Device and method for correcting working distance deviation of focused charged particle beam

Abstract

The invention discloses a focusing charged particle beam working distance deviation correction device and correction method, and the device comprises a standard marking plate which is provided with a mark for position detection and a mark for beam spot shape and size detection; the control module is used for controlling the focused charged particle beam to draw a pattern on the surface of the substrate, scanning a mark on the standard mark plate, processing data acquired by the scanning detection module, and calculating and generating correction parameters; the scanning detection module is used for generating a scanning signal and detecting and calculating the scanning position of the mark or the beam spot size of the focused charged particle beam; the distance detection module is used for detecting and calculating the working distance change of the focused charged particle beam; the correction module is used for performing correction calculation on the scanning signals by applying the correction model and the correction parameters of the control module; and the execution module is used for converting the signal output by the correction module into an actual driving signal to adjust the particle beam. The device has the advantages of simple structure, easiness in implementation, high correction and adjustment speed, high precision and the like.

Description

Technical Field

[0001] The present invention mainly relates to the technical field of focused charged particle beam micro-nano processing equipment, and in particular to a focused charged particle beam working distance deviation correction device and correction method. Background Art

[0002] Focused charged particle beam micro-nano processing equipment uses electromagnetic fields to constrain high-energy charged particles to draw patterns on the substrate surface. The distance between the center of the last-stage electromagnetic lens (hereinafter referred to as the final lens) of the focused charged particle beam and the substrate surface (hereinafter referred to as the working distance) should be kept fixed. However, due to errors in substrate disk processing, installation, substrate tilting, or slight warping deformation of the substrate itself, the substrate surface and the ideal working plane cannot completely coincide. The shape, size, and range of particle beam deflection of the focused charged particle beam spot are generally calibrated and calibrated on a standard marking plate located on the workpiece table or substrate disk. Therefore, when the focused charged particle beam draws patterns at different positions on the substrate, the actual working distance will inevitably be different from the working distance on the standard marking plate. The deviation of the working distance will cause the size of the focused charged particle beam spot to change, and the position of the particle beam deflection will also change when drawing the pattern, which will cause the size and position deviation of the pattern. The size of the deviation varies according to different electromagnetic lens systems and can reach 25nm / um. This is unacceptable for some precision graphics processing, and it is necessary to detect the deviation of this working distance and correct it.

[0003] The deviation of the working distance can be detected by a method based on laser beam reflection, and then compensated according to the deviation between the detected working distance and the working distance on the standard marking plate. The usual compensation method is to adjust the working plane, that is, to move the substrate up and down by a corresponding small distance. For example, the document with application number 201811220010.0 discloses a method for adjusting the height of the substrate, by setting a Z worktable and adjusting the displacement of the worktable in the Z direction, so that the deviation between the detected substrate surface height and the marked substrate surface height is within a certain threshold range. The method of compensating the deviation of the working distance of the focused charged particle beam by setting the Z worktable and adjusting the Z displacement is suitable for scenes with a large deviation range and no frequent adjustment. Because the Z displacement of the worktable requires mechanical movement, it is difficult to control the accuracy of the mechanical displacement to within the range of microns or even sub-microns. Inaccurate Z displacement is difficult to fully compensate for the small deviation of the working distance, and even brings about a larger deviation; the speed of mechanical displacement adjustment is difficult to increase, which will increase the overall time for the focused charged particle beam to draw the graphics and reduce efficiency. On the other hand, setting up a Z-axis worktable requires additional structures, power and control devices, which increases the complexity of the system and also affects the size, load-bearing capacity, vacuum, thermal balance, etc. of the cavity. For focused charged particle beam micro-nano processing applications, the deviation of the working distance is usually not large (for example, no more than 200 microns), but it requires frequent dynamic adjustments. Summary of the invention

[0004] In view of the technical problems existing in the prior art, the present invention provides a device and method for correcting the working distance deviation of a focused charged particle beam, which can improve the accuracy of drawing patterns on the surface of a substrate.

[0005] In order to solve the above technical problems, the technical solution proposed by the present invention is:

[0006] A focused charged particle beam working distance deviation correction device, comprising:

[0007] A standard marking plate, provided with marks for position detection and marks for beam spot shape and size detection;

[0008] A control module is used to control the focused charged particle beam to draw a pattern on the substrate surface and scan the mark on the standard mark plate, and process the data collected by the scanning detection module to calculate and generate correction parameters;

[0009] A scanning detection module, used to generate a scanning signal according to the output data of the control module, and determine the scanning position of the mark or the beam spot size of the focused charged particle beam by detecting the signal generated when scanning the mark;

[0010] A distance detection module is used to calculate the change in the working distance of the focused charged particle beam by detecting the displacement of the reflected light spot after the laser is obliquely incident on the substrate or the marking plate;

[0011] A correction module, used for applying the correction model and correction parameters of the control module to perform correction calculation on the scanning signal;

[0012] The execution module is used to convert the signal output by the correction module into an actual driving signal to adjust the particle beam.

[0013] Preferably, the standard marking plate is a fixed marking plate located on the workpiece table or substrate disk, and the fixed marking plate has a plurality of step structures, and each step is provided with a position mark and a beam spot mark.

[0014] Preferably, the standard marking plate is a movable marking substrate, on the surface of which position marks and beam spot marks are arranged at different positions with a large distance between them, and the standard marking plate is placed obliquely on the substrate disk.

[0015] Preferably, the scanning detection module includes a scanning generator, a particle signal detector and a calculation unit; the scanning generator generates deflection position signals in the X and Y directions according to the instructions of the control module, and outputs to control the deflection of the focused charged particle beam; the particle signal detector detects the particle intensity signal scattered from the surface or inside of the mark when scanning the mark, and processes the signal; the calculation unit calculates the center position data of the mark, or the size data of the beam spot, based on the changing characteristics of the detection signal at the edge of the mark and the scanning position signal given by the control module, and feeds back to the control module.

[0016] Preferably, the distance detection module comprises a plurality of groups of laser transmitters and laser receivers; the angle between the axes of the laser transmitters and the laser receivers is between 45° and 90°.

[0017] The present invention also discloses a correction method based on the above-mentioned focused charged particle beam working distance deviation correction device, comprising the steps of:

[0018] S1, pre-perform a working distance deviation correction operation to calculate correction parameters, and transmit them to a correction module;

[0019] S2, moving the workpiece stage to the first positioning deflection field of the pattern to be drawn on the substrate;

[0020] S3, obtaining the working distance of the current positioning deflection field;

[0021] S4, the correction module calculates the compensation amount of the execution module in combination with the correction parameters and the current working distance, and synchronously compensates the particle beam focus position and the deflection position of the current positioning deflection field;

[0022] S5, move the workpiece stage to the next positioning deflection field of the pattern to be drawn on the substrate, and go to S3 to execute the loop until the patterns of all positioning deflection fields are drawn.

[0023] Preferably, step S1 adjusts the beam spot size and deflection position of the focused charged particle beam by scanning the mark on the standard mark plate to achieve a desired state; and calculates and generates correction parameters using a correction model between the compensation amount and the working distance. The specific process is as follows:

[0024] S11, setting calibration program parameters;

[0025] S12, moving the workpiece stage to the first height marking area of ​​the standard marking plate or the first marking area of ​​the marking substrate;

[0026] S13, measure the working distance at that location;

[0027] S14, moving the workpiece stage a short distance to the beam spot mark position marked there, performing automatic fine focusing operation, adjusting the setting value of the final lens to minimize the detected beam spot size, and obtaining the optimal setting value of the final lens at the current working distance;

[0028] S15, moving the workpiece stage a short distance to the marked position, performing a deflection field correction operation, adjusting the correction coefficient of the deflection field so that the deviation between the actual position of the particle beam deflection and the expected position is within a preset range, and obtaining the correction parameter of the deflection field at the current working distance;

[0029] S16, move the workpiece stage to the next set marking area, and go to S13 to execute the loop until all the set marking areas are measured;

[0030] S17, using the set values ​​and correction parameter data of the actuator at different working distances obtained in the above steps, and calculating the correction model parameters of the compensation amount of the actuator with respect to the working distance according to the correction model;

[0031] S18, saving the calibration model parameters related to the working distance, and transmitting them to the calibration module for application.

[0032] Preferably, in steps S3 and S13, when measuring the working distance, the workpiece stage is moved a small distance so that the light spot of the measuring laser incident on the surface to be measured is located at multiple positions evenly distributed in the positioning deflection field, and the working distance data of the above multiple positions are detected and the average is taken as the final working distance.

[0033] Preferably, in step S17, the correction parameters of the adjustment amount ΔF of the final lens setting value with respect to the working distance, the adjustment amounts of the gain coefficients of the positioning deflection field in the X and Y directions, and the adjustment amounts of the rotation coefficients with respect to the working distance are calculated.

[0034] Preferably, in step S17, the correction model for calculating the actuator setting value and the correction parameter adjustment amount with respect to the working distance adopts a linear function, namely:

[0035] δy=f(δh)=k×δh+b

[0036] Where δy is the adjustment amount, δh is the change in working distance, and k and b are the parameters of the correction model.

[0037] Compared with the prior art, the advantages of the present invention are:

[0038] The focused charged particle beam working distance deviation correction device and correction method of the present invention have the following advantages:

[0039] (1) Simple structure and easy to implement. The correction device provided by the present invention relies on the existing hardware structure of the focused charged particle beam processing equipment. It only needs to add an additional standard marking plate with a height mark, cooperate with the correction program running in the control module and the digital correction circuit located in the correction module, so as to realize the dynamic correction function of the working distance deviation. No other structures need to be added, it is easy to implement, and has no other adverse effects on the system.

[0040] (2) The correction and adjustment speed is fast. The correction method provided by the present invention compensates for the focus position and deflection position deviation of the focused charged particle beam by synchronously adjusting the fine focus lens setting value, the X and Y axis gain coefficients of the positioning deflection field, and the X and Y axis rotation coefficients. It is essentially an electrical adjustment with a fast adjustment speed. On the other hand, the correction calculation of the correction method provided by the present invention is a digital circuit built by the internal computing resources of the FPGA. The correction calculation process is synchronized with the data transmission and is output synchronously by the clock pulse. It does not add additional calculation delays and does not affect the update rate of the output data, thereby not affecting the drawing speed of the focused charged particle beam.

[0041] (3) High accuracy of correction. First, the detection accuracy of the working distance is high. The measurement error is reduced by using two groups of lasers to cross-shoot and take the average data of two groups. For each group of lasers, the detection accuracy of the working distance is further improved by detecting the working distance data of multiple positions evenly distributed in the positioning deflection field and taking the average. Secondly, the correction and compensation are comprehensive: the automatic fine-tuning program, the positioning deflection field correction program and the optional graphic drawing field correction program are respectively executed at different working distances to obtain the optimal parameters at the working distance, and then these parameters are adjusted at different working distances. The compensation amount includes the focal position of the focused charged particle beam, the gain of the deflection in two directions, and the rotation angle, so that the size of the beam spot and the position of the deflection are effectively corrected, thereby improving the accuracy of the graphic drawing on the substrate surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 It is a block diagram of the correction device of the present invention in an embodiment.

[0043] Figure 2 The diagram is a structural diagram of the standard marking plate in an embodiment of the present invention; (a) is a front view of the fixed marking plate; (b) is a top view of the fixed marking plate; (c) is a side view of the fixed marking plate; (d) is a top view of the movable marking plate; and (e) is a side view of the fixed marking plate.

[0044] Figure 3 The figure is a flow chart of a correction method in an embodiment of the present invention.

[0045] Figure 4 The figure is a flow chart of the method for obtaining correction parameters in the present invention. DETAILED DESCRIPTION

[0046] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments.

[0047] like Figure 1 As shown, the working distance deviation correction device for a focused charged particle beam provided by an embodiment of the present invention includes:

[0048] A standard marking plate, provided with a mark for position detection (hereinafter referred to as position mark) and a mark for beam spot shape and size detection (hereinafter referred to as beam spot mark);

[0049] A control module is used to control the focused charged particle beam to draw a pattern on the substrate surface, or scan a mark on a standard marking plate, process the data collected by the detection module, and calculate and generate correction parameters;

[0050] A scanning detection module, used to generate a scanning signal according to the output data of the control module, and determine the scanning position of the mark or the beam spot size of the focused charged particle beam by detecting the signal generated when scanning the mark;

[0051] A distance detection module is used to calculate the change in the working distance of the focused charged particle beam by detecting the displacement of the reflected light spot after the laser is obliquely incident on the substrate or the marking plate;

[0052] A correction module, used for applying the correction model and correction parameters of the control module to perform correction calculation on the scanning signal;

[0053] The execution module is used to convert the output of the correction module into an actual driving signal to adjust the particle beam, including the deflector and the final lens.

[0054] like Figure 2As shown, the standard marking plate has position marks and beam spot marks (hereinafter referred to as height marks) of different heights (three or more) arranged in the same small area (e.g., a square area with a side length of 1 mm), which can be a fixed marking plate located on the workpiece table or substrate disk, with a plurality of (three or more) step structures on the plate, and position marks and beam spot marks are arranged on each step. It can also be a movable marking substrate, on the surface of which position marks and beam spot marks are arranged at different positions (three or more) separated by a large distance, and a slight tilt angle must be set to place it on the substrate disk.

[0055] Specifically, the control module includes control hardware and control software, wherein the control hardware can be a computer, an onboard embedded system, a programmable logic controller, or a combination of multiple thereof. The control module can execute a graphics drawing program or a correction program in a time-sharing manner, and the correction program adjusts the beam spot and the deflection position of the focused charged particle beam to achieve a desired state at different working distances, obtains the compensation amount of the execution module at different working distances, adopts a correction model between the compensation amount and the working distance, generates correction parameters, and transmits them to the correction module.

[0056] Specifically, the scanning detection module includes a scanning generator, a particle signal detector and a calculation unit. The scanning generator generates X and Y direction deflection position signals according to the control module instructions, and outputs the control focused charged particle beam deflection; the particle signal detector can detect the particle intensity signal scattered from the surface or inside of the mark when scanning the mark, and filter, enhance, reduce noise and other processing on the signal; the calculation unit calculates the center position data of the mark or the size data of the beam spot according to the change characteristics of the detection signal at the edge of the mark, combined with the scanning position signal given by the control module, and feeds back to the control module.

[0057] Specifically, the laser transmitter and receiver of the distance detection module can be set in one or two groups. The spot position of the laser incident on the substrate must be kept within a certain deviation range directly below the final lens. In order to improve the accuracy of working distance detection, two groups can be set that are mutually irradiated and maintain a certain angle (45° to 90°), and the average value of the two groups of measurement data is taken.

[0058] Specifically, the correction module adopts FPGA for digital correction, and uses multiple multipliers and adders of its internal DSP unit to build a digital correction calculation circuit to realize the correction calculation model (where the correction coefficient is provided by the control module); different correction calculations are processed in parallel within the correction module, and are transmitted to the adder for addition after being triggered by the synchronous clock, and then output to the execution module to adjust the particle beam.

[0059] Specifically, the deflector of the execution module controls the deflection of the particle beam to draw graphics or scan marks. The deflectors are respectively arranged along the X and Y directions to control the deflection position of the particle beam in the X and Y directions respectively. Preferably, two groups of deflectors can be arranged in each direction, one of which is used to deflect and position the beam spot, and its deflection range (hereinafter referred to as the positioning deflection field) is relatively large (such as ±500um) but slow; the other group is used to reciprocately draw graphics, and its deflection range (hereinafter referred to as the graphics drawing field) is relatively small (such as ±2um) but fast; the two groups cooperate to achieve graphics drawing in a larger range.

[0060] Among them, the final lens of the execution module is also divided into two coaxial settings, one of which adjusts the up and down movement range of the particle beam focus to be larger but slower (hereinafter referred to as the coarse focusing lens), and the other adjusts the up and down movement range of the particle beam focus to be smaller but faster (hereinafter referred to as the fine focusing lens). The two cooperate to achieve focus adjustment within a larger range and fast dynamic adjustment within a smaller range. When adjusting the focus of the focused charged particle beam, the fine focusing lens is adjusted first.

[0061] like Figure 3 As shown, an embodiment of the present invention further provides a correction method based on the working distance deviation correction device for a focused charged particle beam as described above, by using a standard marking plate, adjusting the beam spot size and deflection position of the focused charged particle beam at different working distances, and using a correction model between the compensation amount and the working distance to generate correction parameters. When drawing a pattern on a substrate, the correction module calculates the compensation amount of the execution module in combination with the correction parameters and the current actual working distance, and synchronously compensates the focus position and deflection position of the particle beam, correcting the influence of the working distance deviation on the size and position of the drawn pattern.

[0062] The above correction method specifically comprises the following steps:

[0063] S1. Pre-execute the working distance deviation correction program, calculate the correction parameters, and transmit them to the correction module;

[0064] S2, execute the graphics drawing program, move the workpiece stage to the first positioning deflection field of the graphics to be drawn on the substrate;

[0065] S3, obtaining the working distance of the current positioning deflection field;

[0066] S4, the correction module calculates the compensation amount of the execution module in combination with the correction parameters and the current working distance, and synchronously compensates the particle beam focus position and the deflection position of the current positioning deflection field;

[0067] S5, move the workpiece stage to the next positioning deflection field of the pattern to be drawn on the substrate, and go to S3 to execute the loop until the patterns of all positioning deflection fields are drawn.

[0068] like Figure 4 As shown, step S1 adjusts the beam spot size and deflection position of the focused charged particle beam by scanning the mark on the standard mark plate to achieve the desired state, and uses the correction model between the compensation amount and the working distance to calculate and generate the correction parameters. The specific process is:

[0069] S11, setting calibration program parameters, including selecting the standard marking plate type, setting the number of measuring points, setting the position and spacing of the markings used, etc.;

[0070] S12, moving the workpiece stage to the first height marking area of ​​the standard marking plate (when a fixed marking plate is used) or the first marking area of ​​the marking substrate (when a movable marking substrate is used);

[0071] S13, measure the working distance at that location;

[0072] S14, moving the workpiece stage a short distance to the beam spot mark position marked there, executing the automatic fine-focusing program, adjusting the setting value of the final lens to minimize the detected beam spot size, and obtaining the optimal setting value of the final lens at the current working distance;

[0073] S15, moving the workpiece stage to the position marked at the location in a small distance, executing the deflection field correction program, adjusting the correction coefficient of the positioning deflection field, so that the deviation between the actual position of the particle beam deflection and the expected position is within a certain allowable range, and obtaining the correction parameters of the deflection field at the current working distance; preferably, only the positioning deflection field correction is performed; optionally, in order to further improve the correction accuracy, the graphic drawing field correction program can be further executed to obtain the correction parameters of the graphic drawing field at the current working distance;

[0074] S16, move the workpiece stage to the next set marking area, and go to S13 to execute the loop until all the set marking areas are measured;

[0075] S17, using the set values ​​and correction parameter data of the actuator at different working distances obtained in the above steps, and calculating the correction model parameters of the compensation amount of the actuator with respect to the working distance according to the correction model;

[0076] S18, saving the calibration model parameters related to the working distance, and transmitting them to the calibration module for application.

[0077] When measuring the working distance in steps S3 and S13, the workpiece stage is moved a small distance so that the light spots of the measuring laser incident on the surface to be measured are respectively located at multiple positions evenly distributed in the positioning deflection field (such as Figure 2 As shown), the working distance data of the above-mentioned multiple positions are detected and the average is taken to improve the accuracy of working distance detection.

[0078] In step S17, the correction parameters of the adjustment amount ΔF of the final lens setting value with respect to the working distance, the adjustment amounts of the gain coefficients (ΔGx and ΔGy) in the X and Y directions of the positioning deflection field, and the adjustment amounts of the rotation coefficients (ΔRx and ΔRy) with respect to the working distance are calculated. Optionally, if the graphic drawing field correction procedure is executed, the correction parameters of the gain coefficients (δgx and δgy) in the X and Y directions of the graphic drawing field and the rotation coefficients (δrx and δry) with respect to the working distance are additionally calculated.

[0079] The correction model for calculating the actuator setting value and the correction parameter adjustment amount with respect to the working distance in step S17 adopts a linear function, namely:

[0080] δy=f(δh)=k×δh+b

[0081] Where δy is the adjustment amount, δh is the change in working distance, and k and b are the parameters of the correction model.

[0082] The focused charged particle beam working distance deviation correction device and correction method of the present invention have the following advantages:

[0083] (1) Simple structure and easy to implement. The correction device provided by the present invention relies on the existing hardware structure of the focused charged particle beam processing equipment. It only needs to add an additional standard marking plate with a height mark, cooperate with the correction program running in the control module and the digital correction circuit located in the correction module, so as to realize the dynamic correction function of the working distance deviation. No other structures need to be added, it is easy to implement, and has no other adverse effects on the system.

[0084] (2) The correction and adjustment speed is fast. The correction method provided by the present invention compensates for the focus position and deflection position deviation of the focused charged particle beam by synchronously adjusting the fine focus lens setting value, the X and Y axis gain coefficients of the positioning deflection field, and the X and Y axis rotation coefficients. It is essentially an electrical adjustment with a fast adjustment speed. On the other hand, the correction calculation of the correction method provided by the present invention is a digital circuit built by the internal computing resources of the FPGA. The correction calculation process is synchronized with the data transmission and is output synchronously by the clock pulse. It does not add additional calculation delays and does not affect the update rate of the output data, thereby not affecting the drawing speed of the focused charged particle beam.

[0085] (3) High accuracy of correction. First, the detection accuracy of the working distance is high. The measurement error is reduced by using two groups of lasers to cross-shoot and take the average data of two groups. For each group of lasers, the detection accuracy of the working distance is further improved by detecting the working distance data of multiple positions evenly distributed in the positioning deflection field and taking the average. Secondly, the correction and compensation are comprehensive: the automatic fine-tuning program, the positioning deflection field correction program and the optional graphic drawing field correction program are respectively executed at different working distances to obtain the optimal parameters at the working distance, and then these parameters are adjusted at different working distances. The compensation amount includes the focal position of the focused charged particle beam, the gain of the deflection in two directions, and the rotation angle, so that the size of the beam spot and the position of the deflection are effectively corrected, thereby improving the accuracy of the graphic drawing on the substrate surface.

[0086] The above are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should be regarded as the protection scope of the present invention.

Claims

1. A device for correcting working distance deviation of a focused charged particle beam, characterized in that: include: A standard marking plate, provided with marks for position detection and marks for beam spot shape and size detection; A control module is used to control the focused charged particle beam to draw a pattern on the substrate surface and scan the mark on the standard mark plate, and process the data collected by the scanning detection module to calculate and generate correction parameters; A scanning detection module, used to generate a scanning signal according to the output data of the control module, and determine the scanning position of the mark or the beam spot size of the focused charged particle beam by detecting the signal generated when scanning the mark; A distance detection module is used to calculate the change in the working distance of the focused charged particle beam by detecting the displacement of the reflected light spot after the laser is obliquely incident on the substrate or the marking plate; A correction module, used for applying the correction model and correction parameters of the control module to perform correction calculation on the scanning signal; The execution module is used to convert the signal output by the correction module into an actual driving signal to adjust the particle beam.

2. The focused charged particle beam working distance deviation correction device according to claim 1, characterized in that: The standard marking plate is a fixed marking plate located on the workpiece table or substrate disk, and has a plurality of step structures, each step being provided with a position mark and a beam spot mark.

3. The focused charged particle beam working distance deviation correction device according to claim 1, characterized in that: The standard marking plate is a movable marking substrate, on the surface of which position marks and beam spot marks are arranged at different positions with a large distance between them, and the standard marking plate is placed on the substrate disk in an inclined manner.

4. The focused charged particle beam working distance deviation correction device according to claim 1, 2 or 3, characterized in that: The scanning detection module includes a scanning generator, a particle signal detector and a calculation unit; the scanning generator generates X and Y direction deflection position signals according to the control module instruction, and outputs to control the deflection of the focused charged particle beam; the particle signal detector detects the particle intensity signal scattered from the surface or inside of the mark when scanning the mark, and processes the signal; the calculation unit calculates the center position data of the mark, or the size data of the beam spot, according to the change characteristics of the detection signal at the edge of the mark, combined with the scanning position signal given by the control module, and feeds back to the control module.

5. The focused charged particle beam working distance deviation correction device according to claim 1, 2 or 3, characterized in that: The distance detection module includes multiple groups of laser transmitters and laser receivers; the angle between the axes of the laser transmitters and the laser receivers is between 45° and 90°.

6. A correction method for the working distance deviation correction device for a focused charged particle beam according to any one of claims 1 to 5, characterized in that: Includes steps: S1, pre-perform a working distance deviation correction operation to calculate correction parameters, and transmit them to a correction module; S2, moving the workpiece stage to the first positioning deflection field of the pattern to be drawn on the substrate; S3, obtaining the working distance of the current positioning deflection field; S4, the correction module calculates the compensation amount of the execution module in combination with the correction parameters and the current working distance, and synchronously compensates the particle beam focus position and the deflection position of the current positioning deflection field; S5, move the workpiece stage to the next positioning deflection field of the pattern to be drawn on the substrate, and go to S3 to execute the loop until the patterns of all positioning deflection fields are drawn.

7. The calibration method according to claim 6, characterized in that: Step S1 adjusts the beam spot size and deflection position of the focused charged particle beam by scanning the mark on the standard mark plate to achieve the desired state; uses the correction model between the compensation amount and the working distance to calculate and generate the correction parameters. The specific process is as follows: S11, setting calibration program parameters; S12, moving the workpiece stage to the first height marking area of ​​the standard marking plate or the first marking area of ​​the marking substrate; S13, measure the working distance at that location; S14, moving the workpiece stage a short distance to the beam spot mark position marked there, performing automatic fine focusing operation, adjusting the setting value of the final lens to minimize the detected beam spot size, and obtaining the optimal setting value of the final lens at the current working distance; S15, moving the workpiece stage a short distance to the marked position, performing a deflection field correction operation, adjusting the correction coefficient of the deflection field so that the deviation between the actual position of the particle beam deflection and the expected position is within a preset range, and obtaining the deflection field correction parameter at the current working distance; S16, move the workpiece stage to the next set marking area, and go to S13 to execute the loop until all the set marking areas are measured; S17, using the set values ​​and correction parameter data of the actuator at different working distances obtained in the above steps, and calculating the correction model parameters of the compensation amount of the actuator with respect to the working distance according to the correction model; S18, saving the calibration model parameters related to the working distance, and transmitting them to the calibration module for application.

8. The calibration method according to claim 7, characterized in that: In steps S3 and S13, when measuring the working distance, the workpiece stage is moved a small distance so that the light spot of the measuring laser incident on the surface to be measured is located at multiple positions evenly distributed in the positioning deflection field, and the working distance data of the above multiple positions are detected and the average is taken as the final working distance.

9. The calibration method according to claim 7 or 8, characterized in that: In step S17 , the correction parameters of the adjustment amount ΔF of the final lens setting value with respect to the working distance, the adjustment amounts of the gain coefficients in the deflection field X and Y directions, and the adjustment amount of the rotation coefficient with respect to the working distance are calculated and obtained.

10. The calibration method according to claim 7 or 8, characterized in that: In step S17, the correction model for calculating the actuator setting value and the correction parameter adjustment amount with respect to the working distance adopts a linear function, namely: δy=f(δh)=k×δh+b Where δy is the adjustment amount, δh is the change in working distance, and k and b are the parameters of the correction model.

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