Preparation method of diamond-like carbon coating

Abstract

The preparation method of the diamond-like carbon coating comprises the following steps: heating in an octagonal furnace, and introducing nitrogen and hydrogen; the vertical up-down ion bombardment structure is started, the first side edge dip angle ion bombardment structure and the second side edge dip angle ion bombardment structure are started in sequence, and workpiece surface vertical, leftward dip angle and rightward dip angle ion bombardment treatment is conducted in sequence; sawtooth concave grids are formed on the surface of the workpiece and are used as high-quality combination parts of the diamond-like coating; preparing to obtain a basic coating; the first side edge dip angle ion bombardment structure and the second side edge dip angle ion bombardment structure are started at the same time, leftward and rightward dip angle ion bombardment treatment is conducted on the surface of the workpiece, and sawtooth grids on the surface of the basic coating are prepared; preparing a diamond-like reinforced outer layer; and the first side edge dip angle ion bombardment structure, the vertical up-down ion bombardment structure and the second side edge dip angle ion bombardment structure are started at the same time, workpiece surface leftward, workpiece surface vertical and rightward dip angle ion bombardment treatment is conducted, and the diamond-like carbon coating with the small tip or without the tip is obtained.

Description

Technical Field

[0001] The invention relates to a surface coating technology and a use device, and specifically, it shows a method for preparing a diamond-like coating. Background Art

[0002] Diamond-like carbon coating, or DLC coating, has the excellent properties of both graphite and diamond, such as high hardness, high corrosion resistance, excellent tribological properties and biocompatibility, and has broad application prospects in aerospace, precision electromechanical and biomedicine.

[0003] The current preparation of diamond-like coatings has poor adhesion to the workpiece and has large tips. In some cases, the tips are needle-like or flaky, which affects the color difference of the product.

[0004] Therefore, it is necessary to provide a method for preparing a diamond-like coating to solve the above problems. Summary of the invention

[0005] The purpose of the present invention is to provide a method for preparing a diamond-like coating.

[0006] The present invention achieves the above object through the following technical solutions:

[0007] A method for preparing a diamond-like coating, comprising the steps of:

[0008] 1) Setting vacuum coating preparation equipment, the vacuum coating preparation equipment includes an octagonal furnace, wherein an ion source is arranged at the top center of the octagonal furnace, and the ion source is used as an upper electrode; a left lower electrode, a lower central electrode, and a right lower electrode are arranged at the bottom of the octagonal furnace, and the left lower electrode and the right lower electrode are symmetrically distributed, and the left lower electrode, the right lower electrode and the center of the ion source are at an angle of 40-65°, the lower central electrode and the ion source cooperate to form a vertical up and down ion bombardment structure, the left lower electrode and the ion source cooperate to form a first side tilt angle ion bombardment structure, and the right lower electrode and the ion source cooperate to form a second side tilt angle ion bombardment structure, and the combination forms a multi-angle collaborative surface treatment structure;

[0009] 2) Heat to 200-230℃ in an octagonal furnace, evacuate to 1-3Pa, and keep warm for 20-30min;

[0010] 3) Introduce nitrogen and hydrogen until the vacuum degree is 2-5PA;

[0011] 4) The vertical up and down ion bombardment structure is turned on for 2-3 minutes to perform vertical ion bombardment treatment on the workpiece surface, with an ion source current of 80-110A and a bias voltage of 100-110A;

[0012] 5) The first side tilt ion bombardment structure, time 5-7min, the workpiece surface is subjected to left tilt ion bombardment treatment, the ion source current is turned on at 110-120A, and the bias voltage is 90-100A;

[0013] 6) The second side tilt ion bombardment structure is turned on for 5-7 minutes, and the workpiece surface is subjected to right-angle ion bombardment treatment, with an ion source current of 110-120A and a bias voltage of 90-100A;

[0014] 7) Through step 6) and step 7), a sawtooth concave grid is formed on the surface of the workpiece, which is used as a high-quality bonding part of the diamond-like coating;

[0015] 8) A group of magnetic sputtering modules A performs chromium primer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes to obtain a basic coating;

[0016] 9) The first side tilt ion bombardment structure and the second side tilt ion bombardment structure are turned on at the same time for 1-2 minutes to perform left and right tilt ion bombardment treatment on the workpiece surface, with an ion source current of 110-120A and a bias voltage of 90-100A to prepare a sawtooth grid on the surface of the base coating;

[0017] 10) A group of magnetic sputtering modules A performs chromium layer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes, the furnace body is filled with C2H2 gas 1Pa, the magnetron coil is passed with direct current A, the bias voltage is 600V, a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 150 minutes, and finally a diamond-like reinforced outer layer with a thickness of 10μ is formed;

[0018] 11) The first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are turned on simultaneously for 1-2 minutes to perform left-, vertical-, and right-angle ion bombardment treatments on the workpiece surface. The ion source current is 110-120A, and the bias voltage is 90-100A to obtain a diamond-like coating with small or no tips.

[0019] Furthermore, the ion source is composed of a tungsten wire ion source.

[0020] Furthermore, the left lower electrode and the right lower electrode are in the shape of a fan-shaped ring, and are distributed with the center of the bottom of the octagonal furnace as a reference.

[0021] Furthermore, the sector angle of the left lower electrode is 30-50°.

[0022] Furthermore, the fan-shaped angle of the lower electrode on the right side is 60-70°.

[0023] Furthermore, the lower central electrode is a torus or a cylinder.

[0024] Furthermore, when the lower central electrode is a circular ring, the diameter of the circular ring is 5-8% of the diameter of the inner cavity of the octagonal furnace.

[0025] Furthermore, when the lower central electrode is a cylinder, the diameter of the cylinder is 3-6% of the inner cavity diameter of the banana furnace.

[0026] Furthermore, a plurality of vacuum ports are provided on the side of the octagonal furnace.

[0027] Furthermore, the number of vacuum ports is at least three.

[0028] Compared with the prior art, the present invention obtains a serrated concave bonding grid through a surface tilted and crossed processing method, which effectively ensures the bonding strength of the diamond-like coating. At the same time, at the end of the coating preparation, the first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are simultaneously opened to perform left-direction, vertical and right-direction tilt ion bombardment treatment on the workpiece surface to obtain a diamond-like coating with small or no tips. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 This is a structural diagram of an octagonal furnace.

[0030] Figure 2 This is a schematic diagram of the distribution of electrodes in an octagonal furnace.

[0031] Figure 3 3 is a schematic diagram of the lower center electrode 3. DETAILED DESCRIPTION

[0032] Embodiment 1:

[0033] This embodiment shows a method for preparing a diamond-like coating, the steps comprising:

[0034] 1) See Figure 1-3, a vacuum coating preparation equipment is provided, the vacuum coating preparation equipment comprises an octagonal furnace 1, an ion source 2 is provided at the top center of the octagonal furnace 1, and the ion source 2 is used as an upper electrode; a left lower electrode 3, a lower central electrode 4, and a right lower electrode 5 are provided at the bottom of the octagonal furnace 1, and the left lower electrode 3 and the right lower electrode 4 are symmetrically distributed, and the left lower electrode 3, the right lower electrode 4 and the center of the ion source 2 are at an angle of 40-65°, the lower central electrode 4 and the ion source 2 cooperate to form a vertical up and down ion bombardment structure, the left lower electrode 3 and the ion source 2 cooperate to form a first side tilt angle ion bombardment structure, and the right lower electrode 5 and the ion source 2 cooperate to form a second side tilt angle ion bombardment structure, which are combined to form a multi-angle collaborative surface treatment structure;

[0035] 2) The octagonal furnace 1 is heated to 200°C, evacuated to 1Pa, and kept warm for 20 minutes;

[0036] 3) Introduce nitrogen and hydrogen until the vacuum degree reaches 2PA;

[0037] 4) The vertical up and down ion bombardment structure is turned on for 2 minutes to perform vertical ion bombardment treatment on the workpiece surface, with an ion source current of 80A and a bias voltage of 100A;

[0038] 5) The first side tilt ion bombardment structure, the time is 5 minutes, the workpiece surface is subjected to left tilt ion bombardment treatment, the ion source current is turned on at 110A, and the bias voltage is 90A;

[0039] 6) The second side tilt ion bombardment structure is turned on for 5 minutes, and the workpiece surface is subjected to right-angle ion bombardment treatment, with an ion source current of 110A and a bias voltage of 90A;

[0040] 7) Through step 6) and step 7), a sawtooth concave grid is formed on the surface of the workpiece, which is used as a high-quality bonding part of the diamond-like coating;

[0041] 8) A group of magnetic sputtering modules A performs chromium primer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes to obtain a basic coating;

[0042] 9) The first side tilt ion bombardment structure and the second side tilt ion bombardment structure are turned on at the same time for 1 minute, and the workpiece surface is subjected to left and right tilt ion bombardment treatment, with an ion source current of 110A and a bias voltage of 90A, to prepare a sawtooth grid on the surface of the base coating;

[0043] 10) A group of magnetic sputtering modules A performs chromium layer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes, the furnace body is filled with C2H2 gas 1Pa, the magnetron coil is passed with direct current A, the bias voltage is 600V, a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 150 minutes, and finally a diamond-like reinforced outer layer with a thickness of 10μ is formed;

[0044] 11) The first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are simultaneously turned on for 1 minute to perform left-, vertical-, and right-angle ion bombardment treatments on the workpiece surface. The ion source current is 110A and the bias voltage is 90A to obtain a diamond-like coating with small or no tips.

[0045] The ion source 2 is composed of a tungsten filament ion source.

[0046] The left lower electrode 3 and the right lower electrode 5 are in the shape of a fan-shaped ring, and are distributed with the center of the bottom of the octagonal furnace 1 as a reference.

[0047] The sector angle of the left lower electrode 3 is 30-50°.

[0048] The sector angle of the right lower electrode 5 is 60-70°.

[0049] The lower center electrode 4 is in the shape of a ring or a cylinder.

[0050] When the lower central electrode 3 is a circular ring, the diameter of the circular ring is 5-8% of the inner cavity diameter of the octagonal furnace 1 .

[0051] When the lower center electrode 3 is a cylinder, the diameter of the cylinder is 3-6% of the inner cavity diameter of the banana furnace 1 .

[0052] A plurality of vacuum ports 6 are provided on the side of the octagonal furnace 1 .

[0053] The number of the vacuum ports 6 is at least three.

[0054] Embodiment 2:

[0055] This embodiment shows a method for preparing a diamond-like coating, the steps comprising:

[0056] 1) Setting vacuum coating preparation equipment, the vacuum coating preparation equipment comprises an octagonal furnace 1, wherein an ion source 2 is arranged at the top center of the octagonal furnace 1, and the ion source 2 is used as an upper electrode; a left lower electrode 3, a lower central electrode 4, and a right lower electrode 5 are arranged at the bottom of the octagonal furnace 1, and the left lower electrode 3 and the right lower electrode 4 are symmetrically distributed, and the left lower electrode 3, the right lower electrode 4 and the center of the ion source 2 are at an angle of 40-65°, the lower central electrode 4 and the ion source 2 cooperate to form a vertical up and down ion bombardment structure, the left lower electrode 3 and the ion source 2 cooperate to form a first side tilt angle ion bombardment structure, and the right lower electrode 5 and the ion source 2 cooperate to form a second side tilt angle ion bombardment structure, and the combination forms a multi-angle collaborative surface treatment structure;

[0057] 2) The octagonal furnace 1 is heated to 230°C, evacuated to 3Pa, and kept warm for 30 minutes;

[0058] 3) Introduce nitrogen and hydrogen until the vacuum degree reaches 5PA;

[0059] 4) The vertical up and down ion bombardment structure is turned on for 3 minutes, and the workpiece surface is vertically ion bombarded. The ion source current is 110A and the bias voltage is 110A;

[0060] 5) The first side tilt ion bombardment structure, the time is 7min, the workpiece surface is subjected to left tilt ion bombardment treatment, the ion source current is turned on at 120A, and the bias voltage is 100A;

[0061] 6) The second side tilt ion bombardment structure is turned on for 7 minutes, and the workpiece surface is subjected to right-angle ion bombardment treatment, with an ion source current of 120A and a bias voltage of 100A;

[0062] 7) Through step 6) and step 7), a sawtooth concave grid is formed on the surface of the workpiece, which is used as a high-quality bonding part of the diamond-like coating;

[0063] 8) A group of magnetic sputtering modules A performs chromium primer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes to obtain a basic coating;

[0064] 9) The first side tilt ion bombardment structure and the second side tilt ion bombardment structure are turned on at the same time for 2 minutes to perform left and right tilt ion bombardment treatment on the workpiece surface, with an ion source current of 120A and a bias voltage of 100A to prepare a sawtooth grid on the surface of the base coating;

[0065] 10) A group of magnetic sputtering modules A performs chromium layer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes, the furnace body is filled with C2H2 gas 1Pa, the magnetron coil is passed with direct current A, the bias voltage is 600V, a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 150 minutes, and finally a diamond-like reinforced outer layer with a thickness of 10μ is formed;

[0066] 11) The first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are turned on simultaneously for 2 minutes to perform left-, vertical-, and right-angle ion bombardment treatments on the workpiece surface. The ion source current is 120A and the bias voltage is 100A to obtain a diamond-like coating with small or no tips.

[0067] The ion source 2 is composed of a tungsten filament ion source.

[0068] The left lower electrode 3 and the right lower electrode 5 are in the shape of a fan-shaped ring, and are distributed with the center of the bottom of the octagonal furnace 1 as a reference.

[0069] The sector angle of the left lower electrode 3 is 30-50°.

[0070] The sector angle of the right lower electrode 5 is 60-70°.

[0071] The lower center electrode 4 is in the shape of a ring or a cylinder.

[0072] When the lower central electrode 3 is a circular ring, the diameter of the circular ring is 5-8% of the inner cavity diameter of the octagonal furnace 1 .

[0073] When the lower center electrode 3 is a cylinder, the diameter of the cylinder is 3-6% of the inner cavity diameter of the banana furnace 1 .

[0074] A plurality of vacuum ports 6 are provided on the side of the octagonal furnace 1 .

[0075] The number of the vacuum ports 6 is at least three.

[0076] Embodiment 3:

[0077] This embodiment shows a method for preparing a diamond-like coating, the steps comprising:

[0078] 1) Setting vacuum coating preparation equipment, the vacuum coating preparation equipment comprises an octagonal furnace 1, wherein an ion source 2 is arranged at the top center of the octagonal furnace 1, and the ion source 2 is used as an upper electrode; a left lower electrode 3, a lower central electrode 4, and a right lower electrode 5 are arranged at the bottom of the octagonal furnace 1, and the left lower electrode 3 and the right lower electrode 4 are symmetrically distributed, and the left lower electrode 3, the right lower electrode 4 and the center of the ion source 2 are at an angle of 40-65°, the lower central electrode 4 and the ion source 2 cooperate to form a vertical up and down ion bombardment structure, the left lower electrode 3 and the ion source 2 cooperate to form a first side tilt angle ion bombardment structure, and the right lower electrode 5 and the ion source 2 cooperate to form a second side tilt angle ion bombardment structure, and the combination forms a multi-angle collaborative surface treatment structure;

[0079] 2) The octagonal furnace 1 is heated to 220°C, evacuated to 2Pa, and kept warm for 25 minutes;

[0080] 3) Introduce nitrogen and hydrogen until the vacuum degree reaches 4PA;

[0081] 4) The vertical up and down ion bombardment structure is turned on for 2.5 minutes, and the workpiece surface is vertically ion bombarded with 95A ion source current and 105A bias voltage;

[0082] 5) The first side tilt ion bombardment structure, time 6min, the workpiece surface is subjected to left tilt ion bombardment treatment, the ion source current is turned on at 115A, and the bias voltage is 95A;

[0083] 6) The second side tilt ion bombardment structure is turned on for 6 minutes, and the workpiece surface is subjected to right-angle ion bombardment treatment, with an ion source current of 115A and a bias voltage of 95A;

[0084] 7) Through step 6) and step 7), a sawtooth concave grid is formed on the surface of the workpiece, which is used as a high-quality bonding part of the diamond-like coating;

[0085] 8) A group of magnetic sputtering modules A performs chromium primer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes to obtain a basic coating;

[0086] 9) The first side tilt ion bombardment structure and the second side tilt ion bombardment structure are turned on at the same time for 1-2 minutes to perform left and right tilt ion bombardment treatment on the workpiece surface, with an ion source current of 115A and a bias voltage of 95A to prepare a sawtooth grid on the surface of the base coating;

[0087] 10) A group of magnetic sputtering modules A performs chromium layer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes, the furnace body is filled with C2H2 gas 1Pa, the magnetron coil is passed with direct current A, the bias voltage is 600V, a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 150 minutes, and finally a diamond-like reinforced outer layer with a thickness of 10μ is formed;

[0088] 11) The first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are simultaneously turned on for 1.5 minutes to perform left-, vertical-, and right-angle ion bombardment treatments on the workpiece surface. The ion source current is 115A and the bias voltage is 95A to obtain a diamond-like coating with small or no tips.

[0089] The ion source 2 is composed of a tungsten filament ion source.

[0090] The left lower electrode 3 and the right lower electrode 5 are in the shape of a fan-shaped ring, and are distributed with the center of the bottom of the octagonal furnace 1 as a reference.

[0091] The sector angle of the left lower electrode 3 is 30-50°.

[0092] The sector angle of the right lower electrode 5 is 60-70°.

[0093] The lower center electrode 4 is in the shape of a ring or a cylinder.

[0094] When the lower central electrode 3 is a circular ring, the diameter of the circular ring is 5-8% of the inner cavity diameter of the octagonal furnace 1 .

[0095] When the lower center electrode 3 is a cylinder, the diameter of the cylinder is 3-6% of the inner cavity diameter of the banana furnace 1 .

[0096] A plurality of vacuum ports 6 are provided on the side of the octagonal furnace 1 .

[0097] The number of the vacuum ports 6 is at least three.

[0098] Compared with the prior art, the present invention obtains a serrated concave bonding grid through a surface tilted and crossed processing method, which effectively ensures the bonding strength of the diamond-like coating. At the same time, at the end of the coating preparation, the first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are simultaneously opened to perform left-direction, vertical and right-direction tilt ion bombardment treatment on the workpiece surface to obtain a diamond-like coating with small or no tips.

[0099] The above are only some embodiments of the present invention. For those skilled in the art, several modifications and improvements can be made without departing from the creative concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. A method for preparing a diamond-like coating, characterized in that: The steps include: 1) Setting up vacuum coating preparation equipment, the vacuum coating preparation equipment includes an octagonal furnace, and an ion source is arranged at the top center of the octagonal furnace, and the ion source is used as an upper electrode; The bottom of the octagonal furnace is provided with a left lower electrode, a lower central electrode, and a right lower electrode, and the left lower electrode and the right lower electrode are symmetrically distributed, and the left lower electrode, the right lower electrode and the center of the ion source are at an angle of 40-65°. The lower central electrode and the ion source cooperate to form a vertical up and down ion bombardment structure, the left lower electrode and the ion source cooperate to form a first side tilt angle ion bombardment structure, and the right lower electrode and the ion source cooperate to form a second side tilt angle ion bombardment structure, which are combined to form a multi-angle collaborative surface treatment structure; 2) Heat to 200-230℃ in an octagonal furnace, evacuate to 1-3Pa, and keep warm for 20-30min; 3) Introduce nitrogen and hydrogen until the vacuum degree is 2-5PA; 4) The vertical up and down ion bombardment structure is turned on for 2-3 minutes to perform vertical ion bombardment treatment on the workpiece surface, with an ion source current of 80-110A and a bias voltage of 100-110A; 5) The first side tilt ion bombardment structure, time 5-7min, the workpiece surface is subjected to left tilt ion bombardment treatment, the ion source current is turned on at 110-120A, and the bias voltage is 90-100A; 6) The second side tilt ion bombardment structure is turned on for 5-7 minutes, and the workpiece surface is subjected to right-angle ion bombardment treatment, with an ion source current of 110-120A and a bias voltage of 90-100A; 7) Through step 6) and step 7), a sawtooth concave grid is formed on the surface of the workpiece, which is used as a high-quality bonding part of the diamond-like coating; 8) A group of magnetic sputtering modules A performs chromium primer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes to obtain a basic coating; 9) The first side tilt ion bombardment structure and the second side tilt ion bombardment structure are turned on at the same time for 1-2 minutes to perform left and right tilt ion bombardment treatment on the workpiece surface, with an ion source current of 110-120A and a bias voltage of 90-100A to prepare a sawtooth grid on the surface of the base coating; 10) A group of magnetic sputtering modules A performs chromium layer coating for 5 minutes; a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 5 minutes; a group of magnetic sputtering modules B performs tungsten carbide coating for 5 minutes, the furnace body is filled with C2H2 gas 1Pa, the magnetron coil is passed with direct current A, the bias voltage is 600V, a group of magnetic sputtering modules A and a group of magnetic sputtering modules B perform chromium and tungsten carbide mixed coating for 150 minutes, and finally a diamond-like reinforced outer layer with a thickness of 10μ is formed; 11) The first side tilt ion bombardment structure, the vertical up and down ion bombardment structure, and the second side tilt ion bombardment structure are turned on simultaneously for 1-2 minutes to perform left-, vertical-, and right-angle ion bombardment treatments on the workpiece surface. The ion source current is 110-120A, and the bias voltage is 90-100A to obtain a diamond-like coating with small or no tips.

2. The method for preparing a diamond-like coating according to claim 1, characterized in that: The ion source is composed of a tungsten filament ion source.

3. The method for preparing a diamond-like coating according to claim 2, characterized in that: The left lower electrode and the right lower electrode are in the shape of fan-shaped rings, and are distributed with the center of the bottom of the octagonal furnace as a reference.

4. The method for preparing a diamond-like coating according to claim 3, characterized in that: The sector angle of the lower electrode on the left side is 30-50°.

5. The method for preparing a diamond-like coating according to claim 4, characterized in that: The sector angle of the lower electrode on the right side is 60-70°.

6. The method for preparing a diamond-like coating according to claim 5, characterized in that: The lower center electrode is a ring or a cylinder.

7. The method for preparing a diamond-like coating according to claim 6, characterized in that: When the lower central electrode is a circular ring, the diameter of the circular ring is 5-8% of the inner cavity diameter of the octagonal furnace.

8. The method for preparing a diamond-like coating according to claim 7, characterized in that: When the lower center electrode is a cylinder, the diameter of the cylinder is 3-6% of the inner cavity diameter of the banana furnace.

9. The method for preparing a diamond-like coating according to claim 8, characterized in that: There are several vacuum ports on the side of the octagonal furnace.

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