Insulator surface potential scanning method and system

The three-dimensional spiral scanning path is formed by the coordinated movement of the insulator and the probe, which solves the problem of unreasonable scanning path design in the prior art, and achieves efficient full coverage and high-precision scanning of the insulator surface potential.

CN120275784APending Publication Date: 2025-07-08ELECTRIC POWER RES INST OF GUANGDONG POWER GRID CO LTD
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Patent Information

Application Number
CN202510441472.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-04-09
Publication Date
2025-07-08

AI Technical Summary

Technical Problem

The existing insulator surface potential scanning method has the problem of unreasonable scanning path design, resulting in incomplete scanning path coverage, too slow speed or reduced accuracy.

Method used

The insulator and the probe are used to move in conjunction with each other to form a scanning path of a three-dimensional spiral line, including the insulator rotation and the linear motion of the probe, ensuring full coverage and efficient scanning.

Benefits of technology

It improves the accuracy and efficiency of potential scanning of insulator surfaces, avoids leakage and potential attenuation, and shortens scanning time.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses an insulator surface potential scanning method and system, and relates to the field of insulator potential measurement, and the method comprises the steps: controlling a first probe to move to a starting point of a to-be-scanned insulator, and keeping a first preset distance from the surface of the insulator; wherein the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of a central conductor of the insulator; controlling the insulator fixing mechanism to rotate so as to drive the insulator to synchronously rotate, and controlling the first probe to linearly move from the starting point to the outer edge of the insulator; wherein the first probe scans the surface potential of the insulator when doing linear motion; a path formed by the rotary motion and the linear motion is a three-dimensional spiral line; and when the first probe moves to the outer edge of the insulator, the insulator fixing mechanism and the first probe are controlled to stop moving so as to complete scanning of the surface potential of the insulator. The scanning precision and efficiency of the surface potential of the insulator can be improved.
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Description

Technical Field

[0001] This application relates to the field of insulator potential measurement, and particularly to a method and system for scanning the surface potential of an insulator. Background Art

[0002] Gas-insulated metal-enclosed transmission line (GIL) is an efficient and environmentally friendly power transmission technology with high transmission capacity, low energy loss, high safety, and environmental friendliness. It has gradually become the first choice for alternative power transmission methods to traditional overhead power transmission lines. However, the long-term operation of a DC GIL system will cause charges to accumulate on the surface of the insulators therein, which will in turn lead to a decrease in the insulation strength of the system. Therefore, in order to optimize the design and performance of a DC GIL system, it is necessary to accurately measure the surface charge distribution of the insulators in an already put-into-operation DC GIL system.

[0003] In the prior art, there have been many methods for measuring the surface potential of insulators, such as the Lichtenberg powder pattern method, the Pockels effect method, and the electrostatic probe method. Among them, the electrostatic probe method is widely used because it has strong adaptability, accurate measurement, and can avoid a large potential attenuation problem during measurement, and is superior to other measurement methods. However, in the existing practical applications of the electrostatic probe method, due to its unreasonable scanning path design and the fact that only the probe completes the scanning work during scanning, problems such as incomplete coverage of the scanning path resulting in missed measurements, too long scanning path, or too slow scanning speed leading to attenuation of the surface potential of the insulator and thus a decrease in measurement accuracy may occur. For example, for commonly used concentric ring scanning paths and reciprocating mobile scanning paths, the former has low efficiency and is prone to missed measurements; the latter has a good scanning path coverage effect, but the path is cumbersome and too long, which is likely to cause attenuation of the surface potential of the insulator and affect the measurement accuracy. Therefore, how to improve the accuracy and efficiency of scanning and measuring the surface potential of insulators remains an urgent problem to be solved in the prior art. Summary of the Invention

[0004] This application provides a method and system for scanning the surface potential of an insulator to solve the technical problem of the insufficient accuracy and efficiency of the existing methods for scanning the surface potential of insulators.

[0005] According to the first aspect of the embodiments of this application, a method for scanning the surface potential of an insulator is provided, which is applied to an insulator potential scanning device. The device includes an insulator fixing mechanism and a first probe. The method includes:

[0006] Controlling the first probe to move to the starting point of the insulator to be scanned and keep a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator;

[0007] Control the insulator fixing mechanism to perform a rotational motion to drive the insulator to perform a synchronous rotational motion, and control the first probe to perform a linear motion from the starting point to the outer edge of the insulator; wherein, when the first probe performs a linear motion, it maintains the first preset distance from the surface of the insulator and scans the surface potential of the insulator; the path formed by the rotational motion and the linear motion is a three-dimensional helix;

[0008] When the first probe moves to the outer edge of the insulator, control the insulator fixing mechanism and the first probe to stop moving to complete the scanning of the surface potential of the insulator.

[0009] In this application, first control the first probe to move to the starting point of the insulator to be scanned and wait for scanning, then control the insulator fixing mechanism to drive the insulator fixed thereon to perform a rotational motion, and at the same time control the first probe to perform a linear motion from the starting point to the outer edge of the insulator. During the movement process, scan the surface potential of the insulator. The path formed by the two movements is a three-dimensional helix. Stop moving until the first probe moves to the outer edge of the insulator and complete the scanning of the surface potential of the insulator. Compared with the prior art where only the probe completes all scanning work, in this application, through the simultaneous movement of the insulator and the probe, the moving path of a single part can be shortened, the control duration of a single part can be reduced, thereby improving the scanning efficiency of the surface potential of the insulator; compared with the unreasonable design of the path in the prior art, in this application, the scanning path formed by the combined movement of the insulator and the probe is pre-designed to form a three-dimensional helix, which can improve the coverage of the scanning path on the surface of the insulator, avoid missing the measurement of the surface potential of the insulator, and thus improve the scanning accuracy of the surface potential of the insulator.

[0010] In some embodiments of this application, the planar projection of the path formed by the rotational motion and the linear motion is an Archimedean spiral.

[0011] In this application, by pre-designing the scanning path formed by the combined movement of the insulator and the probe so that its planar projection forms an Archimedean spiral, it can ensure full coverage of the surface of the insulator by the scanning path, improve the coverage of the scanning path, avoid missing the measurement of the surface potential of the insulator, and thus improve the scanning accuracy of the surface potential of the insulator.

[0012] In some embodiments of this application, the linear motion is specifically:

[0013]

[0014] Wherein, r(t) is the axial component of the linear motion, z(t) is the radial component of the linear motion, t is the motion time, n is the rotation speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear motion is decomposed with the connection line between the starting point and the outer edge on the same side of the insulator as the axial direction and the axis of the central shaft body as the radial direction, and the direction from the axis of the central conductor to the outer edge of the insulator is defined as the positive direction of the axial component, and the direction from the central conductor to the first probe is defined as the positive direction of the radial component.

[0015] In this application, through the pre-design of the linear motion of the first probe during the scanning process, where the axial component and the radial component of the linear motion are designed separately, the planar projection of its axial component can form an Archimedean spiral, and in cooperation with the radial component, it can ensure that the scanning path completely covers the surface of the insulator, thereby avoiding the missed measurement of the surface potential of the insulator and improving the scanning accuracy of the surface potential of the insulator.

[0016] In some embodiments of this application, the rotational motion is specifically:

[0017] θ(t) = 2πnt;

[0018] Wherein, θ(t) is the rotation angle, n is the rotation speed of the insulator fixing mechanism, and t is the motion time.

[0019] In this application, through the pre-design of the rotational motion of the insulator driven by the insulator fixing mechanism during the scanning process, it can provide a prerequisite for the measurement of the surface potential of the insulator and the scanning path formed during the measurement.

[0020] In some embodiments of this application, the device further includes a voltage application mechanism and a voltage shielding mechanism; before controlling the first probe to move to the starting point of the insulator to be scanned, it further includes:

[0021] Controlling the voltage application mechanism to be connected to the insulator fixing mechanism, controlling the voltage shielding mechanism to be connected to the insulator, and controlling the voltage application mechanism to apply a voltage to the insulator;

[0022] Controlling the voltage shielding mechanism to be separated from the insulator to wait for the first probe to scan the surface potential of the insulator.

[0023] In this application, the voltage application mechanism and the voltage shielding mechanism are used to complete the preparatory work before the surface potential scanning of the insulator. The voltage application mechanism can provide a prerequisite voltage for the surface potential scanning of the insulator, and the voltage shielding mechanism can avoid the mutual influence between the charged insulator and the outside world, preventing the surface potential scanning from being inaccurate.

[0024] According to a second aspect of the embodiments of the present application, there is provided an insulator surface potential scanning system, which is applied to an insulator potential scanning device. The device includes an insulator fixing mechanism and a first probe. The system includes a scanning preparation module, a potential scanning module, and a scanning stop module.

[0025] The scanning preparation module is configured to control the first probe to move to the starting point of the insulator to be scanned and maintain a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator.

[0026] The potential scanning module is configured to control the insulator fixing mechanism to perform a rotational movement to drive the insulator to perform a synchronous rotational movement, and control the first probe to perform a linear movement from the starting point to the outer edge of the insulator; wherein, when the first probe performs the linear movement, it maintains the first preset distance from the surface of the insulator and scans the surface potential of the insulator; the path formed by the rotational movement and the linear movement is a three-dimensional helix.

[0027] The scanning stop module is configured to control the insulator fixing mechanism and the first probe to stop moving when the first probe moves to the outer edge of the insulator, so as to complete the scanning of the surface potential of the insulator.

[0028] In some embodiments of the present application, the planar projection of the path formed by the rotational movement and the linear movement is an Archimedean spiral.

[0029] In some embodiments of the present application, the linear movement is specifically:

[0030]

[0031] wherein, r(t) is the axial component of the linear movement, z(t) is the radial component of the linear movement, t is the movement time, n is the rotational speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear movement is decomposed with the connection line between the starting point and the outer edge on the same side of the insulator as the axial direction and the axis center of the central axis body as the radial direction, and the direction from the axis center of the central conductor to the outer edge of the insulator is the positive direction of the axial component, and the direction from the central conductor to the first probe is the positive direction of the radial component.

[0032] In some embodiments of the present application, the rotational movement is specifically:

[0033] θ(t) = 2πnt;

[0034] wherein, θ(t) is the rotational angle, n is the rotational speed of the insulator fixing mechanism, and t is the movement time.

[0035] In some embodiments of the present application, the device further includes a voltage application mechanism and a voltage shielding mechanism; the system further includes a pre-pressure application module; the pre-pressure application module includes a voltage application unit and a structure separation unit;

[0036] The voltage application unit is configured to control the connection between the voltage application mechanism and the insulator fixing mechanism, control the connection between the voltage shielding mechanism and the insulator, and control the voltage application mechanism to apply a voltage to the insulator;

[0037] The structure separation unit is configured to control the separation of the voltage shielding mechanism from the insulator to wait for the first probe to scan the surface potential of the insulator.

[0038] In the present application, first, the first probe is controlled to move to the starting point of the insulator to be scanned and wait for scanning. Then, the insulator fixing mechanism is controlled to drive the insulator fixed thereon to perform a rotational motion. At the same time, the first probe is controlled to move linearly from the starting point to the outer edge of the insulator. During the movement process, the surface potential of the insulator is scanned. The movements of the two form a three-dimensional helical path. The movement stops when the first probe moves to the outer edge of the insulator, and the scanning of the surface potential of the insulator is completed. Compared with the prior art where only the probe completes all scanning work, in the present application, through the simultaneous movement of the insulator and the probe, the movement path of a single part can be shortened, and the control duration of a single part can be reduced, thereby improving the scanning efficiency of the surface potential of the insulator. Compared with the unreasonable design of the path in the prior art, in the present application, the scanning path formed by the coordinated movement of the insulator and the probe is pre-designed to form a three-dimensional helix, which can improve the coverage of the scanning path on the surface of the insulator and avoid missing the measurement of the surface potential of the insulator, thereby improving the scanning accuracy of the surface potential of the insulator. Description of the Drawings

[0039] Figure 1 : Planar projection diagram of the concentric circular ring scanning path of the electrostatic probe method;

[0040] Figure 2 : Planar projection diagram of the reciprocating mobile scanning path of the electrostatic probe method;

[0041] Figure 3 : Schematic flow diagram of a method for scanning the surface potential of an insulator shown in some embodiments of the present application;

[0042] Figure 4 : Planar projection diagram of the scanning path of a method for scanning the surface potential of an insulator shown in some embodiments of the present application;

[0043] Figure 5: Schematic diagram of the movement mode of a method for scanning the surface potential of an insulator shown in certain embodiments of the present application;

[0044] Figure 6 : Overall schematic diagram of the scanning path of a method for scanning the surface potential of an insulator shown in certain embodiments of the present application;

[0045] Figure 7 : Module structure diagram of a system for scanning the surface potential of an insulator shown in certain embodiments of the present application. Detailed implementation manners

[0046] The following details the implementation manners of the present application. Examples of the implementation manners are shown in the drawings, where the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions throughout. The implementation manners described below in conjunction with the drawings are exemplary and are only used to explain some implementation manners of the present application, and should not be construed as a limitation on the implementation manners of the present application. All other implementation manners obtained by those of ordinary skill in the art based on the implementation manners shown in the present application without creative efforts fall within the protection scope of the present application.

[0047] In the description of the present application, it should be understood that the terms "first" and "second" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present application, unless otherwise specifically defined, the meaning of "plurality" and "several" is two or more.

[0048] In the existing methods for measuring the surface potential of insulators, the electrostatic probe method is the most widely used. However, in its actual application, due to the unreasonable design of its scanning path and the fact that only the probe is used to complete the scanning work during scanning, problems such as incomplete coverage of the scanning path resulting in missed measurements, too long scanning path or too slow scanning speed leading to attenuation of the surface potential of the insulator and thus a decrease in measurement accuracy may occur. Figure 1 is a commonly used concentric ring scanning path in the electrostatic probe method. Its measurement principle is to complete one circle of measurement for each current height, then move the probe forward and upward to the next height for the next circle of measurement, and repeat this process until the measurement is completed. The efficiency of this scanning path is low, and it can only measure the surface potential within the same ring and height range of the insulator. At the same time, it is easy to miss measurements between two rings, resulting in missing measurement data and measurement distortion. Figure 2It is another commonly used reciprocating mobile scanning path in the electrostatic probe method. Here, L is the inner diameter of the insulator, l is the probe measurement radius, and x is the probe movement distance. Its measurement principle is that the probe moves reciprocally, and the insulator moves linearly in a certain fixed direction perpendicular to the probe movement direction. The two keep moving until the measurement is completed. Although this scanning path can better cover the surface of the insulator, the path and operation of this scanning path are relatively cumbersome, and the path length is relatively high, which easily leads to the attenuation of the surface potential of the insulator and affects the measurement accuracy. Therefore, how to improve the accuracy and efficiency of the scanning measurement of the surface potential of the insulator remains an urgent problem to be solved.

[0049] Based on the above technical background, please refer to Figure 3 , an embodiment of the present application provides a method for scanning the surface potential of an insulator, which is applied to an insulator potential scanning device. The device includes an insulator fixing mechanism and a first probe, and includes steps S301 to S303. The specific steps are as follows:

[0050] Step S301: Control the first probe to move to the starting point of the insulator to be scanned and keep a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator.

[0051] In some embodiments of the present application, the device further includes a voltage application mechanism and a voltage shielding mechanism; before controlling the first probe to move to the starting point of the insulator to be scanned, it further includes:

[0052] Control the voltage application mechanism to be connected to the insulator fixing mechanism, control the voltage shielding mechanism to be connected to the insulator, and control the voltage application mechanism to apply a voltage to the insulator;

[0053] Control the voltage shielding mechanism to be separated from the insulator to wait for the first probe to scan the surface potential of the insulator.

[0054] The present application completes the preparatory work before the surface potential scanning of the insulator through the voltage application mechanism and the voltage shielding mechanism, can provide a prerequisite voltage for the surface potential scanning of the insulator through the voltage application mechanism, and avoid the mutual influence between the charged insulator and the outside through the voltage shielding mechanism, avoiding the inaccuracy of the surface potential scanning.

[0055] Step S302: Control the insulator fixing mechanism to perform a rotational motion to drive the insulator to perform a synchronous rotational motion, and control the first probe to perform a linear motion from the starting point to the outer edge of the insulator; wherein, when the first probe performs a linear motion, it maintains the first preset distance from the surface of the insulator and scans the surface potential of the insulator; the path formed by the rotational motion and the linear motion is a three-dimensional helix.

[0056] Please refer to Figure 4 , in some embodiments of the present application, the planar projection of the path formed by the rotational motion and the linear motion is an Archimedean spiral.

[0057] By pre-designing the scanning path formed by the cooperative motion of the insulator and the probe in the present application, so that its planar projection forms an Archimedean spiral, it can ensure full coverage of the surface of the insulator by the scanning path, improve the coverage of the scanning path, avoid missing measurement of the surface potential of the insulator, and thus improve the scanning accuracy of the surface potential of the insulator.

[0058] Please refer to Figure 5 , which is a motion schematic diagram of a method for scanning the surface potential of an insulator shown in some embodiments of the present application. Among them, the cylindrical groove inside the insulator is the central conductor not shown, the vector θ represents the counterclockwise rotational motion of the insulator; the vector z represents the radial component of the linear motion of the probe (i.e., the first probe), and its direction along the central conductor pointing to the first probe is the positive direction; the vector r represents the axial component of the linear motion of the first probe, and its direction along the axis of the central conductor pointing to the outer edge of the insulator is the positive direction. Specifically, when Figure 5 the planar projection of the path formed by the motion of the insulator and the probe shown is Figure 4 the Archimedean spiral shown, the polar coordinate formula of this path is analyzed as follows:

[0059]

[0060] where a is the pitch, b is the radial growth rate, r0 is the radius of the central conductor, θ is the rotation angle, is the axial motion coordinate, and z is the radial motion coordinate.

[0061] By associating the motion path with the motion time t, and performing motion decomposition on the insulator and the probe according to Formula 1, and at the same time performing motion decomposition of the motion of the probe in an oblique coordinate system, the analytical representation of the rotational motion of the insulator and the analytical representation of the linear motion of the probe can be obtained respectively.

[0062] Generally, since the rotation angle θ of the insulator is associated with the angular velocity, linear velocity, and movement time t, and changes in the angular velocity and linear velocity will cause changes in the movement path, by modifying the analytical formula for the association between the rotation angle and the movement time t in Formula 1, the Archimedean spiral corresponding to Formula 1 can be transformed into a spiral of other forms, and a similar scanning effect can also be achieved.

[0063] Generally, since Formula 1 includes the set constants a and b, and Formula 1 is the path polar coordinate analytical formula, by changing the pitch a and the radial growth rate b, it is possible to change the length of the movement path while Formula 1 still corresponds to the Archimedean spiral, that is, to correspondingly change the number of sampling points for the surface potential scan on the insulator surface, so as to adapt to insulators of different specifications.

[0064] In some embodiments of the present application, the linear motion is specifically:

[0065]

[0066] where r(t) is the axial component of the linear motion, z(t) is the radial component of the linear motion, t is the movement time, n is the rotation speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear motion is decomposed with the connection line between the starting point and the outer edge on the same side of the insulator as the axial direction and the axis center of the central shaft body as the radial direction, and the direction from the axis center of the central conductor to the outer edge of the insulator is the positive direction of the axial component, and the direction from the central conductor to the first probe is the positive direction of the radial component.

[0067] Through the pre-design of the linear motion of the first probe during the scanning process in the present application, where the axial component and the radial component of the linear motion are designed separately, it is possible to make the planar projection of the axial component form an Archimedean spiral, and cooperate with the radial component to ensure full coverage of the insulator surface by the scanning path, thereby avoiding missed measurements of the surface potential of the insulator, and thus improving the scanning accuracy of the insulator surface potential.

[0068] In some embodiments of the present application, the rotational motion is specifically:

[0069] θ(t) = 2πnt;

[0070] where θ(t) is the rotation angle, n is the rotation speed of the insulator fixing mechanism, and t is the movement time.

[0071] Through the pre-design of the rotational motion of the insulator driven by the insulator fixing mechanism during the scanning process in the present application, it is possible to provide a prerequisite for the measurement of the surface potential of the insulator and the scanning path formed during the measurement.

[0072] Step S303: When the first probe moves to the outer edge of the insulator, control the insulator fixing mechanism and the first probe to stop moving, so as to complete the scanning of the surface potential of the insulator.

[0073] To specifically illustrate the implementation effect of an insulator surface potential scanning method shown in the present application, please refer to Figure 6 , in a certain embodiment, taking a frustum-shaped insulator as an example, when the type of the three-dimensional spiral line formed is defined as an Archimedean spiral, the overall schematic diagram of the probe scanning path obtained through MATLAB modeling and simulation analysis is shown. Considering the inner diameter (i.e., the radius of the central conductor) r0 = 20 cm, the outer diameter r1 = 50 cm, the height h = 10 cm of the example frustum-shaped insulator, and defining the number of scanning turns N = 4, and then calculating the pitch a, the radial growth rate b, and the rotation angle θ in sequence, and further calculating the axial movement coordinate r and the radial movement coordinate z according to Formula 1, and then calculating its numerical difference to obtain the arc length s. With the same inner diameter, outer diameter, and number of scanning turns, the scanning path is defined as Figure 1 the concentric ring scanning path shown in the figure, and through modeling and simulation analysis and calculation, the arc length s' can be obtained. Through research and analysis, it can be concluded that s is about 20% shorter than s'. Obviously, an insulator surface potential scanning method shown in the present application can correspondingly shorten the movement path during the scanning of the insulator surface potential, thereby improving the scanning efficiency of the insulator surface potential.

[0074] The present application first controls the first probe to move to the starting point of the insulator to be scanned and wait for scanning, then controls the insulator fixing mechanism to drive the insulator fixed thereon to make a rotational motion, and at the same time controls the first probe to make a linear motion from the starting point to the outer edge of the insulator, and scans the surface potential of the insulator during the movement. The movement of the two constitutes a three-dimensional spiral line. When the first probe moves to the outer edge of the insulator, it stops moving and completes the scanning of the insulator surface potential. Compared with the prior art in which only the probe completes all the scanning work, the present application can shorten the movement path of a single part and reduce the control duration of a single part through the simultaneous movement of the insulator and the probe, thereby improving the scanning efficiency of the insulator surface potential; compared with the unreasonable design of the path in the prior art, the present application pre-designs the scanning path formed by the combined movement of the insulator and the probe to make it form a three-dimensional spiral line, which can improve the coverage of the scanning path on the surface of the insulator and avoid missing the measurement of the surface potential of the insulator, thereby improving the scanning accuracy of the insulator surface potential.

[0075] Corresponding to the foregoing method, please refer to Figure 7, an embodiment of the present application provides an insulator surface potential scanning system, which is applied to an insulator potential scanning device. The device includes an insulator fixing mechanism and a first probe. The system includes a scanning preparation module 710, a potential scanning module 720, and a scanning stop module 730;

[0076] The scanning preparation module 710 is configured to control the first probe to move to the starting point of the insulator to be scanned and maintain a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator;

[0077] The potential scanning module 720 is configured to control the insulator fixing mechanism to perform a rotational motion to drive the insulator to perform a synchronous rotational motion, and control the first probe to perform a linear motion from the starting point to the outer edge of the insulator; wherein, when the first probe performs a linear motion, it maintains the first preset distance from the surface of the insulator and scans the surface potential of the insulator; the path formed by the rotational motion and the linear motion is a three-dimensional helix;

[0078] The scanning stop module 730 is configured to control the insulator fixing mechanism and the first probe to stop moving when the first probe moves to the outer edge of the insulator, so as to complete the scanning of the surface potential of the insulator.

[0079] In some embodiments of the present application, the planar projection of the path formed by the rotational motion and the linear motion is an Archimedean spiral.

[0080] In some embodiments of the present application, the linear motion is specifically:

[0081]

[0082] wherein, r(t) is the axial component of the linear motion, z(t) is the radial component of the linear motion, t is the motion time, n is the rotational speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear motion is decomposed with the line connecting the starting point and the outer edge on the same side of the insulator as the axial direction and the axis center of the central axis body as the radial direction, and the direction from the axis center of the central conductor to the outer edge of the insulator is the positive direction of the axial component, and the direction from the central conductor to the first probe is the positive direction of the radial component.

[0083] In some embodiments of the present application, the rotational motion is specifically:

[0084] θ(t) = 2πnt;

[0085] Wherein, θ(t) is the rotation angle, n is the rotation speed of the insulator fixing mechanism, and t is the movement time.

[0086] In some embodiments of the present application, the device further includes a voltage application mechanism and a voltage shielding mechanism; the system further includes a pre-pressure application module; the pre-pressure application module includes a voltage application unit and a structure separation unit;

[0087] The voltage application unit is used to control the connection between the voltage application mechanism and the insulator fixing mechanism, control the connection between the voltage shielding mechanism and the insulator, and control the voltage application mechanism to apply voltage to the insulator;

[0088] The structure separation unit is used to control the separation of the voltage shielding mechanism from the insulator to wait for the first probe to scan the surface potential of the insulator.

[0089] In the present application, first, the first probe is controlled to move to the starting point of the insulator to be scanned and wait for scanning. Then, the insulator fixing mechanism is controlled to drive the insulator fixed thereon to perform a rotational motion. At the same time, the first probe is controlled to move linearly from the starting point to the outer edge of the insulator. During the movement process, the surface potential of the insulator is scanned. The movement of the two constitutes a three-dimensional spiral path. When the first probe moves to the outer edge of the insulator, the movement stops and the surface potential scanning of the insulator is completed. Compared with the prior art where only the probe completes all scanning work, in the present application, through the simultaneous movement of the insulator and the probe, the movement path of a single part can be shortened, and the control duration of a single part can be reduced, thereby improving the scanning efficiency of the surface potential of the insulator. Compared with the unreasonable design of the path in the prior art, in the present application, the scanning path formed by the coordinated movement of the insulator and the probe is pre-designed to form a three-dimensional spiral line, which can improve the coverage of the scanning path on the surface of the insulator and avoid missing the measurement of the surface potential of the insulator, thereby improving the scanning accuracy of the surface potential of the insulator.

[0090] It should be understood that the system provided by the embodiments of the present application corresponds to the foregoing method. A surface potential scanning system for an insulator provided by the embodiments of the present application can implement a surface potential scanning method for an insulator provided by any embodiment of the present application.

[0091] Adaptively, the embodiments of the present application also provide a computer device and a computer-readable storage medium.

[0092] The computer device includes: a processor, a memory, and a computer program stored in the memory and configured to be executed by the processor;

[0093] Wherein, when the processor executes the computer program, it implements a surface potential scanning method for an insulator of the present application.

[0094] The computer-readable storage medium stores multiple instructions, and the instructions are adapted to be loaded by a processor to execute a method for scanning the surface potential of an insulator according to the present application.

[0095] The above is a partial embodiment of the present application. The purpose, technical solution, and beneficial effects of the present application have been further described in detail. It should be clear that the above partial embodiments of the present application should not be construed as a limitation of the present application. In particular, for those skilled in the art, any changes, modifications, equivalent replacements, and variations made within the spirit and principle of the present application should be included within the protection scope of the present application.

Claims

1. A method for scanning the surface potential of an insulator, characterized in that, Applied to an insulator potential scanning device, the device includes an insulator fixing mechanism and a first probe, and the method includes: Controlling the first probe to move to the starting point of the insulator to be scanned and maintaining a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator; Controlling the insulator fixing mechanism to perform a rotational motion to drive the insulator to perform a synchronous rotational motion, and controlling the first probe to move linearly from the starting point to the outer edge of the insulator; wherein, when the first probe moves linearly, it maintains the first preset distance from the surface of the insulator and scans the surface potential of the insulator; the path formed by the rotational motion and the linear motion is a three-dimensional helix; When the first probe moves to the outer edge of the insulator, controlling the insulator fixing mechanism and the first probe to stop moving to complete the scanning of the surface potential of the insulator.

2. The surface potential scanning method for an insulator according to claim 1, wherein The planar projection of the path formed by the rotational motion and the linear motion is an Archimedean spiral.

3. A method for scanning the surface potential of an insulator according to claim 2, characterized in that The linear motion is specifically: Where r(t) is the axial component of the linear motion, z(t) is the radial component of the linear motion, t is the motion time, n is the rotational speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear motion is decomposed with the connection line between the starting point and the outer edge on the same side of the insulator as the axial direction and the axis center of the central axis body as the radial direction, and the direction from the axis center of the central conductor to the outer edge of the insulator is the positive direction of the axial component, and the direction from the central conductor to the first probe is the positive direction of the radial component.

4. A method for scanning the surface potential of an insulator according to claim 1, characterized in that The rotational motion is specifically: θ(t) = 2πnt; Where θ(t) is the rotational angle, n is the rotational speed of the insulator fixing mechanism, and t is the motion time.

5. A method for scanning the surface potential of an insulator according to claim 1, characterized in that, The device further includes a voltage application mechanism and a voltage shielding mechanism; before controlling the first probe to move to the starting point of the insulator to be scanned, it further includes: Controlling the voltage application mechanism to be connected to the insulator fixing mechanism, controlling the voltage shielding mechanism to be connected to the insulator, and controlling the voltage application mechanism to apply a voltage to the insulator; Controlling the voltage shielding mechanism to be separated from the insulator to wait for the first probe to scan the surface potential of the insulator.

6. An insulator surface potential scanning system, characterized in that, Applied to an insulator potential scanning device, the device includes an insulator fixing mechanism and a first probe, and the system includes a scanning preparation module, a potential scanning module, and a scanning stop module; The scanning preparation module is used to control the first probe to move to the starting point of the insulator to be scanned and maintain a first preset distance from the surface of the insulator; wherein, the insulator is fixed on the insulator fixing mechanism; the starting point is any point on the edge of the central conductor of the insulator; The potential scanning module is used to control the insulator fixing mechanism to perform a rotational motion, so as to drive the insulator to perform a synchronous rotational motion, and control the first probe to perform a linear motion from the starting point to the outer edge of the insulator; wherein, when the first probe performs a linear motion, it maintains the first preset distance from the surface of the insulator, and scans the surface potential of the insulator; the path formed by the rotational motion and the linear motion is a three-dimensional helix; The scanning stop module is used to control the insulator fixing mechanism and the first probe to stop moving when the first probe moves to the outer edge of the insulator, so as to complete the scanning of the surface potential of the insulator.

7. An insulator surface potential scanning system according to claim 6, wherein The planar projection of the path formed by the rotational motion and the linear motion is an Archimedean spiral.

8. An insulator surface potential scanning system according to claim 7, characterized in that, The linear motion is specifically: wherein, r(t) is the axial component of the linear motion, z(t) is the radial component of the linear motion, t is the motion time, n is the rotational speed of the insulator fixing mechanism, a is the pitch, b is the radial growth rate, and r0 is the radius of the central conductor; the linear motion is decomposed with the connection line between the starting point and the outer edge on the same side of the insulator as the axial direction and the axis center of the central shaft body as the radial direction, and the direction from the axis center of the central conductor to the outer edge of the insulator is the positive direction of the axial component, and the direction from the central conductor to the first probe is the positive direction of the radial component.

9. The surface potential scanning system for an insulator according to claim 6, characterized in that, The rotational motion is specifically: θ(t) = 2πnt; wherein, θ(t) is the rotational angle, n is the rotational speed of the insulator fixing mechanism, and t is the motion time.

10. A surface potential scanning system for an insulator according to claim 6, characterized in that, The device further includes a voltage application mechanism and a voltage shielding mechanism; the system further includes a pre-pressure application module; the pre-pressure application module includes a voltage application unit and a structure separation unit; The voltage application unit is used to control the voltage application mechanism to be connected to the insulator fixing mechanism, control the voltage shielding mechanism to be connected to the insulator, and control the voltage application mechanism to apply a voltage to the insulator; The structure separation unit is used to control the voltage shielding mechanism to be separated from the insulator to wait for the first probe to scan the surface potential of the insulator.