VUV parallel light source photoetching machine equipment
By designing VUV parallel light source lithography machine equipment, using sliders and slide rail mechanisms to achieve accurate exposure and detection of circuit boards, the existing lithography machine equipment has solved the problems of high manufacturing cost, inconvenient operation and low accuracy, and achieved efficient and economical lithography effects.
Patent Information
- Application Number
- CN202510399885.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-01
- Publication Date
- 2025-06-27
AI Technical Summary
The existing lithography machine equipment has high manufacturing cost, complex structure, inconvenient operation, and low exposure and detection accuracy, which affects product quality.
A VUV parallel light source lithography machine equipment is designed, using components such as base, mount, lighting device, moving mechanism and detection camera to achieve accurate exposure and detection of the circuit board through sliders and slide rail mechanisms.
It realizes lithography equipment with simple structure, reduced manufacturing cost and convenient operation, improves the exposure effect and detection accuracy of the circuit board, and improves the product yield rate.
Smart Images
Figure CN120215218A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of lithography machines, and more specifically, relates to a VUV parallel light source lithography machine device. Background Art
[0002] In the semiconductor industry, a general lithography process generally undergoes processes such as cleaning and drying the surface of a silicon wafer, applying a bottom layer, applying a photoresist, soft baking, alignment and exposure, post-baking, developing, hard baking, and etching. Among them, the lithography process is a process of evenly applying a photoresist on the surface of a silicon wafer and then transferring the pattern on the mask to the photoresist (i.e., the process of temporarily "copying" the device or circuit structure onto the silicon wafer). In semiconductor equipment, a track machine (coater / developer) is a process equipment that integrates machines with different process technologies, and its main function is to coat and develop the photoresist on the surface of a wafer; the lithography machine is mainly responsible for the exposure of the photoresist.
[0003] In the prior art, most lithography machine devices not only have high manufacturing costs, complex structures, but also are inconvenient to operate, time-consuming and laborious. At the same time, during the exposure process and the detection process of most lithography machine devices, due to the inability to accurately move to the set position, the exposure effect and the detection effect are poor, which has a certain impact on the lithography accuracy and thus affects the product quality. Summary of the Invention
[0004] Therefore, to solve the above technical problems, the present invention provides a VUV parallel light source lithography machine device, including a base 10. One side of the top of the base 10 is connected with a mounting seat 20. The top of the mounting seat 20 is connected with a lighting device 30. The lighting device 30 includes an upper box body 301 and a lower box body 302. The upper box body 301 is connected to the lower box body 302. A power supply component is arranged in the upper box body 301, and a light source component is arranged in the lower box body 302. A radiation window 40 is arranged at the center of the bottom of the lower box body 302, and the light source component is placed directly above the radiation window 40. A first moving mechanism 50 is further arranged at the top of the base 10. Both sides of the bottom end of the first moving mechanism 50 are connected with first sliders 60. A first slide rail 70 matching the first sliders 60 is arranged at the top of the base 10. The first moving mechanism 50 is slidably connected to the base 10. The top of the first moving mechanism 50 is connected with a bearing seat 80. The top of the bearing seat 80 is connected with a bearing table 90. An adsorption platform 100 is connected to the center of the top of the bearing table 90. The adsorption platform 100 is used for placing a circuit board coated with photoresist. On the other side of the top of the base 10, there is a second moving mechanism 110. Both sides of the bottom end of the second moving mechanism 110 are connected with second sliders 120. A second slide rail 130 matching the second sliders 120 is arranged at the top of the base 10. The second moving mechanism 110 is slidably connected to the base 10. The top of the second moving mechanism 110 is connected with a detection camera 140 for detecting the exposure effect of the circuit board. During use, the circuit board coated with photoresist is placed on the adsorption platform 100 and sent to directly below the radiation window 40 through the first moving mechanism 50. Subsequently, exposure is carried out through the light source component. After the exposure is completed, the first moving mechanism 50 drives the circuit board to reset. The second moving mechanism 110 drives the detection camera 140 to move towards the adsorption platform 100, so that the detection camera 140 is placed directly above the circuit board to detect the exposure effect of the exposed circuit board. This device not only has a simple structure, reduces the manufacturing cost, and is very convenient to operate, but also has a good exposure effect on the circuit board, improves the detection effect, and increases the yield rate of the product.
[0005] A VUV parallel light source lithography machine device, including a base 10, one side of the top of the base 10 is connected with a mounting seat 20, the top of the mounting seat 20 is connected with a lighting device 30, the lighting device 30 includes an upper box body 301 and a lower box body 302, the upper box body 301 is connected with the lower box body 302, a power supply component is arranged in the upper box body 301, a lamp source component is arranged in the lower box body 302, an irradiation window 40 is arranged at the center of the bottom of the lower box body 302, and the lamp source component is placed directly above the irradiation window 40. A first moving mechanism 50 is also arranged at the top of the base 10. Both sides of the bottom end of the first moving mechanism 50 are connected with first sliders 60. A first slide rail 70 matching the first sliders 60 is arranged at the top of the base 10. The first moving mechanism 50 is slidably connected with the base 10. The top of the first moving mechanism 50 is connected with a bearing seat 80. The top of the bearing seat 80 is connected with a bearing table 90. The center of the top of the bearing table 90 is connected with an adsorption platform 100, and the adsorption platform 100 is used for placing a circuit board coated with photoresist. On the other side of the top of the base 10, there is a second moving mechanism 110. Both sides of the bottom end of the second moving mechanism 110 are connected with second sliders 120. A second slide rail 130 matching the second sliders 120 is arranged at the top of the base 10. The second moving mechanism 110 is slidably connected with the base 10. The top of the second moving mechanism 110 is connected with a detection camera 140 for detecting the exposure effect of the circuit board. When in use, the circuit board coated with photoresist is placed on the adsorption platform 100 and sent to directly below the irradiation window 40 through the first moving mechanism 50. Then, exposure is carried out through the lamp source component. After the exposure is completed, the first moving mechanism 50 drives the circuit board to reset. The second moving mechanism 110 drives the detection camera 140 to move towards the adsorption platform 100, so that the detection camera 140 is placed directly above the circuit board to detect the exposure effect of the exposed circuit board.
[0006] Further, the first moving mechanism 50 includes a first moving plate 501 and a first handle 502. Both sides of the bottom end of the first moving plate 501 are connected with the first sliders 60. The top of the first moving plate 501 is connected with the bearing table 90. On the side of the first moving plate 501 away from the mounting seat 20, there is a connecting block 150 extending outwards. A card slot 160 is arranged on the connecting block 150. The bottom end of the first handle 502 is connected with a clamping post, and the clamping post and the card slot 160.
[0007] Further, a first electromagnet 170 is connected to the bottom end of the first moving plate 501 near one side of the lower box body 302. A first fixing block 180 and a second fixing block 190 are also connected to the top end of the base 10. The first fixing block 180 is placed below the first moving plate 501, and the second fixing block 190 is placed below the lower box body 302. The first fixing block 180 is placed on one side of the first electromagnet 170, and the second fixing block 190 is placed on the other side of the first electromagnet 170. Moreover, the first electromagnet 170, the first fixing block 180, and the second fixing block 190 are all placed inside the first slide rail 70. A first iron block 200 is connected to the lower part of the first fixing block 180, and a second iron block 210 is connected to the second fixing block 190. A first electromagnetic switch is provided on the first handle 502. Under normal conditions, the first electromagnet 170 magnetically attracts the first iron block 200 to fix the first moving plate 501. When the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 170 and the first iron block 200 are demagnetized, and the first moving plate 501 drives the circuit board to move. When the circuit board moves to directly below the irradiation window 40, at this time, the first electromagnet 170 magnetically attracts the second iron block 210 to prevent the first moving plate 501 from moving back and forth during the exposure of the circuit board, resulting in poor exposure effect.
[0008] Further, a first buffer 220 is connected to the upper part of the first fixing block 180, and a second buffer 230 is provided above the second fixing block 190. The second buffer frame is connected to the side wall of the base 10. The first buffer 220 is used to absorb and slow down the impact force generated when the first electromagnet 170 magnetically attracts the first iron block 200, and the second buffer 230 is used to absorb and slow down the impact force generated when the first electromagnet 170 magnetically attracts the second iron block 210, both playing a protective role.
[0009] Further, a sensor 240 is connected to the top end of the base 10 near one side of the second buffer 230. The sensor 240 is used to monitor the magnetic attraction state between the first electromagnet 170 and the second iron block 210.
[0010] Further, the second moving mechanism 110 includes a second moving plate 1101, a second handle 1102, and a fixing rod 1103. Second sliders 120 are connected to both sides of the bottom end of the second moving plate 1101. The fixing rod 1103 is connected to the top end of the second moving plate 1101. The second handle 1102 is connected to the middle of one side of the fixing rod 1103 close to the side wall of the base 10. When the exposed circuit board needs to be detected, the inspection camera 140 is driven to move by pushing and pulling the second handle 1102.
[0011] Further, a second electromagnet 250 is connected to the front end of the second moving plate 1101, and a third electromagnet 260 is connected to the rear end. One end of the second slide rail 130 is provided with a third fixing block 270, and the other end of the second slide rail 130 is provided with a fourth fixing block 280. The bottom ends of the third fixing block 270 and the fourth fixing block 280 are both connected to the top end of the base 10. The second electromagnet 250, the third electromagnet 260, the third fixing block 270, and the fourth fixing block 280 are all disposed inside the second slide rail 130. A third iron block 290 is connected to the lower part of the third fixing block 270, and a fourth iron block 300 is connected to the lower part of the fourth fixing block 280. A second electromagnetic switch is provided on the second handle 1102. Under normal conditions, the third electromagnet 260 and the third iron block 290 are magnetically attracted to fix the second moving plate 1101. When it is necessary to detect the exposed circuit board, the second electromagnetic switch is pressed to make the third electromagnet 260 and the third iron block 290 demagnetize. The second moving plate 1101 drives the detection camera 140 to move. When the detection camera 140 moves to directly above the circuit board, at this time, the second electromagnet 250 and the fourth iron block 300 are magnetically attracted to prevent the second moving plate 1101 from moving back and forth during the detection by the detection camera 140, resulting in a poor detection effect.
[0012] Further, a third buffer 310 is connected to the upper part of the third fixing block 270, and a fourth buffer 320 is connected to the upper part of the fourth fixing block 280. The third buffer 310 is used to absorb and slow down the impact force generated when the third electromagnet 260 and the third iron block 290 are magnetically attracted, and the fourth buffer 320 is used to absorb and slow down the impact force generated when the second electromagnet 250 and the fourth iron block 300 are magnetically attracted, both playing a protective role.
[0013] Further, a cross platform 330 is connected to the top end of the fixing rod 1103. One side of the top of the cross platform 330 is provided with a connecting rod 340. One end of the connecting rod 340 is connected to the cross platform 330, and the other end is connected to a third handle 350. The other side of the top of the cross platform 330 is provided with a connecting plate 360. One end of the connecting plate 360 is connected to the cross platform 330, and the other end is connected to the detection camera 140. The cross platform 330 is used to assist in adjusting the position of the detection camera 140. By pushing and pulling the third handle 350, under the action of the cross platform 330, the detection camera 140 is driven to move.
[0014] Further, an adjusting mechanism 370 is connected to the top end of the connecting plate 360. The adjusting mechanism 370 includes a third slide rail 3701, a third slider 3702, a fourth slide rail 3703, a fourth slider 3704, a fifth slide rail 3705 and a fifth slider. The third slide rail 3701 is connected to the top end of the connecting plate 360. The third slider 3702 is slidably connected to the third slide rail 3701. The top end of the third slider 3702 is connected to the fourth slide rail 3703. The fourth slide rail 3703 is slidably connected to the fourth slider 3704. A first adapter plate 380 is connected to the side of the fourth slider 3704 away from the fourth slide rail 3703. The fifth slide rail 3705 is connected to the side of the first adapter plate 380 away from the fourth slider 3704. A second adapter plate 390 is connected to the side of the first adapter plate 380 close to the fifth slide rail 3705. The fifth slider is connected to the side of the second adapter plate 390 close to the fifth slide rail 3705. The fifth slider is slidably connected to the fifth slide rail 3705. A fixed seat 400 is provided on the side of the second adapter plate 390 away from the fifth slide rail 3705. One end of the fixed seat 400 is connected to the second adapter plate 390, and the other end is connected to the detection camera 140. Under the action of the adjusting mechanism 370, the position of the detection camera 140 can be adjusted forward and backward, left and right, and up and down.
[0015] Advantages of the present invention: The present invention provides a VUV parallel light source lithography machine device, including a base 10. One side of the top of the base 10 is connected with a mounting seat 20. The top of the mounting seat 20 is connected with a lighting device 30. The lighting device 30 includes an upper box body 301 and a lower box body 302. The upper box body 301 is connected to the lower box body 302. A power supply component is arranged in the upper box body 301, and a lamp source component is arranged in the lower box body 302. A radiation window 40 is arranged at the center of the bottom of the lower box body 302, and the lamp source component is placed directly above the radiation window 40. A first moving mechanism 50 is also arranged on the top of the base 10. Both sides of the bottom end of the first moving mechanism 50 are connected with first sliders 60. A first slide rail 70 matching the first sliders 60 is arranged on the top of the base 10. The first moving mechanism 50 is slidably connected to the base 10. The top end of the first moving mechanism 50 is connected with a carrier seat 80. The top of the carrier seat 80 is connected with a carrier table 90. An adsorption platform 100 is connected to the center of the top of the carrier table 90. The adsorption platform 100 is used for placing a circuit board coated with photoresist. On the other side of the top of the base 10, there is a second moving mechanism 110. Both sides of the bottom end of the second moving mechanism 110 are connected with second sliders 120. A second slide rail 130 matching the second sliders 120 is arranged on the top of the base 10. The second moving mechanism 110 is slidably connected to the base 10. The top end of the second moving mechanism 110 is connected with a detection camera 140 for detecting the exposure effect of the circuit board. During use, the circuit board coated with photoresist is placed on the adsorption platform 100 and sent to directly below the radiation window 40 through the first moving mechanism 50. Subsequently, exposure is performed through the lamp source component. After the exposure is completed, the first moving mechanism 50 drives the circuit board to reset. The second moving mechanism 110 drives the detection camera 140 to move towards the adsorption platform 100, so that the detection camera 140 is placed directly above the circuit board to detect the exposure effect of the exposed circuit board. This device not only has a simple structure, reduces manufacturing costs, and is very convenient to operate, but also has a good exposure effect on the circuit board, improves the detection effect, and increases the product qualification rate. Description of the Drawings
[0016] Figure 1 It is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention.
[0017] Figure 2 It is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention.
[0018] Figure 3 It is a partial enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention.
[0019] Figure 4 This is a top view of a VUV parallel light source lithography machine device of the present invention.
[0020] Figure 5 This is a partial enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention.
[0021] Figure 6 This is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention.
[0022] Figure 7 This is a partial enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention.
[0023] Figure 8 This is a partial enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention.
[0024] Figure 9 This is a partial enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention.
[0025] Figure 10 This is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention.
[0026] Description of main component symbols:
[0027] Base 10, mounting seat 20, lighting device 30, upper box body 301, lower box body 302, irradiation window 40, first moving mechanism 50, first moving plate 501, first handle 502, first slider 60, first slide rail 70, bearing seat 80, bearing table 90, adsorption platform 100, second moving mechanism 110, second moving plate 1101, second handle 1102, fixed rod 1103, second slider 120, second slide rail 130, detection camera 140, connecting block 150, card slot 160, first electromagnet 170, first fixing block 180, second fixing block 190, first iron block 200, second iron block 210, first buffer 220, second buffer 230, sensor 240, second electromagnet 250, third electromagnet 260, third fixing block 270, fourth fixing block 280, third iron block 290, fourth iron block 300, third buffer 310, fourth buffer 320, cross platform 330, connecting rod 340, third handle 350, connecting plate 360, adjusting mechanism 370, third slide rail 3701, third slider 3702, fourth slide rail 3703, fourth slider 3704, fifth slide rail 3705, first adapter plate 380, second adapter plate 390, fixing seat 400.
[0028] The following specific embodiments will further illustrate the present invention in conjunction with the above drawings. Specific embodiments
[0029] The following embodiments are described to assist in understanding the present application. The embodiments are not and should not in any way be construed as limiting the scope of protection of the present application.
[0030] In the following description, those skilled in the art will recognize that throughout this discussion, components may be described as separate functional units (which may include sub-units), but those skilled in the art will recognize that various components or portions thereof may be divided into separate components or integrated together (including being integrated within a single system or component).
[0031] At the same time, the connections between components or systems are not intended to be limited to direct connections. Instead, the data between these components may be modified, reformatted, or otherwise changed by intermediate components. Additionally, additional or fewer connections may be used. It should also be noted that the terms "coupled", "connected", or "input" should be understood to include direct connections, indirect connections through one or more intermediate devices, and wireless connections.
[0032] Embodiment 1
[0033] As Figure 1 shown, it is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention; as Figure 2 shown, it is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention; as Figure 3 shown, it is a partially enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention; as Figure 4 shown, it is a top view of a VUV parallel light source lithography machine device of the present invention; as Figure 5 shown, it is a partially enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention; as Figure 6 shown, it is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention; as Figure 7 shown, it is a partially enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention; as Figure 8 shown, it is a partially enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention; as Figure 9 shown, it is a partially enlarged view of a part of the structure of a VUV parallel light source lithography machine device of the present invention; as Figure 10 shown, it is a schematic structural diagram of a VUV parallel light source lithography machine device of the present invention.
[0034] A VUV parallel light source lithography machine device, including a base 10, one side of the top of the base 10 is connected with a mounting seat 20, the top of the mounting seat 20 is connected with a lighting device 30, the lighting device 30 includes an upper box body 301 and a lower box body 302, the upper box body 301 is connected with the lower box body 302, a power supply component is arranged in the upper box body 301, a lamp source component is arranged in the lower box body 302, an irradiation window 40 is arranged at the center of the bottom of the lower box body 302, and the lamp source component is placed directly above the irradiation window 40. A first moving mechanism 50 is also arranged at the top of the base 10. Both sides of the bottom end of the first moving mechanism 50 are connected with first sliders 60. A first slide rail 70 matching the first sliders 60 is arranged at the top of the base 10. The first moving mechanism 50 is slidably connected with the base 10. The top of the first moving mechanism 50 is connected with a bearing seat 80, the top of the bearing seat 80 is connected with a bearing table 90, and an adsorption platform 100 is connected at the center of the top of the bearing table 90. The adsorption platform 100 is used for placing a circuit board coated with photoresist. On the other side of the top of the base 10, there is a second moving mechanism 110. Both sides of the bottom end of the second moving mechanism 110 are connected with second sliders 120. A second slide rail 130 matching the second sliders 120 is arranged at the top of the base 10. The second moving mechanism 110 is slidably connected with the base 10. The top of the second moving mechanism 110 is connected with a detection camera 140 for detecting the exposure effect of the circuit board. During use, the circuit board coated with photoresist is placed on the adsorption platform 100 and sent to directly below the irradiation window 40 through the first moving mechanism 50. Then, exposure is carried out through the lamp source component. After the exposure is completed, the first moving mechanism 50 drives the circuit board to reset. The second moving mechanism 110 drives the detection camera 140 to move towards the adsorption platform 100, so that the detection camera 140 is placed directly above the circuit board to detect the exposure effect of the exposed circuit board.
[0035] The first moving mechanism 50 includes a first moving plate 501 and a first handle 502. Both sides of the bottom end of the first moving plate 501 are connected with the first sliders 60. The top of the first moving plate 501 is connected with the bearing table 90. On the side of the first moving plate 501 away from the mounting seat 20, there is a connecting block 150 extending outwards. A card slot 160 is arranged on the connecting block 150. The bottom end of the first handle 502 is connected with a clamping post, and the clamping post is engaged with the card slot 160.
[0036] A first electromagnet 170 is connected and provided on one side of the bottom end of the first moving plate 501 close to the lower box body 302. A first fixing block 180 and a second fixing block 190 are also connected and provided at the top end of the base 10. The first fixing block 180 is placed below the first moving plate 501, the second fixing block 190 is placed below the lower box body 302, the first fixing block 180 is placed on one side of the first electromagnet 170, the second fixing block 190 is placed on the other side of the first electromagnet 170, and the first electromagnet 170, the first fixing block 180 and the second fixing block 190 are all placed inside the first slide rail 70. A first iron block 200 is connected and provided at the lower part of the first fixing block 180, and a second iron block 210 is connected and provided on the second fixing block 190. A first electromagnetic switch is provided on the first handle 502. Under normal conditions, the first electromagnet 170 and the first iron block 200 are magnetically attracted to fix the first moving plate 501. When the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 170 and the first iron block 200 are demagnetized, and the first moving plate 501 drives the circuit board to move. When the circuit board moves to directly below the irradiation window 40, at this time, the first electromagnet 170 and the second iron block 210 are magnetically attracted to prevent the first moving plate 501 from moving back and forth during the exposure of the circuit board, resulting in poor exposure effect.
[0037] A first buffer 220 is connected and provided at the upper part of the first fixing block 180, and a second buffer 230 is provided above the second fixing block 190. The second buffer frame is connected to the side wall of the base 10. The first buffer 220 is used to absorb and slow down the impact force generated when the first electromagnet 170 and the first iron block 200 are magnetically attracted, and the second buffer 230 is used to absorb and slow down the impact force generated when the first electromagnet 170 and the second iron block 210 are magnetically attracted, both playing a protective role.
[0038] A sensor 240 is connected and provided at the top end of the base 10 close to one side of the second buffer 230. The sensor 240 is used to monitor the magnetic attraction state between the first electromagnet 170 and the second iron block 210.
[0039] The second moving mechanism 110 includes a second moving plate 1101, a second handle 1102 and a fixing rod 1103. The second sliders 120 are connected to both sides of the bottom end of the second moving plate 1101. The fixing rod 1103 is connected to the top end of the second moving plate 1101. The second handle 1102 is connected to the middle of one side of the fixing rod 1103 close to the side wall of the base 10. When the exposed circuit board needs to be detected, the inspection camera 140 is driven to move by pushing and pulling the second handle 1102.
[0040] A second electromagnet 250 is connected to the front end of the second moving plate 1101, and a third electromagnet 260 is connected to the rear end. One end of the second slide rail 130 is provided with a third fixing block 270, and the other end of the second slide rail 130 is provided with a fourth fixing block 280. The bottom ends of the third fixing block 270 and the fourth fixing block 280 are both connected to the top end of the base 10. The second electromagnet 250, the third electromagnet 260, the third fixing block 270, and the fourth fixing block 280 are all placed inside the second slide rail 130. A third iron block 290 is connected to the lower part of the third fixing block 270, and a fourth iron block 300 is connected to the lower part of the fourth fixing block 280. A second electromagnetic switch is provided on the second handle 1102. Under normal conditions, the third electromagnet 260 and the third iron block 290 are magnetically attracted to fix the second moving plate 1101. When it is necessary to detect the exposed circuit board, the second electromagnetic switch is pressed to make the third electromagnet 260 and the third iron block 290 demagnetize. The second moving plate 1101 drives the detection camera 140 to move. When the detection camera 140 moves to directly above the circuit board, at this time, the second electromagnet 250 and the fourth iron block 300 are magnetically attracted to prevent the second moving plate 1101 from moving back and forth during the detection by the detection camera 140, resulting in poor detection effect.
[0041] A third buffer 310 is connected to the upper part of the third fixing block 270, and a fourth buffer 320 is connected to the upper part of the fourth fixing block 280. The third buffer 310 is used to absorb and slow down the impact force generated when the third electromagnet 260 and the third iron block 290 are magnetically attracted, and the fourth buffer 320 is used to absorb and slow down the impact force generated when the second electromagnet 250 and the fourth iron block 300 are magnetically attracted, both playing a protective role.
[0042] The top end of the fixing rod 1103 is connected to a cross platform 330. One side of the top of the cross platform 330 is provided with a connecting rod 340. One end of the connecting rod 340 is connected to the cross platform 330, and the other end is connected to a third handle 350. The other side of the top of the cross platform 330 is provided with a connecting plate 360. One end of the connecting plate 360 is connected to the cross platform 330, and the other end is connected to the detection camera 140. The cross platform 330 is used to assist in adjusting the position of the detection camera 140. By pushing and pulling the third handle 350, under the action of the cross platform 330, the detection camera 140 is driven to move.
[0043] The top of the connecting plate 360 is connected with an adjusting mechanism 370. The adjusting mechanism 370 includes a third slide rail 3701, a third slider 3702, a fourth slide rail 3703, a fourth slider 3704, a fifth slide rail 3705 and a fifth slider. The third slide rail 3701 is connected with the top of the connecting plate 360. The third slider 3702 is slidably connected with the third slide rail 3701. The top of the third slider 3702 is connected with the fourth slide rail 3703. The fourth slide rail 3703 is slidably connected with the fourth slider 3704. One side of the fourth slider 3704 away from the fourth slide rail 3703 is connected with a first adapter plate 380. One side of the first adapter plate 380 away from the fourth slider 3704 is connected with the fifth slide rail 3705. One side of the first adapter plate 380 close to the fifth slide rail 3705 is connected with a second adapter plate 390. One side of the second adapter plate 390 close to the fifth slide rail 3705 is connected with the fifth slider. The fifth slider is slidably connected with the fifth slide rail 3705. One side of the second adapter plate 390 away from the fifth slide rail 3705 is provided with a fixed seat 400. One end of the fixed seat 400 is connected with the second adapter plate 390, and the other end is connected with the detection camera 140. Under the action of the adjusting mechanism 370, the position of the detection camera 140 is adjusted forward and backward, left and right, and up and down.
[0044] Advantages of the present invention: The present invention provides a VUV parallel light source lithography machine device, which includes a base 10. One side of the top of the base 10 is connected with a mounting seat 20. The top of the mounting seat 20 is connected with a lighting device 30. The lighting device 30 includes an upper box body 301 and a lower box body 302. The upper box body 301 is connected to the lower box body 302. A power supply component is arranged in the upper box body 301, and a light source component is arranged in the lower box body 302. A radiation window 40 is arranged at the center of the bottom of the lower box body 302, and the light source component is placed directly above the radiation window 40. A first moving mechanism 50 is further arranged at the top of the base 10. Both sides of the bottom end of the first moving mechanism 50 are connected with first sliders 60. A first slide rail 70 matching the first sliders 60 is arranged at the top of the base 10. The first moving mechanism 50 is slidably connected to the base 10. The top of the first moving mechanism 50 is connected with a carrier seat 80. The top of the carrier seat 80 is connected with a carrier table 90. An adsorption platform 100 is connected to the center of the top of the carrier table 90. The adsorption platform 100 is used to place a circuit board coated with photoresist. On the other side of the top of the base 10, there is a second moving mechanism 110. Both sides of the bottom end of the second moving mechanism 110 are connected with second sliders 120. A second slide rail 130 matching the second sliders 120 is arranged at the top of the base 10. The second moving mechanism 110 is slidably connected to the base 10. The top of the second moving mechanism 110 is connected with a detection camera 140 for detecting the exposure effect of the circuit board. During use, the circuit board coated with photoresist is placed on the adsorption platform 100 and sent to directly below the radiation window 40 through the first moving mechanism 50. Subsequently, exposure is carried out through the light source component. After the exposure is completed, the first moving mechanism 50 drives the circuit board to reset. The second moving mechanism 110 drives the detection camera 140 to move towards the adsorption platform 100, so that the detection camera 140 is placed directly above the circuit board to detect the exposure effect of the exposed circuit board. This device not only has a simple structure, reduces the manufacturing cost, and is very convenient to operate, but also has a good exposure effect on the circuit board, improves the detection effect, and increases the yield rate of the product.
[0045] The above embodiments only represent several implementation manners of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the invention patent of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several deformations and improvements can still be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the invention patent of the present invention should be subject to the appended claims.
Claims
1. A VUV parallel light source lithography equipment, characterized in that: The invention comprises a base (10), wherein a mounting seat (20) is connected to one side of the top of the base (10), and a lighting device (30) is connected to the top of the mounting seat (20), and the lighting device (30) comprises an upper box (301) and a lower box (302), wherein the upper box (301) is connected to the lower box (302), a power supply component is arranged in the upper box (301), and a light source component is arranged in the lower box (302), and an illumination window (40) is arranged at the center of the bottom of the lower box (302), and the light source component is placed directly above the illumination window (40), and a first moving mechanism (50) is also arranged at the top of the base (10), and first sliders (60) are connected to both sides of the bottom of the first moving mechanism (50), and a first slide rail (70) matching the first slider (60) is arranged at the top of the base (10), and the first The moving mechanism (50) is slidably connected to the base (10); a bearing seat (80) is connected to the top of the first moving mechanism (50); a bearing platform (90) is connected to the top of the bearing seat (80); an adsorption platform (100) is connected to the center of the top of the bearing platform (90); the adsorption platform (100) is used to place a circuit board coated with photoresist; a second moving mechanism (110) is provided on the other side of the top of the base (10); second sliders (120) are connected to the two sides of the bottom of the second moving mechanism (110); a second slide rail (130) matching the second slider (120) is provided on the top of the base (10); the second moving mechanism (110) is slidably connected to the base (10); a detection camera (140) is connected to the top of the second moving mechanism (110) for detecting the exposure effect of the circuit board.
2. The VUV parallel light source lithography equipment according to claim 1, characterized in that: The first moving mechanism (50) comprises a first moving plate (501) and a first handle (502), the first sliding blocks (60) are connected to both sides of the bottom end of the first moving plate (501), the top end of the first moving plate (501) is connected to the supporting platform (90), a side of the first moving plate (501) away from the mounting seat (20) is connected to a connecting block (150) extending outward, a slot (160) is provided on the connecting block (150), and a clamping column is connected to the bottom end of the first handle (502), and the clamping column is connected to the slot (160).
3. The VUV parallel light source lithography equipment according to claim 2, characterized in that: A first electromagnet (170) is connected to a side of the bottom end of the first movable plate (501) close to the lower box (302); a first fixed block (180) and a second fixed block (190) are also connected to the top of the base (10); the first fixed block (180) is placed below the first movable plate (501); the second fixed block (190) is placed below the lower box (302); the first fixed block (180) is placed on one side of the first electromagnet (170); the second fixed block (190) is placed on the other side of the first electromagnet (170); the first electromagnet (170), the first fixed block (180) and the second fixed block (190) are all placed on the inner side of the first slide rail (70); a first iron block (200) is connected to the lower part of the first fixed block (180); a second iron block (210) is connected to the second fixed block (190); and a first electromagnetic switch is provided on the first handle (502).
4. The VUV parallel light source lithography equipment according to claim 3, characterized in that: A first buffer (220) is connected to the upper part of the first fixed block (180), a second buffer (230) is provided above the second fixed block (190), and the second buffer frame is connected to the side wall of the base (10). The first buffer (220) is used to absorb and reduce the impact force generated when the first electromagnet (170) and the first iron block (200) are magnetically attracted, and the second buffer (230) is used to absorb and reduce the impact force generated when the first electromagnet (170) and the second iron block (210) are magnetically attracted, both of which play a protective role.
5. The VUV parallel light source lithography equipment according to claim 4, characterized in that: A sensor (240) is connected to a side of the top of the base (10) close to the second buffer (230), and the sensor (240) is used to monitor the magnetic attraction state of the first electromagnet (170) and the second iron block (210).
6. The VUV parallel light source lithography equipment according to claim 5, characterized in that: The second moving mechanism (110) comprises a second moving plate (1101), a second handle (1102) and a fixed rod (1103); the second sliding block (120) is connected to both sides of the bottom end of the second moving plate (1101); the top end of the second moving plate (1101) is connected to the fixed rod (1103); the middle part of one side of the fixed rod (1103) close to the side wall of the base (10) is connected to the second handle (1102); when it is necessary to inspect the circuit board after exposure, the inspection camera (140) is driven to move by pushing and pulling the second handle (1102).
7. The VUV parallel light source lithography equipment according to claim 6, characterized in that: The front end of the second movable plate (1101) is connected with a second electromagnet (250), and the rear end is connected with a third electromagnet (260); one end of the second slide rail (130) is provided with a third fixed block (270), and the other end of the second slide rail (130) is provided with a fourth fixed block (280); the bottom ends of the third fixed block (270) and the fourth fixed block (280) are both connected to the top of the base (10); the second electromagnet (250), the third electromagnet (260), the third fixed block (270) and the fourth fixed block (280) are all placed on the inner side of the second slide rail (130); the lower part of the third fixed block (270) is connected with a third iron block (290), and the lower part of the fourth fixed block (280) is connected with a fourth iron block (300); and the second handle (1102) is provided with a second electromagnetic switch.
8. The VUV parallel light source lithography equipment according to claim 7, characterized in that: A third buffer (310) is connected to the upper part of the third fixed block (270), and a fourth buffer (320) is connected to the upper part of the fourth fixed block (280). The third buffer (310) is used to absorb and mitigate the impact force generated when the third electromagnet (260) and the third iron block (290) are magnetically attracted, and the fourth buffer (320) is used to absorb and mitigate the impact force generated when the second electromagnet (250) and the fourth iron block (300) are magnetically attracted, both of which play a protective role.
9. The VUV parallel light source lithography equipment according to claim 8, characterized in that: The top of the fixed rod (1103) is connected to a cross platform (330), and a connecting rod (340) is provided on one side of the top of the cross platform (330). One end of the connecting rod (340) is connected to the cross platform (330), and the other end is connected to a third handle (350). A connecting plate (360) is provided on the other side of the top of the cross platform (330). One end of the connecting plate (360) is connected to the cross platform (330), and the other end is connected to the detection camera (140). The cross platform (330) is used to assist in adjusting the position of the detection camera (140). By pushing and pulling the third handle (350), the detection camera (140) is driven to move under the action of the cross platform (330).
10. The VUV parallel light source lithography equipment according to claim 9, characterized in that: The top end of the connecting plate (360) is connected with an adjusting mechanism (370), and the adjusting mechanism (370) includes a third slide rail (3701), a third slider (3702), a fourth slide rail (3703), a fourth slider (3704), a fifth slide rail (3705) and a fifth slider. The third slide rail (3701) is connected with the top end of the connecting plate (360), the third slider (3702) is slidably connected with the third slide rail (3701), the top end of the third slider (3702) is connected with the fourth slide rail (3703), the fourth slide rail (3703) is slidably connected with the fourth slider (3704), and a first adapter plate (380) is connected with a side of the fourth slider (3704) away from the fourth slide rail (3703), and the first adapter plate (380) is connected with the first adapter plate (380). 0) The side away from the fourth slider (3704) is connected to the fifth slide rail (3705), the side of the first adapter plate (380) close to the fifth slide rail (3705) is connected to a second adapter plate (390), the side of the second adapter plate (390) close to the fifth slide rail (3705) is connected to the fifth slider, the fifth slider is slidably connected to the fifth slide rail (3705), the side of the second adapter plate (390) away from the fifth slide rail (3705) is provided with a fixed seat (400), one end of the fixed seat (400) is connected to the second adapter plate (390), and the other end is connected to the detection camera (140), and under the action of the adjustment mechanism (370), the position of the detection camera (140) can be adjusted front and back, left and right, up and down.