Flowing type gallium boat, HVPE equipment and preparation method of gallium-containing gas source

Abstract

The invention provides a flowing type gallium boat, HVPE equipment and a preparation method of a gallium-containing gas source, the flowing type gallium boat comprises a liquid gallium caching mechanism and a reaction mechanism, the liquid gallium caching mechanism comprises a first cavity, an input pipeline and an output pipeline, and one end of the input pipeline is communicated with the first cavity; the other end of the second cavity is communicated with the first cavity and is provided with a gas injection port; the reaction mechanism comprises a second cavity, an exhaust pipeline and a return pipeline, and the second cavity is communicated with the other end of the output pipeline; one end of the return pipeline is communicated with the second cavity, and the other end is connected with the first cavity. The transmission and preparation efficiency can be improved, gas-liquid full contact can be achieved, and then the purposes of improving the material utilization rate and the product quality stability are achieved; in addition, unreacted liquid gallium can be recycled, and material waste is avoided. Compared with a conventional gallium boat structure, the gallium boat structure has the advantages of high quality, high efficiency, high utilization rate, high controllability and the like, and can be used in the field of growth of gallium nitride.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor devices, and in particular to a method for preparing a flow-type gallium boat, a HVPE device and a gallium-containing gas source. Background Art

[0002] In the field of hydride vapor phase epitaxy (HVPE) technology, gallium boats are key components that react with hydrochloric acid to generate gallium chloride, a process that has a decisive influence on the production of high-quality III-V semiconductor materials, especially GaN. However, existing technologies have many challenges in improving the actual utilization of the reaction between metal gallium and hydrochloric acid, which directly affects the efficiency and cost-effectiveness of HVPE equipment.

[0003] At present, in order to increase the contact area between metal gallium and hydrochloric acid, and thus improve the reaction efficiency, technicians have made various attempts. One method is to design a more complex gallium boat structure to extend the reaction path between metal gallium and hydrochloric acid. This design does increase the contact area and reaction time to a certain extent, but it also increases the complexity of the equipment structure and the increase in the overall volume. This not only increases the manufacturing cost and floor space of the equipment, but also brings maintenance difficulties in actual operation, affecting the stability and reliability of the equipment.

[0004] Another attempt is to introduce gas below the surface of liquid gallium to form bubbles to disturb the liquid gallium, thereby increasing the contact between metal gallium and hydrochloric acid. Although this method has its advantages in theory, in practical applications, the formation and movement of bubbles are difficult to accurately control, resulting in large fluctuations in the quality of gallium chloride generated, making it difficult to ensure the consistency and repeatability of semiconductor material growth. In addition, the liquid level fluctuations that may be caused by the generation and dissipation of bubbles will also have an adverse effect on the HVPE growth process.

[0005] In view of this, the technology of generating gallium chloride by reacting gallium boat with hydrochloric acid in the existing HVPE equipment still has obvious limitations. The complexity of the equipment structure and the increase in volume, as well as the lack of controllability during the reaction process, have restricted the further development and application of HVPE technology. Summary of the invention

[0006] Therefore, the technical problem to be solved by the present invention is to overcome the problem in the prior art that the gallium boat is difficult to ensure stable product quality, and to provide a flowable gallium boat, HVPE equipment and a method for preparing a gallium-containing gas source.

[0007] In order to solve the above technical problems, in a first aspect, the present invention provides a flow-type gallium boat, which comprises: A liquid gallium cache mechanism, the liquid gallium cache mechanism comprising a first cavity, an input pipeline and an output pipeline, one end of the input pipeline is connected to the first cavity, and liquid gallium is filled into the first cavity through the input pipeline; one end of the output pipeline is connected to the first cavity, and at least one gas injection port is provided on the output pipeline; A reaction mechanism, the reaction mechanism comprising a second cavity, an exhaust pipeline and a reflux pipeline, the second cavity is connected to the other end of the output pipeline, the liquid gallium enters the second cavity through the output pipeline; one end of the reflux pipeline is connected to the second cavity, and the other end is connected to the first cavity, the unreacted liquid gallium in the second cavity enters the first cavity through the reflux pipeline; the gallium-containing gas source generated by the reaction of the liquid gallium in the second cavity with the gas source is discharged through the exhaust pipeline connected to the second cavity.

[0008] In one embodiment of the present invention, the second cavity comprises a separation space and a collection space which are interconnected, the separation space and the collection space are arranged in sequence along the flow direction of liquid gallium, the output pipeline is connected to the separation space, and the cross-sectional diameter of the separation space in the flow direction of liquid gallium is larger than the cross-sectional diameter of the output pipeline; wherein the collection space has an inlet and outlet connected to the separation space, and in the process of liquid gallium in the first cavity flowing to the second cavity, the liquid level of the liquid gallium in the second cavity is lower than the height of the inlet and outlet.

[0009] In one embodiment of the present invention, one end of the output pipeline is arranged close to the top of the second cavity, and the other end is arranged close to the bottom of the first cavity.

[0010] In one embodiment of the present invention, the gas injection port is disposed at one end close to the reaction mechanism, and the gas injection port is multiple in number.

[0011] In one embodiment of the present invention, the return pipeline further includes a stopper, and the stopper is rotatably connected to the end of the return pipeline to connect / block the return pipeline.

[0012] In one embodiment of the present invention, the liquid gallium cache mechanism also includes a pressure detector, which is arranged on the input pipeline; the pressure detector is used to adjust the pressure of the first cavity so that the liquid gallium in the first cavity flows out from the output pipeline, or so that the stopper connects the return pipeline with the first cavity.

[0013] In one embodiment of the present invention, the bottom area of ​​the first cavity is smaller than the bottom area of ​​the second cavity; and / or the height of the first cavity is greater than the height of the second cavity; and / or the bottom of the reaction mechanism is higher than the stopper.

[0014] In a second aspect, the present invention further provides a HVPE device, comprising the above-mentioned flow-type gallium boat.

[0015] In a third aspect, the present invention further provides a method for preparing a gallium-containing gas source, which prepares the gallium-containing gas source by the above-mentioned flowing gallium boat, and comprises: step S1, filling a first cavity with liquid gallium; step S2, adjusting the pressure of the first cavity so that the liquid gallium in the first cavity flows along an output pipeline to a second cavity; step S3, inputting a gas source into a gas injection port during the flow of the liquid gallium, so that the liquid gallium reacts with the gas source to generate a gallium-containing gas source and is discharged through an exhaust pipeline; step S4, adjusting the pressure of the first cavity so that the unreacted liquid gallium in the second cavity returns to the first cavity through a reflux pipeline.

[0016] In one embodiment of the present invention, step S2 includes: filling the first cavity with liquid gallium through an input pipeline; filling the first cavity with protective gas through the input pipeline and controlling the supply amount of the protective gas and the pressure of the first cavity through a pressure detector so that the liquid gallium flows along the output pipeline.

[0017] The above technical solution of the present invention has the following advantages compared with the prior art: The solution provided by the present invention can make the liquid gallium fully mixed with the gas source to be reacted during the flow process, which can not only improve the transmission preparation efficiency, but also achieve full contact between the gas source and the liquid gallium, thereby achieving the purpose of improving material utilization and product quality stability. In addition, the present invention can also recycle unreacted liquid gallium, thereby avoiding material waste. Compared with the conventional gallium boat structure at this stage, the present invention has the advantages of high quality, high efficiency, high utilization rate and high controllability. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to make the contents of the present invention more clearly understood, the present invention is further described in detail below based on specific embodiments of the present invention in conjunction with the accompanying drawings.

[0019] Figure 1 is a schematic diagram of the structure of a flow-type gallium boat in a preferred embodiment of the present invention; Figure 2 yes Figure 1 A schematic diagram of the three-dimensional structure of the output pipeline in the flow-type gallium boat shown; Figure 3 4 is a flow chart of a method for preparing a gallium-containing gas source in another embodiment of the present invention.

[0020] Explanation of the reference numerals in the specification: 100, liquid gallium cache mechanism; 110, first cavity; 120, input pipeline; 130, output pipeline; 131, gas injection port; 140, pressure detector; 200, reaction mechanism; 210, second cavity; 211, separation space; 212, collection space; 220, exhaust pipeline; 230, reflux pipeline; 231, stopper. DETAILED DESCRIPTION

[0021] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.

[0022] The present invention provides a flow-type gallium boat, which comprises: a liquid gallium cache mechanism and a reaction mechanism, the liquid gallium cache mechanism comprises a first cavity, an input pipeline and an output pipeline, one end of the input pipeline is connected to the first cavity, and liquid gallium is filled in the first cavity through the input pipeline; one end of the output pipeline is connected to the first cavity, and at least one gas injection port is provided on it.

[0023] The reaction mechanism includes a second cavity, an exhaust pipeline and a reflux pipeline. The second cavity is connected to the other end of the output pipeline, and liquid gallium enters the second cavity through the output pipeline; one end of the reflux pipeline is connected to the second cavity, and the other end is connected to the first cavity, and unreacted liquid gallium in the second cavity enters the first cavity through the reflux pipeline; the gallium-containing gas source generated by the reaction of the liquid gallium in the second cavity with the gas source is discharged through the exhaust pipeline connected to the second cavity.

[0024] Furthermore, the liquid gallium to be reacted is buffered in the liquid gallium buffer mechanism, and the reaction mechanism is used to provide a reaction space and a separation space after the gas and liquid are mixed. Before starting the mobile gallium boat, liquid gallium needs to be injected into the first cavity through the input pipeline, and then the protective gas (such as nitrogen) is filled into the first cavity through the input pipeline to push the liquid gallium along the output pipeline by gas pressure. When it passes through the gas injection port, the gas source to be reacted is input into the output pipeline through the gas injection port, and it is fully mixed with the liquid gallium during the movement to form a mixed fluid. When the mixed fluid enters the second cavity, the generated gallium-containing gas source is discharged through the exhaust pipeline, and the unreacted liquid gallium re-enters the first cavity through the reflux pipeline, waiting for the next cycle processing process.

[0025] Furthermore, the flow rate of liquid gallium can be adaptively adjusted by changing the flow rate of the shielding gas. When it is necessary to reduce the flow rate of liquid gallium, the flow rate of the shielding gas can be appropriately reduced to reduce the gas pressure in the first cavity; conversely, when it is necessary to increase the flow rate of liquid gallium, the flow rate of the shielding gas can be appropriately increased to increase the gas pressure in the first cavity.

[0026] Furthermore, the gaseous source may be hydrogen chloride gas, and the reaction between hydrogen chloride gas and liquid gallium is as follows: 2HCl(g)+Ga(s)→GaCl(g)+H2(g) The obtained gallium-containing gaseous source is gallium chloride gas, which can react with ammonia gas in a gas reaction device to grow gallium nitride products.

[0027] Furthermore, the bottom area of ​​the first cavity is smaller than the bottom area of ​​the second cavity. Since there is a spacing distance between the output pipeline and the bottom surface of the first cavity, the flow rate of the liquid gallium in the first cavity can be increased by reducing the bottom area of ​​the first cavity, thereby ensuring that the liquid gallium can stably flow from the first cavity to the second cavity, and the liquid buffered in the second cavity will not escape and flow back.

[0028] Furthermore, the height of the first cavity is greater than the height of the second cavity, thereby providing a sufficient spacing distance between the output pipeline and the return pipeline in the height direction, thereby increasing the capacity of the liquid gallium that can flow in the first cavity, and on the other hand, facilitating the unreacted liquid gallium to re-enter the first cavity through the return pipeline.

[0029] In one embodiment, one end of the output pipeline is arranged near the top of the second cavity, and the other end is arranged near the bottom of the first cavity, thereby, the liquid gallium deposited at the bottom of the first cavity can move toward the second cavity under the action of gas pressure, thereby avoiding the accumulation of liquid gallium in the first cavity. At the same time, the gallium-containing gas source generated by the reaction of liquid gallium and the gas source can also be automatically separated in the second cavity under the action of gravity, thereby facilitating the collection of the gallium-containing gas source and facilitating the recycling of unreacted liquid gallium.

[0030] In one embodiment, the gas injection port is disposed at one end close to the reaction mechanism, and the number of the gas injection port is multiple, thereby improving the stable output of liquid gallium in the output pipeline and the rapid separation of the gallium-containing gas source.

[0031] Furthermore, the gaseous source injected through the gas injection port can be fully mixed with the liquid gallium through a uniform and dense bubble structure, thereby improving the reaction efficiency and actual utilization rate. Therefore, the aperture size and number of the gas injection port directly affect the growth rate of the gallium-containing gas source. At the same time, the aperture size and number of the gas injection port can also be used to regulate the generation rate of gallium chloride, thereby controlling the gas flow rate of gallium chloride.

[0032] In actual operation, the specific number and location of the gas injection ports can be adjusted according to actual use requirements. In order to improve the mixing degree with liquid gallium, the gas injection ports are generally configured as small-diameter through holes, and the present invention does not impose specific restrictions on this.

[0033] In one embodiment, the second cavity includes a separation space and a collection space that are interconnected, the separation space and the collection space are arranged in sequence along the flow direction of liquid gallium, the output pipeline is connected to the separation space, and the cross-sectional diameter of the separation space in the flow direction of liquid gallium is larger than the cross-sectional diameter of the output pipeline.

[0034] Furthermore, the separation space is used to carry out the main gas-liquid separation process. In the separation space, the generated gallium-containing gas source and the unreacted liquid gallium can be quickly separated. The gallium-containing gas source with low density is suspended above the separation space for easy collection; the liquid gallium with high density is deposited at the bottom of the separation space for easy recycling.

[0035] Furthermore, the collecting space has an inlet and outlet connected to the separation space. When the liquid gallium in the first cavity flows to the second cavity, the liquid level of the liquid gallium in the second cavity is lower than the height of the inlet and outlet, thereby ensuring that the gallium-containing gas source can be discharged through the exhaust pipe above the collecting space, and at the same time, the liquid gallium that does not participate in the reaction can enter the reflux pipe at the bottom of the collecting space.

[0036] In one embodiment, the reflux pipeline further includes a stopper, which is rotatably connected to the end of the reflux pipeline to connect / block the reflux pipeline. When only a small amount of liquid gallium accumulates in the reflux pipeline, the stopper is in a blocking state, thereby ensuring that the liquid gallium moves along the output pipeline under the action of gas pressure; when a large amount of liquid gallium accumulates in the reflux pipeline, the stopper is in a connected state, so that the liquid gallium can enter the first cavity from the reflux pipeline.

[0037] Furthermore, the stopper is preferably a frosted plug, the frosted portion of which can be inserted into the reflux pipeline and fits tightly against the inner wall of the reflux pipeline, thereby improving the sealing performance of the reflux pipeline in a blocked state.

[0038] Furthermore, the bottom of the reaction mechanism is higher than the stopper, thereby ensuring the circulation of liquid gallium between the first cavity and the second cavity, and preventing the liquid gallium from flowing back or overflowing due to liquid pressure.

[0039] It can be understood that during the switching process of the stopper, the hydrogen chloride gas continues to flow into the gas injection port, and the hydrogen chloride gas still enters the second cavity to react with the liquid gallium to generate gallium chloride, and there will be no interruption of gallium chloride.

[0040] In one embodiment, the liquid gallium cache mechanism also includes a pressure detector, which is arranged on the input pipeline; the pressure detector is used to adjust the pressure of the first cavity so that the liquid gallium in the first cavity flows out from the output pipeline, or the stopper connects the return pipeline with the first cavity.

[0041] When the liquid gallium in the first cavity is sufficient to be transferred to the second cavity, the gas pressure inside the flowing gallium boat will be maintained at a relatively stable state. As the liquid gallium gradually decreases, when the first cavity can no longer provide liquid gallium to the second cavity, the overall gas pressure inside the gallium boat will suddenly change. At this time, the supply of protective gas is reduced through the pressure detector, so that the gas pressure in the first cavity can be lower than the liquid pressure in the return line, thereby causing the stopper to flip under the push of liquid gallium, thereby connecting the return line with the first cavity; on the contrary, when the liquid gallium in the return line is exhausted, the pressure detector increases the supply of protective gas, so that the stopper re-blocks the return line under the action of gas pressure.

[0042] The present invention also provides an HVPE device, comprising the above-mentioned flowing gallium boat, which is used for performing substrate growth processing through a gallium-containing gas source generated by the flowing gallium boat.

[0043] The present invention also provides a method for preparing a gallium-containing gas source, which uses the above-mentioned flowing gallium boat to prepare a gallium-containing gas source, and comprises: Step S1, filling the first cavity with liquid gallium. Step S2, adjusting the pressure of the first chamber so that the liquid gallium in the first chamber flows along the output pipeline to the second chamber.

[0044] Step S2 includes: S21: Filling the first cavity with liquid gallium through an input pipeline.

[0045] S22: Filling the first cavity with protective gas through the input pipeline and controlling the supply amount of the protective gas and the pressure of the first cavity through the pressure detector, so that the liquid gallium flows along the output pipeline.

[0046] The protective gas is preferably nitrogen.

[0047] Step S3: inputting a gas source into the gas injection port during the flow of the liquid gallium, so that the liquid gallium reacts with the gas source to generate a gallium-containing gas source which is discharged through the exhaust pipeline.

[0048] After the gaseous source and liquid gallium are mixed and reacted, the main gas-liquid separation process is carried out in the separation space. The separated gallium-containing gas source is discharged through the exhaust pipeline in the collection space, and the unreacted liquid gallium enters the reflux pipeline at the bottom of the collection space.

[0049] Step S4, adjusting the pressure of the first chamber so that the unreacted liquid gallium in the second chamber returns to the first chamber through the reflux pipeline.

[0050] The gas supply of the protective gas is adjusted by the gas pressure detector. When the liquid gallium for reaction needs to flow into the first cavity, the input amount of the protective gas is reduced; when the liquid gallium needs to flow into the second cavity through the output pipeline, the input amount of the protective gas is increased. Embodiment 1

[0051] See also Figure 1 As shown, the flow-type gallium boat provided in this embodiment includes: a liquid gallium buffer mechanism 100 , a reaction mechanism 200 and a pressure detector 140 .

[0052] The liquid gallium cache mechanism 100 includes a first cavity 110, an input pipeline 120 and an output pipeline 130. One end of the input pipeline 120 is connected to the first cavity 110, and liquid gallium is filled in the first cavity 110 through the input pipeline 120. A pressure detector 140 is provided on the input pipeline 120. One end of the output pipeline 130 is connected to the first cavity 110, and a gas injection port 131 is provided thereon. The gas injection port 131 is used to introduce a gas source (for example, hydrogen chloride gas).

[0053] The reaction mechanism 200 includes a second cavity 210, an exhaust pipeline 220, and a reflux pipeline 230. The second cavity 210 is connected to the other end of the output pipeline 130, and liquid gallium enters the second cavity 210 through the output pipeline 130. One end of the reflux pipeline 230 is connected to the second cavity 210, and the other end of the reflux pipeline 230 is connected to the first cavity 110. The unreacted liquid gallium in the second cavity 210 enters the first cavity 110 through the reflux pipeline 230; the gallium-containing gas source generated by the reaction of the liquid gallium in the second cavity 210 with the gas source is discharged through the exhaust pipeline 220 connected to the second cavity 210.

[0054] Further, the bottom diameter of the first cavity 110 is 10 cm, the bottom diameter of the collecting space in the second cavity 210 is 20 cm, and the height of the first cavity 110 is greater than the height of the second cavity 210. Specifically, in this embodiment, the connection between the first cavity 110 and the output pipeline 130 and the connection between the first cavity 110 and the return pipeline 230 are 40 cm apart, so that the first cavity 110 can output 4000 cm to the second cavity 210. 3 correspondingly, in the second chamber 210, the distance between the connection between the collecting space and the reaction space and its bottom surface is 10 cm, thus, the maximum capacity of the collecting space is 4000 cm 3 , thereby preventing the liquid gallium from flowing back along the output pipeline 130 or overflowing from the exhaust pipeline 220 due to the small capacity of the second chamber 210.

[0055] See also Figure 1 and Figure 2 As shown, one end of the output pipeline 130 is arranged near the top of the second cavity 210, and the other end is arranged near the bottom of the first cavity 110; further, the gas injection port 131 is arranged at one end close to the reaction mechanism 200, and is arranged in sequence along the flow direction of the liquid gallium.

[0056] In this embodiment, the second cavity 210 includes a separation space 211 and a collection space 212 which are interconnected. The separation space 211 and the collection space 212 are arranged in sequence along the flow direction of liquid gallium. The output pipeline 130 is connected to the separation space 211, and the cross-sectional diameter of the separation space 211 in the flow direction of liquid gallium is greater than the cross-sectional diameter of the output pipeline 130; specifically, in this embodiment, the cross-sectional diameter of the output pipeline 130 is 8 mm, and the cross-sectional diameter of the separation space 211 is 12 mm.

[0057] In this embodiment, the collecting space 212 has an inlet and outlet communicating with the separation space 211 . When the liquid gallium in the first cavity 110 flows to the second cavity 210 , the liquid level of the liquid gallium in the second cavity 210 is lower than the height of the inlet and outlet.

[0058] In this embodiment, the reflux pipeline 230 further includes a stopper 231 , the bottom of which is lower than the bottom of the reaction mechanism 200 ; the stopper 231 is rotatably connected to the end of the reflux pipeline 230 to connect / block the reflux pipeline 230 . Specifically, the stopper 231 in the present embodiment is preferably a frosted plug, and the four corners of the frosted plug are movably hung on the inner wall of the first cavity 110; when the liquid gallium in the first cavity 110 needs to flow out, the stopper 231 blocks the return pipe 230, and the pressure detector 140 is used to regulate the pressure of the first cavity 110. At this time, the pressure in the first cavity 110 is relatively large, and the frosted plug is tightly pressed on the end of the return pipe 230 close to the first cavity 110, which plays a sealing role, ensuring that the liquid gallium in the first cavity 110 flows into the second cavity 210 through the output pipe 130; when the liquid gallium in the second cavity 210 needs to flow out, the pressure detector 140 is used to regulate the pressure of the first cavity 110, and combined with the gravity of the second cavity 210 and the liquid gallium in the return pipe 230, the frosted plug is pushed open, so that the liquid gallium in the second cavity 210 flows into the second cavity 210 through the return pipe 23.

[0059] This embodiment provides a flowing gallium boat for flowing liquid gallium, and a plurality of gas injection ports for hydrogen chloride gas are arranged in the transmission pipeline, so that a full reaction between liquid gallium and hydrogen chloride gas is achieved, and the reaction efficiency is high. Embodiment 2

[0060] This embodiment provides an HVPE device, including the flowing gallium boat described in the first embodiment, which is used to perform gallium nitride substrate growth processing by using gallium chloride gas generated by the flowing gallium boat. Embodiment 3

[0061] See also Figure 3 As shown, this embodiment provides a method for preparing a gallium-containing gas source, which prepares gallium chloride gas by using the flowing gallium boat described in the first embodiment, and comprises: Step S1, filling the first cavity with liquid gallium.

[0062] Step S2, adjusting the pressure of the first chamber so that the liquid gallium in the first chamber flows along the output pipeline to the second chamber.

[0063] The first cavity is filled with liquid gallium through an input pipeline; the first cavity is filled with nitrogen through an input pipeline and the supply amount of the protective gas and the pressure of the first cavity are controlled through a pressure detector so that the liquid gallium flows along the output pipeline.

[0064] Step S3: During the flow of liquid gallium, hydrogen chloride gas is input into the gas injection port, so that the liquid gallium reacts with the gas source to generate a gallium chloride gas source, which is then discharged through the exhaust pipe.

[0065] Step S4, adjusting the pressure of the first chamber so that the unreacted liquid gallium in the second chamber returns to the first chamber through the reflux pipeline.

[0066] The above-mentioned setting of using protective gas to drive the flow of liquid gallium cleverly avoids the problem of unstable reaction efficiency caused by the drop of the metal liquid gallium level in the traditional gallium boat. At the same time, the liquid gallium can fully and evenly react with the gas source during the flow process, thereby ensuring the generation quality of the gallium-containing gas source and further ensuring the stability of the gallium nitride epitaxial growth process.

[0067] Obviously, the above embodiments are merely examples for clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the protection scope of the invention.

Claims

1. A mobile gallium boat, characterized in that: include: A liquid gallium cache mechanism (100), the liquid gallium cache mechanism (100) comprising a first cavity (110), an input pipeline (120) and an output pipeline (130), one end of the input pipeline (120) being in communication with the first cavity (110), and liquid gallium is filled into the first cavity (110) through the input pipeline (120); one end of the output pipeline (130) being in communication with the first cavity (110), and at least one gas injection port (131) being provided thereon; A reaction mechanism (200), the reaction mechanism (200) comprising a second chamber (210), an exhaust pipeline (220) and a reflux pipeline (230), the second chamber (210) being in communication with the other end of the output pipeline (130), the liquid gallium entering the second chamber (210) through the output pipeline (130); one end of the reflux pipeline (230) being in communication with the second chamber (210), and the other end being connected to the first chamber (110), the unreacted liquid gallium in the second chamber (210) entering the first chamber (110) through the reflux pipeline (230); and a gallium-containing gas source generated by a reaction between the liquid gallium in the second chamber (210) and a gas source being discharged through the exhaust pipeline (220) in communication with the second chamber (210).

2. The mobile gallium boat according to claim 1, characterized in that: The second cavity (210) comprises a separation space (211) and a collection space (212) which are interconnected, the separation space (211) and the collection space (212) being arranged in sequence along the flow direction of the liquid gallium, the output pipeline (130) being connected to the separation space (211), and the cross-sectional diameter of the separation space (211) in the flow direction of the liquid gallium being larger than the cross-sectional diameter of the output pipeline (130); The collecting space (212) has an inlet and an outlet connected to the separation space (211), and during the process of the liquid gallium in the first cavity (110) flowing to the second cavity (210), the liquid level of the liquid gallium in the second cavity (210) is lower than the height of the inlet and an outlet.

3. The mobile gallium boat according to claim 1, characterized in that: One end of the output pipeline (130) is arranged close to the top of the second cavity (210), and the other end is arranged close to the bottom of the first cavity (110).

4. The mobile gallium boat according to claim 1, characterized in that: The gas injection ports (131) are arranged at one end close to the reaction mechanism (200), and there are multiple gas injection ports (131).

5. The mobile gallium boat according to claim 1, characterized in that: The return pipeline (230) further comprises a stopper (231), wherein the stopper (231) is rotatably connected to an end of the return pipeline (230) to connect with / block the return pipeline (230).

6. The mobile gallium boat according to claim 5, characterized in that: The liquid gallium cache mechanism (100) further comprises a pressure detector (140), wherein the pressure detector (140) is arranged on the input pipeline (120); the pressure detector (140) is used to adjust the pressure of the first cavity (110) so that the liquid gallium in the first cavity (110) flows out from the output pipeline (130), or so that the stopper (231) connects the return pipeline (230) and the first cavity (110).

7. The mobile gallium boat according to claim 5, characterized in that: The bottom area of ​​the first cavity (110) is smaller than the bottom area of ​​the second cavity (210); and / or, the height of the first cavity (110) is greater than the height of the second cavity (210); And / or, the bottom of the reaction mechanism (200) is higher than the stopper (231).

8. A HVPE device, comprising the flow-type gallium boat according to any one of claims 1 to 7.

9. A method for preparing a gallium-containing gas source, characterized in that: The gallium-containing gas source is prepared by the flowing gallium boat according to any one of claims 1 to 7, comprising: Step S1, filling the first cavity with liquid gallium; Step S2, adjusting the pressure of the first cavity so that the liquid gallium in the first cavity flows along the output pipeline to the second cavity; Step S3, inputting a gas source into the gas injection port during the flow of the liquid gallium, so that the liquid gallium reacts with the gas source to generate a gallium-containing gas source and discharges the gas source through an exhaust pipeline; Step S4, adjusting the pressure of the first chamber so that the unreacted liquid gallium in the second chamber returns to the first chamber through the reflux pipeline.

10. The method for preparing a gallium-containing gas source according to claim 9, characterized in that: Step S2 includes: Filling the first cavity with liquid gallium through an input pipeline; The first cavity is filled with protective gas through the input pipeline, and the supply amount of the protective gas and the pressure of the first cavity are controlled through a pressure detector, so that the liquid gallium flows along the output pipeline.

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