An X-ray scattering measurement device, monitoring method and medium

Abstract

An X-ray scattering measurement device includes a collimating monochromator, a monitoring and adjustment system, an X-ray source, and a monitoring detector. The collimating monochromator receives X-rays emitted from the X-ray source and outputs a main X-ray beam and peripheral X-ray beams. The monitoring detector detects the peripheral X-ray beams to obtain their intensity information. The monitoring and adjustment system processes the intensity information to obtain X-ray intensity monitoring data and monitors the X-ray source based on this data. By using the unused peripheral X-ray beams in the measurement optical path as the monitoring target, real-time monitoring of the X-ray source can be achieved without interrupting the measurement process, without any loss of the measurement beam flux. Simultaneously, by judging the state of the X-ray source based on the real-time monitoring results, appropriate adjustment measures can be taken in a timely manner, and anomalies in the measurement results can be located immediately. This facilitates the automated analysis and processing of abnormal measurement results and improves the efficiency of root cause analysis of abnormal measurements.

Description

Technical Field

[0001] This invention relates to the field of optical measurement equipment technology, specifically to an X-ray scattering measurement device, monitoring method, and medium. Background Technology

[0002] Critical Dimension Small Angle X-ray Scattering (CD-SAXS) is a transmission-based, variable-angle X-ray scattering measurement technique that can be used to measure complex periodic structural features on the 1-100 nanometer scale. Taking the measurement of high aspect ratio (HAR) structures in semiconductor devices as an example, the X-ray beam penetrates the semiconductor device and scatters from the HAR structure. By detecting the angular distribution information of the scattered X-rays in the HAR structure, the three-dimensional morphology of the HAR structure can be reconstructed using CD-SAXS analysis algorithms, thereby enabling the measurement of critical dimensions in the lateral and depth directions of the HAR structure.

[0003] Because the X-ray source configured in CD-SAXS metrology equipment needs to have high power and high brightness, the X-ray sources that currently meet these characteristics mainly include synchrotron radiation X-ray sources, liquid metal target X-ray sources, and rotating anode target X-ray sources. Among them, synchrotron radiation X-ray sources are large scientific facilities with extremely high costs for construction and maintenance, making them unsuitable for widespread application in CD-SAXS equipment. Therefore, existing CD-SAXS metrology equipment typically uses liquid metal target X-ray sources or rotating anode target X-ray sources. However, compared to fixed anode target sources, these two types of sources have more complex structures, resulting in poor intensity stability. During the measurement process, the stability of the X-ray source intensity is a key factor in ensuring the accuracy and consistency of the measurement results. Therefore, how to monitor and control the X-ray source has become a technical problem that urgently needs to be solved in the industry. Summary of the Invention

[0004] The main technical problem solved by this invention is to provide an X-ray scattering measurement device, monitoring method and medium that can realize real-time monitoring and adjustment of X-ray source.

[0005] According to a first aspect, one embodiment provides an X-ray scattering measurement device, comprising:

[0006] X-ray source;

[0007] A collimating monochromator is disposed in the X-ray emission path of the X-ray source; the collimating monochromator receives the X-rays emitted by the X-ray source and outputs a main X-ray beam and a peripheral X-ray beam; wherein, the main X-ray beam is used to irradiate the sample to be tested, the main X-ray beam is X-rays output after multiple reflections by the collimating monochromator, and the peripheral X-ray beam is X-rays output after a single reflection by the collimating monochromator and / or without reflection by the collimating monochromator;

[0008] The detection system receives the scattered X-rays formed after the main X-ray beam passes through the sample under test, and outputs the measurement information of the morphology of the sample under test.

[0009] A monitoring detector is positioned in the optical path of the peripheral X-ray beam; the monitoring detector detects the peripheral X-ray beam and outputs the intensity information of the peripheral X-ray beam;

[0010] A monitoring and adjustment system is connected to both the X-ray source and the monitoring detector. The monitoring and adjustment system processes the intensity information to obtain intensity monitoring data of the X-rays and monitors the X-ray source based on the intensity monitoring data.

[0011] In one embodiment, the main X-ray beam is an X-ray emitted from the collimating monochromator after being reflected twice, and the peripheral X-ray beam is an X-ray emitted from the collimating monochromator after being reflected once.

[0012] In one embodiment, the number of monitoring detectors is set to multiple, and each of the multiple monitoring detectors detects a corresponding peripheral X-ray beam.

[0013] In one embodiment, the monitoring and adjustment system sums the photon counts of the peripheral X-ray beams output by at least two of the monitoring detectors, and uses the summation result as the intensity monitoring data to monitor the X-ray source; wherein the intensity information includes the photon count.

[0014] In one embodiment, the monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. If the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

[0015] In one embodiment, the monitoring and adjustment system also compares the intensity monitoring data with a second preset intensity threshold, wherein the second preset intensity threshold is greater than the first preset intensity threshold;

[0016] When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information to adjust the output power of the X-ray source, and outputting instruction information to adjust the environmental parameters of the environment in which the X-ray source is located;

[0017] If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputs an instruction to pause the X-ray source from emitting X-rays, or outputs an abnormal alarm.

[0018] In one embodiment, an environmental control system is further included for monitoring and adjusting environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and to adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

[0019] According to a second aspect, one embodiment provides a monitoring method for an X-ray scattering measurement device, comprising:

[0020] Control the X-ray source to emit X-rays;

[0021] A monitoring detector located at the collimator monochromator exit is used to detect the peripheral X-ray beam output from the collimator monochromator. The X-rays emitted from the X-ray source pass through the collimator monochromator, outputting the peripheral X-ray beam and the main X-ray beam irradiating the sample. The main X-ray beam consists of X-rays reflected multiple times by the collimator monochromator, while the peripheral X-ray beam consists of X-rays reflected once by the collimator monochromator and / or X-rays not reflected by the collimator monochromator.

[0022] The monitoring and adjustment system, which is connected to the monitoring detector and the X-ray source respectively, processes the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data of X-rays, and monitors the X-ray source based on the intensity monitoring data.

[0023] In one embodiment, monitoring the X-ray source based on the intensity monitoring data includes:

[0024] The intensity monitoring data is compared with a first preset intensity threshold. If the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

[0025] In one embodiment, monitoring the X-ray source based on the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, wherein the second preset intensity threshold is greater than the first preset intensity threshold;

[0026] If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, then the following steps are performed:

[0027] Determine whether the environmental parameters of the environment in which the X-ray source is located deviate from the preset environmental reference value;

[0028] If the environmental parameter deviates from the preset environmental reference value, an instruction message to adjust the environmental parameter is output. After the environmental parameter is adjusted to the preset environmental reference value, the intensity monitoring data obtained after adjusting the environmental parameter is compared with the first preset intensity threshold and / or the second preset intensity threshold to generate an abnormal monitoring and adjustment report.

[0029] If the environmental parameters do not deviate from the preset environmental reference value, an instruction to adjust the output power of the X-ray source is output until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0030] If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting an instruction to pause the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

[0031] In one embodiment, the step of detecting the peripheral X-ray beams output from the collimator monochromator by means of a monitoring detector disposed at the exit of the collimator monochromator includes: setting a monitoring detector in the optical path of each of the multiple peripheral X-ray beams output from the collimator monochromator, and detecting the number of photons corresponding to a single peripheral X-ray beam by means of the monitoring detector;

[0032] The process of processing the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data of X-rays includes: summing the number of photons output by multiple monitoring detectors, and using the summation result of the photon number as the intensity monitoring data.

[0033] According to a third aspect, one embodiment provides a computer-readable storage medium storing a computer program that can be executed by a processor to implement the monitoring method described in the second aspect.

[0034] The X-ray scattering measurement device according to the above embodiment includes a collimating monochromator, a monitoring and adjustment system, an X-ray source, and a monitoring detector. The collimating monochromator receives X-rays emitted from the X-ray source and outputs a main X-ray beam and a peripheral X-ray beam. The monitoring detector detects the peripheral X-ray beam to obtain intensity information of the peripheral X-ray beam. The monitoring and adjustment system processes the intensity information to obtain X-ray intensity monitoring data and monitors the X-ray source based on the intensity monitoring data. By using the useless peripheral X-ray beam in the measurement optical path as the monitoring object, real-time monitoring of X-ray intensity can be achieved without interrupting the measurement process, and no loss of flux of the measurement beam is caused during the monitoring process. At the same time, the state of the X-ray source can be judged based on the real-time monitoring results, so that corresponding adjustment measures can be taken in a timely manner, and the abnormal points of the measurement results can be located immediately. This is conducive to the automated analysis and processing of abnormal measurement results and improves the efficiency of root cause analysis of abnormal measurements. Attached Figure Description

[0035] Figure 1 This is a schematic diagram of the system architecture of an X-ray scattering measurement device according to one embodiment.

[0036] Figure 2 for Figure 1 A partially enlarged schematic diagram of the system structure of the X-ray scattering measurement equipment.

[0037] Figure 3 This is a schematic diagram showing the relative spatial distribution of each beam at the exit of a collimating monochromator according to one embodiment.

[0038] Figure 4 This is a schematic diagram illustrating the arrangement principle of the monitoring detector in an X-ray scattering measurement device according to one embodiment.

[0039] Figure 5 This is a schematic diagram illustrating the flow principle of a monitoring method according to one embodiment.

[0040] Figure 6 This is a schematic diagram illustrating the flow principle of the monitoring steps in a monitoring method according to one embodiment.

[0041] Figure 7 This is a logical flowchart of the monitoring steps in a monitoring method according to one embodiment.

[0042] In the picture:

[0043] 10. X-ray source; 20. Collimator monochromator; 30. Vacuum collimation system; 40. Displacement stage system; 50. Detection system; 51. Vacuum scattering system; 52. X-ray detector; 60. Monitoring detector; 70. Monitoring and adjustment system; 80. Environmental control system; L1. Main X-ray beam; L2. Peripheral X-ray beam. Detailed Implementation

[0044] The present invention will now be described in further detail with reference to specific embodiments and accompanying drawings. Similar elements in different embodiments are referred to by associated similar element reference numerals. In the following embodiments, many details are described to facilitate a better understanding of this application. However, those skilled in the art will readily recognize that some features may be omitted in different situations, or may be replaced by other elements, materials, or methods. In some cases, certain operations related to this application are not shown or described in the specification. This is to avoid obscuring the core parts of this application with excessive description. For those skilled in the art, detailed description of these related operations is not necessary; they can fully understand the related operations based on the description in the specification and general technical knowledge in the art.

[0045] Furthermore, the features, operations, or characteristics described in the specification can be combined in any suitable manner to form various embodiments. At the same time, the steps or actions in the method description can be rearranged or adjusted in a manner obvious to those skilled in the art. Therefore, the various orders in the specification and drawings are only for the clear description of a particular embodiment and do not imply a necessary order, unless otherwise stated that a particular order must be followed.

[0046] The serial numbers assigned to components in this document, such as "first" and "second," are used only to distinguish the described objects and have no sequential or technical meaning. The terms "connection" and "linkage" used in this application, unless otherwise specified, include both direct and indirect connections (linkages).

[0047] Currently, the main monitoring method for X-ray sources in CD-SAXS (critical size small angle X-ray scattering) measurement equipment is periodic sampling inspection. That is, during the use of the equipment, X-ray detectors are periodically inserted into the main optical path of X-ray measurement. The status of the X-ray source is judged by detecting the change in X-ray intensity relative to the previous value, and corresponding measures are taken according to the status of the X-ray source, such as adjusting the output power of the X-ray source and recalibrating the intensity of the detection system and algorithm analysis system.

[0048] However, this monitoring method has the following drawbacks:

[0049] 1. The measurement process of the measurement equipment needs to be interrupted, which will greatly reduce the measurement throughput of the equipment and cause a loss of X-ray intensity in the main optical path of the measurement.

[0050] 2. Because the sampling inspection is conducted periodically, it is often impossible to detect the abnormality of the X-ray source in a timely manner. Although it is possible to detect the abnormality of the X-ray source through the change of the final measurement result, since the measurement result is mainly related to the morphology of the sample itself, it is impossible to locate the cause of the abnormal measurement result to the X-ray source in the first place, making the root cause analysis of the abnormal point of the measurement result difficult.

[0051] 3. Because the anomaly of the X-ray source cannot be detected immediately, the reliability of some measurement data before the anomaly is detected is also reduced;

[0052] 4. Since causal analysis cannot be decoupled from the measurement results of sample morphology, it is difficult to automatically analyze and process abnormal measurement results, which will greatly increase the cost of daily operation and maintenance of measurement equipment.

[0053] Please see Figures 1 to 4 This application provides an X-ray scattering measurement device (hereinafter referred to as the measurement device), such as a CD-SAXS measurement device that can be used to measure the critical dimensions of nano-etched structures in semiconductor devices. The measurement device achieves real-time monitoring and automatic adjustment of the X-ray source by monitoring useless X-rays in the optical path of the device. The measurement device includes an X-ray source 10, a collimating monochromator 20, a vacuum collimation system 30, a displacement stage system 40, a detection system 50, a monitoring detector 60, a monitoring and adjustment system 70, and other functional components as needed, which are described in detail below.

[0054] Please see Figure 1 and Figure 2 The collimator monochromator 20 is disposed between the X-ray source 10 and the vacuum collimation system 30; wherein, the X-ray source 10 is mainly used to generate and emit X-rays (e.g., point-divergent X-ray beams). In some embodiments, the X-ray source 10 may also be specifically an X-ray source, such as a liquid metal target X-ray source, a rotating anode target X-ray source, etc.

[0055] The collimator monochromator 20 is essentially positioned on the X-ray emission path of the X-ray source 10. It is mainly used to receive the X-rays emitted by the X-ray source 10 and convert the received X-rays (e.g., a point-divergent polychromatic X-ray beam) into a quasi-monochromatic quasi-parallel X-ray beam.

[0056] The vacuum collimation system 30 is used to further collimate the X-ray beam output from the collimation monochromator 20 and to achieve precise control over the X-ray beam spot size so as to ultimately project the X-ray onto the sample to be tested. For example, the vacuum collimation system 30 may include multiple slit systems, and the optical paths between each slit system can be in a vacuum environment, thereby reducing the attenuation effect of air on the X-ray beam.

[0057] Regarding the collimator monochromator 20, the X-rays received by the collimator monochromator 20 typically output different types of X-ray beams from different outlets of the collimator monochromator 20. These X-ray beams include X-rays that are emitted multiple times by the collimator monochromator 20 and output from the collimator monochromator 20, X-rays that are reflected once by the collimator monochromator 20 and output from the collimator monochromator 20 directly without reflection. Among them, the X-rays that are reflected multiple times by the collimator monochromator 20 are the X-rays used for measurement by the measuring equipment. These X-rays will enter the vacuum collimation system 30 and, after collimation and spot size control, irradiate the sample to be measured. The X-rays that are reflected once by the collimator monochromator 20 and output without emission from the collimator monochromator 20 are discarded or useless X-rays and do not need to irradiate the sample to be measured (for example, these X-ray beams will be blocked by the vacuum collimation system 30 and cannot irradiate the sample to be measured).

[0058] Therefore, for ease of distinction and description, the X-ray beam output from the collimator monochromator 20 and ultimately used to irradiate the sample under test (i.e., the X-ray beam output after multiple reflections from the collimator monochromator 20) is defined as the main X-ray beam L1, and other X-ray beams output from the collimator monochromator 20 that do not need to or cannot irradiate the sample under test (e.g., X-ray beams output after a single reflection from the collimator monochromator 20 or without reflection from the collimator monochromator 20) are defined as the peripheral X-ray beam L2.

[0059] For example, please refer to Figure 3 , Figure 3 The diagram illustrates the relative spatial distribution of various X-ray beams exiting from different outlets of a multilayer monochromator (e.g., a Montel monochromator) along the optical axis cross-section of the monochromator. Figure 3 As can be seen, when the point-divergent X-ray beam generated by the X-ray source 10 passes through the collimating monochromator 20, the following three types of X-ray beams are typically output from the collimating monochromator 20:

[0060] The first type of X-ray beam is a quasi-parallel monochromatic X-ray output from the collimator monochromator 20 after being reflected twice by the multilayer film structure of the collimator monochromator 20. This type of X-ray beam is the main beam required for measurement by the measuring equipment. It can be collimated by the vacuum collimation system 30 and the spot size controlled before irradiating the sample to be measured. In other words, this type of X-ray beam is the main path X-ray beam L1.

[0061] The second type of X-ray beam is an X-ray beam that is reflected once from the collimator monochromator 20 by the multilayer film structure. The third type of X-ray beam is an X-ray beam that is not reflected by the multilayer film structure of the collimator monochromator 20 and is output from the outlet of the collimator monochromator 20. Both types of X-ray beams are usually blocked by the vacuum collimation system 30 and will not irradiate the sample under test. Therefore, the peripheral X-ray beam L2 can be understood as one or both of these types of X-ray beams.

[0062] In other words, the main X-ray beam L1 can be understood as the X-ray beam output from the collimator monochromator 20 that will eventually participate in the measurement, while the peripheral X-ray beam L2 can be understood as the useless X-ray beam output from the collimator monochromator 20 that will not participate in the measurement.

[0063] Please see Figure 1 The displacement stage system 40 is positioned between the vacuum collimation system 30 and the detection system 50. The displacement stage system 40 may have multiple degrees of freedom (e.g., degrees of freedom to move along the X, Y, and Z axes and degrees of freedom to rotate around the X, Y, and Z axes). It is mainly used to carry the sample to be tested, so as to achieve precise positioning of any point on the sample to be tested, while adjusting the angular position of the sample to be tested relative to the optical path axis and controlling the scanning.

[0064] The detection system 50 is mainly used to receive scattered X-rays (such as X-rays scattered by periodic nano-etched structures in semiconductor devices) after the main X-ray beam L1 passes through the sample under test. By detecting the intensity and angular distribution information of the scattered X-rays generated by the sample under test, the system outputs measurement information of the morphology of the sample under test (such as the three-dimensional morphology of periodic nano-etched structures in semiconductor devices).

[0065] For example, please refer to Figure 1 The detection system 50 includes a vacuum scattering system 51 and an X-ray detector 52. The vacuum scattering system 51 may include a high-vacuum cavity structure. The vacuum scattering system 51 is used to provide a vacuum transmission environment for the scattered X-rays generated by the sample to be tested to be transmitted to the X-ray detector 52, so as to reduce the attenuation of the scattered X-ray signal by air during transmission. The X-ray detector is used to detect the intensity and angular distribution information of the scattered X-ray signal, thereby outputting the measurement information of the morphology of the sample to be tested.

[0066] Please see Figure 1 , Figure 2 and Figure 4The monitoring detector 60 is located at the exit of the collimating monochromator 20 and in the optical path of the peripheral X-ray beam L2; for example, the monitoring detector 60 is located downstream of the collimating monochromator 20 and between the collimating monochromator 20 and the vacuum collimation system 30; the monitoring detector 60 is mainly used to detect the peripheral X-ray beam L2 and output the intensity information of the peripheral X-ray beam L2.

[0067] For example, the monitoring detector 60 includes a photon counter, which detects the number of photons in the peripheral X-ray beam L2, thereby using the number of photons to determine the intensity information of the peripheral X-ray beam L2.

[0068] Of course, the monitoring detector 60 can also use other types of X-ray signal detection devices. For example, the monitoring detector 60 can output light intensity as intensity information by detecting the light intensity of the peripheral X-ray beam L2.

[0069] Please see Figure 1 and Figure 2 The monitoring and adjustment system 70 is connected to the X-ray source 10 and the monitoring detector 60 respectively. The monitoring and adjustment system 70 can be understood as a device or system composed of a controller, processor and related functional devices, and has functions such as data analysis and processing. The monitoring and adjustment system 70 is mainly used to receive and process the intensity information output by the monitoring detector 60 to obtain intensity monitoring data about X-rays, and to monitor the X-ray source 10 based on the intensity monitoring data.

[0070] For example, the monitoring and adjustment system 70 can compare the intensity monitoring data with a preset intensity threshold and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0071] If the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal, the monitoring and adjustment system 70 only generates a monitoring record report in document form so that the measurement process of the measurement equipment can proceed normally and continuously.

[0072] If the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal, the monitoring and adjustment system 70 outputs instructions to adjust the X-ray source 10 (such as instructions output by the control system of the measurement equipment), so that the measurement equipment can automatically and autonomously perform operations such as adjusting the output power of the X-ray source 10, adjusting the environmental parameters of the environment in which the X-ray source 10 is located, pausing the X-ray source 10 to emit X-rays, pausing the measurement process, generating an abnormal monitoring report in document form, outputting an abnormal alarm, and generating an abnormal monitoring and adjustment report in document form.

[0073] It should be noted that the description of the "control system of the measuring equipment" introduced in this article is only for the purpose of understanding the role of the monitoring and adjustment system 70 in the measuring equipment. The control system can be understood as a collection of related devices that play a role in regulating and managing related functional devices and systems in the measuring equipment. The control system can support the realization of all or part of the functions of the measuring equipment.

[0074] In other words, in some embodiments, the monitoring and adjustment system 70 can be a functional system independently set up relative to the control system of the measuring equipment. The monitoring and adjustment system 70 cooperates with the control system of the measuring equipment to analyze and process the intensity information output by the monitoring detector 60, and then issues corresponding command information to the control system of the measuring equipment based on the obtained intensity monitoring data, so as to cause the control system of the measuring equipment to adjust the X-ray source 10 accordingly. In other embodiments, the monitoring and adjustment system 70 can be part of the control system of the measuring equipment, or the control system of the measuring equipment can have the functions of the monitoring and adjustment system 70, so that the monitoring and adjustment system 70 can directly adjust the X-ray source 10 according to the intensity monitoring data.

[0075] Therefore, based on the cooperation of the monitoring detector 60 and the monitoring and adjustment system 70, a monitoring system that is relatively independent of the main measurement system can be built in the system architecture of the measurement equipment. By using the useless X-rays in the optical path of the measurement equipment (i.e., the peripheral X-ray beam L2) as the real-time monitoring object, the X-ray source 10 can be monitored in real time by analyzing and processing the intensity information of the peripheral X-ray beam L2.

[0076] Firstly, the measurement equipment can perform both measurement and monitoring processes simultaneously during use, meaning that the measurement and monitoring processes can be carried out in parallel. This will not cause any loss to the measurement throughput (or the main X-ray beam L1) of the measurement equipment, effectively ensuring the measurement efficiency of the measurement equipment.

[0077] Secondly, during the monitoring process, the intensity stability of the X-ray source 10 can be judged in real time, and corresponding countermeasures can be automatically taken for common abnormal monitoring results, such as adjusting the output power of the X-ray source 10. This effectively reduces the frequency of manual intervention to handle abnormalities during equipment maintenance, thereby reducing the downtime of the measurement equipment and reducing the labor costs of daily operation and maintenance of the equipment.

[0078] Third, based on the monitoring results, the abnormality of the measurement results can be located to the X-ray source 10 in the first instance. This can provide support for the automatic analysis, processing and judgment of the root cause relationship between the abnormal measurement results and the abnormal state of the X-ray source 10, and can effectively improve the accuracy and consistency of the measurement results.

[0079] To describe the measurement device more clearly and in detail, the following mainly uses the example of the monitoring detector 60 being able to count the photons of the peripheral X-ray beam L2 and output the photon count as intensity information to explain the structural architecture and monitoring principle of the measurement device.

[0080] In some embodiments, please refer to Figure 1 , Figure 2 and Figure 4 The number of monitoring detectors 60 is set to multiple, and the multiple monitoring detectors 60 are arranged in the optical path of a corresponding peripheral X-ray beam L2; for example, please refer to Figure 4 At the exit of the collimator monochromator 20 and on both sides of the optical path of the main X-ray beam L1, a monitoring detector 60 is respectively provided to detect the two peripheral X-ray beams L2 output from the collimator monochromator 20 after a single reflection. Alternatively, the number of monitoring detectors 60 is set to three, with two monitoring detectors 60 used to detect the two peripheral X-ray beams L2 output after a single reflection from the collimator monochromator 20, and the remaining monitoring detector 60 used to detect the peripheral X-ray beam L2 output without reflection from the collimator monochromator 20.

[0081] Of course, depending on the number or type of X-ray beams output from the collimator monochromator 20, the monitoring detector 60 may also be configured to other numbers, which will not be elaborated here.

[0082] Correspondingly, the monitoring and adjustment system 70 is configured to sum the number of photons obtained by multiple monitoring detectors 60, and use the summation result of the number of photons (i.e. the sum of the number of photons detected by multiple monitoring detectors 60) as intensity monitoring data to monitor the X-ray source 10.

[0083] By using multiple monitoring detectors 60 to detect the number of photons in the peripheral X-ray beam L2, and by using the monitoring and adjustment system 70 to sum the number of photons output by each monitoring detector 60, the signal strength of the signal received by the monitoring and adjustment system 70 can be guaranteed, and the accuracy of the intensity monitoring data obtained by the monitoring and adjustment system 70 can be improved, thus providing strong support for the precise adjustment of the X-ray source 10. At the same time, by counting the photons in the peripheral X-ray beam L2, the performance of the X-ray source 10 can be determined more directly, ensuring the accuracy of the obtained intensity monitoring data.

[0084] In some embodiments, please refer to Figure 1 and Figure 2The measuring device also includes an environmental control system 80 connected to the monitoring and adjustment system 70. The environmental control system 80 monitors and adjusts environmental parameters (such as the temperature inside and outside the X-ray source 10) to ensure the stability of the X-ray source 10. Correspondingly, the monitoring and adjustment system 70 can receive the environmental parameters monitored by the environmental control system 80. When environmental parameters change, the monitoring and adjustment system 70 can directly or indirectly send instructions to the environmental control system 80 to adjust the environmental parameters of the X-ray source 10 based on intensity monitoring data, thereby realizing the adjustment operation of the environmental parameters of the X-ray source 10.

[0085] As mentioned above, in some embodiments, the monitoring and adjustment system 70 can compare the intensity monitoring data with a preset intensity threshold and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0086] Specifically, the preset intensity threshold may include a first preset intensity threshold and a second preset intensity threshold, wherein the first preset intensity threshold is less than the second preset intensity threshold; when the intensity monitoring data (the total number of photons obtained in real time, or the amplitude of the change in the total number of photons within a preset time period, etc.) is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal.

[0087] If the intensity and stability of the X-ray source 10 are determined to be normal, the monitoring and adjustment system 70 can generate only a monitoring record report in document form to avoid affecting the measurement process of the measurement equipment.

[0088] If the intensity stability of the X-ray source 10 is determined to be abnormal and the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system 70 can output instructions to pause the measurement process and / or pause the X-ray source 10 from emitting X-rays. It can also output an abnormal alarm or generate an abnormal monitoring report at the same time, so that the equipment engineer can manually intervene in the adjustment and maintenance of the measurement equipment.

[0089] If the intensity stability of the X-ray source 10 is determined to be abnormal and the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 70 outputs instruction information to adjust the X-ray source 10. This instruction information may include instructions to pause the measurement process, instructions from the control environment control system 80 to adjust the environmental parameters of the environment in which the X-ray source 10 is located, instructions to adjust the output power of the X-ray source 10, and the generation of anomaly monitoring and adjustment reports, etc., so that the measurement equipment can adjust the X-ray source 10 automatically and continue the measurement process after the X-ray source 10 returns to normal.

[0090] In other embodiments, the measuring device may be given different functional modes according to actual needs and based on the cooperation between the monitoring and adjustment system 70 and the monitoring detector 60.

[0091] For example, if the preset intensity threshold is a first preset intensity threshold, and the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; if the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 can output instructions such as pausing the measurement process and pausing the emission of the X-ray source 10, and can also output abnormal alarms and generate abnormal monitoring reports at the same time, so that equipment engineers can intervene directly.

[0092] For example, if the preset intensity threshold is a first preset intensity threshold, and the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; if the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 can output instructions such as pausing the measurement process and adjusting the X-ray source 10 (e.g., adjusting the output power of the X-ray source 10, adjusting the environmental parameters of the environment in which the X-ray source 10 is located), and can simultaneously generate abnormal monitoring and adjustment reports, so as to realize the automatic analysis and control of the measurement equipment, and thus continue the measurement process when the intensity stability of the X-ray source 10 returns to normal.

[0093] It should be noted that the preset intensity threshold, the first preset intensity threshold, and the second preset intensity threshold mentioned in this article can be determined according to actual needs. These intensity thresholds can be specific data values ​​(such as photon count values) or ranges of data values.

[0094] It should be noted that, Figure 1 and Figure 2 The bold solid lines in the diagram represent the connection relationships between related functional components, and the bold dashed lines represent the main measuring beam or measuring optical path of the measuring equipment. Figure 4 The bold solid line in the diagram represents the main X-ray beam L1, and the bold dashed line represents the peripheral X-ray beam L2.

[0095] Please see Figures 5 to 7 and combined Figures 1 to 4 This application also provides a monitoring method for an X-ray scattering measurement device, which can realize real-time monitoring and adjustment of the X-ray scattering measurement device of the aforementioned embodiments; please refer to... Figure 5 The monitoring method includes steps 100 to 300, which are described in detail below.

[0096] Step 100: Control the X-ray source 10 to emit X-rays.

[0097] Specifically, by controlling the X-ray source 10 to emit X-rays, the measurement equipment is switched to a working state (e.g., the state of executing a measurement process). The collimating monochromator 20 receives the X-rays emitted by the X-ray source 10 and can output the main X-ray beam L1 and the peripheral X-ray beam L2. The peripheral X-ray beam L2 is the X-ray that is reflected once by the collimating monochromator 20 or output without being emitted by the collimating monochromator 20. The main X-ray beam L1 is the X-ray beam that is emitted multiple times by the collimating monochromator 20. After being collimated and the spot size controlled by the vacuum collimating system 30, the main X-ray beam L1 irradiates the sample to be measured carried by the displacement stage system 40. The detection system 50 receives the scattered X-rays generated by the sample to be measured, thereby outputting measurement information with the morphology of the sample to be measured.

[0098] Step 200: Detect the peripheral X-ray beam L2 output from the collimating monochromator 20 and obtain the intensity information of the peripheral X-ray beam L2.

[0099] For example, please refer to Figure 2 The monitoring detector 60, located at the exit of the collimating monochromator 20 (i.e., in the optical path of the peripheral X-ray beam L2), detects the peripheral X-ray beam L2 and outputs its intensity information. For example, the monitoring detector 60 counts the photons detected by the peripheral X-ray beam L2 and outputs the photon count as intensity information.

[0100] Step 300: Process the intensity information of the peripheral X-ray beam L2 to obtain intensity monitoring data of X-rays, and monitor the X-ray source 10 based on the intensity monitoring data.

[0101] For example, please refer to Figure 2 The monitoring and adjustment system 70, which is connected to the X-ray source 10 and the monitoring detector 60 respectively, receives and processes the intensity information output by the monitoring detector 60 to obtain intensity monitoring data, and monitors the X-ray source 10 based on the intensity monitoring data.

[0102] For example, please refer to Figure 2 A monitoring detector 60 is set in the optical path of the multiple peripheral X-ray beams L2 output by the collimator monochromator 20. The number of photons of the corresponding peripheral X-ray beam L2 is detected by each monitoring detector 60. The total number of photons can be obtained by summing the number of photons output by each monitoring detector 60. The total number of photons is then used as the intensity monitoring data.

[0103] Therefore, the useless peripheral X-ray beam L2 in the measurement optical path of the measurement equipment is used as the monitoring object. Based on the intensity information of the peripheral X-ray beam L2, intensity monitoring data about X-rays is obtained, and the X-ray source 10 is monitored according to the intensity monitoring data. The X-ray source 10 can be monitored in real time without affecting the measurement process of the measurement equipment. This will not cause any loss of measurement throughput of the measurement equipment, and the status of the X-ray source 10 can be judged in real time based on the intensity monitoring data. In order to automatically take corresponding measures for common abnormal monitoring results, there is no need for manual intervention by equipment engineers. This can effectively reduce the daily operation labor cost of the measurement equipment and ensure the accuracy of measurement results.

[0104] As described above, step 300 mainly includes processing the intensity information of the peripheral X-ray beam L2 to obtain intensity monitoring data of the X-rays, and monitoring the X-ray source 10 based on the intensity monitoring data; in some embodiments, please refer to Figure 6 and Figure 7 The steps for monitoring the X-ray source 10 based on intensity monitoring data include steps 310 to 330.

[0105] Step 310: Compare the intensity monitoring data with the preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison results.

[0106] Specifically, when the intensity monitoring data (e.g., the total number of photons obtained by the monitoring and adjustment system 70 by summing the number of photons detected and output by each monitoring detector 60) is less than or equal to a preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal.

[0107] The preset intensity threshold can be determined based on the state of the X-ray source 10 (e.g., intensity stability state) required for the normal measurement process of the measurement equipment; the preset intensity threshold can be a specific data value (e.g., photon count) or a range of data values.

[0108] Step 320: If the intensity stability of X-ray source 10 is normal, generate a monitoring record report.

[0109] Specifically, if the intensity stability of the X-ray source 10 is normal, and the measurement equipment is in the process of executing the measurement procedure, the measurement procedure does not need to be interrupted. At this time, the monitoring and adjustment system 70 can simply generate a monitoring record report. If the measurement equipment is in the process of pausing the measurement procedure, the monitoring and adjustment system 70 can output instruction information to control the measurement equipment to continue the measurement procedure and generate a monitoring record report.

[0110] Step 330: If the intensity stability of the X-ray source 10 is abnormal, the measurement process is paused.

[0111] For example, please refer to Figure 7 The preset intensity thresholds include a first preset intensity threshold and a second preset intensity threshold, where the first preset intensity threshold is less than the second preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be normal. When the intensity monitoring data is greater than the first preset intensity threshold (that is, the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, or the intensity monitoring data is greater than or equal to the second preset intensity threshold), the intensity stability of the X-ray source 10 is determined to be abnormal.

[0112] In the event of abnormal intensity stability of X-ray source 10, if the intensity monitoring data exceeds the second preset intensity threshold, the monitoring and adjustment system 70 may perform the following operations: outputting instructions to pause the measurement process, outputting instructions to pause X-ray emission from X-ray source 10, outputting an abnormal alarm, generating an abnormal monitoring report, etc., so that equipment engineers can intervene manually.

[0113] In the event of abnormal intensity stability of the X-ray source 10, if the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 70 will perform the following operations: output instructions to pause the measurement process, output instructions to adjust the output power of the X-ray source 10 or adjust the environmental parameters of the X-ray source 10, generate an abnormal monitoring and adjustment report, etc., so as to realize the automated and autonomous adjustment of the measurement equipment.

[0114] For example, the preset intensity threshold is the first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is normal. When the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 performs the following operations: outputs the instruction information to pause the measurement process or outputs the instruction information to pause the X-ray source 10 from emitting X-rays, outputs an abnormal alarm, generates an abnormal monitoring report, etc.

[0115] For example, the preset intensity threshold is the first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be normal. When the intensity monitoring data is greater than the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be abnormal. At this time, the monitoring and adjustment system 70 performs the following operations: outputs instructions to pause the measurement process, outputs instructions to adjust the output power of the X-ray source 10 or adjust the environmental parameters of the X-ray source 10, and generates an abnormal monitoring and adjustment report, etc.

[0116] In some embodiments, please refer to Figure 7 When the intensity stability of the X-ray source 10 is abnormal and adjustment operations such as pausing the measurement process, adjusting the X-ray source 10, and generating an abnormality monitoring and adjustment report are required, the steps may specifically include steps 331 to 333.

[0117] Step 331: Pause the measurement process and determine whether the environmental parameters of the environment where the X-ray source 10 is located deviate from the preset environmental reference value.

[0118] Specifically, the monitoring and adjustment system 70 can compare the environmental parameters monitored by the environmental control system 80 with preset environmental reference values ​​to determine whether the environmental parameters of the X-ray source 10 have changed relative to the preset environmental reference values. The preset environmental reference value can be understood as the environmental conditions (such as the internal and external ambient temperature of the X-ray source 10) that the measuring equipment needs to provide for the X-ray source 10 when it is performing the measurement process normally. The preset environmental reference value can be a specific value or a range of values.

[0119] Step 332: If the environmental parameters of the environment where the X-ray source 10 is located deviate from the preset environmental reference value, the environmental parameters are adjusted to the preset environmental reference value, and the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0120] Specifically, if the environmental parameters deviate from the preset environmental reference value, the monitoring and adjustment system 70 can directly or indirectly send an instruction to the environmental control system 80 to adjust the environmental parameters to the preset environmental reference value, so that the environmental parameters of the X-ray source 10 return to normal. Then, the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity threshold to further determine whether the intensity stability of the X-ray source 10 has returned to normal.

[0121] Step 333: If the environmental parameters of the environment where the X-ray source 10 is located do not deviate from the preset environmental reference value, adjust the output power of the X-ray source 10 until the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold, and generate an intensity monitoring and adjustment report.

[0122] Specifically, if the environmental parameters have not changed, it can be basically determined that the output power of the X-ray source 10 affects the intensity stability of the X-ray source 10. Therefore, by adjusting the output power of the X-ray source 10, the intensity stability of the X-ray source 10 can be restored to normal. After the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold (e.g., less than or equal to the first preset intensity threshold), the monitoring and adjustment system 70 can output the instruction information to continue the measurement process, and generate an abnormal monitoring and adjustment report based on the abnormal monitoring situation and adjustment process.

[0123] Based on this, since the entire monitoring process can be carried out in real time during the measurement process of the measuring equipment, it is possible to promptly detect whether abnormal measurement results are caused by an abnormality of the X-ray source 10, and to take corresponding countermeasures automatically and in real time in response to the abnormality of the X-ray source 10. This can ensure the measurement efficiency of the equipment, greatly improve the root cause analysis efficiency of abnormal measurement results, and ensure the accuracy of the measurement results.

[0124] Those skilled in the art will understand that all or part of the functions of the various methods in the above embodiments can be implemented by hardware or by computer programs. When all or part of the functions in the above embodiments are implemented by computer programs, the program can be stored in a computer-readable storage medium, which may include: read-only memory, random access memory, disk, optical disk, hard disk, etc., and the above functions are implemented by executing the program by a computer. For example, the program can be stored in the memory of a device, and when the program in the memory is executed by the processor, all or part of the above functions can be implemented.

[0125] In addition, when all or part of the functions in the above embodiments are implemented by computer programs, the programs can also be stored in storage media such as servers, other computers, disks, optical discs, flash drives, or portable hard drives. They can be downloaded or copied to the memory of the local device, or the system of the local device can be updated. When the program in the memory is executed by the processor, all or part of the functions in the above embodiments can be implemented.

[0126] The above examples illustrate the present invention only to aid in understanding it and are not intended to limit the scope of the invention. Those skilled in the art can make various simple deductions, modifications, or substitutions based on the principles of this invention.

Claims

1. An X-ray scattering measurement device, characterized in that, include: X-ray source; A collimating monochromator is positioned in the X-ray emission path of the X-ray source; The collimating monochromator receives X-rays emitted by the X-ray source and outputs a main X-ray beam and a peripheral X-ray beam from the collimating monochromator; wherein, the main X-ray beam is used to irradiate the sample to be tested, and the main X-ray beam is X-rays output after multiple reflections by the collimating monochromator, and the peripheral X-ray beam is X-rays output after a single reflection by the collimating monochromator and / or without reflection by the collimating monochromator; The detection system receives the scattered X-rays formed after the main X-ray beam passes through the sample under test, and outputs the measurement information of the morphology of the sample under test. A monitoring detector is positioned in the optical path of the peripheral X-ray beam; the monitoring detector detects the peripheral X-ray beam and outputs the intensity information of the peripheral X-ray beam; A monitoring and adjustment system is connected to both the X-ray source and the monitoring detector. The monitoring and adjustment system processes the intensity information to obtain intensity monitoring data of the X-rays and monitors the X-ray source based on the intensity monitoring data.

2. The X-ray scattering measurement device as described in claim 1, characterized in that, The main X-ray beam is the X-ray output from the collimating monochromator after being reflected twice, and the peripheral X-ray beam is the X-ray output from the collimating monochromator after being reflected once.

3. The X-ray scattering measurement device as described in claim 2, characterized in that, The number of monitoring detectors is set to multiple, and each of the multiple monitoring detectors detects a corresponding peripheral X-ray beam.

4. The X-ray scattering measurement device as described in claim 3, characterized in that, The monitoring and adjustment system sums the photon counts of the peripheral X-ray beams output by at least two of the monitoring detectors, and uses the summation result as the intensity monitoring data to monitor the X-ray source; wherein, the intensity information includes the photon count.

5. The X-ray scattering measurement device as described in any one of claims 1-4, characterized in that, The monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. If the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

6. The X-ray scattering measurement device as described in claim 5, characterized in that, The monitoring and adjustment system also compares the intensity monitoring data with a second preset intensity threshold, wherein the second preset intensity threshold is greater than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information to adjust the output power of the X-ray source, and outputting instruction information to adjust the environmental parameters of the environment in which the X-ray source is located; If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputs an instruction to pause the X-ray source from emitting X-rays, or outputs an abnormal alarm.

7. The X-ray scattering measurement device as described in claim 6, characterized in that, It also includes an environmental control system for monitoring and adjusting environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and to adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

8. A monitoring method for an X-ray scattering measurement device, characterized in that, include: Control the X-ray source to emit X-rays; A monitoring detector located at the collimator monochromator exit is used to detect the peripheral X-ray beam output from the collimator monochromator. The X-rays emitted from the X-ray source pass through the collimator monochromator, outputting the peripheral X-ray beam and the main X-ray beam irradiating the sample. The main X-ray beam consists of X-rays reflected multiple times by the collimator monochromator, while the peripheral X-ray beam consists of X-rays reflected once by the collimator monochromator and / or X-rays not reflected by the collimator monochromator. The monitoring and adjustment system, which is connected to the monitoring detector and the X-ray source respectively, processes the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data of X-rays, and monitors the X-ray source based on the intensity monitoring data.

9. The monitoring method as described in claim 8, characterized in that, The monitoring of the X-ray source based on the intensity monitoring data includes: The intensity monitoring data is compared with a first preset intensity threshold. If the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

10. The monitoring method as described in claim 9, characterized in that, The step of monitoring the X-ray source based on the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, wherein the second preset intensity threshold is greater than the first preset intensity threshold; If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, then the following steps are performed: Determine whether the environmental parameters of the environment in which the X-ray source is located deviate from the preset environmental reference value; If the environmental parameter deviates from the preset environmental reference value, an instruction message to adjust the environmental parameter is output. After the environmental parameter is adjusted to the preset environmental reference value, the intensity monitoring data obtained after adjusting the environmental parameter is compared with the first preset intensity threshold and / or the second preset intensity threshold to generate an abnormal monitoring and adjustment report. If the environmental parameters do not deviate from the preset environmental reference value, an instruction to adjust the output power of the X-ray source is output until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and an abnormal monitoring and adjustment report is generated. If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting an instruction to pause the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

11. The monitoring method as described in any one of claims 8-10, characterized in that, The step of detecting the peripheral X-ray beams output from the collimator monochromator by means of a monitoring detector set at the exit of the collimator monochromator includes: setting a monitoring detector in the optical path of each of the multiple peripheral X-ray beams output from the collimator monochromator, and detecting the number of photons corresponding to a single peripheral X-ray beam by means of the monitoring detector. The process of processing the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data of X-rays includes: summing the number of photons output by multiple monitoring detectors, and using the summation result of the photon number as the intensity monitoring data.

12. A computer-readable storage medium, characterized in that, The medium stores a computer program that can be executed by a processor to implement the monitoring method as described in any one of claims 8-11.

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