Load lock chamber and semiconductor apparatus

Abstract

The embodiments of the present application provide a load lock chamber and a semiconductor device. The load lock chamber comprises a cavity, at least one gas filling port and a first chamber, the at least one gas filling port and the first chamber being in communication with each other; a first cover, the first cover covering the first chamber and being connected with the cavity, the first cover and the inner wall of the cavity jointly forming a first annular air channel and a first annular gap, the first annular air channel being in communication with the first chamber, the first annular air channel and the first annular gap being arranged along a first direction and being in communication with each other, the first annular air channel having a first communication port in communication with the gas filling port, and the first annular gap comprising a first width section and a second width section arranged in communication, the width of the first width section of the first annular gap being different from the width of the second width section of the first annular gap.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor equipment, in particular to a load lock chamber and semiconductor equipment. BACKGROUND

[0002] When the load lock chamber switches between the atmospheric environment and the low pressure environment (usually the vacuum environment), the uniformity of the inflating flow rate needs to be ensured to avoid causing the workpiece (for example, the wafer) to shake or move. To achieve this purpose, the load lock chamber usually needs to be configured with a diffuser to improve the uniformity of the inflating flow rate. However, sometimes due to the structure or limitation of the load lock chamber, the diffuser cannot be configured, resulting in non-uniform inflating flow rate, causing the workpiece to shake or move, and affecting the transmission accuracy of the workpiece. SUMMARY

[0003] The embodiments of the present application provide a load lock chamber and semiconductor equipment capable of improving the uniformity of the inflating flow rate.

[0004] In a first aspect, the embodiments of the present application provide a load lock chamber, comprising:

[0005] a cavity, provided with a first inflating port and a first chamber, the at least one inflating port and the first chamber being in communication with each other;

[0006] a first cover, covering the first chamber and connected with the cavity, the first cover and the inner wall of the cavity jointly forming a first annular air channel and a first annular gap, the first annular air channel being in communication with the first chamber, the first annular air channel and the first annular gap being arranged along a first direction and in communication with each other, the first annular gap including a first width section and a second width section arranged in communication, the width of the first width section of the first annular gap being different from the width of the second width section of the first annular gap.

[0007] Since the width of the first width section of the first annular gap is different from the width of the second width section of the first annular gap, the width of the first annular gap is non-uniform, which is conducive to adjusting the flow rate of the gas in the first annular gap, reducing the flow rate difference of the gas at different positions in the first annular gap, thereby improving the uniformity of the gas flow rate, and reducing the generation of vortex, thereby reducing the shaking and moving of the workpiece in the first chamber, and improving the transmission accuracy of the workpiece in the first chamber.

[0008] According to a possible implementation manner of the first aspect, the first annular air passage has a first communication port in communication with the at least one gas charging port, and a first width section of the first annular gap is arranged at a side of the first annular gap close to the first communication port, and a width of the first width section of the first annular gap is greater than a width of a second width section of the first annular gap.

[0009] Since the width of the first width section of the first annular gap is greater than the width of the second width section, the width of the first annular gap is non-uniform, and the first width section of the first annular gap with a greater width is arranged at a position of the first annular gap close to the at least one gas charging port, which is beneficial to slow down the gas flow rate entering the first annular gap, reduce the flow rate difference between the first width section and a side of the second width section away from the first width section, improve the uniformity of the gas flow rate, and reduce the generation of vortex, thereby reducing the shaking and movement of the workpiece in the first chamber and improving the transmission accuracy of the workpiece in the first chamber. Since the vortex in the first chamber is reduced, the attachment of contaminant particles to the workpiece in the first chamber is reduced, thereby improving the cleanliness of the workpiece in the first chamber.

[0010] According to a possible implementation manner of the first aspect, an inner wall of an end of the cavity close to the first cover body is provided with a first annular groove, and an inner wall of the first annular groove and the first cover body jointly form the first annular air passage.

[0011] According to a possible implementation manner of the first aspect, the cavity further includes a second chamber in communication with the at least one gas charging port, and the load lock chamber further includes a second cover body covering the second chamber and connected with the cavity, the second cover body and an inner wall of the cavity jointly form a second annular air passage and a second annular gap, the at least one gas charging port, the second annular air passage, the second annular gap and the second chamber are in communication with each other, the second annular air passage and the second annular gap are arranged along the first direction, and the second annular gap includes a first width section and a second width section arranged in communication, and a width of the first width section of the second annular gap is different from a width of the second width section of the second annular gap.

[0012] Since the width of the first width section of the second annular gap is different from the width of the second width section of the second annular gap, the width of the second annular gap is non-uniform, which is beneficial to adjust the flow rate of the gas in the second annular gap, reduce the flow rate difference of the gas at different positions in the second annular gap, improve the uniformity of the gas flow rate, reduce the generation of vortex, and reduce the shaking and movement of the workpiece in the second chamber, thereby improving the transmission accuracy of the workpiece in the second chamber.

[0013] The load lock chamber comprises a first chamber and a second chamber, which increases the number of workpieces that can be processed and improves the processing efficiency of the load lock chamber.

[0014] According to a possible implementation of the first aspect, the second annular gas channel has a second communication port in communication with the first gas filling port, and a first width section of the second annular gap is arranged on a side of the second annular gap close to the second communication port, and the first width section has a width greater than that of a second width section of the second annular gap.

[0015] The width of the second annular gap is non-uniform, and the first width section with a greater width is arranged at a position of the second annular gap close to the at least one gas filling port, which helps to slow down the flow rate of the gas entering the second annular gap, reduce the flow rate difference between the first width section and the second width section away from the first width section, improve the uniformity of the flow rate of the gas filling into the second chamber, and help to reduce the generation of vortexes, thereby helping to reduce the shaking and movement of the workpieces in the second chamber and improving the transmission accuracy of the workpieces in the second chamber. Due to the reduction of vortexes in the second chamber, the attachment of contaminant particles to the workpieces in the second chamber is reduced, thereby improving the cleanliness of the workpieces in the second chamber.

[0016] According to a possible implementation of the first aspect, the cavity further comprises a main body and a first partition accommodated in an inner cavity of the main body, the first chamber and the second chamber are arranged separately by the first partition, the first partition, the first cover body, and an inner wall of the main body jointly form the first annular gas channel and the first annular gap, and the first partition, the second cover body, and the inner wall of the main body jointly form the second annular gas channel and the second annular gap. The first chamber and the second chamber are separated by the first partition, which facilitates the manufacturing of the cavity.

[0017] According to a possible implementation of the first aspect, the first chamber and the second chamber are arranged in a second direction different from the first direction, the cavity further comprises a third chamber and a second partition, the second partition is accommodated in the main body, the second partition is connected with the inner wall of the main body and the first partition, the third chamber is separated from the first chamber by the second partition, the third chamber and the first chamber are arranged in the first direction, and the third chamber is in communication with the at least one gas filling port. The third chamber and the first chamber are separated by the second partition, which facilitates the manufacturing of the cavity while increasing the number of chambers.

[0018] In a possible implementation of the first aspect, the first partition, the second partition, and the inner wall of the main body jointly form a third annular air passage and a third annular gap, the first chamber, the third annular air passage, the third annular gap, and the third chamber are arranged in the first direction, the third annular gap includes a first width section and a second width section arranged in communication, the third annular gap includes a first width section and a second width section arranged in communication, and the width of the first width section of the third annular gap is different from the width of the second width section of the third annular gap.

[0019] The width of the third annular gap is non-uniform because the width of the first width section of the third annular gap is different from the width of the second width section of the third annular gap, which is conducive to adjusting the flow rate of the gas in the third annular gap, reducing the flow rate difference of the gas at different positions in the third annular gap, thereby improving the uniformity of the flow rate of the gas, and reducing the generation of vortexes, thereby reducing the shaking and movement of the workpiece in the third chamber and improving the transmission accuracy of the workpiece in the third chamber.

[0020] In a possible implementation of the first aspect, the first width section of the third annular gap is arranged on a side of the third annular gap close to the at least one gas charging port, and the width of the first width section of the third annular gap is greater than the width of the second width section of the third annular gap.

[0021] The width of the third annular gap is non-uniform because the width of the first width section of the third annular gap is greater than the width of the second width section of the third annular gap, and the first width section with a greater width is arranged at a position of the third annular gap close to the at least one gas charging port, which is conducive to slowing down the flow rate of the gas just entering the third annular gap, reducing the flow rate difference of the gas between the first width section and the side of the second width section away from the first width section of the third annular gap, improving the uniformity of the flow rate of the gas charged into the third chamber, reducing the generation of vortexes, thereby reducing the shaking and movement of the workpiece in the third chamber and improving the transmission accuracy of the workpiece in the third chamber. The reduction of vortexes in the third chamber is conducive to reducing the attachment of contaminant particles to the workpiece in the third chamber, thereby improving the cleanliness of the workpiece in the third chamber.

[0022] In a possible implementation of the first aspect, the cavity further includes a fourth chamber and a third partition, the third partition is connected with the inner wall of the main body, the third partition is connected with the first partition, the second chamber and the fourth chamber are separated by the third partition, the second chamber and the fourth chamber are arranged in the first direction, the third chamber and the fourth chamber are arranged in the second direction, and the fourth chamber is in communication with the at least one gas charging port.

[0023] The load lock chamber comprises a first chamber, a second chamber, a third chamber and a fourth chamber, so that the load lock chamber is a double-layer four-chamber structure, which is beneficial to reduce the length of the load lock chamber while increasing the number of chambers.

[0024] According to the first aspect, in a possible implementation manner of the present application, the third partition, the first partition and the inner wall of the main body jointly form a fourth annular air channel and a fourth annular gap, the second chamber, the fourth annular air channel, the fourth annular gap and the fourth chamber are arranged in a first direction, the fourth annular air channel is in communication with the at least one inflation port, the fourth annular gap comprises a first width section and a second width section arranged in communication, the first width section of the fourth annular gap is arranged on a side of the fourth annular gap close to the at least one inflation port, and the width of the first width section of the fourth annular gap is greater than the width of the second width section of the fourth annular gap.

[0025] Since the width of the first width section of the fourth annular gap is greater than the width of the second width section, the width of the fourth annular gap is non-uniform, and the first width section with a greater width is arranged at a position of the fourth annular gap close to the at least one inflation port, which is beneficial to slow down the flow rate of the gas just entering the fourth annular gap, reduce the flow rate difference between the first width section and the second width section away from the first width section, improve the uniformity of the flow rate of the gas inflating the fourth chamber, and reduce the generation of vortex, thereby reducing the shaking and movement of the workpiece in the fourth chamber and improving the transmission accuracy of the workpiece in the fourth chamber. Since the vortex in the fourth chamber is reduced, it is beneficial to reduce the attachment of contaminant particles on the workpiece in the fourth chamber, thereby improving the cleanliness of the workpiece in the fourth chamber.

[0026] According to the first aspect, in a possible implementation manner of the present application, the load lock chamber further comprises a processing component arranged in the cavity, and the processing component comprises a preheating disc and / or a cooling disc. The preheating disc can perform preheating treatment on the workpiece in the chamber to preheat the temperature of the workpiece to a required temperature. The cooling disc can perform cooling treatment on the workpiece in the chamber.

[0027] According to the first aspect, in a possible implementation manner of the present application, the load lock chamber further comprises a first gas extraction port arranged on the cavity, and the first gas extraction port is in communication with the first chamber. The first gas extraction port is used to be connected with a gas extraction device.

[0028] In the second aspect, the embodiments of the present application provide a semiconductor device, comprising a processing chamber, a transmission chamber and a load lock chamber according to the first aspect, and the transmission chamber is connected between the processing chamber and the load lock chamber. BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 This is a schematic diagram of the structure of a semiconductor device provided in one embodiment of this application;

[0030] Figure 2 This is a three-dimensional assembly schematic diagram of the load locking chamber provided in one embodiment of this application;

[0031] Figure 3 It is along Figure 2 The cross-sectional view obtained by line II shown;

[0032] Figure 4 yes Figure 2 A top view of the load-locking chamber shown;

[0033] Figure 5a yes Figure 2 The bottom view of the load-locking chamber shown;

[0034] Figure 5b It is along Figure 5a The sectional view obtained by line II-II;

[0035] Figure 6a yes Figure 3 An enlarged schematic diagram of region A;

[0036] Figure 6b This is a planar schematic diagram of the first annular gap;

[0037] Figure 6c yes Figure 6a An enlarged schematic diagram of region C;

[0038] Figure 7 yes Figure 3 An enlarged schematic diagram of region B;

[0039] Figure 8 yes Figure 6a An enlarged schematic diagram of region D;

[0040] Figure 9 This is a cross-sectional view of the load locking chamber provided in one embodiment of this application.

[0041] Explanation of reference numerals in the attached figures:

[0042] 10-Cavity; 12-Main body; 14-Separating components;

[0043] 100 - Front-end module; 101 - Chamber; 103 - Inflation port; 105 - Ejection port; 122 - First part; 124 - Second part; 126 - ...

[0044] Two protrusions; 142 - First partition; 144 - Second partition; 146 - Third partition;

[0045] 1000 - semiconductor equipment; 1010 - transfer port; 1011 - first chamber; 1012 - second chamber; 1013 - third chamber; 1014 - fourth chamber; 1031 - first gas filling port; 1033 - second gas filling port; 1422 - base; 1424 - first protrusion; 1442 - first connecting portion; 1444 - second connecting portion;

[0046] 200 - load lock chamber;

[0047] 30 - cover; 31 - first cover; 32 - second cover; 33 - third cover; 34 - fourth cover;

[0048] 300 - transfer chamber;

[0049] 50 - gate valve;

[0050] 61 - first annular air passage; 62 - first annular gap; 63 - second annular air passage; 64 - second annular gap; 65 - third annular air passage; 66 - third annular gap; 67 - fourth annular air passage; 68 - fourth annular gap;

[0051] 600 - pumping device; 611 - first communication port; 621 - first width section; 623 - second width section; 631 - second communication port; 641 - first width section; 643 - second width section; 661 - first width section; 663 - second width section; 681 - first width section; 683 - second width section;

[0052] 500 - processing chamber;

[0053] 70 - processing component;

[0054] 80 - support frame;

[0055] 800 - workpiece. DETAILED DESCRIPTION

[0056] Reference will now be made to Figure 1 , Figure 1 is a structural schematic diagram of a semiconductor equipment provided by an embodiment of the present application. A semiconductor equipment 1000 includes a front end module 100, a load lock chamber 200, a transfer chamber 300, and a plurality of processing chambers 500.

[0057] The front end module 100 can interact with parts of other external facilities or equipment. The front end module 100 has a front end robot, which is used to deliver a workpiece 800 into the load lock chamber 200.

[0058] The load lock chamber 200 is coupled to the transfer chamber 300, and the load lock chamber 200 is coupled to a plurality of processing chambers 500. It is understood that the number of processing chambers 500 can also be one or two. A vacuum valve is provided between the transfer chamber 300 and the processing chamber 500. The load lock chamber 200 is used to receive an unprocessed (inbound) workpiece 800 from the front end module 100 to be transferred to the processing chamber 500, and to receive a processed workpiece 800 from the processing chamber 500 to be transferred back to the front end module 100. After the workpiece 800 is processed in the load lock chamber 200, the workpiece 800 enters the transfer chamber 300. In the present embodiment, the workpiece 800 is a wafer. It is understood that the workpiece 800 can also be other types of workpieces. The load lock chamber 200 is connected to a gas filling device. The gas filling device is used to fill gas into the load lock chamber 200 to change the environment in the load lock chamber 200, for example, to switch the load lock chamber 200 from a vacuum environment to an atmospheric environment. The load lock chamber 200 is connected to a gas extraction device. The gas extraction device is used to extract gas from the load lock chamber 200 to change the environment in the load lock chamber 200, for example, to switch the load lock chamber 200 from an atmospheric environment to a vacuum environment. The gas filling device can be a gas pump, and the gas extraction device can be a vacuum pump. It is understood that in some embodiments, the gas filling device and the gas extraction device can be provided on the same device.

[0059] The transfer chamber 300 is usually provided with a transfer robot (not shown in the figure), and the transfer robot is used to transfer the workpiece 800 between the transfer chamber 300 and the processing chamber 500. In the present embodiment, the front end module 100 is usually in an atmospheric pressure environment, and the transfer chamber 300 and the processing chamber 500 are usually maintained in a vacuum environment.

[0060] It is understood that in some embodiments, the front end module 100, the gas filling device, and the gas extraction device can be omitted.

[0061] Please refer to Figure 2 , Figure 2 is a perspective assembly view of a load lock chamber provided by an embodiment of the present application. The load lock chamber 200 includes a cavity 10, a plurality of cover bodies 30, and a plurality of door valves 50.

[0062] Please refer to Figure 2 and Figure 3 , Figure 3 is a cross-sectional view taken along the line I-I shown in Figure 2 . The cavity 10 is provided with a plurality of chambers 101 and at least one gas filling port 103. Each cover body 30 is sealingly covered on one chamber 101 to close the chamber 101. The gas filling port 103 is connected to the gas filling device through a pipeline. Figure 2 and Figure 3 The load lock chamber shown in the example is a symmetrical structure or a symmetrical integrated structure. It is understood that the present application does not limit the load lock chamber to be a symmetrical structure.

[0063] The plurality of chambers 101 are used to carry and process the workpieces 800. Each chamber 101 is provided with a set of transfer ports 1010. Each set of transfer ports 1010 includes two transfer ports 1010. One of the transfer ports 1010 in each set of transfer ports 1010 is coupled to the front end module 100 to receive the unprocessed workpieces 800 transferred from the front end module 100 or to transfer the processed workpieces 800 processed by the processing chamber 500 from the chamber 101 to the front end module 100. The other transfer port 1010 in each set of transfer ports 1010 is coupled to the transfer chamber 300 to transfer the unprocessed workpieces 800 from the chamber 101 to the transfer chamber 300 or to receive the processed workpieces 800 processed by the processing chamber 500 transferred from the transfer chamber 300. Each door valve 50 is provided on the cavity 10 corresponding to one of the transfer ports 1010 to control the opening and closing of the corresponding transfer port 1010. When the transfer port 1010 is opened, the workpieces 800 can enter or exit the chamber 101 through the transfer port 1010. The door valve 50 is an atmospheric door valve. It can be understood that the door valve 50 can also be a gate valve, a sliding door, a rotary door, etc. The structure of the door valve 50 is not limited in the present application.

[0064] Please refer to Figure 4 , Figure 4 is Figure 2 the top view of the load lock chamber. The inflation port 103 is provided on the cavity 10 to inflate the plurality of chambers 101 to switch the corresponding chamber 101 from a vacuum environment to an atmospheric environment. In the present embodiment, the number of inflation ports 103 is two, and the inflation ports 103 are provided on the top surface of the cavity 10. It can be understood that the number of inflation ports 103 can also be one or more.

[0065] Please refer to Figure 5a and Figure 5b , Figure 5a is Figure 2 the bottom view of the load lock chamber, Figure 5b is the cross-sectional view along the line II-II of Figure 5a . The cavity 10 is also provided with at least one exhaust port 105 for extracting gas in the plurality of chambers 101 to switch the chamber 101 from an atmospheric environment to a vacuum environment. In the present embodiment, the number of exhaust ports 105 is two, and the exhaust ports 105 are provided on the bottom surface of the cavity 10. The exhaust port 105 is connected to the exhaust device through a pipeline. It can be understood that the number of exhaust ports 105 can also be one or more.

[0066] Please refer to Figure 2 and Figure 3The plurality of chambers 101 includes a first chamber 1011, a second chamber 1012, a third chamber 1013, and a fourth chamber 1014. The plurality of covers 30 includes a first cover 31, a second cover 32, a third cover 33, and a fourth cover 34. The first cover 31 is sealingly covered on the first chamber 1011, the second cover 32 is sealingly covered on the second chamber 1012, the third cover 33 is sealingly covered on the third chamber 1013, and the fourth cover 34 is sealingly covered on the fourth chamber 1014. The first cover 31 and the second cover 32 are located on the side where the top surface of the cavity 10 is located, and the third cover 33 and the fourth cover 34 are located on the side where the bottom surface of the cavity 10 is located. It can be understood that the third cover 33 and the fourth cover 34 can be omitted.

[0067] In the embodiment, the first chamber 1011 and the third chamber 1013 are arranged along a first direction, the first chamber 1011 and the second chamber 1012 are arranged along a second direction, the second chamber 1012 and the fourth chamber 1014 are arranged along the first direction, and the third chamber 1013 and the fourth chamber 1014 are arranged along the second direction. The first direction can be the X direction as shown in Figure 3 , Figure 3 the second direction can be the Y direction as shown in Figure 2 , Figure 3 and Figure 4 The number of the inflation ports 103 is two, the two inflation ports 103 include a first inflation port 1031 and a second inflation port 1033, the first inflation port 1031 is in communication with the first chamber 1011 and the second chamber 1012 (as shown in Figure 3 ), and the second inflation port 1033 is in communication with the third chamber 1013 and the fourth chamber 1014. The number of the exhaust ports 105 is two, the first exhaust port 105 is in communication with the first chamber 1011 and the second chamber 1012 (as shown in Figure 5b ), and the second exhaust port 105 is in communication with the third chamber 1013 and the fourth chamber 1014. In this way, the first chamber 1011 and the second chamber 1012 can be inflated through the same inflation port 103, the first chamber 1011 and the second chamber 1012 can be exhausted through the same exhaust port 105, the third chamber 1013 and the fourth chamber 1014 can be inflated through the same inflation port 103, and the third chamber 1013 and the fourth chamber 1014 can be exhausted through the same exhaust port 105.

[0068] It can be understood that, in some possible implementation manners of the present application, the first inflation port 1031 of the two inflation ports 103 is in communication with the first chamber 1011 and the third chamber 1013, and the second inflation port 1033 is in communication with the second chamber 1012 and the fourth chamber 1014; one of the two exhaust ports 105 is in communication with the first chamber 1011 and the third chamber 1013, and the other of the two exhaust ports 105 is in communication with the second chamber 1012 and the fourth chamber 1014. It can be understood that each chamber 101 can be equipped with one inflation port 103 to improve the inflation efficiency of the inflation device for each chamber 101; and each chamber 101 can be equipped with one exhaust port 105 to improve the exhaust efficiency of the exhaust device for each chamber 101.

[0069] In the embodiment, the cavity 10 includes a main body 12 and a partition component 14 accommodated in the main body 12. The partition component 14 includes a first partition 142, a second partition 144 and a third partition 146. The first partition 142 divides the main body 12 into a first part 122 and a second part 124 along a second direction.

[0070] The first inflation port 1031 and the second inflation port 1033 are arranged on the main body 12 and the first partition 142, and the exhaust port 105 is arranged on the main body 12 and the first partition 142. The second partition 144 is accommodated in the first part 122, and the second partition 144 is connected with the main body 12 and the first partition 142, so as to divide the first part 122 into the first chamber 1011 and the third chamber 1013. The second partition 144 is located between the first cover 31 and the third cover 33 in the first direction. The third partition 146 is accommodated in the second part 124, and the third partition 146 is connected with the main body 12 and the first partition 142, so as to divide the second part 124 into the second chamber 1012 and the fourth chamber 1014. The third partition 146 is located between the second cover 32 and the fourth cover 34 in the first direction. It can be understood that the present application does not limit the positions of the inflation ports 103 and the exhaust ports 105.

[0071] In the embodiment, the first partition 142 includes a base body 1422 and a first protruding part 1424 protruding from the base body 1422, and the first protruding part 1424 is used for connecting with the second partition 144 and the third partition 146. A second protruding part 126 corresponding to the first protruding part 1424 is arranged on the inner wall of the main body 12.

[0072] The second partition 144 and the third partition 146 each include a first connecting portion 1442 and a second connecting portion 1444 protruding from a side of the first connecting portion 1442 away from the first cover 31. The first connecting portion 1442 of the second partition 144 abuts against the first protruding portion 1424, and the first connecting portion 1442 of the third partition 146 abuts against the second protruding portion 126.

[0073] The first protruding portion 1424 of the second partition 144 and the second protruding portion 126 can cooperate with each other to position the second partition 144 when the second partition 144 is installed on the first partition 142 and the main body 12. The first protruding portion 1424 of the third partition 146 and the second protruding portion 126 can cooperate with each other to position the third partition 146 when the third partition 146 is installed on the first partition 142 and the main body 12, facilitating assembly of the load lock chamber 200. It should be understood that the present application does not limit the structure of the first partition 142, the second partition 144, the third partition 146, and the main body 12, nor the connection manner of the first partition 142 and the second partition 144 and the main body 12, nor the connection manner of the first partition 142 and the third partition 146 and the main body 12.

[0074] The load lock chamber 200 further includes a processing component 70 disposed in the cavity 10. In the present embodiment, the processing component 70 is a preheating disc for preheating the workpiece 800 in the cavity 10 to a desired temperature. The number of the processing component 70 can be two, and one processing component 70 is located in the third chamber 1013. The processing component 70 can also be a cooling disc for cooling the cavity 10. It should be understood that, in some embodiments, the processing component 70 includes a preheating disc and / or a cooling disc. It should be understood that the present application does not limit the number of the processing component 70, which can be one or more.

[0075] Please refer to Figure 6a , Figure 6a is Figure 3 the enlarged view of the area A of Figure 6a 、 Figure 6b and Figure 6c , Figure 6bis a plan view of the first annular gap, the first annular gap 62 comprises a first width section 621 and a second width section 623 arranged in communication, Figure 6c is an enlarged view of the region C of Figure 6a , the width of the first width section 621 is different from the width of the second width section 623. That is, the first annular gap 62 is a non-uniform width gap. In the embodiment, the first width section 621 is arranged at one side of the first annular gap 62 close to the first communication port 611, the first width section 621 and the first communication port 611 are arranged in the first direction, and the width of the first width section 621 is greater than the width of the second width section 623. The width of the first annular gap 62 refers to the radial width of the first annular gap 62. Figure 6b The shape of the first annular gap 62 of

[0076] In the embodiment, the inner wall of the base body 1422 and the main body 12 is provided with a first groove, the first groove on the inner wall of the base body 1422 and the main body 12 forms a first annular groove, and the inner wall of the first annular groove and the first cover body 31 jointly form the first annular air channel 61. The base body 1422, the main body 12 and the first cover body 31 jointly form the first annular gap 62.

[0077] The gas input from the first gas filling port 1031 enters the first annular air channel 61 through the first communication port 611. The gas entering the first annular air channel 61 flows circumferentially, and the gas in the first annular air channel 61 generates radial flow and up-down flow in the first direction through the first annular gap 62, thereby achieving filling of the gas into the first chamber 1011.

[0078] If the annular gap is a uniform width annular gap, when the gas flows from the gas filling port, the flow rate of the gas in the part of the annular gap close to the gas filling port will be much greater than the flow rate in the part of the annular gap away from the gas filling port. If the flow rate of the gas in the annular gap differs greatly, vortex flow is easily caused, which causes the workpiece in the chamber to vibrate or displace, and also can cause the contamination particles in the chamber to fall on the workpiece and contaminate the workpiece.

[0079] The first width section 621 has a width different from that of the second width section 623, so that the width of the first annular gap 62 is non-uniform, which is conducive to adjusting the flow rate of the gas in the first annular gap 62, reducing the flow rate difference of the gas at different positions in the first annular gap 62, thereby improving the uniformity of the flow rate of the gas, which is conducive to reducing the generation of eddy current, thereby reducing the shaking and movement of the workpiece 800 in the first chamber 1011, and improving the transmission accuracy of the workpiece 800 in the first chamber 1011. Since the first width section 621 has a greater width than the second width section 623, and the first width section 621 with a greater width is arranged at a position of the first annular gap 62 close to the first gas charging port 1031, it is conducive to slowing down the flow rate of the gas just entering the first annular gap 62, reducing the flow rate difference between the first width section 621 and the side of the second width section 623 away from the first width section 621, improving the uniformity of the flow rate of the gas, which is conducive to reducing the generation of eddy current, thereby reducing the shaking and movement of the workpiece 800 in the first chamber 1011, and improving the transmission accuracy of the workpiece 800 in the first chamber 1011. Since the eddy current in the first chamber 1011 is reduced, it is conducive to reducing the attachment of contaminant particles on the workpiece 800 in the first chamber 1011, thereby improving the cleanliness of the workpiece 800 in the first chamber 1011.

[0080] Please refer to Figure 7 , Figure 7 is Figure 3 an enlarged schematic view of the area B of FIG. 10, and the second cover 32 and the inner wall of the cavity 10 jointly form a second annular air channel 63 and a second annular gap 64. The second annular air channel 63, the second annular gap 64 and the second chamber 1012 are in communication with each other. The second annular air channel 63 and the second annular gap 64 are arranged along the first direction. The second annular air channel 63 has a second communication port 631 in communication with the first gas charging port 1031, and the second annular gap 64 includes a first width section 641 and a second width section 643 arranged in communication. The width of the first width section 641 is different from that of the second width section 643. The first width section 641 is arranged at one side of the second annular gap 64 close to the second communication port 631. In this embodiment, the first width section 641 of the second annular gap 64 and the second communication port 631 are arranged along the first direction, and the width of the first width section 641 is greater than that of the second width section 643.

[0081] In this embodiment, the inner wall of the base 1422 and the main body 12 is provided with a second groove, and the first groove on the inner wall of the base 1422 and the main body 12 forms a second annular groove, and the inner wall of the second annular groove and the second cover 32 jointly form the second annular air channel 63. The base 1422, the main body 12 and the second cover 32 jointly form the second annular gap 64.

[0082] In this embodiment, the gas input from the first gas inlet port 1031 enters the second annular gas passage 63 through the second communication port 631. The gas entering the second annular gas passage 63 flows circumferentially, and the gas in the second annular gas passage 63 generates radial flow through the second annular gap 64 and up-and-down flow in the first direction, thereby achieving the charging of the gas into the second chamber 1012.

[0083] Since the width of the first width section 641 is different from the width of the second width section 643, the width of the second annular gap 64 is non-uniform, which is conducive to adjusting the flow rate of the gas in the second annular gap 64 and reducing the difference in the flow rate of the gas at different positions in the second annular gap 64. Since the width of the first width section 641 is greater than the width of the second width section 643, the width of the second annular gap 64 is non-uniform, and the first width section 641 with a greater width is arranged at a position of the second annular gap 64 close to the first gas inlet port 1031, which is conducive to slowing down the flow rate of the gas just entering the second annular gap 64, reducing the difference in the flow rate of the gas between the first width section 641 and the side of the second width section 643 away from the first width section 641, improving the uniformity of the flow rate of the gas charged into the second chamber 1012, and reducing the generation of vortex, thereby reducing the shaking and movement of the workpiece 800 in the second chamber 1012 and improving the transmission accuracy of the workpiece 800 in the second chamber 1012. Since the vortex in the second chamber 1012 is reduced, it is conducive to reducing the attachment of contaminant particles to the workpiece 800 in the second chamber 1012, thereby improving the cleanliness of the workpiece 800 in the second chamber 1012.

[0084] Please refer again to Figure 6a , the first partition 142, the second partition 144, and the inner wall of the main body 12 jointly form the third annular gas passage 65 and the third annular gap 66, and the first chamber 1011, the third annular gas passage 65, the third annular gap 66, and the third chamber 1013 are arranged in the first direction. Please refer to Figure 6a and Figure 8 , Figure 8 is Figure 6a , the third annular gap 66 includes a first width section 661 and a second width section 663 arranged in communication, and the width of the first width section 661 is different from the width of the second width section 663. The first width section 661 of the third annular gap 66 is arranged at a side of the third annular gap 66 close to the second gas inlet port 1033, and the width of the first width section 661 of the third annular gap 66 is greater than the width of the second width section 663 of the third annular gap 66.

[0085] In the embodiment, the third recess is arranged on the first protruding part 1424 and the second protruding part 126, and the third recess on the first protruding part 1424 and the second protruding part 126 forms a third annular groove, and the inner wall of the third annular groove and the second partition 144 jointly form a third annular air channel 65. The first protruding part 1424, the second protruding part 126 and the second partition 144 jointly form a third annular gap 66.

[0086] In the embodiment, the gas enters the third annular air channel 65 through the second gas filling port 1033. The gas in the third annular air channel 65 flows circumferentially, and the gas in the third annular air channel 65 flows radially through the third annular gap 66 and flows up and down in the first direction, so as to fill the gas into the third chamber 1013.

[0087] Since the width of the first width section 661 is different from the width of the second width section 663, the width of the third annular gap 66 is non-uniform, which is conducive to adjusting the flow rate of the gas in the third annular gap 66 and reducing the difference in the flow rate of the gas at different positions in the third annular gap 66. Since the width of the first width section 661 of the third annular gap 66 is greater than the width of the second width section 663, the width of the third annular gap 66 is non-uniform, and the first width section 661 with a greater width is arranged at a position of the third annular gap 66 close to the second gas filling port 1033, which is conducive to slowing down the flow rate of the gas just entering the third annular gap 66, reducing the flow rate difference between the first width section 661 and the second width section 663 of the third annular gap 66 away from the first width section 661, improving the uniformity of the flow rate of the gas filled into the third chamber 1013, and reducing the generation of vortex, thereby reducing the shaking and movement of the workpiece 800 in the third chamber 1013 and improving the transmission accuracy of the workpiece 800 in the third chamber 1013. Since the vortex in the third chamber 1013 is reduced, it is conducive to reducing the attachment of pollution particles on the workpiece 800 in the third chamber 1013, thereby improving the cleanliness of the workpiece 800 in the third chamber 1013.

[0088] Please refer to Figure 7The first partition 142, the third partition 146, and the inner wall of the main body 12 jointly form a fourth annular air passage 67 and a fourth annular gap 68. The second chamber 1012, the fourth annular air passage 67, the fourth annular gap 68, and the fourth chamber 1014 are arranged in the first direction. The fourth annular air passage 67 is in communication with the second gas charging port 1033. The fourth annular gap 68 includes a first width section 681 and a second width section 683 which are arranged in communication. The width of the first width section 681 is different from the width of the second width section 683. In this embodiment, the first width section 681 of the fourth annular gap 68 is arranged on the side of the fourth annular gap 68 close to the second gas charging port 1033. The width of the first width section 681 of the fourth annular gap 68 is greater than the width of the second width section 683 of the fourth annular gap 68.

[0089] In this embodiment, the first protruding portion 1424 and the second protruding portion 126 are provided with fourth grooves. The fourth grooves on the first protruding portion 1424 and the second protruding portion 126 form a fourth annular groove. The inner wall of the fourth annular groove and the second partition 144 jointly form the fourth annular air passage 67. The first protruding portion 1424, the second protruding portion 126, and the second partition 144 jointly form the fourth annular gap 68.

[0090] In this embodiment, the gas enters the fourth annular air passage 67 through the second gas charging port 1033. The gas in the fourth annular air passage 67 flows circumferentially, and the gas in the fourth annular air passage 67 generates radial flow and up-and-down flow in the first direction through the fourth annular gap 68, thereby achieving the charging of the gas into the fourth chamber 1014.

[0091] Since the width of the first width section 681 is different from the width of the second width section 683, the width of the fourth annular gap 68 is non-uniform, which is conducive to adjusting the flow rate of the gas in the fourth annular gap 68 and reducing the difference in the flow rate of the gas at different positions in the fourth annular gap 68. Since the width of the first width section 681 of the fourth annular gap 68 is greater than the width of the second width section 683, the width of the fourth annular gap 68 is non-uniform, and the first width section 681 with a greater width is arranged at a position of the fourth annular gap 68 close to the second gas filling port 1033, which is conducive to slowing down the flow rate of the gas just entering the fourth annular gap 68, reducing the difference in the flow rate of the gas between the first width section 681 and the side of the second width section 683 away from the first width section 681, improving the uniformity of the flow rate of the gas filled into the fourth chamber 1014, and reducing the generation of vortexes, thereby reducing the shaking and movement of the workpiece 800 in the fourth chamber 1014 and improving the transmission accuracy of the workpiece 800 in the fourth chamber 1014. Since the vortexes in the fourth chamber 1014 are reduced, it is conducive to reducing the attachment of contaminant particles to the workpiece 800 in the fourth chamber 1014, thereby improving the cleanliness of the workpiece 800 in the fourth chamber 1014.

[0092] It can be understood that the first annular groove can be formed on the first cover body 31. The second annular groove can be formed on the second cover body 32, the third annular groove can be formed on the second partition 144, and the fourth annular groove can be formed on the third partition 146.

[0093] In some possible embodiments of the present application, the first chamber 1011 and the second chamber 1012 are isolated from each other, and the first chamber 1011 and the fourth chamber 1014 are isolated from each other, so as to avoid cross infection between the first chamber 1011 and the second chamber 1012, and avoid cross infection between the first chamber 1011 and the fourth chamber 1014. The third chamber 1013 and the second chamber 1012 are isolated from each other, and the third chamber 1013 and the fourth chamber 1014 are isolated from each other, so as to avoid cross infection between the third chamber 1013 and the second chamber 1012, and avoid cross infection between the third chamber 1013 and the fourth chamber 1014. The first chamber 1011 is in communication with the third chamber 1013, and the first chamber 1011 is in communication with the first aeration port 1031. The first aeration port 1031 is connected to an aeration device through a pipeline, so as to aerate the first chamber 1011 and the third chamber 1013. The third chamber 1013 is connected to the first exhaust port 105 through a pipeline, and the first exhaust port 105 is in communication with the exhaust device 600, so as to exhaust the first chamber 1011 and the third chamber 1013. The second chamber 1012 is in communication with the fourth chamber 1014, and the second chamber 1012 is in communication with the second aeration port 1033. The second aeration port 1033 is used to be connected to an aeration device through a pipeline, so as to aerate the second chamber 1012 and the fourth chamber 1014. The second exhaust port 105 is connected to the exhaust device 600 through a pipeline, so as to exhaust the second chamber 1012 and the fourth chamber 1014. The main body 12 is divided into the first part 122 and the second part 124 which are isolated from each other by the first partition 142. The first part 122 is divided into the first chamber 1011 and the third chamber 1013 which are in communication with each other by the second partition 144. The second part 124 is divided into the second chamber 1012 and the fourth chamber 1014 which are in communication with each other by the third partition 146. The first part 122 and the second part 124 can be independently operated, for example, aeration operation or exhaust operation. The first chamber 1011 and the third chamber 1013 in the first part 122 can be aerated at the same time, and the first chamber 1011 and the third chamber 1013 in the first part 122 can be exhausted at the same time. The second chamber 1012 and the fourth chamber 1014 in the second part 124 can be aerated at the same time, and the second chamber 1012 and the fourth chamber 1014 in the second part 124 can be exhausted at the same time. In this way, the number of aeration pipelines and exhaust pipelines is reduced while the number of chambers 101 is increased, which is conducive to simplifying the structure of the semiconductor device 1000.

[0094] In some possible embodiments of the present application, at least one aeration port and at least one exhaust port are arranged in each of the first chamber 1011, the second chamber 1012, the third chamber 1013 and the fourth chamber 1014, so as to make the plurality of chambers 101 independent of each other in the environment, avoid cross infection, and improve the cleanliness of the workpiece 800.

[0095] In some possible embodiments of the present application, the plurality of chambers 101 can share the same gas filling port 103, and the plurality of chambers 101 can share the same gas exhausting port 105.

[0096] In some embodiments of the present application, the number of chambers 101 in the load lock chamber 200 can be one, i.e. the load lock chamber 200 is a single chamber, please refer to Figure 9 The load lock chamber 200 includes a cavity 10 and a first cover 31. The cavity 10 is provided with a gas filling port 103 and a first chamber 1011. The gas filling port 103 and the first chamber 1011 are in communication with each other. The first cover 31 covers the first chamber 1011 and is connected with the cavity 10. The first cover 31 and the inner wall of the cavity 10 jointly form a first annular air passage 61 and a first annular gap 62. The first annular air passage 61 is in communication with the first chamber 1011. The first annular air passage 61 and the first annular gap 62 are arranged along the first direction and are in communication with each other. The first annular air passage 61 has a first communication port 611 in communication with the gas filling port 103. The first annular gap 62 includes a first width section 621 and a second width section 623 arranged in communication. The width of the first width section 621 is different from the width of the second width section 623.

[0097] The first width section 621 is arranged at one side of the first annular gap 62 close to the first communication port 611. The first width section 621 of the first annular gap 62 and the first communication port 611 are arranged along the first direction. The width of the first width section 621 of the first annular gap 62 is greater than the width of the second width section 623 of the first annular gap 62.

[0098] When the gas is filled, the gas can form a circumferential flow through the first annular air passage 61. The gas flowing in the first annular air passage 61 can generate up and down flows in the radial direction and the first direction through the first annular gap 62, as Figure 9 Exemplary arrows represent gas flow.

[0099] The load lock chamber 200 is further provided with a support frame 80 in the first chamber 101 for supporting a workpiece 800.

[0100] It should be understood that expressions such as "include" and "may include" used in the present application represent the existence of disclosed functions, operations or constituent elements, and do not limit one or more additional functions, operations and constituent elements. In the present application, terms such as "include" and / or "have" can be interpreted to mean that specific features, numbers, operations, constituent elements, components or combinations thereof are present, but cannot be interpreted to exclude the presence or addition of one or more other features, numbers, operations, constituent elements, components or combinations thereof.

[0101] Furthermore, in the present application, the expression "and / or" includes any and all combinations of the associated listed items. For example, the expression "A and / or B" can include A, can include B, or can include both A and B.

[0102] In the present application, expressions including ordinal numbers such as "first" and "second" can modify various elements. However, such elements are not limited by the above expressions. For example, the above expressions do not limit the sequence and / or importance of the elements. The above expressions are used merely to distinguish an element from other elements. For example, a first user device and a second user device indicate different user devices, although both the first user device and the second user device are user devices. Similarly, a first element can be termed a second element, and likewise, a second element can be termed a first element without departing from the scope of the present application.

[0103] When a component is referred to as being "connected" or "accessed" to another component, it should be understood that another component can be present in between the component and the other component. On the other hand, when a component is referred to as being "directly connected" or "directly accessed" to another component, it should be understood that there is no component present in between the component and the other component.

[0104] The above description is merely illustrative of the application and is not intended to limit the scope of the application. Any changes and modifications that can come within the scope of the present application will be readily understood by those skilled in the art, and it is intended to embrace all such changes and modifications. The scope of the application should, therefore, be determined not with reference to the above description, but instead with reference to the appended claims.

Claims

1. A load lock chamber, characterized by, The utility model relates to a load lock chamber, comprising: a cavity provided with at least one gas filling port and a first chamber, the at least one gas filling port and the first chamber being in communication with each other; a first cover body covering the first chamber and connected to the cavity, the first cover body and the inner wall of the cavity jointly forming a first annular air channel and a first annular gap, the first annular air channel being in communication with the first chamber, the first annular air channel and the first annular gap being arranged along a first direction and in communication with each other, the first annular gap comprising a first width section and a second width section arranged in communication; the first annular air channel has a first communication port in communication with the at least one gas filling port, the first width section of the first annular gap being arranged on the side of the first annular gap close to the first communication port, and the second width section of the first annular gap being arranged on the side of the first annular gap away from the first communication port; the width of the first width section of the first annular gap is greater than the width of the second width section of the first annular gap; gas can enter the first annular air channel through the gas filling port and the first communication port, and then enter the first chamber through the first annular air channel, the first width section of the first annular gap, and the second width section of the first annular gap.

2. The load lock chamber of claim 1, wherein, The inner wall of the cavity close to one end of the first cover body is provided with a first annular groove, and the inner wall of the first annular groove and the first cover body jointly form the first annular air channel.

3. The load lock chamber of claim 1, wherein, The cavity further comprises a second chamber in communication with the at least one gas filling port, the load lock chamber further comprises a second cover body covering the second chamber and connected to the cavity, the second cover body and the inner wall of the cavity jointly forming a second annular air channel and a second annular gap, the at least one gas filling port, the second annular air channel, the second annular gap, and the second chamber being in communication with each other, the second annular air channel and the second annular gap being arranged along the first direction, the second annular gap comprising a first width section and a second width section arranged in communication, and the width of the first width section of the second annular gap being different from the width of the second width section of the second annular gap.

4. The load lock chamber of claim 3, wherein, The second annular air channel has a second communication port in communication with the at least one gas filling port, the first width section of the second annular gap being arranged on the side of the second annular gap close to the second communication port, and the width of the first width section of the second annular gap being greater than the width of the second width section of the second annular gap.

5. The load lock chamber of claim 3, wherein, The cavity further comprises a main body and a first partitioning member accommodated in the inner cavity of the main body, the first chamber and the second chamber being arranged in separation through the first partitioning member, the first partitioning member, the first cover body, and the inner wall of the main body jointly forming the first annular air channel and the first annular gap, and the first partitioning member, the second cover body, and the inner wall of the main body jointly forming the second annular air channel and the second annular gap.

6. The load lock chamber of claim 5, wherein, The first chamber and the second chamber are arranged along a second direction different from the first direction, the cavity further comprises a third chamber and a second partition, the second partition is accommodated in the main body, the second partition is connected with the inner wall of the main body and the first partition, the third chamber is separated from the first chamber by the second partition, the third chamber and the first chamber are arranged along the first direction, and the third chamber is in communication with the at least one inflation port.

7. The load lock chamber of claim 6, wherein, The first partition, the second partition and the inner wall of the main body jointly form a third annular air channel and a third annular gap, the first chamber, the third annular air channel, the third annular gap and the third chamber are arranged along the first direction, the third annular air channel is in communication with the at least one inflation port, and the third annular gap comprises a first width section and a second width section arranged in communication, and the width of the first width section of the third annular gap is different from the width of the second width section of the third annular gap.

8. The load lock chamber of claim 7, wherein, The first width section of the third annular gap is arranged on the side of the third annular gap close to the at least one inflation port, and the width of the first width section of the third annular gap is greater than the width of the second width section of the third annular gap.

9. The load lock chamber of claim 6, wherein, The cavity further comprises a fourth chamber and a third partition, the third partition is connected with the inner wall of the main body, the third partition is connected with the first partition, the second chamber and the fourth chamber are separated by the third partition, the third chamber and the fourth chamber are arranged along the second direction, and the fourth chamber is in communication with the at least one inflation port.

10. The load lock chamber of claim 9, wherein, The third partition, the first partition and the inner wall of the main body jointly form a fourth annular air channel and a fourth annular gap, the second chamber, the fourth annular air channel, the fourth annular gap and the fourth chamber are arranged along the first direction, the fourth annular air channel is in communication with the at least one inflation port, the fourth annular gap comprises a first width section and a second width section arranged in communication, and the width of the first width section of the fourth annular gap is different from the width of the second width section of the fourth annular gap.

11. The load lock chamber of claim 10, wherein, The first width section of the fourth annular gap is arranged on the side of the fourth annular gap close to the at least one inflation port, and the width of the first width section of the fourth annular gap is greater than the width of the second width section of the fourth annular gap.

12. The load lock chamber of claim 11, wherein, The load lock chamber is of a symmetrical structure.

13. The load lock chamber of any of claims 1-12, wherein, The load lock chamber further comprises a processing component arranged in the cavity, and the processing component comprises a preheating disc or a cooling disc.

14. The load lock chamber of claim 1, wherein, The load lock chamber further comprises at least one exhaust port arranged on the cavity, and the at least one exhaust port is in communication with the first chamber.

15. A semiconductor device, characterized by comprising: A system comprising a processing chamber, a transfer chamber and a load lock chamber according to any one of claims 1-14, the transfer chamber is coupled with the processing chamber, and the transfer chamber is coupled with the load lock chamber.

Images