A durable, transparent super-hydrophobic packaging material and preparation method thereof

Abstract

The present invention relates to a durable, transparent, super-hydrophobic encapsulation material and a preparation method thereof, wherein the preparation method comprises: preparing a photoresist coating on a silicon wafer; subjecting the silicon wafer prepared with the photoresist coating to a photoresist treatment and a development treatment based on ultraviolet exposure to obtain a silicon wafer template; coating the silicon wafer template with polydimethylsiloxane (PDMS) material, and performing demoulding after curing; placing the demoulded silicon wafer template in a molding device for hot pressing to obtain a grid organic glass having a plurality of grid grooves formed thereon; and spraying a super-hydrophobic coating on the grid grooves of the grid organic glass. The present invention achieves anti-reflection and super-hydrophobicity, and the durable, transparent, super-hydrophobic encapsulation material has high visible light transmittance, and the unique armor structure design greatly improves the wear resistance of the coating.

Description

Technical Field

[0001] The present invention relates to a super-hydrophobic material, and in particular to a durable, transparent super-hydrophobic packaging material and a preparation method thereof. Background Art

[0002] Photovoltaic panels, often placed outdoors year-round, accumulate a layer of dust, which reduces their light transmittance. Traditional manual cleaning and automated water cleaning methods waste significant manpower, material resources, and financial resources. In contrast, superhydrophobic surfaces can effectively remove surface dust with the help of natural rainwater. Commercial photovoltaic encapsulation materials mostly use glass as their primary substrate, and research on superhydrophobic structures and coatings has primarily focused on glass substrates. However, with the advancement of building-integrated photovoltaics (BIPV), PV panels urgently need to be lightweight and flexible to meet the demands of building integration. Against this backdrop, a number of new encapsulation materials have emerged, and their excellent light transmittance, lightweight properties, and good plasticity have led to their widespread application in the construction industry. However, research on superhydrophobic materials based on these new encapsulation materials remains relatively scarce, suggesting significant potential for research and application in this area.

[0003] Furthermore, a major challenge facing superhydrophobic coatings is their wear resistance. Coatings left outdoors year-round can experience wear and tear from wind and sand, leading to failure. Traditional photovoltaic glass is inflexible and heavy. Traditional microstructures combined with superhydrophobic particles often employ inverted pyramid structures, which experience a dramatic increase in the solid-liquid contact fraction after wear, with the increase becoming more pronounced with increasing inclination angle. Currently, there are no processes for fabricating microframe structures on organic glass substrates. Summary of the Invention

[0004] The present invention provides a durable, transparent, super-hydrophobic encapsulation material, aiming to address at least one of the technical problems existing in the prior art. To this end, the present invention proposes a durable, transparent, super-hydrophobic encapsulation material that can achieve self-cleaning of solar cells, achieve robust super-hydrophobic properties, and enable low-cost production.

[0005] The technical solution of the present invention relates to a method for preparing a durable transparent super-hydrophobic encapsulation material, which comprises the following steps:

[0006] S100, preparing a photoresist coating on a silicon wafer;

[0007] S200, performing a photolithography process and a development process based on ultraviolet exposure on the silicon wafer prepared with the photoresist coating to obtain a silicon wafer template;

[0008] S300, pouring polydimethylsiloxane (PDMS) material on the silicon wafer template, and demolding after curing to obtain a demolded polydimethylsiloxane (PDMS) material;

[0009] S400, placing the demolded polydimethylsiloxane (PDMS) material in a molding device for hot pressing to obtain a grid organic glass having a plurality of grid grooves formed thereon;

[0010] S500, spraying super hydrophobic coating on the grille groove of the grille organic glass.

[0011] Furthermore, the step S100 includes the following steps:

[0012] S110, placing the silicon wafer on a baking tray and drying the moisture on the surface of the silicon wafer at a first temperature;

[0013] S120, placing the silicon wafer on a spin coater, and spin-coating the photoresist at a preset rotation speed to form a uniform photoresist coating on the silicon wafer;

[0014] S130 , placing the silicon wafer coated with the photoresist coating on a baking tray, and baking at the second temperature and the third temperature for a preset time respectively.

[0015] Further, in step S110, the first temperature is 90°C-110°C;

[0016] In the step S120, the preset rotation speed is 1300 rpm-1500 rpm, the type of the photoresist is AZ4562, and the thickness of the photoresist coating is 8 μm-12 μm;

[0017] In the step S130, the second temperature is 50°C-70°C, the third temperature is 110°C-120°C, and the preset time is 2-3 minutes.

[0018] Furthermore, a plurality of grid microcavities are provided on the silicon wafer template, and each grid microcavity is periodically arranged in sequence in the horizontal and vertical directions.

[0019] Furthermore, the size of each grid microcavity is a rectangle of 300um*300um, and the depth of the grid microcavity is 10um.

[0020] Furthermore, step S300 includes the following steps:

[0021] S310, performing surface silanization treatment on the silicon wafer template;

[0022] S320, fully mixing polydimethylsiloxane (PDMS) and a curing agent at a ratio of 5:1, and vacuum-treating the mixture of polydimethylsiloxane (PDMS) and the curing agent;

[0023] S330, polydimethylsiloxane PDMS is evenly poured on the silicon wafer template and vacuum treated again.

[0024] S340, curing the silicon wafer template cast with polydimethylsiloxane (PDMS) at 50°C-70°C for 2-3 hours;

[0025] S350, demolding the silicon wafer template cast with polydimethylsiloxane PDMS.

[0026] Furthermore, in step S400,

[0027] The molding device is provided with a first glass, a demolded polydimethylsiloxane (PDMS) material, an organic glass, and a second glass in order from top to bottom. The first glass and the second glass are used to ensure that the upper and lower surfaces of the polydimethylsiloxane (PDMS) material after demolding are flat on the organic glass.

[0028] Furthermore, in step S500,

[0029] The super hydrophobic coating is hydrophobic SiO2 nanoparticles.

[0030] Another aspect of the technical solution of the present invention relates to a durable transparent super-hydrophobic encapsulation material, which is prepared using the method for preparing the durable transparent super-hydrophobic encapsulation material. The durable transparent super-hydrophobic encapsulation material comprises:

[0031] The grid organic glass is provided with a plurality of grid grooves, each grid groove is periodically arranged in sequence in the horizontal and vertical directions.

[0032] The grid grooves are sprayed with super-hydrophobic coating.

[0033] Another aspect of the technical solution of the present invention relates to glass provided with the durable transparent super-hydrophobic encapsulation material.

[0034] The beneficial effects of the present invention are as follows:

[0035] The durable, transparent, super-hydrophobic packaging material of the present invention and its preparation method achieve anti-reflection and super-hydrophobicity. The durable, transparent, super-hydrophobic packaging material has a large contact angle of about 160°, a sliding angle of 3°, and a high visible light transmittance of more than 90%. The unique armor structure design greatly improves the wear resistance of the coating and maintains excellent super-hydrophobicity even after encountering harsh conditions such as sandpaper friction, water impact, acid immersion, ultraviolet irradiation, and repeated bending. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 14 is a flow chart of a method for preparing a durable transparent super-hydrophobic encapsulation material according to an embodiment of the present invention.

[0037] Figure 2 1 is a flow chart for preparing a transparent super-hydrophobic encapsulation material according to an embodiment of the present invention.

[0038] Figure 3 Schematic diagram of multiple grille grooves on a grille organic glass according to an embodiment of the present invention.

[0039] Figure 4 3 is a comparison diagram of the changes in solid-liquid contact fraction after grinding in four structures on the grid organic glass according to an embodiment of the present invention.

[0040] Figure 5 is a schematic diagram of a molding device according to an embodiment of the present invention.

[0041] Figure 6 Schematic diagram of a template transfer experiment process according to an embodiment of the present invention.

[0042] Figure 7 Schematic diagram of the measured spectra of (a) transmittance and (b) reflectance between 300-1100 nm of a pure PMMA substrate with a thickness of 2 mm and the proposed multifunctional coating according to an embodiment of the present invention.

[0043] Figure 8 FIG. 4 is a schematic diagram showing the contact angle CA and the rolling angle SA along the friction distance during the sandpaper wear process according to an embodiment of the present invention.

[0044] Figure 9 FIG. 4 is a schematic diagram showing the relationship between the contact angle CA and the rolling angle SA and the water jet impact time according to an embodiment of the present invention.

[0045] Figure 10 Schematic diagram of the contact angle CA and the sliding angle SA as a function of the 5% HCl immersion time according to an embodiment of the present invention.

[0046] Figure 11 FIG. 4 is a schematic diagram showing the contact angle CA and the sliding angle SA as a function of ultraviolet irradiation time according to an embodiment of the present invention.

[0047] Figure 12 Schematic diagram of the change of contact angle CA and sliding angle SA with the bending time of the armor structure AS coating sample according to an embodiment of the present invention.

[0048] Reference numerals: 100, molding device; 200, first glass; 300, polydimethylsiloxane (PDMS) material after demolding; 400, organic glass; 500, second glass. DETAILED DESCRIPTION

[0049] The following will be combined with the embodiments and drawings to clearly and completely describe the concept, specific structure and technical effects of the present invention so as to fully understand the purpose, scheme and effect of the present invention. It should be noted that the embodiments and features in the embodiments of this application can be combined with each other unless there is a conflict.

[0050] It should be noted that, unless otherwise specified, when a feature is referred to as being "fixed" or "connected" to another feature, it may be directly fixed or connected to the other feature or indirectly fixed or connected to the other feature. Furthermore, terms such as "upper," "lower," "left," "right," "top," and "bottom" used in this disclosure are intended solely to describe the relative positions of the components of the disclosure as shown in the accompanying drawings.

[0051] In addition, unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art. The terms used in this specification are only for describing specific embodiments and are not intended to limit the present invention. The term "and / or" as used herein includes any combination of one or more of the related listed items.

[0052] It should be understood that although the terms first, second, third, etc. may be used to describe various elements in the present disclosure, these elements should not be limited to these terms. These terms are only used to distinguish elements of the same type from each other. For example, a first element may also be referred to as a second element, and similarly, a second element may also be referred to as a first element without departing from the scope of the present disclosure.

[0053] See also Figures 1 to 12 , the preparation method of the durable transparent super hydrophobic encapsulation material of the technical solution of the present invention, referring to Figure 1 and Figure 2 The method for preparing the durable transparent super-hydrophobic encapsulation material comprises the following steps:

[0054] S100, preparing a photoresist coating on a silicon wafer;

[0055] S200, performing a photolithography process and a development process based on ultraviolet exposure on the silicon wafer prepared with the photoresist coating to obtain a silicon wafer template;

[0056] S300, pouring polydimethylsiloxane (PDMS) material on the silicon wafer template, and demolding after curing to obtain a demolded polydimethylsiloxane (PDMS) material;

[0057] S400, placing the demolded polydimethylsiloxane (PDMS) material in a molding device 100 for hot pressing to obtain a grid organic glass having a plurality of grid grooves formed thereon;

[0058] S500, spraying super hydrophobic coating on the grille groove of the grille organic glass.

[0059] The beneficial effects of the present invention are as follows:

[0060] The durable, transparent, super-hydrophobic packaging material of the present invention and its preparation method achieve anti-reflection and super-hydrophobicity. The durable, transparent, super-hydrophobic packaging material has a large contact angle of about 160°, a sliding angle of 3°, and a high visible light transmittance of more than 90%. The unique armor structure design greatly improves the wear resistance of the coating and maintains excellent super-hydrophobicity even after encountering harsh conditions such as sandpaper friction, water impact, acid immersion, ultraviolet irradiation, and repeated bending.

[0061] Specifically, the durable, transparent, super-hydrophobic packaging material and its preparation method involve the design and preparation of organic glass 400 base packaging material. The surface is sprayed with super-hydrophobic material, which can achieve a super-hydrophobic self-cleaning effect, and has lightweight and certain flexibility. It can be used in the field of photovoltaic building integration to replace traditional photovoltaic glass, making it have a certain flexibility and reducing the weight of photovoltaic modules.

[0062] Transparent superhydrophobic coatings have recently attracted widespread attention in the solar energy sector due to their ease of preparation, low cost, self-cleaning process, and high effectiveness in reducing dust adhesion. Compared to rigid glass covers, organic glass 400 covers offer the advantages of flexibility and light weight, but the impact of dust deposition is more severe. The present invention aims to design a transparent superhydrophobic coating with excellent durability on the surface of organic glass 400 to restore module efficiency reduction caused by dust deposition. Using soft lithography and hot pressing processes, periodic microcavities are fabricated on the organic glass 400 surface as an armoring structure, and hydrophobic SiO2 nanoparticles are sprayed into the microcavities to achieve antireflection and superhydrophobicity. Experimental test results show that the designed coating has a large contact angle of approximately 160°, a sliding angle of 3°, and a high visible light transmittance of over 90%. The unique armored structure design significantly improves the coating's wear resistance, maintaining excellent superhydrophobicity even after exposure to harsh conditions such as sandpaper friction, water impact, acid immersion, UV irradiation, and repeated bending.

[0063] Furthermore, the step S100 includes the following steps:

[0064] S110, placing the silicon wafer on a baking tray and drying the moisture on the surface of the silicon wafer at a first temperature;

[0065] S120, placing the silicon wafer on a spin coater, and spin-coating the photoresist at a preset rotation speed to form a uniform photoresist coating on the silicon wafer;

[0066] S130 , placing the silicon wafer coated with the photoresist coating on a baking tray, and baking at the second temperature and the third temperature for a preset time respectively.

[0067] Further, in step S110, the first temperature is 90°C-110°C;

[0068] In the step S120, the preset rotation speed is 1300 rpm-1500 rpm, the type of the photoresist is AZ4562, and the thickness of the photoresist coating is 8 μm-12 μm;

[0069] In the step S130, the second temperature is 50°C-70°C, the third temperature is 110°C-120°C, and the preset time is 2-3 minutes.

[0070] Furthermore, a plurality of grid microcavities are provided on the silicon wafer template, and each grid microcavity is periodically arranged in sequence in the horizontal and vertical directions.

[0071] Furthermore, the size of each grid microcavity is a rectangle of 300um*300um, and the depth of the grid microcavity is 10um.

[0072] Specifically, refer to Figure 3 and Figure 4 Since a plurality of grid microcavities are provided on the silicon wafer template, a grid organic glass is made in the subsequent process. A plurality of grid grooves are formed on the grid organic glass. The grid grooves are frame microstructures with vertical inner walls, which effectively improve the wear resistance of the superhydrophobic coating. After wear, the solid-liquid contact fraction of the superhydrophobic surface remains basically unchanged.

[0073] In a specific embodiment, in order to prepare a photolithography template with a super-hydrophobic surface, a silicon wafer is first placed on a baking tray at 100°C to dry the moisture on its surface. Next, photoresist AZ4562 is spin-coated on a spin coater at a speed of 1400 rpm to form a uniform coating of approximately 10 μm. Subsequently, the silicon wafer is heat-baked at 60°C and 115°C for 2 minutes respectively. This process is intended to remove the solvent in the photoresist, enhance its adhesion to the silicon wafer, release internal stress, and prevent the photoresist from contaminating the equipment in subsequent steps. After the heat baking is completed, ultraviolet exposure is performed, and finally development treatment is performed to prepare the photolithography template.

[0074] Furthermore, step S300 includes the following steps:

[0075] S310, performing surface silanization treatment on the silicon wafer template;

[0076] S320, fully mixing polydimethylsiloxane (PDMS) and a curing agent at a ratio of 5:1, and vacuum-treating the mixture of polydimethylsiloxane (PDMS) and the curing agent;

[0077] S330, polydimethylsiloxane PDMS is evenly poured on the silicon wafer template and vacuum treated again.

[0078] S340, curing the silicon wafer template cast with polydimethylsiloxane (PDMS) at 50°C-70°C for 3 hours;

[0079] S350, demolding the silicon wafer template cast with polydimethylsiloxane PDMS.

[0080] Specifically, in step S310, in order to prevent the silicon wafer template from adhering to polydimethylsiloxane (PDMS), a surface silanization treatment is performed.

[0081] In step S320, when preparing the polydimethylsiloxane (PDMS), increasing the curing agent content can reduce the amount of uncrosslinked polydimethylsiloxane (PDMS) prepolymer, thereby increasing its hardness. Therefore, the polydimethylsiloxane (PDMS) and curing agent are thoroughly mixed in a ratio of 5:1 to improve the hardness and heat resistance of the polydimethylsiloxane (PDMS).

[0082] In steps S330 and S340, a vacuum treatment is performed to remove air bubbles from the mixture. PDMS is evenly poured onto the photolithography template and vacuum treated again to ensure that the PDMS fully penetrates the microstructures and further remove air bubbles. After curing at 60°C for 3 hours, the mixture is demolded.

[0083] Furthermore, in step S400,

[0084] The first glass 200, the demolded polydimethylsiloxane (PDMS) material 300, the organic glass 400, and the second glass 500 are placed in the molding device 100 from top to bottom. The first glass 200 and the second glass 500 are used to ensure that the upper and lower surfaces of the polydimethylsiloxane (PDMS) material after demolding are flat on the organic glass 400.

[0085] Reference Figure 5 and Figure 6 The molding device 100 places the materials in layers in the device from top to bottom in the order of first glass 200--> demolded polydimethylsiloxane PDMS material 300--> organic glass 400--> second glass 500. The function of the top first glass 200 and the bottom second glass 500 is to ensure that the upper and lower surfaces of the stamping are flat.

[0086] Reference Figure 6 , (a) is a schematic diagram of the PDMS demolding process, (b) is a diagram showing the effect after demolding, (c) is a diagram showing the effect of organic glass 400 under a microscope after hot pressing, and (d) is a SEM photo.

[0087] Furthermore, in step S500,

[0088] The super hydrophobic coating is hydrophobic SiO2 nanoparticles.

[0089] Another aspect of the technical solution of the present invention relates to a durable transparent super-hydrophobic encapsulation material, which is prepared using the method for preparing the durable transparent super-hydrophobic encapsulation material. The durable transparent super-hydrophobic encapsulation material comprises:

[0090] The grid organic glass is provided with a plurality of grid grooves, each grid groove is periodically arranged in sequence in the horizontal and vertical directions.

[0091] The grid grooves are sprayed with super-hydrophobic coating.

[0092] Another aspect of the technical solution of the present invention relates to glass provided with the durable transparent super-hydrophobic encapsulation material.

[0093] The following are the technical effects achieved by the technical solution of the present invention:

[0094] Reference Figure 7 , the spectral transmittance and reflectance of the proposed multifunctional coating were measured in the wavelength range of 300-1100 nm and compared with those of pure organic glass 400 (PMMA substrate) with a thickness of 2 mm, which is sufficient to consider the photoelectric conversion of various solar panels. Figure 7 (a), compared with pure organic glass 400 (PMMA substrate), an increase in transmittance is observed over the entire wavelength range. This is due to the anti-reflection effect caused by the nanoporous medium formed by SiO2 nanoparticles, which is also a common method to improve the transmittance of glass substrates. Considering that the refractive index of organic glass 400 (PMMA substrate) is about 1.5 and the refractive index of SiO2 is around 1.45, it can be well matched with a layer of nanoporous SiO2 medium between air and organic glass 400 (PMMA substrate), thereby reducing light reflection. The average transmittance of the proposed coating in the range of 300-1100nm is more than 90%. At the same time, consistent with the transmittance measurement results, the anti-reflection effect of the coating can also be achieved in Figure 7 It is observed in (b) that the reflectivity of the proposed multifunctional coating is about 1% lower than that of pure organic glass 400 (PMMA substrate), indicating its good potential in improving the panel conversion efficiency.

[0095] Reference Figures 8 to 12 , respectively give a schematic diagram of the friction distance of 800 cm through sandpaper wear, a schematic diagram of the water jet impact at 70 kPa pressure for 30 minutes, a schematic diagram of the immersion in 5% HCl solution for 30 minutes, a schematic diagram of the 100 SEM image of the proposed coating after 35 minutes of UV light irradiation and 300 cycles of 45° bending. This study highlights the application of high transparency and superhydrophobic coatings in providing dust resistance to photovoltaic panels. The water contact angle CA and sliding angle SA of the surface are two main factors to measure the self-cleaning performance. In a specific embodiment, CA>150° and SA<10° indicate that the surface is superhydrophobic. The durability of the proposed coating was studied by observing the changes in contact angle CA and sliding angle SA during various tests, including sandpaper abrasion, water jet impact, and acid and alkali solution immersion. The changes in contact angle CA and sliding angle SA are shown in Figure 2. Figures 8 to 12 As shown, SEM images of the proposed coating after various tests are given. Note that the durability of the proposed coating sample with hydrophobic SiO2 nanoparticles embedded in the armor substrate frame (denoted as "AS") and the reference coating sample with hydrophobic silica nanoparticles sprayed directly on a flat PMMA substrate (marked as "FS") were explored and compared to demonstrate the protective function of the armor frame.

[0096] Reference Figures 8 to 12 , where CA represents the contact angle, SA represents the slide angle, FS represents the flat structure, AS represents the armor structure, FS-CA represents the contact angle of the flat structure, AS-CA represents the contact angle of the armor structure, AS-CA represents the contact angle of the armor structure, and AS-SA represents the slide angle of the armor structure.

[0097] A 100 g weight is placed on 1000 grit sandpaper and the abrasion test is performed by dragging the sandpaper along the sample surface. Figure 8 The variation of the contact angle (CA) of the "AS" and "FS" samples with friction distance is plotted in Figure 2. The proposed armored frame coating exhibits excellent wear resistance, maintaining its superhydrophobic properties of CA > 150° and SA < 10° after a friction distance of 300 cm. Even after a friction distance of 800 cm, the contact angle remains greater than 150°, but after a relatively short distance, the sliding angle increases rapidly, exceeding 10° beyond 300 cm. In contrast, although the "FS" coating exhibits superhydrophobicity in its initial state, it is severely damaged and loses its superhydrophobicity after a short friction distance of 50 cm. SEM images also clearly illustrate the protective effect of the armored frame, with obvious signs of friction after 800 cm. However, the coating remains almost intact, without severe damage or flaking, demonstrating good resistance to sand wear.

[0098] Reference Figure 9 , the water jet resistance of the proposed coating was also tested by impacting the sample surface with a 70 kPa water jet, and the changes in CA and SA are shown in Figure 9 As shown. It can be seen that the coating still maintains superhydrophobicity after 35 minutes of water spraying. Considering that the conventional pressure of rainfall on the surface is much less than 70kPa and the rain impact is not a fixed-point impact as performed in this experiment, the durability of the multifunctional coating can be maintained for a longer time under outdoor conditions. Compared with its poor abrasion resistance, the "FS" coating shows better durability under water jet impact, maintaining superhydrophobicity for 20 minutes, while the contact angle remains almost unchanged for a longer time. SEM images of the coating after 30 minutes of spraying at 70kPa pressure are also shown. Although some areas of the coating are severely damaged or even peeled off, the size is relatively small, not exceeding 100cm. Therefore, the impact of the damaged area on the hydrophobicity is limited, and the entire surface still has good durability to the water spray test.

[0099] Reference Figure 10 Considering the possibility of acidic substances carried by rain or wind being deposited on the surface of solar panels, the proposed coating's resistance to acidic solutions was also studied by immersing it in a 5% HCl solution for a period of time. As the time increases from 0 min to 30 min, the changes in CA and SA are shown in Figure 2. Figure 10 Surprisingly, it exhibits excellent acid corrosion resistance, with CA > 155° and SA < 5° remaining nearly unchanged when the immersion time is increased to 30 minutes. SEM images of the proposed coating after testing also verify its strong durability in acidic atmospheres, where almost the entire surface remains covered with nanoparticles, with only minor damage observed.

[0100] Reference Figure 11 To evaluate the reliability of the proposed coating material when exposed to ultraviolet (UV) radiation from sunlight under operational conditions, controlled laboratory experiments were conducted. The coating was exposed continuously for 35 minutes using a UV lamp with a power density of 100 mW / cm², approximately 20 times stronger than typical sunlight UV intensity. Throughout the exposure period, changes in its hydrophobic properties were carefully monitored. Figure 11 As shown, although SEM images show small cracks on the coating surface after long-term exposure to high-intensity UV light, the coating's superhydrophobic properties are unaffected. The contact angle remains above 150° and the sliding angle remains below 5°, demonstrating the material's resilience under harsh conditions.

[0101] Reference Figure 12 Given that the coating's primary application is flexible photovoltaic modules, its reliability under repeated bending and deformation is crucial. To evaluate this aspect, the coating was subjected to more than 300 bending cycles at a 45-degree angle. The surface morphology and hydrophobicity were analyzed to capture any changes caused by mechanical stress. Figure 12As shown, the contact angle changed very little and remained above 150 degrees throughout the test. However, after 150 bending cycles, a significant increase in the sliding angle was observed, rising from 5 degrees to 10 degrees. Subsequent bending cycles stabilized the sliding angle. SEM images show that the coating developed visible cracks after repeated bending. However, due to different stress concentrations on the surface during bending, the size and distribution of these cracks also varied. This change in crack size may be an important factor leading to the increase in sliding angle, indicating that while the coating maintains excellent hydrophobic properties, the mechanical properties need to be carefully considered in flexible applications.

[0102] The above description is merely a preferred embodiment of the present invention. The present invention is not limited to the aforementioned embodiments. As long as the technical effects of the present invention are achieved by the same means, any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present disclosure shall be included within the scope of protection of the present disclosure. Within the scope of protection of the present invention, its technical solutions and / or implementation methods may be modified and varied in various ways.

Claims

1. A method for preparing a durable, transparent, super-hydrophobic encapsulation material, characterized in that: The preparation method of the durable transparent super-hydrophobic encapsulation material comprises the following steps: S100, preparing a photoresist coating on a silicon wafer; S200, performing a photolithography process and a development process based on ultraviolet exposure on the silicon wafer prepared with the photoresist coating to obtain a silicon wafer template; S300, pouring polydimethylsiloxane (PDMS) material on the silicon wafer template, and demolding after curing to obtain a demolded polydimethylsiloxane (PDMS) material; S400, placing the demoulded polydimethylsiloxane (PDMS) material in a molding device (100) for hot pressing to obtain a grid organic glass, wherein a plurality of grid grooves are formed on the grid organic glass; S500, spraying a super-hydrophobic coating on the grille grooves of the grille organic glass; Wherein, in the step S400, The molding device (100) is provided with a first glass (200), a demolded polydimethylsiloxane (PDMS) material (300), an organic glass (400), and a second glass (500) in order from top to bottom. The first glass (200) and the second glass (500) are used to ensure that the upper and lower surfaces of the demolded polydimethylsiloxane (PDMS) material printed on the organic glass (400) are flat.

2. The method according to claim 1, characterized in that The step S100 includes the following steps: S110, placing the silicon wafer on a baking tray and drying the moisture on the surface of the silicon wafer at a first temperature; S120, placing the silicon wafer on a spin coater, and spin-coating the photoresist at a preset rotation speed to form a uniform photoresist coating on the silicon wafer; S130 , placing the silicon wafer coated with the photoresist coating on a baking tray, and baking at the second temperature and the third temperature for a preset time respectively.

3. The method according to claim 2, characterized in that In the step S110, the first temperature is 90°C-110°C; In the step S120, the preset rotation speed is 1300 rpm-1500 rpm, the type of the photoresist is AZ4562, and the thickness of the photoresist coating is 8 μm-12 μm; In the step S130, the second temperature is 50°C-70°C, the third temperature is 110°C-120°C, and the preset time is 2-3 minutes.

4. The method according to claim 1, wherein In the step S200, A plurality of grid microcavities are arranged on the silicon wafer template, and each grid microcavity is periodically arranged in sequence in the horizontal and vertical directions.

5. The method according to claim 4, characterized in that The size of each grid microcavity is a rectangle of 300um*300um, and the depth of the grid microcavity is 10um.

6. The method according to claim 1, characterized in that The step S300 includes the following steps: S310, performing surface silanization treatment on the silicon wafer template; S320, fully mixing polydimethylsiloxane (PDMS) and a curing agent at a ratio of 5:1, and vacuum-treating the mixture of polydimethylsiloxane (PDMS) and the curing agent; S330, polydimethylsiloxane PDMS is evenly poured on the silicon wafer template and vacuum treated again. S340, curing the silicon wafer template cast with polydimethylsiloxane (PDMS) at 50°C-70°C for 2-3 hours; S350, demolding the silicon wafer template cast with polydimethylsiloxane PDMS.

7. The method according to claim 1, characterized in that In the step S500, The super hydrophobic coating is hydrophobic SiO2 nanoparticles.

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