Liquid crystal substrate cleaning equipment and method

Abstract

The invention discloses liquid crystal substrate cleaning equipment and method, and belongs to the field of liquid crystal substrate production. The device comprises a conveying device, the conveying device drives the liquid crystal substrate to move in a roller transmission mode, cleaning devices are arranged on the upper side and the lower side of the conveying device, the liquid crystal substrate is located between the upper cleaning device and the conveying device, and the cleaning devices are connected with a dust collecting device. The upper-layer cleaning device adsorbs impurities on the surface of the liquid crystal substrate through the electrostatic adsorption effect, and the lower-layer cleaning device is used for adsorbing impurities attached to the conveying device. The conveying device conveys the liquid crystal substrate to the next procedure in a roller conveying mode, surface cleaning is completed in the conveying process, during cleaning, the upper-layer cleaning device adsorbs impurities on the upper surface of the liquid crystal substrate through the electrostatic adsorption effect, and direct contact with the liquid crystal substrate is not needed while the surface cleanliness of a liquid crystal substrate product is guaranteed; therefore, mechanical scratches on the surface of the liquid crystal substrate are avoided.

Description

Technical Field

[0001] The present invention relates to the technical field of liquid crystal substrate production, and particularly to a liquid crystal substrate cleaning device and method. Background Art

[0002] A liquid crystal substrate is the main material for manufacturing the screen of a liquid crystal display, usually composed of two transparent glass substrates, and a liquid crystal layer is sandwiched between these two substrates. The substrate needs to have good optical transmittance and mechanical strength. The liquid crystal substrate plays a role in carrying and protecting the liquid crystal layer in liquid crystal display technology, and also carries the electrodes and circuits of the display.

[0003] In the process of liquid crystal substrate production, the glass substrate is first cut and polished, then a transparent conductive material is coated on the surface of the glass substrate, and then precise electrode patterns are formed on the conductive layer through technologies such as photolithography for the control of liquid crystal display. During the production process, multiple cleanings and surface inspections are required to ensure that the surface of the liquid crystal substrate is defect-free, and the produced liquid crystal substrate needs to be cleaned.

[0004] Existing LCD and OLED liquid crystal substrate cleaning devices usually use a brush belt or a roller brush belt for cleaning. During cleaning, the top and bottom surfaces of the substrate come into contact with the brush belt, and the impurities adsorbed on the substrate surface are removed through the friction between the two. Since the brush directly contacts the liquid crystal substrate, it is easy to cause defects such as scratches on the surface of the liquid crystal substrate, and it is also very difficult to clean the gaps of the brush belt or the roller brush belt, resulting in the accumulation of impurities and causing secondary pollution of the liquid crystal substrate. Based on this, the operator will replace the brush with softer bristles and increase the cleaning frequency of the brush belt or the roller brush belt, but the effect is minimal. It is found during the cleaning process that no matter what material the bristles are made of (even bristles made of ultra-fine fibers, wool, etc.), they will cause different degrees of scratches on the liquid crystal substrate, and the problem of secondary pollution of the liquid crystal substrate still occurs when using bristles with normal cleanliness. Summary of the Invention

[0005] The present invention provides a liquid crystal substrate cleaning device and method, which can solve the problems of scratching and secondary pollution of the liquid crystal substrate caused by the existing brush belt or roller brush belt.

[0006] A liquid crystal substrate cleaning device includes: a conveying device, which drives the liquid crystal substrate to move in a roller drive manner;

[0007] Cleaning devices are arranged on both the upper and lower sides of the conveying device. The liquid crystal substrate is located between the upper cleaning device and the conveying device. The cleaning device is connected to a dust collection device, and the dust collection device is connected to a vacuum system;

[0008] During the movement of the liquid crystal substrate, the upper cleaning device adsorbs impurities on the surface of the liquid crystal substrate through the electrostatic adsorption effect, and the lower cleaning device is used to adsorb impurities attached to the conveying device;

[0009] The dust collection device collects the impurities adsorbed by the cleaning device through air flow.

[0010] Preferably, the cleaning device includes an adsorption rod, and the outer shell of the adsorption rod is made of a conductive material, which adsorbs impurities through electrostatic attraction.

[0011] Preferably, the adsorption rod is connected to a power source, and the power source is used to drive the adsorption rod to rotate.

[0012] Preferably, the adsorption rod is connected to an adsorption box, the adsorption box is provided with a lower end face, the lower end face is an arc-shaped concave structure, and the upper part of the lower end face is in contact with the adsorption rod.

[0013] Preferably, a cavity is provided inside the adsorption box, an air outlet is opened at the lower end face of the adsorption box, and the air outlet is communicated with the cavity.

[0014] Preferably, a contact gap is provided between the adsorption box and the adsorption rod.

[0015] Preferably, the dust collection device includes a dust collection box, a connecting pipe is communicated and arranged on one side of the dust collection box, and the connecting pipe is connected to a vacuum system.

[0016] Preferably, a vacuum pipeline is communicated and arranged on the other side of the dust collection box, and the vacuum pipeline is connected to the adsorption box.

[0017] Preferably, a filter screen is detachably arranged inside the dust collection box.

[0018] A method for cleaning a liquid crystal substrate, which uses a liquid crystal substrate cleaning device for cleaning, includes:

[0019] The conveying device continuously and sequentially horizontally conveys a plurality of liquid crystal substrates in a roller drive manner;

[0020] When the liquid crystal substrate moves between the upper cleaning device and the conveying device, the upper cleaning device adsorbs impurities on the top surface of the liquid crystal substrate. At the same time, the lower cleaning device adsorbs impurities attached to the conveying device;

[0021] Under the action of the vacuum system, the dust collection device generates an air flow, and the air flow takes out the impurities adsorbed by the cleaning device and collects them in the dust collection device.

[0022] Advantages of the present invention:

[0023] (1) In the present invention, the conveying device conveys the liquid crystal substrate to the next process in a roller conveying manner, and surface cleaning is completed during the conveying process. During cleaning, the upper cleaning device adsorbs impurities on the upper surface of the liquid crystal substrate through the electrostatic adsorption effect, ensuring the surface cleanliness of the liquid crystal substrate product without directly contacting the liquid crystal substrate, thereby avoiding mechanical scratches on the surface of the liquid crystal substrate.

[0024] (2) In the present invention, during the movement of the liquid crystal substrate, the scanning cleaning of the liquid crystal substrate by the cleaning device can avoid cleaning dead corners and effectively improve the cleaning efficiency and effect.

[0025] (3) In the present invention, impurities attached to the lower surface of the liquid crystal substrate will adhere to the rollers during the contact process between the liquid crystal substrate and the rollers of the conveying device. The lower cleaning device can adsorb the impurities attached to the rollers, thereby maintaining a good operating environment in the workshop and preventing the liquid crystal substrate from being secondarily contaminated. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 is a schematic structural diagram of a liquid crystal substrate cleaning device provided by the present invention in a use state;

[0027] Figure 2 is a schematic structural diagram of a liquid crystal substrate cleaning device provided by the present invention;

[0028] Figure 3 is Figure 2 an enlarged view of part A in

[0029] Figure 4 is Figure 3 a schematic structural diagram of the adsorption box in

[0030] Figure 5 is a bottom view of a liquid crystal substrate cleaning device provided by the present invention;

[0031] Figure 6 is a rear view of a liquid crystal substrate cleaning device provided by the present invention.

[0032] DESCRIPTION OF THE REFERENCE NUMERALS:

[0033] 1. Liquid crystal substrate; 2. Conveying device; 3. Cleaning device; 31. Adsorption rod; 32. Adsorption box; 321. Lower end face; 322. Air outlet; 33. Power source; 34. Contact gap; 4. Dust collection device; 41. Vacuum pipeline; 42. Dust collection box; 43. Connecting pipe; 5. Support platform. DETAILED DESCRIPTION OF THE INVENTION

[0034] The following describes the specific embodiments of the present invention in detail, but it should be understood that the protection scope of the present invention is not limited by the specific embodiments.

[0035] AsFigure 1 As shown, a liquid crystal substrate cleaning device provided by an embodiment of the present invention is supported and fixed by a support table 5 to facilitate maintaining the stability of the operation of the device. The liquid crystal substrate cleaning device includes: a conveying device 2, which is installed on an external support frame (not shown in the figure). The conveying device 2 is used for conveying the liquid crystal substrate 1 on the production line and providing environmental conditions for the subsequent cleaning of surface defects. The conveying device 2 drives the movement of the liquid crystal substrate 1 in a roller drive manner.

[0036] Among them, the conveying device 2 includes a rotating shaft, and the rotating shaft is driven to rotate by a motor, so as to provide conveying power to a plurality of rollers assembled on the rotating shaft, or adopt an air-floating conveying method.

[0037] As Figure 2 shown, cleaning devices 3 are arranged on both the upper and lower sides of the conveying device 2. The liquid crystal substrate 1 is located between the upper cleaning device 3 and the conveying device 2. The cleaning device 3 is connected to a dust collection device 4, and the dust collection device 4 is connected to the vacuum system on the production line.

[0038] Specifically, the cleaning device 3 includes an adsorption rod 31. The outer shell of the adsorption rod 31 is made of a conductive material, usually a metal material, including but not limited to aluminum and copper. It adsorbs impurities through electrostatic attraction. A power supply and an electrostatic generator are arranged inside the adsorption rod 31. The electrostatic generator converts the voltage of the power supply into an adapted electric field, which can transfer current to the outer shell of the adsorption rod 31. Usually, this electric field is generated on the electrode or the metal rod, so that the entire adsorption rod 31 can generate static electricity to adsorb impurities on the liquid crystal substrate 1 and in the surrounding air (including but not limited to particulate matter and dust). The adsorption rod 31 is connected to a power source 33, and the power source 33 is used to drive the adsorption rod 31 to rotate. The power source 33 includes but is not limited to a motor.

[0039] As Figures 3 - 4 shown, the adsorption rod 31 is also connected to an adsorption box 32. The adsorption box 32 is provided with a lower end face 321, and the lower end face 321 is an arc-shaped concave structure. The upper part of the lower end face 321 is in contact with the adsorption rod 31. A cavity is arranged inside the adsorption box 32. The adsorption box 32 is provided with air vents 322 at the lower end face 321, and the air vents 322 are communicated with the cavity. The impurities on the surface of the liquid crystal substrate 1 enter the cavity inside the adsorption box 32 through the air vents 322.

[0040] Among them, a contact gap 34 is arranged between the adsorption box 32 and the adsorption rod 31, so that when the adsorption rod 31 rotates, the contact gap 34 can provide a diversion path for the impurities entering the adsorption box 32, enabling the impurities to smoothly enter the adsorption box 32.

[0041] Further, the dust collection device 4 includes a dust collection box 42. A connecting pipe 43 is connected to one side of the dust collection box 42 in a communicating manner. The connecting pipe 43 is connected to a vacuum system (not shown in the figure). A vacuum pipe 41 is connected to the other side of the dust collection box 42 in a communicating manner. The vacuum pipe 41 is connected to the adsorption box 32. Due to the negative pressure provided by the vacuum system, the impurities in the adsorption box 32 enter the dust collection box 42 through the vacuum pipe 41. A filter screen is detachably arranged in the dust collection box 42, and the impurities adhere to the filter screen. Regularly cleaning and replacing the filter screen can maintain the service state of the dust collection box 42.

[0042] It should be noted that when the adsorption rod 31 rotates, the impurities adsorbed on its surface enter the adsorption box 32 under the action of the air flow. However, the impurities will resist the air flow under the action of electrostatic adsorption. When some impurities with strong adhesion are difficult to fall off from the surface of the adsorption rod 31, the upper part of the lower end face 321 of the adsorption box 32 acts as a scraper structure. During the contact with the adsorption rod 31, the impurities that are difficult to fall off from the surface of the adsorption rod 31 are scraped off. The scraped-off impurities enter the adsorption box 32 along the air flow, thereby ensuring that the adsorption rod 31 maintains a clean state and reducing the cleaning frequency of the adsorption rod 31.

[0043] In this embodiment, as Figures 5 - 6 shown, during the movement of the liquid crystal substrate 1, the upper cleaning device 3 adsorbs the impurities on the surface of the liquid crystal substrate 1 through the electrostatic adsorption effect, and the lower cleaning device 3 is used to adsorb the impurities attached to the conveying device 2. The dust collection device 4 collects the impurities adsorbed by the cleaning device 3 through the air flow.

[0044] Specifically, the conveying device 2 conveys the liquid crystal substrate 1 to the next process in a roller conveying manner and completes the surface cleaning during the conveying process. During the cleaning, the power source 33 in the upper cleaning device 3 drives the adsorption rod 31 to rotate. During the rotation of the adsorption rod 31, the static electricity generated adsorbs the impurities on the upper surface of the liquid crystal substrate 1. The adsorbed impurities enter the adsorption box 32 and then enter the dust collection box 42 through the vacuum pipe 41. Compared with the common cleaning methods of brush belts and roller brush belts in the prior art, the cleaning equipment adopted in the present invention can ensure the surface cleanliness of the liquid crystal substrate 1 product without directly contacting the liquid crystal substrate 1, thereby avoiding mechanical scratches on the surface of the liquid crystal substrate 1. Moreover, during the movement of the liquid crystal substrate 1, the scanning cleaning of the liquid crystal substrate 1 by the adsorption rod 31 can avoid cleaning dead corners and effectively improve the cleaning efficiency and effect.

[0045] Correspondingly, the adsorption rod 31 in the lower cleaning device 3 is also rotating continuously. Some of the impurities adhering to the lower surface of the liquid crystal substrate 1 will fall under the action of gravity, and some will adhere to the rollers of the conveying device 2 during the contact process between the liquid crystal substrate 1 and the rollers. While the lower adsorption rod 31 adsorbs the impurities adhering to the rollers, the impurities doped in the air due to falling will also enter the adsorption box 32 along with the air flow under the action of the vacuum system, thereby maintaining a good operating environment in the workshop and preventing the liquid crystal substrate 1 from being secondarily contaminated.

[0046] The inventors found that the cleaning methods using brush belts and rotary brush belts in the prior art rely on mechanical friction to remove impurities on the surface of the liquid crystal substrate 1. However, the bristles will be damaged to varying degrees during use, and it is easy to have the phenomena of broken hairs and fallen hairs. The bristles will act on the liquid crystal substrate 1 in the reverse direction with the air flow, resulting in a relatively high risk of secondary contamination for the liquid crystal substrate 1 that has just been cleaned. In addition, impurities will also adhere to the gaps between the bristles, and these impurities will also act on the liquid crystal substrate 1.

[0047] This application abandons the method of mechanical friction of bristles and adopts electrostatic adsorption, taking into account both cleaning damage and secondary contamination, and can effectively improve the product yield and quality.

[0048] It can be understood that the quality inspection requirements for the liquid crystal substrate 1 are not symmetrical. The upper surface of the liquid crystal substrate 1, as the functional surface, usually directly bears the core functional structures such as liquid crystal molecules or OLED light-emitting layers, including but not limited to the TFT layer of LCD and the anode / cathode interface of OLED. In the production process, the core processes such as lithography, etching, and deposition are usually carried out on this surface. Therefore, the requirements for this surface are relatively high. The lower surface of the liquid crystal substrate 1 is used as a structural support or encapsulation layer, and the surface defects have less impact on the electrical performance. Therefore, the requirements for this surface are relatively relaxed. There are still some impurities on the lower surface of the liquid crystal substrate 1 that cannot be carried out even under the action of external forces such as air flow. The adhesion between these impurities and the liquid crystal substrate 1 is relatively strong, and they usually do not float into the upper surface of the liquid crystal substrate 1 to affect its quality, nor do they affect the subsequent acceptance and quality inspection. Therefore, in this application, considering the actual application, there is no need to implement relatively strict cleaning standards for the lower surface of the liquid crystal substrate 1, which reduces the subsequent quality inspection difficulty and workload and also saves costs.

[0049] Although the requirements for the lower surface of the liquid crystal substrate 1 are relaxed, it is still necessary to clean it. When using a brush belt or a roller brush belt, the liquid crystal substrate 1 needs to be turned over for cleaning, and there are many uncontrollable factors during the turning process. The upper surface of the liquid crystal substrate 1 after cleaning is likely to adhere to impurities again, and the mechanical contact between the turning fixture and the liquid crystal substrate 1 will also increase the risk of scratching. This application does not require the liquid crystal substrate 1 to be turned over, and simultaneously cleans the upper and lower surfaces of the liquid crystal substrate 1, thereby improving the cleaning efficiency and reducing the turning risk of the liquid crystal substrate 1 during the cleaning process.

[0050] In another embodiment, a method for cleaning a liquid crystal substrate uses a liquid crystal substrate cleaning device for cleaning, including:

[0051] The conveying device 2 continuously and horizontally conveys a number of liquid crystal substrates 1 in sequence by means of roller transmission. During the conveying process, some of the impurities attached to the lower surface of the liquid crystal substrate 1 will fall off and be mixed in the workshop air, or adhere to the surface of the rollers of the conveying device 2.

[0052] When the liquid crystal substrate 1 moves between the upper cleaning device 3 and the conveying device 2, the upper cleaning device 3 uses the adsorption effect to adsorb the impurities on the top surface of the liquid crystal substrate 1. At the same time, the lower cleaning device 3 adsorbs the impurities attached to the conveying device 2.

[0053] Under the action of the vacuum system, the dust collecting device 4 generates an air flow, and the air flow carries out the impurities adsorbed by the cleaning device 3 and collects them in the dust collecting device 4. The operator regularly cleans the dust collecting box 42 in the dust collecting device 4.

[0054] Working principle: The conveying device 2 conveys the liquid crystal substrate 1 to the next process by means of roller transmission, and completes the surface cleaning during the conveying process. During cleaning, the power source 33 in the upper cleaning device 3 drives the adsorption rod 31 to rotate. During the rotation of the adsorption rod 31, the static electricity generated by it adsorbs the impurities on the upper surface of the liquid crystal substrate 1. The adsorbed impurities enter the adsorption box 32 and then enter the dust collecting box 42 along the vacuum pipeline 41. Correspondingly, the adsorption rod 31 in the lower cleaning device 3 is also constantly rotating. Some of the impurities attached to the lower surface of the liquid crystal substrate 1 will fall off under the action of gravity, and some will adhere to the rollers during the contact process between the liquid crystal substrate 1 and the rollers of the conveying device 2. While the lower adsorption rod 31 adsorbs the impurities attached to the rollers, the impurities doped in the air due to falling will also enter the adsorption box 32 along with the air flow under the action of the vacuum system.

[0055] The above discloses only several specific embodiments of the present invention. However, the embodiments of the present invention are not limited thereto, and any changes that can be thought of by those skilled in the art should fall within the protection scope of the present invention.

Claims

1. A liquid crystal substrate cleaning device, characterized in that: include: A conveying device (2), wherein the conveying device (2) drives the liquid crystal substrate (1) to move by roller transmission; Cleaning devices (3) are provided on both the upper and lower sides of the conveying device (2); the liquid crystal substrate (1) is located between the cleaning device (3) on the upper layer and the conveying device (2); the cleaning device (3) is connected to a dust collecting device (4); and the dust collecting device (4) is connected to a vacuum system; During the movement of the liquid crystal substrate (1), the upper cleaning device (3) absorbs impurities on the surface of the liquid crystal substrate (1) through an electrostatic adsorption effect, and the lower cleaning device (3) is used to absorb impurities attached to the conveying device (2); The dust collecting device (4) collects impurities adsorbed by the cleaning device (3) through airflow.

2. A liquid crystal substrate cleaning device as claimed in claim 1, characterized in that: The cleaning device (3) comprises an adsorption rod (31), the outer shell of which is made of a conductive material and adsorbs impurities through electrostatic attraction.

3. A liquid crystal substrate cleaning device as claimed in claim 2, characterized in that: The adsorption rod (31) is connected to a power source (33), and the power source (33) is used to drive the adsorption rod (31) to rotate.

4. A liquid crystal substrate cleaning device as claimed in claim 3, characterized in that: The adsorption rod (31) is connected to the adsorption box (32); the adsorption box (32) is provided with a lower end surface (321); the lower end surface (321) is an arc-shaped concave structure; the upper part of the lower end surface (321) is in contact with the adsorption rod (31).

5. A liquid crystal substrate cleaning device as claimed in claim 4, characterized in that: A cavity is arranged inside the adsorption box (32), and an air outlet (322) is provided on the lower end surface (321) of the adsorption box (32), wherein the air outlet (322) is communicated with the cavity.

6. A liquid crystal substrate cleaning device as claimed in claim 5, characterized in that: A contact gap (34) is provided between the adsorption box (32) and the adsorption rod (31).

7. The liquid crystal substrate cleaning device according to claim 4, characterized in that: The dust collecting device (4) comprises a dust collecting box (42), one side of the dust collecting box (42) is connected to a connecting pipe (43), and the connecting pipe (43) is connected to a vacuum system.

8. The liquid crystal substrate cleaning device according to claim 7, characterized in that: The other side of the dust collecting box (42) is connected to a vacuum pipe (41), and the vacuum pipe (41) is connected to the adsorption box (32).

9. The liquid crystal substrate cleaning device according to claim 7, characterized in that: The dust collecting box (42) is provided with a detachable filter screen.

10. A method for cleaning a liquid crystal substrate, characterized in that: Cleaning using a liquid crystal substrate cleaning device according to any one of claims 1 to 9, comprising: The conveying device (2) conveys a plurality of liquid crystal substrates (1) horizontally and continuously in sequence by means of roller transmission; When the liquid crystal substrate (1) moves between the upper cleaning device (3) and the conveying device (2), the upper cleaning device (3) absorbs impurities on the top surface of the liquid crystal substrate (1), and at the same time, the lower cleaning device (3) absorbs impurities attached to the conveying device (2); Under the action of the vacuum system, the dust collecting device (4) generates an airflow, which carries out the impurities adsorbed by the cleaning device (3) and collects them in the dust collecting device (4).

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