Portable temperature-control photochemical flow reaction device

Abstract

The invention discloses a portable temperature control photochemical flow reaction device which is characterized in that a temperature control medium flow guide cavity wraps the periphery of a quartz reactor, so that a temperature control medium directionally flows at a preset flow speed along the cavity; a simulation light source in the simulation light source temperature control structure is arranged in a cylindrical structure, and a sleeve is arranged outside the simulation light source, so that the temperature control medium flow guide cavity passes through the sleeve; the purge gas cooling assembly precools purge gas and inputs the purge gas into the cooling cavity; the sample gas temperature pretreatment structure adopts a conical structure, the periphery of the sample gas temperature pretreatment structure is wrapped with a temperature control medium flow guide cavity, and a sample introduction channel is reserved in the middle; the temperature control medium supply unit is provided with a temperature adjusting assembly in a matched mode and inputs a temperature control medium with the preset temperature into the temperature control medium flow guide cavity. By means of the technical scheme, the temperature of the oxidation reaction environment can be accurately controlled, and therefore indoor and outdoor application and application in more scenes are achieved.

Description

Technical Field

[0001] The invention relates to the technical field of chemical devices, and in particular to a portable temperature-controlled photochemical flow reaction device. Background Art

[0002] At present, smog chambers are mainly used to simulate the SOA generation process in laboratory research on atmospheric chemistry. However, the experimental cycle of the smog chamber is long and inconvenient. Since the oxidation flow reactor can produce high-concentration oxidation conditions and has the characteristics of mobility, it can simulate long-period atmospheric chemical processes in a relatively short period of time. However, the internal temperature of the oxidation flow reactor currently used in the laboratory cannot be accurately controlled, and there is a large temperature difference in the reaction chamber, which greatly limits the simulation data and application scenarios. Summary of the invention

[0003] In response to the above problems, the present invention provides a portable temperature-controlled photochemical flow reaction device, which can accurately control the temperature of the oxidation reaction environment by introducing the temperature-controlled medium into the temperature-controlled medium guide cavity structure wrapped outside the reaction cavity. The device can also be assembled in modular components to achieve indoor and outdoor applications and in more scenarios, making experimental simulation data more reproducible.

[0004] To achieve the above-mentioned object, the present invention provides a portable temperature-controlled photochemical flow reaction device, comprising: a temperature-controlled medium flow-guiding cavity, a simulated light source temperature control structure, a purge gas cooling component, a sample gas temperature pretreatment structure and a temperature-controlled medium supply unit;

[0005] The temperature control medium flow guiding cavity is wrapped around the periphery of the quartz reactor, so that the temperature control medium flows along the cavity at a preset flow rate;

[0006] The simulated light source temperature control structure adopts a sleeve-type cylindrical tube structure, the simulated light source is arranged in the cylindrical tube structure, and a sleeve is arranged outside the simulated light source, so that the temperature control medium guide cavity passes through the sleeve;

[0007] The purge gas cooling assembly precools the purge gas and inputs the purge gas into the cooling chamber;

[0008] The sample gas temperature pretreatment structure is arranged at the injection end of the quartz reactor, and the sample gas temperature pretreatment structure adopts a conical structure, and the periphery of the sample gas temperature pretreatment structure is wrapped with the temperature control medium guide cavity and the reserved injection channel in the middle;

[0009] The temperature control medium supply unit is equipped with a temperature regulating component, and inputs the temperature control medium of a preset temperature into the temperature control medium guide cavity.

[0010] In the above technical solution, preferably, the temperature control medium flow guide cavity is respectively installed with temperature, flow and flow rate regulating modules to regulate the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow guide cavity.

[0011] In the above technical solution, preferably, the cooling gas inlet of the purge gas cooling assembly is arranged at the injection end of the quartz reactor, and the purge gas cooling assembly adopts a tubular, surround or full-outlet maze type to pre-cool the purge gas, and purges and cools the cooling cavity and the simulated light source temperature control structure through the purge gas.

[0012] In the above technical solution, preferably, a sample gas inlet and a sheath gas inlet are set at the entrance of the sample gas temperature pretreatment structure, and the sample gas and the sheath gas pass through the channels preset at the injection end respectively, so that the sample gas is mixed through the multi-flow path mixing structure, and the sheath gas is realized in a laminar flow state through the damping stabilizing flow structure.

[0013] In the above technical solution, preferably, a sample gas collection end is provided at the other end of the quartz reactor relative to the sample inlet end, and the sample gas passes through the quartz reactor and is output from the sample gas collection end.

[0014] In the above technical solution, preferably, the temperature adjustment component includes a temperature and humidity sensor, and the temperature and humidity sensor is arranged at the sample gas collection end, and the temperature and humidity sensor is used to measure the sampling temperature of the sample gas collection end.

[0015] In the above technical solution, preferably, the temperature adjustment component further includes a medium temperature control module, and the medium temperature control module is used to input a temperature control medium of a preset temperature into the temperature control medium guide cavity.

[0016] Compared with the prior art, the beneficial effects of the present invention are as follows: by introducing the temperature control medium into the temperature control medium guide cavity structure wrapped outside the reaction cavity, the temperature of the oxidation reaction environment can be precisely controlled, and modular components can be assembled to achieve application indoors and outdoors and in more scenarios, making the experimental simulation data more reproducible. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A schematic diagram of the three-dimensional structure of a portable temperature-controlled photochemical flow reaction device disclosed in an embodiment of the present invention;

[0018] Figure 2 A front structural schematic diagram of a portable temperature-controlled photochemical flow reaction device disclosed in an embodiment of the present invention;

[0019] Figure 3 A schematic diagram of the rear structure of a portable temperature-controlled photochemical flow reaction device disclosed in one embodiment of the present invention;

[0020] Figure 4 The present invention is a schematic cross-sectional view of a portable temperature-controlled photochemical flow reaction device disclosed in an embodiment of the present invention.

[0021] In the figure, the corresponding relationship between each component and the reference numeral is as follows:

[0022] 1. Temperature control medium guide cavity, 2. Simulated light source temperature control structure, 21. Simulated light source, 22. Lamp tube fixing seat, 3. Purge gas cooling assembly, 31. Cooling gas inlet, 4. Sample gas temperature pretreatment structure, 41. Gas mixing structure, 51. Temperature and humidity sensor, 52. Medium temperature control module, 6. Quartz reactor, 61. Sample gas inlet, 62. Sheath gas inlet, 63. Sample gas collection end. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0024] The present invention is further described in detail below in conjunction with the accompanying drawings:

[0025] like Figures 1 to 4 As shown, a portable temperature-controlled photochemical flow reaction device provided according to the present invention comprises: a temperature-controlled medium flow guiding cavity 1, a simulated light source temperature control structure 2, a purge gas cooling component 3, a sample gas temperature pretreatment structure 4 and a temperature-controlled medium supply unit 5;

[0026] The temperature control medium flow guiding cavity 1 is wrapped around the periphery of the quartz reactor 6, so that the temperature control medium flows along the cavity at a preset flow rate;

[0027] The simulated light source temperature control structure 2 adopts a sleeve-type cylindrical tube structure, the simulated light source 21 is arranged in the cylindrical tube structure, and a sleeve is arranged outside the simulated light source 21, so that the temperature control medium guide cavity 1 passes through the sleeve;

[0028] The purge gas cooling assembly 3 precools the purge gas and inputs the purge gas into the cooling chamber;

[0029] The sample gas temperature pretreatment structure 4 is arranged at the sample inlet end of the quartz reactor 6. The sample gas temperature pretreatment structure 4 adopts a conical structure. The periphery of the sample gas temperature pretreatment structure 4 is wrapped with a temperature control medium guide cavity 1 and a sample inlet channel reserved in the middle;

[0030] The temperature control medium supply unit 5 is equipped with a temperature regulating component, and inputs the temperature control medium of a preset temperature into the temperature control medium guide cavity 1 .

[0031] In this embodiment, by introducing the temperature control medium into the temperature control medium guide cavity 1 structure wrapped outside the reaction cavity, the temperature of the oxidation reaction environment can be precisely controlled, and modular components can be assembled to achieve application indoors and outdoors and in more scenarios, making the experimental simulation data more reproducible, and providing a portable temperature-controlled oxidation flow reaction device that can meet multiple working conditions for simulating atmospheric chemistry-related experiments.

[0032] Specifically, by designing and installing a tubular or surrounding cavity outside the reactor, the reaction cavity is wrapped, and the temperature control medium in the tubular or surrounding cavity flows along the directional cavity at a set flow rate, so as to bring out the heat of the reactor. At the same time, the heat of the temperature control medium contributes to the controllable temperature of the reaction cavity. The characteristics are that it will not leak, will not affect the intensity of the simulated light source, will not affect the laminar flow state in the reaction cavity, and will not participate in the sample gas reaction. Combined with the coordinated operation of the simulated light source temperature control structure 2, the purge gas cooling component 3, and the sample gas temperature pretreatment structure 4, a temperature-controlled oxidation flow reaction device with precise temperature control is achieved.

[0033] Among them, the simulated light source temperature control structure 2 adopts a sleeve-type cylindrical tube structure, in which the simulated light source 21 is placed. The characteristic is that one or more layers of sleeves are added outside the light source, and the temperature control medium flows in an organized manner inside, combined with the purge inside the light source tube, which greatly reduces the impact of the heat generated by the simulated light source 21 on the reactor and temperature control.

[0034] In the above embodiment, preferably, the temperature control medium flow guiding cavity 1 is respectively installed with temperature, flow and flow rate regulating modules to regulate the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow guiding cavity 1 .

[0035] Specifically, through the above-mentioned adjustment module, the temperature, flow rate and flow velocity of the temperature control medium in the temperature control medium guiding cavity 1 can be adjusted, and the temperature control medium can flow according to the shape and direction of the cavity.

[0036] In the above embodiment, preferably, the cooling gas inlet 31 of the purge gas cooling component 3 is arranged at the injection end of the quartz reactor 6, and the purge gas cooling component 3 adopts a tubular, surround or full-outlet maze type to pre-cool the purge gas, so as to more efficiently achieve precise temperature control effects, and purge and cool the cooling cavity and the simulated light source temperature control structure 2 through the purge gas.

[0037] In the above embodiment, preferably, a sample gas inlet 61 and a sheath gas inlet 62 are set at the entrance of the sample gas temperature pretreatment structure 4, and the sample gas and the sheath gas pass through the channels preset at the injection end respectively, so that the sample gas is mixed through the multi-flow path mixing structure 41, and the sheath gas realizes a laminar flow state through the damping stabilizing flow structure.

[0038] In the above embodiment, preferably, a sample gas collection end 63 is provided at the other end of the quartz reactor 6 relative to the sample inlet end, and the sample gas passes through the quartz reactor 6 and is output from the sample gas collection end 63 .

[0039] like Figure 3 and Figure 4 As shown, in the above embodiment, preferably, the temperature adjustment component includes a temperature and humidity sensor 51, which is arranged at the sample gas collection end 63, and the temperature and humidity sensor 51 is used to measure the sample gas temperature at the sample gas collection end 63. Among them, preferably, the temperature adjustment component also includes a medium temperature control module 52, and the medium temperature control module 52 includes but is not limited to a water bath device, which is used to input a temperature control medium of a preset temperature into the temperature control medium guide cavity 1. The temperature adjustment component cooperates with the temperature control medium guide cavity 1, the simulated light source temperature control structure 2, the purge gas cooling component 3 and the sample gas temperature pretreatment structure 4 to achieve precise adjustment and control of the temperature.

[0040] In addition, the sample gas collection end 63 is further provided with a lamp tube fixing seat 22 to fix the simulated light source temperature control structure 2 in the quartz reactor 6 through the lamp tube fixing seat 22 .

[0041] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A portable temperature-controlled photochemical flow reaction device, characterized in that: include: Temperature control medium flow guide cavity, simulated light source temperature control structure, purge gas cooling assembly, sample gas temperature pretreatment structure and temperature control medium supply unit; The temperature control medium flow guiding cavity is wrapped around the periphery of the quartz reactor, so that the temperature control medium flows along the cavity at a preset flow rate; The simulated light source temperature control structure adopts a sleeve-type cylindrical tube structure, the simulated light source is arranged in the cylindrical tube structure, and a sleeve is arranged outside the simulated light source, so that the temperature control medium guide cavity passes through the sleeve; The purge gas cooling assembly precools the purge gas and inputs the purge gas into the cooling chamber; The sample gas temperature pretreatment structure is arranged at the injection end of the quartz reactor, and the sample gas temperature pretreatment structure adopts a conical structure, and the periphery of the sample gas temperature pretreatment structure is wrapped with the temperature control medium guide cavity and the reserved injection channel in the middle; The temperature control medium supply unit is equipped with a temperature regulating component, and inputs the temperature control medium of a preset temperature into the temperature control medium guide cavity.

2. The portable temperature-controlled photochemical flow reaction device according to claim 1, characterized in that: The temperature control medium flow guiding cavity is respectively installed with temperature, flow rate and flow velocity regulating modules to regulate the temperature, flow rate and flow velocity of the temperature control medium in the temperature control medium flow guiding cavity.

3. The portable temperature-controlled photochemical flow reaction device according to claim 1, characterized in that: The cooling gas inlet of the purge gas cooling component is arranged at the sampling end of the quartz reactor. The purge gas cooling component adopts a tubular, surrounding or full-outlet labyrinth type to pre-cool the purge gas, and purges and cools the cooling cavity and the simulated light source temperature control structure through the purge gas.

4. The portable temperature-controlled photochemical flow reaction device according to claim 3, characterized in that: The inlet of the sample gas temperature pretreatment structure is provided with a sample gas inlet and a sheath gas inlet, and the sample gas and the sheath gas respectively pass through the channels preset at the injection end, so that the sample gas is mixed through the multi-flow path mixing structure, and the sheath gas realizes a laminar flow state through the damping stabilizing flow structure.

5. The portable temperature-controlled photochemical flow reaction device according to claim 4, characterized in that: A sample gas collecting end is arranged at the other end of the quartz reactor relative to the sample inlet end, and the sample gas is outputted from the sample gas collecting end after passing through the quartz reactor.

6. The portable temperature-controlled photochemical flow reaction device according to claim 5, characterized in that: The temperature regulating component comprises a temperature and humidity sensor, which is arranged at the sample gas collection end and is used to measure the sampling temperature of the sample gas collection end.

7. The portable temperature-controlled photochemical flow reaction device according to claim 6, characterized in that: The temperature adjustment component further includes a medium temperature control module, and the medium temperature control module is used to input a temperature control medium of a preset temperature into the temperature control medium guide cavity.

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