An electroplating additive for nickel-chromium alloy, its preparation method and its application

Abstract

The present disclosure relates to the technical field of metal surface treatment, and particularly relates to an electroplating additive for chromium-nickel alloy, a preparation method thereof, and an application thereof. The electroplating additive is selected from organic compounds whose molecular structures satisfy the following conditions: including at least one aryl group, cycloalkyl group, heterocyclic group or heteroaryl group; including at least one amino group, and the amino group is connected to the aryl group, cycloalkyl group, heterocyclic group or heteroaryl group; including at least two carboxyl groups, and the carboxyl groups are connected to the aryl group, cycloalkyl group, heterocyclic group or heteroaryl group. The present disclosure prepares an electroplating additive compound that helps deposit chromium ions and nickel ions during the electroplating process.

Description

Technical Field

[0001] The present disclosure relates to the technical field of metal surface treatment, and particularly relates to an electroplating additive for chromium-nickel alloy, a preparation method thereof, and an application thereof. Background Art

[0002] In recent years, with the rapid development of China's economy, the increasing number of sea-related activities such as maritime transportation, aquaculture, and oil development, the emergence of various transportation equipment, aquaculture equipment, and oil development equipment has facilitated industrial activities. Due to the particularity of the marine industrial environment, the surface of the equipment is easily corroded, so it is necessary to consume a large amount of maintenance costs and delay the production cycle.

[0003] Electroplating nickel-chromium alloy has attracted much attention due to its excellent coating properties, such as corrosion resistance, wear resistance, and good decorative effects of the coating. The application range is extremely wide, and some coatings can replace chromium-plated products. Especially depositing a layer of nickel-chromium alloy on the surface of metal materials can improve the corrosion resistance of the substrate, thereby reducing the consumption of stainless steel and saving chromium resources. Summary of the Invention

[0004] The present disclosure provides an electroplating additive for chromium-nickel alloy, a preparation method thereof, and an application thereof to solve the deficiencies in the related art.

[0005] According to the first aspect of the embodiments of the present disclosure, an electroplating additive for chromium-nickel alloy is provided, and the electroplating additive is selected from organic compounds whose molecular structure satisfies the following conditions:

[0006] 1) It contains at least one aryl group, cycloalkyl group, heterocyclic group, or heteroaryl group;

[0007] 2) It contains at least one amino group, and the amino group is connected to the aryl group, cycloalkyl group, heterocyclic group, or heteroaryl group;

[0008] 3) It contains at least two carboxyl groups, and the carboxyl groups are connected to the aryl group, cycloalkyl group, heterocyclic group, or heteroaryl group.

[0009] In one aspect of the embodiments of the present disclosure, the electroplating additive is selected from organic compounds whose molecular structure satisfies the following conditions:

[0010] 1) It contains at least two aryl groups or heteroaryl groups; or, it contains at least one aryl group and at least one heteroaryl group;

[0011] 2) It contains at least one amide group, and the amide group connects the aryl group or heteroaryl group;

[0012] 3) It contains at least one amino group, and the amino group is connected to the aryl group or heteroaryl group;

[0013] 4) It contains at least two carboxyl groups, and the carboxyl groups are connected to the aryl group or heteroaryl group;

[0014] 5) The amino group and the carboxyl group are not connected to the same aryl or heteroaryl group.

[0015] In one aspect of the embodiments of the present disclosure, the electroplating additive is selected from organic compounds having the following structural formula I:

[0016]

[0017] Wherein, n is selected from integers from 1 to 6; Ar1 and Ar2 are each independently selected from C3-C15 cycloalkyl, C6-12 aryl, 5-15 membered heterocyclic group or 5-15 membered heteroaryl group; wherein, the C3-C15 cycloalkyl, C6-12 aryl, 5-15 membered heterocyclic group or 5-15 membered heteroaryl group is optionally substituted by one or more hydrogen, hydroxyl, nitro, cyano, C1-C3 alkyl, C1-C3 alkoxy.

[0018] In one aspect of the embodiments of the present disclosure, Ar1 and Ar2 are each independently selected from phenyl and biphenyl, wherein, the phenyl and biphenyl are optionally substituted by one or more hydrogen, hydroxyl, nitro, cyano, C1-C3 alkyl, C1-C3 alkoxy.

[0019] In one aspect of the embodiments of the present disclosure, the electroplating additive is selected from organic compounds having the following structural formulae II-1 to II-4:

[0020]

[0021]

[0022] Wherein, n is selected from integers from 1 to 6; n2 is selected from integers from 0 to 3; R1 is selected from hydrogen, hydroxyl, nitro, cyano, C1-C3 alkyl or C1-C3 alkoxy.

[0023] In one aspect of the embodiments of the present disclosure, preferably, the electroplating additive is selected from any one of the following organic compounds:

[0024]

[0025] In one aspect of the embodiments of the present disclosure, preferably, the electroplating additive is selected from the following organic compounds: Or .

[0026] According to a second aspect of the embodiments of the present disclosure, there is provided a method for preparing the aforementioned electroplating additive, the method comprising the following steps:

[0027]

[0028] In one aspect of the embodiments of the present disclosure, preferably, the raw material A is selected from 5-bromoisophthalic acid.

[0029] In one aspect of the embodiments of the present disclosure, preferably, the raw material B is selected from 2,3-diaminobenzamide, 3-aminobenzamide, 2-aminobenzamide or 4-aminobenzamide.

[0030] According to a third aspect of the embodiments of the present disclosure, there is provided an electroplating solution for chromium-nickel alloy, the electroplating solution comprising: water, chromium salt, nickel salt, conductive agent, surfactant, buffer, and the aforementioned electroplating additive.

[0031] In one aspect of the embodiments of the present disclosure, in the electroplating solution, relative to 1000 parts by weight of water, the content of the chromium salt is 100-200 parts by weight, the content of the nickel salt is 40-100 parts by weight, the content of the conductive agent is 40-80 parts by weight, the content of the surfactant is 5-20 parts by weight, the content of the conductive agent is 10-50 parts by weight, and the content of the electroplating additive is 5-60 parts by weight.

[0032] In one aspect of the embodiments of the present disclosure, the chromium salt is selected from at least one of chromium nitrate, chromium chloride or chromium sulfate; the nickel salt is selected from at least one of nickel sulfate, nickel chloride, nickel acetate or nickel nitrate; the conductive agent is selected from at least one of ammonium chloride, sodium chloride or potassium chloride; the surfactant is selected from at least one of sodium dodecyl sulfate, cetyltrimethylammonium bromide, OP-10 or polyvinylpyrrolidone; the buffer is selected from at least one of boric acid, tartaric acid or phosphoric acid.

[0033] In one aspect of the embodiments of the present disclosure, preferably, the chromium salt is selected from chromium nitrate, and the nickel salt is selected from nickel nitrate.

[0034] In one aspect of the embodiments of the present disclosure, preferably, the molar ratio of the chromium salt to the nickel salt is selected from 1:(1.8-2.2); more specifically, the molar ratio of the chromium salt to the nickel salt is selected from 1:2.

[0035] The technical solutions provided by the embodiments of the present disclosure may include the following beneficial effects:

[0036] As can be seen from the above embodiments, the present disclosure has prepared an electroplating additive compound that helps to deposit chromium ions and nickel ions during the electroplating process.

[0037] It should be understood that the above general description and the following detailed description are merely exemplary and explanatory, and do not limit the present disclosure. Detailed Description of the Invention

[0038] To make the objectives, technical solutions and advantages of the present application clearer, the technical solutions of the present application will be clearly and completely described below in conjunction with the embodiments. Apparently, the described embodiments are some, but not all, of the embodiments of the present application. The described embodiments herein are illustrative in nature and are provided to give a basic understanding of the present application. The embodiments of the present application should not be construed as limiting the present application.

[0039] For the sake of brevity, only some numerical ranges are specifically disclosed herein. However, any lower limit can be combined with any upper limit to form a range not explicitly recited; and any lower limit can be combined with other lower limits to form a range not explicitly recited, and similarly any upper limit can be combined with any other upper limit to form a range not explicitly recited. In addition, each individually disclosed point or single numerical value itself can be used as a lower limit or an upper limit and combined with any other point or single numerical value or combined with other lower limits or upper limits to form a range not explicitly recited.

[0040] In this document, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, such that a process, method, article or device comprising a series of elements includes not only those elements but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the phrase "comprising a..." does not exclude the presence of additional identical elements in the process, method, article or device comprising the element.

[0041] In the description herein, unless otherwise specified, "above" and "below" include the number itself.

[0042] Unless otherwise specified, the terms used in the present disclosure have the well-known meanings commonly understood by those skilled in the art. Unless otherwise specified, the numerical values of the various parameters mentioned in the present disclosure can be measured by various measurement methods commonly used in the art (for example, they can be tested according to the methods given in the embodiments of the present disclosure).

[0043] The term "about" is used to describe and account for small variations. When used in connection with an event or circumstance, the term can refer to instances in which the event or circumstance occurs precisely as well as instances in which it occurs very nearly. For example, when used in connection with a numerical value, the term can refer to a range of variation that is less than or equal to ±10% of the numerical value, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%. Additionally, quantities, ratios, and other numerical values are sometimes presented herein in a range format. It should be understood that such range formats are for convenience and brevity only and should be interpreted flexibly to include not only the numerical values explicitly specified as range limits but also all individual numerical values or sub-ranges subsumed within that range as if each numerical value and sub-range were explicitly specified.

[0044] The list of items joined by the terms "at least one of", "at least a", "at least one kind of", or other similar terms can mean any combination of the listed items. For example, if items A and B are listed, then the phrase "at least one of A and B" means only A; only B; or A and B. In another example, if items A, B, and C are listed, then the phrase "at least one of A, B, and C" means only A; or only B; only C; A and B (excluding C); A and C (excluding B); B and C (excluding A); or all of A, B, and C. Item A can include a single component or multiple components. Item B can include a single component or multiple components. Item C can include a single component or multiple components.

[0045] In the present disclosure, the term "alkyl" refers to an aliphatic hydrocarbon group, which can be straight-chain or branched-chain. A branched chain refers to one or more lower alkyl groups attached to a linear alkyl chain, such as methyl, ethyl, or propyl. "Lower alkyl" refers to a group containing from about 1 to about 6 carbon atoms in the chain, which can be straight-chain or branched-chain.

[0046] In the present disclosure, the term "amino" refers to the -NR’R” group. The amino group can be optionally substituted. In an unsubstituted amino group, R’ and R” are hydrogen. In a substituted amino group, R’ and R” can each independently be, but are not limited to, hydrogen, alkyl, heteroalkyl, cycloalkyl, heterocycloalkyl, alkylcycloalkyl, alkylheterocycloalkyl, alkoxy, sulfonyl, alkenyl, alkanoyl, aryl, arylalkyl, or heteroaryl, provided that R’ and R” are not both hydrogen. In a substituted amino group, R’ and R” can cyclize to form a cyclic amino group, such as pyrrolidinyl or piperidinyl. Such cyclic amino groups can incorporate other heteroatoms, such as to form piperazine or morpholine groups. Such cyclic amino groups can be optionally substituted, for example, by an amino group, a hydroxyl group, or an oxo group.

[0047] In the present disclosure, the term "alkoxy" refers to -O-alkyl. An alkoxy may refer to a straight-chain, branched-chain, or cyclic, saturated or unsaturated oxy-hydrocarbon chain, including, for example, methoxy, ethoxy, propoxy, isopropoxy, butoxy, tert-butoxy, and pentyloxy. An alkoxy may optionally be substituted with one or more alkoxy substituents ("substituted alkoxy").

[0048] In the present disclosure, the term "aryl" refers to an aromatic monocyclic or polycyclic ring system. An aryl may optionally be substituted with one or more "ring system substituents", which may be the same or different and are as defined herein. Non-limiting examples of suitable aryls include phenyl and naphthyl.

[0049] In the present disclosure, the term "heteroaryl" refers to an aromatic monocyclic or polycyclic ring system in which one or more ring atoms are elements other than carbon, such as nitrogen, oxygen, or sulfur, either individually or in combination. Preferred heteroaryls contain from about 5 to about 6 ring atoms. "Heteroaryl" may optionally be substituted with one or more "ring system substituents", which may be the same or different and are as defined herein. The prefixes aza-, oxa-, or thia- before the heteroaryl root name indicate that at least one nitrogen, oxygen, or sulfur atom, respectively, is present as a ring atom. The nitrogen atom of a heteroaryl may optionally be oxidized to the corresponding N-oxide. Non-limiting examples of suitable heteroaryls include pyridyl, pyrazinyl, furyl, phenylthio, pyrimidinyl, isoxazolyl, isothiazolyl, oxazolyl, thiazolyl, pyrazolyl, furazanyl, pyrrolyl, pyrazolyl, triazolyl, 1,2,4-thiadiazolyl, pyrazinyl, pyridazinyl, quinoxalinyl, cinnolinyl, imidazo[1,2-a]pyridyl, imidazo[2,1-b]thiazolyl, benzofurazanyl, indolyl, azaindolyl, benzimidazolyl, benzothienyl, quinolinyl, imidazolyl, thiophenopyridyl, quinazolinyl, thiophenopyrimidinyl, pyrrolopyridyl, imidazopyridyl, isoquinolinyl, benzazaindolyl, 1,2,4-triazinyl, benzothiazolyl, etc.

[0050] In the present disclosure, the term "cycloalkyl" refers to a non-aromatic mono- or polycyclic ring system containing from about 3 to about 10 carbon atoms, preferably from about 5 to about 10 carbon atoms, and preferably the cycloalkyl ring contains from about 5 to about 7 ring atoms. A cycloalkyl may optionally be substituted with one or more "ring system substituents", which may be the same or different and are as defined above. Non-limiting examples of suitable monocyclic cycloalkyls include cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, etc. Non-limiting examples of suitable polycyclic cycloalkyls include 1-decalinyl, norbornyl, adamantyl, etc.

[0051] In the present disclosure, the term "heterocyclic group" refers to a non-aromatic saturated monocyclic or polycyclic ring system containing about 3 to about 10 ring atoms, preferably about 5 to about 10 ring atoms, wherein one or more ring atoms in the ring system are elements other than carbon, such as nitrogen, oxygen or sulfur, either individually or in combination. There are no adjacent oxygen and / or sulfur atoms in the ring system, and preferably the heterocycle contains about 5 to about 6 ring atoms. The prefixes aza-, oxa- or thia- before the heterocyclic group root name indicate that at least one nitrogen, oxygen or sulfur atom is present as a ring atom, respectively. The heterocyclic group may optionally be substituted by one or more "ring system substituents", which are the same or different and are defined herein. The nitrogen or sulfur atom of the heterocyclic group may optionally be oxidized to the corresponding N-oxide, S-oxide or S,S-dioxide. Non-limiting examples of suitable monocyclic heterocyclic group rings include piperidinyl, pyrrolidinyl, piperazinyl, morpholinyl, thiomorpholinyl, thiazolidinyl, 1,3-dioxolanyl, 1,4-dioxanyl, tetrahydrofuranyl, tetrahydrobenzothienyl, tetrahydrothiopyranyl, etc.

[0052] In the present disclosure, the electroplating additives involved in the present disclosure can form coordination polymers with nickel and cobalt elements. Taking a compound as an example, it can form the following structure with nickel atoms and / or cobalt atoms:

[0053]

[0054] Among them, cobalt is connected to two carboxyl groups, and nickel is connected to four carboxyl groups.

[0055] The present invention will be further described below by way of specific examples. All chemical reagents used in the embodiments of the present invention are obtained through conventional commercial channels unless otherwise specified. Unless otherwise specified, the contents described below are mass contents. Unless otherwise specified, it is understood that the operations are carried out at room temperature.

[0056] Examples and Comparative Examples

[0057] Example 1:

[0058] Example 1 includes the following steps:

[0059] (1) Prepare the electrolyte additive of Example 1:

[0060]

[0061] 4.5 g of 5-bromoisophthalic acid (20 mmol) was added to 50 mL of butyronitrile, 1.0 g of potassium phosphate, 400 μL of ethylenediamine (0.36 g, 6 mmol) and 0.5 g of the catalyst CuI were added, and then 3.26 g of 4-aminobenzamide (24 mmol) was added. Under nitrogen protection, the reaction was carried out at 165 °C for 4 h. After the reaction, the product was obtained by extraction, column chromatography and drying, and the yield was 72%. 1 H NMR: δ 6.87 (2H, J = 8.6, 1.1, 0.4 Hz), 7.47 (2H, J =8.6, 1.7, 0.4 Hz), 7.60 (2H, t, J = 1.9 Hz), 8.44 (1H, t, J = 1.9 Hz).

[0062] (2) Preparation of the electroplating solution of Example 1:

[0063] 6 g of sodium dodecyl sulfate was added to 500 mL of water, and the water was heated to 80 °C to completely dissolve the sodium dodecyl sulfate. Then 80 g of cobalt nitrate, 40 g of nickel nitrate, 25 g of sodium chloride, 5 g of tartaric acid and 3 g of the electrolyte additive prepared above (10 mmol) were added to obtain the electroplating solution of Example 1.

[0064] Example 2:

[0065] Example 2 includes the following steps:

[0066] (1) Preparation of the electrolyte additive of Example 2:

[0067] The steps for preparing the electrolyte additive in Example 2 were the same as those in Example 1, except that the raw material 4-aminobenzamide was replaced with 3-aminobenzamide:

[0068]

[0069] The product yield was 65%, 1 H NMR: δ 7.26 (1H, J = 8.2, 1.4, 1.3 Hz), 7.34-7.51 (2H,7.42 ( J = 8.4, 8.2, 0.4 Hz), 7.45 (J = 8.4, 1.8, 1.3 Hz)), 7.61 (2H, t, J =1.9 Hz), 8.07 (1H, J = 1.8, 1.4, 0.4 Hz), 8.44 (1H, t, J = 1.9 Hz).。

[0070] (2) Preparation of the electroplating solution of Example 2:

[0071] The steps for preparing the electroplating solution in Example 2 are the same as those in Example 1, except that the electrolyte additive prepared in Example 1 is replaced with the electrolyte additive (10 mmol) prepared in Example 2.

[0072] Example 3:

[0073] Example 3 includes the following steps:

[0074] (1) Prepare the electrolyte additive for Example 3:

[0075] The steps for preparing the electrolyte additive in Example 3 are the same as those in Example 1, except that the raw material 4-aminobenzamide is replaced with 2-aminobenzamide:

[0076]

[0077] The product yield is 63%, 1 H NMR: δ 6.88 (1H, J = 8.1, 1.2, 0.5 Hz), 7.29 (1H, J =7.9, 7.4, 1.2 Hz), 7.42 - 7.65 (4H, 7.49 (J = 7.9, 1.4, 0.5 Hz), 7.58 (J = 8.1,7.4, 1.4 Hz), 7.60 (t, J = 1.9 Hz)), 8.44 (1H, t, J = 1.9 Hz).

[0078] (2) Prepare the electroplating solution for Example 3:

[0079] The steps for preparing the electroplating solution in Example 3 are the same as those in Example 1, except that the electrolyte additive prepared in Example 1 is replaced with the electrolyte additive (10 mmol) prepared in Example 3.

[0080] Example 4:

[0081] Example 4 includes the following steps:

[0082] (1) Prepare the electrolyte additive for Example 4:

[0083] The steps for preparing the electrolyte additive in Example 4 are the same as those in Example 1, except that the raw material 4-aminobenzamide is replaced with 2,3-diaminobenzamide:

[0084]

[0085] The product yield is 67%, 11H NMR: δ 6.63 (1H, dd, J = 8.3, 1.5 Hz), 6.98 (1H, dd, J= 8.5, 8.3 Hz), 7.16 (1H, dd, J = 8.5, 1.5 Hz), 7.60 (2H, t, J = 1.9 Hz),8.44 (1H, t, J = 1.9 Hz).

[0086] (2) Prepare the electroplating solution of Example 4:

[0087] The steps for preparing the electroplating solution in Example 4 are the same as those in Example 1, except that the electrolyte additive prepared in Example 1 is replaced with the electrolyte additive (10 mmol) prepared in Example 4.

[0088] Example 5:

[0089] Example 5 includes the following steps:

[0090] (1) Prepare the electrolyte additive of Example 5:

[0091] The steps for preparing the electrolyte additive in Example 5 are the same as those in Example 1, except that the raw material 4-aminobenzamide is replaced with 3,4-diaminobenzamide:

[0092]

[0093] The product yield is 70%, 1 1H NMR: δ 6.84 (1H, dd, J = 8.8, 0.5 Hz), 7.23 (1H, dd, J= 8.8, 1.8 Hz), 7.60 (2H, t, J = 1.9 Hz), 8.12 (1H, dd, J = 1.8, 0.5 Hz),8.44 (1H, t, J = 1.9 Hz).

[0094] (2) Prepare the electroplating solution of Example 5:

[0095] The steps for preparing the electroplating solution in Example 5 are the same as those in Example 1, except that the electrolyte additive prepared in Example 1 is replaced with the electrolyte additive (10 mmol) prepared in Example 5.

[0096] Comparative Example 1:

[0097] (1) Select the electrolyte additive of Comparative Example 1:

[0098] Select 5-hydroxyisophthalic acid as the electrolyte additive of Comparative Example 1.

[0099] (2)Prepare the electroplating solution for Comparative Example 1:

[0100] The steps for preparing the electroplating solution in Comparative Example 1 are the same as those in Example 1, except that the electrolyte additive obtained in Example 1 is replaced with the electrolyte additive of Comparative Example 1 (10 mmol).

[0101] Comparative Example 2:

[0102] (1)Select the electrolyte additive for Comparative Example 2:

[0103] Select diethylenetriamine as the electrolyte additive for Comparative Example 2.

[0104] (2)Prepare the electroplating solution for Comparative Example 2:

[0105] The steps for preparing the electroplating solution in Comparative Example 2 are the same as those in Example 1, except that the electrolyte additive obtained in Example 1 is replaced with the electrolyte additive of Comparative Example 2 (10 mmol).

[0106] Comparative Example 3:

[0107] (1)Select the electrolyte additive for Comparative Example 3:

[0108] Select tetra-hydroxyethyl ethylene diamine as the electrolyte additive for Comparative Example 3.

[0109] (2)Prepare the electroplating solution for Comparative Example 3:

[0110] The steps for preparing the electroplating solution in Comparative Example 3 are the same as those in Example 1, except that the electrolyte additive obtained in Example 1 is replaced with the electrolyte additive of Comparative Example 3 (10 mmol).

[0111] Comparative Example 4:

[0112] (1)Select the electrolyte additive for Comparative Example 4:

[0113] Select sodium acetate as the electrolyte additive for Comparative Example 4.

[0114] (2)Prepare the electroplating solution for Comparative Example 4:

[0115] The steps for preparing the electroplating solution in Comparative Example 4 are the same as those in Example 1, except that the electrolyte additive obtained in Example 1 is replaced with the electrolyte additive of Comparative Example 4 (10 mmol).

[0116] Comparative Example 5:

[0117] (1)Select the electrolyte additive for Comparative Example 5:

[0118] Select butanetetracarboxylic acid as the electrolyte additive for Comparative Example 5.

[0119] (2) Prepare the electroplating solution for Comparative Example 5:

[0120] The steps for preparing the electroplating solution in Comparative Example 5 are the same as those in Example 1, except that the electrolyte additive obtained in Example 1 is replaced with the electrolyte additive (10 mmol) of Comparative Example 5.

[0121] Electroplating process:

[0122] Perform electroplating on the electrolytes obtained in Examples 1-5 and Comparative Examples 1-5. The electroplating conditions are: substrate: iron plate, current value: 2.5 A, current density: 4 A / dm 2 , temperature: 25 °C, current time: 20 min, to obtain the electroplated plates of Examples 1-5 and Comparative Examples 1-5.

[0123] Corrosion resistance test:

[0124] Place the electroplated plates of Examples 1-5 and Comparative Examples 1-5 in an aqueous sodium chloride solution at a temperature of 45 °C, adjust the pH to 6.5, and control the deposition rate of the salt mist to be about 2 ml / 80 cm ² .h, place for 2.5 h, and detect the corrosion degree of the electroplated plates. The test results are shown in Table 1.

[0125] Table 1:

[0126]

[0127] By comparing Examples 1-5 and Comparative Examples 1-5, it can be seen that the electrolyte additive provided by the present disclosure can not only act as a complexing agent, which can form coordination polymers with chromium ions and nickel ions, facilitating the precipitation of heavy metal ions and preventing the formation of piled-up hydroxy-bridged compounds; moreover, due to the presence of amino and amide groups in the molecular structure of the electrolyte additive, it can further contribute to the precipitation of heavy metal ions. In addition, by comparing Examples 1-5, it can be seen that in similar molecular structures, the position and number of amino groups also affect the effect of the electrolyte additive. When the amino group is in the ortho position (Example 3), its performance as an electrolyte additive is slightly worse because the ortho amino group will combine with the carboxylic acid of the electrolyte additive, making it unfavorable for complexing with heavy metal ions; while in Example 5, the amino group is not in the ortho position and the number of amino groups is more, so the performance is the best.

[0128] Other embodiments of the present disclosure will be readily apparent to those skilled in the art upon considering the specification and practice of the disclosure herein. The present disclosure is intended to cover any variations, uses, or adaptations of the present disclosure that follow the general principles of the present disclosure and include known common general knowledge or conventional technical means in the technical field not disclosed by the present disclosure.

Claims

1. A chromium-nickel alloy electroplating additive, characterized in that: The electroplating additive is selected from any one of the following organic compounds: 。 2. A chromium-nickel alloy electroplating solution, characterized in that: The electroplating solution comprises: water, chromium salt, nickel salt, conductive agent, surfactant, buffer, and the electroplating additive according to claim 1.

3. The electroplating solution according to claim 2, characterized in that In the electroplating solution, relative to 1000 parts by weight of water, the content of the chromium salt is 100-200 parts by weight, the content of the nickel salt is 40-100 parts by weight, the content of the conductive agent is 40-80 parts by weight, the content of the surfactant is 5-20 parts by weight, the content of the buffer is 10-50 parts by weight, and the content of the electroplating additive is 5-60 parts by weight.

4. The electroplating solution according to claim 3, characterized in that The chromium salt is selected from at least one of chromium nitrate, chromium chloride or chromium sulfate; the nickel salt is selected from at least one of nickel sulfate, nickel chloride, nickel acetate or nickel nitrate; the conductive agent is selected from at least one of ammonium chloride, sodium chloride or potassium chloride; the surfactant is selected from at least one of sodium dodecyl sulfate, hexadecyltrimethylammonium bromide, OP-10 or polyvinyl pyrrolidone; the buffer is selected from at least one of boric acid, tartaric acid or phosphoric acid.

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