Apparatus for processing substrate and valve assembly used in the apparatus

Abstract

An apparatus for processing a substrate and a valve assembly used in the apparatus are disclosed. Specifically disclosed is a substrate processing apparatus including a valve assembly including a body and a diaphragm, and the body includes an inlet port through which a processing liquid is introduced from a liquid supply source side, an outlet port through which the processing liquid is discharged to a liquid processing chamber side, and a recirculation port through which the processing liquid is discharged from the liquid supply source side to the liquid processing chamber side. The process liquid is returned to the liquid supply source side through the recirculation port. The diaphragm opens and closes a flow path through which the process fluid flows to the outlet port side. The process liquid introduced into the body of the valve assembly is supplied to the nozzle through the outlet port or recovered to the liquid supply source side through the recirculation port.

Description

[0001] Cross - reference to related applications

[0002] This application claims the priority and benefit of Korean Patent Application No. 10 - 2023 - 0191424, filed with the Korean Intellectual Property Office on December 26, 2023, the entire content of which is incorporated herein by reference. Technical Field

[0003] The present invention relates to an apparatus for processing a substrate, and more particularly, to an apparatus for liquid - processing a substrate by supplying a processing liquid to the substrate and a valve assembly provided on the apparatus to control whether to supply the processing liquid. Background Art

[0004] In order to manufacture semiconductor devices or liquid crystal displays, various processes such as photolithography, etching, ashing, ion implantation, thin - film deposition, and cleaning are performed on a substrate. Among them, in the cleaning process, a processing liquid is supplied to the substrate to remove a thin film or particles on the substrate.

[0005] Generally, in the cleaning process, a nozzle supplies a processing liquid from the top of the substrate.

[0006] The processing liquid can be a chemical, pure water, an organic solvent, etc. An apparatus for performing the cleaning process has a nozzle and a liquid supply line for supplying the processing liquid to the nozzle, and a valve for opening and closing a flow path is generally provided in the liquid supply line.

[0007] Figure 1 is a cross - sectional view schematically showing the structure of a commonly used valve. Referring to Figure 1 , the valve has a body in which a buffer space is formed, and an inflow path through which the processing liquid is introduced and an outflow path through which the processing liquid is discharged are formed in the buffer space. The inflow path and the outflow path are connected to the buffer space, and a diaphragm for opening and closing the outflow path is provided in the buffer space. In the above structure, when the diaphragm closes the outflow path, the processing liquid stays in the buffer space.

[0008] Specifically, in the structure shown in Figure 1 , the processing liquid flowing into the inflow path is distributed to opposite sides of the diaphragm within the buffer space. Therefore, as shown in Figure 2 , since the processing liquid forms vortices due to collision in the region opposite to the connection region of the inflow path, the amount of generated particles is large.

[0009] When the processing liquid stays in the buffer space for a long time, particles are generated in the processing liquid. When the diaphragm opens the outflow path and supplies the processing liquid to the substrate, the particles staying in the buffer space are supplied to the substrate together with the processing liquid. Summary of the Invention

[0010] The present invention is dedicated to providing a valve assembly and a substrate processing apparatus including the valve assembly that can minimize the discharge of a processing liquid containing particles to a substrate when processing the substrate.

[0011] The present invention is also dedicated to providing a valve assembly and a substrate processing apparatus including the valve assembly that can solve the problem of particle generation in the processing liquid staying in the valve when the valve is closed.

[0012] The problems to be solved by the present invention are not limited to the above problems, and those skilled in the art will clearly understand the problems not mentioned from the following description.

[0013] An exemplary embodiment of the present invention provides an apparatus for processing a substrate, the apparatus including: a liquid processing chamber formed with a processing space in which a processing liquid is supplied to the substrate to perform liquid processing on the substrate; and a liquid supply unit for supplying the processing liquid to the liquid processing chamber, wherein the liquid supply unit includes: a liquid supply pipeline through which the processing liquid flows; and a valve assembly installed in the liquid supply pipeline, and the valve assembly includes: a body including an inlet port, an outlet port, and a recirculation port, introducing the processing liquid from the liquid supply source side through the inlet port, discharging the processing liquid to the liquid processing chamber side through the outlet port, and returning the processing liquid to the liquid supply source side through the recirculation port; and a diaphragm provided to the body and opening and closing a flow path for the processing fluid to flow to the outlet port side.

[0014] According to this example, the body may be formed with: a buffer space; an inflow path connecting the inlet port and the buffer space; an outflow path connecting the buffer space and the outlet port; and a recirculation path connecting the buffer space and the recirculation port therein.

[0015] According to this example, the valve assembly may further include a driver for moving the diaphragm between an open position for opening the outflow path and a closed position for closing the outflow path, and when the diaphragm is in the closed position, the diaphragm is located in the buffer space.

[0016] According to this example, the buffer space is defined by an inner wall, a bottom wall, and an upper wall, and when the diaphragm is in the closed position, the position of the diaphragm may be spaced apart from the inner wall.

[0017] According to this example, the buffer space is set in a cylindrical shape, and the central axis of the buffer space and the central axis of the diaphragm can coincide with each other.

[0018] According to this example, the inlet of the outflow path can be located in the bottom wall.

[0019] According to this example, the outlet of the inflow path and the inlet of the recirculation path can each be located at the inner wall.

[0020] According to this example, the outlet of the inflow path and the inlet of the recirculation path can each be located at the inner wall.

[0021] According to this example, when viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path can be arranged in a straight line in sequence.

[0022] According to this example, the liquid supply source includes a supply tank in which the processing liquid is stored, and the liquid supply pipeline includes: a first pipeline that connects the liquid supply source to the inlet port of the valve assembly; a second pipeline that connects the outlet port of the valve assembly to the liquid processing chamber, and the recirculation port and the supply tank can be connected through a recirculation pipeline.

[0023] According to this example, an on / off valve can be installed on the recirculation pipeline.

[0024] According to this example, the valve assembly is further formed with a suction space that communicates directly with the outflow path, and the valve assembly further includes a suction plate that adjusts the volume of the suction space.

[0025] According to another example, the substrate processing apparatus further includes a controller for controlling the driver and the on / off valve. The position of the diaphragm in the state where the diaphragm is lifted and the outflow path is opened is referred to as the open position, and the position of the diaphragm in the state where the diaphragm is lowered and the outflow path is closed is referred to as the closed position. The controller can control the driver and the on / off valve to open the on / off valve when the diaphragm is in the closed position and close the on / off valve when the diaphragm is in the open position.

[0026] Another exemplary embodiment of the present invention provides a valve assembly, which includes: a body that includes: an inlet port through which the processing liquid is introduced from the liquid supply source side; an outlet port through which the processing liquid is discharged to the liquid processing chamber side; and a body that includes a recirculation port for returning the processing liquid to the liquid supply source side; and a diaphragm that is disposed on the body and opens and closes the flow path of the processing fluid flowing to the outlet port side.

[0027] According to this example, a buffer space, an inflow path, an outflow path, and a recirculation path are formed in the body, and the diaphragm moves between an open position for opening the outflow path and a closed position for closing the outflow path. When the diaphragm is in the closed position, the diaphragm is located in the buffer space. When the diaphragm is in the closed position, the position of the diaphragm is spaced apart from the inner wall.

[0028] According to this example, the outlet of the inflow path and the inlet of the recirculation path may each be located at the inner wall.

[0029] According to this example, when viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path may be arranged in a straight line in sequence.

[0030] According to another example, the outlet of the inflow path and the inlet of the recirculation path may each be located in the bottom wall.

[0031] According to this example, when viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path may be arranged in a straight line in sequence.

[0032] Yet another exemplary embodiment of the present invention provides an apparatus for processing a substrate, the apparatus comprising: a liquid processing chamber having a processing space in which a processing liquid is supplied to the substrate to perform liquid processing on the substrate; and a liquid supply unit for supplying the processing liquid to the liquid processing chamber, wherein the liquid supply unit comprises: a supply tank in which the processing liquid is stored; a liquid supply pipeline through which the processing liquid in the supply tank flows into the liquid processing chamber; and a valve assembly installed in the liquid supply pipeline, and the valve assembly comprises: a body including an inlet port, an outlet port, and a recirculation port and a buffer space, the processing liquid is introduced from the liquid supply source side through the inlet port, the processing liquid is discharged to the liquid processing chamber side through the outlet port, the processing liquid is returned to the liquid supply source side through the recirculation port, and the body is formed with an inflow path, an outflow path, and a recirculation path, the inflow path connecting the inlet port and the buffer space, the outflow path connecting the buffer space and the outlet port, the recirculation path connecting the buffer space and the recirculation port; a diaphragm located in the buffer space and opening and closing the inlet of the outflow path; and a driver for moving the diaphragm between an open position for opening the inlet of the outflow path and a closed position for closing the inlet of the outflow path, the buffer space being defined by an inner wall, a bottom wall, and an upper wall, and when the diaphragm is in the closed position, the diaphragm is located in the buffer space and spaced apart from the inner wall, the recirculation port and the supply tank are connected through a recirculation pipeline, and an on / off valve is installed on the recirculation pipeline.

[0033] According to an exemplary embodiment of the present invention, when a processing liquid is discharged onto a substrate through a liquid supply line in which a valve is installed, the discharge of the processing liquid containing particles onto the substrate can be minimized.

[0034] In addition, according to an exemplary embodiment of the present invention, particles generated due to the processing liquid staying in the valve when the valve is closed can be prevented.

[0035] The effects of the present invention are not limited to the above effects, and those skilled in the art will clearly understand the effects not mentioned from the specification and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] After being described in detail in conjunction with the drawings, various features and advantages of the non-limiting exemplary embodiments of this specification can be more clearly understood. The drawings are for reference only and should not be construed as limiting the scope of the claims. Unless explicitly stated, the drawings should not be considered to be drawn to scale. For clarity, various dimensions in the figures may be exaggerated.

[0037] Figure 1 A cross-sectional view schematically showing a cross-section of a conventional valve assembly.

[0038] Figure 2 A top view of a conventional valve assembly.

[0039] Figure 3 A top plan view of a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0040] Figure 4 For schematically showing in Figure 3 a cross-sectional view of the structure of the liquid processing chamber.

[0041] Figure 5 A schematic diagram schematically showing the configuration of a liquid supply unit according to an exemplary embodiment of the present invention.

[0042] Figure 6 For schematically showing Figure 5 a cross-sectional view of an exemplary embodiment of a valve assembly.

[0043] Figure 7 For showing Figure 6 a top view of the configuration of a valve assembly.

[0044] Figure 8 For schematically showing the flow of a processing liquid in Figure 6 the open position of a valve assembly.

[0045] Figure 9 For schematically showing the flow of a processing liquid in Figure 6 the closed position of a valve assembly.

[0046] Figures 10 to 14 Schematic cross-sectional views respectively showing modified examples of valve assemblies Figure 6 are shown.

[0047] Figure 15 Schematic views showing modified examples of liquid supply units Figure 5 are shown. DETAILED DESCRIPTION

[0048] Hereinafter, exemplary embodiments of the present invention will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the present invention are shown. However, the present invention may be implemented differently and is not limited to the following exemplary embodiments. In addition, when describing the exemplary embodiments of the present invention in detail, if it is determined that a detailed description of related known functions or configurations may unnecessarily obscure the gist of the present invention, the detailed description of these known functions or configurations will be omitted. In addition, throughout the drawings, the same reference numerals are used for parts having similar functions and actions.

[0049] In addition, unless explicitly stated to the contrary, "comprise" and variations such as "comprises" or "comprising" will be understood to imply the inclusion of the stated elements but not the exclusion of any other elements. It should be understood that the terms "comprise" and "have" are intended to specify the presence of the features, quantities, operations, components and parts, or combinations thereof described in this specification, and do not exclude the possibility of the pre-existence or addition of one or more other features, quantities, operations, components and parts, or combinations thereof.

[0050] The singular expressions used herein include plural expressions unless they have a clearly contrary meaning in the context. Therefore, for a clearer description, the shapes and sizes of the elements in the drawings may be exaggerated.

[0051] The expression "and / or" includes each of the items mentioned and all combinations including one or more of these items. In addition, in this specification, "connection" not only means that member A and member B are directly connected, but also means that member A and member B are indirectly connected through member C interposed between member A and member B.

[0052] The exemplary embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited by the following exemplary embodiments. These exemplary embodiments are provided to more fully explain the present invention to those skilled in the art. Therefore, the shapes of the elements in the drawings are exaggerated for a more clear description.

[0053] Figure 3A top plan view of a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0054] Hereinafter, the substrate may be a wafer or a mask for manufacturing a semiconductor, or a substrate for manufacturing a display panel.

[0055] Referring to Figure 3 , the substrate processing system includes an indexing module 10, a processing module 20, and a controller (not shown). According to an exemplary embodiment, the indexing module 10 and the processing module 20 are arranged in one direction. Hereinafter, the direction in which the indexing module 10 and the processing module 20 are arranged is referred to as a first direction 92, and when viewed from above, the direction perpendicular to the first direction 92 is referred to as a second direction 94, and the direction that is in both the first direction 92 and the second direction 94 is referred to as a third direction 96.

[0056] The indexing module 10 transfers the substrate W from a container 80 that houses the substrate W therein to the processing module 20, and houses the substrate W that has been processed in the processing module 20 into the container 80. The longitudinal direction of the indexing module 10 is arranged along the second direction 94. The indexing module 10 includes a load port 12 and an indexing frame 14. Based on the indexing frame 14, the load port 12 is located at the opposite side of the processing module 20. The container 80 that houses the substrate W therein is placed on the load port 12. The load port 12 may be provided in plurality, and the plurality of load ports 12 may be arranged along the second direction 94.

[0057] An indexing robot 120 is provided to the indexing frame 14. A guide rail 140 whose longitudinal direction is arranged in the second direction 94 is provided inside the indexing frame 14, and the indexing robot 120 may be provided to be movable on the guide rail 140. The indexing robot 120 includes a hand 122 on which the substrate W is placed, and the hand 122 may be provided to be movable forward and backward, rotatable about the third direction 96, and movable along the third direction 96. A plurality of hands 122 may be provided while being spaced apart from each other in the vertical direction, and can move forward and backward independently.

[0058] The processing module 20 includes a buffer unit 200, a transfer chamber 300, and a liquid processing chamber 400. The buffer unit 200 provides a space in which the substrate W loaded into the processing module 20 and the substrate W unloaded from the processing module 20 stay temporarily. The liquid processing chamber 400 performs a liquid processing process for liquid-processing the substrate W by supplying a liquid to the substrate W. The liquid processing chamber 400 performs a drying process for removing the liquid remaining on the substrate W. The transfer chamber 300 transfers the substrate W between the buffer unit 200 and the liquid processing chamber 400.

[0059] The transfer chamber 300 may be arranged such that the longitudinal direction is the first direction 92. The buffer unit 200 may be arranged between the indexing module 10 and the transfer chamber 300. A plurality of liquid processing chambers 400 are provided, and the plurality of liquid processing chambers may be provided on the sides of the transfer chamber 300. The liquid processing chambers 400 and the transfer chamber 300 may be arranged along the second direction 94. The buffer unit 200 may be located at one end of the transfer chamber 300.

[0060] According to an example, the liquid processing chambers 400 may be respectively provided on both sides of the transfer chamber 300. At each of the two sides of the transfer chamber 300, the liquid processing chambers 400 may be arranged in an array of A×B (where each of A and B is a natural number of 1 or greater than 1) in the first direction 92 and the third direction 96.

[0061] The transfer chamber 300 includes a transfer robot 320. A guide rail 340 having a longitudinal direction along the first direction 92 is provided in the transfer chamber 300, and the transfer robot 320 may be arranged to be movable on the guide rail 340. The transfer robot 320 includes a hand 322 on which a substrate W is placed, and the hand 322 may be arranged to be movable forward and backward, rotatable about the third direction 96, and movable along the third direction 96. A plurality of hands 322 may be arranged at intervals in the vertical direction, and the plurality of hands 322 may move forward and backward independently of each other.

[0062] The buffer unit 200 includes a plurality of buffer areas 220 on which the substrate W is placed. The buffer areas 220 may be arranged at intervals in the third direction 96. The front and rear of the buffer unit 200 are open. The front is the face facing the indexing module 10, and the rear is the face facing the transfer chamber 300. The indexing robot 120 may approach the buffer unit 200 through the front, and the transfer robot 320 may approach the buffer unit 200 through the rear.

[0063] Figure 4 For schematically showing the Figure 3 cross-sectional view of the structure of the liquid processing chamber in

[0064] Referring to Figure 4 , the liquid processing chamber 400 includes a housing 410, a cup-shaped member 420, a support unit 440, a nozzle unit 460, and a lifting unit 480. The housing 410 is arranged in the shape of a substantially rectangular parallelepiped. The cup-shaped member 420, the support unit 440, and the nozzle unit 460 are provided inside the housing 410.

[0065] The cup-shaped member 420 has a top-opened processing space, and liquid processing of the substrate W is performed in the processing space. The support unit 440 supports the substrate W in the processing space. The nozzle unit 460 supplies liquid onto the substrate W supported on the support unit 440. A plurality of types of liquid can be provided, and the plurality of types of liquid can be sequentially supplied onto the substrate W. The lifting unit 480 adjusts the relative height between the cup-shaped member 420 and the support unit 440.

[0066] The cup-shaped member 420 includes a plurality of recovery containers 422, 424, and 426. Each of the recovery containers 422, 424, and 426 has a recovery space for recovering the liquid used for processing the substrate. Each of the recovery containers 422, 424, and 426 is arranged in an annular shape around the support unit 440. During the liquid processing process, the pretreatment liquid sputtered by the rotation of the substrate W flows into the recovery space through the inlets 422a, 424a, and 426a of the recovery containers 422, 424, and 426, respectively. According to an exemplary embodiment, the cup-shaped member 420 includes a first recovery container 422, a second recovery container 424, and a third recovery container 426. The first recovery container 422 is arranged around the support unit 440, the second recovery container 424 is arranged around the first recovery container 422, and the third recovery container 426 is arranged around the second recovery container 424. The second inlet 424a for introducing liquid into the second recovery container 424 may be positioned above the first inlet 422a for introducing liquid into the first recovery container 422, and the third inlet 426a for introducing liquid into the third recovery container 426 may be positioned above the second inlet 424a.

[0067] The support unit 440 includes a support plate 442 and a drive shaft 444. The upper surface of the support plate 442 may be arranged in a substantially circular shape and may have a diameter larger than the diameter of the substrate W. A support pin 442a for supporting the rear surface of the substrate W is provided at the center of the support plate 442, and the upper end of the support pin 442a is arranged to protrude from the support plate 442 such that the substrate W is spaced apart from the support plate 442 by a predetermined distance. Chuck pins 442b are provided to the edge of the support plate 442. The chuck pins 442b are arranged to protrude upward from the support plate 442 and support the lateral portion of the substrate W such that the substrate W does not separate from the support unit 440 when the substrate W rotates. The drive shaft 444 driven by a driver 446 is connected to the center of the bottom surface of the substrate W and rotatably supports the support plate 442 about its central axis.

[0068] The nozzle unit 460 includes a first nozzle 462, a second nozzle 464, and a third nozzle 466. The first nozzle 462 supplies a first liquid onto the substrate W. The first liquid may be a liquid for removing a film or foreign substances remaining on the substrate W. For example, the first liquid may be an acidic component chemical (such as sulfuric acid, hydrofluoric acid, phosphoric acid, or hydrochloric acid), a basic component chemical (such as ammonia), or a mixture of an acid and a base. The second nozzle 464 supplies a second liquid onto the substrate W. The second liquid is water. The third nozzle 466 supplies a third liquid onto the substrate W. According to an exemplary embodiment, the third liquid may be an organic solvent. The organic solvent may be isopropyl alcohol (IPA). The first nozzle 462, the second nozzle 464, and the third nozzle 466 are supported by different arms 461, and these arms 461 may move independently. Alternatively, the first nozzle 462, the second nozzle 464, and the third nozzle 466 may be mounted on the same arm 461 and may move simultaneously.

[0069] The lifting unit 480 moves the cup-shaped member 420 in the vertical direction. By moving the cup-shaped member 420 up and down, the relative height between the cup-shaped member 420 and the substrate W is changed. In this way, the recovery containers 422, 424, 426 for the pre-treatment liquid to be recovered are changed according to the type of the liquid supplied to the substrate W, so that the liquid can be separated and recovered. Different from the description, the cup-shaped member 420 may be fixedly mounted, and the lifting unit 480 may move the support unit 440 in the vertical direction.

[0070] The liquid supply unit 490 supplies a processing liquid to the nozzle unit 460. Hereinafter, the present invention will be described by taking as an example the case where the processing liquid is a chemical and the chemical is supplied to the first nozzle 462 of the nozzle unit 460. For example, the chemical may be a liquid containing sulfuric acid or hydrofluoric acid. Hereinafter, the nozzle unit 460 of the liquid processing chamber 400 will be referred to as the nozzle 460.

[0071] Figure 5 A schematic diagram of a liquid supply unit schematically showing a configuration of supplying a processing liquid to a nozzle of a liquid processing chamber according to an exemplary embodiment of the present invention.

[0072] Referring to Figure 5 , the liquid supply unit 500 includes a liquid supply source 520, a liquid supply pipeline 540, a valve assembly 600, a recirculation pipeline 560, and a controller 580. The liquid supply source 520 stores the processing liquid supplied to the liquid processing chamber 400. The liquid supply source 520 includes a supply tank 522. The supply tank 522 may have a cylindrical shape. A space for storing the processing liquid is formed inside the supply tank 522.

[0073] The liquid supply line 540 supplies the processing liquid in the liquid supply source to the nozzle 460 of the liquid processing chamber 400. The liquid supply line 540 connects the supply tank 522 to the nozzle 460. The valve assembly 600 is installed in the liquid supply line 540. The liquid supply line 540 may include a first line 542 and a second line 544. A pump 546 is installed in the first line 542. The pump 546 provides a flow pressure such that the processing liquid flows from the supply tank 522 to the nozzle 460. Additionally, a flow meter 548 or a static pressure valve 550 may be installed in the first line 542. Additionally, other components (such as a filter 552, a heater 554, and various types of valves) may be selectively installed in the first line 542 and the second line 544. The filter 552 removes foreign substances from the processing liquid flowing through the liquid supply line 540. The heater 554 heats the processing liquid in the liquid supply line 540 to a temperature suitable for processing the substrate.

[0074] A recirculation line 560 is provided to selectively recirculate the processing liquid in the valve assembly 600 to the supply tank 522. An on / off valve 562 is installed in the recirculation line 560.

[0075] Figure 6 A cross-sectional view schematically showing the internal structure of the valve assembly.

[0076] Figure 6 Schematically shown in Figure 5 the positions of the buffer space 621, the inflow path 630, the outflow path 632, and the recirculation path 634 in the valve assembly. Referring to Figure 6 , the valve assembly 600 includes a body 620, a diaphragm 640, and a driver 660. The body 620 includes an inlet port 622, an outlet port 624, and a recirculation port 626. The first line 542 of the liquid supply line 540 is connected to the inlet port 622. The second line 544 of the liquid supply line 540 is connected to the outlet port 624. The recirculation line 560 is connected to the recirculation port 626.

[0077] A buffer space 621, an inflow path 630, an outflow path 632, and a recirculation path 634 are formed inside the body 620. The buffer space 621 may be provided as a cylinder inside the body 620. The buffer space 621 is defined by an inner wall 621a, a bottom wall 621b, and an upper wall 621c. The bottom wall 621b and the upper wall 621c are provided in a cylindrical shape, and the inner wall 621a is provided in an annular shape.

[0078] According to an exemplary embodiment, an inflow path 630, an outflow path 632, and a recirculation path 634 communicate with a buffer space 621. The inflow path 630 connects an inlet port 622 to the buffer space 621. The outflow path 632 connects an outlet port 624 to the buffer space 621. The recirculation path 634 connects a recirculation port 626 to the buffer space 621.

[0079] A suction space 636 may be formed in the body 620. The suction space 636 is provided to communicate directly with the outflow path 632. A suction plate 638 is disposed in the suction space 636. The suction plate 638 is arranged to move in a vertical direction in the suction space 636 by a suction driver 639. The suction plate 638 moves between a first position 680 and a second position 682. When the suction plate 638 moves from the first position 680 to the second position 682, the volume of the region where the suction space 636 communicates directly with the outflow path 632 increases. When the suction plate 638 moves from the second position 682 to the first position 680, the volume of the region where the suction space 636 communicates directly with the outflow path 632 decreases. After stopping the supply of the processing liquid to the nozzle 460, the volume B of the region where the suction space 636 communicates directly with the outflow path 632 immediately increases. Accordingly, the processing liquid at the end of the nozzle 460 is moved a predetermined distance into the internal space of the nozzle 460

[0080] Figure 7 The figure shows a top view of the configuration of the valve assembly.

[0081] Referring to Figure 6 and Figure 7 As shown, an inlet 633a of the outflow path 632 is formed at a bottom wall 621b of the buffer space 621. The inlet 633a of the outflow path 632 may be located at a central portion of the bottom wall 621b. An outlet 631a of the inflow path 630 is formed at the bottom wall 621b of the buffer space 621. Additionally, an inlet 635 of the recirculation path 634 is formed at the bottom wall 621b of the buffer space 621. The outlet 631a of the inflow path 630 and the inlet 635 of the recirculation path 634 may be located at the same distance from the inlet 633a of the outflow path 632. When viewed from above, the outlet 631a of the inflow path 630, the inlet 633a of the outflow path 632, and the inlet 635 of the recirculation path 634 may be located on a straight line.

[0082] The inflow path 630 has a first part 630a and a second part 630b. The first part 630a is located near the inlet port 622. The outlet 631a of the inflow path 630 is provided on the second part 630b. The inlet port 622 is provided on the first side surface 620a of the body 620. The first part 630a is provided in a direction perpendicular to the first side surface 620a of the body 620. The second part 630b extends from the first part 630a. The second part 630b is provided in a direction perpendicular to the first part 630a. The longitudinal direction of the second part 630b may be provided in the vertical direction.

[0083] The outflow path 632 has a first part 632a and a second part 632b. The inlet 633a of the outflow path 632 is provided on the first part 632a. The second part 632b is located near the outlet port 624. The longitudinal direction of the first part 632a may be provided in the vertical direction. The second part 632b extends from the first part 632a. The second part 632b is provided in a direction perpendicular to the first part 632a. The outlet port 624 is provided on the second side surface 620b of the body 620. The second part 632b may be provided in a direction perpendicular to the second side surface 620b.

[0084] The recirculation path 634 has a first part 634a, a second part 634b, and a third part 634c. The inlet 635 of the recirculation path 634 is provided on the first part 634a. The third part 634c is located near the recirculation port 626. The second part 634b extends from the first part 634a to the third part 634c. The longitudinal direction of the first part 634a may be provided in the vertical direction. The first part 634a may be provided in the vertical direction with respect to the first part 634a. The recirculation port 626 is provided on the third side surface 620c of the body 620. The third side surface 620c may be the top surface of the body 620. The third part 634c may be provided in a direction perpendicular to the third side surface 620c. The first part 634a and the third part 634c may be arranged parallel to each other, and the second part 634b may be arranged perpendicular to the first part 634a and the third part 634c.

[0085] The controller 580 controls the on / off valve 562 and the valve assembly 600 installed in the recirculation pipeline 560.

[0086] Reference Figure 7, the diaphragm 640 opens and closes the inlet 633a of the outflow path 632 through the controller 580. The diaphragm 640 can be formed of an elastic material. The diaphragm 640 is positioned within the buffer space 621. When viewed from above, the diaphragm 640 is arranged to overlap the inlet 633a of the outflow path 632. The diaphragm 640 has an area larger than the inlet 633a of the outflow path 632. When viewed from above, the diaphragm 640 has an area narrower than the buffer space 621. The central axis 642 of the diaphragm 640 can be set to coincide with the central axis 621d of the buffer space 621. Additionally, the central axis 642 of the diaphragm 640 can be set to coincide with the central axis 633c of the inlet 633a of the outflow path 632. Thus, the diaphragm 640 is positioned to be spaced apart from the inner wall 621a forming the buffer space 621. In the buffer space 621, a gap 644 through which fluid flows is formed around the diaphragm 640. The gap 644 between the inner wall 621a of the buffer space 621 and the diaphragm 640 can be set to be the same in the circumferential direction of the diaphragm 640.

[0087] The diaphragm 640 is arranged to be movable between an open position and a closed position. The open position is the position where the diaphragm 640 opens the inlet 633a of the outflow path 632. The closed position is the position where the diaphragm 640 closes the inlet 633a of the outflow path 632. When the diaphragm 640 is in the open position, the diaphragm 640 can be located in the upper region within the buffer space 621. In the open position, the diaphragm 640 is spaced apart from the inlet 633a of the outflow path 632. When the diaphragm 640 is in the closed position, the diaphragm 640 is located in the lower end region within the buffer space 621. In the closed position, the diaphragm 640 is in close contact with the inlet 633a of the outflow path 632. The position of the diaphragm 640 can be changed between the open position and the closed position by vertical movement.

[0088] The driver 660 moves the diaphragm 640 between the open position and the closed position. According to an example, the plunger 628 is positioned on the body 620. The diaphragm is attached to the lower end of the plunger 628. The plunger 628 has a rod shape. The plunger 628 can have a longitudinal direction set in the vertical direction. The driver 660 moves the plunger 628 along its longitudinal direction. The driver 660 can move the plunger 628 by an electronic or pneumatic method.

[0089] Figure 8 and Figure 9 respectively show Figure 6 the operating state of the valve assembly and the flow of the processing liquid. Figure 8 is a schematic diagram schematically showing the flow of the processing liquid when the diaphragm in the valve assembly is in the open position, and Figure 9 is a schematic diagram schematically showing the flow of the processing liquid when the diaphragm in the valve assembly is in the closed position.

[0090] Referring to Figure 8 , when the diaphragm 640 is in the open position, the on / off valve 562 provided to the recirculation line 560 is closed. The processing liquid flows along the first line 542 from the supply tank 522 by the operation of the pump 546. The processing liquid flows into the valve assembly 600 through the port 622. The processing liquid sequentially flows along the inflow path 630, the buffer space 621, and the outflow path 632. Thereafter, the processing liquid flows out of the valve assembly 600 through the outlet port 624 and is supplied to the nozzle 460 through the second line 544. The nozzle 460 discharges the processing liquid onto the substrate W.

[0091] When the supply of the processing liquid to the substrate W is completed, the supply of the processing liquid to the nozzle 460 is stopped.

[0092] Referring to Figure 6 and Figure 9 , the diaphragm 640 moves from the open position to the closed position, and at the same time, the on / off valve 562 provided in the recirculation line 560 is opened. The processing liquid flows along the first line 542 from the supply tank 522 by the operation of the pump 546. The processing liquid flows into the valve assembly 600 through the port 622. The processing liquid sequentially flows along the inflow path 630, the buffer space 621, and the recirculation path 634. Thereafter, the processing liquid is discharged from the valve assembly 600 through the recirculation port 626 and is recycled back to the supply tank 522 through the recirculation line 560.

[0093] After the diaphragm 640 moves from the open position to the closed position, the suction plate 638 moves from the first position 680 to the second position 682. Therefore, the processing liquid at the end of the nozzle 460 moves a predetermined distance inside the nozzle 460.

[0094] In the valve assembly 600 having the structure shown in FIG. 1, when the diaphragm 640 is in the closed position, the processing liquid stays in the buffer space 621. When the processing liquid stays in the buffer space for a long time and the processing liquid stagnates (A), a large number of particles are generated. However, in the valve assembly 600 having the structure shown in FIG. 8, even when the diaphragm 640 is in the closed position, the processing liquid still continuously flows through the supply tank 522, the first line 542, the valve assembly 600, and the recirculation line 560. Therefore, it is possible to prevent the generation of particles due to the residue of the processing liquid in the buffer space 621.

[0095] Figure 10 For showing Figure 6 Another example of the valve assembly

[0096] Referring to Figure 10, an inlet 633a of the outflow path 632 is formed at a bottom wall 621b of the buffer space 621. The inlet 633a of the outflow path 632 may be located at a central portion of the bottom wall 621b. An outlet 631a of the inflow path 630 is formed at an inner wall 621a of the buffer space 621. Additionally, an inlet 635 of the recirculation path 634 is formed at the inner wall 621a of the buffer space 621. When viewed from above, the outlet 631a of the inflow path 630, the inlet 633a of the outflow path 632, and the inlet 635 of the recirculation path 634 may be positioned in a straight-line sequence.

[0097] The inflow path 630 is provided in a straight line. An inlet 631b of the inflow path 630 is provided at the inlet port 622. The inlet port 622 is provided on a first side surface 620a of the main body 620. An outlet 631a of the inflow path 630 is provided at the inner wall 621a of the buffer space 621. The inflow path 630 may be provided perpendicular to the first side surface 620a of the main body 620 and the inner wall 621a of the buffer space 621, respectively.

[0098] The outflow path 632 may have the same structure as the outflow path 632 in the Figure 6 exemplary embodiment.

[0099] The recirculation path 634 has a first portion 634a and a second portion 634b. An inlet 635 of the recirculation path 634 is provided on the first portion 634a. The second portion 634b is located near the recirculation port 626. The first portion 634a may be provided in a direction in which its longitudinal direction is perpendicular to the vertical direction. The recirculation port 626 is provided on a third side surface 620c of the main body 620. The third side surface 620c may be a top wall of the main body 620. The second portion 634b may be provided in a direction perpendicular to the third side surface 620c. The first portion 634a and the second portion 634bb may be provided perpendicular to each other.

[0100] Figure 11 For showing Figure 6 another example of the valve assembly.

[0101] Referring to Figure 11 , an inlet 633a of the outflow path 632 is formed at a bottom wall 621b of the buffer space 621. The inlet 633a of the outflow path 632 may be located at a central portion of the bottom wall 621b. An outlet 631a of the inflow path 630 is formed at the bottom wall 621b of the buffer space 621. The inlet 635 of the recirculation path 634 may be directly connected to the inflow path 630.

[0102] The inflow path 630 has a first part 630a and a second part 630b. The first part 630a is located near the inlet port 622. The outlet port 631a of the inflow path 630 is provided on the second part 630b. The inlet port 622 is provided on the first side surface 620a of the body 620. The first part 630a is provided in a direction perpendicular to the first side surface 620a of the body 620. The longitudinal direction of the second part 630b can be set in the vertical direction.

[0103] The outflow path 632 can have the same structure as the outflow path 632 in the Figure 6 exemplary embodiment.

[0104] The recirculation path 634 has a first part 634a and a second part 634b. According to the exemplary embodiment, the inlet 635 of the recirculation path 634 is provided in the second part 630b of the inflow path 630. The first part 634a of the recirculation path 634 can be provided in a direction perpendicular to the second part 634b of the inflow path 630. The first part 634a of the recirculation path 634 can be arranged parallel to the first part 630a of the inflow path 630. The recirculation port 626 is provided on the third side surface 620c of the body 620. The third side surface 620c can be the top wall of the body 620. The second part 634b can be provided in a direction perpendicular to the third side surface 620c of the body 620. The first part 634a and the second part 634bb can be arranged perpendicular to each other.

[0105] Next, various modification examples of the present invention will be described.

[0106] In Figure 6 the present invention has been described as the parts where the inflow path 630 and the recirculation path 634 are directly connected to the buffer space 621 are arranged in the vertical direction. However, differently, as Figure 12 shown, the parts where the inflow path 630 and the recirculation path 634 are directly connected to the buffer space 621 can be arranged in a direction inclined with respect to the central axis 621d of the buffer space 621.

[0107] In Figure 10 the outlet 631a of the inflow path 630, the inlet 633a of the outflow path 632, and the inlet 635 of the recirculation path 634 are arranged in a straight line in sequence. However, as Figure 13As shown, the outlet 631a of the inflow path 630, the inlet 633a of the outflow path 632, and the inlet 635 of the recirculation path 634 can be arranged at positions that are linearly distant from each other. For example, the angle between the line connecting the outlet 631a of the inflow path 630 and the inlet 633a of the outflow path 632 and the line connecting the inlet 633a of the outflow path 632 and the inlet 635 of the recirculation path 634 can be an acute angle, a right angle, or an obtuse angle.

[0108] In Figure 6 it has been described that the suction space 636 is provided in the valve assembly 600. However, in contrast, as Figure 14 shown, the suction space 636 may not be provided in the valve assembly 600.

[0109] In Figure 9 it has been described that the recirculation pipeline 560 is connected to the supply tank 522 so that the processing liquid flowing through the recirculation port 626 of the valve assembly 600 is recycled to the supply tank 522. However, in contrast, as Figure 15 shown, the recirculation pipeline 560 is directly connected to the first pipeline 542, and the processing liquid flowing through the recirculation port 626 of the valve assembly 600 can flow back to the valve assembly 600 through the first pipeline 542 without being recycled to the supply tank 522.

Claims

1. An apparatus for processing a substrate, the apparatus comprising: a liquid processing chamber, wherein the liquid processing chamber forms a processing space in which a processing liquid is supplied onto a substrate to perform liquid processing on the substrate; as well as a liquid supply unit, the liquid supply unit being used to supply the processing liquid to the liquid processing chamber, Wherein, the liquid supply unit comprises: a liquid supply line through which the process liquid flows; and a valve assembly installed in the liquid supply line, and The valve assembly comprises: a body, the body comprising an inlet port, an outlet port, and a recirculation port, through which the treatment liquid is introduced from a liquid supply source side, through which the treatment liquid is discharged to the liquid treatment chamber side, and through which the treatment liquid is returned to the liquid supply source side; and A diaphragm is provided to the body, and the diaphragm opens and closes a flow path of the process fluid to the outlet port side.

2. The device according to claim 1, wherein: The body is formed with: Buffer space; an inflow path connecting the inlet port and the buffer space; an outflow path connecting the buffer space and the outlet port; as well as A recirculation path connects the buffer space and the recirculation port in the body.

3. The device according to claim 2, wherein: The valve assembly further includes an actuator for moving the diaphragm between an open position for opening the outflow path and a closed position for closing the outflow path, and When the diaphragm is in the closed position, the diaphragm is located in the buffer space.

4. The device according to claim 3, wherein: The buffer space is defined by an inner wall, a bottom wall and an upper wall, and When the diaphragm is in the closed position, the diaphragm is located spaced apart from the inner wall.

5. The device according to claim 4, wherein: The buffer space is configured in a cylindrical shape, and A central axis of the buffer space and a central axis of the diaphragm coincide with each other.

6. The device according to claim 4, wherein: An inlet of the outflow path is located in the bottom wall.

7. The device according to claim 4, wherein: An outlet of the inflow path and an inlet of the recirculation path are each located at the inner wall.

8. The device according to claim 7, wherein: When viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path are sequentially arranged along a straight line.

9. The device according to claim 4, wherein: An outlet of the inflow path and an inlet of the recirculation path are located in the bottom wall.

10. The device according to claim 9, wherein: When viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path are sequentially arranged along a straight line.

11. The device according to claim 1, wherein: The liquid supply source includes a supply tank, and the treatment liquid is stored in the supply tank. The liquid supply pipeline comprises: a first pipeline connecting the liquid supply to the inlet port of the valve assembly; a second line connecting the outlet port of the valve assembly to the liquid processing chamber, and The recirculation port is connected to the supply tank through a recirculation line, and an opening / closing valve is installed on the recirculation line.

12. The device according to claim 1, wherein: The body is formed with: Buffer space; an inflow path connecting the inlet port and the buffer space; an outflow path connecting the buffer space and the outlet port; as well as A recirculation path connects the inflow path and the recirculation port formed in the body.

13. The device according to claim 2, wherein: The valve assembly also forms a suction space, which is directly connected to the outflow path, and The valve assembly further includes a suction plate which adjusts the volume of the suction space.

14. The device according to claim 11, wherein: The valve assembly includes an actuator that moves the diaphragm between an open position that opens the outflow path and a closed position that closes the outflow path, The device further comprises a controller for controlling the driver and the on / off valve, and The controller controls the driver and the open / close valve to open the open / close valve when the diaphragm is in the closed position and to close the open / close valve when the diaphragm is in the open position.

15. A valve assembly, comprising: A body, the body comprising: an inlet port through which the treatment liquid is introduced from a liquid supply source side; an outlet port through which the processing liquid is discharged to the liquid processing chamber side; and a body including a recirculation port for returning the treated liquid to the liquid supply source side; and A diaphragm is provided to the body and opens and closes a flow path of the treatment liquid toward the outlet port side.

16. The valve assembly according to claim 15, wherein: The body is formed with: a buffer space, the buffer space being defined by an inner wall, a bottom wall and an upper wall; an inflow path connecting the inlet port and the buffer space; an outflow path connecting the buffer space and the outlet port; as well as a recirculation path connecting the buffer space and the recirculation port in the body, The diaphragm is arranged to be movable between an open position for opening the outflow path and a closed position for closing the outflow path, and When the diaphragm is in the closed position, the diaphragm is located in the buffer space to be spaced apart from the inner wall.

17. The valve assembly according to claim 16, wherein: The buffer space is defined by an inner wall, a bottom wall and an upper wall, and The inlet of the outflow path is located in the bottom wall of the buffer space.

18. The valve assembly of claim 17, wherein: The outlet of the inflow path and the inlet of the recirculation path are located in the inner wall, and When viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path are sequentially arranged along a straight line.

19. The valve assembly according to claim 17, wherein: The outlet of the inflow path and the inlet of the recirculation path are located in the bottom wall, and When viewed from above, the outlet of the inflow path, the inlet of the outflow path, and the inlet of the recirculation path are sequentially arranged along a straight line.

20. An apparatus for processing a substrate, the apparatus comprising: a liquid processing chamber having a processing space in which a processing liquid is supplied onto a substrate to perform liquid processing on the substrate; as well as a liquid supply unit, the liquid supply unit being used to supply the processing liquid to the liquid processing chamber, Wherein, the liquid supply unit comprises: a supply tank in which the process liquid is stored; a liquid supply line through which the processing liquid in the supply tank flows into the liquid processing chamber; and a valve assembly installed in the liquid supply line, and The valve assembly comprises: a body, the body comprising an inlet port, an outlet port, a recirculation port and a buffer space, the treatment liquid is introduced from the liquid supply source side through the inlet port, the treatment liquid is discharged to the liquid treatment chamber side through the outlet port, the treatment liquid is returned to the liquid supply source side through the recirculation port, and the body is formed with an inflow path, an outflow path and a recirculation path, the inflow path connects the inlet port and the buffer space, the outflow path connects the buffer space and the outlet port, and the recirculation path connects the buffer space and the recirculation port; a diaphragm that is located in the buffer space and opens and closes an inlet of the outflow path; and an actuator that moves the diaphragm between an open position that opens the inlet of the outflow path and a closed position that closes the inlet of the outflow path, The buffer space is defined by an inner wall, a bottom wall and an upper wall, and When the diaphragm is in the closed position, the diaphragm is located in the buffer space to be spaced apart from the inner wall. The recirculation port and the supply tank are connected via a recirculation line, and An on / off valve is installed on the recirculation line.

Images