Chemical liquid supply system, liquid exchange method, substrate processing apparatus, and medium

Abstract

The invention discloses a chemical liquid supply system, a liquid changing method, a substrate processing device and a medium. The chemical liquid supply system comprises a first supply part and a control part, the first supply part comprises a liquid storage tank, a liquid inlet pipeline, a first circulation pipeline, a heater, a first discharge pipeline, a flushing pipeline and a detection device, and the liquid inlet pipeline is used for introducing chemical liquid into the liquid storage tank; the first circulating pipeline is connected with an inlet and an outlet of the liquid storage tank; the heater is arranged on the first circulating pipeline; the first discharge pipeline is connected with the first circulating pipeline, and the flushing pipeline is used for introducing flushing liquid into the liquid storage tank after the chemical liquid in the liquid storage tank and the heater is discharged from the first discharge pipeline; the detection device is used for detecting process parameters in the liquid storage tank and / or the first circulation pipeline; the control part is in communication connection with the liquid inlet pipeline, the flushing pipeline and the detection device and used for controlling connection and disconnection of the liquid inlet pipeline or the flushing pipeline according to the technological parameters detected by the detection device. Discharge can be achieved so that liquid can be replaced, and leakage can be prevented.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a chemical liquid supply system, a liquid replacement method of the chemical liquid supply system, a substrate processing device, and a computer-readable medium storing computer program codes. Background Art

[0002] In the wet cleaning process, a single-chip high-temperature SPM (Sulfuric Acid Hydrogen Peroxide Mixture) cleaning device is used to supply SPM solution to the substrate surface to clean organic matter and etching residues on the substrate surface. The single-chip high-temperature SPM cleaning device includes a chamber and a sulfuric acid CDS (Chemical Distribution System). The chamber is used to accommodate the substrate. The sulfuric acid CDS includes a reservoir, a circulation pipeline and a heater. The reservoir is used to supply sulfuric acid solution to the chamber. The temperature of the sulfuric acid solution provided is 90°C~190°C and the concentration is 96%. The circulation pipeline connects the inlet and outlet of the reservoir. The heater is set in the circulation pipeline to heat the sulfuric acid solution in the circulation pipeline. The heated sulfuric acid solution returns to the reservoir through the circulation pipeline.

[0003] When the sulfuric acid CDS is replaced with a new sulfuric acid solution, it is necessary to first discharge the sulfuric acid solution inside the storage tank, circulation pipeline and heater in the sulfuric acid CDS, and then use a rinse solution, such as deionized water (DIW) to rinse it clean, and finally introduce a new sulfuric acid solution. Before rinsing, if there is too much sulfuric acid solution remaining, then during rinsing, the deionized water and the high-concentration and high-temperature sulfuric acid solution will mix and react chemically, and a large amount of heat will be released. Even in a short period of time, the mixing temperature of the deionized water and the sulfuric acid solution exceeds 100°C, resulting in boiling, and then a large amount of water vapor will be generated to cause local high pressure, resulting in the rupture of the sulfuric acid storage tank and pipelines, etc., causing leakage. Similarly, after rinsing, when a new sulfuric acid solution is introduced, if there is too much rinse solution remaining, it will mix and react chemically with the new sulfuric acid solution, which will also cause the sulfuric acid storage tank and pipelines to rupture, causing leakage. Summary of the invention

[0004] The purpose of the present application is to solve the problem in the prior art of how to enable a chemical liquid supply system to discharge in order to replace the liquid and prevent leakage.

[0005] To solve the above problems, one embodiment of the present application proposes a chemical liquid supply system, including a first supply part and a control part, the first supply part including: a liquid storage tank for storing chemical liquid; a liquid inlet pipeline for introducing chemical liquid into the liquid storage tank; a first circulation pipeline connecting the inlet and outlet of the liquid storage tank; a heater arranged in the first circulation pipeline; a first discharge pipeline connected to the first circulation pipeline, for discharging the chemical liquid in the liquid storage tank and the heater; a flushing pipeline, for introducing flushing liquid into the liquid storage tank after the chemical liquid in the liquid storage tank and the heater is discharged from the first discharge pipeline, so that the flushing liquid flushes the liquid storage tank and the first circulation pipeline in turn; and a detection device, for detecting process parameters in the liquid storage tank and / or the first circulation pipeline; wherein the control part is respectively connected to the liquid inlet pipeline, the flushing pipeline and the detection device for communication, and the control part is used to control the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters detected by the detection device.

[0006] In one embodiment of the present application, the detection device includes a temperature sensor and / or a pressure sensor, and the process parameters include a temperature value and / or a pressure value; in response to the temperature value and / or the pressure value exceeding a corresponding predetermined value, the control unit controls the liquid inlet pipeline or the flushing pipeline to be shut off to stop the chemical liquid or flushing liquid from entering the liquid storage tank.

[0007] In one embodiment of the present application, it also includes: a pressure protection device, which is arranged in the liquid storage tank and / or the first circulation pipeline, and is used to release the pressure when the pressure in the liquid storage tank and / or the first circulation pipeline exceeds a set value.

[0008] In one embodiment of the present application, it also includes: a liquid outlet pipeline, the access point of which is connected to the first circulation pipeline and is located between the outlet of the heater and the inlet of the liquid storage tank; a first filter, which is arranged in the liquid outlet pipeline and is used to filter the chemical liquid in the liquid outlet pipeline; and a second discharge pipeline, which is connected to the first filter and is used to discharge the chemical liquid in the first filter.

[0009] In one embodiment of the present application, it also includes a second supply part, which includes: a liquid replenishing tank, connected to the liquid inlet pipeline, used to replenish the chemical liquid into the liquid storage tank; a third discharge pipeline, connected to the liquid replenishing tank, used to discharge the chemical liquid in the liquid replenishing tank; a second circulation pipeline, connecting the inlet and outlet of the liquid replenishing tank; a second filter, arranged in the second circulation pipeline; a fourth discharge pipeline, connected to the second filter, used to discharge the chemical liquid in the second filter; wherein the outlet of the fourth discharge pipeline is connected to the third discharge pipeline.

[0010] In one embodiment of the present application, it also includes: a recovery section for recovering chemical liquid; a waste liquid section for treating the flushing liquid after flushing; a discharge main pipe, which is connected to the recovery section and the waste liquid section respectively, and is connected to the first discharge pipeline, the second discharge pipeline and the third discharge pipeline respectively.

[0011] In one embodiment of the present application, it also includes: a residual liquid detection sensor, which is arranged at the outlet of the discharge main pipe and is used to detect whether there are droplets at the outlet of the discharge main pipe.

[0012] In one embodiment of the present application, the liquid storage tank includes: an inner tank body, used to contain the chemical liquid; and an outer tank body, arranged on the periphery of the inner tank body.

[0013] Another embodiment of the present application provides a substrate processing device, comprising: a plurality of chambers, each for accommodating a substrate; and the above-mentioned chemical liquid supply system, for supplying the chemical liquid in the liquid storage tank to the plurality of chambers respectively.

[0014] Another embodiment of the present application provides a liquid replacement method for a chemical liquid supply system, comprising the following steps: Step S10: discharging the chemical liquid in the liquid storage tank and the heater through a first discharge pipeline, wherein the heater is disposed in a first circulation pipeline, and the first circulation pipeline is connected to an inlet and an outlet of the liquid storage tank; Step S20: introducing a flushing liquid into the liquid storage tank through the flushing pipeline, so that the flushing liquid flushes the liquid storage tank and the first circulation pipeline in turn, and at the same time detecting the process parameters in the liquid storage tank and / or the first circulation pipeline, and controlling the on-off of the flushing pipeline according to the process parameters; Step S30: discharging the flushing liquid in the liquid storage tank and the heater through the first discharge pipeline; Step S40: introducing chemical liquid into the liquid storage tank through the liquid inlet pipeline, detecting the process parameters in the liquid storage tank and / or the first circulation pipeline at the same time, and controlling the on-off of the liquid inlet pipeline according to the process parameters.

[0015] Another embodiment of the present application provides a computer-readable medium storing a computer program code, and the computer program code implements the above-mentioned fluid replacement method when executed by a processor.

[0016] The present application can discharge the liquid storage tank, the first circulation pipeline and the heater on the first circulation pipeline by setting the first discharge pipeline, and can flush the liquid storage tank, the first circulation pipeline and the heater on the first circulation pipeline after discharge by setting the flushing pipeline. The chemical liquid can be introduced into the discharged and flushed liquid storage tank through the liquid inlet pipeline. On this basis, the process parameters in the liquid storage tank and the first circulation pipeline are detected by setting the detection device, and the control unit controls the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters. When it is detected that the process parameters are abnormal, the liquid inlet pipeline or the flushing pipeline can be controlled to be shut down in time, the supply of chemical liquid or flushing liquid can be stopped, and then the new liquid can be stopped from participating in the chemical reaction, so as to avoid the occurrence of a larger area of ​​chemical reaction, so that the process parameters are controlled within the expected range, and the liquid storage tank and the first circulation pipeline are prevented from being broken, thereby avoiding leakage.

[0017] Other features and corresponding beneficial effects of the present application are described in the latter part of the specification, and it should be understood that at least some of the beneficial effects become obvious from the records in the specification of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a structural schematic diagram of a first supply part in a chemical liquid supply system according to an embodiment of the present application; Figure 2 A schematic diagram of the structure of a chemical liquid supply system according to an embodiment of the present application; and Figure 3 The present invention is a flow chart of a liquid replacement method of a chemical liquid supply system according to an embodiment of the present invention. DETAILED DESCRIPTION

[0019] The following specific embodiments illustrate the implementation of the present application, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Although the description of the present application will be introduced in conjunction with the preferred embodiment, this does not mean that the features of this application are limited to the implementation. On the contrary, the purpose of introducing the application in conjunction with the implementation is to cover other options or modifications that may extend based on the protection scope of the present application. In order to provide a deep understanding of the present application, the following description will include many specific details. The present application can also be implemented without using these details. In addition, in order to avoid confusion or blurring the focus of the present application, some specific details will be omitted in the description. It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other without conflict.

[0020] It should be noted that in this specification, similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings.

[0021] The technical solution of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.

[0022] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0023] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0024] In order to make the objectives, technical solutions and advantages of the present application clearer, the implementation methods of the present application will be further described in detail below in conjunction with the accompanying drawings.

[0025] Figure 1 Schematic diagram of the structure of a first supply part in a chemical liquid supply system according to an embodiment of the present application.

[0026] refer to Figure 1The chemical liquid supply system proposed in the present application includes a first supply unit 10 and a control unit 100. The first supply unit 10 includes a liquid storage tank 11, a liquid inlet pipeline 12, a first circulation pipeline 13, a heater 131, a first discharge pipeline 14, a flushing pipeline 15 and a detection device 101. The liquid storage tank 11 is used to store chemical liquid, the liquid inlet pipeline 12 is used to pass chemical liquid into the liquid storage tank 11, the first circulation pipeline 13 connects the inlet and outlet of the liquid storage tank 11, and the heater 131 is arranged in the first circulation pipeline 13, which is used to heat the chemical liquid in the first circulation pipeline 13. The heated chemical liquid returns to the liquid storage tank 11 through the first circulation pipeline 13, thereby realizing the heating of the chemical liquid in the liquid storage tank 11. The first discharge pipeline 14 is connected to the first circulation pipeline 13, and is used to discharge the chemical liquid in the liquid storage tank 11 and the heater 131. The flushing pipeline 15 is used to pass flushing liquid into the liquid reservoir 11 after the chemical liquid in the liquid reservoir 11 and the heater 131 is discharged from the first discharge pipeline 14, so that the flushing liquid flushes the liquid reservoir 11 and the first circulation pipeline 13 in turn. After the flushing liquid is finally discharged through the first discharge pipeline 14, the liquid inlet pipeline 12 passes the chemical liquid into the liquid reservoir 11. The discharge process of the flushing liquid is similar to the discharge process of the chemical liquid. The detection device 101 is used to detect the process parameters in the liquid reservoir 11 and / or the first circulation pipeline 13. The control unit 100 is respectively connected to the liquid inlet pipeline 12, the flushing pipeline 15 and the detection device 101 for communication, and the control unit 100 is used to control the on and off of the liquid inlet pipeline 12 or the flushing pipeline 15 according to the process parameters detected by the detection device 101. The liquid inlet pipeline 12 is provided with an automatic valve 121, and the flushing pipeline 15 is provided with an automatic valve 151. The control unit 100 controls the opening and closing of the liquid inlet pipeline 12 or the flushing pipeline 15 by respectively controlling the opening and closing of the automatic valve 121 and the automatic valve 151.

[0027] exist Figure 1 In the example shown, the first circulation pipeline 13 is provided with a first pump 132 and an automatic valve 133, and the first pump 132 is located at the outlet of the liquid storage tank 11. The chemical liquid in the liquid storage tank 11 can be discharged through the first discharge pipeline 14 under the action of the first pump 132. The automatic valve 133 is used to control the on-off of the first circulation pipeline 13. The first discharge pipeline 14 is provided with an automatic valve 141, which is used to control the on-off of the first discharge pipeline 14. The chemical liquid in the heater 131 is discharged through the first discharge pipeline 14 under the action of gravity. During the discharge process of the heater 131 and the liquid storage tank 11, the automatic valve 133 can be opened, which is conducive to the discharge of the chemical liquid in the first circulation pipeline 13 from the first discharge pipeline 14 after the chemical liquid in the liquid storage tank 11 and the heater 131 is discharged from the first discharge pipeline 14, and at the same time, it can prevent the chemical liquid discharged from the liquid storage tank 11 from flowing back into the liquid storage tank 11.

[0028] The present application realizes discharge of the liquid storage tank 11, the first circulation pipeline 13 and the heater 131 on the first circulation pipeline 13 by setting the first discharge pipeline 14, and realizes flushing of the liquid storage tank 11, the first circulation pipeline 13 and the heater 131 on the first circulation pipeline 13 after discharge by setting the flushing pipeline 15, and the chemical liquid can be introduced into the liquid storage tank 11 after discharge and flushing through the liquid inlet pipeline 12, and on this basis, the process parameters in the liquid storage tank 11 and the first circulation pipeline 13 are detected by setting the detection device 101, and the control unit 100 controls the opening and closing of the liquid inlet pipeline 12 or the flushing pipeline 15 according to the process parameters. When it is detected that the process parameters are abnormal, the liquid inlet pipeline 12 or the flushing pipeline 15 can be controlled to be shut down in time, the supply of chemical liquid or flushing liquid can be stopped, and then the new liquid can be stopped from participating in the chemical reaction, so as to avoid the occurrence of chemical reactions in a larger area, so that the process parameters are controlled within the expected range, and the liquid storage tank 11 and the first circulation pipeline 13 are prevented from being broken, thereby avoiding leakage.

[0029] refer to Figure 1 In some embodiments, the detection device 101 includes a temperature sensor 102 and / or a pressure sensor 103, and the process parameters include temperature values ​​and / or pressure values. The detection device 101 can detect abnormal process parameters in a timely manner. In this embodiment, the detection device 101 includes a temperature sensor 102 and a pressure sensor 103, and the liquid storage tank 11 and the first circulation pipeline 13 are both provided with the temperature sensor 102 and the pressure sensor 103.

[0030] When the detection device 101 includes a temperature sensor 102 and a pressure sensor 103, and the temperature sensor 102 and the pressure sensor 103 are both provided on the liquid storage tank 11 and the first circulation pipeline 13, during the liquid discharge process, that is, the chemical liquid in the liquid storage tank 11 and the heater 131 is discharged through the first discharge pipeline 14, and is flushed after discharge through the flushing pipeline 15, and the flushing liquid after flushing is discharged through the first discharge pipeline 14, in response to the temperature sensor 102 at any position detecting that the temperature value exceeds the temperature preset value and the pressure sensor 103 at any position detecting that the pressure value exceeds the pressure preset value, the control unit 100 controls the flushing pipeline 15 to be shut down. During the liquid replacement process, that is, after the flushing liquid after flushing is discharged through the first discharge pipeline 14, the liquid inlet pipeline 12 is passed into the liquid storage tank 11. In response to the temperature sensor 102 at any position detecting that the temperature value exceeds the temperature preset value and the pressure sensor 103 at any position detecting that the pressure value exceeds the pressure preset value, the control unit 100 controls the liquid inlet pipeline 12 to be shut down.

[0031] In the above-mentioned liquid discharge process and liquid replacement process, the high temperature problem caused by the reaction between the chemical liquid and the flushing liquid can be timely discovered by setting the temperature sensor 102, and the high pressure problem caused by the reaction between the chemical liquid and the flushing liquid can be timely discovered by setting the pressure sensor 103. Therefore, the simultaneous detection of these two process parameters can improve the detection accuracy and enhance the reliability of the chemical liquid supply system. In this embodiment, an alarm device (not shown) can be set. When the detection device 101 detects that the process parameters are abnormal, the alarm device alarms so as to stop the supply of flushing liquid or chemical liquid in time to avoid the deterioration of the situation.

[0032] refer to Figure 1 In some embodiments, the chemical liquid supply system further includes a pressure protection device 104, which is disposed in the liquid storage tank 11 and / or the first circulation pipeline 13. When the pressure in the liquid storage tank 11 and / or the first circulation pipeline 13 exceeds a set value, the pressure protection device 104 discharges the excess pressure in the liquid storage tank 11 and / or the first circulation pipeline 13 to prevent the liquid storage tank 11 or the first circulation pipeline 13 from being damaged. In some embodiments, the pressure protection device 104 may be a safety valve or a pressure relief valve. In this embodiment, the liquid storage tank 11 includes an inner tank body 111 and an outer tank body 112, the inner tank body 111 is used to contain the chemical liquid, the material of the inner tank body 111 is quartz, and the outer tank body 112 is disposed on the periphery of the inner tank body 111, and is used to catch the leaked liquid when the inner tank body 111 is broken. The material of the outer tank body 112 may be PTFE. When the pressure protection device 104 is disposed in the inner tank body 111 , it can release the pressure when the internal pressure of the inner tank body 111 is too high, thereby preventing the inner tank body 111 from rupturing.

[0033] exist Figure 1 In the example shown, the access point 134 where the first discharge pipeline 14 is connected to the first circulation pipeline 13 is located between the outlet of the liquid storage tank 11 and the inlet of the heater 131 .

[0034] refer to Figure 1 In some embodiments, the chemical liquid supply system further includes a liquid outlet pipeline 16, a first filter 161 and a second discharge pipeline 17. The access point 136 where the liquid outlet pipeline 16 is connected to the first circulation pipeline 13 is located between the outlet of the heater 131 and the inlet of the liquid storage tank 11. The first filter 161 is disposed in the liquid outlet pipeline 16, and is used to filter the chemical liquid in the liquid outlet pipeline 16. The second discharge pipeline 17 is connected to the first filter 161, and is used to discharge the chemical liquid in the first filter 161. The second discharge pipeline 17 is provided with an automatic valve 171. Specifically, the first filter 161 includes a first housing and a first filter element, the first filter element is located inside the first housing, and is used to filter the chemical liquid in the liquid outlet pipeline 16, and the second discharge pipeline 17 is connected to the cavity between the first housing and the first filter element, and is used to discharge the chemical liquid in the cavity.

[0035] Figure 2 Schematic diagram of the structure of a chemical liquid supply system according to an embodiment of the present application.

[0036] refer to Figure 2 In some embodiments, the chemical liquid supply system further includes a second supply unit 20, which includes a liquid replenishing tank 21, a third discharge pipeline 22, a second circulation pipeline 23, a second filter 231 and a fourth discharge pipeline 24. The liquid replenishing tank 21 is connected to the liquid inlet pipeline 12 of the first supply unit 10, and is used to replenish the chemical liquid to the liquid storage tank 11. The third discharge pipeline 22 is connected to the liquid replenishing tank 21, and is used to discharge the chemical liquid in the liquid replenishing tank 21. The second circulation pipeline 23 connects the inlet and outlet of the liquid replenishing tank 21, and the second filter 231 is arranged in the second circulation pipeline 23. The fourth discharge pipeline 24 is connected to the second filter 231, and is used to discharge the chemical liquid in the second filter 231; wherein the outlet of the fourth discharge pipeline 24 is connected to the third discharge pipeline 22, so that the chemical liquids in the third discharge pipeline 22 and the fourth discharge pipeline 24 are collected and discharged together. In this embodiment, the second circulation pipeline 23 is provided with a second pump 233 and an automatic valve 234. The second pump 233 is located at the outlet of the liquid replenishing tank 21. The chemical liquid in the liquid replenishing tank 21 can be discharged under the action of the second pump 233. The automatic valve 234 is used to control the on-off of the second circulation pipeline 23. The third discharge pipeline 22 is connected to the second circulation pipeline 23 to be connected to the liquid replenishing tank 21 through the second circulation pipeline 23.

[0037] refer to Figure 2 In some embodiments, the second supply unit 20 further includes a preheater 232 and a fifth discharge pipeline 25, and the fifth discharge pipeline 25 is configured so that the chemical liquid in the preheater 232 is discharged through the fifth discharge pipeline 25 under the action of gravity. Figure 2 In the example shown, the first end 251 of the fifth discharge pipeline 25 is connected to the second circulation pipeline 23 and is located between the preheater 232 and the second filter 231, and the second end 252 of the fifth discharge pipeline 25 is connected to the second circulation pipeline 23 and is located between the second filter 231 and the outlet of the liquid replenishing tank 21. The fifth discharge pipeline 25 is in communication with the third discharge pipeline 22, and the chemical liquid in the fifth discharge pipeline 25 is finally discharged into the third discharge pipeline 22. An automatic valve 253 is provided on the fifth discharge pipeline 25 for controlling the opening and closing of the fifth discharge pipeline 25.

[0038] refer to Figure 2In some embodiments, the chemical liquid supply system further includes a recovery section 30, a waste liquid section 40, a discharge main pipe 50 and a residual liquid detection sensor 60. The recovery section 30 is used to recover the chemical liquid, and the waste liquid section 40 is used to treat the flushing liquid after flushing. The discharge main pipe 50 is connected to the recovery section 30 and the waste liquid section 40 respectively, and is connected to the first discharge pipeline 14, the second discharge pipeline 17 and the third discharge pipeline 22 respectively, so that the chemical liquid in the first discharge pipeline 14, the second discharge pipeline 17 and the third discharge pipeline 22 is discharged to the recovery section 30 through the discharge main pipe 50, and the flushing liquid in the first discharge pipeline 14, the second discharge pipeline 17 and the third discharge pipeline 22 is discharged to the waste liquid section 40 through the discharge main pipe 50.

[0039] refer to Figure 2 In some embodiments, the residual liquid detection sensor 60 is disposed at the outlet of the discharge main pipe 50. When the chemical liquid supply system supplies chemical liquid to the substrate in the wet cleaning process, the residual liquid detection sensor 60 does not work; when the chemical liquid supply system is in the process of discharging liquid, the residual liquid detection sensor 60 works to detect whether there are droplets at the outlet of the discharge main pipe 50, to ensure that the chemical liquid supply system has completed the discharge, so as to carry out other subsequent processes. In this embodiment, the discharge main pipe 50 is a transparent or translucent pipe, and the residual liquid detection sensor 60 is installed on the periphery of the discharge main pipe 50 to detect whether there are droplets flowing in the discharge main pipe 50. The residual liquid detection sensor 60 can be a clamp-tube photoelectric sensor or a clamp-tube laser sensor.

[0040] refer to Figure 2 In some embodiments, the second supply part 20 also includes a liquid inlet pipeline 27, a flushing pipeline 26, a detection device 201 and a pressure protection device 204. The design principles of the liquid inlet pipeline 27, the flushing pipeline 26, the detection device 201 and the pressure protection device 204 of the second supply part 20 and the connection relationship between them and the liquid replenishment tank 21 are similar to the design principles of the liquid inlet pipeline 12, the flushing pipeline 15, the detection device 101 and the pressure protection device 104 of the first supply part 10 and the connection relationship between them and the liquid storage tank 11, and are not repeated here.

[0041] The present application also proposes a substrate processing device, comprising a plurality of chambers (not shown) and the above-mentioned chemical liquid supply system. The plurality of chambers are respectively used to accommodate substrates. The first end of the liquid outlet pipeline 16 of the chemical liquid supply system is connected to the first circulation pipeline 13 and is located between the outlet of the heater 131 and the inlet of the liquid storage tank 11, and the second end of the liquid outlet pipeline 16 is connected to a plurality of branch liquid outlet pipelines, so that the chemical liquid in the liquid storage tank 11 is respectively supplied to the plurality of chambers through the plurality of branch liquid outlet pipelines.

[0042] Figure 3 The present invention is a flow chart of a liquid replacement method of a chemical liquid supply system according to an embodiment of the present invention.

[0043] refer to Figure 3 The present application also proposes a liquid replacement method for a chemical liquid supply system. The liquid replacement method can be implemented based on the above-mentioned chemical liquid supply system. The liquid replacement method of this embodiment includes the following steps: Step S10: discharging the chemical liquid in the liquid storage tank 11 and the heater 131 through the first discharge pipeline 14, wherein the heater 131 is disposed in the first circulation pipeline 13, and the first circulation pipeline 13 is connected to the inlet and the outlet of the liquid storage tank 11; Step S20: introducing a flushing liquid into the liquid storage tank 11 through the flushing pipeline 15, so that the flushing liquid flushes the liquid storage tank 11 and the first circulation pipeline 13 in sequence, and detecting the process parameters in the liquid storage tank 11 and / or the first circulation pipeline 13 at the same time, and controlling the on-off of the flushing pipeline 15 according to the process parameters; Step S30: discharging the flushing liquid in the liquid storage tank 11 and the heater 131 through the first discharge pipeline 14; Step S40: introducing chemical liquid into the liquid storage tank 11 through the liquid inlet pipeline 12, detecting the process parameters in the liquid storage tank 11 and / or the first circulation pipeline 13, and controlling the on-off of the liquid inlet pipeline 12 according to the process parameters.

[0044] In some embodiments, in step S10, the chemical liquid in the liquid storage tank 11 can be discharged through the first discharge pipeline 14 under the action of the first pump 132 at the first predetermined time. When the liquid level in the liquid storage tank 11 drops to the predetermined low liquid level, the chemical liquid in the liquid storage tank 11 is discharged through the first discharge pipeline 14 at the second predetermined time to ensure that the chemical liquid in the liquid storage tank 11 is discharged. Then, the chemical liquid in the heater 131 is discharged through the first discharge pipeline 14 at the third predetermined time, and then, the chemical liquid in the first filter 161 is discharged through the second discharge pipeline 17 at the fourth predetermined time. In this embodiment, the first predetermined time and the second predetermined time are, for example, 10 seconds respectively, the third predetermined time is, for example, 20 seconds, and the fourth predetermined time is, for example, 30 seconds. In other embodiments, the starting points of the first predetermined time, the third predetermined time, and the fourth predetermined time are synchronized, that is, the liquid discharge process of the liquid storage tank 11, the heater 131, and the first filter 161 can be carried out simultaneously. In the embodiment of the present application, there is no particular limitation on the order of draining the liquid from the liquid storage tank 11 , the heater 131 , and the first filter 161 , as long as the purpose of draining the liquid is achieved.

[0045] The method for discharging the flushing liquid in step S30 may refer to the method for discharging the chemical liquid in step S10 described above.

[0046] The specific process of controlling the on-off of the flushing pipeline 15 according to the process parameters in step S20 and the specific process of controlling the on-off of the liquid inlet pipeline 12 according to the process parameters in step S40 are described in detail in the above-mentioned chemical liquid supply system embodiment and will not be repeated here.

[0047] It should be noted that in the wet cleaning process, the first supply unit 10 and the second supply unit 20 work in cooperation with each other. When the first supply unit 10 provides chemical liquid to the substrate in the chamber, the second supply unit 20 is used to replenish the liquid to the liquid storage tank 11 in the first supply unit 10 to a predetermined high liquid level. For the liquid replacement method of the second supply unit 20, reference can be made to the liquid replacement method of the first supply unit 10 in the previous text. Among them, the first supply unit 10 and the second supply unit 20 can be drained and rinsed separately, or drained and rinsed at the same time.

[0048] The present application also proposes a computer-readable medium storing a computer program code, which implements the above-mentioned liquid replacement method when executed by a processor.

[0049] When the liquid replacement method is implemented as a computer program, it can also be stored in a computer-readable storage medium as a product. For example, a computer-readable storage medium may include, but is not limited to, a magnetic storage device (e.g., a hard disk, a floppy disk, a magnetic strip), an optical disk (e.g., a compact disk (CD), a digital versatile disk (DVD)), a smart card, and a flash memory device (e.g., an electrically erasable programmable read-only memory (EPROM), a card, a stick, a key drive). In addition, the various storage media described herein can represent one or more devices and / or other machine-readable media for storing information. The term "machine-readable medium" may include, but is not limited to, wireless channels and various other media (and / or storage media) that can store, contain and / or carry code and / or instructions and / or data.

[0050] It should be understood that the embodiments described above are only illustrative. The embodiments described herein may be implemented in hardware, software, firmware, middleware, microcode, or any combination thereof. For hardware implementation, the processor may be implemented in one or more application specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, and / or other electronic units designed to perform the functions herein, or combinations thereof.

[0051] Some aspects of the present application may be performed entirely by hardware, entirely by software (including firmware, resident software, microcode, etc.), or by a combination of hardware and software. The above hardware or software may be referred to as "data blocks", "modules", "engines", "units", "components" or "systems". The processor may be one or more application specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DAPDs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, or combinations thereof. In addition, various aspects of the present application may be represented as computer products located in one or more computer-readable media, which include computer-readable program codes. For example, computer-readable media may include, but are not limited to, magnetic storage devices (e.g., hard disks, floppy disks, tapes ...), optical disks (e.g., compact disks CDs, digital versatile disks DVDs ...), smart cards, and flash memory devices (e.g., cards, sticks, key drives ...).

[0052] A computer-readable medium may include a propagated data signal containing computer program code, such as in baseband or as part of a carrier wave. The propagated signal may have a variety of manifestations, including electromagnetic, optical, etc., or a suitable combination. A computer-readable medium may be any computer-readable medium other than a computer-readable storage medium, which may be connected to an instruction execution system, device or apparatus to communicate, propagate or transmit a program for use. The program code on the computer-readable medium may be propagated via any suitable medium, including radio, cable, fiber optic cable, radio frequency signal, or similar medium, or any combination of the above mediums.

[0053] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A chemical liquid supply system, characterized in that: The invention comprises a first supply unit and a control unit, wherein the first supply unit comprises: A liquid storage tank for storing chemical liquid; A liquid inlet pipeline, used for introducing chemical liquid into the liquid storage tank; A first circulation pipeline, connecting the inlet and the outlet of the liquid storage tank; A heater, arranged in the first circulation pipeline; a first discharge pipeline, connected to the first circulation pipeline, for discharging the chemical liquid in the liquid storage tank and the heater; a flushing pipeline, used to pass a flushing liquid into the liquid reservoir after the chemical liquid in the liquid reservoir and the heater is discharged from the first discharge pipeline, so that the flushing liquid flushes the liquid reservoir and the first circulation pipeline in sequence; and A detection device is used to detect the process parameters in the liquid storage tank and / or the first circulation pipeline; wherein, The control unit is respectively connected to the liquid inlet pipeline, the flushing pipeline and the detection device for communication, and the control unit is used to control the on-off of the liquid inlet pipeline or the flushing pipeline according to the process parameters detected by the detection device.

2. The chemical liquid supply system according to claim 1, characterized in that: The detection device includes a temperature sensor and / or a pressure sensor, and the process parameter includes a temperature value and / or a pressure value; In response to the temperature value and / or the pressure value exceeding the corresponding predetermined value, the control unit controls the liquid inlet pipeline or the flushing pipeline to be closed to stop the chemical liquid or flushing liquid from being introduced into the liquid storage tank.

3. The chemical liquid supply system according to claim 1, characterized in that: Also includes: A pressure protection device is arranged in the liquid storage tank and / or the first circulation pipeline, and is used to release the pressure when the pressure in the liquid storage tank and / or the first circulation pipeline exceeds a set value.

4. The chemical liquid supply system according to claim 1, characterized in that: Also includes: A liquid outlet pipeline, the access point of which is connected to the first circulation pipeline and is located between the outlet of the heater and the inlet of the liquid storage tank; A first filter, disposed in the liquid outlet pipeline, for filtering the chemical liquid in the liquid outlet pipeline; The second discharge pipeline is connected to the first filter and is used for discharging the chemical liquid in the first filter.

5. The chemical liquid supply system according to claim 4, characterized in that: Also included is a second supply unit, the second supply unit comprising: A liquid replenishing tank, connected to the liquid inlet pipeline, for replenishing the chemical liquid to the liquid storage tank; a third discharge pipeline connected to the liquid replenishing tank and used for discharging the chemical liquid in the liquid replenishing tank; A second circulation pipeline is connected to the inlet and outlet of the liquid replenishment tank; A second filter is arranged in the second circulation pipeline; A fourth discharge pipeline is connected to the second filter and is used to discharge the chemical liquid in the second filter; wherein an outlet of the fourth discharge pipeline is connected to the third discharge pipeline.

6. The chemical liquid supply system according to claim 5, characterized in that: Also includes: Recovery department, used to recover chemical liquid; A waste liquid section, used for treating the flushing liquid after flushing; The discharge main pipe is connected to the recovery part and the waste liquid part respectively, and is connected to the first discharge pipeline, the second discharge pipeline and the third discharge pipeline respectively.

7. The chemical liquid supply system according to claim 6, characterized in that: Also includes: The residual liquid detection sensor is arranged at the outlet of the discharge main pipe and is used to detect whether there are liquid drops at the outlet of the discharge main pipe.

8. The chemical liquid supply system according to claim 1, characterized in that: The liquid storage tank comprises: The inner tank is used to contain chemical liquid; The outer tank body is arranged on the outer periphery of the inner tank body.

9. A substrate processing device, characterized in that: include: A plurality of chambers, each for accommodating a substrate; as well as The chemical liquid supply system according to any one of claims 1 to 8 is used to supply the chemical liquid in the liquid storage tank to the multiple chambers respectively.

10. A liquid replacement method for a chemical liquid supply system, characterized in that: The following steps are involved: Step S10: discharging the chemical liquid in the liquid storage tank and the heater through a first discharge pipeline, wherein the heater is disposed in a first circulation pipeline, and the first circulation pipeline is connected to an inlet and an outlet of the liquid storage tank; Step S20: introducing a flushing liquid into the liquid storage tank through a flushing pipeline, so that the flushing liquid flushes the liquid storage tank and the first circulation pipeline in sequence, and detecting process parameters in the liquid storage tank and / or the first circulation pipeline, and controlling the on-off of the flushing pipeline according to the process parameters; Step S30: discharging the flushing liquid in the liquid storage tank and the heater through the first discharge pipeline; Step S40: introducing chemical liquid into the liquid storage tank through the liquid inlet pipeline, detecting the process parameters in the liquid storage tank and / or the first circulation pipeline, and controlling the on-off of the liquid inlet pipeline according to the process parameters.

11. A computer readable medium storing computer program code, characterized in that: The computer program code implements the fluid replacement method according to claim 10 when executed by a processor.

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