Device and method for improving utilization rate of target material for magnetron sputtering coating

Abstract

The invention relates to the technical field of magnetron sputtering equipment, in particular to a device and method for improving the utilization rate of a target material for magnetron sputtering coating. A stainless steel sheet is arranged between the inner wall of a vacuum chamber and a cathode target material, and the shape and the size of the stainless steel sheet can be designed according to the actual equipment structure and the magnetic field distribution condition; during assembly, stainless steel sheets are assembled on the two bottom supporting seats in advance, and when the bottom supporting seat on one side is installed, the lengths of the two transverse telescopic rods and the lengths of the two vertical telescopic rods are synchronously adjusted by connecting the two transverse telescopic rods in a back-to-back mode and clamping the bottom ends of the two vertical telescopic rods into the bottom grooves, so that the electric field distribution around the target material is adjusted. And when the L-shaped supporting rod on one side far away from the sliding seat is taken down and the bottom supporting seat on the other side is mounted, the taken-down L-shaped supporting rod is inserted into the bottom groove, close to the sliding seat, of the bottom supporting seat on the side, so that the stainless steel sheets on the two sides are accurately and symmetrically arranged, the cathode target materials on the two sides are uniformly sputtered, and the overall utilization rate of the target materials is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of magnetron sputtering equipment, and in particular to a device and method for improving target material utilization rate in magnetron sputtering coating. Background Art

[0002] Magnetron sputtering coating technology is one of the important industrial large-area vacuum coating technologies at present, with the advantages of high speed, low temperature, and low damage. In the process of heterojunction magnetron sputtering coating, the utilization rate of the target material has always been a key issue. In traditional technology, due to factors such as uneven magnetic field distribution and the distance between the target material and the workpiece, the utilization rate of the target material is low, which increases production costs and waste of resources. For example, during the use of common cylindrical targets, due to the unevenness of the sputtering area, the utilization rate of the edge of the target material is low, and even local over-etching occurs. In current technologies, such as a magnetron sputtering source device for improving target utilization disclosed in Chinese patent document CN215713336U, a target material for improving target utilization of magnetron sputtering coating disclosed in CN203947153U, and the actual conventional means, the target utilization is improved mainly by optimizing the magnetic field distribution, changing the shape of the target (such as dog-bone target), etc., but the basic requirement of 80% target utilization has not been reached, and they are all between 73-76% or lower, and there is still room for improvement. Therefore, how to further improve the target utilization is one of the difficult problems that heterojunction magnetron sputtering equipment still urgently needs to be tackled. Summary of the invention

[0003] In view of this, the purpose of the present invention is to propose a device and method for improving target material utilization in magnetron sputtering coating, so as to solve the problem that the target material utilization in the existing heterojunction magnetron sputtering coating still needs to be further improved.

[0004] Based on the above purpose, the present invention provides a device for improving the utilization rate of target materials in magnetron sputtering coating, which is arranged in a vacuum chamber of a magnetron sputtering device: A cathode target is arranged in parallel along the length direction of the vacuum chamber. The cathode target is designed in a cylindrical shape. The cathode target is symmetrically arranged on both sides along the width direction of the vacuum chamber. An auxiliary anode is arranged in parallel between the cathode targets on both sides. A stainless steel sheet is provided between the inner wall of the vacuum chamber along the length direction and the cathode target material, and a bottom support seat is detachably connected to the bottom end of the stainless steel sheet, and the bottom support seat is detachably connected to the bottom end of the vacuum chamber; The top of the bottom support seat is slidably connected with a slide seat along its width direction, the top of the slide seat is vertically slidably connected with a clamping seat for fixing and placing the stainless steel sheet, the top of the bottom support seat is provided with two bottom grooves spaced apart along its width direction, and a side groove is provided on one side of the clamping seat; It also includes two L-shaped support rods, which include a vertical telescopic rod and a horizontal telescopic rod fixed to the top of the vertical telescopic rod. When the bottom support seat on one side is installed, the two horizontal telescopic rods are connected back to back, and the bottom ends of the two vertical telescopic rods are inserted into the bottom groove, and the end of one of the horizontal telescopic rods is inserted into the side groove, which is used to synchronously adjust the lengths of the two horizontal telescopic rods and the vertical telescopic rods. The L-shaped support rod on the side away from the slide is removed and inserted into the bottom groove on the bottom support seat on the other side close to the slide.

[0005] Preferably, the stainless steel sheet is arranged parallel to the length direction of the cathode target.

[0006] Preferably, a chamber protection plate is attached to an inner wall of one side of the vacuum chamber along its length direction, and magnetic fluid protection covers are provided at the four corners of the vacuum chamber.

[0007] Preferably, the transverse telescopic rod includes a transverse fixed section fixed to the top end of the vertical telescopic rod and a transverse movable section threadedly connected to one end of the transverse fixed section. A groove is provided on the end of the transverse fixed section away from the transverse movable section. A rotating rod is rotatably connected in the groove. The inner end of the rotating rod passes through the transverse movable section to drive the transverse movable section to rotate axially. A sleeve is connected to the outer end of the rotating rod on one of the L-shaped support rods. When the two transverse telescopic rods are connected back to back, the sleeve is sleeved on the outer end of the rotating rod to drive the rotating rods on both sides to rotate synchronously.

[0008] Preferably, the vertical telescopic rod includes a vertical movable section fixed to the bottom end of the horizontal fixed section and a vertical fixed section sleeved on the bottom end of the vertical movable section. The side end of the vertical fixed section on the same side as the groove is connected to a vertical rod bolt for locking the telescopic length of the vertical telescopic rod.

[0009] Preferably, a cross bar bolt is connected to the top end of the groove, and the bottom end of the cross bar bolt extends into the groove to abut against one side of the rotating rod.

[0010] Preferably, a clamping block is connected to the bottom end of the vertical telescopic rod, and the clamping block is designed to be a polygonal shape matching the bottom groove.

[0011] Preferably, an extension groove is provided at the top of the bottom support seat in parallel along its width direction, the extension groove is located at the bottom groove near one side of the slide seat, and one end of the extension groove away from the slide seat is connected to the bottom groove.

[0012] The present invention also provides a method for improving target material utilization rate in magnetron sputtering coating, comprising the following steps: A stainless steel sheet is provided between the inner wall of the vacuum chamber along the length direction and the cathode target material to adjust the electric field distribution around the target material; During assembly, first install the stainless steel sheets on the two bottom support seats in advance, and then fix the bottom support seats at the bottom end of the vacuum chamber. When installing the bottom support seat on one side, the two horizontal telescopic rods are connected back to back, and the bottom ends of the two vertical telescopic rods are inserted into the bottom groove, and the end of one of the horizontal telescopic rods is inserted into the side groove. At this time, the lengths of the two horizontal telescopic rods and the vertical telescopic rods are synchronously adjusted until the stainless steel sheet on this side is adjusted to a suitable position, and then the L-shaped support rod on the side away from the slide is removed. When installing the bottom support seat on the other side, the removed L-shaped support rod is directly inserted into the bottom groove of the bottom support seat on this side close to the slide seat, so that the end of the horizontal telescopic rod is inserted into the side groove, completing the accurate and symmetrical arrangement of the stainless steel sheets on both sides, ensuring that the same electric field optimization adjustment is achieved for the cathode targets on both sides.

[0013] Preferably, an extension groove is provided at the top of the bottom support seat in parallel along its width direction, the extension groove is located at the bottom groove close to one side of the slide seat, and the end of the extension groove away from the slide seat is connected to the bottom groove. When removing one of the L-shaped support rods on the outside of the connected L-shaped support rods, the L-shaped support rod on the inside is pushed to make the bottom end of the vertical telescopic rod slide into the extension groove until the relative transverse telescopic rods are separated, and then the outer L-shaped support rod is taken out.

[0014] The beneficial effects of the present invention are as follows: cathode targets are symmetrically arranged on both sides along the width direction of the vacuum chamber, auxiliary anodes are arranged in parallel between the cathode targets on both sides, stainless steel sheets are arranged between the inner wall of the vacuum chamber along its length direction and the cathode targets, and the shape and size of the stainless steel sheets can be designed according to the actual equipment structure and magnetic field distribution, and are used to adjust the electric field distribution around the targets. When assembling, the stainless steel sheets are first assembled on the two bottom support seats in advance, and then the bottom support seats are fixedly installed at the bottom end of the vacuum chamber. When installing the bottom support seat on one side, two horizontal telescopic rods are connected back to back, and the bottom ends of the two vertical telescopic rods are clamped. Insert it into the bottom groove, and insert the end of one of the horizontal telescopic rods into the side groove. At this time, adjust the lengths of the two horizontal telescopic rods and the vertical telescopic rod synchronously until the stainless steel sheet on that side is adjusted to a suitable position, and then remove the L-shaped support rod on the side away from the slide. When installing the bottom support seat on the other side, directly insert the removed L-shaped support rod into the bottom groove of the bottom support seat on that side close to the slide seat, so that the end of the horizontal telescopic rod is inserted into the side groove, completing the accurate and symmetrical arrangement of the stainless steel sheets on both sides, ensuring the same electric field optimization adjustment for the cathode targets on both sides, so that the cathode targets on both sides achieve the same uniform sputtering, thereby improving the overall utilization rate of the targets. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings in the following description are only for the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0016] Figure 1 It is a schematic diagram of the overall top view structure of the vacuum chamber of the present invention; Figure 2 It is a top view structural schematic diagram of the bottom support seat with stainless steel sheet assembled in the present invention; Figure 3 It is a schematic diagram of the top view of the bottom groove and the extension groove of the present invention; Figure 4 It is a schematic diagram of a top view of the structure of two L-shaped support rods of the present invention being relatively connected and inserted into the bottom groove; Figure 5 It is a side view structural schematic diagram of two L-shaped support rods of the present invention being relatively connected and inserted into the bottom groove; Figure 6 It is a side view structural schematic diagram of the present invention when the relative rotating rod and sleeve are separated; Figure 7 It is a schematic diagram of the top view of the structure after the L-shaped support rod away from the side of the slide seat is removed in the present invention; Figure 8 It is a schematic diagram of the side view structure after the L-shaped support rod away from the side of the slide seat is removed in the present invention; Fig. 9 It is a top view of the structure when the L-shaped support rod removed in the present invention is inserted into the bottom support seat on the other side; Fig.10 It is a schematic diagram of the top view structure of the cathode target material and the auxiliary anode of the present invention; Fig.11 It is a trend diagram of the coating thickness when there is no stainless steel sheet in the present invention; Fig.12 It is a trend diagram of the coating thickness when a stainless steel sheet is installed in the present invention.

[0017] The markings in the figure are: 1. Vacuum chamber; 2. Cathode target; 3. Auxiliary anode; 4. Stainless steel sheet; 5. Bottom support seat; 51. Bottom groove; 52. Extension groove; 6. Slide seat; 61. Guide column; 7. Clamp seat; 71. Side groove; 8. L-shaped support rod; 81. Vertical telescopic rod; 811. Vertical fixed section; 812. Vertical movable section; 82. Horizontal telescopic rod; 820. Groove; 821. Horizontal fixed section; 822. Horizontal movable section; 9. Slide slot; 10. Chamber protection plate; 11. Magnetic fluid protection cover; 12. Rotating rod; 13. Sleeve; 14. Vertical rod bolt; 15. Horizontal rod bolt; 16. Block. DETAILED DESCRIPTION

[0018] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments.

[0019] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the present invention should be understood by people with ordinary skills in the field to which the present invention belongs. The "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0020] A device for improving target utilization rate in magnetron sputtering coating is arranged in a vacuum chamber 1 of a magnetron sputtering device, a cathode target 2 is arranged in parallel along the length direction of the vacuum chamber 1, the cathode target 2 is designed in a cylindrical shape, the cathode target 2 is symmetrically arranged on both sides along the width direction of the vacuum chamber 1, an auxiliary anode 3 is arranged in parallel between the cathode targets 2 on both sides, a stainless steel sheet 4 is arranged between the inner wall of the vacuum chamber 1 and the cathode target 2 along the length direction, the bottom end of the stainless steel sheet 4 is detachably connected to a bottom support seat 5, the bottom support seat 5 is detachably connected to the bottom end of the vacuum chamber 1, the top end of the bottom support seat 5 is slidably connected to a slide seat 6 along the width direction, and the top end of the slide seat 6 is vertically slidably connected to a fixed placement The base 7 of the stainless steel sheet 4 has two bottom grooves 51 spaced apart at the top of the bottom support base 5 along its width direction, and a side groove 71 is provided on one side of the base 7. It also includes two L-shaped support rods 8, and the L-shaped support rod 8 includes a vertical telescopic rod 81 and a horizontal telescopic rod 82 fixed to the top of the vertical telescopic rod 81. When the bottom support base 5 on one side is installed, the two horizontal telescopic rods 82 are connected back to back, and the bottom ends of the two vertical telescopic rods 81 are inserted into the bottom groove 51, and the end of one of the horizontal telescopic rods 82 is inserted into the side groove 71, which is used to synchronously adjust the lengths of the two horizontal telescopic rods 82 and the vertical telescopic rod 81, and the L-shaped support rod 8 on the side away from the slide is removed to be inserted into the bottom groove 51 on the bottom support base 5 on the other side close to the slide 6.

[0021] like Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5As shown, the present invention is based on the existing conventional magnetron sputtering coating equipment, including a vacuum chamber 1, a cathode target 2 is arranged in parallel along the length direction of the vacuum chamber 1, the cathode target 2 can be fixed in the vacuum chamber 1 by bolts, the cathode target 2 adopts the existing conventional cylindrical shape design, the cathode target 2 is symmetrically arranged on both sides along the width direction of the vacuum chamber 1, and an auxiliary anode 3 is arranged in parallel between the cathode targets 2 on both sides, and the auxiliary anode 3 can be fixed in the vacuum chamber 1 by bolts. The function of the auxiliary anode 3 is to eliminate the excess electrons generated during the sputtering process to avoid the high temperature generated during the strong collision of the excess electrons and damage to the film layer. A stainless steel sheet 4 is arranged between the inner wall of the vacuum chamber 1 and the cathode target 2 along the length direction, wherein the stainless steel sheet 4 is optionally arranged in parallel to the length direction of the cathode target 2. Specifically, it can be designed into a rectangular thin sheet shape. The shape and size of the stainless steel sheet 4 can also be designed according to the actual equipment structure and magnetic field distribution to ensure that it can effectively adjust the electric field distribution around the target. In the magnetron sputtering process, the electric field around the target is generated by the spiral motion of charged particles under the constraint of the magnetic field. Therefore, the electric field adjustment needs to be optimized according to the magnetic field distribution. The stainless steel sheet 4 is specially selected instead of the conventional magnetic metal material. The magnetic metal material will affect the magnetic field around the target, causing the film thickness uniformity to deteriorate during the coating process, thereby affecting the target utilization rate. The stainless steel sheet 4 is not magnetic but shows a certain conductivity. After adding the stainless steel sheet around the target, it has no effect on the target magnetic field. At the same time, it can effectively change the electric field around the target village, thereby improving the target utilization rate. The stainless steel sheet 4 is grounded; The carrier to be coated is located at the top of the vacuum chamber 1, so that the target material is sputtered upward to complete the coating of the silicon wafer on the carrier. Preferably, a chamber transmission assembly can also be provided on the vacuum chamber 1. Specifically, the chamber transmission assembly can be assembled on the outer wall of the vacuum chamber 1 by bolts, and conventional mechanisms such as roller assemblies can be used to enable the carrier to be transported at the top of the vacuum chamber 1 through the chamber transmission assembly to complete the coating of the silicon wafer. Among them, the bottom end of the stainless steel sheet 4 is detachably connected to a bottom support seat 5, and the bottom support seat 5 is detachably connected to the bottom end of the vacuum chamber 1, and can be specifically detachably assembled by bolts. The top of the bottom support seat 5 is slidably connected to a slide seat 6 along its width direction, and the top of the slide seat 6 is vertically slidably connected to a holder 7 for fixing the stainless steel sheet 4. The top of the bottom support seat 5 is provided with two bottom grooves 51 spaced apart along its width direction, and a side groove 71 is provided on one side of the holder 7, and also includes two L-shaped support rods 8. The L-shaped support rod 8 includes a vertical telescopic rod 81, and a horizontal telescopic rod 82 fixed to the top of the vertical telescopic rod 81. The vertical telescopic rod 81 and the horizontal telescopic rod 82 can be freely telescopically adjusted in length along their length direction; Specifically, optionally, a slide groove 9 may be provided at the top of the bottom support seat 5 along its width direction, and two groups of slide grooves 9 may be symmetrically arranged on the left and right. The bottom end of the slide seat 6 may be slidably connected to the slide groove 9 through a structure such as a slider, and the slider and the inner side of the slide groove 9 may be elastically connected through existing elastic components such as springs, which are used to pull the slide seat 6 outward in a direction away from the cathode target 2. The top end of the slide seat 6 may be integrally connected with a vertical guide column 61 to achieve a vertical sliding connection with the holder 7. The holder 7 may be designed in a U-shape. When installing the stainless steel sheet 4, the stainless steel sheet 4 may be first centrally inserted into the holder 7, and the stainless steel sheet 4 may be fixed to the outside of the holder 7 by bolts. When assembling, Figure 2 As shown, the stainless steel sheets 4 can be pre-assembled on the two bottom support seats 5, and then the bottom support seats 5 are fixedly installed at the bottom end of the vacuum chamber 1. When installing the bottom support seat 5 on one side, as shown in FIG. Figure 4 , Figure 5 As shown, the two horizontal telescopic rods 82 are connected back to back, that is, the two L-shaped support rods 8 are connected relatively to form a T-shape, the bottom ends of the two vertical telescopic rods 81 are inserted into the bottom groove 51, and the slide 6 is pushed inward so that the end of one of the horizontal telescopic rods 82 is inserted into the side groove 71. At this time, the lengths of the two horizontal telescopic rods 82 and the vertical telescopic rod 81 are adjusted synchronously until the stainless steel sheet 4 on this side is adjusted to a suitable position, and then the L-shaped support rod 8 on the side away from the slide 6 is removed. The removal process is as shown in FIG. Figure 6 , Figure 7 , Figure 8 As shown, when installing the bottom support seat 5 on the other side, as shown in Fig. 9 As shown, the slide 6 is also pushed inward, and the removed L-shaped support rod 8 is directly inserted into the bottom groove 51 on the side bottom support 5 close to the slide 6, and the slide 6 is loosened so that the end of the horizontal telescopic rod 82 is inserted into the side groove 71, thereby completing the installation and adjustment of the bottom support 5 on the other side, so that the stainless steel sheets 4 on both sides are accurately symmetrically arranged, ensuring that the same electric field optimization adjustment is achieved for the cathode target materials 2 on both sides, so that the cathode target materials 2 on both sides achieve the same uniform sputtering, thereby improving the overall utilization rate of the target materials.

[0022] like Fig.10As shown, during the magnetron sputtering coating process, a closed annular etching track will be formed around the target material. Under the influence of the auxiliary anode 3, an asymmetric electric field will appear around the target material. Due to the asymmetry of the electric field, a higher intensity plasma is generated on the side of the etching track close to the auxiliary anode 3. Moving in the direction of the Hall current, the electrons are dragged to the corner, resulting in a higher etching rate, while the plasma on the side of the etching track farther from the auxiliary anode 3 is relatively weak, bringing less energy into the corner area, and the etching rate of the target material is relatively slow. This asymmetric diagonal etching phenomenon in the corner area of ​​the cathode magnetic field is the diagonal effect. In the magnetron sputtering coating process, it is precisely because of the diagonal effect of the target material etching process that the target material is locally over-etched, resulting in low utilization of the sputtering area.

[0023] After adding the stainless steel sheet 4 on the cathode side, the diagonal effect of the single target coating disappears, forming a shape that is thin at both ends and thick in the middle. The low film thickness areas at both ends can be easily adjusted by adjusting the height of the magnetic bars at both ends, so that the target material etching speed is consistent, which is conducive to improving the target material utilization rate. At the same time, under the same coating power, the film thickness of the single target after installing the stainless steel sheet 4 is basically unchanged. Among them, the trend of the coating thickness is as follows Fig.11 , Fig.12 As shown, Fig.11 , Fig.12 The middle horizontal axis corresponds to the lateral position of the silicon wafer on the carrier board. The uniformity of the coating film thickness is significantly improved, indicating that the addition of the stainless steel sheet 4 changes the electric field around the cathode target 2, weakens the asymmetric phenomenon of the electric field around the target, thereby reducing local over-etching and uneven etching on the target surface, and the film thickness reduction is small, which can improve the target utilization rate of the magnetron sputtering coating equipment. The uniform sputtering process reduces unnecessary loss of the target material, extends the service life of the target material, reduces production costs, and helps to obtain more uniform film thickness and better film performance. It is suitable for various types of heterojunction magnetron sputtering coating equipment and has good versatility and practicality.

[0024] In an embodiment of the present invention, optionally, Figure 1 As shown, a chamber protection plate 10 is attached to the inner wall of one side of the vacuum chamber 1 along its length direction, which plays a role in protecting the inner wall of the vacuum chamber 1 during the equipment coating process and preventing the inner wall from being coated with a film.

[0025] In an embodiment of the present invention, optionally, Figure 1 As shown, a magnetic fluid shield 11 is provided at the four corners of the vacuum chamber 1. The magnetic fluid shield 11 can be assembled on the chamber protection plate 10 by bolts. The side end of the magnetic fluid shield 11 can be provided with a stopper for limiting the stainless steel sheet 4 to avoid loosening or displacement during sputtering, which is conducive to further stabilizing the stainless steel sheet 4.

[0026] In an embodiment of the present invention, optionally, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 As shown, the horizontal telescopic rod 82 includes a horizontal fixed section 821 fixed to the top of the vertical telescopic rod 81 and a horizontal movable section 822 threadedly connected to one end of the horizontal fixed section 821. A groove 820 is provided on the end of the horizontal fixed section 821 away from the horizontal movable section 822. A rotating rod 12 is rotatably connected in the groove 820. The inner end of the rotating rod 12 penetrates into the horizontal movable section 822 to drive the horizontal movable section 822 to rotate axially. A sleeve 13 is connected to the outer end of the rotating rod 12 on one of the L-shaped support rods 8. When the two horizontal telescopic rods 82 are connected back to back, the sleeve 13 is sleeved on the rotating rod 1 2 outer ends are used to drive the rotating rods 12 on both sides to rotate synchronously. Specifically, the horizontal fixed section 821 and the horizontal movable section 822 can be designed with a hollow structure, wherein the cross section of the hollow interior of the horizontal movable section 822 and the cross section of the rotating rod 12 can form a matching polygonal shape, and the cross section of the inner hole of the sleeve 13 and the cross section of the rotating rod 12 also form a matching polygonal shape, so that when the two horizontal telescopic rods 82 are connected back to back, by holding and axially rotating any horizontal movable section 822, the other horizontal movable section 822 can be driven to rotate synchronously, that is, the two horizontal telescopic rods 82 can be telescoped synchronously.

[0027] In an embodiment of the present invention, optionally, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 As shown, the vertical telescopic rod 81 includes a vertical movable section 812 fixed to the bottom end of the horizontal fixed section 821 and a vertical fixed section 811 sleeved on the bottom end of the vertical movable section 812. The side end of the vertical fixed section 811 on the same side as the groove 820 is connected with a vertical rod bolt 14. Specifically, the vertical telescopic rod 81 can adopt an existing conventional cylindrical telescopic sleeve structure similar to that of the conventional one. The vertical rod bolt 14 is located at the top of the vertical fixed section 811. When the two horizontal telescopic rods 82 are connected back to back, the vertical lengths of the two vertical telescopic rods 81 can be synchronously adjusted by pulling the two horizontal telescopic rods 82 up and down. After adjustment, the vertical rod bolt 14 is synchronously rotated so that the inner end of the vertical rod bolt 14 is pressed against the outer side of the vertical movable section 812 to complete the locking of the telescopic length of the vertical telescopic rod 81.

[0028] In an embodiment of the present invention, optionally, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 As shown, a cross bar bolt 15 is connected to the top of the groove 820 , and the bottom end of the cross bar bolt 15 is adjusted to extend into the groove 820 to abut against one side of the rotating rod 12 to complete locking the telescopic length of the horizontal telescopic rod 82 .

[0029] In an embodiment of the present invention, optionally, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 , Figure 8 As shown, the bottom end of the vertical telescopic rod 81 is integrally connected with a clamping block 16 , and the clamping block 16 is designed to be a polygonal shape matching the bottom groove 51 to prevent the vertical telescopic rod 81 from axial rotation.

[0030] In an embodiment of the present invention, optionally, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 As shown, the top of the bottom support seat 5 is parallelly provided with an extension groove 52 along the width direction thereof, and the extension groove 52 is located at the bottom groove 51 on one side close to the slide seat 6, and the end of the extension groove 52 away from the slide seat 6 is connected to the bottom groove 51, so that when one of the L-shaped support rods 8 on the outer side is removed, as shown in FIG. Figure 6 As shown, by pushing the inner L-shaped support rod 8, the block 16 slides into the extension groove 52 until the relative rotating rod 12 and sleeve 13 are separated, and then the outer L-shaped support rod 8 is taken out. The process of taking out is as shown in FIG. Figure 6 , Figure 7 , Figure 8 As shown, in normal use, that is, without human push, the spring in the slide groove 9 naturally pulls the slide seat 6 outward, so that the side groove 71 is tightly against the horizontal telescopic rod 82, and the clamping block 16 slides into the bottom groove 51 for clamping.

[0031] The present invention also provides a method for improving target material utilization rate in magnetron sputtering coating, comprising the following steps: A stainless steel sheet 4 is provided between the inner wall of the vacuum chamber 1 along the length direction thereof and the cathode target 2. The shape and size of the stainless steel sheet 4 can be designed according to the actual equipment structure and magnetic field distribution, so as to adjust the electric field distribution around the target. During assembly, first install the stainless steel sheets 4 on the two bottom support seats 5 in advance, and then fix the bottom support seat 5 to the bottom end of the vacuum chamber 1. When installing the bottom support seat 5 on one side, the two horizontal telescopic rods 82 are connected back to back, and the bottom ends of the two vertical telescopic rods 81 are inserted into the bottom groove 51, and the end of one of the horizontal telescopic rods 82 is inserted into the side groove 71. At this time, the lengths of the two horizontal telescopic rods 82 and the vertical telescopic rods 81 are synchronously adjusted until the stainless steel sheet 4 on this side is adjusted to a suitable position, and then the L-shaped support rod 8 on the side away from the slide 6 is removed. When installing the bottom support seat 5 on the other side, the removed L-shaped support rod 8 is directly inserted into the bottom groove 51 on the bottom support seat 5 on this side close to the slide 6, so that the end of the horizontal telescopic rod 82 is inserted into the side groove 71, completing the accurate and symmetrical arrangement of the stainless steel sheets 4 on both sides, ensuring that the same electric field optimization adjustment is achieved for the cathode targets 2 on both sides.

[0032] More preferably, an extension groove 52 is provided at the top of the bottom support seat 5 in parallel along its width direction, and the extension groove 52 is located at the bottom groove 51 on the side close to the slide seat 6, and the end of the extension groove 52 away from the slide seat 6 is connected to the bottom groove 51, so that when removing one of the L-shaped support rods 8 on the outside of the connected L-shaped support rods 8, the inner L-shaped support rod 8 is pushed to make the bottom end of the vertical telescopic rod 81 slide into the extension groove 52 until the relative rotating rod 12 and sleeve 13 are separated, and then the outer L-shaped support rod 8 is taken out.

[0033] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present invention is limited to these examples. Under the concept of the present invention, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity.

Claims

1. A device for improving target material utilization rate in magnetron sputtering coating, arranged in a vacuum chamber (1) of a magnetron sputtering device, characterized in that: The vacuum chamber (1) has cathode targets (2) arranged in parallel along its length direction, the cathode targets (2) are designed in a cylindrical shape, the cathode targets (2) are symmetrically arranged on both sides along the width direction of the vacuum chamber (1), and auxiliary anodes (3) are arranged in parallel between the cathode targets (2) on both sides; A stainless steel sheet (4) is provided between the inner wall of the vacuum chamber (1) along its length direction and the cathode target material (2); the bottom end of the stainless steel sheet (4) is detachably connected to a bottom support seat (5); and the bottom support seat (5) is detachably connected to the bottom end of the vacuum chamber (1); The top end of the bottom support seat (5) is slidably connected to a slide seat (6) along its width direction, the top end of the slide seat (6) is vertically slidably connected to a clamping seat (7) for fixing and placing the stainless steel sheet (4), the top end of the bottom support seat (5) is provided with two bottom grooves (51) spaced apart along its width direction, and a side groove (71) is provided on one side of the clamping seat (7); The invention also comprises two L-shaped support rods (8), wherein the L-shaped support rods (8) comprise a vertical telescopic rod (81) and a horizontal telescopic rod (82) fixed to the top of the vertical telescopic rod (81). When the bottom support seat (5) on one side is installed, the two horizontal telescopic rods (82) are connected back to back, and the bottom ends of the two vertical telescopic rods (81) are inserted into the bottom groove (51), and the end of one of the horizontal telescopic rods (82) is inserted into the side groove (71) for synchronously adjusting the lengths of the two horizontal telescopic rods (82) and the vertical telescopic rod (81). The L-shaped support rod (8) on one side away from the slide seat (6) is removed and inserted into the bottom groove (51) on the bottom support seat (5) on the other side close to the slide seat (6).

2. The device for improving target material utilization rate by magnetron sputtering coating according to claim 1, characterized in that: The stainless steel sheet (4) is arranged parallel to the length direction of the cathode target material (2).

3. The device for improving target material utilization rate by magnetron sputtering coating according to claim 1, characterized in that: A chamber protection plate (10) is attached to an inner wall of one side of the vacuum chamber (1) along its length direction, and magnetic fluid protection covers (11) are provided at the four corners of the vacuum chamber (1).

4. The device for improving target material utilization rate by magnetron sputtering coating according to claim 1, characterized in that: The transverse telescopic rod (82) comprises a transverse fixed section (821) fixed to the top end of the vertical telescopic rod (81) and a transverse movable section (822) threadedly connected to one end of the transverse fixed section (821). A groove (820) is provided on one end of the transverse fixed section (821) away from the transverse movable section (822). A rotating rod (12) is rotatably connected in the groove (820). The inner end of the rotating rod (12) penetrates into the transverse movable section (822) to drive the transverse movable section (822) to rotate axially. A sleeve (13) is connected to the outer end of the rotating rod (12) on one of the L-shaped support rods (8). When the two transverse telescopic rods (82) are connected back to back, the sleeve (13) is sleeved on the outer end of the rotating rod (12) to drive the rotating rods (12) on both sides to rotate synchronously.

5. The device for improving target material utilization rate by magnetron sputtering coating according to claim 4, characterized in that: The vertical telescopic rod (81) comprises a vertical movable section (812) fixed to the bottom end of the horizontal fixed section (821) and a vertical fixed section (811) sleeved on the bottom end of the vertical movable section (812); a vertical rod bolt (14) is connected to the side end of the vertical fixed section (811) located on the same side as the groove (820) for locking the telescopic length of the vertical telescopic rod (81).

6. The device for improving target material utilization rate by magnetron sputtering coating according to claim 4, characterized in that: The top end of the groove (820) is connected to a crossbar bolt (15), and the bottom end of the crossbar bolt (15) extends into the groove (820) to abut against one side of the rotating rod (12).

7. The device for improving target material utilization rate by magnetron sputtering coating according to claim 1, characterized in that: The bottom end of the vertical telescopic rod (81) is connected to a clamping block (16), and the clamping block (16) is designed to be a polygonal shape matching the bottom groove (51).

8. The device for improving target material utilization rate by magnetron sputtering coating according to claim 1, characterized in that: An extension groove (52) is provided at the top end of the bottom support seat (5) in parallel along the width direction thereof. The extension groove (52) is located at the bottom groove (51) on one side close to the slide seat (6), and one end of the extension groove (52) away from the slide seat (6) is connected to the bottom groove (51).

9. A method for improving target utilization rate by magnetron sputtering coating, the method using the device for improving target utilization rate by magnetron sputtering coating as claimed in any one of claims 1 to 8 for sputtering, characterized in that: The steps include: A stainless steel sheet (4) is provided between the inner wall of the vacuum chamber (1) along its length direction and the cathode target material (2) to adjust the electric field distribution around the target material; During assembly, firstly assemble the stainless steel sheets (4) on both bottom support seats (5) in advance, and then fix the bottom support seats (5) to the bottom end of the vacuum chamber (1). When installing the bottom support seat (5) on one side, the two horizontal telescopic rods (82) are connected back to back, the bottom ends of the two vertical telescopic rods (81) are inserted into the bottom groove (51), and the end of one of the horizontal telescopic rods (82) is inserted into the side groove (71). At this time, the lengths of the two horizontal telescopic rods (82) and the vertical telescopic rod (81) are adjusted synchronously until the bottom support seat (5) is installed. When the stainless steel sheet (4) on that side is adjusted to a suitable position, the L-shaped support rod (8) on the side away from the slide seat (6) is removed, and when the bottom support seat (5) on the other side is installed, the removed L-shaped support rod (8) is directly inserted into the bottom groove (51) on the bottom support seat (5) on that side close to the slide seat (6), so that the end of the horizontal telescopic rod (82) is inserted into the side groove (71), thereby completing the accurate symmetrical arrangement of the stainless steel sheets (4) on both sides, ensuring that the same electric field optimization adjustment is achieved for the cathode targets (2) on both sides.

10. The method for improving target material utilization rate in magnetron sputtering coating according to claim 9, characterized in that: An extension groove (52) is provided at the top of the bottom support seat (5) in parallel along the width direction thereof. The extension groove (52) is located at the bottom groove (51) close to one side of the slide seat (6), and one end of the extension groove (52) away from the slide seat (6) is connected to the bottom groove (51). When removing one of the L-shaped support rods (8) on the outer side, the L-shaped support rod (8) on the inner side is pushed to slide the bottom end of the vertical telescopic rod (81) into the extension groove (52) until the opposite transverse telescopic rods (82) are separated, and then the outer L-shaped support rod (8) is taken out.

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