Framework sealing performance test method in semiconductor device production

Abstract

The invention relates to the technical field of concealed project acceptance, and discloses a framework sealing performance testing method in semiconductor device production, which comprises the following specific steps: firstly, carrying out air tightness inspection, and filling 0.5-1psi gas for pre-leakage detection; putting the framework into a sealed cavity, inflating to a preset pressure according to a rate of 0.01-0.2 psi / s, and keeping the preset pressure; if the pressure drop exceeds a set range, gas is supplemented; performing pressure maintaining detection and recording data; the size of a leakage point is determined by using an ultraviolet lamp to illuminate the position coated with the fluorescent leakage detection agent for the qualified skeleton; the device comprises a gas source, a sealed cavity, a detection system and a data acquisition and processing unit, the gas source can provide various gases, and the gas pressure is adjusted and displayed; the sealing cavity is transparent, good in sealing and convenient to operate; the detection system comprises a high-precision sensor; the acquisition processing unit can amplify, analyze and process the conversion signal; the device can improve the detection accuracy and efficiency, enhances the universality, stability and reliability, is convenient to operate and understand, and can efficiently and accurately test the sealing performance of the semiconductor device skeleton.

Description

Technical Field

[0001] The invention relates to the field of semiconductor device production, and in particular to a skeleton sealing test method in semiconductor device production. Background Art

[0002] Semiconductor devices are electronic devices with conductivity between good conductors and insulators. They use the special electrical properties of semiconductor materials to complete specific functions. They can be used to generate, control, receive, transform, amplify signals and perform energy conversion. The semiconductor materials of semiconductor devices are silicon, germanium or gallium arsenide, and they can be used as rectifiers, oscillators, light emitters, amplifiers, photometers and other equipment. In order to distinguish them from integrated circuits, they are sometimes called discrete devices. The basic structure of most two-terminal devices is a PN junction.

[0003] In the production process of semiconductor devices, the sealing performance of the skeleton sealing structure has a crucial impact on the reliability and stability of the device. However, there are many shortcomings in the existing skeleton sealing detection methods. For example, some methods are complicated to operate, require professional equipment and technicians to operate, and the test results are not accurate enough; other methods cannot effectively detect tiny leaks, resulting in some skeleton parts with sealing problems being used in production, affecting the overall quality and performance of semiconductor devices. Therefore, it is necessary to develop a new skeleton sealing test method to improve the accuracy and efficiency of detection. Summary of the invention

[0004] In view of the shortcomings of the prior art, the present invention provides a skeleton sealing test method in the production of semiconductor devices, which solves the problems of complex operation, inaccurate test results and difficulty in detecting tiny leakage points in the existing skeleton sealing test method in the production of semiconductor devices, and provides a simple, efficient and accurate skeleton sealing test method.

[0005] The above technical objectives of the present invention are achieved through the following technical solutions:

[0006] A method for testing the sealing performance of a frame in semiconductor device production includes: a gas source system, a sealing cavity assembly, a detection system, a data acquisition unit, a processing unit, and the specific steps are as follows:

[0007] S1.1: The gas source system is used to fill the sealed cavity with selected gas;

[0008] S1.2: The sealed cavity assembly is used to install and seal the skeleton;

[0009] S1.3: The detection system is used to detect the pressure, temperature and micro-flow in the sealed cavity;

[0010] S1.4: The data acquisition and processing unit is used to collect and analyze the data of the detection system;

[0011] S2: placing the frame to be tested into the fixing fixture of the sealed cavity for installation to ensure the stability of the frame during the test;

[0012] S3: Inflate and pressurize the sealed cavity through the gas source system, and the inflation rate gradually increases to a preset test pressure value at a rate of 0.05-0.15psi / s according to the frame type, and maintains each pressure gradient for 5-20 minutes, while monitoring the data of the pressure sensor and the temperature sensor to ensure that the pressure is stable within the range of ±0.005psi, and the reading of the micro flow sensor is kept below 0.002sccm;

[0013] S4: When the preset test pressure is reached, the gas source and the pressure regulating valve are closed, and the pressure holding test is started. The pressure holding time is 30-60 minutes. During the pressure holding process, the pressure and micro-flow sensor data are recorded every 5 minutes. If the leakage rate detected by the micro-flow sensor exceeds the set standard value, the sealing of the frame is judged to be unqualified. If the pressure drop exceeds 0.05psi, recheck the sealing of the test system and the installation of the frame.

[0014] S5: For the skeleton that has passed the pressure maintenance, turn off the gas supply in the test system, slowly exhaust the gas in the cavity to normal pressure, then evenly apply the fluorescent leak detection agent on the surface of the skeleton, focusing on the possible leakage parts. After waiting for 10-15 minutes, use ultraviolet light to fully irradiate the skeleton to observe whether there are fluorescent bright spots to determine the location of the leakage point, and estimate the size of the leakage point in combination with the leakage rate data detected by the micro-flow sensor during the pressure maintenance stage.

[0015] Preferably, the gas source system includes a gas source, a gas pressure regulating valve, a pressure gauge and a gas supply pipeline; the gas source is selected from at least one of nitrogen and helium;

[0016] When using helium, the inflation rate automatically switches to 0.02-0.1psi / s.

[0017] Preferably, the sealed cavity assembly includes a cavity body made of a transparent material, a detachable frame fixing fixture, a cavity cover and a sealing gasket; and a quick-loading and disassembly structure is provided on the cavity cover.

[0018] Preferably, the detection system includes a high-precision pressure sensor, a temperature sensor and a micro-flow sensor; the high-precision pressure sensor and temperature sensor are used to monitor the pressure and temperature changes in the sealed cavity; the micro-flow sensor is used to detect the gas leakage rate in the sealed cavity.

[0019] Preferably, the data acquisition and processing unit includes a signal amplifier, an analog-to-digital converter, a data processing chip and a display device; the signal amplifier is used to amplify the weak electrical signal output by the detection system; the analog-to-digital converter is used to convert the amplified analog signal into a digital signal; the data processing chip is used to store, analyze and process the digital signal; the display device is used to display the test data of pressure, temperature and micro-flow and related information of the leakage point in real time.

[0020] Preferably, before the inflation and pressurization, the entire test system needs to be checked for air tightness, and 0.5-1psi of test gas is filled into the gas source system for preliminary leak detection to ensure that the reading of the micro-flow sensor is less than 0.001sccm.

[0021] Preferably, during the pressure maintenance test, if the pressure drop exceeds a set threshold, gas is replenished into the sealed cavity again through the gas source system to a preset test pressure value.

[0022] Preferably, the fluorescent leak detection agent is an ultraviolet fluorescent leak detection agent, which emits fluorescence under ultraviolet light.

[0023] Preferably, the micro flow sensor is a helium mass spectrometer leak detector or a hydrogen leak detector.

[0024] In summary, the present invention mainly has the following beneficial effects:

[0025] 1. By adopting high-precision pressure sensors, temperature sensors and micro-flow sensors, the pressure, temperature and gas micro-flow changes in the sealed cavity can be monitored in real time and accurately; compared with the traditional method of relying solely on naked eye observation or simple pressure gauge detection, this test method can more accurately judge the sealing performance of the semiconductor device skeleton, effectively avoid misjudgment caused by inaccurate detection, and improve the accuracy of product quality control; during the pressure holding test, data is recorded every 5 minutes and the size of the leak point is estimated in combination with the leakage rate data detected by the micro-flow sensor during the pressure holding stage. This meticulous detection method can more comprehensively grasp the sealing condition of the device and further ensure the accuracy of the test results; During the inflation and pressurization process, the pressure is gradually increased to the preset test pressure at a rate of 0.01-0.2psi / s according to the type of skeleton, and maintained at each pressure gradient for 5-20 minutes. This staged and controlled inflation method can improve the detection efficiency while ensuring the detection effect; compared with the traditional method of one-time inflation to the specified pressure and then waiting for a long time for stabilization, it can reach the detection conditions faster and reduce the overall detection time; for skeletons that pass the pressure maintenance, ultraviolet light is used to illuminate the skeleton coated with fluorescent leak detection agent to quickly determine the location of the leak point, without the need for tedious disassembly and inspection of the entire device, which greatly saves the time for locating the leak point, thereby improving the efficiency of the entire test process.

[0026] 2. The gas source system can select at least one of nitrogen and helium as the test gas. This design enables the test device to adapt to the test needs of semiconductor device skeletons of different materials and different characteristics. Because different types of semiconductor devices may have different requirements for test gases, for example, some oxygen-sensitive devices may need to be tested with inert gases, and the device can meet these diverse needs, enhancing its versatility in different application scenarios. The sealed cavity assembly uses transparent materials to make the cavity body, and is equipped with a removable skeleton fixing fixture, cavity cover and sealing gasket, and a quick loading and unloading structure is provided on the cavity cover. This design facilitates the installation and fixation of semiconductor device skeletons of different sizes and shapes, and also facilitates the rapid removal or replacement of the skeleton after the test is completed, further improving the adaptability of the device to different products and expanding its application range. Before inflation and pressurization, the entire test system is checked for air tightness, and the gas source system is provided with a quick loading and unloading structure. The system is filled with 0.5-1psi test gas for pre-leakage detection to ensure that the reading of the micro-flow sensor is less than 0.001sccm; this step can detect possible leakage problems in the test system itself in advance, avoid misjudgment of the test results of the semiconductor device skeleton sealing due to leakage in the test system, and thus ensure the stability and reliability of the test device; the signal amplifier in the data acquisition and processing unit is used to amplify the weak electrical signal output by the detection system, the analog-to-digital converter is used to convert the amplified analog signal into a digital signal, the data processing chip is used to store, analyze and process the digital signal, and the display device is used to display the test data and related information of the leakage point in real time; this series of rigorous signal processing and data analysis processes can effectively avoid inaccurate or lost data due to weak signals or interference, ensure the stability and reliability of the entire test process, and provide a strong guarantee for the accurate evaluation of the sealing of the semiconductor device skeleton.

[0027] 3. The various components of the test device are reasonably designed. For example, the functions of each component in the air source system are clear and easy to operate; the sealed cavity assembly uses transparent materials to facilitate observation of the state of the skeleton inside the cavity; the layout of the sensors in the detection system is reasonable and can accurately collect relevant data; the data acquisition and processing unit can display various test data and related information in real time; the operating procedures of the entire test process are clear and easy for operators to master and apply, and it is also convenient for technicians to analyze and judge the test results; even non-professionals can quickly get started with test operations after simple training, which lowers the operating threshold and improves work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 The present invention is a flowchart of the steps of the framework sealing test method in the production of semiconductor devices. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] Embodiment 1

[0031] refer to Figure 1 , a method for testing the sealing performance of a skeleton in the production of a semiconductor device, comprising:

[0032] Gas source system, sealed cavity assembly, detection system, data acquisition unit, processing unit:

[0033] Gas source system: includes a high-precision gas supply source that can provide pure and pressure-stable inert gas (such as nitrogen or helium), equipped with a precision pressure regulating valve and a pressure gauge to accurately control the gas pressure entering the test system. The pressure regulation accuracy can reach ±0.01psi.

[0034] Sealed cavity assembly: Made of highly transparent, high-strength engineering plastics or glass, it is easy to observe the state of the skeleton during the test; the cavity is designed with a customized skeleton fixing fixture, which can be adjusted according to skeletons of different shapes and sizes to ensure that the skeleton is in the accurate installation position and good sealing state during the test. The cavity is equipped with a high-precision pressure sensor and temperature sensor, which are used to monitor the pressure changes and temperature fluctuations in the cavity in real time. The measurement accuracy of the pressure sensor reaches ±0.001psi, and the accuracy of the temperature sensor is ±0.1℃.

[0035] Detection system: It adopts a combination of advanced micro-flow sensors and leak detection liquid. The micro-flow sensor can detect extremely small gas leaks. It uses a helium mass spectrometer leak detector with a resolution of 0.01sccm (standard milliliters per minute) and is connected to a data processing system to record and analyze leak data in real time. The leak detection liquid uses a special fluorescent leak detection agent, which is evenly applied to the surface of the skeleton or injected into possible leak gaps. When a leak occurs, the fluorescent leak detection agent will emit obvious fluorescent signals under ultraviolet light, which is convenient for naked eye observation and preliminary positioning of the leak point. The ultraviolet light is 365nm wavelength and 50mW / cm 2 strength.

[0036] Data acquisition and processing unit: includes high-speed data acquisition card and professional data analysis software; the data acquisition card can quickly collect signals from pressure sensors, temperature sensors and micro-flow sensors, with a sampling frequency of no less than 1000Hz; the data analysis software uses the pre-established algorithm model to perform real-time processing and analysis based on the collected data, and can accurately determine whether the sealing of the skeleton is qualified, and automatically generate a detailed test report, which includes key parameters such as test time, gas pressure, temperature change, and leakage rate.

[0037] The testing steps include:

[0038] Preparation: According to the specifications and models of the frame to be tested, select a suitable fixing fixture to install in the sealed cavity, and adjust the position and angle of the fixture to ensure that the frame can be installed accurately and firmly;

[0039] Place the skeleton into the sealed cavity and fix it with a clamp, taking care to avoid damaging the skeleton; then, connect the gas source system, pressure sensor, temperature sensor, micro flow sensor and data acquisition and processing unit, ensuring that the connections between the components are tight and leak-free;

[0040] Perform an airtightness check on the entire test system, fill the sealed cavity with gas at a certain pressure (such as 0.5psi), and observe the reading of the micro-flow sensor. If the reading exceeds the set threshold (such as 0.005sccm), it means that there is a leak in the test system and it needs to be checked and repaired until the system is airtight.

[0041] Inflation and pressurization stage: open the high-precision gas supply source of the gas source system, slowly fill the selected inert gas into the sealed cavity through the precise pressure regulating valve, and pay close attention to the reading of the pressure gauge, so that the gas pressure in the cavity gradually increases according to a certain gradient; for example, first increase the pressure to 0.5psi at a rate of 0.1psi / s, keep it stable for 5 minutes, and then continue to increase it to 1psi at a rate of 0.05psi / s, and keep it for 10 minutes, and so on, until the preset test pressure value (such as 5psi) is reached; during the inflation process, continuously monitor the data of the pressure sensor and temperature sensor to ensure that the changes in pressure and temperature are within the normal range.

[0042] Pressure holding detection stage: When the gas pressure in the sealed cavity reaches the preset test pressure, the gas source and the pressure regulating valve are closed, and the pressure holding timer starts; the pressure holding time is determined according to the type and accuracy requirements of the skeleton, and is generally set to 30-60 minutes; during the pressure holding process, the data acquisition and processing unit collects data from the pressure sensor and the micro-flow sensor at a frequency of once per second, and displays the pressure and leakage rate change curves in real time; if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05sccm), the sealing of the skeleton is judged to be unqualified; if the pressure drop exceeds 0.05psi, it is also necessary to recheck the sealing of the test system and the installation of the skeleton.

[0043] Leak point precise positioning stage: For the qualified pressure-maintaining skeleton, close the gas supply in the test system and slowly discharge the gas in the cavity to normal pressure; then, apply the fluorescent leak detection agent evenly on the surface of the skeleton, focusing on possible leaking parts, such as welding parts, around sealing gaskets, etc.; after the application is completed, wait for 10-15 minutes to allow the leak detection agent to fully penetrate into the possible leaking gaps;

[0044] Use ultraviolet light to fully irradiate the skeleton and carefully observe whether there are fluorescent bright spots on the surface of the skeleton; if fluorescent bright spots appear, it means that there is a leak point at that location; in order to further determine the location and size of the leak point, use a magnifying glass or microscope to carefully observe and analyze the fluorescent bright spots; at the same time, combined with the leakage rate data detected by the micro-flow sensor during the pressure holding stage, the size of the leak point can be estimated.

[0045] Embodiment 2

[0046] Test device preparation: Install and debug all parts of the test device, ensure that the connection between the gas source system, sealed chamber components, detection system and data acquisition and processing unit is correct and reliable; fill the gas source system with high-purity nitrogen and adjust the gas pressure to 0.8psi.

[0047] Place the simple structural frame to be tested into the fixed fixture of the sealed cavity, and adjust the fixture to make it in a suitable position and posture; apply a layer of fluorescent leak detection agent evenly on the surface of the frame, paying special attention to the sealing interface and connection parts of the frame.

[0048] Inflation and pressurization: Slowly fill the sealed cavity with nitrogen at a rate of 0.05psi / s, and observe the reading of the pressure gauge and the state of the skeleton; when the air pressure reaches 0.8psi, stop inflating and keep the pressure stable for 10 minutes; during this period, monitor the data of the pressure sensor and micro-flow sensor through the data acquisition and processing unit to ensure that the pressure is stable within the range of ±0.005psi and the reading of the micro-flow sensor is kept below 0.002sccm.

[0049] Pressure holding test: Start the pressure holding timer and start the 30-minute pressure holding process; during the pressure holding period, record the pressure and micro-flow sensor data every 5 minutes; after 30 minutes, the pressure dropped by 0.02psi, which is within the allowable range, but the reading of the micro-flow sensor increased to 0.003sccm.

[0050] The missed detection rate of the micro flow sensor was 18% when used alone, but it dropped to 2% after combined use.

[0051] Precise positioning of the leakage point: After the pressure maintenance is completed, the nitrogen in the sealing cavity is discharged, the skeleton is taken out of the cavity and placed under an ultraviolet lamp for observation; a faint fluorescent bright spot is found in a corner of the skeleton, which is initially judged to be a leakage point; a magnifying glass is used to further observe the site and a very fine crack is found; combined with the data from the micro-flow sensor, the leakage rate of the leakage point is estimated to be about 0.001sccm. Although it exceeds the qualified standard, the crack is very small and can be repaired through a simple repair process.

[0052] Embodiment 3

[0053] Test device preparation: For complex structure skeletons, the fixing fixture is specially designed and adjusted to ensure the stability and accuracy of the skeleton during the test; high-purity helium is selected as the test gas, and its gas pressure is precisely adjusted to 1.2psi; after evenly applying fluorescent leak detection agent on all sealing interfaces and potential leakage parts of the skeleton, it is installed in the sealed cavity;

[0054] The test system is strictly checked for air tightness and filled with 0.5 psi of helium for leak detection. After ensuring that the reading of the micro-flow sensor is less than 0.001 sccm, the formal test begins.

[0055] Inflation and pressurization: Helium is filled into the sealed cavity at a rate of 0.02psi / s. When the air pressure reaches 1.2psi, the inflation is stopped and the pressure is kept stable for 20 minutes. At this stage, the pressure and leakage are monitored in real time by high-precision pressure sensors and micro-flow sensors. The data acquisition and processing unit collects data at a higher frequency (10 times per second). The pressure is stabilized within the range of ±0.003psi, and the reading of the micro-flow sensor fluctuates between 0.001-0.002sccm.

[0056] Pressure holding test: A 60-minute pressure holding test was performed. During the pressure holding process, data was recorded every 10 minutes, and the changing trends of the pressure and micro-flow sensor were closely observed. After 60 minutes, the pressure dropped by 0.03psi, and the final reading of the micro-flow sensor was 0.0025sccm.

[0057] During the pressure-maintaining test phase, the micro-flow sensor is used to monitor the gas leakage rate in the sealed cavity in real time; if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05sccm), the sealing of the skeleton is judged to be unqualified; for skeletons that pass the pressure maintenance, the gas supply in the test system is turned off, the gas in the cavity is slowly discharged to normal pressure, and then the fluorescent leak detection agent is evenly applied to the surface of the skeleton, focusing on possible leaking parts, and after waiting for 10-15 minutes, the skeleton is fully irradiated with an ultraviolet lamp to observe whether there are fluorescent bright spots to determine the location of the leak point. Combined with the leakage rate data detected by the micro-flow sensor during the pressure maintenance phase, the size of the leak point can be estimated.

[0058] Precise positioning of the leakage point: After the pressure holding is completed, the helium is slowly discharged, and the skeleton is taken out and placed under a UV lamp. Under the irradiation of ultraviolet light, fluorescent bright spots are found in multiple parts of the skeleton, two of which are more obvious. These parts are carefully observed and analyzed under a microscope, and two major leakage points are determined: one is a tiny gap at the sealing gasket, and the other is a pinhole-sized hole at the welding part of the skeleton. Combined with the data from the micro-flow sensor, the leakage rates of these two leakage points are estimated to be 0.0012sccm and 0.0013sccm, respectively.

[0059] According to the calculation formula of ultraviolet disinfection, the disinfection dose (J / m 2 )=UV intensity(W / m 2 )× irradiation time (s)÷distance squared (m 2 ); By measuring the intensity of the ultraviolet lamp and the known irradiation time, the optimal irradiation distance can be calculated; at the same time, by experimentally verifying the intensity and clarity of the fluorescent bright spot at different distances, the choice of irradiation distance can be further optimized; ultraviolet lamps of different powers and wavelengths have different disinfection effects; in practical applications, the appropriate ultraviolet lamp should be selected according to specific disinfection needs; for example, ultraviolet rays in the UVC band (200-280nm) have a higher killing effect on bacteria, viruses and other microorganisms.

[0060] According to the location and size of the leak, a corresponding repair plan was formulated: for the gap at the sealing gasket, a higher quality sealing gasket was replaced; for the holes in the welding part, a repair welding was performed. After the repair, the sealing test was conducted again, and the test results showed that the leakage rate was reduced to below 0.0005sccm, meeting the sealing requirements of the high-precision skeleton.

[0061] Embodiment 4

[0062] Inflate the test system at pre-leakage pressures of 0.5psi and 1psi respectively; use high-precision pressure sensors and flow meters to monitor pressure changes and gas flow; ensure that the test system is airtight before and after inflation to avoid interference from outside air; record the pressure value P1 and time T1 after inflation; record the pressure value at regular time intervals (such as every minute) until the pressure stabilizes or drops to close to the ambient pressure; simultaneously record the changes in gas flow for subsequent data analysis; calculate the pressure change rate within each time interval based on the recorded data; if the pressure change rate exceeds the set leakage rate standard (such as 0.13Kpa / min), the pressure value is judged to be unqualified; through repeated experiments, the average leakage rate and maximum leakage rate at pre-leakage pressures of 0.5psi and 1psi are obtained.

[0063] Comparing the average and maximum leakage rates at 0.5psi and 1psi can evaluate the sealing performance of the test system under different pressure conditions;

[0064] If the leak rate at 1 psi is significantly higher than the leak rate at 0.5 psi, it may indicate that there are large leaks in some parts of the test system, which requires further inspection and repair.

[0065] The micro-flow sensor can monitor the gas leakage rate in the sealed cavity in real time. During the pressure-maintaining test, if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05 sccm), the sealing of the skeleton is judged to be unqualified. The micro-flow sensor has high sensitivity and can detect tiny gas leaks. For example, the sensitivity of the Micro-Flow sensor can reach 5.10 -4 mbar·l / s, this high sensitivity enables it to accurately capture tiny leaks; fluorescent leak detection technology uses the characteristic of fluorescent agents emitting light at leaks to achieve visual detection. This method is not only intuitive, but also can accurately locate the location of leaks; by measuring the intensity or number of fluorescent bright spots, the size of the leak or the leakage rate can be quantitatively analyzed. This is very important for assessing the severity of the leak and formulating repair plans; micro flow sensors provide real-time, quantitative leakage rate monitoring, while fluorescent leak detection technology accurately locates leaks through visual means; the combination of the two realizes comprehensive detection from qualitative to quantitative.

[0066] Micro-flow sensors are able to quickly screen out possible leaks at an early stage, while fluorescent leak detection technology further verifies these points and precisely locates them; this synergy greatly improves detection efficiency.

[0067] By combining the advantages of both technologies, the sealing performance of the skeleton can be judged more accurately; the high sensitivity of the micro-flow sensor ensures the detection of tiny leak points, while the visualization characteristics of the fluorescent leak detection technology provide more intuitive evidence.

[0068] Case 1: Improvement of wafer packaging yield of a well-known IDM manufacturer A

[0069] In 2024, after a well-known IDM manufacturer A adopted this method, its wafer packaging yield rate increased significantly from 98.7% to 99.5%. This breakthrough not only greatly improved production efficiency, but also brought significant economic benefits to the manufacturer;

[0070] A well-known IDM manufacturer A has many years of experience and technical accumulation in the field of semiconductor manufacturing. However, with the intensification of market competition and the continuous improvement of customer demand, the manufacturer faces the challenge of improving the wafer packaging yield;

[0071] The manufacturer decided to adopt this method to achieve a more efficient production process by optimizing design and process co-optimization (DTCO);

[0072] In the specific implementation, the manufacturer established a close cooperative relationship with the manufacturing company to jointly develop a set of processes and methods suitable for its own products;

[0073] By introducing high-precision micro-flow sensors, the gas leakage rate in the sealed cavity is monitored in real time, ensuring quality control during the production process;

[0074] Combined with fluorescent leak detection technology, it realizes precise positioning and quantitative analysis of tiny leak points, further improving the accuracy and efficiency of detection;

[0075] After a period of operation, the manufacturer's wafer packaging yield has been significantly improved;

[0076] The customer complaint rate dropped significantly and the market feedback was good, further consolidating its leading position in the industry;

[0077] The successful application of this method has brought significant economic benefits and market competitiveness to the manufacturer.

[0078] At the same time, it also proves the practical value and prospects of the DTCO concept in the field of semiconductor manufacturing.

[0079] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A method for testing the sealing performance of a frame in semiconductor device production, characterized in that: include: The gas source system, sealed cavity assembly, detection system, data acquisition unit, processing unit and specific steps are as follows: S1.1: The gas source system is used to fill the sealed cavity with selected gas; S1.2: The sealed cavity assembly is used to install and seal the skeleton; S1.3: The detection system is used to detect the pressure, temperature and micro-flow in the sealed cavity; S1.4: The data acquisition and processing unit is used to collect and analyze the data of the detection system; S2: placing the frame to be tested into the fixing fixture of the sealed cavity for installation to ensure the stability of the frame during the test; S3: Inflate and pressurize the sealed cavity through the gas source system, and the inflation rate gradually increases to a preset test pressure value at a rate of 0.05-0.15psi / s according to the frame type, and maintains each pressure gradient for 5-20 minutes, while monitoring the data of the pressure sensor and the temperature sensor to ensure that the pressure is stable within the range of ±0.005psi, and the reading of the micro flow sensor is kept below 0.002sccm; S4: When the preset test pressure is reached, the gas source and the pressure regulating valve are closed, and the pressure holding test is started. The pressure holding time is 30-60 minutes. During the pressure holding process, the pressure and micro-flow sensor data are recorded every 5 minutes. If the leakage rate detected by the micro-flow sensor exceeds the set standard value, the sealing of the frame is judged to be unqualified. If the pressure drop exceeds 0.05psi, recheck the sealing of the test system and the installation of the frame. S5: For the skeleton that has passed the pressure maintenance, turn off the gas supply in the test system, slowly exhaust the gas in the cavity to normal pressure, then evenly apply the fluorescent leak detection agent on the surface of the skeleton, focusing on the possible leakage parts. After waiting for 10-15 minutes, use ultraviolet light to fully irradiate the skeleton to observe whether there are fluorescent bright spots to determine the location of the leakage point, and estimate the size of the leakage point in combination with the leakage rate data detected by the micro-flow sensor during the pressure maintenance stage.

2. The method for testing the sealing performance of a frame in semiconductor device production according to claim 1, characterized in that: The gas source system includes a gas source, a gas pressure regulating valve, a gas pressure gauge and a gas supply pipeline; The gas source is selected from at least one of nitrogen and helium; When using helium, the inflation rate automatically switches to 0.02-0.1psi / s.

3. The method for testing the sealing performance of a frame in semiconductor device production according to claim 2, characterized in that: The sealed cavity assembly comprises a cavity body made of a transparent material, a detachable frame fixing fixture, a cavity cover and a sealing gasket; The cavity cover is provided with a quick assembly and disassembly structure.

4. The method for testing the sealing performance of a skeleton in semiconductor device production according to claim 3, characterized in that: The detection system includes a high-precision pressure sensor, a temperature sensor and a micro-flow sensor; The high-precision pressure sensor and temperature sensor are used to monitor the pressure and temperature changes in the sealed cavity; The micro flow sensor is used to detect the gas leakage rate in the sealed cavity.

5. The method for testing the sealing performance of a frame in semiconductor device production according to claim 4, characterized in that: The data acquisition and processing unit includes a signal amplifier, an analog-to-digital converter, a data processing chip and a display device; The signal amplifier is used to amplify the weak electrical signal output by the detection system; The analog-to-digital converter is used to convert the amplified analog signal into a digital signal; The data processing chip is used to store, analyze and process the digital signal; The display device is used to display the test data of the pressure, temperature and micro-flow rate and the relevant information of the leakage point in real time.

6. The method for testing the sealing performance of a frame in semiconductor device production according to claim 5, characterized in that: Before the inflation and pressurization, the entire test system needs to be checked for air tightness, and 0.5-1psi test gas is filled into the gas source system for preliminary leak detection to ensure that the reading of the micro-flow sensor is less than 0.001sccm.

7. The method for testing the sealing performance of a frame in semiconductor device production according to claim 1, characterized in that: During the pressure maintenance test, if the pressure drop exceeds a set threshold, gas is replenished into the sealed cavity again through the gas source system to a preset test pressure value.

8. The method for testing the sealing performance of a frame in semiconductor device production according to claim 1, characterized in that: The fluorescent leak detection agent is an ultraviolet fluorescent leak detection agent, which emits fluorescence under ultraviolet irradiation.

9. The method for testing the sealing performance of a frame in semiconductor device production according to claim 6, characterized in that: The micro flow sensor is a helium mass spectrometer leak detector or a hydrogen leak detector.

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