Infrared characteristic simulation material design method

By converting the initial image into a grayscale map and etching or weaving the film material in combination with the filling rule function, the problem of easy rewriting of the existing infrared anti-counterfeiting code is solved. The generated infrared feature simulation material has the characteristics of high resolution and difficulty in rewriting, achieving effective infrared anti-counterfeiting effect.

CN119993344AActive Publication Date: 2025-05-13HARBIN INST OF TECH +1
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Patent Information

Application Number
CN202510085226.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-20
Publication Date
2025-05-13
Estimated Expiration
2045-01-20

AI Technical Summary

Technical Problem

Existing infrared anti-counterfeiting codes are easily copied and it is difficult to deal with professional counterfeiting methods.

Method used

By converting the initial image into a grayscale map, the position information and values ​​of each pixel point are read, and the low emissivity film material is etched or braided in combination with the filling rule function to obtain infrared feature simulation materials.

Benefits of technology

The generated infrared feature simulation material corresponds to the initial image, has high resolution and is difficult to rewrite, effectively realizes infrared anti-counterfeiting, and is low in cost, eliminating difficulties.

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Abstract

According to the infrared feature simulation material design method, an initial image is converted into a grey-scale map, each pixel point value of the grey-scale map is obtained, and a filling rule function is obtained according to the pixel point maximum value and the pixel point minimum value; the infrared low-emissivity thin film material is etched or woven according to the filling rule function to obtain the infrared characteristic simulation material, and the infrared characteristic simulation material is used for manufacturing the anti-counterfeiting mark, so that the anti-counterfeiting function can be realized, the anti-counterfeiting mark is not easy to copy, the anti-counterfeiting cost is low, and the anti-counterfeiting mark is difficult to remove; the problem that an existing anti-fake infrared mark is prone to being duplicated can be effectively solved.
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Description

Technical Field

[0001] The present application belongs to the field of infrared simulation materials, and specifically relates to a method for designing infrared characteristic simulation materials. Background Art

[0002] High-end products and important documents in our daily life usually need to add anti-counterfeiting labels, among which infrared anti-counterfeiting labels are an important criterion for identifying the authenticity of products. However, with the development of infrared display technology, counterfeiting techniques to remove or rewrite infrared digital anti-counterfeiting codes (infrared secret codes) are emerging in an endless stream. Simple infrared anti-counterfeiting codes such as digital codes or barcodes are no longer able to cope with the counterfeiting methods of professional counterfeiters. Summary of the invention

[0003] In order to solve the problem that infrared anti-counterfeiting marks are easily copied in the prior art, a method for designing infrared characteristic simulation materials is proposed; the infrared characteristic simulation material obtained by this method corresponds to the initial image, has high resolution, is difficult to copy, and can effectively achieve infrared anti-counterfeiting;

[0004] A method for designing infrared characteristic simulation materials, comprising:

[0005] Step 1: Convert the initial image into a grayscale image, read the position information and pixel value of each pixel in the grayscale image, and obtain a pixel data matrix according to the position information and corresponding pixel value of each pixel;

[0006] Step 2: Select the maximum pixel value N in the pixel data matrix max and the minimum pixel value N min , set the maximum pixel value N max The corresponding number of lines is 0, and the minimum pixel value is N min The corresponding number of dashes is m, where m is an integer;

[0007] N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min Corresponding dependent variables, the two sets of independent variables and dependent variables are substituted into the set initial rule function respectively to obtain the value of the constant in the initial rule function, and the filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function;

[0008] Step 3: Calculate the number of dashed lines corresponding to each pixel point according to the obtained filling rule function and the value of each pixel point in the pixel point data matrix;

[0009] Step 4: According to the number of scribing lines corresponding to each pixel and the position information of each pixel in the pixel data matrix, the low emissivity thin film material is scribed, etched or woven to obtain the infrared characteristic simulation material.

[0010] Beneficial Effects

[0011] The present application discloses a method for designing infrared characteristic simulation materials, which converts an initial image into a grayscale image, etches or weaves an infrared low-emissivity thin film material according to the pixel value and position information of each pixel point in the grayscale image in combination with a filling rule function to obtain the infrared characteristic simulation material; the infrared characteristic simulation material obtained by this method corresponds to the initial image, and the resolution of the infrared characteristic simulation material can be adjusted by changing the filling rule function; the infrared anti-counterfeiting mark made of the infrared characteristic simulation material is difficult to copy, and infrared anti-counterfeiting can be effectively realized, with low anti-counterfeiting cost and difficulty in removing. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 A flow chart of a method for designing infrared characteristic simulation materials according to a specific embodiment of the present application;

[0013] Figure 2 This is a schematic diagram of ITO thin film etching according to a specific embodiment of the present application;

[0014] Figure 3 A landscape image of Harbin Institute of Technology for the specific implementation of this application;

[0015] Figure 4 The infrared image of the landscape of Harbin Institute of Technology when the initial rule function of the specific implementation mode of the present application is a quadratic function;

[0016] Figure 5 The infrared image of the landscape of Harbin Institute of Technology when the initial rule function of the specific implementation mode of the present application is a linear function;

[0017] Figure 6 The infrared image of the landscape of Harbin Institute of Technology when the initial rule function of the specific implementation mode of the present application is a half power function;

[0018] Figure 7 An image of the famous painting "Ink Bamboo" which is a specific implementation of this application;

[0019] Figure 8 The infrared image of the famous painting "Ink Bamboo" when the initial rule function of the specific implementation mode of the present application is a quadratic function;

[0020] Fig. 9 An image of the famous painting "A Thousand Miles of Rivers and Mountains (Part)" according to a specific embodiment of the present application;

[0021] Fig.10The infrared image of the famous painting "A Thousand Miles of Rivers and Mountains (Part)" when the initial rule function of the specific implementation method of the application is a quadratic function. DETAILED DESCRIPTION

[0022] Specific implementation method 1: The following will be combined with the attached embodiment of the present invention Figure 1 To Attachment Fig.10 , illustrate this implementation mode, and clearly and completely describe the technical solutions in the embodiments of the present invention:

[0023] A method for designing infrared characteristic simulation materials, comprising:

[0024] Step 1: Convert the initial image into a grayscale image, read the position information and pixel value of each pixel in the grayscale image, and obtain a pixel data matrix according to the position information and corresponding pixel value of each pixel;

[0025] Step 2: Select the maximum pixel value N in the pixel data matrix max and the minimum pixel value N min , set the maximum pixel value N max The corresponding number of lines is 0, and the minimum pixel value is N min The corresponding number of dashes is m, where m is an integer;

[0026] N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min Corresponding dependent variables, the two sets of independent variables and dependent variables are substituted into the set initial rule function respectively to obtain the value of the constant in the initial rule function, and the filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function;

[0027] Step 3: Calculate the number of dashed lines corresponding to each pixel point according to the obtained filling rule function and the value of each pixel point in the pixel point data matrix;

[0028] Step 4: According to the number of scribing lines corresponding to each pixel and the position information of each pixel in the pixel data matrix, the low emissivity thin film material is scribed, etched or woven to obtain the infrared characteristic simulation material.

[0029] Specifically, a uniform surface has a constant infrared emissivity and can only show a single color under an infrared camera, while the total infrared emissivity of a surface with different materials can be expressed as the sum of the products of the emissivity of multiple different materials and their filling ratios. Therefore, the total infrared emissivity of the material can be controlled by covering one material with another material in proportion or removing the surface material in proportion to expose the underlying material. The infrared emissivity of each unit area in the infrared feature simulation material obtained by the infrared feature simulation material design method of the present application corresponds to the pixel value of the corresponding pixel point of the original image. The infrared anti-counterfeiting mark made of the infrared feature simulation material is difficult to copy, which can effectively realize infrared anti-counterfeiting;

[0030] In addition, using an infrared camera to photograph infrared characteristic simulation materials can obtain an infrared image corresponding to the initial image; this method can realize infrared band imaging of complex patterns, and this method can also be used for pixel-level infrared stealth and other aspects.

[0031] Furthermore, the infrared low emissivity film material is an ITO film, a metal film layer or an infrared low emissivity cloth.

[0032] Furthermore, the number of drawn lines m=a / d, where a is the side length of each pixel in the grayscale image, and d is the set minimum processing accuracy.

[0033] Furthermore, the initial rule function is a quadratic function, a linear function or a one-half power function.

[0034] Specifically, when the initial rules respectively select quadratic function, linear function and one-half power function, the obtained filling rule functions are different, the number of strokes corresponding to each pixel point is different, and the final infrared characteristic simulation materials are also different; the infrared image obtained by the infrared camera shooting the infrared characteristic simulation material has different visual brightness, which changes in a gradient; therefore, the filling rule function can be adjusted by adjusting the initial rule function, and then infrared photos of different brightness and levels can be customized.

[0035] Furthermore, N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including:

[0036] The initial rule function is a quadratic function y = Ax 2 +C, N max As an independent variable, the number of dashes 0 is used as the maxThe corresponding dependent variable is substituted into the quadratic function y = Ax 2 +C, get the first intermediate function; N min As an independent variable, the number of lines m is related to N min Substitute the corresponding dependent variable into the quadratic function y=Ax 2 +C, and obtain the second intermediate function; according to the first intermediate function and the second intermediate function, obtain the values ​​of constants A and C; according to the obtained values ​​of constants A and C and the quadratic function expression, obtain the filling rule function.

[0037] Furthermore, N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including:

[0038] The initial rule function is a linear function y=kx+D, and N max As the independent variable, the number of strokes 0 as the dependent variable, substitute into the linear function y = kx + D, and get the first intermediate function; min As the independent variable, the number of strokes m is substituted into the linear function y=kx+D as the dependent variable to obtain the second intermediate function; the values ​​of constants k and D are obtained based on the obtained first intermediate function and second intermediate function; the filling rule function is obtained based on the obtained values ​​of constants k and D and the linear function expression.

[0039] Furthermore, N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including:

[0040] The initial rule function is a power function of one half N max As an independent variable, and the maximum value of pixel point N max The corresponding number of dashes 0 is used as the dependent variable and substituted into the half-power function Get the first intermediate function; min As an independent variable, and the minimum pixel value N min The corresponding number of dashes m is substituted into the half-power function as the dependent variable A second intermediate function is obtained; values ​​of constants E and F are obtained according to the obtained first intermediate function and the second intermediate function; a filling rule function is obtained according to the obtained values ​​of constants E and F and a one-half power function expression.

[0041] Specifically, the filling rule function is usually determined by the initial rule function, the pixel side length and the processing accuracy. Assume that the pixel side length is a and the minimum processing accuracy is d. If the fixed pixel data is the minimum value N in the figure min The corresponding processing times are a / d (complete coverage or complete removal), and the pixel data is the maximum value N in the figure. max When the corresponding processing times is 0 (no processing). 2 +C as the initial rule function, N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function, and then the filling rule function is determined. According to the filling rule function, a pixel value within a given range can get a processing number.

[0042] Similarly, the resolution of the infrared characteristic simulation material can be adjusted by changing the form of the filling rule function, thereby changing the visual effect of the infrared image corresponding to the initial image taken by the infrared camera; the filling rule function can also be other functions in addition to the quadratic function, linear function and half-power function provided in this specific embodiment.

[0043] Furthermore, the infrared low-emissivity thin film material covers the surface of the substrate, and the infrared emissivity of the substrate is greater than the infrared emissivity of the low-emissivity thin film material.

[0044] Specifically, Figure 2 As shown, when the low emissivity film material is an ITO film and the substrate is PET (polyester resin), a laser etcher with a scribing accuracy of 0.025 mm is used to etch the ITO film. After the surface ITO film is removed by the laser, the PET substrate is exposed, wherein the infrared emissivity of the ITO film is 0.15 and the emissivity of the PET substrate is 0.95.

[0045] Furthermore, the low-emissivity thin film material after etching or weaving is used to make infrared anti-counterfeiting labels.

[0046] Specific embodiment 1: Figure 3The Harbin Institute of Technology landscape image (resolution 300×200) shown is converted into a grayscale image using the Image.convert('L') function in the PTL library in Python. The side length of each pixel in the grayscale image is 1 mm. The value of each pixel in the grayscale image is read using the Image.getdata(·) function in the PTL library in Python and stored as a table. The value of each pixel in the table is traversed by programming, and a quadratic function is selected as the initial rule function. When the pixel value is 0, the processing times is set to 40, that is, the number of strokes is 40, and when the pixel value is 255, the processing times is set to 0, that is, the number of strokes is 0. The number of crossed lines is 0; 255 is used as the independent variable, the number of crossed lines 0 is used as the dependent variable corresponding to 255, 0 is used as the independent variable, and the number of crossed lines 40 is used as the dependent variable corresponding to 0, respectively, and they are substituted into the set quadratic function to obtain the constant value in the quadratic function, and further obtain the filling rule function; during the traversal process, the value of each pixel point in the grayscale image read is used to obtain the processing times corresponding to each pixel point, that is, the number of straight lines in each pixel point; when the traversal is completed, a complete CAD processing drawing corresponding to the pixel point and the processing times is obtained, and according to the processing drawing, a laser etcher (scribing accuracy of 0.025mm) is used to scribe and etch on the transparent conductive ITO film to obtain the corresponding Figure 3 The infrared characteristic simulation material corresponding to the landscape of Harbin Institute of Technology shown in the figure; the surface resistance of the transparent conductive ITO film is 3Ω / sq, the size is 300mm×200mm, the infrared emissivity is 0.15, the transparent conductive ITO film is covered on the surface of the PET substrate, and the ITO film on the surface of the PET substrate is removed by laser to expose the PET substrate with an emissivity of 0.95; the infrared characteristic simulation material is photographed using an infrared camera to obtain the following Figure 4 Infrared image of Harbin Institute of Technology landscape when the initial rule function is a quadratic function.

[0047] Similarly, when a linear function is selected as the initial rule function, the low emissivity thin film material is scribed, etched or woven to obtain an infrared characteristic simulation material, and an infrared camera is used to photograph the infrared characteristic simulation material to obtain the following Figure 5 The infrared image of the Harbin Institute of Technology landscape shown in Figure 1. When the half-power function is selected as the initial rule function, the following is obtained: Figure 6 The infrared image of the Harbin Institute of Technology landscape shown in the figure; Figure 4 , Figure 5 and Figure 6 By comparison, it can be found that the initial rule functions are different, and the brightness of the infrared images obtained by using an infrared camera to shoot infrared characteristic simulation materials is different.

[0048] Specific embodiment 2: Figure 7The famous painting "Ink Bamboo" image (resolution 262×300) shown in the figure is converted into a grayscale image, and the side length of each pixel in the grayscale image is 1 mm; the value of each pixel in the grayscale image is read and stored as a table, and the value of each pixel in the table is traversed by programming, and a quadratic function is selected as the initial rule function. When the pixel value is 0, the processing times is set to 40, that is, the number of strokes is 40, and when the pixel value is 255, the processing times is set to 0, that is, the number of strokes is 0; 255 is used as the independent variable, and the number of strokes 0 is used as the dependent variable corresponding to 255, and 0 is used as the dependent variable corresponding to 255. As the independent variable, the number of scribing lines 40 as the dependent variable corresponding to 0 is substituted into the set quadratic function to obtain the constant value in the quadratic function, and further obtain the filling rule function; during the traversal process, the value of each pixel point in the grayscale image is read through the corresponding function to obtain the number of processing times corresponding to each pixel point, that is, the number of straight lines in each pixel point; when the traversal is completed, a complete processing drawing corresponding to the pixel point and the number of processing times is obtained. According to the processing drawing, a laser etcher (scribing accuracy of 0.025mm) is used to scribe and etch on the transparent conductive ITO film to obtain the corresponding Figure 7 The infrared characteristic simulation material corresponding to the image of the famous painting "Ink Bamboo" shown in the figure; the surface resistance of the transparent conductive ITO film is 3Ω / sq, the size is 262mm×300mm, and the infrared emissivity is 0.15. After the surface ITO is removed by laser, the PET substrate with an emissivity of 0.95 is exposed. The infrared characteristic simulation material is photographed with an infrared camera to obtain the following Figure 8 The infrared image of the famous painting "Ink Bamboo" when the initial rule function is a quadratic function.

[0049] Specific embodiment three: Fig. 9 The famous painting "A Thousand Miles of Rivers and Mountains (Part)" shown in the figure (resolution of 300×168) is converted into a grayscale image, and the side length of each pixel in the grayscale image is 1 mm; the value of each pixel in the grayscale image is read and stored as a table, and the value of each pixel in the table is traversed by programming, and a quadratic function is selected as the initial rule function. When the value of the pixel is 0, the processing times is set to 40, that is, the number of strokes is 40, and when the value of the pixel is 255, the processing times is set to 0, that is, the number of strokes is 0; 255 is used as the independent variable, and the number of strokes 0 is used as the dependent variable corresponding to 255. The value of each pixel in the grayscale image is read through the corresponding function to obtain the number of processing times corresponding to each pixel, that is, the number of straight lines in each pixel; when the traversal is completed, a complete processing drawing corresponding to the pixel and the number of processing times is obtained. According to the processing drawing, a laser etcher (scribing accuracy of 0.025 mm) is used to etch the transparent conductive ITO film to obtain the corresponding number of straight lines. Fig. 9The infrared characteristic simulation material corresponding to the image of the famous painting "A Thousand Miles of Rivers and Mountains (Part)" shown in the figure; the surface resistance of the transparent conductive ITO film is 3Ω / sq, the size is 300mm×168mm, and the infrared emissivity is 0.15. After the surface ITO is removed by laser, the PET substrate with an emissivity of 0.95 is exposed. The infrared characteristic simulation material film is photographed with an infrared camera to obtain the following Fig.10 The infrared image of the famous painting "A Thousand Miles of Rivers and Mountains (Part)" when the initial regular function is a quadratic function.

[0050] Although the present invention is described herein with reference to specific embodiments, it should be understood that these embodiments are merely examples of the principles and applications of the present invention. It should therefore be understood that many modifications may be made to the exemplary embodiments and that other arrangements may be devised without departing from the spirit and scope of the present invention as defined by the appended claims. It should be understood that the various dependent claims and features described herein may be combined in a manner different from that described in the original claims. It should also be understood that features described in conjunction with individual embodiments may be used in other described embodiments.

Claims

1. A method for designing infrared characteristic simulation materials, characterized in that: include: Step 1: Convert the initial image into a grayscale image, read the position information and pixel value of each pixel in the grayscale image, and obtain a pixel data matrix according to the position information and corresponding pixel value of each pixel; Step 2: Select the maximum pixel value N in the pixel data matrix max and the minimum pixel value N min , set the maximum pixel value N max The corresponding number of lines is 0, and the minimum pixel value is N min The corresponding number of dashes is m, where m is an integer; N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min Corresponding dependent variables, the two sets of independent variables and dependent variables are substituted into the set initial rule function respectively to obtain the value of the constant in the initial rule function, and the filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function; Step 3: Calculate the number of dashed lines corresponding to each pixel point according to the obtained filling rule function and the value of each pixel point in the pixel point data matrix; Step 4: According to the number of scribing lines corresponding to each pixel and the position information of each pixel in the pixel data matrix, the low emissivity thin film material is scribed, etched or woven to obtain the infrared characteristic simulation material.

2. The infrared characteristic simulation material design method according to claim 1, characterized in that: The low emissivity film material is an ITO film, a metal film layer or an infrared low emissivity fabric.

3. The infrared characteristic simulation material design method according to claim 1, characterized in that: The number of drawn lines m=a / d, where a is the side length of each pixel in the grayscale image, and d is the set drawing accuracy.

4. The infrared characteristic simulation material design method according to claim 1, characterized in that: The initial rule function is a quadratic function, a linear function, or a one-half power function.

5. The infrared characteristic simulation material design method according to claim 1, characterized in that: N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including: The initial rule function is a quadratic function y = Ax 2 +C, N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable is substituted into the quadratic function y = Ax 2 +C, get the first intermediate function; N min As an independent variable, the number of lines m is related to N min Substitute the corresponding dependent variable into the quadratic function y=Ax 2 +C, and obtain the second intermediate function; according to the first intermediate function and the second intermediate function, obtain the values ​​of constants A and C; according to the obtained values ​​of constants A and C and the quadratic function expression, obtain the filling rule function.

6. The infrared characteristic simulation material design method according to claim 1, characterized in that: N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including: The initial rule function is a linear function y=kx+D, and N max As the independent variable, the number of strokes 0 as the dependent variable, substitute into the linear function y = kx + D, and get the first intermediate function; min As the independent variable, the number of strokes m is substituted into the linear function y=kx+D as the dependent variable to obtain the second intermediate function; the values ​​of constants k and D are obtained based on the obtained first intermediate function and second intermediate function; the filling rule function is obtained based on the obtained values ​​of constants k and D and the linear function expression.

7. The infrared characteristic simulation material design method according to claim 1, characterized in that: N max As an independent variable, the number of dashes 0 is used as the max The corresponding dependent variable, N min As an independent variable, the number of lines m is related to N min The corresponding dependent variables are respectively substituted into the set initial rule function to obtain the value of the constant in the initial rule function. The filling rule function is obtained according to the initial rule function and the value of the constant in the initial rule function, including: The initial rule function is a power function of one half N max As an independent variable, and the maximum value of pixel point N max The corresponding number of dashes 0 is used as the dependent variable and substituted into the half-power function Get the first intermediate function; min As an independent variable, and the minimum pixel value N min The corresponding number of dashes m is substituted into the half-power function as the dependent variable A second intermediate function is obtained; values ​​of constants E and F are obtained according to the obtained first intermediate function and the second intermediate function; a filling rule function is obtained according to the obtained values ​​of constants E and F and a one-half power function expression.

8. The infrared characteristic simulation material design method according to claim 1, characterized in that: The low-emissivity film material covers the surface of the substrate, and the infrared emissivity of the substrate is greater than the infrared emissivity of the low-emissivity film material.

9. The infrared characteristic simulation material design method according to claim 1, characterized in that: Infrared characteristic simulation materials are used to make infrared anti-counterfeiting labels.

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