Cleaning method and equipment for improving cleanliness of solid surface

Abstract

The invention discloses a cleaning method and equipment for improving the cleanliness of a solid surface. The cleaning method comprises the steps that a cleaning medium is injected into a cleaning tank, the cleaning medium comprises micro-nano bubbles, and the particle size range of the micro-nano bubbles is 10-200 nanometers; periodic pressure pulses are applied to the cleaning medium in the cleaning tank, and the frequency of the pressure pulses is 0.1-2.0 Hz so as to induce surface interface oscillation of the micro-nano bubbles; radio frequency waves with the frequency range of 1-10 MHz are applied into the cleaning tank to excite resonance of the micro-nano bubbles; and the cleaning medium is adjusted to circularly flow in the cleaning tank so as to clean the surface of the solid. According to the cleaning method for the solid surface cleanliness, the synergistic effect of pressure pulses, radio frequency resonance and micro-nano bubbles is fully exerted, and the cleaning effect is remarkably improved.

Description

Technical Field

[0001] The present application relates to the field of cleaning technology, and in particular to a cleaning method and equipment for improving the cleanliness of a solid surface. Background Art

[0002] In modern industry, cleaning technology of solid surfaces plays a vital role, especially in the fields of microelectronics, optics, medical devices and other precision manufacturing. The removal of surface contaminants not only affects the appearance and function of the product, but is also directly related to the quality and performance of the product. With the continuous development of manufacturing technology, the standards for surface cleanliness are getting higher and higher, which puts higher requirements on cleaning technology. Although traditional surface cleaning methods can meet industrial needs to a certain extent, they are often difficult to cope with the growing demand for high-precision cleaning, especially when dealing with tiny particles, complex contaminants and precision surfaces. The effectiveness and efficiency of existing methods are significantly restricted. With the continuous advancement of science and technology, especially the application of nanotechnology, micro-nano bubble technology, as a new type of surface cleaning method, has gradually attracted widespread attention from academia and industry. This technology achieves surface cleaning by generating extremely small bubbles and utilizing their unique physical properties, and has great application potential.

[0003] At present, common surface cleaning technologies include manual cleaning, chemical cleaning, mechanical friction cleaning and ultrasonic cleaning. Although the manual cleaning method is easy to operate, it has poor removal effect on tiny pollutants and is easy to introduce secondary pollution during the cleaning process, which cannot meet the requirements of modern precision manufacturing. Chemical cleaning methods mainly remove pollutants by using solvents or other chemical reagents, which are suitable for removing pollutants such as grease and dust. However, chemical cleaning methods usually have potential hazards to the environment and the health of operators, and in some cases, chemical reagents may cause damage to the cleaned surface. Mechanical friction cleaning relies on physical contact to remove pollutants, but this method cannot effectively remove tiny particles and may cause scratches or other damage to the surface. Ultrasonic cleaning uses bubbles generated by high-frequency sound waves to remove surface pollutants. This method performs well in removing tiny particles and is particularly suitable for cleaning micro or complex surfaces. However, ultrasonic cleaning still has some limitations, especially in terms of the unevenness of bubble generation and distribution, the stability of bubbles, etc., and it is still difficult to meet the cleaning needs of higher precision and higher efficiency.

[0004] With the development of micro-nano bubble technology, it has gradually shown its unique advantages in the field of cleaning. Micro-nano bubbles are bubbles with a diameter ranging from tens of nanometers to several microns, with extremely high surface activity and strong kinetic effects. Compared with traditional bubbles, micro-nano bubbles have a larger specific surface area, stronger surface energy and longer residence time, which makes it show unique advantages in the cleaning and decontamination process. Micro-nano bubbles can be evenly distributed in the liquid, produce a strong physical effect, and can effectively remove the attachments on the solid surface, especially when dealing with small pollutants that are difficult to remove. It shows excellent results. In addition, micro-nano bubbles also have strong penetration ability and can penetrate into complex surface structures to remove pollutants that are difficult to reach. Therefore, micro-nano bubble technology has shown broad application prospects in the fields of surface cleaning, sewage treatment, medical device cleaning, etc. Although micro-nano bubble technology has significant advantages, it still faces some technical difficulties in practical applications. At present, there are still certain limitations in the generation technology and control methods of micro-nano bubbles. Summary of the invention

[0005] The main technical problem solved by the present application is to provide a cleaning method and equipment for improving the cleanliness of solid surfaces, which can improve the cleaning efficiency and effect.

[0006] In order to solve the above technical problems, a technical solution adopted in the present application is: to provide a cleaning method for improving the cleanliness of a solid surface, the cleaning method comprising: injecting a cleaning medium into a cleaning tank, the cleaning medium comprising micro-nano bubbles, and the particle size range of the micro-nano bubbles is 10-200 nanometers; applying periodic pressure pulses to the cleaning medium in the cleaning tank, the frequency of the pressure pulses is 0.1-2.0 Hz, so as to induce oscillation of the surface interface of the micro-nano bubbles; applying radio frequency waves with a frequency range of 1-10 MHz to the cleaning tank to excite the resonance of the micro-nano bubbles; and adjusting the circulation of the cleaning medium in the cleaning tank to clean the solid surface.

[0007] In one embodiment, the method further comprises adjusting the gas-liquid ratio in the cleaning tank to between 1:5 and 1:20.

[0008] In one embodiment, the method further comprises controlling the shear stress of the fluid in the cleaning tank to be 0.1-10 Pa.

[0009] In one embodiment, the amplitude of the periodic pressure pulses is in the range of 0.1-2 MPa.

[0010] In one embodiment, the method further includes: during the cleaning process, dynamically adjusting the frequency of the radio frequency wave using multi-frequency resonance technology to adapt to changes in the particle size of the bubbles.

[0011] In one embodiment, the method further comprises: during the cleaning process, micro-nano bubbles formed by alternately introducing different gases.

[0012] In one embodiment, the cleaning medium further includes a surface tension regulator, which is used to reduce the surface tension of the solution, and the concentration of the surface tension regulator is 0.0005-0.05 wt %; optionally, the surface tension regulator includes a surfactant.

[0013] In one embodiment, the gas includes one or more of oxygen, ozone, nitrogen, carbon dioxide or an inert gas.

[0014] In one embodiment, after the cleaning process is completed, the micro-nano bubbles in the cleaning medium are recovered and reused through separation technology.

[0015] In one embodiment, the method is used to clean electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relic surfaces, precision mechanical parts, and medical device surfaces.

[0016] In order to solve the above technical problems, a technical solution adopted in this application is: to provide a cleaning device for improving the cleanliness of solid surfaces, the cleaning device includes a cleaning tank, a pressure pulse generating device, a radio frequency excitation device and a reflux device. Among them, the cleaning tank is used to accommodate the cleaning medium and the device to be cleaned, the cleaning tank includes a medium inlet and a medium outlet, the medium inlet is used to access the cleaning medium, the cleaning medium includes micro-nano bubbles, and the particle size range of the micro-nano bubbles is 10-200 nanometers; the pressure pulse generating device is connected to the cleaning tank, and is used to apply periodic pressure pulses to the cleaning medium in the cleaning tank, and the frequency range of the pressure pulse is 0.1 to 2 Hz; the radio frequency excitation device is arranged outside the cleaning tank, and is used to apply radio frequency waves with a frequency range of 1-10 MHz to the cleaning tank; the reflux device includes a reflux pipe, and the reflux pipe is connected to the medium inlet and the medium outlet respectively, and the reflux device is used to adjust the circulation of the cleaning medium in the cleaning tank to clean the solid surface.

[0017] In one embodiment, the reflux device includes a dynamic fluid shearing device, which includes a rotatable blade and a regulating valve for generating a continuously adjustable shear stress to control the shear stress of the fluid in the cleaning tank to be 0.1-10Pa.

[0018] In one embodiment, the cleaning device further comprises a micro-nano bubble generating device, which comprises a gas mixing module, and the gas mixing module is used to alternately introduce different gases to form various micro-nano bubbles.

[0019] In one embodiment, the pressure pulse generating device generates periodic pressure pulses with an amplitude range of 0.1-2 MPa through a hydraulic drive device.

[0020] In one embodiment, the radio frequency excitation device uses a multi-frequency resonance mode to dynamically adjust the frequency of the radio frequency wave to adapt to the change in the particle size of the bubbles.

[0021] In one embodiment, the cleaning tank is made of high-strength titanium alloy or corrosion-resistant stainless steel.

[0022] In one embodiment, the cleaning device further comprises a temperature control system, which comprises a temperature sensor and a heating / cooling unit, and is used to control the temperature of the cleaning medium within a range of 0-100°C.

[0023] In one embodiment, the cleaning device also includes a control unit, which is electrically connected to the micro-nano bubble generating device, the pressure pulse generating device, the radio frequency excitation device, the reflux device and the temperature control system, and is used to monitor the micro-nano bubble particle size, pressure pulse parameters, radio frequency wave parameters and temperature parameters, and automatically adjust the equipment operating parameters based on the monitoring data.

[0024] In one embodiment, the cleaning device further comprises a centrifugal separation device, which is used to recycle and reuse the micro-nano bubbles in the cleaning medium.

[0025] In one embodiment, the cleaning device is used to clean electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relic surfaces, precision mechanical parts, and medical device surfaces.

[0026] The above description is only an overview of the technical solution of the present application. In order to more clearly understand the technical means of the present application, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0028] Figure 1 This is a schematic cross-sectional structure diagram of a cleaning device according to one or more embodiments of the present application. DETAILED DESCRIPTION

[0029] In order to make the purpose, technical solution and effect of the present application clearer and more specific, the following will describe the embodiments of the technical solution of the present application in detail with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present application, and are therefore only used as examples, and cannot be used to limit the scope of protection of the present application.

[0030] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which this application belongs; the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" in the specification and claims of this application and the above-mentioned figure descriptions and any variations thereof are intended to cover non-exclusive inclusions.

[0031] In the description of the embodiments of the present application, the technical terms "first", "second", etc. are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the term "multiple" refers to more than two (including two), similarly, "multiple groups" refers to more than two (including two groups), and "multiple pieces" refers to more than two (including two pieces), unless otherwise clearly and specifically defined.

[0032] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0033] In the description of the embodiments of the present application, the term "and / or" is only a description of the association relationship of the associated objects, indicating that there may be three relationships. For example, A and / or B can represent: A exists alone, A and B exist at the same time, and B exists alone. In addition, the character " / " in this article generally indicates that the associated objects before and after are in an "or" relationship.

[0034] Amounts, ratios and other numerical values ​​are presented herein in a range format. It should be understood that such a range format is for convenience and brevity and should be flexibly interpreted to include not only the values ​​explicitly specified as range limits, but also all individual values ​​or sub-ranges encompassed within the range, as if each value and sub-range were explicitly specified.

[0035] If there is no special explanation, all steps of the present application can be performed sequentially, randomly, or in parallel, preferably sequentially. For example, the method includes steps (a) and (b), indicating that the method may include steps (a) and (b) performed sequentially, or may include steps (b) and (a) performed sequentially, or may be steps (a) and (b) performed simultaneously in parallel. For example, the method may also include step (c), indicating that step (c) may be added to the method in any order, for example, the method may include steps (a), (b) and (c), or may include steps (a), (c) and (b), or may include steps (c), (a) and (b), etc.

[0036] Existing methods for generating micro-nano bubbles usually rely on high-pressure gas dissolution, bubble generators, static mixers and other equipment to achieve bubble generation, but these methods often make it difficult to ensure uniform distribution of bubbles in the liquid, and the size, concentration and stability of the bubbles are also difficult to accurately control. These factors limit the application effect of micro-nano bubble technology in the cleaning process, especially in applications with high requirements such as high-precision cleaning and removal of complex pollutants. The stability and repeatability of the cleaning effect are still a problem that needs to be solved urgently. This makes it difficult for cleaning efficiency and accuracy to reach the expected level. Therefore, how to optimize the generation and movement of bubbles to achieve efficient and accurate surface cleaning is a key issue that needs to be solved in the current micro-nano bubble cleaning technology. The development of more efficient and accurate micro-nano bubble generation and control technology is still the key to promoting the development of this field.

[0037] This application overcomes the various deficiencies in the prior art by innovatively optimizing the generation, distribution and movement of micro-nano bubbles, and combining the precise control of pressure pulses and radio frequency resonance, thereby providing a more efficient and precise solution in the field of surface cleaning. Through means such as radio frequency resonance and pressure pulse control, this application can achieve uniform generation and precise control of bubbles, and give full play to the synergistic effect of pressure pulses, radio frequency resonance and micro-nano bubbles, significantly improving the cleaning effect. This technology not only solves the problems of unstable bubbles and uneven cleaning effects in the prior art, but also ensures that the surface is not damaged during the cleaning process, meeting the stringent requirements of modern high-end manufacturing industries for surface cleanliness.

[0038] In one embodiment, the present application provides a cleaning method for improving the cleanliness of a solid surface, the method comprising injecting a cleaning medium into a cleaning tank, the cleaning medium comprising micro-nano bubbles, the particle size of the micro-nano bubbles ranging from 10 to 200 nanometers; applying periodic pressure pulses to the cleaning medium in the cleaning tank, the frequency of the pressure pulses being 0.1-2.0 Hz to induce oscillation of the surface interface of the micro-nano bubbles; applying radio frequency waves with a frequency range of 1-10 MHz to the cleaning tank to excite the resonance of the micro-nano bubbles; and adjusting the circulation of the cleaning medium in the cleaning tank to clean the solid surface.

[0039] Among them, the selection of cleaning liquid should be based on the material and contaminant characteristics of the solid surface to be cleaned to ensure the cleaning effect and avoid damage to the substrate. That is, choose a cleaning liquid suitable for the cleaning object and contamination type, such as ultrapure water or environmentally friendly cleaning liquid, and add it to the cleaning tank.

[0040] The cleaning gas is mixed with the cleaning liquid in the form of micro-nano bubbles, or in other words, the cleaning gas is present in the cleaning medium in the form of micro-nano bubbles. The gas can be introduced into the cleaning liquid by a micro-nano bubble generator, and a forced mixing method is adopted to fully contact with the cleaning liquid to generate micro-nano bubbles with a particle size range of 10 to 200 nanometers. The gas can be selected from any one or more combinations of oxygen, ozone, nitrogen, carbon dioxide or inert gas to enhance cleaning performance. The micro-nano bubble generator adopts pressure dissolution, microporous aeration, membrane aeration, electrolysis, hydrodynamic cavitation, rotary flow, turbulent static mixing, ejector nozzle or hammer mill rotary method to generate the micro-nano bubbles.

[0041] Furthermore, a periodic pressure pulse is applied to the cleaning medium in the cleaning tank, and the frequency of the pressure pulse is 0.1-2.0 Hz, for example, 0.1 Hz, 0.3 Hz, 0.5 Hz, 0.8 Hz, 1.0 Hz, 1.2 Hz, 1.5 Hz, 1.8 Hz, 2.0 Hz, etc. The pressure pulse induces the oscillation of the micro-nano bubble surface interface to generate high-frequency vibration and cavitation effect to achieve cleaning. At the same time, the cleaning medium is circulated in the cleaning tank through the water distribution pipe and the reflux system to form a stable flow field, so that the cleaning medium is fully in contact with the solid surface, thereby improving the cleaning efficiency.

[0042] Furthermore, a radio frequency wave with a frequency range of 1-10 MHz is applied to the cleaning tank to excite the resonance of the micro-nano bubbles. Radio frequency waves are essentially a high-frequency alternating electromagnetic wave, which is an electromagnetic frequency that can be radiated into space and is generally generated by a radio frequency excitation device. The introduction of radio frequency waves further excites the resonance of the micro-nano bubbles and can improve the cleaning efficiency.

[0043] In one embodiment, the periodic pressure pulses are generated by a hydraulic drive device, and the amplitude thereof is 0.1 to 2 MPa, for example, 0.1 MPa, 0.3 MPa, 0.5 MPa, 0.8 MPa, 1.0 MPa, 1.2 MPa, 1.5 MPa, 1.8 MPa, 2.0 MPa, etc. This arrangement can control the degree of bubble oscillation, thereby enhancing the cleaning effect.

[0044] In one embodiment, the gas-liquid ratio in the cleaning tank is adjusted to be between 1:5 and 1:20, for example, 1:5, 1:8, 1:10, 1:12, 1:15, 1:18, 1:20, etc. This setting can optimize the distribution and aggregation of bubbles, making the micro-nano bubbles in the cleaning medium more stable and more evenly distributed, thereby enhancing the cleaning effect.

[0045] In one embodiment, the shear stress of the fluid in the cleaning tank is controlled to be 0.1 to 10 Pa, for example, 0.1 Pa, 0.5 Pa, 0.8 Pa, 1.0 Pa, 3.0 Pa, 5.0 Pa, 8.0 Pa, 10.0 Pa, etc. This setting can improve the efficiency of stripping particles attached to the solid surface and enhance the cleaning effect.

[0046] In one embodiment, during the cleaning process, the frequency of the radio frequency wave is dynamically adjusted using multi-frequency resonance technology to adapt to the change in bubble size, stimulate the resonance of micro-nano bubbles, and enhance the cleaning effect.

[0047] In one embodiment, during the cleaning process, micro-nano bubbles formed by different gases are alternately introduced to improve the diversity and cleaning ability of the bubbles.

[0048] In one embodiment, the cleaning medium is circulated in the cleaning tank through a water distribution pipe and a reflux system to form a stable flow field. The formation of the flow field adjusts the flow rate and flow rate so that the cleaning medium is fully in contact with the solid surface to improve the cleaning efficiency. The flow velocity of the cleaning medium is controlled between 0.01 and 2 m / s, for example, it can be 0.01 m / s, 0.03 m / s, 0.05 m / s, 0.08 m / s, 0.10 m / s, 0.15 m / s, 0.20 m / s, 0.50 m / s, 0.80 m / s, 1.00 m / s, 1.20 m / s, 1.50 m / s, 1.80 m / s, 2.00 m / s, etc. To ensure that the cleaning medium is evenly distributed and enhance the cleaning effect.

[0049] In one embodiment, the cleaning medium further includes a surface tension regulator, which is used to reduce the surface tension of the solution, and the concentration of the surface tension regulator is 0.0005 to 0.05 wt%, for example, 0.0005 wt%, 0.0008 wt%, 0.0010 wt%, 0.0030 wt%, 0.0050 wt%, 0.0080 wt%, 0.010 wt%, 0.020 wt%, 0.030 wt%, 0.040 wt%, 0.050 wt%, etc.; optionally, the surface tension regulator includes a surfactant. The surface tension regulator can adjust the surface tension of the cleaning medium, prevent bubbles from gathering, and improve the cleaning effect.

[0050] In one embodiment, the cleaning method further comprises controlling the temperature in the cleaning tank within a range of 0 to 100° C. The temperature of the medium in the cleaning tank is controlled within a range of 0 to 100° C. by a temperature control system, for example, 5° C., 10° C., 15° C., 25° C., 35° C., 50° C., 80° C., 100° C., etc. The temperature control system comprises a temperature sensor and a heating / cooling unit, which can monitor and adjust the temperature of the cleaning liquid in real time, enhance the cleaning efficiency and prevent excessive accumulation and rupture of bubbles.

[0051] In one embodiment, the cleaning method further includes real-time monitoring of micro-nano bubble particle size, pressure pulse parameters, radio frequency wave parameters and temperature parameters by a control unit, and automatically adjusting operating parameters such as the frequency and amplitude of the pressure pulse and the frequency of the radio frequency wave based on the monitoring data to ensure the stability and efficiency of the cleaning process.

[0052] In one embodiment, the cleaning method further comprises, after the cleaning is completed, using deionized water to rinse the cleaned solid surface for a second time to remove residual impurities. The flow rate of the rinse liquid (deionized water) is controlled within the range of 0.5 to 2 m / s to ensure that the residues are completely removed. Subsequently, the cleaned solid material is dried in a drying device at a certain temperature and vacuum to obtain a clean product.

[0053] In one embodiment, the cleaning method further comprises recycling the micro-nano bubbles in the cleaning medium by separation technology, and reusing the recycled effective components for the next round of cleaning process to improve resource utilization and reduce operating costs.

[0054] Embodiment 1: The present invention provides a cleaning method for improving the cleanliness of a solid surface, comprising the following steps: S1: Ultrapure water was mixed with the surfactant sodium dodecyl sulfate at a concentration of 0.005 wt%, and oxygen was injected through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 50-150 nm. The gas-liquid ratio was adjusted to 1:10.

[0055] S2: Apply pressure pulses with a periodic frequency of 1.0 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium fluid to 2 Pa, and the circulation flow rate of the cleaning medium to 0.5 m / s to clean the solid surface. The cleaning temperature is controlled at 25°C and the cleaning time is 20 minutes.

[0056] S3: The solid washed in S2 is placed in ultrapure water at 25° C. for rinsing for 10 minutes.

[0057] S4: The rinsed solid is placed in a vacuum drying oven at 70°C and -0.09MPa to dry.

[0058] Embodiment 2: This embodiment uses different gases to prepare nanobubbles to improve the cleanliness of the solid surface, and mainly uses ozone as the gas source.

[0059] S1: Ultrapure water and surfactant polyoxyethylene ether were mixed at a concentration of 0.01 wt%, and ozone was injected through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 60-200 nm. The gas-liquid ratio was adjusted to 1:15.

[0060] S2: Apply pressure pulses with a periodic frequency of 0.5 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium fluid to 5 Pa, and the circulation flow rate of the cleaning medium to 1.1 m / s to clean the solid surface. The cleaning temperature is controlled at 40°C and the cleaning time is 15 minutes.

[0061] S3: The solid washed in S2 is placed in ultrapure water at 45° C. for rinsing for 10 minutes.

[0062] S4: The rinsed solid is placed in a vacuum drying oven at 80°C and -0.09 MPa to dry.

[0063] Embodiment three: This embodiment uses different gases to prepare nanobubbles, and uses non-ionic surfactants to increase solid surfactants. The gas source used is carbon dioxide.

[0064] S1: Ultrapure water and non-ionic surfactant are mixed, the concentration of the surfactant is 0.0001 wt%, carbon dioxide is injected through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 10-50 nm, and the gas-liquid ratio is adjusted to 1:7.

[0065] S2: Apply pressure pulses with a periodic frequency of 0.2 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium fluid to 0.5 Pa, and the circulation flow rate of the cleaning medium to 0.1 m / s to clean the solid surface. The cleaning temperature is controlled at 50°C and the cleaning time is 10 minutes.

[0066] S3: The solid washed in S2 is placed in ultrapure water at 50° C. for rinsing for 10 minutes.

[0067] S4: The rinsed solid was placed in a vacuum drying oven at 35°C to dry.

[0068] Table 1: Cleaning effect of each embodiment As mentioned above, the solid surface cleaning method provided by this application, which combines micro-nano bubbles with pressure pulse and radio frequency technology, aims to significantly improve the cleaning efficiency and effect by optimizing the generation, distribution and stability of bubbles, and accurately controlling the interaction between micro-nano bubbles and pressure pulse and radio frequency. This method is particularly suitable for efficient and uniform cleaning of precision surfaces such as electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relics surfaces, precision mechanical parts and medical devices, and overcomes the problems of uneven bubble generation, poor stability and inaccurate pressure pulse control in the prior art.

[0069] See also Figure 1 , Figure 1 The cross-sectional structure diagram of a cleaning device according to one or more embodiments of the present application. The present application provides a cleaning device for improving the cleanliness of a solid surface, the cleaning device comprising a cleaning tank 10, a pressure pulse generating device 20, a radio frequency excitation device 30 and a reflux device 40, wherein: The cleaning tank 10 is used to accommodate cleaning medium and devices to be cleaned. The cleaning tank 10 includes a medium inlet 101 and a medium outlet 102. The medium inlet 101 is used to connect the cleaning medium. The cleaning medium includes a mixture of cleaning liquid and gas. The cleaning gas exists in the cleaning medium in the form of micro-nano bubbles. The particle size of the micro-nano bubbles ranges from 10 to 200 nanometers.

[0070] The pressure pulse generating device 20 is connected to the cleaning tank 10 and is used to apply periodic pressure pulses to the cleaning medium in the cleaning tank 10. The frequency range of the pressure pulses is 0.1 to 2 Hz.

[0071] The radio frequency excitation device 30 is disposed outside the cleaning tank 10 and is used to apply radio frequency waves with a frequency range of 1-10 MHz into the cleaning tank 10 .

[0072] The reflux device 40 includes a reflux pipe 401 , which is connected to the medium inlet 101 and the medium outlet 102 , respectively. The reflux device 40 is used to adjust the circulation of the cleaning medium in the cleaning tank 10 to clean the solid surface.

[0073] In one embodiment, the inner surface of the cleaning tank 10 is covered with an anti-corrosion coating to extend the service life of the cleaning tank 10 and maintain the stability of the cleaning process. The material of the cleaning tank 10 can be selected from high-strength titanium alloy or corrosion-resistant stainless steel to adapt to different cleaning environments and media.

[0074] In one embodiment, the pressure pulse generating device 20 generates periodic pressure pulses with an amplitude range of 0.1-2 MPa through a hydraulic drive device. Specifically, the pressure pulse generating device 20 generates pulses with a pressure amplitude of 0.1 to 2 MPa through a high-precision hydraulic control system.

[0075] In one embodiment, the RF excitation device 30 uses a multi-frequency resonance mode to dynamically adjust the frequency of the RF wave to adapt to the change in the particle size of the bubbles. The RF excitation device 30 is used to further stimulate the resonance of the micro-nano bubbles. When the particle size of the micro-nano bubbles changes, the resonance frequency will also change. The RF excitation device 30 uses a multi-frequency resonance technology to dynamically adjust the frequency during the cleaning process to adapt to the change in the particle size of the bubbles, so as to achieve continuous resonance and enhance the cleaning effect.

[0076] In one embodiment, the reflux device 40 includes a dynamic fluid shearing device, including a rotatable blade and a regulating valve, for generating a continuously adjustable shear stress, and controlling the shear stress of the fluid in the cleaning tank to be 0.1 to 10 Pa. The shear stress of the fluid in the cleaning tank is controlled by the dynamic fluid shearing device to peel off particles attached to the solid surface and enhance the cleaning effect.

[0077] In one embodiment, the reflux device 40 includes a reflux pipe 401 and a fluid pump (not shown), the reflux pipe 401 is connected to the cleaning tank 10, and the reflux device 40 is used to circulate the cleaning medium in the cleaning tank 10 to form a stable flow field. The fluid pump can be a fluid pump with adjustable flow rate, which is used to control the fluid flow field in the cleaning tank. Among them, the flow velocity of the cleaning medium can be controlled in the range of 0.01 to 2 m / s. The formation of the flow field ensures that the liquid medium is evenly distributed by adjusting the flow velocity and flow rate, so that the liquid medium is fully in contact with the solid surface, thereby enhancing the cleaning effect and improving the cleaning efficiency.

[0078] The reflux system uses a Grundfos UP15-42F pump with variable frequency control function to ensure the stability of the flow field and the uniform distribution of the liquid medium.

[0079] In one embodiment, the cleaning equipment also includes an input device, which includes a micro-nano bubble generating device. The input device introduces gas into the cleaning liquid through the micro-nano bubble generating device, uses a forced mixing method to fully contact the cleaning liquid, generates micro-nano bubbles with a particle size range of 10 to 200 nanometers, and inputs the mixed cleaning medium into the cleaning tank.

[0080] The micro-nano bubbles are generated by a multiphase flow injection module of a bubble excitation device, and the bubble excitation device further includes a gas mixing module for alternately introducing oxygen, nitrogen and inert gas to enhance the cleaning performance.

[0081] In one embodiment, the cleaning device further comprises a temperature control system, which comprises a temperature sensor and a heating / cooling unit, for controlling the temperature of the cleaning liquid within a range of 0 to 100°C. The system can accurately adjust the temperature to prevent excessive accumulation and rupture of bubbles and improve cleaning efficiency. The accuracy of the temperature control module is controlled within ±0.5°C to ensure temperature stability and controllability.

[0082] In one embodiment, the cleaning device further comprises a control unit, which is electrically connected to the micro-nano bubble generator, the pressure pulse generator, the radio frequency excitation device, the reflux device and the temperature control system, and is used to monitor the bubble particle size, pressure pulse parameters, radio frequency wave parameters and temperature parameters, and automatically adjust the equipment operation parameters based on the monitoring data. The control unit adopts an artificial intelligence-based adjustment algorithm, which can optimize the pressure pulse frequency, amplitude and radio frequency resonance frequency in real time according to the cleaning object, to ensure the efficiency and stability of the cleaning process.

[0083] In one embodiment, the cleaning equipment further comprises a deionized water system, which is used for secondary rinsing after cleaning to ensure the final cleanliness of the surface of the solid material. The deionized water system adopts the Arium® series ultrapure water system of Sartorius of Germany to ensure the provision of high-quality ultrapure water and meet strict water quality requirements.

[0084] In one embodiment, the cleaning device further comprises a centrifugal separation device, which is used to recover micro-nano bubbles from the cleaning liquid after the cleaning process is completed. The device can separate bubbles with a diameter less than 200 nanometers and return them to the micro-nano bubble generating device to achieve bubble reuse, improve resource utilization, and reduce operating costs.

[0085] In one embodiment, the cleaning device further comprises a drying device, which is used to dry the cleaned solid material, with the temperature controlled at 60 to 80° C., the vacuum degree controlled at -0.08 to -0.1 MPa, and the drying time being 6 to 12 hours. The lining material of the drying device is made of stainless steel and DuPont PTFE to ensure durability and corrosion resistance.

[0086] The solid surface cleaning method and corresponding cleaning equipment provided by the present application, which combine micro-nano bubbles with pressure pulses and radio frequency resonance technology, are intended to significantly improve the cleaning efficiency and effect by optimizing the generation, distribution and stability of bubbles, and accurately controlling the interaction between pressure pulses, radio frequency technology and bubbles. The invention is particularly suitable for efficient and uniform cleaning of precision surfaces such as electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relics surfaces, precision mechanical parts, and medical device surfaces, overcoming the problems of uneven bubble generation, poor stability, and inaccurate ultrasonic control in the prior art. The above is only an implementation method of the present application, and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are similarly included in the patent protection scope of the present application.

Claims

1. A cleaning method for improving the cleanliness of a solid surface, characterized in that: The cleaning method comprises: Injecting a cleaning medium into the cleaning tank, the cleaning medium comprising micro-nano bubbles, wherein the particle size of the micro-nano bubbles ranges from 10 to 200 nanometers; Applying periodic pressure pulses to the cleaning medium in the cleaning tank, wherein the frequency of the pressure pulses is 0.1-2.0 Hz, so as to induce oscillation of the surface interface of the micro-nano bubbles; Applying radio frequency waves in the frequency range of 1-10 MHz into the cleaning tank to excite the resonance of the micro-nano bubbles; The cleaning medium is adjusted to circulate in the cleaning tank to clean the solid surface.

2. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The method further comprises: The gas-liquid ratio in the cleaning tank is adjusted to be between 1:5 and 1:

20.

3. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The method further comprises: Controlling the shear stress of the fluid in the cleaning tank to be 0.1-10 Pa; and / or The amplitude range of the periodic pressure pulse is 0.1-2 MPa.

4. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The method further comprises: During the cleaning process, the frequency of the radio frequency wave is dynamically adjusted using multi-frequency resonance technology to adapt to changes in the particle size of the bubbles.

5. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The method further comprises: During the cleaning process, micro-nano bubbles formed by alternately introducing different gases; and / or The gas includes one or more of oxygen, ozone, nitrogen, carbon dioxide or inert gas.

6. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The cleaning medium also includes a surface tension regulator, which is used to reduce the surface tension of the solution. The concentration of the surface tension regulator is 0.0005-0.05 wt %; Optionally, the surface tension modifier comprises a surfactant.

7. The cleaning method for improving the cleanliness of a solid surface according to claim 1, characterized in that: The method is used for cleaning electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relic surfaces, precision mechanical parts, and medical device surfaces.

8. A cleaning device for improving the cleanliness of a solid surface, characterized in that: The cleaning equipment comprises: A cleaning tank, used to contain a cleaning medium and a device to be cleaned, the cleaning tank comprising a medium inlet and a medium outlet, the medium inlet being used to receive a cleaning medium, the cleaning medium comprising micro-nano bubbles, the particle size of the micro-nano bubbles being in the range of 10-200 nanometers; a pressure pulse generating device, connected to the cleaning tank, for applying periodic pressure pulses to the cleaning medium in the cleaning tank, wherein the frequency range of the pressure pulses is 0.1-2 Hz; A radio frequency excitation device, disposed outside the cleaning tank, for applying radio frequency waves with a frequency range of 1-10 MHz into the cleaning tank; The reflux device comprises a reflux pipe, wherein the reflux pipe is connected to the medium inlet and the medium outlet respectively, and the reflux device is used to adjust the circulation of the cleaning medium in the cleaning tank to clean the solid surface.

9. The cleaning device for improving the cleanliness of a solid surface according to claim 8, characterized in that: The reflux device comprises: The dynamic fluid shearing device comprises a rotatable blade and a regulating valve, which is used to generate a continuously adjustable shearing stress and control the shearing stress of the fluid in the cleaning tank to be 0.1-10 Pa.

10. The cleaning device for improving the cleanliness of a solid surface according to claim 8, characterized in that: The cleaning device also includes: A micro-nano bubble generating device comprises a gas mixing module, and the gas mixing module is used for alternately introducing different gases to form various micro-nano bubbles.

11. The cleaning device for improving the cleanliness of a solid surface according to claim 8, characterized in that: The pressure pulse generating device generates periodic pressure pulses with an amplitude range of 0.1-2 MPa through a hydraulic drive device; and / or The radio frequency excitation device adopts a multi-frequency resonance mode to dynamically adjust the frequency of the radio frequency wave to adapt to the change in the particle size of the bubble.

12. The cleaning device for improving the cleanliness of a solid surface according to claim 8, characterized in that: The cleaning device also includes: A temperature control system, comprising a temperature sensor and a heating / cooling unit, for controlling the temperature of the cleaning medium within a range of 0 to 100° C.; and / or A control unit is electrically connected to the micro-nano bubble generating device, the pressure pulse generating device, the radio frequency excitation device, the reflux device and the temperature control system, and is used to monitor the micro-nano bubble particle size, pressure pulse parameters, radio frequency wave parameters and temperature parameters, and automatically adjust the equipment operation parameters based on the monitoring data.

13. The cleaning device for improving the cleanliness of a solid surface according to claim 8, characterized in that: The cleaning device also includes: A centrifugal separation device is used to recycle the micro-nano bubbles in the cleaning medium; and / or the cleaning tank is made of high-strength titanium alloy or corrosion-resistant stainless steel.

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