When pressure sensors 84A and 84B are not distinguished, pressure sensor 84 is referred to as pressure sensor 85A and 85B are not distinguished, pressure sensor 85 is referred to as pressure sensor 85. When pressure sensors 86A and 86B are not distinguished, pressure sensor 86 is referred to as pressure sensor 86. When pressure adjustment mechanisms 87A and 87B are not distinguished, pressure adjustment mechanisms 87 are referred to as pressure adjustment mechanisms 87. When pressure adjustment mechanisms 88A and 88B are not distinguished, pressure adjustment mechanisms 88 are referred to as pressure adjustment mechanisms 88. When pressure adjustment mechanisms 89A and 89B are not distinguished, pressure adjustment mechanisms 89 are referred to as pressure adjustment mechanisms 89.

[0231] Reference Figure 6 The pressure sensor 71 is, for example, disposed in the flow path between the processing housing 23 and the switching mechanism 51. The pressure sensor 71 is, for example, disposed inside the switching housing 53 (i.e., the switching space 54). The pressure sensor 71 is, for example, disposed in the introduction portion 55. The pressure sensor 71 is, for example, disposed on the primary side of the distribution portion 56. The pressure sensor 71 is, for example, disposed on the primary side of the opening and closing portions 61-63.

[0232] The pressure regulating mechanism 73 is, for example, disposed in the flow path between the processing housing 23 and the switching mechanism 51. The pressure regulating mechanism 73 is, for example, disposed inside the switching housing 53 (i.e., the switching space 54). The pressure regulating mechanism 73 is, for example, disposed in the introduction portion 55. The pressure regulating mechanism 73 is, for example, disposed on the primary side of the distribution portion 56. The pressure regulating mechanism 73 is, for example, disposed on the primary side of the opening and closing portions 61-63. The pressure regulating mechanism 73 is, for example, disposed in the vicinity of the pressure sensor 71. The pressure regulating mechanism 73 is, for example, disposed on the secondary side (downstream side) of the pressure sensor 71. The pressure regulating mechanism 73 is, for example, disposed on the primary side of the pressure sensor 71.

[0233] The pressure regulating mechanism 73 may also regulate the pressure of the gas by regulating the flow rate of the gas, for example. The pressure regulating mechanism 73 is, for example, a damper or a fan.

[0234] also, Figure 7 The pressure sensor 71 and the pressure adjustment mechanism 73 are omitted in the figure.

[0235] Reference Figure 3 , 4 5. The exhaust pipes 81-83 are respectively arranged at a position higher than the processing housing 23. Each exhaust pipe 81 is connected to the two exhaust pipes 41 at a position higher than the processing housing 23. Each exhaust pipe 82 is connected to the two exhaust pipes 42 at a position higher than the processing housing 23. Each exhaust pipe 83 is connected to the two exhaust pipes 43 at a position higher than the processing housing 23.

[0236] The exhaust pipes 41-43 extend to a position higher than the processing housing 23. The gas flows upward in the exhaust pipes 41-43. The exhaust pipes 41-43 have lower ends. The lower ends of the exhaust pipes 41-43 are closed.

[0237] Reference Figure 3 . Exhaust pipes 81A-83A are arranged above the processing housings 23A and 23B. Exhaust pipes 81A-83A are arranged in the width direction Y. Exhaust pipes 81A-83A are arranged at the same height position. Exhaust pipes 81B-83B are arranged above the processing housings 23C and 23D. Exhaust pipes 81B-83B are arranged in the width direction Y. Exhaust pipes 81B-83B are arranged at the same height position. Exhaust pipes 81B-83B are arranged at the same height position as exhaust pipes 81A-83A.

[0238] Fig.10 1 is a top view showing the upper part of the process module 11. The exhaust pipes 81A-83A and 81B-83B extend in the front-rear direction X. The exhaust pipes 81A-83A have the same length. The exhaust pipes 81B-83B have the same length. The exhaust pipes 81B-83B are shorter than the exhaust pipes 81A-83A.

[0239] The exhaust pipes 81A, 82A, and 83A have front ends 81Af, 82Af, and 83Af, respectively. The exhaust pipes 81B, 82B, and 83B have front ends 81Bf, 82Bf, and 83Bf, respectively. The front ends 81Af to 83Af are arranged in front of the front ends 81Bf to 83Bf. The front ends 81Af to 83Af are arranged in the rear of the transfer conveyor 3.

[0240] The exhaust pipe 81 extends to a position behind the processing module 11 and is connected to the first exhaust treatment device not shown in the figure. The first exhaust treatment device recovers gas from the exhaust pipe 81. Similarly, the exhaust pipes 82 and 83 extend to a position behind the processing module 11 and are connected to the second and third exhaust treatment devices not shown in the figure. The second and third exhaust treatment devices recover gas from the exhaust pipes 82 and 83, respectively. The first to third exhaust treatment devices are all external elements of the substrate processing apparatus 1. The first to third exhaust treatment devices are respectively installed in, for example, a factory where the substrate processing apparatus 1 is installed.

[0241] The gas flows backward in the exhaust pipes 81 to 83. The front ends 81Af to 83Af and 81Bf to 83Bf correspond to the upstream ends of the exhaust pipes 81A to 83A and 81B to 83B, respectively.

[0242] The front ends 81Af to 83Af, 81Bf to 83Bf are open to the outside of the substrate processing apparatus 1. For example, the front ends 81Af to 83Af, 81Bf to 83Bf are open to a clean room in which the substrate processing apparatus 1 is installed.

[0243] The pressure sensor 84 is provided in the exhaust pipe 81. The pressure sensor 84 is provided downstream of the connection position between the exhaust pipe 81 and the exhaust pipe 41. For example, the pressure sensor 84A is provided downstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A, and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. The pressure sensor 84A is provided rearward of the connection position between the exhaust pipe 81A and the exhaust pipe 41A, and the connection position between the exhaust pipe 81A and the exhaust pipe 41B.

[0244] Likewise, pressure sensors 85 and 86 are provided in the exhaust pipes 82 and 83 , respectively.

[0245] The pressure regulating mechanism 87 is arranged in the exhaust pipe 81. The pressure regulating mechanism 87 is arranged upstream of the pressure sensor 84. The pressure regulating mechanism 87 is arranged upstream of the connection position of the exhaust pipe 81 and the exhaust pipe 41. For example, the pressure regulating mechanism 87A is arranged upstream of the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. The pressure regulating mechanism 87A is arranged in front of the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. The pressure regulating mechanism 87A is arranged at the front end 81A1 of the exhaust pipe 81A. The pressure regulating mechanism 87A adjusts the flow rate of the gas flowing into the exhaust pipe 81A from the outside of the substrate processing device 1 through the front end 81A1 of the exhaust pipe 81A.

[0246] Similarly, pressure regulating mechanisms 88 and 89 are provided in the exhaust pipes 82 and 83 , respectively.

[0247] The pressure regulating mechanism 87-89 can also adjust the pressure of the gas by adjusting the flow rate of the gas, for example. The pressure regulating mechanism 87-89 is, for example, a damper or a fan.

[0248] <Control of Substrate Processing Apparatus 1>

[0249] Reference Figure 1 The substrate processing apparatus 1 includes a control unit 91 . The control unit 91 is provided in the transfer conveyor unit 3 , for example. The control unit 91 controls the substrate processing apparatus 1 .

[0250] Fig.11 1 is a control block diagram of the substrate processing device 1. The control unit 91 controls the conveying mechanism 6, 16. Specifically, the control unit 91 controls the hand drive unit 8, 18. The control unit 91 controls the processing unit 21. Specifically, the control unit 91 controls the holding unit 31, the rotation drive unit 32, the liquid supply unit 33, the support cup 38 and the blowing unit 39. The control unit 91 controls the switching mechanism 51. Specifically, the control unit 91 controls the opening and closing units 61-63. The control unit 91 obtains the detection results of the pressure sensors 71, 84, 85, 86. The control unit 91 controls the pressure adjustment mechanisms 73, 87, 88, 89. The control unit 91 is connected to these elements so as to be communicable.

[0251] The control unit 91 is implemented by a central processing unit (CPU) that executes various processes, a RAM (Random-Access Memory) that serves as a work area for the calculation process, a storage medium such as a hard disk, and the like. The storage medium stores various information in advance. The storage medium stores, for example, information (processing scheme) that specifies the operating conditions related to the processing performed by each processing unit 21. The storage medium stores, for example, information on the operating conditions related to the switching of the exhaust passage by the switching mechanism 51. The storage medium stores information on the operating conditions related to the adjustment of the exhaust pressure by the pressure adjustment mechanism 73, 87-89.

[0252] Here, the processing housing 23A2 is an example of the second processing housing in the present invention. The holding portion 32 of the processing unit 21A2 is an example of the second holding portion in the present invention. The liquid supply portion 33 of the processing unit 21A2 is an example of the second liquid supply portion in the present invention. The switching mechanism 51A2 is an example of the second switching mechanism in the present invention.

[0253] The pressure sensor 71A1 is an example of the first pressure sensor in the present invention. The pressure sensor 71B1 is an example of the third pressure sensor in the present invention. The pressure regulating mechanism 73A1 is an example of the first pressure regulating mechanism in the present invention. The pressure regulating mechanism 73B1 is an example of the third pressure regulating mechanism in the present invention.

[0254] The exhaust pipe 81A is an example of the fifth exhaust pipe in the present invention. The exhaust pipe 82A is an example of the sixth exhaust pipe in the present invention. The pressure sensor 84A is an example of the fifth pressure sensor in the present invention. The pressure sensor 85A is an example of the sixth pressure sensor in the present invention. The pressure regulating mechanism 87A is an example of the fifth pressure regulating mechanism in the present invention. The pressure regulating mechanism 88A is an example of the sixth pressure regulating mechanism in the present invention.

[0255] <Operation Example of Substrate Processing Apparatus 1>

[0256] Fig.12 1 is a flowchart showing the steps of the operation of processing the substrate W. An operation example related to one processing unit 21 will be described. It is assumed that the substrate W is already held by the holding portion 31 . Each element operates according to the control of the control portion 91 .

[0257] 《Step S1》

[0258] The liquid supply unit 33 supplies the first processing liquid. Specifically, the nozzle 34A moves from the retreat position to the processing position. The nozzle 34A supplies the first processing liquid to the substrate W held by the holding unit 31. The gas in the processing housing 23 contains a component derived from the first processing liquid.

[0259] The switching mechanism 51 switches the exhaust passage of the processing housing 23 to the exhaust pipe 41. Specifically, the switching mechanism 51 connects the processing housing 23 to the exhaust pipe 41. The gas flows from the processing housing 23 to the exhaust pipe 41 via the switching mechanism 51. The exhaust pipe 41 exhausts the gas of the processing housing 23. The gas further flows from the exhaust pipe 41 to the exhaust pipe 81. The exhaust pipe 81 exhausts the gas from the exhaust pipe 41.

[0260] Furthermore, when step S1 is executed, at least one of the exhaust pipes 42 and 43 may exhaust the gas of the other process housing 23. The same is true in steps S2 and S3 described below.

[0261] The pressure sensor 71 measures the gas pressure on the primary side of the switching mechanism 51. The pressure regulating mechanism 73 regulates the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0262] The following illustrates more detailed actions of the pressure regulating mechanism 73. Similarly in the following steps S2 and S3, the pressure regulating mechanism 73 may also perform the following action examples. Each pressure regulating mechanism 73 is adjusted, for example, in such a manner as to make the exhaust pressure constant. Each pressure regulating mechanism 73 is adjusted, for example, in such a manner as to make the detection result of the pressure sensor 71 constant. The pressure regulating mechanisms 73A1 and 73A2, for example, make the gas pressure on the primary side of the switching mechanism 51A1 and the gas pressure on the primary side of the switching mechanism 51A2 equal to each other. The pressure regulating mechanisms 73A1-73A6, for example, make the gas pressure on the primary side of the switching mechanisms 51A1-51A6 equal to each other. The pressure regulating mechanisms 73A1 and 73B1, for example, make the gas pressure on the primary side of the switching mechanism 51A1 and the gas pressure on the primary side of the switching mechanism 51B1 equal to each other. The pressure regulating mechanisms 73A1, 73B1, 73C1, and 73D1 make the gas pressures on the primary sides of the switching mechanisms 51A1, 51B1, 51C1, and 51D1 equal, for example. The pressure regulating mechanism 73 makes the gas pressures on the primary sides of the switching mechanisms 51 equal, for example.

[0263] The pressure sensors 84 to 86 measure the gas pressure inside the exhaust pipes 81 to 83, respectively. The pressure adjustment mechanisms 87 to 89 adjust the gas pressure inside the exhaust pipes 81 to 83, respectively, based on the detection results of the pressure sensors 84 to 86.

[0264] The following illustrates more detailed actions of the pressure adjustment mechanisms 87-89. In addition, in the following steps S2 and S3, the pressure adjustment mechanisms 87-89 can also perform the following action examples. Each pressure adjustment mechanism 87-89 is adjusted in a manner such as to make the exhaust pressure constant. For example, the pressure adjustment mechanism 87A is adjusted in a manner such that the detection result of the pressure sensor 84A is constant. The pressure adjustment mechanisms 87A-89A, for example, make the gas pressure inside the exhaust pipe 81A, the gas pressure inside the exhaust pipe 82B, and the gas pressure inside the exhaust pipe 83A equal to each other. The pressure adjustment mechanisms 87A and 87B, for example, make the gas pressure inside the exhaust pipe 81A equal to the gas pressure inside the exhaust pipe 81B. The pressure adjustment mechanisms 87A-89A and 87B-89B, for example, make the gas pressures inside the exhaust pipes 81A-83A and 81B-83B equal.

[0265] 《Step S2》

[0266] The liquid supply unit 33 supplies the second processing liquid. Specifically, the nozzle 34A moves from the processing position to the retreat position, and the nozzle 34B moves from the retreat position to the processing position. The nozzle 34B supplies the second processing liquid to the substrate W held by the holding unit 31. The gas in the processing housing 23 contains components derived from the second processing liquid.

[0267] The switching mechanism 51 switches the exhaust passage of the processing housing 23 to the exhaust pipe 42. Specifically, the switching mechanism 51 connects the processing housing 23 to the exhaust pipe 42. The gas flows from the processing housing 23 into the exhaust pipe 42 via the switching mechanism 51. The exhaust pipe 42 exhausts the gas from the processing housing 23. The gas further flows from the exhaust pipe 42 into the exhaust pipe 82. The exhaust pipe 82 exhausts the gas from the exhaust pipe 42.

[0268] The pressure sensor 71 measures the gas pressure on the primary side of the switching mechanism 51. The pressure regulating mechanism 73 regulates the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0269] The pressure sensors 84 to 86 measure the gas pressure inside the exhaust pipes 81 to 83, respectively. The pressure adjustment mechanisms 87 to 89 adjust the gas pressure inside the exhaust pipes 81 to 83, respectively, based on the detection results of the pressure sensors 84 to 86.

[0270] 《Step S3》

[0271] The liquid supply unit 33 supplies the third processing liquid. Specifically, the nozzle 34B moves from the processing position to the retreat position, and the nozzle 34C moves from the retreat position to the processing position. The nozzle 34C supplies the third processing liquid to the substrate W held by the holding unit 31. The gas in the processing housing 23 contains components derived from the third processing liquid.

[0272] The switching mechanism 51 switches the exhaust passage of the processing housing 23 to the exhaust pipe 43. Specifically, the switching mechanism 51 connects the processing housing 23 to the exhaust pipe 43. The gas flows from the processing housing 23 to the exhaust pipe 43 via the switching mechanism 51. The exhaust pipe 43 exhausts the gas of the processing housing 23. The gas further flows from the exhaust pipe 43 to the exhaust pipe 83. The exhaust pipe 83 exhausts the gas from the exhaust pipe 43.

[0273] The pressure sensor 71 measures the gas pressure on the primary side of the switching mechanism 51. The pressure regulating mechanism 73 regulates the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0274] The pressure sensors 84 to 86 measure the gas pressure inside the exhaust pipes 81 to 83, respectively. The pressure adjustment mechanisms 87 to 89 adjust the gas pressure inside the exhaust pipes 81 to 83, respectively, based on the detection results of the pressure sensors 84 to 86.

[0275] <Effects of Implementation Methods>

[0276] As described above, according to the substrate processing apparatus 1 , the switching mechanism 51 is disposed at substantially the same height as the processing housing 23 , so that the flow path between the switching mechanism 51 and the processing housing 23 can be appropriately shortened. As a result, gas can be appropriately exhausted from the processing housing 23 .

[0277] Furthermore, the substrate processing apparatus 1 can obtain the following effects.

[0278] At least a portion of the switching mechanism 51 is disposed on the side of the processing housing 23. Therefore, the height of the processing housing 23 and the switching mechanism 51 as a whole can be suppressed. Therefore, the height of the substrate processing apparatus 1 can be suppressed to be low. Furthermore, the number of processing housings 23 arranged in the vertical direction Z can be easily increased. In this way, the enlargement of the substrate processing apparatus 1 can be suppressed, and the production capacity of the substrate processing apparatus 1 can be appropriately improved. Here, the "height" is the length in the vertical direction Z.

[0279] The upper end P1 of the switching mechanism 51 is equal to or lower than the upper end P2 of the processing housing 23. The lower end Q1 of the switching mechanism 51 is equal to or higher than the lower end Q2 of the processing housing 23. In this way, the switching mechanism 51 is configured as a whole at a position equal to or lower than the upper end P2 and equal to or higher than the lower end Q2. Therefore, the flow path between the switching mechanism 51 and the processing housing 23 can be appropriately shortened.

[0280] The switch housing 53 is arranged at a position equal to or lower than the upper surface 31a of the holding portion 31. Therefore, the size of the switch mechanism 51 is relatively small. Specifically, the height of the switch mechanism 51 is smaller than the height of the processing housing 23. Therefore, the size of the substrate processing apparatus 1 can be preferably suppressed.

[0281] The switching mechanism 51 is disposed at a position not overlapping with the holding portion 31 in a plan view. Therefore, interference between the holding portion 31 and the switching mechanism 51 can be easily avoided.

[0282] The distance from the center point G to the switching mechanism 51 in a plan view is greater than three times the radius of the substrate W. That is, the switching mechanism 51 is arranged in a region where the distance from the center point G in a plan view is greater than three times the radius of the substrate W. Therefore, interference between the holding portion 31 and the switching mechanism 51 can be reliably avoided.

[0283] The distance from the center point G to the switching mechanism 51 is smaller than 5 times the radius of the substrate W in a plan view. That is, the switching mechanism 51 is arranged in a region where the distance from the center point G is smaller than 5 times the radius of the substrate W in a plan view. Therefore, the flow path between the switching mechanism 51 and the processing housing 23 can be effectively shortened. Furthermore, the switching mechanism 51 is relatively small in a plan view. Therefore, the increase in the occupied area of ​​the substrate processing apparatus 1 can be appropriately suppressed.

[0284] The exhaust pipes 41 to 43 extend in the vertical direction Z. Therefore, the installation area of ​​the exhaust pipes 41 to 43 in a plan view can be appropriately reduced. Therefore, the increase in the occupied area of ​​the substrate processing apparatus 1 can be appropriately suppressed.

[0285] The substrate processing apparatus 1 includes a first pipe space 44. Therefore, exhaust pipes 41 to 43 can be appropriately provided.

[0286] The transport mechanism 16 transports the substrate W to the holding portion 31. The transport mechanism 16 is provided in the transport space 12. The transport space 12 is adjacent to the processing housing 23. Therefore, the transport mechanism 16 can easily transport the substrate W to the holding portion 31.

[0287] The substrate processing apparatus 1 includes a first pipe space 44. Therefore, exhaust pipes 41 to 43 can be appropriately provided.

[0288] The first pipe space 44 is adjacent to the process housing 23. Therefore, the exhaust pipes 41 to 43 can be provided near the process housing 23.

[0289] The transport space 12 extends in the front-rear direction X. The processing housing 23 and the first piping space 44 are arranged in the front-rear direction X. Therefore, the transport space 12 adjacent to the processing housing 23 and the first piping space 44 adjacent to the processing housing 23 can be appropriately arranged, respectively. Therefore, the transport mechanism 16 can be appropriately prevented from interfering with the exhaust pipes 41 to 43.

[0290] The first pipe space 44 and the process housing 23 are arranged in the front-rear direction X. The exhaust pipes 41 to 43 are arranged in the width direction Y. Therefore, the exhaust pipes 41 to 43 can be respectively provided near the process housing 23 .

[0291] At least a part of the switching mechanism 51 is disposed in the first pipe space 44. Therefore, the switching mechanism 51 can be disposed near the processing housing 23. Furthermore, the switching mechanism 51 can be easily connected to the exhaust pipes 41-43.

[0292] The switching mechanism 51 includes opening and closing parts 61, 62, and 63. The opening and closing part 61 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 41, and a position where the processing housing 23 is blocked from the exhaust pipe 41. The opening and closing part 62 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 42, and a position where the processing housing 23 is blocked from the exhaust pipe 42. The opening and closing part 63 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 43, and a position where the processing housing 23 is blocked from the exhaust pipe 43. The opening and closing parts 61, 62, and 63 can move independently of each other. Therefore, the switching mechanism 51 can connect the exhaust pipes 41-43 to the processing housing 23 individually. The switching mechanism 51 can block the exhaust pipes 41-43 from the processing housing 23 individually.

[0293] The switching mechanism 51 includes a switching housing 53. The switching housing 53 is connected to the processing housing 23. The switching housing 53 accommodates the opening and closing parts 61 to 63. Therefore, the switching housing 53 can appropriately form a flow path from the processing housing 23 to the opening and closing parts 61 to 63.

[0294] The switch housing 53 is connected to the process housing 23 and the exhaust pipe 41. Therefore, the switch housing 53 can appropriately form a flow path from the process housing 23 to the exhaust pipe 41. Furthermore, the switch housing 53 is connected to the exhaust pipes 42 and 43. Therefore, the switch housing 53 can appropriately form a flow path from the process housing 23 to the exhaust pipes 42 and 43.

[0295] The opening and closing parts 61 to 63 are provided in one switching housing 53. Therefore, the flow path from the processing housing 23 to the opening and closing parts 61 to 63 can be further shortened.

[0296] The opening and closing parts 61-63 are arranged in one switching space 54. Therefore, the opening and closing parts 61-63 can open and close the openings 41k-43k of the exhaust pipes 41-43 under the same conditions. Therefore, the conditions for exhausting the gas from the processing housing 23 can be easily made equal between the exhaust pipes 41-43. For example, the uneven exhaust pressure between the exhaust pipes 41-43 can be suppressed. For example, the uneven exhaust flow rate between the exhaust pipes 41-43 can be suppressed. Therefore, the quality of the processing of the substrate W in the processing housing 23 can be appropriately improved.

[0297] The switch housing 53 includes an introduction portion 55. The introduction portion 55 is connected to the process housing 23. Therefore, the gas can be easily introduced from the process housing 23 into the switch housing 53.

[0298] The introduction section 55 extends in the front-rear direction X. As described above, the transport space 12 extends in the front-rear direction X. Therefore, the transport space 12 adjacent to the processing housing 23 and the introduction section 55 connected to the processing housing 23 can be appropriately arranged. Therefore, the transport mechanism 16 and the introduction section 55 can be appropriately prevented from interfering with each other.

[0299] The switch housing 53 is provided with a distribution portion 56. The distribution portion 56 is connected to the introduction portion 55. The distribution portion 56 is connected to the exhaust pipes 41 to 43. Therefore, the gas can be easily discharged from the switch housing 53 to the exhaust pipes 41 to 43.

[0300] The distribution part 56 is connected to the exhaust pipes 41 to 43. The distribution part 56 accommodates the opening and closing parts 61 to 63. Therefore, the switching mechanism 51 can easily switch the exhaust passage of the processing housing 23 between the exhaust pipes 41 to 43.

[0301] The distribution portion 56 extends in the width direction Y. As described above, the exhaust pipes 41 to 43 are arranged in the width direction Y. Thus, the distribution portion 56 extends in a direction parallel to the direction in which the exhaust pipes 41 to 43 are arranged. Therefore, the distribution portion 56 can be easily connected to the exhaust pipes 41 to 43.

[0302] The introduction portion 55 is arranged at a position relatively close to the transport space 12. Specifically, in a top view, the distance between the introduction portion 55 and the transport space 12 is smaller than the distance between the holding portion 31 and the transport space 12. Therefore, it is easy to prevent the introduction portion 55 from interfering with the components (for example, the base portions 37A-37C) disposed in the processing housing 23. Therefore, the gas can be smoothly introduced from the processing housing 23 to the introduction portion 55. For example, it is possible to appropriately avoid the airflow entering the introduction portion 55 from the processing housing 23 from being disturbed by the components disposed in the processing housing 23.

[0303] The gas supply pipe 48 supplies gas to the process housing 23. The second pipe space 46 accommodates the gas supply pipe 48. The second pipe space 46 is adjacent to the process housing 23. Therefore, the gas supply pipe 48 can easily supply gas to the process housing 23.

[0304] The first piping space 44A, the processing housing 23A, and the second piping space 46 are arranged in sequence in the front-rear direction X. Therefore, the first piping space 44 and the second piping space 46 are separated by the processing housing 23. Therefore, the arrangement of the exhaust pipes 41-43 is not restricted by the air supply pipe 48. That is, the arrangement freedom of the exhaust pipes 41-43 can be appropriately improved. For example, the exhaust pipes 41-43 can be easily arranged near the processing housing 23.

[0305] The processing housing 23A is used as an example for explanation. The substrate processing apparatus 1 includes a processing housing 23A2. The processing housing 23A2 is disposed below the processing housing 23A1. Therefore, the installation area of ​​the processing housings 23A1 and 23A2 in a plan view can be appropriately reduced. Therefore, the increase in the occupied area of ​​the substrate processing apparatus 1 can be appropriately suppressed.

[0306] The substrate processing apparatus 1 includes a switching mechanism 51A2. The switching mechanism 51A2 switches the exhaust passage of the processing housing 23A2 to one of the exhaust pipes 41A-43A. Therefore, the exhaust pipes 41A-43A exhaust the gas of the processing housing 23A2 in addition to exhausting the gas of the processing housing 23A1. Therefore, the structure of the substrate processing apparatus 1 can be simplified.

[0307] The switching mechanism 51A2 is disposed at substantially the same height as the processing housing 23A2. Therefore, the flow path between the processing housing 23A2 and the switching mechanism 51A2 can be appropriately shortened. As a result, the gas can be appropriately exhausted from the processing housing 23A2.

[0308] The processing housing 23A2 is arranged at the same position as the processing housing 23A1 when viewed from above. The switching mechanism 51A2 is arranged at the same position as the switching mechanism 51A1 when viewed from above. Therefore, the relative position of the processing housing 23A2 and the switching mechanism 51A2 is substantially the same as the relative position of the processing housing 23A1 and the switching mechanism 51A1. Therefore, the flow path between the processing housing 23A2 and the switching mechanism 51A2 and the flow path between the processing housing 23A1 and the switching mechanism 51A1 have the same length and the same shape. Therefore, the exhaust gas conditions between the processing housings 23A1 and 23A2 can be easily made equal. For example, the uneven exhaust pressure between the processing housings 23A1 and 23A2 can be suppressed. For example, the uneven exhaust flow rate between the processing housings 23A1 and 23A2 can be suppressed. As a result, the quality of the processing performed on the substrate W between the processing housings 23A1 and 23A2 can be appropriately made equal.

[0309] The switching mechanism 51A2 is arranged at the same position as the switching mechanism 51A1 in a plan view. The exhaust pipe 41A extends in the vertical direction Z. Therefore, the switching mechanisms 51A1 and 51A2 can be easily connected to the exhaust pipe 41A, respectively. Similarly, the exhaust pipes 42A and 43A extend in the vertical direction Z, respectively. Therefore, the switching mechanisms 51A1 and 51A2 can be easily connected to the exhaust pipes 42A and 43A, respectively.

[0310] Similarly, the substrate processing apparatus 1 includes processing housings 23A3 to 23A6. The processing housings 23A3 to 23A6 are respectively arranged below the processing housing 23A1. Therefore, it is possible to more preferably suppress an increase in the occupied area of ​​the substrate processing apparatus 1.

[0311] The substrate processing apparatus 1 includes switching mechanisms 51A3-51A6. The switching mechanisms 51A3-51A6 switch the exhaust passages of the processing housings 23A3-23A6 to one of the exhaust pipes 41A-43A, respectively. Therefore, the exhaust pipes 41A-43A exhaust the gas of the processing housings 23A1-23A6, respectively. Therefore, the structure of the substrate processing apparatus 1 can be further simplified.

[0312] The processing housings 23A3-23A6 are arranged at the same position as the processing housing 23A1 in a plan view. The switching mechanisms 51A3-51A6 are arranged at the same position as the switching mechanism 51A1 in a plan view. Therefore, the relative positions of the processing housings 23A3-23A6 and the switching mechanisms 51A3-51A6 are substantially the same as the relative positions of the processing housing 23A1 and the switching mechanism 51A1. As a result, the quality of the processing performed on the substrate W can be appropriately made equal between the processing housings 23A1-23A6.

[0313] The switching mechanisms 51A3 to 51A6 are respectively arranged at the same positions as the switching mechanism 51A1 in a plan view. The exhaust pipes 41A to 43A respectively extend in the vertical direction Z. Therefore, the switching mechanisms 51A3 to 51A6 can be easily connected to the exhaust pipes 41A to 43A respectively.

[0314] The pressure sensor 71 measures the gas pressure on the primary side of the switching mechanism 51. The pressure adjustment mechanism 73 adjusts the gas pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71. Therefore, the pressure on the primary side of the switching mechanism 51 can be appropriately adjusted. Therefore, the quality of the processing of the substrate W in the processing housing 23 can be appropriately improved.

[0315] The pressure adjustment mechanism 73 adjusts the exhaust pressure to be constant, for example. This can suppress the exhaust pressure from fluctuating when the substrate W is processed in the processing housing 23. Therefore, the quality of processing the substrate W in the processing housing 23 can be appropriately improved.

[0316] The pressure adjustment mechanisms 73A1 and 73A2, for example, make the gas pressure on the primary side of the switching mechanism 51A1 and the gas pressure on the primary side of the switching mechanism 51A2 equal. Thus, the exhaust pressure when the substrate W is processed in the processing housing 23A1 and the exhaust pressure when the substrate W is processed in the processing housing 23A2 can be appropriately equalized. Therefore, the quality of processing on the substrate W can be appropriately equalized between the processing housings 23A1 and 23A2 arranged in the vertical direction Z.

[0317] The pressure adjustment mechanisms 73A1-73A6 make the gas pressures on the primary sides of the switching mechanisms 51A1-51A6 equal to each other, for example. This can appropriately make the quality of processing on the substrate W equal among all the processing housings 23A1-23A6 arranged in the vertical direction Z.

[0318] The pressure adjustment mechanisms 73A1 and 73B1 make the gas pressure on the primary side of the switching mechanism 51A1 and the gas pressure on the primary side of the switching mechanism 51B1 equal, for example, so that the quality of processing on the substrate W can be made equal between the processing housings 23A1 and 23B1 arranged at the same height.

[0319] The pressure adjustment mechanisms 73A1, 73B1, 73C1, and 73D1 make the gas pressures on the primary sides of the switching mechanisms 51A1, 51B1, 51C1, and 51D1 equal, so that the quality of processing on the substrate W can be made equal among all the processing housings 23A1, 23B1, 23C1, and 23D1 arranged at the same height.

[0320] The pressure adjustment mechanism 73 makes the gas pressures on the primary sides of the switching mechanisms 51 equal, for example. This makes it possible to appropriately make the quality of the processing performed on the substrate W equal among all the processing housings 23 .

[0321] The exhaust pipe 81A is connected to the exhaust pipes 41A and 41B. The exhaust pipe 81A exhausts gas from the exhaust pipes 41A and 41B. In this way, the two exhaust pipes 41A and 41B are connected to one exhaust pipe 81A. Therefore, the structure of the substrate processing apparatus 1 can be simplified.

[0322] Likewise, exhaust pipe 82A is connected to exhaust pipes 42A and 42B. Exhaust pipe 82A exhausts gas from exhaust pipes 42A and 42B. Exhaust pipe 83A is connected to exhaust pipes 43A and 43B. Exhaust pipe 83A exhausts gas from exhaust pipes 43A and 43B. Therefore, the structure of substrate processing apparatus 1 can be further simplified.

[0323] The pressure sensor 84 measures the gas pressure inside the exhaust pipe 81. The pressure adjustment mechanism 87 adjusts the gas pressure inside the exhaust pipe 81 based on the detection result of the pressure sensor 84. Therefore, the pressure inside the exhaust pipe 81 can be appropriately adjusted. Therefore, the quality of the processing of the substrate W in the processing housing 23 can be further appropriately improved.

[0324] Similarly, the pressure sensors 85 and 86 measure the gas pressure inside the exhaust pipes 82 and 83. The pressure adjustment mechanisms 88 and 89 adjust the gas pressure inside the exhaust pipes 82 and 83 based on the detection results of the pressure sensors 85 and 86. Therefore, the pressure inside the exhaust pipes 82 and 83 can be appropriately adjusted. Therefore, the quality of the processing of the substrate W in the processing housing 23 can be appropriately improved.

[0325] The exhaust pipe 81A is used as an example for explanation. The pressure sensor 84A is disposed downstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. Both the gas from the exhaust pipe 41A and the gas from the exhaust pipe 41B flow downstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. Therefore, the pressure sensor 84A can appropriately detect the exhaust pressure of the exhaust pipes 41A and 41B as a whole.

[0326] Similarly, the pressure sensor 85A is disposed downstream of the connection position between the exhaust pipe 82A and the exhaust pipe 42A, and the connection position between the exhaust pipe 82A and the exhaust pipe 42B. Therefore, the pressure sensor 85A can appropriately detect the exhaust pressure of the exhaust pipes 42A and 42B as a whole. The pressure sensor 86A is disposed downstream of the connection position between the exhaust pipe 83A and the exhaust pipe 43A, and the connection position between the exhaust pipe 83A and the exhaust pipe 43B. Therefore, the pressure sensor 86A can appropriately detect the exhaust pressure of the exhaust pipes 43A and 43B as a whole.

[0327] For example, the pressure adjustment mechanism 87 is adjusted so that the exhaust pressure is constant. Similarly, the pressure adjustment mechanisms 88 and 89 are adjusted so that the exhaust pressure is constant. Thus, when the substrate W is processed in the processing housing 23, the exhaust pressure fluctuation can be suppressed. Therefore, the quality of the processing of the substrate W in the processing housing 23 can be appropriately improved.

[0328] The pressure adjustment mechanisms 87A to 89A, for example, make the gas pressure inside the exhaust pipe 81A, the gas pressure inside the exhaust pipe 82A, and the gas pressure inside the exhaust pipe 83A equal. Thus, the exhaust pressures between the exhaust pipes 41A to 43A and 41B to 43B can be appropriately equalized. Therefore, when the exhaust passages of the processing housings 23A and 23B are switched, the exhaust pressure fluctuation can be suppressed. Therefore, the quality of the processing of the substrate W in the processing housings 23A and 23B can be appropriately improved.

[0329] The pressure adjustment mechanisms 87A and 87B, for example, make the gas pressure inside the exhaust pipe 81A equal to the gas pressure inside the exhaust pipe 81B. Thus, even if the exhaust pipes 81A and 81B have different lengths, it is possible to suppress the occurrence of uneven exhaust pressure between the exhaust pipes 81A and 81B. Therefore, the exhaust pressure between the exhaust pipes 41A and 41B and the exhaust pipes 41C and 41D can be made equal. Therefore, the quality of processing performed on the substrate W between the processing housings 23A and 23B and the processing housings 23C and 23D can be appropriately made equal.

[0330] The pressure adjustment mechanisms 87A-89A and 87B-89B make the gas pressures inside the exhaust pipes 81A-83A and 81B-83B equal, for example. Thus, even if the exhaust pipes 81A-83A and 81B-83B have different lengths, it is possible to suppress the occurrence of uneven exhaust pressures between the exhaust pipes 81A-83A and 81B-83B. Therefore, the exhaust pressures between the exhaust pipes 41A-43A, 41B-43B, 41C-43C, and 41D-43D can be made equal. Therefore, the quality of processing on the substrate W can be made more appropriately equal between the processing housings 23A, 23B, 23C, and 23D.

[0331] The liquid supply part 33 can supply the first treatment liquid, the second treatment liquid and the third treatment liquid. The liquid supply part 33 switches the treatment liquid to be supplied between the first treatment liquid, the second treatment liquid and the third treatment liquid. According to the switching of the treatment liquid to be used in the treatment shell 23, the switching mechanism 51 switches the exhaust passage of the treatment shell 23 between the exhaust pipes 41-43. When the liquid supply part 33 supplies the first treatment liquid, the switching mechanism 51 switches the exhaust passage of the treatment shell 23 to the exhaust pipe 41. When the liquid supply part 33 supplies the second treatment liquid, the switching mechanism 51 switches the exhaust passage of the treatment shell 23 to the exhaust pipe 42. When the liquid supply part 33 supplies the third treatment liquid, the switching mechanism 51 switches the exhaust passage of the treatment shell 23 to the exhaust pipe 43. As a result, when the liquid supply part 33 supplies the first treatment liquid, the exhaust pipe 41 discharges the gas of the treatment shell 23. When the liquid supply part 33 supplies the second treatment liquid or the third treatment liquid, the exhaust pipe 41 does not discharge the gas of the treatment shell 23. Therefore, the contamination inside the exhaust pipe 41 can be appropriately suppressed. For the same reason, the contamination inside the exhaust pipes 42 and 43 can also be appropriately suppressed. Therefore, the gas flows smoothly in the exhaust pipes 41 to 43. As a result, the gas in the processing housing 23 can be discharged more appropriately.

[0332] Furthermore, it is possible to appropriately suppress contamination of the inside of the exhaust pipes 81 to 83. Therefore, the gas flows smoothly in the exhaust pipes 81 to 83. As a result, the gas in the processing housing 23 can be discharged more appropriately.

[0333] The present invention is not limited to the embodiments, and can be implemented with modifications as described below.

[0334] In an embodiment, the switching mechanism 51 switches the exhaust passage of the gas in the processing shell 23 to one of the exhaust pipes 41-43. That is, the switching mechanism 51 switches between three exhaust pipes (specifically, exhaust pipes 41-43). However, it is not limited to this. The switching mechanism 51 may also switch between two exhaust pipes. For example, the exhaust pipe 43 may also be omitted. In this case, the switching mechanism 51 switches the exhaust passage of the processing shell 23 to one of the exhaust pipes 41 and 42. The switching mechanism 51 switches the exhaust passage of the processing shell 23 between the exhaust pipes 41 and 42. The switching mechanism 51 may also switch between more than four exhaust pipes. For example, the substrate processing device 1 may also have an additional exhaust pipe in addition to the exhaust pipes 41-43. In this case, the switching mechanism 51 switches the exhaust passage of the processing shell 23 to one of the exhaust pipes 41-43 and the additional exhaust pipe. The switching mechanism 51 switches the exhaust passage of the processing shell 23 between the exhaust pipes 41-43 and the additional exhaust pipe.

[0335] In the embodiment, the exhaust pipes 41 to 43 are disposed between the processing housing 23 and the distribution unit 56 in a plan view. However, the present invention is not limited thereto. The distribution unit 56 may be disposed between the exhaust pipes 41 to 43 and the processing housing 23 in a plan view.

[0336] Fig.13 2 is a plan view of the processing unit 21 in the modified embodiment. In addition, the same reference numerals are attached to the same components as those in the embodiment, and detailed descriptions thereof are omitted.

[0337] The substrate processing apparatus 1 includes a switching mechanism 101. The switching mechanism 101 includes a switching housing 103. The switching housing 103 includes a distribution unit 106. The distribution unit 106 is provided outside the processing housing 23. The distribution unit 106 is provided in the first piping space 44. The distribution unit 106 is connected to the processing housing 23. The distribution unit 106 is arranged between the processing housing 23 and the exhaust pipes 41-43 in a plan view. Specifically, the distribution unit 106 is connected to the side wall 25b of the processing housing 23. The distribution unit 106 is arranged between the side wall 25b and the exhaust pipes 41-43.

[0338] In the embodiment, a portion of the switching mechanism 51 (for example, the first end 55a) is arranged inside the processing housing 23. However, it is not limited to this. The switching mechanism 51 can also be arranged entirely outside the processing housing 23. Similarly, in the embodiment, a portion of the switching housing 53 (for example, the first end 55a) is arranged inside the processing housing 23. However, it is not limited to this. The switching housing 53 can also be arranged entirely outside the processing housing 23.

[0339] Reference Fig.13 . The switching mechanism 101 includes an introduction portion 105. The introduction portion 105 extends in the front-to-rear direction X. The introduction portion 105 has a first end 105a and a second end 105b. The first end 105a corresponds to the upstream end of the switching space 54. The first end 105a is arranged on the side wall 25b of the processing shell 23. The first end 105a is connected to the side wall 25b of the processing shell 23. The first end 105a is not arranged inside the processing shell 23. The second end 105b is arranged outside the processing shell 23. Therefore, the introduction portion 105 is arranged outside the processing shell 23 as a whole. As a result, the switching shell 103 is arranged outside the processing shell 23 as a whole. The switching mechanism 101 is arranged outside the processing shell 23 as a whole. Here, the outside of the processing shell 23 is specifically the first piping space 44.

[0340] In an embodiment, a portion of the switching mechanism 51 (for example, the first end 55a) is disposed inside the processing housing 23. However, this is not limited to this. The switching mechanism 51 may be entirely disposed inside the processing housing 23. Similarly, in an embodiment, a portion of the switching housing 53 is disposed inside the processing housing 23. However, this is not limited to this. The switching housing 53 may be entirely disposed inside the processing housing 23. In an embodiment, the opening and closing parts 61-63 are disposed outside the processing housing 23. However, this is not limited to this. The opening and closing parts 61-63 may be disposed inside the processing housing 23.

[0341] Fig.14 FIG. 2 is a top view of the processing unit 21 in the modified embodiment. In addition, the same symbols are used to mark the same components as those in the embodiment, and detailed description is omitted. Fig.14 The liquid supply unit 33 is schematically shown in FIG.

[0342] The exhaust pipes 41 to 43 are provided in the first pipe space 44. The openings k1 to k3 of the exhaust pipes 41 to 43 are respectively connected to the processing housing 23 (specifically, the side wall 25b).

[0343] The substrate processing apparatus 1 includes a switching mechanism 111. The switching mechanism 111 includes opening and closing parts 113, 114, and 115. The opening and closing parts 113-115 are respectively provided inside the processing housing 23. The opening and closing parts 113-115 are respectively provided near the side wall 25b. The opening and closing parts 113-115 are respectively arranged at positions facing the openings 41k-43k.

[0344] Each of the opening and closing parts 113 to 115 has the same structure as the opening and closing parts 61 to 63. The opening and closing part 113 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 41, and a position where the processing housing 23 is blocked from the exhaust pipe 41. The opening and closing part 114 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 42, and a position where the processing housing 23 is blocked from the exhaust pipe 42. The opening and closing part 115 can be moved to a position where the processing housing 23 is connected to the exhaust pipe 43, and a position where the processing housing 23 is blocked from the exhaust pipe 43.

[0345] In this way, the switching mechanism 111 is entirely disposed inside the processing housing 23 .

[0346] exist Fig.14 In the illustrated variation, the switching mechanism 111 may or may not include a switching housing. When the switching mechanism 111 includes a switching housing, the switching housing of the switching mechanism 111 may be entirely disposed inside the processing housing 23 .

[0347] In the embodiment, the switching mechanism 51 includes a switching housing 53. However, this is not limited to this. Fig.14 As illustrated in the modified embodiment, the switch housing 53 is appropriately omitted.

[0348] In the embodiment, the switching housing 53 is not connected to the cup 38. However, the present invention is not limited thereto. The switching housing 53 may be connected to the cup 38. The switching housing 53 may form a flow path from the inside of the cup 38 to the exhaust pipes 41-43.

[0349] In the embodiment, when the opening and closing portion 61 is in a position to connect the processing housing 23 to the exhaust pipe 41, the opening and closing portion 61 does not block the processing housing 23 from the exhaust pipes 42 and 43. However, it is not limited to this. When the opening and closing portion 61 is in a position to connect the processing housing 23 to the exhaust pipe 41, the opening and closing portion 61 may also block the processing housing 23 from the exhaust pipes 42 and 43. Similarly, in the embodiment, when the opening and closing portion 62 is in a position to connect the processing housing 23 to the exhaust pipe 42, the opening and closing portion 62 does not block the processing housing 23 from the exhaust pipe 43. However, it is not limited to this. When the opening and closing portion 62 is in a position to connect the processing housing 23 to the exhaust pipe 42, the opening and closing portion 62 may also block the processing housing 23 from the exhaust pipe 43.

[0350] Figure 1 5 is a plan view of a processing unit 21 in a modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted.

[0351] The substrate processing apparatus 1 includes a switching mechanism 121. The switching mechanism 121 includes opening and closing parts 123 and 124. The opening and closing parts 123 and 124 are provided inside the switching housing 53. That is, the opening and closing parts 123 and 124 are provided in the switching space 54. The opening and closing parts 123 and 124 are respectively arranged at positions opposite to the openings 41k and 42k. The opening and closing part 123 opens and closes the opening 41k. The opening and closing part 124 opens and closes the opening 42k. In addition, the switching mechanism 121 does not include a component corresponding to the opening and closing part 63.

[0352] The gas flows in one direction in the switching space 54. The gas flows from the introduction portion 55 to the distribution portion 56. The openings 41k, 42k, and 43k are respectively connected to the switching space 54. The position where the opening 42k is connected to the switching space 54 is further downstream than the position where the opening 41k is connected to the switching space 54. The position where the opening 43k is connected to the switching space 54 is further downstream than the position where the opening 42k is connected to the switching space 54.

[0353] Here, the switching space 54 is divided into a first area 126 , a second area 127 , and a third area 128 by virtual boundaries B1 and B2 . Figure 1 5 is illustrated by a single-point dashed line. Boundary B1 is located downstream of the position where the opening 41k is connected to the switching space 54, and upstream of the position where the opening 42k is connected to the switching space 54. Boundary B2 is located downstream of the position where the opening 42k is connected to the switching space 54, and upstream of the position where the opening 43k is connected to the switching space 54. The first area 126 is a portion of the switching space 54 that is located upstream of the boundary B1. The second area 127 is a portion of the switching space 54 that is located downstream of the boundary B1 and upstream of the boundary B2. The third area 128 is a portion of the switching space 54 that is located downstream of the boundary B2.

[0354] The opening and closing portion 123 can be moved to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is blocked from the exhaust pipe 41 . Fig.15 In FIG. 1 , the opening and closing portion 123 at a position where the processing housing 23 communicates with the exhaust pipe 41 is indicated by a solid line. Fig.15 In FIG. 1 , the opening and closing portion 123 at a position where the processing housing 23 is blocked from the exhaust pipe 41 is indicated by a dotted line.

[0355] When the opening and closing part 123 is in a position to connect the processing housing 23 to the exhaust pipe 41, the opening and closing part 123 opens the opening 41k and blocks the first area 126 from the second area 127. That is, when the opening and closing part 123 connects the processing housing 23 to the exhaust pipe 41, the opening and closing part 123 blocks the processing housing 23 from the exhaust pipes 42 and 43. When the opening and closing part 123 is in a position to block the processing housing 23 from the exhaust pipe 41, the opening and closing part 123 blocks the opening 41k and connects the first area 126 to the second area 127. That is, when the opening and closing part 123 blocks the processing housing 23 from the exhaust pipe 41, the opening and closing part 123 does not block the processing housing 23 from the exhaust pipes 42 and 43.

[0356] The opening and closing portion 124 is movable to a position where the process housing 23 communicates with the exhaust pipe 42 and a position where the process housing 23 is blocked from the exhaust pipe 42 . Fig.15 In FIG. 1 , the opening and closing portion 124 at a position where the processing housing 23 communicates with the exhaust pipe 42 is indicated by a solid line. Fig.15 In FIG. 1 , the opening and closing portion 124 at a position where the processing housing 23 is blocked from the exhaust pipe 42 is indicated by a dotted line.

[0357] When the opening and closing portion 124 is in a position to connect the processing housing 23 to the exhaust pipe 42, the opening and closing portion 124 opens the opening 42k and blocks the second region 127 from the third region 128. That is, when the opening and closing portion 124 connects the processing housing 23 to the exhaust pipe 42, the opening and closing portion 124 blocks the processing housing 23 from the exhaust pipe 43. When the opening and closing portion 124 is in a position to block the processing housing 23 from the exhaust pipe 42, the opening and closing portion 124 blocks the opening 42k and connects the second region 127 to the third region 128. That is, when the opening and closing portion 124 blocks the processing housing 23 from the exhaust pipe 42, the opening and closing portion 124 does not block the processing housing 23 from the exhaust pipe 43.

[0358] When the switching mechanism 121 switches the exhaust passage of the processing housing 23 to the exhaust pipe 41, the opening and closing portion 123 moves to a position where the processing housing 23 is connected to the exhaust pipe 41. The opening and closing portion 124 may also move to any one of a position where the processing housing 23 is connected to the exhaust pipe 42 and a position where the processing housing 23 is blocked from the exhaust pipe 42. In other words, the opening and closing portion 124 may open or close the opening 42k.

[0359] When the switching mechanism 121 switches the exhaust passage of the process housing 23 to the exhaust pipe 42, the opening and closing section 123 moves to a position blocking the process housing 23 from the exhaust pipe 41. The opening and closing section 124 moves to a position connecting the process housing 23 to the exhaust pipe 42.

[0360] When the switching mechanism 121 switches the exhaust passage of the process housing 23 to the exhaust pipe 43, the opening and closing section 123 moves to a position blocking the process housing 23 from the exhaust pipe 41. The opening and closing section 124 moves to a position blocking the process housing 23 from the exhaust pipe 42.

[0361] According to this modified embodiment, the component corresponding to the opening and closing portion 63 can be omitted. That is, the number of the opening and closing portions 123 and 124 is only one less than the number of the exhaust pipes 41 to 43. Therefore, the structure of the switching mechanism 121 can be simplified.

[0362] When the switching mechanism 121 switches the exhaust passage of the processing housing 23 to the exhaust pipe 41, the gas can be prevented from flowing into the second area 127 and the third area 128, and the gas can be appropriately prevented from stagnating in the second area 127 and the third area 128. Therefore, the gas in the processing housing 23 can be more appropriately exhausted.

[0363] When the switching mechanism 121 switches the exhaust passage of the processing housing 23 to the exhaust pipe 42, the gas can be prevented from flowing into the third area 128, and the gas can be preferably prevented from stagnating in the third area 128. Therefore, the gas in the processing housing 23 can be exhausted more appropriately.

[0364] In the embodiment, the rotation axis A1 of the opening and closing portion 61 passes through the first end of the opening and closing portion 61. However, the present invention is not limited thereto. The position of the rotation axis A1 of the opening and closing portion 61 may be changed as appropriate.

[0365] Fig.16 2 is a plan view of the processing unit 21 in the modified embodiment. In addition, the same reference numerals are attached to the same components as those in the embodiment, and detailed descriptions thereof are omitted.

[0366] The substrate processing apparatus 1 includes a switching mechanism 131. The switching mechanism 131 includes opening and closing parts 133 and 134. The opening and closing parts 133 and 134 are provided inside the switching housing 53. The opening and closing parts 133 and 134 are respectively arranged at positions facing the openings 41k and 42k. The opening and closing part 133 opens and closes the opening 41k. The opening and closing part 134 opens and closes the opening 42k. In addition, the switching mechanism 131 does not include a component corresponding to the opening and closing part 63.

[0367] The opening and closing portion 133 has a substantially T-shape in a plan view. The opening and closing portion 133 includes a plate portion 133a and a base portion 133b. The plate 133a has a substantially vertical flat plate shape. The base portion 133b is connected to the central portion of the plate portion 133a in a plan view. The base portion 133b protrudes horizontally from the plate portion 133a. The opening and closing portion 133 swings around a rotation axis A4. The rotation axis A4 is an imaginary line parallel to the vertical direction Z. The rotation axis A4 passes through the base portion 133b. The rotation axis A4 does not pass through the plate portion 133a. The opening and closing portion 133 swings around the rotation axis A4.

[0368] The opening and closing portion 134 has the same structure as the opening and closing portion 133. That is, the opening and closing portion 134 includes a plate portion 134a and a base portion 134b. The opening and closing portion 134 swings around the rotation axis A5.

[0369] The opening and closing portion 133 can be moved to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is blocked from the exhaust pipe 41 . Fig.16 In FIG. 1 , the opening and closing portion 133 at a position where the processing housing 23 communicates with the exhaust pipe 41 is indicated by a solid line. Fig.16 In FIG. 1 , the opening and closing portion 133 at a position where the processing housing 23 is blocked from the exhaust pipe 41 is indicated by a dotted line.

[0370] The opening and closing portion 134 is movable to a position where the process housing 23 communicates with the exhaust pipe 42 and a position where the process housing 23 is blocked from the exhaust pipe 42 . Fig.16 In FIG. 1 , the opening and closing portion 134 at a position where the processing housing 23 communicates with the exhaust pipe 42 is indicated by a dotted line. Fig.16 In FIG. 1 , the opening and closing portion 134 at a position where the processing housing 23 is blocked from the exhaust pipe 42 is indicated by a solid line.

[0371] The opening and closing parts 133 and 134 have Figure 1 5. For example, when the opening and closing portion 133 is in a position to connect the processing housing 23 to the exhaust pipe 41, the opening and closing portion 133 blocks the processing housing 23 from the exhaust pipes 42 and 43. When the opening and closing portion 134 is in a position to connect the processing housing 23 to the exhaust pipe 42, the opening and closing portion 134 blocks the processing housing 23 from the exhaust pipe 43.

[0372] In the embodiment, the liquid supply unit 33 supplies the first processing liquid, the second processing liquid, and the third processing liquid. That is, the liquid supply unit 33 can supply three types of processing liquids. However, it is not limited to this. The liquid supply unit 33 can supply less than three types of processing liquids. The liquid supply unit 33 can also supply more than three types of processing liquids.

[0373] For example, the liquid supply unit 33 may also be capable of supplying a fourth treatment liquid. The fourth treatment liquid is classified as a cleaning liquid, for example. The fourth treatment liquid includes at least one of pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water, and diluted hydrochloric acid water.

[0374] In the embodiment, the processing unit 21 may further include a processing gas supply unit. The processing gas supply unit is disposed inside the processing housing 23. The processing gas supply unit supplies processing gas to the substrate W held by the holding unit 31. The processing gas supply unit supplies at least one type of processing gas. The processing gas is, for example, a gas other than clean air.

[0375] When the processing unit 21 is provided with a processing gas supply unit, the switching mechanism 51 may also operate as described below. The switching mechanism 51 may also switch the exhaust passage of the processing housing 23 by switching between using and not using the processing gas in the processing housing 23. When the processing gas used in the processing housing 23 is switched between a plurality of processing gases, the switching mechanism 51 may also switch the exhaust passage of the processing housing 23 by switching between the types of processing gases. The switching mechanism 51 may also switch the exhaust passage of the processing housing 23 by switching between supplying a processing liquid and supplying a processing gas.

[0376] In the embodiment, the liquid supply unit 33 sequentially supplies the first processing liquid, the second processing liquid, and the third processing liquid to the substrate W held by the holding unit 31. However, the present invention is not limited thereto and the order of supplying the first processing liquid, the second processing liquid, and the third processing liquid may be changed as appropriate.

[0377] In the embodiment, the number of processing shells 23 arranged at substantially the same height position is 4. However, this is not limited to this. The number of processing shells 23 arranged at substantially the same height position may be less than 4 or more than 4. In the embodiment, the number of processing shells 23 arranged in the vertical direction Z is 6. However, this is not limited to this. The number of processing shells 23 arranged in the vertical direction Z may be less than 6 or more than 6.

[0378] In the embodiment, the substrate processing apparatus 1 has two transport spaces 12A and 12B. That is, the number of transport spaces 12 is 2. However, this is not limited to this. For example, the number of transport spaces 12 may be 1. For example, the transport space 12B may be omitted. For example, the number of transport spaces 12 may be 3 or more.

[0379] In the embodiment, the number of the conveying mechanisms 16 provided in one conveying space 12 is one. However, the present invention is not limited thereto. For example, the number of the conveying mechanisms 16 provided in one conveying space 12 may be two or more.

[0380] In the embodiment, the first piping space 44A is arranged in front of the processing housing 23A. The second piping space 46A is arranged behind the processing housing 23A. However, this is not limited to this. The relative positions of the processing housing 23A, the first piping space 44A and the second piping space 46A may be appropriately changed.

[0381] Fig.17 1 is a plan view showing the inside of a substrate processing apparatus 141 in a modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted.

[0382] In the substrate processing apparatus 141, the first piping space 44A is disposed at the rear of the processing housing 23A, and the second piping space 46A is disposed at the front of the processing housing 23A.

[0383] Furthermore, in the substrate processing apparatus 141, the first piping space 44B is arranged at the rear of the processing housing 23B. The second piping space 46B is arranged at the front of the processing housing 23B. The first piping space 44C is arranged at the front of the processing housing 23C. The second piping space 46C is arranged at the rear of the processing housing 23C. The first piping space 44D is arranged at the front of the processing housing 23D. The second piping space 46D is arranged at the rear of the processing housing 23D.

[0384] Similarly, in the substrate processing apparatus 141, the relative positions of the processing housing 23B, the first piping space 44B, and the second piping space 46B are the same as the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. The relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the same as the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. The relative positions of the processing housing 23D, the first piping space 44D, and the second piping space 46D are the same as the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A.

[0385] In the embodiment, the exhaust pipes 41A to 43A are arranged in front of the processing housing 23A, but the present invention is not limited thereto.

[0386] Reference Fig.17 In the substrate processing apparatus 141, exhaust pipes 41A to 43A are arranged at the rear of the processing housing 23A.

[0387] Furthermore, in the substrate processing apparatus 141, exhaust pipes 41B to 43B are arranged at the rear of the processing housing 23B, exhaust pipes 41C to 43C are arranged at the front of the processing housing 23C, and exhaust pipes 41D to 43D are arranged at the front of the processing housing 23D.

[0388] In the embodiment, the structure of the conveying mechanism 6 of the transfer conveying unit 3 is exemplified. However, the present invention is not limited to this and the structure of the conveying mechanism 6 may be changed as appropriate.

[0389] Reference Fig.17 The transfer conveyor 3 includes a conveying mechanism 146. The conveying mechanism 146 includes a hand 147 and a hand driving unit 148. The hand 147 holds one substrate W in a horizontal posture. The hand driving unit 148 is connected to the hand 147. The hand driving unit 148 moves the hand 147. The hand driving unit 148 moves the hand 147 in the front-rear direction X, the width direction Y, and the vertical direction Z.

[0390] The hand driving unit 148 includes a first driving unit 148a and a second driving unit 148b. The second driving unit 148b is supported by the first driving unit 148a. The first driving unit 148a moves the second driving unit 148b in the vertical direction Z. The first driving unit 148a further rotates the second driving unit 148b around a rotation axis parallel to the vertical direction Z. However, the first driving unit 148a does not move the second driving unit 148b in the horizontal direction. The first driving unit 148a itself cannot move in the horizontal direction. The second driving unit 148b moves in the horizontal direction relative to the first driving unit 148a. The second driving unit 148b is composed of, for example, a multi-joint arm. The second driving unit 148b is connected to the hand 147. Since the hand driving unit 148 has such a structure, the hand 147 can move in parallel in the vertical direction Z. The hand 147 can move in parallel in any horizontal direction. The hand 147 can rotate in a horizontal plane.

[0391] In the embodiment, the structure of the conveying mechanism 16 of the processing module 11 is exemplified. However, the present invention is not limited thereto. The structure of the conveying mechanism 16 may be appropriately changed. For example, the conveying mechanism 16 may have the same structure as the conveying mechanism 146 described above.

[0392] In an embodiment, if Figure 8 As shown, the opening and closing portion 61 has a substantially rectangular shape when viewed from the front. However, this is not limiting. The shape of the opening and closing portion 61 may be appropriately changed. Similarly, the shapes of the opening and closing portions 62 and 63 may be appropriately changed.

[0393] Figure 1 8 is a front view of a switching mechanism according to a modified embodiment. Fig.19A , 19B 1 and 2. It is a side view of a switching mechanism of a modified embodiment. In addition, the same reference numerals are given to the same components as those of the embodiment, and detailed descriptions thereof are omitted.

[0394] Reference Figure 1 8. The substrate processing apparatus 1 includes a switching mechanism 151. The switching mechanism 151 includes opening and closing parts 152, 153, and 154. The opening and closing parts 152 to 154 are respectively provided inside the switching housing 53. The opening and closing parts 152 to 154 each have a substantially circular shape.

[0395] The opening and closing part 152 can swing around the rotation axis A6. The rotation axis A6 is a horizontal imaginary line. The rotation axis A6 is parallel to the width direction Y. The rotation axis A6 is arranged above the opening and closing part 152. The rotation axis A6 does not pass through the center of the opening and closing part 152. By swinging the opening and closing part 152 around the rotation axis A6, the opening and closing part 152 moves to a position where the processing housing 23 is connected to the exhaust pipe 41 and a position where the processing housing 23 is blocked from the exhaust pipe 41. Similarly, the opening and closing parts 153 and 154 can swing around the rotation axes A7 and A8, respectively.

[0396] exist Fig.18 In the embodiment, the opening and closing portion 152 is arranged at a position to block the processing housing 23 from the exhaust pipe 41. Similarly, the opening and closing portions 153 and 154 are arranged at positions to block the processing housing 23 from the exhaust pipes 42 and 43, respectively.

[0397] exist Fig.19A In the embodiment, the opening and closing portion 152 is arranged at a position to block the processing housing 23 from the exhaust pipe 41. The opening and closing portion 152 closes the opening 41k of the exhaust pipe 41. Fig.19B In the embodiment, the opening and closing portion 152 is arranged at a position that allows the processing housing 23 to communicate with the exhaust pipe 41. The opening and closing portion 152 opens the opening 41k.

[0398] Reference Fig.19A , 19B . The opening and closing part 152 is supported by the switching housing 53. The opening and closing part 152 is supported by the distribution part 56. Specifically, the switching mechanism 151 includes a support rod 156 and a mounting component 157. The support rod 156 is fixed to the switching housing 53. The support rod 156 is fixed to the distribution part 56. The mounting component 157 is supported by the support rod 156. The mounting component 157 can rotate around the rotation axis A6 relative to the support rod 156. The mounting component 157 is fixed to the opening and closing part 152.

[0399] Reference Fig.18 Similar to the opening and closing portion 152 , the opening and closing portions 153 and 154 are fixed to the mounting members 158 and 159 , respectively.

[0400] In the embodiment, the mechanism for moving the opening and closing parts 61 to 63 is not specifically illustrated. Fig.19A , 19B , illustrating a mechanism for moving the opening and closing portion 152.

[0401] The processing module 11 includes a driving unit 161 that moves the opening and closing unit 152. In addition, the driving unit 161 is not an element of the switching mechanism 151.

[0402] The driving unit 161 includes an actuator 161a. The actuator 161a generates power to move the opening and closing unit 152. The actuator 161a is, for example, an air cylinder, a hydraulic cylinder, or an electric motor. The actuator 161a is disposed outside the switching housing 53. The actuator 161a is disposed in the first piping space 44. The actuator 161a is disposed above the switching housing 53. The actuator 161a is disposed above the distribution unit 56.

[0403] The driving unit 161 includes a rod 161b. The rod 161b is connected to the actuator 161a. The rod 161b extends downward from the actuator 161a. The rod 161b passes through the switching case 53. At least a portion of the rod 161b is disposed inside the switching case 53. The actuator 161a moves the rod 161b in the vertical direction Z.

[0404] The driving unit 161 includes a connecting rod 161c. The connecting rod 161c is disposed inside the switching housing 53. The connecting rod 161c connects the rod 161b to the mounting member 157. The connecting rod 161c can rotate around the axis A11 relative to the rod 161b. The connecting rod 161c can rotate around the axis A12 relative to the mounting member 157. The axes A11 and A12 are respectively horizontal imaginary lines. The axes A11 and A12 are respectively parallel to the width direction Y.

[0405] When the actuator 161a moves the rod 161b in the vertical direction Z, the opening and closing portion 152 rotates about the rotation axis A6. When the actuator 161a moves the rod 161b upward, the opening and closing portion 152 moves to a position where the processing housing 23 is connected to the exhaust pipe 41. When the actuator 161a moves the rod 161b downward, the opening and closing portion 152 moves to a position where the processing housing 23 is blocked from the exhaust pipe 41.

[0406] In the embodiment, it is also possible to detect gas leakage in the exhaust passage of the processing housing 23. For example, it is also possible to detect gas leakage from the opening and closing parts 61 to 63.

[0407] Reference Fig.18 , 19A , 19B. The processing module 11 includes wind speed sensors 162, 163, and 164. The wind speed sensor 162 is arranged near the opening and closing part 152. The wind speed sensor 162 is arranged, for example, inside the switching housing 53. The wind speed sensor 162 is arranged, for example, inside the distribution part 56. When the rotation axis A6 is arranged above the opening and closing part 152, it is preferred that the wind speed sensor 162 is arranged below the opening and closing part 152. Similarly, the wind speed sensors 163 and 164 are arranged near the opening and closing parts 153 and 154.

[0408] Wind speed sensor 162 detects wind speed (specifically, moving speed of the gas) of the gas near opening and closing section 152. Similarly, wind speed sensors 163 and 164 detect wind speed of the gas near opening and closing sections 153 and 154. Wind speed sensors 162 and 164 are, for example, hot wire anemometers.

[0409] The wind speed sensor 162 may further detect the wind direction of the gas near the opening and closing part 152 (specifically, the moving direction of the gas). Similarly, the wind speed sensors 163 and 164 may further detect the wind direction of the gas near the opening and closing parts 153 and 154.

[0410] Although not shown in the figure, the control unit 91 is connected to the wind speed sensors 162 to 164 so as to be able to communicate with each other. The control unit 91 acquires the detection results of the wind speed sensors 162 to 164.

[0411] The control unit 91 determines whether there is gas leakage from the opening and closing unit 152 based on the detection result of the wind speed sensor 162. The gas leakage from the opening and closing unit 152 means that when the opening and closing unit 152 is arranged at a position to block the processing housing 23 from the exhaust pipe 41, the opening and closing unit 152 causes gas to leak from the processing housing 23 to the exhaust pipe 41.

[0412] Specifically, the control unit 91 calculates the wind speed of the gas near the opening and closing unit 152 based on the detection result of the wind speed sensor 162. The calculated wind speed of the gas near the opening and closing unit 152 is referred to as an "actually measured value".

[0413] When the opening and closing section 152 is arranged at a position to block the processing housing 23 from the exhaust pipe 41, the control section 91 monitors whether the measured value satisfies a specified condition. The specified condition is, for example, that the measured value is less than a first reference value set in advance. The specified condition is, for example, that the change in the measured value per unit time is less than a second reference value. Furthermore, the control section 91 determines that when the opening and closing section 152 is arranged at a position to block the processing housing 23 from the exhaust pipe 41, if the measured value does not satisfy the specified condition, gas leakage from the opening and closing section 152 will occur.

[0414] Here, it is preferred that at least one of the first reference value and the second reference value is, for example, a variable. At least one of the first reference value and the second reference value may be changed, for example, according to the positions of other opening and closing parts 153, 154. At least one of the first reference value and the second reference value may be changed, for example, according to the position of the opening and closing part 152 belonging to other switching mechanisms 151. At least one of the first reference value and the second reference value may be changed, for example, according to the positions of the opening and closing parts 152, 153, 154 belonging to other switching mechanisms 151. Accordingly, even in a case where the wind speed of the gas near the opening and closing part 152 is easily disturbed, the control unit 91 can accurately determine whether there is a gas leak from the opening and closing part 152.

[0415] Alternatively, at least one of the first reference value and the second reference value may be set to a constant.

[0416] Similarly, the control unit 91 determines whether or not there is gas leakage from the opening and closing units 153 and 154 based on the detection results of the wind speed sensors 163 and 164 .

[0417] According to the present variation, it is possible to appropriately monitor whether the exhaust passage of the processing housing 23 is normally switched between the exhaust pipes 41 to 43 .

[0418] Furthermore, the wind speed sensors 162-164 can appropriately detect minute gas flows, so that it is possible to accurately monitor whether the exhaust passage of the processing housing 23 is normally switched between the exhaust pipes 41-43.

[0419] In this variation, further, when the control unit 91 detects a gas leak in the exhaust passage, the control unit 91 may perform at least one of the actions of sounding an alarm and stopping the liquid supply unit 33. When the control unit 91 sounds an alarm, the gas leak in the exhaust passage may be quickly notified to the user of the substrate processing device 1. When the control unit 91 stops the action of the liquid supply unit 33, the amount of components derived from the processing liquid contained in the gas in the processing housing 23 may be quickly suppressed. In either case, internal contamination of the exhaust pipes 41-43 may be appropriately suppressed. For example, the generation of crystals (salts) inside the exhaust pipes 41-43 may be appropriately suppressed. For example, the accumulation of crystals inside the exhaust pipes 41-43 may be appropriately suppressed.

[0420] exist Fig.18 , 19A In the modified embodiment shown in FIG. 19B , the wind speed sensors 162 to 164 are disposed inside the switching housing 53. However, the present invention is not limited thereto.

[0421] For example, the wind speed sensor 162 may be disposed inside the exhaust pipe 41. Even when the wind speed sensor 162 is disposed inside the exhaust pipe 41, an appropriate reference value included in the specified condition may be set in advance. Therefore, the control unit 91 may appropriately determine whether there is gas leakage from the opening and closing unit 152. The arrangement of the wind speed sensors 163 and 164 may be changed in the same manner.

[0422] For example, the wind speed sensor 162 may be disposed inside the processing housing 23. Even when the wind speed sensor 162 is disposed inside the processing housing 23, an appropriate reference value included in the specified condition may be set in advance. Therefore, the control unit 91 may appropriately determine whether there is gas leakage from the opening and closing unit 152. The arrangement of the wind speed sensors 163 and 164 may be changed in the same manner.

[0423] Referring to the drawings, the configuration of wind speed sensors 162 - 164 is illustrated. Fig. 20A is Figure 6 A top view showing an example of the arrangement of wind speed sensors is added to FIG. Fig. 20B is Fig.13 A top view showing an example of the arrangement of wind speed sensors is added to FIG. Fig.21A is Figure 1 5, a top view showing an example of arrangement of wind speed sensors is added. Fig.21B 1 and 6 are plan views showing an additional arrangement example of a wind speed sensor. In addition, the same reference numerals are given to the same components as those in the embodiment, and detailed descriptions thereof are omitted.

[0424] Reference Fig. 20A The wind speed sensor 162 includes at least one of the wind speed sensors 162a and 162b. The wind speed sensors 162a and 162b are respectively arranged near the opening and closing portion 61. The wind speed sensor 162a is arranged inside the exhaust pipe 41. The wind speed sensor 162a is arranged near the opening 41k. The wind speed sensor 162b is arranged inside the switching housing 53. Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163a and 163b. The wind speed sensor 164 includes at least one of the wind speed sensors 164a and 164b.

[0425] Reference Fig. 20B The wind speed sensor 162 includes at least one of the wind speed sensors 162c and 162d. The wind speed sensors 162c and 162d are respectively arranged near the opening and closing portion 113. The wind speed sensor 162c is arranged inside the processing housing 23. The wind speed sensor 162d is arranged inside the exhaust pipe 41. The wind speed sensor 162d is arranged near the opening 41k. Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163c and 163d. The wind speed sensor 164 includes at least one of the wind speed sensors 164c and 164d.

[0426] Reference Fig.21A. The wind speed sensor 162 includes at least any one of the wind speed sensors 162e, 162f, and 162g. The wind speed sensors 162e-162g are respectively arranged near the opening and closing part 123. The wind speed sensor 162e is arranged inside the exhaust pipe 41. The wind speed sensor 162e is arranged near the opening 41k. The wind speed sensors 162f and 162g are respectively arranged inside the switching housing 53. As described above, when the opening and closing part 123 is arranged at a position that connects the processing housing 23 to the exhaust pipe 41, the opening and closing part 123 blocks the first area 126 from the second area 127. At this time, in order to detect gas leakage from the opening and closing part 123, the wind speed sensor 162g is provided. When the opening and closing part 123 is arranged at a position that connects the processing housing 23 to the exhaust pipe 41, the wind speed sensor 162g can appropriately detect the amount of gas leaked from the first area 126 to the second area 127 by the opening and closing part 123. Similarly, the wind speed sensor 163 includes at least one of wind speed sensors 163e, 163f, and 163g. The purpose of installing the wind speed sensor 163g is similar to that of the wind speed sensor 162g. The wind speed sensor 164 includes at least one of wind speed sensors 164e and 164f.

[0427] Reference Fig.21B . The wind speed sensor 162 includes at least any one of the wind speed sensors 162h, 162i, 162j, 162k, and 1621. The wind speed sensors 162h-1621 are respectively arranged near the opening and closing part 133. The wind speed sensors 162h and 162i are arranged inside the exhaust pipe 41. The wind speed sensors 162h and 162i are arranged near the opening 41k. The wind speed sensors 162j-1621 are respectively arranged inside the switching housing 53. As described above, when the opening and closing part 133 is arranged at a position that connects the processing housing 23 to the exhaust pipe 41, the opening and closing part 133 blocks the processing housing 23 from the exhaust pipes 42 and 43. At this time, in order to detect gas leakage from the opening and closing part 133, the wind speed sensors 162k and 1621 are provided. When the opening and closing part 133 is arranged at a position where the processing housing 23 is connected to the exhaust pipe 41, the wind speed sensors 162k and 1621 can appropriately detect the amount of gas leaked from the processing housing 23 to the exhaust pipes 42 and 43 by the opening and closing part 133. Similarly, the wind speed sensor 163 includes at least any one of the wind speed sensors 163h, 163i, 163j, 163k, and 1631. The purpose of setting the wind speed sensors 163k and 1631 is similar to that of the wind speed sensors 162k and 1621. The wind speed sensor 164 includes at least any one of the wind speed sensors 164h, 164i, and 164j.

[0428] The embodiment and each modified embodiment may be appropriately modified by replacing each configuration with a configuration of another modified embodiment or combining with a configuration of another modified embodiment.

[0429] The present invention may be embodied in other specific forms without departing from the spirit or essence thereof, and thus, reference should be made not to the above description but to the appended claims for indicating the scope of the invention.

[0430] [Explanation of Symbols]

[0431] 1.141 Substrate processing device

[0432] 11 Processing Module

[0433] 12A, 12B, 12 Transport Space

[0434] 16A, 16B, 16 Transport mechanism

[0435] 21 Processing Units

[0436] 23 Handle the shell

[0437] 23A1 Processing shell (1st processing shell)

[0438] 23A2 Processing shell (second processing shell)

[0439] 23B1 Processing shell (3rd processing shell)

[0440] 24 Processing Space

[0441] 31 holding part (first holding part, second holding part, third holding part)

[0442] 33 Liquid supply unit (first liquid supply unit, second liquid supply unit, third liquid supply unit)

[0443] 41, 42, 43 Exhaust pipe

[0444] 41A Exhaust pipe (1st exhaust pipe)

[0445] 42A Exhaust pipe (2nd exhaust pipe)

[0446] 41B Exhaust pipe (3rd exhaust pipe)

[0447] 42B exhaust pipe (4th exhaust pipe)

[0448] 44 1st piping space

[0449] 46 Second piping space

[0450] 48 Air supply pipe

[0451] 51, 101, 111, 121, 131, 151 switching mechanism

[0452] 51A1 Switching mechanism (1st switching mechanism)

[0453] 51A2 Switching mechanism (second switching mechanism)

[0454] 51B1 Switching mechanism (3rd switching mechanism)

[0455] 53, 103 Switching shell

[0456] 54 Switch Space

[0457] 55, 105 Importing section

[0458] 56, 106 Distribution Department

[0459] 61-63, 113-115, 123-124, 133-134, 152-154 Opening and closing parts

[0460] 61, 113, 123, 133, 152 Opening and closing section (first opening and closing section)

[0461] 62, 114, 124, 134, 153 Opening and closing section (second opening and closing section)

[0462] 71 Pressure sensor

[0463] 71A1 Pressure sensor (1st pressure sensor)

[0464] 71B1 Pressure sensor (3rd pressure sensor)

[0465] 73 Pressure adjustment mechanism

[0466] 73A1 Pressure adjustment mechanism (1st pressure adjustment mechanism)

[0467] 73B1 Pressure adjustment mechanism (3rd pressure adjustment mechanism)

[0468] 81, 82, 83 exhaust pipe

[0469] 81A Exhaust pipe (5th exhaust pipe)

[0470] 82A exhaust pipe (6th exhaust pipe)

[0471] 84-86 Pressure Sensor

[0472] 84A Pressure Sensor (No. 5 Pressure Sensor)

[0473] 85A Pressure Sensor (No. 6 Pressure Sensor)

[0474] 87-89 Pressure adjustment mechanism

[0475] 87A Pressure adjustment mechanism (No. 5 pressure adjustment mechanism)

[0476] 88A Pressure adjustment mechanism (6th pressure adjustment mechanism)

[0477] 91 Control Department

[0478] W substrate

[0479] X front-to-back direction (1st direction)

[0480] Y width direction (second direction)

[0481] Z vertical direction.

Claims

1. A substrate processing device, comprising: A first processing shell; A first holding portion, disposed inside the first processing housing, and holding a substrate; a first liquid supply unit, disposed inside the first processing housing, and supplying a processing liquid to the substrate held by the first holding unit; A second processing shell is arranged below the first processing shell; a second holding portion, disposed inside the second processing housing, and holding the substrate; a second liquid supply unit, disposed inside the second processing housing, and supplying a processing liquid to the substrate held by the second holding unit; a first exhaust pipe, disposed on the side of the first processing shell and the second processing shell, for exhausting gas; a second exhaust pipe, disposed on the side of the first processing shell and the second processing shell, for exhausting gas; a first switching mechanism for switching the exhaust passage of the first processing housing to one of the first exhaust pipe and the second exhaust pipe; a second switching mechanism for switching the exhaust passage of the second processing housing to one of the first exhaust pipe and the second exhaust pipe; and a first pipe space adjacent to the first processing shell and the second processing shell, and accommodating the first exhaust pipe and the second exhaust pipe; and The second processing housing is arranged at the same position as the first processing housing in a plan view. The second switching mechanism is arranged at the same position as the first switching mechanism in a plan view.

2. The substrate processing apparatus according to claim 1, wherein The first switching mechanism is arranged at a position not overlapping with the first holding portion in a plan view.

3. The substrate processing apparatus according to claim 1, wherein The first exhaust pipe extends in a vertical direction. The second exhaust pipe extends in the vertical direction.

4. The substrate processing apparatus according to claim 1, wherein The substrate processing apparatus comprises: a transfer space extending in a first horizontal direction and adjacent to the first processing shell and the second processing shell; and a transport mechanism, disposed in the transport space, for transporting the substrate to the first holding portion and the second holding portion; and The first processing housing and the first pipe space are arranged in the first direction, The first exhaust pipe and the second exhaust pipe are arranged in a second direction which is perpendicular to the first direction and is horizontal.

5. The substrate processing apparatus according to claim 1, wherein At least a portion of the first switching mechanism is disposed in the first piping space. At least a portion of the second switching mechanism is provided in the first piping space.

6. The substrate processing apparatus according to claim 1, wherein The first switching mechanism comprises: a first opening and closing portion movable to a position where the first processing housing communicates with the first exhaust pipe and a position where the first processing housing is blocked from the first exhaust pipe; and The second opening and closing portion is movable independently of the first opening and closing portion to a position where the first process housing communicates with the second exhaust pipe and a position where the first process housing is blocked from the second exhaust pipe.

7. The substrate processing apparatus according to claim 6, wherein The first switching mechanism includes a switching housing. The switch housing is connected to the first processing housing and accommodates the first opening and closing portion and the second opening and closing portion.

8. The substrate processing apparatus according to claim 7, wherein The switching housing comprises: an introduction portion connected to the first processing housing and extending in a first horizontal direction; and The distribution portion is connected to the introduction portion, extends in a second direction perpendicular to and horizontal to the first direction, is connected to both the first exhaust pipe and the second exhaust pipe, and accommodates both the first opening and closing portion and the second opening and closing portion.

9. The substrate processing apparatus according to claim 8, wherein In a plan view, a distance between the introduction portion and a transfer space adjacent to the first processing housing is smaller than a distance between the first holding portion and the transfer space.

10. The substrate processing apparatus according to claim 1, wherein The substrate processing apparatus comprises: a gas supply pipe for supplying gas to the first processing shell and the second processing shell; and a second pipe space, adjacent to the first processing shell and the second processing shell, accommodating the gas supply pipe; and The first pipe space, the first processing housing, and the second pipe space are arranged in sequence in a first horizontal direction.

11. The substrate processing apparatus according to claim 1, wherein The substrate processing apparatus comprises: A third processing shell is arranged at the same height as the first processing shell; a third holding portion, disposed inside the third processing housing, and holding the substrate; a third liquid supply unit, disposed inside the third processing housing, and supplying a processing liquid to the substrate held by the third holding unit; a third exhaust pipe, disposed on the side of the third processing shell, for exhausting gas; a fourth exhaust pipe, disposed on the side of the third processing housing, for exhausting gas; and The third switching mechanism is disposed at the same height position as the third process housing, and switches the exhaust passage of the third process housing to one of the third exhaust pipe and the fourth exhaust pipe.

12. The substrate processing apparatus according to claim 11, wherein The substrate processing apparatus comprises: a first pressure sensor for measuring a gas pressure on a primary side of the first switching mechanism; a first pressure regulating mechanism for regulating the gas pressure on the primary side of the first switching mechanism based on a detection result of the first pressure sensor; a third pressure sensor for measuring the gas pressure on the primary side of the third switching mechanism; and The third pressure regulating mechanism regulates the gas pressure on the primary side of the third switching mechanism based on the detection result of the third pressure sensor.

13. The substrate processing apparatus according to claim 12, wherein The first pressure regulating mechanism and the third pressure regulating mechanism make the gas pressure on the primary side of the first switching mechanism equal to the gas pressure on the primary side of the third switching mechanism.

14. The substrate processing apparatus according to claim 11, wherein The substrate processing apparatus comprises: a fifth exhaust pipe connected to the first exhaust pipe and the third exhaust pipe to discharge the gas from the first exhaust pipe and the gas from the third exhaust pipe; and The sixth exhaust pipe is connected to the second exhaust pipe and the fourth exhaust pipe, and exhausts the gas in the second exhaust pipe and the gas in the fourth exhaust pipe.

15. The substrate processing apparatus according to claim 14, wherein The substrate processing apparatus comprises: a fifth pressure sensor for measuring the gas pressure inside the fifth exhaust pipe; a fifth pressure regulating mechanism for regulating the gas pressure inside the fifth exhaust pipe based on the detection result of the fifth pressure sensor; a sixth pressure sensor for measuring the gas pressure inside the sixth exhaust pipe; and The sixth pressure regulating mechanism regulates the gas pressure inside the sixth exhaust pipe based on the detection result of the sixth pressure sensor.

16. The substrate processing apparatus according to claim 15, wherein The fifth pressure sensor is disposed downstream of a connection position between the first exhaust pipe and the fifth exhaust pipe and a connection position between the third exhaust pipe and the fifth exhaust pipe. The sixth pressure sensor is provided downstream of a connection position between the second exhaust pipe and the sixth exhaust pipe and a connection position between the fourth exhaust pipe and the sixth exhaust pipe.

17. The substrate processing apparatus according to claim 1, wherein The first liquid supply unit is capable of supplying a first processing liquid and a second processing liquid. When the first liquid supply unit supplies the first processing liquid, the first switching mechanism switches the exhaust passage of the first processing housing to the first exhaust pipe. When the first liquid supply part supplies the second processing liquid, the first switching mechanism switches the exhaust passage of the first processing housing to the second exhaust pipe.

18. The substrate processing apparatus according to claim 1, wherein The substrate processing apparatus comprises: a first pressure sensor for measuring a gas pressure on a primary side of the first switching mechanism; a first pressure regulating mechanism for regulating the gas pressure on the primary side of the first switching mechanism based on a detection result of the first pressure sensor; a second pressure sensor for measuring the gas pressure on the primary side of the second switching mechanism; and The second pressure regulating mechanism regulates the gas pressure on the primary side of the second switching mechanism based on the detection result of the second pressure sensor.

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