Gas mixing device and treatment equipment

Abstract

The invention discloses a gas mixing device and treatment equipment. The gas mixing device comprises a gas inlet component and a gas distribution component, the air inlet component is provided with at least two air inlet cavities and at least two air inlet channels, and each air inlet cavity is communicated with at least one air inlet channel; the air distribution component is provided with at least two air outlet channels, the air outlet channels are provided with air outlets, each air inlet cavity is communicated with at least one air outlet channel, and the air outlet channels communicated with the air inlet cavities are different. When the gas mixing device is applied, the probability that different kinds of gas to be mixed collide with one another in the gas mixing process can be reduced, and then generation of particle foreign matter on the surface of a wafer can be reduced, so that the quality of a film on the surface of the wafer is relatively guaranteed.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor thin film equipment, and particularly relates to a gas mixing device and a processing equipment. Background Art

[0002] In the process of semiconductor manufacturing, thin film deposition technology is usually used to deposit materials on the surface of a substrate to form a thin film. With the continuous progress of semiconductor process technology, higher requirements are put forward for the uniformity of the thin film deposited on the wafer surface by semiconductor coating equipment, the concentricity of the thin film thickness, and the performance of particulate foreign matters, etc. Even multiple layers of thin films need to be deposited on a single wafer. Thus, when performing coating operations using thin film deposition technology, a gas mixing device is required to mix multiple process gases and then introduce them into the reaction chamber. The gas mixing effect of the gas mixing device is crucial, directly affecting the uniformity of the thin film on the wafer surface, the concentricity of the thin film thickness, and the performance of particulate foreign matters.

[0003] In related technologies, the gas mixing device mostly adopts a mechanism of creating turbulence to mix the gases to be mixed, so as to achieve the purpose of gas mixing. Specifically, the gases to be mixed collide with each other in the gas mixing chamber and enter the reaction chamber in a spiral manner. Although this gas mixing method can achieve the purpose of gas mixing, since the collision against each other easily causes chemical reactions between the gases to be mixed, the reaction products fall on the wafer surface and form particulate foreign matters, thereby reducing the quality of the thin film on the wafer surface.

[0004] Therefore, how to provide a solution to overcome or alleviate the above defects is still a technical problem that those skilled in the art need to solve urgently. Summary of the Invention

[0005] The purpose of the present application is to provide a gas mixing device to reduce the probability of collision between different gases to be mixed during the gas mixing process, thereby reducing the generation of particulate foreign matters on the wafer surface and relatively ensuring the quality of the thin film on the wafer surface. Another purpose of the present application is to provide a processing equipment.

[0006] To solve the above technical problems, the present application provides a gas mixing device, and the gas mixing device includes an air inlet component and a gas distribution component;

[0007] The air inlet component has at least two air inlet chambers;

[0008] The gas distribution component has at least two air outlet channels, the air outlet channels have air outlet openings, each air inlet chamber is communicated with at least one air outlet channel, and the air outlet channels communicated with each air inlet chamber are different.

[0009] The gas mixing device provided by the present application has at least two intake cavities provided in the intake component and at least two outlet channels provided in the gas distribution component. The outlet channels have outlet openings, and each intake cavity communicates with at least one outlet channel, and the outlet channels communicated with each intake cavity are different. Then, during use, at least two kinds of gases to be mixed can be respectively introduced into the corresponding intake cavities. The gases to be mixed entering each intake cavity are forced to be divided into the corresponding outlet channels and are discharged from the corresponding outlet openings. In this way, each kind of gas to be mixed is forced to be divided, and various gases to be mixed are distributed at intervals at the outlets, which can reduce the probability of collision between different gases to be mixed during the gas mixing process, and further reduce the generation of particulate foreign matters on the wafer surface, so as to relatively ensure the quality of the thin film on the wafer surface.

[0010] Optionally, all the outlet openings are divided into more than two outlet opening groups. The outlet opening group includes at least two of the outlet openings, and the intake cavities communicated with at least two of the outlet openings in the outlet opening group are different; the outlet openings in the outlet opening group are arranged adjacent to each other.

[0011] Optionally, the outlet openings in the outlet opening group are arranged adjacent to each other such that the distance between two adjacent outlet openings in the outlet opening group is less than or equal to the distance between two adjacent outlet opening groups.

[0012] Optionally, the distance between two outlet openings is the distance between the centers of the two outlet openings, and the distance between two outlet opening groups is the minimum value of the distances between the centers of any two outlet openings in the two outlet opening groups.

[0013] Optionally, the gas distribution component has an outlet surface, and a plurality of the outlet openings are all provided on the outlet surface.

[0014] Optionally, there are a plurality of the outlet opening groups; as a unit of the group, the plurality of outlet opening groups are evenly distributed on the outlet surface.

[0015] Optionally, as a unit of the group, the plurality of outlet opening groups are located on at least two concentric circumferences, and several of the outlet opening groups on each circumference are evenly spaced along the circumference.

[0016] Optionally, as a unit of the group, the plurality of outlet opening groups are distributed in a rectangular array.

[0017] Optionally, as a unit of the group, the plurality of outlet opening groups are evenly distributed in a dot pattern.

[0018] Optionally, as a unit of the group, the outlet surface is evenly divided into at least two concentric fan-shaped regions, and at least one of the outlet opening groups is distributed in each fan-shaped region.

[0019] Optionally, the air outlet group includes a plurality of the air outlets; in each air outlet group, the plurality of air outlets are distributed along the same circumference.

[0020] Optionally, the air outlet group includes a plurality of the air outlets; in each air outlet group, the plurality of air outlets are distributed along the same polygon.

[0021] Optionally, the air outlet group includes a plurality of the air outlets; in each air outlet group, some of the air outlets are distributed around at least one of the air outlets.

[0022] Optionally, in each air outlet group, the cross-sectional area of the air outlet is positively correlated with the mixing ratio required for the corresponding gas to be mixed.

[0023] Optionally, the axes of the end portions of the air outlet ends of the air outlet channels are parallel to each other.

[0024] Optionally, the bottom surface of the gas distribution member forms the air outlet surface.

[0025] Optionally, the intake member has an installation cavity with an open bottom end, at least a part of the gas distribution member is located in the installation cavity, and the intake cavity is at least partially arranged around the installation cavity.

[0026] Optionally, the intake cavity completely surrounds the installation cavity, and at least two intake cavities are arranged at intervals from top to bottom.

[0027] Optionally, the gas distribution member has a first outer side wall surface, the air outlet channel has an air inlet located on the first outer side wall surface, and the air inlet is communicated with the intake cavity.

[0028] Optionally, the air outlet channel includes a first section channel and a second section channel that are communicated with each other;

[0029] The first section channel penetrates to the first outer side wall surface and forms the air inlet on the first outer side wall surface; the second section channel penetrates to the air outlet surface and forms the air outlet on the air outlet surface;

[0030] The first section channel is arranged horizontally or inclined relative to the horizontal plane, and the second section channel is arranged vertically or inclined relative to the vertical plane.

[0031] Optionally, all the air inlets corresponding to each intake cavity are equidistantly spaced along the circumference of the intake cavity.

[0032] Optionally, the gas distribution member includes a gas distribution portion and a boss portion;

[0033] The top end of the gas distribution part extends radially outward to form the boss part. The air outlet channel is arranged in the gas distribution part. The boss part has a first stepped surface facing downward. The top end of the air inlet component is provided with a stepped hole, and the stepped hole is communicated with the installation cavity. The stepped hole has a second stepped surface facing upward.

[0034] The gas distribution part is arranged in the installation cavity, the boss part is arranged in the stepped hole, and the first stepped surface and the second stepped surface are in contact.

[0035] Optionally, a convex part is arranged on the outer side wall surface of the boss part, the stepped hole has a second inner side wall surface, and a concave part is arranged on the second inner side wall surface;

[0036] The convex part is clamped in the concave part to limit the circumferential rotation of the gas distribution component.

[0037] Optionally, the air inlet component is provided with an annular sealing groove on the second stepped surface, and a sealing ring is arranged in the sealing groove.

[0038] Optionally, the gas mixing device further includes a transition component;

[0039] The transition component has a transition channel and an upper end surface. The transition component is located below the gas distribution component. The air outlet surface and the upper end surface are in contact. The air outlet is communicated with the transition channel, and the inner diameter of the transition channel gradually increases from top to bottom.

[0040] Optionally, the air inlet component has a second outer side wall surface and at least two air inlet channels;

[0041] Each air inlet cavity is communicated with at least one air inlet channel, and the air inlet channel penetrates to the second outer side wall surface.

[0042] This application also provides a processing device, and the processing device includes a reaction chamber and the gas mixing device as described above;

[0043] The air outlet is communicated with the reaction chamber.

[0044] Since the processing device provided by this application includes the above gas mixing device, it also has all the beneficial effects of the above gas mixing device, which will not be elaborated here one by one. Description of the Drawings

[0045] Figure 1 It is a partial structural schematic diagram of the gas mixing device according to the first embodiment provided by this application;

[0046] Figure 2 It is Figure 1 the left view of

[0047] Figure 3 It isFigure 2 Cross-sectional view taken along the A-A direction of;

[0048] Figure 4 is Figure 1 Bottom view of;

[0049] Figure 5 is Figure 1 Partial cross-sectional view of;

[0050] Figure 6 is Figure 1 Exploded structure diagram of;

[0051] Figure 7 is Figure 6 Structure diagram of the gas distribution component shown in;

[0052] Figure 8 is Figure 7 Bottom view of;

[0053] Figure 9 Simulation diagram of the flow field in the reaction zone after gas mixing of the gas mixing device provided by the related technology;

[0054] Figure 10 Simulation diagram of the flow field in the reaction zone after gas mixing of the gas mixing device according to the first embodiment provided by the present application;

[0055] Figure 11 Distribution diagram of each gas outlet group on the gas outlet surface in the gas mixing device according to the second embodiment provided by the present application;

[0056] Figure 12 is Figure 11 Distribution diagram of each gas outlet in each gas outlet group in the gas mixing device shown in;

[0057] Figure 13 Distribution diagram of each gas outlet in each gas outlet group in the gas mixing device according to the third embodiment provided by the present application;

[0058] Figure 14 is Figure 1 Longitudinal cross-sectional view after adding the top cover.

[0059] The reference numerals in the above-mentioned drawings are explained as follows:

[0060] 1 - Intake component, 1a - Intake cavity, 1a1 - Opening, 1b - Intake channel, 1c - Installation cavity, 1c1 - First inner wall surface, 1d - Second outer wall surface, 1e - Step hole, 1e1 - Second step surface, 1e2 - Second inner wall surface, 1e3 - Depression, 1f - Sealing groove;

[0061] 2 - Gas distribution component, 2a - Gas outlet channel, 2a0 - Gas outlet group, 2a1 - Gas outlet, 2a2 - Gas inlet, 2a3 - First - stage channel, 2a4 - Second - stage channel, 2b - Gas outlet surface, 2c - First outer side wall surface, 2d - First step surface, 21 - Gas distribution part, 22 - Boss part, 221 - Protrusion part;

[0062] 3 - Transition component, 3a - Transition channel, 3b - Upper end surface;

[0063] 4 - Top cover. Detailed implementation manners

[0064] In order to enable those skilled in the art of the present technology to better understand the solution of this application, the following further detailed description of this application will be given in conjunction with the accompanying drawings and specific implementation manners.

[0065] It should be specifically noted that: the terms "first", "second", etc. in this application are only for facilitating the description of two or more structures or components with the same or similar structures and / or functions, and do not represent a certain special limitation on the sequence and / or importance.

[0066] Please refer to Figures 1 to 4 , Figure 1 , which is a partial structural schematic diagram of the gas - mixing device according to the first embodiment provided by this application, Figure 2 is Figure 1 the left - view, Figure 3 is Figure 2 the A - A cross - sectional view, Figure 4 is Figure 1 the bottom - view.

[0067] In the first embodiment provided by this application, as Figures 1 to 3 shown, the gas - mixing device includes an intake component 1 and a gas - distribution component 2; the intake component 1 has at least two intake cavities 1a; the gas - distribution component 2 has a gas - outlet surface 2b and at least two gas - outlet channels 2a, the gas - outlet channels 2a have gas outlets 2a1 located on the gas - outlet surface 2b, each intake cavity 1a is communicated with at least one gas - outlet channel 2a, and the gas - outlet channels 2a communicated with each intake cavity 1a are different.

[0068] It is not difficult to understand that each intake cavity 1a is used to introduce a kind of gas to be mixed. In other words, the number of intake cavities 1a is the same as the number of types of gases to be mixed; each intake cavity 1a is communicated with at least one gas - outlet channel 2a, and the gas - outlet channels 2a communicated with each intake cavity 1a are different, so that each kind of gas to be mixed exits through at least one gas - outlet channel 2a. Specifically, the intake end of the gas - outlet channel 2a has a gas inlet 2a2, the outlet end has a gas outlet 2a1, the gas to be mixed inside the intake cavity 1a flows into the corresponding gas - outlet channel 2a through the corresponding gas inlet 2a2, and is exported from the corresponding gas outlet 2a1, and after mixing, it enters the downstream reaction cavity for coating operation.

[0069] Compared with the prior art, the gas mixing method using the hedging collision method is likely to cause chemical reactions between the gases to be mixed, and the resulting products fall on the surface of the wafer to form particulate foreign matters, reducing the quality of the thin film on the wafer surface. Since the gas mixing device provided in the first embodiment of the present application has at least two intake cavities 1a provided in the intake member 1 and at least two outlet channels 2a provided in the gas distribution member 2, the outlet channels 2a have outlet openings 2a1 located on the outlet surface 2b, and each intake cavity 1a communicates with at least one outlet channel 2a. At the same time, the outlet channels 2a communicated with each intake cavity 1a are different. During use, at least two gases to be mixed are respectively introduced into the corresponding intake cavities 1a, and the gases to be mixed entering the interior of the intake cavities 1a are forced to be shunted into the corresponding outlet channels 2a and are discharged from the corresponding outlet openings 2a1 on the outlet surface 2b. In this way, by adopting the forced shunt flow mechanism, each gas to be mixed is forced to be shunted, and various gases to be mixed are distributed at intervals at the outlet, which can reduce the probability of collision between different gases to be mixed during the gas mixing process, and thus can reduce the generation of particulate foreign matters on the wafer surface, so as to relatively ensure the quality of the thin film on the wafer surface.

[0070] Moreover, compared with the prior art, the hedging collision and spiral intake are in a random form, making the gas mixing effect uncontrollable and unpredictable. Since the gas mixing effect of the gas mixing device provided in the first embodiment of the present application is mainly affected by factors such as the number, size, position, and distribution form of the outlet openings 2a1, and these factors are controllable, the corresponding gas mixing effect is controllable and predictable. In this way, the active control and prediction of the gas mixing effect can be achieved by setting the number, size, position, and distribution form of the outlet openings 2a1.

[0071] In addition, compared with the prior art, the spiral intake method is likely to impact the gases to be mixed into other pipelines, that is, gas leakage occurs, and thus particulate foreign matters are generated. Since the gas mixing device provided in the first embodiment of the present application forces the gases to be mixed in the intake cavity 1a to be shunted into the corresponding outlet channels 2a and then discharged, and the pressure inside the outlet channels 2a is greater than the pressure inside the downstream reaction chamber, the gases to be mixed change from high pressure to low pressure when entering the reaction chamber from the outlet channels 2a. After the gases to be mixed enter the reaction chamber, they are not likely to flow back into the outlet channels 2a, and it is not easy for the gases to be mixed to leak between each other, which can further reduce the generation of particulate foreign matters on the wafer surface.

[0072] In addition, compared with the related art, in order to achieve a better gas mixing effect, a relatively long gas mixing distance is often required. This not only results in a relatively large volume of the processing equipment, but also for the thin film deposition process, more cleaning time is needed, which will reduce the production capacity of the processing equipment. Since the gas outlets 2a1 of the gas mixing device provided in the first embodiment of the present application are located on the same gas outlet surface 2b, various gases to be mixed can be mixed within a very short distance when being led out from the gas outlet surface 2b, which can greatly shorten the gas mixing distance, correspondingly significantly reduce the volume of the processing equipment, and significantly shorten the cleaning time of the thin film deposition process, being beneficial to improving the production capacity of the processing equipment.

[0073] Please refer to Figure 5 , Figure 5 as Figure 1 a partial cross-sectional view of.

[0074] In actual setting, the arrangement form of the gas outlets 2a1 is not limited.

[0075] In the embodiment provided by the present application, all the gas outlets 2a1 are divided into two or more gas outlet groups 2a0. The gas outlet group 2a0 includes at least two gas outlets 2a1, and the intake cavities 1a communicated with at least two gas outlets 2a1 in the gas outlet group 2a0 are different; the gas outlets 2a1 in the gas outlet group 2a0 are arranged adjacent to each other.

[0076] In this way, various gases to be mixed are led out through the respective gas outlet groups 2a0 on the gas outlet surface 2b, and the gases to be mixed led out within each gas outlet group 2a0 are adjacent to each other when coming out, which can further improve the gas mixing effect and shorten the gas mixing distance. Moreover, by setting the number and distribution form of the gas outlet groups 2a0 and the number, size, position and distribution form of the gas outlets 2a1 inside the gas outlet groups 2a0, etc., it is easier to control and predict the gas mixing effect.

[0077] Specifically, the gas outlets 2a1 in each gas outlet group 2a0 are arranged adjacent to each other such that the distance between two adjacent gas outlets 2a1 in the gas outlet group 2a0 is less than or equal to the distance between two adjacent gas outlet groups 2a0.

[0078] Furthermore, the calculation method of the distance between two gas outlets 2a1 is not limited.

[0079] In the embodiments provided by the present application, the distance between the two air outlets 2a1 may be the distance between the centers of the two air outlets 2a1, and the distance between the two air outlet groups 2a0 may be the minimum value among the distances between the centers of any two air outlets 2a1 in the two air outlet groups 2a0. In this way, the distance between the two air outlets 2a1 and the distance between the two air outlet groups 2a0 are easy to calculate, making it easier to design the positions of the air outlets 2a1, so that the air outlets 2a1 in the air outlet group 2a0 can be arranged closer to each other more easily, which can further improve the gas mixing effect and can control and predict the gas mixing effect more accurately.

[0080] It should be noted that the number of air outlet channels 2a connected to each intake cavity 1a, that is, the number of air outlets 2a1 corresponding to each gas to be mixed, can be set according to the required gas mixing volume of the gas to be mixed. Specifically, if the required gas mixing volume of a certain gas to be mixed is relatively small, the corresponding number of air outlets 2a1 can be reduced accordingly; if the required gas mixing volume of a certain gas to be mixed is relatively large, the corresponding number of air outlets 2a1 can be increased accordingly.

[0081] In the first embodiment provided by the present application, each intake cavity 1a is connected to the same number of air outlet channels 2a, that is, the number of air outlets 2a1 corresponding to each gas to be mixed is the same. In this way, the demand for the gas mixing volume can be met by setting the size of the air outlets 2a1 corresponding to each gas to be mixed, thus facilitating the design of the air outlets 2a1.

[0082] In the embodiments not shown in the present application, the number of air outlet channels 2a connected to some intake cavities 1a is different from the number of air outlet channels 2a connected to other intake cavities 1a. In other words, the number of air outlets 2a1 corresponding to some gases to be mixed is different from the number of air outlets 2a1 corresponding to other gases to be mixed. In this way, the demand for the gas mixing volume can be met by setting the number of air outlets 2a1 corresponding to each gas to be mixed, making the design of the air outlets 2a1 more flexible and convenient.

[0083] Furthermore, the distribution of the types of gases to be mixed corresponding to the air outlets 2a1 in the air outlet group 2a0 is not limited.

[0084] In the first embodiment provided by the present application, each air outlet group 2a0 includes one air outlet 2a1 corresponding to each gas to be mixed. At this time, the air outlets 2a1 in the air outlet group 2a0 cover all types of gases to be mixed, and the types of gases to be mixed corresponding to the air outlets 2a1 in the air outlet group 2a0 are different from each other.

[0085] Of course, according to the proportion of the mixing gas volume of various gases to be mixed, the distribution of the types of gases to be mixed corresponding to each gas outlet 2a1 in some of the gas outlet groups 2a0 can be adjusted. In an embodiment not shown in the present application, a certain gas outlet group 2a0 may not include a gas outlet 2a1 for a certain gas to be mixed, or may include more than two gas outlets 2a1 for a certain gas to be mixed.

[0086] Please refer to Figures 6 to 10 , Figure 6 for Figure 1 the exploded view of Figure 7 for Figure 6 the structural view of the gas distributing component shown in Figure 8 for Figure 7 the bottom view of Figure 9 for the simulation diagram of the flow field in the reaction zone after gas mixing by the gas mixing device provided by the related art. Figure 10 for the simulation diagram of the flow field in the reaction zone after gas mixing by the gas mixing device according to the first embodiment provided by the present application.

[0087] In actual setting, the arrangement form of each gas outlet group 2a0 on the gas outlet surface 2b is not limited.

[0088] In the first embodiment provided by the present application, there are multiple gas outlet groups 2a0. Here, "multiple" means more than three; taking groups as units, multiple gas outlet groups 2a0 are evenly distributed on the gas outlet surface 2b, so that the mixing of the gases to be mixed led out by each gas outlet 2a1 is more uniform.

[0089] Specifically, the way of evenly distributing the gas outlet groups 2a0 is not limited.

[0090] As Figure 8 shown, in the first embodiment provided by the present application, taking groups as units, multiple gas outlet groups 2a0 are located on at least two concentric circles, and several gas outlet groups 2a0 on each circle are evenly spaced along the corresponding circle.

[0091] From Figure 9 it can be seen that the simulation result of the flow field in the reaction zone after gas mixing by the gas mixing device provided by the related art shows that the average concentration difference U% is 16.5%, the gas mixing uniformity is poor, and there is a large eccentric distribution in the flow field of the reaction zone. From Figure 10 it can be seen that the simulation result of the flow field in the reaction zone after gas mixing by the gas mixing device according to the first embodiment provided by the present application shows that the average concentration difference U% is 7%, the gas mixing uniformity is high, and the flow field of the reaction zone is distributed in a concentric circle shape, and the concentricity of the concentric circle shape is also high.

[0092] In the related art, the gas mixing device uses a counter-impact method for gas mixing, resulting in a large eccentric distribution in the flow field of the reaction zone after gas mixing, making it difficult to meet the actual requirement of a concentric circle distribution in the flow field of the reaction zone, thus leading to poor uniformity of the thin film on the wafer surface and concentricity of the thin film thickness. In the first embodiment of the present application above, since the gas distribution component 2 is used to forcibly divide and equally distribute the gas to be mixed inside each intake cavity 1a and export it from the gas outlet 2a1 on the same gas outlet surface 2b, and at the same time, each gas outlet group 2a0 is annularly distributed in multiple zones on the gas outlet surface 2b, the flow field of the reaction zone after gas mixing is likely to be concentrically distributed and has a high concentricity, which has a high improvement effect on the film forming quality, especially the uniformity of the thin film on the wafer surface and the concentricity of the thin film thickness.

[0093] It is worth mentioning that in the first embodiment of the present application above, each gas outlet group 2a0 is annularly distributed in multiple zones, which also makes the gas distribution component 2 easier to process and can reduce the processing cost.

[0094] Furthermore, the number of circumferences of the above distribution of the gas outlet group 2a0 is not limited, and it can be distributed on two circumferences as shown in Figure 8 , or can be distributed on more circumferences according to requirements. Among them, when the gas outlet group 2a0 is distributed on two circumferences as shown in Figure 8 , the area occupied by the gas outlet group 2a0 distributed on the inner circumference is larger, and the aperture of the gas outlet 2a1 can be relatively set larger than the aperture of the gas outlet 2a1 on the outer circumference to make the gas mixing more uniform.

[0095] In addition, the number of gas outlet groups 2a0 distributed on each circumference is also not limited and can be set according to the gas mixing requirements.

[0096] Please also refer to Figure 11 , Figure 11 , which is a schematic diagram of the distribution of each gas outlet group on the gas outlet surface in the gas mixing device of the second embodiment provided by the present application.

[0097] The main difference between the second embodiment provided by the present application and the first embodiment above is that, taking groups as units, multiple gas outlet groups 2a0 are evenly distributed in a dot pattern. In this way, the distribution of the gas outlet groups 2a0 is relatively uniform, and the uniformity of gas mixing can also be improved.

[0098] Of course, in other embodiments not shown in the present application, taking groups as units, multiple gas outlet groups 2a0 can also be distributed in a rectangular array pattern, or the gas outlet surface 2b can be evenly divided into at least two concentrically arranged fan-shaped regions, and each fan-shaped region is provided with at least one gas outlet group 2a0, which is not specifically limited.

[0099] It is not difficult to understand that the number and distribution uniformity of the air outlet groups 2a0 affect the air mixing effect. For example, the more the number of the air outlet groups 2a0, the better the air mixing effect and the shorter the distance required for air mixing.

[0100] Please refer to Figures 12 to 13 , Figure 12 for Figure 11 the distribution schematic diagram of each air outlet in each air outlet group in the air mixing device shown, Figure 13 which is the distribution schematic diagram of each air outlet in each air outlet group in the air mixing device of the third embodiment provided by the present application.

[0101] In actual setting, the arrangement form of the air outlets 2a1 in each air outlet group 2a0 is not limited.

[0102] As Figure 8 and Figure 13 shown, in the first embodiment and the third embodiment provided by the present application, there are multiple intake cavities 1a, and the air outlet group 2a0 includes multiple air outlets 2a1; in each air outlet group 2a0, some air outlets 2a1 are distributed around at least one air outlet 2a1, and these air outlets 2a1 located on the outside can be distributed along the same circle or the same polygon or other shapes. In this way, in each air outlet group 2a0, the gas to be mixed led out by each air outlet 2a1 can be mixed more evenly, which is beneficial to improving the mixing uniformity of the entire air mixing device.

[0103] As Figure 12 shown, the difference between the second embodiment provided by the present application and the above-mentioned first embodiment is further that: there are multiple intake cavities 1a, and the air outlet group 2a0 includes multiple air outlets 2a1; in each air outlet group 2a0, multiple air outlets 2a1 are distributed along the same polygon. In this way, in each air outlet group 2a0, the gas to be mixed led out by each air outlet 2a1 can be mixed more evenly, which is beneficial to improving the mixing uniformity of the entire air mixing device.

[0104] In other embodiments not shown in the present application, there are multiple intake cavities 1a, and the air outlet group 2a0 includes multiple air outlets 2a1; in each air outlet group 2a0, multiple air outlets 2a1 are distributed along the same circle. In this way, in each air outlet group 2a0, each air outlet 2a1 can be mixed more evenly, which is beneficial to improving the mixing uniformity of the entire air mixing device.

[0105] In actual setting, the air outlet 2a1 can be circular as Figure 8 shown, or can be fan-shaped as Figure 13 shown, or can also be oval, and there is no specific limitation; the shapes of the air outlets 2a1 can be the same as Figure 8 and Figure 12 shown, or can be different as Figure 13Different from what is shown, there is no specific limitation. In this way, the shape of each air outlet 2a1 can be set according to the actual gas mixing requirements, which is more flexible.

[0106] When actually setting, the size of each air outlet 2a1 is not limited.

[0107] In the first embodiment provided by the present application, in each air outlet group 2a0, the cross-sectional area of the air outlet 2a1 is positively correlated with the gas mixing ratio required for the corresponding gas to be mixed. Specifically, the gas mixing ratio required for the gas to be mixed is the ratio of the gas volume required for the gas to be mixed, and the gas volume can be volume or flow rate; when the gas mixing ratio required for the gas to be mixed is small, the cross-sectional area of its corresponding air outlet 2a1 can be set small, and when the gas mixing ratio required for the gas to be mixed is large, the cross-sectional area of its corresponding air outlet 2a1 can be set large.

[0108] In this way, the cross-sectional area of the air outlet 2a1 can be set according to the gas mixing ratio required for the gas to be mixed. Specifically, the size of the air outlet 2a1 such as the inner diameter can be set to achieve forced diversion of the gas outlet position of the gas to be mixed and forced distribution of the gas outlet volume, so that each gas to be mixed can roughly meet the gas mixing requirements after being led out from the air outlet 2a1, which can significantly improve the uniformity of gas mixing and greatly shorten the gas mixing distance.

[0109] It is not difficult to understand that when the cross-sectional area of the air outlet 2a1 is positively correlated with the gas mixing ratio required for the gas to be mixed, it is negatively correlated with the flow rate of the gas to be mixed. That is, if the flow rate of the gas to be mixed is high during intake, the cross-sectional area of its corresponding air outlet 2a1 is set relatively small, and if the flow rate of the gas to be mixed is low during intake, the cross-sectional area of its corresponding air outlet 2a1 is set relatively large.

[0110] It should be noted that when the sizes of the air outlets 2a1 corresponding to a certain gas to be mixed are the same, it is best that the air outlets 2a1 are evenly distributed on the air outlet surface 2b. When the sizes of the air outlets 2a1 corresponding to a certain gas to be mixed are different, the larger-sized air outlets 2a1 can be distributed more sparsely, and the smaller-sized air outlets 2a1 can be distributed more densely.

[0111] In the first embodiment provided by the present application, please combine Figure 3 Understand that the axes of the end portions of the air outlet ends of the air outlet channels 2a are parallel to each other. In this way, the air outlet directions of the air outlets 2a1 are parallel to each other, so that various gases to be mixed are not easily opposed to each other after being led out from the air outlets 2a1, and are not easily flushed into other air outlet channels 2a, which can further reduce the generation of particulate foreign matters on the wafer surface.

[0112] When actually setting, the position of the air outlet surface 2b on the gas distribution component 2 is not limited.

[0113] In the first embodiment provided by the present application, as Figure 3 and Figure 5 shown, the bottom surface of the gas distribution component 2 forms an air outlet surface 2b. In this way, when the gas to be mixed enters the corresponding air outlet channel 2a from the air inlet cavity 1a, it finally flows downward from the air outlet 2a1. Coupled with the fact that the pressure inside the air outlet channel 2a is greater than the pressure inside the downstream reaction cavity, it makes it more difficult for the gas to flow back into the air outlet channel 2a after entering the reaction cavity, and it is more difficult for the gases to be mixed to leak between each other. Thus, the particulate foreign matters caused by gas leakage can be further reduced.

[0114] Furthermore, the arrangement form of each air inlet cavity 1a is not limited.

[0115] As Figure 3 and Figure 5 shown, in the first embodiment of the present application, the air inlet component 1 has an installation cavity 1c with an open bottom end. The gas distribution component 2 is at least partially located in the installation cavity 1c, and the air inlet cavity 1a is at least partially arranged around the installation cavity 1c.

[0116] In this way, after the gas to be mixed enters the air inlet cavity 1a, it can flow horizontally along the circumferential direction of the air inlet cavity 1a and is diverted to the corresponding air outlet channels 2a from each air inlet 2a2, making the diversion of the gas to be mixed more uniform and more conducive to improving the uniformity of gas mixing.

[0117] Specifically, the air inlet cavity 1a can be partially arranged around the installation cavity 1c to be partially annular. At this time, each air inlet cavity 1a can be arranged around the installation cavity 1c at the same horizontal height, and the structure is relatively compact. Of course, each air inlet cavity 1a can also be arranged at intervals from top to bottom, and specific limitations are not made; the air inlet cavity 1a can also be completely arranged around the installation cavity 1c to be a complete ring as Figure 3 and Figure 5 shown. Each air inlet cavity 1a can be arranged at intervals from top to bottom. At this time, the air inlet cavity 1a can provide a 360-degree space for the gas to be mixed to flow through, so that the gas to be mixed can be diverted more fully and evenly, which is conducive to further improving the uniformity of gas mixing.

[0118] Please refer to Figure 3 and Figure 5 for understanding. In the first embodiment provided by the present application, the gas distribution component 2 has a first outer side wall surface 2c, and the air outlet channel 2a has an air inlet 2a2 located on the first outer side wall surface 2c. The air inlet 2a2 is communicated with the air inlet cavity 1a. In this way, the gas to be mixed inside the air inlet cavity 1a can enter the gas distribution component 2 from the inner ring side of the air inlet cavity 1a through the air inlet 2a2, making the structure of the gas mixing device relatively compact.

[0119] Among them, one side of the inner ring of the intake cavity 1a can be opened to form an opening 1a1. The intake component 1 and the first outer wall surface 2c enclose the intake cavity 1a, and the intake port 2a2 is communicated with the opening 1a1. In this way, the intake cavity 1a is directly communicated with the air outlet channel 2a of the air distribution component 2, which not only enables the gas to be mixed in the intake cavity 1a to flow into the corresponding air outlet channel 2a more efficiently, but also eliminates the need to additionally provide a structure on the intake component 1 to connect the intake cavity 1a and the air outlet channel 2a, making the structure of the intake component 1 simpler and easier to manufacture.

[0120] It should be noted that when the opening 1a1 is provided in the intake cavity 1a as above, a sealing structure (not shown in the figure), such as a sealing ring, can be adopted between the corresponding first inner wall surface 1c1 of the installation cavity 1c and the first outer wall surface 2c of the air distribution component 2 for sealing, so as to improve the sealing performance between the air distribution component 2 and the intake component 1, and further ensure the smooth and stable progress of the air distribution operation, so as to ensure a better gas mixing effect.

[0121] Specifically, the intake cavity 1a can have various cross-sectional shapes. For example, it can be rectangular, circular, semi-circular, or elliptical. The present application does not limit this.

[0122] Furthermore, the specific structure of each air outlet channel 2a is not limited.

[0123] As Figure 3 shown, in the first embodiment provided by the present application, the air outlet channel 2a includes a first section channel 2a3 and a second section channel 2a4 that are communicated with each other; the first section channel 2a3 penetrates to the first outer wall surface 2c and forms an intake port 2a2 on the first outer wall surface 2c; the second section channel 2a4 penetrates to the air outlet surface 2b and forms an air outlet 2a1 on the air outlet surface 2b; the first section channel 2a3 is horizontally arranged or inclined relative to the horizontal plane, and the second section channel 2a4 is vertically arranged or inclined relative to the vertical plane. In this way, the structure of the air distribution component 2 is relatively simple and easy to manufacture.

[0124] When specifically setting, the arrangement form of the intake ports 2a2 corresponding to each intake cavity 1a is not limited.

[0125] As Figure 6 and Figure 7 shown, in the first embodiment provided by the present application, all the intake ports 2a2 corresponding to each intake cavity 1a are equidistantly spaced along the circumferential direction of the intake cavity 1a. In this way, the gas to be mixed in the intake cavity 1a can be forced to be equally divided and shunted into each air outlet channel 2a, making the shunting of the gas to be mixed more efficient and uniform, which is beneficial to further enhancing the uniformity of gas mixing.

[0126] Among them, the air distribution component 2 can be as Figure 7As shown, a circle of air inlets 2a2 is provided corresponding to each air inlet chamber 1a. The circle of air inlets 2a2 can be evenly spaced along the circumferential direction of the air distribution member 2. The air distribution member 2 can also be provided with more than two circles of air inlets 2a2 corresponding to some of the air inlet chambers 1a. Each circle of air inlets 2a2 can be evenly spaced along the circumferential direction of the air distribution member 2, and the circles of air inlets 2a2 can be evenly spaced along the up and down directions. The air distribution member 2 can also be arranged with the air inlets 2a2 in other types of uniform distribution forms.

[0127] Please also refer to Figure 14 , Figure 14 which is Figure 1 a longitudinal sectional view after adding the top cover.

[0128] In actual setting, the air distribution member 2 can be at least partially arranged in the installation cavity 1c of the air inlet member 1, and its specific structure is not limited.

[0129] In the first embodiment provided by the present application, as Figure 3 , Figure 6 and Figure 14 shown, the air distribution member 2 can include an air distribution part 21 and a boss part 22; the top end of the air distribution part 21 extends radially outward to form the boss part 22. The air outlet channel 2a is arranged in the air distribution part 21. The bottom surface of the air outlet channel 2a can form the above-mentioned air outlet surface 2b. The outer side wall surface of the air distribution part 21 forms the above-mentioned first outer side wall surface 2c. The boss part 22 has a downward first step surface 2d; the top end of the air inlet member 1 is provided with a stepped hole 1e, and the stepped hole 1e communicates with the installation cavity 1c. The stepped hole 1e has an upward second step surface 1e1; the air distribution part 21 can be arranged in the installation cavity 1c, and the boss part 22 can be arranged in the stepped hole 1e, and the first step surface 2d of the boss part 22 can abut against the corresponding second step surface 1e1 of the stepped hole 1e.

[0130] In this way, the stepped hole 1e and the boss part 22 cooperate with each other, and can position the installation of the air distribution member 2 in the installation cavity 1c when the air distribution member 2 and the air inlet member 1 are integrally formed, which can improve the installation accuracy, further ensure the stability of the air distribution process of the air distribution member 2, and is beneficial to improving the stability of the air mixing of the entire air mixing device.

[0131] In the above-mentioned first embodiment provided by the present application, the air distribution member 2 and the air inlet member 1 are integrally formed. Of course, the two can also be integrally formed, and the specific is not limited.

[0132] In the first embodiment provided by the present application, a protrusion 221 is provided on the outer side wall surface of the boss part 22. The stepped hole 1e has a second inner side wall surface 1e2, and a recess 1e3 is provided on the second inner side wall surface 1e2. The protrusion 221 can be clamped in the recess 1e3 to limit the circumferential rotation of the air distribution member 2, so that the installation of the air distribution member 2 in the installation cavity 1c is more stable.

[0133] Please understand in conjunction with Figure 6 and Figure 14 that in the first embodiment provided by the present application, the intake component 1 can be provided with an annular sealing groove 1f on the second step surface 1e1 of the stepped hole 1e, and a sealing ring (not shown in the figure) can be arranged in the sealing groove 1f to seal the space between the first step surface 2d of the boss portion 22 and the second step surface 1e1 of the intake component 1, which can further improve the sealing performance of the gas mixing device and ensure the smooth progress of the gas mixing process.

[0134] Please understand in conjunction with Figure 14 that in the first embodiment provided by the present application, the gas mixing device may further include a top cover 4, and the top cover 4 can be covered on the top of the intake component 1 to further improve the sealing performance of the gas mixing device.

[0135] In the first embodiment provided by the present application, please understand in conjunction with Figure 3 , Figure 5 and Figure 6 that the gas mixing device further includes a transition component 3; the transition component 3 has a transition channel 3a and an upper end surface 3b, the transition component 3 is located below the gas distribution component 2, the gas outlet surface 2b and the upper end surface 3b are in contact, the gas outlet 2a1 is communicated with the transition channel 3a, and the inner diameter of the transition channel 3a gradually increases from top to bottom.

[0136] In this way, the transition channel 3a is in a form of gradually expanding from top to bottom, so that after the gas to be mixed is led out from each gas outlet 2a1, it can enter the transition channel 3a for buffering and mixing, which is beneficial to reducing the generation of eddy currents, making it more difficult for various gases to be mixed to react with each other, thereby being beneficial to further reducing the generation of particulate foreign matters on the wafer surface, and being beneficial to shortening the size of the gas distribution component 2 in the axial direction, that is, the up and down direction, and reducing the processing difficulty of the gas distribution component 2 with a hole type.

[0137] Of course, the transition component 3 may not be provided, but the gas to be mixed directly enters the downstream reaction chamber after exiting from the lower end of the gas distribution component 2.

[0138] In addition, the transition component 3 can be integrally formed with the intake component 1 or separately formed with the intake component 1, and there is no specific limitation.

[0139] In the first embodiment provided by the present application, the intake component 1 has at least two intake channels 1b; each intake chamber 1a is communicated with at least one intake channel 1b. In this way, each intake chamber 1a intakes gas through at least one intake channel 1b, making the intake process more convenient.

[0140] Specifically, the number of intake channels 1b communicated with each intake chamber 1a is not limited, and it can be as Figure 3As shown, each intake chamber 1a intakes air through an intake passage 1b, making the structure of the intake component 1 relatively simple. Of course, each intake chamber 1a can also intake air through more than two intake passages 1b.

[0141] Furthermore, the arrangement form of each intake passage 1b is not limited.

[0142] In the first embodiment provided by the present application, as Figure 1 and Figure 5 shown, the intake component 1 has at least one second outer side wall surface 1d; the intake passage 1b penetrates through to the second outer side wall surface 1d. In this way, each intake chamber 1a intakes air from the side of the intake component 1, making the structure of the intake component 1 relatively compact.

[0143] Of course, in an embodiment not shown in the present application, the intake passage 1b can also penetrate through to the bottom of the intake component 1 to intake air from the lower side of the intake component 1, and the intake passage 1b can also penetrate through to the top of the intake component 1 to intake air from the upper side of the intake component 1.

[0144] Specifically, when setting, the structural form of the intake component 1 is not limited.

[0145] In the first embodiment provided by the present application, the intake component 1 can be a polyhedron structure as Figure 3 shown. The intake component 1 can have second outer side wall surfaces 1d that are the same in number as and in one-to-one correspondence with the intake chambers 1a, and the intake passage 1b connected to each intake chamber 1a can penetrate through to the corresponding second outer side wall surface 1d. In this way, each intake chamber 1a intakes air from one side of the intake component 1 from the outside to the inside. The intake method is simple, and the structure of the entire intake component 1 is also relatively compact.

[0146] In an embodiment not shown in the present application, the intake component 1 can be of other shapes, such as cylindrical. At this time, the intake component 1 has one second outer side wall surface 1d, and the intake passage 1b connected to each intake chamber 1a can penetrate through to this second outer side wall surface 1d. In this way, each intake chamber 1a intakes air from the side. The intake method is simple, and the structure of the entire intake component 1 is also relatively compact.

[0147] It should be noted that the number of intake chambers 1a is not limited, and it is specifically designed according to the number of gases to be mixed.

[0148] In the first embodiment provided by the present application, there are four gases to be mixed, as Figure 3 shown. Four intake chambers 1a can be provided, and the four annular intake chambers 1a can be evenly spaced from top to bottom. Correspondingly, as Figure 1 shown, the intake component 1 can be a cuboid, which has four second outer side wall surfaces 1d, and the four intake passages 1b corresponding to the four intake chambers 1a respectively penetrate through to the four second outer side wall surfaces 1d of the intake component 1.

[0149] The present application also provides a processing device, which includes a reaction chamber and the gas mixing device in all of the above embodiments; the gas outlet 2a1 is communicated with the reaction chamber, specifically, it can be communicated through a gas mixing pipeline. Since the processing device provided by the present application has the gas mixing device in all of the above embodiments, it has all the beneficial effects of the gas mixing devices provided in all of the above embodiments, which will not be elaborated herein one by one.

[0150] The working principle of the gas mixing device provided by the present application will be described below in conjunction with the accompanying drawings:

[0151] In the present application, factors such as the number and distribution mode of the gas outlet groups 2a0, and the number, shape, size and distribution mode of the gas outlets 2a1 inside the gas outlet groups 2a0 affect the gas mixing effect. By setting these factors, the outlet positions of the gases to be mixed can be forcibly allocated in advance and the gas volumes of the gases to be mixed can be forcibly shunted, so that after the various gases to be mixed are led out from the gas outlet 2a1, they can immediately roughly meet the gas mixing requirements.

[0152] Specifically, under the condition of complete gas mixing uniformity, the size and position of the gas outlet 2a1 corresponding to each gas to be mixed can be designed according to the gas mixing ratio required by each gas to be mixed on a cross-section of the downstream gas mixing pipeline, so that after the various gases to be mixed are led out from the gas outlet 2a1, they can roughly have the gas volume required at the position near the gas outlet 2a1. In other words, in each very small local area, for example, in the area near the outlet of a gas outlet group 2a0, the gas volumes of the various gases to be mixed are roughly equivalent to the gas volumes of the various gases to be mixed when the gas mixing is uniform at this position. It is equivalent to that the gases to be mixed can complete gas mixing after being led out from the gas outlet 2a1, which can greatly improve the uniformity of gas mixing, ensure the uniformity of the thin film on the wafer surface and the concentricity of the thin film thickness, and greatly shorten the gas mixing distance, improve the equipment production capacity. At the same time, it can achieve strong active control and accurate prediction of the gas mixing effect, and greatly reduce the generation of foreign particles on the wafer surface.

[0153] In the above embodiments, the intake component 1 and the gas distribution component 2 are separately arranged, which is convenient for processing the intake cavity 1a and the gas outlet channel 2a. It can be seen that the intake component 1 and the gas distribution component 2 can also be integrally arranged.

[0154] Specific examples are used in this article to elaborate on the principle and implementation manner of the present application. The description of the above embodiments is only used to help understand the device of the present application and its core idea. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present application, several improvements and modifications can be made to the present application, and these improvements and modifications also fall within the protection scope of the claims of the present application.

Claims

1. A gas mixing device, characterized in that: The gas mixing device comprises an air intake component (1) and a gas separation component (2); The air intake component (1) has at least two air intake cavities (1a); The gas separation component (2) has at least two gas outlet channels (2a), each gas outlet channel (2a) has a gas outlet (2a1), each gas inlet cavity (1a) is connected to at least one gas outlet channel (2a), and each gas inlet cavity (1a) is connected to a different gas outlet channel (2a).

2. The gas mixing device according to claim 1, characterized in that: All the air outlets (2a1) are divided into more than two air outlet groups (2a0), the air outlet group (2a0) comprising at least two air outlets (2a1), the air inlet cavities (1a) connected to at least two of the air outlets (2a1) in the air outlet group (2a0) being different; and the air outlets (2a1) in the air outlet group (2a0) are arranged adjacent to each other.

3. The gas mixing device according to claim 2, characterized in that: The air outlets (2a1) in the air outlet group (2a0) are arranged adjacent to each other so that the distance between two adjacent air outlets (2a1) in the air outlet group (2a0) is less than or equal to the distance between two adjacent air outlet groups (2a0).

4. The gas mixing device according to claim 3, characterized in that: The distance between the two air outlets (2a1) is the distance between the centers of the two air outlets (2a1), and the distance between the two air outlet groups (2a0) is the minimum value of the distances between the centers of any two air outlets (2a1) in the two air outlet groups (2a0).

5. The gas mixing device according to any one of claims 2 to 4, characterized in that: The gas separation component (2) has a gas outlet surface, and the plurality of gas outlets (2a1) are all arranged on the gas outlet surface.

6. The gas mixing device according to claim 5, characterized in that: There are a plurality of the air outlet groups (2a0); the plurality of air outlet groups (2a0) are evenly distributed on the air outlet surface (2b) in groups.

7. The gas mixing device according to claim 6, characterized in that: In groups, the plurality of air outlet groups (2a0) are located on at least two concentrically arranged circles, and the plurality of air outlet groups (2a0) on each circle are distributed at equal intervals along the circle.

8. The gas mixing device according to claim 6, characterized in that: Taking groups as units, the plurality of air outlet groups (2a0) are distributed in a rectangular array.

9. The gas mixing device according to claim 6, characterized in that: Taking groups as units, the plurality of gas outlet groups (2a0) are evenly distributed in a dotted manner.

10. The gas mixing device according to claim 6, characterized in that: In groups, the air outlet surface (2b) is divided into at least two concentrically arranged fan-shaped areas, and each fan-shaped area is distributed with at least one air outlet group (2a0).

11. The gas mixing device according to any one of claims 2 to 4, characterized in that: The air outlet group (2a0) comprises a plurality of the air outlets (2a1); in each of the air outlet groups (2a0), the plurality of air outlets (2a1) are distributed along the same circumference.

12. The gas mixing device according to any one of claims 2 to 4, characterized in that: The air outlet group (2a0) comprises a plurality of the air outlets (2a1); in each of the air outlet groups (2a0), the plurality of air outlets (2a1) are distributed along the same polygon.

13. The gas mixing device according to any one of claims 2 to 4, characterized in that: The air outlet group (2a0) comprises a plurality of the air outlets (2a1); in each of the air outlet groups (2a0), some of the air outlets (2a1) are distributed around at least one of the air outlets (2a1).

14. The gas mixing device according to any one of claims 2 to 4, characterized in that: In each of the gas outlet groups (2a0), the cross-sectional area of ​​the gas outlet (2a1) is positively correlated with the required gas mixing ratio of the corresponding gas to be mixed.

15. The gas mixing device according to any one of claims 1 to 4, characterized in that: The axes of the gas outlet ends of the gas outlet channels (2a) are parallel to each other.

16. The gas mixing device according to claim 5, characterized in that: The bottom surface of the gas separation component (2) forms the gas outlet surface (2b).

17. The gas mixing device according to claim 16, characterized in that: The air intake component (1) comprises a mounting cavity (1c), the bottom end of the mounting cavity (1c) is open, the air separation component (2) is at least partially located in the mounting cavity (1c), and the air intake cavity (1a) is at least partially arranged around the mounting cavity (1c).

18. The gas mixing device according to claim 17, characterized in that: The air intake cavity (1a) is arranged completely around the installation cavity (1c), and at least two of the air intake cavities (1a) are arranged at intervals from top to bottom.

19. The gas mixing device according to claim 17, characterized in that: The air distribution component (2) has a first outer wall surface (2c), the air outlet channel (2a) has an air inlet (2a2) located on the first outer wall surface (2c), and the air inlet (2a2) is connected to the air inlet cavity (1a).

20. The gas mixing device according to claim 19, characterized in that: The air outlet channel (2a) comprises a first channel section (2a3) and a second channel section (2a4) which are interconnected; The first section of the channel (2a3) penetrates to the first outer wall surface (2c), and forms the air inlet (2a2) on the first outer wall surface (2c); the second section of the channel (2a4) penetrates to the air outlet surface (2b), and forms the air outlet (2a1) on the air outlet surface (2b); The first section of the channel (2a3) is arranged horizontally or inclined relative to the horizontal plane, and the second section of the channel (2a4) is arranged vertically or inclined relative to the vertical plane.

21. The gas mixing device according to claim 19, characterized in that: All the air inlets (2a2) corresponding to each air inlet cavity (1a) are distributed at equal intervals along the circumference of the air inlet cavity (1a).

22. The gas mixing device according to claim 17, characterized in that: The gas separation component (2) comprises a gas separation portion (21) and a boss portion (22); The top end of the air separation portion (21) extends radially outward to form the boss portion (22); the air outlet passage (2a) is provided on the air separation portion (21); the boss portion (22) has a first step surface (2d) facing downward; the top end of the air inlet component (1) is provided with a step hole (1e); the step hole (1e) is in communication with the mounting cavity (1c); and the step hole (1e) has a second step surface (1e1) facing upward; The air distributor portion (21) is disposed in the mounting cavity (1c), the boss portion (22) is disposed in the step hole (1e), and the first step surface (2d) and the second step surface (1e1) are in abutment with each other.

23. The gas mixing device according to claim 22, characterized in that: The outer wall surface of the boss portion (22) is provided with a protruding portion (221), the step hole (1e) has a second inner wall surface (1e2), and the second inner wall surface (1e2) is provided with a recessed portion (1e3); The protruding portion (221) is clamped in the recessed portion (1e3) to limit the rotation of the air distribution component (2) in the circumferential direction.

24. The gas mixing device according to claim 22, characterized in that: The air intake component (1) is provided with an annular sealing groove (1f) on the second step surface (1e1), and a sealing ring is provided in the sealing groove (1f).

25. The gas mixing device according to claim 16, characterized in that: The gas mixing device further comprises a transition component (3); The transition component (3) comprises a transition channel (3a) and an upper end surface (3b); the transition component (3) is located below the gas separation component (2); the gas outlet surface (2b) abuts against the upper end surface (3b); the gas outlet (2a1) is connected to the transition channel (3a); and the inner diameter of the transition channel (3a) gradually increases from top to bottom.

26. The gas mixing device according to any one of claims 1 to 4, characterized in that: The air intake component (1) comprises a second outer side wall surface (1d) and at least two air intake passages (1b); Each of the air intake cavities (1a) is in communication with at least one of the air intake passages (1b), and the air intake passages (1b) extend through the second outer side wall surface (1d).

27. A processing device, characterized in that The processing equipment comprises a reaction chamber and a gas mixing device as claimed in any one of claims 1 to 26; The gas outlet (2a1) is in communication with the reaction chamber.

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