Semiconductor industry fluorine-containing wastewater treatment device and ecological recycling system

Abstract

The invention discloses a semiconductor industry fluorine-containing wastewater treatment device and an ecological recycling system, and particularly relates to the technical field of wastewater treatment.The semiconductor industry fluorine-containing wastewater treatment device comprises an oxidation sterilization device and a blending device.The oxidation sterilization device comprises an oxidation pond, and a mounting cover is movably mounted at the top of the oxidation pond; a plurality of ultraviolet lamps are fixedly mounted at the bottom of the mounting cover, an output mechanism is fixedly mounted at the bottom of the oxidation pond, a stirring mechanism is fixedly connected to the top of the output mechanism, and an aeration pipe is fixedly mounted at the bottom of the oxidation pond. According to the fluorine-containing wastewater treatment device for the semiconductor industry, through cooperation of the output mechanism, the stirring mechanism and the aeration pipe, a water body in the oxidation pond uniformly flows in the whole pond, so that all the water bodies can be fully exposed under the irradiation of ultraviolet lamps, and a large number of ultraviolet lamps do not need to be placed in the water body to ensure the irradiation quality; the problem that in the prior art, high-frequency shutdown is needed for cleaning the ultraviolet lamp, and the efficiency is low is fundamentally solved.

Description

Technical Field

[0001] The present invention relates to the technical field of wastewater treatment, and in particular to a semiconductor industry fluorine-containing wastewater treatment device and an ecological recycling system. Background Art

[0002] The fluoride-containing wastewater generated during the manufacturing process of the semiconductor industry poses a potential risk to the environment and human health because it contains high concentrations of fluoride and other harmful substances. In order to meet this challenge, efficient treatment technology and strict management measures must be adopted to ensure that wastewater is properly purified before being discharged or reused, thereby protecting the safety of water resources and the ecological environment. By introducing advanced treatment processes such as chemical precipitation, membrane separation, and ecological reuse systems, not only can fluoride ions and other pollutants in wastewater be effectively removed, but water resources can also be recycled to support the sustainable development of the semiconductor industry.

[0003] Ultraviolet disinfection equipment is widely used in the treatment of fluoride-containing wastewater in the semiconductor industry, with its efficient disinfection ability and relatively low operating costs. Ultraviolet disinfection achieves the purpose of sterilization by destroying the DNA structure of microorganisms to inhibit their reproduction, without adding any chemicals to the water, avoiding the problem of secondary pollution. For the semiconductor industry, the use of ultraviolet disinfection equipment can not only effectively remove bacteria, viruses and other pathogens in wastewater, but also ensure the safety of discharged water quality.

[0004] In order to ensure that the light can fully irradiate the water body, the ultraviolet sterilization equipment in the prior art usually needs to evenly arrange a large number of lamps inside the waterway. Although this meets the usage requirements to a certain extent, the cost of using a large number of lamps is too high, and the lamps are immersed in the sewage and the outer walls are easily accumulated with dirt, which affects the light. The lamps need to be shut down regularly for cleaning, which results in low efficiency. Summary of the invention

[0005] The purpose of the present invention is to solve the problems in the prior art that the cost of using a large number of lamps is too high, the outer walls of the lamps immersed in sewage are easily accumulated with dirt affecting the lighting, and the lamps need to be shut down regularly for cleaning, resulting in low efficiency.

[0006] To achieve the above object, the present invention adopts the following technical solutions:

[0007] A semiconductor industry fluorine-containing wastewater treatment device is designed, including an oxidation sterilization device and a blending device, the oxidation sterilization device includes an oxidation tank, a mounting cover is movably installed on the top of the oxidation tank, a plurality of ultraviolet lamps are fixedly installed on the bottom of the mounting cover, an output mechanism is fixedly installed on the bottom of the oxidation tank, a stirring mechanism is fixedly connected to the top of the output mechanism, an aeration pipe is fixedly installed on the bottom of the oxidation tank, the stirring mechanism is rotatably installed inside the oxidation tank, the aeration pipe is arranged at the bottom of the stirring mechanism, an overflow control mechanism is fixedly installed on one side of the oxidation tank, an overflow weir is fixedly installed on one side of the overflow control mechanism, the overflow weir is slidably installed inside the oxidation tank, the overflow weir is arranged on the top of the stirring mechanism, the output mechanism includes a first mounting frame, the first mounting frame is fixedly installed on the bottom of the oxidation tank, a motor is fixedly installed on the bottom of the first mounting frame, a first gear is rotatably installed on one side of the first mounting frame, and the output shaft of the motor is driven by a belt The component is fixedly connected to the bottom of the first gear, a second gear is rotatably mounted on one side of the first mounting frame, a spline shaft is slidably mounted inside the second gear, the second gear is meshingly connected to one side of the first gear, a connecting shaft is fixedly connected to the top of the spline shaft, and the connecting shaft is fixedly connected to the bottom of the stirring mechanism, the output mechanism also includes a gearbox, an input shaft of the gearbox is fixedly connected to the top of the first gear, a reciprocating screw is rotatably mounted on one side of the first mounting frame, the output shaft of the gearbox is fixedly connected to the bottom of the reciprocating screw, a connecting block is threadedly connected to the outer wall of the reciprocating screw, the connecting block is fixedly mounted on the outer wall of the connecting shaft, a limiting frame is fixedly mounted on one side of the first mounting frame, and the connecting block is slidably mounted on the outer wall of the limiting frame, the blending device includes a regulating tank, a liquid inlet mechanism is fixedly mounted on one side of the regulating tank, a drain pipe is fixedly mounted on the side of the regulating tank away from the liquid inlet mechanism, and a liquid inlet valve connected to the drain pipe is provided at the bottom of the oxidation tank.

[0008] Furthermore, a plurality of refraction plates are fixedly mounted on the bottom of the ultraviolet lamp, and the refraction plates are arranged on the top of the ultraviolet lamp.

[0009] Furthermore, a number of interfering flow baffles are staggeredly installed inside the regulating tank.

[0010] Furthermore, the overflow control mechanism includes a mounting block, which is fixedly installed inside the oxidation tank, a slider is slidably installed inside the mounting block, a drainage pipe is installed inside the slider, and the slider is fixedly installed on one side of the overflow weir.

[0011] Furthermore, a slide groove is provided inside the mounting block, the slider is slidably installed inside the slide groove, sealing plates are fixedly installed on the upper and lower sides of the slider, sealing grooves are provided on the upper and lower sides of the slide groove, the sealing plates are slidably installed inside the sealing grooves, a second mounting frame is fixedly installed on the bottom of the slider, two groups of hydraulic rods are fixedly installed on the bottom of the second mounting frame, and the two groups of hydraulic rods are fixedly installed on one side of the mounting block.

[0012] Furthermore, the stirring mechanism comprises a mounting plate, and a plurality of stirring blades are fixedly mounted on the outer wall of the mounting plate, and the cross section of the stirring blades is Z-shaped.

[0013] Furthermore, a plurality of winding chutes are provided inside the stirring blade.

[0014] Furthermore, the liquid inlet mechanism includes a liquid inlet pipe, one side of the liquid inlet pipe is fixedly connected to a volute, a leakage hole is opened inside the volute, a liquid outlet pipe is fixedly installed at the bottom of the volute, the liquid outlet pipe is connected to the leakage hole, and a liquid outlet hole is opened on the side of the liquid outlet pipe away from the leakage hole.

[0015] Furthermore, a number of turbulence plates are staggeredly installed inside the liquid outlet pipe.

[0016] In order to solve the above technical problems, the present invention also proposes an ecological reuse system for a semiconductor industry fluorine-containing wastewater treatment device, which is used for the semiconductor industry fluorine-containing wastewater treatment device. The ecological reuse system includes a pretreatment unit, a plant decomposition unit, a liquid storage unit, and a recovery unit. The pretreatment unit is used to filter large suspended particles in the wastewater and perform disinfection to prevent the wastewater from damaging subsequent units.

[0017] The wastewater after the pretreatment unit enters the plant decomposition unit, where the plant roots and microorganisms work together to decompose organic matter and other pollutants, while providing habitats for birds and insects. At the same time, there are still a lot of NO3-, Ca2+ and other ions in the treated fluoride-containing wastewater. Ca and N are both essential nutrients for plant growth, which will promote the healthy growth of plants in the plant decomposition unit.

[0018] The liquid storage unit includes an oxidation pond and an ecological pond. The ecological pond is used to store wastewater with a low degree of pollution. The ecological pond is a small aquatic ecosystem that simulates the function of a natural lake and uses the interaction between plants, microorganisms and animals to purify water quality. The oxidation pond is used to store wastewater with a high degree of pollution, relying on sunlight and oxygen in the air to promote the activity of aerobic microorganisms and accelerate the decomposition of organic matter.

[0019] Recycling treated water or rainwater through the recovery unit to supply the pre-treatment unit or plant decomposition unit reduces the dependence on external fresh water sources, especially in areas with scarce water resources. This is particularly important:

[0020] Compared with the prior art, the semiconductor industry fluorine-containing wastewater treatment device proposed by the present invention has the following beneficial effects:

[0021] (1) The present invention makes the water in the oxidation pond flow evenly throughout the pond through the coordination between the output mechanism, the stirring mechanism and the aeration pipe, so that all the water can be fully exposed to the irradiation of the ultraviolet lamp. There is no need to place a large number of ultraviolet lamps in the water body to ensure the irradiation quality, which fundamentally solves the problems of the prior art that a large number of ultraviolet lamps are required, which are high in cost, and the ultraviolet lamps need to be shut down frequently for cleaning, which is low in efficiency.

[0022] (2) The coordination between the overflow weir slider and the drain pipe allows personnel to flexibly adjust the height of the overflow weir according to the actual water inflow, ensuring that the oxidation sterilization device can maintain the best treatment effect at any flow rate;

[0023] (3) The liquid inside the oxidation tank is stirred by the cooperation between the mounting plate and the stirring blades. During this process, the Z-shaped stirring blades can generate a complex three-dimensional flow pattern during rotation, breaking the laminar flow and forming a strong turbulence, so that the liquid can be pushed and stretched in different directions, ensuring that all areas can be fully stirred and turned, thereby ensuring that all water bodies can be irradiated by the ultraviolet lamp;

[0024] (4) The sewage and various additives are received through the provided liquid inlet pipe and the above-mentioned liquids are made to flow to the volute and then flow into the liquid outlet pipe through the leakage hole and finally discharged into the interior of the regulating tank through the liquid outlet hole. After entering the volute, the above-mentioned liquid forms a complex three-dimensional flow pattern under the guidance of the groove wall, generating naturally induced turbulence, so that the sewage and various additives are fully mixed. In summary, the present equipment relies on the gravity of the liquid itself and the pumping pressure to achieve mixing, which reduces the dependence on mechanical agitators and reduces energy consumption. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings:

[0026] Figure 1 It is a structural schematic diagram of the oxidation sterilization device of the present invention;

[0027] Figure 2 is a cross-sectional view of the oxidation sterilization device of the present invention;

[0028] Figure 3It is a structural schematic diagram of the output mechanism of the present invention;

[0029] Figure 4 A bottom view of the installation cover of the present invention;

[0030] Figure 5 It is a structural schematic diagram of the overflow control mechanism of the present invention;

[0031] Figure 6 is a cross-sectional view of the overflow control mechanism of the present invention;

[0032] Figure 7 It is a structural schematic diagram of the stirring mechanism of the present invention;

[0033] Figure 8 It is a structural schematic diagram of the blending device of the present invention;

[0034] Fig. 9 It is a structural schematic diagram of the liquid inlet mechanism of the present invention;

[0035] Fig.10 The structure diagram of the ecological recycling system of the present invention is as follows;

[0036] Fig.11 The present invention is a structural block diagram of the composition of the liquid storage unit of the ecological recycling system.

[0037] In the figure: 1, oxidation tank; 2, installation cover; 3, output mechanism; 301, first installation frame; 302, motor; 303, first gear; 304, second gear; 305, spline shaft; 306, connecting shaft; 307, gearbox; 308, reciprocating screw rod; 309, connecting block; 310, limit frame; 4, stirring mechanism; 401, installation plate; 402, stirring blade; 403, winding chute; 5, ultraviolet lamp; 6, overflow weir; 7, aeration pipe; 8, overflow Flow control mechanism; 801, mounting block; 802, slider; 803, second mounting frame; 804, hydraulic rod; 805, drain pipe; 806, slide groove; 807, sealing plate; 808, sealing groove; 9, refraction plate; 10, regulating tank; 11, spoiler baffle; 12, liquid inlet mechanism; 1201, liquid inlet pipe; 1202, volute; 1203, leakage hole; 1204, liquid outlet pipe; 1205, liquid outlet hole; 1206, spoiler; 13, drain pipe. DETAILED DESCRIPTION

[0038] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention; it is obvious that the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments, and all other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making creative work are within the scope of protection of the present invention.

[0039] In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "top / bottom" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific position, be constructed and operated in a specific position, and therefore cannot be understood as limiting the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0040] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "mounted / connected", "connected", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0041] The structural features of the present invention are now described in detail with reference to the accompanying drawings.

[0042] A semiconductor industry fluorine-containing wastewater treatment device comprises an oxidation sterilization device and a blending device. The blending device is used to control the water volume, adjust the water quality and pre-treat the fluorine-containing wastewater. An ultraviolet lamp 5 is used to irradiate the wastewater mixed with a photocatalytic oxidant in an oxidation tank 1. While disinfecting the wastewater, the refractory organic matter in the wastewater is efficiently decomposed and mineralized into carbon dioxide and water. Then, the oxidation sterilization device is used to fully expose all water bodies to the irradiation of the ultraviolet lamp, without placing a large number of ultraviolet lamps in the water body to ensure the irradiation quality.

[0043] See also Figure 1-8The present invention provides a technical solution: a semiconductor industry fluorine-containing wastewater treatment device, including an oxidation sterilization device and a blending device, the oxidation sterilization device including: an installation cover 2 is movably installed on the top of an oxidation pool 1, a plurality of ultraviolet lamps 5 are fixedly installed on the bottom of the installation cover 2, an output mechanism 3 is fixedly installed on the bottom of the oxidation pool 1, a stirring mechanism 4 is fixedly connected to the top of the output mechanism 3, an aeration pipe 7 is fixedly installed on the bottom of the oxidation pool 1, the stirring mechanism 4 is rotatably installed inside the oxidation pool 1, the aeration pipe 7 is arranged at the bottom of the stirring mechanism 4, an overflow control mechanism 8 is fixedly installed on one side of the oxidation pool 1, an overflow weir 6 is fixedly installed on one side of the overflow control mechanism 8, and the overflow weir 6 slides The output mechanism 3 is installed inside the oxidation tank 1, the overflow weir 6 is arranged on the top of the stirring mechanism 4, the output mechanism 3 includes a first mounting frame 301, the first mounting frame 301 is fixedly installed at the bottom of the oxidation tank 1, a motor 302 is fixedly installed at the bottom of the first mounting frame 301, a first gear 303 is rotatably installed on one side of the first mounting frame 301, the output shaft of the motor 302 is fixedly connected to the bottom of the first gear 303 through a belt transmission assembly, a second gear 304 is rotatably installed on one side of the first mounting frame 301, a spline shaft 305 is slidably installed inside the second gear 304, the second gear 304 is meshed and connected to one side of the first gear 303, and the top of the spline shaft 305 is fixed. The output mechanism 3 further comprises a gearbox 307, the input shaft of the gearbox 307 is fixedly connected to the top of the first gear 303, a reciprocating screw 308 is rotatably mounted on one side of the first mounting frame 301, the output shaft of the gearbox 307 is fixedly connected to the bottom of the reciprocating screw 308, the outer wall of the reciprocating screw 308 is threadedly connected with a connecting block 309, the connecting block 309 is fixedly mounted on the outer wall of the connecting shaft 306, a limiting frame 310 is fixedly mounted on one side of the first mounting frame 301, and the connecting block 309 is slidably mounted on the outer wall of the limiting frame 310, the blending device comprises a regulating tank 10, a regulating A liquid inlet mechanism 12 is fixedly installed on one side of the pool 10, a liquid discharge pipe 13 is fixedly installed on the side of the regulating pool 10 away from the liquid inlet mechanism 12, a liquid inlet valve connected to the liquid discharge pipe 13 is arranged at the bottom of the oxidation pool 1, a plurality of refraction plates 9 are fixedly installed at the bottom of the ultraviolet lamp 5, and the refraction plates 9 are arranged on the top of the ultraviolet lamp 5. The light of the ultraviolet lamp 5 is scattered by the refraction plates 9 so that the device only needs fewer ultraviolet lamps 5 to achieve a larger illumination range. Several interfering flow baffles 11 are staggeredly installed inside the regulating pool 10, and the water flow is guided to flow along a specific path through the liquid inlet mechanism 12 to reduce the short-flow phenomenon and ensure that all wastewater entering the regulating pool 10 can be fully mixed and stay for a sufficient time;

[0044] The fluorine-containing wastewater is controlled in quantity, regulated in quality, and pre-treated by the blending device. The wastewater mixed with the photocatalytic oxidant in the oxidation tank 1 is irradiated by the ultraviolet lamp 5, and the hard-to-degrade organic matter in the wastewater is efficiently decomposed while the wastewater is disinfected, and the hard-to-degrade organic matter in the wastewater is mineralized into carbon dioxide and water. The auxiliary gas discharged by the aeration pipe 7 promotes the oxidation and sterilization process, while keeping the waste liquid rolling to ensure the irradiation effect of the ultraviolet lamp 5. The motor 302, the first gear 303, the second gear 304, the spline shaft 305, and the connecting shaft 306 cooperate to drive the stirring mechanism 4 to rotate and stir the wastewater;

[0045] Through the cooperation among the first gear 303, the gearbox 307, the reciprocating screw 308, the connecting block 309, and the limit frame 310, the connecting shaft 306 rotates and reciprocates up and down at the same time, so that the stirring mechanism 4 rotates inside the oxidation pond 1 and reciprocates up and down at the same time, so as to ensure that the water body inside the oxidation pond 1 flows evenly in the entire pond. In summary, the equipment makes the water body inside the oxidation pond 1 flow evenly in the entire pond through the cooperation among the output mechanism 3, the stirring mechanism 4, and the aeration pipe 7, so that all water bodies can be fully exposed to the irradiation of the ultraviolet lamp 5, and there is no need to place a large number of ultraviolet lamps 5 inside the water body to ensure the irradiation quality. The problem of the high cost of a large number of ultraviolet lamps 5 and the low efficiency of the ultraviolet lamp 5 that needs to be shut down and cleaned frequently in the prior art is fundamentally solved.

[0046] See also Figure 1-6The present invention provides a technical solution: a semiconductor industry fluorine-containing wastewater treatment device, the overflow control mechanism 8 includes a mounting block 801, the mounting block 801 is fixedly installed inside the oxidation tank 1, a slider 802 is slidably installed inside the mounting block 801, a drain pipe 805 is installed inside the slider 802, the slider 802 is fixedly installed on one side of the overflow weir 6, a slide groove 806 is opened inside the mounting block 801, the slider 802 is slidably installed inside the slide groove 806, the upper and lower sides of the slider 802 are fixedly installed with sealing plates 807, the upper and lower sides of the slide groove 806 are opened with sealing grooves 808, the sealing plate 807 is slidably installed inside the sealing groove 808, the bottom of the slider 802 is fixedly installed with a second mounting frame 803, the bottom of the second mounting frame 803 is fixedly installed Two groups of hydraulic rods 804 are fixedly installed on one side of the mounting block 801. The cooperation among the overflow weir 6, the slider 802 and the drain pipe 805 guides the discharged water flow to be evenly distributed, ensuring that all treated liquids can be fully exposed to ultraviolet rays, avoiding short-flow phenomenon, and improving the sterilization and oxidation decomposition effects. Through the cooperation among the slide 806, the mounting block 801, the sealing groove 808 and the sealing plate 807, the slider 802 can move up and down inside the slide 806 without destroying the sealing of the mounting block 801. Through the cooperation among the slider 802, the second mounting frame 803 and the hydraulic rod 804, the personnel can flexibly adjust the height of the overflow weir 6 according to the actual water inflow, ensuring that the oxidation sterilization device can maintain the best treatment effect at any flow rate.

[0047] Referring to 1-7, the present invention provides a technical solution: a semiconductor industry fluorine-containing wastewater treatment device, wherein the stirring mechanism 4 includes a mounting plate 401, and a plurality of stirring blades 402 are fixedly mounted on the outer wall of the mounting plate 401. The cross section of the stirring blade 402 is Z-shaped, and a plurality of winding grooves 403 are opened inside the stirring blade 402. The liquid is guided to flow outward from the inside of the stirring blade 402 through the winding grooves 403 to form an additional flow channel, thereby increasing the fluid circulation path and further improving the mixing uniformity; the liquid inside the oxidation tank 1 is stirred by the cooperation between the mounting plate 401 and the stirring blade 402. In this process, the Z-shaped stirring blade 402 can generate a complex three-dimensional flow pattern during rotation, break the laminar flow, and form a strong turbulence, so that the liquid can be pushed and stretched in different directions, ensuring that all areas can be fully stirred and turned, thereby ensuring that all water bodies can be irradiated by the ultraviolet lamp 5.

[0048] Referring to 8-9, the present invention provides a technical solution: a semiconductor industry fluorine-containing wastewater treatment device, the liquid inlet mechanism 12 includes a liquid inlet pipe 1201, a volute 1202 is fixedly connected to one side of the liquid inlet pipe 1201, a liquid leakage hole 1203 is opened inside the volute 1202, a liquid outlet pipe 1204 is fixedly installed at the bottom of the volute 1202, the liquid outlet pipe 1204 is connected to the liquid leakage hole 1203, a liquid outlet hole 1205 is opened on the side of the liquid outlet pipe 1204 away from the liquid leakage hole 1203, and a number of spoiler plates 1206 are staggeredly installed inside the liquid outlet pipe 1204, through the spoiler plates 1206 The water flow inside the liquid outlet pipe 1204 is disrupted to make the liquid mixing more uniform. The sewage and various additives are received through the liquid inlet pipe 1201 and the above liquids are made to flow to the volute 1202 and then flow into the liquid outlet pipe 1204 through the leakage hole 1203, and finally discharged into the interior of the regulating tank 10 through the liquid outlet hole 1205. After entering the volute 1202, the above liquid forms a complex three-dimensional flow pattern under the guidance of the tank wall, generating naturally induced turbulence, so that the sewage and various additives are fully mixed. In summary, the present equipment relies on the gravity of the liquid itself and the pumping pressure to achieve mixing, reduces the dependence on mechanical agitators, and reduces energy consumption.

[0049] Implementation Cases

[0050] See also Figure 1-9 When the semiconductor industry fluorine-containing wastewater treatment device is used, the fluorine-containing wastewater is controlled in water volume, regulated in water quality, and pre-treated by the blending device. The wastewater mixed with the photocatalytic oxidant in the oxidation tank 1 is irradiated by the ultraviolet lamp 5, and the wastewater is disinfected while efficiently decomposing the difficult-to-degrade organic matter in the wastewater, and mineralizing it into carbon dioxide and water. The auxiliary gas discharged through the aeration pipe 7 promotes the oxidation and sterilization process while keeping the waste liquid rolling to ensure the irradiation effect of the ultraviolet lamp 5. The stirring mechanism 4 is driven to rotate by the cooperation among the motor 302, the first gear 303, the second gear 304, the spline shaft 305, and the connecting shaft 306 to stir the wastewater. The cooperation among the reciprocating screw rod 308, the connecting block 309 and the limiting frame 310 makes the connecting shaft 306 rotate and reciprocate up and down at the same time, so that the stirring mechanism 4 rotates inside the oxidation pond 1 and reciprocates up and down at the same time, so as to ensure that the water inside the oxidation pond 1 flows evenly in the entire pond. In summary, the equipment makes the water inside the oxidation pond 1 flow evenly in the entire pond through the cooperation among the output mechanism 3, the stirring mechanism 4 and the aeration pipe 7, so that all water bodies can be fully exposed to the irradiation of the ultraviolet lamp 5, and there is no need to place a large number of ultraviolet lamps 5 inside the water body to ensure the irradiation quality, which fundamentally solves the problems of the high cost of a large number of ultraviolet lamps 5 and the low efficiency of the ultraviolet lamps 5 that need to be stopped frequently for cleaning in the prior art;

[0051] The refraction plate 9 scatters the light of the ultraviolet lamp 5 so that the device only needs fewer ultraviolet lamps 5 to achieve a larger illumination range. The liquid inlet mechanism 12 guides the water flow along a specific path to reduce the short-flow phenomenon and ensure that all wastewater entering the regulating tank 10 can be fully mixed and stay for a sufficient time.

[0052] The overflow weir 6, the slider 802, and the drain pipe 805 cooperate to guide the discharge water flow to be evenly distributed, ensuring that all treated liquids can be fully exposed to ultraviolet rays, avoiding short-circuit phenomena, and improving the sterilization and oxidation decomposition effects. The slide 806, the mounting block 801, the sealing groove 808, and the sealing plate 807 cooperate to allow the slider 802 to move up and down inside the slide 806 without destroying the sealing of the mounting block 801. The slider 802, the second mounting frame 803, and the hydraulic rod 804 cooperate to allow personnel to flexibly adjust the height of the overflow weir 6 according to the actual water inflow, ensuring that the oxidation sterilization device can maintain the best treatment effect at any flow rate;

[0053] The liquid inside the oxidation pond 1 is stirred by the cooperation between the mounting plate 401 and the stirring blades 402. In this process, the Z-shaped stirring blades 402 can generate a complex three-dimensional flow pattern during rotation, breaking the laminar flow and forming a strong turbulence, so that the liquid can be pushed and stretched in different directions, ensuring that all areas can be fully stirred and turned, thereby ensuring that all water bodies can be irradiated by the ultraviolet lamp 5;

[0054] By guiding the liquid to flow outward from the inside of the stirring blade 402 around the chute 403, an additional flow channel is formed, increasing the fluid circulation path, and further improving the mixing uniformity;

[0055] The sewage and various additives are received through the liquid inlet pipe 1201 and the above liquids are made to flow to the volute 1202 and then flow into the liquid outlet pipe 1204 through the leakage hole 1203 and finally discharged into the inside of the regulating tank 10 through the liquid outlet hole 1205. After entering the volute 1202, the above liquid forms a complex three-dimensional flow pattern under the guidance of the tank wall, generating naturally induced turbulence, so that the sewage and various additives are fully mixed. In summary, the equipment relies on the gravity of the liquid itself and the pumping pressure to achieve mixing, reducing the dependence on mechanical agitators and reducing energy consumption;

[0056] The spoiler 1206 disturbs the water flow inside the liquid outlet pipe 1204, so that the liquid is mixed more evenly.

[0057] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A semiconductor industry fluorine-containing wastewater treatment device, characterized in that: Including oxidation sterilization device and blending device; The oxidation sterilization device comprises an oxidation pond (1), a mounting cover (2) is movably mounted on the top of the oxidation pond (1), a plurality of ultraviolet lamps (5) are fixedly mounted on the bottom of the mounting cover (2), an output mechanism (3) is fixedly mounted on the bottom of the oxidation pond (1), a stirring mechanism (4) is fixedly connected to the top of the output mechanism (3), an aeration pipe (7) is fixedly mounted on the bottom of the oxidation pond (1), the stirring mechanism (4) is rotatably mounted inside the oxidation pond (1), the aeration pipe (7) is arranged at the bottom of the stirring mechanism (4), an overflow control mechanism (8) is fixedly mounted on one side of the oxidation pond (1), an overflow weir (6) is fixedly mounted on one side of the overflow control mechanism (8), the overflow weir (6) is slidably mounted inside the oxidation pond (1), and the overflow weir (6) is arranged on the top of the stirring mechanism (4); The output mechanism (3) comprises a first mounting frame (301), the first mounting frame (301) is fixedly mounted at the bottom of the oxidation tank (1), a motor (302) is fixedly mounted at the bottom of the first mounting frame (301), a first gear (303) is rotatably mounted on one side of the first mounting frame (301), an output shaft of the motor (302) is fixedly connected to the bottom of the first gear (303) via a belt transmission assembly, a second gear (304) is rotatably mounted on one side of the first mounting frame (301), a spline shaft (305) is slidably mounted inside the second gear (304), the second gear (304) is meshedly connected to one side of the first gear (303), a connecting shaft (306) is fixedly connected to the top of the spline shaft (305), and the connecting shaft (306) is fixedly connected to the bottom of the stirring mechanism (4); The output mechanism (3) further comprises a gearbox (307), an input shaft of the gearbox (307) being fixedly connected to the top of the first gear (303), a reciprocating screw (308) being rotatably mounted on one side of the first mounting frame (301), an output shaft of the gearbox (307) being fixedly connected to the bottom of the reciprocating screw (308), an outer wall of the reciprocating screw (308) being threadedly connected to a connecting block (309), the connecting block (309) being fixedly mounted on the outer wall of the connecting shaft (306), a limiting frame (310) being fixedly mounted on one side of the first mounting frame (301), the connecting block (309) being slidably mounted on the outer wall of the limiting frame (310); The blending device comprises a regulating tank (10), a liquid inlet mechanism (12) is fixedly installed on one side of the regulating tank (10), and a liquid discharge pipe (13) is fixedly installed on the side of the regulating tank (10) away from the liquid inlet mechanism (12); A liquid inlet valve connected to a liquid discharge pipe (13) is provided at the bottom of the oxidation pond (1).

2. A semiconductor industry fluorine-containing wastewater treatment device according to claim 1, characterized in that: A plurality of refraction plates (9) are fixedly mounted on the bottom of the ultraviolet lamp (5), and the refraction plates (9) are arranged on the top of the ultraviolet lamp (5).

3. The semiconductor industry fluorine-containing wastewater treatment device according to claim 1, characterized in that: Several interfering flow baffles (11) are installed in a staggered manner inside the regulating tank (10).

4. The semiconductor industry fluorine-containing wastewater treatment device according to claim 1, characterized in that: The overflow control mechanism (8) comprises a mounting block (801), wherein the mounting block (801) is fixedly mounted inside the oxidation pond (1), a slider (802) is slidably mounted inside the mounting block (801), a drainage pipe (805) is installed through the inside of the slider (802), and the slider (802) is fixedly mounted on one side of the overflow weir (6).

5. A semiconductor industry fluorine-containing wastewater treatment device according to claim 4, characterized in that: A slide groove (806) is provided inside the mounting block (801), and the slider (802) is slidably installed inside the slide groove (806). Sealing plates (807) are fixedly installed on both the upper and lower sides of the slider (802). Sealing grooves (808) are provided on both the upper and lower sides of the slide groove (806), and the sealing plates (807) are slidably installed inside the sealing grooves (808). A second mounting frame (803) is fixedly installed at the bottom of the slider (802), and two groups of hydraulic rods (804) are fixedly installed at the bottom of the second mounting frame (803). The two groups of hydraulic rods (804) are fixedly installed on one side of the mounting block (801).

6. The semiconductor industry fluorine-containing wastewater treatment device according to claim 1, characterized in that: The stirring mechanism (4) comprises a mounting plate (401), and a plurality of stirring blades (402) are fixedly mounted on the outer wall of the mounting plate (401), and the cross section of the stirring blades (402) is Z-shaped.

7. A semiconductor industry fluorine-containing wastewater treatment device according to claim 6, characterized in that: A plurality of winding chutes (403) are provided inside the stirring blade (402).

8. The semiconductor industry fluorine-containing wastewater treatment device according to claim 1, characterized in that: The liquid inlet mechanism (12) comprises a liquid inlet pipe (1201), one side of the liquid inlet pipe (1201) is fixedly connected to a volute (1202), a liquid leakage hole (1203) is provided inside the volute (1202), a liquid outlet pipe (1204) is fixedly installed at the bottom of the volute (1202), the liquid outlet pipe (1204) is connected to the liquid leakage hole (1203), and a liquid outlet hole (1205) is provided on a side of the liquid outlet pipe (1204) away from the liquid leakage hole (1203).

9. The semiconductor industry fluorine-containing wastewater treatment device according to claim 8, characterized in that: Several flow disturbance plates (1206) are installed in a staggered manner inside the liquid outlet pipe (1204).

10. An ecological recycling system for a fluorine-containing wastewater treatment device in the semiconductor industry, used for a fluorine-containing wastewater treatment device in the semiconductor industry as claimed in any one of claims 1 to 9, characterized in that: The ecological recycling system includes a pretreatment unit, a plant decomposition unit, a liquid storage unit, and a recovery unit. The pretreatment unit is used to filter large suspended particles in the wastewater and perform disinfection to prevent the wastewater from damaging subsequent units. The wastewater after the pretreatment unit enters the plant decomposition unit, where the plant roots and microorganisms work together to decompose organic matter and other pollutants. The liquid storage unit includes an oxidation pond and an ecological pond. The ecological pond is used to store wastewater with a low degree of pollution, which is used to simulate a natural lake and purify water quality by utilizing the interaction between plants, microorganisms and animals. The oxidation pond is used to store wastewater with a high degree of pollution, which relies on sunlight and oxygen in the air to promote the activity of aerobic microorganisms and accelerate the decomposition of organic matter. The treated water or rainwater is recovered through the recovery unit and supplied to the pretreatment unit or the plant decomposition unit, thereby reducing the dependence on external fresh water sources.

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