Pigment composition, patterning composition, patterned substrate, color filter, and semiconductor device

Abstract

The invention provides a pigment composition, a patterning composition, a patterning substrate, a color filter and a semiconductor device, the pigment composition comprises a dispersing agent, an organic pigment and a solvent, a synergist comprises an alkaline compound, the dispersing agent comprises a first structural unit shown in a formula (I) and a second structural unit shown in a formula (II), # imgabs 0 # formula (I) and # imgabs 1 # formula (II), the pigment composition provided by the invention has high organic pigment content and excellent dispersing performance, the light splitting effect and optical crosstalk resistance of the color filter are improved, and the high-pixel performance of a semiconductor device is improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor preparation, and in particular to a pigment composition, a patterned composition, a patterned substrate, a color filter, and a semiconductor device. Background Art

[0002] With the continuous development of semiconductor technology, the industry has higher and higher requirements for the high pixel performance of semiconductor devices, especially image sensors. In the related art, by increasing the content of organic pigments in the pigment composition, a patterned film layer is formed and applied to semiconductor devices, which can meet its spectroscopic requirements and reduce the adverse effects of optical crosstalk. However, too high an organic pigment content will cause the pigment composition to agglomerate, the viscosity and particle size will change significantly, and the coating performance will decrease, which is not conducive to improving the high pixel performance of semiconductor devices. Therefore, there is a need for a pigment composition with good dispersion properties and a high organic pigment content to improve the spectroscopic performance and high pixel performance of semiconductor devices. Summary of the invention

[0003] In view of this, the present application provides a pigment composition, a patterned composition, a patterned substrate, a color filter, and a semiconductor device. In the pigment composition, the dispersant includes a first structural unit and a second structural unit. Under the interaction of a synergist, the dispersant can be anchored on the surface of the organic pigment through the first structural unit, and at the same time, the second structural unit can increase steric hindrance, inhibit agglomeration, and promote the dispersion of the organic pigment, so that the pigment composition has excellent dispersion performance while having a high organic pigment content, thereby improving the spectroscopic effect and anti-optical crosstalk ability of the obtained pattern, which is beneficial to improving the high pixelation performance of the semiconductor device.

[0004] In a first aspect, the present application provides a pigment composition, the pigment composition comprising a dispersant, an organic pigment, a synergist and a solvent, the synergist comprising an alkaline compound, the dispersant comprising a first structural unit represented by formula (I) and a second structural unit represented by formula (II), Formula (I), Formula (II), Formula (I), R1, R2 and R3 are independently selected from hydrogen atom or C1-C4 alkyl, R4 is selected from single bond or -C(=O)O-, R5 is selected from single bond, -R a -O(O=)CR b -、-R c -HN-(O=)CR d -、-R e -(O=)2SNH-R f -, alkylene or arylene, R a , R b , R c, R d , R e , R f are independently selected from a single bond or an alkylene group; in formula (II), R 1 , R 2 and R 3 are independently selected from hydrogen atom or C1-C4 alkyl, R 4 -C(=O)O-, R 5 Selected from , , or , R 6 is selected from C1-C20 alkyl groups, R 7 Selected from -R a -O(O=)C-、-R b -HN-(O=)C-or-R c -(O=)2SNH-,R 8 Selected from alkylene, R a , R b , R c The pigment composition provided by the present application promotes the dispersion of the organic pigment by the dispersant, thereby improving the dispersibility of the pigment composition, so that the pigment composition has both high organic pigment content and high dispersibility, which is beneficial to improving the spectroscopic performance and anti-optical crosstalk ability of the obtained pattern.

[0005] Optionally, in the dispersant, the mass percentage of the first structural unit is 20%-25%, and the mass percentage of the second structural unit is 75%-80%. The appropriate ratio of different structural units can improve the dispersibility of the dispersant, thereby promoting uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration.

[0006] Optionally, the R 6 The alkyl group is selected from C5-C20. In this way, the hydrophobic property of the dispersant can be further improved, and the steric stability of the dispersant can be enhanced.

[0007] Optionally, the dispersant comprises a structure represented by formula (III): Formula (III), Wherein, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, the ratio of x to y is (20-25): (75-80), x+y=100, and n is any positive number in the range of 4 to 10. The appropriate ratio of different structural units in the dispersant can better exert the anchoring ability of the first structural unit, the hydrophobic property and steric hindrance of the second structural unit, and improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration.

[0008] Optionally, the dispersant further comprises a third structural unit represented by formula (IV), Formula (IV), Among them, R 9 , R 10 and R 11 are independently selected from hydrogen atom or C1-C4 alkyl, R 12 is an alkylene group, R 13 for , R 14 is a C1-C3 alkoxy group, R 15 is a C1-C3 alkylene group, and h is any positive number in the range of 5 to 10. The third structural unit has a hydrophilic ether bond, which can make the pigment composition easily soluble in an alkaline developer when used in the patterning process, has excellent alkali solubility, fast cleaning speed, can improve the development effect, and is conducive to obtaining a patterned film with clear patterns and high fineness.

[0009] Optionally, in the dispersant, the mass percentage of the first structural unit is 20%-25%, the mass percentage of the second structural unit is 60%-70%, and the mass percentage of the third structural unit is 10%-20%. The appropriate proportion of different structural units can improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration; at the same time, the alkali solubility of the pigment composition in the patterning process is improved, which is conducive to the formation of a refined patterned film.

[0010] Optionally, the dispersant comprises a structure as shown in formula (V): Formula (V), Wherein, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, z is the mass percentage of the third structural unit, the ratio of x, y and z is (20-25): (60-70): (10-20), x+y+z=100, n is any positive number in the range of 4-10, and h is any positive number in the range of 5-10. In the dispersant, the appropriate ratio of different structural units can make the dispersant have excellent alkali solubility and good dispersibility, which is beneficial to the preparation process of semiconductor devices and improves the high pixel performance of semiconductor devices.

[0011] Optionally, the weight average molecular weight of the dispersant is 9000-25000. A suitable weight average molecular weight can make the dispersant have better dispersibility and can better avoid self-agglomeration.

[0012] Optionally, the polymer dispersibility index of the dispersant is less than or equal to 1.4. The smaller the dispersibility index of the dispersant, the more regular the monomer arrangement and the better the dispersibility.

[0013] Optionally, based on the total mass of the non-volatile components in the pigment composition being 100%, in the pigment composition, the mass percentage of the organic pigment is 69%-76.9%, the mass percentage of the dispersant is 18%-24%, and the mass percentage of the synergist is 5%-8%. While the appropriate dispersant content has excellent dispersing effect, the high organic pigment content is beneficial to improving the spectroscopic effect and anti-optical crosstalk capability of the obtained pattern.

[0014] Optionally, the mass ratio of the dispersant to the organic pigment is (0.2-0.3):1, the mass ratio of the synergist to the organic pigment is (0.05-0.1):1, and the mass ratio of the dispersant to the synergist is (0.2-0.3):(0.05-0.1). A suitable mass ratio can obtain a pigment composition with both high organic pigment content and high dispersibility.

[0015] Optionally, the synergist is a small molecule amine compound, which is used to interact with the dispersant and / or organic pigment. Some amino groups in the alkaline small molecule amine compound interact with the carboxyl groups in the dispersant and connect together; the remaining amino groups are anchored to the surface of the organic pigment, thereby achieving the connection between the dispersant and the organic pigment and promoting the dispersion of the organic pigment.

[0016] Optionally, the solvent includes one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether. This can improve the uniformity of the pigment composition, enhance the coating performance of the patterned composition, and help improve the structural stability of the obtained pattern.

[0017] Optionally, in the pigment composition, the mass percentage of the solvent is 75%-80%. An appropriate amount of solvent can promote uniform dispersion of the organic pigment and improve the coating performance of the pigment composition, which is beneficial to the stability of the semiconductor process.

[0018] Optionally, the particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm. The appropriate particle size indicates that the pigment composition has high dispersibility and no significant agglomeration, thereby improving the coating performance of the pigment composition and enhancing the spectral performance and anti-optical crosstalk capability of the semiconductor device.

[0019] Optionally, the viscosity of the pigment composition is less than or equal to 4 mPa·s. The smaller the viscosity, the better the dispersibility of the pigment composition and the absence of agglomeration, so that the pigment composition maintains a high pigment content while having high dispersibility.

[0020] Optionally, after being stored at 40° C. for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%. In this way, the dispersant with excellent dispersibility has strong anti-agglomeration ability, improves the dispersibility and stability of the pigment composition, and is conducive to improving the storage performance of the pigment composition.

[0021] In a second aspect, the present application provides a patterned composition, which comprises the pigment composition described in the first aspect and a film-forming resin.

[0022] The patterned composition provided in the present application has excellent dispersibility and stability, which is beneficial to improving the storage period of the patterned composition and improving the fineness of the prepared pattern.

[0023] In a third aspect, the present application provides a patterned substrate, wherein the patterned substrate is prepared using the patterned composition described in the second aspect.

[0024] The patterned substrate provided in the present application has a clear pattern, good structural stability and strong spectroscopic performance.

[0025] In a fourth aspect, the present application provides a color filter, wherein the color filter comprises the patterned substrate described in the third aspect.

[0026] The color filter provided by the present application has good light-splitting performance and strong anti-optical crosstalk capability.

[0027] In a fifth aspect, the present application provides a semiconductor device, wherein the semiconductor device is manufactured by coating the patterned composition described in the second aspect.

[0028] The semiconductor device provided by the present application has high precision, high pixel performance, and excellent overall performance. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present application are described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.

[0030] With the rapid development of semiconductor devices, they are widely used in various fields. For example, complementary metal oxide semiconductor (CMOS) can be used as an image sensor in camera modules and applied in electronic equipment, aerospace, transportation, industrial production and other fields. The performance of the color filter determines the performance of the CMOS sensor. As the requirements for high pixelation of CMOS sensors become higher, the performance requirements for the color filter in the CMOS sensor are also getting higher and higher. The color filter is formed by coating and etching a patterned composition containing a pigment composition on the surface of a substrate. In order to reduce the optical crosstalk phenomenon of the color filter, it is necessary to increase the content of organic pigments in the pigment composition. However, a high content of organic pigments will cause agglomeration, changes in particle size and viscosity in the pigment composition, which is not conducive to the storage of the pigment composition and the coating performance of the patterned composition. The obtained patterned film has a reduced spectral performance and a weakened ability to resist optical crosstalk, resulting in a reduction in the pixelation performance of the semiconductor device.

[0031] In order to solve the above technical problems, the present application provides a pigment composition, including a dispersant, an organic pigment, a synergist and a solvent, wherein the synergist includes an alkaline compound, and the dispersant includes a first structural unit represented by formula (I) and a second structural unit represented by formula (II). Formula (I), Formula (II), Formula (I), R1, R2 and R3 are independently selected from hydrogen atom or C1-C4 alkyl, R4 is selected from single bond or -C(=O)O-, R5 is selected from single bond, -R a -O(O=)CR b -、-R c -HN-(O=)CR d -、-R e -(O=)2SNH-R f -, alkylene or arylene, R a , R b , R c , R d , R e , R f are independently selected from a single bond or an alkylene group; in formula (II), R 1 , R 2 and R 3are independently selected from hydrogen atom or C1-C4 alkyl, R 4 -C(=O)O-, R 5 Selected from , , or , R 6 is selected from C1-C20 alkyl groups, R 7 Selected from -R a -O(O=)C-、-R b -HN-(O=)C-or-R c -(O=)2SNH-,R 8 Selected from alkylene, R a , R b , R c are independently selected from alkylene groups, p, q, and n are any positive numbers in the range of 4-10, and the sum of m1+m2 is any positive number in the range of 4-10. In the present application, the organic pigment can make the patterned composition have a corresponding color, can form a patterned film of a certain color, and improve the spectral performance of the semiconductor device; the dispersant interacts with the synergist through the first structural unit, and the synergist interacts with the surface of the organic pigment, so that the dispersant is anchored on the surface of the organic pigment, and at the same time, the hydrophobic alkyl chain (R 6 ) and R which increases steric hindrance 5 The first structural unit and the second structural unit are used to promote the steric hindrance of the dispersant; under the joint action of the first structural unit and the second structural unit, the dispersant makes the organic pigment have an excellent dispersion effect, which is conducive to forming a patterned film layer with high uniformity and improving the refinement of the pattern. The pigment composition provided by the present application can maintain excellent dispersion performance under the condition of high organic pigment content and low dispersant content, and can improve the spectral performance and anti-optical crosstalk ability of the prepared patterned film, thereby improving the high pixel performance of the semiconductor device.

[0032] In the present application, the dispersant is a controlled polymerization product, including a first structural unit with an anchoring effect and a second structural unit with hydrophobic properties and increased steric hindrance. The dispersant can interact with the synergist on the surface of the organic pigment through the carboxyl group in the first structural unit, thereby anchoring on the surface of the organic pigment, promoting the dispersion of the organic pigment, and improving the dispersion performance of the organic pigment; at the same time, R 4 -C(=O)O- can improve the compatibility of the dispersant and the solvent and enhance the coating performance of the pigment composition. 5 It can increase the steric hindrance of the dispersant and improve the spatial dispersion ability of organic pigments. 6It has excellent hydrophobic properties, thereby improving the hydrophobicity of the dispersant and improving the spatial stability of the dispersant. The dispersant can increase the content of organic pigments while maintaining a low dispersant content in the pigment composition, thereby improving the dispersibility of the pigment composition, and further improving the spectral performance and anti-optical crosstalk capability of the color filter.

[0033] An alkyl group is a monovalent group in an alkane molecule in which a hydrogen atom is removed. 1 , R 2 and R 3 It can be a C1-C4 alkyl group, for example, it can include a C1-C4 straight chain alkyl group, a C1-C4 branched chain alkyl group and a C3-C4 cycloalkyl group. Specifically, the C1-C4 alkyl group can be, but is not limited to, one or more of a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclopropyl group and a cyclobutyl group.

[0034] In one embodiment of the present application, R 6 The alkyl group selected from C1-C20 may include, for example, a straight-chain alkyl group of C1-C20, a branched-chain alkyl group of C1-C20, and a cycloalkyl group of C3-C20. Specifically, the alkyl group of C1-C20 may include, but is not limited to, one or more of a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 4-methylbutyl group, a 2,2-dimethylpropyl group, a n-hexyl group, a heptyl group, a 2-methylhexyl group, a 3-methylhexyl group, a 4-methylpentyl group, a 5-methylpentyl group, a 2-ethylbutyl group, a 3-ethylbutyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, a cyclopropyl group, a 4-methylcyclobutyl group, a cyclopentyl group, a 2-ethylcyclohexyl group, a cyclooctyl group, and an adamantyl group. In one embodiment of the present application, R 6 It can be 2-methylbutyl. In another embodiment of the present application, R 6 It may be 5-methylpentyl. In some embodiments, R 6 The alkyl group is selected from C5-C20, so that the hydrophobic property of the dispersant can be further improved and the steric stability of the dispersant can be enhanced.

[0035] An alkylene group is a divalent group in which two hydrogen atoms are removed from an alkane molecule. In one embodiment of the present application, the number of carbon atoms of the alkylene group is 1-18, and may include a straight-chain alkylene group, a branched-chain alkylene group, and a cycloalkylene group. Specifically, the number of carbon atoms of the alkylene group may be, but is not limited to, 1, 4, 6, 8, 10, 12, 14, 16, or 18, etc.; illustratively, the alkylene group may include, but is not limited to, at least one of -CH2-, -CH2CH2-, -CH2CH2CH2-, -CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2-, and -CH2CH2CH2CH2CH2CH2-. In one embodiment of the present application, the alkylene group may be -CH2CH2CH2CH2-. In another embodiment of the present application, the alkylene group may be -CH2CH2-.

[0036] Arylene is a general term for the divalent group remaining after two hydrogen atoms are removed from the aromatic carbon of the aromatic hydrocarbon molecule. In one embodiment of the present application, R5 is selected from arylene, and the number of carbon atoms of the arylene can be 6-30. Specifically, the number of carbon atoms of the arylene can be, but not limited to, 6, 10, 12, 14, 18, 22, 24, 26 or 30, etc.; illustratively, the arylene can include, but not limited to, at least one of phenylene, naphthylene, anthracene, tetraphenylene, pentaphenylene and tetrahydronaphthylene. In one embodiment of the present application, R5 can be a divalent anthracene group. In another embodiment of the present application, R5 can be a phenylene group.

[0037] In one embodiment of the present application, R1 and R2 may be hydrogen atoms, R3 may be a methyl group, R4 may be -C(=O)O-, R5 may be -CH3-CH3-O-(O=)C-CH3-, and the first structural unit is In another embodiment of the present application, R1 and R2 may be hydrogen atoms, R3 may be a methyl group, R4 and R5 may be single bonds, and the first structural unit is In some embodiments, R4 may be -C(=O)O-, thereby improving the compatibility of the dispersant and the solvent and enhancing the coating performance of the pigment composition.

[0038] In one embodiment of the present application, R 5 Selected from , , or , p, q, n are any positive numbers in the range of 4-10 respectively, the sum of m1+m2 is any positive number in the range of 4-10, and the number of suitable polyether or polyester structures can increase the steric hindrance of the dispersant, promote the dispersion of organic pigments, and avoid agglomeration of the pigment composition. Specifically, p can be but not limited to 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5 or 10, etc.; q can be but not limited to 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5 or 10, etc.; n can be but not limited to 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5 or 10, etc. In one embodiment of the present application, R 5 Can be , p can be any positive number in the range of 2-8. In another embodiment of the present application, R 5 Can be , n can be any positive number in the range of 8-10, which can further improve the dispersing ability of the dispersant, improve the dispersibility in the pigment composition, and obtain a pigment composition with a high organic pigment content and a low dispersant content.

[0039] In one embodiment of the present application, R 5 for , the sum of m1+m2 is any positive number in the range of 4-10. Appropriate values ​​of m1 and m2 can increase the number of polyether groups in the dispersant, increase its steric hindrance, improve the dispersing ability of the dispersant, and further improve the dispersibility of the organic pigment. Specifically, m1 can be but not limited to 1, 2, 4, 6, 8 or 9, and m2 can be but not limited to 1, 2, 4, 6, 8 or 9. In one embodiment of the present application, R 5 Can be , m1 can be any positive number in the range of 2-4, m2 can be any positive number in the range of 2-5, and the sum of m1+m2 is any positive number in the range of 4-10. 5 Can be , m1 can be any positive number in the range of 5-7, m2 can be any positive number in the range of 2-5, and the sum of m1+m2 is any positive number in the range of 4-10.

[0040] In one embodiment of the present application, R 4 -C(=O)O-, R 5 for , R 6 is 2-ethyl-butyl, and the second structural unit is In another embodiment of the present application, R 1 , R 2 can be a hydrogen atom, R 3 is methyl, R5 for , R 7 For-R b -HN-(O=)C-、R b is ethylene, R 8 is pentylene, R 6 is 2-ethyl-butyl, and the second structural unit is .

[0041] In one embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20%-25%, and the mass percentage of the second structural unit is 75%-80%. The appropriate ratio of different structural units can improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration. Specifically, the mass percentage of the first structural unit can be but not limited to 20%, 21%, 22%, 23%, 24% or 25%, etc.; the mass percentage of the second structural unit can be but not limited to 75%, 76%, 77%, 78%, 79% or 80%, etc. In one embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20%-23%, and the mass percentage of the second structural unit is 77%-80%. In another embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 22%-25%, and the mass percentage of the second structural unit is 75%-78%.

[0042] In one embodiment of the present application, the dispersant includes a structure represented by formula (III): Formula (III), Wherein, x and y represent the mass proportion of the first structural unit and the second structural unit respectively, and the ratio of x to y is (20-25): (75-80), x+y=100. The appropriate ratio of different structural units in the polymer can better exert the anchoring ability of the first structural unit, the hydrophobic property and steric hindrance of the second structural unit, and improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration. Specifically, the ratio of x to y can be but is not limited to 20:80, 21:79, 22:78, 23:77, 24:76 or 21:75, etc. In one embodiment of the present application, in the dispersant, the ratio of x to y is (20-23): (77-80), x+y=100. In another embodiment of the present application, in the dispersant, the ratio of x to y is (22-25): (75-78), x+y=100.

[0043] In one embodiment of the present application, the dispersant further comprises a structure represented by formula (IV), Formula (IV), Among them, R 9 , R10 and R 11 are independently selected from hydrogen atom or C1-C4 alkyl, R 12 is an alkylene group, R 13 for , R 14 is a C1-C3 alkoxy group, R 15 is a C1-C3 alkylene group, and h is any positive number in the range of 5-10. The third structural unit has a hydrophilic ether bond, which can make the pigment composition easily soluble in an alkaline developer when used in the patterning process, has excellent alkali solubility, fast cleaning speed, can improve the development effect, and is conducive to obtaining a patterned film with clear patterns and high fineness. Specifically, h can be but is not limited to 5, 6, 7, 8, 9 or 10, etc. In one embodiment of the present application, h can be 7-8, which can further improve the alkali solubility effect, and at the same time has excellent dispersibility, which promotes the dispersion of organic pigments.

[0044] In one embodiment of the present application, the dispersant includes a first structural unit, a second structural unit and a third structural unit, wherein the mass percentage of the first structural unit is 20%-25%, the mass percentage of the second structural unit is 60%-70%, and the mass percentage of the third structural unit is 10%-20%. The appropriate proportion of different structural units can improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration; at the same time, the alkali solubility of the pigment composition in the patterning process is improved, which is conducive to the formation of a refined patterned film. Specifically, the mass percentage of the first structural unit can be but not limited to 20%, 21%, 22%, 23%, 24% or 25%, etc.; the mass percentage of the second structural unit can be but not limited to 60%, 62%, 64%, 65%, 68% or 70%, etc.; the mass percentage of the third structural unit can be but not limited to 10%, 12%, 13%, 15%, 16%, 17%, 18%, 19% or 20%, etc. In one embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20%-23%, the mass percentage of the second structural unit is 62%-70%, and the mass percentage of the third structural unit is 10%-18%. In another embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 22%-25%, the mass percentage of the second structural unit is 60%-65%, and the mass percentage of the third structural unit can be 13%-20%.

[0045] In one embodiment of the present application, the dispersant includes a first structural unit, a second structural unit and a third structural unit, and the connection method of the first structural unit, the second structural unit and the third structural unit is not limited. In one embodiment of the present application, the dispersant includes a structure as shown in formula (V): Formula (V), Wherein, x is the mass proportion of the first structural unit, y is the mass proportion of the second structural unit, z is the mass proportion of the third structural unit, the ratio of x, y and z is (20-25): (60-70): (10-20), x+y+z=100, n is any positive number in the range of 4-10, and h is any positive number in the range of 5-10. In the dispersant, the appropriate ratio of different structural units can make the dispersant have excellent alkali solubility and good dispersibility, which is beneficial to the preparation process of semiconductor devices and improves the high pixel performance of semiconductor devices. Specifically, the ratio of x, y and z can be but not limited to 20:60:20, 21:62:17, 23:61:16, 23:60:17, 20:62:18 or 20:61:19, etc. In one embodiment of the present application, in the dispersant, the ratio of x, y and z is (20-23): (60-65): (10-17), x+y+z=100. In another embodiment of the present application, in the dispersant, the ratio of x, y and z is (22-25): (75-78): (17-20), x+y+z=100.

[0046] In one embodiment of the present application, the weight average molecular weight (Mw) of the dispersant is 9000-25000. The appropriate weight average molecular weight can make the dispersant have better dispersibility and can better avoid self-agglomeration. Specifically, the weight average molecular weight of the dispersant can be, but not limited to, 9000, 10000, 12000, 14000, 16000, 18000, 20000, 22000, 24000 or 25000. In one embodiment of the present application, the weight average molecular weight of the dispersant can be 9000-15000. In another embodiment of the present application, the weight average molecular weight of the dispersant can be 15000-25000.

[0047] In one embodiment of the present application, the polymer dispersity index (PDI) of the dispersant is less than or equal to 1.4. A high molecular polymer is a combination of monomers doped with various molecular weights. The polymer dispersity index is used to describe the molecular weight distribution of the polymer. The narrower the molecular weight distribution (i.e., the smaller the PDI), the more regular the monomer arrangement, and the better the dispersibility. Specifically, the polymer dispersity index of the dispersant may be, but is not limited to, 1.4, 1.3, 1.2, 1.1, 1, 0.9, 0.8 or 0.7, etc. In one embodiment of the present application, the polymer dispersity index of the dispersant may be 1-1.4, which may further improve the dispersibility of the dispersant, inhibit the occurrence of agglomeration of the pigment composition, and extend its storage period. In another embodiment of the present application, the polymer dispersity index of the dispersant may be 0.2-1.

[0048] In one embodiment of the present application, taking the total mass of the non-volatile components in the pigment composition as 100%, the mass percentage of the dispersant in the pigment composition is 18%-24%. The appropriate dispersant content has excellent dispersing effect, and the organic pigment content is high, which is beneficial to improve the spectroscopic effect and anti-optical crosstalk ability of the obtained pattern. Specifically, in the pigment composition, the mass percentage of the dispersant can be but is not limited to 18%, 19%, 20%, 20.5%, 21%, 21.5%, 22%, 22.5%, 23%, 23.5% or 24%, etc. In one embodiment of the present application, in the pigment composition, the mass percentage of the dispersant can be 18%-22%. In another embodiment of the present application, in the pigment composition, the mass percentage of the dispersant can be 22%-24%.

[0049] In the present application, the pigment composition includes an organic pigment, which can make the obtained pattern have an ideal color, thereby achieving excellent anti-optical crosstalk; and the organic pigment and the dispersant work synergistically to further improve the dispersibility of the organic pigment. In one embodiment of the present application, taking the total mass of the non-volatile components in the pigment composition as 100%, the mass percentage of the organic pigment in the pigment composition is 69%-76.9%, further improving the anti-spectral crosstalk ability of the pigment composition, and obtaining a semiconductor device with excellent spectral performance. Specifically, the mass percentage of the organic pigment can be, but is not limited to, 69%, 70%, 71%, 72%, 73%, 74%, 75%, 76% or 76.9%, etc. In one embodiment of the present application, in the pigment composition, the mass percentage of the organic pigment can be 69%-74%. In another embodiment of the present application, in the pigment composition, the mass percentage of the organic pigment can be 74%-76.9%, which can further improve the anti-optical crosstalk ability of the semiconductor device.

[0050] In one embodiment of the present application, the mass percentage of organic pigments in the pigment composition can be obtained by, but not limited to, absorption spectrum testing. For example: by testing multiple groups of pigment compositions with different organic pigment contents, after coating the pigment composition into a film, an absorption spectrum curve is obtained, which is a standard curve; the absorption spectrum of the pigment composition with an unknown organic pigment content is tested to obtain its absorption spectrum curve, which is compared with the standard curve, so that the mass percentage of the unknown organic pigment can be obtained. In one embodiment of the present application, after the pigment composition is coated into a film, in the absorption spectrum curve of a 400nm thick pigment composition film, the wavelength is 530nm-550nm, and the transmittance of the pigment composition is 90%-94%. At this time, the total mass of the non-volatile components in the pigment composition is 100%, and the mass percentage of the organic pigment in the pigment composition is 69%-76.9%.

[0051] In one embodiment of the present application, the mass ratio of the dispersant to the organic pigment is (0.2-0.3):1. The appropriate mass ratio can obtain a pigment composition with both high organic pigment content and high dispersibility. Specifically, the mass ratio of the dispersant to the organic pigment can be, but is not limited to, 0.2:1, 0.21:1, 0.22:1, 0.23:1, 0.24:1, 0.25:1, 0.26:1, 0.27:1, 0.28:1, 0.29:1 or 0.3:1, etc. In one embodiment of the present application, the mass ratio of the dispersant to the organic pigment can be (0.2-0.26):1. In another embodiment of the present application, the mass ratio of the dispersant to the organic pigment can be (0.25-0.3):1.

[0052] In the present application, the synergist includes an alkaline compound that can interact with the carboxylic acid group in the first structural unit of the dispersant, so that the dispersant can be anchored on the surface of the organic pigment through the synergist, promote the dispersion of the organic pigment, reduce the viscosity of the pigment composition, and maintain the high organic pigment content of the pigment composition. Specifically, the synergist can be, but is not limited to, a small molecule amine compound. In one embodiment of the present application, the synergist is a small molecule amine compound, and some of the amino groups in the alkaline small molecule amine compound react with the carboxyl group in the dispersant to connect together; the remaining amino groups interact with the surface of the organic pigment, thereby achieving the connection between the dispersant and the organic pigment, and no chemical reaction occurs between the two. Specifically, the small molecule amine compound can be, but is not limited to, a fatty amine compound, a cyclic amine compound containing a piperidine group, and the like. In one embodiment of the present application, the structural formula of the small molecule amine can be . In the present application, the dispersant interacts with the synergist to improve the dispersibility of the pigment composition, and the interaction can be achieved through charge interaction, acid-base interaction and / or chemical reaction, etc. Specifically, the interaction can include but is not limited to non-bonded interactions (electrostatic interactions, hydrogen bonds, π-π interactions or acid-base interactions, etc.), bonded interactions (covalent bonds, ionic bonds, etc. formed by chemical reactions). For example, the carboxyl group in the first structural unit in the dispersant can react chemically with the amino group in the synergist of the small molecule amine compound to form an interaction; the carboxyl group in the first structural unit in the dispersant can also form an acid-base interaction with the amino group in the synergist of the small molecule amine compound to promote the dispersion of the organic pigment.

[0053] In one embodiment of the present application, the total mass of the non-volatile components in the pigment composition is 100%, and the mass percentage of the synergist in the pigment composition is 5%-8%. Specifically, in the pigment composition, the mass percentage of the synergist may be, but is not limited to, 5%, 5.5%, 6%, 6.5%, 7%, 7.5% or 8%, etc., to avoid the adverse effects of low mass percentage of the synergist, which leads to poor dispersion performance of the pigment composition or even non-dispersion. In one embodiment of the present application, the total mass of the non-volatile components in the pigment composition is 100%, and the mass percentage of the synergist in the pigment composition may be 5%-7%. In another embodiment of the present application, the total mass of the non-volatile components in the pigment composition is 100%, and the mass percentage of the synergist in the pigment composition may be 6.5%-8%. In some embodiments, the pigment composition includes a dispersant, an organic pigment, a synergist and a solvent, wherein the non-volatile component includes a dispersant, an organic pigment and a synergist other than a solvent.

[0054] In one embodiment of the present application, the mass ratio of the synergist to the organic pigment is (0.05-0.1):1. The appropriate mass ratio can promote the dispersion of the pigment composition. Specifically, the mass ratio of the synergist to the organic pigment can be, but is not limited to, 0.05:1, 0.06:1, 0.07:1, 0.08:1, 0.09:1 or 0.1:1. In one embodiment of the present application, the mass ratio of the synergist to the organic pigment can be (0.05-0.08):1. In another embodiment of the present application, the mass ratio of the synergist to the organic pigment can be (0.07-0.1):1.

[0055] In one embodiment of the present application, the mass ratio of the dispersant to the synergist is (0.2-0.3): (0.05-0.1). The appropriate mass ratio can promote the anchoring effect of the dispersant on the surface of the organic pigment and improve the dispersibility of the pigment composition. Specifically, the mass ratio of the dispersant to the synergist can be, but is not limited to, 0.2:0.05, 0.21:0.06, 0.22:0.08, 0.23:0.06, 0.24:0.05, 0.25:0.09, 0.26:0.1, 0.27:0.7, 0.28:0.8, 0.29:0.6 or 0.3:0.7, etc. In one embodiment of the present application, the mass ratio of the dispersant to the synergist can be (0.2-0.28): (0.05-0.07). In another embodiment of the present application, the mass ratio of the dispersant to the synergist can be (0.25-0.3): (0.07-0.1).

[0056] In the present application, the solvent can improve the uniformity of the pigment composition, enhance the coating performance of the patterned composition, and help improve the structural stability of the obtained pattern. Specifically, the solvent can include, but is not limited to, one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether. In one embodiment of the present application, the solvent can be propylene glycol methyl ether acetate. In another embodiment of the present application, the solvent can be propylene glycol monomethyl ether.

[0057] In one embodiment of the present application, in the pigment composition, the mass percentage of the solvent is 75%-80%. The appropriate amount of solvent can promote the uniform dispersion of the organic pigment while improving the coating performance of the pigment composition, which is beneficial to the stability of the semiconductor process. Specifically, in the pigment composition, the mass percentage of the solvent can be, but is not limited to, 75%, 76%, 77%, 78%, 79% or 80%, etc. In one embodiment of the present application, in the pigment composition, the mass percentage of the solvent can be 75%-78%. In another embodiment of the present application, in the pigment composition, the mass percentage of the solvent can be 77%-80%.

[0058] In one embodiment of the present application, the particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm. The appropriate particle size indicates that the pigment composition has high dispersibility and no significant agglomeration phenomenon, thereby improving the coating performance of the pigment composition and enhancing the spectral performance and anti-optical crosstalk capability of the semiconductor device. Specifically, the particle size D50 of the pigment composition may be, but is not limited to, 120 nm, 110 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 40 nm, 30 nm, 20 nm or 10 nm, etc.; the particle size D00 of the pigment composition may be, but is not limited to, 200 nm, 180 nm, 160 nm, 140 nm, 120 nm, 100 nm, 80 nm, 60 nm, 40 nm, 30 nm, 20 nm or 10 nm, etc. In one embodiment of the present application, the particle size D50 of the pigment composition may be 80 nm-120 nm; the particle size D90 of the pigment composition may be 130 nm-200 nm. In another embodiment of the present application, the particle size D50 of the pigment composition may be 50 nm-100 nm; the particle size D90 of the pigment composition may be 60 nm-120 nm. In some embodiments, the particle size of the pigment composition refers to the test particle size of the particles composed of the remaining components except the solvent. In the present application, the particle size test method of the pigment composition is: after diluting the pigment composition by about 2000 times, an optical particle size test is performed using a dynamic light scattering nanoparticle size analyzer.

[0059] In one embodiment of the present application, the viscosity of the pigment composition is less than or equal to 4 mPa·s, indicating that the pigment composition has excellent dispersibility. In the case of a high organic pigment content, the pigment composition still has a high dispersibility without agglomeration. Specifically, the viscosity of the pigment composition may be, but is not limited to, 4 mPa·s, 3.5 mPa·s, 3.2 mPa·s, 3 mPa·s, 2.8 mPa·s, 2.5 mPa·s, 2.4 mPa·s, 2.3 mPa·s, 2.2 mPa·s, 2.1 mPa·s or 2 mPa·s, etc. In one embodiment of the present application, the viscosity of the pigment composition may be 2.5 mPa·s-4 mPa·s. In another embodiment of the present application, the viscosity of the pigment composition may be 2 mPa·s-3 mPa·s.

[0060] In one embodiment of the present application, after being stored at 40°C for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%, indicating that the dispersant provided by the present application has excellent dispersibility and strong anti-agglomeration ability, which improves the dispersibility and stability of the pigment composition, and is conducive to improving the storage of the pigment composition. Viscosity change rate = (viscosity of the pigment composition after being stored at 40°C for 7 days - viscosity of the prepared pigment composition) / viscosity of the prepared pigment composition × 100%. Specifically, after being stored at 40°C for 7 days, the viscosity change rate of the pigment composition may be, but is not limited to, 5%, 4.5%, 4%, 3.5%, 3%, 2.5%, 2% or 1%, etc. In one embodiment of the present application, after being stored at 40°C for 7 days, the viscosity change rate of the pigment composition may be less than or equal to 4%. In another embodiment of the present application, after being stored at 40°C for 7 days, the viscosity change rate of the pigment composition may be less than or equal to 2%.

[0061] An embodiment of the present application provides a method for preparing a pigment composition, comprising: mixing and dispersing an organic pigment, a dispersant, a synergist and a solvent to obtain a pigment composition. The preparation method is simple, the preparation cost is low, and the obtained pigment composition has good stability and high dispersibility. In an embodiment of the present application, an organic pigment, a dispersant, a synergist and a solvent are mixed and sand-milled in two stages, and the pigment composition is obtained by centrifugation post-treatment.

[0062] The present application provides a patterned composition, including the pigment composition and film-forming resin provided in any one of the above-mentioned embodiments, which is beneficial to improving the coating performance of the patterned composition, enhancing the anti-optical crosstalk capability of the obtained pattern, and enhancing the spectral performance of the semiconductor device.

[0063] In one embodiment of the present application, the total mass of the non-functional components in the patterned composition is 100%, and the mass percentage of the non-volatile components in the pigment composition in the patterned composition is 80%-90%, which is beneficial to improve the anti-optical crosstalk ability of the patterned composition. Specifically, based on the solid content of the patterned composition, the mass percentage of the non-volatile components in the pigment composition in the patterned composition may be, but not limited to, 80%, 82%, 84%, 85%, 86%, 88%, 89% or 90%, etc. In one embodiment of the present application, the total mass of the non-functional components in the patterned composition is 100%, and the mass percentage of the non-volatile components in the pigment composition in the patterned composition may be 80%-86%. In another embodiment of the present application, the total mass of the non-functional components in the patterned composition is 100%, and the mass percentage of the non-volatile components in the pigment composition in the patterned composition may be 84%-90%.

[0064] In one embodiment of the present application, the patterned composition includes a film-forming resin, which can make the patterned composition have film-forming properties and promote the formation of a patterned film. Specifically, the film-forming resin can include, but is not limited to, acrylate polymers and the like. In one embodiment of the present application, the film-forming resin can be an acrylate polymer, which is a homopolymer or copolymer of acrylate and its derivatives, methacrylate and its derivatives. In some embodiments, the film-forming resin can be a polyacrylate. In other embodiments, the film-forming resin can be a polymethacrylate.

[0065] In one embodiment of the present application, the patterned composition further includes various additives such as polymerizable monomers, epoxy resins, polymerization initiators, chain transfer agents, polymerization inhibitors, ultraviolet absorbers (UV absorbers), surfactants, etc. Those skilled in the art can determine the amount of the above additives added to the patterned composition according to actual production needs.

[0066] In one embodiment of the present application, the epoxy resin can improve the film-forming properties of the patterned composition, which is beneficial to the formation of the patterned film or patterned substrate. Specifically, the epoxy resin can be, but is not limited to, a compound having more than two epoxy rings in the molecule, such as bisphenol A type, cresol novolac type, biphenyl type, alicyclic epoxy compounds, etc. In one embodiment of the present application, the epoxy resin can be bisphenol A type.

[0067] In one embodiment of the present application, the thermal polymerization initiator can initiate polymerization of the monomers, prompting the patterned composition to react quickly, which is conducive to the formation of the pattern. Specifically, the thermal polymerization initiator can be, but is not limited to, an azo compound or a peroxide compound. For example, the peroxide compound can be, but is not limited to, a ketone peroxide, a peroxy ketal, hydrogen peroxide, a dialkyl peroxide, a diacyl peroxide, a peroxy ester, a peroxy dicarbonate, and the like.

[0068] In one embodiment of the present application, the chain transfer agent is also called a molecular weight regulator. In the free radical polymerization process, a small molecule with a large chain transfer constant is sometimes intentionally added to the polymerization reaction system to regulate and control the molecular weight of the polymer product. Specifically, the chain transfer agent may include, but is not limited to, one or more of mercaptan, α-methylstyrene dimer, trichloroethylene, and tetrachloromethane.

[0069] In one embodiment of the present application, the polymerization inhibitor can prevent the polymer from having side reactions during the chemical reaction. Specifically, the polymerization inhibitor can include, but is not limited to, one or more of polyphenol inhibitors, quinone inhibitors, aromatic amine inhibitors, and aromatic nitro compounds.

[0070] In one embodiment of the present application, the ultraviolet absorber (UV absorber) can absorb the ultraviolet part of sunlight and fluorescent light source without changing itself, thereby extending the storage period of the patterned composition and providing its stability. Specifically, the ultraviolet absorber can include but is not limited to one or more of salicylates, benzophenones, benzotriazoles, substituted acrylonitriles, and triazines.

[0071] In one embodiment of the present application, the surfactant can improve the etching quality of the patterned composition, enhance the fineness of the pattern, and enhance the fineness of the semiconductor device. Specifically, the surfactant can be, but is not limited to, one or more of anionic, cationic, nonionic, and zwitterionic.

[0072] In one embodiment of the present application, the patterned composition may further include other additives, such as a leveling agent, etc., so as to improve the coating performance of the patterned composition. Those skilled in the art may determine the amount of the above additives added to the patterned composition according to actual production needs.

[0073] One embodiment of the present application also provides a patterned film, which is prepared using the patterned composition provided in any of the above embodiments. The patterned film can be used to prepare a mask in a semiconductor manufacturing process, which is conducive to transferring the pattern of the patterned film to a substrate such as a wafer through subsequent exposure and other treatments, and forming a pattern corresponding to the mask on the substrate.

[0074] In one embodiment of the present application, a method for preparing a patterned film includes: coating a patterned composition on a substrate to form a patterned composition film layer; exposing and developing the patterned composition film layer through a photomask to form a patterned film on the substrate surface.

[0075] The present application also provides a patterned substrate, which is made using the patterned composition described in any of the above embodiments. The patterned substrate can be used in the preparation of semiconductor devices, thereby improving the manufacturing accuracy and quality of semiconductor devices and helping to improve the overall performance of semiconductor devices.

[0076] In one embodiment of the present application, a method for preparing a patterned substrate includes: forming a patterned film on the upper and lower sides of a substrate, and transferring a pattern of the patterned film to the substrate to obtain a patterned substrate.

[0077] In one embodiment of the present application, the pattern formed by the patterned composition selectively protects the underlying substrate material in the etching step, and after etching under certain conditions, the unprotected substrate material is etched, but the etching speed of the protected part is slower than that of the unprotected part, and finally a pattern is formed on the substrate material, that is, the pattern is transferred to the substrate. The etching process can specifically transfer the pattern to the substrate through HF etching, ion etching or ion implantation process.

[0078] The present application provides a color filter, which includes the above-mentioned patterned substrate or the patterned substrate prepared by the above-mentioned patterned substrate preparation method. In some embodiments, the color filter is formed by coating and etching the patterned composition provided by the present application on the surface of the substrate, and has good light splitting effect and strong anti-optical crosstalk ability.

[0079] The present application provides a semiconductor device, which is prepared by coating any of the patterned compositions described above on a substrate, and then exposing and developing the semiconductor device, or by using the patterned film described in any of the above embodiments, or by using the patterned substrate described in any of the above embodiments. The semiconductor device provided by the present application has high precision, which is conducive to improving the comprehensive performance of the semiconductor device.

[0080] In one embodiment of the present application, the semiconductor device comprises: a structure obtained by etching or electron injection into a patterned substrate. In one embodiment of the present application, the semiconductor device is a structure obtained by etching or electron injection into a patterned substrate whose substrate is a silicon wafer.

[0081] In the present application, there is no limitation on the specific type of semiconductor device. In one embodiment of the present application, the semiconductor device may be an integrated circuit device including a chip. During the preparation of the chip, other functional layers may be prepared after the aforementioned patterning process is completed.

[0082] In one embodiment of the present application, the semiconductor device may be a CMOS sensor, including a stacked photodiode, a color filter and a microlens, wherein the color filter is made from the patterned composition provided in any of the above embodiments. The color filter has a high organic pigment content, improves the spectral performance of the CMOS sensor, and is conducive to improving its pixelation performance.

[0083] In one embodiment of the present application, the CMOS sensor can be used in a camera module, and then applied in electronic equipment, aerospace, transportation, industrial production and other fields, which is conducive to improving the commercial application of semiconductor devices.

[0084] An embodiment of the present application further provides a method for preparing a semiconductor device, comprising: S101: coating the patterned composition described in any one of the above embodiments on a surface of a substrate to form a patterned composition film layer; S102: masking, exposing and developing the patterned composition film layer to obtain a patterned film. The preparation method provided in the present application is simple, and the obtained semiconductor device has excellent comprehensive performance, which is conducive to its commercial application.

[0085] In one embodiment of the present application, the substrate is selected according to actual needs. Specifically, the substrate can be, but is not limited to, a silicon wafer or a silicon wafer covered with a coating, and the coating can be, for example, an anti-reflective coating, an anti-etching coating, an epitaxial layer, a metal layer, a dielectric layer, a modified layer or a matching layer. Usually other coatings can be obtained by pre-treating the substrate. The pre-treatment method can be: subjecting the silicon wafer substrate to O2 plasma surface hydrophilic activation; or cleaning in Piranha solution (H2O: 30% ammonia: 30% H2O2 = 5:1:1) for 15mins-20mins, and then washing with deionized water and isopropanol to complete the hydrophilic treatment; or using evaporation or spin coating to cover hexamethyldisilazane (Hexamethyldisilazane, HMDS) on the substrate to perform surface hydrophobic treatment on the substrate; the hydrophobic treatment can be after the hydrophilic treatment; or adding a bottom antireflection layer (BARC), a bottom carbon-containing coating (Spin on carbon, SOC), or a bottom silicon-containing coating (Spin on glass, SOG).

[0086] In one embodiment of the present application, the substrate may be cleaned before coating to remove impurities and dust on the surface of the substrate. Specifically, the cleaning method may be, but is not limited to, using a solvent, acid, ultrasound or spray cleaning. In one embodiment of the present application, the cleaning method may be ultrasonic cleaning.

[0087] In one embodiment of the present application, the light source for exposure may be, but is not limited to, light with a wavelength of 10 nm-380 nm, X-rays, electron beams, ion beams, and the like.

[0088] In one embodiment of the present application, after coating, baking treatment can be performed before exposure to remove excess solvent in the film layer and improve the structural reliability of the patterned composition; baking treatment can also be performed after exposure and before development to promote the chemical reaction in the etch-resistant coating. The baking temperature is 60°C-200°C, and the baking time is 20s-120s. Specifically, the baking temperature can be but not limited to 60°C, 80°C, 100°C, 120°C, 140°C, 160°C, 180°C or 200°C, and the baking time can be but not limited to 20s, 40s, 60s, 80s, 100s or 120s. In one embodiment of the present application, the baking temperature can be 60°C-150°C, and the baking time can be 20s-80s. In one embodiment of the present application, the baking temperature can be 100°C-200°C, and the baking time can be 70s-120s.

[0089] In one embodiment of the present application, a developing solution is used for developing treatment. Since the chemical properties of the exposed area in the patterned composition film layer change and the solubility changes, it is necessary to use a developing solution to clean the exposed patterned composition film layer to obtain a patterned film. The cleaning time is 10s-300s, which can be divided into single-step cleaning and multi-step cleaning. In the patterned composition film layer after cleaning, if the exposed area is washed away, it is positive development to form a positive pattern, and the patterned composition is a positive patterned composition; if the exposed area is not washed away, it is negative development to form a negative pattern, and the patterned composition is a negative patterned composition.

[0090] In one embodiment of the present application, the developing solution includes a developer. The developer can be selected according to the properties of the patterning composition and used in combination to improve the etching effect. The developing time is 10s-120s. Specifically, the developer can include but is not limited to organic solutions, inorganic solutions, pure solvents, mixed solvents, solvents containing other additives, etc.; illustratively, the organic solvent can be but is not limited to one or more of ketones, alcohols, ethers, esters, lactones and high-boiling alcohols; among them, ketones can be but are not limited to cyclohexanone or methyl-2-n-pentyl ketone, etc.; alcohols can be but are not limited to 3-methoxybutanol, 3-methyl-3-methoxybutanol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol or diacetone alcohol, etc.; ethers can be but are not limited to propylene glycol mono Methyl ether, ethylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monoethyl ether, propylene glycol dimethyl ether or diethylene glycol dimethyl ether, etc.; esters may be, but are not limited to, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl lactate, ethyl pyruvate, butyl acetate, 3-ethoxypropionic acid methyl ester, 3-ethoxypropionic acid ethyl ester, tert-butyl acetate, tert-butyl propionate or propylene glycol monotert-butyl ether acetate, etc.; lactones may be, but are not limited to, γ-butyrolactone; high boiling point alcohol solvents may be, but are not limited to, diethylene glycol, propylene glycol, glycerol, 1,4-butanediol or 1,3-butanediol, etc. In one embodiment of the present application, the developer may be a tetramethylammonium hydroxide (TMAH) aqueous solution with a concentration of 0.5%-5%. In some embodiments, after development, rinsing and baking are also included to remove impurities on the surface of the patterned film and improve the structural reliability of the patterned film.

[0091] In one embodiment of the present application, after forming a patterned film on a substrate, the method further includes: etching the patterned substrate or injecting electrons to form a pattern on the surface of the patterned substrate, thereby forming a structure required for a semiconductor device on the surface of the substrate to obtain a semiconductor device.

[0092] The effect of the technical solution of the present application is further illustrated below through specific examples.

[0093] Example 1 Dispersant, organic pigment (PG58), synergist (synergist's structural formula is ) and a solvent (propylene glycol methyl ether acetate), and then sand-milled and centrifuged twice to obtain a pigment composition, wherein the dispersant comprises: , where the weight average molecular weight Mw of the dispersant is 20,000, PDI=1.4, n is 9.5, and x:y is 20.99:79.01.

[0094] Example 2 The difference from Example 1 is that, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the dispersant in the pigment composition is 20%.

[0095] Example 3 The difference from Example 1 is that the dispersant includes n is 9, h is 7.5, the weight average molecular weight Mw of the dispersant is 18000, PDI=1.61, and x:y:z is 20.83:63.96:15.21.

[0096] Example 4 The difference from Example 1 is that, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the synergist in the pigment composition is 3.57%, and the mass percentage of the dispersant is 24.99%.

[0097] Comparative Example 1 The difference from Example 1 is that the dispersant includes: , wherein the weight average molecular weight Mw of the dispersant is 12600, PDI=1.3, n is 3, and x:y is 30.67:69.33.

[0098] Comparative Example 2 The difference from Example 1 is that the dispersant includes: , wherein the weight average molecular weight Mw of the dispersant is 10198, PDI=1.36, n is 3, and x:y is 30.67:69.33.

[0099] Comparative Example 3 The difference from Example 1 is that the dispersant includes: , n is 3, h is 3.5, wherein the weight average molecular weight Mw of the dispersant is 12952, PDI=1.53, and x:y:z is 33.85:58.46:7.69.

[0100] Comparative Example 4 The difference from Example 1 is that the dispersant is , n is 3, the weight average molecular weight Mw of the dispersant is 20,000, and PDI = 1.4.

[0101] Comparative Example 5 The difference from Example 1 is that no dispersant is added.

[0102] Comparative Example 6 The difference from Example 1 is that no synergist is added.

[0103] Performance Testing The component contents of the pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 are shown in Table 1.

[0104] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to a particle size test, and the test method was as follows: the pigment compositions were diluted by about 2000 times, and then the particle size was tested using a dynamic light scattering nanoparticle size analyzer. The test results are shown in Table 1.

[0105] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to viscosity tests using an E-type viscometer. The test results are shown in Table 1.

[0106] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to stability tests using an E-type viscometer. The pigment compositions were heat stored at 40° C. for 7 days and the dispersion stability was determined by comparing the viscosity with the initial viscosity.

[0107] The pigment composition prepared in the above Examples 1-4, together with a film-forming resin, a polymerizable monomer, an initiator, a UV absorber and a leveling agent, was used to form a patterned composition, and a cleaning rate test was performed using a (TMAH aqueous solution). The test method was to apply the patterned composition on a 4-inch glass sheet, drip a developer, record the cleaning thickness and cleaning time, and calculate the cleaning speed. The test results are shown in Table 2.

[0108] Table 1 Pigment composition performance test

[0109] Table 2 Performance test of patterned composition

[0110] It can be seen from Examples 1-4 and Comparative Examples 1-6 that the pigment composition provided by the present application has both high dispersibility and high organic pigment content and excellent stability when using a low dispersant content. It can be seen from Examples 1 and 2-4 that the pigment composition provided by the present application can increase the amount of organic pigment used when using a low content dispersant and an appropriate amount of synergist, but does not affect the dispersibility of the pigment composition, has a similar level of viscosity and particle size, and achieves the same dispersibility effect. It can be seen from Examples 1 and 3 that the third structural unit can make the patterned group have an excellent cleaning rate, which is beneficial to the stability of the semiconductor process. It can be seen from Examples 1 and Comparative Examples 1-6 that the use of the present application under the interaction of the dispersant and the synergist can further increase the organic pigment content in the pigment composition, improve the dispersibility of the pigment composition, inhibit the agglomeration of the pigment composition, and obtain a nano-level pigment composition, which is beneficial to improving the refinement, spectral effect and anti-optical crosstalk ability of semiconductor devices.

[0111] It should be understood that the first, second and various numerical numbers involved in this document are only distinguished for the convenience of description and are not used to limit the scope of the present application.

[0112] In this application, "and / or" describes the association relationship of associated objects, indicating that there can be three relationships. For example, A and / or B can mean: A exists alone, A and B exist at the same time, and B exists alone, where A and B can be singular or plural. The character " / " generally indicates that the associated objects are in an "or" relationship.

[0113] In this application, "at least one" means one or more, and "plurality" means two or more. "At least one of the following" or similar expressions refers to any combination of these items, including any combination of single items or plural items. For example, "at least one of a, b, or c", or "at least one of a, b, and c" can all mean: a, b, c, ab (i.e., a and b), ac, bc, or abc, where a, b, c can be single or multiple.

[0114] In this application, “-” represents a range value, including the endpoint values ​​at both ends. For example, the value of a can be 0.5-15, which means that the value of a can be between 0.5 and 15, and includes the endpoint values ​​0.5 and 15.

[0115] The above is a preferred embodiment of the present application, but it should not be understood as limiting the scope of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application, and these improvements and modifications are also considered to be within the scope of protection of the present application.

Claims

1. A pigment composition, characterized in that The pigment composition comprises a dispersant, an organic pigment, a synergist and a solvent, wherein the synergist comprises an alkaline compound, and the dispersant comprises a first structural unit represented by formula (I) and a second structural unit represented by formula (II). Formula (I), Formula (II), In formula (I), R1, R2 and R3 are independently selected from hydrogen atom or C1-C4 alkyl, R4 is selected from single bond or -C(=O)O-, R5 is selected from single bond, -R a -O(O=)CR b -、-R c -HN-(O=)CR d -、-R e -(O=)2SNH-R f -, alkylene or arylene, R a , R b , R c , R d , R e , R f independently selected from a single bond or an alkylene group; In formula (II), R 1 , R 2 and R 3 are independently selected from hydrogen atom or C1-C4 alkyl, R 4 -C(=O)O-, R 5 Selected from , , or , R 6 is selected from C1-C20 alkyl groups, R 7 Selected from -R a -O(O=)C-、-R b -HN-(O=)C-or-R c -(O=)2SNH-,R 8 Selected from alkylene, R a , R b , R c They are independently selected from alkylene groups, p, q, and n are any positive numbers in the range of 4-10, and the sum of m1+m2 is any positive number in the range of 4-10.

2. The pigment composition according to claim 1, characterized in that In the dispersant, the mass percentage of the first structural unit is 20%-25%, and the mass percentage of the second structural unit is 75%-80%.

3. The pigment composition according to claim 1, characterized in that The R 6 An alkyl group selected from C5-C20.

4. The pigment composition according to claim 1, characterized in that The dispersant comprises a structure shown in formula (III): Formula (III), Wherein, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, the ratio of x to y is (20-25):(75-80), x+y=100, and n is any positive number in the range of 4-10.

5. The pigment composition according to claim 1, characterized in that The dispersant further comprises a third structural unit represented by formula (IV), Formula (IV), Among them, R 9 , R 10 and R 11 are independently selected from hydrogen atom or C1-C4 alkyl, R 12 is an alkylene group, R 13 for , R 14 is a C1-C3 alkoxy group, R 15 is a C1-C3 alkylene group, and h is any positive number in the range of 5-10.

6. The pigment composition according to claim 5, characterized in that In the dispersant, the mass percentage of the first structural unit is 20%-25%, the mass percentage of the second structural unit is 60%-70%, and the mass percentage of the third structural unit is 10%-20%.

7. The pigment composition according to claim 5, characterized in that The dispersant comprises a structure as shown in formula (V): Formula (V), Wherein, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, z is the mass percentage of the third structural unit, the ratio of x, y and z is (20-25): (60-70): (10-20), x+y+z=100, n is any positive number in the range of 4-10, and h is any positive number in the range of 5-10.

8. The pigment composition according to claim 1, characterized in that The weight average molecular weight of the dispersant is 9000-25000, and the polymer dispersibility index of the dispersant is less than or equal to 1.

4.

9. The pigment composition according to any one of claims 1 to 8, characterized in that Taking the total mass of the non-volatile components in the pigment composition as 100%, in the pigment composition, the mass percentage of the organic pigment is 69%-76.9%, the mass percentage of the dispersant is 18%-24%, and the mass percentage of the synergist is 5%-8%.

10. The pigment composition according to claim 1, characterized in that The mass ratio of the dispersant to the organic pigment is (0.2-0.3):1, the mass ratio of the synergist to the organic pigment is (0.05-0.1):1, and the mass ratio of the dispersant to the synergist is (0.2-0.3):(0.05-0.1).

11. The pigment composition according to claim 1, characterized in that The solvent includes one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether; In the pigment composition, the mass percentage of the solvent is 75%-80%.

12. The pigment composition according to claim 1, characterized in that The particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm.

13. The pigment composition according to claim 1, characterized in that The viscosity of the pigment composition is less than or equal to 4 mPa·s; After being stored at 40° C. for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%.

14. A patterned composition, characterized in that The patterning composition comprises the pigment composition according to any one of claims 1 to 13 and a film-forming resin.

15. A patterned substrate, characterized in that: The patterned substrate is made from the patterned composition according to claim 14.

16. A color filter, characterized in that: The color filter comprises the patterned substrate according to claim 15 .

17. A semiconductor device, characterized in that: The semiconductor device is manufactured using the patterning composition according to claim 14.

Images