Light beam processing device and optical system
By using a beam processing device containing bent or twisted pipes in the optical system for decoherence processing, the performance limitations caused by absorption and scattering of the optical system in the prior art are solved, and efficient light energy utilization and system performance improvement are achieved.
Patent Information
- Application Number
- CN202410027323.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-04
- Publication Date
- 2025-07-04
AI Technical Summary
When existing optical systems use diffusion sheets or random phase sheets for decoherence processing, they will lead to absorption and scattering of incident light waves, affecting system performance and light energy utilization.
A beam processing device is adopted, which comprises a waveguide structure and N pipes arranged thereon, wherein some of the pipes are bent or twisted, and decoherent processing is achieved through multiple reflections to reduce absorption and scattering.
It improves the light energy utilization rate, reduces stray light, improves the performance and applicability of the optical system, and avoids performance limitations caused by diffusion sheets or random phase sheets.
Smart Images

Figure CN120255067A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of optical technologies, and in particular, to a beam processing device and an optical system. Background Art
[0002] With the continuous evolution of optical technologies, the wavelength band of the incident light wave used in an optical system is continuously reduced, and can even reach the X-ray band. However, in application scenarios of short wavelength bands such as X-rays, the spatial coherence of the incident light wave will cause interference fringes and speckles to be generated when it propagates in the optical system, resulting in very poor image quality of the system or even making it unusable. Therefore, how to perform decoherence processing on the incident light wave by an optical system has become one of the current research hotspots.
[0003] The prior art performs phase randomization on the incident light wave by setting optical devices such as a diffusion sheet and a random phase sheet on the propagation path of the incident light wave in the optical system to achieve the purpose of decoherence. However, while these optical devices perform decoherence processing, they will have a strong absorption and scattering effect on the incident light wave, thereby affecting the performance of the optical system. Summary of the Invention
[0004] To solve the above problems, this application provides a beam processing device and an optical system, which can reduce or avoid the absorption and scattering of the incident light wave during the decoherence process.
[0005] In a first aspect, a beam processing device provided by this application. The beam processing device includes a waveguide structure and N pipes arranged on the waveguide structure. The incident ends and the exit ends of the N pipes are respectively communicated with the incident end and the exit end of the waveguide structure, and the N pipes include M bent or twisted pipes. Wherein, N is greater than or equal to 2, and M is greater than or equal to 1. Any one of the M bent or twisted pipes is used to make the light be reflected multiple times and then exit.
[0006] In the above implementation, the beam processing device includes a waveguide structure and N pipes arranged on the waveguide structure, and M of the N pipes are bent or twisted pipes. During actual operation, the beam processing device can perform decoherence processing on the incident light of the waveguide structure through the N pipes. Since the N pipes will not cause a strong absorption or scattering effect on the incident light, the light energy utilization rate of the beam processing device can be high, and a large amount of stray light will not be generated, and its applicability and practicality are relatively strong. Further, applying the beam processing device to an optical system can effectively solve the problem that the performance of the existing optical system is limited due to using optical devices such as a diffusion sheet or a random phase sheet for beam decoherence, and can effectively improve the performance and applicability of the optical system.
[0007] In a feasible implementation manner in combination with the first aspect, a total reflection coating is plated on the inner wall of each of the N pipes.
[0008] In the above implementation, plating a total reflection coating on the inner wall of each pipe can further reduce the absorption and scattering effects of the N pipes on incident light, thereby further improving the light energy utilization rate of the beam processing device and reducing the stray light generated by it.
[0009] In a feasible implementation manner in combination with the first aspect, at least two of the N pipes have different diameters.
[0010] In the above implementation, ensuring that at least two of the N pipes have different diameters can improve the phase alienation effect of the N pipes, and further improve the decoherence performance of the beam processing device.
[0011] In a feasible implementation manner in combination with the first aspect, a total reflection coating is plated on the end face of the incident end of the waveguide structure.
[0012] In the above implementation, plating a total reflection coating on the end face of the incident end of the waveguide structure can increase the radiation damage threshold of the waveguide structure, and further improve the decoherence performance of the beam processing device.
[0013] In the above implementation, plating a total reflection coating on the end face of the first end of the waveguide structure can increase the radiation damage threshold of the waveguide structure, and further improve the decoherence performance of the beam processing device.
[0014] In a feasible implementation manner in combination with the first aspect, the degree of bending or twisting of each of the M bent or twisted pipes is different.
[0015] In the above implementation, designing the degree of bending or twisting of each of the M bent or twisted pipes included in the waveguide structure to be different can further improve the phase alienation effect of the N pipes, and further improve the decoherence performance of the beam processing device.
[0016] In combination with the first aspect, the N pipes are diverging in the direction extending from the incident end into the interior of the waveguide structure; or, the N pipes are parallel to each other in the direction extending from the incident end into the interior of the waveguide structure. Or, the N pipes are diverging in the direction extending from the interior of the waveguide structure to the exit end. Or, the N pipes are parallel to each other in the direction extending from the interior of the waveguide structure to the exit end. Or, the N pipes intersect at a point in the direction extending from the interior of the waveguide structure to the exit end.
[0017] In a feasible implementation manner in combination with the first aspect, the incident end and the exit end of the waveguide structure are arranged opposite to each other.
[0018] In combination with the first aspect, in a feasible implementation, the beam processing device further includes a beam splitting component and an absorption cell. The output end of the beam splitting component is disposed opposite to the absorption cell and the waveguide structure respectively. The beam splitting component is configured to separate light within a preset wavelength range; the beam splitting component is further configured to incident light within the preset wavelength range into the N pipelines. The beam splitting component is further configured to incident light not within the preset wavelength range into the absorption cell. The absorption cell is configured to absorb light not within the preset wavelength range.
[0019] In combination with the first aspect, in a feasible implementation, the beam processing device further includes a first driving device, the first driving device is drivingly connected to the waveguide structure, and the first driving device is configured to drive the waveguide structure to vibrate or rotate.
[0020] In the above implementation, by driving the waveguide structure to vibrate or rotate through the first driving device, the phase aliasing effect of the N pipelines can be further improved, thereby improving the decoherence performance of the beam processing device.
[0021] In combination with the first aspect, in a feasible implementation, the waveguide structure is presented as a bent structure. The output end and the input end of the waveguide structure are respectively located at both ends of the bent structure. The N pipelines are configured to cause light within a preset wavelength range to undergo multiple reflections, and the waveguide structure is configured to allow light not within the preset wavelength range to pass through.
[0022] In the above implementation, the waveguide structure is a bent structure. While performing decoherence through the N pipelines, it can also separate light within the preset wavelength range and light not within the preset wavelength range through its bent portion. This can avoid the need to additionally introduce corresponding beam splitting devices due to the need to separate light within the preset wavelength range in the beam processing device, thereby reducing the structural complexity and implementation cost of the beam processing device.
[0023] In combination with the first aspect, in a feasible implementation, the beam processing device further includes an absorption cell, and the absorption cell is configured to absorb light not within the preset wavelength range.
[0024] In combination with the first aspect, in a feasible implementation, the beam processing device further includes a first driving device, the first driving device is drivingly connected to the waveguide structure, and the first driving device is configured to drive the waveguide structure to vibrate.
[0025] In the above implementation, by driving the waveguide structure to vibrate through the first driving device, the phase aliasing effect of the N pipelines can be further improved, thereby improving the decoherence performance of the beam processing device.
[0026] In combination with the first aspect, in a feasible implementation, the beam processing device further includes a light homogenizing component, which is disposed opposite to the output end of the waveguide structure, and the light homogenizing component is configured to perform light homogenizing processing on the light emitted from the output end of the waveguide structure.
[0027] In combination with the first aspect, in a feasible implementation, the light homogenizing component is an array of mirrors, and the beam processing device further includes a micro-array of mirrors corresponding to the array of mirrors.
[0028] In combination with the first aspect, in a feasible implementation, the beam processing device further includes a limiter, and the output ends of the N pipes are distributed around the outer peripheral surface of the limiter, and the limiter is configured to adjust the distribution position of the output ends of the N pipes at the output end of the waveguide structure.
[0029] In the above implementation, a limiter capable of adjusting the distribution position of the output ends of the N pipes at the output end of the waveguide structure is designed in the waveguide structure. In this way, the beam processing device can, through the waveguide and this limiter, perform light homogenizing processing and illumination mode adjustment on the incident light wave of the waveguide structure while performing decoherence processing, thereby avoiding the problem of high structural complexity caused by the beam processing device additionally introducing other functional devices for light homogenizing processing and illumination mode adjustment. By using the limiter, the quality of the output beam of the beam processing device can be relatively high, and the structural complexity is low, which can improve the applicability and practicality of the beam processing device.
[0030] In combination with the first aspect, in a feasible implementation, the beam processing device includes at least two decoherence components and a second driving device. Any one of the at least two decoherence components includes the waveguide structure, N pipes disposed on the waveguide structure, and the limiter, and the limiters included in each of the at least two decoherence components are different. The second driving device is respectively drivingly connected to the at least two decoherence components, and the second driving device is configured to switch the positions of the at least two decoherence components.
[0031] In the above implementation, at least two decoherence components with different included limiters and a second driving device are provided in the beam processing device. In this way, the beam processing device can flexibly interchange the spatial positions of any two of the at least two decoherence components through the second driving device, so that the illumination mode of the light wave obtained by the beam processing device can be flexibly adjusted. This can further improve the functional flexibility and applicability of the beam processing device.
[0032] In combination with the first aspect, in a feasible implementation, the light emitted from the output ends of the N waveguides converges at the focal point. The beam processing device further includes a spot detection device located at the focal point, and the spot detection device is used to detect the optical power of the light emitted from the output ends of the N waveguides.
[0033] In a second aspect, an embodiment of the present application provides a light source system. The light source system includes a light source and a beam processing device provided as described in the foregoing first aspect or any optional implementation manner in the first aspect. The light source is used to provide incident light for the beam processing device.
[0034] In a third aspect, an embodiment of the present application provides an optical system. The optical system includes the light source system as described in the foregoing second aspect, an object plane, a projection system, and an imaging plane. The light source system is used to provide radiation light, and the radiation light is incident on the object plane, the projection system, and the imaging plane in sequence to image the object plane onto the imaging plane.
[0035] In combination with the third aspect, in an optional implementation manner, the optical system further includes a relay mirror, and the relay mirror is used to receive the radiation light and forward the radiation light to the object plane.
[0036] The solutions provided in the foregoing second and third aspects are used to implement or cooperate with the beam processing device provided in the first aspect, so the same or corresponding beneficial effects can be achieved as those in the first aspect, and details are not described herein again.
[0037] In summary, by using the beam processing device provided in the embodiment of the present application, absorption and scattering of the incident light wave during the decoherence process can be reduced or avoided. BRIEF DESCRIPTION OF THE DRAWINGS
[0038] Figure 1 is a schematic structural diagram of a beam processing device provided by the present application;
[0039] Figure 2 is a schematic diagram of one end face of a waveguide structure provided by the present application;
[0040] Figure 3 is a schematic diagram of another end face of a waveguide structure provided by the present application;
[0041] Figure 4 is a schematic structural diagram of a waveguide structure provided by the present application;
[0042] Figure 5 is a schematic structural diagram of another waveguide structure provided by the present application;
[0043] Figure 6 is a schematic structural diagram of another waveguide structure provided by the present application;
[0044] Figure 7 It is another schematic structural diagram of the waveguide structure provided by this application;
[0045] Figure 8 It is another schematic structural diagram of the waveguide structure provided by this application;
[0046] Figure 9 It is another schematic structural diagram of the waveguide structure provided by this application;
[0047] Figure 10 It is another schematic structural diagram of a beam processing device provided by this application;
[0048] Figure 11 It is another schematic structural diagram of a beam processing device provided by this application;
[0049] Figure 12 It is another schematic structural diagram of a beam processing device provided by this application;
[0050] Figure 13 It is another schematic structural diagram of a beam processing device provided by this application;
[0051] Figure 14 It is another schematic structural diagram of a beam processing device provided by this application;
[0052] Figure 15 It is another schematic structural diagram of a beam processing device provided by this application;
[0053] Figure 16 It is another schematic structural diagram of a beam processing device provided by this application;
[0054] Figure 17 It is another schematic structural diagram of a beam processing device provided by this application;
[0055] Figure 18 It is another schematic structural diagram of a beam processing device provided by this application;
[0056] Figure 19 It is another schematic structural diagram of a beam processing device provided by this application;
[0057] Figure 20 It is another schematic end view of the waveguide structure provided by this application;
[0058] Figure 21 It is a schematic diagram of the types of limiters provided by this application;
[0059] Figure 22 It is another schematic structural diagram of a beam processing device provided by this application;
[0060] Figure 23It is a schematic diagram of the position switching of the decoherence component provided by this application;
[0061] Figure 24 It is another schematic diagram of the structure of a beam processing device provided by this application;
[0062] Figure 25 It is a schematic diagram of the structure of a light source system provided by this application;
[0063] Figure 26 It is a schematic diagram of the structure of an optical system provided by this application. Detailed implementation manners
[0064] Next, the technical solutions in the embodiments of this application will be clearly and completely described in conjunction with the accompanying drawings provided in the embodiments of this application.
[0065] In the prior art, optical devices such as diffuser plates and random phase plates are used to randomize the phase of the incident light wave of the optical system to achieve the purpose of decoherence. However, these optical devices will have a strong absorption and scattering effect on the incident light wave while performing the decoherence process, thus affecting the performance of the optical system.
[0066] Therefore, the technical problem to be solved by this application is: how to reduce or avoid the absorption and scattering of the incident light wave during the decoherence process, so as to reduce or eliminate the stray light generated during the decoherence process and improve the light energy utilization rate of the incident light wave.
[0067] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "horizontal", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.
[0068] To solve the above technical problems, the present application provides a beam processing device, which can be applied to an optical system for processing operations such as decoherence of incident light waves. The beam processing device includes a waveguide structure and N pipes provided on the waveguide structure, and these N pipes include M bent or twisted pipes. During actual operation, any one of the M bent or twisted pipes can cause the light conducted therein to be reflected multiple times and then emitted. Based on this, a phase difference is generated between the light waves incident on the N pipes from the incident end of the waveguide structure and emitted from each of the N pipes, so that the decoherence processing of the incident light waves can be achieved through the N pipes. Since the N pipes do not have a strong absorption or scattering effect on the incident light beam, the light energy utilization rate is high and less stray light is generated when performing decoherence processing through the N pipes. Therefore, by adopting the beam processing device provided by the present application in an optical system, the problem of limited performance caused by using optical devices such as diffuser sheets or random phase plates for beam decoherence in the existing optical system can be effectively solved, and the performance and applicability of the optical system can be effectively improved.
[0069] The following will combine Figures 1 to 25 to describe in detail the structure and working principle of a beam processing device provided by the present application.
[0070] Please refer to Figure 1 , Figure 1 which is a schematic structural diagram of a beam processing device provided by the present application. It should be understood that Figure 1 shows a sectional view of the waveguide structure 11. As Figure 1 shown, the beam processing device 100 may include a waveguide structure 11 and N pipes provided on the waveguide structure 11. Among them, N is a positive integer greater than or equal to 2. The incident ends of the N pipes are connected to the incident end 111 of the waveguide structure 11, and the exit ends of the N pipes are connected to the exit end 112 of the waveguide structure 11. Or rather, the end faces of the incident ends of each of the N pipes are distributed on the end face of the incident end 111 of the waveguide structure 11, and the end faces of the exit ends of each of the N pipes are distributed on the end face of the exit end 112 of the waveguide structure 11. Taking the end face of the incident end 111 of the waveguide structure 11 as an example, please refer to Figure 2 , Figure 2 which is a schematic end face diagram of the waveguide structure provided by the present application. It should be understood that Figure 2 shows a front view of the end face of the incident end 111. As Figure 2 shown, on the end face of the incident end 111, the end faces of the incident ends of each of the N pipes are distributed, and the end faces of the incident ends of each pipe are in the same plane as the end face of the incident end 111. It should be understood that in actual implementation, the shapes of the end faces of the incident end 111 and the exit end 112 may be as Figure 2The shown circle can also be other shapes, such as an ellipse, a square, etc., which can be specifically determined according to actual design requirements, and this application does not limit this.
[0071] Among the above N pipes, there are M bent or twisted pipes. Wherein, M is a positive integer greater than or equal to 1. For the convenience of description, in the embodiments of this application, the bent or twisted pipes are referred to as the first pipes, and the straight pipes are referred to as the second pipes. That is, among the above N pipes, there are M first pipes and N - M second pipes. It should be noted that in the embodiments of this application, the bending of the pipe refers to the change in the extending direction of the pipe on a certain two-dimensional plane. The twisting of the pipe refers to the change in the extending direction of the pipe in three-dimensional space.
[0072] In actual work, the waveguide structure 11 is used to receive the light wave (hereinafter referred to as the first light wave for the convenience of distinction) provided by the light beam processing device 100 through the incident end 111. It should be understood that the first light wave can be emitted by other optical devices included in the light beam processing device 100 to the waveguide structure 11, or can be directly incident on the waveguide structure 11 from the outside of the light beam processing device 100, and this application does not specifically limit this. After reaching the incident end 111, the first light wave will be decomposed into N first sub-light waves by the incident ends of the N pipes. Each of these N first sub-light waves will enter one of the first pipes or the second pipes among the above N pipes and travel towards the output ends of the N pipes. Particularly, among these N first sub-light waves, the M first sub-light waves propagating in the above M first pipes will undergo multiple reflections in these M pipes. The above N first sub-light waves form N second sub-light waves after propagating in the above N pipes and are respectively emitted at the output ends of the above N pipes. During this process, because there are M first pipes among the N pipes, there will be a certain optical path difference between the M first sub-light waves emitted from these M first pipes and the N - M second sub-light waves emitted from the remaining N - M second pipes, thereby making the spatial coherence of these N second sub-light waves lower than that of the above N first sub-light waves, that is, decoherence is achieved. It should be understood that in actual implementation, due to the optical characteristics of the light wave, the above N second sub-light waves will gradually synthesize into the same light wave (hereinafter assumed to be the third light wave) during subsequent propagation. Therefore, it can be understood that the waveguide structure 11 (or N pipes) receives the first light wave and emits the third light wave, and the spatial coherence of the third light wave is lower than that of the first light wave.
[0073] It should be noted here that the more the first pipelines included in the N pipelines, and the higher the degree of bending or twisting difference of each first pipeline, the better the decoherence performance of these N pipelines. For example, in the case of N = M (that is, in the case where the above N pipelines are all bent or twisted pipelines), assume that the spatial coherence of the first light wave is γ1. Through multiple experiments, it can be obtained that the spatial coherence γ2 of the N second sub-light waves can be reduced to Specifically, when N = M = 50000, the spatial coherence γ2 of the N second sub-light waves can be equal to 0.45% * γ1, and when N = M = 110000, the spatial coherence γ2 of the N second sub-light waves can be equal to 0.32% * γ1.
[0074] It should also be noted here that in the embodiments of the present application, the number N of pipelines, the number M of the first pipelines, and the degree of bending or twisting of each first pipeline can be determined according to the actual design requirements of the beam processing device 100, and the present application does not limit this.
[0075] In the above implementation, the beam processing device 100 includes a waveguide structure 11 and N pipelines disposed on the waveguide structure 11, and M of the N pipelines are bent or twisted first pipelines. During actual operation, these N pipelines can be used to perform decoherence processing on the incident first light wave of the waveguide structure 11. Since these N pipelines will not cause a strong absorption or scattering effect on the first light wave, the light energy utilization rate of the beam processing device 100 can be high, and a large amount of stray light will not be generated, and its applicability and practicability are relatively strong. Further, applying the beam processing device 100 to an optical system can effectively solve the problem of performance limitation caused by using optical devices such as diffuser sheets or random phase plates for beam decoherence in existing optical systems, and can effectively improve the performance and applicability of the optical system.
[0076] In some feasible implementation manners, a total reflection coating (hereinafter referred to as total reflection coating L1 for convenience of distinction) is plated on the inner wall of each of the above N pipelines. For example, please refer to Figure 3 , Figure 3 is a schematic diagram of another end face of the waveguide structure provided by the present application. Among them, Figure 3 in (a) is a front view of the end face of the incident end 111, Figure 3 in (b) is a side view of the end face of the incident end 111. As shown in Figure 3 (a), taking the pipeline 101 in the N pipelines as an example, a layer of total reflection coating L1 is plated on the inner wall of the pipeline 101. Optionally, the thickness of the total reflection coating L1 is equal to or greater than 5 nm, and the surface roughness of the total reflection coating L1 is less than or equal to 1 nm. As shown in Figure 3As shown in (a) therein, the thickness d1 of the total reflection coating L1 plated on the inner wall of the pipeline 101 is less than or equal to 5 nm, and its surface roughness is less than or equal to 1 nm.
[0077] In the above implementation, plating the total reflection coating L1 on the inner walls of the pipelines can further reduce the absorption and scattering effects of the N pipelines on the first light wave, thereby further improving the light energy utilization rate of the beam processing device 100 and reducing the stray light generated by it.
[0078] In some feasible implementation manners, at least two of the N pipelines have different diameters. Exemplarily, as Figure 3 shown in (a) therein, the diameters of the pipeline 101 and the pipeline 102 among the N pipelines are different, and the diameter of the pipeline 102 is smaller than that of the pipeline 101. It should be understood that in Figure 3 in (a) therein, the diameter of the end face of the incident end of each pipeline can be used to represent the diameter of each pipeline. The greater the difference in the diameters between the pipelines among the above N pipelines, the better the decoherence performance of the beam processing device 100. Optionally, the diameters of the pipelines among the above N pipelines are all less than or equal to 50 mm. Preferably, the diameters of the pipelines among the above N pipelines are all different.
[0079] In the above implementation, ensuring that at least two of the N pipelines have different diameters can improve the phase alienation effect of the N pipelines, thereby improving the decoherence performance of the beam processing device 100.
[0080] In some feasible implementation manners, the end face of the incident end 111 of the waveguide structure 11 is plated with a total reflection coating (for the convenience of distinction, it will be described as the total reflection coating L2 hereinafter). Optionally, the thickness of the total reflection coating L2 is equal to or greater than 5 nm. Exemplarily, as Figure 3 shown in (b) therein, the total reflection coating L2 is plated on the end face of the incident end 111, and the thickness d2 of the total reflection coating L2 is equal to or greater than 5 nm.
[0081] It should be added that in an optional specific implementation, the above waveguide structure 11 provided with N pipelines can be formed by integrally drawing N prefabricated hollow waveguides and fusing them together after cooling. That is to say, there may be no gap between the N pipelines and they cannot move relative to each other. In this case, as Figure 3As shown in (a) of , the end face of the incident end 111 includes some non-pipe regions in addition to the end faces of the incident ends of the respective pipes, and the total reflection coating L2 described above is actually plated on these non-pipe regions. In another alternative specific implementation, the waveguide structure 11 may also be formed by fixing N mutually independent hollow waveguides through limiting structures such as a housing and cable ties. In this case, the respective pipes exist independently of each other. The total reflection coating L2 described above is plated on the port surfaces of the incident ends of the respective pipes. It should be understood that the waveguide structure 11 may also be fabricated in other ways, and the present application places no restrictions thereon.
[0082] In the above implementation, plating the total reflection coating L2 on the end face of the incident end 111 of the waveguide structure 11 can improve the radiation damage threshold of the waveguide structure 11, thereby enhancing the decoherence performance of the beam processing device 100.
[0083] In some feasible implementation manners, the materials of the total reflection coating L1 and the total reflection coating L2 include, but are not limited to, materials such as ruthenium (Ru), rhodium (Rh), platinum (Pt), etc., and the present application places no specific restrictions thereon. The material of the waveguide structure 11 includes, but is not limited to, quartz, borosilicate glass, etc., and the present application places no specific restrictions thereon.
[0084] In some feasible implementation manners, the first light wave may be incident on the waveguide structure 11 in a manner perpendicular to or nearly perpendicular to the end face of the incident end 111, so that the above-mentioned N first sub-light waves can be incident obliquely with respect to the inner walls of the respective pipes, which can further reduce the absorption and scattering effects of the waveguide structure 11 on the first light wave.
[0085] In some feasible implementation manners, the degrees of bending of the respective first pipes in the above-mentioned M bent first pipes are different. For example, please refer to Figure 4 . Figure 4 is a schematic structural diagram of a waveguide structure provided by the present application. Figure 4 In (a) of is an analysis diagram of the waveguide structure, Figure 4 in (b) of is another analysis diagram of the waveguide structure. As shown in Figure 4As shown in (a) therein, taking the first waveguide with 6 bends among N waveguides as an example, the 6 bends of the first waveguide are the first waveguide 1, the first waveguide 2, the first waveguide 3, the first waveguide 4, the first waveguide 5, and the first waveguide 6 respectively. The variation modes of the extending directions of these 6 first waveguides on the cross-section of the waveguide structure 11 are all different, so the bending degrees of these 6 first waveguides are also different. It should be understood that since the bending degrees of these 6 first waveguides are different, the numbers of reflections of the 6 first sub-light waves propagating in these 6 first waveguides are different, so the 6 second sub-light waves emitted from these 6 first waveguides have different optical path differences, and there are also certain differences in their phases. Or, the twisting degrees of the first waveguides in the above-mentioned M twisted first waveguides are different. As Figure 4 As shown in (b) therein, taking the first waveguide with 4 twists among N waveguides as an example, the 4 twisted first waveguides are the first waveguide 1, the first waveguide 2, the first waveguide 3, and the first waveguide 4 respectively. The variation modes of the extending directions of these 4 first waveguides in the internal space of the waveguide structure 11 are all different, so the twisting degrees of these 4 first waveguides are also different. It should be understood that since the twisting degrees of these 4 first waveguides are different, the numbers of reflections of the 4 first sub-light waves propagating in these 4 first waveguides are different, so the 4 second sub-light waves emitted from these 4 first waveguides have different optical path differences, and there are also certain differences in their phases.
[0086] It should also be noted here that in the case where the N waveguides include M bent first waveguides, the bending states of the first waveguides in these M bent first waveguides can all be the same, or some can be the same and some can be different, and this application does not limit this. Similarly, in the case where the N waveguides include M twisted first waveguides, the twisting states of the first waveguides in these M twisted first waveguides can all be the same, or some can be the same and some can be different, and this application does not limit this.
[0087] In the above implementation, the bending degrees or twisting degrees of the first waveguides in the M bent or twisted first waveguides included in the waveguide structure 11 are all designed to be different, so as to further improve the phase alienation effect of the N waveguides, and thus improve the decoherence performance of the beam processing device 100.
[0088] In some feasible implementation manners, please refer to Figure 5 , Figure 5 which is another schematic structural diagram of the waveguide structure provided by this application. As Figure 5As shown, the extending direction of each of the above-mentioned N pipes from the incident end 111 of the waveguide structure 11 into its interior is divergent. In other words, the first light wave incident from the incident end 111 of the waveguide structure 11 will be split into N first sub-light waves by the N pipes, and these N first sub-light waves travel into the interior of the waveguide structure 11 in a divergent manner. In other words, the incident end 111 of the waveguide structure 11 has the ability to diverge the light beam. Preferably, the divergence angle between the extending directions of each of the N pipes from the incident end 111 of the waveguide structure 11 into its interior is greater than 45 degrees.
[0089] Or, please refer to Figure 6 , Figure 6 which is another schematic structural diagram of the waveguide structure provided by this application. As Figure 6 shown, the extending directions of each of the above-mentioned N pipes from the incident end 111 of the waveguide structure 11 into its interior are parallel to each other. In other words, the first light wave incident from the incident end 111 of the waveguide structure 111 will be split into N first sub-light waves by the N pipes, and the traveling directions of these N first sub-light waves into the interior of the waveguide structure 11 are parallel to each other. In other words, the incident end 111 of the waveguide structure 11 has the ability to make the light beam parallel.
[0090] In some feasible implementation manners, please refer to Figure 7 , Figure 7 which is another schematic structural diagram of the waveguide structure provided by this application. As Figure 7 shown, the extending direction of each of the above-mentioned N pipes from the interior of the waveguide structure 11 to its output end 112 is divergent. In other words, the N first sub-light waves split by the N pipes travel from the interior of the waveguide structure 11 to its output end 112 in a divergent manner. In other words, the output end 112 of the waveguide structure 11 has the ability to diverge the light beam. Preferably, the divergence angle between the extending directions of each of the N pipes from the interior of the waveguide structure 11 to its output end 112 is less than 45 degrees.
[0091] Or, please refer to Figure 8 , Figure 8 which is another schematic structural diagram of the waveguide structure provided by this application. As Figure 8 shown, the extending directions of each of the above-mentioned N pipes from the interior of the waveguide structure 11 to its output end 112 are parallel to each other. In other words, the traveling directions of the N first sub-light waves split by the N pipes from the interior of the waveguide structure 11 to its output end 112 are parallel to each other. In other words, the output end 112 of the waveguide structure 11 has the ability to make the light beam parallel.
[0092] Or, please refer to Figure 9 , Figure 9 which is another schematic structural diagram of the waveguide structure provided by this application. As Figure 9As shown, each of the N ducts included in the waveguide structure 11 converges in the direction extending from the inside of the waveguide structure 11 towards its output end 112. That is to say, the N first sub-light waves split by the N ducts travel in a converging manner from the inside of the waveguide structure 11 towards its output end 112. That is to say, the output end 112 of the waveguide structure 11 has the ability to converge light beams. It should be understood that in this structure, the N second sub-light waves emitted from the N ducts will converge at a point, which can be called the focal point F. Preferably, the diameter of the focal point F should be greater than or equal to 0.1 mm.
[0093] In some feasible implementation manners, please continue to refer to Figure 4 , such as Figure 4 As shown, the input end 111 and the output end 112 of the waveguide structure 11 are oppositely arranged. It can also be understood that the waveguide structure 11 is a straight waveguide with parallel end faces at both ends. It should be understood that in actual implementation, the cross-section of the waveguide structure 11 can be a regular shape such as a circle or a square, or other irregular shapes, and the present application does not make specific limitations on this.
[0094] In some feasible implementation manners, in the scenario where the input end 111 and the output end 112 of the waveguide structure 11 are oppositely arranged, please refer to Figure 10 , Figure 10 which is another schematic structural diagram of a light beam processing device provided by the present application. As Figure 10 shown, the light beam processing device 100 may further include a beam splitting component 12 and an absorption cell 13. Among them, the output ends of the beam splitting component 12 are respectively oppositely arranged with the absorption cell 13 and the waveguide structure 11. Specifically, as Figure 10 shown, the beam splitting component 12 includes at least two output ends and one input end, which are the output end 121, the output end 122 and the input end 123 respectively. The output end 121 is oppositely arranged with the waveguide structure 11 and is close to the input end 111 of the waveguide structure 11. The output end 122 is oppositely arranged with the absorption cell 13. Optionally, the distance between the output end 121 and the output end 122 is equal to or greater than a preset distance.
[0095] In actual work, the beam splitting component 12 is used to separate light within a preset wavelength range from the light waves it receives, and direct the light within the preset wavelength range obtained by the separation onto N channels on the waveguide structure 11. The beam splitting component 12 is also used to direct the light that is not within the preset wavelength range obtained by the separation onto the absorption cell 13. Or rather, the beam splitting component 12 is used to separate the light within the preset wavelength range and the light not within the preset wavelength range contained in the second light wave received through its incident end 123, direct the light within the preset wavelength range as the first light wave described above into the above-mentioned N channels, and emit the light not within the preset wavelength range to the absorption cell 13. The absorption cell 13 is mainly used to absorb the light not within the preset wavelength range.
[0096] In some feasible implementation manners, in the scenario where the incident end 111 and the output end 112 of the waveguide structure 11 are oppositely arranged, please refer to Figure 11 , Figure 11 which is another structural schematic diagram of a beam processing device provided by this application. As Figure 11 shown, the beam processing device 100 may further include a radiation isolation wall 14. Among them, a through hole 141 is provided between the first surface 142 and the second surface 143 of the radiation isolation wall 14 that face away from each other. One end of the through hole 141 is located on the first surface 142, and the other end is located on the second surface 143. It should be understood that the side space where the first surface 142 is located is the first side of the radiation isolation wall 14, and the side space where the second surface 143 is located is the second side of the radiation isolation wall 14. The beam splitting component 12 is arranged on the first side of the radiation isolation wall 14, and the waveguide structure 11 is arranged on the second side of the radiation isolation wall 14. The incident end 111 of the waveguide structure 11 is arranged opposite to the through hole 141, and the through hole 141 is also arranged opposite to the output end 121 of the beam splitting component 12. The absorption cell 13 is arranged on the first side of the radiation isolation wall 14 and is located on the first surface 142.
[0097] In actual work, on the one hand, the radiation isolation wall 14 can be used to conduct the first light wave output by the beam splitting component 12 to the above-mentioned N channels through the through hole 141, and on the other hand, it can be used in combination with the absorption cell 13 to block the propagation of the light not within the preset wavelength range from the first side of the radiation isolation wall 14 to the second side of the radiation isolation wall 14. It should be understood that most of the light energy of the light not within the preset wavelength range will be absorbed by the absorption cell 13, and the small part of the light energy that escapes due to scattering or refraction will only propagate on the first side of the radiation isolation wall 14 due to the isolation effect of the radiation isolation wall 14. Therefore, the radiation isolation wall 14 and the absorption cell 13 in combination can block the propagation of the light not within the preset wavelength range from the first side of the radiation isolation wall 14 to the second side of the radiation isolation wall 14.
[0098] In some feasible implementation manners, please refer to Figure 12 , Figure 12This is another schematic structural diagram of a beam processing device provided by the present application. As Figure 12 described, the beam splitting component 12 can be composed of a first lens 124 and a second lens 125. Among them, the second lens 125 is disposed opposite to the incident end 111 of the waveguide structure 11, and the first lens 124 is disposed below the second lens 125 and opposite to the absorption cell 13.
[0099] In actual operation, the first lens 124 is used as the incident end 123 of the beam splitting component 12 to receive the second light wave, and separates the light within a preset wavelength range and the light outside the preset wavelength range in the second light wave. Specifically, the first lens 124 can reflect or refract the light within the preset range in the second light wave towards the second lens 125, and it can also transmit the light outside the preset wavelength range in the second light wave towards the absorption cell 13 as the exit end 122 of the beam splitting component 12. The second lens 125 serves as the exit end 121 of the beam splitting component, and is used to emit the light within the preset range as the first light wave to the N channels on the waveguide structure 11. It should be understood that in actual implementation, the first lens 124 can adopt a material with a high refractive index or reflectivity for the light within the preset wavelength range and a high transmittance for the light outside the preset wavelength range, and the second lens 125 can adopt a material with a high reflectivity or refractive index and a low transmittance for the light wave within the preset wavelength range.
[0100] Optionally, in actual applications, the first light wave described above can also be referred to as the required radiation, and the light outside the wavelength range described above can also be referred to as bremsstrahlung.
[0101] In some feasible implementation manners, please refer to Figure 13 , Figure 13 This is another schematic structural diagram of the beam processing device provided by the present application. As Figure 13 shown, the beam processing device 100 further includes a first driving device 15, and the first driving device 15 is drivingly connected to the waveguide structure 11. The first driving device 15 is used to drive the waveguide structure 11 to vibrate or rotate. It should be understood that when the first driving device 15 drives the waveguide structure 11 to rotate, the incident light direction and the outgoing light direction of the N channels should be kept unchanged. Preferably, the first driving device 15 is used to drive the waveguide structure 11 to rotate around its axis.
[0102] In the above implementation, by driving the waveguide structure 11 to vibrate or rotate through the first driving device 15, the phase aliasing effect of the N channels can be further improved, and thus the decoherence performance of the beam processing device 100 can be improved.
[0103] Further, please continue to refer to Figure 13 , as Figure 13As shown, the first driving device 15 may include a connecting component 151 and an actuating component 152. The waveguide structure 11 is drivingly connected through the connecting component 151 and the actuating component 152. In actual operation, the actuating component 152 can be used to drive the waveguide structure 11 to vibrate through the connecting component 151. For example, the actuating component 152 can be a vibration motor, and the connecting component 151 can be a bridge arm connected between the vibration motor and the body of the waveguide structure 11. When the body of the vibration motor starts to vibrate, the body of the waveguide structure 11 can be driven to vibrate through this bridge arm. In this case, the vibration amplitude of the waveguide structure 11 should not be too large, and its vibration amplitude should be less than or equal to a preset vibration amplitude. Here, the preset vibration amplitude is specifically the maximum vibration amplitude obtained through multiple vibration experiments on the waveguide structure 11 that can ensure the decoherence performance of the beam processing device 100. Alternatively, the actuating component 152 can be used to drive the waveguide structure 11 to rotate through the connecting component 151. For example, the actuating component 152 can be a stepper motor, and the connecting component 151 can be a hinge, which is connected to the stepper motor and the body of the waveguide structure 11 through gears respectively. When the stepper motor starts to rotate, the waveguide structure 11 can be driven to rotate through the gears and the hinge.
[0104] In some feasible implementation manners, please refer to Figure 14 , Figure 14 which is another schematic structural diagram of the beam processing device provided by this application. As Figure 14As shown, the above waveguide structure 11 presents a bent structure. Or rather, the waveguide structure 11 is a bent waveguide. The output end 112 and the input end 111 of the waveguide structure 11 are respectively located at both ends of this bent structure. Specifically, one end of the bent structure serves as the input end 111 of the waveguide structure 11, and the other end serves as the output end 112 of the waveguide structure 11. The above N pipes exist on this bent structure, and each of the N pipes is a bent or twisted pipe. In actual operation, the waveguide structure 11 is used to receive a second light wave containing light within a preset wavelength range and light outside the preset wavelength range through the input end 111. The N pipes on the waveguide structure 11 are used to cause the light within the preset wavelength range to be reflected multiple times. Specifically, these N pipes are used to decompose the light within the preset wavelength range in the second light wave into N first sub-light waves, perform multiple reflections on the N first sub-light waves to obtain N second sub-light waves, and output the N second sub-light waves from the output end 112. The waveguide structure 11 is also used to allow the light outside the preset wavelength range to pass through. Or rather, the waveguide structure 11 can allow the light outside the preset wavelength range to pass through and continue to propagate in the traveling direction of the second light wave. It should be understood here that since the waveguide structure 11 presents a bent structure, in the bent portion of the waveguide structure 11, the light within the preset wavelength range will continue to conduct along the N pipes towards the output end 112 (in the form of N first sub-light waves), while the light outside the preset wavelength range will continue to propagate forward in the original traveling direction of the second light wave. In this way, the separation of the light within the preset wavelength range can be achieved, so that the N second sub-light waves after decoherence can be output at the output end 112 of the waveguide structure 11, and the light outside the wavelength range will be output at its bent portion.
[0105] It should be noted here that Figure 14 The shown waveguide structure 11 has two bent portions. In actual implementation, the waveguide structure 11 can have only one bent portion, or can have 3 or more bent portions. The number of bent portions of the waveguide structure 11 can be determined according to actual application requirements, and this application does not make specific limitations on this.
[0106] Optionally, in actual implementation, the waveguide structure 11 presenting a bent structure can adopt a material with a high reflectivity to light waves within a preset wavelength range and a high transmittance to light waves outside the preset wavelength range.
[0107] In the above implementation, the waveguide structure 11 is a bent structure. While performing decoherence through the N pipes, it can also achieve the separation of the light within the preset wavelength range and the light outside the preset wavelength range through its bent portion. In this way, it can be avoided that the beam processing device 100 additionally introduces corresponding beam splitting devices due to the need for separating the light within the preset wavelength range, and thus the structural complexity and implementation cost of the beam processing device 100 can be reduced.
[0108] In some feasible implementation manners, please refer to Figure 15 , Figure 15 which is another schematic structural diagram of a beam processing device provided by the present application. As Figure 15 shown, when the waveguide structure 11 presents a bent structure, the beam processing device 100 may further include an absorption cell 13. Wherein, the absorption cell 13 is disposed opposite to the position where the waveguide structure 11 emits light not within a preset wavelength range. The absorption cell 13 is mainly used for absorbing the light emitted by the waveguide structure 11 that is not within the preset wavelength range.
[0109] Furthermore, please continue to refer to Figure 15 , as Figure 15 shown, the beam processing device 100 may further include a radiation isolation wall 14. A through hole 141 is provided between a first surface 142 and a second surface 143 of the radiation isolation wall 14 that face away from each other. One end of the through hole 141 is located on the first surface 142, and the other end is located on the second surface 143. It should be understood that the side space where the first surface 142 is located is the first side of the radiation isolation wall 14, and the side space where the second surface 143 is located is the second side of the radiation isolation wall 14. The waveguide structure 11 is located on the first side of the radiation isolation wall 14, and the through hole 141 is located in the emission direction of the emission end 112 of the waveguide structure 11, or rather, the emission end 112 of the waveguide structure 11 faces the through hole 141. In actual implementation, the emission end 112 of the waveguide structure 11 may also pass through the through hole 141 and be located on the second side of the radiation isolation wall 14, or the emission end 112 of the waveguide structure 11 is also located inside the through hole 141, and the present application does not make specific limitations thereto. The absorption cell 13 may be disposed on the first side of the radiation isolation wall 14 and located on the first surface 142. Generally, the through hole 141 should be away from the absorption cell 13.
[0110] In actual work, on the one hand, the radiation isolation wall 14 can conduct N second sub-light waves emitted by the waveguide structure 11 through the through hole 141, and on the other hand, it can cooperate with the absorption cell 13 to block the light not within the preset wavelength range from propagating from the first side of the radiation isolation wall 14 to the second side of the radiation isolation wall 14. It should be understood that most of the light energy of the light not within the preset wavelength range will be absorbed by the absorption cell 13, and the small part of the light energy dissipated due to scattering or refraction will only propagate on the first side of the radiation isolation wall 14 due to the isolation effect of the radiation isolation wall 14. Therefore, the combination of the radiation isolation wall 14 and the absorption cell 13 can block the light not within the preset wavelength range from propagating from the first side of the radiation isolation wall 14 to the second side of the radiation isolation wall 14.
[0111] In some feasible implementation manners, please refer to Figure 16 , Figure 16 which is another schematic structural diagram of a beam processing device provided by the present application. As Figure 16As shown, when the waveguide structure 11 presents a bent structure, the beam processing device 100 may include a first driving device 15, and the first driving device 15 is drivingly connected to the body of the waveguide structure 11. In actual operation, the first driving device 15 is used to drive the waveguide structure 11 to vibrate.
[0112] In the above implementation, when the waveguide structure 11 presents a bent structure, driving the waveguide structure 11 to vibrate through the first driving device 15 can further improve the effect of phase randomization of N channels, and thus further improve the decoherence performance of the beam processing device 100.
[0113] Further, please continue to refer to Figure 16 , such as Figure 16 As shown, the first driving device 15 may include a connecting component 151 and an actuating component 152. The waveguide structure 11 is drivingly connected to the actuating component 152 through the connecting component 151. In actual operation, the actuating component 152 can be used to drive the waveguide structure 11 to vibrate through the connecting component 151. For example, the actuating component 152 can be a vibration motor, and the connecting component 151 can be a bridge arm connected between the vibration motor and the body of the waveguide structure 11. When the body of the vibration motor starts to vibrate, the body of the waveguide structure 11 can be driven to vibrate through this bridge arm. In this case, the vibration amplitude of the waveguide structure 11 should not be too large, and its vibration amplitude should be less than or equal to a preset vibration amplitude. Here, the preset vibration amplitude is specifically the maximum vibration amplitude obtained through multiple vibration experiments on the waveguide structure 11 that can ensure the decoherence performance of the beam processing device 100.
[0114] In some feasible implementation manners, on the basis that the beam processing device 100 adopts the structure shown in any one of Figures 1 to 16 , please refer to Figure 17 , Figure 17 FIG. is another schematic structural diagram of a beam processing device provided by the present application. As shown in Figure 17As shown, the beam processing device 100 may further include a light homogenizing component 16. The light homogenizing component 16 is disposed opposite to the output end of the waveguide structure 11. During actual operation, the light homogenizing component 16 is used to perform light homogenization on the light emitted from the output end of the waveguide structure 11 and output the light after the light homogenization process. It should be noted here that due to the characteristics of light waves, the N second sub-light waves at the output end of the waveguide structure 11 will be further combined into the same beam of light, and this beam of light is the light emitted from the output end of the waveguide structure 11. For the convenience of distinction, the following will use the third light wave to represent it. In the embodiments of the present application, light homogenization can also be referred to as beam homogenization, that is, adjusting the light intensity distribution of a light wave with an uneven light intensity distribution to obtain a light beam with a uniform light intensity distribution. For example, assuming that the light intensity of the third light wave emitted by the waveguide structure 11 is Gaussian distributed, the light homogenizing component 16 can be used to adjust the light intensity distribution of the third light wave so that the light intensity distribution of the third light wave satisfies a uniform distribution, thereby outputting the light after light homogenization with a uniform light intensity distribution.
[0115] In some feasible implementation manners, please refer to Figure 18 , Figure 18 which is another schematic structural diagram of a beam processing device provided by the present application. As shown in Figure 18 , the above-mentioned light homogenizing component 16 may specifically be an array mirror 161, and the beam processing device 100 further includes a microarray mirror 17 corresponding to the array mirror 161. It should be noted that the array mirror 161 is a lens array composed of a plurality of tiny and independent optical lenses (which can also be referred to as light homogenizing units), and the tilt angle of each optical lens is controllable. When the third light wave is incident on the array mirror 161, the array mirror 161 can control the tilt angles of these optical lenses to achieve the light homogenization function of the third light wave and output the light after light homogenization to the microarray mirror 17.
[0116] It should be understood that the array mirror 161 is only a specific implementation manner of the light homogenizing component 16, and the light homogenizing component 16 provided by the present application may also adopt other possible implementation manners, and the present application does not make specific limitations on the implementation manners of the light homogenizing component 16.
[0117] Furthermore, the microarray mirror 17 is also a lens array composed of multiple tiny and independent optical lenses (which can also be called uniform light array units). The tilting angle of each optical lens is controllable, and the tilting angles of the respective optical lenses included in the microarray mirror 17 are associated with the illumination pattern of the outgoing light wave of the microarray mirror 17. In the embodiment of the present application, the illumination pattern of the light wave is determined by the shape of the light spot formed by the light wave and the irradiation angle of the light wave. In practical applications, the illumination pattern usually includes monopole illumination, annular illumination, secondary illumination, quadrilateral illumination, etc. In the initialization stage of the microarray mirror 17, the tilting angles of the respective optical lenses included therein can be adjusted according to the preset illumination pattern of the microarray mirror 17, so that the illumination pattern of the outgoing light wave thereof is the preset illumination pattern. When the uniform light emitted from the array mirror 161 is incident on the microarray mirror 17, the microarray mirror 17 can adjust the illumination pattern of the uniform light through these optical lenses with different tilting angles, and then output light with a preset illumination pattern.
[0118] It should be supplemented here that when the beam processing device 100 includes both the array mirror 161 and the microarray mirror 17, preferably, the array mirror 161 and the microarray mirror 17 can form a Köhler illumination system to output the light of the above first illumination pattern. Here, the Köhler illumination system has advantages such as good uniform light effect, mature processing technology, easy control, and easy implementation of off-axis illumination.
[0119] In some feasible implementation manners, on the basis that the beam processing device 100 adopts Figures 1 to 16 the structure shown in any one of Figure 19 , Figure 19 Please refer to Figure 19 which is another schematic structural diagram of a beam processing device provided by the present application. As shown in
[0120] The limiter 18 is disposed at the output end 112 of the waveguide structure 11, and the output ends of the N pipes on the waveguide structure 11 are distributed around the outer peripheral surface of the limiter 18. It should be understood that the end faces of the input ends of the respective pipes among the N pipes on the waveguide structure 11 are distributed on the end face of the input end 111 of the waveguide structure 11, and the end faces of the output ends of the respective pipes among these N pipes and the surface of the limiter 18 facing the outside of the waveguide structure 11 (for the convenience of distinction, the outer surface of the limiter 18 will be used for description hereinafter) are distributed on the end face of the output end 112 of the waveguide structure 11. For example, please refer to Figure 20 , Figure 20 which is another end face schematic diagram of the waveguide structure provided by the present application. Among them, Figure 20 the (a) in Figure 20In (b), it is a front view of the end face of the outgoing end 112. As Figure 20 shown in (a) therein, on the end face of the incident end 111, the end faces of the incident ends of each of the N pipes are distributed, or rather, the end face of the incident end 111 includes the N end faces corresponding to the incident ends of each of the N pipes. As Figure 20 shown in (b) therein, on the end face of the outgoing end 112, the N end faces corresponding to the outgoing ends of each of the N pipes and the outer surface of the position limiter 18 are distributed, or rather, the end face of the outgoing end 112 includes the N end faces corresponding to the outgoing ends of each of the N pipes and the outer surface of the position limiter 18.
[0121] The position limiter 18 is mainly used to adjust the distribution positions of the outgoing ends of the N pipes at the outgoing end of the waveguide structure 11. Specifically, on the one hand, the position limiter 18 is used to adjust the distribution positions of the outgoing ends of the N pipes at the outgoing end 112 of the waveguide structure 11 so that the distribution positions of the outgoing ends of the N pipes on the end face of the outgoing end 112 are different from the distribution positions of the incident ends of the N pipes on the end face of the incident end 11 of the waveguide structure 11. For example, please also refer to Figure 20 As Figure 20 shown in (a) and (b) therein, taking the pipes 1, 2, 3, 4, 5, 6, and 7 included in the above N pipes as an example. On the end face of the incident end 111, the end faces of the incident ends of these 7 pipes are mainly distributed in the central part of the end face of the incident end 111. Due to the existence of the position limiter 18, on the end face of the outgoing end 112, the end faces of the outgoing ends of these 7 pipes are no longer concentrated in its central part, but are distributed dispersedly on the end face of the outgoing end 112. On the other hand, the position limiter 18 can also adjust the distribution positions of the outgoing ends of the N pipes at the outgoing end 112 of the waveguide structure 11 to adjust the shape of the light spot formed by the third light wave (obtained by combining N second sub-light waves) emitted from the outgoing end 112 of the waveguide structure 11 and the irradiation angle of the third light wave.
[0122] Therefore, in actual work, the waveguide structure 11 can also be used to perform uniform light processing and illumination mode adjustment on the incident first light wave through these N pipes and the limiter 18, so as to output a third light wave that has undergone decoherence processing, uniform light processing, and illumination mode adjustment. Among them, the illumination mode of the third light wave is the illumination mode corresponding to the limiter 18 (for the convenience of distinction, the first illumination mode will be used to describe it hereinafter). Specifically, since the limiter 18 can make the distribution positions of the output ends of these N pipes on the end face of the output end 112 different from the distribution positions of the input ends of these N pipes on the end face of the input end 111 of the waveguide structure 11, therefore, at the output end 112 of the waveguide structure 11, the light intensity distribution of the N second sub-light waves in space is different from the light intensity part of the above N first sub-light waves in space at the input end 111 of the waveguide structure 11, so that uniform light processing of the first light wave can be realized. Exemplarily, as Figure 20 shown, assuming that the light intensity distribution of the first light wave satisfies a Gaussian distribution, then at the input end 111, the light intensity of the first sub-light wave propagating in the pipe 7 is the largest, and the light intensities of the first sub-light waves transmitted in the pipes 1, 2, 3, 4, 5, and 6 are weaker, and the light intensities of the first sub-light waves transmitted in other pipes near the edge are even weaker. At the output end 112, due to the presence of the limiter 18, the distribution positions of the pipes 1, 2, 3, 4, 5, 6, and 7 are disrupted, which can cause changes in the distribution of the second sub-light waves emitted from each pipe at the output end 112. Therefore, the light intensity distribution of the third light wave synthesized by these second sub-light waves no longer satisfies the Gaussian distribution but becomes more uniform, thus realizing uniform light processing. In addition, due to the presence of the limiter 18, the shape and outgoing angle of the light spot generated by the third light wave emitted from the output end 112 of the waveguide structure 11 are changed, so that its illumination mode can be adjusted to the first illumination mode corresponding to the limiter 18.
[0123] In the above implementation, the beam processing device 100 further includes a limiter 18 that can be used to adjust the distribution positions of the output ends of the N pipes at the output end of the waveguide structure 11. By combining the waveguide structure 11 with this limiter 18, uniform light processing and illumination mode adjustment can be performed on the incident light wave of the waveguide structure 11 while performing decoherence processing, which can avoid the problem of high structural complexity caused by the beam processing device 100 additionally introducing other functional devices for uniform light processing and illumination mode adjustment. By using the limiter 18, the quality of the output beam of the beam processing device 100 can be relatively high, and the structural complexity is low, which can improve the applicability and practicality of the beam processing device 100.
[0124] In some feasible implementations, there may be multiple types of stoppers 18, and different types of stoppers 18 occupy different areas on the end face of the output end 112 of the waveguide structure 11. Here, since the shapes of the outer surfaces of different types of stoppers 18 are different, the areas occupied by different types of stoppers 18 on the end face of the output end 112 are also different. In this way, the output ends of the above-mentioned N pipes can be distributed at different positions on the end face of the output end 112, so that the shape and output angle of the light spot generated by the third light wave emitted from the output end 112 are different. Therefore, different types of stoppers 18 correspond to different illumination modes. It can also be said that the use of different types of stoppers 18 can make the illumination mode of the output light of the waveguide structure 11 different. For example, see Figure 21 , Figure 21 Schematic diagram of the types of limiters provided in this application. Figure 21 (a) is an end face view of the emission end 112 , which illustrates the first type of limiter 18 . Figure 21 (b) is another end view of the emission end 112, which illustrates the second type of stopper 18. Figure 21 As shown in (a) of FIG. 1 , the outer surface of the first type of stopper 18 is circular, and it occupies a circular area on the end surface of the emission end 112, and its corresponding illumination mode can be a ring illumination mode. If the first type of stopper 18 is set on the waveguide structure 11, the first illumination mode mentioned above can be a ring illumination mode. Figure 21 As shown in (b), the outer surface of the second type of stopper 18 is an irregular pattern, which divides the end surface of the output end 112 into four independent areas, and the corresponding illumination mode can be a four-level illumination mode. If the second type of stopper 18 is in the waveguide structure 11, the above-mentioned first illumination mode can be a four-level illumination mode. It should be understood that Figure 21 The types of the limiter 18 are described only as examples. In real implementation, the limiter 18 may also include other types. The present application does not impose any specific restrictions on the types of the limiter 18.
[0125] In the above implementation, the limiters 18 are of different types, and different types of limiters 18 correspond to different lighting modes. Using different types of limiters 18 can enable the light beam processing device 100 to adjust different lighting modes, thereby improving the functional flexibility of the light beam processing device 100.
[0126] For some possible implementations, see Figure 22 , Figure 22 is another structural schematic diagram of a light beam processing device provided by the present application. Figure 22 As shown, the beam processing device 100 includes at least two decoherence components and a second driving device 19. It should be understood thatFigure 22 It is shown in the figure that the beam processing device 100 includes two dephasing components, namely the dephasing component 201 and the dephasing component 202. Among them, any one of the at least two dephasing components includes the waveguide structure 11 described above, N pipelines arranged on the waveguide structure 11, and the stopper 18. And the stoppers 18 included in each of the at least two dephasing components are different (or rather, the types of the included stoppers 18 are different). For example, the dephasing component 201 includes the waveguide structure 11, N pipelines, and the stopper 181, and the dephasing component 202 includes the waveguide structure 11, N pipelines, and the stopper 182. It should also be noted here that each of the at least two dephasing components may also include different waveguide structures, and the number of pipelines on these different waveguide structures may also be different. In the embodiments of the present application, as long as the types of the stoppers corresponding to each dephasing component in the at least two dephasing components are different, there is no requirement for whether there are differences in other structures included in each dephasing component.
[0127] The second driving device 19 is respectively drivingly connected to the at least two dephasing components. The second driving device 19 is mainly used to switch the positions of the at least two dephasing components, or rather, the second driving device 19 is mainly used to interchange the spatial positions of any two of the at least two dephasing components. Through the second driving device 19, the beam processing device 100 can flexibly adjust the illumination mode of the light wave processed by it.
[0128] Since the functions of the second driving device 19 for each of the at least two dephasing components are similar, the function of the second driving device 19 will be further described below by taking the dephasing component 201 and the dephasing component 202 as examples.
[0129] Here, it is assumed that the stopper 181 in the phase removal component 201 corresponds to the first illumination mode, and the stopper 182 in the phase removal component 202 corresponds to the second illumination mode. In actual work, the second driving device 19 can be used to exchange the spatial positions of the phase removal component 201 and the phase removal component 202 according to the received switching instruction, so that the first light wave changes from the original waveguide structure 11 incident on the phase removal component 201 to the waveguide structure 11 incident on the phase removal component 202. That is to say, after receiving the switching instruction, the second driving device 19 can move the phase removal component 202 to the position where the phase removal component 201 is located (that is, realize the spatial position exchange of the phase removal component 201 and the phase removal component 202), so that the phase removal component 202 can be located in the forward direction of the first light wave, so that the incident end of the waveguide structure 11 in the phase removal component 202 can receive the first light wave. Further, after the position exchange is completed, the phase removal component 202 can be used to perform decoherence processing, light homogenization processing, and illumination mode adjustment on the first light wave through N1 pipelines and the stopper 182, and emit a fourth light wave with the illumination mode being the above-mentioned second illumination mode. Simply put, the second driving device 19 can be used to exchange the positions of the phase removal component 201 and the phase removal component 202 using different types of stoppers according to the corresponding switching instruction, so that the beam processing device 100 can obtain light waves with different illumination modes. Here, the switching instruction can be input to the second driving device 19 by the user in real time, or can be preset by the second driving device 19, and the present application does not limit this.
[0130] For example, please refer to Figure 23 , Figure 23 is a schematic diagram of the position switching of the phase removal component provided by the present application. As Figure 23 shown, the second driving device 19 can specifically be a turntable with a controllable rotation angle, and the phase removal component 201 and the phase removal component 202 can be fixed on the turntable around the axis of the turntable. Here, it is assumed that the first illumination mode corresponding to the stopper 181 is the annular illumination mode described above, and the second illumination mode corresponding to the stopper 182 is the four-level illumination mode described above. During actual work, when the second driving device 19 receives the switching instruction, it can control the turntable to rotate a predetermined angle, so that the positions of the phase removal component 201 and the phase removal component 202 are exchanged with each other, so that the phase removal component 202 can replace the phase removal component 201 to work, so that the illumination mode of the light wave obtained by the beam processing device 100 changes from the original annular illumination mode to the four-level illumination mode. It should be understood that the description of the specific structure and working mode of the second driving device 19 here is only exemplary. In actual implementation, the second driving device 19 can also adopt other feasible structures, and the present application does not limit this.
[0131] In the above implementation, at least two dephasing components with different limiters and a second driving device 19 are provided in the beam processing device 100, so that the beam processing device 100 can flexibly interchange the spatial positions of any two of the at least two dephasing components through the second driving device 19, thereby enabling the beam processing device 100 to flexibly adjust the illumination mode of the light wave. This can further improve the functional flexibility and applicability of the beam processing device 100.
[0132] In some feasible implementation manners, please refer to Figure 24 , Figure 24 which is another structural schematic diagram of a beam processing device provided by the present application. As Figure 24 shown, the light emitted from the output ends of N pipes (i.e., the above-mentioned N second sub-light waves) converges at the focal point F. The beam processing device 100 further includes a spot detection device 21, and the spot detection device 21 is located at the focal point F. In actual work, the spot detection device 21 is used to detect the optical power of the light emitted from the output ends of the N pipes. Or rather, the spot detection device 21 is used to detect the optical power of the third light wave formed by combining the N second sub-light waves emitted from the above-mentioned N pipes. At the same time, the spot detection device 21 is also used to detect whether the focal point F where the light emitted from the output ends of the N pipes converges is at a predetermined position. The result detected by the spot detection device 21 is mainly used for the beam processing device 100 to determine whether the light emitted from the waveguide structure 11 meets the design requirements. Optionally, the spot detection device 21 may specifically be an optical device such as a quadrant photodiode.
[0133] The embodiment of the present application also provides a light source system. Please refer to Figure 25 , Figure 25 which is a structural schematic diagram of a light source system provided by the present application. As Figure 25 shown, the light source system 300 includes a light source 310 and the beam processing device 100 as described above. The light source 310 and the beam processing device 100 are disposed opposite to each other.
[0134] In actual work, the light source 310 is used to provide incident light to the beam processing device 100. The beam processing device 100 is used to perform dephasing processing, light homogenization processing, and illumination mode adjustment on the incident light and output the processed light. The structure and function of the beam processing device 100 here can refer to the corresponding description in Embodiment 1 above.
[0135] It should be noted that in actual implementation, the light source 310 can adopt an accelerator light source, such as a free electron laser (FEL) light source, a synchrotron radiation light source (SRLS), etc. It should be understood that an accelerator light source uses an accelerator to accelerate electrons to relativistic speeds, and after passing through an undulator, emits radiation beams tangentially in a wiggler, having a series of advantages such as high brightness, high power, high collimation, clean light source, continuously adjustable wavelength, etc. Therefore, adopting an accelerator light source as the light source 310 can improve the performance of the light source system 300. The light source 310 can also adopt a discharged produced plasmas (DPP) laser light source. Of course, the light source 310 can also adopt other types of light sources, and the present application does not make specific restrictions on this.
[0136] In the above implementation, since the light energy utilization rate of the beam processing device 100 is high and the stray light generated is very little, therefore, adopting the beam processing device 100 in the light source system 300 can make the light source system 300 have a high light energy utilization rate and good quality of the output beam.
[0137] An embodiment of the present application also provides an optical system. Please refer to Figure 26 , Figure 26 is a schematic structural diagram of an optical system provided by the present application. As Figure 26 shown, the optical system 500 may include the aforementioned light source system 300, an object plane 510, a projection system 520, and an imaging plane 530. During actual operation, the light source system 300 is used to provide radiation light, and the radiation light is incident on the object plane 510, the projection system 520, and the imaging plane 530 in sequence, so as to image the object on the object plane 510 onto the imaging plane 530. Specifically, the third beam is incident on and illuminates the object plane 510, and the projection system 520 images the object plane 510 on the imaging plane 530.
[0138] In the above implementation, applying the aforementioned light source system 300 including the beam processing device 100 to the optical system 500 can improve the light energy utilization rate and imaging quality of the optical system 500.
[0139] It should be noted that various different implementation manners provided by the present application can be combined with each other. For example, the expressions based on Figures 5 - 9 for the functions of the incident end 111 and the exit end 112 of the waveguide structure 11 can also be combined with Figure 14 the waveguide structure 11 shown. Another example, Figure 14 the implementation manner of the waveguide structure 11 shown can also be combined with Figure 17The implementation manners of the described beam processing device 100 are combined. It should be understood that these new implementation manners formed by combining various different implementation manners provided in this application should all be included within the protection scope of this application.
[0140] The terms "first", "second", "third", "fourth", etc. in the description, claims and drawings of this application are used to distinguish different objects, rather than to describe a specific order. In addition, the terms "comprise" and "have" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally further includes steps or units not listed, or optionally further includes other steps or units inherent to these processes, methods, products or devices.
[0141] Referring to "embodiment" herein means that a specific feature, structure or characteristic described in connection with the embodiment can be included in at least one embodiment of this application. The phrase appears in various places in the specification and does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment mutually exclusive with other embodiments. Those skilled in the art will explicitly and implicitly understand that the embodiments described herein can be combined with other embodiments.
[0142] The above-described specific implementation manners further elaborate on the purpose, technical solution and beneficial effects of this application. It should be understood that the above is only the specific implementation manner of this application and is not used to limit the protection scope of this application. Any modifications, equivalent replacements, improvements, etc. made on the basis of the technical solution of this application should all be included within the protection scope of this application.
Claims
1. A beam processing device, characterized in that, The beam processing device includes a waveguide structure and N pipes disposed on the waveguide structure. The incident ends and the exit ends of the N pipes are respectively in communication with the incident end and the exit end of the waveguide structure. The N pipes include M bent or twisted pipes, where N is greater than or equal to 2 and M is greater than or equal to 1. Any one of the M bent or twisted pipes is configured to cause light to be reflected multiple times and then exit.
2. The beam processing device according to claim 1, wherein The inner walls of the pipes in the N pipes are coated with a total reflection coating.
3. The beam processing device according to claim 1 or 2, characterized in that, At least two of the N pipes have different diameters.
4. The beam processing device according to any one of claims 1 to 3, characterized in that, The end face of the incident end of the waveguide structure is coated with a total reflection coating.
5. The beam processing device according to any one of claims 1-4, characterized in that, The degree of bending or twisting of each of the M bent or twisted pipes is different.
6. The beam processing device according to any one of claims 1-5, characterized in that, The N pipes are diverging in the direction extending from the incident end into the interior of the waveguide structure; or, the N pipes are parallel to each other in the direction extending from the incident end into the interior of the waveguide structure; or, the N pipes are diverging in the direction extending from the interior of the waveguide structure to the exit end; or, the N pipes are parallel to each other in the direction extending from the interior of the waveguide structure to the exit end; or, the N pipes intersect at a point in the direction extending from the interior of the waveguide structure to the exit end.
7. The beam processing device according to any one of claims 1-6, characterized in that The incident end and the exit end of the waveguide structure are disposed opposite to each other.
8. The beam processing device according to claim 7, characterized in that, The beam processing device further includes a beam splitting component and an absorption cell. The exit end of the beam splitting component is disposed opposite to the absorption cell and the waveguide structure respectively; The beam splitting component is configured to separate light within a preset wavelength range; the beam splitting component is further configured to incident light within the preset wavelength range into the N pipes; the beam splitting component is further configured to incident light not within the preset wavelength range into the absorption cell; The absorption cell is configured to absorb light not within the preset wavelength range.
9. The beam processing device according to claim 7 or 8, characterized in that, The beam processing device further includes a first driving device, which is drivingly connected to the waveguide structure. The first driving device is configured to drive the waveguide structure to vibrate or rotate.
10. The beam processing device according to any one of claims 1-6, characterized in that, The waveguide structure presents as a bent structure. The exit end and the incident end of the waveguide structure are respectively located at both ends of the bent structure. The N pipes are configured to cause light within a preset wavelength range to be reflected multiple times. The waveguide structure is configured to allow light not within the preset wavelength range to pass through.
11. The beam processing device according to claim 10, wherein The beam processing device further includes an absorption cell, which is configured to absorb light not within the preset wavelength range.
12. The beam processing device according to claim 10 or 11, characterized in that, The beam processing device further includes a first driving device, which is drivingly connected to the waveguide structure. The first driving device is configured to drive the waveguide structure to vibrate.
13. The beam processing device according to any one of claims 1-12, characterized in that, The beam processing device further includes a light homogenizing component, which is disposed opposite to the exit end of the waveguide structure. The light homogenizing component is configured to perform light homogenizing processing on the light exiting from the exit end of the waveguide structure.
14. The beam processing device according to claim 13, wherein The light homogenizing component is an array of mirrors. The beam processing device further includes a micro-array of mirrors corresponding to the array of mirrors.
15. The beam processing device according to any one of claims 1-12, characterized in that, The beam processing device further includes a limiter, and the output ends of the N pipes are distributed around the outer peripheral surface of the limiter. The limiter is used to adjust the distribution positions of the output ends of the N pipes at the output end of the waveguide structure.
16. The beam processing device according to claim 15, wherein The beam processing device includes at least two dephasing components and a second driving device. Any one of the at least two dephasing components includes the waveguide structure, N pipes arranged on the waveguide structure, and the limiter. The limiters included in each of the at least two dephasing components are different; The second driving device is respectively drivingly connected to the at least two dephasing components, and the second driving device is used to switch the positions of the at least two dephasing components.
17. The beam processing device according to any one of claims 1-16, characterized in that, The light emitted from the output ends of the N pipes converges at a focal point. The beam processing device further includes a spot detection device located at the focal point. The spot detection device is used to detect the optical power of the light emitted from the output ends of the N pipes.
18. A light source system, characterized in that, The light source system includes a light source and the beam processing device according to any one of the preceding claims 1-17; The light source is used to provide incident light for the beam processing device.
19. An optical system, characterized in that, The optical system includes the light source system according to the preceding claim 18, an object plane, a projection system, and an imaging plane; The light source system is used to provide radiation light, and the radiation light is incident on the object plane, the projection system, and the imaging plane to image the object plane on the imaging plane.