Double telecentric projection photoetching lens

Abstract

The invention relates to a double telecentric projection photoetching lens which is applied to an ultraviolet broadband and comprises a front lens group, a diaphragm and a rear lens group which are sequentially arranged from an object side to an image side, and the front lens group comprises six lenses which are sequentially arranged from the object side to the image side; the rear lens group comprises a seventh lens, an eighth lens and a twelfth lens which are sequentially arranged from the object space to the image space, the seventh lens is a negative lens, the eighth lens and the twelfth lens are positive lenses, and at least one meniscus positive lens and a biconcave negative lens are arranged between the eighth lens and the twelfth lens. According to the double-telecentric projection photoetching lens provided by the invention, the achromatic problem and the difficult problem of difficulty in processing and assembling of the existing ultraviolet broadband photoetching lens are solved, and the full-waveband high transmittance and the double-telecentric characteristic of the lens are ensured; when the lens is used under a high-power laser light source, the focal plane offset is guaranteed to be in the micron order, the diameter of the lens cone can guarantee high-efficiency printing of the whole machine, and the lens can be suitable for production of various kinds of ink for PCB clients.

Description

Technical Field

[0001] The invention relates to the technical field of photolithography lenses, and in particular to a double telecentric projection photolithography lens applied to ultraviolet wide band. Background Art

[0002] Telecentric lenses have superior characteristics that are different from ordinary lenses: low distortion, constant magnification, etc. A dual-telecentric projection lithography lens refers to an imaging system that meets the characteristics of both the object-side telecentric optical path and the image-side telecentric optical path. It includes the common advantages of the two telecentric optical paths.

[0003] The application of dual-telecentric projection lithography lenses in the field of lithography lenses is equally important. With the continuous development of the domestic micro-nano processing industry, the demand for dual-telecentric lithography lenses used in the ultraviolet band is also increasing. At present, the development of domestic ultraviolet narrow-band projection lithography lenses is in its infancy. Since wide-band lenses need to be achromatic, the development of ultraviolet wide-band projection lithography lenses is even more scarce. The difficulty lies in the fact that wide-band projection lithography lenses have extremely high requirements for the processing accuracy of optical parts, and the manufacturing technology of supporting lenses is not mature. Therefore, in addition to the problem of insufficient transmittance, the current ultraviolet wide-band projection lithography lenses are difficult to process and assemble due to the non-centralized tolerances, which also increases the difficulty of mass production. Summary of the invention

[0004] In order to solve the above problems, the present invention provides a dual telecentric projection lithography lens, which is applied to a wide ultraviolet band.

[0005] The technical solution of the present invention is: On one hand, the present invention provides a dual telecentric projection lithography lens, which is applied to ultraviolet wide band, and comprises a front lens group, an aperture and a rear lens group arranged in sequence from the object side to the image side, and is characterized in that: The front lens group includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens arranged in sequence from the object side to the image side, the third lens and the sixth lens are both negative lenses, and the remaining lenses in the front lens group are all positive lenses; The rear lens group includes a seventh lens, an eighth lens and a twelfth lens arranged in sequence from the object side to the image side, the seventh lens is a negative lens, the eighth lens and the twelfth lens are both positive lenses, at least one meniscus positive lens and a biconcave negative lens are arranged between the eighth lens and the twelfth lens, and the biconcave negative lens is located on a side close to the eighth lens.

[0006] Further, the focal length F1 of the front lens group ranges from 55.532 mm to 59.502 mm, the focal length F2 of the rear lens group ranges from 109.059 mm to 116.521 mm, the focal length F of the double telecentric projection lithography lens ranges from 1518.02 mm to 1968.58 mm, and the lens conjugate distance L of the double telecentric projection lithography lens ranges from 465.5 mm to 481.5 mm.

[0007] Further, a ninth lens, a tenth lens, and an eleventh lens are sequentially arranged between the eighth lens and the twelfth lens. The ninth lens is a biconcave negative lens, the tenth lens is a meniscus positive lens, and the eleventh lens is a biconvex positive lens.

[0008] Further, the front lens group satisfies the relational expression: -3.90 ≤ (f1 + f2 + f4 + f5) / (f3 + f6) ≤ -2.45, where f1 is the focal length of the first lens, f2 is the focal length of the second lens, f3 is the focal length of the third lens, f4 is the focal length of the fourth lens, f5 is the focal length of the fifth lens, and f6 is the focal length of the sixth lens.

[0009] The rear lens group satisfies the relational expression: -7.55 ≤ (f8 + f10 + f11 + f12) / (f7 + f9) ≤ -6.55, where f7 is the focal length of the seventh lens, f8 is the focal length of the eighth lens, f9 is the focal length of the ninth lens, f10 is the focal length of the tenth lens, f11 is the focal length of the eleventh lens, and f12 is the focal length of the twelfth lens.

[0010] Further, the first lens, the fifth lens, and the eighth lens are all made of domestic fluorocrown glass material. The second lens is made of domestic fluorocrown glass material or domestic light flint glass material. The third lens is made of domestic light crown glass material. The fourth lens, the tenth lens, and the twelfth lens are made of domestic optical quartz glass material. The sixth lens, the seventh lens, the ninth lens, and the eleventh lens are all made of domestic flint glass material or domestic light flint glass material.

[0011] Further, both the front lens group and the rear lens group adopt spherical mirrors. It is defined that if the object side or the image side of each lens protrudes convexly towards the object side, it is positive, and if it protrudes convexly towards the image side, it is negative; The radius range of the object side of the first lens is 170.908 mm < R11 < 185.824 mm, and the radius range of the image side of the first lens is -86.819 mm < R12 < -76.244 mm; The radius range on the object side of the second lens is 105.639 mm < R21 < 135.209 mm, and the radius range on the image side of the second lens is R22 < -232.627 mm; The radius range on the object side of the third lens is -76.813 mm < R31 < -73.339 mm, and the radius range on the image side of the third lens is -605.000 mm < R32 < -595.678 mm; The radius range on the object side of the fourth lens is 38.187 mm < R41 < 40.619 mm, and the radius range on the image side of the fourth lens is R42 > 423.371 mm; The radius range on the object side of the fifth lens is 54.710 mm < R51 < 62.940 mm, and the radius range on the image side of the fifth lens is R52 > 66.298 mm; The radius range on the object side of the sixth lens is -117.587 mm < R61 < -85.670 mm, and the radius range on the image side of the sixth lens is 23.903 mm < R62 < 26.719 mm; The radius range on the object side of the seventh lens is 356.754 mm < R71 < 392.042 mm, and the radius range on the image side of the seventh lens is 41.651 mm < R72 < 46.975 mm; The radius range on the object side of the eighth lens is 33.308 mm < R81 < 39.128 mm, and the radius range on the image side of the eighth lens is -37.113 mm < R82 < -31.716 mm; The radius range on the object side of the ninth lens is -22.555 mm < R91 < -21.090 mm, and the radius range on the image side of the ninth lens is 197.792 mm < R92 < 445.680 mm; The radius range on the object side of the tenth lens is -124.522 mm < R101 < -58.217 mm, and the radius range on the image side of the tenth lens is -36.667 mm < R102 < -33.784 mm; The radius range on the object side of the eleventh lens is 173.108 mm < R111 < 176.779 mm, and the radius range on the image side of the eleventh lens is -196.237 mm < R112 < -116.400 mm; The radius range on the object side of the twelfth lens is 112.856 mm < R121 < 284.061 mm, and the radius range on the image side of the twelfth lens is -1107.665 mm < R122 < -1104.665 mm or 223.961 mm < R122 < 226.961 mm.

[0012] Further, the eighth lens satisfies the relational expression: 0.024 ≤ (R81 + R82) / (R81 - R82) ≤ 0.027, where R81 is the curvature radius on the object side of the eighth lens, and R82 is the curvature radius on the image side of the eighth lens.

[0013] The ninth lens satisfies the relational expression: -0.95 ≤ (R91 + R92) / (R91 - R92) ≤ -0.80, where R91 is the curvature radius on the object side of the ninth lens, and R92 is the curvature radius on the image side of the ninth lens.

[0014] Further, the thickness T1 of the first lens ranges from 9.08 mm < T1 < 9.59 mm, and the air gap L1 between the first lens and the second lens ranges from 0.39 mm < L1 < 0.59 mm; The thickness T2 of the second lens ranges from 6.57 mm < T2 < 14.32 mm, and the air gap L2 between the second lens and the third lens ranges from 7.20 mm < L2 < 21.69 mm; The thickness T3 of the third lens ranges from 4.9 mm < T3 < 5.4 mm, and the air gap L3 between the third lens and the fourth lens ranges from 0.18 mm < L3 < 0.40 mm; The thickness T4 of the fourth lens ranges from 12.36 mm < T4 < 15.10 mm, and the air gap L4 between the fourth lens and the fifth lens ranges from 1.48 mm < L4 < 1.77 mm; The thickness T5 of the fifth lens ranges from 12.96 mm < T5 < 15.10 mm, and the air gap L5 between the fifth lens and the sixth lens ranges from 4.05 mm < L5 < 5.65 mm; The thickness T6 of the sixth lens ranges from 2.69 mm < T6 < 3.30 mm, and the air gap L6 between the sixth lens and the seventh lens ranges from 7.24 mm < L6 < 8.16 mm; The thickness T7 of the seventh lens ranges from 2.7 mm < T7 < 3.3 mm, and the air gap L7 between the seventh lens and the eighth lens ranges from 1.74 mm < L7 < 2.35 mm; The thickness T8 of the eighth lens ranges from 6.1 mm < T8 < 6.7 mm, and the air gap L8 between the eighth lens and the ninth lens ranges from 9.49 mm < L8 < 10.17 mm; The thickness T9 of the ninth lens ranges from 5.96 mm < T9 < 10.04 mm, and the air gap L9 between the ninth lens and the tenth lens ranges from 13.61 < L9 < 18.32 mm; The thickness T10 of the tenth lens ranges from 14.5 mm < T10 < 15.5 mm, and the air gap L10 between the tenth lens and the eleventh lens ranges from 1.16 < L10 < 15.55 mm; The thickness T11 of the eleventh lens ranges from 15.84 mm < T11 < 21.10 mm, and the air gap L11 between the eleventh lens and the twelfth lens ranges from 111.85 < L11 < 153.36 mm; The thickness L12 of the twelfth lens ranges from 10.01 mm < L12 < 15.10 mm.

[0015] Furthermore, the front lens group satisfies the relation: 0.3 ≤ T2 / L2 ≤ 2, where T2 is the thickness of the second lens, and L2 is the air gap between the second lens and the third lens.

[0016] The rear lens group satisfies the relation: 7.2 ≤ L10 / L11 ≤ 121.7, where L10 is the air gap between the tenth lens and the eleventh lens, and L11 is the air gap between the eleventh lens and the twelfth lens.

[0017] Furthermore, the first lens is a biconvex positive lens, the second lens is a biconvex positive lens or a plano-convex positive lens, the third lens is a meniscus negative lens, the fourth lens and the fifth lens are meniscus positive lenses or plano-convex positive lenses, the sixth lens is a biconcave negative lens, the seventh lens is a meniscus negative lens, the eighth lens is a biconvex positive lens, the ninth lens is a biconcave negative lens, the tenth lens is a meniscus positive lens, the eleventh lens is a biconvex positive lens, and the twelfth lens is a biconvex positive lens or a meniscus positive lens.

[0018] Furthermore, the distance between the side surface of the first lens close to the object side and the object side is 92.42 mm to 95.10 mm, and the distance between the side surface of the twelfth lens close to the image side and the image side is 57.19 mm to 61.34 mm; the wavelength range of the dual telecentric lithography lens is 375 nm ≤ λ ≤ 425 nm.

[0019] Furthermore, the effective field of view of the image side of the bi-telecentric projection lithography lens is Φ48 mm, the numerical aperture of the image side is 0.05, and the bi-telecentric projection lithography lens forms a bi-telecentric optical system for magnified imaging, and the magnification M=-2.00X.

[0020] Another aspect of the present invention provides a direct-write lithography device, comprising the dual-telecentric projection lithography lens described in any of the above technical solutions.

[0021] The double-telecentric projection lithography lens provided by the present invention solves the current achromatic aberration problem of ultraviolet wide-band lithography lenses and the difficult problems of processing and assembly, and ensures the full-band high transmittance and double-telecentric characteristics of the lens; when the lens is used under a high-power laser light source, the focal plane offset is guaranteed to be at the micron level, and the lens barrel diameter can ensure high-efficiency printing of the entire equipment, the difficulty of mass production is greatly reduced, and it can be applied to the production of various inks for PCB customers. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a structural schematic diagram of a dual telecentric projection lithography lens of Example 1; Figure 2 is a vertical axis chromatic aberration diagram of the double telecentric projection lithography lens of the first embodiment within the ultraviolet wide band; Figure 3 is a field curvature / distortion diagram of the dual telecentric projection lithography lens of the first embodiment; Figure 4 is an MTF diagram of the dual telecentric projection lithography lens of Example 1; Figure 5 is an axial chromatic aberration diagram of the double telecentric projection lithography lens of the first embodiment; Figure 6 is a schematic structural diagram of a dual telecentric projection lithography lens according to a second embodiment of the present invention; Figure 7 is a vertical axis chromatic aberration diagram of the double telecentric projection lithography lens in the second embodiment within the ultraviolet wide band; Figure 8 is a field curvature / distortion diagram of the dual telecentric projection lithography lens in the second embodiment; Fig. 9 is an MTF diagram of a dual telecentric projection lithography lens in an embodiment; Fig.10 1 is an axial chromatic aberration diagram of the double telecentric projection lithography lens in the second embodiment. DETAILED DESCRIPTION

[0023] In order to facilitate the understanding of the present invention, the present invention will be described more comprehensively below in conjunction with the specific embodiments. Preferred embodiments of the present invention are provided in the specific embodiments. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0024] The words "optionally" and the like in the present invention refer to embodiments of the present invention that can provide certain beneficial effects in certain circumstances. However, other embodiments may also be optional under the same circumstances or other circumstances. In addition, the statement of one or more optional embodiments does not imply that other embodiments are not available, nor is it intended to exclude other embodiments from the scope of the present invention.

[0025] The present invention provides a dual telecentric projection lithography lens, which is applied to a wide ultraviolet band, and comprises a front lens group, a stop 20 and a rear lens group arranged in sequence from the object side to the image side, wherein the telecentricity of the object side is ensured by the front lens group, and the telecentricity of the image side is ensured by the rear lens group. The stop 20 can be specifically selected as an aperture stop.

[0026] The front lens group includes six lenses arranged in sequence from the object side to the image side, specifically: a first lens 1, a second lens 2, a third lens 3, a fourth lens 4, a fifth lens 5 and a sixth lens 6. The third lens 3 and the sixth lens 6 are both negative lenses, and the remaining lenses in the front lens group are all positive lenses, that is, the first lens 1, the second lens 2, the fourth lens 4 and the fifth lens 5 are all positive lenses. In a specific embodiment, the first lens 1 can be a biconvex positive lens, the third lens 3 can be a meniscus negative lens, and the sixth lens 6 can be a biconcave negative lens.

[0027] The rear lens group includes a seventh lens 7, an eighth lens 8 and a twelfth lens 12 which are arranged in sequence from the object side to the image side, the seventh lens 7 is a negative lens, the eighth lens 8 and the twelfth lens 12 are both positive lenses, at least one meniscus positive lens and a biconcave negative lens are arranged between the eighth lens 8 and the twelfth lens 12, and the biconcave negative lens is located on a side close to the eighth lens 8.

[0028] In the field of optics, the object side (also called the object side) and the image side (also called the image side) refer to two different areas in the optical system, which are used to describe the different positions and directions of light in the process of propagating from the object to the image. In the optical system, the object side usually refers to the side where the light propagates from the object plane to the optical system. The light undergoes refraction, reflection, etc. in this area to form the incident end of the optical system; the image side refers to the area where the light is gathered and imaged after being modulated by the optical system. The light forms the final image in this area, that is, the image plane.

[0029] The front lens group is located at the starting point of the optical path and is responsible for the initial focusing, splitting and adjustment of the incident light to form an intermediate image. The light is initially shaped and modulated through the refraction, scattering and combination of the front lens group.

[0030] The aperture 20 is located between the front lens group and the rear lens group, and plays a role in limiting the angle of incident light and reducing scattered interference in the optical system. The aperture 20 will filter out some non-essential light, avoid interference and stray light, and ensure the clarity and quality of the image.

[0031] The rear lens group is immediately behind the aperture 20 and is responsible for further adjusting, focusing and imaging the light, and finally focusing the light onto the image plane to form a clear image. The rear lens group performs the final shaping and modulation of the light through its specific optical parameters to ensure the accuracy and clarity of the imaging.

[0032] The distance between the side surface of the first lens 1 close to the object side and the object side is 92.42 mm to 95.10 mm, and the distance between the side surface of the twelfth lens 12 close to the image side and the image side is 57.19 mm to 61.34 mm; the wavelength range value of the double telecentric lithography lens is 375 nm ≤ λ ≤ 425 nm, which is suitable for ultraviolet wide band.

[0033] The focal length F1 range of the front lens group is: 55.532mm≤F1≤59.502mm, the focal length F2 range of the rear lens group is: 109.059mm≤F2≤116.521mm, the focal length F range of the dual telecentric projection lithography lens is: 1518.02mm≤F≤1968.58mm, and the lens conjugate distance L range of the dual telecentric projection lithography lens is: 465.5mm≤L≤481.5mm.

[0034] The distance between the side surface of the first lens close to the object side and the object side is 92.42 mm to 95.10 mm, and the distance between the side surface of the twelfth lens close to the image side and the image side is 57.19 mm to 61.34 mm; the wavelength range of the double telecentric lithography lens is 375 nm ≤ λ ≤ 425 nm.

[0035] See also Figure 1 and Figure 2 As shown, in some specific embodiments of the present invention, a ninth lens 9, a tenth lens 10 and an eleventh lens 11 are sequentially arranged between the eighth lens 8 and the twelfth lens 12, the ninth lens 9 is a double concave negative lens, the tenth lens 10 is a meniscus positive lens, and the eleventh lens 11 is a double convex positive lens.

[0036] Specifically, the first lens 1 is a biconvex positive lens, the second lens 2 is a biconvex positive lens or a plano-convex positive lens, the third lens 3 is a meniscus negative lens, the fourth lens 4 and the fifth lens 5 are meniscus positive lenses or plano-convex positive lenses, the sixth lens 6 is a biconcave negative lens, the seventh lens 7 is a meniscus negative lens, the eighth lens 8 is a biconvex positive lens, the ninth lens 9 is a biconcave negative lens, the tenth lens 10 is a meniscus positive lens, the eleventh lens 11 is a biconvex positive lens, and the twelfth lens 12 is a biconvex positive lens or a meniscus positive lens.

[0037] Furthermore, each lens in the dual-telecentric projection lithography lens of the present invention is made of domestic glass materials, the first lens 1, the fifth lens 5 and the eighth lens 8 are all made of domestic fluor-crown glass materials, the second lens 2 is made of domestic fluor-crown glass material or domestic light flint glass material, the third lens 3 is made of domestic light crown glass material, the fourth lens 4, the tenth lens 10 and the twelfth lens 12 are set to be domestic optical quartz glass materials, the sixth lens 6, the seventh lens 7, the ninth lens 9 and the eleventh lens 11 are all made of domestic flint glass material or domestic light flint glass material, while ensuring the full-band transmittance and dual-telecentric characteristics of the lens, the cost of the projection lithography lens is effectively reduced.

[0038] Preferably, the front lens group satisfies the relationship (1): -3.90≤(f1+f2+f4+f5) / (f3+f6)≤-2.45 (1) Wherein, f1 is the focal length of the first lens 1, f2 is the focal length of the second lens 2, f3 is the focal length of the third lens 3, f4 is the focal length of the fourth lens 4, f5 is the focal length of the fifth lens 5, and f6 is the focal length of the sixth lens 6. In the present invention, each lens in the front lens group satisfies the above relationship (1), so that each lens in the front lens group has a good focal length distribution, so that the optical system has good image quality and low sensitivity.

[0039] The rear lens group satisfies the relationship (2): -7.55≤(f8+f 10 +f 11 +f 12 ) / (f7+f9)≤-6.55 (2) Wherein, f7 is the focal length of the seventh lens 7, f8 is the focal length of the eighth lens 8, f9 is the focal length of the ninth lens 9, and f 10 is the focal length of the tenth lens 10, f 11 is the focal length of the eleventh lens 11, f 12 is the focal length of the twelfth lens 12. In the present invention, each lens in the rear lens group satisfies the above relationship (2), so that each lens in the rear lens group has a good focal length distribution, so that the optical system has good image quality and low sensitivity.

[0040] In a specific embodiment of the present invention, the front lens group and the rear lens group both adopt spherical mirrors, each lens has an object plane side close to the object side of the double telecentric projection lithography lens, and an image plane side close to the image side of the double telecentric projection lithography lens, and the object plane side or image plane side of each lens is defined as positive when convex toward the object side and negative when convex toward the image side.

[0041] The radius range of the object side of the first lens 1 is 170.908 mm <R 11 <185.824mm, the radius range of the image side of the first lens 1 is -86.819mm <R 12 <-76.244mm; The radius of the object side of the second lens 2 is 105.639 mm <R 21 <135.209mm, the radius range of the image side of the second lens 2 is R 22 <-232.627mm; The radius range of the object side of the third lens 3 is -76.813 mm <R 31 <-73.339mm, the radius range of the image side of the third lens 3 is -605.000mm <R 32 <-595.678mm; The radius of the object side of the fourth lens 4 is 38.187 mm <R 41 <40.619 mm, the radius range of the image side of the fourth lens 4 is R 42 >423.371mm; The radius of the object side of the fifth lens 5 is 54.710 mm <R 51 <62.940mm, the radius range of the image side of the fifth lens 5 is R 52 >66.298mm; The radius range of the object side of the sixth lens 6 is -117.587 mm <R 61 <-85.670mm, the radius range of the image side of the sixth lens 6 is 23.903mm <R 62 <26.719mm; The radius of the object side of the seventh lens 7 is 356.754 mm <R 71 <392.042mm, the radius range of the image side of the seventh lens 7 is 41.651mm <R 72 <46.975mm; The radius range of the object side of the eighth lens 8 is 33.308 mm <R 81 <39.128mm, the radius range of the image side of the eighth lens 8 is -37.113mm <R 82 <-31.716mm; The radius range of the object side of the ninth lens 9 is -22.555 mm <R 91 <-21.090mm, the radius range of the image side of the ninth lens 9 is 197.792mm <R 92 <445.680mm; The radius range of the object side of the tenth lens 10 is -124.522 mm <R 101 <-58.217mm, the radius range of the image side of the tenth lens 10 is -36.667mm <R 102 <-33.784mm; The radius of the object side of the eleventh lens 11 is 173.108 mm <R 111 <176.779mm, the radius range of the image side of the eleventh lens 11 is -196.237mm <R 112 <-116.400mm; The radius of the object side of the twelfth lens 12 is 112.856 mm. <R 121 <284.061mm, the radius range of the image side of the twelfth lens 12 is -1107.665mm <R 122 <-1104.665mm or the radius range of the image side of the twelfth lens 12 is 223.961mm <R 122 <226.961mm.

[0042] Preferably, the eighth lens 8 satisfies the relationship: 0.024≤(R 81 +R 82 ) / (R 81 -R 82 )≤0.027 (3) Among them, R 81 is the radius of curvature of the object side of the eighth lens 8, R 82is the radius of curvature on the image side of the eighth lens 8. The eighth lens 8 satisfies the relational expression (3), can reasonably control the shape of the lens of the eighth lens 8, and is beneficial to reducing the spherical aberration of the optical system.

[0043] The ninth lens 9 satisfies the relational expression: -0.95 ≤ (R 91 + R 92 ) / (R 91 - R 92 ) ≤ -0.80, (4) wherein, R 91 is the radius of curvature on the object side of the ninth lens 9, and R 92 is the radius of curvature on the image side of the ninth lens 9. The ninth lens 9 satisfies the relational expression (4), can reasonably control the shape of the lens, and is beneficial to correcting the axial chromatic aberration of the optical system.

[0044] Furthermore, the thickness of each lens on the optical axis and the air interval range between two adjacent lenses are specifically as follows: The range of the thickness T1 of the first lens 1 is 9.08 mm < T1 < 9.59 mm, and the range of the air interval L1 between the first lens 1 and the second lens 2 is 0.39 mm < L1 < 0.59 mm; The range of the thickness T2 of the second lens 2 is 6.57 mm < T2 < 14.32 mm, and the range of the air interval L2 between the second lens 2 and the third lens 3 is 7.20 mm < L2 < 21.69 mm; The range of the thickness T3 of the third lens 3 is 4.9 mm < T3 < 5.4 mm, and the range of the air interval L3 between the third lens 3 and the fourth lens 4 is 0.18 mm < L3 < 0.40 mm; The range of the thickness T4 of the fourth lens 4 is 12.36 mm < T4 < 15.10 mm, and the range of the air interval L4 between the fourth lens 4 and the fifth lens 5 is 1.48 mm < L4 < 1.77 mm; The range of the thickness T5 of the fifth lens 5 is 12.96 mm < T5 < 15.10 mm, and the range of the air interval L5 between the fifth lens 5 and the sixth lens 6 is 4.05 mm < L5 < 5.65 mm; The range of the thickness T6 of the sixth lens 6 is 2.69 mm < T6 < 3.30 mm, and the range of the air interval L6 between the sixth lens 6 and the seventh lens 7 is 7.24 mm < L6 < 8.16 mm; The range of the thickness T7 of the seventh lens 7 is 2.7 mm < T7 < 3.3 mm, and the range of the air interval L7 between the seventh lens 7 and the eighth lens 8 is 1.74 mm < L7 < 2.35 mm; The thickness T8 of the eighth lens 8 ranges from 6.1 mm < T8 < 6.7 mm, and the air gap L8 between the eighth lens 8 and the ninth lens 9 ranges from 9.49 mm < L8 < 10.17 mm; The thickness T9 of the ninth lens 9 ranges from 5.96 mm < T9 < 10.04 mm, and the air gap L9 between the ninth lens 9 and the tenth lens 10 ranges from 13.61 < L9 < 18.32 mm; The thickness T of the tenth lens 10 10 ranges from 14.5 mm < T 10 < 15.5 mm, and the air gap L between the tenth lens 10 and the eleventh lens 11 10 ranges from 1.16 < L 10 < 15.55 mm; The thickness T of the eleventh lens 11 11 ranges from 15.84 mm < T 11 < 21.10 mm, and the air gap L between the eleventh lens 11 and the twelfth lens 12 11 ranges from 111.85 < L 11 < 153.36 mm; The thickness L of the twelfth lens 12 12 ranges from 10.01 mm < L 12 < 15.10 mm.

[0045] Preferably, the front lens group satisfies the relational expression: 0.3 ≤ T2 / L2 ≤ 2, (5) wherein, T2 is the thickness of the second lens, and L2 is the air gap between the second lens and the third lens.

[0046] In the dual-telecentric projection lithography lens of the present invention, the thickness of the second lens 2 and the air gap between the second lens 2 and the third lens 3 satisfy the relational expression (5), which helps to compress the optical total length of the front lens group and miniaturize the dual-telecentric projection lithography lens.

[0047] The rear lens group satisfies the relational expression: 7.2 ≤ L 10 / L 11 ≤ 121.7, (6) wherein, L 10 is the air gap between the tenth lens and the eleventh lens, and L 11is the air space between the eleventh lens and the twelfth lens. In the dual telecentric projection lithography lens of the present invention, the air space between the tenth lens 10 and the eleventh lens 11 and the air space between the eleventh lens 11 and the twelfth lens 12 satisfy the above relationship (6), which helps to compress the total optical length of the rear lens group behind the aperture 20, thereby miniaturizing the dual telecentric projection lithography lens.

[0048] The following is further described by means of specific examples.

[0049] See also Figure 1 As shown, Figure 1 : This is a structural schematic diagram of a double telecentric projection lithography lens according to Embodiment 1 of the present invention, wherein the first lens 1 is a biconvex positive lens, the second lens 2 is a biconvex positive lens, the third lens 3 is a meniscus negative lens, the fourth lens 4 and the fifth lens 5 are meniscus positive lenses, the sixth lens 6 is a biconcave negative lens, the seventh lens 7 is a meniscus negative lens, the eighth lens 8 is a biconvex positive lens, the ninth lens 9 is a biconcave negative lens, the tenth lens 10 is a meniscus positive lens, the eleventh lens 11 is a biconvex positive lens, and the twelfth lens 12 is a biconvex positive lens.

[0050] Table 1 shows the parameters of each lens in Example 1.

[0051]

[0052] In Table 1, R is the radius of curvature of the surface of each optical element, TH is the thickness of each optical element, Nd is the refractive index of each optical element, and Vd is the Abbe constant of each optical element. The diameter of all lenses is within 60 mm, which makes the photolithography lens miniaturized.

[0053] In the first embodiment, the first lens 1, the second lens 2, the fifth lens 5 and the eighth lens 8 are all made of domestic fluor crown glass, the third lens 3 is made of domestic light crown glass, the fourth lens 4, the tenth lens 10 and the twelfth lens 12 are made of domestic optical quartz glass, the sixth lens 6, the seventh lens 7, the ninth lens 9 and the eleventh lens 11 are all made of domestic light flint glass. The light source wavelength of the materials used in all optical components has a high transmittance in the range of 375nm-425nm.

[0054] After configuring according to Table 1, optical testing is performed and the results are obtained. Figure 2-Figure 5 Test data, Figure 2 : is the vertical axis chromatic aberration diagram of the double telecentric projection lithography lens in the embodiment within the designed ultraviolet wide band. Figure 2 It can be seen that the achromatic problem of the double telecentric projection lithography lens has been solved.

[0055] Figure 3: is the field curvature / distortion diagram of the double telecentric projection lithography lens in the embodiment. The field curvature of the fine beam is corrected within the range of 0.2mm, which meets the design requirements. Although the distortion does not affect the imaging quality, the size of the distortion affects the accuracy of the imaging. Through correction, the system distortion is below 1μm, which enables the optical system of the present invention to control the image spot radius below 4μm under different fields of view in a wide band, and control the field curvature aberration within the range of -0.2mm to 0.2mm, so that the distortion of the optical system is controlled within the range of 1μm.

[0056] Figure 4 is a diagram of the MTF (Modulation Transfer Function) of the dual telecentric projection lithography lens in the embodiment; Figure 4 It can be seen that the MTF value of the system at 100lp / mm is relatively close to the diffraction limit.

[0057] Figure 5 is the axial chromatic aberration diagram of the double telecentric projection lithography lens in Example 1, Figure 5 It can be seen that the axial chromatic aberration of this optical system in a wide band at different apertures is within 0.2 mm.

[0058] The effective field of view of the image side of the bi-telecentric projection lithography lens is Φ48mm, and the numerical aperture of the image side is 0.05. The bi-telecentric projection lithography lens forms a bi-telecentric optical system for magnified imaging, and the magnification M=-2.00X, where the negative sign indicates inverted imaging. The lens diameter D of the bi-telecentric projection lithography lens is ≤60mm, realizing the miniaturization of the projection lithography lens.

[0059] The dual telecentric projection lithography lens of this embodiment forms an afocal system, which has a simple structure, a small size, good processing performance and low cost, and excellent imaging performance. In addition, under long-term irradiation with a laser with a laser wavelength of 375nm~425nm and a laser light power of about 100W, the optimal focal plane position of the exposure surface changes with temperature by ≤3μm / ℃.

[0060] See also Figure 6 As shown, Figure 6 : This is a structural schematic diagram of a double telecentric projection lithography lens according to Embodiment 2 of the present invention, wherein the first lens 1 is a biconvex positive lens, the second lens 2 is a plano-convex positive lens, the third lens 3 is a meniscus negative lens, the fourth lens 4 and the fifth lens 5 are plano-convex positive lenses, the sixth lens 6 is a biconcave negative lens, the seventh lens 7 is a meniscus negative lens, the eighth lens 8 is a biconvex positive lens, the ninth lens 9 is a biconcave negative lens, the tenth lens 10 is a meniscus positive lens, the eleventh lens 11 is a biconvex positive lens, and the twelfth lens 12 is a meniscus positive lens.

[0061] Table 2 Lens parameters of Example 2.

[0062]

[0063] In Table 2, R is the radius of curvature of the surface of each optical element, TH is the thickness of each optical element, Nd is the refractive index of each optical element, and Vd is the Abbe constant of each optical element. The diameter of all lenses is within 60 mm, which makes the photolithography lens miniaturized.

[0064] The first lens 1, the second lens 2, the fifth lens 5 and the eighth lens 8 in the second embodiment are all made of domestic fluorine crown glass, the second lens 2 is made of domestic light flint glass, the third lens 3 is made of domestic light crown glass, the fourth lens 4, the tenth lens 10 and the twelfth lens 12 are made of domestic optical quartz glass, the sixth lens 6, the seventh lens 7, the ninth lens 9 and the eleventh lens 11 are all made of domestic light flint glass. The material light source used in all optical components has a high transmittance at a wavelength of 375nm-425nm.

[0065] Figure 7 : is the vertical axis chromatic aberration diagram of the double telecentric projection lithography lens in the second embodiment within the designed ultraviolet wide band. Figure 7 It can be seen that the achromatic aberration problem of this photolithography lens has been solved.

[0066] Figure 8 This is the field curvature / distortion diagram of the double telecentric projection lithography lens in Example 2. The field curvature of the fine beam is corrected within the range of 0.2mm, which meets the design requirements. Although the distortion does not affect the imaging quality, the size of the distortion affects the accuracy of the imaging. Through correction, the system distortion is below 1μm, which enables the optical system of the present invention to control the image spot radius below 2.5μm under different fields of view within a wide band, and control the field curvature aberration within the range of -0.2mm to 0.2mm, so that the distortion of the optical system is controlled within the range of 1μm.

[0067] Fig. 9 is the MTF diagram of the dual telecentric projection lithography lens in Example 2; Fig. 9 It can be seen that the MTF value of the system at 100lp / mm is relatively close to the diffraction limit.

[0068] Fig.10 is the axial chromatic aberration diagram of the double telecentric projection lithography lens in Example 2, Fig.10 It can be seen that the axial chromatic aberration of this optical system in a wide band at different apertures is within 0.2 mm.

[0069] The effective field of view of the image side of the bi-telecentric projection lithography lens is Φ48mm, and the numerical aperture of the image side is 0.05. The bi-telecentric projection lithography lens forms a bi-telecentric optical system for magnified imaging, and the magnification M=-2.00X, where the negative sign indicates inverted imaging. The lens diameter D of the bi-telecentric projection lithography lens is ≤60mm, realizing the miniaturization of the projection lithography lens.

[0070] Compared with Example 1, the second lens 2 in Example 2 adopts the domestic light flint glass material QF50GTI, rather than the domestic fluor-crown glass material H-FK61 in Example 1, so that the optical performance of the double telecentric projection lithography lens is better: the vertical axis chromatic aberration is better, the image spot radius is controlled below 2.5μm, the MTF value at 100lp / mm is higher, and the magnification is kept unchanged.

[0071] The dual telecentric projection lithography lens of this embodiment forms an afocal system, which has a simple structure, a small size, good processing performance and low cost, and excellent imaging performance. In addition, under long-term irradiation with a laser with a laser wavelength of 375nm~425nm and a laser light power of about 100W, the optimal focal plane position of the exposure surface changes with temperature by ≤3μm / ℃, ensuring that the focal plane offset is at the micron level when used under a high-power laser light source, and has excellent temperature drift performance.

[0072] It can be seen from the above two embodiments that the dual-telecentric projection lithography lens applied in the present invention solves the problem of achromatism of wide-band projection lithography lenses and can realize the exposure of various inks. At the same time, the tolerance distribution of the projection lithography lens is more reasonable, the difficulty of processing and assembly is greatly reduced, and the difficulty of mass production is greatly reduced, thereby improving the production efficiency of the lens.

[0073] In addition, the dual-telecentric projection lithography lens applied for by the present invention has object-side telecentricity and image-side telecentricity that can meet the standards of general telecentric lenses and has an extremely high telecentricity level. The telecentricity is less than 0.1 degrees, the depth of field is large, and the image magnification can be kept consistent within a certain object distance range. The extremely small distortion greatly reduces the image distortion, thereby further improving its detection accuracy, and can be fully applied to future industrial detection fields.

[0074] On the other hand, the present invention further provides a direct writing lithography device, which is provided with a dual telecentric projection lithography lens. The specific structure of the dual telecentric projection lithography lens is as described above and will not be repeated here. The direct writing lithography device of the present invention can realize high power, miniaturization and excellent temperature drift performance of the projection lens, can realize exposure of various inks, and effectively improve the production capacity of LDI lithography equipment.

[0075] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A double telecentric projection lithography lens, which is applied to the ultraviolet wide band, includes a front lens group, a diaphragm, and a rear lens group sequentially arranged from the object side to the image side. It is characterized in that: The front lens group includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, and a sixth lens sequentially arranged from the object side to the image side. The third lens and the sixth lens are both negative lenses, and the remaining lenses in the front lens group are all positive lenses; The rear lens group includes a seventh lens, an eighth lens, and a twelfth lens sequentially arranged from the object side to the image side. The seventh lens is a negative lens, the eighth lens and the twelfth lens are both positive lenses. At least one meniscus positive lens and a biconcave negative lens are arranged between the eighth lens and the twelfth lens, and the biconcave negative lens is located on the side close to the eighth lens.

2. The double telecentric projection lithography lens according to claim 1, characterized in that: The focal length F1 of the front lens group ranges from: 55.532 mm ≤ F1 ≤ 59.502 mm, the focal length F2 of the rear lens group ranges from: 109.059 mm ≤ F2 ≤ 116.521 mm, the focal length F of the double telecentric projection lithography lens ranges from: 1518.02 mm ≤ F ≤ 1968.58 mm, and the lens conjugate distance L of the double telecentric projection lithography lens ranges from: 465.5 mm ≤ L ≤ 481.5 mm.

3. The dual telecentric projection lithography lens according to claim 1, characterized in that: A ninth lens, a tenth lens, and an eleventh lens are sequentially arranged between the eighth lens and the twelfth lens. The ninth lens is a biconcave negative lens, the tenth lens is a meniscus positive lens, and the eleventh lens is a biconvex positive lens.

4. The double telecentric projection lithography lens according to claim 3, characterized in that: The front lens group satisfies the relational expression: -3.90 ≤ (f1 + f2 + f4 + f5) / (f3 + f6) ≤ -2.45, where f1 is the focal length of the first lens, f2 is the focal length of the second lens, f3 is the focal length of the third lens, f4 is the focal length of the fourth lens, f5 is the focal length of the fifth lens, and f6 is the focal length of the sixth lens; The rear lens group satisfies the relational expression: -7.55≤(f8+f 10 +f 11 +f 12 ) / (f7+f9)≤-6.55, Among them, f7 is the focal length of the seventh lens, f8 is the focal length of the eighth lens, f9 is the focal length of the ninth lens, and f 10 is the focal length of the tenth lens, f 11 is the focal length of the eleventh lens, f 12 is the focal length of the twelfth lens.

5. The dual telecentric projection lithography lens according to claim 3, characterized in that: The first lens, the fifth lens, and the eighth lens are all made of domestic fluorite crown glass materials. The second lens is made of domestic fluorite crown glass materials or domestic light flint glass materials. The third lens is made of domestic light crown glass materials. The fourth lens, the tenth lens, and the twelfth lens are made of domestic optical quartz glass materials. The sixth lens, the seventh lens, the ninth lens, and the eleventh lens are all made of domestic flint glass materials or domestic light flint glass materials.

6. The dual telecentric projection lithography lens according to claim 3, characterized in that: Both the front lens group and the rear lens group adopt spherical mirrors. It is defined that the convex side of the object side or the image side of each lens facing the object side is positive, and the convex side facing the image side is negative; The radius range of the object side of the first lens is 170.908 mm <R 11 <185.824mm, the radius range of the image side of the first lens is -86.819mm <R 12 <-76.244mm; The radius range of the object side of the second lens is 105.639 mm <R 21 <135.209mm, the radius range of the image side of the second lens is R 22 <-232.627mm; The radius range of the object side of the third lens is -76.813 mm <R 31 <-73.339mm, the radius range of the image side of the third lens is -605.000mm <R 32 <-595.678mm; The radius of the object side of the fourth lens is 38.187 mm <R 41 <40.619mm, the radius range of the image side of the fourth lens is R 42 >423.371mm; The radius range of the object side of the fifth lens is 54.710 mm <R 51 <62.940mm, the radius range of the image side of the fifth lens is R 52 >66.298mm; The radius range of the object side of the sixth lens is -117.587 mm <R 61 <-85.670mm, the radius range of the image side of the sixth lens is 23.903mm <R 62 <26.719mm; The radius range of the object side of the seventh lens is 356.754 mm <R 71 <392.042mm, the radius range of the image side of the seventh lens is 41.651mm <R 72 <46.975mm; The radius range of the object side of the eighth lens is 33.308 mm <R 81 <39.128mm, the radius range of the image side of the eighth lens is -37.113mm <R 82 <-31.716mm; The radius range of the object side of the ninth lens is -22.555 mm <R 91 <-21.090mm, the radius range of the image side of the ninth lens is 197.792mm <R 92 <445.680mm; The radius range of the object side of the tenth lens is -124.522 mm <R 101 <-58.217mm, the radius range of the image side of the tenth lens is -36.667mm <R 102 <-33.784mm; The radius range of the object side of the eleventh lens is 173.108 mm <R 111 <176.779mm, the radius range of the image side of the eleventh lens is -196.237mm <R 112 <-116.400mm; The radius range of the object side of the twelfth lens is 112.856 mm <R 121 <284.061mm, the radius range of the image side of the twelfth lens is -1107.665mm <R 122 <-1104.665mm or 223.961mm <R 122 <226.961mm.

7. The dual telecentric projection lithography lens according to claim 6, characterized in that: The eighth lens satisfies the relational expression: 0.024≤(R 81 +R 82 ) / (R 81 -R 82 )≤0.027, Among them, R 81 is the radius of curvature of the object side of the eighth lens, R 82 is the radius of curvature of the image surface side of the eighth lens; The ninth lens satisfies the relational expression: -0.95≤(R 91 +R 92 ) / (R 91 -R 92 )≤-0.80, Among them, R 91 is the radius of curvature of the object side of the ninth lens, R 92 is the curvature radius of the image surface side of the ninth lens.

8. The dual telecentric projection lithography lens according to claim 3, characterized in that: The thickness T1 of the first lens ranges from 9.08 mm < T1 < 9.59 mm, and the air gap L1 between the first lens and the second lens ranges from 0.39 mm < L1 < 0.59 mm; The thickness T2 of the second lens ranges from 6.57 mm < T2 < 14.32 mm, and the air gap L2 between the second lens and the third lens ranges from 7.20 mm < L2 < 21.69 mm; The thickness T3 of the third lens ranges from 4.9 mm < T3 < 5.4 mm, and the air gap L3 between the third lens and the fourth lens ranges from 0.18 mm < L3 < 0.40 mm; The thickness T4 of the fourth lens ranges from 12.36 mm < T4 < 15.10 mm, and the air gap L4 between the fourth lens and the fifth lens ranges from 1.48 mm < L4 < 1.77 mm; The thickness T5 of the fifth lens ranges from 12.96 mm < T5 < 15.10 mm, and the air gap L5 between the fifth lens and the sixth lens ranges from 4.05 mm < L5 < 5.65 mm; The thickness T6 of the sixth lens ranges from 2.69 mm < T6 < 3.30 mm, and the air gap L6 between the sixth lens and the seventh lens ranges from 7.24 mm < L6 < 8.16 mm; The thickness T7 of the seventh lens ranges from 2.7 mm < T7 < 3.3 mm, and the air gap L7 between the seventh lens and the eighth lens ranges from 1.74 mm < L7 < 2.35 mm; The thickness T8 of the eighth lens ranges from 6.1 mm < T8 < 6.7 mm, and the air gap L8 between the eighth lens and the ninth lens ranges from 9.49 mm < L8 < 10.17 mm; The thickness T9 of the ninth lens ranges from 5.96 mm < T9 < 10.04 mm, and the air gap L9 between the ninth lens and the tenth lens ranges from 13.61 < L9 < 18.32 mm; The thickness T of the tenth lens 10 The range is 14.5mm <T 10 <15.5mm, the air gap L between the tenth lens and the eleventh lens 10 The range is 1.16 <L 10 <15.55mm; The thickness T of the eleventh lens 11 The range is 15.84mm <T 11 <21.10mm, the air gap L between the eleventh lens and the twelfth lens 11 The range is 111.85 <L 11 <153.36mm; The thickness L of the twelfth lens 12 The range is 10.01mm <L 12 <15.10mm.

9. The dual telecentric projection lithography lens according to claim 8, characterized in that: The front lens group satisfies the relation: 0.3 ≤ T2 / L2 ≤ 2, where T2 is the thickness of the second lens and L2 is the air gap between the second lens and the third lens; The rear lens group satisfies the relation: 7.2≤L 10 / L 11 ≤121.7, Among them, L 10 is the air space between the tenth lens and the eleventh lens, L 11 is the air space between the eleventh lens and the twelfth lens.

10. The dual telecentric projection lithography lens according to claim 3, characterized in that: The first lens is a biconvex positive lens, the second lens is a biconvex positive lens or a plano-convex positive lens, the third lens is a meniscus negative lens, the fourth lens and the fifth lens are meniscus positive lenses or plano-convex positive lenses, the sixth lens is a biconcave negative lens, the seventh lens is a meniscus negative lens, the eighth lens is a biconvex positive lens, the ninth lens is a biconcave negative lens, the tenth lens is a meniscus positive lens, the eleventh lens is a biconvex positive lens, and the twelfth lens is a biconvex positive lens or a meniscus positive lens.

11. The dual telecentric projection lithography lens according to claim 1, characterized in that: The distance between the side of the first lens adjacent to the object side and the object side is 92.42 mm to 95.10 mm, and the distance between the side of the twelfth lens adjacent to the image side and the image side is 57.19 mm to 61.34 mm; the wavelength range of the double telecentric lithography lens is 375 nm ≤ λ ≤ 425 nm.

12. The dual telecentric projection lithography lens according to claim 1, characterized in that: The effective field of view of the image side of the bi-telecentric projection lithography lens is Φ48 mm, and the numerical aperture of the image side is 0.

05. The bi-telecentric projection lithography lens forms a bi-telecentric optical system for magnified imaging, and the magnification M=-2.00X.

13. A direct writing lithography apparatus, characterized in that: The invention comprises the dual telecentric projection lithography lens as described in any one of claims 1 to 12.

Images