Device for measuring abrasion loss of narrow-face chamfered copper plate of crystallizer and working method

Abstract

The invention provides a device for measuring the abrasion loss of a narrow-face chamfered copper plate of a crystallizer and a working method, and relates to the technical field of continuous casting, the device comprises a positioning mechanism, a clamping mechanism and a measuring device; the positioning mechanism is a planar substrate with a guide clamping groove; the clamping device is mounted at the tail part of the planar base plate and is used for clamping the narrow-surface chamfering copper plate of the crystallizer placed in the guide clamping groove; and the measuring device is arranged at the side part of the planar substrate and is used for acquiring data for calculating the abrasion loss of the narrow-surface chamfered copper plate of the crystallizer. The narrow-surface chamfering copper plate of the crystallizer is placed on the plane base of the positioning mechanism for positioning, and the positioning mechanism is placed on the measuring platform for use, so that the levelness and flatness of a detection surface are ensured, and the reliability of a measuring result is ensured; through base fixation of the universal rod and adjustment of the universal rod, flexible mobility of the dial indicator is guaranteed, it is guaranteed that the abrasion loss of all points of the copper plate can be measured, and the accuracy of a measurement result is guaranteed through the measurement precision of the dial indicator.

Description

Technical Field

[0001] The invention relates to the technical field of continuous casting, and in particular to a device and a working method for measuring the wear amount of a chamfered copper plate on a narrow surface of a crystallizer. Background Art

[0002] The crystallizer is an important equipment of the continuous casting machine. It is in direct contact with the molten steel. Under the combined effect of the strong cooling of the crystallizer copper plate and the heat transfer of the protective slag, the molten steel gradually solidifies in the crystallizer to form a primary billet shell. As an important component of the continuous casting machine, the degree of wear of the crystallizer copper plate directly affects the uniformity of heat conduction, and thus affects the quality of the casting.

[0003] The wear of the chamfered copper plate on the narrow side of the crystallizer is currently measured manually using a vernier caliper to measure the thickness of the center point of the bottom of the copper plate. However, the wear at other locations, such as the contact between the copper plate and the molten steel surface and the wear at the chamfer of the copper plate, cannot be measured, and therefore cannot provide relevant data for the information model.

[0004] Therefore, the present application proposes a new device and method for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer to solve the above-mentioned problem. Summary of the invention

[0005] According to the above technical problem that the existing technology cannot measure the wear amount on the chamfered position of the copper plate, a device and working method for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer are provided. The present invention mainly measures and provides the wear amount data of each point of the copper plate for use in the continuous casting information model, so as to accurately measure the wear amount of each point of the copper plate on the narrow surface of the crystallizer.

[0006] The technical means adopted by the present invention are as follows:

[0007] A device for measuring the wear amount of a chamfered copper plate on a narrow surface of a crystallizer, comprising a positioning mechanism, a clamping mechanism and a measuring device;

[0008] The positioning mechanism is a flat substrate with a guide slot;

[0009] The clamping mechanism is installed at the tail of the planar substrate and is used to clamp the narrow chamfered copper plate of the crystallizer placed in the guide slot;

[0010] The measuring device is arranged on the side of the planar substrate and is used to obtain data for calculating the wear amount of the chamfered copper plate on the narrow surface of the crystallizer.

[0011] Furthermore, an inner chamfer is arranged in the guide slot, and the chamfered copper plate of the narrow surface of the crystallizer is placed on the flat substrate in the guide slot.

[0012] Furthermore, the clamping mechanism comprises a clamping device bracket, and the clamping device bracket is fixed on the plane base of the positioning mechanism.

[0013] Furthermore, the clamping mechanism further comprises a clamping device, which is a spiral clamping mechanism fixed in a vertical direction by a clamping device bracket, and the clamping devices are arranged in pairs.

[0014] Furthermore, the measuring device comprises a base of a universal rod arranged on a plane base of the positioning mechanism, the base of the universal rod is connected to the head end of the universal rod, and the end of the universal rod is connected to a micrometer.

[0015] The present invention also provides a working method of a device for measuring the wear amount of a chamfered copper plate on a narrow surface of a crystallizer, comprising:

[0016] S1. Before testing, place the positioning mechanism on the measuring platform, place the narrow chamfered copper plate of the crystallizer on the plane base of the positioning mechanism, with the non-chamfered side contacting the plane base, fix the position of the narrow chamfered copper plate of the crystallizer through the guide slot, fix the narrow chamfered copper plate of the crystallizer through the clamping device, locate each point to be tested through the distance measuring tool and mark it on the narrow chamfered copper plate of the crystallizer;

[0017] S2. During the test, move the universal rod and move the dial gauge to the marked test points. The dial gauge rod contacts the chamfered copper plate on the narrow surface of the crystallizer and the dial gauge scale value is recorded.

[0018] The chamfered copper plate on the narrow side of the crystallizer is measured once before and after it goes online. The difference between the two measurements is the wear amount of each point to be measured.

[0019] S3. After inspection, release the clamping device and remove the chamfered copper plate on the narrow surface of the crystallizer from the positioning mechanism.

[0020] Furthermore, for the measurement of the wear amount at the chamfer position of the chamfered copper plate on the narrow surface of the crystallizer, the micrometer scale value a1 is obtained after the first measurement, and the micrometer scale value a2 is obtained after the second measurement. The wear amount of the measured point s=a1-a2.

[0021] Compared with the prior art, the present invention has the following advantages:

[0022] The invention has a simple structure, is easy to install and is simple to operate: since the chamfered copper plate on the narrow side of the crystallizer has a flat surface and the flat surface does not produce wear during the service of the copper plate, the invention places the chamfered copper plate on the narrow side of the crystallizer on a flat base of a positioning mechanism for positioning, and places the positioning mechanism on a measuring platform for use, thereby ensuring the levelness and flatness of the detection surface and the reliability of the measurement result; the invention ensures the flexibility and mobility of the micrometer through the base fixation of the universal rod and the adjustment of the universal rod, ensuring that the wear amount of each point of the copper plate can be measured, and the measurement accuracy of the micrometer ensures the accuracy of the measurement result. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0024] Figure 1 It is the front view of the device in the present invention.

[0025] Figure 2 It is a side view of the device in the present invention.

[0026] Figure 3 It is a top view of the device in the present invention.

[0027] In the figure: 1. Chamfered copper plate on the narrow side of the crystallizer; 2. Positioning mechanism; 3. Guide slot; 4. Clamping device; 5. Clamping device bracket; 6. Base of the universal rod; 7. Universal rod; 8. Micrometer. DETAILED DESCRIPTION

[0028] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0029] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is by no means intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0031] Unless otherwise specifically stated, the relative arrangement of the parts and steps described in these embodiments, the numerical expressions and numerical values ​​do not limit the scope of the present invention. At the same time, it should be clear that, for ease of description, the sizes of the various parts shown in the drawings are not drawn according to the actual proportional relationship. The technology, methods and equipment known to ordinary technicians in the relevant field may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be regarded as part of the authorization specification. In all examples shown and discussed here, any specific value should be interpreted as merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0032] like Figure 1-3 As shown, the present invention provides a device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer, including a positioning mechanism 2, a guide slot 3, a clamping device 4, a clamping device bracket 5, a base 6 of a universal rod arranged on the bottom surface of the positioning mechanism, a universal rod 7 connected to the base 6 of the universal rod, and a micrometer 8 at the end of the universal rod, and the clamping devices 4 are arranged in pairs.

[0033] The main body of the positioning mechanism 2 is a plane base with a guide slot 3. The guide slot 3 is provided with an inner chamfer so that the copper plate and the measuring device will not be damaged by rigid collision when the copper plate is taken or placed.

[0034] The clamping device bracket 5 is fixed on the plane base of the positioning mechanism 2; the clamping device 4 is a spiral clamping mechanism fixed in the vertical direction by the clamping device bracket 5, and is used to manually clamp the placed narrow copper plate of the crystallizer.

[0035] The base 6 of the universal rod is fixed on the plane base of the positioning mechanism 2; the universal rod 7 connects the base 6 and the micrometer 8, so that the micrometer 8 can move freely within the narrow copper plate range of the crystallizer.

[0036] The present invention also provides a method for measuring the wear amount of the chamfered copper plate on the narrow side of the crystallizer, using the above-mentioned device for measuring the wear amount of the chamfered copper plate on the narrow side of the crystallizer, comprising the steps of:

[0037] S1. Before testing, place the positioning mechanism 2 on the measuring platform, place the narrow chamfered copper plate 1 of the crystallizer on the plane base of the positioning mechanism 2, with the non-chamfered side contacting the plane base, fix the position of the copper plate through the guide slot 3, and fix the copper plate through the clamping device 4.

[0038] Use an industrial measuring ruler to determine the center line of the copper plate 1 with chamfered narrow surface of the crystallizer in the length direction, mark point A 15 cm away from the upper edge of the copper plate as the position of the meniscus of the molten steel in the crystallizer, and use chalk to mark point A on the copper plate.

[0039] S2, during the inspection, move the universal rod 7, move the micrometer 8 to point A, and the measuring rod of the micrometer 8 vertically contacts point A on the narrow chamfered copper plate 1 of the crystallizer, and record and obtain the scale value a1 of the micrometer 8. When the narrow chamfered copper plate 1 of the crystallizer is offline after service, repeat step S1 to obtain point A' at the position of the meniscus of the molten steel in the crystallizer. Repeat step S2, measure point A', and record and obtain the scale value a2 of the micrometer 8. It is thus obtained that the meniscus of the molten steel in the crystallizer is at the midline position in the length direction of the copper plate, and the wear amount s = a1-a2.

[0040] S3. After the inspection, release the clamping device 4 and remove the narrow-face chamfered copper plate 1 of the crystallizer from the positioning mechanism 2.

[0041] The device has a simple structure, is easy to install and easy to operate: the present invention ensures the levelness and flatness of the detection surface through a positioning mechanism 2 placed on the measuring platform, and the guide slot 3 and the clamping device 4 ensure that the position of the narrow chamfered copper plate 1 of the crystallizer to be measured is relatively fixed with the positioning mechanism 2, thereby ensuring the reliability of the measurement result; the present invention ensures mobility through a universal rod 7, ensuring that the wear amount of each point of the copper plate can be measured, and the measurement accuracy of the micrometer 8 ensures the accuracy of the measurement result.

[0042] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A device for measuring the wear of the chamfered copper plate on the narrow surface of a crystallizer, characterized in that: It comprises a positioning mechanism (2), a clamping mechanism and a measuring device; The positioning mechanism (2) is a planar substrate with a guide slot (3); The clamping mechanism is installed at the rear of the planar substrate and is used to clamp the narrow-surface chamfered copper plate (1) of the crystallizer placed in the guide slot (3); The measuring device is arranged on the side of the plane substrate and is used to obtain data for calculating the wear amount of the narrow chamfered copper plate (1) of the crystallizer.

2. The device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer according to claim 1 is characterized in that: An inner chamfer is arranged in the guide slot (3), and the narrow-face chamfered copper plate (1) of the crystallizer is placed on a flat substrate in the guide slot (3).

3. The device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer according to claim 1 is characterized in that: The clamping mechanism comprises a clamping device bracket (5), and the clamping device bracket (5) is fixed on a plane base of the positioning mechanism (2).

4. The device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer according to claim 3 is characterized in that: The clamping mechanism further comprises a clamping device (4), wherein the clamping device (4) is a screw clamping mechanism fixed in a vertical direction by a clamping device bracket (5), and the clamping devices (4) are arranged in pairs.

5. The device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer according to claim 1, characterized in that: The measuring device comprises a universal rod base (6) arranged on a plane base of a positioning mechanism (2), the universal rod base (6) being connected to the head end of a universal rod (7), and the end of the universal rod (7) being connected to a micrometer (8).

6. A working method of a device for measuring the wear amount of a copper plate chamfered on a narrow surface of a crystallizer, which is implemented based on the device for measuring the wear amount of a copper plate chamfered on a narrow surface of a crystallizer according to any one of claims 1 to 5, characterized in that: include: S1. Before testing, the positioning mechanism (2) is placed on the measuring platform, the narrow chamfered copper plate (1) of the crystallizer is placed on the plane base of the positioning mechanism (2), with the non-chamfered side contacting the plane base, the position of the narrow chamfered copper plate (1) of the crystallizer is fixed by the guide slot (3), the narrow chamfered copper plate (1) of the crystallizer is fixed by the clamping device (4), and each point to be tested is located by a distance measuring tool and marked on the narrow chamfered copper plate (1) of the crystallizer; S2. During the test, the universal rod (7) is moved to move the micrometer (8) to each marked test point, the measuring rod of the micrometer (8) is in contact with the chamfered copper plate (1) on the narrow surface of the crystallizer, and the scale value of the micrometer (8) is recorded; The narrow chamfered copper plate (1) of the crystallizer is measured once before and after it goes online, and the difference between the two measurements is the wear amount of each point to be measured; S3. After the inspection, release the clamping device (4) and remove the narrow-face chamfered copper plate (1) of the crystallizer from the positioning mechanism (2).

7. The working method of the device for measuring the wear amount of the chamfered copper plate on the narrow surface of the crystallizer according to claim 6 is characterized in that: For measuring the wear amount at the chamfer position of the narrow chamfered copper plate (1) of the crystallizer, the scale value a1 of the micrometer (8) is obtained after the first measurement, and the scale value a2 of the micrometer (8) is obtained after the second measurement, and the wear amount s of the point to be measured is s=a1-a2.

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