Preparation method of flexible integrated electrochromic device

Abstract

The invention provides a preparation method of a flexible integrated electrochromic device, which comprises the following steps: S1) mixing a crosslinking component A and a solvent to prepare a crosslinking component A premixing system; mixing the crosslinking component B with a solvent to prepare a crosslinking component B premixing system; the premixing system of the crosslinking component A and / or the premixing system of the crosslinking component B also comprises a non-crosslinking component; compounding a conductive layer on the surface of the flexible substrate layer to obtain a conductive film layer; s2) uniformly mixing the premixing system of the crosslinking component A and the premixing system of the crosslinking component B to form electrochromic slurry, and coating the electrochromic slurry on the surface of the conductive film layer; s3) combining the films, curing the electrochromic slurry, and forming a composite layer sequentially comprising a first flexible substrate surface, a first conductive layer, an integrated electrochromic layer, a second conductive layer and a second flexible substrate surface; and S4) performing laser slicing, electrode pasting and packaging to obtain the flexible integrated electrochromic device. According to the invention, the preparation of the flexible integrated electrochromic device can be completed very simply.

Description

Technical Field

[0001] The present invention relates to the technical field of organic electrochromic devices, and particularly to a preparation method of a flexible integrated electrochromic device. Background Art

[0002] An electrochromic device is an optoelectronic device that changes color by adjusting voltage. According to the type of substrate, it can be divided into a rigid electrochromic device and a flexible electrochromic device.

[0003] With the wide application of electrochromic devices, rigid electrochromic devices can no longer meet the actual needs. Flexible electrochromic devices have good bending performance and can be applied to fields such as wearable devices and flexible displays, thus obtaining a wider range of applications.

[0004] Currently, most flexible electrochromic devices are multi-layer structures, and each functional layer needs to be coated. The coating thickness of some functional layers in the multi-layer structure is relatively thin, resulting in the necessity to use precision coating such as slit coating to complete the single-layer preparation. Even after the single-layer preparation is completed at a high cost, technical problems such as sequential coating and multi-layer film formation still exist, and the preparation process is very cumbersome, and the yield is difficult to guarantee.

[0005] For a flexible integrated electrochromic device, only one electrochromic layer needs to be coated to complete the basic preparation of the device, which greatly simplifies the device preparation process and improves the yield. However, currently, the preparation of flexible integrated electrochromic devices faces problems such as high energy consumption in the photocuring and thermal curing of electrochromic slurries, and difficult control of the reaction window at room temperature, making it impossible to mass-produce flexible integrated electrochromic devices. Summary of the Invention

[0006] In view of this, the technical problem to be solved by the present invention is to provide a preparation method of a flexible integrated electrochromic device, which finally realizes the purpose of rapid curing and coating by splitting the electrochromic layer slurry into two components A and B.

[0007] To achieve the above object, the present invention provides a preparation method of a flexible integrated electrochromic device, including the following steps:

[0008] S1) Mix the crosslinking component A and the solvent to prepare a crosslinking component A premixed system;

[0009] Mix the crosslinking component B and the solvent to prepare a crosslinking component B premixed system;

[0010] Wherein, the crosslinking component A premixed system and / or the crosslinking component B premixed system further contains a non-crosslinking component;

[0011] The crosslinking component A and the crosslinking component B can undergo a crosslinking reaction to form an electrochromic layer;

[0012] Compound a conductive layer on the surface of a flexible substrate layer to obtain a conductive film layer;

[0013] S2) Mix a premixed system of crosslinking component A and a premixed system of crosslinking component B uniformly to form an electrochromic slurry, and coat it on the surface of the conductive film layer;

[0014] S3) Combine films to cure the electrochromic slurry, forming a composite layer that sequentially includes a first flexible substrate surface, a first conductive layer, an integrated electrochromic layer, a second conductive layer, and a second flexible substrate surface;

[0015] S4) Perform laser slicing, attach electrodes, and encapsulate to obtain a flexible integrated electrochromic device.

[0016] In the present invention, the slurry used for the electrochromic layer is split into two components A and B, and they are mixed with non-crosslinking components. Among them, crosslinking component A and crosslinking component B will undergo a crosslinking reaction after mixing, forming a network structure microscopically and a cured material macroscopically. In order to enable stable storage and use of each component before coating, the present invention splits crosslinking component A and crosslinking component B as mutually exclusive components, and forms the electrochromic layer by gradually reacting and curing by mixing components A and B before preparation, avoiding the problem that the electrochromic layer slurry undergoes a crosslinking reaction in advance and affects the device performance.

[0017] The non-crosslinking components can be premixed with component A or component B. In order to mix the multi-components uniformly, each component needs to be dissolved in a compatible solvent component.

[0018] Figure 1 It is a flow chart of the above preparation method.

[0019] The present invention can also take the non-crosslinking components as a single component. Specifically, the present invention provides a method for preparing a flexible integrated electrochromic device, including the following steps:

[0020] S11) Mix crosslinking component A and a solvent to prepare a premixed system of crosslinking component A;

[0021] Mix crosslinking component B and a solvent to prepare a premixed system of crosslinking component B;

[0022] The crosslinking component A and the crosslinking component B can undergo a crosslinking reaction to form an electrochromic layer;

[0023] Mix the non-crosslinking components and a solvent to prepare a premixed system of non-crosslinking components;

[0024] Compound a conductive layer on the surface of a flexible substrate layer to obtain a conductive film layer;

[0025] S22) Mix the premixed system of crosslinking component A, the premixed system of crosslinking component B, and the premixed system of non-crosslinking component evenly to form an electrochromic slurry, and coat it on the surface of the conductive film layer;

[0026] S33) Combine the films to cure the electrochromic slurry and form a composite layer that sequentially includes the surface of the first flexible substrate, the first conductive layer, the integrated electrochromic layer, the second conductive layer, and the surface of the second flexible substrate;

[0027] S44) Perform laser slicing, attach electrodes, and encapsulate to obtain a flexible integrated electrochromic device.

[0028] Optionally, the crosslinking component A includes one or more of acrylic resin and its derivatives, acrylic polyol and its derivatives, acrylic polyamine and its derivatives, alkyl polyol, and alkyl polyamine.

[0029] Optionally, the crosslinking component B includes one or more of diphenylmethane diisocyanate and its derivatives, toluene diisocyanate and its derivatives, isophorone diisocyanate and its derivatives, dicyclohexylmethane diisocyanate and its derivatives, hexamethylene diisocyanate and its derivatives, and L-lysine diisocyanate and its derivatives.

[0030] Optionally, the solvent includes one or more of γ-butyrolactone and its derivatives, dimethyl sulfoxide and its derivatives, N-methylpyrrolidone and its derivatives, N,N-dimethylacetamide and its derivatives, N,N-dimethylformamide and its derivatives, cyclopentyl methyl ether and its derivatives, sulfolane and its derivatives, propylene carbonate and its derivatives, and ethylene carbonate and its derivatives.

[0031] Optionally, the non-crosslinking component includes one or more of cathode and anode active materials, electrolyte materials, ion storage materials, coupling agents, and catalysts.

[0032] Optionally, the non-crosslinking component includes one or more of viologen and its derivatives, phenazine and its derivatives, ferrocene and its derivatives, tetrathiafulvalene and its derivatives, polythiophene and its derivatives, poly(3,4-ethylenedioxythiophene) and its derivatives, poly(3,4-propylenedioxythiophene) and its derivatives, polyaniline and its derivatives, polypyrrole and its derivatives, polyfuran and its derivatives, polyfluorene and its derivatives, polycarbazole and its derivatives, lithium phosphonitride, siloxane and its derivatives, tetrabutylbis(trifluoromethanesulfonyl)imide salt and its derivatives, 1-butyl-3-methylimidazolium hexafluorophosphate and its derivatives, polyethylene oxide, tetraethylammonium hexafluorophosphate and its derivatives, tetramethylammonium trifluoromethanesulfonate and its derivatives, tetramethylammonium trifluoroacetate and its derivatives, trimethyloctylammonium bromide and its derivatives, triethylammonium tetrafluoroborate and its derivatives, dibutyltin dilaurate and its derivatives, bis(dodecylthio)dibutyltin and its derivatives, dibutyltin diacetate and its derivatives, stannous octoate and its derivatives, and silane coupling agents.

[0033] In some specific embodiments of the present invention, the crosslinking component A includes: ethyl phenazine, methyl viologen, tetrabutylbis(trifluoromethanesulfonyl)imide, methyl ferrocene, acrylic resin, and dibutyltin dilaurate. The crosslinking component B includes: toluene diisocyanate. The solvent for the crosslinking component A and the crosslinking component B is γ-butyrolactone.

[0034] In some specific embodiments of the present invention, the crosslinking component A includes: acrylic polyol. The crosslinking component B includes: hexamethylene diisocyanate, tetrathiafulvalene, isopropyl viologen, tetraethylammonium hexafluorophosphate, hexamethyl ferrocene, and bis(dodecylthio)dibutyltin. The solvent for the crosslinking component A and the crosslinking component B is propylene carbonate.

[0035] In some specific embodiments of the present invention, the crosslinking component A includes: propylenedioxythiophene oligomer, 1-butyl-3-methylimidazolium hexafluorophosphate, EO-PO block copolymer, and dibutyltin diacetate. The crosslinking component B includes: isophorone diisocyanate, phenyl viologen, and decamethyl ferrocene. The solvent for the crosslinking component A and the crosslinking component B is cyclopentyl methyl ether.

[0036] Optionally, a spacer can be added to the above component A, component B, or non-crosslinking component, or added after mixing of each component. The morphology of the spacer is preferably spherical, and its materials include, but are not limited to, polyacrylic resin, polystyrene, carbon nanotubes, zirconia, nickel oxide, iron oxide, and silica, etc. The particle size is preferably 0.1 - 500 μm. The function of the spacer is to maintain the overall uniformity of the thickness of the integrated electrochromic layer of the flexible device.

[0037] Optionally, the coating method in step S2) or step S22) is double-roll coating, slot coating or knife coating.

[0038] The above coating on the surface of the conductive film layer is specifically on the side of the conductive film layer with the conductive layer.

[0039] Optionally, the method for curing the electrochromic slurry in step S3) or step S33) is room temperature curing, ultraviolet irradiation curing or heat curing.

[0040] By means of ultraviolet irradiation curing or heat curing, the kinetic process of the reaction can be accelerated and the curing can be speeded up.

[0041] The present invention has no special limitation on the materials of the conductive layer and the flexible substrate layer, and they can be general applicable materials for flexible integrated electrochromic devices.

[0042] Optionally, the material of the conductive layer is one or more of indium tin oxide, aluminum zinc oxide, fluorine-doped tin oxide, nano copper wire, nano silver wire, nano aluminum wire, metal copper grid, metal silver grid, metal aluminum grid, indium tin oxide-copper multi-layer composite material, indium tin oxide-silver multi-layer composite material, indium tin oxide-aluminum multi-layer composite material, graphene, carbon nanotube, nano silver paste.

[0043] Optionally, the material of the flexible substrate layer is selected from one or more of polyethylene terephthalate and its derivatives, polyethylene naphthalate and its derivatives, cyclic olefin copolymer and its derivatives, triacetate cellulose and its derivatives, polyethersulfone resin and its derivatives, polyimide and its derivatives, polycarbonate and its derivatives.

[0044] Optionally, the conductive layer is compounded on the surface of the flexible substrate layer by magnetron sputtering, screen printing, ion beam evaporation or chemical deposition.

[0045] The film combination is specifically the combination of the conductive film layer coated with the electrochromic slurry obtained in step S2) or step S22) and the conductive film layer not coated with the electrochromic slurry. After the electrochromic slurry is cured, a composite layer including a first flexible substrate surface, a first conductive layer, an integrated electrochromic layer, a second conductive layer, and a second flexible substrate surface is formed in sequence.

[0046] The structural schematic diagram of the flexible integrated electrochromic device prepared by the present invention is as Figure 2 shown. Among them, 21 and 25 are flexible substrate layers, 22 and 24 are conductive layers, and 23 is an integrated electrochromic layer.

[0047] The present invention has no special limitation on the thickness of each layer of the flexible integrated electrochromic device, and it can be adjusted according to process requirements.

[0048] Optionally, the thickness of the surface of the first flexible substrate is 20 to 2000 μm.

[0049] Optionally, the thickness of the first conductive layer is 5 to 5000 nm.

[0050] Optionally, the thickness of the integrated electrochromic layer is 2 to 2000 μm.

[0051] Optionally, the thickness of the second conductive layer is 5 to 5000 nm.

[0052] Optionally, the thickness of the second flexible substrate layer is 20 to 2000 μm.

[0053] Compared with the prior art, the present invention provides a method for preparing a flexible integrated electrochromic device, comprising the following steps: S1) Mixing the crosslinking component A and a solvent to prepare a pre-mixed system of the crosslinking component A; mixing the crosslinking component B and a solvent to prepare a pre-mixed system of the crosslinking component B; wherein, the pre-mixed system of the crosslinking component A and / or the pre-mixed system of the crosslinking component B further comprises a non-crosslinking component; the crosslinking component A and the crosslinking component B can undergo a crosslinking reaction to form an electrochromic layer; laminating the conductive layer on the surface of the flexible substrate layer to obtain a conductive film layer; S2) Mixing the pre-mixed system of the crosslinking component A and the pre-mixed system of the crosslinking component B evenly to form an electrochromic slurry, and coating the electrochromic slurry on the surface of the conductive film layer; S3) Combining the films to cure the electrochromic slurry, forming a composite layer sequentially including the surface of the first flexible substrate, the first conductive layer, the integrated electrochromic layer, the second conductive layer, and the surface of the second flexible substrate; S4) Laser slicing, attaching electrodes, and encapsulating to obtain a flexible integrated electrochromic device.

[0054] The present invention adopts the structure of a flexible integrated electrochromic device, avoiding the process problems of a multi-layer structure, completing the coating and film combination of all materials at one time, being simpler and more efficient, and having a higher yield. At the same time, the present invention first adopts the method of mixing and coating two-component A and B, and can very simply complete the preparation of a flexible integrated electrochromic device, having good market application prospects. Description of the Drawings

[0055] Figure 1 It is a flowchart of the method for preparing a flexible integrated electrochromic device provided by the present invention;

[0056] Figure 2 It is a schematic structural diagram of the flexible integrated electrochromic device prepared by the present invention. Detailed Embodiments

[0057] In order to further illustrate the present invention, the following embodiments are used to describe in detail the method for preparing a flexible integrated electrochromic device provided by the present invention.

[0058] Example 1

[0059] S1. Dissolve 2 kg of ethyl phenazine, 7.9 kg of methyl viologen, 26.2 kg of tetrabutylammonium bis(trifluoromethanesulfonyl)imide, 0.2 kg of methylferrocene, 34.6 kg of acrylic resin and 0.1 kg of dibutyltin dilaurate in 98 L of γ-butyrolactone and mix evenly to form a premixed system of Component A;

[0060] S2. Dissolve 3.6 kg of toluene diisocyanate in 2 L of γ-butyrolactone and mix evenly to form Component B;

[0061] S3. Mix the solutions prepared in S1 and S2, add spacers (the morphology of the spacers is spherical, the material is polyacrylic resin, and the particle size is 50 μm), stir evenly, and quickly coat on the PET-ITO conductive film by means of double-roll coating;

[0062] S4. Wait for the electrochromic slurry to cure after laminating the films;

[0063] S5. Slice with a slitting knife, attach electrodes and encapsulate to obtain a flexible integrated electrochromic device.

[0064] When the transmittance of the flexible substrate is greater than 90%, the average transmittance data of the colored state and non-colored state of the electrochromic layer with different thicknesses in the visible light range (380 - 780 nm) are shown in Table 1 below. Among them, the transmittance of the colored state and the transmittance of the non-colored state are measured according to the method in GB / T268094 "Determination of Visible Light Transmittance, Solar Direct Transmittance, Total Solar Transmittance, Ultraviolet Transmittance and Related Window Glass Parameters of Architectural Glass".

[0065] Table 1

[0066] Electrochromic layer thickness / μm Colored state / % Non - colored state / % 20 1.2 86 50 1.1 85 100 0.6 82 300 0.2 80

[0067] Under the condition that the active area is 100 mm * 100 mm, the coloring time and fading time of the electrochromic layer with different thicknesses are shown in Table 2 below. The measurement methods of the coloring time and fading time are as follows: Put the above-mentioned electrochromic devices into a UV-visible spectrometer respectively, detect the maximum transmittance and the minimum transmittance at 550 nm, and the time taken for the transmittance to change from the maximum value to the minimum value is recorded as the coloring time, and the time taken for the transmittance to change from the minimum value to the maximum value is recorded as the fading time.

[0068] Table 2

[0069] Electrochromic layer thickness / μm Coloring time / s Fading time / s 20 8 25 50 12 35 100 20 50 300 25 70

[0070] Example 2

[0071] S1. Dissolve 31.5 kg of acrylic polyol in 50 L of propylene carbonate to form Component A;

[0072] S2. Dissolve 3.1 kg of hexamethylene diisocyanate, 10 kg of tetrathiafulvalene, 8.2 kg of isopropyl viologen, 18.6 kg of tetraethylammonium hexafluorophosphate, 0.3 kg of hexamethylferrocene and 0.1 kg of bis(dodecylthio)dibutyltin in 50 L of propylene carbonate and mix evenly to form a premixed system of Component B;

[0073] S4. After mixing the solutions prepared in S1 and S2, add spacers (the morphology of the spacers is spherical, the material is polystyrene, and the particle size is 100 μm), stir evenly, and quickly coat it on the metal grid conductive film by slit coating;

[0074] S4. After film formation, accelerate the curing of the electrochromic slurry by ultraviolet irradiation;

[0075] S5. Carry out die cutting, electrode pasting and encapsulation to obtain a flexible integrated electrochromic device.

[0076] When the transmittance of the flexible substrate is greater than 90%, the average transmittance data of the colored state and non-colored state of the electrochromic layer with different thicknesses in the visible light range (380 - 780 nm) are shown in Table 3 below. The test method is the same as that in Example 1.

[0077] Table 3

[0078] Electrochromic layer thickness / μm Colored state / % Non - colored state / % 20 1.0 87 50 0.8 85 100 0.7 83 300 0.2 81

[0079] Under the condition that the active area is 100 mm * 100 mm, the coloring time and fading time of the electrochromic layer with different thicknesses are shown in Table 4 below. The test method is the same as that in Example 1.

[0080] Table 4

[0081] Electrochromic layer thickness / μm Coloring time / s Fading time / s 20 12 30 50 18 40 100 25 60 300 35 85

[0082] Example 3

[0083] S1. Dissolve 3.5 kg of propylenedioxythiophene oligomer, 23.6 kg of 1-butyl-3-methylimidazolium hexafluorophosphate, 21.3 kg of EO-PO block copolymer and 0.1 kg of dibutyltin diacetate in 70 L of cyclopentyl methyl ether and mix evenly to form a premixed system of Component A;

[0084] S2. Dissolve 4.2 kg of isophorone diisocyanate, 9.3 kg of phenyl viologen and 0.3 kg of decamethylferrocene in 30 L of cyclopentyl methyl ether and mix evenly to form a premixed system of Component B;

[0085] S3. After mixing the solutions prepared in S1 and S2, add spacers (the morphology of the spacers is spherical, the material is carbon nanotubes, and the particle size is 300 μm), stir evenly, and quickly coat it on the nano-silver conductive film by doctor blade coating;

[0086] S4. After film lamination, accelerate the curing of the electrochromic slurry by heating;

[0087] S5. Perform laser slicing, electrode pasting, and encapsulation to obtain a flexible integrated electrochromic device.

[0088] When the transmittance of the flexible substrate is greater than 90%, the average transmittance data of the colored state and non-colored state of electrochromic layers with different thicknesses in the visible light range (380 - 780 nm) are shown in Table 5 below. The test method is the same as that in Example 1.

[0089] Table 5

[0090] Electrochromic layer thickness / μm Colored state / % Non - colored state / % 20 1.5 88 50 1.3 84 100 1.0 83 300 0.6 82

[0091] Under the condition that the active area is 100 mm * 100 mm, the coloring time and fading time of electrochromic layers with different thicknesses are shown in Table 6 below. The test method is the same as that in Example 1.

[0092] Table 6

[0093] Electrochromic layer thickness / μm Coloring time / s Fading time / s 20 6 18 50 10 30 100 18 45 300 24 65

[0094] The descriptions of the above embodiments are only used to help understand the method and its core idea of the present invention. It should be noted that for those of ordinary skill in the art of this technology, without departing from the principle of the present invention, several improvements and modifications can still be made to the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

Claims

1. A preparation method of a flexible integrated electrochromic device, characterized in that, It includes the following steps: S1) Mix the crosslinking component A and the solvent to prepare a crosslinking component A premixed system; Mix the crosslinking component B and the solvent to prepare a crosslinking component B premixed system; Wherein, the crosslinking component A premixed system and / or the crosslinking component B premixed system further contains a non-crosslinking component; The crosslinking component A and the crosslinking component B can undergo a crosslinking reaction to form an electrochromic layer; Compound the conductive layer on the surface of the flexible substrate layer to obtain a conductive film layer; S2) Mix the crosslinking component A premixed system and the crosslinking component B premixed system evenly to form an electrochromic slurry, and coat it on the surface of the conductive film layer; S3) Combine the films to cure the electrochromic slurry, forming a composite layer that sequentially includes a first flexible substrate surface, a first conductive layer, an integrated electrochromic layer, a second conductive layer, and a second flexible substrate surface; S4) Perform laser slicing, attach electrodes, and encapsulate to obtain a flexible integrated electrochromic device.

2. A preparation method of a flexible integrated electrochromic device, characterized in that, It includes the following steps: S11) Mix the crosslinking component A and the solvent to prepare a crosslinking component A premixed system; Mix the crosslinking component B and the solvent to prepare a crosslinking component B premixed system; The crosslinking component A and the crosslinking component B can undergo a crosslinking reaction to form an electrochromic layer; Mix the non-crosslinking component and the solvent to prepare a non-crosslinking component premixed system; Compound the conductive layer on the surface of the flexible substrate layer to obtain a conductive film layer; S22) Mix the crosslinking component A premixed system, the crosslinking component B premixed system, and the non-crosslinking component premixed system evenly to form an electrochromic slurry, and coat it on the surface of the conductive film layer; S33) Combine the films to cure the electrochromic slurry, forming a composite layer that sequentially includes a first flexible substrate surface, a first conductive layer, an integrated electrochromic layer, a second conductive layer, and a second flexible substrate surface; S44) Perform laser slicing, attach electrodes, and encapsulate to obtain a flexible integrated electrochromic device.

3. The preparation method of the flexible integrated electrochromic device according to claim 1 or 2, characterized in that, The crosslinking component A includes one or more of acrylic resins and their derivatives, acrylic polyols and their derivatives, acrylic polyamines and their derivatives, alkyl polyols, and alkyl polyamines; The crosslinking component B includes one or more of diphenylmethane diisocyanate and its derivatives, toluene diisocyanate and its derivatives, isophorone diisocyanate and its derivatives, dicyclohexylmethane diisocyanate and its derivatives, hexamethylene diisocyanate and its derivatives, and L-lysine diisocyanate and its derivatives.

4. The preparation method of the flexible integrated electrochromic device according to claim 1 or 2, characterized in that, The solvent includes one or more of γ-butyrolactone and its derivatives, dimethyl sulfoxide and its derivatives, N-methylpyrrolidone and its derivatives, N,N-dimethylacetamide and its derivatives, N,N-dimethylformamide and its derivatives, cyclopentyl methyl ether and its derivatives, sulfolane and its derivatives, propylene carbonate and its derivatives, and ethylene carbonate and its derivatives.

5. The preparation method of the flexible integrated electrochromic device according to claim 1 or 2, characterized in that, The non-crosslinking component includes one or more of cathode and anode active materials, electrolyte materials, ion storage materials, coupling agents, and catalysts.

6. The preparation method of the flexible integrated electrochromic device according to claim 5, characterized in that, The non-crosslinked components include one or more of viologen and its derivatives, phenazine and its derivatives, ferrocene and its derivatives, tetrathiafulvalene and its derivatives, polythiophene and its derivatives, poly(3,4-ethylenedioxythiophene) and its derivatives, poly(3,4-propylenedioxythiophene) and its derivatives, polyaniline and its derivatives, polypyrrole and its derivatives, polyfuran and its derivatives, polyfluorene and its derivatives, polycarbazole and its derivatives, lithium phosphonitride, siloxane and its derivatives, tetrabutylbis(trifluoromethanesulfonyl)imide salt and its derivatives, 1-butyl-3-methylimidazolium hexafluorophosphate and its derivatives, polyethylene oxide, tetraethylammonium hexafluorophosphate and its derivatives, tetramethylammonium trifluoromethanesulfonate and its derivatives, tetramethylammonium trifluoroacetate and its derivatives, trimethyloctylammonium bromide and its derivatives, triethylammonium tetrafluoroborate and its derivatives, dibutyltin dilaurate and its derivatives, dibutyltin bis(dodecylthiol) and its derivatives, dibutyltin diacetate and its derivatives, stannous octoate and its derivatives, and silane coupling agent.

7. The preparation method of the flexible integrated electrochromic device according to claim 1, wherein The coating method in the step S2) is double-roll coating, slot coating or blade coating; The method for curing the electrochromic slurry in the step S3) is room temperature curing, ultraviolet radiation curing or heat curing.

8. The preparation method of the flexible integrated electrochromic device according to claim 2, characterized in that The coating method in the step S22) is double-roll coating, slot coating or blade coating; The method for curing the electrochromic slurry in the step S33) is room temperature curing, ultraviolet radiation curing or heat curing.

9. The preparation method of the flexible integrated electrochromic device according to claim 1 or 2, characterized in that, The material of the conductive layer is one or more of indium tin oxide, aluminum zinc oxide, fluorine-doped tin oxide, nano copper wire, nano silver wire, nano aluminum wire, metal copper grid, metal silver grid, metal aluminum grid, indium tin oxide-copper multi-layer composite material, indium tin oxide-silver multi-layer composite material, indium tin oxide-aluminum multi-layer composite material, graphene, carbon nanotube, and nano silver paste; The conductive layer is compounded on the surface of the flexible base layer by magnetron sputtering, screen printing, ion beam evaporation or chemical deposition; The material of the flexible base layer is selected from one or more of polyethylene terephthalate and its derivatives, polyethylene naphthalate and its derivatives, cyclic olefin copolymer and its derivatives, cellulose triacetate and its derivatives, polyethersulfone resin and its derivatives, polyimide and its derivatives, and polycarbonate and its derivatives.

10. The preparation method of the flexible integrated electrochromic device according to claim 1 or 2, characterized in that, The thickness of the first flexible base surface is 20 - 2000 μm; The thickness of the first conductive layer is 5 - 5000 nm; The thickness of the integrated electrochromic layer is 2 - 2000 μm; The thickness of the second conductive layer is 5 - 5000 nm; The thickness of the second flexible base layer is 20 - 2000 μm.

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