Method for plating high-performance wide-spectrum color separation film

Abstract

The invention discloses a high-performance wide-spectrum color separation film and a plating method, and relates to the technical field of film plating. The film system structure is an optical substrate / a first matching film layer / an induced transmission film layer / a second matching film layer / a protective film layer / air; the optical substrate is positioned at the innermost part of the film system and is attached to the surface of a coated object The first matching film layer and the second matching film layer are multilayer dielectric film layers formed by overlapping materials with different high and low refractive indexes; the induced transmission film layer is positioned between the two multi-layer dielectric film layers and is formed by compounding a plurality of metal film layers; the protective film layer is located on the outermost side of the film system, serves as an anti-reflection, namely a protective layer of the reflecting film and is used for reflecting visible near-infrared light and resisting abrasion. The color separation film adopts the design of the matching film layer, the induction transmission film layer, the matching film layer and the protection film layer, the passband of the visible near-infrared band is broadened, the high reflectivity of the medium-long wave infrared band is kept, the transmission and reflection transition area is shortened, the environment resistance of the whole film layer is improved, and the service life of the color separation film is prolonged.

Description

Technical Field

[0001] The embodiments of the present application relate to the field of film coating technology, and in particular to a method for coating a high-performance wide-spectrum color separation film. Background Art

[0002] Wide spectrum color separation film is an optical thin film device that can separate visible light, near infrared and far infrared spectral energy. It plays an important role in the field of optoelectronic equipment and is one of the key devices for the design and manufacture of optoelectronic equipment instruments. The main function of this color separation film is to divide the spectral information into two major band channels of 400nm-1600nm and 7400nm-14000nm, so as to separate the visible and near infrared bands from the mid- and far infrared bands, and then perform more detailed spectroscopy as needed, so that the radiation energy of each band can reach the corresponding detector for photoelectric information conversion and data processing. The performance of the color separation film directly affects the image quality, working distance and other performances of the optoelectronic equipment system. At the same time, this brings great convenience to reducing the number, volume and quality of optical components of the optoelectronic equipment system.

[0003] In the relevant technology, in the development of wide spectrum dichroic film, to achieve visible-infrared wide spectrum dichroic, the most important means requires the participation of metal film layer, so as to induce transmission in the visible band, and achieve reflection in the infrared band by relying on the metal properties of the metal film layer. The advantage of this type of dichroic film is that the spectral coverage is wide, and the reflection band can be extended to long-wave infrared and even farther wavelengths. However, this single induced transmission structure dichroic film has some shortcomings, mainly manifested in:

[0004] 1. When the transmission band is wide, the metal film layer needs to be very thin, and the metallic property is not fully expressed, resulting in a decrease in the transmittance of visible light near-infrared bands and the reflectivity of infrared bands, and a serious decrease in color separation performance;

[0005] 2. The transition zone between spectral transmission and reflection is relatively wide, and the spectral resources in this band cannot be fully utilized;

[0006] 3. The metal film layer is very thin, the optical thickness of the film layer is difficult to control, and the process repeatability is poor;

[0007] 4. The physical and chemical properties of the entire color separation film, such as firmness and anti-friction performance, are poor. Summary of the invention

[0008] The embodiment of the present application provides a high-performance wide-spectrum color separation film coating method to solve the color separation performance and anti-friction performance problems of the color separation film mentioned in the related art.

[0009] On the one hand, the present application provides a high-performance wide-spectrum color separation film, and its film system structure is represented as follows:

[0010] Optical substrate / first matching film layer / induced transmission film layer / second matching film layer / protective film layer / air;

[0011] The optical substrate is located at the innermost part of the film system and fits the surface of the coated object; the first matching film layer and the second matching film layer are multi-layer dielectric film layers overlapped by different high and low refractive index materials;

[0012] The induced transmission film layer is located between two multi-layer dielectric film layers and is formed by compounding multiple metal film layers;

[0013] The protective film layer is located on the outermost side of the film system and is in direct contact with the air. It serves as an anti-reflection or protective layer for the reflective film and is used to reflect visible and near-infrared light and resist wear.

[0014] Specifically, the film system structure of the first matching film layer is expressed as:

[0015] α 1 Hα 2 Lα 3 Hα 4 L

[0016] The film structure of the second matching film layer is expressed as:

[0017] β 1 Lβ 2 H

[0018] H represents the high refractive index material layer, L represents the low refractive index material layer, α 1 , α 2 , α 3 , α 4 , β 1 and β 2 Represent the optical thickness coefficients of different material films respectively.

[0019] Specifically, the high refractive index material is zinc sulfide ZnS; the low refractive index material is ytterbium trifluoride YbF 3 ; ZnS and YbF 3 The optical thickness is λ 0 / 4,λ 0 Indicates the central wavelength.

[0020] Specifically, the film system structure of the induced transmission film layer is expressed as:

[0021] γ 1 HMγ 2 H

[0022] The film structure of the protective film layer is expressed as:

[0023] θN

[0024] Where H represents the optical thickness λ 0 / 4 high refractive index material film layer ZnS, γ 1 , γ 2 and θ represent the optical thickness coefficients of different material layers; M represents the metal silver Ag film layer, and N represents the magnesium fluoride MgF 2 Membrane layer.

[0025] On the other hand, the present application provides a high-performance wide-spectrum color separation film coating method, the method comprising:

[0026] After cleaning the optical substrate, place it in the vacuum chamber of the first coating machine, open the vacuum valve to evacuate the vacuum, and then turn on the baking switch to preheat the optical substrate;

[0027] Pre-melting the ZnS particles placed in the vacuum chamber, and ion-depositing the ZnS film material onto the optical substrate by ion deposition;

[0028] Place YbF in the vacuum chamber 3 The particles are pre-melted and YbF 3 The film material is ion deposited onto the optical substrate; ZnS film and YbF are repeatedly deposited 3 The film layer reaches the preset number of layers;

[0029] The planetary disk on which the workpiece is placed is moved into the second coating machine, and a Ag film layer is continuously sputtered onto the film-forming optical substrate in the vacuum chamber;

[0030] After the Ag film is plated, the second coating machine is filled with air, the planetary disk with the workpiece is transferred to the first coating machine for vacuuming, and the baking and heating are turned on; the ZnS film and YbF film are plated repeatedly. 3 The film layer steps are continued until the preset number of layers is reached; when the ZnS film layer and YbF 3 When measuring the film layer, the quartz crystal monitoring method is used to determine the film thickness;

[0031] The coated film layer is baked and cured at a constant temperature, and then MgF is plated on the outermost layer. 2 The film layer is transferred to a vacuum chamber and then cooled and taken out.

[0032] Specifically, during the preheating stage of the optical substrate, the vacuum degree in the vacuum chamber of the first coating machine is set to 2×10 -2 Pa, heat the substrate to 120℃-150℃.

[0033] Specifically, the ZnS film material is deposited onto the optical substrate by ion deposition, comprising:

[0034] The substrate was ion-assisted using an ion source, and the vacuum was set to 8×10 -3Pa, ion source anode voltage 100V, ion source anode current 0.3A, bombardment time 15min-20min, so that ZnS film material ions are deposited on the substrate.

[0035] Specifically, YbF 3 The particle pre-melting vacuum degree is 5×10 -2 Pa;

[0036] The YbF 3 Ion deposition of film materials onto optical substrates, including:

[0037] The substrate was ion-assisted using an ion source, and the vacuum was set to 8×10 -3 Pa, ion source anode voltage 100V, ion source anode current 0.5A, bombardment time 15min-20min, so that ZnS film material ions are deposited on the substrate.

[0038] Specifically, the step of continuing to sputter the Ag film onto the film-formed optical substrate in the vacuum chamber includes:

[0039] When the vacuum degree P≤3.0×10 -6 torr, pre-sputtering of Ag target, sputtering time 50s;

[0040] When sputtering the Ag film layer, the cathode power is 3.5kw, argon is 50-60sccm, the ion source power is 2kw, nitrogen is 30-40sccm, the deposition rate is 0.1nm / s, and the deposition time is 40s-80s.

[0041] Specifically, the plated film layer is baked and cured at a constant temperature, and then MgF is plated on the outermost layer. 2 Film layers, including:

[0042] Increase the baking temperature to 250℃-300℃, keep the temperature constant for 40 minutes, and then continue to plate MgF 2 Membrane layer.

[0043] The beneficial effects brought by the technical solution provided by the embodiment of the present application include at least:

[0044] 1. The color separation film adopts the design of matching film layer + induced transmission film layer + matching film layer + protective film layer, which broadens the passband of the visible and near-infrared bands, maintains a high reflectivity in the medium and long-wave infrared bands, and shortens the transition zone of transmission and reflection.

[0045] 2. The metal thin layer adopts pulsed DC sputtering and low-speed deposition. The film thickness is controlled by quartz crystal oscillator and time to improve process repeatability.

[0046] 3. By placing a metal film layer between two matching film stacks and adding a protective layer, the transmittance in the visible and near-infrared bands is improved, while the environmental resistance of the entire film layer is improved, and the service life of the color separation film is enhanced.

[0047] 4. The wide spectrum color separation film of the present invention has a simple structure, good process repeatability and is easy to prepare. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] Figure 1 It is a schematic diagram of the film structure of the high-performance wide-spectrum color separation film provided by the present application;

[0049] Figure 2 It is a flow chart of the high-performance wide-spectrum color separation film coating method provided by the present application;

[0050] Figure 3 The transmission spectrum of 0.4μm to 1.6μm (AOI = 45°) is selected;

[0051] Figure 4 The reflectance spectrum diagram is selected from 7.4μm to 14μm (AOI=45°). DETAILED DESCRIPTION

[0052] In order to make the objectives, technical solutions and advantages of the present application clearer, the implementation methods of the present application will be further described in detail below with reference to the accompanying drawings.

[0053] The present application provides a design of a wide spectrum dichroic film and a film coating method, the purpose of which is to solve the technical problem that the requirements of the dichroic film cannot be simultaneously achieved, such as the passband width and transmittance of 400nm to 1600nm and the high reflectivity of 7400nm to 14000nm, the good repeatability of the metal thin layer, and the improvement of the environmental resistance of the film.

[0054] Figure 1 It is a schematic diagram of the film structure of the high-performance wide-spectrum color separation film provided by the present application, which includes a total of five film system levels, namely optical substrate 1 / matching film layer 2 / induced transmission film layer 3 / matching film layer 4 / protective film layer 5 / air. The optical substrate 1 is located at the innermost part of the film system and fits the surface of the coated object. The first matching film layer 2 and the second matching film layer 4 are multi-layer dielectric film layers overlapped by different high and low refractive index materials. The induced transmission film layer 3 is located between the two multi-layer dielectric film layers and is formed by a composite of multiple metal film layers. The protective film layer is located at the outermost side of the film system and is in direct contact with the air. It serves as an anti-reflection and protective layer of the reflective film, which is used to reflect visible and near-infrared light and resist wear.

[0055] The overall structure of the wide spectrum color separation film is described as follows:

[0056] The first matching film layer is a multilayer dielectric film layer with overlapping high and low refractive index materials. Its film structure is expressed as:

[0057] α 1 Hα 2 Lα 3 Hα 4 L

[0058] The film system structure of the second matching film layer is expressed as:

[0059] β 1 Lβ 2 H

[0060] The induced transmission film layer is a combination of a metal film sandwiched between two dielectric films, and its film system structure is:

[0061] γ 1 HMγ 2 H

[0062] The film system structure of the protective film layer is expressed as:

[0063] θN

[0064] Among them, H represents a high refractive index material film layer, L represents a low refractive index material film layer, α 1 , α 2 , α 3 , α 4 , β 1 , β 2 , γ 1 , γ 2 and θ respectively represent the optical thickness coefficients of different material film layers, and their values are all positive numbers greater than 0.

[0065] In a possible implementation manner, the high refractive index material can be zinc sulfide ZnS; the low refractive index material can be ytterbium trifluoride YbF 3 ; the optical thickness of ZnS and YbF3 is λ 0 / 4, λ 0 represents the central wavelength; M represents a silver Ag metal film layer, and its thickness is 4 - 8 nm; N represents a magnesium fluoride MgF 2 film layer.

[0066] When manufacturing the wide-spectrum dichroic film in this application, dedicated infrared coating equipment is required, configured with a multi-position resistance evaporation source, an ion source, baking, a public rotation planetary bracket, etc., to deposit ZnS and YbF 3 film layers. In addition, magnetron sputtering coating equipment is also required, configured with a magnetron sputtering target, to deposit an extremely thin silver metal film layer.

[0067] The overall coating method is: first coat the first matching film layer and the first dielectric layer of the induced transmission film layer on the infrared coating equipment, wait for 20 minutes and immediately open the vacuum chamber door to move the planetary disk (including parts) to the magnetron sputtering coating machine, evacuate, and then coat the extremely thin metal silver film. After coating, immediately move the planetary disk (including parts) to the infrared coating machine to continue coating the second dielectric layer and the second matching film layer of the induced transmission film layer. At this time, change the baking temperature, adjust the baking temperature to 250℃~300℃, keep the temperature constant for 40 minutes, and then continue to coat the anti-reflection layer and protective layer. After the coating is completed, you can take the parts out.

[0068] Compared with the "full dielectric matching layer + induced transmission film structure design" in the related art, it can be seen that the dielectric matching layer material of this application selects better infrared thin film materials such as ZnS and YbF 3 ; The number of dielectric layers is increased to 4; 2 dielectric layers are added outside the induced transmission film layer to protect the silver film from water vapor, CO 2 Etc.; the outermost layer is plated with MgF 2 The film layer increases the film's anti-friction performance, while further forming a tighter protection for the entire film system and improving the durability of the wide spectrum color separation film.

[0069] Figure 2 The present invention provides a method for coating a high-performance wide-spectrum color separation film, which comprises the following steps:

[0070] S1, after cleaning the optical substrate, place it in the vacuum chamber of the first coating machine, open the vacuum valve to evacuate the vacuum, and then turn on the baking switch to preheat the optical substrate;

[0071] S2, put ZnS particles into the vacuum chamber for pre-melting, and deposit ZnS film ions onto the optical substrate by ion deposition; 3 The particles are placed in a vacuum chamber for pre-melting, and YbF 3 The film material is ion deposited onto the optical substrate; ZnS film and YbF are repeatedly deposited 3 The film layer reaches the preset number of layers;

[0072] S3, moving the planetary disk on which the workpiece is placed into the second coating machine, and continuing to sputter the Ag film layer onto the film-forming optical substrate in the vacuum chamber;

[0073] S4, after the Ag film coating is completed, the second coating machine is inflated, the planetary disk with the workpiece is transferred to the first coating machine for vacuuming, and the baking heating is turned on; the ZnS film and YbF coating are repeated. 3 The film layer steps are continued until the preset number of layers is reached; when the ZnS film layer and YbF 3 When measuring the film layer, the quartz crystal monitoring method is used to determine the film thickness;

[0074] S5, the plated film layer is baked and cured at a constant temperature, and then MgF is plated on the outermost layer. 2 The film layer is transferred to a vacuum chamber and then cooled and taken out.

[0075] In another embodiment, the process can be described in detail with specific raw materials and parameters:

[0076] Step 1: Clean the optical substrate and place it in a fixture to coat the main film system on two or specific surfaces of the part.

[0077] Step 2: Place the optical substrate into the vacuum chamber of the coating machine 1, open the vacuum valve, and make the vacuum degree in the vacuum chamber to 2×10 -2 Pa, turn on the baking switch and heat the substrate to 120℃-150℃.

[0078] Step 3: At a vacuum degree of 5×10 -2 Pa, for YbF 3 The film material particles are pre-melted to fully release the gas adsorbed by the film material to reduce impurities.

[0079] Step 4: Plating the first film layer, pre-melting ZnS, depositing ZnS film material, and ion source ion-assisted the substrate during deposition, with a vacuum degree of 8×10 -3 Pa, ion source anode voltage 100V, ion source anode current 0.3A, bombardment time 15min-20min, so that ZnS film material ions are deposited on the optical substrate. During the ion deposition process, the quartz crystal monitoring method is used to determine the thickness of the first film layer.

[0080] Step 5: Plating the second film layer, YbF 3 Pre-melt and deposit YbF 3 Membrane material, vacuum degree is 8×10 -3 Pa, ion source anode voltage 100V, ion source anode current 0.5A, bombardment time 15min-20min, make YbF 3 The film material ions are deposited on the substrate, and the thickness of the second film layer is determined by quartz crystal monitoring.

[0081] Step 6: Repeat steps 4 and 5 in sequence to deposit the 3rd to 5th layers of film, cool for 20 minutes, and inflate the vacuum chamber.

[0082] Step 7: Move the planetary disk (including parts) in coating machine 1 to coating machine 2, close the vacuum chamber door and evacuate. At this time, coating machine 1 is waiting for subsequent coating.

[0083] Step 8: When the vacuum degree P≤3.0×10 -6 torr, pre-sputter the Ag target with a sputtering time of 50 s.

[0084] Step 9: Sputtering Ag film layer. Set cathode power to 3.5kw, argon gas to 50-60sccm, ion source power to 2kw, nitrogen gas to 30-40sccm, deposition rate to 0.1nm / s, and deposition time to 40s-80s.

[0085] Step 10: After the Ag layer is plated, the vacuum chamber of coating machine 2 is immediately inflated, the planetary disk (including parts) is moved to coating machine 1, and the vacuum chamber door is closed to evacuate the chamber.

[0086] Step 11: When the vacuum degree in the vacuum chamber is 2×10 -2 Pa, turn on the baking switch and heat the optical substrate to 120℃-150℃.

[0087] Step 12: Repeat steps 3, 4 and 5 in sequence to plate the 7th to 9th film layers.

[0088] Step 13: After coating the 9th layer, increase the baking temperature to 250℃-300℃ for 40 minutes, and then continue to coat the anti-reflection layer and protective layer (MgF 2 ).

[0089] Step 14: Take out the parts. Place the color separation film parts with 10 layers of film coating in the vacuum chamber and cool them naturally to room temperature before taking them out.

[0090] This scheme adopts a preparation method that combines resistance evaporation and magnetron sputtering and gives detailed plating steps. It uses magnetron low-speed deposition to actively thin the silver layer, and a quartz crystal oscillator accurately controls the film thickness with good repeatability. The outermost protective layer is plated at high temperature, which improves the actual performance of the film.

[0091] In some embodiments, the specific technical indicators of this implementation case are: AOI=45°, 0.4μm~0.75μm, Tave≥80%&1.5μm~1.6μm, T≥55%; 7.4μm~14μm, R≥88%.

[0092] According to the technical requirements, K9 glass is used as the substrate, and ZnS and YbF are selected. 3 They are used as the high refractive index material and low refractive index material of the matching layer respectively; Ag is used as the metal film layer of the induced transmission layer, and ZnS is used as the dielectric layer of the induced transmission layer. 0 =550nm, H:ZnS, L:YbF 3 , N:MgF 2 , M: Ag. The optical thin film design software Essential Macleod was used to perform design optimization calculations on the film system, and the total number of film layers was determined to be 10. The film layer thickness distribution is shown in Table 1:

[0093] Table 1 Film thickness of high performance wide spectrum color separation film

[0094]

[0095]

[0096] The specific implementation steps are operated according to the above-mentioned embodiment, the film thickness is controlled according to the data in the table, and the plating result spectrum is shown in Figure 3 and Figure 4 shown. Figure 3 The transmission spectrum of 0.4μm to 1.6μm (AOI = 45°) is selected. Figure 4 The reflectance spectrum diagram is selected from 7.4μm to 14μm (AOI=45°).

[0097] Analyzing the two figures, we can see that Figure 3 The medium spectrum curve is the transmittance curve of the wide spectrum dichroic film after adding the first matching layer, the second matching layer and the protective layer at 0.4 μm to 1.6 μm (AOI=45°). Figure 4 The mid-spectrum curve is the reflectivity curve of the wide spectrum color separation film after adding the first matching layer, the second matching layer, and the protective layer at 7.4μm to 14μm. As can be seen from the figure, after adding the dielectric matching layer, the 0.4μm to 1.6μm transmission bandwidth is expanded, the average transmittance is improved, especially the transmittance at 1540nm is significantly improved, the transition zone between the transmission band and the reflection band is significantly shortened, and the reflectivity at 7.4μm to 14μm is also increased. At the same time, the added multi-layer dielectric film fully protects the silver film and improves durability.

[0098] In this embodiment, the adhesion test of the wide spectrum color separation film parts is carried out. A 3M transparent tape with a width of 12.7 mm is tightly attached to the surface of the film layer, and then one end of the tape is quickly pulled up. The surface of the film layer is intact and there is no film peeling phenomenon. The wet heat test of the wide spectrum color separation film parts is carried out. The sample is placed in a constant temperature and humidity chamber, and the temperature is set at 50±2°C and the relative humidity is 95% to 100% for 24 hours. Then it is cooled to room temperature and taken out. The surface of the film layer is intact and there is no film peeling phenomenon. The temperature test of the wide spectrum color separation film parts is carried out. The sample is placed in a constant temperature and humidity chamber and kept at -6 The temperature was maintained at 2±2℃ and 70±2℃ for 2h respectively (the temperature change rate shall not exceed 2℃ / min), and then the film surface was restored to room temperature and taken out. The film surface was intact without any film peeling. The water solubility test was carried out on the parts with wide spectrum color separation film. The samples were immersed in pure water (room temperature) and taken out after immersion for 24h. The film surface was intact without any film peeling. The surface cleaning test was carried out on the parts with wide spectrum color separation film. The film surface was wiped with a dust-free cloth dipped in a mixture of anhydrous ethanol and anhydrous ether to evaporate the liquid without leaving any trace on the surface. After wiping, the film surface was intact without any film peeling.

[0099] Beneficial effects:

[0100] 1. The color separation film adopts the design of matching film layer + induced transmission film layer + matching film layer + protective film layer, which broadens the passband of the visible and near-infrared bands, maintains a high reflectivity in the medium and long-wave infrared bands, and shortens the transition zone of transmission and reflection.

[0101] 2. The metal thin layer adopts pulsed DC sputtering and low-speed deposition. The film thickness is controlled by quartz crystal oscillator and time to improve process repeatability.

[0102] 3. By placing a metal film layer between two matching film stacks and adding a protective layer, the transmittance in the visible and near-infrared bands is improved, while the environmental resistance of the entire film layer is improved, and the service life of the color separation film is enhanced.

[0103] 4. The wide spectrum color separation film of the present invention has a simple structure, good process repeatability and is easy to prepare.

[0104] This specific embodiment is merely an explanation of the present invention and is not a limitation of the present invention. After reading this specification, those skilled in the art may make non-creative modifications to the present embodiment as needed. However, as long as they are within the scope of the claims of the present invention, they are protected by the patent law.

Claims

1. A high-performance wide-spectrum color separation film, characterized in that: The film structure is expressed as: Optical substrate / first matching film layer / induced transmission film layer / second matching film layer / protective film layer / air; The optical substrate is located at the innermost part of the film system and fits the surface of the coated object; the first matching film layer and the second matching film layer are multi-layer dielectric film layers overlapped by different high and low refractive index materials; The induced transmission film layer is located between two multi-layer dielectric film layers and is formed by compounding multiple metal film layers; The protective film layer is located on the outermost side of the film system and is in direct contact with the air. It serves as an anti-reflection or protective layer for the reflective film and is used to reflect visible and near-infrared light and resist wear.

2. The high performance wide spectrum color separation film according to claim 1, characterized in that: The film structure of the first matching film layer is expressed as: α1Hα2Lα3Hα4L The film structure of the second matching film layer is expressed as: β1Lβ2H Here, H represents a high refractive index material layer, L represents a low refractive index material layer, and α1, α2, α3, α4, β1 and β2 represent optical thickness coefficients of different material layers, respectively.

3. The high performance wide spectrum color separation film according to claim 2, characterized in that: The high refractive index material is zinc sulfide ZnS; the low refractive index material is ytterbium fluoride YbF3; the optical thickness of ZnS and YbF3 is λ 0 / 4, λ0 represents the central wavelength.

4. The high performance wide spectrum color separation film according to claim 1, characterized in that: The film structure of the induced transmission film layer is expressed as: γ1HMγ2H The film structure of the protective film layer is expressed as: θN Wherein H represents the high refractive index material film layer ZnS with an optical thickness of λ0 / 4, γ1, γ2 and θ represent the optical thickness coefficients of different material film layers respectively; M represents the metal silver Ag film layer, and N represents the magnesium fluoride MgF2 film layer.

5. A high-performance wide-spectrum color separation film coating method, characterized in that: The method comprises: After cleaning the optical substrate, place it in the vacuum chamber of the first coating machine, open the vacuum valve to evacuate the vacuum, and then turn on the baking switch to preheat the optical substrate; Pre-melting the ZnS particles placed in the vacuum chamber, and ion-depositing the ZnS film material onto the optical substrate by ion deposition; Pre-melting the YbF3 particles placed in the vacuum chamber, and ion-depositing the YbF3 film material onto the optical substrate by ion deposition; repeatedly depositing the ZnS film layer and the YbF3 film layer to reach a preset number of layers; The planetary disk on which the workpiece is placed is moved into the second coating machine, and a Ag film layer is continuously sputtered onto the film-forming optical substrate in the vacuum chamber; After the Ag film coating is completed, the second coating machine is inflated, the planetary disk with the workpiece is transferred to the first coating machine for vacuuming, and the baking heating is turned on; the steps of coating the ZnS film layer and the YbF3 film layer are repeated until the preset number of layers is reached; when coating the ZnS film layer and the YbF3 film layer, the film thickness is determined by a quartz crystal monitoring method; The deposited film layer is baked and solidified at a constant temperature, and then a MgF2 film layer is deposited on the outermost layer. The part is transferred to a vacuum chamber for cooling and then taken out.

6. The high performance wide spectrum color separation film coating method according to claim 5, characterized in that: During the preheating phase of the optical substrate, the vacuum degree in the vacuum chamber of the first coating machine was set to 2×10 -2 Pa, heat the substrate to 120℃-150℃.

7. The high performance wide spectrum color separation film coating method according to claim 5, characterized in that: The method of depositing ZnS film material ions onto the optical substrate by ion deposition comprises: The substrate was ion-assisted using an ion source, and the vacuum was set to 8×10 -3 Pa, ion source anode voltage 100V, ion source anode current 0.3A, bombardment time 15min-20min, so that ZnS film material ions are deposited on the substrate.

8. The high performance wide spectrum color separation film coating method according to claim 5, characterized in that: The pre-melting vacuum degree of YbF3 particles is 5×10 -2 Pa; The method of depositing YbF3 film material ions onto the optical substrate by ion deposition comprises: The substrate was ion-assisted using an ion source, and the vacuum was set to 8×10 -3 Pa, ion source anode voltage 100V, ion source anode current 0.5A, bombardment time 15min-20min, so that ZnS film material ions are deposited on the substrate.

9. The high performance wide spectrum color separation film coating method according to claim 5, characterized in that: The step of continuing to sputter the Ag film onto the film-formed optical substrate in the vacuum chamber comprises: When the vacuum degree P≤3.0×10 -6 torr, pre-sputtering of Ag target, sputtering time 50s; When sputtering the Ag film layer, the cathode power is 3.5kw, argon is 50-60sccm, the ion source power is 2kw, nitrogen is 30-40sccm, the deposition rate is 0.1nm / s, and the deposition time is 40s-80s.

10. The high performance wide spectrum color separation film coating method according to claim 5, characterized in that: The method of baking and curing the plated film layer at a constant temperature and then plating a MgF2 film layer on the outermost layer comprises: Increase the baking temperature to 250°C-300°C and keep the temperature constant for 40 minutes before continuing to plate the MgF2 film.

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