Nanometer polishing solution for precise glass ball processing

Abstract

The invention belongs to the technical field of polishing solutions, and particularly relates to a nano polishing solution for precision glass ball processing, which is prepared by the following steps: 1, uniformly mixing silicon carbide micro powder, water and a dispersing agent according to a mass ratio of 0.3: 1: 0.4 to obtain a mixture, and then putting the mixture into a sand mill for cyclic crushing until the particle size of solid materials in the mixture is nanoscale to obtain a nano polishing solution; the preparation method comprises the following steps: step 1, preparing nano silicon carbide slurry, step 2, adding the nano silicon carbide slurry into water according to a mass ratio of 1: 20, and uniformly mixing, step 3, differentiating by using a dispersion machine so that the nano silicon carbide slurry is completely dissolved in purified water to obtain a nano silicon carbide suspension, and step 4, adding a chelating agent, a lubricant, a preservative and a pH regulator into the step 3, and uniformly stirring to obtain the nano polishing solution. The nano polishing solution comprises, by mass, 0.05%-1.0% of a chelating agent and 0.5%-2.0% of a lubricating agent, and the nano polishing solution has the advantages of being environmentally friendly, high in diluting capacity, high in polishing efficiency, low in polishing product cost and the like.

Description

Technical Field

[0001] The present invention belongs to the technical field of polishing fluids, and particularly relates to a nano-polishing fluid for the processing of precision glass balls. Background Art

[0002] Precision optical glass is widely used in fields such as aerospace, deep space exploration, nuclear energy industry, precision electronic instruments, etc. Optical glass materials have high brittleness and low fracture toughness. Generally, they need to go through processes such as ultra-precision grinding and ultra-precision polishing to finally achieve a surface shape accuracy better than 0.1 μm, a surface roughness Ra better than 10 nm, and extremely few surface defects and subsurface damages.

[0003] At present, the polishing fluids used in the polishing industry in China for the precision processing of glass wafers mainly rely on imports, with relatively high costs. At present, many precision glass wafers with poor chemical stability and fast consumption of auxiliary materials have high requirements for polishing fluids, requiring no scratching and corrosion of the glass surface, and at the same time meeting the requirements of high polishing efficiency. Summary of the Invention

[0004] To solve the problems raised in the above background art, the present invention provides a nano-polishing fluid for the processing of precision glass balls, which has the characteristics of being green and environmentally friendly, having strong dilution ability, and high polishing efficiency.

[0005] To achieve the above object, the present invention provides the following technical solution: A nano-polishing fluid for the processing of precision glass balls, including Step 1: Mix silicon carbide micropowder, water, and a dispersant evenly according to a mass ratio of 0.3∶1∶0.4 to obtain a mixture, and then place the mixture in a sand mill for cyclic pulverization until the particle size of the solid material in the mixture is nanoscale to obtain a nano-silicon carbide slurry; Step 2: Add the nano-silicon carbide slurry to water and mix evenly at a mass ratio of 1∶20; Step 3: Use a disperser to disperse it to completely dissolve it in pure water to obtain a nano-silicon carbide suspension; Step 4: Add a chelating agent, a lubricant, a preservative, and a pH regulator to Step 3, and stir evenly to obtain a nano-polishing fluid. The mass percentage content of the chelating agent in the nano-polishing fluid is 0.05% - 1.0%, the mass percentage content of the lubricant is 0.5% - 2.0%, the mass percentage content of the preservative is 0.05% - 1.0%, and the mass percentage content of the pH regulator is 0.5% - 3.0%.

[0006] Preferably, the particle size of the silicon carbide micropowder is not greater than 1.5 μm.

[0007] Preferably, the water in the preparation process is pure water or deionized water.

[0008] Preferably, the chelating agent is any one of gluconic acid and tartaric acid.

[0009] Preferably, the lubricant is any one of sodium stearate, polyethylene glycol, and glycerol.

[0010] Preferably, the preservative is any one of benzotriazole, sodium chloride and potassium sorbate.

[0011] Preferably, the pH regulator can be any one of salicylic acid, citric acid, acetic acid or oxalic acid solution.

[0012] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0013] 1. The present invention has the advantages of being green and environmentally friendly, having strong dilution ability, high polishing efficiency, and low cost of polished products. Detailed implementation manners

[0014] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0015] Embodiment 1

[0016] The present invention provides the following technical solutions: A nano-polishing liquid for processing precision glass balls, including Step 1: Mix silicon carbide micropowder, water and a dispersant in a mass ratio of 0.3∶1∶0.4 evenly to obtain a mixture, and then place the mixture in a sand mill for cyclic pulverization until the particle size of the solid materials in the mixture is nanoscale to obtain a nano-silicon carbide slurry; Step 2: Add the nano-silicon carbide slurry to water and mix evenly at a mass ratio of 1∶20; Step 3: Use a disperser to disperse and dissolve it completely in pure water to obtain a nano-silicon carbide suspension; Step 4: Add a chelating agent, a lubricant, a preservative and a pH regulator to Step 3, and stir evenly to obtain a nano-polishing liquid. The mass percentage content of the chelating agent in the nano-polishing liquid is 0.05% - 1.0%, the mass percentage content of the lubricant is 0.5% - 2.0%, the mass percentage content of the preservative is 0.05% - 1.0%, and the mass percentage content of the pH regulator is 0.5% - 3.0%. The particle size of the silicon carbide micropowder is not more than 1.5 μm. The water in the preparation process is pure water or deionized water. The chelating agent is any one of gluconic acid and tartaric acid. The lubricant is any one of sodium stearate, polyethylene glycol and glycerol. The preservative is any one of benzotriazole, sodium chloride and potassium sorbate. The pH regulator can be any one of salicylic acid, citric acid, acetic acid or oxalic acid solution.

[0017] In this embodiment, the chelating agent is gluconic acid with a mass percentage content of 0.5%, the lubricant is glycerol with a mass percentage content of 1%, the preservative is benzotriazole with a mass percentage content of 0.05%, and the pH regulator is citric acid with a mass percentage content of 0.5%.

[0018] The nano-silicon carbide polishing liquid prepared in this embodiment was placed for 3 months, and no obvious sedimentation phenomenon was found, and the particle size of the polishing liquid hardly changed.

[0019] Example 2

[0020] The present invention provides the following technical solutions: a nano-polishing liquid for precision glass ball processing, including Step 1: Mix silicon carbide micropowder, water and a dispersant evenly according to a mass ratio of 0.3∶1∶0.4 to obtain a mixture, and then place the mixture in a sand mill for cyclic pulverization until the particle size of the solid materials in the mixture is nanoscale to obtain a nano-silicon carbide slurry; Step 2: Add the nano-silicon carbide slurry to water and mix evenly according to a mass ratio of 1∶20; Step 3: Use a disperser to disperse it to completely dissolve it in pure water to obtain a nano-silicon carbide suspension; Step 4: Add a chelating agent, a lubricant, a preservative and a pH regulator to Step 3, and stir evenly to obtain a nano-polishing liquid. In the nano-polishing liquid, the mass percentage content of the chelating agent is 0.05% - 1.0%, the mass percentage content of the lubricant is 0.5% - 2.0%, the mass percentage content of the preservative is 0.05% - 1.0%, and the mass percentage content of the pH regulator is 0.5% - 3.0%. The particle size of the silicon carbide micropowder is not greater than 1.5 μm. The water in the preparation process is pure water or deionized water. The chelating agent is any one of gluconic acid and tartaric acid. The lubricant is any one of sodium stearate, polyethylene glycol and glycerol. The preservative is any one of benzotriazole, sodium chloride and potassium sorbate. The pH regulator can be any one of salicylic acid, citric acid, acetic acid or oxalic acid solution.

[0021] In this embodiment, the chelating agent is tartaric acid with a mass percentage content of 1%, the lubricant is sodium stearate with a mass percentage content of 1%, the preservative is sodium chloride with a mass percentage content of 0.4%, and the pH regulator is salicylic acid with a mass percentage content of 1.5%.

[0022] The nano-silicon carbide polishing liquid prepared in this embodiment was placed for 3 months, and no obvious sedimentation phenomenon was found, and the particle size of the polishing liquid hardly changed.

[0023] Example 3

[0024] The present invention provides the following technical solutions: A nano-polishing liquid for precision glass ball processing, including Step 1: Mix silicon carbide micropowder, water, and a dispersant evenly according to a mass ratio of 0.3∶1∶0.4 to obtain a mixture, and then place the mixture in a sand mill for cyclic pulverization until the particle size of the solid material in the mixture is nanoscale to obtain a nano-silicon carbide slurry; Step 2: Add the nano-silicon carbide slurry to water and mix evenly at a mass ratio of 1∶20; Step 3: Use a disperser to disperse it until it is completely dissolved in pure water to obtain a nano-silicon carbide suspension; Step 4: Add a chelating agent, a lubricant, a preservative, and a pH regulator to Step 3, and stir evenly to obtain a nano-polishing liquid. The mass percentage content of the chelating agent in the nano-polishing liquid is 0.05% - 1.0%, the mass percentage content of the lubricant is 0.5% - 2.0%, the mass percentage content of the preservative is 0.05% - 1.0%, and the mass percentage content of the pH regulator is 0.5% - 3.0%. The particle size of the silicon carbide micropowder is not greater than 1.5 μm. The water in the preparation process is pure water or deionized water. The chelating agent is any one of gluconic acid and tartaric acid. The lubricant is any one of sodium stearate, polyethylene glycol, and glycerol. The preservative is any one of benzotriazole, sodium chloride, and potassium sorbate. The pH regulator can be any one of salicylic acid, citric acid, acetic acid, or oxalic acid solution.

[0025] In this embodiment, the chelating agent is tartaric acid with a mass percentage content of 0.1%, the lubricant is polyethylene glycol with a mass percentage content of 0.5%, the preservative is potassium sorbate with a mass percentage content of 0.1%, and the pH regulator is oxalic acid with a mass percentage content of 0.5%.

[0026] The nano-silicon carbide polishing liquid prepared in this embodiment was placed for 3 months, and no obvious sedimentation phenomenon was found, and the particle size of the polishing liquid hardly changed.

[0027] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. Nano-polishing liquid for precision glass ball processing, including: Step 1: Silicon carbide powder, water and dispersant are mixed uniformly in a mass ratio of 0.3:1:0.4 to obtain a mixture, and then the mixture is placed in a sand mill for cyclic crushing until the particle size of the solid material in the mixture is nanometer-level, thereby obtaining nano silicon carbide slurry; Step 2: Add nano silicon carbide slurry into water and mix evenly at a mass ratio of 1:20; Step 3: Use a disperser to completely dissolve the nano-silicon carbide in pure water to obtain a nano-silicon carbide suspension; Step 4: adding the chelating agent, lubricant, preservative and pH adjuster into step 3, stirring evenly to obtain a nano-polishing liquid; The invention is characterized in that the mass percentage of the chelating agent in the nano polishing liquid is 0.05% to 1.0%, the mass percentage of the lubricant is 0.5% to 2.0%, the mass percentage of the preservative is 0.05% to 1.0%, and the mass percentage of the pH regulator is 0.5% to 3.0%.

2. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The particle size of the silicon carbide powder is not greater than 1.5 μm.

3. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The water used in the preparation process is pure water or deionized water.

4. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The chelating agent is any one of gluconic acid and tartaric acid.

5. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The lubricant is any one of sodium stearate, polyethylene glycol and glycerol.

6. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The preservative is any one of benzotriazole, sodium chloride and potassium sorbate.

7. The nano-polishing liquid for precision glass ball processing according to claim 1, characterized in that: The pH regulator can be any one of salicylic acid, citric acid, acetic acid or oxalic acid solution.