Vacuum isolated low-temperature pipeline device

Abstract

The invention discloses a vacuum-isolated low-temperature pipeline device which comprises a cold plate, a T-shaped pipe, a vacuum cavity, a Y-shaped pipe and a cold source. The cold plate and the T-shaped pipe are arranged in the vacuum cavity; the Y-shaped pipe comprises an outer pipe and an inner pipe which are in clearance fit, a boundary plate is arranged on the Y-shaped pipe, so that the clearance between the outer pipe and the inner pipe is divided into a high vacuum area and a low vacuum area, and the high vacuum area is communicated with the vacuum cavity; two ends of the outer pipe are respectively connected with the cold source and the vacuum cavity, two ends of the inner pipe are respectively connected with the cold source and the T-shaped pipe, the T-shaped pipe is connected with an input port and an output port of the cold plate, and a circulating pipeline is arranged in the cold plate; and a low-temperature working medium provided by the cold source is conveyed to the circulating pipeline in the cold plate through the inner pipe and the T-shaped pipe so as to cool the cold plate, and the working medium subjected to heat exchange is recirculated into the cold source. The solar water heater has the advantages of being compact in structure, high in stability, convenient to disassemble and assemble and the like, heat transfer can be effectively isolated through low vacuum between the inner pipe and the outer pipe, in the ultralow temperature state, the outer pipe does not need to be wrapped with any heat preservation material, and condensate water cannot be generated.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a vacuum-insulated low-temperature pipeline device. Background Art

[0002] In semiconductor process manufacturing, especially in ion implanters, in order to reduce the activity of atoms or ions and obtain a clearer interface between the amorphous layer and the single crystal layer during the implantation process, and to meet higher-level manufacturing requirements, the load end needs to be subjected to ultra-low temperature cooling treatment. For example, when the load end is processed in a -160°C environment, the isolation method of wrapping with insulation materials is often used to reduce the condensation problem caused by low temperature. The method of wrapping with insulation materials cannot completely eliminate the occurrence of condensation. In particular, when the low-temperature pipeline is introduced from the atmosphere to the load end on the vacuum side, it is difficult to wrap the insulation material on the vacuum side, and the use of insulation materials on the vacuum side is prone to functional problems such as particle pollution, metal pollution, and excessive water vapor. Similarly, the problem of water vapor condensation on the vacuum side cannot be completely solved. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide a vacuum-insulated cryogenic pipeline device with compact structure, high stability and convenient assembly and disassembly in view of the deficiencies in the prior art.

[0004] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0005] A vacuum-isolated low-temperature pipeline device comprises: a cold plate, a T-tube, a vacuum cavity, a Y-tube and a cold source; the cold plate and the T-tube are arranged in the vacuum cavity; the Y-tube comprises an outer tube and an inner tube with clearance fit, and a boundary plate is arranged on the Y-tube to realize that the gap between the outer tube and the inner tube is divided into a high vacuum area and a low vacuum area, and the high vacuum area is connected to the vacuum cavity; one end of the outer tube is connected to the cold source, and the other end of the outer tube is connected to the vacuum cavity; one end of the inner tube is connected to the cold source, and the other end of the inner tube is connected to one end of the T-tube after passing through the vacuum cavity, and the other end of the T-tube is connected to the input and output ports of the cold plate, and a circulation pipeline is arranged inside the cold plate; the low-temperature working medium provided by the cold source is transported to the circulation pipeline inside the cold plate through the inner tube and the T-tube to realize cooling of the cold plate, thereby realizing cooling of the wafer on the cold plate, and the working medium after heat exchange is circulated to the cold source through the inner tube and the T-tube.

[0006] As a further improvement of the present invention, a differential block is provided at the connection between the outer tube and the vacuum chamber, and the differential block is provided with a first O-ring and a second O-ring in the radial direction. Between the first O-ring and the second O-ring, the inner wall of the differential block and the outer wall of the outer tube form a differential space, and the differential space is connected to the differential pump through a pipeline to assist in establishing a high vacuum environment of 3E-7Torr inside the vacuum chamber.

[0007] As a further improvement of the present invention, there are two inner tubes, which serve as the cryogenic medium input tube and output tube respectively.

[0008] As a further improvement of the present invention, in the vacuum chamber, the two inner tubes are connected by a U-shaped block.

[0009] As a further improvement of the present invention, a C-shaped sealing ring is provided between the outer ring of the inner tube and the T-shaped tube.

[0010] As a further improvement of the present invention, the side of the vacuum chamber is connected to a vacuum pump through a pipeline.

[0011] As a further improvement of the present invention, a detachable cover is provided on the top of the vacuum chamber.

[0012] As a further improvement of the present invention, the vacuum degree of the low vacuum zone is ≤5E-5Torr.

[0013] Compared with the prior art, the advantages of the present invention are:

[0014] 1. The vacuum-insulated low-temperature pipeline device of the present invention uses a Y-tube from the cold source end. The Y-tube is a double-layer tube, divided into an inner tube and an outer tube. The inner tube is divided into an inlet tube and an outlet tube for the low-temperature working medium. There is a low vacuum state between the inner tube and the outer tube. When the inner tube circulates and transports the low-temperature working medium, the low vacuum between the inner tube and the outer tube can effectively isolate heat transfer. Under the ultra-low temperature state, the outer tube does not need to be wrapped with any insulation material, and the outer tube will not produce condensed water, thereby improving the high vacuum degree of the process chamber.

[0015] 2. The vacuum-insulated low-temperature pipeline device of the present invention realizes isolation between the low vacuum side and the vacuum side of the low-temperature working medium conveying inner tube by arranging a boundary plate of low thermal conductivity material on the Y-tube. The boundary plate not only serves to isolate high and low vacuum, but also effectively prevents heat transfer between the outer tube and the inner tube. The outer tube is connected to the high vacuum cavity through a differential block. The differential block has an O-ring at the upper and lower positions of the differential extraction port, which has a significant effect on promoting the establishment of high vacuum in the vacuum cavity. When there is no differential block, the vacuum degree of the vacuum cavity is ≥8E-6Torr. After using the differential block, the vacuum degree of the vacuum cavity can reach 3E-7Torr. The differential block is easy to install and has reliable functions. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the overall structural principle of a cryogenic tube in a specific embodiment of the present invention;

[0017] Figure 2 It is a schematic diagram of the cross-sectional structure principle of a cryogenic tube in a specific embodiment of the present invention;

[0018] Legend: 1. Cover plate; 2. Cold plate; 3. T-tube; 4. Vacuum chamber; 5. Vacuum pump; 6. Differential block; 7. Differential pump; 8. U-block; 9. First O-ring; 10. Second O-ring; 11. C-ring; 12. Y-tube; 121. Outer tube; 122. Inner tube; 13. Cold source; 14. Boundary plate; 15. Low vacuum area. DETAILED DESCRIPTION

[0019] The present invention is further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the protection scope of the present invention is not limited thereby.

[0020] In the description of the present invention, it should be understood that the terms "side", "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0021] In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "multiple" means two or more, unless otherwise clearly and specifically defined.

[0022] Example

[0023] like Figure 1 and Figure 2As shown, the vacuum-insulated low-temperature pipeline device of the present invention comprises: a cold plate 2, a T-tube 3, a vacuum cavity 4, a Y-tube 12 and a cold source 13. The cold plate 2 and the T-tube 3 are arranged in the vacuum cavity 4. The Y-tube 12 comprises an outer tube 121 and an inner tube 122 with clearance fit, and a dividing plate 14 is provided on the Y-tube 12 to realize that the clearance between the outer tube 121 and the inner tube 122 is radially divided into a high vacuum zone and a low vacuum zone 15, and the high vacuum zone is connected to the vacuum cavity 4. One end of the outer tube 121 is connected to the cold source 13, and the other end of the outer tube 121 is connected to the vacuum cavity 4; one end of the inner tube 122 is connected to the cold source 13, and the other end of the inner tube 122 is connected to one end of the T-tube 3 after passing through the vacuum cavity 4, and the other end of the T-tube 3 is connected to the input and output ports of the cold plate 2, and a circulation pipeline is provided inside the cold plate 2. The low-temperature working medium provided by the cold source 13 is transported to the circulation pipeline inside the cold plate 2 through the inner tube 122 and the T-tube 3 to cool the cold plate 2 and then cool the wafers on the cold plate 2. The working medium after heat exchange is then circulated to the cold source 13 through the inner tube 122 and the T-tube 3.

[0024] like Figure 2 As shown, there are two inner tubes 122 , which serve as a cryogenic medium input tube and an output tube respectively. The two inner tubes 122 are arranged in a Y shape and are nested inside the outer tube 121 .

[0025] In this embodiment, the vacuum degree of the low vacuum zone 15 is ≤5E-5Torr. Under this vacuum degree, when the inner tube 122 transports a low-temperature working medium at -160°C, due to the isolation effect of the vacuum-sealed space, no condensed water will be generated on the surface of the outer tube 121 at room temperature; and there is only extremely low cooling loss during the transportation of the low-temperature working medium.

[0026] In this embodiment, a Y-shaped tube 12 is used starting from the cold source end. The Y-shaped tube 12 is a double-layer tube, divided into an inner tube 122 and an outer tube 121. The inner tube 122 is divided into a low-temperature working medium inlet tube and an outlet tube. There is a low vacuum state between the inner tube 122 and the outer tube 121. When the inner tube 122 circulates the low-temperature working medium, the low vacuum between the inner tube 122 and the outer tube 121 can effectively isolate heat transfer. In the ultra-low temperature state, the outer tube 121 does not need to be wrapped with any thermal insulation material, which reduces the risk of pollution, and the outer tube 121 does not produce condensed water.

[0027] like Figure 1 and Figure 2 As shown, a differential block 6 is provided at the connection between the outer tube 121 and the vacuum chamber 4, and a first O-ring 9 and a second O-ring 10 are provided in the radial direction of the differential block 6. Between the first O-ring 9 and the second O-ring 10, the inner wall of the differential block 6 and the outer wall of the outer tube 121 form a differential space, and the differential space is connected to the differential pump 7 through a pipeline to assist in establishing a high vacuum environment of 3E-7Torr inside the vacuum chamber 4.

[0028] like Figure 1 and Figure 2 As shown, in the vacuum chamber 4, two inner tubes 122 are connected by a U-shaped block 8, and the U-shaped block 8 is close to the bottom of the T-shaped tube 3. Furthermore, a C-shaped sealing ring 11 is provided between the outer ring of the inner tube 122 and the T-shaped tube 3.

[0029] In this embodiment, the input and output ports of the inner tube 122 are respectively connected to the input and output ports of the T-tube 3 in a planar manner, and a C-shaped sealing ring 11 is used on the outer ring of the inner tube 122. The two inner tubes 122 are mechanically connected through a U-shaped block 8 to keep the end face of the inner tube 122 in close contact with the end face of the T-tube 3, thereby performing a seal between the two inner tubes 122, and effectively preventing the cryogenic working fluid in the input tube of the inner tube 122 from leaking into the inner tube 122 output tube, thereby greatly improving the utilization rate of the cryogenic working fluid. The C-shaped sealing ring 11 prevents the cryogenic working fluid from leaking into the vacuum chamber 4.

[0030] like Figure 2 As shown, the side of the vacuum chamber 4 is connected to the vacuum pump 5 through a pipeline, and the vacuum chamber 4 is evacuated by the vacuum pump 5.

[0031] like Figure 2 As shown, a detachable cover plate 1 is provided on the top of the vacuum chamber 4 . The cover plate 1 is opened to facilitate placing the wafer on the cold plate 2 or removing the wafer from the cold plate 2 .

[0032] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A vacuum-insulated cryogenic piping device, characterized in that: include: A cold plate (2), a T-tube (3), a vacuum chamber (4), a Y-tube (12) and a cold source (13); the cold plate (2) and the T-tube (3) are arranged in the vacuum chamber (4); the Y-tube (12) comprises an outer tube (121) and an inner tube (122) with clearance fit, and a dividing plate (14) is provided on the Y-tube (12) to separate the clearance between the outer tube (121) and the inner tube (122) into a high vacuum zone and a low vacuum zone (15), wherein the high vacuum zone is connected to the vacuum chamber (4); one end of the outer tube (121) is connected to the cold source (13), and the other end of the outer tube (121) is connected to the vacuum chamber (4); ); one end of the inner tube (122) is connected to the cold source (13); the other end of the inner tube (122) passes through the vacuum chamber (4) and is connected to one end of the T-tube (3); the other end of the T-tube (3) is connected to the input and output ports of the cold plate (2); and a circulation pipeline is provided inside the cold plate (2); the low-temperature working fluid provided by the cold source (13) is transported to the circulation pipeline inside the cold plate (2) through the inner tube (122) and the T-tube (3) to achieve cooling of the cold plate (2), thereby achieving cooling of the wafers on the cold plate (2); and the working fluid after heat exchange is circulated to the cold source (13) through the inner tube (122) and the T-tube (3).

2. The vacuum-insulated cryogenic pipeline device according to claim 1, characterized in that: A differential block (6) is provided at the connection between the outer tube (121) and the vacuum chamber (4); the differential block (6) is provided with a first O-ring (9) and a second O-ring (10) in the radial direction; between the first O-ring (9) and the second O-ring (10), the inner wall of the differential block (6) and the outer wall of the outer tube (121) form a differential space; the differential space is connected to a differential pump (7) through a pipeline to assist in establishing a high vacuum environment of 3E-7Torr inside the vacuum chamber (4).

3. The vacuum-insulated cryogenic pipeline device according to claim 2, characterized in that: There are two inner tubes (122), which serve as a cryogenic medium input tube and an output tube respectively.

4. The vacuum-insulated cryogenic pipeline device according to claim 3, characterized in that: In the vacuum chamber (4), the two inner tubes (122) are connected via a U-shaped block (8).

5. The vacuum-insulated cryogenic pipeline device according to claim 4, characterized in that: A C-shaped sealing ring (11) is provided between the outer ring of the inner tube (122) and the T-shaped tube (3).

6. The vacuum-insulated cryogenic piping device according to any one of claims 1 to 5, characterized in that: The side of the vacuum chamber (4) is connected to a vacuum pump (5) via a pipeline.

7. The vacuum-insulated cryogenic piping device according to any one of claims 1 to 5, characterized in that: A detachable cover plate (1) is provided on the top of the vacuum chamber (4).

8. The vacuum-insulated cryogenic piping device according to any one of claims 1 to 5, characterized in that: The vacuum degree of the low vacuum zone (15) is ≤5E-5Torr.

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