A monitoring device for real-time monitoring of silicon dioxide thickness and its use method

Abstract

The present invention discloses a monitoring device for real-time monitoring of silica thickness and a method for using the device, which relates to the technical field of silica thickness monitoring. The device comprises a plate body, a right-angle plate, and an electric telescopic rod. A controller component is mounted on the top of the plate body, a right-angle plate is mounted on the top of the plate body, an electric telescopic rod is mounted on the top of the right-angle plate, a movable plate is mounted on the output end of the electric telescopic rod, a hydraulic cylinder is mounted on the top of the movable plate, a lifting plate is mounted on the output end of the hydraulic cylinder, and a rotating thickness measuring mechanism is provided at the bottom of the lifting plate. When a second laser rangefinder is moved downward to measure the thickness of a silica plate, a spring can be used to buffer the contact between the second laser rangefinder and the silica, thereby reducing damage to the second laser rangefinder when colliding with the silica. By moving the second laser rangefinder back and forth to measure the thickness of the silica plate, the thickness measuring range can be increased.

Description

Technical Field

[0001] The present invention relates to the technical field of silicon dioxide thickness monitoring, and in particular to a monitoring device for real-time monitoring of silicon dioxide thickness and a method for using the same. Background Art

[0002] The main material of glass is silicon dioxide. Silica sheet is a transparent sheet. The thickness of the silicon dioxide sheet can be monitored by placing the sheet on a substrate that can reflect light, then placing a laser rangefinder close to the top of the sheet, and then using the laser rangefinder to measure the thickness of the silicon dioxide sheet.

[0003] The defects of the existing silicon dioxide thickness measuring device are:

[0004] 1. The prior art KR20070100618A discloses a device for measuring the thickness of a glass substrate. This device lacks a structure to cushion the impact between the rangefinder and the glass plate. When the rangefinder and the glass plate approach each other, they are easily damaged by contact and collision. Therefore, a real-time monitoring device for silicon dioxide thickness is needed to reduce impact damage when the rangefinder and the glass plate approach each other.

[0005] 2. JP2007298504A discloses a glass substrate thickness measurement device. This device lacks a mechanism for cleaning dust between the laser rangefinder and the glass plate. Dust between the laser rangefinder and the glass plate can easily affect the laser rangefinder's measurement accuracy. Therefore, a device for monitoring silicon dioxide thickness in real time, which can clean dust between the laser rangefinder and the plate, is needed to address this issue.

[0006] 3. The prior art US4848913A discloses a device for measuring the thickness of insulating glass. This technology does not have a structure for measuring the thickness of glass sheets by swapping the positions of multiple laser rangefinders. When a laser rangefinder makes a measurement error, it is impossible to promptly determine whether the rangefinder has made a measurement error. Therefore, a real-time monitoring device for monitoring the thickness of silica is needed to solve this problem by swapping the positions of multiple laser rangefinders to detect whether other laser rangefinders have made measurement errors.

[0007] 4. Prior art CN118533031B discloses a glass thickness measuring device. This technology does not have a structure to protect the laser rangefinder when idle. The laser rangefinder is easily contaminated by dust in the air, causing dust accumulation on the end of the laser rangefinder or scratches on the laser rangefinder. Therefore, a real-time monitoring device for monitoring silica thickness is needed to protect the laser rangefinder and other components when idle to solve this problem. Summary of the Invention

[0008] One purpose of the present application is to provide a monitoring device for real-time monitoring of silicon dioxide thickness and a method of using the same, which can solve the technical problems raised in the prior art.

[0009] To achieve the above-mentioned object, the present invention provides the following technical solution: a monitoring device for real-time monitoring of silica thickness, comprising a plate body, a right-angle plate, and an electric telescopic rod, wherein a controller component is mounted on the top of the plate body, a right-angle plate is mounted on the top of the plate body, an electric telescopic rod is mounted on the top of the right-angle plate, and the electric telescopic rod is electrically connected to the controller component, a movable plate is mounted on the output end of the electric telescopic rod, a hydraulic cylinder is mounted on the top of the movable plate, and the hydraulic cylinder is electrically connected to the controller component, a lifting plate is mounted on the output end of the hydraulic cylinder, and a rotating thickness measuring mechanism is provided at the bottom of the lifting plate;

[0010] A storage frame is installed on the back side of the right-angle plate.

[0011] Preferably, a motor 1 is symmetrically installed on the top of the plate body 1, and the motor 1 is electrically connected to the controller component. A screw is installed on the output end of the motor 1. A support block is symmetrically installed on the top of the plate body 1, and the support block is located on the outside of the screw, and a transport plate is installed on the outside of the screw.

[0012] Preferably, a reflective block is installed on the front of the transport plate, a laser rangefinder is installed on the top of the plate body, and the laser rangefinder is located on one side of the reflective block, and the laser rangefinder is electrically connected to the controller component.

[0013] Preferably, a support plate is symmetrically installed on the front side of the right-angle plate, and the support plate is located below the first movable plate.

[0014] Preferably, the rotating thickness measuring mechanism includes a second motor and a rotating lifting plate. The second motor is installed at the bottom of the first lifting plate, and the second motor is electrically connected to the controller component. The output end of the second motor is installed with the rotating lifting plate.

[0015] Preferably, the rotating thickness measuring mechanism also includes a frame body 1, a spring 1, a pressure sensor 1, a plate body 2 and a laser rangefinder 2. Multiple frame bodies 1 are installed at the bottom of the rotating lifting plate. A spring 1 is installed on the top inner wall of the frame body 1. A pressure sensor 1 is installed at one end of the spring 1. The pressure sensor 1 is electrically connected to the controller component by signal. The bottom input end of the pressure sensor 1 is installed with a plate body 2. The bottom of the plate body 2 is installed with a laser rangefinder 2, and the laser rangefinder 2 is electrically connected to the controller component by signal.

[0016] Preferably, a frame body 2 is installed on the front of the frame body 1, a spring 2 is installed on the top inner wall of the frame body 2, a pressure sensor 2 is installed on one end of the spring 2, the pressure sensor 2 is electrically connected to the controller component by signal, a lifting plate 2 is installed on the bottom input end of the pressure sensor 2, block plates are symmetrically installed on both sides of the lifting plate 2, an electric telescopic rod 2 is installed on the front of the block plate, and the electric telescopic rod 2 is electrically connected to the controller component by signal, a moving rod is installed on the output end of the electric telescopic rod 2, and brushes are symmetrically installed on the top and bottom of the moving rod.

[0017] Preferably, hydraulic cylinder 2 is symmetrically installed on the back of the storage frame, hydraulic cylinder 2 is electrically connected to the controller component, movable plate 2 is installed on the output end of hydraulic cylinder 2, and the front of movable plate 2 passes through the front of the right-angle plate, and a sponge is installed on the top of movable plate 2.

[0018] Preferably, the method for using the monitoring device for real-time monitoring of silicon dioxide thickness is as follows:

[0019] S1. The silica plate is placed on top of the transport plate. The transport plate transports the silica plate to the bottom of the rotating lifting plate. The rotating lifting plate moves downward so that the laser rangefinder contacts the top of the silica plate.

[0020] S2, the second laser rangefinder measures the thickness of the silicon dioxide plate, and then the lifting plate is rotated upward, and then the lifting plate is rotated 180 degrees, and then the lifting plate is rotated downward again to allow the second laser rangefinder to measure the thickness of the silicon dioxide plate;

[0021] S3. After the measurement is completed, rotate the lifting plate to move up, then the moving plate 2 drives the sponge to move forward, and then the laser rangefinder 2 moves down to contact the sponge to protect the laser rangefinder 2.

[0022] Preferably, the step S1 further includes the following steps:

[0023] S11. Before the laser rangefinder 2 contacts the silica plate, the brush first contacts the silica plate, and then the brush moves back and forth to clean the dust on the output section at the bottom of the laser rangefinder 2 and the top of the silica plate.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] When the second laser rangefinder is moved downward to measure the thickness of the silicon dioxide plate, the first spring can buffer the contact between the second laser rangefinder and the silicon dioxide, thereby reducing damage caused by the collision between the second laser rangefinder and the silicon dioxide. By moving the second laser rangefinder forward and backward to measure the thickness of the silicon dioxide plate, the thickness measurement range can be increased.

[0026] The present invention ensures that the laser rangefinder measures the thickness of the silica plate accurately by causing the brush to first contact the silica plate before the laser rangefinder contacts the silica plate, and then the brush moves back and forth to clean dust from the output section at the bottom of the laser rangefinder and the top of the silica plate.

[0027] According to the present invention, after the second laser rangefinder measures the thickness of the silicon dioxide plate, the lifting plate is rotated upward, and then the lifting plate is rotated 180 degrees and then moved downward again to allow the second laser rangefinder to measure the thickness of the silicon dioxide plate. Thus, whether there is an error in the measurement of the silicon dioxide plate can be judged according to whether the measurement data of the silicon dioxide plate before and after the rotation of the second laser rangefinder are consistent, thereby facilitating the judgment of whether the second laser rangefinder is damaged.

[0028] After the measurement is completed, the lifting plate is rotated to move up, and then the second moving plate drives the sponge to move forward, and then the second laser rangefinder moves down to contact the sponge, so as to protect the second laser rangefinder and avoid dust falling or collision damage. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 A perspective view of the present invention;

[0030] Figure 2 This is a schematic diagram of the right-angle plate structure of the present invention;

[0031] Figure 3 This is a schematic diagram of the structure of the rotating lifting plate of the present invention;

[0032] Figure 4 This is a schematic structural diagram of frame 1 and frame 2 of the present invention;

[0033] Figure 5 A side sectional view of a rotating lifting plate of the present invention;

[0034] Figure 6 It is a side cross-sectional view of the frame 1 and the frame 2 of the present invention;

[0035] Figure 7 This is a schematic diagram of the storage frame structure of the present invention;

[0036] Figure 8 It is a side sectional view of the storage frame of the present invention;

[0037] Figure 9 The figure is a flow chart of the method of using the present invention.

[0038] In the figure: 1. Plate body 1; 2. Controller component; 3. Motor 1; 4. Screw; 5. Support block; 6. Transport plate; 7. Reflection block; 8. Laser rangefinder 1; 9. Right-angle plate; 10. Electric telescopic rod 1; 11. Moving plate 1; 12. Support plate; 13. Hydraulic cylinder 1; 14. Lifting plate 1; 15. Motor 2; 16. Rotating lifting plate; 17. Frame body 1; 18. Spring 1; 19. Pressure sensor 1; 20. Plate body 2; 21. Laser rangefinder 2; 22. Frame body 2; 23. Spring 2; 24. Pressure sensor 2; 25. Lifting plate 2; 26. Block plate; 27. Electric telescopic rod 2; 28. Moving rod; 29. Brush; 30. Storage frame; 31. Hydraulic cylinder 2; 32. Moving plate 2; 33. Sponge. DETAILED DESCRIPTION

[0039] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0040] In the description of the present invention, it should be noted that the terms "upper," "lower," "inner," "outer," "front end," "rear end," "both ends," "one end," "the other end," and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate and simplify the description of the present invention. They are not intended to indicate or imply that the devices or components referred to must have, be constructed, or operate in a specific orientation, and therefore should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0041] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "installed," "provided with," "connected," etc., should be understood in a broad sense. For example, "connected" may refer to a fixed connection, a detachable connection, or an integral connection; it may refer to a mechanical connection or an electrical connection; it may refer to a direct connection or an indirect connection through an intermediate medium; it may refer to internal communication between two components. Those skilled in the art will be able to understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0042] See also Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 、 Figure 5 and Figure 6 , an embodiment provided by the present invention: a monitoring device for real-time monitoring of silicon dioxide thickness;

[0043] It includes a plate body 1, a right-angle plate 9 and an electric telescopic rod 10. A controller component 2 is installed on the top of the plate body 1. A right-angle plate 9 is installed on the top of the plate body 1. A support plate 12 is symmetrically installed on the front of the right-angle plate 9, and the support plate 12 is located below the mobile plate 11. An electric telescopic rod 10 is installed on the top of the right-angle plate 9, and the electric telescopic rod 10 is connected to the controller component 2 by electrical signals. A mobile plate 11 is installed on the output end of the electric telescopic rod 10. A hydraulic cylinder 13 is installed on the top of the mobile plate 11, and the hydraulic cylinder 13 is connected to the controller component 2 by electrical signals. A lifting plate 14 is installed on the output end of the hydraulic cylinder 13, and a rotating thickness measuring mechanism is provided at the bottom of the lifting plate 14. The plate body 1 can provide security for other components of the equipment. The installation position allows other components of the equipment to have a position for installation. The controller component 2 can receive signals from the laser rangefinder 8, the pressure sensor 19, the laser rangefinder 21 and the pressure sensor 24, and can control the motor 3, the electric telescopic rod 10, the hydraulic cylinder 13, the motor 2 15, the electric telescopic rod 27 and the hydraulic cylinder 2 31. The right-angle plate 9 can provide an installation position for the electric telescopic rod 10. The electric telescopic rod 10 can convert electrical energy into kinetic energy, thereby driving the mobile plate 11 to move back and forth. The mobile plate 11 can drive the hydraulic cylinder 13, the rotating lifting plate 16 and the laser rangefinder 21 to move back and forth through the forward and backward movement, so that the laser rangefinder 21 can be placed on the transport plate from front to back. 6 for thickness measurement, the support plate 12 can provide support for the movable plate 11, the hydraulic cylinder 13 can convert hydraulic energy into kinetic energy, thereby driving the lifting plate 14 to move up and down, and the lifting plate 14 can drive the motor 2 15 and the laser rangefinder 2 21 to move up and down by moving up and down, the rotating thickness measuring mechanism includes the motor 2 15 and the rotating lifting plate 16, the motor 2 15 is installed at the bottom of the lifting plate 14, and the motor 2 15 is electrically connected to the controller component 2, and the output end of the motor 2 15 is installed with the rotating lifting plate 16, the rotating thickness measuring mechanism also includes a frame 17, a spring 18, a pressure sensor 19, a plate 20 and a laser rangefinder 21, and a plurality of frames 17 are installed at the bottom of the rotating lifting plate 16. A spring 18 is installed on the inner wall of the top of the spring 18, and a pressure sensor 19 is installed on one end of the spring 18. The pressure sensor 19 is electrically connected to the controller component 2. A plate 20 is installed on the bottom input end of the pressure sensor 19. A laser rangefinder 21 is installed on the bottom of the plate 20, and the laser rangefinder 21 is electrically connected to the controller component 2. The motor 21 can convert electrical energy into kinetic energy, thereby driving the rotating lifting plate 16 to rotate. The rotating lifting plate 16 can drive the laser rangefinder 21 to rotate by rotating, so that the laser rangefinder 21 can rotate 180 degrees to measure the thickness of the silicon dioxide plate, thereby facilitating the comparison of the data before and after the rotation to determine whether the measurement result of the laser rangefinder 21 is incorrect.Frame 17 provides a mounting location for spring 18 and protects pressure sensor 19. Spring 18 cushions pressure sensor 19, reducing damage to laser rangefinder 21 when it moves downward and strikes the silica plate. Pressure sensor 19 measures the support force exerted on laser rangefinder 21 by the silica plate. Plate 20 provides a mounting location for laser rangefinder 21. Laser rangefinder 21 measures the thickness of the silica plate by moving downward and contacting it.

[0044] See also Figure 1 、 Figure 7 and Figure 8 , an embodiment provided by the present invention: a monitoring device for real-time monitoring of silicon dioxide thickness;

[0045] A storage frame 30 is installed on the back of the right-angle plate 9, and a hydraulic cylinder 2 31 is symmetrically installed on the back of the storage frame 30. The hydraulic cylinder 2 31 is electrically connected to the controller component 2. A movable plate 2 32 is installed on the output end of the hydraulic cylinder 2 31, and the front of the movable plate 2 32 passes through the front of the right-angle plate 9. A sponge 33 is installed on the top of the movable plate 2 32. The storage frame 30 can provide a storage space for the movable plate 2 32. The hydraulic cylinder 2 31 can convert hydraulic energy into kinetic energy, thereby driving the movable plate 2 32 to move back and forth. The movable plate 2 32 can drive the sponge 33 to move back and forth by moving back and forth. The forward movement of the sponge 33 can protect the downward-moving laser rangefinder 2 21 to avoid dust or collision damage.

[0046] See also Figure 1 , an embodiment provided by the present invention: a monitoring device for real-time monitoring of silicon dioxide thickness;

[0047] The motor 3 is symmetrically mounted on the top of the plate 1, and the motor 3 is electrically connected to the controller 2. The output end of the motor 3 is mounted with a screw 4. The top of the plate 1 is symmetrically mounted with a support block 5, and the support block 5 is located on the outside of the screw 4. A transport plate 6 is mounted on the outside of the screw 4. A reflective block 7 is mounted on the front of the transport plate 6. A laser rangefinder 8 is mounted on the top of the plate 1, and the laser rangefinder 8 is located on one side of the reflective block 7. The laser rangefinder 8 is electrically connected to the controller 2. The motor 3 can electrically Energy can be converted into kinetic energy, thereby driving the screw rod 4 to rotate. The screw rod 4 can drive the transport plate 6 to move left and right by rotating. The transport plate 6 can drive the silica plate placed above the transport plate 6 to move left and right by moving left and right. The support block 5 can provide support for one end of the screw rod 4. The reflection block 7 can reflect the laser emitted by the laser rangefinder 8, so that the laser rangefinder 8 can measure the distance from itself to the reflection block 7. The laser rangefinder 8 measures the distance from itself to the reflection block 7 to facilitate the controller component 2 to calculate the position of the transport plate 6.

[0048] See also Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 、 Figure 5 and Figure 6 , an embodiment provided by the present invention: a monitoring device for real-time monitoring of silicon dioxide thickness;

[0049] The frame 22 includes a frame 22 installed on the front of the frame 17, a spring 23 installed on the top inner wall of the frame 22, a pressure sensor 24 installed on one end of the spring 23, the pressure sensor 24 is connected to the controller component 2 by electrical signals, a lifting plate 25 is installed on the bottom input end of the pressure sensor 24, and blocks 26 are symmetrically installed on both sides of the lifting plate 25, an electric telescopic rod 27 is installed on the front of the block 26, and the electric telescopic rod 27 is connected to the controller component 2 by electrical signals, a moving rod 28 is installed on the output end of the electric telescopic rod 27, and brushes 29 are symmetrically installed on the top and bottom of the moving rod 28, and the frame 22 can provide a pressure sensor for the spring 23. The installation position can also provide guidance for the lifting plate 25 so that the lifting plate 25 can move up and down. The pressure sensor 24 can measure the supporting force exerted on the brush 29. The lifting plate 25 can provide an installation position for the block plate 26. The block plate 26 can provide an installation position for the electric telescopic rod 27. The electric telescopic rod 27 can convert electrical energy into kinetic energy, thereby driving the moving rod 28 to move back and forth. The moving rod 28 can drive the brush 29 to move back and forth by moving back and forth. The brush 29 can clean the bottom end face of the laser rangefinder 21 and the silica plate below by moving back and forth, thereby ensuring that the laser rangefinder 21 can accurately measure the thickness of the silica plate.

[0050] The method of using the monitoring device for real-time monitoring of silicon dioxide thickness is as follows:

[0051] S1. The silica plate is placed on top of the transport plate 6. The transport plate 6 transports the silica plate to the bottom of the rotating lifting plate 16. The rotating lifting plate 16 moves downward so that the laser rangefinder 21 contacts the top of the silica plate.

[0052] S2, the second laser rangefinder 21 then measures the thickness of the silicon dioxide plate, and then the lifting plate 16 is rotated upward, and then the lifting plate 16 is rotated 180 degrees, and then the lifting plate 16 is rotated downward again to allow the second laser rangefinder 21 to measure the thickness of the silicon dioxide plate;

[0053] S3. After the measurement is completed, the lifting plate 16 is rotated to move upward, and then the second moving plate 32 drives the sponge 33 to move forward, and then the second laser rangefinder 21 moves downward to contact the sponge 33 to protect the second laser rangefinder 21.

[0054] S1 also includes the following steps:

[0055] S11. Before the laser rangefinder 21 contacts the silicon dioxide plate, the brush 29 first contacts the silicon dioxide plate, and then the brush 29 moves back and forth to clean the dust on the output section at the bottom of the laser rangefinder 21 and the top of the silicon dioxide plate.

[0056] Working principle: Before using the monitoring device for real-time monitoring of silica thickness, you should first check whether there are any problems that affect the use of the monitoring device. The silica plate is placed on the transport plate 6. The transport plate 6 transports the silica plate to the bottom of the rotating lifting plate 16. The rotating lifting plate 16 moves downward so that the brush 29 first contacts the silica plate. Then the brush 29 moves back and forth to clean the dust on the bottom output end face of the laser rangefinder 21 and the top of the silica plate. Then the laser rangefinder 21 contacts the top of the silica plate. Then the laser rangefinder 21 measures the thickness of the silica plate, and then the lifting plate 16 is rotated and moved upward. Then, after the lifting plate 16 is rotated one hundred and eighty degrees, the lifting plate 16 is rotated and moved downward again to allow the laser rangefinder 21 to measure the thickness of the silica plate. After the measurement is completed, the lifting plate 16 is rotated and moved upward, and then the moving plate 2 32 drives the sponge 33 to move forward, and then the laser rangefinder 21 moves downward to contact the sponge 33 to protect the laser rangefinder 21. Then the transport plate 6 transports the silica plate to one side to complete the monitoring of the silica thickness.

[0057] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the invention can be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the invention is defined by the appended claims rather than the foregoing description. It is intended that all variations within the meaning and range of equivalents of the claims be embraced herein, and any reference signs in the claims should not be construed as limiting the rights involved.

Claims

1. A monitoring device for real-time monitoring of silicon dioxide thickness, characterized by: It comprises a plate body (1), a right-angle plate (9) and an electric telescopic rod (10), wherein a controller component (2) is installed on the top of the plate body (1), a right-angle plate (9) is installed on the top of the plate body (1), an electric telescopic rod (10) is installed on the top of the right-angle plate (9), and the electric telescopic rod (10) is connected to the controller component (2) via an electrical signal, a moving plate (11) is installed on the output end of the electric telescopic rod (10), a hydraulic cylinder (13) is installed on the top of the moving plate (11), and the hydraulic cylinder (13) is connected to the controller component (2) via an electrical signal, a lifting plate (14) is installed on the output end of the hydraulic cylinder (13), and a rotating thickness measuring mechanism is provided at the bottom of the lifting plate (14); A storage frame (30) is installed on the back of the right-angle plate (9); The rotating thickness measuring mechanism includes a second motor (15) and a rotating lifting plate (16), wherein the second motor (15) is installed at the bottom of the first lifting plate (14), and the second motor (15) is electrically connected to the controller component (2), and the output end of the second motor (15) is installed with the rotating lifting plate (16); The rotating thickness measuring mechanism further comprises a frame body (17), a spring body (18), a pressure sensor (19), a plate body (20) and a laser rangefinder (21). The bottom of the rotating lifting plate (16) is provided with a plurality of frame bodies (17). The top inner wall of the frame body (17) is provided with a spring body (18). One end of the spring body (18) is provided with a pressure sensor (19). The pressure sensor (19) is electrically connected to the controller component (2). The bottom input end of the pressure sensor (19) is provided with a plate body (20). The bottom of the plate body (20) is provided with a laser rangefinder (21). The laser rangefinder (21) is electrically connected to the controller component (2). A second hydraulic cylinder (31) is symmetrically mounted on the back of the storage frame (30). The second hydraulic cylinder (31) is electrically connected to the controller component (2). A second movable plate (32) is mounted on the output end of the second hydraulic cylinder (31). The front of the second movable plate (32) passes through the front of the right-angle plate (9). A sponge (33) is mounted on the top of the second movable plate (32).

2. A monitoring device for real-time monitoring of silicon dioxide thickness according to claim 1, characterized in that: A motor (3) is symmetrically mounted on the top of the plate body (1), and the motor (3) is electrically connected to the controller component (2). A screw (4) is mounted on the output end of the motor (3). A support block (5) is symmetrically mounted on the top of the plate body (1), and the support block (5) is located outside the screw (4). A transport plate (6) is mounted outside the screw (4).

3. A monitoring device for real-time monitoring of silicon dioxide thickness according to claim 2, characterized in that: A reflective block (7) is installed on the front of the transport plate (6), a laser rangefinder (8) is installed on the top of the plate body (1), and the laser rangefinder (8) is located on one side of the reflective block (7), and the laser rangefinder (8) is electrically connected to the controller component (2).

4. The device for real-time monitoring of silicon dioxide thickness according to claim 1, wherein: A support plate (12) is symmetrically mounted on the front face of the right-angle plate (9), and the support plate (12) is located below the first movable plate (11).

5. The device for real-time monitoring of silicon dioxide thickness according to claim 2, characterized in that: The front of the frame body 1 (17) is equipped with a frame body 2 (22), the top inner wall of the frame body 2 (22) is equipped with a spring 2 (23), one end of the spring 2 (23) is equipped with a pressure sensor 2 (24), the pressure sensor 2 (24) is electrically connected to the controller component (2), the bottom input end of the pressure sensor 2 (24) is equipped with a lifting plate 2 (25), both sides of the lifting plate 2 (25) are symmetrically equipped with block plates (26), the front of the block plate (26) is equipped with an electric telescopic rod 2 (27), and the electric telescopic rod 2 (27) is electrically connected to the controller component (2), the output end of the electric telescopic rod 2 (27) is equipped with a moving rod (28), and brushes (29) are symmetrically equipped at the top and bottom of the moving rod (28).

6. The method for using the device for real-time monitoring of silicon dioxide thickness according to claim 5, characterized in that: The method for using the monitoring device for real-time monitoring of silicon dioxide thickness is as follows: S1, the silica plate is placed on the transport plate (6), the transport plate (6) transports the silica plate to the bottom of the rotating lifting plate (16), and the rotating lifting plate (16) moves downward so that the second laser rangefinder (21) contacts the top of the silica plate; S2, then the second laser rangefinder (21) measures the thickness of the silicon dioxide plate, and then the lifting plate (16) is rotated upward, and then the lifting plate (16) is rotated 180 degrees, and then the lifting plate (16) is rotated downward again to allow the second laser rangefinder (21) to measure the thickness of the silicon dioxide plate; S3. After the measurement is completed, the lifting plate (16) is rotated to move upward, and then the second moving plate (32) drives the sponge (33) to move forward, and then the second laser rangefinder (21) moves downward to contact the sponge (33) to protect the second laser rangefinder (21).

7. The method for using the device for real-time monitoring of silicon dioxide thickness according to claim 6, characterized in that: The S1 also includes the following steps: S11. Before the laser rangefinder 2 (21) contacts the silicon dioxide plate, the brush (29) first contacts the silicon dioxide plate, and then the brush (29) moves back and forth to clean the dust on the output section at the bottom of the laser rangefinder 2 (21) and the top of the silicon dioxide plate.

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