Method for integrating texture pattern and anti-glare pattern and glass substrate

Abstract

The invention relates to a method for integrating a texture pattern and an anti-dazzle pattern and a glass substrate. The method comprises the following steps: S10, designing a graph with an anti-dazzle area and a texture area on glass; s20, manufacturing a mask plate based on the graphic design; s30, placing the mask under yellow light, and then performing yellow light process treatment on the glass so as to transfer the graphic design to the glass; and S40, the glass is etched. According to the method provided by the invention, the pattern design of the anti-dazzle area and the texture area is firstly carried out on the surface of one side of the glass substrate, then the yellow light process treatment is carried out on the glass substrate, so that the pattern is formed on the glass, and then the hydrofluoric acid etching is carried out to form the glass substrate integrating the anti-dazzle pattern and the texture pattern at the same time. The problem that anti-dazzle and texture nesting combined manufacturing cannot be achieved in the traditional technology is solved.

Description

Technical Field

[0001] The present disclosure relates to the technical field of display screen glass, and more specifically, to a method for integrating a texture pattern and an anti-glare pattern and a glass substrate. Background Art

[0002] Anti-glare (AG) glass is very popular in the applications of mobile phone back covers, laptop back covers and camera lenses. This is because AG glass provides a smooth and hard-to-slip touch, fingerprints are not obvious on the AG surface, and the surface is less susceptible to dirt. However, the current AG technology is mainly divided into two types: one is to form a concave-convex structure through the combined etching of fluoride salt and hydrofluoric acid; the other is to use sandblasting technology to spray small particles of corundum on the glass surface to form concave-convex.

[0003] As an emerging technology, the application of 3D texture on mobile phone cameras and mobile phone back covers has just begun. This 3D texture technology provides designers with more creative space, making the mobile phone present a more technological and elegant design style, which can meet the needs of different levels. This technology is rapidly attracting the attention of mobile phone manufacturers and is gradually being introduced into the market.

[0004] However, the technology for nesting and combining texture and AG on glass materials has not yet appeared. The main reason is that if AG glass is first made according to the current method, the subsequent texture etching process will be affected and the texture cannot be reflected. If the texture is made first, the texture effect after AG cannot be seen. As a result, the combination of texture and AG effects cannot be achieved at the same time. Therefore, how to reflect the three-dimensional texture and AG pattern on the glass material at the same time is the problem solved by the present invention. Summary of the invention

[0005] In view of this, the present application provides a method for integrating a texture pattern and an anti-glare pattern and a glass substrate, which can integrate a three-dimensional texture and an anti-glare pattern on the glass at the same time to solve the problems existing in the prior art.

[0006] The technical solutions provided by this application are as follows: In a first aspect, the present application provides a method for integrating a texture pattern with an anti-glare pattern, comprising: S10, designing a graphic design having an anti-glare area and a texture area on the glass; wherein the anti-glare area adopts dots with a diameter of 3um to 50um or other shapes of the same size, and a spacing of 5um to 1000um; the texture area adopts a line width of 20um to 1000um, and a line spacing of 10um to 1000um; S20, manufacturing a mask based on the graphic design; S30, placing the mask under yellow light, then cleaning the glass, coating the photoresist, soft-baking, exposing and developing the glass to transfer the graphic design onto the glass; S40, etching the glass, specifically comprising: using a hydrofluoric acid etching solution containing a preset concentration, etching the glass according to a preset etching time and / or a preset etching depth to achieve a specific haze and a specific glossiness; wherein the specific haze is continuously adjustable within a range of 2% to 90%; and the specific glossiness is continuously adjustable within a range of 10GU to 120GU.

[0007] Further, the S30 includes: S310, placing the mask under yellow light; S320, cleaning the glass to remove impurities and dust on the surface thereof; S330, coating a layer of photoresist on the glass surface; S340, soft-baking the glass to remove the solvent in the photoresist; S350, exposing the mask to transfer the pattern on the mask to the glass surface; S360, developing the glass to remove the photoresist at the exposed portion.

[0008] Furthermore, the preset weight ratio of the hydrofluoric acid etching solution is 2% to 20%.

[0009] Furthermore, the preset etching depth ranges from 1 um to 20 um.

[0010] Furthermore, the coating thickness of the photoresist ranges from 1um to 15um.

[0011] Furthermore, the exposure time of S350 ranges from 3S to 50S.

[0012] On the other hand, the present application also provides a glass substrate integrating a texture pattern and an anti-glare pattern, wherein the glass substrate is a glass substrate obtained by the above-mentioned method of integrating a texture pattern and an anti-glare pattern.

[0013] Furthermore, any nested combination of anti-glare pattern and texture pattern can be realized on any surface of the glass substrate, wherein the combination of nested AG effect and three-dimensional texture effect can produce a desired pattern effect according to the designer's intention.

[0014] The solution provided in this application has the following beneficial effects: The method provided by the present application first designs the graphics of the anti-glare area and the texture area on one side of the glass substrate, then performs yellow light process on the glass substrate to form a pattern on the glass, and then performs hydrofluoric acid etching on it to form a glass substrate that integrates both the anti-glare pattern and the texture pattern, thereby avoiding the problem that the traditional technology cannot combine the anti-glare and texture nesting (the adverse effect on the anti-glare effect when the anti-glare glass is first made and then the texture is etched in the traditional technology; the texture pattern cannot be accurately aligned with the anti-glare pattern in the traditional technology). The method provided by the present application can arbitrarily design the anti-glare pattern and the texture pattern, and the two can also be arbitrarily nested on the glass material, giving the designer sufficient design expression space and also bringing users a new visual and tactile experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0016] Figure 1 It is a schematic diagram of the structure of a glass substrate having only three-dimensional texture patterns in the prior art; Figure 2 It is a schematic diagram of the structure of a glass substrate having only an anti-glare pattern in the prior art; Figure 3 A flow chart of a method for integrating a texture pattern and an anti-glare pattern provided in an embodiment of the present application; Figure 4 A schematic diagram of the side structure of a glass substrate provided in an embodiment of the present application; Figure 5 A schematic structural diagram of a glass substrate with integrated three-dimensional texture patterns and anti-glare patterns provided in Example 1 of the present application; Figure 6 A schematic structural diagram of a glass substrate integrated with a three-dimensional texture pattern and an anti-glare pattern provided in Example 2 of the present application; Figure 7 A schematic structural diagram of a glass substrate with integrated three-dimensional texture patterns and anti-glare patterns provided in Example 3 of the present application; Figure 8 A schematic structural diagram of a glass substrate with integrated three-dimensional texture patterns and anti-glare patterns provided in Example 4 of the present application; Fig. 9 A graph showing the change in haze and etching time provided in an embodiment of the present application. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application, but it should be understood that these descriptions are only exemplary and are not intended to limit the scope of the present application. In addition, in the following description, the description of well-known structures and technologies is omitted to avoid unnecessary confusion of the concepts of the present application.

[0018] The terms used herein are only for describing specific embodiments and are not intended to limit the present disclosure. The words "a", "an", "the", etc. used herein should also include the meanings of "multiple", "multiple", etc., unless the context clearly indicates otherwise. In addition, the terms "include", "comprising", etc. used herein indicate the presence of the features, steps, operations and / or components, but do not exclude the presence or addition of one or more other features, steps, operations or components.

[0019] All terms (including technical and scientific terms) used herein have the meanings commonly understood by those skilled in the art unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification and should not be interpreted in an idealized or overly rigid manner.

[0020] Figure 1 is a schematic diagram of the structure of a glass substrate having only a three-dimensional texture pattern in the prior art. Figure 2 It is a schematic diagram of the structure of a glass substrate with only an anti-glare pattern in the prior art. It is understandable that the prior art cannot simultaneously integrate a three-dimensional texture pattern and an anti-glare pattern on the same glass substrate, and cannot provide designers with more sufficient expression space.

[0021] In view of this, the first aspect of the present application provides a method for integrating a texture pattern and an anti-glare pattern, see Figure 3 , Figure 3 A flow chart of a method for integrating a texture pattern and an anti-glare pattern provided in an embodiment of the present application. The method comprises: S10, designing a graphic design having an anti-glare area and a texture area on the glass; wherein the anti-glare area adopts dots with a diameter of 3um to 50um or other shapes of the same size, and a spacing of 5um to 1000um; the texture area adopts a line width of 20um to 1000um, and a line spacing of 10um to 1000um.

[0022] In this step, the anti-glare area and the texture area are designed on one side surface of the glass. The shape of the texture area is not limited. A line width of 20um to 1000um and a line spacing of 10um to 1000um can be used to form a variety of different texture patterns. The shape of the anti-glare area is not limited. A diameter dot of 3um to 50um or other shapes of the same size and a spacing of 5um to 1000um can be used. The texture area and the anti-glare area can be nested at will. For example, in one embodiment, a line width of 80um and a line spacing of 100um can be used to form a texture pattern; a diameter dot of 20um and a spacing of 40um are used to form an anti-glare pattern. In another embodiment, a line width of 120um and a line spacing of 150um can be used to form a texture pattern; a diameter dot of 30um and a spacing of 60um are used to form an anti-glare pattern.

[0023] S20, manufacturing a mask based on the graphic design.

[0024] In this step, a mask matching the pattern is produced based on the pattern, so as to transfer the pattern to the glass surface in subsequent operations.

[0025] S30, placing the mask under yellow light, then cleaning the glass, coating it with photoresist, soft-baking, exposing and developing it, so as to transfer the graphic design onto the glass.

[0026] In this step, the mask is placed under yellow light, which is a safe light source that can prevent the photoresist from curing prematurely during the exposure process. The glass is cleaned to remove impurities and dust on the surface of the glass; a layer of photoresist is coated on one side of the cleaned glass and then soft-baked; the soft-baked glass is placed under the mask, exposed and developed to transfer the designed pattern to the glass surface.

[0027] S40, etching the glass, specifically comprising: using a hydrofluoric acid etching solution containing a preset concentration, etching the glass according to a preset etching time and / or a preset etching depth to achieve a specific haze and a specific glossiness; wherein the specific haze continuously changes in the range of 2% to 90%, and in one embodiment the specific haze continuously changes in the range of 40% to 80%. The specific gloss continuously changes in the range of 10GU to 120GU; in one embodiment the specific gloss continuously changes in the range of 10GU to 60GU.

[0028] In this step, the glass is etched with hydrofluoric acid. Hydrofluoric acid can react with silicon dioxide and other substances in the glass, thereby etching the glass. In the actual operation process, the other side of the glass where no pattern is formed is first shielded, and then the glass is etched to protect the other side of the glass from being etched. The etching time and / or etching depth are determined by the desired anti-glare pattern and texture pattern effect.

[0029] In this step, the haze is detected by a universal haze tester, such as Fig. 9 As shown, it is a curve diagram of the change of haze and etching time provided in this embodiment. It can be seen that the present application can achieve a continuous haze change of 2% to 90% by adjusting the etching time.

[0030] In the present application, the anti-glare area and the texture area are first designed on one side of the glass substrate, and then the glass substrate is treated with yellow light process to form a pattern on the glass, and then it is etched with hydrofluoric acid to form a glass substrate that integrates both the anti-glare pattern and the texture pattern, thereby avoiding the problem that the traditional technology cannot combine the anti-glare and texture nesting (the traditional technology first makes the anti-glare glass and then etches the texture, which has an adverse effect on the anti-glare effect; the texture pattern in the traditional technology cannot be accurately aligned with the anti-glare pattern). In addition, the method provided in the present application can arbitrarily design the anti-glare pattern and the texture pattern, and the two can also be arbitrarily nested on the glass material, giving the designer sufficient design expression space and also bringing users a new visual and tactile experience.

[0031] Further, the S30 includes: S310, placing the mask under yellow light; S320, cleaning the glass to remove impurities and dust on the surface thereof; In this step, the glass is firstly cleaned with water to remove impurities, dust, particles and other dirt that are easier to remove on the surface of the glass, and then the glass is cleaned again with an acid solution to remove dirt that is more difficult to remove on the surface of the glass, and then the glass surface is cleaned with water again to remove the acid solution remaining on the surface of the glass after acid cleaning. In this step, after the glass is cleaned, it can be ensured that the photoresist can be well attached to its surface, avoiding the photoresist from falling off due to dirt on the glass surface.

[0032] S330, coating a layer of photoresist on the glass surface; In this step, after the cleaned glass is dried, a layer of transparent photoresist is evenly coated on one surface of the glass. Photoresist is a type of adhesive that must be cured by ultraviolet light. It has high bonding strength and is completely transparent after curing. It does not turn yellow or white for a long time. It also has excellent properties such as resistance to low temperature, high temperature and high humidity, so that it is not easy to fall off from the glass surface.

[0033] S340, soft-baking the glass to remove the solvent in the photoresist; In this step, the temperature and time required for soft baking are determined by the characteristics of the photoresist. Different photoresists have their own specific soft baking temperature and soft baking time. Generally speaking, the soft baking temperature is set in the range of 85°C to 120°C, and the soft baking time is set in the range of 30S to 60S. Soft baking the glass surface coated with photoresist can remove the photoresist solvent covering the glass surface, avoid excessive solvent content, resulting in difficulty in distinguishing between exposed and unexposed photoresists due to dissolution differences during development; it can also enhance the adhesion of the photoresist and ease the stress in the photoresist film so that the photoresist can better adhere to the glass surface during development.

[0034] S350, exposing the mask to transfer the pattern on the mask to the glass surface; In this step, after the photoresist is soft-baked, the originally liquid photoresist is solidified on the glass surface, so that it can be exposed. The exposure step can transfer the pattern on the mask to the glass coated with the photoresist. Among them, for positive photoresist, before exposure, the photosensitizer therein is insoluble in the developer. After exposure, some substances in the photoresist undergo chemical decomposition and become solubility enhancers, which greatly increase the solubility factor in the developer to 100 or higher, and then develop with the developer to form a pattern. For negative photoresist, negative photoresist is also called photoresist. After exposure, insoluble substances are formed, and then developed with the developer to form a pattern.

[0035] S360, developing the glass to remove the photoresist at the exposed portion.

[0036] In this step, after the glass is exposed, it needs to be developed to remove the photoresist of the exposed part. The development process includes development, rinsing and drying. In the development process, a developer needs to be used to dissolve the photoresist of the exposed part. The specific composition of the developer is not limited in this application. As long as the developer contains water, the photoresist of the exposed part can be dissolved during the development of the photoresist, thereby exposing the designed pattern. After the glass is developed, it needs to be rinsed to remove the excess developer residue on its surface; after cleaning, the glass needs to be dried to avoid leaving stains on the glass surface.

[0037] Furthermore, the preset weight ratio of the hydrofluoric acid etching solution is 2% to 20%.

[0038] In the present application, the preset weight ratio of the hydrofluoric acid etching solution is in the range of 2% to 20%, preferably, the weight ratio is 8% to 16%. In one embodiment, the weight ratio of hydrofluoric acid is 5%, 10%, 15% or 18%. Hydrofluoric acid can corrode substances such as silicon dioxide in the glass to generate fluorosilicates, thereby ensuring the etching process and obtaining glass with anti-glare effect; if the hydrofluoric acid content in the etching solution is too low (for example, less than 2%), it will not be able to effectively corrode substances such as silicon dioxide in the glass, resulting in uneven etching or even no etching, and thus anti-glare glass cannot be obtained. If the hydrofluoric acid content in the etching solution is too high (for example, higher than 20%), the etching speed is too fast, which will cause the etching system acidity to be too high, and anti-glare glass cannot be obtained.

[0039] Furthermore, the preset etching depth ranges from 1 um to 20 um.

[0040] In this step, the etching depth is determined by the desired haze and texture effect. Preferably, the etching depth is controlled to be 5um to 15um, thereby forming a protrusion. In one embodiment, the etching depth is 10um, 12um, 16um or 18um. It is understood that in actual operation, the etching depth can be controlled by controlling the etching time.

[0041] Furthermore, the coating thickness of the photoresist ranges from 1um to 15um.

[0042] In this step, preferably, the coating thickness of the photoresist ranges from 6um to 12um. In one embodiment, the coating thickness of the photoresist is 3um, 5um, 8um or 10um. If the coating thickness of the photoresist is too low (for example, less than 1um), the subsequent exposure process will be unstable, affecting the formation of the glass surface pattern. If the coating thickness of the photoresist is too high (for example, higher than 15um), the accuracy of the subsequent exposure will be affected, and the formation of the glass surface pattern will also be affected.

[0043] Furthermore, the exposure time of S350 ranges from 3S to 50S.

[0044] In this step, the exposure time is adjusted according to the designed graphics needs.

[0045] On the other hand, the present application also provides a glass substrate integrating a texture pattern and an anti-glare pattern, wherein the glass substrate is a glass substrate obtained by the above-mentioned method of integrating a texture pattern and an anti-glare pattern. Figure 4 , Figure 4A schematic diagram of the side structure of a glass substrate with integrated texture patterns and anti-glare patterns provided in an embodiment of the present application.

[0046] Example 1 See also Figure 5 , Figure 5 A schematic diagram of the structure of a glass substrate integrating a three-dimensional texture pattern and an anti-glare pattern provided in Example 1 of the present application.

[0047] The method of integrating the texture pattern and the anti-glare pattern in this embodiment is as follows: (1) The dot diameter is designed to be 20um, and the row spacing is 20um and the column spacing is 30um as the anti-glare pattern (wherein the line spacing includes the above-mentioned row spacing and column spacing); the line width is 20um and the line spacing is 50um as the texture pattern; the anti-glare pattern of this embodiment is a checkered shape, and the texture pattern is an arc shape; (2) Produce a mask that matches the designed pattern; (3) Cut and grind the glass to make it into a standard size of yellow light. In this embodiment, the standard size of 300 mm*200 mm is adopted; (4) The cut glass is exposed to yellow light, and the pattern is transferred to the glass surface through steps such as cleaning, coating with photoresist, soft baking, exposure, and development. In this embodiment, the thickness of the photoresist is 3 μm, and the exposure time is 20 seconds. (5) The glass with the pattern is placed in an etching tank containing hydrofluoric acid. The etching depth of the anti-glare pattern is 2 um, and the depth of the texture pattern is 1.2 um. The haze of the glass substrate with integrated texture pattern and anti-glare pattern made in this embodiment is 35%, and the glossiness is 40 GU.

[0048] Example 2 See also Figure 6 , Figure 6 A schematic diagram of the structure of a glass substrate integrating a three-dimensional texture pattern and an anti-glare pattern provided in Example 2 of the present application.

[0049] The method of integrating the texture pattern and the anti-glare pattern in this embodiment is as follows: (1) The dot diameter is designed to be 15um, and the line spacing is 20um as the anti-glare pattern; the line width is 20um and the line spacing is 30um as the texture pattern; the anti-glare pattern of this embodiment is a composite square shape; the texture pattern is a composite arc shape; (2) Produce a mask that matches the designed pattern; (3) Cut and grind the glass to make it into a standard size of yellow light. In this embodiment, the standard size of 300 mm*200 mm is adopted; (4) The cut glass is exposed to yellow light, and the pattern is transferred to the glass surface through steps such as cleaning, coating with photoresist, soft baking, exposure, and development. In this embodiment, the thickness of the photoresist is 3 μm, and the exposure time is 20 seconds. (5) The glass with the pattern is placed in an etching tank containing hydrofluoric acid. The etching depth of the anti-glare pattern is 8 um, and the depth of the texture pattern is 7 um. The haze of the glass substrate with integrated texture pattern and anti-glare pattern made in this embodiment is 82%, and the glossiness is 9 GU.

[0050] Example 3 See also Figure 7 , Figure 7 A schematic diagram of the structure of a glass substrate integrating a three-dimensional texture pattern and an anti-glare pattern provided in Example 3 of the present application.

[0051] The method of integrating the texture pattern and the anti-glare pattern in this embodiment is as follows: (1) The dot diameter is designed to be 30um, and the line spacing is 15um as the anti-glare pattern; the line width is 15um and the line spacing is 15um as the texture pattern; the anti-glare pattern of this embodiment is a composite polygon; the texture pattern is a composite grid; (2) Produce a mask that matches the designed pattern; (3) Cut and grind the glass to make it into a standard size of yellow light. In this embodiment, the standard size of 300 mm*200 mm is adopted; (4) The cut glass is exposed to yellow light, and the pattern is transferred to the glass surface through steps such as cleaning, coating with photoresist, soft baking, exposure, and development. In this embodiment, the thickness of the photoresist is 3 μm, and the exposure time is 20 seconds. (5) The glass with the pattern is placed in an etching tank containing hydrofluoric acid. The etching depth of the anti-glare pattern is 8 um, and the depth of the texture pattern is 6 um. The haze of the glass substrate with integrated texture pattern and anti-glare pattern made in this embodiment is 60%, and the glossiness is 13 GU.

[0052] Example 4 See also Figure 8 , Figure 8 A schematic structural diagram of a glass substrate with integrated three-dimensional texture patterns and anti-glare patterns provided in Example 4 of the present application.

[0053] The method of integrating the texture pattern and the anti-glare pattern in this embodiment is as follows: (1) The dot diameter is designed to be 30um, and the line spacing is 10um as the anti-glare pattern; the line width is 15um and the line spacing is 10um as the texture pattern; the anti-glare pattern of this embodiment is a composite polygon; the texture pattern is a composite line; (2) Produce a mask that matches the designed pattern; (3) Cut and grind the glass to make it into a standard size of yellow light. In this embodiment, the standard size of 300 mm*200 mm is adopted; (4) The cut glass is exposed to yellow light, and the pattern is transferred to the glass surface through steps such as cleaning, coating with photoresist, soft baking, exposure, and development. In this embodiment, the thickness of the photoresist is 5 μm, and the exposure time is 40 seconds. (5) The glass with the pattern is placed in an etching tank containing hydrofluoric acid. The etching depth of the anti-glare pattern is 9 um, and the depth of the texture pattern is 6.5 um. The haze of the glass substrate with integrated texture pattern and anti-glare pattern made in this embodiment is 70%, and the glossiness is 10 GU.

[0054] The haze of the glass substrate with integrated texture pattern and anti-glare pattern prepared by the method of integrating texture pattern and anti-glare pattern provided in the above embodiment 1, embodiment 2, embodiment 3 and embodiment 4 is shown in the following table:

[0055] Although example embodiments have been described, it will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the inventive concept. Therefore, it should be understood that the above example embodiments are not restrictive, but illustrative.

Claims

1. A method for integrating a texture pattern and an anti-glare pattern, characterized in that: include: S10, designing a graphic design having an anti-glare area and a texture area on the glass; wherein the anti-glare area adopts dots with a diameter of 3um to 50um or other shapes of the same size, and a spacing of 5um to 1000um; the texture area adopts a line width of 20um to 1000um, and a line spacing of 10um to 1000um; S20, manufacturing a mask based on the graphic design; S30, placing the mask under yellow light, then cleaning the glass, coating the photoresist, soft-baking, exposing and developing the glass to transfer the graphic design onto the glass; S40, etching the glass, specifically comprising: using a hydrofluoric acid etching solution containing a preset concentration, etching the glass according to a preset etching time and / or a preset etching depth to achieve a specific haze and a specific glossiness; wherein the specific haze is continuously adjustable within a range of 2% to 90%; and the specific glossiness is continuously adjustable within a range of 10GU to 120GU.

2. The method for integrating a texture pattern and an anti-glare pattern according to claim 1, characterized in that: The S30 includes: S310, placing the mask under yellow light; S320, cleaning the glass to remove impurities and dust on the surface thereof; S330, coating a layer of photoresist on the glass surface; S340, soft-baking the glass to remove the solvent in the photoresist; S350, exposing the mask to transfer the pattern on the mask to the glass surface; S360, developing the glass to remove the photoresist at the exposed portion.

3. The method of integrating a texture pattern and an anti-glare pattern according to claim 1, characterized in that: The preset weight ratio of the hydrofluoric acid etching solution is 2% to 20%.

4. The method for integrating a texture pattern and an anti-glare pattern according to claim 1, characterized in that: The preset etching depth ranges from 1um to 20um.

5. The method of integrating a texture pattern and an anti-glare pattern according to claim 2, characterized in that: The coating thickness of the photoresist ranges from 1um to 15um.

6. The method for integrating a texture pattern and an anti-glare pattern according to claim 2, characterized in that: The exposure time of S350 ranges from 3S to 50S.

7. A glass substrate integrating a texture pattern and an anti-glare pattern, characterized in that: The glass substrate is a glass substrate obtained by the method for integrating a texture pattern and an anti-glare pattern as described in any one of claims 1 to 6.

8. The glass substrate with integrated texture pattern and anti-glare pattern according to claim 7, characterized in that: Any nested combination of anti-glare patterns and texture patterns is achieved on any surface of the glass substrate.

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