Photosensitive composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound

Abstract

A photosensitive composition comprising: a compound A represented by formula (A); a colorant B that is a compound other than the compound A, has a maximum absorption wavelength in the wavelength range of 400-1000 nm, has a molecular weight of 2000 or less, and has a pi-conjugation plane; a polymerizable compound; a photopolymerization initiator; and a solvent. In formula (A), Por1 represents a structure represented by formula (1), An1 represents a counter anion, s represents an integer of 1 or more, t is an integer of 0 or more and represents a number necessary to neutralize the charge of Por1, and when Por1 is electrically neutral, s is 1 and t is 0. [Por1] s [An1] t (A) # imgabs0 #

Description

Technical Field

[0001] The present invention relates to a photosensitive composition. Further, the present invention relates to a film, a filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module using the photosensitive composition. Further, the present invention relates to a compound fused with an azulene ring. Background Art

[0002] Patent Document 1 discloses an azulenocyanine compound having a specific structure as a novel compound that absorbs light in the near-infrared region. Patent Document 1 describes that the compound can be used as a light absorption dye for a solar cell or the like.

[0003] Prior Art Documents

[0004] Patent Documents

[0005] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2011-116717 Summary of the Invention

[0006] Technical Problem to be Solved by the Invention

[0007] As a result of the inventors' in-depth study of the azulenocyanine compound disclosed in Patent Document 1, it was found that the compound has strong cohesion and easily forms aggregates. Further, it was found that when a photosensitive composition containing the compound is used to form a pattern by photolithography, development residues are likely to be generated between the patterns, and there is room for improvement in lithography.

[0008] Therefore, an object of the present invention is to provide a photosensitive composition having excellent lithography. Further, an object of the present invention is to provide a film, a filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

[0009] Means for Solving the Technical Problem

[0010] The present invention provides the following.

[0011] <1> A photosensitive composition comprising:

[0012] Compound A, represented by formula (A);

[0013] Colorant B, which is a compound other than the above Compound A, has a maximum absorption wavelength in the wavelength range of 400 to 1000 nm, a molecular weight of 2000 or less, and has a π-conjugated plane;

[0014] A polymerizable compound;

[0015] A photopolymerization initiator; and

[0016] A solvent,

[0017] [Por 1 s [An 1 t ...(A)

[0018] In formula (A), Por 1 represents the structure represented by formula (1),

[0019] An 1 represents a counter anion,

[0020] s represents an integer of 1 or more,

[0021] t is an integer of 0 or more and represents the number required to neutralize the charge of Por 1 .

[0022] When Por 1 is electrically neutral, s is 1 and t is 0,

[0023] [Chemical formula 1]

[0024]

[0025] In formula (1), Az 1a ~Az 1c each independently represents a ring represented by formula (2),

[0026] Az 1d represents a ring represented by formula (3),

[0027] X 1a ~X 1d each independently represents a nitrogen atom or CR X1 , and R X1 represents a hydrogen atom or a substituent,

[0028] M 1 represents two hydrogen atoms or a positively charged atom with a valence of 2 or more to which a ligand can coordinate,

[0029] [Chemical formula 2]

[0030]

[0031] In formula (2), R 2 represents a substituent, n2 represents an integer from 0 to 6, and when n2 is 2 or more, adjacent R 2 can bond to each other to form a ring, * represents the connection site to the porphyrin ring, and the connection direction is arbitrary,

[0032] In formula (3), R 3 represents a substituent, n3 represents an integer from 0 to 6, and when n3 is 2 or more, adjacent R​​3 They can be bonded to each other to form a ring. The * indicates the connecting site to the porphyrin ring, and the connecting direction is arbitrary.

[0033] <2>The photosensitive composition according to <1>, wherein

[0034] Por of formula (A) 1 has a structure represented by formula (4) or formula (5),

[0035] [Chemical formula 3]

[0036]

[0037] In formula (4), Az 4a ~Az 4c each independently represents a ring represented by the above formula (2),

[0038] Az 4d represents a ring represented by the above formula (3),

[0039] X 4a ~X 4d each independently represents a nitrogen atom or CR X4 , and R X4 represents a hydrogen atom or a substituent,

[0040] M 4 represents B, Al, Ga, In or Sc,

[0041] Z 4 represents a ligand,

[0042] In formula (5), Az 5a ~Az 5c each independently represents a ring represented by the above formula (2),

[0043] Az 5d represents a ring represented by the above formula (3),

[0044] X 5a ~X 5d each independently represents a nitrogen atom or CR X5 , and R X5 represents a hydrogen atom or a substituent,

[0045] M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn,

[0046] Z 5a and Z 5b each independently represents a ligand.

[0047] <3>The photosensitive composition according to <2>, wherein

[0048] Z of the above formula (4) 4 and Z of the above formula (5) 5a and Z 5b are each independently a ligand represented by formula (6),

[0049] [Chemical formula 4]

[0050]

[0051] In formula (6), R 6a and R 6b each independently represent a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heteroalkoxy group or an aryloxy group. R 6a and R 6b may bond to each other to form a ring. * is a bonding bond with M 4 or M 5 .

[0052] <4>The photosensitive composition according to <2>, wherein

[0053] Z of the above formula (4) 4 and Z of the above formula (5) 5a and Z 5b are each independently a ligand represented by formula (7) or formula (8),

[0054] [Chemical formula 5]

[0055]

[0056] In formula (7), R 7a and R 7b each independently represent a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group or a group represented by formula (10). At least one of R 7a and R 7b is a group represented by formula (10). * is a bonding bond with M 4 or M 5 .

[0057] In formula (8), Y 8 represents -OSO2-, -OCO- or -O-. L 8 represents a single bond or an n8 + 1 valent linking group. Pm 8 represents a polymer chain. n8 represents an integer from 1 to 5. When n8 is from 2 to 5, the plurality of Pm 8 may be the same or different. * is a bonding bond with M 4 or M 5 .

[0058] [Chemical formula 6]

[0059]

[0060] In formula (10), L 10 represents a single bond or an n10+1 valent linking group, and Pm 10 represents a polymer chain. n10 represents an integer from 1 to 5. When n10 is from 2 to 5, multiple Pm 10 may be the same or different, and * is a bonding bond to P of formula (7).

[0061] <5>The photosensitive composition according to <4>, wherein

[0062] the polymer chain represented by Pm of the above formula (8) 8 and the polymer chain represented by Pm of the above formula (10) 10 are polymer chains containing repeating units of at least one structure selected from a polyether structure, a polyester structure, and a poly(meth)acrylic acid structure.

[0063] <6>The photosensitive composition according to <4>, wherein

[0064] the ligand represented by formula (7) is a ligand of a polymer having a structure represented by formula (7-1), a ligand represented by formula (7-2), or a ligand represented by formula (7-3),

[0065] [Chemical formula 7]

[0066]

[0067] In formula (7-1), R 11a represents a hydrogen atom, an alkyl group, or a halogen atom,

[0068] R 11b represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group,

[0069] L 11a represents -CONH-L 11b -, -COO-L 11c -, -CONH-L 11d -O- or -COO-L 11e -O-, and L 11b to L 11e each independently represents a hydrocarbon group or a divalent group formed by connecting a plurality of hydrocarbon groups through -O-, -CO-, -COO-, -OCO-, -CONH-, or -NHCO-,

[0070] * is a bonding bond to M 4 or M 5 and

[0071] In formula (7-2), R 12a represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heteroepoxy group, or an aryloxy group,

[0072] R 12b represents an alkyl group or an aryl group,

[0073] L 12 represents an alkylene group or an arylene group,

[0074] n12 represents 0 or 1,

[0075] m12 represents an integer of 2 or more,

[0076] * is a bonding bond with M 4 or M 5 ;

[0077] In formula (7-3), R 13a and R 13b each independently represent an alkyl group or an aryl group,

[0078] L 13a and L 13b each independently represent an alkylene group or an arylene group,

[0079] n13 and p13 each independently represent 0 or 1,

[0080] m13 and q13 each independently represent an integer of 2 or more,

[0081] * is a bonding bond with M 4 or M 5 ;

[0082] <7>The photosensitive composition according to <1> or <2>, wherein the colorant B contains at least one selected from the group consisting of quinacridone compounds, anthraquinone compounds, perylene compounds, diketopyrrolopyrrole compounds, azo compounds, phthalocyanine compounds, naphthalocyanine compounds, dioxazine compounds, azomethine compounds, quinophthalone compounds, isoindoline compounds, pteridine compounds, triarylmethane compounds, xanthene compounds, indigo compounds, polymethine compounds, bisbenzofuranone compounds, iminium compounds, squaric acid compounds, croconium compounds, and pyrrolopyrrole compounds.

[0083] <8>The photosensitive composition according to <1> or <2>, which further contains a resin having a cyclic structure in the main chain.

[0084] <9>The photosensitive composition according to <1> or <2>, wherein

[0085] the polymerizable compound includes a polymerizable compound having a urethane bond.

[0086] <10>The photosensitive composition according to <1> or <2> further contains an antioxidant having at least 1 phosphorus atom in the molecule.

[0087] <11>A film obtained by using the photosensitive composition according to <1> or <2>.

[0088] <12>A filter containing the film according to <11>.

[0089] <13>The filter according to <12> is an infrared cut-off filter or an infrared transmission filter.

[0090] <14>A solid-state imaging device containing the film according to <11>.

[0091] <15>An image display device containing the film according to <11>.

[0092] <16>An infrared sensor containing the film according to <11>.

[0093] <17>A camera module containing the film according to <11>.

[0094] <18>A compound represented by formula (A1),

[0095] [Por 2 s [An 2 t ...(A1)

[0096] In formula (A1), Por 2 represents a structure represented by formula (4a) or formula (5a),

[0097] An 2 represents a counter anion,

[0098] s represents an integer of 1 or more,

[0099] t is an integer of 0 or more and represents the number required to neutralize the charge of Por 2 .

[0100] When Por 2 is electrically neutral, s is 1 and t is 0,

[0101] [Chemical formula 8]

[0102]

[0103] In formula (4a), Az 4a ~Az 4c each independently represents a ring represented by formula (2), Az 4d ​​represents a ring represented by formula (3),

[0104] X 4a ~X 4d each independently represents a nitrogen atom or CR X4 , R X4 represents a hydrogen atom or a substituent,

[0105] M 4 represents B, Al, Ga, In or Sc,

[0106] Z 4 represents a ligand represented by formula (7) or formula (8),

[0107] In formula (5a), Az 5a ~Az 5c each independently represents a ring represented by formula (2), and Az 5d represents a ring represented by formula (3),

[0108] X 5a ~X 5d each independently represents a nitrogen atom or CR X5 , R X5 represents a hydrogen atom or a substituent,

[0109] M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn,

[0110] Z 5a and Z 5b each independently represents a ligand represented by formula (7) or formula (8),

[0111] [Chemical formula 9]

[0112]

[0113] In formula (2), R 2 represents a substituent, n2 represents an integer from 0 to 6, and when n2 is 2 or more, adjacent R 2 can bond to each other to form a ring, * represents the connection site to the porphyrin ring, and the connection direction is arbitrary,

[0114] In formula (3), R 3 represents a substituent, n3 represents an integer from 0 to 6, and when n3 is 2 or more, adjacent R 3 can bond to each other to form a ring, * represents the connection site to the porphyrin ring, and the connection direction is arbitrary.

[0115] [Chemical formula 10]

[0116]

[0117] In formula (7), R 7a and R 7b each independently represent a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (10), and at least one of R 7a and R 7b is a group represented by formula (10), and * is a bonding bond with M 4 or M 5 .

[0118] In formula (8), Y 8 represents -OSO2-, -OCO-, or -O-, L 8 represents a single bond or an n8 + 1 valent linking group, Pm 8 represents a polymer chain, n8 represents an integer from 1 to 5, and when n8 is from 2 to 5, multiple Pm 8 may be the same or different, and * is a bonding bond with M 4 or M 5 .

[0119] [Chemical formula 11]

[0120]

[0121] In formula (10), L 10 represents a single bond or an n10 + 1 valent linking group, Pm 10 represents a polymer chain, n10 represents an integer from 1 to 5, and when n10 is from 2 to 5, multiple Pm 10 may be the same or different, and * is a bonding bond with P of formula (7).

[0122] Advantages of the Invention

[0123] According to the present invention, a photosensitive composition with excellent lithography performance can be provided. Moreover, the present invention can provide a film, a filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound. Brief Description of the Drawings

[0124] Figure 1 is a schematic diagram showing an embodiment of an infrared sensor. Detailed Description of the Invention

[0125] Hereinafter, the content of the present invention will be described in detail.

[0126] In this specification, "~" is used to mean including the values described before and after it as the lower limit value and the upper limit value.

[0127] In the notations of groups (atomic groups) in this specification, those without notations of substituted and unsubstituted include groups (atomic groups) without substituents as well as groups (atomic groups) with substituents. For example, "alkyl" includes not only alkyl without substituents (unsubstituted alkyl) but also alkyl with substituents (substituted alkyl).

[0128] In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. And as the light used in exposure, there can be cited actinic rays or radiation such as the bright line spectrum of a mercury lamp, far ultraviolet rays typified by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and electron beams.

[0129] In this specification, "(meth)acrylate" means both or either of acrylate and methacrylate, "(meth)acrylic acid" means both or either of acrylic acid and methacrylic acid, and "(meth)acryloyl" means both or either of acryloyl and methacryloyl.

[0130] In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene conversion values measured by gel permeation chromatography (GPC).

[0131] In this specification, in chemical formulas, Me represents methyl, Et represents ethyl, Bu represents butyl, and Ph represents phenyl.

[0132] In this specification, infrared rays mean light (electromagnetic waves) with a wavelength of 700 to 2500 nm.

[0133] In this specification, the total solid content refers to the total mass of the components obtained by removing the solvent from all the components of the composition.

[0134] In this specification, the term "process" includes not only independent processes but also, even in cases where it cannot be clearly distinguished from other processes, as long as the expected function of the process is achieved, it is also included in this term.

[0135] <Photosensitive composition>

[0136] The photosensitive composition of the present invention contains:

[0137] Compound A, represented by formula (A);

[0138] Colorant B, which is a compound other than the above Compound A, has a maximum absorption wavelength in the range of 400 to 1000 nm, a molecular weight of 2000 or less, and has a π-conjugated plane;

[0139] Polymerizable compound;

[0140] A photopolymerization initiator; and

[0141] a solvent.

[0142] According to the present invention, a photosensitive composition excellent in lithography and suppressing the generation of residues between patterns can be provided. The reason for obtaining such an effect can be presumed as follows. The photosensitive composition of the present invention contains the above compound A in addition to the above colorant B. It is presumed that since the colorant B is a compound having a π-conjugated plane, it easily interacts with the compound A, and the aggregation of the compound A can be suppressed by the colorant B. Therefore, it is presumed that when the photosensitive composition is used to form a pattern by lithography, the generation of development residues between patterns can be suppressed.

[0143] The photosensitive composition of the present invention can be used as a photosensitive composition for a filter. As the types of filters, an infrared cut-off filter, an infrared transmission filter, etc. can be mentioned.

[0144] Hereinafter, each component used in the photosensitive composition of the present invention will be described.

[0145] 《Compound A》

[0146] The photosensitive composition of the present invention contains a compound A represented by the formula (A).

[0147] [Por 1 s [An 1 t ...(A)

[0148] In the formula (A), Por 1 represents a structure represented by the formula (1),

[0149] An 1 represents a counter anion,

[0150] s represents an integer of 1 or more,

[0151] t is an integer of 0 or more and represents the number required to neutralize the charge of Por 1 When Por

[0152] is electrically neutral, s is 1 and t is 0. 1 -Regarding Por

[0153] - 1 -

[0154] Por in the formula (A) 1 represents a structure represented by the formula (1).

[0155] [Chemical formula 12]

[0156] ​​

[0157] Az of formula (1) 1a ~Az 1c each independently represents a ring represented by formula (2),

[0158] Az 1d represents a ring represented by formula (3).

[0159] [Chemical formula 13]

[0160]

[0161] In formula (2), R 2 represents a substituent, n2 represents an integer of 0 to 6, and when n2 is 2 or more, adjacent Rs 2 can bond to each other to form a ring, * represents the connecting position to the porphyrin ring, and the connecting direction is arbitrary,

[0162] In formula (3), R 3 represents a substituent, n3 represents an integer of 0 to 6, and when n3 is 2 or more, adjacent Rs 3 can bond to each other to form a ring, * represents the connecting position to the porphyrin ring, and the connecting direction is arbitrary.

[0163] As the substituent represented by R in formula (2) 2 and the substituent represented by R in formula (3) 3 the groups exemplified for the substituent T described below and the groups represented by formula (R-100) described below can be mentioned, and preferably a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic oxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a cyano group, a nitro group, an amino group or a group represented by formula (R-100).

[0164] As the halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom can be mentioned.

[0165] Regarding the alkyl group and the alkoxy group, the number of carbon atoms is preferably 1 to 20, more preferably 1 to 10, and further preferably 1 to 5. The alkyl group and the alkoxy group can be any of linear, branched, and cyclic, preferably linear or branched, and more preferably linear. The alkyl group and the alkoxy group can have a substituent or can be unsubstituted. As the substituent, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc. can be mentioned.

[0166] Regarding the aryl group and the aryloxy group, the number of carbon atoms is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group and the aryloxy group can have a substituent or can be unsubstituted. As the substituent, an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc. can be mentioned.

[0167] Regarding a heterocyclic group, a heterocyclic epoxy group, and a heterocyclic epoxycarbonyl group, the number of carbon atoms in the ring constituting the heterocycle is preferably 1 to 30, more preferably 1 to 12. As the types of heteroatoms in the ring constituting the heterocycle, a nitrogen atom, an oxygen atom, and a sulfur atom can be mentioned. The number of heteroatoms in the ring constituting the heterocycle is preferably 1 to 3, more preferably 1 to 2. The heterocycle is preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4. The heterocyclic group, the heterocyclic epoxy group, and the heterocyclic epoxycarbonyl group may have a substituent or may be unsubstituted. As the substituent, an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc. can be mentioned.

[0168] Regarding an acyl group, an acyloxy group, and an alkoxycarbonyl group, the number of carbon atoms is preferably 2 to 30, more preferably 2 to 20. The acyl group, the acyloxy group, and the alkoxycarbonyl group may have a substituent or may be unsubstituted. As the substituent, an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc. can be mentioned.

[0169] Regarding an aryloxycarbonyl group, the number of carbon atoms is preferably 7 to 30, more preferably 7 to 20, and further preferably 7 to 12. The aryloxycarbonyl group may have a substituent or may be unsubstituted. As the substituent, an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc. can be mentioned.

[0170] As the amino group, a group represented by -NRa 1 Ra 2 and a cyclic amino group can be mentioned. In the group represented by -NRa 1 Ra 2 Ra 1 and Ra 2 each independently represent a hydrogen atom, an alkyl group, or an aryl group, preferably an alkyl group. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The alkyl group can be any of a straight chain, a branched chain, and a cyclic form, preferably a straight chain or a branched chain, more preferably a straight chain. The alkyl group may have a substituent. As the substituent, a group mentioned in the following substituent T can be mentioned. The number of carbon atoms of the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group may have a substituent. As the substituent, a group mentioned in the following substituent T can be mentioned. And, Ra 1 and Ra 2 can be bonded to form a ring. As the cyclic amino group, a pyrrolidinyl group, a piperidinyl group, a piperazinyl group, a morpholinyl group, etc. can be mentioned. These groups may also have a substituent. As the substituent, a group mentioned in the following substituent T can be mentioned. As a specific example of the substituent, an alkyl group and an aryl group, etc. can be mentioned.

[0171] n2 in formula (2) represents an integer from 0 to 6. When n2 is 0, excellent effects can be obtained in terms of high thermal stability. When n2 is an integer of 1 or more, excellent effects can be obtained in terms of high solvent solubility. When n2 is an integer of 1 or more, n2 is preferably an integer from 1 to 5, more preferably an integer from 1 to 3.

[0172] n3 in formula (3) represents an integer from 0 to 6. When n3 is 0, excellent effects can be obtained in terms of high thermal stability. When n3 is an integer of 1 or more, excellent effects can be obtained in terms of high solvent solubility. When n3 is an integer of 1 or more, n3 is preferably an integer from 1 to 5, more preferably an integer from 1 to 3.

[0173] When n2 in formula (2) is 2 or more, adjacent Rs 2 can bond to each other to form a ring. Also, when n3 in formula (3) is 2 or more, adjacent Rs 3 can bond to each other to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may have a substituent. As the substituent, groups exemplified in the following substituent T and groups represented by the following formula (R-100) can be mentioned, and preferably a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic oxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a cyano group, a nitro group, an amino group or a group represented by formula (R-100).

[0174] X in formula (1) 1a ~X 1d each independently represents a nitrogen atom or CR X1 , and R X1 represents a hydrogen atom or a substituent. As the substituent represented by R X1 , a halogen atom, an alkyl group, an aryl group, a heterocyclic group, etc. can be mentioned. As the halogen atom, alkyl group, aryl group and heterocyclic group represented by R X1 , groups described as the substituents represented by the above R 2 and R 3 can be mentioned, and the preferred ranges are also the same.

[0175] R X1 is preferably a hydrogen atom, an alkyl group, an aryl group or a halogen atom, more preferably a hydrogen atom.

[0176] As a preferred mode of X in formula (1) 1a ~X 1d , a mode in which X 1a ~X 1d are nitrogen atoms can be mentioned. According to this mode, it is excellent in terms of high light stability.

[0177] As X in formula (1) 1a ~X ldAnother preferred embodiment is X 1a ~X 1d are each independently CR X1 In this way, it is excellent in terms of high heat and humidity resistance.

[0178] M in formula (1) 1 represents two hydrogen atoms or a positively charged atom with a valence of 2 or more to which a ligand can coordinate (cationic atom).

[0179] Specific examples of the divalent positively charged atom include Be, Mg, Ca, Ba, Fe, Co, Ni, Cu, Ru, Rh, Pd, Pt, Zn, Cd, Hg, etc. Specific examples of the trivalent positively charged atom include B, Al, Ga, In, Sc, etc. Specific examples of the tetravalent positively charged atom include Ti, Zr, Hf, V, Nb, Ta, Si, Ge, Sn, etc. Specific examples of the pentavalent positively charged atom include P, etc.

[0180] A ligand can be coordinated to the positively charged atom represented by M 1 When the positively charged atom represented by M 1 is a positively charged atom with a valence of 3 or more, it is preferable to coordinate a ligand. When the positively charged atom represented by M 1 is a valence of 4 or more, two or more ligands can be coordinated. Examples of the ligand include an oxygen atom, a halogen atom, -OR M1 -OCOR M1 -OSO2R M1 and the ligands represented by formulas (6) to (8), etc. R M1 represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0181] R M1 The number of carbon atoms of the alkyl group represented by is preferably 1 to 20, more preferably 1 to 10, and still more preferably 1 to 5. The alkyl group can be any of linear, branched, and cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc.

[0182] R M1 The number of carbon atoms of the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, etc.

[0183] The R M1The number of carbon atoms in the ring of the heterocyclic ring represented by is preferably 1 to 30, more preferably 1 to 12. As the types of heteroatoms constituting the ring of the heterocyclic ring, nitrogen atoms, oxygen atoms, and sulfur atoms can be mentioned. The number of heteroatoms constituting the ring of the heterocyclic ring is preferably 1 to 3, more preferably 1 to 2. The heterocyclic ring is preferably a monocyclic ring or a condensed ring with a condensation number of 2 to 8, more preferably a monocyclic ring or a condensed ring with a condensation number of 2 to 4. The heterocyclic group may have a substituent or may be unsubstituted. As the substituent, alkyl groups, alkoxy groups, aryl groups, heterocyclic groups, halogen atoms, etc. can be mentioned.

[0184] In M 1 The ligand coordinated to the positively charged atom represented by is preferably a ligand represented by Formula (6) to Formula (8), more preferably a ligand represented by Formula (7) or Formula (8), and further preferably a ligand represented by Formula (7). The compound A having a ligand represented by Formula (6) to Formula (8) can be synthesized with reference to the descriptions in paragraphs 0081 to 0084 of Japanese Patent Laid-Open No. 2022-091099.

[0185] [Chemical Formula 14]

[0186]

[0187] In Formula (6), R 6a and R 6b each independently represent a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group. R 6a and R 6b may bond to each other to form a ring. * is a bonding bond with M of Formula (1) 1 , M of Formula (4) described later 4 or M of Formula (5) described later 5 .

[0188] Regarding R 6a and R 6b representing the alkyl group and the alkoxy group, the number of carbon atoms is preferably 1 to 20, more preferably 1 to 10, and further preferably 1 to 5. The alkyl group and the alkoxy group can be any of straight-chain, branched-chain, and cyclic, preferably straight-chain or branched-chain, and more preferably straight-chain. The alkyl group and the alkoxy group may have a substituent or may be unsubstituted. As the substituent, alkoxy groups, aryl groups, heterocyclic groups, halogen atoms, nitro groups, vinyl groups, (meth)allyl groups, (meth)acryloyl groups, (meth)acryloyloxy groups, etc. can be mentioned.

[0189] Regarding R 6a and R 6bThe aryl and aryloxy groups represented preferably have 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aryl and aryloxy groups may have substituents or may be unsubstituted. Examples of the substituents include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, etc.

[0190] Regarding the heterocyclic group and heterocyclic oxy group, the number of carbon atoms in the ring constituting the heterocycle preferably is 1 to 30, more preferably 1 to 12. Examples of the types of heteroatoms in the ring constituting the heterocycle include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms in the ring constituting the heterocycle preferably is 1 to 3, more preferably 1 to 2. The heterocycle is preferably a monocyclic ring or a condensed ring having 2 to 8 condensations, more preferably a monocyclic ring or a condensed ring having 2 to 4 condensations. The heterocyclic group and heterocyclic oxy group may have substituents or may be unsubstituted. Examples of the substituents include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, etc.

[0191] R in formula (6) 6a and R 6b may bond to each other to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may have substituents. Examples of the substituents include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, etc.

[0192] R in formula (6) 6a and R 6b are each independently preferably an aryl group, an alkoxy group, or an aryloxy group, more preferably an aryl group or an aryloxy group, and still more preferably an aryloxy group.

[0193] The ligand represented by formula (6) is also preferably a residue obtained by removing a hydrogen atom from the OH group on the phosphorus atom of the compound described in paragraph 0080 of Japanese Patent Application Laid-Open No. 2022-091099 or a residue obtained by removing a hydrogen atom from the OH group on the phosphorus atom of the phosphoric acid ester compound having an ethylenically unsaturated group described in paragraphs 0045 to 0048 of Japanese Patent Application Laid-Open No. 2019-105713.

[0194] [Chemical formula 15]

[0195]

[0196] In formula (7), R 7a and R 7b each independently represent a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (10), R 7a and R7b At least one of them is a group represented by the formula (10), and * is a bonding bond with M of the formula (1) 1 , M of the formula (4) described later 4 or M of the formula (5) described later 5 .

[0197] In the formula (8), Y 8 represents -OSO 2 -, -OCO- or -O-, and L 8 represents a single bond or an n8+1 valent linking group, Pm 8 represents a polymer chain, n8 represents an integer of 1 to 5, and when n8 is 2 to 5, multiple Pm 8 can be the same or different, and * is a bonding bond with M of the formula (1) 1 , M of the formula (4) described later 4 or M of the formula (5) described later 5 .

[0198] [Chemical formula 16]

[0199]

[0200] In the formula (10), L 10 represents a single bond or an n10+1 valent linking group, Pm 10 represents a polymer chain, n10 represents an integer of 1 to 5, and when n10 is 2 to 5, multiple Pm 10 can be the same or different, and * is a bonding bond with P of the formula (7).

[0201] R of the formula (7) 7a and R 7b The alkyl group, aryl group, alkoxy group and aryloxy group represented by can be cited as the groups described for R 6a and R 6b These groups represented by, and the preferred ranges are also the same.

[0202] Y of the formula (8) 8 represents -OSO 2 -, -OCO- or -O-, preferably -OSO 2 - or -OCO-.

[0203] As the n8+1 valent linking group represented by L of the formula (8) and L of the formula (10) 8 10 ​Examples of the n10+1-valent linking group represented include a hydrocarbon group, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and a group formed by combining two or more of these. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described later, and preferably a halogen atom, a hydroxyl group, an alkyl group, an aryl group, etc.

[0204] Pm of formula (8) 8 The polymer chain represented by formula (8) and Pm of formula (10) 10 The polymer chain represented is preferably a polymer chain containing repeating units having at least one structure selected from a polyether structure, a polyester structure, and a poly(meth)acrylic acid structure.

[0205] Pm of formula (8) 8 The polymer chain represented by formula (8) and Pm of formula (10) 10 The weight-average molecular weight of the polymer chain represented is preferably 1000 to 50000, more preferably 1500 to 20000.

[0206] n8 in formula (8) represents an integer of 1 to 5, preferably 1 or 2, and more preferably 1.

[0207] n10 in formula (10) represents an integer of 1 to 5, preferably 1 or 2, and more preferably 1.

[0208] The ligand represented by formula (7) is preferably a ligand of a polymer having a structure represented by formula (7-1), a ligand represented by formula (7-2), or a ligand represented by formula (7-3).

[0209] [Chemical formula 17]

[0210]

[0211] In formula (7-1), R 11a represents a hydrogen atom, an alkyl group, or a halogen atom,

[0212] R 11b represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group,

[0213] L 11a represents -CONH-L 11b -, -COO-L 11c -, -CONH-L 11d-O- or -COO-L 11e -O-, L 11b ~L 11e Each independently represents an alkylene group, an arylene group, or a divalent group formed by connecting multiple hydrocarbon groups through -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-

[0214] * is a bonding bond with M in formula (1) 1 , M in formula (4) described later 4 or M in formula (5) described later 5 of the bonding bond

[0215] In formula (7-2), R 12a represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group or an aryloxy group

[0216] R 12b represents an alkyl group or an aryl group

[0217] L 12 represents an alkylene group or an arylene group

[0218] n12 represents 0 or 1

[0219] m12 represents an integer of 2 or more

[0220] * is a bonding bond with M in formula (1) 1 , M in formula (4) described later 4 or M in formula (5) described later 5 of the bonding bond

[0221] In formula (7-3), R 13a and R 13b each independently represents an alkyl group or an aryl group

[0222] L 13a and L 13b each independently represents an alkylene group or an arylene group

[0223] n13 and p13 each independently represent 0 or 1

[0224] m13 and q13 each independently represent an integer of 2 or more

[0225] * is a bonding bond with M in formula (1) 1 , M in formula (4) described later 4 or M in formula (5) described later 5 of the bonding bond

[0226] R in formula (7-1) 11a is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or a methyl group

[0227] R of formula (7-1) 11b Examples of the alkyl group, heterocyclic group, aryl group, alkoxy group, heteroepoxy group, and aryloxy group represented by 11b include the groups described as R of formula (6) 6a and R 6b The groups represented by 6b are the same as those described above, and the preferred ranges are also the same.

[0228] L of formula (7-1) 11a represents -CONH-L 11b -, -COO-L 11c -, -CONH-L 11d -O- or -COO-L 11e -O-, L 11b ~L 11e each independently represents a hydrocarbon group or a divalent group formed by connecting multiple hydrocarbon groups through -O-, -CO-, -COO-, -OCO-, -CONH-, or -NHCO-. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The aliphatic hydrocarbon group can be linear, branched, or cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and preferably include a halogen atom, a hydroxyl group, an alkyl group, an aryl group, etc.

[0229] R of formula (7-2) 12a Examples of the alkyl group, heterocyclic group, aryl group, alkoxy group, heteroepoxy group, and aryloxy group represented by 12a include the groups described as R of formula (6) 6a and R 6b The groups represented by 6b are the same as those described above, and the preferred ranges are also the same.

[0230] R of formula (7-2) 12b The alkyl group represented by 12b , and R of formula (7-3) 13a and R 13b The number of carbon atoms in the alkyl group represented by 13b is preferably 1 to 20, more preferably 1 to 10, and further preferably 1 to 5. The alkyl group can be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, an aryloxy group, a heteroepoxy group, an alkenyl group, an alkynyl group, etc.

[0231] R of formula (7-2) 12b The aryl group represented by 12b , and R of formula (7-3) 13a and R 13bThe number of carbon atoms of the aryl group represented is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, an aryloxy group, a heterocyclic oxy group, an alkenyl group, and an alkynyl group.

[0232] L of formula (7-2) 12 The alkylene group represented and L of formula (7-3) 13a and L 13b The number of carbon atoms of the alkylene group represented is preferably 1 to 10, more preferably 1 to 8. The alkylene group is preferably linear or branched, and more preferably linear. Further, when n12 is 0, the number of carbon atoms of the alkylene group represented by L 12 is preferably 1 to 5, more preferably 1 to 3, and still more preferably 2 to 3. When n13 is 0, the number of carbon atoms of the alkylene group represented by L 13a is preferably 1 to 5, more preferably 1 to 3, and still more preferably 2 to 3. When p13 is 0, the number of carbon atoms of the alkylene group represented by L 13b is preferably 1 to 5, more preferably 1 to 3, and still more preferably 2 to 3.

[0233] L of formula (7-2) 12 The arylene group represented and L of formula (7-3) 13a and L 13b The number of carbon atoms of the arylene group represented is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12.

[0234] L of formula (7-2) 12 and L of formula (7-3) 13a and L 13b are each independently preferably an alkylene group.

[0235] n12 of formula (7-2) represents 0 or 1, and m12 represents an integer of 2 or more. m12 is preferably an integer of 5 to 300, and more preferably an integer of 10 to 100.

[0236] n13 and p13 of formula (7-3) each independently represent 0 or 1, and m13 and q13 each independently represent an integer of 2 or more. m13 and q13 are each independently preferably an integer of 5 to 300, and more preferably an integer of 10 to 100.

[0237] The polymer having the structure represented by (7-1) can be obtained by polymerizing the monomer represented by the general formula (7) described in paragraph 0040 of Japanese Unexamined Patent Application Publication No. 2022-091099.

[0238] In addition to having the structure represented by formula (7-1), the polymer having the structure represented by formula (7-1) may also have repeating units other than the structure represented by formula (7-1) (also referred to as other repeating units). As the other repeating units, repeating units derived from (meth)acrylates, crotonates, vinyl esters, maleic diesters, fumaric diesters, itaconic diesters, (meth)acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth)acrylonitrile, and monomers selected from acid group-containing monomers, hydroxyl group-containing monomers, oxetanyl group-containing monomers, tert-butyl group-containing monomers, isocyanate group-containing monomers, and blocked isocyanate group-containing monomers can be cited.

[0239] As the (meth)acrylates, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, tert-butylcyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, tert-octyl (meth)acrylate, dodecyl (meth)acrylate, octadecyl (meth)acrylate, 2-acetoxyethyl (meth)acrylate, phenyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 2-(2-methoxyethoxy)ethyl (meth)acrylate, 3-phenoxy-2-hydroxypropyl (meth)acrylate, benzyl (meth)acrylate, diethylene glycol monomethyl ether (meth)acrylate, diethylene glycol monoethyl ether (meth)acrylate, triethylene glycol monomethyl ether (meth)acrylate, triethylene glycol monoethyl ether (meth)acrylate, polyethylene glycol monomethyl ether (meth)acrylate, polyethylene glycol monoethyl ether (meth)acrylate, β-phenoxyethoxyethyl (meth)acrylate, nonylphenoxy polyethylene glycol (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, trifluoroethyl (meth)acrylate, octafluoropentyl (meth)acrylate, perfluorooctylethyl (meth)acrylate, dicyclopentyl (meth)acrylate, tribromophenyl (meth)acrylate, tribromophenoxyethyl (meth)acrylate, etc. can be cited.

[0240] As the crotonates, butyl crotonate, hexyl crotonate, etc. can be cited.

[0241] As the vinyl esters, vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, etc. can be cited.

[0242] As the maleic diesters, dimethyl maleate, diethyl maleate, dibutyl maleate, etc. can be cited.

[0243] Examples of the diesters of fumaric acid include dimethyl fumarate, diethyl fumarate, dibutyl fumarate, and the like.

[0244] Examples of the diesters of itaconic acid include dimethyl itaconate, diethyl itaconate, dibutyl itaconate, and the like.

[0245] Examples of the (meth)acrylamides include (meth)acrylamide, N-methyl(meth)acrylamide, N-ethyl(meth)acrylamide, N-propyl(meth)acrylamide, N-isopropyl(meth)acrylamide, N-n-butyl(meth)acrylamide, N-tert-butyl(meth)acrylamide, N-cyclohexyl(meth)acrylamide, N-(2-methoxyethyl)(meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-phenyl(meth)acrylamide, N-benzyl(meth)acrylamide, (meth)acryloylmorpholine, diacetone acrylamide, and the like.

[0246] Examples of the vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, methoxyethyl vinyl ether, and the like.

[0247] Examples of the styrenes include styrene, methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, isopropylstyrene, butylstyrene, hydroxystyrene, methoxystyrene, butoxystyrene, acetoxystyrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethylstyrene, hydroxystyrene protected with a group capable of being deprotected by an acidic substance (such as t-Boc, etc.), methyl vinyl benzoate, α-methylstyrene, and the like.

[0248] Examples of the acid group-containing monomers include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid; unsaturated dicarboxylic acids or their acid anhydrides such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid; unsaturated polycarboxylic acids or their acid anhydrides having a valence of 3 or more; mono[(meth)acryloyloxyalkyl] esters of polycarboxylic acids having a valence of 2 or more such as succinic acid mono(2-acryloyloxyethyl), succinic acid mono(2-methacryloyloxyethyl), phthalic acid mono(2-acryloyloxyethyl), phthalic acid mono(2-methacryloyloxyethyl); mono(meth)acrylates of polymers having carboxyl groups at both ends such as ω-carboxy-polycaprolactone monoacrylate, ω-carboxy-polycaprolactone monomethacrylate, and the like.

[0249] Examples of the hydroxy group-containing monomer include 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyvinylbenzene, 2-hydroxy-3-phenoxypropyl acrylate, or a caprolactone adduct (molar number: 1 to 5) of these monomers, etc.

[0250] Examples of the oxetanyl group-containing monomer include 3-(acryloxymethyl)-3-methyloxetane, 3-(methacryloxymethyl)-3-methyloxetane, 3-(acryloxymethyl)-3-ethyloxetane, 3-(methacryloxymethyl)-3-ethyloxetane, 3-(acryloxymethyl)-3-butyloxetane, 3-(methacryloxymethyl)-3-butyloxetane, 3-(acryloxymethyl)-3-hexyloxetane, and 3-(methacryloxymethyl)-3-hexyloxetane, etc.

[0251] Examples of the tert-butyl group-containing monomer include tert-butyl acrylate, tert-butyl methacrylate, etc.

[0252] Examples of the isocyanate group-containing monomer include 2-isocyanatoethyl methacrylate, 2-isocyanatoethyl acrylate, 4-isocyanatobutyl methacrylate, 4-isocyanatobutyl acrylate, etc.

[0253] The blocked isocyanate group in the blocked isocyanate group-containing monomer refers to a functional group that protects the isocyanate group with other functional groups under general conditions to inhibit the reactivity of the isocyanate group, and can be deprotected by heating to regenerate the active isocyanate group. Examples of commercially available products of the blocked isocyanate group-containing monomer include 2-[(3,5-dimethylpyrazolyl)carboxylamino]ethyl methacrylate (Karenz MOI-BP, manufactured by Showa Denko K.K.); 2-(O-[1'-methylpropylideneamino]carboxylamino)ethyl methacrylate (Karenz MOI-BM, manufactured by Showa Denko K.K.), etc.

[0254] The ligand represented by the formula (7-2) and the ligand represented by the formula (7-3) are also preferably residues obtained by removing hydrogen from the OH group on the phosphorus atom of the phosphate A2 described in paragraphs 0130 to 0148 of Japanese Patent Laid-Open No. 2016-218433.

[0255] The phosphate ester compounds that are raw materials for the ligand represented by Formula (7-2) and the ligand represented by Formula (7-3) are commercially available. Specific examples thereof include the Plysurf series (polyoxyethylene alkyl ether phosphoric acid) manufactured by DKS Co., Ltd., the PHOSPHANOL series (polyoxyethylene alkyl ether phosphoric acid) manufactured by TOHO Chemical Industry Co., Ltd., DISPERBYK 102, DISPERBYK 110, DISPERBYK 111, DISPERBYK 140 manufactured by BYK-Chemie GmbH, TEGO Dispers 651, TEGO Dispers 655 manufactured by Evonik Japan Co., Ltd., SOLSPERSE 26000, SOLSPERSE 36000, SOLSPERSE 41000 manufactured by Japan Lubrizol Corporation, the ADEKA COLTS / CS / PS series manufactured by ADEKA CORPORATION, DISPARLON PW-36, DISPARLON 3500 manufactured by Kusumoto Chemicals, Ltd., etc.

[0256] Por of Formula (A) 1 Preferably, it is a structure represented by Formula (4) or Formula (5).

[0257] [Chemical Formula 18]

[0258]

[0259] In Formula (4), Az 4a ~Az 4c Each independently represents a ring represented by the above Formula (2),

[0260] Az 4d represents a ring represented by the above Formula (3),

[0261] X 4a ~X 4d Each independently represents a nitrogen atom or CR X4 , R X4 represents a hydrogen atom or a substituent,

[0262] M 4 represents B, Al, Ga, In or Sc,

[0263] Z 4 represents a ligand,

[0264] In Formula (5), Az 5a ~Az 5c Each independently represents a ring represented by the above Formula (2),

[0265] Az 5d represents the ring represented by the above formula (3).

[0266] X 5a ~X 5d each independently represents a nitrogen atom or CR X5 , R X5 represents a hydrogen atom or a substituent.

[0267] M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn.

[0268] Z 5a and Z 5b each independently represents a ligand.

[0269] X in formula (4) 4a ~X 4d and X in formula (5) 5a ~X 5d have the same meaning as X in formula (1) 1a ~X 1d and the same preferred range.

[0270] As the ligand represented by Z in formula (4) 4 and the ligand represented by Z in formula (5) 5a and Z 5b the ligands represented can be the above-mentioned ligands, preferably the ligands represented by the above formulas (6) to (8), more preferably the ligands represented by the above formula (7) or formula (8), and further preferably the ligand represented by the above formula (7).

[0271] -Regarding An 1 -

[0272] An in formula (A) 1 represents a counter anion. The counter anion can be an organic anion or an inorganic anion. As the counter anion, anions represented by formula (ANl), anions represented by formula AN2), anions represented by formula AN3), anions represented by formula AN4), anions represented by formula AN5), fluoride anions, chloride anions, bromide anions, iodide anions, cyanide ions, perchlorate anions, carboxylate anions, sulfonate anions, phosphate anions, heteropolyacid (phosphotungstic acid, phosphomolybdic acid, phosphotungstomolybdic acid, silicotungstic acid, silicomolybdic acid, silicotungstomolybdic acid, etc.) anions, isopolyacid (tungstic acid, molybdic acid, etc.) anions, etc. can be cited.

[0273] [Chemical formula 19]

[0274]

[0275] In formula (AN1), R AN1 and R AN2 each independently represent a halogen atom or an alkyl group, and R AN1 and R AN2 may bond to form a ring;

[0276] In formula (AN2), R AN3 to R AN5 each independently represent a halogen atom or an alkyl group, and R AN3 and R AN4 , R AN4 and R AN5 or R AN3 and R AN5 may bond to form a ring;

[0277] In formula (AN3), R AN6 to R AN9 each independently represent a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group or a cyano group;

[0278] In formula (AN4), R AN10 represents a halogenated hydrocarbon group that can be connected through a linking group having a nitrogen atom or an oxygen atom;

[0279] In formula (AN5), R AN11 to R AN16 each independently represent a halogen atom or a halogenated hydrocarbon group.

[0280] Examples of the halogen atom represented by R AN1 and R AN2 in formula (AN1), the halogen atom represented by R AN3 to R AN5 in formula (AN2), and the halogen atom represented by R AN6 to R AN9 in formula (AN3) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferred.

[0281] The number of carbon atoms of the alkyl group represented by R AN1 and R AN2 in formula (AN1), the alkyl group represented by R AN3 to R AN5 in formula (AN2), and the alkyl group represented by R AN6 to R AN9 in formula (AN3) is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 3. The alkyl group may be linear, branched or cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. The alkyl group is preferably an alkyl group having a halogen atom as a substituent, more preferably an alkyl group having a fluorine atom as a substituent (fluoroalkyl). Moreover, the fluoroalkyl group is preferably a perfluoroalkyl group.

[0282] R of formula (AN3) AN6 ~R AN9 The number of carbon atoms of the aryl group represented is preferably 6 to 20, more preferably 6 to 12, and still more preferably 6. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include a halogen atom and an alkyl group. As the halogen atom, a fluorine atom is preferred. As the alkyl group, a fluoroalkyl group is preferred.

[0283] R of formula (AN3) AN6 ~R AN9 The number of carbon atoms of the alkoxy group represented is preferably 1 to 10, more preferably 1 to 6, and still more preferably 1 to 3. The alkoxy group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. The alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include a halogen atom and an alkyl group. As the halogen atom, a fluorine atom is preferred. As the alkyl group, a fluoroalkyl group is preferred.

[0284] R of formula (AN3) AN6 ~R AN9 The number of carbon atoms of the aryloxy group represented is preferably 6 to 20, more preferably 6 to 12, and still more preferably 6. The aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include a halogen atom and an alkyl group. As the halogen atom, a fluorine atom is preferred. As the alkyl group, a fluoroalkyl group is preferred.

[0285] R of formula (AN1) AN1 and R AN2 can bond to form a ring. R of formula (AN2) AN3 and R AN4 , R AN4 and R AN5 or R AN3 and R AN5 can bond to form a ring.

[0286] R of formula (AN4) AN10 represents a halogenated hydrocarbon group that can be connected through a linking group having a nitrogen atom or an oxygen atom. The halogenated hydrocarbon group refers to a monovalent hydrocarbon group substituted by a halogen atom, preferably a monovalent hydrocarbon group substituted by a fluorine atom. Examples of the hydrocarbon group include an alkyl group, an aryl group, etc. The monovalent hydrocarbon group substituted by a halogen atom may further have a substituent. Examples of the linking group having a nitrogen atom or an oxygen atom include -O-, -CO-, -COO-, -CO-NH-, etc.

[0287] R of formula (AN5) AN11 ~R AN16Each independently represents a halogen atom or a halogenated hydrocarbon group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, with a fluorine atom being preferred. Examples of the halogenated hydrocarbon group preferably include an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent.

[0288] Specific examples of the heteropolyacid anion and the isopolyacid anion include tungstate anions ([W6O 19 2- 、[W 10 O 32 4- 、[WO4] 2- etc.), molybdate anions ([Mo2O7] 2- 、[Mo6O 19 2- 、[Mo8O 26 4- etc.), phosphotungstate anions ([PW4O 20 4- 、[PW 12 O 40 3- 、[P2W 15 O 56 12- 、[P2W 17 O 61 10- 、[P2W 18 O 62 6- etc.), phosphomolybdate anions ([P2Mo 18 O 62 6- 、[PMo 12 O 40 3- etc.), phosphotungstomolybdate anions ([PW 12-x Mo x O 40 3- (x is an integer from 1 to 11), [P2W 18-y Mo y O 62 6- (y is an integer from 1 to 17) etc.), silicotungstate anions ([SiW9O 34 10- 、[SiW 10 O 36 8- 、[SiW 11 O 39 8- 、[SiW 12 O 40 4- ​​​​​​​​​​​​​​​​​etc.), silicomolybdate anions ([SiMo 12 O 40 4- etc.), silicotungstomolybdate anions ([SiW 12-x Mo x O 40 4- (x is an integer from 1 to 11), etc.) and tungsten-based isopolyacid anions.

[0289] -Regarding s, t-

[0290] In formula (A), s represents an integer of 1 or more, t is an integer of 0 or more and represents the number required to neutralize the charge of Por 1 . When Por 1 is electrically neutral, s is 1 and t is 0.

[0291] -Regarding substituent T-

[0292] ​​As the substituent T, the following groups can be mentioned. A halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heterocyclic sulfonyl group (preferably a heterocyclic sulfonyl group having 1 to 30 carbon atoms), a heterocyclic sulfonylamino group (preferably a heterocyclic sulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heterocyclic sulfinyl group (preferably a heterocyclic sulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxyl group, a nitro group, a carboxyl group, a sulfo group, a phosphoric acid group, a carboxamide group, a sulfonamide group, an imide group, a phosphino group, a mercapto group, a cyano group, an alkylsulfinyl group, an arylsulfinyl group, an arylazo group, a heterocyclic azo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, an imino group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group. When these groups are groups that can be further substituted, they can also have substituents.As the substituent, the groups described in the above substituent T can be mentioned.

[0293] -Regarding the group represented by the formula (R-100)-

[0294] [Chemical formula 20]

[0295] *——L R1 —(X R1 ) n (R-100)

[0296] In the formula (R-100), L R1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, -OSO2- or an n+1-valent linking group obtained by combining two or more of these groups, R L1 represents a hydrogen atom, an alkyl group or an aryl group, X R1 represents an acid group or a basic group, and n represents an integer of 1 or more. When n is 1, L R1 can be a single bond.

[0297] The number of carbon atoms of the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 2 to 20, further preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group can be any of straight-chain, branched-chain, and cyclic. The aliphatic hydrocarbon group can have a substituent. As the substituent, the groups mentioned in the above substituent T can be mentioned.

[0298] The number of carbon atoms of the aromatic hydrocarbon group is preferably 6 to 18, more preferably 6 to 14, further preferably 6 to 10. The aromatic hydrocarbon group can have a substituent. As the substituent, the groups mentioned in the above substituent T can be mentioned.

[0299] The heterocyclic group is preferably a monocyclic or condensed ring having 2 to 4 condensed rings. The number of heteroatoms in the ring constituting the heterocyclic group is preferably 1 to 3. The heteroatoms in the ring constituting the heterocyclic group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms in the ring constituting the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, more preferably 3 to 12. As specific examples of the heterocyclic group, piperazinyl, pyrrolidinyl, pyrrolyl, piperidinyl, pyridyl, imidazolyl, pyrazolyl, oxazolyl, thiazolyl, pyrazinyl, morpholinyl, thiazinyl, indolyl, isoindolyl, benzimidazolyl, purinyl, quinolyl, isoquinolyl, quinoxalinyl, cinnolinyl, carbazolyl and the groups represented by the following formulas (L-1) to (L-7) can be mentioned.

[0300] [Chemical formula 21]

[0301]

[0302] In the formula, * represents a linking bond. R represents a hydrogen atom or a substituent. As the substituent, groups exemplified in the above-mentioned substituent T can be mentioned.

[0303] The aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent. As the substituent, groups exemplified in the above-mentioned substituent T can be mentioned, preferably a halogen atom, more preferably a fluorine atom.

[0304] R L1 The alkyl group represented by preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and further preferably 1 to 8 carbon atoms. The alkyl group can be any of linear, branched and cyclic, preferably linear or branched, more preferably linear. R L1 The alkyl group represented by may also have a substituent. As the substituent, groups exemplified in the above-mentioned substituent T can be mentioned.

[0305] R L1 The aryl group represented by preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. R L1 The aryl group represented by may also have a substituent. As the substituent, groups exemplified in the above-mentioned substituent T can be mentioned.

[0306] As the acid group represented by X in the formula (R-100) R1 carboxyl group, sulfo group, phosphoric acid group, boric acid group, carboxamide group, sulfonamide group, imidic acid group and salts thereof can be mentioned. As the atom or atomic group constituting the salt, alkali metal ions (Li + 、Na + 、K + etc.), alkaline earth metal ions (Ca 2+ 、Mg 2+ etc.), ammonium ion, imidazolium ion, pyridinium ion, phosphonium ion etc. can be mentioned. As the carboxamide group, a group represented by -NHCOR X1 is preferred. As the sulfonamide group, a group represented by -NHSO2R X2 is preferred. As the imidic acid group, a group represented by -SO2NHSO2R X3 、-CONHSO2R X4 、-CONHCOR X5 or -SO2NHCOR X6 is preferred, and more preferably -SO2NHSO2R X3 . R X1 ~R X6 each independently represents an alkyl group or an aryl group. R X1 ~R X6 The alkyl group and aryl group represented by may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred.

[0307] As X of formula (R-100) R1 Examples of the basic group represented by the formula include an amino group, a pyridyl group and its salt, an ammonium group salt, and a phthalimidomethyl group. Examples of the atom or atomic group constituting the salt include a hydroxide ion, a halogen ion, a carboxylate ion, a sulfonate ion, a phenoxide ion, etc.

[0308] Examples of the amino group include a group represented by -NRx 1 Rx 2 and a cyclic amino group. In the group represented by -NRx 1 Rx 2 Rx 1 and Rx 2 each independently represent a hydrogen atom, an alkyl group or an aryl group, preferably an alkyl group. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The alkyl group can be any of linear, branched, and cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Examples of the substituent include the groups exemplified in the above substituent T. The number of carbon atoms of the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the groups exemplified in the above substituent T. Further, Rx 1 and Rx 2 may be bonded to form a ring. Examples of the cyclic amino group include a pyrrolidinyl group, a piperidinyl group, a piperazinyl group, a morpholinyl group, etc. These groups may also have a substituent. Examples of the substituent include the groups exemplified in the above substituent T. Specific examples of the substituent include an alkyl group and an aryl group, etc.

[0309] Compound A is preferably a compound represented by formula (A1). The compound represented by formula (A1) is also a compound of the present invention.

[0310] [Por 2 s [An 2 t ...(A1)

[0311] In formula (A1), Por 2 represents a structure represented by formula (4a) or formula (5a),

[0312] An 2 represents a counter anion,

[0313] s represents an integer of 1 or more,

[0314] t is an integer of 0 or more and represents the number required to neutralize the charge of Por 2 ,

[0315] ​​For 2 When it is electrically neutral, s is 1 and t is 0.

[0316] [Chemical formula 22]

[0317]

[0318] In formula (4a), Az 4a ~Az 4c each independently represents a ring represented by the above formula (2),

[0319] Az 4d represents a ring represented by the above formula (3),

[0320] X 4a ~X 4d each independently represents a nitrogen atom or CR X4 , R X4 represents a hydrogen atom or a substituent,

[0321] M 4 represents B, Al, Ga, In or Sc,

[0322] Z 4 represents a ligand represented by the above formula (7) or formula (8),

[0323] In formula (5a), Az 5a ~Az 5c each independently represents a ring represented by the above formula (2),

[0324] Az 5d represents a ring represented by the above formula (3),

[0325] X 5a ~X 5d each independently represents a nitrogen atom or CR X5 , R X5 represents a hydrogen atom or a substituent,

[0326] M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn,

[0327] Z 5a and Z 5b each independently represents a ligand represented by the above formula (7) or formula (8).

[0328] An in formula (A1) 2 has the same meaning as An in formula (A) 1 , and the preferred ranges are also the same.

[0329] Az in formula (4a) 4a ~Az 4c , X4a to X 4d and M 4 and Az of formula (4) 4a to Az 4c and X 4a to X 4d and M 4 have the same meanings and the same preferred ranges.

[0330] Az of formula (5a) 5a to Az 5c and X 5a to X 5d and M 5 and Az of formula (5) 5a to Az 5c and X 5a to X 5d and M 5 have the same meanings and the same preferred ranges.

[0331] Compound A can be a dye or a pigment. When Compound A is a pigment, the solubility of Compound A in propylene glycol monomethyl ether acetate and water at 25°C is preferably 0.1 g / 100 g or less.

[0332] Compound A is preferably an infrared absorber. Compound A preferably has a maximum absorption wavelength in the range of 700 to 1800 nm. The lower limit is preferably 800 nm or more, more preferably 900 nm or more in wavelength. The upper limit is preferably 1600 nm or less, more preferably 1400 nm or less in wavelength.

[0333] Moreover, Compound A can be a pigment derivative. The pigment derivative can be used as a dispersion aid, for example. A dispersion aid refers to a material used to improve the dispersibility of a pigment in a composition.

[0334] Az of formula (1) 1a to Az 1d in which at least one contains a structure having a group represented by the above formula (R-100) as a substituent can preferably be used as a pigment derivative. In addition, Az of formula (1) 1a to Az 1d in which at least one contains a structure having a group represented by the above formula (R-100) as a substituent can also be used as a pigment and a dye.

[0335] As specific examples of Compound A, there may be mentioned Compound A-p-1 to A-p-28, A-d-1 to A-d-10, A-p-101 to A-p-110, A-d-101 to A-d-109, A-p-201 to A-p-217, A-d-201 to A-d-206, A-p-301 to A-p-303, A-d-301 to A-d-303, A-p-401 to A-p-413, A-d-401 to A-d-410, A-s-1 to A-s-4 described in the following Examples.

[0336] In addition, regarding Compound A, Por in formula (A) 1 In the structure of, due to the difference in the bonding of the azulene ring to the porphyrin skeleton, there are isomers represented by formulas (A-a) to (A-d). In the following Examples, in the structural formulas shown as specific examples of Compound A, the structure of Por in formula (A) 1 is shown as the structural formula of formula (A-a), but Compound A may be any of the following isomers, or may be a mixture containing two or more of the following isomers.

[0337] [Chemical formula 23]

[0338]

[0339] In the above formulas, X independently represents a nitrogen atom or CR X1 , R X1 represents a hydrogen atom or a substituent, M a represents two hydrogen atoms or a positively charged atom with a valence of 2 or more to which a ligand can coordinate, and R a to R f each independently represents a hydrogen atom or a substituent.

[0340] The content of Compound A in the total solid components of the photosensitive composition is preferably 5 to 80% by mass. The lower limit is preferably 10% by mass or more, more preferably 20% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 40% by mass or less. The photosensitive composition may contain only one kind of Compound A, or may contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0341] <Colorant B>

[0342] The photosensitive composition of the present invention contains: Colorant B, which is a compound other than the above Compound A, has a maximum absorption wavelength in the range of 400 to 1000 nm, has a molecular weight of 2000 or less, and has a π-conjugated plane.

[0343] The coloring material B may be only one kind, but considering the reasons that can further effectively suppress the aggregation of the above compound A and can further improve the lithography performance and storage stability, it is preferably used in two or more kinds.

[0344] The coloring material B may be a pigment or a dye. It is preferably a pigment.

[0345] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and further preferably 100 nm or less. In addition, in this specification, the primary particle diameter of the pigment can be obtained by observing the primary particles of the pigment with a transmission electron microscope and based on the obtained photograph. Specifically, the projected area of the primary particles of the pigment is obtained, and the equivalent circle diameter corresponding thereto is calculated as the primary particle diameter of the pigment. And the average primary particle diameter in the present invention is set as the arithmetic average of the primary particle diameters of 400 primary particles of the pigment. And the primary particles of the pigment refer to non-aggregated independent particles.

[0346] The crystallite size obtained from the half-width of the peak of any crystal plane in the X-ray diffraction spectrum when the CuKα line of the pigment is used as the X-ray source is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, further preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0347] The specific surface area of the pigment is preferably 1 to 300 m 2 / g. The lower limit is preferably 10 m 2 / g or more, more preferably 30 m 2 / g or more. The upper limit is preferably 250 m 2 / g or less, more preferably 200 m 2 / g or less. The value of the specific surface area can be measured according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: determination of the specific surface area of solids by gas adsorption (Determination of the specific surface area of solids based on gas adsorption).

[0348] As the pigment, a pigment obtained by pulverizing through methods such as grinding and dry bead milling in a mortar and atomizing through a sieve can be used.

[0349] The number of π electrons constituting the conjugation length of the π-conjugated plane of the coloring material B is preferably an integer of 6 or more, more preferably an integer of 10 or more, and still more preferably an integer of 16 or more. The upper limit is preferably an integer of 42 or less, more preferably an integer of 38 or less, and still more preferably an integer of 34 or less.

[0350] The π-conjugated plane of the coloring material B preferably contains a monocyclic or polycyclic aromatic ring, more preferably contains two or more of the aromatic rings, and still more preferably contains three or more of the aromatic rings. The upper limit is preferably 15 or less, more preferably 10 or less. Examples of the aromatic ring include a benzene ring, a naphthalene ring, an indene ring, an azulene ring, a heptalene ring, an indene ring, a perylene ring, a pentacene ring, a coronene ring, an acenaphthene ring, a phenanthrene ring, an anthracene ring, a tetracene ring, (chrysene) ring, a triphenylene ring, a fluorene ring, a pyridine ring, a quinoline ring, an isoquinoline ring, an imidazole ring, a benzimidazole ring, a pyrazole ring, a thiazole ring, a benzothiazole ring, a triazole ring, a benzotriazole ring, an oxazole ring, a benzoxazole ring, an imidazoline ring, a pyrazine ring, a quinoxaline ring, a pyrimidine ring, a quinazoline ring, a pyridazine ring, a triazine ring, a pyrrole ring, an indole ring, an isoindole ring, a carbazole ring, a pyran ring, a thiopyran ring, and polycyclic rings having these rings.

[0351] The coloring material B preferably contains at least one selected from quinacridone compounds, anthraquinone compounds, perylene compounds, diketopyrrolopyrrole compounds, azo compounds, phthalocyanine compounds, naphthalocyanine compounds, dioxazine compounds, azomethine compounds, quinophthalone compounds, isoindoline compounds, pteridine compounds, triarylmethane compounds, xanthene compounds, indigo compounds, polymethine compounds, bisbenzofuranone compounds, iminium compounds, squaric acid compounds, croconium compounds, and pyrrolopyrrole compounds, and more preferably contains at least one selected from anthraquinone compounds, diketopyrrolopyrrole compounds, phthalocyanine compounds, naphthalocyanine compounds, dioxazine compounds, quinophthalone compounds, isoindoline compounds, polymethine compounds, squaric acid compounds, and pyrrolopyrrole compounds.

[0352] The coloring material B preferably contains at least one selected from coloring materials and infrared absorbing materials, and more preferably contains coloring materials and infrared absorbing materials. Examples of the coloring materials include yellow coloring materials, orange coloring materials, red coloring materials, green coloring materials, purple coloring materials, blue coloring materials, etc.

[0353] The coloring material B preferably contains at least one selected from the coloring material B-1, coloring material B-2, and coloring material B-3 shown below, and more preferably contains coloring material B-1, coloring material B-2, and coloring material B-3 in view of the reasons that can further effectively suppress the aggregation of the above compound A and can further improve lithography and storage stability.

[0354] Colorant B-1: A colorant having a maximum absorption wavelength in the range of 450 nm or more and 600 nm or less

[0355] Colorant B-2: A colorant having a maximum absorption wavelength in the range of more than 600 nm and 700 nm or less

[0356] Colorant B-3: A colorant having a maximum absorption wavelength in the range of more than 700 nm and 1000 nm or less

[0357] Examples of Colorant B-1 include yellow colorants, orange colorants, red colorants, and purple colorants. Examples of Colorant B-2 include blue colorants and green colorants. Examples of Colorant B-3 include infrared absorbing colorants.

[0358] Colorant B-1 can be only one kind, or two or more kinds can be used. Colorant B-2 can be only one kind, or two or more kinds can be used. Colorant B-3 can be only one kind, or two or more kinds can be used.

[0359] When Colorant B includes Colorant B-1, Colorant B-2, and Colorant B-3, the proportion of Colorant B-1 relative to the total 100 parts by mass of Colorant B-1, Colorant B-2, and Colorant B-3 is preferably 5 to 60 parts by mass. The upper limit is preferably 50 parts by mass or less, more preferably 40 parts by mass or less. The lower limit is preferably 15 parts by mass or more, more preferably 25 parts by mass or more.

[0360] And, the proportion of Colorant B-2 relative to the total 100 parts by mass of Colorant B-1, Colorant B-2, and Colorant B-3 is preferably 20 to 70 parts by mass. The upper limit is preferably 60 parts by mass or less, more preferably 50 parts by mass or less. The lower limit is preferably 30 parts by mass or more, more preferably 40 parts by mass or more.

[0361] And, the proportion of Colorant B-3 relative to the total 100 parts by mass of Colorant B-1, Colorant B-2, and Colorant B-3 is preferably 5 to 50 parts by mass. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. The lower limit is preferably 10 parts by mass or more, more preferably 15 parts by mass or more.

[0362] Examples of the red colorant include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, thioindigo compounds, etc., preferably diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, more preferably diketopyrrolopyrrole compounds. And, the red colorant is preferably a pigment.

[0363] As specific examples of the red coloring material, C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, 297 and other red pigments can be cited. Further, as the red coloring material, the compound described in paragraph 0034 of International Publication No. 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in Japanese Patent Application Laid-Open No. 2020-085947 can also be used.

[0364] As the red coloring material, C.I. Pigment Red 122, 177, 254, 255, 264, 269, 272 are preferred.

[0365] As the green coloring material, phthalocyanine compounds, squaric acid compounds, etc. can be cited, and phthalocyanine compounds are preferred. Further, the green coloring material is preferably a pigment.

[0366] As specific examples of the green coloring material, C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, 66 and other green pigments can be cited. Further, as the green coloring material, a zinc phthalocyanine halide pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. As a specific example, the compound described in International Publication No. 2015 / 118720 can be cited. Further, as the green coloring material, the compound described in paragraph 0029 of International Publication No. 2022 / 085485, the aluminum phthalocyanine compound described in Japanese Patent Application Laid-Open No. 2020-070426, the diarylmethane compound described in Japanese Patent Application Laid-Open No. 2020-504758, etc. can also be used.

[0367] As the green coloring material, C.I. Pigment Green 7, 36, 58, 62, 63 are preferred, and C.I. Pigment Green 36, 58 are more preferred.

[0368] As the orange colorant, diketopyrrolopyrrole compounds and the like can be cited. Further, the orange colorant is preferably a pigment. Specific examples of the orange colorant include orange pigments such as C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc.

[0369] As the yellow colorant, azo compounds, azomethine compounds, isoindoline compounds, pteridine compounds, quinophthalone compounds, and perylene compounds can be cited. Specific examples of the yellow colorant include yellow pigments such as C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc.

[0370] As the yellow colorant, a nickel complex of azobarbituric acid having the following structure can also be used.

[0371] [Chemical formula 24]

[0372]

[0373] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of International Publication No. 2022 / 085485, the methylene dyes described in Japanese Unexamined Patent Application Publication No. 2019-073695, and the methylene dyes described in Japanese Unexamined Patent Application Publication No. 2019-073696 can be used.

[0374] Examples of the purple coloring material include dioxazine compounds and indigo compounds. Specific examples of the purple coloring material include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0375] Examples of the blue coloring material include phthalocyanine compounds. Specific examples of the blue coloring material include blue pigments such as C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, 88. In addition, as the blue coloring material, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraph 0047 of JP-A-2011-157478.

[0376] Dyes can also be used as the colored coloring material used as Coloring Material B. There is no particular limitation on the dyes, and known dyes can be used. For example, pyrazole azo compounds, anilino azo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxacarbocyanine compounds, pyrazolotriazole azo compounds, pyridone azo compounds, polymethine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds, xanthene compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, pyrromethene compounds, etc. can be cited.

[0377] Two or more kinds of colored coloring materials can also be used in combination. When two or more kinds of colored coloring materials are used in combination, black can be formed by the combination of two or more kinds of colored coloring materials. As such combinations, for example, the following methods (1) to (7) can be cited.

[0378] (1) A method containing a red coloring material and a blue coloring material.

[0379] (2) A method containing a red coloring material, a blue coloring material, and a yellow coloring material.

[0380] (3) A method containing a red coloring material, a blue coloring material, a yellow coloring material, and a purple coloring material.

[0381] (4) A method containing a red coloring material, a blue coloring material, a yellow coloring material, a purple coloring material, and a green coloring material.

[0382] (5) A method containing a red coloring material, a blue coloring material, a yellow coloring material, and a green coloring material.

[0383] (6) A method containing a red coloring material, a blue coloring material, and a green coloring material.

[0384] (7) A method containing a yellow coloring material and a purple coloring material.

[0385] The infrared absorbing colorant used as colorant B is preferably a compound having a maximum absorption wavelength on the long wavelength side greater than a wavelength of 700 nm, more preferably a compound having a maximum absorption wavelength in the range of greater than 700 nm and 1000 nm or less in wavelength. Further, the infrared absorbing colorant is preferably a pigment.

[0386] Examples of the infrared absorbing colorant include pyrrolopyrrole compounds, polymethine compounds, squaric acid compounds, phthalocyanine compounds, naphthalocyanine compounds, squarylium compounds, merocyanine compounds, xanthene compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, indigo compounds, and dithiolene metal complexes. From the reasons that the aggregation of the above compound A can be further effectively inhibited and the lithography and storage stability can be further improved, at least one selected from pyrrolopyrrole compounds, polymethine compounds, squaric acid compounds, phthalocyanine compounds, and naphthalocyanine compounds is preferred.

[0387] Examples of the pyrrolopyrrole compounds include the compounds described in paragraphs 0016 to 0058 of JP-A No. 2009-263614, the compounds described in paragraphs 0037 to 0052 of JP-A No. 2011-068731, the compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873, and the like. Examples of the squaric acid compounds include the compounds described in paragraphs 0044 to 0049 of JP-A No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, the compound described in paragraph 0040 of WO 2016 / 181987, the compounds described in JP-A No. 2015-176046, the compound described in paragraph 0072 of WO 2016 / 190162, the compounds described in paragraphs 0196 to 0228 of JP-A No. 2016-074649, the compound described in paragraph 0124 of JP-A No. 2017-067963, the compounds described in WO 2017 / 135359, the compounds described in JP-A No. 2017-114956, the compounds described in Japanese Patent No. 6197940, the compounds described in WO 2016 / 120166, the compounds described in Table 1 of US Patent No. 11261172, and the like. Examples of the polymethine compounds include the compounds described in paragraphs 0044 to 0045 of JP-A No. 2009-108267, the compounds described in paragraphs 0026 to 0030 of JP-A No. 2002-194040, the compounds described in JP-A No. 2015-172004, the compounds described in JP-A No. 2015-172102, the compounds described in JP-A No. 2008-088426, the compound described in paragraph 0090 of WO 2016 / 190162, the compounds described in JP-A No. 2017-031394, the compounds described in JP-A No. 2021-134350, the compounds described in WO 2021 / 085372, the compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422, and the like. Examples of the croconium compounds include the compounds described in JP-A No. 2017-082029 and the compounds described in JP-A No. 2016-079331. Examples of the iminium compounds include the compounds described in JP-T No. 2008-528706, the compounds described in JP-A No. 2012-012399, the compounds described in JP-A No. 2007-092060, and the compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564.As phthalocyanine compounds, examples thereof include the compounds described in paragraph 0093 of Japanese Unexamined Patent Application Publication No. 2012-077153, titanium-oxyphthalocyanine described in Japanese Unexamined Patent Application Publication No. 2006-343631, the compounds described in paragraphs 0013 to 0029 of Japanese Unexamined Patent Application Publication No. 2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and the compounds described in International Publication No. 2020 / 071470. As naphthalocyanine compounds, examples thereof include the compounds described in paragraph 0093 of Japanese Unexamined Patent Application Publication No. 2012-077153 and the compounds described in Japanese Unexamined Patent Application Publication No. 2022-173080. As indigo compounds, examples thereof include the compounds described in Japanese Unexamined Patent Application Publication No. 2022-173080. As dithiolene metal complexes, examples thereof include the compounds described in Japanese Patent No. 5733804.

[0388] As infrared absorbing color materials, it is also possible to use squaric acid compounds described in Japanese Unexamined Patent Application Publication No. 2017-197437, squaric acid compounds described in Japanese Unexamined Patent Application Publication No. 2017-025311, squaric acid compounds described in International Publication No. 2016 / 154782, squaric acid compounds described in Japanese Patent No. 5884953, squaric acid compounds described in Japanese Patent No. 6036689, squaric acid compounds described in Japanese Patent No. 5810604, squaric acid compounds described in paragraphs 0090 to 0107 of International Publication No. 2017 / 213047, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of Japanese Unexamined Patent Application Publication No. 2018-054760, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of Japanese Unexamined Patent Application Publication No. 2018-040955, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of Japanese Unexamined Patent Application Publication No. 2018-002773, squaric acid compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of Japanese Unexamined Patent Application Publication No. 2018-041047, amide-linked squaric acid compounds described in Japanese Unexamined Patent Application Publication No. 2017-179131, compounds having a pyrrole double-type squaric acid skeleton or a croconium skeleton described in Japanese Unexamined Patent Application Publication No. 2017-141215, dihydrocarbazole double-type squaric acid compounds described in Japanese Unexamined Patent Application Publication No. 2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of Japanese Unexamined Patent Application Publication No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in Japanese Unexamined Patent Application Publication No. 2017-067963, phthalocyanine compounds described in Japanese Patent No. 6251530, and the like.

[0389] The content of coloring material B in the total solid components of the photosensitive composition is preferably 5 to 50% by mass. The lower limit is preferably 10% by mass or more, more preferably 15% by mass or more. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less.

[0390] Moreover, the content of coloring material B is preferably 20 to 200 parts by mass with respect to 100 parts by mass of the above compound A. The lower limit is preferably 30 parts by mass or more, more preferably 40 parts by mass or more. The upper limit is preferably 160 parts by mass or less, more preferably 120 parts by mass or less.

[0391] The photosensitive composition may contain only one kind of coloring material B, or may contain two or more kinds. When two or more kinds are included, the total amount thereof is preferably within the above range.

[0392] 《Polymerizable Compound》

[0393] The photosensitive composition of the present invention contains a polymerizable compound. Examples of the polymerizable compound include compounds having a group containing an ethylenically unsaturated bond. Examples of the group containing an ethylenically unsaturated bond include vinyl, (meth)allyl, (meth)acryloyl, etc. The polymerizable compound used in the present invention is preferably a radical polymerizable compound.

[0394] The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, an oligomer, etc., and is preferably a monomer. The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more.

[0395] The polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraphs 0254 to 0257 of JP-A-2008-292970, paragraphs 0034 to 0038 of JP-A-2013-253224, paragraph 0477 of JP-A-2012-208494, JP-A-2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and JP-A-2017-194662, and these contents are incorporated into the present specification.

[0396] Examples of the polymerizable compound include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPH; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), and compounds having a structure in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454 and SR499 commercially available from SARTOMER Company, Inc.). Further, examples of the polymerizable compound also include diglycerol E0 (ethylene oxide) modified (meth)acrylate (commercially available product: M-460; manufactured by TOAGOSEI CO., LTD.), pentaerythritol tetraacrylate (NK ESTER A-TMMT manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006 and 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-AO (manufactured by KYOEISHA CHEMICAL Co., LTD.), etc.

[0397] As the polymerizable compound, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, pentaerythritol tri(meth)acrylate, etc. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.), etc.

[0398] As the polymerizable compound, it is preferable to use a polymerizable compound having a urethane bond. By using such a polymerizable compound, the heat resistance of the obtained film can be further improved. The reason for obtaining such an effect is presumably that a physical crosslinked structure based on intermolecular hydrogen bonds is formed at the urethane bond part.

[0399] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylate obtained by reacting a polyfunctional isocyanate with a (meth)acrylate having a hydroxyl group, and urethane (meth)acrylate obtained by reacting a polyfunctional isocyanate with a polyol and then further reacting a (meth)acrylate having a hydroxyl group.

[0400] Examples of the (meth)acrylate having the above hydroxyl group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol ethylene oxide-modified hexa(meth)acrylate, dipentaerythritol propylene oxide-modified hexa(meth)acrylate, dipentaerythritol caprolactone-modified hexa(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, reaction product of an epoxy group-containing compound and a carboxy (meth)acrylate, hydroxyl group-containing polyol polyacrylate, etc.

[0401] Examples of the above polyfunctional isocyanates include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, and xylene diisocyanate; biuret bodies, isocyanurate bodies, and trimethylolpropane adducts thereof.

[0402] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of Japanese Unexamined Patent Application Publication No. 2022-173080 can also be used.

[0403] When a polymerizable compound having a urethane bond is used as the polymerizable compound, the content of the polymerizable compound having a urethane bond in the total amount of the polymerizable compounds contained in the photosensitive composition is preferably 50% by mass or more, more preferably 70% by mass or more, and still more preferably 90% by mass or more.

[0404] Polymerizable compounds can also be polymerizable compounds having acid groups such as carboxyl groups, sulfonic acid groups, and phosphoric acid groups. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like.

[0405] Polymerizable compounds can also be polymerizable compounds having a caprolactone structure. Regarding the compounds having a caprolactone structure, reference can be made to the description in paragraphs 0042 to 0045 of Japanese Unexamined Patent Application Publication No. 2013-253224, and this content is incorporated herein. Regarding the compounds having a caprolactone structure, for example, DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available as a series by Nippon Kayaku Co., Ltd., can be mentioned.

[0406] Polymerizable compounds can also be polymerizable compounds having a group containing an ethylenically unsaturated bond and an alkyleneoxy group. Such polymerizable compounds are preferably polymerizable compounds having a group containing an ethylenically unsaturated bond and ethyleneoxy and / or propyleneoxy groups, more preferably polymerizable compounds having a group containing an ethylenically unsaturated bond and ethyleneoxy groups, and still more preferably 3- to 6-functional (meth)acrylate compounds having 4 to 20 ethyleneoxy groups. Commercially available products include, for example, SR-494, which is a 4-functional (meth)acrylate having 4 ethyleneoxy groups and is manufactured by SARTOMER Company, Inc., and KAYARAD TPA-330, which is a 3-functional (meth)acrylate having 3 isobutenoxy groups and is manufactured by Nippon Kayaku Co., Ltd.

[0407] Polymeric compounds can also use polymeric compounds having a fluorene skeleton. As commercially available products, OGSOLEA-0200, EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton), etc. can be cited.

[0408] In the total solid content of the photosensitive composition, the content of the polymeric compound is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more, and further preferably 3% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less. The photosensitive composition may contain only one type of polymeric compound or may contain two or more types. When containing two or more types, the total amount thereof is preferably within the above range.

[0409] "Photoinitiator"

[0410] The photosensitive composition of the present invention contains a photoinitiator. There is no particular limitation on the photoinitiator, and it can be appropriately selected from known photoinitiators. For example, compounds that are sensitive to light in the ultraviolet region to the visible region are preferred. The photoinitiator is preferably a photo radical polymerization initiator.

[0411] As the photopolymerization initiator, halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-amino ketone compounds, etc. can be mentioned. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyldimethyl ketal compound, an α-hydroxy ketone compound, an α-amino ketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyl oxadiazole compound, and a 3-aryl-substituted coumarin compound, more preferably a compound selected from oxime compounds, α-hydroxy ketone compounds, α-amino ketone compounds, and acylphosphine compounds, and still more preferably an oxime compound. Further, as the photopolymerization initiator, compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, compounds described in JP-B-6301489, peroxide-based photopolymerization initiators described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, photopolymerization initiators described in WO 2018 / 221177, photopolymerization initiators described in WO 2018 / 110179, photopolymerization initiators described in JP-A-2019-043864, photopolymerization initiators described in JP-A-2019-044030, peroxide-based initiators described in JP-A-2019-167313, aminobenzophenone-based initiators having an oxazolidinyl group described in JP-A-2020-055992, oxime-based photopolymerization initiators described in JP-A-2013-190459, polymers described in JP-A-2020-172619, compounds represented by Formula 1 described in WO 2020 / 152120, compounds described in JP-A-2021-181406, etc. are mentioned, and these are incorporated into the present specification.

[0412] As a specific example of the hexaarylbiimidazole compound, 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole etc. can be mentioned.

[0413] Examples of commercially available α-hydroxy ketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Examples of commercially available α-amino ketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (manufactured by BASF), etc.

[0414] Examples of the oxime compound include the compounds described in JP-A-2001-233842, the compounds described in JP-A-2000-080068, the compounds described in JP-A-2006-342166, the compounds described in J.C.S. Perkin II (1979, pp. 1653-1660), the compounds described in J.C.S. Perkin II (1979, pp. 156-162), the compounds described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), the compounds described in JP-A-2000-066385, the compounds described in JP-T-2004-534797, the compounds described in JP-A-2006-342166, the compounds described in JP-A-2017-019766, the compounds described in JP-B-6065596, the compounds described in WO 2015 / 152153, the compounds described in WO 2017 / 051680, the compounds described in JP-A-2017-198865, the compounds described in paragraphs 0025 to 0038 of WO 2017 / 164127, WO 2013 / 167515, WO 2017 / 169819, the compounds described in paragraphs 0029 to 0044 of JP-A-2019-168654, the compounds represented by the general formula (1) or the compounds described in paragraphs 0022 to 0024 of JP-A-2021-173858, the compounds represented by the general formula (1) or the compounds described in paragraphs 0117 to 0120 of JP-A-2021-170089, etc. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyimino-pentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetoxime), etc.As commercial products, Irgacure OXEO 1, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (the above are manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-327 (manufactured by TRONLY), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, photoinitiator 2 described in Japanese Unexamined Patent Application Publication No. 2012-014052) can be cited. Further, as the oxime compound, a compound having no coloring property or a compound having high transparency and being less likely to change color is also preferably used. As commercial products, ADEKA ARKLS NCI-730, NCI-831, NCI-930 (the above are manufactured by ADEKA CORPORATION), etc. can be cited.

[0415] As the photoinitiator, an oxime compound having a fluorene ring can also be used. Specific examples of the oxime compound having a fluorene ring include the compounds described in Japanese Unexamined Patent Application Publication No. 2014-137466, Japanese Patent No. 6636081, Korean Patent Publication No. 10-2016-0109444, fluorenylaminoketone photoinitiators described in Japanese Patent Application Laid-Open No. 2020-507664, and oxime ester compounds described in International Publication No. 2021 / 023144.

[0416] As the photoinitiator, an oxime compound in which at least one benzene ring having a carbazole ring becomes a naphthalene ring skeleton can also be used. Specific examples of such an oxime compound include the compounds described in International Publication No. 2013 / 083505.

[0417] As the photoinitiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in Japanese Unexamined Patent Application Publication No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Laid-Open No. 2014-500852, and compound (C-3) described in Japanese Unexamined Patent Application Publication No. 2013-164471.

[0418] As a photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is also preferably set as a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249, paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, and ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

[0419] As a photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015 / 036910.

[0420] As a photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include the compounds described in International Publication No. 2019 / 088055.

[0421] Specific examples of the oxime compounds preferably used in the present invention are shown below, but the present invention is not limited to these.

[0422] [Chemical formula 25]

[0423]

[0424] [Chemical formula 26]

[0425]

[0426] [Chemical formula 27]

[0427]

[0428] [Chemical formula 28]

[0429]

[0430] The oxime compound is preferably a compound having a maximum absorption wavelength in the range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the range of 360 to 480 nm. Further, from the viewpoint of sensitivity, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, still more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar extinction coefficient of the compound can be measured by a known method. For example, it is preferably measured at a concentration of 0.01 g / L using ethyl acetate as a solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

[0431] As the photopolymerization initiator, a bifunctional or higher trifunctional photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, and thus good sensitivity can be obtained. Further, when a compound having an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent or the like becomes high, and it becomes difficult to precipitate over time, whereby the stability over time of the photosensitive composition can be improved. Specific examples of the bifunctional or higher trifunctional photoradical polymerization initiator include the dimer of the oxime compound described in paragraphs 0407 to 0412 of JP-T-2010-527339, JP-T-2011-524436, WO 2015 / 004565, paragraphs 0407 to 0412 of JP-T-2016-532675, paragraphs 0039 to 0055 of WO 2017 / 033680; compound (E) and compound (G) described in JP-T-2013-522445; Cmpdl-7 described in WO 2016 / 034963; the oxime ester-based initiator described in paragraph 0007 of JP-T-2017-523465; the photopolymerization initiator described in paragraphs 0020 to 0033 of JP-A-2017-167399; the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP-A-2017-151342; the oxime ester-based initiator described in JP-B-6469669; the photopolymerization initiator having two oxime groups described in JP-A-2022-181171, and the like.

[0432] The content of the photopolymerization initiator in the total solid components of the photosensitive composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is preferably 20% by mass or less, more preferably 15% by mass or less. The photosensitive composition may contain only one kind of photopolymerization initiator, or may contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0433] 《Solvent》

[0434] The photosensitive composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of the organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents and the like. For the detailed content thereof, reference can be made to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein by reference. Also, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can be preferably used. Specific examples of the organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol and the like. However, sometimes for environmental reasons and the like, it is preferred to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents (for example, it can be set to 50 mass ppm (parts per million) or less, or can be set to 10 mass ppm or less, or can be set to 1 mass ppm or less) relative to the total amount of organic solvents.

[0435] In the present invention, an organic solvent with a low metal content is preferably used, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less, for example. An organic solvent at the mass ppt (parts per trillion) level can be used as needed. Such organic solvents are provided by, for example, Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

[0436] As a method for removing impurities such as metals from the organic solvent, for example, distillation (molecular distillation, thin-film distillation, etc.) or filtration using a filter can be cited. The pore diameter of the filter for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0437] The organic solvent may contain isomers (compounds with the same number of atoms but different structures). Moreover, only one type of isomer may be contained, or multiple types may be contained.

[0438] The content rate of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially free of peroxide.

[0439] The content of the solvent in the photosensitive composition is preferably 10 to 97 mass%. The lower limit is preferably 30 mass% or more, more preferably 40 mass% or more, further preferably 50 mass% or more, still more preferably 60 mass% or more, and particularly preferably 70 mass% or more. The upper limit is preferably 96 mass% or less, and more preferably 95 mass% or less. The photosensitive composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0440] 《Resin》

[0441] The photosensitive composition of the present invention preferably contains a resin. The resin is formulated, for example, for the purpose of dispersing pigments or the like in the photosensitive composition or as an adhesive. In addition, a resin mainly used for dispersing pigments or the like in the photosensitive composition is also referred to as a dispersant. However, such uses of the resin are just examples, and the resin can also be used for purposes other than such uses.

[0442] The weight average molecular weight of the resin is preferably 3000 to 2000000. The upper limit is preferably 1000000 or less, and more preferably 500000 or less. The lower limit is preferably 4000 or more, and more preferably 5000 or more.

[0443] Examples of the resin include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polystyrene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, polyurea resins, etc. Among these resins, one type can be used alone, or two or more types can be used in combination. From the viewpoint of improving heat resistance, the cyclic olefin resin is preferably a norbornene resin. Examples of commercially available norbornene resins include the ARTON series manufactured by JSR Corporation (e.g., ARTON F4520). Also, as the resin, the resins described in the examples of International Publication No. 2016 / 088645, the resins described in Japanese Patent Application Laid-Open No. 2017-057265, the resins described in Japanese Patent Application Laid-Open No. 2017-032685, the resins described in Japanese Patent Application Laid-Open No. 2017-075248, the resins described in Japanese Patent Application Laid-Open No. 2017-066240, the resins described in Japanese Patent Application Laid-Open No. 2017-167513, the resins described in Japanese Patent Application Laid-Open No. 2017-173787, the resins described in paragraphs 0041 to 0060 of Japanese Patent Application Laid-Open No. 2017-206689, the resins described in paragraphs 0022 to 0071 of Japanese Patent Application Laid-Open No. 2018-010856, the blocked polyisocyanate resin described in Japanese Patent Application Laid-Open No. 2016-222891, the resins described in Japanese Patent Application Laid-Open No. 2020-122052, the resins described in Japanese Patent Application Laid-Open No. 2020-111656, the resins described in Japanese Patent Application Laid-Open No. 2020-139021, and the resin described in Japanese Patent Application Laid-Open No. 2017-138503 that contains a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. Also, as the resin, a resin having a fluorene skeleton can be preferably used. Regarding the resin having a fluorene skeleton, reference can be made to the description in the specification of U.S. Patent Application Publication No. 2017 / 0102610, and this content is incorporated herein. Also, as the resin, the resins described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resins described in Japanese Patent Application Laid-Open No. 2021-134350, and the resins described in Japanese Patent Application Laid-Open No. 2022-174597 can be used.

[0444] As the resin, a resin having an acid group is preferably used. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group, etc. These acid groups may be only one type, or two or more types. The resin having an acid group can also be used as a dispersant or an alkali-soluble resin. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, further preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0445] As the resin, a resin having a polymerizable group is also preferably used. Examples of the polymerizable group include groups containing an ethylenic unsaturated bond such as a vinyl group, a (meth)allyl group, a (meth)acryloyl group, etc.

[0446] As the resin, a resin having a cyclic structure in the main chain is preferably used. By using such a resin, a film having more excellent heat resistance can be formed.

[0447] The resin having a cyclic structure in the main chain is preferably a resin having a repeating unit derived from the compound represented by formula (C-1) to (C-3).

[0448] [Chemical formula 29]

[0449]

[0450] In formula (C-1), Rc 1 and Rc 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. Examples of Rc 1 and Rc 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, tert-pentyl, stearyl, lauryl, cyclohexyl, ethylhexyl, methoxyethyl, ethoxyethyl, benzyl, etc., and preferably methyl, ethyl, cyclohexyl or benzyl.

[0451] In formula (C-2), Re 3 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. Rc 3 includes linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-pentyl, stearyl, lauryl, 2-ethylhexyl; aryl groups such as phenyl; alicyclic groups such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecyl, isobornyl, adamantyl, 2-methyl-2-adamantyl; alkyl groups substituted with an alkoxy group such as 1-methoxyethyl, 1-ethoxyethyl; alkyl groups substituted with an aryl group such as benzyl (aralkyl); etc., and preferably methyl, ethyl, cyclohexyl or benzyl.

[0452] In the general formula (C-3), Rc 4 represents a hydrocarbon group having 1 to 20 carbon atoms which may have substituents. As Rc 4 specific examples include phenyl, benzyl, naphthyl, cyclohexyl, methyl, ethyl, propyl, etc., and benzyl is preferred.

[0453] In the resin having a cyclic structure in the main chain, the content of the repeating unit derived from the compounds represented by the general formulas (C-1) to (C-3) is preferably 5 to 50 mol%.

[0454] The resin having a cyclic structure in the main chain preferably further contains a repeating unit having an acid group. As the acid group, for example, carboxyl group, phosphoric acid group, sulfo group, phenolic hydroxyl group, etc. can be mentioned, and carboxyl group is preferred. The content of the repeating unit having an acid group in the resin having a cyclic structure in the main chain is preferably 5 to 30 mol%.

[0455] The resin having a cyclic structure in the main chain is preferably an alkali-soluble resin. The acid value of the resin having a cyclic structure in the main chain is preferably 20 to 300 mgKOH / g, more preferably 50 to 200 mgKOH / g. The weight average molecular weight of the resin having a cyclic structure in the main chain is preferably 10,000 to 100,000, more preferably 10,000 to 80,000. And the number average molecular weight is preferably 5,000 to 50,000.

[0456] The resin having a cyclic structure in the main chain may contain a repeating unit having a polymerizable group. The content of the repeating unit having a polymerizable group in the resin having a cyclic structure in the main chain is preferably 50 mol% or less, more preferably 40 mol% or less, further preferably 30 mol% or less. The lower limit can be set to 1 mol% or more, and can also be set to 5 mol% or more.

[0457] As the resin, a resin containing a repeating unit derived from the compound represented by the general formula (X) is also preferably used.

[0458] [Chemical formula 30]

[0459]

[0460] In the formula, R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 each independently represents an alkylene group, and n represents an integer of 0 to 15. R 21 and R 22The number of carbon atoms of the represented alkylene group is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and still more preferably an integer of 0 to 3.

[0461] Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide-modified (meth)acrylate of para-cumyl phenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.).

[0462] The photosensitive composition of the present invention preferably contains a resin as a dispersant. Examples of the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is more than the amount of basic groups. When the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, the acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol% or more. The acid groups possessed by the acidic dispersant (acidic resin) are preferably carboxyl groups. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. And the basic dispersant (basic resin) refers to a resin in which the amount of basic groups is more than the amount of acid groups. When the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, the basic dispersant is preferably a resin in which the amount of basic groups exceeds 50 mol%. The basic groups possessed by the basic dispersant are preferably amino groups.

[0463] The resin used as the dispersant is also preferably a graft resin. For the detailed content of the graft resin, reference can be made to the descriptions in paragraphs 0025 to 0094 of Japanese Patent Laid-Open No. 2012-255128, and this content is incorporated into the present specification.

[0464] The resin used as the dispersant is also preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. As the polyimine-based dispersant, a resin having a main chain and a side chain and having a basic nitrogen atom in at least one of the main chain and the side chain is preferred. The main chain includes a partial structure having a functional group with a pKa of 14 or less, and the side chain has 40 to 10,000 atoms. The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom having basicity. For the polyimine-based dispersant, reference can be made to the descriptions in paragraphs 0022 to 0097 of Japanese Patent Laid-Open No. 2009-203462 and paragraphs 0102 to 0166 of Japanese Patent Laid-Open No. 2012-255128, and these contents are incorporated into the present specification.

[0465] The resin used as a dispersant is also preferably a resin having a structure in which a plurality of polymer chains are bonded to the core. As such resins, for example, dendritic polymers (including star polymers) can be mentioned. And, as specific examples of dendritic polymers, the high molecular compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Unexamined Patent Application Publication No. 2013-043962 can be mentioned, etc.

[0466] The resin used as a dispersant is also preferably a resin containing a repeating unit having a group containing an ethylenically unsaturated bond in the side chain. The content of the repeating unit having a group containing an ethylenically unsaturated bond in the side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and still more preferably 20 to 70 mol% in all the repeating units of the resin.

[0467] As the dispersant, the resins described in Japanese Unexamined Patent Application Publication No. 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077, the polyethyleneimine having a polyester side chain described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having an acrylamide structural unit described in Japanese Unexamined Patent Application Publication No. 2020-066687, the block polymer having an acrylamide structural unit described in Japanese Unexamined Patent Application Publication No. 2020-066688, the dispersant described in International Publication No. 2016 / 104803, etc. can also be used.

[0468] The dispersant can also be obtained as a commercial product. As such specific examples, the DISPERBYK series manufactured by BYK-Chemie GmbH, the SOLSPERSE series manufactured by Japan Lubrizol Corporation, the Efka series manufactured by BASF Corporation, the Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc., etc. can be mentioned. And, the products described in paragraph 0129 of Japanese Unexamined Patent Application Publication No. 2012-137564 and the products described in paragraph 0235 of Japanese Unexamined Patent Application Publication No. 2017-194662 can also be used as the dispersant.

[0469] The content of the resin in the total solid components of the photosensitive composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, still more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 45% by mass or less, more preferably 40% by mass or less, still more preferably 30% by mass or less. The photosensitive composition of the present invention may contain only 1 kind of resin, or may contain 2 or more kinds. When containing 2 or more kinds of resins, the total amount thereof is preferably within the above range.

[0470] "Pigment Derivative"

[0471] The photosensitive composition of the present invention can also contain a pigment derivative. The pigment derivative can be used as a dispersion aid. A dispersion aid refers to a material used to improve the dispersibility of a pigment in a composition.

[0472] As the pigment derivative, a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group can be cited.

[0473] As the above-mentioned pigment structure, an azulaphthalocyanine pigment structure, a squaric acid pigment structure, a pyrrolopyrrole pigment structure, a diketopyrrolopyrrole pigment structure, a quinacridone pigment structure, an anthraquinone pigment structure, a dianthraquinone pigment structure, a benzisoindole pigment structure, a thiazine indigo pigment structure, an azo pigment structure, a quinophthalone pigment structure, a phthalocyanine pigment structure, a naphthalocyanine pigment structure, a dioxazine pigment structure, a perylene pigment structure, a violanthrone pigment structure, a benzimidazolone pigment structure, a benzothiazole pigment structure, a benzimidazole pigment structure, and a benzoxazole pigment structure can be cited. Preferably, an azulaphthalocyanine pigment structure, a squaric acid pigment structure, a pyrrolopyrrole pigment structure, a diketopyrrolopyrrole pigment structure, a phthalocyanine pigment structure, a quinacridone pigment structure, or a benzimidazolone pigment structure.

[0474] As the acid group of the pigment derivative, a carboxyl group, a sulfo group, a phosphoric acid group, a boric acid group, a carboxamide group, a sulfonamide group, an imidic acid group, and salts thereof can be cited. As the atom or atomic group constituting the salt, an alkali metal ion (Li + , Na + , K + , etc.), an alkaline earth metal ion (Ca 2+ , Mg 2+ , etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, a phosphonium ion, etc. can be cited. As the carboxamide group, a group represented by -NHCOR X1 is preferred. As the sulfonamide group, a group represented by -NHSO2R X2 is preferred. As the imidic acid group, a group represented by -SO2NHSO2R X3 , -CONHSO2R X4 , -CONHCOR X5 , or -SO2NHCOR X6 is preferred, and more preferably -SO2NHSO2R X3 . R X1 to R X6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R X1 to R X6 may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred.

[0475] Examples of the basic group as a pigment derivative include an amino group, a pyridyl group and its salts, a salt of an ammonium group, and a phthalimidomethyl group. Examples of the atom or atomic group constituting the salt include a hydroxide ion, a halogen ion, a carboxylate ion, a sulfonate ion, a phenoxide ion, etc.

[0476] Specific examples of the pigment derivative include the compounds described in paragraphs 0037 to 0054 of International Publication No. 2016 / 035695, the compounds described in paragraphs 0061 to 0086 of International Publication No. 2017 / 146092, the compounds described in paragraphs 0017 to 0068 of International Publication No. 2018 / 230387, the compounds described in paragraphs 0085 to 0099 of International Publication No. 2020 / 054718, the compounds described in paragraph 0099 of International Publication No. 2020 / 054718, the compounds described in paragraph 0124 of International Publication No. 2022 / 085485, benzimidazolone compounds described in Japanese Patent Application Laid-Open No. 2018-168244, or salts thereof, compounds having an isoindoline skeleton represented by the general formula (1) described in Japanese Patent No. 6996282, etc.

[0477] The content of the pigment derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the pigment. The lower limit value is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit value is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. The photosensitive composition may contain only one kind of pigment derivative, or may contain two or more kinds. When two or more kinds are included, the total amount thereof is preferably within the above range.

[0478] 《Compound with a cyclic ether group》

[0479] The photosensitive composition of the present invention can contain a compound having a cyclic ether group. Examples of the compound having a cyclic ether group include a compound having an epoxy group, a compound having an oxetanyl group, etc., and a compound having an epoxy group is preferred. Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be set to 10 or less, for example, and can also be set to 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0480] The compound having a cyclic ether group may be a low-molecular compound (e.g., having a molecular weight of less than 1000) or a macromolecule (e.g., having a molecular weight of 1000 or more, and in the case of a polymer, having a weight-average molecular weight of 1000 or more). The weight-average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight-average molecular weight is preferably 10,000 or less, more preferably 5000 or less, and further preferably 3000 or less.

[0481] As the compound having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, the compounds described in paragraphs 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, the compounds described in paragraphs 0085 to 0092 of Japanese Patent Application Laid-Open No. 2014-089408, and the compounds described in Japanese Patent Application Laid-Open No. 2017-179172 can also be used.

[0482] Examples of commercially available products of compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, EX-850 (manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (manufactured by ADEKA CORPORATION), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (manufactured by ADEKA CORPORATION), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (manufactured by Daicel Corporation), CYCLOMER P ACA200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (manufactured by Mitsubishi Chemical Corporation), ARONE OXETANE OXT-121, OXT-221, OX-SQ, PNOX (manufactured by TOAGOSEI CO., LTD.), ADEKA GLYCIROL ED-505 (manufactured by ADEKA CORPORATION, containing an epoxy monomer), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF CORPORATION, containing an epoxy polymer), OXT-101, OXT-121, OXT-212, OXT-221 (manufactured by TOAGOSEI CO., LTD., containing an oxetanyl monomer), OXE-10, OXE-30 (manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., containing an oxetanyl monomer), and the like.

[0483] The content of the compound having a cyclic ether group in the total solid content of the photosensitive composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is preferably 15% by mass or less, more preferably 10% by mass or less. The photosensitive composition may contain only one kind of compound having a cyclic ether group, or may contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0484] 《Curing Agent》

[0485] When the photosensitive composition of the present invention contains a compound having a cyclic ether group, it preferably further contains a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, thiol compounds, etc. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, pentaerythritol tetra(3-mercaptopropionate), etc. Compounds described in paragraphs 0072 to 0078 of Japanese Patent Laid-Open No. 2016-075720 and compounds described in Japanese Patent Laid-Open No. 2017-036379 can also be used as the curing agent. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and further preferably 0.1 to 6.0 parts by mass with respect to 100 parts by mass of the compound having a cyclic ether group.

[0486] 《Antioxidant》

[0487] The photosensitive composition of the present invention can contain an antioxidant.

[0488] Examples of the antioxidant include antioxidants having at least one phosphorus atom in the molecule (hereinafter, also referred to as phosphorus-based antioxidants), phenolic antioxidants, amine-based antioxidants, phosphorus-based antioxidants, sulfur-based antioxidants, etc., and phosphorus-based antioxidants are preferred. It is also preferred to use a phosphorus-based antioxidant and a phenolic antioxidant simultaneously.

[0489] Examples of the phosphorus-based antioxidant include compounds having a structure represented by formula (p), and compounds represented by formula (p-1) to (p-3) are preferred.

[0490] [Chemical formula 31]

[0491]

[0492] In formula (p), * is a bonding bond.

[0493] [Chemical formula 32]

[0494]

[0495] In the formula, R p1 ~Rp5 Each independently represents a hydrogen atom; a halogen atom; a hydrocarbon group having 1 to 30 carbon atoms which may have a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom or a silicon atom; or a polar group, n represents an integer of 0 to 5, and m is 0 or 1.

[0496] As specific examples of the phosphorus-based antioxidant, compounds described in paragraph 0053 of Japanese Unexamined Patent Application Publication No. 2021-039369, tris[2-[[2,4,8,10-tetra(1,1-dimethylethyl)dibenz[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenz[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, bis(2,4-di-tert-butyl-6-methylphenyl) ethyl phosphite, tris(2,4-di-tert-butylphenyl) phosphite, etc. can be cited.

[0497] As the phenolic antioxidant, hindered phenol compounds can be cited. The phenolic antioxidant is preferably a compound having a substituent at a position (ortho-position) adjacent to the phenolic hydroxyl group. As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred.

[0498] As commercially available products of the antioxidant, for example, ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330, ADEKA STAB AO-412S, ADEKA STAB2112, ADEKA STAB PEP-8, ADEKA STAB PEP-36, ADEKA STAB HP-10, ADEKA STAB 2112, ADEKA STAB 2112RG, ADEKA STAB 1178, ADEKA STAB 1500, ADEKA STAB C, ADEKA STAB135A, ADEKA STAB 3010, ADEKA STAB TPP (the above are manufactured by ADEKA CORPORATION), JP-650 (manufactured by JOHOKU CHEMICAL CO., LTD.), etc. can be cited.

[0499] Antioxidants can also use the compounds described in paragraphs 0023 to 0048 of Japanese Patent Publication No. 6268967, the compounds described in International Publication No. 2017 / 006600, the compounds described in International Publication No. 2017 / 164024, and the compounds described in Korean Published Patent No. 10-2019-0059371.

[0500] The content of the antioxidant in the total solid components of the photosensitive composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. The photosensitive composition may contain only one kind of antioxidant or may contain two or more kinds. When two or more kinds are included, the total amount thereof is preferably within the above range.

[0501] 《Surfactant》

[0502] The photosensitive composition of the present invention can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants can be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. Regarding the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, and this content is incorporated into the present specification.

[0503] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of International Publication No. 2022 / 085485 can be used.

[0504] As the nonionic surfactant, the compounds described in paragraph 0174 of International Publication No. 2022 / 085485 can be cited.

[0505] Examples of silicone surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67Additive, 74 Additive, M Additive, SF 8419 OIL (manufactured by Dow Toray Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (manufactured by BYK-Chemie GmbH), and the like.

[0506] Moreover, a compound having the following structure can also be used as the silicone surfactant.

[0507] [Chemical Formula 33]

[0508]

[0509] The content of the surfactant in the total solid components of the photosensitive composition is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and still more preferably 0.001 to 0.2% by mass. The photosensitive composition may contain only one kind of surfactant or may contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0510] 《Polymerization inhibitor》

[0511] The photosensitive composition of the present invention can contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxylamine salts (ammonium salt, cerous salt, etc.), and p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid components of the photosensitive composition is preferably 0.0001 to 5% by mass. The photosensitive composition may contain only one kind of polymerization inhibitor or may contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0512] 《Silane coupling agent》

[0513] The photosensitive composition of the present invention can contain a silane coupling agent. As the silane coupling agent, a silane compound having a hydrolyzable group can be mentioned, and a silane compound having a hydrolyzable group and other functional groups is preferred. The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can form a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. As the hydrolyzable group, for example, a halogen atom, an alkoxy group, an acyloxy group, etc. can be mentioned, and an alkoxy group is preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. And, as the functional group other than the hydrolyzable group, for example, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a thioether group, an isocyanate group, a phenyl group, etc. can be mentioned, and an amino group, a (meth)acryloyl group, and an epoxy group are preferred. As a specific example of the silane coupling agent, the compounds described in paragraph 0177 of International Publication No. 2022 / 085485 and Japanese Patent Application Laid-Open No. 2019-183020 can be mentioned. The content of the silane coupling agent in the total solid content of the photosensitive composition is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass. The photosensitive composition can contain only one kind of silane coupling agent, or can contain two or more kinds. When two or more kinds are contained, the total amount thereof is preferably within the above range.

[0514] 《Ultraviolet Absorbent》

[0515] The photosensitive composition of the present invention can contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, amino diene compounds, salicylic acid ester compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, dibenzoyl, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Application Laid-Open No. 2013-068814, paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, paragraphs 0052 and 0074 of International Publication No. 2021 / 131355, and paragraphs 0022 to 0024 of International Publication No. 2021 / 132247. These are incorporated into this specification. Commercially available products of the ultraviolet absorber include Tinuvin series, Uvinul series, etc. manufactured by BASF. And as the benzotriazole compound, there is the MYUA series manufactured by MIYOSHIO OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). The ultraviolet absorber can also use the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, paragraphs 0059 to 0076 of International Publication No. 2016 / 181987, the thioaryl-substituted benzotriazole type ultraviolet absorber described in International Publication No. 2020 / 137819, and the reactive triazine ultraviolet absorber described in Japanese Patent Application Laid-Open No. 2021-178918. The content of the ultraviolet absorber in the total solid components of the photosensitive composition is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass. The photosensitive composition can contain only one kind of ultraviolet absorber or two or more kinds. When two or more kinds are contained, the total amount of these is preferably within the above range.

[0516] 《Other Components》

[0517] The photosensitive composition of the present invention may contain, as needed, a sensitizer, a curing accelerator, a filler, a thermal curing accelerator, a plasticizer, and other auxiliary agents (for example, conductive particles, an antifoaming agent, a flame retardant, a leveling agent, a peeling accelerator, a fragrance, a surface tension regulator, a chain transfer agent, etc.). By appropriately containing these components, properties such as film physical properties can be adjusted. For these components, for example, reference can be made to the descriptions in paragraphs 0183 et seq. of Japanese Unexamined Patent Application Publication No. 2012-003225 (corresponding to paragraphs 0237 of the specification of US Patent Application Publication No. 2013 / 0034812), paragraphs 0101 to 0104, 0107 to 0109 of Japanese Unexamined Patent Application Publication No. 2008-250074, paragraphs 0120 to 0123 of Japanese Unexamined Patent Application Publication No. 2022-184752, and these contents are incorporated into this specification. Further, the photosensitive composition of the present invention may contain a latent antioxidant as needed. As the latent antioxidant, the following compounds can be cited: a compound in which the site that functions as an antioxidant is protected by a protecting group and the protecting group is removed by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid / alkali catalyst to function as an antioxidant. As the latent antioxidant, the compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and Japanese Unexamined Patent Application Publication No. 2017-008219 can be cited. As commercially available products of the latent antioxidant, ADEKA ARKLSGPA-5001 (manufactured by ADEKA CORPORATION) etc. can be cited.

[0518] <Containing container>

[0519] The containing container for the photosensitive composition of the present invention is not particularly limited, and a publicly known containing container can be used. Further, as the containing container, the container described in paragraph 0187 of International Publication No. 2022 / 085485 can be used.

[0520] <Method for manufacturing a photosensitive composition>

[0521] The photosensitive composition of the present invention can be manufactured by mixing the above components. When manufacturing the photosensitive composition, all the components can be simultaneously dissolved or dispersed in a solvent to manufacture the photosensitive composition, or two or more kinds of solutions or dispersions prepared by appropriately formulating the respective components in advance can be prepared as needed, and these can be mixed at the time of use (coating) to manufacture the photosensitive composition.

[0522] When manufacturing a photosensitive composition, a pigment dispersion process may be included. In the pigment dispersion process, as the mechanical force for dispersing the pigment, compression, extrusion, impact, shear, cavitation, etc. can be cited. As specific examples of these processes, a bead mill, a sand mill, a roll mill, a ball mill, a paint stirrer, a microfluidizer, a high-speed impeller, a sand mixer, jet mixing, high-pressure wet atomization, ultrasonic dispersion, etc. can be cited. Further, in the pulverization of the pigment in a sand mill (bead mill), it is preferably carried out under conditions of improving the pulverization efficiency by using microbeads with a small diameter and increasing the filling rate of the microbeads. Further, after the pulverization treatment, it is preferable to remove coarse particles by filtration, centrifugation, etc. Further, regarding the pigment dispersion process and the dispersing machine, it is possible to preferably use "The Complete Collection of Dispersion Technologies, published by JOHOKIKO CO., LTD., July 15, 2005" or "Comprehensive Data Collection of Dispersion Technologies and Industrial Practical Applications Centering on Suspension (Solid / Liquid Dispersion System), published by the Publishing Department of the Business Development Center, October 10, 1978", and the processes and dispersing machines described in paragraph 0022 of Japanese Unexamined Patent Application Publication No. 2015-157893. Further, in the pigment dispersion process, the micronization treatment of the pigment can be carried out by a salt milling process. For example, the materials, equipment, treatment conditions, etc. used in the salt milling process can refer to the descriptions in Japanese Unexamined Patent Application Publication No. 2015-194521 and Japanese Unexamined Patent Application Publication No. 2012-046629. As the microbead material for dispersion, zirconia, agate, quartz, titanium dioxide, tungsten carbide, silicon nitride, alumina, stainless steel, and glass can be cited. Further, inorganic compounds with a Mohs hardness of 2 or more can also be used as the microbeads. The photosensitive composition may contain 1 to 10,000 ppm of the above microbeads.

[0523] When manufacturing a photosensitive composition, for the purpose of removing foreign substances, reducing defects, etc., it is preferable to filter the photosensitive composition with a filter. As the types of filters and the filtering methods for filtering, the filters and filtering methods described in paragraphs 0196 to 0199 of International Publication No. 2022 / 085485 can be cited.

[0524] <Film>

[0525] Next, the film of the present invention will be described. The film of the present invention is obtained from the above photosensitive composition of the present invention. The film of the present invention can preferably be used as a light filter. The use of the light filter is not particularly limited, and examples include an infrared cut-off filter, an infrared transmission filter, etc., and an infrared transmission filter is preferred.

[0526] The film thickness of the film of the present invention can be appropriately adjusted according to the purpose, and is preferably 0.1 to 20 μm. The upper limit of the film thickness is preferably 10 μm or less, more preferably 5 μm or less, still more preferably 3 μm or less, and particularly preferably 1.5 μm or less. The lower limit of the film thickness is preferably 0.2 μm or more, more preferably 0.3 μm or more.

[0527] When the film of the present invention is used as an infrared transmission filter, the film of the present invention preferably has any one of the following spectral characteristics (i1) to (i3), for example.

[0528] (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light having a wavelength greater than 950 nm.

[0529] (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light having a wavelength greater than 1050 nm.

[0530] (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light having a wavelength greater than 1150 nm.

[0531] The film of the present invention can be used in various devices such as solid-state imaging elements such as CCD (charge-coupled device) and CMOS (complementary metal-oxide-semiconductor), infrared sensors, and image display devices.

[0532] The film of the present invention can also be used as an infrared transmission film provided in an infrared communication opening formed in a frame portion of a protection plate for a display device.

[0533] <Method for forming a pattern>

[0534] A method for forming a pattern by lithography using the photosensitive composition of the present invention will be described. The method for forming a pattern by lithography preferably includes: a step of coating the photosensitive composition on a support to form a photosensitive composition layer; a step of exposing the photosensitive composition layer in a pattern (exposure step); and a step of developing the exposed photosensitive composition layer to remove the unexposed portion of the photosensitive composition layer (development step).

[0535] The support is not particularly limited and can be appropriately selected according to the use. For example, a transparent substrate, a silicon substrate, etc. can be mentioned. A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. can be formed on the silicon substrate. And sometimes a black matrix for isolating each pixel is formed on the silicon substrate. And in order to improve the adhesion with the upper layer, prevent the diffusion of substances, or planarize the substrate surface, a base layer can be provided on the silicon substrate. When measured with diiodomethane, the surface contact angle of the base layer is preferably 20 to 70°. And when measured with water, it is preferably 30 to 80°. The transparent substrate is not particularly limited as long as it is made of a material that can transmit at least visible light. For example, substrates made of materials such as glass and resin can be mentioned. As the resin, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene / vinyl acetate copolymer, norbornene resin, acrylate resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, etc. can be mentioned. As the glass, soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, copper-containing glass, etc. can be mentioned. As the copper-containing glass, copper-containing phosphate glass, copper-containing fluorophosphate glass, etc. can be mentioned. Commercially available products can also be used for the copper-containing glass. As commercially available products of copper-containing glass, NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.) etc. can be mentioned.

[0536] As a coating method of the photosensitive composition, known methods can be used. For example, the dropwise addition method (drop coating); the slit coating method; the spraying method; the roll coating method; the spin coating method (spin coating); the casting coating method; the slit and spin coating method; the pre-wetting method (for example, the method described in Japanese Patent Application Laid-Open No. 2009-145395); various printing methods such as inkjet (for example, the on-demand method, the piezoelectric method, the thermal method), nozzle jet printing, flexographic printing, screen printing, gravure printing, offset printing, metal mask printing, etc.; the transfer method using a mold, etc.; the nanoimprint method, etc. The applicable method in inkjet is not particularly limited. For example, the method shown in "Expansion and Use of Inkjet - Infinite Possibilities Appearing in Patents -", published in February 2005, SumitbeTechon Research Co., Ltd. (especially pages 115 to 133) or the methods described in Japanese Patent Application Laid-Open No. 2003-262716, Japanese Patent Application Laid-Open No. 2003-185831, Japanese Patent Application Laid-Open No. 2003-261827, Japanese Patent Application Laid-Open No. 2012-126830, Japanese Patent Application Laid-Open No. 2006-169325, etc. can be cited.

[0537] The photosensitive composition layer formed by coating the photosensitive composition can be dried (pre-baked). When pre-baking, the pre-baking temperature is preferably 150 °C or lower, more preferably 120 °C or lower, and further preferably 110 °C or lower. The lower limit can be set, for example, to 50 °C or higher, and can also be set to 80 °C or higher. The pre-baking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be carried out using a hot plate, an oven, etc.

[0538] In the exposure step, the photosensitive composition layer is exposed in a pattern. For example, using a step exposure machine or a scanning exposure machine, etc., the photosensitive composition layer is exposed through a mask having a predetermined mask pattern, whereby exposure in a pattern can be carried out. Thereby, the exposed portion can be cured.

[0539] As the radiation (light) that can be used during exposure, g-rays, i-rays, etc. can be cited. And light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can also be used. As the light having a wavelength of 300 nm or less, KrF rays (wavelength 248 nm), ArF rays (wavelength 193 nm), etc. can be cited, and KrF rays (wavelength 248 nm) are preferred. And a long-wavelength light source of 300 nm or more can also be utilized.

[0540] Further, during exposure, continuous light irradiation can be performed for exposure, or pulsed irradiation can be performed for exposure (pulse exposure). Additionally, pulse exposure is an exposure method in which light irradiation and pause are repeatedly performed in a short cycle (e.g., less than milliseconds) for exposure.

[0541] The irradiation dose (exposure dose) is, for example, preferably 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 . The oxygen concentration during exposure can be appropriately selected. In addition to performing under the atmosphere, for example, exposure can also be performed in a low-oxygen environment with an oxygen concentration of 19 vol% or less (e.g., 15 vol%, 5 vol% or substantially oxygen-free), or exposure can be performed in a high-oxygen environment with an oxygen concentration exceeding 21 vol% (e.g., 22 vol%, 30 vol% or 50 vol%). And, the exposure illuminance can be appropriately set, and generally can be selected from the range of 1000 W / m 2 to 100000 W / m 2 (e.g., 5000 W / m 2 , 15000 W / m 2 or 35000 W / m 2 ). The conditions of oxygen concentration and exposure illuminance can be appropriately combined. For example, it can be set to an oxygen concentration of 10 vol% and an illuminance of 10000 W / m 2 , an oxygen concentration of 35 vol% and an illuminance of 20000 W / m 2 etc.

[0542] In the development process, the exposed photosensitive composition layer is developed to remove the unexposed part of the photosensitive composition layer. The development and removal of the unexposed part of the photosensitive composition layer can be performed using a developer. Thus, the unexposed part of the photosensitive composition layer in the exposure process dissolves into the developer, and only the photocured part remains on the support. The temperature of the developer is, for example, preferably 20 to 30 °C. The development time is preferably 20 to 180 seconds. And, in order to improve the residue removal property, the following process can be repeated multiple times: the process of discarding the developer every 60 seconds and then supplying a new developer.

[0543] Examples of the developer include organic solvents, alkali developers, etc., and an alkali developer can be preferably used. Regarding the developer and the cleaning (rinsing) method after development, the developer or cleaning method described in paragraph 0214 of International Publication No. 2022 / 085485 can be used.

[0544] After development, it is preferable to perform additional exposure treatment or heat treatment (post-baking) after drying. The additional exposure treatment or post-baking is a curing treatment for the developed film to achieve complete curing. The heating temperature in post-baking is, for example, preferably 100 to 300 °C, more preferably 200 to 270 °C. The developed film can be post-baked in a continuous or intermittent manner using a heating mechanism such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heating machine so as to meet the above conditions. When performing the additional exposure treatment, the light used for exposure is preferably light with a wavelength of 400 nm or less. Moreover, the additional exposure treatment can be carried out by the method described in Korean Patent Publication No. 10-2017-0122130.

[0545] <Filter>

[0546] The filter of the present invention has the film of the present invention described above. As types of filters, an infrared cut-off filter, an infrared transmission filter, etc. can be mentioned.

[0547] In addition to having the film of the present invention described above, the filter of the present invention may also have a copper-containing layer, a dielectric multilayer film, an ultraviolet absorption layer, etc. As the ultraviolet absorption layer, for example, the absorption layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060 can be mentioned. As the dielectric multilayer film, the dielectric multilayer film described in paragraphs 0255 to 0259 of Japanese Patent Laid-Open No. 2014-041318 can be mentioned. As the copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex layer) can also be used. As the copper-containing glass substrate, copper-containing phosphate glass, copper-containing fluorophosphate glass, etc. can be mentioned. As commercially available products of copper-containing glass, NF-50 (manufactured by AGC TECHNOGLASS Co., Ltd.), BG-60, BG-61 (both manufactured by Schott AG), CD5000 (manufactured by HOYA CORPORATION), etc. can be mentioned.

[0548] <Solid-state imaging device>

[0549] The solid-state imaging device of the present invention includes the film of the present invention described above. The structure of the solid-state imaging device is not particularly limited as long as it has the structure of the film of the present invention and functions as a solid-state imaging device. For example, the following structures can be mentioned.

[0550] The above structure is as follows: on a support, there is a transfer electrode composed of a plurality of photodiodes and polysilicon or the like that constitutes a light-receiving region of a solid-state imaging device. On the photodiodes and the transfer electrode, there is a light-shielding film composed of tungsten or the like that opens only at the light-receiving portion of the photodiodes. On the light-shielding film, there is a device protection film composed of silicon nitride or the like that is formed so as to cover the entire light-shielding film and the light-receiving portion of the photodiodes. On the device protection film, there is the film of the present invention. In addition, it may also be a structure in which a condensing mechanism (for example, a microlens or the like. The same applies hereinafter) is provided on the device protection film and below (closer to the support side) the film of the present invention, or a structure in which a condensing mechanism is provided on the film of the present invention. Further, the color filter may also have the following structure: for example, a film forming each pixel is embedded in a space partitioned into a lattice shape by partition walls. At this time, the partition walls preferably have a refractive index lower than that of each pixel. As an example of an imaging device having such a structure, the devices described in Japanese Patent Application Laid-Open No. 2012-227478 and Japanese Patent Application Laid-Open No. 2014-179577 can be cited.

[0551] <Image display device>

[0552] The image display device of the present invention includes the film of the present invention described above. Examples of the image display device include a liquid crystal display device, an organic electroluminescence (organic EL) display device, and the like. The definition and detailed content of the image display device are described, for example, in "Electronic Display Devices (written by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd. in 1990)", "Display Devices (written by Junsho Ibuki, published by Sangyo Tosho Publishing Co., Ltd. in 1989)", and the like. And regarding the liquid crystal display device, it is described, for example, in "Next-Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd. in 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above "Next-Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. As the white organic EL element, a tandem structure is preferred. The tandem structure of the organic EL element is described in Japanese Patent Application Laid-Open No. 2003-045676, supervised by Akiyoshi Mikami, "The Forefront of Organic EL Technology Development - High Brightness, High Precision, Long Life Technology Collection -", TECHNICAL INFORMATION INSTITUTE CO., LTD., pages 326 to 328, 2008, and the like. The spectrum of the white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430 to 485 nm), the green region (530 to 580 nm), and the yellow region (580 to 620 nm). More preferably, in addition to these emission peaks, it further has a maximum emission peak in the red region (650 to 700 nm).

[0553] <Infrared sensor>

[0554] The infrared sensor of the present invention includes the film of the present invention described above. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0555] Figure 1 In the figure, reference numeral 110 is a solid-state imaging device. An infrared cut-off filter 111 and an infrared transmission filter 114 are disposed on the imaging region of the solid-state imaging device 110. And a color filter 112 is disposed on the infrared cut-off filter 111. A microlens 115 is disposed on the incident light hv side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed so as to cover the microlens 115.

[0556] The color filter 112 is a color filter for forming pixels that transmit and absorb light of specific wavelengths in the visible region, and there is no particular limitation. A conventionally known color filter for forming pixels can be used. For example, a color filter for forming pixels of red (R), green (G), and blue (B) can be used. For example, reference can be made to the description in paragraphs 0214 to 0263 of Japanese Patent Application Laid-Open No. 2014-043556, and this content is incorporated into this specification. The infrared transmission filter 114 can be selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the photosensitive composition of the present invention.

[0557] Figure 1 In the infrared sensor shown, an infrared cut-off filter (other infrared cut-off filter) different from the infrared cut-off filter 111 can be further disposed on the planarization layer 116. As the other infrared cut-off filter, a filter having a copper-containing layer and / or a dielectric multilayer film can be cited. For the detailed content of these, the above content can be cited. And, as the other infrared cut-off filter, a dual band-pass filter can be used.

[0558] <Camera module>

[0559] The camera module of the present invention includes the film of the present invention described above. The camera module preferably further has a lens, a solid-state imaging element, and a circuit for processing an image obtained from the solid-state imaging element. As an example of the camera module, reference can be made to the camera modules described in Japanese Patent Application Laid-Open No. 2016-006476 and Japanese Patent Application Laid-Open No. 2014-197190, and these contents are incorporated into this specification.

[0560] Examples

[0561] Hereinafter, examples will be given to further describe the present invention in detail. The materials, amounts used, ratios, processing contents, processing sequences, etc. shown in the following examples can be appropriately changed as long as they do not depart from the gist of the present invention. And, in the structural formulas shown below, Me represents a methyl group, and Ph represents a phenyl group.

[0562] <Compound A>

[0563] In the examples shown below, as Compound A, the following compound was used.

[0564] (Compound A-p-1 to A-p-28, A-d-1 to A-d-10, A-p-101 to A-p-110, A-d-101 to A-d-109, A-p-201 to A-p-217, A-d-201 to A-d-206)

[0565] [Chemical formula 34]

[0566]

[0567] [Table 1]

[0568]

[0569] [Table 2]

[0570]

[0571] [Table 3]

[0572]

[0573] [Table 4]

[0574]

[0575] [Table 5]

[0576]

[0577] (Compounds A-p-301 to A-p-303, A-d-301 to A-d-303, A-p-401 to A-p-413, A-d-401 to A-d-410)

[0578] [Chemical Formula 35]

[0579]

[0580] [Table 6]

[0581]

[0582] [Table 7]

[0583]

[0584] Resin Z (Resins Z-1 to Z-13) is as follows. The values marked on the main chain are the molar ratios of the repeating units.

[0585] [Chemical Formula 36]

[0586]

[0587] [Chemical Formula 37]

[0588]

[0589] [Chemical Formula 38]

[0590]

[0591] [Chemical Formula 39]

[0592]

[0593] [Chemical formula 40]

[0594]

[0595] [Table 8]

[0596] Resin number Weight-average molecular weight Acid value [mgKOH / g] Glass transition temperature [℃] Z-1 12300 17 - Z-2 1300 86 - Z-3 1500 - - Z-4 15900 26 37 Z-5 16600 49 38 Z-6 15400 26 122 Z-7 16300 25 - Z-8 16700 24 - Z-9 16300 25 - Z-10 1700 129 - Z-11 2700 84 - Z-12 2300 50 - Z-13 2600 42 -

[0597] [Synthesis example of Compound A]

[0598] [Synthesis example 1]

[0599] Compound A-p-102, A-p-103 and A-p-404 were synthesized according to the following synthesis scheme.

[0600] [Chemical formula 41]

[0601]

[0602] (Synthesis of Compound A-p-102)

[0603] 5,6-Dicyanoazulene was synthesized according to the method described in JP-A-2011-116717. After adding 27 parts by mass of gallium trichloride to a mixture of 27 parts by mass of 5,6-dicyanoazulene and 200 parts by mass of 1-chloronaphthalene under a nitrogen stream, the temperature was gradually raised to 200 °C and stirred for 3 hours. Then, when it was naturally cooled to 130 °C, it was filtered while it was hot, washed with 1-chloronaphthalene, washed several times with methanol, further washed several times with hot water at 80 °C and dried, whereby Compound A-p-102 (15 parts by mass, yield 12%) was obtained.

[0604] Identification data of Compound A-p-102: MALDI TOF-MASS (time-of-flight mass spectrometry) Calc. for C 48 H 24 ClGaN8[M] + : 816.1 found: 816.1

[0605] (Synthesis of Compound A-p-103)

[0606] Under an ice bath, 10 parts by mass of Compound A-p-102 was added to 100 parts by mass of concentrated sulfuric acid and stirred for 1 hour. Then, the sulfuric acid solution was poured into 1000 parts by mass of cold water at 3 °C, and the resulting precipitate was treated in the order of filtration, washing with water, washing with a 2.5% aqueous sodium hydroxide solution, and washing with water and dried, whereby Compound A-p-103 (8 parts by mass, yield 82%) was obtained.

[0607] Identification data of Compound A-p-103: MALDI TOF-MASS (Matrix-Assisted Laser Desorption / Ionization Time-of-Flight Mass Spectrometry) Calc. for C 48 H 25 GaN8O[M] + : 798.1 found: 798.1

[0608] (Synthesis of Resin Z-4)

[0609] In a reaction vessel equipped with a stirring device, a thermometer, a reflux condenser, and a nitrogen inlet tube, 100 parts by mass of propylene glycol monomethyl ether acetate (PGMEA) and 3 parts by mass of methyl 4-cyano-4-(dodecylsulfanylthiocarbonothioylthio)pentanoate were added. After heating to 80 °C in a nitrogen atmosphere, a mixture composed of 48 parts by mass of methyl methacrylate, 29 parts by mass of ethyl methacrylate, 19 parts by mass of tert-butyl acrylate, and 1 part by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) was added dropwise over 4 hours. After the addition was completed, the mixture was maintained at 90 °C for 2 hours, and then a mixture composed of 5 parts by mass of 2-methacryloyloxyethyl phosphate and 100 parts by mass of PGME was further added dropwise over 1 hour. Subsequently, after maintaining at 90 °C for 12 hours, PGME was added to obtain a 30% by mass solution of Resin Z-4. The weight-average molecular weight of this Resin Z-4 was 15,900, the acid value was 26 mg KOH / g, and the glass transition temperature was 37 °C.

[0610] (Synthesis of Compound A-p-404)

[0611] 88 parts by mass of Resin Z-4 was added to 200 parts by mass of N-methyl-2-pyrrolidone, and after thoroughly stirring and mixing, it was heated to 50 °C. After adding 14 parts by mass of Compound A-p-103 little by little to this solution, it was stirred at 90 °C for 120 minutes. For confirmation of the reaction end point, the reaction solution was dropped onto filter paper, and the time point when there was no penetration was taken as the end point. Subsequently, this reaction solution was poured into 2000 parts by mass of water, and the resulting precipitate was treated in the order of filtration, washing with water, and drying to obtain Compound A-p-404 (92 parts by mass, yield 90%). The molar ratio of the positively charged atom Ga at the center of Compound A-p-404 to the phosphate group contained in Resin Z-4 was (moles of the positively charged atom Ga at the center of Compound A-p-404) / (moles of the phosphate group contained in Resin Z-4) = 0.9 / 1.

[0612] [Synthesis Example 2]

[0613] Compound A-p-411 was synthesized according to the following synthesis scheme.

[0614] [Chemical Formula 42]

[0615]

[0616] (Synthesis of Resin Z-11)

[0617] In a reaction vessel equipped with an air introduction tube, a condenser, and a stirrer, 300 parts by mass of glycerol dimethacrylate, i.e., "LIGHT ESTER G-101P" (manufactured by KYOEISHA CHEMICAL Co., LTD.), 1350 parts by mass of ε-caprolactone monomer, 0.33 parts by mass of methyl hydroquinone, and 0.35 parts by mass of monobutyltin oxide were added, and the temperature was raised to 130°C and maintained for 2 hours while blowing dry air. After confirming the disappearance of the caprolactone monomer, the mixture was cooled to 40°C or less, mixed with 114 parts by mass of polyphosphoric acid having an orthophosphoric acid conversion content of 118%, and the temperature was gradually raised, and stirred and heated at 80°C for 6 hours, thereby obtaining resin Z-11. The weight average molecular weight of the resin Z-11 was 2700, and the acid value was 84 mgKOH / g.

[0618] (Synthesis of Compound Ap-411)

[0619] 27 parts by mass of resin Z-11 were added to 200 parts by mass of N-methyl-2-pyrrolidone, and the mixture was stirred thoroughly and then heated to 50°C. After 14 parts by mass of compound Ap-103 were added little by little to the solution, the mixture was stirred at 90°C for 120 minutes. The end point of the reaction was confirmed by, for example, dripping the reaction solution onto filter paper and taking the time point when no penetration occurred as the end point. Next, the reaction solution was injected into 2000 parts by mass of water, and the precipitate generated was filtered, washed with water and dried, thereby obtaining compound Ap-411 (36 parts by mass, yield 87%). The molar ratio of the positively charged atom Ga at the center of compound Ap-411 to the phosphate group contained in resin Z-11 is (the number of moles of the positively charged atom Ga at the center of compound Ap-411) / (the number of moles of the phosphate group contained in resin Z-11) = 0.9 / 1.

[0620] <Production of Dispersion Liquid>

[0621] The pigments, pigment derivatives, dispersing resins and solvents of the types listed in the following table were mixed in the mass parts listed in the following table, and 117 mass parts of zirconium oxide beads with a diameter of 0.3 mm were added, and a dispersion treatment was performed for 5 hours using a paint mixer, and the beads were separated by filtration to prepare a dispersion liquid. In addition, the pigment used was a pigment that had been subjected to the following kneading and grinding treatment.

[0622] (Mixing and grinding conditions)

[0623] 10.6 parts by mass of a pigment, 149.4 parts by mass of a grinding agent, and 28 parts by mass of a binder were added to a Labplastomill (manufactured by Toyo Seiki Seisaku-sho, Ltd.), and the temperature was controlled until the temperature of the kneaded product in the apparatus reached 70°C and kneaded for 2 hours. As the grinding agent, neutral anhydrous sodium sulfate E (average particle diameter (50% diameter (D50) based on volume) = 20 μm, manufactured by MITAJIRI Chemical Industry Co., Ltd.) was used, and as the binder, diethylene glycol was used. The kneaded and ground kneaded product was washed with 20 L of water at 24°C to remove the grinding agent and the binder, and treated at 80°C for 24 hours using a heating oven.

[0624] [Table 9]

[0625]

[0626] [Table 10]

[0627]

[0628] [Table 11]

[0629]

[0630] The detailed content of the materials described in the above table is as follows.

[0631] (Pigment)

[0632] A-p-1 to A-p-28, A-p-101 to A-p-110, A-p-201 to A-p-217, A-p-301 to A-p-303, A-p-401 to A-p-413: The above compounds A-p-1 to A-p-28, A-p-101 to A-p-110, A-p-201 to A-p-217, A-p-301 to A-p-303, A-p-401 to A-p-413 (Compound A)

[0633] PR81: C.I. Pigment Red 81 (xanthene compound, red pigment, Color Material B)

[0634] PR122: C.I. Pigment Red 122 (quinacridone compound, red pigment, Color Material B)

[0635] PR177: C.I. Pigment Red 177 (anthraquinone compound, red pigment, Color Material B)

[0636] PR185: C.I. Pigment Red 185 (azo compound, red pigment, Color Material B)

[0637] PR224: C.I. Pigment Red 224 (perylene compound, red pigment, colorant B)

[0638] PR254: C.I. Pigment Red 254 (diketopyrrolopyrrole compound, red pigment, colorant B)

[0639] PB15:6: C.I. Pigment Blue 15:6 (phthalocyanine compound, blue pigment, colorant B)

[0640] PB66: C.I. Pigment Blue 66 (indigo compound, blue pigment, colorant B)

[0641] PG58: C.I. Pigment Green 58 (phthalocyanine compound, green pigment, colorant B)

[0642] PV23: C.I. Pigment Violet 23 (dioxazine compound, purple pigment, colorant B)

[0643] PV39: C.I. Pigment Violet 39 (triarylmethane compound, purple pigment, colorant B)

[0644] PY129: C.I. Pigment Yellow 129 (azomethine compound, yellow pigment, colorant B)

[0645] PY138: C.I. Pigment Yellow 138 (quinophthalone compound, yellow pigment, colorant B)

[0646] PY139: C.I. Pigment Yellow 139 (isoindoline compound, yellow pigment, colorant B)

[0647] PY150: C.I. Pigment Yellow 150 (azo compound, yellow pigment, colorant B)

[0648] PY215: C.I. Pigment Yellow 215 (pteridine compound, yellow pigment, colorant B)

[0649] Bk-1: Irgaphor Black (bisbenzofuranone compound manufactured by BASF, black pigment, colorant B)

[0650] IR-1: Compound with the following structure (squaric acid compound, infrared absorbing pigment, colorant B)

[0651] IR-2: Compound with the following structure (squaric acid compound, infrared absorbing pigment, colorant B)

[0652] IR-3: Compound with the following structure (xanthenium compound, infrared absorbing pigment, colorant B)

[0653] IR-4: Compound with the following structure (naphthalocyanine compound, infrared absorbing pigment, colorant B)

[0654] IR-5: A compound with the following structure (pyrrolopyrrole compound, infrared absorption pigment, colorant B)

[0655] IR-6: A mixture of 81:17:2 of the following structures (IR-6-a):(IR-6-b):(IR-6-c) (indigo compound, infrared absorption pigment, colorant B)

[0656] IR-7: A mixture of 7:19:59:15 of the following structures (IR-7-a):{(IR-7-b)+(IR-7-c)}:(IR-7-d) (partial naphthalocyanine compound, infrared absorption pigment, colorant B)

[0657] [Chemical formula 43]

[0658]

[0659] [Chemical formula 44]

[0660]

[0661] (Pigment derivative)

[0662] A-s-1 to A-s-4: Compounds with the following structure (Compound A)

[0663] IR-8: A compound with the following structure (colorant B)

[0664] [Chemical formula 45]

[0665]

[0666] (Dispersion resin)

[0667] D-1: A resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units. Weight-average molecular weight 9800, amine value 50 mg KOH / g, quaternary ammonium salt value 20 mg KOH / g).

[0668] D-2: A resin with the following structure (the values marked on the side chain represent the molar ratio of repeating units. Weight-average molecular weight 9000, acid value 43 mg KOH / g).

[0669] D-3: A resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units, and the values marked on the side chain represent the number of repeating units. Weight-average molecular weight 22900, acid value 32.3 mg KOH / g, amine value 45.0 mg KOH / g).

[0670] D-4: Resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units, and the values marked on the side chain represent the number of repeating units. Weight-average molecular weight 22,000, acid value 85.0 mg KOH / g).

[0671] [Chemical formula 46]

[0672]

[0673] (Solvent)

[0674] S-1: Propylene glycol monomethyl ether acetate

[0675] S-2: Propylene glycol monomethyl ether

[0676] S-3: Cyclopentanone

[0677] (Manufacture of photosensitive composition)

[0678] After mixing and stirring the materials listed in the following table by the mass parts listed in the following table respectively, they were filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby manufacturing photosensitive compositions (Compositions 1-93, 101-121, 201-235, 301-306, 401-427, 501).

[0679] [Table 12]

[0680]

[0681] [Table 13]

[0682]

[0683] [Table 14]

[0684]

[0685] [Table 15]

[0686]

[0687] [Table 16]

[0688]

[0689] [Table 17]

[0690]

[0691] [Table 18]

[0692]

[0693] [Table 19]

[0694]

[0695] [Table 20]

[0696]

[0697] [Table 21]

[0698]

[0699] [Table 22]

[0700]

[0701] [Table 23]

[0702]

[0703] [Table 24]

[0704]

[0705] [Table 25]

[0706]

[0707] [Table 26]

[0708]

[0709] [Table 27]

[0710]

[0711] [Table 28]

[0712]

[0713] [Table 29]

[0714]

[0715] [Table 30]

[0716]

[0717] The detailed content of the materials recorded in the above table is as follows. In addition, the dispersion liquid is the above dispersion liquid.

[0718] (Compound A, coloring material B)

[0719] A-d-1 to A-d-10, A-d-101 to A-d-109, A-d-201 to A-d-206, A-d-301 to A-d-303, A-d-401 to A-d-410: The above compounds A-d-1 to A-d-10, A-d-101 to A-d-109, A-d-201 to A-d-206, A-d-301 to A-d-303, A-d-401 to A-d-410 (Compound A)

[0720] IR-9: The compound of the following structure (squaric acid compound, infrared absorption dye, colorant B)

[0721] IR-10: The compound of the following structure (polymethine compound, infrared absorption dye, colorant B)

[0722] IR-11: The compound of the following structure (iminium compound, infrared absorption dye, colorant B)

[0723] [Chemical formula 47]

[0724]

[0725] (Polymerizable compound)

[0726] M-1 to M-7: The compounds of the following structure

[0727] [Chemical formula 48]

[0728]

[0729] M-6: The polymerizable compound C1-6 having a urethane bond described in paragraph 0313 of Japanese Patent Laid-Open No. 2022-173080 (aromatic urethane acrylate having 10 polymerizable unsaturated groups)

[0730] M-7: The polymerizable compound C1-8 having a urethane bond described in paragraph 0315 of Japanese Patent Laid-Open No. 2022-173080 (aromatic urethane acrylate having an average of 9 polymerizable unsaturated groups with an acid group)

[0731] (Photoinitiator)

[0732] I-1 to I-9: The compounds of the following structure

[0733] [Chemical formula 49]

[0734]

[0735] (Adhesive)

[0736] P-1: Resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units. Weight-average molecular weight 10,000, acid value 110 mg KOH / g).

[0737] P-2: Resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units. Weight-average molecular weight 9,000, acid value 72 mg KOH / g, double bond equivalent 493 g / eq, glass transition temperature greater than -10 °C and 80 °C or lower).

[0738] P-3: Resin with the following structure (the values marked on the main chain represent the mass ratio of repeating units. Weight-average molecular weight 22,900, acid value 130 mg KOH / g, epoxy equivalent 316 g / eq, glass transition temperature 124 °C).

[0739] P-4: Resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units. Weight-average molecular weight 9,700, acid value 184 mg KOH / g).

[0740] P-5: Resin with the following structure (the values marked on the main chain represent the molar ratio of repeating units. Weight-average molecular weight 10,000, acid value 69 mg KOH / g).

[0741] [Chemical formula 50]

[0742]

[0743] (Additive)

[0744] Ad-1 to Ad-4: Compounds with the following structure (antioxidants)

[0745] Ad-5 to Ad-8: Compounds with the following structure (ultraviolet absorbers)

[0746] Ad-9: Compound with the following structure (silane coupling agent)

[0747] Ad-10: Compound with the following structure (epoxy resin)

[0748] Ad-11: 4,4'-bis(diethylamino)benzophenone (sensitizer)

[0749] [Chemical formula 51]

[0750]

[0751] (Polymerization inhibitor)

[0752] St-1: p-Methoxyphenol

[0753] (Surfactant)

[0754] W-1: A compound having the following structure (weight-average molecular weight = 14,000, in the following formula, the % representing the ratio of repeating units is mol%)

[0755] [Chemical formula 52]

[0756]

[0757] W-2: KF-6001 (a silicone surfactant manufactured by Shin-Etsu Chemical Co., Ltd.)

[0758] <Evaluation of lithography>

[0759] Using the spin coating method, the photosensitive composition just after manufacture was coated on a silicon wafer with an undercoat layer so that the film thickness after coating became 0.7 μm, and then it was heated on a hot plate at 100 °C for 2 minutes to form a composition layer. Then, using an i-ray stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), the obtained composition layer was exposed through a mask having a Bayer pattern of 1.1 μm square (the exposure amount was selected to be the optimum exposure amount for a line width of 1.1 μm). Then, using a 0.3 mass% aqueous solution of tetramethylammonium hydroxide (TMAH), the exposed composition layer was subjected to spin coating immersion development at 23 °C for 60 seconds. Then, it was rinsed by rotary spraying and further washed with pure water to form a pattern (pixel). By binarization processing of the image, the amount of residue remaining on the silicon wafer between the obtained patterns was confirmed, and the lithography was evaluated according to the following criteria.

[0760] A: The amount of residue between the patterns is 1% or less of the total area of the silicon wafer between the patterns

[0761] B: The amount of residue between the patterns exceeds 1% and is 2% or less of the total area of the silicon wafer between the patterns

[0762] C: The amount of residue between the patterns exceeds 2% and is 3% or less of the total area of the silicon wafer between the patterns

[0763] D: The amount of residue between the patterns exceeds 3% and is 5% or less of the total area of the silicon wafer between the patterns

[0764] E: The amount of residue between the patterns exceeds 5% of the total area of the silicon wafer between the patterns

[0765] <Evaluation of storage stability>

[0766] After storing each photosensitive composition in a thermostat at 45°C for 3 days, a spin coater was used to coat the stored photosensitive composition on a glass substrate (Corning Incorporated Co., Ltd. product number 1737) so that the dried film thickness became 1.0 μm, and a heat treatment (pre-baking) was performed using a hot plate at 100°C for 120 seconds. Subsequently, a full-surface exposure was carried out using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.) at an exposure dose of 500 mJ / cm 2 Then, a developing solution (CD-2060, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was used for 60 seconds of spin-on immersion development at 23°C. After that, a rinsing treatment was carried out using pure water, followed by spin drying. Moreover, a heat treatment (post-baking) was performed using a hot plate at 200°C for 300 seconds to form a film. The obtained film was observed using a scanning electron microscope (measurement magnification = 10,000 times), and the number of foreign substances present within a range of 10 μm × 15 μm was measured. The storage stability was evaluated according to the following criteria.

[0767] A: No foreign substances are present within a range of 10 μm × 15 μm

[0768] B: The number of foreign substances present within a range of 10 μm × 15 μm exceeds 0 and is 50 or less

[0769] C: The number of foreign substances present within a range of 10 μm × 15 μm exceeds 50 and is 100 or less

[0770] D: The number of foreign substances present within a range of 10 μm × 15 μm exceeds 100 and is 200 or less

[0771] E: The number of foreign substances present within a range of 10 μm × 15 μm exceeds 200

[0772] <Evaluation of infrared ray shielding property>

[0773] Using each photosensitive composition just after manufacturing, a film was formed in the same manner as the evaluation of storage stability. The average transmittance of the obtained film in the wavelength range of 1000 - 1200 nm was measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). The infrared ray shielding property was evaluated according to the following criteria.

[0774] A: The average transmittance in the wavelength range of 1000 nm - 1200 nm ≤ 2%

[0775] B: 2% < The average transmittance in the wavelength range of 1000 nm - 1200 nm ≤ 4%

[0776] C: The average transmittance in the wavelength range of 1000 nm to 1200 nm is 4% < average transmittance ≤ 7%

[0777] D: The average transmittance in the wavelength range of 1000 nm to 1200 nm is 7% < average transmittance ≤ 10%

[0778] E: The average transmittance in the wavelength range of 1000 nm to 1200 nm is > 10%

[0779] <Evaluation of heat resistance>

[0780] Using each photosensitive composition just after manufacture, a film was formed in the same manner as in the evaluation of storage stability. Using a hot plate, the obtained film was heated at 265 °C for 5 minutes to conduct a heat resistance test. The transmittance in the wavelength range of 400 to 1600 nm of the film before and after the heat resistance test was measured, and the transmittance change at each wavelength was calculated by the following formula. Using the maximum value of the transmittance change in the range of 400 to 1600 nm, the heat resistance was evaluated according to the following criteria.

[0781] Transmittance change = |(Transmittance before heat resistance test - Transmittance after heat resistance test)|

[0782] A: The maximum value of the transmittance change is less than 2%.

[0783] B: The maximum value of the transmittance change exceeds 2% and is less than 4%

[0784] C: The maximum value of the transmittance change exceeds 4% and is less than 7%

[0785] C: The maximum value of the transmittance change exceeds 7% and is less than 10%

[0786] D: The maximum value of the transmittance change exceeds 10%

[0787] [Table 31]

[0788]

[0789] [Table 32]

[0790]

[0791] [Table 33]

[0792]

[0793] [Table 34]

[0794]

[0795] [Table 35]

[0796]

[0797] As shown in the above table, the lithographic property evaluation of each example is superior to that of Comparative Example 1.

[0798] In each example, regarding the compound used as Compound A, Por in Formula (A) 1 The same effect can also be obtained when the structure is changed to the compound of the isomer shown in the above Formula (A-b) to (A-d) or the compound containing two or more isomers shown in Formula (A-a) to (A-d).

[0799] (Examples 501 to 927)

[0800] In Test Example 2 of International Publication No. 2019 / 054281, Composition 101 was changed to Compositions 1 to 427 described in this specification. Except for this, an infrared transmission filter pattern was formed in the same manner as in Test Example 2 and assembled into a solid-state imaging device. Images of a white utensil moistened with water and the white utensil after drying were taken using the obtained solid-state imaging device, and it was evaluated whether the moistened situation with water could be distinguished. As a result, it was possible to clearly distinguish between the dried utensil and the utensil moistened with water. The photosensitive composition of the present invention can preferably be used as a composition for an infrared transmission filter.

[0801] Symbol Explanation

[0802] 110 - Solid-state imaging device, 111 - Infrared cut-off filter, 112 - Color filter, 114 - Infrared transmission filter, 115 - Microlens, 116 - Planarization layer.

Claims

1. A photosensitive composition, comprising: Compound A, which is represented by formula (A); Colorant B, which is a compound other than Compound A, has a maximum absorption wavelength in the range of 400 nm to 1000 nm, has a molecular weight of 2000 or less and has a π-conjugated plane; Polymerizable compound; Photopolymerization initiator; and Solvent, [Por 1 s [An 1 t (A)​​ In formula (A), Por 1 represents the structure represented by formula (1), An 1 represents a counter anion, s represents an integer of 1 or more, t is an integer of 0 or more and represents the number required to neutralize the charge of Por 1 of When 1 when electrically neutral, s is 1 and t is 0, In formula (1), Az 1a ~Az 1c each independently represents a ring represented by formula (2), Az 1d represents the ring represented by formula (3), X 1a ~X 1d each independently represents a nitrogen atom or CR X1 , R X1 represents a hydrogen atom or a substituent, M 1 represents two hydrogen atoms or a positively charged atom with a valence of 2 or more to which a ligand is optionally coordinated, In formula (2), R 2 represents a substituent, n2 represents an integer from 0 to 6, and when n2 is 2 or more, adjacent R 2 are optionally bonded to each other to form a ring, * represents the connecting site to the porphyrin ring, and the connecting direction is arbitrary. In formula (3), R 3 represents a substituent, n3 represents an integer from 0 to 6, and when n3 is 2 or more, adjacent R 3 are optionally bonded to each other to form a ring, * represents the connecting position to the porphyrin ring, and the connecting direction is arbitrary.

2. The photosensitive composition according to claim 1, wherein, Por of formula (A) 1 is a structure represented by formula (4) or formula (5), In formula (4), Az 4a ~Az 4c each independently represents a ring represented by the said formula (2), Az 4d represents the ring represented by the said formula (3), X 4a ~X 4d each independently represents a nitrogen atom or CR X4 , R X4 represents a hydrogen atom or a substituent, M 4 represents B, Al, Ga, In or Sc, Z 4 represents a ligand In formula (5), Az 5a ~Az 5c each independently represents a ring represented by the said formula (2), Az 5d represents the ring represented by the formula (3), X 5a ~X 5d each independently represents a nitrogen atom or CR X5 ,R X5 represents a hydrogen atom or a substituent, M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn, Z 5a and Z 5b each independently represents a ligand.

3. The photosensitive composition according to claim 2, wherein, The Z of formula (4) 4 and the Z of formula (5) 5a and Z 5b are each independently a ligand represented by formula (6). In formula (6), R 6a and R 6b each independently represent a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group or an aryloxy group, R 6a and R 6b optionally bond to each other to form a ring, and * is a bonding bond with M 4 or M 5 .

4. The photosensitive composition according to claim 2, wherein, The Z of formula (4) 4 and the Z of formula (5) 5a and Z 5b are each independently a ligand represented by formula (7) or formula (8). In formula (7), R 7a and R 7b each independently represents a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (10), at least one of R 7a and R 7b is a group represented by formula (10), and * is a bonding bond with M 4 or M 5 . In formula (8), Y 8 represents -OSO2-, -OCO- or -O-, L 8 represents a single bond or an n8+1 valent linking group, Pm 8 represents a polymer chain, n8 represents an integer from 1 to 5, when n8 is from 2 to 5, multiple Pm 8 are the same or different, * is a bonding bond with M 4 or M 5 of the bonding bond, In formula (10), L 10 represents a single bond or an n10+1 valent linking group, Pm 10 represents a polymer chain, n10 represents an integer from 1 to 5, and when n10 is from 2 to 5, multiple Pm 10 are the same or different, and * is a bonding bond with P of formula (7).

5. The photosensitive composition according to claim 4, wherein, The Pm of formula (8) 8 The polymer chain represented by and the Pm of formula (10) 10 The polymer chain is a polymer chain having a repeating unit containing at least one structure selected from a polyether structure, a polyester structure, and a poly(meth)acrylic acid structure.

6. The photosensitive composition according to claim 4, wherein, The ligand represented by formula (7) is a ligand of a polymer having a structure represented by formula (7-1), a ligand represented by formula (7-2) or a ligand represented by formula (7-3), In formula (7-1), R 11a represents a hydrogen atom, an alkyl group or a halogen atom, R 11b represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group or an aryloxy group, L 11a represents -CONH-L 11b -, -COO-L 11c -, -CONH-L 11d -O- or -COO-L 11e -O-, L 11b ~L 11e each independently represents a hydrocarbon group or a divalent group formed by connecting multiple hydrocarbon groups through -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO- *For bonding with M 4 or M 5 of the bonding key In formula (7-2), R 12a represents a hydrogen atom, a hydroxyl group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heteroepoxy group or an aryloxy group, R 12b represents an alkyl or aryl group, L 12 represents an alkylene or arylene group, n12 represents 0 or 1, m12 represents an integer of 2 or more, *For bonding with M 4 or M 5 of the bonding key In formula (7-3), R 13a and R 13b each independently represents an alkyl group or an aryl group, L 13a and L 13b each independently represents an alkylene or arylene group, n13 and p13 each independently represent 0 or 1, m13 and q13 each independently represent an integer of 2 or more, *For bonding with M 4 or M 5 bonding keys.

7. The photosensitive composition according to claim 1 or 2, wherein, The colorant B includes at least one selected from quinacridone compounds, anthraquinone compounds, perylene compounds, diketopyrrolopyrrole compounds, azo compounds, phthalocyanine compounds, naphthalocyanine compounds, dioxazine compounds, azomethine compounds, quinophthalone compounds, isoindoline compounds, pteridine compounds, triarylmethane compounds, xanthene compounds, indigo compounds, polymethine compounds, bisbenzofuranone compounds, iminium compounds, squaric acid compounds, croconium compounds and pyrrolopyrrole compounds.

8. The photosensitive composition according to claim 1 or 2, which further comprises a resin having a cyclic structure in the main chain.

9. The photosensitive composition according to claim 1 or 2, wherein, The polymerizable compound includes a polymerizable compound having a urethane bond.

10. The photosensitive composition according to claim 1 or 2, which further comprises an antioxidant having at least 1 phosphorus atom in the molecule.

11. A film, which is obtained by using the photosensitive composition according to claim 1 or 2.

12. A filter, which comprises the film according to claim 11.

13. The filter according to claim 12, which is an infrared cut-off filter or an infrared transmission filter.

14. A solid-state imaging device, which comprises the film according to claim 11.

15. An image display device, which comprises the film according to claim 11.

16. An infrared sensor, which comprises the film according to claim 11.

17. A camera module, which comprises the film according to claim 11.

18. A compound, which is represented by formula (A1), [Por 2 s [An 2 t (A1)​​ In formula (A1), Por 2 represents the structure represented by formula (4a) or formula (5a), An 2 represents a counter anion, s represents an integer of 1 or more, t is an integer of 0 or more and represents the number required to neutralize the charge of Por 2 of When 2 when it is electrically neutral, s is 1 and t is 0, In formula (4a), Az 4a ~Az 4c each independently represents a ring represented by formula (2), Az 4d represents the ring represented by formula (3), X 4a ~X 4d each independently represents a nitrogen atom or CR X4 ,R X4 represents a hydrogen atom or a substituent, M 4 represents B, Al, Ga, In, or Sc, Z 4 represents the ligand represented by formula (7) or formula (8), In formula (5a), Az 5a ~ Az 5c each independently represents a ring represented by formula (2), Az 5d represents the ring represented by formula (3). X 5a ~X 5d each independently represents a nitrogen atom or CR X5 , R X5 represents a hydrogen atom or a substituent, M 5 represents Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn, Z 5a and Z 5b each independently represents a ligand represented by formula (7) or formula (8), In formula (2), R 2 represents a substituent, n2 represents an integer from 0 to 6, and when n2 is 2 or more, adjacent R 2 are optionally bonded to each other to form a ring, * represents the connecting site to the porphyrin ring, and the connecting direction is arbitrary. In formula (3), R 3 represents a substituent, n3 represents an integer from 0 to 6, and when n3 is 2 or more, adjacent R 3 are optionally bonded to each other to form a ring, * represents the connecting position to the porphyrin ring, and the connecting direction is arbitrary. In formula (7), R 7a and R 7b each independently represent a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group or a group represented by formula (10), at least one of R 7a and R 7b is a group represented by formula (10), and * is a bonding bond with M 4 or M 5 . In formula (8), Y 8 represents -OSO2-, -OCO- or -O-, L 8 represents a single bond or an n8+1 valent linking group, Pm 8 represents a polymer chain, n8 represents an integer from 1 to 5, and when n8 is from 2 to 5, multiple Pm 8 are the same or different, * is the bonding bond with M 4 or M 5 of the bonding bond, In formula (10), L 10 represents a single bond or an n10+1 valent linking group, Pm 10 represents a polymer chain, n10 represents an integer from 1 to 5, and when n10 is from 2 to 5, multiple Pm 10 are the same or different, and * is a bonding bond with P of formula (7).

Images