Full-automatic compatible multi-etching technology and multi-sample size uniformity machine table for scientific research

Abstract

The application discloses a full-automatic compatible multi-photolithography technology and multi-sample size uniform glue machine table for scientific research, and relates to the technical field of semiconductor uniform glue, wherein the first and second sample holders are used for loading samples of different sizes; the uniform glue device and the baking device are respectively used for uniform glue and baking treatment of the samples; the transfer device is provided with a transfer carrier adapted to the second sample size and used for carrying the first sample; the pretreatment device is used for pretreatment of the sample; the first sample moving device is used for conveying the sample, and the second sample moving device is used for conveying the sample and the transfer carrier; the pipetting device is connected with the first sample moving device and used for dropping and coating photoresist; and the adsorption replacement device is used for replacing the adsorption module of the uniform glue device. The machine table integrates the standard piece and fragment uniform glue functions, can meet the uniform glue requirements of different sizes of samples for electron beam lithography, laser direct writing lithography, step-by-step lithography, contact lithography and other lithography technologies, effectively reduces the equipment cost, reduces the space occupation and improves the scientific research efficiency.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor photolithography and multi-sample size, and particularly relates to a full-automatic compatible multi-photolithography and multi-sample size spin coater for scientific research. BACKGROUND

[0002] In the field of semiconductor micro-nano processing research, the photoresist spin coating in the photolithography process can be divided into two types according to the wafer sample size: 1, 1cm*1cm and 2cm*2cm (hereinafter referred to as "fragments"), which is a commonly used size in the early process of reducing research costs; 2, 2 inches / 4 inches / 6 inches / 8 inches (hereinafter referred to as "standard pieces"), which is used for mass production after the process conditions are mature in the fragments.

[0003] For the spin coating of the two types of samples, two spin coating methods are usually used. The first method is to use a manual spin coater for fragments and standard pieces. The sample is manually clamped and placed on the vacuum adsorption hole of the spin coater chuck by the naked eye. Different sizes of samples need to be manually replaced with corresponding chucks. The photoresist is dropped on the sample from the glue bottle by a dropper, and then the spin coating process is performed. The disadvantages of this method are: ①When placing the sample, the naked eye is used to determine whether the sample is placed in the middle of the vacuum adsorption hole of the spin coater. It cannot be guaranteed that the sample is placed in the same position every time. In addition, manual dropping of the glue cannot guarantee the consistency of the dropping position and the dropping amount every time. These may cause low process repeatability, poor stability, and low research efficiency. ②As the size of the sample increases, the requirements for manual spin coating also increase. It is more difficult to obtain good single photoresist uniformity, not to mention the stability between batches. The process effect is poor. ③The remaining photoresist needs to be manually cleaned by the researcher. The management cost of the management personnel is high. In addition, the photoresist may be contacted during cleaning, which is harmful to the health of the personnel. ④Manual replacement of different sizes of sample chucks reduces experimental efficiency. The second method is to use one set of fragment spin coater and one set of enterprise-level automatic standard piece spin coater. This method can ensure the process of standard pieces to a certain extent. However, this method significantly increases the cost because two complete sets of equipment need to be purchased and maintained. In addition, the laboratory space occupied is also greatly increased, which not only increases the operating cost of the laboratory, but also may limit the development of other scientific research activities.

[0004] In addition, in the field of semiconductor micro-nano processing, there are various photolithography technologies, such as laser direct writing photolithography, electron beam photolithography, step photolithography, and contact photolithography. Different photolithography technologies need to use different types of photoresist. Among these various photolithography technologies, the spin-coated photoresist used in laser direct writing photolithography, step photolithography, and contact photolithography can utilize the above-mentioned two spin-coating methods. However, in electron beam photolithography technology, the electron beam photoresist used is a very special photoresist.

[0005] Currently, for the spin-coating of electron beam photoresist, whether it is a fragment or a standard piece, only the first method can be used, that is, a manual spin coater is used. This is determined by the characteristics of the electron beam photoresist, which needs to be stored in a -18℃ freezer (such as HSQ electron beam photoresist) or a 2-8℃ refrigerator (ARP electron beam photoresist, PMMA electron beam photoresist). When used, it is taken out from the refrigerator and spin-coated on the sample using a spin coater. After spin-coating is completed, the electron beam photoresist needs to be immediately stored in the refrigerator. The existing automatic machine used by enterprises can only use room temperature photoresist, which is pumped from the photoresist barrel by a photoresist pump, and is not suitable for electron beam photoresist that needs to be stored in a freezer or refrigerator.

[0006] Therefore, there is an urgent need to provide a new solution to solve the above problems, which not only meets the needs of laser direct writing photolithography, step photolithography, and contact photolithography for spin-coating of fragments and standard pieces, but also meets the special spin-coating needs of electron beam photoresist technology, ensuring the stability of the standard piece process. SUMMARY

[0007] Therefore, the purpose of the present application is to provide a full-automatic compatible multi-photolithography technology and multi-sample size spin coater for scientific research, which can meet the needs of laser direct writing photolithography, step photolithography, and contact photolithography for spin-coating of fragments and standard pieces, solve the technical problems of cost increase and limitation of other scientific research activities caused by the existing two sets of machine solutions, and also meet the special spin-coating needs of electron beam photoresist technology, ensuring the stability of the standard piece process.

[0008] To achieve the above technical purposes, the present application provides a full-automatic compatible multi-photolithography technology and multi-sample size spin coater for scientific research, which comprises a first wafer device, a second wafer device, a liquid loading device, a first wafer moving device, a second wafer moving device, a pipetting device, an oven device, a spin coater device, an adsorption replacement device, a transfer device, and a pretreatment device.

[0009] The first wafer device is used to load a first sample.

[0010] The second wafer device is used to load a second sample with a size larger than the first sample.

[0011] The spin coater is used for spin coating the first sample or the second sample with the photoresist;

[0012] The baking device is used for baking the first sample and / or the second sample after spin coating;

[0013] The transfer device is provided with a transfer carrier which is adapted to the shape and size of the second sample and used for carrying the first sample;

[0014] The pre-treatment device is used for pre-treating the first sample or the second sample;

[0015] The first slide transferring device is capable of transferring the first sample between the first slide carrier device, the transfer carrier, the spin coater and the baking device;

[0016] The second slide transferring device is capable of transferring the second sample between the second slide carrier device, the pre-treatment device, the spin coater and the baking device;

[0017] The second slide transferring device is also capable of transferring the transfer carrier between the transfer device and the pre-treatment device;

[0018] The pipetting device is connected with the first slide transferring device and capable of sucking the photoresist from the liquid carrier device and dropping the photoresist on the first sample or the second sample under the driving of the first slide transferring device;

[0019] The adsorption replacement device is used for replacing the adsorption module of the spin coater.

[0020] Further, the second slide transferring device is also capable of transferring the transfer carrier between the transfer device and the baking device.

[0021] Further, the first slide transferring device is installed above the second slide transferring device and comprises a first multi-axis mechanical arm, a first visual sensor and a first slide transferring executor;

[0022] The first visual sensor is installed on the first multi-axis mechanical arm;

[0023] The first slide transferring executor is detachably installed on the end of the first multi-axis mechanical arm and capable of grabbing the first sample.

[0024] Further, the first slide transferring executor is a gripper;

[0025] The clamping surface of the clamping fingers of the first slide transferring executor is provided with at least two clamping protrusions which are spaced apart;

[0026] The clamping protrusions are capable of contacting the side surface of the first sample.

[0027] Further, the liquid carrier device comprises a liquid carrier container and a container fixing mechanism;

[0028] The liquid carrier container is used for containing photoresist;

[0029] The container fixing mechanism is used for fixing the liquid carrier container.

[0030] Further, the liquid carrier container is provided with a twist-off container cap;

[0031] The first wafer transfer device further comprises a container actuator;

[0032] The container actuator is detachably connected to the end of the first multi-axis robot arm, and can grab the liquid carrier container or twist the container cap.

[0033] Further, a low-temperature storage device is further included;

[0034] The low-temperature storage device is provided with a refrigeration chamber and a freezing chamber;

[0035] The liquid carrier container is provided with a label;

[0036] An information reader for reading the label is further included;

[0037] The information reader is mounted on the first wafer transfer device;

[0038] The first wafer transfer device is further used for transporting the liquid carrier container in the low-temperature storage device.

[0039] Further, the transfer device comprises a transfer seat and the transfer carrier;

[0040] The top of the transfer seat is provided with a carrier groove for placing the transfer carrier;

[0041] The carrier groove is provided with a transfer ejector pin for jacking up the transfer carrier;

[0042] The top of the transfer carrier is provided with a sample groove for placing the first sample;

[0043] The sample groove is provided with an avoidance through hole;

[0044] The carrier groove is further provided with a sample ejector pin for jacking up the first sample through the avoidance through hole.

[0045] Further, the transfer device further comprises a transfer driver and a second visual sensor;

[0046] The transfer driver is connected with the transfer seat and used for driving the transfer seat to rotate horizontally;

[0047] The second visual sensor is configured to acquire image information of the carrier groove and the transfer carrier.

[0048] Further, the adsorption replacement device comprises a replacement seat, a replacement displacement mechanism, and a replacement gripping mechanism.

[0049] The replacement seat is provided with a plurality of module grooves for placing the adsorption modules.

[0050] The gripping mechanism is configured to grip the adsorption modules.

[0051] The replacement displacement mechanism is connected with the gripping mechanism and configured to drive the gripping mechanism to move so as to transport the adsorption modules between the module grooves and the glue uniformizing device.

[0052] Further, the device further comprises a module cleaning mechanism.

[0053] The replacement seat is provided with a module jig and a jig driver.

[0054] The module jig is configured to fix the adsorption modules.

[0055] The jig driver is connected with the module jig and configured to drive the module jig to rotate horizontally.

[0056] The replacement displacement mechanism is further configured to drive the gripping mechanism to move so as to transport the adsorption modules between the module jig and the glue uniformizing device, or between the module grooves and the module jig.

[0057] The module cleaning mechanism is arranged on one side of the replacement seat and configured to clean the adsorption modules on the module jig.

[0058] Further, the module cleaning mechanism comprises a mechanism body, a first unwinder, a first rewinder, and a belt pressing mechanism.

[0059] The first unwinder is installed on the mechanism body and configured to release a first cleaning belt.

[0060] The first rewinder is installed on the mechanism body and located on one side of the first unwinder, and configured to rewind the first cleaning belt.

[0061] The belt pressing mechanism comprises a belt pressing piece and a belt pressing driver.

[0062] The belt pressing piece has a first belt pressing part and a second belt pressing part.

[0063] The first cleaning belt passes through the first belt pressing part and the second belt pressing part.

[0064] The pressing-belt driver is installed on the mechanism body and connected with the pressing-belt piece, and is used to drive the pressing-belt piece to move close to or away from the module fixture, so that the first pressing-belt part presses a part of the first cleaning belt passing through on the top surface of the adsorption module and / or so that the second pressing-belt part presses another part of the first cleaning belt passing through on the side surface of the adsorption module.

[0065] Further, the glue-uniformizing device comprises a device body, a device cover and a cover driving driver.

[0066] The device body is provided with a glue-uniformizing cavity at the top.

[0067] The glue-uniformizing cavity is provided with an adsorption module installation station at the center.

[0068] The cover driving driver is connected with the device cover and is used to drive the device cover to close or open the glue-uniformizing cavity.

[0069] Further, the glue-uniformizing device further comprises a first spraying mechanism and a second spraying mechanism.

[0070] The spraying end of the first spraying mechanism extends into the glue-uniformizing cavity and is arranged upward, and is used to spray cleaning liquid to the back surface of the second sample.

[0071] The first sample moving device can also grab a cleaning cloth and wipe and clean the inner wall surface of the glue-uniformizing cavity and the inner wall surface of the device cover.

[0072] The spraying end of the second spraying mechanism extends into the device cover and is arranged downward, and is used to spray cleaning liquid to the edge of the second sample in the glue-uniformizing cavity.

[0073] Further, the second spraying mechanism comprises a spraying pipe and a spraying driving driver.

[0074] The spraying pipe is rotationally installed on the device cover and extends into the device cover at one end.

[0075] One end of the spraying pipe is connected with a spraying head.

[0076] The tail end of the spraying head is located on one side of the central axis of the spraying pipe.

[0077] The spraying driving driver is installed on the device cover and connected with the spraying pipe, and is used to drive the spraying pipe to rotate.

[0078] Further, a sample cleaning device is further included.

[0079] The sample cleaning device is used to clean the first sample.

[0080] Further, the sample cleaning device comprises a second unwinder, a first guide frame, a second guide frame and a traction mechanism;

[0081] The second unwinder is wound with a second cleaning tape;

[0082] The traction mechanism is used to pull and release the second cleaning tape on the second unwinder;

[0083] The first guide frame and the second guide frame are sequentially arranged between the second unwinder and the traction mechanism;

[0084] The second cleaning tape passes through the first guide frame and the second guide frame;

[0085] The second guide frame is arranged at a height higher than that of the first guide frame, so that the second cleaning tape forms a first cleaning section arranged at a certain inclination angle or vertically between the first guide frame and the second guide frame;

[0086] The top of the second guide frame is provided with a horizontal support surface;

[0087] The width of the horizontal support surface is smaller than the width of the first sample;

[0088] The traction mechanism is arranged at a height lower than that of the second guide frame, so that the second cleaning tape forms a second cleaning section on the horizontal support surface and adheres to the horizontal support surface;

[0089] The first sample can also be grabbed by the first sample moving device, and the side surface of the first sample is in contact with the first cleaning section;

[0090] The first sample can also be grabbed by the first sample moving device, and the back surface of the first sample is in contact with the second cleaning section.

[0091] Further, a spraying table is further included;

[0092] The spraying table is arranged below the first guide frame, and is used to spray cleaning liquid on the part of the second cleaning tape passing through the first guide frame.

[0093] Further, a shearing mechanism and a recycling box are further included;

[0094] The shearing mechanism is arranged on one side of the discharge end of the traction mechanism, and is used to shear the released second cleaning tape;

[0095] The recycling box is used to recycle the cleaning tape waste used by the shearing mechanism.

[0096] Further, a side changing table is further included;

[0097] The edge-changing table is provided with an edge-changing adsorption hole for adsorbing the first sample.

[0098] Further, the second slide moving device comprises a second multi-axis mechanical arm and a second slide moving executor.

[0099] The end of the second multi-axis mechanical arm is connected with the second slide moving executor for driving the second slide moving executor to move.

[0100] The second slide moving executor is used for pricking the second sample or pricking the transfer carrier.

[0101] Further, the machine table body is further provided.

[0102] The machine table body is provided with a working cavity.

[0103] The first slide device, the second slide device, the liquid loading device, the first slide moving device, the second slide moving device, the pipetting device, the baking device, the glue spreading device, the adsorption changing device, the transfer device and the pretreatment device.

[0104] The second slide moving device is arranged directly below the first slide moving device.

[0105] The first slide device, the second slide device, the liquid loading device, the baking device, the glue spreading device, the adsorption changing device, the transfer device and the pretreatment device are distributed around the circumferential circumference of the second slide moving device.

[0106] Further, a fan filter unit is installed on the top of the machine table body and communicates with the working cavity.

[0107] Further, a control device is further provided.

[0108] The control device is electrically connected with the first slide device, the second slide device, the liquid loading device, the first slide moving device, the second slide moving device, the pipetting device, the baking device, the glue spreading device, the adsorption changing device, the transfer device and the pretreatment device.

[0109] From the above technical scheme can be seen, the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research designed in the present application, first, through the first moving device and the second moving device, the machine table can respectively grab the corresponding size of the sample; secondly, increase the design with the second sample size of the transfer device, so that the first sample can also adaptively pretreated, reduce the cost of modification of pretreatment equipment; further, increase the design of adsorption replacement module, for replacing the adsorption module of the uniform glue device to adapt to different sizes of sample adsorption, so as to meet the demand of laser direct writing lithography, stepping lithography, contact lithography technology for different size of uniform glue. Through the above design, a machine table is integrated with standard piece uniform glue and piece uniform glue function, which effectively reduces the equipment cost, reduces the occupation of laboratory space, and reduces the operation cost. BRIEF DESCRIPTION OF DRAWINGS

[0110] In order to more clearly illustrate the technical scheme in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application, and those skilled in the art can also obtain other drawings according to these drawings without creating labor.

[0111] Figure 1 The structure diagram of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application without machine table main body;

[0112] Figure 2 The first partial structure diagram of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application;

[0113] Figure 3 The partial structure diagram of the first moving device of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application;

[0114] Figure 4 The partial structure diagram of the second moving device of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application; Figure 3 The enlarged schematic diagram of A position in

[0115] Figure 5 The second partial structure diagram of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application;

[0116] Figure 6 The structure diagram of the transfer device of the full-automatic compatible multiple lithography technology and multiple sample size's uniform glue machine table for scientific research provided in the present application;

[0117] Figure 7The structural schematic view of the adsorption replacement device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application;

[0118] Figure 8 The first perspective view of the uniform coating device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application;

[0119] Figure 9 The second perspective view of the uniform coating device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application;

[0120] Figure 10 The first perspective view of the sample cleaning device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application;

[0121] Figure 11 The second perspective view of the sample cleaning device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application;

[0122] Figure 12 The third perspective view of the sample cleaning device of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application with a recycling box;

[0123] Figure 13 The perspective view of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application with a machine table main body;

[0124] Figure 14 The perspective view of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided in the application with a control device;

[0125] In the figure: 101, first slide moving device; 102, second slide moving device; 201, first slide device; 202, second slide device; 301, carrier liquid device; 302, pipette device; 400, transfer device; 500, pre-treatment device; 601, gel uniformizing device; 602, adsorption replacement device; 700, baking device; 800, sample cleaning device; 900, main body of machine; 901, observation window; 902, fan filter unit; 1000, control device; 11, first multi-axis robot arm; 12, first slide moving executor; 121, clamping finger; 122, clamping protrusion; 123, shaped groove; 13, second multi-axis robot arm; 14, second slide moving executor; 15, carrier; 16, container executor; 17, first vision sensor; 21, container fixing mechanism; 22, carrier liquid container; 221, container cover; 23, low-temperature storage device; 231, refrigeration chamber; 232, freezing chamber; 31, transfer seat; 32, transfer carrier; 321, sample groove; 322, avoidance through hole; 41, replacement seat; 42, replacement displacement mechanism; 43, replacement clamping mechanism; 44, adsorption module; 45, module cleaning mechanism; 451, mechanism main body; 452, first unwinder; 453, first winder; 454, belt pressing piece; 4541, first belt pressing part; 4542, second belt pressing part; 455, first cleaning belt; 51, device body; 52, device cover; 53, switch cover driver; 54, first spraying mechanism; 55, second spraying mechanism; 551, spraying driver; 552, spraying pipe; 553, spraying head; 61, second unwinder; 62, first guide frame; 63, second guide frame; 631, horizontal support surface; 64, traction mechanism; 65, second cleaning belt; 651, second cleaning section; 652, first cleaning section; 66, spraying table; 67, shearing mechanism; 68, recycling box; 681, automatic switch cover mechanism; 69, side changing table; 691, side changing adsorption hole. DETAILED DESCRIPTION

[0126] The technical solutions of the embodiments of the present application will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0127] In the description of the embodiments of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the embodiments of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the embodiments of the present application. In addition, the terms "first", "second", "third" are only for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0128] In the description of the embodiments of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood in a broad sense, for example, it can be fixedly connected, or it can be replaceably connected, or it can be integrally connected, it can be mechanically connected, or it can be electrically connected, it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the embodiments of the present application can be understood according to the specific circumstances.

[0129] The embodiments of the present application disclose a full-automatic compatible multi-photolithography technology and multi-sample size uniform glue machine table for scientific research.

[0130] Please refer to Figure 1 An embodiment of the full-automatic compatible multi-photolithography technology and multi-sample size uniform glue machine table for scientific research provided in the embodiments of the present application comprises:

[0131] The first slide device 201, the second slide device 202, the carrier liquid device 301, the first slide moving device 101, the second slide moving device 102, the pipette device 302, the baking device 700, the glue uniformizing device 601, the adsorption replacing device 602, the transfer device 400 and the pretreatment device 500.

[0132] The first slide device 201 is used for loading a first sample, and a plurality of loading stations are arranged thereon, and a jacking module is arranged on each loading station and used for jacking the first sample to facilitate grabbing the sample; the specific design can refer to an existing sample loading table with a jacking module, and no further description is made.

[0133] The second slide device 202 is used for loading a second sample with a size larger than that of the first sample; the first sample can be understood as a fragment (1 cm x 1 cm, 2 cm x 2 cm), and the second sample can be understood as a standard piece (2 inches / 4 inches / 6 inches / 8 inches); the grabbing of the standard piece can be achieved in a forked manner, and therefore the second slide device 202 can comprise a plurality of forked stations, and a bracket is arranged on each forked station to facilitate the forked grabbing of the second sample; the specific design can refer to an existing large-size sample carrier table, and no further description is made.

[0134] The spin coater 601 is used for spin coating the first sample or the second sample with photoresist.

[0135] The baking device 700 is used for baking the first sample (fragments) and / or the second sample (standard pieces) after spin coating, and the baking device 700 is an existing device provided with hot plate areas for baking and cold plate areas for cooling after baking. The hot plate areas and the cold plate areas can be provided in multiple numbers to realize simultaneous baking and cooling of the first sample and the second sample. When the number of hot plate areas is limited, the first sample and the second sample are baked separately, and details are not described herein.

[0136] The transfer device 400 is provided with a transfer carrier 32 matched with the shape and size of the second sample and used for carrying the first sample. In this design, the pretreatment device 500 only needs to be designed according to the pretreatment requirements of the second sample, and does not need to be redesigned for the first sample, avoiding the problem of cost increase caused by modification, and also realizing the pretreatment requirements of multiple first samples at a time and improving the efficiency.

[0137] The pretreatment device 500 is used for pretreating the first sample or the second sample. The pretreatment device 500 can be an evaporation machine, which is used for depositing a thin film layer with specific functions on the surface of the sample to provide necessary material basis for subsequent process steps (such as photoetching and etching).

[0138] The first sample transport device 101 can transport the first sample between the first carrier device 201, the transfer carrier 32, the spin coater 601 and the baking device 700. The second sample transport device 102 can transport the second sample between the second sample transport device 102, the pretreatment device 500, the spin coater 601 and the baking device 700. The second sample transport device 102 can also transport the transfer carrier 32 between the transfer device 400 and the pretreatment device 500. The second sample transport device 102 can also transport the transfer carrier 32 between the transfer device 400 and the baking device 700.

[0139] The pipetting device 302 is connected with the first sample transport device 101 and can suck photoresist from the liquid carrying device 301 and drop coat the photoresist on the first sample or the second sample under the driving of the first sample transport device 101. The adsorption replacement device 602 is used for replacing the adsorption module 44 of the spin coater 601.

[0140] The first sample spin coating process is as follows:

[0141] 1. The first sample transport device 101 grabs the first sample from the first carrier device 201 and transports the first sample to the transfer carrier 32.

[0142] 2、Second moving device 102 transports the intermediate carrier 32 to the pre-treatment device 500 to pre-treat the first sample, and transports the intermediate carrier 32 back to the intermediate device 400 after the pre-treatment is completed;

[0143] 3、The first moving device 101 picks up the first sample from the intermediate carrier 32 and transports it to the spin coating device 601, and before or during the transportation to the spin coating device 601, the adsorption replacement device 602 operates to replace the adsorption module 44 matching the size of the current first sample to the spin coating device 601; after the first sample is transported to the position, the adsorption module 44 adsorbs the first sample;

[0144] 4、The pipetting device 302 sucks the photoresist from the liquid carrier device 301 under the driving of the first moving device 101 and then drops it on the first sample of the adsorption module 44, and then the spin coating device 601 operates to perform spin coating treatment on the first sample;

[0145] 5、The first moving device 101 transports the first sample after spin coating to the baking device 700 for baking, or transports it back to the intermediate carrier 32, and then the second moving device 102 transports the intermediate carrier 32 to the baking device 700 to bake the first sample on the intermediate carrier 32 together and then transports it back to the intermediate device 400.

[0146] 6、The first moving device 101 transports the first sample after baking back to the first carrier device 201 to wait for removal.

[0147] The second sample spin coating process is as follows:

[0148] 1、The second moving device 102 picks up the second sample from the second carrier device 202 and transports it to the pre-treatment device 500 for pre-treatment;

[0149] 2、The second moving device 102 picks up the second sample after pre-treatment and transports it to the spin coating device 601, and before or during the transportation to the spin coating device 601, the adsorption replacement device 602 operates to replace the adsorption module 44 matching the size of the current second sample to the spin coating device 601; after the second sample is transported to the position, the adsorption module 44 adsorbs the second sample;

[0150] 3、The pipetting device 302 sucks the photoresist from the liquid carrier device 301 under the driving of the first moving device 101 and then drops it on the second sample of the adsorption module 44, and then the spin coating device 601 operates to perform spin coating treatment on the second sample;

[0151] 4、The second moving device 102 transports the second sample after spin coating to the baking device 700 for baking.

[0152] 5、The second moving device 102 transports the second sample after baking back to the second carrier device 202 to wait for removal.

[0153] From the above technical solutions, the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table designed by the present application is more flexible and efficient in function implementation. Specifically, through the cooperative operation of the first sample moving device 101 and the second sample moving device 102, different sizes of samples can be accurately grabbed and transported, greatly improving the adaptability and flexibility of the uniform coating operation. In addition, the design of the transfer device 400 cleverly solves the adaptation problem of the fragment sample in the pretreatment process, so that the standard piece and the fragment sample can be smoothly completed in the same machine table, without the need for additional modification of the pretreatment equipment, thereby saving the modification cost. Further, the design of the adsorption replacement module enables the uniform coating device 601 to quickly replace the adsorption module 44 according to different sample sizes, ensuring the stability and uniformity of the sample during the uniform coating process. This design not only improves the efficiency of the uniform coating operation, but also ensures the consistency and reliability of the uniform coating quality.

[0154] In summary, the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table designed by the present application successfully realizes the goal of integrating standard piece uniform coating and fragment uniform coating functions in one machine table (meeting the uniform coating needs of different sizes of samples for laser direct writing lithography, step-by-step lithography, and contact lithography technology). This not only effectively reduces the equipment cost, but also significantly reduces the occupation of laboratory space and operating cost, providing a more convenient, efficient and economical solution for the research activities of semiconductor uniform coating and baking.

[0155] The above is embodiment one of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided by the present application. The following is embodiment two of the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table for scientific research provided by the present application, please refer to Figures 1 to 14 .

[0156] Based on the above embodiment one:

[0157] Further, as Figures 2 to 4 indicated, for the design of the first sample moving device 101, a first multi-axis robot arm 11, a first vision sensor 17 and a first sample moving actuator 12 are installed above the second sample moving device 102; the first vision sensor 17 is installed on the first multi-axis robot arm 11; the first sample moving actuator 12 is detachably installed at the end of the first multi-axis robot arm 11 and can grab the first sample.

[0158] The first multi-axis robot 11 has multiple degrees of freedom, can flexibly move and rotate in three-dimensional space, to ensure accurate positioning and grasping of the first sample (specifically a six-axis collaborative robot / six-axis robot). The first vision sensor 17 is used to capture the position and attitude information of the first sample in real time, to provide accurate navigation for the first multi-axis robot 11, thereby improving the accuracy and efficiency of grasping.

[0159] Further, as shown in Figure 2 The first sample moving executor 12 can be a gripper, i.e., grasping the first sample in a clamping manner, specifically a pneumatic cylinder gripper, which can firmly clamp the first sample to avoid falling or displacement during movement. The gripper can also be adjusted according to the size of the first sample to adapt to different sample grasping requirements.

[0160] The clamping surface of the first sample moving executor 12 is provided with at least two spaced-apart clamping protrusions 122, which can contact the side surface of the first sample. Compared with the traditional direct surface contact, the improved multiple clamping protrusions 122 reduce the contact area between the clamping fingers 121 and the first sample (from the original area to point contact, the clamping protrusions 122 can be regarded as point contact structures, which can be in the form of strips, and the forming method can be to form a forming groove 123 in the middle of the clamping surface, the width of the forming groove 123 is smaller than the width of the clamping surface, and the bottom of the forming groove 123 extends to the bottom of the clamping surface, so that the two sides of the forming groove 123 form a protruding structure, which is the clamping protrusion 122, the width of the clamping protrusion 122 can be designed as small as possible to better reduce the contact area, which can be designed according to actual needs, without limitation), thereby reducing the viscosity between them (after research, there is some glue residue on the side surface of the first sample, and the direct surface contact design will transfer a lot of glue residue to the clamping surface of the clamping fingers 121, which will increase the viscosity between the clamping fingers 121 and the sample during the next clamping, causing the sample to be placed to be easily offset, affecting the operation accuracy). Therefore, by adopting the multi-point contact design, we not only improve the stability of clamping, but also optimize the operation process, ensure the accurate placement of the sample, and thereby improve the overall operation accuracy and efficiency.

[0161] Further, as shown in Figure 5As shown, for the design of the liquid carrier device 301, it includes a liquid carrier container 22 and a container fixing mechanism 21; the liquid carrier container 22 is used to hold the photoresist; the container fixing mechanism 21 is used to fix the liquid carrier container 22. The container fixing mechanism 21 can be a clamping mechanism to fix the liquid carrier container 22 in a clamped manner, ensuring that it does not shake or tilt during operation, and ensuring stable supply of photoresist. The liquid carrier container 22 is designed to consider the properties and use requirements of photoresist, and is made of chemically resistant materials to ensure that photoresist does not react with the container and affect its performance.

[0162] Further, as shown in Figure 2 and Figure 5 The liquid carrier container 22 is provided with a container cap 221 that can be twisted off to prevent photoresist from being oxidized or contaminated by air during long-term storage.

[0163] The first wafer moving device 101 further includes a container executor 16; the container executor 16 is detachably connected to the end of the first multi-axis mechanical arm 11, and can grab the liquid carrier container 22 or twist the container cap 221.

[0164] The container executor 16 can also be a gripper (such as a pneumatic cylinder gripper), which has sufficient clamping force and stability to securely grab the liquid carrier container 22 and avoid dropping or leaking during movement. At the same time, the design of the container executor 16 also needs to consider the operation of twisting off the container cap 221, that is, the container executor 16 has a rotating function and can twist off or tighten after clamping the container cap 221. This design not only improves the operation convenience of the liquid carrier device 301, but also ensures the safe storage and stable supply of photoresist, providing strong support for the photoresist uniformity operation. The container executor 16 can be designed for container grabbing or cap twisting, and if it is designed for a single operation, an additional container executor can be designed for another operation; for the case where the container and the cap have similar diameters, it can be compatible with both operations, and those skilled in the art can make changes according to actual needs without limitation.

[0165] In order to facilitate the replacement of the container executor 16 and the first wafer executor 12, a carrier 15 is provided to carry the container executor 16 and the first wafer executor 12, and to fix the replaced executor; the executor and the first multi-axis mechanical arm 11 are connected through a quick-change joint to improve the replacement efficiency.

[0166] Further, as shown in Figure 5As shown, it also includes a low-temperature storage device 23 (e.g., a freezer / refrigerator); the low-temperature storage device 23 is provided with a refrigerator compartment 231 and a freezer compartment 232; a label (not shown) is provided on the liquid container 22; it also includes an information reader (not shown) for reading the label; the information reader is installed on the first transfer device 101; the first transfer device 101 is also used to transport the liquid container 22 in the low-temperature storage device 23.

[0167] The cryogenic storage device 23 is designed with the storage requirements of photoresist in mind. Photoresist is a temperature-sensitive chemical material that needs to be stored under specific temperature conditions to maintain its performance stability. Therefore, the cryogenic storage device 23 provides two different storage areas: a refrigerator compartment 231 and a freezer compartment 232, to accommodate the different storage temperature requirements of photoresist. The refrigerator compartment 231 is suitable for storing photoresist with slightly lower temperature requirements, while the freezer compartment 232 is used to store photoresist with more stringent temperature requirements.

[0168] The tag (RFID tag) on ​​the liquid carrier container 22 is used to record key information such as the type, batch, and storage conditions of the photoresist. This information is crucial for ensuring the accuracy and traceability of the spin coating operation. An information reader is installed on the first wafer transfer device 101, which can automatically read the information on the tag during the transport of the liquid carrier container 22 by the first wafer transfer device 101. In this way, the first wafer transfer device 101 can accurately transport the liquid carrier container 22 to the designated storage location or select the correct photoresist during the spin coating operation based on the read information.

[0169] Furthermore, the first wafer transfer device 101 also has the function of transporting the liquid carrier container 22 within the cryogenic storage device 23. This means that before the spin coating operation, the first wafer transfer device 101 can automatically remove the required liquid carrier container 22 from the cryogenic storage device 23 and transport it to the container fixing mechanism 21 of the liquid carrier device 301 for use. This design not only improves the automation level of the spin coating operation but also ensures the safety and stability of the photoresist during storage and transportation.

[0170] By designing a low-temperature storage device 23, the spin coating machine designed in this application can also meet the special spin coating requirements of electron beam photoresist technology.

[0171] Furthermore, such as Figure 6 As shown, the transfer device 400 includes a transfer base 31 and a transfer carrier 32. The top of the transfer base 31 is provided with a carrier groove for the transfer carrier 32 to be placed. The transfer base 31 serves as a support structure, and the carrier groove on its top is used to stably place the transfer carrier 32.

[0172] The carrier groove is provided with a transfer ejector pin (not shown in the figure) for jacking up the transfer carrier 32; the transfer ejector pin can jack up the transfer carrier 32 when needed, facilitating the first wafer moving device 101 or the second wafer moving device 102 to grasp and place the transfer carrier 32.

[0173] The top of the transfer carrier 32 is provided with a sample groove 321 for placing the first sample; the sample groove 321 is provided with an avoiding through hole 322; the carrier groove is also provided with a sample ejector pin (not shown in the figure) for jacking up the first sample through the avoiding through hole 322. The design of the transfer carrier 32 also takes into account the placement requirements of the sample. The sample groove 321 at the top is matched in size with the first sample and can stably carry the first sample. The avoiding through hole 322 provided on the sample groove 321 is used in cooperation with the sample ejector pin on the carrier groove. When the first sample needs to be jacked up, the sample ejector pin can jack up the sample through the avoiding through hole 322, so that the sample can be smoothly separated from the transfer carrier 32, facilitating the first wafer moving device 101 to grasp or place.

[0174] Further, the transfer device 400 also includes a transfer driver (not shown in the figure) and a second vision sensor (not shown in the figure); the transfer driver is connected with the transfer seat 31 for driving the transfer seat 31 to rotate horizontally; the second vision sensor is used to obtain image information of the carrier groove and the transfer carrier 32.

[0175] When the transfer carrier 32 is reset after being transported to the pre-processing device 500 or the baking device 700, there may be an inaccurate resetting problem, that is, the avoiding through hole 322 cannot be aligned with the sample ejector pin on the transfer seat 31, causing problems in jacking up the first sample, thereby affecting the grasping of the first sample. By designing the second vision sensor to obtain the image information of the carrier groove and the transfer carrier 32, the alignment between the avoiding through hole 322 and the sample ejector pin can be determined, and then the rotation angle can be adjusted by the transfer driver (such as a reversible servo motor, without limitation) to ensure that the transfer carrier 32 can be accurately placed on the transfer seat 31.

[0176] Of course, the second vision sensor can not be provided, and the first vision sensor can be directly used for detection and judgment to save the cost of sensor arrangement and maintenance.

[0177] Further, as shown in Figure 7 For the design of the adsorption replacement device 602, it includes a replacement seat 41, a replacement displacement mechanism 42, and a replacement clamping mechanism 43. The replacement seat 41 is provided with a plurality of module grooves for placing the adsorption modules 44 one by one; the clamping mechanism is used to clamp the adsorption modules 44; the replacement displacement mechanism 42 is connected with the clamping mechanism and is used to drive the clamping mechanism to move to transport the adsorption modules 44 between the module grooves and the glue uniformizing device 601.

[0178] The replacement displacement mechanism 42 can be a multi-axis robot arm (such as a six-axis robot arm) or a linear motor module (XYZ three-axis module) with sufficient movement precision and stability to ensure the safety and accuracy of the adsorption module 44 during transportation. The replacement gripping mechanism 43 can be a cylinder gripper or other suitable gripping device that can firmly grip the adsorption module 44 to prevent it from falling or being damaged during replacement. In addition, the number of module recesses provided on the replacement seat 41 can be set according to actual needs to meet the replacement needs of different types and quantities of adsorption modules 44.

[0179] Further, as shown in Figure 7 After the adsorption module 44 is used, there may be glue residues on its upper surface and side surface. In order to avoid these glue residues from contaminating the sample during the next use, the module cleaning mechanism 45 is additionally designed.

[0180] The replacement seat 41 is provided with a module jig (not shown in the figure) and a jig driver (not shown in the figure); the module jig is used to fix the adsorption module 44; the jig driver is connected with the module jig and is used to drive the module jig to rotate horizontally. The module jig can be a clamping mechanism or a vacuum adsorption mechanism to fix the module jig in a clamped or adsorbed manner, and the jig driver can be a servo motor, which is not limited in particular.

[0181] The replacement displacement mechanism 42 is also used to drive the gripping mechanism to transport the adsorption module 44 between the module jig and the glue uniformizing device 601, or between the module recess and the module jig; it can be understood that the replaced adsorption module 44 is first transported to the module jig for fixation to prepare for cleaning, and then transported to the module recess after cleaning to wait for the next replacement.

[0182] The module cleaning mechanism 45 is arranged on one side of the replacement seat 41 and is used to clean the adsorption module 44 located on the module jig.

[0183] It should be noted that generally, cleaning is mainly aimed at the adsorption module 44 used for adsorbing and fixing the fragments. Since the fragments are small in size, they cannot cover the adsorption module 44, and therefore the part of the adsorption module 44 not covered by the fragments is easy to be splashed with glue and become dirty. The adsorption module 44 used for adsorbing and fixing the standard pieces can completely cover the adsorption module 44 due to the relatively large size of the standard pieces, and therefore the probability of dirt is relatively small, and the module cleaning mechanism 45 can be used to clean the dirt when it occurs. Those that do not need to be cleaned are placed in the module recess for use, which is not described in detail.

[0184] Further, as shown in Figure 5 For the design of the module cleaning mechanism 45, it includes a mechanism body 451, a first unwinder 452, a first rewinder 453, and a belt pressing mechanism.

[0185] The first unwinder 452 is installed on the mechanism body 451 and is used to release the first cleaning belt 455; the first winder 453 is installed on the mechanism body 451 and is located on one side of the first unwinder 452 and is used to wind the first cleaning belt 455.

[0186] The belt pressing mechanism includes a belt pressing piece 454 and a belt pressing driver (not shown in the figure); the belt pressing piece 454 has a first belt pressing part 4541 and a second belt pressing part 4542; the first cleaning belt 455 passes through the first belt pressing part 4541 and the second belt pressing part 4542; the belt pressing driver is installed on the mechanism body 451 and is connected with the belt pressing piece 454 and is used to drive the belt pressing piece 454 to move close to or away from the module jig, so that the first belt pressing part 4541 presses a part of the passing first cleaning belt 455 to the top surface of the adsorption module 44 and / or so that the second belt pressing part 4542 presses another part of the passing first cleaning belt 455 to the side surface of the adsorption module 44.

[0187] Through the design of the belt pressing mechanism, it can be ensured that the first cleaning belt 455 can closely adhere to the top surface and the side surface of the adsorption module 44 during the cleaning process, thereby improving the cleaning effect. The belt pressing driver can be a multi-axis linear module (such as an XYZ three-axis linear module) or a multi-axis mechanical arm (such as a six-axis mechanical arm) or a rotary motor, which can press the first belt pressing part 4541 and / or the second belt pressing part 4542 to the adsorption module 44, without limitation.

[0188] During the cleaning process, the first cleaning belt 455 is pressed to the top surface or the side surface of the adsorption module 44, and then the jig driver is started to drive the adsorption module 44 to rotate. During the rotation process, the dirt on the surface of the adsorption module 44 is also wiped away by the first cleaning belt 455. In order to improve the wiping effect, the belt can be appropriately walked, and the clean cleaning belt segment can continue to wipe.

[0189] The design of the first unwinder 452 and the first winder 453 can conveniently release and wind the first cleaning belt 455, which is convenient for the replacement and maintenance of the cleaning belt. The entire module cleaning mechanism 45 has a compact structure and a reasonable design, and can effectively complete the cleaning work of the adsorption module 44.

[0190] In order to further improve the cleaning effect, a module cleaning spraying mechanism (not shown in the figure) can be designed and arranged between the first unwinder 452 and the belt pressing mechanism to spray cleaning liquid to the passing first cleaning belt 455, so as to improve the cleaning effect.

[0191] Further, as shown in Figure 8 and Figure 9 , for the design of the uniform glue device 601, it includes a device body 51, a device cover 52, and a switch cover driver 53.

[0192] The device body 51 is provided with a glue uniformizing cavity at the top; the glue uniformizing cavity is provided with an adsorption module 44 installation station at the center; and the switch cover driver 53 is connected with the device cover 52, and is used to drive the device cover 52 to close or open the glue uniformizing cavity.

[0193] When the device cover 52 is closed, the adsorption module 44 installation station can be closed in the glue uniformizing cavity, the cleanliness in the glue uniformizing cavity is maintained, and the influence of external impurities on the glue uniformizing process is avoided. When the device cover 52 is opened, the adsorption module 44 can be installed on or removed from the adsorption module 44 installation station, and the replacement or maintenance operation is facilitated. Such a design makes the operation of the glue uniformizing device 601 automatic, and improves the work efficiency. At the same time, corresponding glue uniformizing components, such as a rotary motor, are also arranged in the glue uniformizing cavity, which are used to uniformly glue the sample adsorbed on the adsorption module 44, so as to ensure that the glue layer on the surface of the sample is uniform and consistent, and meet the requirements of the subsequent process, and details are not described herein.

[0194] The opening and closing of the device cover 52 can be vertically controlled, and correspondingly, the switch cover driver 53 can be a lifting mechanism (a telescopic rod, a vertically arranged linear module, etc.), which is not limited.

[0195] Further, the glue uniformizing device 601 further comprises a first spraying mechanism 54 and a second spraying mechanism 55.

[0196] The spraying end of the first spraying mechanism 54 extends into the glue uniformizing cavity and is arranged upward, which is used to spray cleaning liquid to the back of the second sample, so as to realize the standard piece back washing function. Of course, when there is no standard piece placed, the cleaning liquid can be sprayed to the inner wall surface of the device cover 52, and then the first piece moving device 101 can also grab the cleaning cloth to wipe and clean the inner wall surface of the glue uniformizing cavity and the inner wall surface of the device cover 52. After the cleaning liquid is sprayed to the device cover 52, the cleaning liquid will flow into the glue uniformizing cavity, and then the device cover 52 is opened, and the cleaning cloth is grabbed by the first piece moving device 101 to simulate the wiping operation of the human hand, so as to wipe and clean the inner wall surface of the glue uniformizing cavity and the inner wall surface of the device cover 52.

[0197] The device body 51 can also be connected with a drain pipe (not shown in the figure) communicating with the glue uniformizing cavity, which is used to drain the cleaning liquid, and details are not limited.

[0198] The spraying end of the second spraying mechanism 55 extends into the device cover 52 and is arranged downward, which is used to spray cleaning liquid to the edge of the second sample in the glue uniformizing cavity, so as to realize the edge removing function.

[0199] Further, as shown in FIG. 6, the glue uniformizing device 601 further comprises a first piece moving device 101 and a second piece moving device 102. Figure 8 and Figure 9As shown, in order to be able to adapt to second samples of various sizes for spraying and ensure that the edges of second samples of each size can be sprayed in place, the second spraying mechanism 55 of the present application is designed to include a spraying pipe 552 and a spraying driver 551.

[0200] The spraying pipe 552 is rotatably installed on the device cover 52, and one end extends into the device cover 52; a spraying head 553 is connected to one end of the spraying pipe 552; the end of the spraying head 553 is located on one side of the central axis of the spraying pipe 552, so that the spraying head 553 can rotate on a preset circular trajectory. By adjusting the rotation angle, the projection of the spraying head 553 in the vertical direction can fall on the second sample, so as to accurately provide cleaning liquid for the edge of the second sample.

[0201] The spraying driver 551 is installed on the device cover 52 and is connected to the spraying pipe 552 for driving the spraying pipe 552 to rotate. The spraying driver 551 can be a servo motor, and is传动 connected to the spraying pipe 552 through transmission components such as gears and belts to drive the spraying pipe 552 to rotate.

[0202] Further, although the present application directly performs backwashing and edge cleaning on the second sample in the spin coating chamber, this cleaning method is relatively more suitable for use with standard samples of larger sizes and not suitable for small-sized fragment samples; in order to meet the requirement that small-sized fragment samples can also be cleaned, as Figure 10 and Figure 11 shown, the present application also additionally designs a sample cleaning device 800.

[0203] The sample cleaning device 800 is used to clean the first sample, and the first sample after cleaning is then sent for baking.

[0204] Further, as Figure 10 and Figure 11 shown, for the design of the sample cleaning device 800, it includes a second unwind reel 61, a first guide frame 62, a second guide frame 63 and a traction mechanism 64.

[0205] A second cleaning belt 65 is wound on the second unwind reel 61; the traction mechanism 64 is used to pull and release the second cleaning belt 65 on the second unwind reel 61; the second unwind reel 61 is equipped with an unwind motor, and in cooperation with the traction mechanism 64, it can control the tension of the released second cleaning belt 65.

[0206] The first guide frame 62 and the second guide frame 63 are sequentially arranged between the second unwind reel 61 and the traction mechanism 64.

[0207] It should be noted that there is an error in the original text where "传动 connected" should be "drivingly connected". The above translation has been corrected accordingly.The second cleaning belt 65 is wound around the first guide frame 62 and the second guide frame 63, and the second guide frame 63 is arranged at a height higher than that of the first guide frame 62, so that the second cleaning belt 65 forms a first cleaning section 652 with an inclined angle or vertically between the first guide frame 62 and the second guide frame 63, which facilitates the full adhesion to the side surface of the first sample.

[0208] The top of the second guide frame 63 is provided with a horizontal support surface 631, and the width of the horizontal support surface 631 is smaller than that of the first sample. The traction mechanism 64 is arranged at a height lower than that of the second guide frame 63, so that the second cleaning belt 65 forms a second cleaning section 651 adhering to the horizontal support surface 631 on the horizontal support surface 631 (the second cleaning section 651 arranged horizontally and with a width smaller than that of the first sample can well adhere to the back surface of the first sample, thereby fully cleaning the back surface of the first sample and avoiding the interference of the pinch finger 121).

[0209] The first sample can be grabbed by the first sample moving device 101 and the side surface of the first sample can be in contact with the first cleaning section 652, and the first sample can also be grabbed by the first sample moving device 101 and the back surface of the first sample can be in contact with the second cleaning section 651.

[0210] Through the above design, when the back surface of the first sample is cleaned, the back surface can be fully in contact with the second cleaning section 651, thereby ensuring the uniformity and thoroughness of the back surface cleaning. When the side surface of the first sample is cleaned, the side surface can be fully in contact with the first cleaning section 652, thereby making the side surface cleaning more ideal.

[0211] Further, in order to improve the cleaning effect, a spraying table 66 is additionally designed. The spraying table 66 is arranged below the first guide frame 62 and is provided with a plurality of spraying holes for spraying cleaning liquid on the part of the second cleaning belt 65 passing through the first guide frame 62 (the spraying table 66 can be designed according to the sprayer, which is not limited). For the design of the first guide frame 62, the structure can be a U-shaped guide plate, and two horizontal passing gaps are formed between the U-shaped guide plate and the spraying table 66. The part of the second cleaning belt 65 located between the passing gaps is a straight part sprayed with the cleaning liquid, thereby improving the efficiency of wetting the cleaning belt with the cleaning liquid.

[0212] The spraying table 66 can be designed with a recycling cavity, and the excess cleaning liquid sprayed upward can fall into the recycling cavity for recycling. Those skilled in the art can make appropriate changes based on this, which is not limited.

[0213] Further, as shown in Figure 11 and Figure 12 , the application also includes a shearing mechanism 67 and a recycling box 68.

[0214] The shearing mechanism 67 is located on one side of the discharge end of the traction mechanism 64 and is used to shear the released second cleaning belt 65. The shearing mechanism 67 is designed to cut off and recycle the dirty second cleaning belt 65; or cut out a clean cleaning belt for the first transfer device 101 to grab and simulate human hand wiping, and then recycle it after use.

[0215] The recycling bin 68 is used to recycle used cleaning belt waste. The recycling bin 68 can be designed with an automatic opening and closing mechanism 681 to improve the level of automation.

[0216] Furthermore, such as Figure 10 as well as Figure 11 As shown, it also includes a side-changing stage 69; the side-changing stage 69 is provided with side-changing adsorption holes 691 for adsorbing the first sample. With the side-changing stage 69 set up, after the two non-clamped sides of the first sample are wiped, it can be placed on the side-changing adsorption holes 691 and temporarily adsorbed and fixed by the side-changing adsorption holes 691. Then, the first plate-shifting actuator 12 switches its position to clamp the wiped side, exposing the other two sides that could not be wiped due to clamping. The exposed other two sides are then wiped, and a secondary cleaning of the back can be performed at the same time, so that all sides can be fully wiped and the wiping effect can be effectively improved.

[0217] Furthermore, such as Figure 2 As shown, the second wafer transfer device 102 includes a second multi-axis robotic arm 13 and a second wafer transfer actuator 14. The end of the second multi-axis robotic arm 13 is connected to the second wafer transfer actuator 14 and is used to drive the second wafer transfer actuator 14 to move. The second wafer transfer actuator 14 is used to pick up the second sample or pick up the intermediate transfer fixture 32. The second wafer transfer device 102 designed above can be designed with reference to the existing industrial-grade large-size sample insertion structure, or can be directly used. Specifically, the second multi-axis robotic arm can be a four-axis wafer transfer robotic arm, which will not be described in detail.

[0218] Furthermore, such as Figure 13 As shown, the system also includes a main body 900; the main body 900 has a working chamber; a first slide carrier 201, a second slide carrier 202, a liquid carrier 301, a first slide transfer device 101, a second slide transfer device 102, a liquid transfer device 302, a baking device 700, a homogenizing device 601, an adsorption replacement device 602, a transfer device 400, and a pretreatment device 500. The design of the working chamber provides a closed and clean environment for the entire processing, effectively avoiding the influence of external contamination on the sample and ensuring the quality of sample processing.

[0219] The second slide moving device 102 is arranged directly below the first slide moving device 101; the first slide device 201, the second slide device 202, the liquid loading device 301, the baking device 700, the glue spreading device 601, the adsorption replacement device 602, the transfer device 400 and the pretreatment device 500 are distributed around the circumferential circumference of the second slide moving device 102. Such a layout design makes the cooperation between each device more smooth, reduces the time loss in the sample transfer process, and improves the overall production efficiency. The first slide moving device 101 and the second slide moving device 102 are located in the center position, which facilitates the rapid transfer of samples between various treatment devices.

[0220] In addition, at least one side of the machine body 900 is provided with an observation window for observing the working condition inside the working cavity.

[0221] Further, a fan filter unit 902 is installed on the top of the machine body 900, which is in communication with the working cavity. The fan filter unit 902 can provide clean air to the working cavity, maintain the cleanliness of the working cavity, and further avoid the influence of external impurities on the sample processing process. At the same time, a corresponding exhaust system can also be arranged in the machine body 900 to exhaust the waste gas in the working cavity, ensuring a good working environment. The design of the entire machine body 900 fully considers the cleanliness and efficiency requirements of sample processing, and provides a stable and reliable platform for the automated processing of samples.

[0222] Further, as shown in Figure 14 The control device 1000 is electrically connected with the first slide device 201, the second slide device 202, the liquid loading device 301, the first slide moving device 101, the second slide moving device 102, the pipette device 302, the baking device 700, the glue spreading device 601, the adsorption replacement device 602, the transfer device 400 and the pretreatment device 500.

[0223] The control device 1000 as the "brain" of the whole system is responsible for coordinating the actions between each device to ensure smooth operation of the entire processing flow. Through the preset program, the control device 1000 can accurately control the motion trajectory, motion speed and action timing of each device, so that each step of sample feeding, glue spreading, baking, cleaning and the like can be automatically completed according to the predetermined order and conditions without manual intervention, greatly improving the production efficiency and automation degree. At the same time, the control device 1000 also has fault detection and alarm functions. Once a fault or abnormal condition is detected in a device, an alarm signal can be immediately sent out, and appropriate protective measures can be taken to ensure the safe and stable operation of the entire system.

[0224] The control device 1000 can be integrated in the machine main body 900, or designed independently of the machine main body 900 and then connected in communication through a related cable, and the specific limitation is not made.

[0225] The above describes in detail the full-automatic compatible multi-photolithography technology and multi-sample size uniform coating machine table provided by the application. For those skilled in the art, according to the idea of the embodiments of the application, there will be changes in the specific implementation manner and application range. In view of the above, the content of the specification should not be understood as a limitation of the application.

Claims

1. A fully automated spin coater for scientific research, compatible with multiple photolithography technologies and various sample sizes, characterized in that: It includes a first slide carrier (201), a second slide carrier (202), a liquid carrier (301), a first slide transfer device (101), a second slide transfer device (102), a liquid transfer device (302), a baking device (700), a spin coating device (601), an adsorption replacement device (602), a transfer device (400), and a pretreatment device (500). The first slide carrier (201) is used to load the first sample; The second slide carrier (202) is used to load a second sample with a size larger than the first sample; The photoresist spinning device (601) is used to perform photoresist spinning on a first or second sample with photoresist droplets. The baking apparatus (700) is used to bake the first sample and / or the second sample after homogenization treatment; The transfer device (400) is equipped with a transfer vessel (32) that is adapted to the shape and size of the second sample and is used to carry the first sample. The pretreatment device (500) is used to pretreat the first sample or the second sample; The first transfer device (101) is capable of transporting the first sample between the first substrate carrier (201), the intermediate transfer device (32), the spin coater (601), and the baking device (700); The second transfer device (102) is capable of transporting the second sample between the second substrate carrier (202), the pretreatment device (500), the spin coating device (601), and the baking device (700); The second plate transfer device (102) is also capable of transporting the intermediate transfer device (32) between the transfer device (400) and the pre-processing device (500); The liquid transfer device (302) is connected to the first wafer transfer device (101) and can draw photoresist from the liquid carrier device (301) and drop it onto the first sample or the second sample under the drive of the first wafer transfer device (101). The adsorption replacement device (602) is used to replace the adsorption module (44) of the gelling device (601).

2. The fully automated spin coater for scientific research compatible with multiple photolithography technologies and multiple sample sizes as described in claim 1, characterized in that, The second plate transfer device (102) is also capable of transporting the intermediate transfer device (32) between the intermediate transfer device (400) and the baking device (700).

3. The fully automated spin coater for scientific research compatible with multiple photolithography technologies and multiple sample sizes as described in claim 1, characterized in that, The first piece-shifting device (101) is mounted above the second piece-shifting device (102) and includes a first multi-axis robotic arm (11), a first vision sensor (17) and a first piece-shifting actuator (12). The first vision sensor (17) is mounted on the first multi-axis robotic arm (11). The first plate-shifting actuator (12) is detachably mounted at the end of the first multi-axis robotic arm (11) and is capable of grasping the first sample.

4. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 3, characterized in that, The first slice actuator (12) is a gripper; The clamping surface of the clamping finger (121) of the first slice actuator (12) is provided with at least two spaced clamping protrusions (122). The clamping protrusion (122) is able to contact the side of the first sample.

5. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 3, characterized in that, The liquid-carrying device (301) includes a liquid-carrying container (22) and a container fixing mechanism (21); The liquid carrier container (22) is used to hold the photoresist; The container fixing mechanism (21) is used to fix the liquid-carrying container (22).

6. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 5, characterized in that, The liquid container (22) is fitted with a container cap (221) that can be unscrewed. The first piece-shifting device (101) also includes a container actuator (16). The container actuator (16) is detachably connected to the end of the first multi-axis robotic arm (11) and is capable of gripping the liquid container (22) or twisting the container cap (221).

7. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 6, characterized in that, It also includes a low-temperature storage device (23); The low-temperature storage device (23) is provided with a cold storage chamber (231) and a freezer chamber (232). The liquid container (22) is labeled; It also includes an information reader for reading the tag; The information reader is mounted on the first chip shifting device (101); The first plate transfer device (101) is also used to transport the liquid carrier container (22) in the cryogenic storage device (23).

8. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, The transfer device (400) includes a transfer base (31) and the transfer carrier (32); The top of the transfer seat (31) is provided with a carrier groove for the transfer carrier (32) to be inserted; The carrier groove is provided with a transfer pin for lifting the transfer carrier (32). The top of the transfer device (32) is provided with a sample groove (321) for the first sample to be placed. The sample groove (321) is provided with a clearance through hole (322); The carrier groove is also provided with a sample ejector pin that lifts the first sample through the clearance through hole (322).

9. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 8, characterized in that, The transfer device (400) also includes a transfer driver and a second vision sensor; The transfer driver is connected to the transfer base (31) and is used to drive the transfer base (31) to rotate horizontally; The second vision sensor is used to acquire image information of the vehicle groove and the intermediate transfer vehicle (32).

10. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, The adsorption replacement device (602) includes a replacement seat (41), a replacement displacement mechanism (42), and a replacement clamping mechanism (43). The replacement seat (41) is provided with several module grooves for the adsorption modules (44) to be inserted one by one. The clamping mechanism is used to clamp the adsorption module (44). The displacement mechanism (42) is connected to the clamping mechanism and is used to drive the clamping mechanism to move to transport the adsorption module (44) between the module groove and the glue-coating device (601).

11. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 10, characterized in that, It also includes a module cleaning mechanism (45); The replacement fixture (41) is equipped with a modular jig and a jig driver; The module fixture is used to fix the adsorption module (44); The fixture driver is connected to the modular fixture and is used to drive the modular fixture to rotate horizontally; The replacement displacement mechanism (42) is also used to drive the clamping mechanism to move to transport the adsorption module (44) between the module fixture and the glue-coating device (601), or to transport the adsorption module (44) between the module groove and the module fixture. The module cleaning mechanism (45) is located on one side of the replacement seat (41) and is used to clean the adsorption module (44) located on the module fixture.

12. The fully automated spin coater for scientific research compatible with multiple photolithography technologies and multiple sample sizes as described in claim 11, characterized in that, The module cleaning mechanism (45) includes a main body (451), a first unwinder (452), a first rewinder (453), and a belt pressing mechanism; The first unwinder (452) is mounted on the main body of the mechanism (451) and is used to release the first cleaning belt (455). The first winding device (453) is mounted on the main body of the mechanism (451) and located on one side of the first unwinder (452) for winding the first cleaning belt (455). The pressing mechanism includes a pressing element (454) and a pressing driver; The pressure band member (454) has a first pressure band portion (4541) and a second pressure band portion (4542). The first cleaning tape (455) passes around the first pressing part (4541) and the second pressing part (4542); The pressure belt driver is mounted on the main body (451) of the mechanism and connected to the pressure belt member (454). It is used to drive the pressure belt member (454) to move closer to or away from the module fixture, so that the first pressure belt part (4541) presses a portion of the first cleaning belt (455) around it against the top surface of the adsorption module (44) and / or the second pressure belt part (4542) presses another portion of the first cleaning belt (455) around it against the side of the adsorption module (44).

13. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, The coating device (601) includes a device body (51), a device cover (52), and a cover opening and closing driver (53). The top of the device body (51) is provided with a uniform adhesive cavity; The center of the gelation chamber is provided with an installation station for the adsorption module (44); The switch cover driver (53) is connected to the device cover (52) and is used to drive the device cover (52) to close or open the glue-coating cavity.

14. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 13, characterized in that, The coating device (601) further includes a first spraying mechanism (54) and a second spraying mechanism (55). The spraying end of the first spraying mechanism (54) extends into the uniform adhesive cavity and is positioned upwards, for spraying cleaning liquid onto the back of the second sample; The first transfer device (101) can also grab a cleaning cloth and wipe and clean the inner wall surface of the glue-coating cavity and the inner wall surface of the device cover (52); The spraying end of the second spraying mechanism (55) extends into the device cover (52) and is positioned downwards, for spraying cleaning liquid onto the edge of the second sample in the homogenizing chamber.

15. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 14, characterized in that, The second spraying mechanism (55) includes a spray pipe (552) and a spray driver (551); The spray pipe (552) is rotatably mounted on the device cover (52), and one end extends into the device cover (52); One end of the spray pipe (552) is connected to a spray head (553); The end of the spray head (553) is located on one side of the central axis of the spray pipe (552); The spray driver (551) is mounted on the device cover (52) and connected to the spray pipe (552) to drive the spray pipe (552) to rotate.

16. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, It also includes a sample cleaning device (800); The sample cleaning device (800) is used to clean the first sample.

17. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 16, characterized in that, The sample cleaning device (800) includes a second unwinder (61), a first guide frame (62), a second guide frame (63), and a traction mechanism (64). The second unwinder (61) has a second cleaning belt (65) wound on it; The traction mechanism (64) is used to pull and release the second cleaning belt (65) on the second unwinder (61); The first guide frame (62) and the second guide frame (63) are sequentially disposed between the second unwinder (61) and the traction mechanism (64); The second cleaning belt (65) passes around the first guide frame (62) and the second guide frame (63); The second guide frame (63) is set at a higher height than the first guide frame (62), so that the second cleaning belt (65) forms a first cleaning section (652) between the first guide frame (62) and the second guide frame (63) at a certain angle or vertically. The second guide frame (63) has a horizontal support surface (631) on top. The width of the horizontal support surface (631) is smaller than the width of the first sample; The traction mechanism (64) is set at a height lower than the second guide frame (63) so that the second cleaning belt (65) forms a second cleaning section (651) that fits the horizontal support surface (631) on the horizontal support surface (631). The first transfer device (101) is also capable of grasping the first sample and making the side of the first sample contact the first cleaning section (652); The first transfer device (101) is also capable of gripping the first sample and bringing the back side of the first sample into contact with the second cleaning section (651).

18. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 17, characterized in that, It also includes a spray station (66); The spray station (66) is located below the first guide frame (62) and is used to spray cleaning liquid onto the section of the second cleaning belt (65) that passes through the first guide frame (62).

19. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 17, characterized in that, It also includes a shearing mechanism (67) and a recycling bin (68); The shearing mechanism (67) is located on one side of the discharge end of the traction mechanism (64) and is used to shear the released second cleaning belt (65). The recycling bin (68) is used to recycle the waste from the cleaning belt used by the shearing mechanism (67).

20. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 17, characterized in that, It also includes the changing table (69); The switching platform (69) is provided with a switching adsorption hole (691) for adsorbing the first sample.

21. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, The second plate-shifting device (102) includes a second multi-axis robotic arm (13) and a second plate-shifting actuator (14); The end of the second multi-axis robotic arm (13) is connected to the second plate-shifting actuator (14) to drive the second plate-shifting actuator (14) to move; The second piece-shifting actuator (14) is used to pick up the second sample or the intermediate transfer device (32).

22. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, It also includes the main body of the machine (900); The main body of the machine (900) is provided with a working cavity; The first slide carrier (201), the second slide carrier (202), the liquid carrier (301), the first slide transfer device (101), the second slide transfer device (102), the liquid transfer device (302), the baking device (700), the spin coating device (601), the adsorption replacement device (602), the transfer device (400), and the pretreatment device (500); The second piece-shifting device (102) is located directly below the first piece-shifting device (101); The first slide carrier (201), the second slide carrier (202), the liquid carrier (301), the baking device (700), the spin coating device (601), the adsorption replacement device (602), the transfer device (400), and the pretreatment device (500) are circumferentially distributed around the second slide transfer device (102).

23. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 22, characterized in that, A fan filter unit (902) is installed on the top of the main body (900) of the machine, which is connected to the working chamber.

24. The fully automated spin coater for scientific research compatible with multiple lithography technologies and multiple sample sizes as described in claim 1, characterized in that, It also includes a control device (1000); The control device (1000) is electrically connected to the first slide carrier (201), the second slide carrier (202), the liquid carrier (301), the first slide transfer device (101), the second slide transfer device (102), the liquid transfer device (302), the baking device (700), the gelling device (601), the adsorption replacement device (602), the transfer device (400), and the pretreatment device (500).

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