Temperature adjustment system, abnormality determination method, and abnormality determination device

By obtaining the control waveform feature amount of the heat treatment device and setting the threshold value, the problem of insufficient accuracy in determining abnormality of the heat treatment device in the prior art is solved, and a higher monitoring accuracy is achieved.

CN120051736APending Publication Date: 2025-05-27OMRON CORP
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Patent Information

Application Number
CN202380073114.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2022-11-01
Filing Date
2023-10-16
Publication Date
2025-05-27

AI Technical Summary

Technical Problem

The prior art has the problem of insufficient accuracy when determining the possibility of abnormality of a heat treatment device.

Method used

By obtaining the control waveform characteristic amount of the heat treatment device in a stable temperature state and when it is disturbed, it is determined that it is abnormal when the characteristic amount exceeds the first threshold.

Benefits of technology

It realizes more accurately determining the abnormal possibility of the heat treatment device, and improves the monitoring and detection accuracy of the system.

✦ Generated by Eureka AI based on patent content.

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Abstract

The temperature control system includes: a temperature controller that controls a heat treatment temperature of the heat treatment device; and an abnormality determination device that determines an abnormality in the heat treatment device. The abnormality determination device includes: a first acquisition unit capable of acquiring a characteristic quantity of a control waveform of the heat treatment device when the heat treatment temperature is in a steady state and when the heat treatment temperature is disturbed; and a first determination unit that determines that the heat treatment device is abnormal when the feature amount acquired by the first acquisition unit exceeds a first threshold value.
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Description

Technical Field

[0001] The present disclosure relates to a temperature control system, an abnormality determination method, and an abnormality determination device. Background Art

[0002] In Patent Document 1, a defect condition detection system is disclosed that detects or predicts a defect condition related to the stability of control.

[0003] Prior Art Documents

[0004] Patent Documents

[0005] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2015-69612 Summary of the Invention

[0006] Problems to be Solved by the Invention

[0007] In the defect condition detection system of Patent Document 1, there is room for improvement in accurately determining the possibility of an abnormality in the heat treatment apparatus.

[0008] The present disclosure provides a temperature control system, an abnormality determination method, and an abnormality determination device that can more accurately determine the possibility of an abnormality in a heat treatment apparatus.

[0009] Means for Solving the Problems

[0010] A temperature control system according to one aspect of the present disclosure includes: a temperature controller that controls the heat treatment temperature of a heat treatment apparatus; and an abnormality determination device that determines an abnormality of the heat treatment apparatus, the abnormality determination device including: a first acquisition unit that can acquire characteristic amounts of a control waveform of the heat treatment apparatus when the heat treatment temperature is in a stable state and when it is disturbed; and a first determination unit that determines that the heat treatment apparatus is abnormal when the characteristic amounts acquired by the first acquisition unit exceed a first threshold value.

[0011] "When the temperature is stable" means a state in which the heat treatment temperature of the heat treatment apparatus continuously stays within a stable temperature range determined in advance based on a temperature target value for a certain period of time or more.

[0012] "Control waveform" refers to time-series data related to temperature control such as temperature, operation amount, current, etc. For example, with the time axis as the horizontal axis, the time-series data related to temperature control is charted to represent the "control waveform".

[0013] "Interference" refers to an external action that disturbs the state of a control system (e.g., temperature or operation amount). "Interference" includes, for example, periodic interference (cyclic interference). Periodic interference mainly becomes the "cause of temperature change" that repeatedly occurs in a similar pattern along with events in the processing of a heat treatment apparatus. "Interference" includes "loading of a workpiece or liquid medicine", "opening and closing of a device door", "target temperature change", "change in exhaust volume or gas pressure", etc.

[0014] An abnormality determination method according to one aspect of the present disclosure obtains a characteristic quantity of a control waveform of a heat treatment apparatus when in a temperature stable state or when being interfered with, and determines that the heat treatment apparatus is abnormal when the obtained characteristic quantity exceeds a first threshold value.

[0015] An abnormality determination device according to one aspect of the present disclosure includes: a first acquisition unit that can acquire a characteristic quantity of a control waveform of a heat treatment apparatus when in a temperature stable state or when being interfered with; and a determination unit that determines that the heat treatment apparatus is abnormal when the characteristic quantity acquired by the first acquisition unit exceeds a first threshold value.

[0016] Advantageous Effects of the Invention

[0017] According to the temperature control system, abnormality determination method, and abnormality determination device according to the foregoing aspects, it is possible to more accurately determine the possibility of abnormality of a heat treatment apparatus. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a block diagram showing a temperature control system according to an embodiment of the present disclosure.

[0019] Figure 2 is a first chart for explaining an example of a characteristic quantity.

[0020] Figure 3 is a second chart for explaining an example of a characteristic quantity.

[0021] Figure 4 is a third chart for explaining an example of a characteristic quantity.

[0022] Figure 5 is a fourth chart for explaining an example of a characteristic quantity.

[0023] Figure 6 is a fifth chart for explaining an example of a characteristic quantity.

[0024] Figure 7 is a sixth chart for explaining an example of a characteristic quantity.

[0025] Figure 8 is for explaining Figure 1Flowchart of an example of the processing of the upper controller in an example of the abnormal determination process of the temperature control system.

[0026] Figure 9 It is used to illustrate Figure 1 Flowchart of an example of the processing of the temperature regulator in the abnormal determination process of the temperature control system.

[0027] Figure 10 It is used to illustrate Figure 1 Flowchart of an example of the threshold setting process of the temperature control system.

[0028] Figure 11 It shows Figure 1 Partial block diagram of the first modified example of the temperature control system.

[0029] Figure 12 It is used to illustrate Figure 11 Flowchart of an example of the slope value sampling process during the temperature rise of the temperature control system.

[0030] Figure 13 It shows Figure 1 Block diagram of the second modified example of the temperature control system. Detailed implementation mode

[0031] Hereinafter, an example of the present disclosure will be described with reference to the drawings. The following description is essentially only an illustration and is not intended to limit the present disclosure, the application of the present disclosure, or the use of the present disclosure. The drawings are schematic, and the ratios of the respective dimensions are not necessarily the same as in reality.

[0032] As Figure 1 shown, the temperature control system 1 of an embodiment of the present disclosure includes a temperature regulator 10 and an upper controller (an example of a controller) 20 including an abnormality determination device 30. In the present embodiment, the temperature control system 1 includes a threshold setting unit 40. The temperature regulator 10 controls the heat treatment temperature of the heat treatment device 100 via an SSR (solid state relay) 110. A heater power supply 120 is connected to the SSR 110. Electric power is supplied to the heat treatment device 100 via the SSR 110. The heat treatment device 100 performs heat treatment on a heat treatment object 101 such as a wafer. The heat treatment temperature of the heat treatment device 100 is detected by a temperature sensor 130 and is sent to the temperature regulator 10 as an analog signal.

[0033] The temperature regulator 10 includes, for example, a processor 17, a storage unit 18, and a communication unit 19. The processor 17 includes a CPU, MPU, GPU, DSP, FPGA, ASIC, etc. The storage unit 18 is constituted by, for example, an internal recording medium or an external recording medium. The internal recording medium includes a non-volatile memory, etc. The external recording medium includes a hard disk drive (HDD), a solid state drive (SSD), an optical disc device, etc. The communication unit 19 is constituted by, for example, a communication circuit or a communication module for transmitting and receiving data to and from an external device such as a server.

[0034] The temperature regulator 10 includes an A / D conversion unit 11, a temperature control unit 12, a feature quantity measurement unit 13, and a reception unit 14. The A / D conversion unit 11, the temperature control unit 12, the feature quantity measurement unit 13, and the reception unit 14 are realized, for example, by the processor 17 executing a prescribed program stored in the storage unit 18.

[0035] The heat treatment temperature data of the heat treatment apparatus 100 detected by the temperature sensor 130 is input to the A / D conversion unit 11 as an analog signal. The A / D conversion unit 11 converts the heat treatment temperature data of the heat treatment apparatus 100 input as an analog signal into a digital signal, and transmits it to the temperature control unit 12 and the feature quantity measurement unit 13.

[0036] Based on the target value of the heat treatment temperature of the heat treatment apparatus 100, the temperature control unit 12 sends a control signal (on-off signal) to the SSR 110.

[0037] The feature quantity measurement unit 13 includes an acquisition unit 15 (an example of a second acquisition unit) and a calculation unit 16 (an example of a first calculation unit).

[0038] The acquisition unit 15 is configured to be able to acquire a control waveform. In the present embodiment, as the control waveform, the acquisition unit 15 acquires the time-series data of the heat treatment temperature from the A / D conversion unit 11, and acquires at least any one of the time-series data of the operation amount, current, and duty ratio of the control signal from the temperature control unit 12.

[0039] The calculation unit 16 is configured to be able to calculate a feature quantity based on the control waveform acquired by the acquisition unit 15. Among the calculated feature quantities, there are included the feature quantities of the control waveform of the heat treatment apparatus 100 when the heat treatment temperature is in a stable state and when it is disturbed. The calculated feature quantities are stored, for example, in the storage unit 18 of the temperature regulator 10. In the present embodiment, the calculation unit 16 calculates the feature quantities sequentially without waiting for the acquisition unit 15 to finish acquiring the control waveform.

[0040] In the present embodiment, after the acquisition unit 15 finishes acquiring the control waveform (in other words, after the measurement of the control waveform is completed), the feature quantity measurement unit 13 transmits the calculated feature quantity (for example, only the feature quantity) to the host controller 20 via wired or wireless communication. At this time, the feature quantity measurement unit 13 is configured not to transmit the control waveform acquired by the acquisition unit 15 to the host controller 20 in real time. This is because, for example, when the sampling time is high frequency (e.g., 50 ms), the data volume of the control waveform becomes huge compared to the number of sensors, and the communication load increases. As an example, the feature quantity measurement unit 13 is configured to be able to transmit the current value of the real-time feature quantity (in other words, the latest feature quantity) to the host controller 20 by a communication command from the host controller 20. "Not transmitting in real time" includes transmitting periodically at a cycle longer than the sampling period, and transmitting at a specified timing such as when receiving a data request command from the upper layer.

[0041] Referring to Figures 2 to 4 , an example of the feature quantity that can be calculated based on the control waveform acquired during the temperature rise is shown below. Figure 2 The time-series data of the heat treatment temperature is shown, Figure 3 The time-series data of the operation amount or current of the control signal during heating is shown, Figure 4 The time-series data of the operation amount of the control signal or the duty ratio of the control signal during cooling is shown. In Figure 2 , the target value of the heat treatment temperature is represented by "SP". In Figures 2 to 4 , starting from the waveform acquisition start time T1, the feature quantity measurement unit 13 sequentially calculates and updates the feature quantity. And at the waveform acquisition stop time T2, the latest feature quantity is transmitted to the abnormality determination device 30.

[0042] · Maximum slope of the temperature waveform: Refer to Figure 2 A1 of

[0043] · Minimum slope of the temperature waveform: Refer to Figure 2 B1 of

[0044] · Minimum deviation (undershoot value) of the temperature waveform: Refer to Figure 2 C1 of

[0045] · Maximum deviation (overshoot value) of the temperature waveform: Refer to Figure 2 D1 of

[0046] · Error area from the target temperature in the temperature waveform: Refer to Figure 2 E1, H1 of

[0047] · Overshoot time in the temperature waveform: Refer to Figure 2 F1 of

[0048] · Useless time in the temperature waveform: Refer toFigure 2 of G1

[0049] ·Absolute value average of deviation in temperature waveform: Figure 2 Area of the slanted part (=E1+H1) / Time from waveform acquisition start to stop (=T2-T1)

[0050] ·Steady-state deviation in temperature waveform

[0051] ·Temperature stabilization time

[0052] ·Average operation amount or average current in operation amount waveform (heating): Figure 3 Area of the slanted part (=I1+J1) / Time from waveform acquisition start to stop (=T2-T1)

[0053] ·Operation amount or current at temperature stabilization: Refer to Figure 3 K1 thereof (operation amount or current at temperature stabilization is calculated regardless of waveform measurement start and end)

[0054] ·Maximum operation amount or maximum current: Refer to Figure 3 L1 thereof

[0055] ·Minimum operation amount or minimum current: Refer to Figure 3 M1 thereof

[0056] ·Average operation amount or average current in operation amount waveform (cooling): Figure 4 Area of the slanted part (=N1) / Time from waveform acquisition start to stop (=T2-T1)

[0057] ·Operation amount or current at temperature stabilization: Refer to Figure 4 O1 thereof (operation amount or current at temperature stabilization is calculated regardless of waveform measurement start and end)

[0058] ·Maximum operation amount or maximum duty ratio: Refer to Figure 4 P1 thereof

[0059] ·Minimum operation amount or minimum duty ratio: Refer to Figure 4 Q1 thereof

[0060] ·Current standard deviation

[0061] Refer to Figures 5 to 7 , an example of characteristic quantities that can be calculated based on the control waveform obtained during interference is shown below. Figure 5 Shows the time-series data of the heat treatment temperature, Figure 6 Shows the time-series data of the operation amount or current of the control signal during heating, Figure 7 Shows the time-series data of the operation amount of the control signal or the duty ratio of the control signal during cooling. InFigure 5 In it, the target value of the heat treatment temperature is represented by "SP". In Figures 5 to 7 In it, starting from the waveform acquisition start time T1, the feature quantity measurement unit 13 sequentially calculates and updates the feature quantity. And at the waveform acquisition stop time T2, the latest feature quantity is sent to the abnormality determination device 30.

[0062] · Maximum slope of the temperature waveform: Refer to Figure 5 A2 of

[0063] · Minimum slope of the temperature waveform: Refer to Figure 5 B2 of

[0064] · Minimum deviation (undershoot) of the temperature waveform: Refer to Figure 5 C2 of

[0065] · Maximum deviation (overshoot) of the temperature waveform: Refer to Figure 5 D2 of

[0066] · Error area from the target temperature in the temperature waveform: Refer to Figure 5 G2, H2 of

[0067] · Overshoot time in the temperature waveform: Refer to Figure 5 E2 of

[0068] · Useless time in the temperature waveform: Refer to Figure 5 F2 of

[0069] · Average absolute value of the deviation in the temperature waveform: Figure 5 Area of the slanted part of

[0070] (=G2 + H2) / Waveform acquisition stop time - Waveform acquisition start time (=T2 - T1)

[0071] · Steady-state deviation in the temperature waveform

[0072] · Temperature stabilization time Figure 6 · Average operation amount or average current in the operation amount waveform (heating):

[0073] Area of the slanted part of Figure 6 (=I2 + J2) / Waveform acquisition stop time - Waveform acquisition start time (=T2 - T1)

[0074] · Operation amount or current at temperature stabilization: Refer to Figure 6 K2 of

[0075] · Maximum operation amount or maximum current: Refer to Figure 6 L2 of

[0076] ·Average operation amount or average current in the operation amount waveform (cooling): Figure 7 Area of the slanted part (= N2) / Stop time of waveform acquisition - Start time of waveform acquisition (= T2 - T1)

[0077] ·Operation amount or current when the temperature is stable: Refer to Figure 7 O2 (Calculated regardless of the start and end of waveform measurement for the operation amount or current when the temperature is stable)

[0078] ·Maximum operation amount or maximum duty ratio: Refer to Figure 7 P2 of

[0079] ·Minimum operation amount or minimum duty ratio: Refer to Figure 7 Q2 of

[0080] ·Current standard deviation

[0081] Figure 4 and Figure 7 The "duty ratio of the control signal" in

[0082] For example, includes the duty ratio of the opening / closing signal of the cooling valve. When using an element that operates with current (e.g., a Peltier element) as the cooling unit, the characteristic quantity can be calculated based on the time-series data of "current" instead of the "duty ratio of the control signal".

[0083] The receiving unit 14 is configured to be able to acquire the control signal sent from the upper controller 20. The receiving unit 14 acquires, for example, the target value of the heat treatment temperature of the heat treatment device 100 set according to the control signal sent from the upper controller 20. The acquired target value of the heat treatment temperature of the heat treatment device 100 is sent to the temperature control unit 12 and the characteristic quantity measurement unit 13.

[0084] The abnormality determination device 30 includes an acquisition unit (an example of a first acquisition unit) 31 and a first determination unit 32. The acquisition unit 31 and the first determination unit 32 are implemented, for example, by the processor 21 executing a prescribed program. The prescribed program may be stored in the storage unit 22 of the host controller 20, or a storage unit may be provided in the abnormality determination device 30 and the program may be stored in the storage unit of the abnormality determination device 30.

[0085] The acquisition unit 31 is configured to be able to acquire the feature quantity calculated by the calculation unit 16 of the feature quantity measurement unit 13. In the present embodiment, the acquisition unit 31 is configured to be able to acquire, in addition to the feature quantity, the first threshold value set by the threshold value setting unit 40. The first determination unit 32 determines that the heat treatment device 100 is abnormal when the feature quantity acquired by the acquisition unit 31 exceeds the first threshold value acquired by the acquisition unit 31. When the determination result of the first determination unit 32 is that the heat treatment device 100 is determined to be abnormal, the result is sent as an abnormality signal to the alarm device 140. The alarm device 140 issues an alarm when an abnormality signal is input, notifying that the heat treatment device 100 is abnormal.

[0086] The threshold value setting unit 40 is provided, for example, in an external device such as a server, and is configured to be able to set the first threshold value for abnormality determination by the first determination unit 32. The first threshold value is set, for example, based on the feature quantity calculated by the heat treatment device 10 in a normal and temperature-stable state. The threshold value setting unit 40 is implemented, for example, by the processor of the external device executing a prescribed program. The threshold value setting unit 40 is connected to the host controller 20 in a communicable state. The set first threshold value is sent to the abnormality determination device 30 by wired or wireless communication.

[0087] Refer to Figure 8 and Figure 9 , and an example of the abnormality determination process of the temperature control system 1 will be described. Figure 8 An example of the process of the host controller 20 in the abnormality determination process is shown, Figure 9 and an example of the process of the temperature regulator 10 is shown. As an example, Figure 8 and Figure 9 The abnormality determination process shown is implemented by the processor 21 of the host controller 20 executing a prescribed program stored in the storage unit 22.

[0088] As Figure 8 shown, when the abnormality determination process starts, the host controller 20 sends a waveform acquisition start signal to the temperature regulator 10 (step S1), and starts the heat treatment in the heat treatment device 100 (step S2).

[0089] Then, when the heat treatment in the heat treatment apparatus 100 ends (step S3), the host controller 20 sends a waveform acquisition stop signal to the temperature regulator 10 (step S4), and the abnormality determination device 30 acquires the characteristic quantity calculated by the characteristic quantity measurement unit 13 (step S5).

[0090] When the characteristic quantity is acquired, the abnormality determination device 30 determines whether the acquired characteristic quantity exceeds a first threshold value (step S6). When it is determined that the acquired characteristic quantity exceeds the first threshold value, the abnormality determination device 30 determines that the heat treatment apparatus 100 is abnormal and sends an abnormality signal (step S7). If an abnormality signal is sent, an alarm is sent from the alarm device 140, and the abnormality determination process ends. If it is not determined that the characteristic quantity acquired in step S6 exceeds the first threshold value, the abnormality determination process ends directly.

[0091] As Figure 9 shown, when the abnormality determination process starts, the temperature regulator 10 initializes each part constituting the temperature regulator 10, for example (step S11), and determines whether it has received a waveform measurement start signal sent from the host controller 20 (step S12). Step S12 is repeated until it is determined that the waveform measurement start signal has been received.

[0092] When it is determined that the waveform measurement start signal has been received, the temperature regulator 10 acquires a control waveform and calculates a characteristic quantity based on the acquired control waveform (step S13). After that, the temperature regulator 10 determines whether it has received a waveform measurement stop signal sent from the host controller 20 (step S14). Step S14 is repeated until it is determined that the waveform measurement stop signal has been received.

[0093] When it is determined that the waveform measurement stop signal has been received, the temperature regulator 10 sends the calculated characteristic quantity to the host controller 20 (step S15), and the abnormality determination process ends.

[0094] Refer to Figure 10 , and an example of the threshold setting process of the threshold setting unit 40 will be described. As an example, Figure 10 the threshold setting process shown is implemented by a processor of an external device executing a prescribed program stored in a storage unit of the external device.

[0095] As Figure 10 shown, the threshold setting unit 40 acquires the characteristic quantities calculated based on multiple control waveforms respectively (step S21), and stores the "deviation amount" of the calculated characteristic quantities (step S22). As an example, the standard deviation σ of the stored characteristic quantities, or the difference between the maximum value and the minimum value of the stored characteristic quantities, is set as the "deviation amount". The "deviation amount" of the calculated characteristic quantities is stored in a storage unit of an external device, for example.

[0096] When storing the "deviation amount" of the calculated feature amount, the threshold setting unit 40 sets the first threshold based on the "deviation amount" of the feature amount, for example, by any of the following methods (step S23), and the threshold setting process ends.

[0097] ·Reference waveform specifying method

[0098] Take the feature amount of the control waveform to be the reference (hereinafter referred to as the reference waveform) as the reference value, and with this reference value as the center, set the amplitude of a constant multiple of the "deviation amount" as the first threshold. The first threshold is not limited to the case of having an upper limit value and a lower limit value relative to the reference value, and may also have only an upper limit value or a lower limit value relative to the reference value. The reference waveform is specified by the user, for example.

[0099] ·Average method

[0100] Take the average value of the feature amounts of the control waveforms for multiple times as the reference value, and with this reference value as the center, set the amplitude of a constant multiple of the "deviation amount" as the first threshold. It is not limited to the case of having an upper limit value and a lower limit value relative to the reference value, and may also have only an upper limit value or a lower limit value relative to the reference value.

[0101] The temperature control system 1 of the present disclosure can exhibit the following effects.

[0102] The temperature control system 1 includes: a temperature regulator 10 that controls the heat treatment temperature of the heat treatment apparatus 100; and an abnormality determination device 30 that determines an abnormality of the heat treatment apparatus 100. The abnormality determination device 30 includes: an acquisition unit 31 that can acquire the feature amounts of the control waveforms of the heat treatment apparatus 100 when the heat treatment temperature is in a stable state and when it is disturbed; and a first determination unit 32 that determines that the heat treatment apparatus 100 is abnormal when the feature amounts acquired by the acquisition unit 31 exceed the first threshold. With such a configuration, it is possible to implement the temperature control system 1 that can more accurately determine the possibility of an abnormality of the heat treatment apparatus 100.

[0103] For example, when monitoring the change in the heat treatment temperature waveform, when performing feedback control on the heat treatment temperature, even if the heater capacity or the like changes, the waveform hardly changes, and it is sometimes difficult to perform abnormality detection. In this case, it is sometimes impossible to detect an abnormality of the heat treatment apparatus at the initial stage of operation. In the temperature control system 1, the change in the feature amount of the control waveform (for example, the operation amount waveform) of the heat treatment apparatus 100 is monitored. Therefore, even when performing feedback control on the heat treatment temperature, it is possible to more accurately determine the possibility of an abnormality of the heat treatment apparatus 100.

[0104] For example, when monitoring fluctuations in statistics of the heat treatment temperature (e.g., average temperature, maximum temperature, and minimum temperature), since the reference value is large, there are cases where the relative change becomes small. In such cases, it is difficult to set a threshold value for determining abnormalities in the heat treatment apparatus, and undetected and false detections of abnormalities in the heat treatment apparatus are likely to occur. Also, if the target value of the heat treatment temperature is changed, the threshold value needs to be reset. In the temperature control system 1, fluctuations in the characteristic quantity of the control waveform of the heat treatment apparatus 100 (e.g., a characteristic quantity related to the deviation from the target value of the heat treatment temperature) are monitored. Therefore, the possibility of an abnormality in the heat treatment apparatus 100 can be determined more accurately.

[0105] For example, heat treatment apparatuses such as semiconductor manufacturing apparatuses and large continuous furnaces are always at a high temperature, and the heating timing may be several times or less per year. When monitoring the heating waveform of such a heat treatment apparatus, continuous monitoring is not possible, and undetected and false detections of abnormalities in the heat treatment apparatus may occur. In the temperature control system 1, the characteristic quantity of the control waveform of the heat treatment apparatus 100 during temperature stabilization and during disturbances is monitored. Therefore, even if the heat treatment apparatus 100 is always at a high temperature, the possibility of an abnormality in the heat treatment apparatus 100 can be determined more accurately.

[0106] For example, when monitoring by visually comparing the shapes of the control waveforms of the heat treatment apparatus, since the heat treatment apparatus is monitored manually, it is difficult to perform continuous monitoring, and there may be deviations due to individual differences. Also, assuming continuous monitoring, a large amount of labor cost is required, and the monitoring cost may increase. In the temperature control system 1, software can be used to determine the possibility of an abnormality in the heat treatment apparatus 100 based on the characteristic quantity of the control waveform of the heat treatment apparatus 100. Therefore, the heat treatment apparatus 100 can be continuously and automatically monitored without relying on human labor, and the possibility of an abnormality in the heat treatment apparatus 100 can be determined.

[0107] The temperature control system 1 can arbitrarily adopt any one or more of the following structures. That is, any one or more of the following structures can be arbitrarily deleted when included in the foregoing embodiment, and can be arbitrarily added when not included in the foregoing embodiment. By adopting such a structure, a temperature control system 1 that can more reliably determine the possibility of an abnormality in the heat treatment apparatus 100 can be realized.

[0108] The temperature controller 10 includes: an acquisition unit 15 that can acquire a control waveform; and a calculation unit 16 that can calculate a characteristic quantity based on the control waveform acquired by the acquisition unit 15.

[0109] The abnormality determination device 30 is provided in the host controller 20 that controls the temperature regulator 10. The temperature regulator 10 is configured to be able to send only the calculated characteristic quantity to the host controller 20. For example, when the original waveform data is sequentially communicated from the temperature regulator to the host controller, the data transceiver in the temperature regulation sampling sometimes causes the communication load and MPU (microprocessor) load of the temperature regulator and the host controller to increase. In particular, when the temperature regulator has a large number of channels and measures and monitors a large number of channels (e.g., 32ch) simultaneously, the sampling interval becomes very sparse, so in order to measure an accurate waveform, sometimes expensive high-speed communication equipment is required. With the above structure of the temperature regulation system 1, even when measuring and monitoring multiple channels simultaneously, it is possible to measure a more accurate waveform without using high-efficiency high-speed communication equipment.

[0110] The temperature regulator 10 is configured not to send the control waveform to the host controller 20 in real time. Thereby, the communication load between the temperature regulator 10 and the host controller 20 can be reduced.

[0111] The calculation unit 16 calculates the characteristic quantity sequentially without waiting for the acquisition unit 15 to finish acquiring the control waveform. Thereby, it is not necessary to hold a large amount of timing data, and thus the RAM consumption can be reduced.

[0112] The temperature regulator 10 is configured to be able to send the characteristic quantity to the host controller 20 after the acquisition unit 15 finishes acquiring the control waveform. Thereby, the communication load between the temperature regulator 10 and the host controller 20 can be reduced.

[0113] The control waveform is a temperature waveform or an operation amount waveform.

[0114] The temperature regulation system 1 includes a threshold setting unit 40 that can set a first threshold based on the deviation amount of the characteristic quantities obtained multiple times by the acquisition unit 15.

[0115] The deviation amount is the standard deviation of the characteristic quantities obtained multiple times or the difference between the maximum value and the minimum value.

[0116] The threshold setting unit 40 sets the amplitude of a constant multiple of the deviation amount as the first threshold with the characteristic quantity of the reference control waveform as the center.

[0117] The threshold setting unit 40 sets the amplitude of a constant multiple of the deviation amount as the first threshold with the average value of the characteristic quantities obtained multiple times as the center.

[0118] The abnormality determination method and the abnormality determination device 30 of the present disclosure can achieve the following effects.

[0119] The abnormality determination method includes the following steps. With such a structure, it is possible to more accurately determine the possibility of abnormality of the heat treatment device 100.

[0120] ·Obtain the characteristic quantity of the control waveform of the heat treatment apparatus 100 when in a temperature stable state or when disturbed.

[0121] ·When the obtained characteristic quantity exceeds the first threshold value, it is determined that the heat treatment apparatus 100 is abnormal.

[0122] The abnormality determination device 30 includes: an acquisition unit 31 that can acquire the characteristic quantity of the control waveform of the heat treatment apparatus when in a temperature stable state or when disturbed; and a first determination unit 32 that determines that the heat treatment apparatus 100 is abnormal when the characteristic quantity acquired by the acquisition unit 31 exceeds the first threshold value. With such a configuration, it is possible to implement the abnormality determination device 30 that can more accurately determine the possibility of abnormality of the heat treatment apparatus 100.

[0123] The temperature control system 1 may also be configured as follows.

[0124] The abnormality determination device 30 is not limited to being provided in the upper controller 20. For example, the abnormality determination device 30 may be provided in the temperature regulator 10 or may be provided in an external device such as a server. When the abnormality determination device 30 is provided in the temperature regulator 10, in addition to the calculated characteristic quantity, the determination result regarding the possibility of abnormality of the heat treatment apparatus 100 is also sent to the upper controller 20.

[0125] The abnormality determination device 30 may also include, for example Figure 11 the following configuration shown.

[0126] ·A calculation unit (an example of a second calculation unit) 33 that can calculate the slope of the physical quantity of the heat treatment apparatus 100. The physical quantity is, for example, temperature and is detected by a physical quantity sensor (for example, a temperature sensor). The calculation unit 33 is configured to be able to quantify the physical quantity detected by the physical quantity sensor at fixed time intervals and calculate it as a sampled value. The calculation unit 33 is configured to be able to calculate the slope of the physical quantity of the heat treatment apparatus 100 based on the sampled values after the change amplitude relative to the previous sampled value among the calculated sampled values becomes equal to or greater than the second threshold value.

[0127] ·A second determination unit 34 that determines whether the heat treatment apparatus 100 is abnormal based on the slope value of the physical quantity calculated by the calculation unit 33. The second determination unit 34 determines that the heat treatment apparatus 100 is abnormal, for example, when the maximum value of the slope value of the physical quantity is equal to or greater than the upper threshold value or equal to or less than the lower threshold value.

[0128] For example, if the temperature value after AD conversion using a fixed sampling time width is used to measure the temperature slope, when the temperature changes very slowly, the resolution of the temperature slope decreases. For example, when the sampling width is 1 second, the AD resolution is 0.01 °C, and the input temperature slope is 0.001 °C / second, the maximum slope measurement value is 0.01 °C / second, with a large error. As a result, it is likely that abnormalities in the heat treatment device are not detected or misdetected easily. As a countermeasure, it is considered to extend the sampling time interval and apply a low-pass filter after sampling. However, if neither of the two countermeasures adjusts the parameters in real time according to the slope of the input waveform, an appropriate measurement value cannot be obtained, and sometimes the error increases in the fixed state, so it is not practical.

[0129] In Figure 11 the abnormality determination device 30, when the maximum value among the slope values calculated by the calculation unit 33 is equal to or greater than the upper threshold, or based on the slope value whose maximum value is equal to or less than the lower threshold, it is determined whether the heat treatment device 100 is abnormal. That is, since the sampling does not include the minute changes in the heat treatment temperature in the range where the quantized temperature value does not change, the possibility of abnormality of the heat treatment device 100 can be determined more accurately. In Figure 11 the abnormality determination device 30, sampling is performed at a variable time interval instead of a fixed time interval.

[0130] Refer to Figure 12 to illustrate an example of the slope value sampling process during heating. As an example, Figure 12 the slope value sampling process shown is implemented by the processor 21 executing a prescribed program.

[0131] As Figure 12 shown, when starting the slope value calculation process, the calculation unit 33 performs an initial setting (step S31). An example of the initial setting is shown below.

[0132] · Temperature sampling width dT = 0.1 °C

[0133] · Time sampling width dt = 0.05 seconds

[0134] · Current sampling count i = 0

[0135] · Previous sampling count j = i

[0136] · Initial temperature = current temperature PV(i) = temperature measurement value

[0137] · Slope sampling count k = 1

[0138] When performing the initial setting, the calculation unit 33 updates the current sampling count (i = i + 1) (step S32), and calculates the temperature difference between the current temperature PV(i) and the current temperature PV(j) at the previous sampling (= PV(i) - PV(j)) (step S33). When the temperature difference is calculated, the calculation unit 33 determines whether the calculated temperature difference is equal to or greater than the temperature sampling width dT (step S34). If it is not determined that the calculated temperature difference is equal to or greater than the temperature sampling width dT, the process returns to step S32 to update the sampling count.

[0139] If it is determined that the calculated temperature difference is equal to or greater than the temperature sampling width dT, the calculation unit 33 updates the previous sampling count and the current temperature PV(i) (j = i, PV(j) = PV(i)), and calculates the slope value (k) (step S35). The slope value (k) is calculated by (temperature measurement value at the current sampling - temperature measurement value at the previous sampling) / (current sampling time (time taken until step S35 = yes in the current sampling) - previous sampling time (time taken until step S35 = yes in the current sampling)), that is, by the temperature difference / time difference (= dt × (i - j)) calculated in step S33.

[0140] When the slope value (k) is calculated, the calculation unit 33 updates the slope sampling count (k = k + 1) (step S36), and determines whether the slope value calculation process has ended (step S37). If it is not determined that the slope value calculation process has ended, the process returns to step S32 to update the sampling count.

[0141] In Figure 12 In the slope value sampling process, when the heat treatment temperature has decreased from the current temperature PV(i), if the current temperature PV(i) is not updated, it may not be possible to accurately calculate the slope value. To solve this problem, for example, a step of determining whether the current temperature PV(i) is less than the current temperature PV(j) at the previous sampling (PV(i) < PV(j)) can be added between step 32 and step S33. In this step, if it is determined that the current temperature PV(i) is less than the current temperature PV(j) at the previous sampling, the previous sampling count and the current temperature PV(i) are updated (j = i, PV(j) = PV(i)), and the process returns to step S32. If it is not determined that the current temperature PV(i) is less than the current temperature PV(j) at the previous sampling, the process proceeds to step S33. By adding the above step, the slope value can be calculated more accurately.

[0142] Figure 12 The slope value sampling process shown is not limited to the heating process, and can also be applied to the slope value sampling process during cooling.

[0143] Figure 11The abnormality determination device 30 can also be configured as follows.

[0144] · It may also include a maximum slope calculation unit 35 (see Figure 13 ). The maximum slope calculation unit 35 is configured to take the slope value of the physical quantity calculated by the calculation unit 33 as input, perform peak holding processing, and be able to calculate the maximum slope value. Peak holding is not limited to the positive side peak, and can also be processing for the negative side peak. In this case, it becomes a negative maximum slope.

[0145] · The calculated slope value and / or the maximum slope value may also be able to be sent to other external devices 200 communicatively connected to the abnormality determination device 30 (see Figure 13 ).

[0146] · It may also include a user interface unit 36 (see Figure 13 ). The user interface unit 36 may also be configured, for example, to enable a user to change the second threshold, the upper limit threshold, and the lower limit threshold.

[0147] · The user interface unit 36 may also be able to display the calculated slope value and / or the maximum slope value.

[0148] · The abnormality determination device 30 may also be configured, for example, to start measuring a physical quantity according to a measurement start command and end measuring the physical quantity according to a measurement end command. The measurement start command and the measurement end command may also be able to be sent from the external device 200 to the abnormality determination device 30, for example.

[0149] Figure 13 An example of a temperature control system 1 including the abnormality determination device 30 having the maximum slope calculation unit 35 and the user interface unit 36 is shown. In Figure 13 's temperature control system 1, the A / D conversion unit 11 and the alarm unit 140 are provided in the abnormality determination device 30. The abnormality determination device 30 includes a control device 301 including a processor 37 and a storage unit 38, and a communication unit 39. The calculation unit 33, the maximum slope calculation unit 35, and the second determination unit 34 are implemented, for example, by the processor 37 executing a prescribed program. The processor 37 includes a CPU, MPU, GPU, DSP, FPGA, ASIC, etc. The storage unit 38 is composed of an internal recording medium or an external recording medium, for example. The internal recording medium includes a non-volatile memory, etc. The external recording medium includes a hard disk drive (HDD), a solid state drive (SSD), an optical disc device, etc. The communication unit 39 is composed of a communication circuit or a communication module for data transmission and reception with an external device such as a server, for example.

[0150] In Figure 13In the abnormality determination device 30, the temperature regulator 10 does not include an acquisition unit 15 and a calculation unit 16. The heat treatment temperature data of the heat treatment device 100 detected by the temperature sensor 130 is sent to the calculation unit 33 via the A / D conversion unit 11. The slope value of the heat treatment temperature calculated by the calculation unit 33 is sent to the maximum slope calculation unit 35. The maximum slope value calculated by the maximum slope calculation unit 35 is sent to the second determination unit 34, the user interface unit 36, and the communication unit 39. The user interface unit 36 sends an upper limit threshold and / or a lower limit threshold to the second determination unit 34.

[0151] In this way, the abnormality determination device 30 can include both the first determination unit 32 and the second determination unit 34, or can include only the first determination unit 32 or only the second determination unit 34.

[0152] The acquisition unit 15, the calculation unit 16, and the threshold setting unit 40 of the temperature regulator 10 can be omitted.

[0153] The temperature regulator 10 can also be configured to send a control waveform to the upper controller 20 in real time.

[0154] The calculation unit 16 of the temperature regulator 10 is not limited to the case where it sequentially calculates the characteristic quantities without waiting for the acquisition unit 15 to finish acquiring the control waveform, and can also be configured to wait for the acquisition unit 15 to finish acquiring the control waveform and then sequentially calculate the characteristic quantities.

[0155] The temperature regulator 10 is not limited to the case where it can send the characteristic quantities to the upper controller 20 after the acquisition unit 15 finishes acquiring the control waveform, and can also be configured to be able to send the characteristic quantities to the upper controller 20 before the acquisition unit 15 finishes acquiring the control waveform.

[0156] The first threshold is not limited to the case where it is set by the Figure 10 processing shown, and can also be set by other methods.

[0157] The abnormality determination method of the present disclosure can be executed by a computer. That is, the present disclosure includes a program for causing a computer to execute the abnormality determination method, and a computer-readable storage medium storing the program for causing a computer to execute the abnormality determination method.

[0158] As described above, various embodiments in the present disclosure have been described in detail with reference to the drawings. Finally, various aspects of the present disclosure are described. In the following description, as an example, reference numerals are also added for description.

[0159] The temperature control system 1 of the first aspect of the present disclosure includes: a temperature controller 10 that controls the heat treatment temperature of a heat treatment apparatus; and an abnormality determination device 30 that determines an abnormality of the heat treatment apparatus. The abnormality determination device 30 includes: a first acquisition unit that can acquire characteristic amounts of a control waveform of the heat treatment apparatus when the heat treatment temperature is in a stable state and when it is disturbed; and a first determination unit that determines that the heat treatment apparatus is abnormal when the characteristic amounts acquired by the first acquisition unit exceed a first threshold value.

[0160] The temperature control system 1 of the second aspect of the present disclosure is based on the temperature control system 1 of the first aspect. The temperature controller 10 includes: a second acquisition unit that can acquire the control waveform; and a first calculation unit that can calculate the characteristic amounts based on the control waveform acquired by the second acquisition unit.

[0161] The temperature control system 1 of the third aspect of the present disclosure is based on the temperature control system 1 of the second aspect. The abnormality determination device 30 is provided in a controller that controls the temperature controller 10, and the temperature controller 10 is configured to be able to send only the calculated characteristic amounts to the controller.

[0162] The temperature control system 1 of the fourth aspect of the present disclosure is based on the temperature control system 1 of the third aspect. The temperature controller 10 is configured not to send the control waveform to the controller in real time.

[0163] The temperature control system 1 of the fifth aspect of the present disclosure is based on the temperature control system 1 of any one of the second to fourth aspects. The first calculation unit calculates the characteristic amounts in sequence without waiting for the acquisition of the control waveform by the second acquisition unit to end.

[0164] The temperature control system 1 of the sixth aspect of the present disclosure is based on the temperature control system 1 of any one of the third to fifth aspects. The temperature controller 10 is configured to be able to send the characteristic amounts to the controller after the acquisition of the control waveform by the second acquisition unit ends.

[0165] The temperature control system 1 of the seventh aspect of the present disclosure is based on the temperature control system 1 of any one of the first to sixth aspects. The control waveform is a temperature waveform or an operation amount waveform.

[0166] The temperature control system 1 of the eighth aspect of the present disclosure is based on the temperature control system 1 of any one of the first to seventh aspects, and includes a threshold setting unit 40 that can set the first threshold value based on a deviation amount of the characteristic amounts acquired multiple times by the first acquisition unit.

[0167] Based on the temperature regulation system 1 of the eighth aspect, in the ninth aspect of the present disclosure, the deviation amount is the standard deviation of multiple times of the characteristic amount or the difference between the maximum value and the minimum value.

[0168] Based on the temperature regulation system 1 of the eighth or ninth aspect, in the tenth aspect of the present disclosure, the threshold setting unit 40 sets the amplitude of a constant multiple of the deviation amount as the first threshold with the characteristic amount of the control waveform serving as the reference.

[0169] Based on the temperature regulation system 1 of any one of the eighth to tenth aspects, in the eleventh aspect of the present disclosure, the threshold setting unit 40 sets the amplitude of a constant multiple of the deviation amount as the first threshold with the average value of multiple times of the characteristic amount serving as the reference.

[0170] Based on the temperature regulation system 1 of any one of the first to eleventh aspects, in the twelfth aspect of the present disclosure, the abnormality determination device 30 includes: a second calculation unit that can quantify the physical quantity of the heat treatment device at a fixed time interval to calculate a sampling value, and can calculate the slope of the physical quantity based on the sampling value after the change amplitude relative to the previous sampling value among the calculated sampling values becomes equal to or greater than a second threshold; and a second determination unit 34 that determines whether the heat treatment device is abnormal based on the slope of the physical quantity calculated by the second calculation unit.

[0171] In the abnormality determination method of the thirteenth aspect of the present disclosure, the characteristic amount of the control waveform of the heat treatment device in a temperature stable state or when being interfered is obtained, and when the obtained characteristic amount exceeds the first threshold, it is determined that the heat treatment device is abnormal.

[0172] The abnormality determination device 30 of the fourteenth aspect of the present disclosure includes: a first acquisition unit that can acquire the characteristic amount of the control waveform of the heat treatment device in a temperature stable state or when being interfered; and a first determination unit that determines that the heat treatment device is abnormal when the characteristic amount acquired by the first acquisition unit exceeds the first threshold.

[0173] The first to fourteenth aspects can be implemented by a computer program, or can be implemented by any combination of a system, a method, a device, and a computer program.

[0174] By appropriately combining any of the above-described various embodiments or modified examples, the effects that each has can be achieved. Moreover, combinations of embodiments with each other, combinations of examples with each other, or combinations of embodiments and examples can be made, and combinations of features in different embodiments or examples can also be made.

[0175] This disclosure has been fully described with reference to the accompanying drawings and in association with preferred embodiments, but various modifications and corrections will be obvious to those skilled in the art. It should be understood that such modifications and corrections are included therein as long as they do not depart from the scope of this disclosure according to the appended claims.

[0176] [Industrial Applicability]

[0177] The temperature control system, abnormality determination method, and abnormality determination device of this disclosure can be applied, for example, to the abnormality determination of semiconductor manufacturing devices.

[0178] Reference Signs Explanation

[0179] 1 Temperature control system

[0180] 10 Temperature regulator

[0181] 11 A / D conversion unit

[0182] 12 Temperature control unit

[0183] 13 Feature quantity measurement unit

[0184] 14 Receiver

[0185] 15 Acquisition unit

[0186] 16 Calculation unit

[0187] 17 Processor

[0188] 18 Storage unit

[0189] 19 Communication unit

[0190] 20 Host controller

[0191] 21 Processor

[0192] 22 Storage unit

[0193] 23 Communication unit

[0194] 30 Abnormality determination device

[0195] 31 Acquisition unit

[0196] 32 First determination unit

[0197] 33 Calculation unit

[0198] 34 Second determination unit

[0199] 35 Maximum slope calculation unit

[0200] 36 User interface unit

[0201] 37 Processor

[0202] 38 Storage unit

[0203] 39 Communication unit

[0204] 40 Threshold setting unit

[0205] 100 Heat treatment device

[0206] 101 Heat treatment object such as a wafer

[0207] 120 Heater power supply

[0208] 130 Temperature sensor

[0209] 140 Alarm device

[0210] 200 External device

[0211] 301 Control device

Claims

1. A temperature control system, comprising: A temperature regulator that controls the heat treatment temperature of a heat treatment apparatus; and An abnormality determination device that determines an abnormality of the heat treatment apparatus, The abnormality determination device includes: A first acquisition unit that can acquire characteristic quantities of a control waveform of the heat treatment apparatus when the heat treatment temperature is in a stable state and when it is disturbed; and A first determination unit that determines that the heat treatment apparatus is abnormal when the characteristic quantity acquired by the first acquisition unit exceeds a first threshold value.

2. The temperature control system according to claim 1, wherein The temperature regulator includes: A second acquisition unit that can acquire the control waveform; and A first calculation unit that can calculate the characteristic quantity based on the control waveform acquired by the second acquisition unit.

3. The temperature control system according to claim 2, wherein The abnormality determination device is provided in a controller that controls the temperature regulator, The temperature regulator is configured to be able to send only the calculated characteristic quantity to the controller.

4. The temperature control system according to claim 3, wherein The temperature regulator is configured not to send the control waveform to the controller in real time.

5. The temperature control system according to any one of claims 2 to 4, wherein The first calculation unit calculates the characteristic quantities in sequence without waiting for the second acquisition unit to finish acquiring the control waveform.

6. The temperature control system according to claim 3 or 4, wherein The temperature regulator is configured to be able to send the characteristic quantity to the controller after the second acquisition unit finishes acquiring the control waveform.

7. The temperature control system according to any one of claims 1 to 6, wherein The control waveform is a temperature waveform or an operation amount waveform.

8. The temperature control system according to any one of claims 1 to 7, wherein The temperature control system includes a threshold setting unit that can set the first threshold based on the deviation amount of the characteristic quantities obtained multiple times by the first acquisition unit.

9. The temperature control system according to claim 8, wherein The deviation amount is the standard deviation of the characteristic quantities obtained multiple times or the difference between the maximum value and the minimum value.

10. The temperature control system according to claim 8 or 9, wherein The threshold setting unit sets the amplitude of a constant multiple of the deviation amount as the first threshold with the characteristic quantity of the control waveform serving as a reference.

11. The temperature control system according to any one of claims 8 to 10, wherein The threshold setting unit sets the amplitude of a constant multiple of the deviation amount as the first threshold with the average value of the characteristic quantities obtained multiple times serving as a reference.

12. The temperature control system according to any one of claims 1 to 11, wherein The abnormality determination device includes: A second calculation unit that can quantify physical quantities of the heat treatment device at fixed time intervals to calculate sampled values, and can calculate the slope of the physical quantity based on the sampled values among the calculated sampled values, after the change amplitude relative to the previous sampled value becomes equal to or greater than a second threshold; and A second determination unit that determines whether the heat treatment device is abnormal based on the slope of the physical quantity calculated by the second calculation unit.

13. An abnormality determination method, wherein, Obtain characteristic quantities of the control waveform of the heat treatment device when in a temperature stable state or when disturbed, When the obtained characteristic quantity exceeds a first threshold, it is determined that the heat treatment device is abnormal.

14. An abnormality determination device, comprising: A first acquisition unit that can acquire characteristic quantities of the control waveform of the heat treatment device when in a temperature stable state or when disturbed; and A first determination unit that determines that the heat treatment device is abnormal when the characteristic quantity acquired by the first acquisition unit exceeds a first threshold.

Citation Information

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