Transparent substrate with anti-glare layer and composition for anti-glare layer

Abstract

The purpose of the present invention is to provide a transparent substrate with an anti-glare layer, which is provided with an anti-glare layer having excellent solubility resistance. The transparent substrate with the anti-dazzle layer has a transparent substrate and an anti-dazzle layer provided on one main surface of the transparent substrate, the anti-dazzle layer is composed of a cured product of a composition for the anti-dazzle layer, and the composition for the anti-dazzle layer contains a disilane agent (B). The disilane agent (B) contains one or more substances selected from the group consisting of disilane compounds in which two Si atoms, to which three substituents selected from the group consisting of reactive groups and hydroxyl groups are each directly bonded, are linked via a methylene group or an ethylene group, hydrolyzates thereof, and polymers thereof, and the disilane agent (B) satisfies specific conditions (Bi) and (Bii).

Description

Technical Field

[0001] The present invention relates to a transparent substrate with an antiglare layer and a composition for an antiglare layer. Background Art

[0002] In recent years, the opportunity to use an image display device has increased in various devices such as a navigation system and a speedometer mounted on a vehicle or the like. As a characteristic of a covering member of the image display device, from the viewpoints of improving safety and appearance, it is required to reduce the reflection of external light and prevent the visibility of an image from being deteriorated due to the entry of external light into the screen. As a means for preventing reflection or entry on the surface of a covering material, there is a method in which an antiglare layer having an uneven structure on the surface is disposed on a display surface of an image display device to cause diffuse reflection of external light, thereby making a reflected image unclear.

[0003] The antiglare layer is formed, for example, by applying a coating liquid containing a hydrolyzable organosilicon compound such as a hydrolysis condensate of an alkoxysilane, which is a silica precursor, onto one main surface of a glass substrate and then curing it (for example, refer to Patent Document 1).

[0004] Prior Art Documents

[0005] Patent Documents

[0006] Patent Document 1: International Publication No. 2016 / 021560 Summary of the Invention

[0007] After forming the antiglare layer, in order to clean the surface of the substrate, a step of immersing the substrate in a cleaning liquid for about several minutes may be performed before each step after the antiglare layer forming step. For example, when a printing layer is formed on the back surface of the substrate (the main surface opposite to the main surface having the antiglare layer) for design purposes, the cleaning after forming the antiglare layer is performed to ensure the cleanliness of the back surface of the substrate before forming the printing layer.

[0008] Here, if the formed antiglare layer is dissolved by the alkaline cleaning liquid used in the cleaning, the following problems are feared: (1) the film thickness or refractive index of the antiglare layer changes, and the chromaticity when an antireflection layer is further provided on the antiglare layer changes depending on the state of the antiglare layer, (2) a layer having a hydrophobic property inside is exposed compared to the surface of the antiglare layer, so that the hydrophilicity of the surface of the antiglare layer decreases, and when an antifouling layer is directly provided on the antiglare layer, the adhesion between the antiglare layer and the antifouling layer decreases, (3) the surface roughness of the surface of the antiglare layer decreases, resulting in a decrease in antiglare property, etc. In particular, the phenomena of (1) and (2) occur even with slight dissolution compared to (3), so the problems are serious.

[0009] The present invention has been made in view of the above circumstances, and an object thereof is to provide a transparent substrate with an antiglare layer having excellent dissolution resistance.

[0010] The present invention relates to a transparent substrate with an antiglare layer and the like described below.

[0011] A transparent substrate with an antiglare layer, comprising: a transparent substrate, and an antiglare layer provided on one main surface of the transparent substrate.

[0012] The antiglare layer is composed of a cured product of an antiglare layer composition. The antiglare layer composition contains a disilane agent (B). The disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers. The disilane compound is formed by connecting two Si atoms each directly bonded to three substituents selected from reactive groups and hydroxyl groups through a methylene group or an ethylene group.

[0013] The disilane agent (B) satisfies the following conditions (Bi) and (Bii).

[0014] (Bi) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through a methylene group,

[0015] {Number of Si atoms from the disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}>0

[0016] ((Bii)) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through an ethylene group,

[0017] {Number of Si atoms from the disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}≥0.10

[0018] According to the present invention, a transparent substrate with an antiglare layer having an antiglare layer with excellent dissolution resistance can be obtained. For the above-mentioned transparent substrate with an antiglare layer, it can be exerted without impairing the function of the antiglare layer. In addition, even when various functional layers such as an antireflection layer and an antifouling layer are provided on the antiglare layer, the chromaticity difference of the reflected color is not easily enlarged. Therefore, the optical properties of the substrate can be maintained, and the adhesion between the antiglare layer and the antifouling layer is not easily decreased. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a cross-sectional view of a transparent substrate with an antiglare layer according to an embodiment of the present invention.

[0020] Figure 2 is a cross-sectional view of a transparent substrate with an antiglare layer according to another embodiment of the present invention.

[0021] Figure 3It is a cross-sectional view of a transparent substrate with an antiglare layer according to another embodiment of the present invention.

[0022] Symbol Explanation

[0023] 10 Transparent substrate with antiglare layer

[0024] 20 Transparent substrate

[0025] 20A First main surface

[0026] 20B Second main surface

[0027] 30 Antiglare layer

[0028] 40 Antifouling layer

[0029] 50 Printing layer Detailed Embodiment

[0030] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that the present invention is not limited to this embodiment. In addition, when there are multiple embodiments, it also includes a mode formed by combining each embodiment. In addition, the numerical values include the range of rounding.

[0031] Unless otherwise specified, the solid content concentration of the antiglare layer composition is represented by the silica-converted solid content concentration, that is, the concentration of silica (SiO 2 ) converted by assuming that all Si in the Si compound contained in the antiglare layer composition becomes SiO 2 .

[0032] <Transparent Substrate with Antiglare Layer>

[0033] Figure 1 It is a cross-sectional view of the transparent substrate 10 with an antiglare layer according to an embodiment of the present invention.

[0034] As Figure 1 shown, the transparent substrate 10 with an antiglare layer has a transparent substrate 20 and an antiglare layer 30. The transparent substrate 20 has a first main surface 20A and a second main surface 20B that face each other, and the antiglare layer 30 is provided on one main surface (the first main surface 20A).

[0035] Figure 2 It is a cross-sectional view of the transparent substrate 10 with an antiglare layer according to another embodiment of the present invention.

[0036] As Figure 2 shown, the transparent substrate 10 with an antiglare layer has a transparent substrate 20, an antiglare layer 30, an antifouling layer 40, and a printing layer 50. The antiglare layer 30 is provided on the first main surface 20A, and the antifouling layer 40 is provided on the antiglare layer 30. The printing layer 50 is provided on the peripheral portion of the second main surface 20B.

[0037] Figure 3 This is a cross-sectional view of the transparent substrate 10 with an antiglare layer according to another embodiment of the present invention.

[0038] As Figure 3 shown, the transparent substrate 10 with an antiglare layer has a transparent substrate 20, an antiglare layer 30, an antireflection layer 60, an antifouling layer 40, and a printing layer 50. The antiglare layer 30, the antireflection layer 60, and the antifouling layer 40 are sequentially provided on the first main surface 20A. The printing layer 50 is provided on the peripheral portion of the second main surface 20B.

[0039] (Transparent substrate)

[0040] The transparent substrate may be made of any transparent material that requires antiglare properties to be imparted by the antiglare layer, and there is no particular limitation. For example, materials made of glass, resin, or a combination thereof (composite materials, laminated materials, etc.) are preferably used. As the glass, for example, soda-lime glass, borosilicate glass, aluminosilicate glass, alkali-free glass, etc. can be cited. As the resin, for example, polyethylene terephthalate, polycarbonate, triacetyl cellulose, polymethyl methacrylate, etc. can be cited.

[0041] The form of the transparent substrate is not particularly limited either. For example, it can be in the form of a rigid plate or a flexible film.

[0042] The first main surface (the surface on which the antiglare layer is to be formed) of the transparent substrate may be smooth or may have irregularities. From the viewpoint of obtaining the required optical properties by providing the antiglare layer, it is preferably smooth. It should be noted that the antiglare layer provided on the transparent substrate may not be formed on the entire surface of the first main surface of the transparent substrate. That is, the antiglare layer only needs to be formed in a specified area of the first main surface of the transparent substrate where antiglare properties are to be imparted, and it may not be formed in other areas.

[0043] The shape of the transparent substrate may be a flat shape or a shape with a curved surface. In this case, it may be entirely composed of a curved surface or may be composed of a part of a curved surface and a flat part. Recently, in various devices equipped with an image display device (TV, personal computer, mobile phone, car navigation, etc.), there have emerged devices in which the display surface of the image display device is curved. The transparent substrate with an antiglare layer having a curved surface shape is useful in such applications of the image display device.

[0044] As the transparent substrate, a glass substrate is preferred. The manufacturing method of the glass substrate is not particularly limited. The glass substrate can be manufactured by charging the required glass raw materials into a melting furnace, heating and melting, clarifying, and then supplying the molten glass to a forming device to form and slowly cool the molten glass. It should be noted that the forming method of the glass substrate is not particularly limited. For example, a glass substrate obtained by forming by the float method, the melting method, the down-draw method, etc. can be used.

[0045] The thickness of the transparent substrate can be appropriately selected according to the use. When using a glass substrate as the transparent substrate, its thickness is preferably 0.1 mm to 5 mm, more preferably 0.2 mm to 2.5 mm.

[0046] When using a glass substrate as the transparent substrate, it is preferable to perform a strengthening treatment on the first main surface of the glass substrate. By the strengthening treatment, the strength of the glass can be improved. For example, the thickness can be reduced while maintaining the strength. An antiglare layer can be formed on the unstrengthened glass substrate, and then the strengthening treatment can be performed.

[0047] For the transparent substrate with an antiglare layer, functional layers such as a primer layer, an adhesion improvement layer, and a protective layer can be provided between the transparent substrate and the antiglare layer. The primer layer functions as an alkali barrier layer or a broadband low refractive index layer. As the primer layer, a layer formed by coating a primer-forming composition containing a hydrolyzate of alkoxysilane (sol-gel silica) on the transparent substrate is preferably used.

[0048] (Antiglare layer)

[0049] The antiglare layer is provided on the first main surface of the transparent substrate, has an uneven structure on the surface, and imparts antiglare properties to the transparent substrate by diffusing the external light irradiated onto the transparent substrate to suppress the surface reflection of the external light. In the transparent substrate with an antiglare layer according to an embodiment of the present invention, the antiglare layer is a layer mainly composed of silica and is composed of a cured product of an antiglare layer-forming composition containing a silane compound described later. It should be noted that "mainly composed of silica" means containing 50% by mass or more of silica.

[0050] The arithmetic mean roughness Ra of the surface of the antiglare layer is preferably 0.02 μm or more. The arithmetic mean roughness Ra is a value obtained by averaging the absolute value deviations from the reference plane in the roughness curve contained in the reference length on the reference plane. By making the arithmetic mean roughness Ra 0.02 μm or more, the antiglare layer exhibits excellent antiglare properties, so it is preferable. In addition, the arithmetic mean roughness Ra of the antiglare layer is preferably 0.1 μm or less. The arithmetic mean roughness Ra being 0.1 μm or less is an important factor for preventing the haze from being too high and enabling the antiglare layer to achieve both excellent antiglare properties and low haze.

[0051] The arithmetic mean roughness Ra can be measured using a surface roughness measuring machine (for example, SURFCOM1500SD3-12 manufactured by Tokyo Seimitsu Co., Ltd.) according to the method specified in JIS B0601-2001.

[0052] The arithmetic mean roughness Ra of the surface of the antiglare layer can be adjusted by the composition of the antiglare layer-forming composition (solid content concentration, content of each component, etc.) and the coating conditions of the antiglare layer-forming composition on the transparent substrate.

[0053] The thickness of the antiglare layer is preferably 20 nm to 500 nm. By being 20 nm or more, antiglare property is easily imparted. In addition, if it is 500 nm or less, irregularities for obtaining sufficient antiglare property can be formed. The thickness of the antiglare layer is more preferably 50 nm to 300 nm.

[0054] The thickness of the antiglare layer can be measured by observing the cross section of the antiglare layer using a scanning electron microscope (SEM), measuring the thickness from the interface between the substrate and the antiglare layer to the surface of the antiglare layer over the entire photographing range, and obtaining the average value.

[0055] (Composition for antiglare layer)

[0056] The composition for antiglare layer contains the disilane agent (B) described below, or a condensate of the disilane agent (B) and at least one of the monosilane agent (A) and the monosilane agent (C) described below.

[0057] (Disilane agent (B))

[0058] The disilane agent (B) is a silane agent containing one or more selected from a disilane compound (B1), its hydrolyzate (B2), and its polymer (B3).

[0059] The composition for antiglare layer is cured to form a matrix, and an antiglare layer having an uneven shape is formed.

[0060] The disilane agent (B) is a component for forming the matrix and is a component contributing to the solvent resistance of the antiglare layer. By containing the disilane agent (B) in the composition for antiglare layer, an antiglare layer having excellent solvent resistance can be obtained.

[0061] The disilane compound (B1) is a compound in which two Si atoms each directly bonded to three substituents selected from a reactive group and a hydroxyl group are connected by a methylene group or an ethylene group, and is represented by the following formula (B1).

[0062] Si(R 1B )(R 2B )(R 3B )-(CH 2 ) n -Si(R 4B )(R 5B )(R 6B )(B1)

[0063] R 1B ~R 6B : Each independently is a reactive group or a hydroxyl group

[0064] n: 1 or 2

[0065] In the disilane compound (B1), the group connecting two Si atoms is an alkylene chain such as methylene or ethylene. Therefore, even when using an alkaline cleaning solution after forming the antiglare layer, it is not easy to cut the bond between Si and Si, and the alkylene chain is short. As a result, the denseness of the antiglare layer is not easily decreased, and the dissolution resistance of the antiglare layer can be improved. Moreover, the alkylene chain connecting two Si atoms does not participate in the curing reaction of the antiglare layer composition and easily exists in the antiglare layer in its original form, enabling the antiglare layer to be imparted with hydrophobicity.

[0066] From the viewpoint of reactivity, the reactive group is preferably selected from alkoxy groups, isocyanate groups, silazanes, halogens, and carboxyl groups. When there are two or more reactive groups, they may be different from each other. As the alkoxy group, an alkoxy group having 1 to 3 carbon atoms is preferred, and methoxy and ethoxy are more preferred. As the halogen, a fluorine atom, a chlorine atom, and a bromine atom can be cited. From the viewpoints of stability and non-corrosiveness, the reactive group is particularly preferably an alkoxy group having 1 to 3 carbon atoms.

[0067] Specific examples of the disilane compound (B1) include bis(triethoxysilyl)methane, bis(triethoxysilyl)ethane, bis(trimethoxysilyl)methane, bis(trimethoxysilyl)ethane, and the like.

[0068] The hydrolyzate (B2) is a hydrolyzate of the disilane compound (B1), and is a compound in which the structure of the Si-reactive group in the disilane compound (B1) is hydrolyzed to become silanol (Si-OH). When the disilane compound (B1) has a plurality of reactive groups, it is sufficient that at least one Si-reactive group structure is hydrolyzed.

[0069] As the hydrolyzate (B2), a compound in which the structure of one or more Si-reactive groups in the compounds listed as specific examples of the disilane compound (B1) is converted to silanol is preferred.

[0070] The polymer (B3) is a polymer of the disilane compound (B1) or a condensate of the hydrolyzate (B2) of the disilane compound (B1). It should be noted that the polymer or hydrolytic condensate of the silane compound is a product in which a part of the reactive group or hydroxyl group remains (partially hydrolyzed condensate), and thus it is difficult to represent this product by a chemical formula.

[0071] The disilane agent (B) may contain only any one of the disilane compound (B1), the hydrolyzate (B2), and the polymer (B3), or may be a mixture containing one or more selected from (B1) to (B3).

[0072] The content of the disilane agent (B) in the antiglare layer composition is set such that the disilane agent (B) satisfies the following conditions (Bi) and (Bii) in the antiglare layer composition.

[0073] Let the number of Si atoms in the disilane agent (B) be A B , and let the total number of at least one kind of atom selected from Si, Al, and Zr in the antiglare layer be A T . At least one kind of atom selected from Si, Al, and Zr is the main atom constituting the antiglare layer.

[0074] (Bi) When the disilane agent (B) contains one or more selected from the disilane compound (B1m) in which the group connecting two Si atoms is methylene, its hydrolyzate (B2m), and its polymer (B3m), A B / A T > 0, preferably A B / A T ≥0.03.

[0075] (Bii) When the disilane agent (B) contains one or more selected from the disilane compound (B1e) in which the group connecting two Si atoms is ethylene, its hydrolyzate (B2e), and its polymer (B3e), A B / A T ≥0.10, preferably A B / A T ≥0.50.

[0076] If it is an antiglare layer composition containing the disilane agent (B) in a manner that satisfies the above conditions, it is preferable from the viewpoint of the solvent resistance of the obtained antiglare layer. Here, the disilane agent (B) in the antiglare layer composition may also contain one or more selected from the disilane compound (B1m) in which the group connecting two Si atoms is methylene, its hydrolyzate (B2m), and its polymer (B3m) and one or more selected from the disilane compound (B1e) in which the group connecting two Si atoms is ethylene, its hydrolyzate (B2e), and its polymer (B3e). It should be noted that the antiglare layer obtained from the antiglare layer composition satisfying the conditions (Bi) and (Bii) also satisfies the conditions (Bi) and (Bii).

[0077] It should be noted that for the number of Si atoms A B , and the total number A of at least one kind of atom selected from Si, Al, and Zr T , if it is an antiglare layer composition, it can be calculated according to the content ratio of the constituent compounds. Additionally, if it is an antiglare layer, it can be calculated using thermal desorption mass spectrometry (TDS), TOF-SIMS (time-of-flight secondary ion mass spectrometry), XPS (X-ray photoelectron spectroscopy), or nuclear magnetic resonance spectroscopy (NMR).

[0078] The composition for an antiglare layer may further contain a silane agent other than the disilane agent (B). As the other silane agent, at least one of the monosilane agent (A) and the monosilane agent (C) described later is preferable.

[0079] As described below, the composition for an antiglare layer may contain a condensate of the disilane agent (B) and at least one of the monosilane agent (A) and the monosilane agent (C). In this case, the composition for an antiglare layer may further contain or may not contain each of the silane agents of the disilane agent (B), the monosilane agent (A), and the monosilane agent (C) together with the condensate.

[0080] (Monosilane agent (A))

[0081] The monosilane agent (A), like the disilane agent (B), is also a component for forming the matrix of the antiglare layer.

[0082] The monosilane agent (A) preferably contains one or more selected from the group consisting of a monosilane compound (A1), its hydrolyzate (A2), and its polymer (A3).

[0083] The monosilane compound (A1) is preferably a compound in which four substituents selected from reactive groups and hydroxyl groups are directly bonded to the Si atom, and is represented by the following formula (A1).

[0084] Si(R 1A )(R 2A )(R 3A )(R 4A )(A1)

[0085] R 1A ~R 4A : Each independently represents a reactive group or a hydroxyl group

[0086] The types of the reactive groups are the same as (including the preferred modes) those of the reactive groups in the disilane compound (B1).

[0087] Specific examples of the monosilane compound (A1) include tetraethoxysilane, tetramethoxysilane, tetrapropoxysilane, tetrabutoxysilane, and the like.

[0088] The hydrolyzate (A2) is a hydrolyzate of the monosilane compound (A1), and is a compound in which the structure of the Si-reactive group in the monosilane compound (A1) is hydrolyzed to become silanol (Si-OH). When the monosilane compound (A1) has a plurality of reactive groups, it is sufficient that at least one Si-reactive group structure is hydrolyzed.

[0089] As the hydrolyzate (A2), a compound in which the structure of one or more Si-reactive groups in the compounds specifically exemplified as the monosilane compound (A1) is converted to silanol is preferable.

[0090] The polymer (A3) is a polymer of a monosilane compound (A1) or a condensate of a hydrolyzate (A2) of the monosilane compound (A1). It should be noted that the polymer or hydrolytic condensate of a silane compound is a product in which a part of the reactive group or hydroxyl group remains (partial hydrolytic condensate), and thus it is difficult to represent this product by a chemical formula.

[0091] The monosilane agent (A) may contain only any one of the monosilane compound (A1), the hydrolyzate (A2), and the polymer (A3), or may be a mixture containing one or more selected from (A1) to (A3).

[0092] When the composition for an antiglare layer contains a condensate of the monosilane agent (A) and the disilane agent (B), as the condensate, a condensate of the hydrolyzate (A2) of the monosilane compound (A1) and the hydrolyzate (B2) of the disilane compound (B1) is preferably selected.

[0093] The content of the monosilane agent (A) in the composition for an antiglare layer is not particularly limited and can be arbitrarily set. Relative to the total amount (100% by mass) of the silica solid component in the composition for an antiglare layer, the content of the monosilane agent (A) in the composition for an antiglare layer is preferably 35% by mass to 94% by mass, more preferably 45% by mass to 90% by mass. If it is within this range, film curing becomes easy.

[0094] (Monosilane agent (C))

[0095] The monosilane agent (C) preferably contains one or more selected from a monosilane compound (C1) in which three substituents selected from reactive groups and hydroxyl groups and a methyl group are directly bonded to the Si atom, its hydrolyzate (C2), and its polymer (C3).

[0096] The monosilane compound (C1) is represented by the following formula (C1).

[0097] Si(R 1C )(R 2C )(R 3C )(CH 3 )(C1)

[0098] R 1C ~R 3C : Each independently is a reactive group or a hydroxyl group

[0099] The monosilane agent (C), like the monosilane agent (A) or the disilane agent (B), is a component of the substrate for forming the antiglare layer. In addition, the methyl group in the monosilane compound (C1) does not participate in the curing reaction of the antiglare layer composition and exists in its original form in the antiglare layer. Therefore, it is easy to relieve the stress generated by the shrinkage during the curing of the antiglare layer. Due to the presence of the monosilane agent (C), the voids in the antiglare layer generated by shrinkage are reduced. As a result, the hardness of the antiglare layer increases, and it is easy to obtain an antiglare layer with excellent durability. Moreover, due to the presence of the methyl group in the antiglare layer, the antiglare layer is imparted with hydrophobicity, so it is preferred.

[0100] The types of the reactive groups of the monosilane compound (C1) are the same as those of the reactive groups in the disilane compound (B1) (including preferred modes).

[0101] Specific examples of the monosilane compound (C1) include methyltriethoxysilane, methyltrimethoxysilane, methyltripropoxysilane, and the like.

[0102] The hydrolyzate (C2) is a hydrolyzate of the monosilane compound (C1), and is a compound in which the structure of the Si-reactive group in the monosilane compound (C1) is hydrolyzed to become silanol (Si-OH). When the monosilane compound (C1) has a plurality of reactive groups, it is sufficient that at least one Si-reactive group structure is hydrolyzed.

[0103] As the hydrolyzate (C2), a compound in which the structure of one or more Si-reactive groups in the compounds specifically exemplified as the monosilane compound (C1) is converted into silanol is preferred.

[0104] The polymer (C3) is a polymer of the monosilane compound (C1) or a condensate of the hydrolyzate (C2) of the monosilane compound (C1). It should be noted that the polymer or hydrolytic condensate of the silane compound is a product in which a part of the reactive group or hydroxyl group remains (partially hydrolyzed condensate), so it is difficult to represent this product by a chemical formula.

[0105] The monosilane agent (C) may contain only any one of the monosilane compound (C1), the hydrolyzate (C2), and the polymer (C3), or may be a mixture containing one or more selected from (C1) to (C3).

[0106] When the antiglare layer composition contains a condensate of the disilane agent (B) and the monosilane agent (C), as the condensate, a condensate of the hydrolyzate (B2) of the disilane compound (B1) and the hydrolyzate (C2) of the monosilane compound (C1) is preferably selected.

[0107] When the composition for an antiglare layer contains a condensate of a disilane agent (B), a monosilane agent (A), and a monosilane agent (C), as the condensate, a condensate of a hydrolyzate (B2) of a disilane compound (B1), a hydrolyzate (A2) of a monosilane compound (A1), and a hydrolyzate (C2) of a monosilane compound (C1) is preferably selected.

[0108] In addition, the composition for an antiglare layer may contain a condensate of a monosilane agent (A) and a monosilane agent (C). As the condensate, a condensate of a hydrolyzate (A2) of a monosilane compound (A1) and a hydrolyzate (C2) of a monosilane compound (C1) is preferably selected.

[0109] The content of the monosilane agent (C) in the composition for an antiglare layer is preferably set such that the monosilane agent (C) in the composition for an antiglare layer satisfies the following condition (Ci).

[0110] (Ci) Let the number of Si atoms from the monosilane agent (C) be A C , and let the total number of at least one kind of atom selected from Si, Al, and Zr in the antiglare layer be A T When C / A T = 0.02 to 0.2, more preferably A C / A T = 0.05 to 0.15.

[0111] If the composition for an antiglare layer contains the monosilane agent (C) in a manner that satisfies the above conditions, it is preferable from the viewpoint of obtaining an antiglare layer with high hardness. It should be noted that the antiglare layer obtained from the composition for an antiglare layer that satisfies the condition (Ci) also satisfies the condition (Ci).

[0112] It should be noted that for the number of Si atoms A C from the monosilane agent (C), if it is the composition for an antiglare layer, it can be calculated based on the content ratio of the monosilane agent (C). In addition, if it is the antiglare layer, it can be calculated by thermal desorption mass spectrometry (TDS), TOF-SIMS (time-of-flight secondary ion mass spectrometry), XPS (X-ray photoelectron spectroscopy), or nuclear magnetic resonance spectroscopy (NMR).

[0113] Within the range that does not hinder the effects of the present invention, the composition for an antiglare layer may contain other silane agents in addition to the monosilane agent (A), the disilane agent (B), and the monosilane agent (C).

[0114] From the viewpoint of obtaining an uneven shape of the antiglare layer suitable for the requirements of a display, the total silica equivalent solid content concentration of the composition for an antiglare layer is preferably 0.1 to 2.0% by mass, more preferably 0.2 to 1.0% by mass.

[0115] (Metal oxide particles)

[0116] In order to impart antiglare properties, the composition for the antiglare layer preferably contains metal oxide particles. The metal oxide particles preferably contain at least one selected from silica, alumina, and zirconia. In addition, as the shape of the metal oxide particles, scaly, spherical, plate-like, rod-like, needle-like, etc. can be mentioned, and from the viewpoint of abrasion resistance, scaly and plate-like are preferred. As the metal oxide particles, scaly or plate-like silica particles, alumina particles, and zirconia particles are particularly preferred.

[0117] From the viewpoint of effectively forming the uneven shape that exhibits antiglare properties, the primary particle size of the metal oxide particles is preferably 10 nm to 500 nm, more preferably 50 nm to 300 nm.

[0118] The primary particle size can be measured by a particle size distribution meter, SEM observation, or TEM observation.

[0119] With respect to the total amount (100% by mass) of the silica solid component in the composition for the antiglare layer, the content of the metal oxide particles in the composition for the antiglare layer is preferably 1% by mass to 30% by mass, more preferably 3% by mass to 15% by mass. If it is within this range, the balance of antiglare properties, glare index value characteristics, and abrasion resistance is good, so it is preferred.

[0120] (Liquid medium)

[0121] The composition for the antiglare layer preferably contains a liquid medium. The liquid medium has the function of being a solvent for dissolving silane agents such as disilane agent (B) or a dispersion medium for dispersing it, and the function of being a dispersion medium for dispersing metal oxide particles. One kind of liquid medium can be used alone, or two or more kinds can be used in combination.

[0122] The liquid medium preferably contains a low-boiling liquid medium having a boiling point of 160 °C or lower and a high-boiling liquid medium having a boiling point higher than 160 °C.

[0123] By including a low-boiling liquid medium having a boiling point of 160 °C or lower in the composition for the antiglare layer, an antiglare layer having excellent antiglare properties can be obtained, particularly when forming the antiglare layer by an electrostatic coating method. The boiling point of the low-boiling liquid medium is preferably 50 °C to 150 °C, more preferably 55 °C to 140 °C. By setting the lower limit within this range, the droplets of the composition for the antiglare layer are easily wetted and spread, and it is easy to form a uniform coating film. In addition, by setting the upper limit within this range, it is easy to obtain the uneven shape of the antiglare layer.

[0124] As the low-boiling liquid medium, water, alcohols having a boiling point of 160 °C or lower (such as methanol, ethanol, isopropyl alcohol, n-butanol, isobutanol, and 1-pentanol), ketones (such as acetone, methyl ethyl ketone, and methyl isobutyl ketone), ethers (such as tetrahydrofuran, 1,4- Alkanes (such as hexane), cellosolves (such as methyl cellosolve, ethyl cellosolve), esters (such as methyl acetate, ethyl acetate), diol ethers (such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether), etc.

[0125] The composition for the antiglare layer can easily achieve both excellent antiglare property and low haze by containing a high-boiling liquid medium with a boiling point higher than 160°C.

[0126] Examples of the high-boiling liquid medium include alcohols, ketones, ethers, cellosolves, esters, diol ethers, nitrogen-containing compounds, sulfur-containing compounds, etc. with a boiling point exceeding 160°C. Examples of alcohols include diacetone alcohol, 1-hexanol, ethylene glycol, propylene glycol, etc. Examples of nitrogen-containing compounds include N,N-dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone, etc. Examples of diol ethers include ethylene glycol monobutyl ether, etc. Examples of sulfur-containing compounds include dimethyl sulfoxide, etc.

[0127] In order to promote the hydrolysis and condensation reaction of silane compounds such as silane compound (A1), disilane compound (B1), monosilane compound (C1), etc., it is preferable to contain at least water as the liquid medium.

[0128] The content ratio of the low-boiling liquid medium relative to the total amount of the liquid medium is preferably 80% by mass to 99.99% by mass, more preferably 80% by mass to 99.9% by mass. The content ratio of the high-boiling liquid medium relative to the total amount of the liquid medium is preferably 0.01% by mass to 20% by mass, more preferably 0.1% by mass to 20% by mass.

[0129] (Catalyst component)

[0130] The composition for the antiglare layer preferably contains a catalyst component for promoting the hydrolysis and condensation reaction of silane compounds such as silane compound (A1), disilane compound (B1), monosilane compound (C1), etc.

[0131] Examples of the catalyst component include an acid or a base.

[0132] Examples of the acid used as a catalyst include inorganic acids such as nitric acid, sulfuric acid, hydrochloric acid, etc., and organic acids such as formic acid, acetic acid, oxalic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, etc. Examples of the base used as a catalyst include ammonia, sodium hydroxide, potassium hydroxide, etc. From the viewpoint of the long-term storage stability of the hydrolysis condensate, an acid is preferred.

[0133] In addition, the content of the catalyst component in the composition for the antiglare layer is preferably 0.001% to 0.1%.

[0134] (Printing layer)

[0135] The transparent substrate with an antiglare layer according to this embodiment preferably has a printed layer.

[0136] For example, for the purpose of improving the visibility and aesthetics of the display, in order to hide the wiring circuit disposed near the outer periphery of an image display device of a portable device or the like, or the bonding portion between the housing of the portable device and the transparent substrate with an antiglare layer, etc., a printed layer may be provided in the peripheral portion of the transparent substrate as needed. Here, the peripheral portion refers to a strip-shaped area having a predetermined width from the outer periphery toward the central portion. The printed layer may be provided on the entire periphery of the second major surface (the major surface opposite to the first major surface provided with the antiglare layer) of the transparent substrate, or may be provided on a part of the periphery. In addition, the printed layer may be provided outside the peripheral portion of the transparent substrate.

[0137] The printed layer is preferably formed in a desired color according to the purpose with a width capable of hiding the above-mentioned wiring circuit or bonding portion. The printed layer is formed, for example, by printing using ink.

[0138] As the ink, for example, inorganic inks containing ceramic calcined bodies, etc., and organic inks containing coloring materials such as dyes or pigments and organic resins can be cited. For example, when forming a printed layer in black, as the ceramics contained in the black inorganic ink, oxides such as chromium oxide and iron oxide, carbides such as chromium carbide and tungsten carbide, carbon black, mica, etc. can be cited. The black printed layer is obtained by melting the ink composed of the above-mentioned ceramics and silica, printing in a required pattern, and then drying. This inorganic ink requires melting and drying processes and is generally used as a special ink for glass.

[0139] The printed layer may be composed of a multilayer formed by laminating multiple layers, or may be composed of a single layer.

[0140] (Antireflection layer)

[0141] The transparent substrate with an antiglare layer according to this embodiment preferably has an antireflection layer.

[0142] The antireflection layer is provided on the surface of the antiglare layer and is a layer that suppresses the reflection of incident light directed at the transparent substrate itself and makes the reflected image unclear. As the antireflection layer, a laminated film of layers with different refractive indices is preferred. For example, a laminated film of a high refractive index layer with a refractive index of 1.9 or more at a wavelength of 550 nm and a low refractive index layer with a refractive index of 1.6 or less at a wavelength of 550 nm is more preferred. The high refractive index layer and the low refractive index layer may be in a form each containing one layer, or may be in a configuration each containing two or more layers. In the case where the high refractive index layer and the low refractive index layer each contain two or more layers, a form in which the high refractive index layer and the low refractive index layer are alternately laminated is preferred.

[0143] As materials constituting the antireflection layer, metal oxides or metal nitrides can be cited, and they can be appropriately selected in consideration of the required degree of low reflectivity, productivity, etc. As materials constituting the high refractive index layer, for example, one or more selected from niobium oxide (Nb 2 O 5 ), titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ), tantalum oxide (Ta 2 O 5 ), silicon nitride (Si 3 N 4 ) can be preferably used. As materials constituting the low refractive index layer, one or more selected from silicon oxide (SiO 2 ), a material of a mixed oxide containing Si and Sn, a material of a mixed oxide containing Si and Zr, and a material of a mixed oxide containing Si and Al can be preferably used.

[0144] From the viewpoints of productivity and refractive index, it is preferable that the high refractive index layer is a layer composed of one selected from niobium oxide, tantalum oxide, and silicon nitride, and the low refractive index layer is a layer composed of silicon oxide.

[0145] (Antifouling layer)

[0146] The transparent substrate with an antiglare layer according to the present embodiment preferably has an antifouling layer.

[0147] When the transparent substrate with an antiglare layer does not have an antireflection layer, it is preferable to have an antifouling layer on the surface of the antiglare layer. When the transparent substrate with an antiglare layer has an antireflection layer, it is preferable to have an antifouling layer on the surface of the antireflection layer. The antifouling layer is a layer that has the effect of suppressing the adhesion of organic substances or inorganic substances to the surface of the transparent substrate with an antiglare layer, or the effect of being able to easily remove the adhered substances by wiping or the like even when organic substances or inorganic substances are adhered.

[0148] As the antifouling layer, for example, as long as it has water and oil repellency and can impart antifouling properties to the transparent substrate with an antiglare layer, there is no limitation. It is preferably composed of a fluorine-containing organosilicon compound film obtained by curing a fluorine-containing organosilicon compound through a hydrolysis and condensation reaction, or an organosilicon compound film containing polydimethylsiloxane obtained by curing an organosilicon compound having a polydimethylsiloxane chain through a hydrolysis and condensation reaction.

[0149] For example, when the antifouling layer is formed of a fluorine-containing organosilicon compound film, the thickness of the antifouling layer is preferably 2 nm to 30 nm, more preferably 3 nm to 15 nm. If the film thickness of the antifouling layer is 2 nm or more, the antifouling layer has excellent abrasion resistance in addition to antifouling properties. In addition, if the film thickness of the antifouling layer is 30 nm or less, the antiglare properties, haze, and other optical properties of the transparent substrate with an antiglare layer in the state where the antifouling layer is formed are good.

[0150] In the transparent substrate with an antiglare layer according to the present embodiment, since the antiglare layer has excellent solvent resistance, even after the cleaning process before forming the printing layer, the hydrophobic portions inside the antiglare layer are not easily exposed, and the hydrophilicity of the antiglare layer can be ensured. As a result, even when the antifouling layer is directly provided on the antiglare layer, the adhesion between the antiglare layer and the antifouling layer can be maintained well.

[0151] (Properties of the transparent substrate with an antiglare layer)

[0152] In the transparent substrate with an antiglare layer according to the present embodiment, the arithmetic mean roughness Ra of the outermost surface on the main surface side having the antiglare layer, that is, the first main surface side, is preferably 0.02 μm or more. Thereby, excellent antiglare properties can be exhibited. In addition, from the viewpoint of maintaining a low haze, Ra is preferably 0.1 μm or less.

[0153] The outermost surface on the first main surface side of the transparent substrate with an antiglare layer refers to the surface of the outermost layer on the first main surface.

[0154] It should be noted that since the shape of the antireflection layer or the antifouling layer follows the shape of the antiglare layer, the uneven shape of the outermost surface on the first main surface side of the transparent substrate with an antiglare layer is almost the same as the uneven shape of the antiglare layer. Therefore, the arithmetic mean roughness Ra of the outermost surface of the transparent substrate with an antiglare layer can be controlled within a desired range by adjusting the arithmetic mean roughness Ra of the antiglare layer.

[0155] Since the antiglare layer in the transparent substrate with an antiglare layer according to the present embodiment has excellent solvent resistance, even after the cleaning process after forming the antiglare layer, the arithmetic mean roughness of the antiglare layer surface does not decrease, excellent antiglare properties can be exhibited, and a transparent substrate with an antiglare layer having a good arithmetic mean roughness of the outermost surface can be obtained.

[0156] In the transparent substrate with an antiglare layer according to the present embodiment, the 60° specular gloss (Gloss) of the outermost surface on the main surface side having the antiglare layer, that is, the first main surface side, is preferably 130% or less, more preferably 115% or less. Thereby, a sufficient antiglare function can be obtained, which is preferable. In addition, from the viewpoint of suppressing the haze to a lower level, the 60° specular gloss (Gloss) of the outermost surface on the first main surface side is preferably 50% or more.

[0157] The 60° specular glossiness can be measured using a gloss meter (e.g., GM-268A manufactured by Konica Minolta, Inc.).

[0158] Since the anti-glare layer in the transparent substrate with an anti-glare layer according to this embodiment has excellent dissolution resistance, even after the cleaning process after the formation of the anti-glare layer, the film thickness and refractive index of the anti-glare layer are not likely to change. Even when an anti-reflection layer is further provided on the anti-glare layer, the specular glossiness does not change, and a transparent substrate with an anti-glare layer having excellent optical properties can be obtained.

[0159] The pencil hardness of the transparent substrate with an anti-glare layer according to this embodiment is preferably 4H or more, more preferably 5H or more. If the pencil hardness is in this range, a transparent substrate with an anti-glare layer having excellent durability can be obtained.

[0160] The pencil hardness of the transparent substrate with an anti-glare layer can be achieved, for example, by forming an anti-glare layer using the anti-glare layer composition containing the above-mentioned silane agent (C).

[0161] <Method for manufacturing a transparent substrate with an anti-glare layer>

[0162] The method for manufacturing a transparent substrate with an anti-glare layer according to the embodiment of the present invention is a method of obtaining a transparent substrate with an anti-glare layer by coating the anti-glare layer composition of this embodiment on one main surface (the first main surface) of the transparent substrate to form a coating film and curing the coating film to form an anti-glare layer. The manufacturing method of this embodiment may have a step of forming a functional layer on the surface of the transparent substrate main body before forming the anti-glare layer as needed. In addition, after forming the anti-glare layer, a step of performing other post-processing may be included.

[0163] (Preparation of the anti-glare layer composition)

[0164] The anti-glare layer composition can be prepared, for example, by preparing a solution or dispersion in which a bis-silane agent (B) and, if necessary, a mono-silane agent (A) and / or a mono-silane agent (C) and other silane agents, or their condensates are dissolved or dispersed in a liquid medium, and mixing a dispersion of metal oxide particles and, if necessary, an additional liquid medium therein.

[0165] (Coating)

[0166] The anti-glare layer-forming composition is coated on the first main surface of the transparent substrate by, for example, a spraying method. Specifically, for example, an electrostatic coating apparatus equipped with an electrostatic coating gun having a gun body and a rotary atomizing head is used. The anti-glare layer-forming composition supplied to the rotary atomizing head is filamentized from the edge of the rotary atomizing head by the centrifugal force generated by rotating and driving the rotary atomizing head. The filaments are atomized by applying a voltage to generate droplets, and the droplets are sprayed onto the transparent substrate by air. Thereby, a coating film of the anti-glare layer-forming composition is formed on the first main surface of the transparent substrate.

[0167] (Curing)

[0168] Next, the coating film of the anti-glare layer-forming composition formed on the first main surface of the transparent substrate is cured.

[0169] The curing can be carried out by heating the coating film. Thereby, the residual liquid medium in the coating film volatilizes and is removed, and at the same time, the reactive groups of the silane agent in the coating film undergo a polycondensation reaction to be cured, thereby forming an anti-glare layer. The heating temperature is preferably 30°C or higher, more preferably 100°C to 750°C, and further preferably 150°C to 550°C.

[0170] Through the above steps, the transparent substrate with an anti-glare layer according to the present embodiment can be manufactured.

[0171] Hereinafter, a manufacturing method in the case where the transparent substrate with an anti-glare layer further has other functional layers will be described.

[0172] After the anti-glare layer is formed, before the printing layer is formed, before the anti-reflection layer is formed, or before the anti-fouling layer is formed, in order to ensure the cleanliness of the main surface, the transparent substrate with an anti-glare layer can be cleaned. As the cleaning method, for example, a method of immersing the transparent substrate with an anti-glare layer in an alkaline cleaning solution for a predetermined time and then rinsing the cleaning solution with water or an organic solvent can be cited.

[0173] Since the anti-glare layer of the transparent substrate with an anti-glare layer according to the present embodiment has excellent solvent resistance, the anti-glare layer does not change even after the cleaning process and can maintain its function.

[0174] (Formation of the printing layer)

[0175] The printing layer can be formed by printing ink on the second main surface of the transparent substrate.

[0176] As the printing method, there are bar coating, reverse coating, gravure coating, die coating, roll coating, screen printing, inkjet printing, etc. However, in order to be able to print simply and be able to print on various substrates in the required sizes, screen printing is preferred.

[0177] (Formation of the anti-reflection layer)

[0178] The antireflection layer is usually formed on the surface of the antiglare layer.

[0179] The method of forming the layers constituting the antireflection layer is not particularly limited. For example, vacuum evaporation, ion beam assisted deposition, ion plating, sputtering, plasma CVD, etc. can be used. Among these film-forming methods, by using the sputtering method, a dense and highly durable film can be formed, so it is preferred. Sputtering methods such as pulsed sputtering, AC sputtering, and digital sputtering are particularly preferred.

[0180] (Formation of the antifouling layer)

[0181] The antifouling layer is formed on the surface of the antiglare layer or the surface of the antireflection layer.

[0182] As a method of forming the antifouling layer, when the antifouling layer is composed of a fluorine-containing organosilicon compound film, for example, the following methods can be cited: a method of coating a composition of a silane coupling agent having a perfluoroalkyl group, a fluoroalkyl group containing a perfluoro(polyoxyalkylene) chain, etc. on the surface of the antiglare layer or the antireflection layer by spin coating, dip coating, casting, slot coating, spraying, etc., and then performing heat treatment as needed; or a vacuum evaporation method of vapor-depositing a fluorine-containing organosilicon compound on the surface of the antiglare layer or the antireflection layer and then performing heat treatment as needed.

[0183] Since the antiglare layer of the transparent substrate with an antiglare layer according to this embodiment has excellent solvent resistance, the antiglare layer is not easily changed even after the cleaning processes before the formation of the printing layer, before the formation of the antireflection layer, and before the formation of the antifouling layer. Even when the antifouling layer is directly provided on the antiglare layer, the adhesion between the antiglare layer and the antifouling layer can be maintained well.

[0184] <Usage>

[0185] As uses of the transparent substrate with an antiglare layer according to this embodiment, a display cover material for an image display device, a building window, a display window, a cover material for a solar cell, etc. can be cited. It is particularly suitable as a display cover material for an in-vehicle image display device such as a car navigation system. When the transparent substrate with an antiglare layer according to this embodiment is mounted on an in-vehicle image display device, it is arranged with the first main surface side on which the antiglare layer is formed facing the interior of the vehicle, that is, facing the driver and other occupants.

[0186] <Image display device>

[0187] The image display device according to this embodiment preferably includes the anti-glare layer-containing transparent substrate according to this embodiment as a covering material for the display surface. By including the anti-glare layer-containing transparent substrate according to this embodiment having excellent anti-glare performance, an image display device with excellent visibility can be obtained. Examples of the image display device include a liquid crystal display (LCD), an LED display, and an organic EL display.

[0188] The present invention includes the following aspects.

[0189] 〔1〕An anti-glare layer-containing transparent substrate having: a transparent substrate, and an anti-glare layer provided on one main surface of the transparent substrate,

[0190] The anti-glare layer is composed of a cured product of an anti-glare layer composition, the anti-glare layer composition contains a disilane agent (B), the disilane agent (B) contains one or more selected from a disilane compound, its hydrolyzate, and its polymer, and the disilane compound is formed by connecting two Si atoms each directly bonded with three substituents selected from a reactive group and a hydroxyl group through a methylene group or an ethylene group.

[0191] The disilane agent (B) satisfies the following conditions (Bi) and (Bii).

[0192] ((Bi)) When the disilane agent (B) contains one or more selected from a disilane compound, its hydrolyzate, and its polymer formed by connecting through a methylene group,

[0193] {The number of Si atoms from the disilane agent (B)} / {The total number of at least one kind of atoms selected from Si, Al, and Zr in the anti-glare layer}>0

[0194] ((Bii)) When the disilane agent (B) contains one or more selected from a disilane compound, its hydrolyzate, and its polymer formed by connecting through an ethylene group,

[0195] {The number of Si atoms from the disilane agent (B)} / {The total number of at least one kind of atoms selected from Si, Al, and Zr in the anti-glare layer}≥0.10

[0196] 〔2〕The anti-glare layer-containing transparent substrate according to 〔1〕, wherein the anti-glare layer composition contains at least one of the following monosilane agent (A) and the following monosilane agent (C).

[0197] Monosilane agent (A): A silane agent containing one or more selected from a monosilane compound in which four substituents selected from a reactive group and a hydroxyl group are directly bonded to an Si atom, its hydrolyzate, and its polymer

[0198] Monosilane agent (C): One or more silane agents selected from monosilane compounds in which three substituents selected from reactive groups and hydroxyl groups and a methyl group are directly bonded to an Si atom, their hydrolyzates, and their polymers

[0199] 〔3〕A transparent substrate with an antiglare layer, comprising: a transparent substrate, and an antiglare layer provided on one main surface of the transparent substrate

[0200] The above-mentioned antiglare layer is composed of a cured product of an antiglare layer composition, and the antiglare layer composition contains a condensate of a disilane agent (B) and at least one of the following monosilane agent (A) and monosilane agent (C). The disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers. The disilane compound is formed by connecting two Si atoms each directly bonded to three substituents selected from reactive groups and hydroxyl groups through a methylene group or an ethylene group

[0201] The above-mentioned disilane agent (B) satisfies the following conditions (Bi) and (Bii).

[0202] Monosilane agent (A): One or more silane agents selected from monosilane compounds in which four substituents selected from reactive groups and hydroxyl groups are directly bonded to an Si atom, their hydrolyzates, and their polymers

[0203] Monosilane agent (C): One or more silane agents selected from monosilane compounds in which three substituents selected from reactive groups and hydroxyl groups and a methyl group are directly bonded to an Si atom, their hydrolyzates, and their polymers

[0204] (Bi) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through a methylene group

[0205] {Number of Si atoms from disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}>0

[0206] (Bii) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through an ethylene group

[0207] {Number of Si atoms from disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}≥0.10

[0208] 〔4〕The transparent substrate with an antiglare layer according to 〔2〕 or 〔3〕, wherein the above-mentioned monosilane agent (C) satisfies the following condition (Ci).

[0209] ((Ci)){The number of Si atoms from the monosilane agent (C)} / {The total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}=0.02 to 0.2

[0210] 〔5〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔4〕, wherein the following condition is satisfied in the above condition (Bi).

[0211] {The number of Si atoms from the disilane agent (B)} / {The total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}≥0.03

[0212] 〔6〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔5〕, wherein the following condition is satisfied in the above condition (Bii).

[0213] {The number of Si atoms from the disilane agent (B)} / {The total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer}≥0.50

[0214] 〔7〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔6〕, wherein the above antiglare layer-forming composition further contains at least one kind of metal oxide particles selected from silicon oxide, aluminum oxide, and zirconium oxide.

[0215] 〔8〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔7〕, wherein the arithmetic mean roughness Ra of the outermost surface on the main surface side having the above antiglare layer is 0.02 μm or more.

[0216] 〔9〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔8〕, wherein the 60° specular glossiness of the outermost surface on the main surface side having the above antiglare layer is 130% or less.

[0217] 〔10〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔9〕, wherein the above metal oxide particles contain flaky silicon oxide particles.

[0218] 〔11〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔10〕, wherein the above reactive groups are selected from alkoxy groups, isocyanate groups, silazanes, halogens, and carboxyl groups.

[0219] 〔12〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔11〕, wherein an antifouling layer is provided on the surface of the above antiglare layer.

[0220] 〔13〕The antiglare layer-containing transparent substrate according to any one of 〔1〕 to 〔11〕, wherein an antireflection layer and an antifouling layer are sequentially provided on the surface of the above antiglare layer.

[0221] 〔14〕The transparent substrate with an antiglare layer according to 〔13〕, wherein the antireflection layer is a laminated film of layers with different refractive indexes.

[0222] 〔15〕An antiglare layer composition containing a disilane agent (B), wherein the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers, and the disilane compound is formed by connecting two Si atoms each directly bonded to three substituents selected from reactive groups and hydroxyl groups through a methylene group or an ethylene group.

[0223] The disilane agent (B) satisfies the following conditions (Bi) and (Bii).

[0224] (Bi) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through a methylene group.

[0225] {Number of Si atoms from the disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer composition}>0

[0226] (Bii) When the disilane agent (B) contains one or more selected from disilane compounds, their hydrolyzates, and their polymers formed by connecting through an ethylene group.

[0227] {Number of Si atoms from the disilane agent (B)} / {Total number of at least one kind of atoms selected from Si, Al, and Zr in the antiglare layer composition}≥0.10

[0228] Examples

[0229] The present invention will be described in detail based on the examples below, but the present invention is not limited to the following description.

[0230] First, the measurement and evaluation methods for each example are shown below.

[0231] <Example 1-1: Preparation of antiglare layer composition>

[0232] 〔1〕Preparation of silica particle dispersion

[0233] Flaky silica particles (Sunlovely LFS HN150, manufactured by AGC Si-Tech Co., Ltd.) were pulverized and dispersed in water to prepare a silica particle dispersion.

[0234] Silica particle content: 5% by mass

[0235] Primary particle size of silica particles in the dispersion: 185 nm

[0236] Average aspect ratio (primary particle size / average thickness) of silica particles in the dispersion: 80

[0237] It should be noted that the primary particle size of the silica particles was measured using a particle size distribution analyzer LA-950 manufactured by HORIBA.

[0238] [2] Preparation of coating liquid (composition for antiglare layer)

[0239] As the main solvent, an alcohol mixture (sold by Nippon Alcohol Sales Co., Ltd., trade name Solmix AP-11, industrial ethanol. A mixture of 85% ethanol, 10% isopropanol, and 5% methanol) was used. First, a stock solution was prepared as follows. While stirring the main solvent using a magnetic stirrer, tetraethoxysilane, bis(triethoxysilyl)ethane (BTE), pure water, the above-mentioned 5% by mass dispersion of flaky silica particles, and 20% nitric acid were added in such a way that they accounted for 11.79% by mass, 1.18% by mass, 3.56% by mass, 4.0% by mass, and 0.36% by mass, respectively, based on the total mass of the stock solution, and they were mixed at 60 °C for 60 minutes to obtain a stock solution (the solid content concentration in terms of silica was 4.0% by mass).

[0240] Next, while stirring the main solvent using a magnetic stirrer, the stock solution, diacetone alcohol, and propylene glycol were added in such a way that they accounted for 12.5% by mass, 0.18% by mass, and 0.144% by mass, respectively, based on the total mass of the coating liquid, and they were mixed at 25 °C for 15 minutes to obtain a coating liquid (the solid content concentration in terms of silica was 0.5% by mass).

[0241] <Examples 1-2 to 1-5>

[0242] The coating liquid (composition for antiglare layer) was prepared in the same manner as in Example 1-1, except that the proportions of the respective compounding components were made the values shown in Table 1 described later.

[0243] <Examples 1-6 to 1-10>

[0244] In the preparation of the coating liquid stock solution, methyltriethoxysilane (MTES) was added together with bis(triethoxysilyl)ethane (BTE) so that the proportions of the respective compounding components were made the values shown in Table 1 described later. Otherwise, the coating liquid (composition for antiglare layer) was prepared in the same manner as in Example 1-1.

[0245] <Example 1-11>

[0246] In the preparation of the coating liquid stock solution, bis(triethoxysilyl)ethane (BTE) was not used, and the proportions of the respective compounding components were added in such a way that they were the values shown in Table 1. Otherwise, the coating liquid (composition for antiglare layer) was prepared in the same manner as in Example 1-1.

[0247] <Examples 1-12>

[0248] In the preparation of the coating liquid stock solution, bis(triethoxysilyl)ethane (BTE) is not used, and the components are added in such proportions that the values shown in Table 1 are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Examples 1-6.

[0249] <Examples 2-1 to 2-10: Production of Antiglare Layer Composition>

[0250] In the preparation of the coating liquid stock solution, bis(triethoxysilyl)methane (BTM) is used instead of bis(triethoxysilyl)ethane (BTE), and the components are added in such proportions that the values shown in Table 2 described later are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Example 1-1.

[0251] <Example 2-11>

[0252] In the preparation of the coating liquid stock solution, bis(triethoxysilyl)methane (BTM) is not used, and the components are added in such proportions that the values shown in Table 2 are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Example 2-1.

[0253] <Examples 2-12 to 2-23: Production of Antiglare Layer Composition>

[0254] In the preparation of the coating liquid stock solution, methyltriethoxysilane (MTES) is added together with bis(triethoxysilyl)methane (BTM), and the components are added in such proportions that the values shown in Table 3 described later are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Example 2-1.

[0255] <Example 2-24>

[0256] In the preparation of the coating liquid stock solution, bis(triethoxysilyl)methane (BTM) is not used, and the components are added in such proportions that the values shown in Table 3 are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Example 2-12.

[0257] <Examples 2-25 to 2-31: Production of Antiglare Layer Composition>

[0258] In the preparation of the coating liquid stock solution, methyltriethoxysilane (MTES) is added together with bis(triethoxysilyl)methane (BTM), and the components are added in such proportions that the values shown in Table 4 described later are obtained. Otherwise, the coating liquid (antiglare layer composition) is produced in the same manner as in Example 2-1.

[0259] <Example 2-32>

[0260] In the preparation of the coating liquid stock solution, methyltriethoxysilane (MTES) is not used, and the components are added such that the proportions of the respective compounding components become the values shown in Table 4. Except for this, the coating liquid (anti-glare layer composition) is produced in the same manner as in Example 2-25.

[0261] The composition of the coating liquid (anti-glare layer composition) produced in Examples 1-1 to 1-12 is shown in Table 1 below.

[0262] The composition of the coating liquid (anti-glare layer composition) produced in Examples 2-1 to 2-11 is shown in Table 2 below.

[0263] The composition of the coating liquid (anti-glare layer composition) produced in Examples 2-12 to 2-24 is shown in Table 3 below.

[0264] The composition of the coating liquid (anti-glare layer composition) produced in Examples 2-25 to 2-32 is shown in Table 4 below.

[0265] It should be noted that Examples 1-1 to 1-10, Examples 2-1 to 2-10, Examples 2-12 to 2-23, and Examples 2-25 to 2-32 are examples, and Examples 1-11 to 1-12, Example 2-11, and Example 2-24 are comparative examples.

[0266] [Table 1]

[0267]

[0268] [Table 2]

[0269]

[0270] [Table 3]

[0271]

[0272] [Table 4]

[0273]

[0274] <Manufacture of Transparent Substrate with Anti-Glare Layer>

[0275] Using each of the coating liquids (anti-glare layer compositions) produced above, an anti-glare layer is formed on one main surface (hereinafter also referred to as the "first main surface") of a glass substrate by an electrostatic coating method. As the glass substrate, a flat rectangular glass plate having a length of 100 mm, a width of 100 mm, and a thickness of 1.3 mm is used.

[0276] 〔1〕Electrostatic Coating Apparatus

[0277] Prepare an electrostatic coating apparatus (liquid electrostatic coater, manufactured by Asahi Sunac Corporation) equipped with an electrostatic coating gun. As the electrostatic coating gun, a rotary atomizing type automatic electrostatic gun (manufactured by Asahi Sunac Corporation, SUNBELL, ESA120, cup diameter 70 mm) is used. To dissipate charge, the pedestal for placing the substrate is made of stainless steel.

[0278] 〔2〕Formation of the antiglare layer (AG layer)

[0279] Adjust the temperature in the coating chamber of the electrostatic coating apparatus within the range of 23 ± 1 °C and the humidity within the range of 52% ± 3%.

[0280] Place the cleaned glass substrate on the pedestal on the chain conveyor of the electrostatic coating apparatus with the long side perpendicular to the conveying direction. While continuously conveying the glass substrate placed on the pedestal by the chain conveyor, pass it under the electrostatic coating gun that sprays the coating liquid, thereby coating the coating liquid on the glass substrate. In this embodiment, the number of passes is 1 time. It should be noted that the coating surface is the B surface of the glass substrate, that is, the surface that contacts the molten tin when manufacturing the glass substrate by the float process. Bake the coated glass substrate in the atmosphere at 300 °C for 60 minutes to form the antiglare layer.

[0281] (Coating conditions)

[0282] Cup rotation speed (rotation speed of the rotary atomizing head): 35 krpm

[0283] Voltage applied to the electrostatic coating gun: 60 kV

[0284] Gun height: 285 mm

[0285] Number of guns: 1

[0286] Liquid volume: 20 g / min

[0287] Shaving air: 175 L / min

[0288] Conveying speed: 2.0 m / min

[0289] The gun height indicates the distance from the lower end of the bell cup of the electrostatic coating gun to the substrate. The lower end of the bell cup is the front end of the rotary atomizing head in the spray direction of the coating composition.

[0290] Through the above process, a transparent substrate with an antiglare layer is manufactured.

[0291] When further forming a printed layer, an antireflection layer (AR layer), and an antifouling layer (AFP layer), the following processes are carried out in sequence.

[0292] 〔3〕Formation of the printed layer

[0293] The printing layer is formed when evaluation is required.

[0294] On the other side of the above-mentioned transparent substrate with an antiglare layer (hereinafter also referred to as the "second main surface"), that is, on the half surface (100 mm in length × 50 mm in width) of the surface where the antiglare layer is not formed, black printing is carried out by screen printing to form a printing layer.

[0295] [4] Cleaning

[0296] The transparent substrate with an antiglare layer is immersed in a cleaning solution prepared by diluting an alkaline cleaning agent (manufactured by PARKER Corporation, PK-LCG213) with pure water for 24 minutes for cleaning. Two levels of concentration, 0.05% by mass or 1.0% by mass, are adopted according to the test strength of the cleaning agent. Which concentration is used in each evaluation is shown in the attached table.

[0297] [5] Formation of an antireflection layer (AR layer)

[0298] The antireflection layer is formed when evaluation is required.

[0299] An antireflection layer is formed by sputtering to deposit a metal oxide layer on the first main surface side of the transparent substrate with an antiglare layer.

[0300] During the film deposition, the conditions are adjusted so that the composition and raw materials of each layer and the thickness of each layer are as shown in Table 5 below in such a way that the metal oxide layer functions as an antireflection layer. Each layer is stacked by a flowing method. During film deposition, for each layer, a mixed gas obtained by mixing 10% by volume of oxygen in argon is introduced into the chamber while sputtering is carried out at a pressure of 0.3 Pa, a frequency of 20 kHz, a film deposition power of 3.8 W / cm 2 , and a reverse pulse width of 5 μsec to stack each layer. The overall thickness of the formed metal oxide layer is 250 nm. It should be noted that the thickness of the metal oxide layer is the result of monitoring using a crystal oscillator during film deposition.

[0301] [Table 5]

[0302] Table 5

[0303] metal material refractive index thickness (nm) the outermost layer silicon oxide low 87 the second layer niobium oxide high 119 the third layer silicon oxide low 38 the fourth layer niobium oxide high 14

[0304] [6] Formation of an antifouling layer (AFP layer)

[0305] An antifouling layer is formed on the first main surface side of the transparent substrate with an antiglare layer by vacuum evaporation. It should be noted that the transparent substrate with an antiglare layer is fixed on a jig, and the carrier substrate fixed by the jig is directly transported to the film deposition chamber for the antifouling layer and used.

[0306] First, as the material for the antifouling layer, the forming material of the fluorine-containing organosilicon compound film is introduced into the heating container in the antifouling layer film-forming chamber. Thereafter, the heating container is degassed for 10 hours or more with a vacuum pump to remove the solvent in the solution, and a composition for forming a fluorine-containing organosilicon compound film (hereinafter referred to as the antifouling layer forming composition) is prepared. As the antifouling layer forming composition, S-550 (manufactured by AGC Inc.) is used.

[0307] Next, the heating container containing the above-mentioned antifouling layer forming composition is heated to 270 °C. After reaching 270 °C, this state is maintained for 10 minutes until the temperature stabilizes. Next, after setting the antiglare layer-containing transparent substrate in the vacuum chamber, the antifouling layer forming composition is supplied to the first main surface from the manifold connected to the heating container containing the above-mentioned antifouling layer forming composition for film formation.

[0308] Film formation is carried out while monitoring the film thickness using a crystal oscillator monitor provided in the vacuum chamber until the thickness of the fluorine-containing organosilicon compound film becomes 4 nm. Next, the antiglare layer-containing transparent substrate taken out from the vacuum chamber is set on a hot plate with the first main surface facing up, and heat treatment is carried out at 150 °C for 60 minutes in the atmosphere.

[0309] The antifouling layer is formed through the above processes. The thickness of the formed antifouling layer is 4 nm.

[0310] Each of the antiglare layer-containing transparent substrates manufactured through the above processes is subjected to the following various tests.

[0311] <Evaluation of the solubility resistance of the antiglare layer>

[0312] For the antiglare layer-containing transparent substrate that has undergone the above-mentioned [2] antiglare layer (AG layer) forming process and the above-mentioned [4] cleaning process, the static contact angle of the first main surface is measured to conduct the solubility resistance test. It should be noted that the antiglare layer is formed using the coating liquids shown in Tables 6 to 7 below.

[0313] Plasma cleaning is performed before the static contact angle measurement. The plasma cleaning is carried out using PS-1200AW manufactured by Wedge at a head-to-glass gap of 5 mm, a scanning speed of 200 mm / sec, and a pitch of 40 mm.

[0314] The measurement of the static contact angle is carried out as follows: Approximately 2 μL of distilled water is left standing at five arbitrary positions on the first main surface, and the water contact angle is measured using a contact angle measuring instrument (manufactured by Kyowa Interface Science Co., Ltd., PCA-11), and the average value is obtained. If the antiglare layer dissolves when using the alkaline cleaning solution used in the cleaning process of step [4], the layer inside, which has a hydrophobic property compared to the surface of the antiglare layer, is exposed, resulting in a decrease in the hydrophilicity of the antiglare layer surface and a decrease in the adhesion between the antiglare layer and the antifouling layer when the antifouling layer is directly provided on the antiglare layer. If the contact angle difference is 12° or less, it is judged that the dissolution resistance is particularly good.

[0315] It should be noted that the cleaning is carried out separately when the concentration of the cleaning solution in the cleaning process [4] is 0.05% by mass and 0.1% by mass.

[0316] The immersion time in the cleaning solution is 24 minutes for both.

[0317] The above evaluation results are shown in Tables 6 to 7 below.

[0318] It should be noted that Examples 3-2 to 3-6, Examples 3-8 to 3-12, Examples 3-14 to 3-18, and Examples 3-20 to 3-24 are examples, and Examples 3-1, 3-7, 3-13, and 3-19 are comparative examples.

[0319] It should be noted that Examples 4-2 to 4-6, Examples 4-8 to 4-12, Examples 4-14 to 4-23, and Examples 4-25 to 4-34 are examples, and Examples 4-1, 4-7, 4-13, and 4-24 are comparative examples.

[0320] [Table 6]

[0321] Table 6

[0322]

[0323] [Table 7]

[0324] Table 7

[0325]

[0326] Based on the above results, it was shown that the antiglare layer formed from the coating liquid of the examples containing the silane agent (B) had a small change in the contact angle before and after cleaning and excellent dissolution resistance. In addition, the contact angle differences of Examples 3-2 to 3-6, Examples 3-8 to 3-12, Examples 4-2 to 4-6, and Examples 4-8 to 4-12 were all within 12°, and the dissolution resistance was particularly good. According to the results of Examples 3-17, 3-18, 3-23, 3-24, Examples 4-16 to 4-23, and Examples 4-27 to 4-34, it was shown that even under severe cleaning conditions, the contact angle difference could be controlled within 12° by adjusting the ratio of the silane agent (B).

[0327] <Chromaticity Evaluation of Transparent Substrate with Anti-Glare Layer>

[0328] For the transparent substrate with an anti-glare layer that has undergone the above-mentioned processes of 〔2〕formation of the anti-glare layer (AG layer), 〔3〕formation of the printing layer, 〔4〕cleaning, 〔5〕formation of the anti-reflection layer (AR layer), and 〔6〕formation of the anti-fouling layer (AFP layer), in the area with the printing layer on the second main surface side, when light from a D65 light source is incident from the first main surface side at an incident angle of 10 degrees, measure L * a * b * the color coordinates a of the reflected color in the colorimetric system * and the color coordinate b * . It should be noted that the anti-glare layer is formed using the coating liquid shown in Table 8 or 9 below. For a pair of samples with a cleaning liquid immersion time of 12 minutes and 24 minutes in the manufacturing process 〔4〕, calculate the absolute value of the difference (|Δa * |) of the color coordinate a and the color coordinate b * in the cases of a cleaning liquid immersion time of 12 minutes and 24 minutes respectively. If the anti-glare layer formed using the alkaline cleaning liquid used in the cleaning dissolves, the film thickness and refractive index of the anti-glare layer change, and the chromaticity when a low-reflection layer is provided on the anti-glare layer changes according to the state of the anti-glare layer. If |Δa * | and |Δb * | are both within 0.3, it is determined that the chromaticity change is extremely small and good. The measurement is performed using a spectrophotometer (Konica Minolta Inc.'s "CM26d"). * | and |Δb * |. The measurement is carried out using a spectrophotometer (manufactured by Konica Minolta Inc., "CM26d").

[0329] It should be noted that the cleaning is performed separately in the case where the concentration of the cleaning liquid in 〔4〕cleaning is 0.05% by mass and 0.1% by mass respectively.

[0330] The immersion time in the cleaning liquid is 24 minutes for both cases.

[0331] The above evaluation results are shown in Tables 8 to 9 below.

[0332] It should be noted that Examples 5-2 to 5-6, Examples 5-8 to 5-12, Examples 5-14 to 5-18, and Examples 5-20 to 5-24 are examples, and Examples 5-1, 5-7, 5-13, and 5-19 are comparative examples.

[0333] It should be noted that Examples 6-2 to 6-6, Examples 6-8 to 6-12, Examples 6-14 to 6-23, and Examples 6-25 to 6-34 are examples, and Examples 6-1, 6-7, 6-13, and 6-24 are comparative examples.

[0334] [Table 8]

[0335] Table 8

[0336]

[0337] [Table 9]

[0338] Table 9

[0339]

[0340] Based on the above results, it was shown that the chromaticity change of the antiglare layer formed from the coating liquid of the example containing the silane agent (B) was small and the dissolution resistance was excellent. In addition, |Δa*| and |Δb*| in Examples 5-2 to 5-6, Examples 5-8 to 5-12, Examples 6-2 to 6-6, and Examples 6-8 to 6-12 were each within 0.3, and the dissolution resistance was particularly good. According to the results of Examples 5-16 to 5-18, Examples 5-22 to 5-24, Examples 6-16 to 6-23, and Examples 6-27 to 6-34, it was shown that even under severe cleaning conditions, by adjusting the ratio of the silane agent (B), |Δa*| and |Δb*| could be controlled within 0.3 respectively.

[0341] <Pencil Hardness Evaluation of Transparent Substrate with Antiglare Layer>

[0342] For the transparent substrate with an antiglare layer that has undergone the above steps of 〔2〕formation of the antiglare layer (AG layer), 〔3〕formation of the printing layer, 〔4〕cleaning, 〔5〕formation of the antireflection layer (AR layer), and 〔6〕formation of the antifouling layer (AFP layer), the pencil hardness of the outermost surface on the first main surface side, that is, the surface of the antifouling layer, was measured. The antiglare layer was formed using the coating liquid shown in Table 10 below. It should be noted that the measurement was carried out based on the pencil hardness test specified in JIS K5600 (1999). When the probability of passing the test 100 times was 75% or more, it was judged as a good result.

[0343] It should be noted that the concentration of the cleaning liquid in 〔4〕cleaning was 0.05% by mass, and the immersion time in the cleaning liquid was 24 minutes.

[0344] The above evaluation results are shown in Table 10 below.

[0345] It should be noted that Examples 7-1 to 7-8 are examples.

[0346] [Table 10]

[0347] Table 10

[0348]

[0349] Based on the above results, it was shown that the pencil hardness of the antiglare layer formed from the coating liquid containing the silane agent (C) increased and the durability was excellent.

[0350] <Arithmetic mean roughness Ra of the transparent substrate with an antiglare layer>

[0351] For the transparent substrate with an antiglare layer that has undergone the above-mentioned [2] antiglare layer (AG layer) formation process and the above-mentioned [4] cleaning process, measure the arithmetic mean roughness Ra of the outermost surface on the first main surface side, that is, the surface of the antiglare layer. The measurement is carried out using SURFCOM1500SD3-12 manufactured by Tokyo Seimitsu Co., Ltd. according to the method specified in JIS B0601-2001. It should be noted that the antiglare layer is formed using the coating liquid shown in Table 11 below.

[0352] Show the above evaluation results in Table 11 below.

[0353] It should be noted that Examples 8-2 to 8-6, Examples 8-8 to 8-12, Examples 8-14 to 8-23, and Examples 8-25 to 8-36 are examples, and Examples 8-1, 8-7, 8-13, and 8-24 are comparative examples.

[0354] <60° specular gloss (Gloss) of the transparent substrate with an antiglare layer>

[0355] For the transparent substrate with an antiglare layer that has undergone the above-mentioned [2] antiglare layer (AG layer) formation process and the above-mentioned [4] cleaning process, measure the 60° specular gloss (Gloss) of the outermost surface on the first main surface side, that is, the surface of the antiglare layer. The measurement is carried out using a gloss meter (GM-268A) manufactured by Konica Minolta. It should be noted that the antiglare layer is formed using the coating liquid shown in Table 11 below.

[0356] Show the above evaluation results in Table 11 below.

[0357] It should be noted that Examples 8-2 to 8-6, Examples 8-8 to 8-12, Examples 8-14 to 8-23, and Examples 8-25 to 8-36 are examples, and Examples 8-1, 8-7, 8-13, and 8-24 are comparative examples.

[0358] [Table 11]

[0359] Table 11

[0360]

[0361] Based on the above results, it is shown that the arithmetic mean roughness Ra of the outermost surface of the anti-glare layer-containing transparent substrate formed from the coating liquid of the example containing the silane agent (B) is 0.02 μm to 0.1 μm, and the haze is not too high, and an anti-glare layer-containing transparent substrate with excellent anti-glare properties and low haze can be obtained. In addition, it is shown that there is a tendency for the 60° specular glossiness to decrease in the anti-glare layer-containing transparent substrate formed from the coating liquid of the example containing the silane agent (B) compared to the anti-glare layer-containing transparent substrate formed from the coating liquid of the comparative example not containing the silane agent (B). Therefore, an anti-glare layer-containing transparent substrate with excellent anti-glare function can be obtained.

[0362] The present invention has been described in detail with reference to specific embodiments, but those skilled in the art will clearly understand that various changes and modifications can be made without departing from the spirit and scope of the present invention.

[0363] This application is based on Japanese Patent Application No. 2023-195974 filed on November 17, 2023, the content of which is incorporated herein by reference.

Claims

1. A transparent substrate with an anti-glare layer, comprising: a transparent substrate, and an anti-glare layer provided on one main surface of the transparent substrate, The anti-glare layer is composed of a cured product of an anti-glare layer composition, wherein the anti-glare layer composition includes a disilane agent B, wherein the disilane agent B includes one or more selected from a disilane compound, a hydrolyzate thereof, and a polymer thereof, wherein the disilane compound is formed by connecting two Si atoms to which three substituents selected from a reactive group and a hydroxyl group are directly bonded through a methylene group or an ethylene group. The disilane agent B satisfies the following conditions (Bi) and (Bii), (Bi): When the disilane agent B comprises one or more selected from disilane compounds connected via methylene groups, hydrolyzates thereof, and polymers thereof, {The number of Si atoms derived from the disilane agent B} / {The total number of at least one type of atoms selected from Si, Al and Zr in the anti-glare layer}>0, (Bii): When the disilane agent B comprises one or more selected from a disilane compound connected by ethylene, a hydrolyzate thereof and a polymer thereof, {The number of Si atoms derived from the disilane agent B} / {the total number of atoms of at least one selected from Si, Al and Zr in the antiglare layer}≥0.

10.

2. The transparent substrate with an anti-glare layer according to claim 1, wherein The anti-glare layer composition comprises at least one of the following monosilane agent A and the following monosilane agent C, Monosilane agent A: comprising at least one silane agent selected from monosilane compounds, hydrolyzates thereof and polymers thereof, wherein the monosilane compound is formed by directly bonding four substituents selected from reactive groups and hydroxyl groups to Si atoms, Monosilane agent C: a silane agent comprising at least one selected from a monosilane compound, a hydrolyzate thereof, and a polymer thereof, wherein the monosilane compound has three substituents selected from a reactive group and a hydroxyl group and a methyl group directly bonded to a Si atom.

3. A transparent substrate with an anti-glare layer, comprising: a transparent substrate, and an anti-glare layer provided on one main surface of the transparent substrate, The anti-glare layer is composed of a cured product of an anti-glare layer composition, wherein the anti-glare layer composition comprises a polycondensate of a disilane agent B and at least one of the following monosilane agent A and the following monosilane agent C, wherein the disilane agent B comprises one or more selected from a disilane compound, a hydrolyzate thereof, and a polymer thereof, wherein the disilane compound is formed by connecting two Si atoms to which three substituents selected from a reactive group and a hydroxyl group are directly bonded through a methylene group or an ethylene group, The disilane agent B satisfies the following conditions (Bi) and (Bii), Monosilane agent A: comprising at least one silane agent selected from monosilane compounds, hydrolyzates thereof and polymers thereof, wherein the monosilane compound is formed by directly bonding four substituents selected from reactive groups and hydroxyl groups to Si atoms, Monosilane agent C: comprising at least one silane agent selected from monosilane compounds, hydrolyzates thereof and polymers thereof, wherein the monosilane compound is formed by directly bonding three substituents selected from reactive groups and hydroxyl groups and a methyl group to Si atoms, (Bi): When the disilane agent B comprises one or more selected from disilane compounds connected via methylene groups, hydrolyzates thereof, and polymers thereof, {The number of Si atoms derived from the disilane agent B} / {The total number of at least one type of atoms selected from Si, Al and Zr in the anti-glare layer}>0, (Bii) when the disilane agent B comprises one or more selected from a disilane compound connected via ethylene, a hydrolyzate thereof, and a polymer thereof, {The number of Si atoms derived from the disilane agent B} / {the total number of atoms of at least one selected from Si, Al and Zr in the antiglare layer}≥0.

10.

4. The transparent substrate with an anti-glare layer according to claim 2 or 3, wherein: The monosilane agent C satisfies the following condition (Ci), (Ci): {the number of Si atoms derived from the monosilane agent C} / {the total number of at least one type of atoms selected from Si, Al and Zr in the antiglare layer}=0.02 to 0.

2.

5. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein In the condition (Bi), the following conditions are satisfied: {The number of Si atoms derived from the disilane agent B} / {the total number of atoms of at least one selected from Si, Al and Zr in the antiglare layer}≥0.

03.

6. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: In the condition (Bii), the following conditions are satisfied: {The number of Si atoms derived from the disilane agent B} / {the total number of atoms of at least one selected from Si, Al and Zr in the antiglare layer}≥0.

50.

7. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: The composition for an anti-glare layer further comprises at least one metal oxide particle selected from silicon oxide, aluminum oxide, and zirconium oxide.

8. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: The arithmetic mean roughness Ra of the outermost surface on the main surface side having the antiglare layer is 0.02 μm or more.

9. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: The 60° specular glossiness of the outermost surface on the main surface side having the antiglare layer is 130% or less.

10. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein The metal oxide particles include flaky silicon oxide particles.

11. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: The reactive group is selected from alkoxy, isocyanate, silazane, halogen and carboxyl groups.

12. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: An antifouling layer is provided on the surface of the antiglare layer.

13. The transparent substrate with an anti-glare layer according to claim 1 or 3, wherein: An antireflection layer and an antifouling layer are sequentially provided on the surface of the antiglare layer.

14. The transparent substrate with an anti-glare layer according to claim 13, wherein: The antireflection layer is a laminated film of layers having different refractive indices.

15. A composition for an anti-glare layer, comprising a disilane agent B, wherein the disilane agent B comprises one or more selected from a disilane compound, a hydrolyzate thereof, and a polymer thereof, wherein the disilane compound is formed by two Si atoms directly bonded to three substituents selected from a reactive group and a hydroxyl group, respectively, and connected via a methylene group or an ethylene group, The disilane agent B satisfies the following conditions (Bi) and (Bii), (Bi): When the disilane agent B comprises one or more selected from disilane compounds connected via methylene groups, hydrolyzates thereof, and polymers thereof, {The number of Si atoms derived from the disilane agent B} / {The total number of at least one type of atoms selected from Si, Al and Zr in the composition for an anti-glare layer}>0, (Bii): When the disilane agent B comprises one or more selected from a disilane compound connected by ethylene, a hydrolyzate thereof and a polymer thereof, {The number of Si atoms derived from the disilane agent B} / {the total number of atoms of at least one selected from Si, Al and Zr in the composition for an antiglare layer}≥0.10.

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