Anti-corrosion thin film structure and manufacturing method thereof

Abstract

The invention provides an anti-corrosion film structure and a manufacturing method thereof. The anti-corrosion film structure comprises a base material, a surface tension changing layer and an anti-corrosion layer. The base material comprises stainless steel. The surface tension changing layer is formed on the surface of the substrate by atmospheric plasma or an irradiation UV lamp. The anti-corrosion layer is arranged on the surface tension changing layer, and the material of the anti-corrosion layer comprises polytetrafluoroethylene (PTFE).

Description

Technical Field

[0001] The invention relates to a film structure and a manufacturing method thereof, and to an anti-corrosion film structure and a manufacturing method thereof. Background Art

[0002] Hydrogen can be used in various forms with cylinders and fuel pipelines, making hydrogen a rapid replenishment with a wide range of uses. However, the pipes or valves used in the hydrogen transportation process or the welds in the pipelines and components may produce acidic and alkaline environments due to different environments such as magnesium chloride in the sea, sulfur in acid rain, and carbonates in the soil, which accelerates the corrosion of the transportation pipes and equipment, thus causing damage to the pipeline components.

[0003] The weld of pipe fittings is corroded by salt spray. Defects on the surface of welds (such as nicks, dents, and roughness) will accelerate the corrosion rate of welds. In addition, the excessive oxide layer is produced by thermal processing at the welding point, and salt spray will accelerate oxidation and cause corrosion. Therefore, using coating and hydrophobic methods to block water vapor and oxygen is an improvement method that can be tried.

[0004] Existing methods for manufacturing anti-corrosion hydrophobic films include using chemical etching (such as hydrochloric acid) to form surface nanostructures, but this method may cause pollution and has the disadvantage of being environmentally unfriendly. In addition, electrochemical methods can also be used to form nanostructures, but there are also pollution problems. As for the production of nanostructures by yellow light lithography, it has the disadvantages of complicated processes and high costs.

[0005] Based on the above, developing an anti-corrosion film structure and a manufacturing method thereof to improve the pollution, environmental protection process and high cost problems of the existing anti-corrosion hydrophobic film is an important research topic currently required. Summary of the invention

[0006] The present invention provides an anti-corrosion film structure and a manufacturing method thereof, which utilizes atmospheric plasma and sputtered polytetrafluoroethylene materials, thereby having super hydrophobic anti-corrosion properties and can be applied to stainless steel easily corroded parts (such as welds). The present invention mainly uses atmospheric plasma or UV lamp to treat the surface of a substrate with different surface tensions and then coats the substrate, so as to be applied in the technical field of stainless steel anti-corrosion.

[0007] The anti-corrosion film structure of the present invention comprises a substrate, a surface tension changing layer and an anti-corrosion layer. The material of the substrate comprises stainless steel. The surface tension changing layer is formed on the surface of the substrate by atmospheric plasma or irradiation with UV lamp. The anti-corrosion layer is arranged on the surface tension changing layer, and the material of the anti-corrosion layer comprises polytetrafluoroethylene (PTFE).

[0008] In one embodiment of the present invention, the water contact angle of the surface tension changing layer is no greater than 20 degrees.

[0009] In one embodiment of the present invention, the thickness of the anti-corrosion layer is 100 nm to 300 nm.

[0010] In one embodiment of the present invention, the substrate is used for a pipe for hydrogen energy.

[0011] The manufacturing method of the anti-corrosion film structure of the present invention comprises the following steps. A substrate is provided, and the material of the substrate comprises stainless steel. Then, a surface tension changing layer is formed on the surface of the substrate by atmospheric plasma or irradiation with UV lamp, and the surface tension changing layer is in contact with the substrate. Next, an anti-corrosion layer is formed on the surface tension changing layer by physical vapor deposition method, and the material of the anti-corrosion layer comprises polytetrafluoroethylene (PTFE).

[0012] In one embodiment of the present invention, the water contact angle of the surface tension changing layer is no greater than 20 degrees.

[0013] In one embodiment of the present invention, the physical vapor deposition method includes a sputtering method.

[0014] In one embodiment of the present invention, the parameters of the sputtering equipment used in the physical vapor deposition method are controlled as follows: the chamber temperature is 25°C to 200°C, the gas flow rate is 10sccm to 50sccm for argon, 10sccm to 100sccm for oxygen, and the process pressure is 2.0E-2Torr to 1.0E-6Torr.

[0015] In one embodiment of the present invention, the substrate is used for a pipe for hydrogen energy.

[0016] Based on the above, the present invention provides an anti-corrosion film structure and a manufacturing method thereof, which utilizes atmospheric plasma and UV light to change the hydrophilicity and hydrophobicity of the substrate to form a surface tension change layer, so as to form a difference in surface tension, thereby increasing the rough water contact angle of the subsequent coating. The anti-corrosion layer is disposed on the surface tension change layer, and has hydrophobic and anti-corrosion properties. The anti-corrosion layer utilizes its properties to coat the stainless steel substrate to achieve the effect of isolating water vapor and anti-corrosion, and has the advantages of simple process, environmental protection and no pollution. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a flow chart of the steps for making an anti-corrosion thin film structure according to one embodiment of the present invention;

[0018] FIG. 2A to FIG. 2C It is a cross-sectional schematic diagram of an anti-corrosion film structure according to an embodiment of the present invention. DETAILED DESCRIPTION

[0019] Hereinafter, embodiments of the present invention will be described in detail. However, these embodiments are illustrative, and the present disclosure is not limited thereto.

[0020] In this article, the range expressed by "a value to another value" is a summary expression method to avoid listing all the values ​​in the range one by one in the specification. Therefore, the description of a specific numerical range covers any value in the numerical range and a smaller numerical range defined by any value in the numerical range, just as the arbitrary value and the smaller numerical range are written in the description text of the specification.

[0021] Figure 1 The present invention is a flowchart of the steps for manufacturing an anti-corrosion film structure according to an embodiment of the present invention. FIG. 2A to FIG. 2C It is a cross-sectional schematic diagram of an anti-corrosion film structure according to an embodiment of the present invention.

[0022] First, please refer to Figure 1 as well as Figure 2A , perform step S10, provide a substrate 101, the material of the substrate 101 includes stainless steel, and the substrate 101 can mainly be used for hydrogen energy pipes.

[0023] Afterwards, please refer to Figure 1 as well as Figure 2B , proceed to step S20, forming a surface tension changing layer 110 on the surface of the substrate 101 by atmospheric plasma or UV lamp irradiation. The surface tension of the surface tension changing layer 110 is extremely low, and the water contact angle of the surface tension changing layer 110 is not greater than 20 degrees. Specifically, atmospheric plasma or UV lamp irradiation can form a hydrophilic structure with low surface tension (surface tension changing layer 110) on the surface of the substrate 101 to improve the adhesion of subsequent coatings and make all gaps more conducive to coating. If different degrees of atmospheric plasma or UV lamp treatment are performed, for example, atmospheric plasma 600W is used at a distance of 15 cm from the object to be tested, the treatment time is 20 seconds, or the UV lamp intensity is 70μW / cm 2 At a distance of 10 cm from the object to be tested and a treatment time of 1 minute, the surface tension can be differentiated, and the water contact angle analysis data can be reduced from an angle of 80 degrees to below 20 degrees, which is extremely hydrophilic. Water droplets cannot form on the surface of the substrate 101 at all. The atmospheric plasma power can improve the rough water contact angle of the subsequent coating. It can be understood that the atmospheric plasma or UV lamp irradiation mainly removes the carbon-hydrogen bonds on the surface of the substrate 101 to reduce the surface tension. It must be noted that in Figure 2B In the figure, the thickness of the surface tension changing layer 110 is exaggerated for the sake of clarity. In actual operation, the atmospheric plasma or UV lamp irradiation mainly removes the carbon-hydrogen bonds on the surface of the substrate 101 to reduce the surface tension of the substrate 101 and form the surface tension changing layer 110 on the surface of the substrate 101, rather than forming an additional new film. That is, the substrate 101 and the surface tension changing layer 110 can be regarded as a processed integral substrate rather than two independent and separate components.

[0024] Next, please refer to Figure 1 as well as Figure 2C , step S30 is performed to form an anti-corrosion layer 120 on the surface tension change layer 110 by a physical vapor deposition method. The anti-corrosion layer 120 provides anti-corrosion properties to protect the substrate 101 and has hydrophobic properties (the water contact angle may be, for example, not less than 110 degrees). The material of the anti-corrosion layer 120 may include polytetrafluoroethylene (PTFE), and the thickness is, for example, 100nm to 300nm. In this embodiment, the physical vapor deposition method includes, for example, a sputtering method. In the sputtering equipment used in the physical vapor deposition method, the parameter control is, for example: the chamber temperature is, for example, 25°C to 200°C, the gas flow rate is, for example, argon 10sccm to 50sccm, oxygen 10sccm to 100sccm, and the process pressure is, for example, 2.0E-2Torr to 1.0E-6Torr. The anti-corrosion layer 120 is dense and non-porous, which can effectively reduce the possibility of the substrate 101 being contacted by water and gas.

[0025] In this way, the anti-corrosion film structure of the present invention can be completed. Figure 2C The anti-corrosion film structure of the present invention includes a substrate 101, a surface tension changing layer 110 and an anti-corrosion layer 120. The surface tension changing layer 110 is formed on the surface of the substrate 101. The anti-corrosion layer 120 is disposed on the surface tension changing layer 110, provides anti-corrosion properties to protect the substrate 101, and has hydrophobic properties, which can effectively reduce the possibility of the substrate 101 being contacted by water and gas.

[0026] In summary, the present invention provides an anti-corrosion film structure and a method for manufacturing the same, which utilizes atmospheric plasma and UV light to change the hydrophilicity and hydrophobicity of the substrate to form a surface tension change layer, so that the surface tension forms a difference, thereby increasing the rough water contact angle of the subsequent coating. The anti-corrosion layer is disposed on the surface tension change layer, and has hydrophobic and anti-corrosion properties. Its properties are utilized to coat the stainless steel substrate, and it can be applied to the easily corroded parts of stainless steel pipes in the hydrogen energy industry (such as welds) to achieve the effect of isolating water vapor and anti-corrosion, and delay the aging of parts, and it has the advantages of simple and stable process, environmental protection and pollution-free, so as to improve the existing anti-corrosion hydrophobic film pollution, cumbersome environmental protection process and high cost.

Claims

1. A corrosion-resistant film structure, It is characterized in that include: A substrate, wherein the material of the substrate comprises stainless steel; A surface tension changing layer is formed on the surface of the substrate by atmospheric plasma or irradiation with UV lamp; as well as The anti-corrosion layer is arranged on the surface tension changing layer, and the material of the anti-corrosion layer includes polytetrafluoroethylene.

2. The anti-corrosion film structure according to claim 1, It is characterized in that The water contact angle of the surface tension changing layer is not greater than 20 degrees.

3. The anti-corrosion film structure according to claim 1, It is characterized in that The thickness of the anti-corrosion layer is 100 nm to 300 nm.

4. The anti-corrosion film structure according to claim 1, It is characterized in that The substrate is used for pipes for hydrogen energy.

5. A method for manufacturing an anti-corrosion film structure, It is characterized in that include: Providing a substrate, wherein the material of the substrate comprises stainless steel; Forming a surface tension changing layer on the surface of the substrate by atmospheric plasma or irradiation with UV lamp; as well as An anti-corrosion layer is formed on the surface tension changing layer by a physical vapor deposition method, wherein the material of the anti-corrosion layer includes polytetrafluoroethylene.

6. The method for manufacturing the anti-corrosion thin film structure according to claim 5, It is characterized in that The water contact angle of the surface tension changing layer is not greater than 20 degrees.

7. The method for manufacturing the anti-corrosion thin film structure according to claim 5, It is characterized in that The physical vapor deposition method includes a sputtering method.

8. The method for manufacturing the anti-corrosion thin film structure according to claim 7, It is characterized in that In the sputtering equipment used in the physical vapor deposition method, the parameters are controlled as follows: the chamber temperature is 25°C to 200°C, the gas flow rate is 10sccm to 50sccm for argon, 10sccm to 100sccm for oxygen, and the process pressure is 2.0E-2Torr to 1.0E-6Torr.

9. The method for manufacturing the anti-corrosion thin film structure according to claim 7, It is characterized in that The substrate is used for pipes for hydrogen energy.

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