High-temperature post-treatment equipment and process for preparing spherical silica powder by liquid phase method

Abstract

The invention relates to the technical field of spherical silica powder production, in particular to high-temperature post-treatment equipment and process for preparing spherical silica powder through a liquid phase method.The high-temperature post-treatment equipment comprises a guiding atomization structure and a vibration treatment structure, the guiding atomization structure is arranged on the vibration treatment structure in a communicating mode, and a separation guiding structure is installed in the center of the vibration treatment structure; the separation guide structure is communicated with the guide atomization structure and is provided with the guide atomization structure, and the separation guide structure is limited and fixed; the atomization structure is guided to conduct atomization treatment, a high-pressure air pipe is communicated with the butt-joint communicating pipe and the atomization base, atomization treatment is conducted through the atomization base, an atomized material reaches the interior of the heating component, the heating mechanism is arranged in a conical distribution mode, flames and plasmas are combined through the heating mechanism, and the atomized material is solidified; and the separation guiding structure is used for guiding and discharging the spherical silica powder. Through the arrangement of the structure, the work of preparing the spherical silica powder by a liquid phase method is facilitated.

Description

Technical Field

[0001] The present invention relates to the technical field of spherical silica powder production, and specifically to a high-temperature post-treatment device and process for preparing spherical silica powder by a liquid-phase method. Background Art

[0002] Prepare spherical silica powder with controllable size by chemical method, precisely control nucleation and growth through the chemical reaction process, achieve key technologies such as high purity, high sphericity, and precise regulation of size / particle size distribution, develop key equipment, overcome the surface modification process and complete set of technologies for ultra-fine and high-purity spherical silica, develop low-radiation, high-purity, high-dispersibility, and high-fill spherical silica, and realize its application in key electronic materials such as high-frequency and high-speed substrates, IC carriers, and high-end chip packaging for 5G communication.

[0003] Currently, the existing high-temperature post-treatment equipment for preparing spherical silica powder by the liquid-phase method is inconvenient for uniform heat treatment during use, has the problem of uneven heating, resulting in a low yield of spherical silica powder. Therefore, improvements are made to address the above problems. Summary of the Invention

[0004] In view of the problems in the prior art, the present invention provides a high-temperature post-treatment device and process for preparing spherical silica powder by a liquid-phase method.

[0005] The technical solution adopted by the present invention to solve its technical problems is: a high-temperature post-treatment device and process for preparing spherical silica powder by a liquid-phase method, including a guiding and atomizing structure and a vibration treatment structure. The guiding and atomizing structure is connected to the vibration treatment structure. A separation and guiding structure is installed at the center of the vibration treatment structure, and the separation and guiding structure is also connected to the guiding and atomizing structure. The guiding and atomizing structure and the separation and guiding structure are limited and fixed. The guiding and atomizing structure performs atomization treatment. It is connected to the docking connecting pipe and the atomizing seat through a high-pressure air pipe. After atomization treatment through the atomizing seat, the atomized material reaches the heating component. The heating mechanism is arranged in a conical distribution, and the heating mechanism combines flame and plasma to solidify the atomized material. The separation and guiding structure is used for the guiding and discharging treatment of spherical silica powder. The control motor drives the first gear through the second gear, and the first gear drives the dispersion guide rod to rotate through the rotating rod, so that the dispersion guide rod contacts the spherical silica powder to guide the spherical silica powder. The vibration treatment structure is used for vibrating and guiding materials. The vibration motor acts on the docking seat and the protective base through the connecting seat to drive the docking seat and the protective base to perform vibration treatment.

[0006] Specifically, the vibration treatment structure includes a docking seat, a protective base, a separation guiding structure, and a vibration motor. The lower end of the docking seat is fixedly connected to the protective base. A connecting seat is fixedly connected to the side end of the protective base. A vibration motor is installed on the connecting seat. The vibration motor drives the connecting seat to vibrate and transmits the vibration to the docking seat and the protective base.

[0007] Specifically, the guiding atomization structure includes an atomization component and a heating component. The lower end of the atomization component is communicated with the heating component. The atomization component performs atomization treatment, and the heating component performs heating cooperation.

[0008] Specifically, the atomization component includes a high-pressure gas pipe and a docking communication pipe. The lower end of the high-pressure gas pipe is communicated with the docking communication pipe. The side end of the docking communication pipe is communicated with a guide exhaust seat. An atomization seat is installed at the lower end of the guide exhaust seat. A regulating valve is provided on the guide exhaust seat. A docking feeding seat is communicated with the regulating valve.

[0009] Specifically, the heating component includes a gas guide pipe and a docking branch pipe. The side end of the gas guide pipe is communicated with the docking branch pipe. The lower end of the docking branch pipe is communicated with a connection control seat. The lower end of the connection control seat is communicated with a heating mechanism through a guiding control disc. Both the connection control seat and the guiding control disc are installed on a reaction seat. A guide exhaust groove is provided at the center of the reaction seat.

[0010] Specifically, the heating mechanism includes a docking gas guide pipe, a gas guide square pipe, and a flame nozzle. The lower end of the docking gas guide pipe is communicated with the gas guide square pipe. The lower end of the gas guide square pipe is communicated with the flame nozzle. The bottom of the gas guide square pipe is limited by a limit fixing base. A plasma generator is provided in the middle of the flame nozzle. The plasma generator is installed and supported through a machine base.

[0011] Specifically, the separation guiding structure includes a guiding cone seat, a dispersion guide rod, and a rotating rod. The rotating rod penetrates through the guiding cone seat. A dispersion guide rod is fixedly connected to the upper end of the rotating rod. A first gear disc is fixedly connected to the lower end of the rotating rod. The side end of the first gear disc is meshed with a second gear disc. A control motor is installed at the upper end of the second gear disc. The lower end of the guiding cone seat is fixedly connected to a protective sleeve disc. The protective sleeve disc supports the first gear disc, and the first gear disc rotates on the protective sleeve disc. Through the setting of the heating component, the combustible gas is conducted to the docking branch pipe through the gas guide pipe, and then conducted to the heating mechanism through the connection control seat and the guiding control disc. The heating mechanism is distributed in a conical shape and can perform uniform heating treatment. The combustible gas reaches the gas guide square pipe through the docking gas guide pipe and is ignited at the flame nozzle. At the same time, the plasma generator performs plasma heating treatment to ensure stable heating inside, enabling the rapid forming of spherical silicon micro powder. Then, through the rotation of the dispersion guide rod, the spherical silicon micro powder is guided and discharged, so that the spherical silicon micro powder reaches the docking seat through the guide exhaust groove and is guided and transmitted through the gap between the docking seat and the separation guiding structure.

[0012] Specifically, there is a gap between the lower end of the dispersion guide rod where it rotates in the guide discharge groove and the docking seat for guiding and discharging spherical silica powder.

[0013] Specifically, the gas guide pipe is connected to the guiding control disk through the docking branch pipe and the connection control seat, and the guiding control disk is connected to the heating mechanism for heat treatment. A flame nozzle and a plasma generator are arranged in the heating mechanism for synchronous heat treatment.

[0014] A high-temperature post-treatment process for preparing spherical silica powder by the liquid-phase method includes the following steps: S1. First, connect the docking material guide seat to the raw material pipe, connect the high-pressure gas pipe to the high-pressure gas generator. The raw material is stored through the docking material guide seat, and the guiding and discharging work is controlled by a regulating valve. The raw material reaches the inside of the discharge seat through the regulating valve, combines with the high-pressure gas conducted by the high-pressure gas pipe, and then is ejected through the atomizing seat to form atomized particles, which are guided to the inside of the reaction seat. S2. At this time, combustible gas is introduced into the gas guide pipe and the docking branch pipe. The combustible gas is conducted to the inside of the guiding control disk through the connection control seat, and then guided to the heating mechanism. The atomized particles are thermally processed through the heating mechanism to form a powdery structure, which is discharged through the guide discharge groove. S3. Then, the docking gas guide pipe is connected to the guiding control disk. The combustible gas is conducted to the gas guide square pipe through the docking gas guide pipe, and then discharged through the flame nozzle and ignited on the flame nozzle to form a flame for thermal processing of the atomized particles. At the same time, the plasma generator on the machine base operates for plasma heating work, cooperating with the flame for thermal processing work of the atomized particles. The setting of the limit fixing base facilitates the installation of the bottom of the heating mechanism, enabling the heating mechanism to be installed inside the reaction seat. S4. Finally, the powdery granular material is discharged through the docking seat and the separation guiding structure. At this time, the control motor controls the rotation of the second gear disk. The rotation of the second gear disk drives the rotation of the first gear disk in cooperation. The rotating rod controls the rotation of the dispersion guide rod through the rotating rod, so that the dispersion guide rod discharges the powdery granular material through the side positions of the docking seat and the guiding cone seat. Moreover, the vibration motor can also perform vibration processing, acting on the docking seat and the protective base through the connecting seat, thereby preventing accumulation.

[0015] The beneficial effects of the present invention: First, through the setting of the high-pressure gas pipe in the present invention, high-pressure air can be introduced. The high-pressure air is conducted to the inside of the discharge seat through the high-pressure gas pipe and the docking connecting pipe. At the same time, the docking material guide seat can introduce the raw material. After being processed by the regulating valve, it is guided to the inside of the discharge seat, combines with the high-pressure gas, and then is atomized through the atomizing seat to form atomized particles, which reach the heating component for continuous production. The heating component facilitates heat treatment, enabling the atomized particles to solidify to form spherical silica powder.

[0016] Second, through the setting of the heating component, the combustible gas is conducted to the docking branch pipe through the air duct, and then conducted to the heating mechanism through the connecting control seat and the guiding control disk. Moreover, the heating mechanism is distributed in a conical shape, capable of performing uniform thermal treatment. The combustible gas reaches the air guiding square pipe through the docking air duct, and is ignited at the flame nozzle. At the same time, the plasma generator performs plasma heating treatment to ensure stable heating inside, enabling the rapid forming of spherical silicon micropowder. Then, through the rotation of the dispersion guide rod, the spherical silicon micropowder is guided and discharged, enabling the spherical silicon micropowder to reach the docking seat through the discharge groove, and being guided and transmitted through the gap between the docking seat and the separation guiding structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The present invention will be further described below in conjunction with the drawings and embodiments.

[0018] Figure 1 It is a front perspective three-dimensional structure schematic diagram of the main body in the present invention; Figure 2 It is a side perspective three-dimensional structure schematic diagram of the main body in the present invention; Figure 3 It is an exploded view of the main body in the present invention; Figure 4 It is a front perspective three-dimensional structure schematic diagram of the guiding atomization structure in the present invention; Figure 5 It is a three-dimensional diagram of the heating component in the present invention; Figure 6 It is a front perspective three-dimensional structure schematic diagram of the heating component in the present invention; Figure 7 It is a sectional view of the heating component in the present invention; Figure 8 It is a three-dimensional diagram of the heating mechanism in the present invention; Figure 9 It is an exploded view of the separation guiding structure in the present invention.

[0019] In the figure: 1 - guiding atomization structure, 2 - vibration treatment structure, 3 - docking seat, 4 - protective base, 5 - separation guiding structure, 6 - vibration motor, 7 - connecting seat, 8 - atomization component, 9 - heating component, 10 - high-pressure air pipe, 11 - docking connecting pipe, 12 - atomization seat, 13 - discharge seat, 14 - regulating valve, 15 - docking feeding seat, 16 - air duct, 17 - docking branch pipe, 18 - connecting control seat, 19 - reaction seat, 20 - guiding control disk, 21 - heating mechanism, 22 - discharge groove, 23 - docking air duct, 24 - air guiding square pipe, 25 - flame nozzle, 26 - plasma generator, 27 - machine base, 28 - limit fixing base, 29 - guiding cone seat, 30 - dispersion guide rod, 31 - rotating rod, 32 - first gear disk, 33 - protective sleeve disk, 34 - second gear disk, 35 - control motor. Detailed implementation manners

[0020] To enable those skilled in the art to better understand the solution of this application, the following will clearly and completely describe the technical solutions in the embodiments of this application with reference to the accompanying drawings in the embodiments of this application. Obviously, the described embodiments are only a part of the embodiments of this application, rather than all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of this application.

[0021] The present invention will be further described below with reference to the accompanying drawings.

[0022] Embodiment, as Figures 1-9 shown, a high-temperature post-treatment device and process for preparing spherical silica powder by a liquid phase method of the present invention includes a guiding atomization structure 1 and a vibration treatment structure 2. The guiding atomization structure 1 is communicated with the vibration treatment structure 2. A separation guiding structure 5 is installed at the center of the vibration treatment structure 2, and the separation guiding structure 5 is also communicated with the guiding atomization structure 1. The guiding atomization structure 1 and the separation guiding structure 5 are limited and fixed. The guiding atomization structure 1 performs atomization treatment. It is communicated with a docking connecting pipe 11 and an atomization seat 12 through a high-pressure air pipe 10. After atomization treatment through the atomization seat 12, the atomized material reaches the heating component 9. The heating mechanism 21 is arranged in a conical distribution, and the heating mechanism 21 combines flame and plasma to solidify the atomized material. The separation guiding structure 5 is used for the guiding and discharging treatment of spherical silica powder. The control motor 35 drives the first gear disk 32 to rotate through the second gear disk 34. The first gear disk 32 drives the dispersion guiding rod 30 to rotate through the rotating rod 31, so that the dispersion guiding rod 30 contacts the spherical silica powder for guiding the spherical silica powder. The vibration treatment structure 2 is used for vibrating and guiding materials. The vibration motor 6 and the connecting seat 7 act on the docking seat 3 and the protective base 4 to drive the docking seat 3 and the protective base 4 to perform vibration treatment.

[0023] The vibration treatment structure 2 includes a docking seat 3, a protective base 4, a separation guiding structure 5 and a vibration motor 6. The lower end of the docking seat 3 is fixedly connected to the protective base 4. The side end of the protective base 4 is fixedly connected to the connecting seat 7. The vibration motor 6 is installed on the connecting seat 7. The vibration motor 6 drives the connecting seat 7 to vibrate and transmits the vibration to the docking seat 3 and the protective base 4.

[0024] The guiding atomization structure 1 includes an atomization component 8 and a heating component 9. The lower end of the atomization component 8 is communicated with the heating component 9. The atomization component 8 performs atomization treatment and the heating component 9 performs heating cooperation.

[0025] The atomizing component 8 includes a high-pressure gas pipe 10 and a docking connecting pipe 11. The lower end of the high-pressure gas pipe 10 is connected to the docking connecting pipe 11. The side end of the docking connecting pipe 11 is connected to a guide and discharge seat 13. An atomizing seat 12 is installed at the lower end of the guide and discharge seat 13. A regulating valve 14 is provided on the guide and discharge seat 13, and a docking feeding seat 15 is connected to the regulating valve 14.

[0026] The heating component 9 includes a gas guide pipe 16 and a docking branch pipe 17. The side end of the gas guide pipe 16 is connected to the docking branch pipe 17. The lower end of the docking branch pipe 17 is connected to a connection control seat 18. The lower end of the connection control seat 18 is connected to a heating mechanism 21 through a guiding control disc 20. The connection control seat 18 and the guiding control disc 20 are both installed on a reaction seat 19. A guide and discharge groove 22 is opened at the center of the reaction seat 19. The user connects the docking feeding seat 15 to a raw material pipe, and the high-pressure gas pipe 10 is connected to a high-pressure gas generator. The raw material is stored through the docking feeding seat 15, and the guide and discharge operation is controlled by the regulating valve 14. The raw material reaches the inside of the guide and discharge seat 13 through the regulating valve 14 and combines with the high-pressure gas conducted by the high-pressure gas pipe 10, and then is ejected through the atomizing seat 12 to form atomized particles, which are guided to the inside of the reaction seat 19. At this time, the gas guide pipe 16 and the docking branch pipe 17 introduce combustible gas. The combustible gas is conducted to the inside of the guiding control disc 20 through the connection control seat 18, and then is guided to the heating mechanism 21, and the atomized particles are thermally processed by the heating mechanism 21 to form a powdery structure, which is discharged through the guide and discharge groove 22.

[0027] The heating mechanism 21 includes a docking gas guide pipe 23, a gas guide square pipe 24, and a flame nozzle 25. The lower end of the docking gas guide pipe 23 is connected to the gas guide square pipe 24. The lower end of the gas guide square pipe 24 is connected to the flame nozzle 25. The bottom of the gas guide square pipe 24 is limited by a limit fixing base 28. A plasma generator 26 is provided in the middle of the flame nozzle 25. The plasma generator 26 is installed and supported by a machine base 27. The docking gas guide pipe 23 is connected to the guiding control disc 20. The combustible gas is conducted to the gas guide square pipe 24 through the docking gas guide pipe 23, and then is discharged through the flame nozzle 25 and ignited on the flame nozzle 25 to form a flame for thermally processing the atomized particles. At the same time, the plasma generator 26 on the machine base 27 operates for plasma heating, and cooperates with the flame to perform the thermally processing work of the atomized particles. The setting of the limit fixing base 28 facilitates the bottom installation of the heating mechanism 21, so that the heating mechanism 21 can be installed in the reaction seat 19.

[0028] The separation and guiding structure 5 includes a guiding cone base 29, a dispersion guide rod 30 and a rotating rod 31. The rotating rod 31 penetrates through the guiding cone base 29. A dispersion guide rod 30 is fixedly connected to the upper end of the rotating rod 31. A first gear disk 32 is fixedly connected to the lower end of the rotating rod 31. The side end of the first gear disk 32 is meshed and connected with a second gear disk 34. A control motor 35 is installed at the upper end of the second gear disk 34. The lower end of the guiding cone base 29 is fixed to a protective sleeve disk 33. The protective sleeve disk 33 supports the first gear disk 32, and the first gear disk 32 rotates on the protective sleeve disk 33. The powdery granular material is guided and discharged through the docking seat 3 and the separation and guiding structure 5. At this time, the control motor 35 controls the rotation of the second gear disk 34. The rotation of the second gear disk 34 drives the rotation and cooperation of the first gear disk 32. The rotating rod 31 controls the rotation of the dispersion guide rod 30 through the rotating rod 31, so that the dispersion guide rod 30 guides and discharges the powdery granular material through the side position of the docking seat 3 and the guiding cone base 29. Moreover, the vibration motor 6 can also perform vibration treatment, acting on the docking seat 3 and the protective base 4 through the connecting seat 7, thereby preventing the occurrence of accumulation phenomena.

[0029] The dispersion guide rod 30 rotates at the lower end of the guide discharge groove 22. There is a gap between the guide discharge groove 22 and the docking seat 3 for the guide discharge of spherical silicon micro powder.

[0030] The air guide pipe 16 is communicated with the guiding control disk 20 through the docking branch pipe 17 and the communication control seat 18. The guiding control disk 20 is communicated with the heating mechanism 21 for heating treatment. Moreover, a flame spray pipe 25 and a plasma generator 26 are arranged in the heating mechanism 21 for synchronous heating treatment.

[0031] The working principle is as follows: When in use, the user connects the docking material guiding seat 15 to the raw material pipe, and the high-pressure air pipe 10 is communicated with the high-pressure gas generator. The raw material is stored through the docking material guiding seat 15, and the guiding and discharging work is controlled through the regulating valve 14. The raw material reaches the guiding discharge seat 13 through the regulating valve 14 and combines with the high-pressure gas conducted by the high-pressure air pipe 10, and then is ejected through the atomizing seat 12 to form atomized particles, which are guided to the inside of the reaction seat 19. At this time, the air guide pipe 16 and the docking branch pipe 17 introduce combustible gas. The combustible gas is conducted to the guiding control disk 20 through the communication control seat 18, and then is guided to the heating mechanism 21. The heating mechanism 21 performs heat treatment on the atomized particles, thereby forming a powdery structure, which is guided and discharged through the guide discharge groove 22; Among them, the docking air duct 23 is communicated with the guiding control disk 20, and the combustible gas is conducted to the air guiding square duct 24 through the docking air duct 23, and then discharged through the flame nozzle 25, and is ignited on the flame nozzle 25 to form a flame for the thermal treatment of the atomized particles. At the same time, the plasma generator 26 on the machine base 27 works for plasma heating, cooperating with the flame to carry out the thermal treatment work of the atomized particles. The setting of the limit fixing base 28 facilitates the bottom installation of the heating mechanism 21, enabling the heating mechanism 21 to be installed in the reaction seat 19; After that, the powdery granular material is guided and discharged through the docking seat 3 and the separation guiding structure 5. At this time, the control motor 35 controls the rotation of the second gear disk 34. The rotation of the second gear disk 34 drives the rotation of the first gear disk 32 in cooperation. The rotating rod 31 controls the rotation of the dispersion guiding rod 30 through the rotating rod 31, so that the dispersion guiding rod 30 guides and discharges the powdery granular material through the side position of the docking seat 3 and the guiding cone seat 29. Moreover, the vibration motor 6 can also perform vibration treatment, acting on the docking seat 3 and the protective base 4 through the connecting seat 7, thereby preventing the occurrence of accumulation phenomenon and completing the work.

[0032] Although the embodiments of the present invention have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A high temperature post-treatment device for preparing spherical silicon powder by liquid phase method, characterized in that: The invention comprises a guiding atomization structure (1) and a vibration processing structure (2), wherein the guiding atomization structure (1) is connected to the vibration processing structure (2), a separation guiding structure (5) is installed at the center of the vibration processing structure (2), and the separation guiding structure (5) is also connected to the guiding atomization structure (1), and the guiding atomization structure (1) and the separation guiding structure (5) are fixed in position; The atomizing structure (1) is guided to perform atomization processing, and is connected to the docking connecting pipe (11) and the atomizing seat (12) through the high-pressure air pipe (10). After the atomization processing of the atomizing seat (12), the atomized material reaches the heating component (9). The heating mechanism (21) is arranged in a conical distribution, and the heating mechanism (21) combines flame and plasma to solidify the atomized material; The separation guide structure (5) is used for guiding and discharging the spherical silicon micropowder, and the control motor (35) drives the first toothed disc (32) to rotate via the second toothed disc (34), and the first toothed disc (32) drives the dispersion guide rod (30) to rotate via the rotating rod (31), so that the dispersion guide rod (30) contacts the spherical silicon micropowder to guide the spherical silicon micropowder; The vibration processing structure (2) is used for vibrating the material guide, and the vibration motor (6) and the connecting seat (7) act on the docking seat (3) and the protective base (4), driving the docking seat (3) and the protective base (4) to vibrate.

2. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 1, characterized in that: The vibration processing structure (2) comprises a docking seat (3), a protective base (4), a separation guide structure (5) and a vibration motor (6); the lower end of the docking seat (3) is fixedly connected to the protective base (4); the side end of the protective base (4) is fixedly connected to a connecting seat (7); the connecting seat (7) is equipped with a vibration motor (6); the vibration motor (6) drives the connecting seat (7) to vibrate, and transmits the vibration to the docking seat (3) and the protective base (4).

3. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 2, characterized in that: The guiding atomization structure (1) comprises an atomization component (8) and a heating component (9); the lower end of the atomization component (8) is connected to the heating component (9); the atomization component (8) performs atomization processing, and the heating component (9) performs heating coordination.

4. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 3, characterized in that: The atomizing component (8) comprises a high-pressure air pipe (10) and a butt-connecting pipe (11); the lower end of the high-pressure air pipe (10) is connected to the butt-connecting pipe (11); the side end of the butt-connecting pipe (11) is connected to a guide seat (13); an atomizing seat (12) is mounted on the lower end of the guide seat (13); a regulating valve (14) is provided on the guide seat (13); and a butt-connecting material guide seat (15) is provided on the regulating valve (14).

5. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 4, characterized in that: The heating component (9) comprises an air guide pipe (16) and a docking branch pipe (17); the side end of the air guide pipe (16) is connected to the docking branch pipe (17); the lower end of the docking branch pipe (17) is connected to a connection control seat (18); the lower end of the connection control seat (18) is connected to a heating mechanism (21) via a guide control disk (20); the connection control seat (18) and the guide control disk (20) are both mounted on a reaction seat (19); and a guide groove (22) is provided at the center of the reaction seat (19).

6. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 5, characterized in that: The heating mechanism (21) comprises a butt gas guide pipe (23), a gas guide square pipe (24) and a flame nozzle (25); the lower end of the butt gas guide pipe (23) is in communication with the gas guide square pipe (24); the lower end of the gas guide square pipe (24) is in communication with the flame nozzle (25); the bottom of the gas guide square pipe (24) is limited by a limit fixing base (28); a plasma generator (26) is provided in the middle of the flame nozzle (25); the plasma generator (26) is mounted and supported by a machine base (27).

7. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 6, characterized in that: The separation guide structure (5) comprises a guide cone seat (29), a dispersion guide rod (30) and a rotating rod (31); the rotating rod (31) is connected to the guide cone seat (29); the upper end of the rotating rod (31) is fixedly connected to the dispersion guide rod (30); the lower end of the rotating rod (31) is fixedly connected to the first toothed disc (32); the side end of the first toothed disc (32) is meshingly connected to the second toothed disc (34); the upper end of the second toothed disc (34) is mounted with a control motor (35); the lower end of the guide cone seat (29) is fixed to a protective sleeve disc (33); the protective sleeve disc (33) supports the first toothed disc (32), and the first toothed disc (32) rotates on the protective sleeve disc (33).

8. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 7, characterized in that: The dispersion guide rod (30) rotates at the lower end of the guide groove (22), and a gap exists between the guide groove (22) and the docking seat (3), which is used for guiding the spherical silicon micropowder.

9. The high-temperature post-treatment equipment for preparing spherical silicon powder by a liquid phase method according to claim 8, characterized in that: The air guide pipe (16) is connected to the guide control disk (20) via a docking branch pipe (17) and a connecting control seat (18); the guide control disk (20) is connected to a heating mechanism (21) for heating treatment; and a flame nozzle (25) and a plasma generator (26) are provided in the heating mechanism (21) for synchronous heating treatment.

10. A high-temperature post-treatment process for preparing spherical silicon micropowder by a liquid phase method, using the high-temperature post-treatment equipment for preparing spherical silicon micropowder by a liquid phase method according to claim 9, characterized in that: The following steps are involved: S1. First, the material guide seat (15) is connected to the raw material pipe, and the high-pressure gas pipe (10) is connected to the high-pressure gas generator. The raw material is stored through the material guide seat (15), and the guide operation is controlled by the regulating valve (14). The raw material reaches the guide seat (13) through the regulating valve (14), combines with the high-pressure gas conducted by the high-pressure gas pipe (10), and then is sprayed through the atomizing seat (12) to form atomized particles, which are guided to the inside of the reaction seat (19); S2, at this time, the gas guide pipe (16) and the docking branch pipe (17) introduce the combustible gas, and the combustible gas is conducted to the guide control disk (20) through the connecting control seat (18), and then guided to the heating mechanism (21), and the atomized particles are thermally treated by the heating mechanism (21), thereby forming a powder structure, and then discharged through the guide groove (22); S3, then, the docking air guide pipe (23) is connected to the guide control panel (20), the combustible gas is conducted to the air guide square pipe (24) through the docking air guide pipe (23), and then discharged through the flame nozzle (25), and ignited on the flame nozzle (25) to form a flame, and perform thermal treatment on the atomized particles. At the same time, the plasma generator (26) on the machine base (27) operates to perform plasma heating, and cooperates with the flame to perform thermal treatment on the atomized particles; S4. Finally, the powdery granules are guided through the docking seat (3) and the separation guide structure (5). At this time, the control motor (35) controls the second toothed disc (34) to rotate. The rotation of the second toothed disc (34) drives the first toothed disc (32) to rotate and cooperate. The rotating rod (31) controls the rotation of the dispersion guide rod (30) through the rotating rod (31), so that the dispersion guide rod (30) guides the powdery granules through the docking seat (3) and the side position of the guide cone seat (29). The vibration motor (6) can also perform vibration processing, and act on the docking seat (3) and the protective base (4) through the connecting seat (7), so as to prevent accumulation.

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