Magnetron target structure and magnetron sputtering equipment

Abstract

The invention belongs to the technical field of magnetron sputtering coating, and particularly relates to a magnetron target structure and magnetron sputtering equipment. The magnetic control target structure comprises inner magnetic steel and outer magnetic steel, the inner magnetic steel is arranged in the center of the outer magnetic steel, the inner magnetic steel is composed of a first inner magnetic ring and a first outer magnetic ring arranged on the first inner magnetic ring in a sleeving mode, and the outer magnetic steel is composed of a second inner magnetic ring and a second outer magnetic ring arranged on the second inner magnetic ring in a sleeving mode. Wherein the polarities of the first inner magnetic ring and the first outer magnetic ring are opposite, the polarities of the first inner magnetic ring and the second inner magnetic ring are the same, and the polarities of the first outer magnetic ring and the second outer magnetic ring are the same. The magnetic control target is low in cost and simple in structure, is not influenced by the size of equipment, and can directly replace and upgrade an old-structure magnetic control target on original equipment; when the magnetron sputtering target material is used on magnetron sputtering equipment, the utilization rate of the magnetron sputtering target material can be effectively improved, so that the operation cost of the magnetron sputtering equipment is greatly reduced.

Description

Technical Field

[0001] The invention belongs to the technical field of magnetron sputtering coating, and in particular relates to a magnetron target structure and a magnetron sputtering device. Background Art

[0002] Magnetron sputtering is a type of physical vapor deposition (PVD). General sputtering can be used to prepare a variety of materials such as metals, semiconductors, insulators, etc., and has the advantages of simple equipment, easy control, large film locking area and strong adhesion. The magnetron sputtering method developed in the 1970s has achieved high speed, low temperature and low damage. Since the magnetron sputtering method performs high-speed sputtering under low pressure, the ionization rate of the gas must be effectively increased. Usually, magnetron sputtering introduces a magnetic field on the surface of the target cathode and uses the magnetic field to confine the charged particles to increase the plasma density and increase the sputtering rate.

[0003] However, the utilization rate of the target material in the prior art is not high (<30%), especially when precious metal targets are used, which leads to a huge waste of costs and makes the operating cost of the magnetron sputtering equipment remain high. Summary of the invention

[0004] The purpose of the present invention is to provide a magnetron target structure and a magnetron sputtering device to solve the technical problem of low utilization rate of magnetron sputtering target materials.

[0005] In a first aspect, the present invention provides a magnetron target structure, comprising an inner magnetic steel and an outer magnetic steel, wherein the inner magnetic steel is arranged at the center of the outer magnetic steel, the inner magnetic steel is composed of a first inner magnetic ring and a first outer magnetic ring with an outer sleeve on the first inner magnetic ring, and the outer magnetic steel is composed of a second inner magnetic ring and a second outer magnetic ring with an outer sleeve on the second inner magnetic ring, wherein the first inner magnetic ring and the first outer magnetic ring have opposite polarities, the first inner magnetic ring and the second inner magnetic ring have the same polarity, and the first outer magnetic ring and the second outer magnetic ring have the same polarity.

[0006] The above-mentioned arrangement of magnetic steel is not only conducive to the formation of the optimal magnetic field, effectively improving the utilization rate of magnetron sputtering targets, thereby greatly reducing the operating cost of magnetron sputtering equipment, but also the shape of the magnetic steel arrangement can be adjusted according to the shape of the magnetron target. It has low cost, simple structure, and is not affected by the size of the equipment. It can directly replace and upgrade the old structure magnetron target on the original equipment.

[0007] Furthermore, it also includes a protective cover and a pole shoe, wherein the protective cover covers the inner magnetic steel and the outer magnetic steel, the lower end of the protective cover and the pole shoe are fixedly connected to form a closed cavity, and the inner magnetic steel and the outer magnetic steel are embedded in the pole shoe.

[0008] By fixing the protective cover and the pole shoe together to form a closed cavity, the inner and outer magnetic steels are prevented from being corroded by direct contact with cooling water, which can extend the service life of the inner and outer magnetic steels. At the same time, based on the above structural form, a magnetron target for sputtering non-magnetic materials such as aluminum, silver, gold and ceramics is formed.

[0009] Furthermore, it also includes a water cooling jacket and a fixing seat, wherein the water cooling jacket covers the pole shoe and the protective cover and its lower end is connected to the fixing seat, a first sealing ring is arranged between the water cooling jacket and the fixing seat, and the pole shoe is fixed on the fixing seat.

[0010] A sealed space is formed between the water cooling jacket and the fixing seat through the first sealing ring. After the cooling water enters the magnetron target, it flows in the sealed space to cool the magnetron target and extend the service life of the magnetron target.

[0011] Furthermore, it also includes an insulating seat, a target support, a bracket, a shielding cover, a target material, and a target material pressure cover. The fixed seat is fixed on the insulating seat, and the insulating seat is fixed on the target support. A second sealing ring and a third sealing ring are respectively arranged between the upper surface of the insulating seat and the fixed seat, and between the lower surface and the target support. The bracket is arranged on the lower outer sleeve of the target support, and the target support and the bracket are connected by bolts. The shielding cover is covered on the water cooling jacket and its lower end is threadedly connected to the upper part of the target support. The target material pressure cover is fixed on the water cooling jacket, and the target material is fixed between the target material pressure cover and the water cooling jacket.

[0012] The shielding cover can provide protection for the various components inside the magnetron target; the shielding cover and the target support can be connected by threads or other means, and the distance between the shielding cover and the target material cover can be adjusted by threads to cover the entire charged part of the target head to prevent discharge; the bracket can easily realize the connection between the magnetron target and the magnetron sputtering equipment, so as to facilitate the installation and use of the magnetron target. The insulating seat is a heat-resistant insulating material that can be used under vacuum, which plays an insulating role between the fixed seat and the target support; in addition, since the water-cooling jacket, fixed seat, insulating seat, and target support are arranged from top to bottom in sequence and connected by screws during the specific implementation, the pole shoe and the fixed seat are both charged during operation. In order to avoid discharge between the screws and the pole shoe and the fixed seat, an insulating cap is used to plug between the two to play an insulating role.

[0013] Furthermore, a terminal is fixed on the bottom of the pole shoe, a water inlet nozzle and a water return nozzle are connected to the fixing seat, and a central hole is opened on the insulating seat, the target support seat and the bracket seat.

[0014] A central hole is opened on the insulating seat, the target support and the bracket to form a channel for connecting pipes and wiring, so that during magnetron sputtering, the power supply is connected to the terminal through the channel through a wire, and the cooling water circulation pipeline is connected to the water inlet nozzle and the water return nozzle through the channel, so that the magnetron target can enter the closed cavity formed by the water cooling jacket and the fixed seat to cool the magnetron target.

[0015] Furthermore, it also includes a water cooling jacket and a pole shoe, the inner magnetic steel and the outer magnetic steel are embedded in the pole shoe, the inner magnetic steel and the outer magnetic steel are embedded in the water cooling jacket, the lower end of the water cooling jacket is fixedly connected to the pole shoe, the upper end surfaces of the inner magnetic steel and the outer magnetic steel are flush with the upper end surface of the water cooling jacket and are exposed, and a cooling channel is formed in the water cooling jacket.

[0016] Based on the above structure, a magnetron target is formed for sputtering magnetic materials such as iron, nickel, etc. Circulating cooling water can be introduced through the cooling channel formed in the water cooling jacket to cool the inner magnetic steel and the outer magnetic steel.

[0017] Furthermore, a first sealing ring is provided between the water cooling jacket and the inner magnetic steel and the outer magnetic steel.

[0018] By setting the first sealing ring, a sealed space can be formed in the cooling water channel of the water cooling jacket and the pole shoe for the circulation of cooling water, while preventing the magnetic steel from being corroded by direct contact with cooling water, thereby extending its service life.

[0019] Furthermore, it also includes an insulating seat, a target support, a bracket, a shielding cover, a target material, and a target material pressure cover. The pole shoe is fixed on the insulating seat, and the insulating seat is fixed on the target support. A second sealing ring and a third sealing ring are respectively arranged between the upper surface of the insulating seat and the pole shoe, and between the lower surface and the target support. The bracket is arranged on the lower outer sleeve of the target support, and the target support and the bracket are connected by bolts. The shielding cover is covered on the water cooling jacket and its lower end is threadedly connected to the upper part of the target support. The target material pressure cover is fixed on the water cooling jacket, and the target material is fixed between the target material pressure cover and the water cooling jacket.

[0020] The shielding cover can provide protection for the various components inside the magnetron target; the shielding cover and the target support can be connected by threads or other means, and the distance between the shielding cover and the target material cover can be adjusted by threads to cover the entire charged part of the target head to prevent discharge; the bracket can easily realize the connection between the magnetron target and the magnetron sputtering equipment, so as to facilitate the installation and use of the magnetron target. The insulating seat is a heat-resistant insulating material that can be used under vacuum, which plays an insulating role between the fixed seat and the target support; in addition, since the water-cooling jacket, pole shoe, insulating seat, and target support are arranged from top to bottom in sequence and connected by screws during the specific implementation, the pole shoe is charged during operation. In order to avoid discharge between the screw and the pole shoe, an insulating cap is inserted between the two to play an insulating role.

[0021] Furthermore, a terminal is fixed at the bottom of the pole shoe, and a water inlet nozzle and a water return nozzle are connected to the pole shoe, and the water inlet nozzle and the water return nozzle are both connected to the cooling channel.

[0022] By setting the terminal, the power supply can be connected to the terminal through the wire during magnetron sputtering, so as to apply voltage to the target material. The cooling water circulation pipeline is connected to the water inlet nozzle and the water return nozzle through the channel, so as to enter the closed cavity formed by the water cooling jacket and the fixing seat to cool the magnetron target, thereby extending the service life of the magnetron target.

[0023] In a second aspect, the present invention provides a magnetron sputtering device based on the above-mentioned magnetron target structure.

[0024] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention is not only low-cost and simple in structure, but also not affected by the size of the equipment, and can directly replace and upgrade the old structure magnetron target on the original equipment.

[0025] 2. By using the present invention on magnetron sputtering equipment, the utilization rate of magnetron sputtering target materials can be effectively improved, thereby greatly reducing the operating cost of the magnetron sputtering equipment, especially the operating cost of production-type equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 A structural schematic diagram of the present invention from one perspective; Figure 2 It is a structural schematic diagram of another perspective of the present invention; Figure 3 A front view of an embodiment of the present invention; Figure 4 for Figure 3 AA section view; Figure 5 A top view of the present invention; Figure 6 A bottom view of the present invention; Figure 7 for Figure 6 BB cross-sectional view; Figure 8 A cross-sectional view of another embodiment of the present invention.

[0027] The names of the components in the figure are: 1. Shielding cover; 2. Target material; 3. Target material gland; 4. Water cooling jacket; 5. Pole shoe; 6. Insulating seat; 7. Terminal post; 8. Water inlet nozzle; 9. Inner magnet; 901. First inner magnetic ring; 902. First outer magnetic ring; 10. Outer magnet; 1001. Second inner magnetic ring; 1002. Second outer magnetic ring; 11. Protective cover; 12. Fixed seat; 13. Water return nozzle; 14. Target support; 15. Support seat; 16. First sealing ring; 17. Second sealing ring; 18. Third sealing ring. DETAILED DESCRIPTION

[0028] The present invention is further described below through specific embodiments in conjunction with the accompanying drawings, but the present invention is not limited thereto. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

[0029] Embodiment 1: like Figure 1-Figure 7As shown, an embodiment of the present invention provides a magnetron target structure, which is used for sputtering non-magnetic materials such as aluminum, silver, gold and ceramics, including a shielding cover 1, a target material 2, a target material pressure cover 3, a water cooling jacket 4, a pole shoe 5, an insulating seat 6, a terminal 7, a water inlet nozzle 8, an inner magnetic steel 9, an outer magnetic steel 10, a protective cover 11, a fixed seat 12, a water return nozzle 13, a target support 14, and a bracket 15. The protective cover 11 covers the inner magnetic steel 9 and the outer magnetic steel 10, and the lower end of the protective cover 11 is fixedly connected to the pole shoe 5 to form a closed The inner magnetic steel 9 and the outer magnetic steel 10 are embedded in the pole shoe 5, and the water cooling jacket 4 covers the pole shoe 5 and the protective cover 11, and its lower end is connected to the fixing seat 12. A first sealing ring 16 is arranged between the water cooling jacket 4 and the fixing seat 12, and a first sealing ring 16 is arranged between the water cooling jacket 4 and the fixing seat 12. The sealing ring 16 forms a sealed space, and cooling water flows in the sealed space after entering the magnetron target to cool the magnetron target and extend the service life of the magnetron target; the pole shoe 5 is fixed on the fixing seat 12, the fixing seat 12 is fixed on the insulating seat 6, the insulating seat 6 is fixed on the target support 14, and a second sealing ring 17 and a third sealing ring 18 are respectively arranged between the upper surface of the insulating seat 6 and the fixing seat 12 and between the lower surface and the target support 14, and the bracket is arranged on the lower outer shell of the target support 14 15, and the target support 14 and the bracket 15 are connected by locking bolts, the shielding cover 1 covers the water cooling jacket 4 and its lower end is threadedly connected to the upper part of the target support 14, the target material pressure cover 3 is fixed on the water cooling jacket 4, the target material 2 is fixed between the target material pressure cover 3 and the water cooling jacket 4, a terminal 7 is fixed at the bottom of the pole shoe 5, a water inlet nozzle 8 and a water return nozzle 13 are connected to the fixing seat 12, and a center hole is opened on the insulating seat 6, the target support 14, and the bracket 15.

[0030] In this example, the inner magnetic steel 9 is arranged at the center of the outer magnetic steel 10, and the inner magnetic steel 9 is composed of a first inner magnetic circle 901 and a first outer magnetic circle 902 which is sleeved on the first inner magnetic circle 901, and the outer magnetic steel 10 is composed of a second inner magnetic circle 1001 and a second outer magnetic circle 1002 which is sleeved on the second inner magnetic circle 1001, wherein the first inner magnetic circle 901 and the first outer magnetic circle 902 have opposite polarities, the first inner magnetic circle 901 and the second inner magnetic circle 1001 have the same polarity, and the first outer magnetic circle 902 and the second outer magnetic circle 1002 have the same polarity.

[0031] It can be understood that when the polarity of the first inner magnetic circle 901 is N, the polarity of the first outer magnetic circle 902 is S, and accordingly, the polarity of the second inner magnetic circle 1001 is N, and the polarity of the second outer magnetic circle 1002 is S; when the polarity of the first inner magnetic circle 901 is S, the polarity of the first outer magnetic circle 902 is N, and accordingly, the polarity of the second inner magnetic circle 1001 is S, and the polarity of the second outer magnetic circle 1002 is N.

[0032] Therefore, the above-mentioned arrangement of magnetic steel is not only conducive to the formation of the optimal magnetic field, effectively improving the utilization rate of magnetron sputtering target materials, thereby greatly reducing the operating cost of magnetron sputtering equipment, but also the shape of the magnetic steel arrangement can be adjusted according to the shape of the magnetron target. It has low cost, simple structure, and is not affected by the size of the equipment. It can directly replace and upgrade the old structure magnetron target on the original equipment.

[0033] In this example, the shielding cover 1 can provide protection for the various components inside the magnetron target; the shielding cover 1 and the target support 14 can be connected by threads or other means, and the distance between the shielding cover 1 and the target material pressure cover 3 can be adjusted by threads to cover the entire charged part of the target head to prevent discharge; the bracket 15 can conveniently realize the connection between the magnetron target and the magnetron sputtering equipment, so as to facilitate the installation and use of the magnetron target. The insulating seat 6 is a heat-resistant insulating material that can be used under vacuum, which plays an insulating role between the fixed seat 12 and the target support 14; in addition, since the water cooling jacket 4, the fixed seat 12, the insulating seat 6, and the target support 14 are arranged from top to bottom in sequence and connected by screws during the specific implementation, the pole shoe 5 and the fixed seat 12 are both charged during operation. In order to avoid discharge between the screws and the pole shoe 5 and the fixed seat 12, an insulating cap is used to plug between the two to play an insulating role. Finally, a central hole is opened on the insulating seat 6, the target support 14, and the bracket 15 to form a channel for connecting pipes and wiring, so that during magnetron sputtering, the power supply is connected to the terminal 7 through a wire through the channel, and the cooling water circulation pipeline is connected to the water inlet nozzle 8 and the water return nozzle 13 through the channel, so that the magnetron target enters the closed cavity formed by the water cooling jacket 4 and the fixed seat 12 to cool the magnetron target.

[0034] In this embodiment, the shielding cover 1 is a hollow cylindrical structure, the upper part of which is covered on the target material pressure cover 3, the water cooling jacket 4, the pole shoe 5, the insulating seat 6, and the fixed seat 12, and the inner wall of the lower part and the outer wall of the target support 14 are connected by threads or other means, and a through hole is formed in the top center of the shielding cover 1 to expose the target material 3.

[0035] A limiting step is formed at the top of the target material pressure cover 3 to limit the target material 2. The height of the limiting step is consistent with the thickness of the target material 2. The target material pressure cover 3 is covered on the supporting protrusion formed on the top of the water cooling jacket 4. The water cooling jacket 4 is made of pure copper, and a support protrusion is formed at the top center thereof to match the target material pressure cover 3. The water cooling jacket 4 is provided with a groove for fixing the first sealing ring 16, and a corresponding sealing surface is provided on the fixing seat 12. The sealing surface and the first sealing ring 16 match to seal the cooling water in the magnetron target; The pole shoe 5 is made of pure iron material, and is provided with mounting grooves for mounting the inner magnetic steel 9 and the outer magnetic steel 10; The insulating seat 6 is an annular structure, and a limiting protrusion is formed at its bottom and inserted into the central hole of the target support 14 below the device, so as to facilitate the assembly and production of the insulating seat 6; The first inner magnetic circle 901 of the inner magnetic steel 9 is a columnar structure, and the annular first outer magnetic circle 902 is tightly wrapped on the outer wall of the first inner magnetic circle 901 to form a layered columnar structure. In addition, the annular second inner magnetic circle 1001, the second outer magnetic circle 1002 and the first inner magnetic circle 901 are coaxially arranged, and the outer wall of the second inner magnetic circle 1001 and the inner wall of the second outer magnetic circle 1002 are in contact, which is conducive to forming an optimal magnetic field to improve the utilization rate of the target material 2. Of course, in the specific implementation process, the arrangement shape of the magnetic steel can be adjusted according to the shape of the magnetron target; The cross section of the protective cover 11 is in a mountain shape, and its bottom is fixedly connected to the pole shoe 5 to form a closed cavity, so as to seal the inner magnetic steel 9 and the outer magnetic steel 10 in the closed cavity, thereby preventing the magnetic steel from contacting the cooling water; The top of the fixing seat 12 is formed with a positioning groove for positioning the pole shoe 5, and the bottom thereof is fixedly connected to the insulating seat 6. A groove for fixing the second sealing ring 17 is formed at the bottom of the fixing seat 12, and a sealing surface matching the second sealing ring 17 is formed on the insulating seat 6. A limited position protrusion is formed at the bottom center of the fixing seat 12 and inserted into the center hole of the insulating seat 6 below, so as to facilitate the assembly and production of the fixing seat 12; The target support 14 has a receiving cavity formed at its center, in which the terminal 7, the water inlet nozzle 8 and the water return nozzle 13 are accommodated. The outer edge of the upper end of the target support 14 extends outward to form a connecting convex edge, on which screws are passed. The screws pass through the insulating seat 6 and the fixing seat 12 located above the target support 14 in sequence and then are threadedly connected to the bottom of the water cooling jacket. An insulating sleeve is provided on the screw. A groove for installing the third sealing ring 18 is formed on the upper surface of the connecting convex edge of the target support 14, and a sealing surface matching the third sealing ring 18 is formed at the bottom of the sealing seat 6. A central hole is provided at the bottom of the target support 14, and the size of the central hole is handed down from top to bottom. A mounting step for realizing the matching mounting of the magnetron target and the magnetron sputtering equipment is formed at the bottom of the central hole, and a plurality of screw holes are distributed on the upper shaft of the mounting step.

[0036] The bracket 15 is a T-shaped ring structure. Figure 4 and Figure 7As shown, its transverse portion is located below the connecting protrusion of the target support 14 to cooperate with the protective cover 1 to achieve the sealing of the head of the screw, and its vertical portion is circumferentially provided with multiple locking bolts, and the bracket 15 is connected to the lower part of the target support 14 through the locking bolts.

[0037] In addition, an embodiment of the present invention further provides a magnetron sputtering device based on the above magnetron target structure for sputtering non-magnetic materials such as aluminum, silver, gold and ceramics.

[0038] Embodiment 2: like Figure 1-Figure 3 , Figure 5-Figure 6 And attached Figure 8 As shown, the embodiment of the present invention provides a magnetron target structure, which is used for sputtering magnetic materials such as iron and nickel. The difference from embodiment 1 is that the specific structure includes: a shielding cover 1, a target material 2, a target material pressure cover 3, a water cooling jacket 4, a pole shoe 5, an insulating seat 6, a terminal 7, a water inlet nozzle 8, an inner magnetic steel 9, an outer magnetic steel 10, a water return nozzle 13, a target support 14, and a bracket 15. The inner magnetic steel 9 and the outer magnetic steel 10 are embedded in the pole shoe 5. The inner magnetic steel 9 and the outer magnetic steel 10 are arranged in the water cooling jacket 4, and the lower end of the water cooling jacket 4 is fixedly connected to the pole shoe 5. The upper end surfaces of the inner magnetic steel 9 and the outer magnetic steel 10 are flush with the upper end surface of the water cooling jacket 4 and are exposed. A cooling channel is formed in the water cooling jacket 4, and circulating cooling water can be introduced through the cooling channel formed in the water cooling jacket 4 to cool the inner magnetic steel 9 and the outer magnetic steel 10. A first sealing ring 16 is arranged between the water cooling jacket 4 and the inner magnetic steel 9 and the outer magnetic steel 10. By setting the first sealing ring 16, The cooling water channel of the water-cooling jacket 4 and the pole shoe 5 form a sealed space for the circulation of cooling water, while preventing the magnetic steel from being corroded by direct contact with the cooling water, thereby extending its service life; the pole shoe 5 is fixed on the insulating seat 6, and the insulating seat 6 is fixed on the target support 14. A second sealing ring 17 and a third sealing ring 18 are respectively arranged between the upper surface of the insulating seat 6 and the pole shoe 5, and between the lower surface and the target support 14. The bracket 15 is arranged on the lower outer sleeve of the target support 14, and the target support 14 is provided with a second sealing ring 17 and a third sealing ring 18. The support 14 and the bracket 15 are connected by locking bolts, the shielding cover 1 covers the water cooling jacket 4 and the lower end thereof is threadedly connected to the upper part of the target support 14, the target material pressure cover 3 is fixed on the water cooling jacket 4, the target material 2 is fixed between the target material pressure cover 3 and the water cooling jacket 4, a terminal 7 is fixed at the bottom of the pole shoe 5, and a water inlet nozzle 8 and a water return nozzle 13 are connected to the pole shoe 5, and the water inlet nozzle 8 and the water return nozzle 13 are both connected to the cooling channel.

[0039] Based on the above structure, the shielding cover 1 can provide protection for each component inside the magnetron target; the shielding cover 1 and the target support 14 can be connected by threads or other means, and the distance between the shielding cover 1 and the target material pressure cover 3 can be adjusted by threads to cover the entire charged part of the target head to prevent discharge; the bracket 15 can conveniently realize the connection between the magnetron target and the magnetron sputtering equipment, so as to facilitate the installation and use of the magnetron target. The insulating seat 6 is a heat-resistant insulating material that can be used under vacuum, which plays an insulating role between the fixed seat 12 and the target support 14; in addition, since the water cooling jacket 4, the pole shoe 5, the insulating seat 6, and the target support 14 are arranged from top to bottom in sequence and connected by screws during the specific implementation, the pole shoe 5 is charged during operation. In order to avoid discharge between the screw and the pole shoe 5, an insulating cap is used to plug between the two to play an insulating role; through the setting of the terminal 7, it is convenient to connect the power supply to the terminal 7 through a wire during magnetron sputtering, so as to apply voltage to the target. The cooling water circulation pipeline is connected to the water inlet nozzle 8 and the water return nozzle 13 through the channel, so that the cooling water enters the closed cavity formed by the water cooling jacket 4 and the fixing seat 12 to cool the magnetron target, thereby extending the service life of the magnetron target.

[0040] In this example, the inner magnetic steel 9 is arranged at the center of the outer magnetic steel 10, and the inner magnetic steel 9 is composed of a first inner magnetic circle 901 and a first outer magnetic circle 902 which is sleeved on the first inner magnetic circle 901, and the outer magnetic steel 10 is composed of a second inner magnetic circle 1001 and a second outer magnetic circle 1002 which is sleeved on the second inner magnetic circle 1001, wherein the first inner magnetic circle 901 and the first outer magnetic circle 902 have opposite polarities, the first inner magnetic circle 901 and the second inner magnetic circle 1001 have the same polarity, and the first outer magnetic circle 902 and the second outer magnetic circle 1002 have the same polarity.

[0041] It can be understood that when the polarity of the first inner magnetic circle 901 is N, the polarity of the first outer magnetic circle 902 is S, and accordingly, the polarity of the second inner magnetic circle 1001 is N, and the polarity of the second outer magnetic circle 1002 is S; when the polarity of the first inner magnetic circle 901 is S, the polarity of the first outer magnetic circle 902 is N, and accordingly, the polarity of the second inner magnetic circle 1001 is S, and the polarity of the second outer magnetic circle 1002 is N.

[0042] In this example, the structures of the shielding cover 1, the target pressure cover 3, the pole shoe 5, the insulating seat 6, the target support 14, and the bracket 15 are consistent with those of the shielding cover 1, the target pressure cover 3, the pole shoe 5, the insulating seat 6, the target support 14, and the bracket 15 in Example 1. The water cooling jacket 4 is different in structure from the water cooling jacket 4 in Example 1, in that the water cooling jacket 4 and the pole shoe 5 in this example are fixed together, while the inner magnetic steel 9 and the outer magnetic steel 10 are embedded in the water cooling jacket, and grooves of appropriate size are processed in the water cooling jacket 4 to form a cooling water channel so that cooling water circulates to cool the magnetron target. In addition, the positions of the water inlet nozzle 8 and the water return nozzle 13 correspond to the sealed cavity formed between the water cooling jacket 4 and the pole shoe 5, so that the cooling water enters the sealed space through the water nozzle and circulates to cool the magnetron target. In addition, the water cooling jacket 4 is provided with a groove for fixing the first sealing ring 16, and a corresponding sealing surface is provided on the pole shoe 5, and the sealing surface cooperates with the first sealing ring 16 to seal the cooling water in the magnetron target.

[0043] In addition, an embodiment of the present invention further provides a magnetron sputtering device based on the above magnetron target structure for sputtering magnetic materials such as iron, nickel, etc.

[0044] In summary, the present invention adopts the above-mentioned magnetic steel arrangement method, which is not only conducive to the formation of the optimal magnetic field, effectively improving the utilization rate of the magnetron sputtering target, thereby greatly reducing the operating cost of the magnetron sputtering equipment, but also the magnetic steel arrangement shape can be adjusted according to the shape of the magnetron target. It has low cost and simple structure, is not affected by the size of the equipment, and can directly replace and upgrade the old structure magnetron target on the original equipment.

[0045] The technical solution provided by the present invention is described in detail above. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. It should be pointed out that for ordinary technicians in this technical field, without departing from the principle of the present invention, the present invention can also be improved and modified in a number of ways, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.

Claims

1. A magnetron target structure, comprising an inner magnetic steel (9) and an outer magnetic steel (10), characterized in that: The inner magnetic steel (9) is arranged at the center of the outer magnetic steel (10), the inner magnetic steel (9) is composed of a first inner magnetic ring (901) and a first outer magnetic ring (902) which is coated on the first inner magnetic ring (901), and the outer magnetic steel (10) is composed of a second inner magnetic ring (1001) and a second outer magnetic ring (1002) which is coated on the second inner magnetic ring (1001), wherein the first inner magnetic ring (901) and the first outer magnetic ring (902) have opposite polarities, the first inner magnetic ring (901) and the second inner magnetic ring (1001) have the same polarity, and the first outer magnetic ring (902) and the second outer magnetic ring (1002) have the same polarity.

2. The magnetron target structure according to claim 1, characterized in that: It also includes a protective cover (11) and a pole shoe (5), wherein the protective cover (11) covers the inner magnetic steel (9) and the outer magnetic steel (10), the lower end of the protective cover (11) and the pole shoe (5) are fixedly connected to form a closed cavity, and the inner magnetic steel (9) and the outer magnetic steel (10) are embedded in the pole shoe (5).

3. The magnetron target structure according to claim 2, characterized in that: It also includes a water cooling jacket (4) and a fixing seat (12), wherein the water cooling jacket (4) covers the pole shoe (5) and the protective cover (11) and its lower end is connected to the fixing seat (12), a first sealing ring (16) is provided between the water cooling jacket (4) and the fixing seat (12), and the pole shoe (5) is fixed on the fixing seat (12).

4. The magnetron target structure according to claim 3, characterized in that: The invention also comprises an insulating seat (6), a target support (14), a bracket (15), a shielding cover (1), a target material (2), and a target material pressure cover (3), wherein the fixed seat (12) is fixed on the insulating seat (6), the insulating seat (6) is fixed on the target support (14), a second sealing ring (17) and a third sealing ring (18) are respectively arranged between the upper surface of the insulating seat (6) and the fixed seat (12) and between the lower surface and the target support (14), the bracket (15) is arranged on the lower outer shell of the target support (14), and the target support (14) and the bracket (15) are connected by bolts, the shielding cover (1) covers the water cooling jacket (4) and the lower end thereof is threadedly connected to the upper part of the target support (14), the target material pressure cover (3) is fixed on the water cooling jacket (4), and the target material (2) is fixed between the target material pressure cover (3) and the water cooling jacket (4).

5. The magnetron target structure according to claim 4, characterized in that: A terminal post (7) is fixed to the bottom of the pole shoe (5), a water inlet nozzle (8) and a water return nozzle (13) are connected to the fixing seat (12), and a central hole is formed on the insulating seat (6), the target support seat (14), and the bracket seat (15).

6. The magnetron target structure according to claim 1, characterized in that: It also includes a water cooling jacket (4) and a pole shoe (5), the inner magnetic steel (9) and the outer magnetic steel (10) being embedded in the pole shoe (5), the inner magnetic steel (9) and the outer magnetic steel (10) being embedded in the water cooling jacket (4), the lower end of the water cooling jacket (4) being fixedly connected to the pole shoe (5), the upper end surfaces of the inner magnetic steel (9) and the outer magnetic steel (10) being flush with and exposed to the upper end surface of the water cooling jacket (4), and a cooling channel being formed in the water cooling jacket (4).

7. The magnetron target structure according to claim 6, characterized in that: A first sealing ring (16) is provided between the water cooling jacket (4) and the inner magnetic steel (9) and the outer magnetic steel (10).

8. The magnetron target structure according to claim 6, characterized in that: The invention also comprises an insulating seat (6), a target support (14), a bracket (15), a shielding cover (1), a target material (2), and a target material pressure cover (3), wherein the pole shoe (5) is fixed on the insulating seat (6), the insulating seat (6) is fixed on the target support (14), a second sealing ring (17) and a third sealing ring (18) are respectively arranged between the upper surface of the insulating seat (6) and the pole shoe (5), and between the lower surface and the target support (14), the bracket (15) is arranged on the lower outer shell of the target support (14), and the target support (14) and the bracket (15) are connected by bolts, the shielding cover (1) covers the water cooling jacket (4) and the lower end thereof is threadedly connected to the upper part of the target support (14), the target material pressure cover (3) is fixed on the water cooling jacket (4), and the target material (2) is fixed between the target material pressure cover (3) and the water cooling jacket (4).

9. The magnetron target structure according to claim 6, characterized in that: A terminal post (7) is fixed to the bottom of the pole shoe (5), and a water inlet nozzle (8) and a water return nozzle (13) are connected to the pole shoe (5), and both the water inlet nozzle (8) and the water return nozzle (13) are connected to the cooling channel.

10. A magnetron sputtering device, characterized in that: The invention comprises the magnetron target structure as described in any one of claims 1 to 9.

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