Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

Through the synergistic effect of the control unit and the display unit, the problem of inefficiency in setting the initial position of multiple conveying mechanisms in the substrate processing device is solved, safe and efficient initial position setting is achieved, erroneous operation and collision are avoided, and operation efficiency is improved.

CN120280386APending Publication Date: 2025-07-08KOKUSAI DENKI KK
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Patent Information

Application Number
CN202411399588.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-01-05
Filing Date
2024-10-09
Publication Date
2025-07-08

AI Technical Summary

Technical Problem

The substrate processing device is inefficient in the initial position setting operation, and it is difficult for the prior art to effectively manage the initial position setting of multiple conveying mechanisms, resulting in problems such as failure to operate normally or collisions.

Method used

The control unit determines and controls the initial position setting of multiple conveying mechanisms, and displays the set and unsettable conveying mechanisms through the display unit to ensure safe parallel settings, reduce the risk of erroneous operation and collision, and improve operation efficiency.

Benefits of technology

By clarifying the display and control logic, misoperation and device collision are avoided, the initial position setting efficiency of the substrate processing device is improved, and safety and clearness of the operation process are ensured.

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Abstract

The invention provides a substrate processing apparatus, a method of manufacturing a semiconductor device, and a recording medium. The reduction of work efficiency in an initial position setting operation of the substrate processing apparatus is suppressed. The present invention is provided with: a plurality of transport units which have one or more transport shafts and which transport substrates or containers in which the substrates are housed; an operation part which selects one or more conveying shafts and can set the initial positions of the conveying shafts; a display unit that displays the setting status of the initial position of the conveyance shaft; and a control unit that has a determination unit that determines that the setting of the initial position of the conveyance shaft selected by the operation unit is completed and that determines whether or not the setting of the initial position of another conveyance shaft can be performed in parallel with the selected conveyance shaft. The control unit is capable of performing control so as to notify the result determined by the determination unit.
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Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus, a method for manufacturing a semiconductor device, and a recording medium. Background Art

[0002] For example, a substrate processing apparatus and a method for manufacturing a semiconductor device as shown in Patent Document 1 are known.

[0003] Prior Art Documents

[0004] Patent Documents

[0005] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2012-169534 Summary of the Invention

[0006] The present invention provides a technique for suppressing a decrease in work efficiency in an initial position setting operation of a substrate processing apparatus.

[0007] According to one aspect of the present invention, there is provided the following technique: including: a plurality of transfer units each having one or more transfer shafts for transferring a substrate or a container accommodating the substrate; an operation unit for selecting one or more of the transfer shafts and setting an initial position of the transfer shaft; a display unit for displaying a setting status of the initial position of the transfer shaft; and a control unit having a determination unit for determining completion of setting of the initial position of the transfer shaft selected by the operation unit and determining whether it is possible to set the initial position of another transfer shaft in parallel with the selected transfer shaft, and the control unit can be controlled to notify the result determined by the determination unit.

[0008] Advantages of the Invention

[0009] According to the present invention, it is possible to suppress a decrease in work efficiency in an initial position setting operation of a substrate processing apparatus. Brief Description of the Drawings

[0010] Figure 1 It is an overall schematic diagram of a substrate processing apparatus used in an embodiment of the present invention.

[0011] Figure 2 It is a side cross-sectional view of a substrate processing apparatus used in an embodiment of the present invention.

[0012] Figure 3 It is a block diagram showing an outline of a control unit used in an embodiment of the present invention.

[0013] Figure 4 It is an example of a screen displayed on a display unit used in an embodiment of the present invention.

[0014] Figure 5It is a flowchart showing the order of setting the origin position in the embodiment of the present invention.

[0015] Figure 6 It is a table showing the correspondence relationship between the transfer shafts in the embodiment of the present invention.

[0016] Figure 7 It is a timing chart showing the steps implemented by the control unit in the embodiment of the present invention.

[0017] Figure 8 It is another example of the screen displayed on the display unit used in the embodiment of the present invention.

[0018] Description of reference numerals

[0019] 2 Substrate

[0020] 4 Container

[0021] 10 Substrate processing device

[0022] 50 Container storage rack (transfer unit)

[0023] 70 Container transfer device (transfer unit)

[0024] 100 Support member transfer device (transfer unit)

[0025] 110 Substrate transfer device (transfer unit)

[0026] 200 Control unit

[0027] 203 Judgment unit

[0028] 212 Operation unit

[0029] 213 Display unit Detailed implementation manners

[0030] Hereinafter, an example of the embodiment of the present invention will be described with reference to the drawings. In addition, in each figure, the same or equivalent structural elements and components are denoted by the same reference numerals. Further, for ease of explanation, there are cases where the dimensional ratios in the figures are exaggerated and different from the actual ratios.

[0031] In addition, in the description of the present invention, the "operator" is not limited to a specific person. That is, regarding the "operator", the operation may be performed by one person or by multiple persons.

[0032] In addition, in the description of the present invention, the "transfer shaft" includes the following two meanings. First, it is the axis related to the direction in which the object to be transferred moves linearly in a specified direction. Second, it is the axis representing the center of the rotation axis when the object to be transferred rotates and moves in a specified direction.

[0033] In addition, in the present embodiment, any device may be used for the linear motion mechanism that linearly moves the object to be transported and the rotary motion mechanism that rotarily moves the object to be transported.

[0034] In addition, in the following description, "select" means that an operator selects one of one or more structures. In other words, "select" means that a state is set in which the operator can arbitrarily operate the structure to be the object according to the operator's will.

[0035] In addition, in the following description, "capable of being selected" means a state in which, when an operator selects one of one or more transport shafts, the operator can operate the structure. Similarly, "not capable of being selected" means a state in which, even when an operator selects one of one or more transport shafts, the operator cannot operate the structure.

[0036] In addition, in the following description, "selectable" means a state that can be changed to a state in which an operator can arbitrarily operate by selecting one of one or more structures. Similarly, "not selectable" means a state that cannot be changed to a state in which an operator can arbitrarily operate a certain structure.

[0037] Figure 1 and Figure 2 FIG. shows the substrate processing apparatus 10 of the present embodiment. In addition, in the present embodiment, the substrate processing apparatus 10 is configured as a vertical apparatus that performs oxidation treatment, diffusion treatment, CVD (Chemical Vapor Deposition) treatment, etc. on the substrate 2. In the substrate processing apparatus 10, a FOUP (Front Opening Unified Pod: hereinafter referred to as the container 4) is used as a substrate container (substrate transporter) that houses the substrate 2 made of, for example, silicon (Si). When the container 4 is used as the substrate transporter, the substrate 2 is transported in a sealed state, so the cleanliness of the substrate 2 is improved.

[0038] (Structure)

[0039] As Figure 1 and Figure 2 shown, the substrate processing apparatus 10 includes a substrate processing apparatus main body 12, an operation unit 212, a display unit 213, a control unit 200, and a plurality of transport units.

[0040] The substrate processing apparatus 10 includes a substrate processing apparatus main body 12. On the front wall 12a of the substrate processing apparatus main body 12, there is provided a loading and unloading unit 14 for loading and unloading (loading / unloading) the container 4 into and out of the substrate processing apparatus main body 12. A loading / unloading port 16 that communicates the inside and outside of the substrate processing apparatus main body 12 is formed in the front wall 12a. The loading / unloading port 16 is opened and closed by an opening / closing unit 18.

[0041] The loading and unloading unit 14 includes a placement unit 20 for placing the container 4, a transfer mechanism 22 for transferring (sliding) the placement unit 20 in the front-rear direction, and a rotating unit 24 formed of, for example, a hinge that enables the placement unit 20 and the transfer mechanism 22 to rotate freely. In the present embodiment, two placement units 20 and transfer mechanisms 22 are arranged side by side in the left-right direction, respectively.

[0042] By transferring the placement unit 20 in the front-rear direction by the transfer mechanism 22, the container 4 placed on the placement unit 20 passes through the loading / unloading port 16 and moves in and out of the substrate processing apparatus main body 12. In this way, the transfer mechanism 22 transfers the placement unit 20 between the loading / unloading position and the handover position.

[0043] The loading / unloading position is a position where the container 4 is received and delivered outside the substrate processing apparatus main body 12 and with an external transfer device (not shown). In addition, the handover position is a position where the container 4 is received and delivered inside the substrate processing apparatus main body 12 and with a container transfer device 70 described later.

[0044] The placement unit 20 and the transfer mechanism 22 rotate forward, for example, during maintenance (repair) inside the substrate processing apparatus main body 12.

[0045] Inside the substrate processing apparatus main body 12 and at the upper rear of the loading and unloading unit 14, there is provided a buffer rack 30 that serves as a first storage unit for storing a plurality of containers 4. The buffer rack 30 is provided to separate the loading and unloading unit 14 from the container transfer device 70.

[0046] The buffer rack 30 is composed of a support plate 32 mounted on the inner surface of the front wall 12a and a plurality of rack plates 34 horizontally supported by the support plate 32. The buffer rack 30 places and arranges a plurality of containers 4 in the left-right direction on each rack plate 34.

[0047] A sub-housing 40 is provided at the lower rear inside the substrate processing apparatus main body 12. The sub-housing 40 forms a space that is fluid-tightly isolated from the space inside the substrate processing apparatus main body 12 by a horizontal wall 42 provided in the front-rear direction and a vertical wall 44 provided in the up-down direction.

[0048] (Transfer Unit)

[0049] In the present embodiment, as an example, the plurality of transfer units include a substrate transfer device 110, a container transfer device 70, a container storage rack 50, and a support member transfer device 100. In addition, the substrate transfer device 110 is an example of the substrate transfer unit in the present embodiment. Further, the container transfer device 70 is an example of the container transfer unit in the present embodiment.

[0050] Above the sub-housing 40, a container storage rack 50 serving as a second storage unit for storing the container 4 is provided.

[0051] As Figure 1 and Figure 2 shown, the container storage rack 50 is a device for storing the container 4 containing the substrate 2 inside the substrate processing apparatus 10. The container storage rack 50 includes a rack plate 54 that extends in four directions in the horizontal direction and on which the container 4 is placed, and a second rotation mechanism 148 that moves the rack plate 54 in a predetermined direction. The second rotation mechanism 148 is a rotation mechanism that rotates and moves the rack plate 54 about a rotation axis in the vertical direction. By rotating the rack plate 54 carrying the container 4 using the second rotation mechanism 148, multiple, up to four, containers 4 can be placed on one rack plate 54.

[0052] In other words, the container storage rack 50 is a transfer unit having a total of one transfer axis, which is a transfer axis that rotates and moves about a rotation axis in the vertical direction. Further, the container storage rack 50 is an example of a rack in the present embodiment. Additionally, the second rotation mechanism 148 is an example of a rotatable rotation axis in the present embodiment.

[0053] Further, the rack plate 54 rotates intermittently using the second rotation mechanism 148, and the container 4 placed on the rack plate 54 is sequentially sent to the front position (front side).

[0054] On the vertical wall 44 of the sub-housing 40, two substrate loading ports 60 for loading and unloading (loading and unloading) the substrate 2 into and out of the container 4 from the container 4 into the sub-housing 40 or from the sub-housing 40 into the container 4 are provided in the vertical direction. At the substrate loading port 60, a container opening / closing device 62 for opening and closing the container 4 by attaching and detaching the lid portion of the container 4 is provided. Further, on the vertical wall 44, a loading / unloading port 64 for communicating the inside and outside of the sub-housing 40 is opened corresponding to the substrate loading port 60.

[0055] Inside the substrate processing apparatus main body 12, a container transfer device 70 for transferring the container 4 is provided between the buffer rack 30 and the container storage rack 50.

[0056] As Figure 1 and Figure 2As shown, the container transfer device 70 is a device that transfers the container 4 containing the substrate 2 inside the substrate processing device 10. The container transfer device 70 includes a mounting table 86 for mounting the container 4, a fourth linear motion mechanism 145, a fifth linear motion mechanism 146, and a sixth linear motion mechanism 147 that move the mounting table 86 in a specified direction.

[0057] The fourth linear motion mechanism 145 is a linear motion mechanism that linearly moves the mounting table 86 in the front-rear direction. The fifth linear motion mechanism 146 is connected to the fourth linear motion mechanism 145 and is a linear motion mechanism that moves the mounting table 86 together with the fourth linear motion mechanism 145 in the up-down direction. The sixth linear motion mechanism 147 is connected to the fifth linear motion mechanism 146 and is mounted on the substrate processing device main body 12, and is a linear motion mechanism that moves the mounting table 86 together with the fourth linear motion mechanism 145 and the fifth linear motion mechanism 146 in the left-right direction.

[0058] In other words, the container transfer device 70 is a transfer unit having a total of three transfer shafts including a transfer shaft driven in the front-rear direction, a transfer shaft driven in the up-down direction, and a transfer shaft driven in the left-right direction. In addition, the container transfer device 70 transfers the container 4 placed on the container storage rack 50 in the present embodiment, and mounts the container 4 on the container storage rack 50. In addition, the fourth linear motion mechanism 145 is an example of a vertical shaft that can move in the up-down direction in the present embodiment. In addition, the fifth linear motion mechanism 146 is an example of a left-right shaft that can move in the left-right direction in the present embodiment.

[0059] At the upper rear inside the substrate processing device main body 12, a heater unit 90 is installed in the vertical direction. Inside the heater unit 90, a process tube 92 constituting a processing chamber is arranged concentrically. A gas introduction tube 94 for introducing raw material gas, purge gas, etc. into the process tube 92 and an exhaust tube 96 for evacuating the inside of the process tube 92 are connected to the process tube 92.

[0060] Below the heater unit 90 and inside the sub-housing 40, a support transfer device 100 is provided.

[0061] As Figure 1 and Figure 2 shown, the support transfer device 100 includes a lid 102 that extends in the horizontal direction and is substantially disk-shaped, a boat 104 provided above the lid 102, and a seventh linear motion mechanism 149 that moves the boat 104 in a specified direction.

[0062] The lid 102 is configured to seal the lower end opening of the process tube 92 and support the boat 104 in a vertically upright state.

[0063] The boat 104 holds multiple substrates 2 in a state of being centered and horizontally arranged. As the lid 102 is lifted and lowered by the support transfer device 100, the boat 104 is moved into and out of the process tube 92. The boat 104 holds more substrates 2 (e.g., 150 pieces) compared to the number of substrates 2 (e.g., 25 pieces) accommodated in one container 4.

[0064] The seventh linear motion mechanism 149 is a linear motion mechanism that moves the boat 104 in the vertical direction. In addition, when the lid 102 is in close contact with the process tube 92 and the internal space is sealed, the internal space becomes a processing chamber for processing the substrate 2.

[0065] In other words, the support transfer device 100 is a transfer unit having a transfer shaft that is driven in the vertical direction. In addition, the support transfer device 100 supports the substrate 2 transferred from the container 4 by the substrate transfer device 110 in this embodiment on the boat 104, and moves the support transfer device 100 supporting the substrate 2 into or out of the processing container 92 through the lid 102. In addition, the seventh linear motion mechanism 149 is an example of a vertical axis that can move in the vertical direction in this embodiment.

[0066] A substrate transfer device 110 is provided in the space within the sub-housing 40. The substrate transfer device 110 is configured to transfer the substrate 2 between the substrate loading port 60 and the boat 104.

[0067] As Figure 1 and Figure 2 shown, the substrate transfer device 110 is a device that picks up and places the substrate 2 with respect to the container 4 and transfers the substrate 2 to the support transfer device 100. The substrate transfer device 110 includes a base 112 mounted on the substrate processing device 10, a clamp 122 for gripping the substrate 2, a first linear motion mechanism 141 for moving the clamp 122 in a specified direction, a second linear motion mechanism 143, a first rotation mechanism 142, and a third linear motion mechanism 144. The second linear motion mechanism 143 is a linear motion mechanism that linearly moves the clamp 122 in the vertical direction. The first linear motion mechanism 141 is connected to the second linear motion mechanism 143 and the first rotation mechanism 142, and is a linear motion mechanism that moves the clamp 122 together with the second linear motion mechanism 143 in the horizontal direction (in the case where the first rotation mechanism 142 is at the origin position, it is the front-rear direction). The first rotation mechanism 142 is connected to the first linear motion mechanism 141 and the third linear motion mechanism 144, and is a rotation mechanism that rotates and moves the clamp 122 together with the first linear motion mechanism 141 and the second linear motion mechanism 143 about the vertical axis. The third linear motion mechanism 144 is connected to the first rotation mechanism 142 and the base 112, and is a linear motion mechanism that moves the clamp 122 together with the first linear motion mechanism 141, the first rotation drive mechanism 142, and the second linear motion mechanism 143 in the vertical direction.

[0068] In other words, the substrate transfer device 110 is a transfer unit having a total of four transfer shafts, namely, a transfer shaft driven in the front-rear direction, two transfer shafts driven in the up-down direction, and a transfer shaft that rotates and moves with the up-down direction as the rotation axis. In addition, the first rotation mechanism 142 is an example of a rotatable rotation shaft in the present embodiment. In addition, the first linear motion mechanism 141 is an example of a front-rear shaft that can move in the front-rear direction in the present embodiment. In addition, the second linear motion mechanism 143 is an example of a vertical shaft that can move in the up-down direction in the present embodiment. In addition, the third linear motion mechanism 144 is an example of a vertical shaft that can move in the up-down direction in the present embodiment.

[0069] In addition, in the following description, when referring to any one of the first linear motion mechanism 141 to the seventh linear motion mechanism 149, and the first rotation mechanism 142 or the second rotation mechanism 148, it is only referred to as the "transfer mechanism". That is, selecting any transfer mechanism or operating it means selecting or operating the transfer shaft of the transfer mechanism.

[0070] (Control unit)

[0071] As shown in Figure 3 , the control unit 200 includes a CPU 201 (Central Processing Unit) as an example of a processor, and a RAM 202 (Random Access Memory) used as a temporary work area of the CPU 201. In addition, by executing a control program by the CPU 201, the control unit 200 functions as a determination unit 203 described later. In addition, the control unit 200 includes a storage unit 204 that stores a control program that causes the CPU 201 to function as the control unit 200, and an I / O port 205. The CPU 201, the RAM 202, the storage unit 204, and the I / O port 205 are respectively connected via a bus (not shown).

[0072] In this way, dedicated processors and memories for executing respective processes are allocated to the control unit 200. The CPU 201 reads a control program from the storage unit 204 and executes the overall control of the substrate processing apparatus 10 undertaken by the control unit 200. That is, the control unit 200 in the present embodiment is also an example of a computer.

[0073] The storage unit 204 is an example of a storage device that can maintain the stored information even when the power supplied to each is cut off. For example, a semiconductor memory is used, but a hard disk may also be used.

[0074] In addition, as shown in Figure 3 , a process control unit 220 and a transfer control unit 221 are connected to the I / O port 205.

[0075] The process control unit 220 is a control device for the substrate processing apparatus 10 to execute the processing sequence of the substrate 2. Specifically, the process control unit 220 is connected to devices such as a temperature measurement device and a pressure measurement device (not shown), and a gas control device for gases such as a processing gas and an inert gas that are used to process the substrate 2.

[0076] As shown in Figure 3 , the transfer control unit 221 is a control device connected to a total of nine drivers, namely, a first linear motion mechanism driver 241, a second linear motion mechanism driver 243, a third linear motion mechanism driver 244, a fourth linear motion mechanism driver 245, a fifth linear motion mechanism driver 246, a sixth linear motion mechanism driver 247, a seventh linear motion mechanism driver 249, a first rotational motion mechanism driver 242, and a second rotational motion mechanism driver 248.

[0077] Here, the linear motion mechanism driver is a control device that controls the controlled transfer mechanism when the transfer unit moves in a specific direction. The first linear motion mechanism driver 241 to the seventh linear motion mechanism driver 249 respectively correspond to the first linear motion mechanism 141 to the seventh linear motion mechanism 149. For example, Figure 3 when the first linear motion mechanism driver 241 shown in Figure 1 receives an instruction from the control unit 200, it drives the first linear motion mechanism 141 that makes the Figure 2 shown pincers move in the front - rear direction. The same applies to other linear motion mechanism drivers and rotational motion mechanism drivers.

[0078] In addition, as shown in Figure 3 , an external communication unit 210, an external storage unit 211, an operation unit 212, and a display unit 213 are connected to the I / O port 205.

[0079] The external communication unit 210 is connected to a communication line and has a communication protocol for transmitting and receiving data with an external device (not shown) connected to the same communication line. The external communication unit 210 performs data communication with the external device in accordance with an instruction from the CPU 201 in the control unit 200.

[0080] The external storage unit 211 is a device that stores various data etc., separately provided from the storage unit 204 of the control unit 200. The specific structure of the external storage unit 211 is not particularly limited. As an example, a storage device connected through a network such as NAS (Network Attached Storage), or a removable recording medium such as an SD memory card is used.

[0081] The operation unit 212 is a device that receives instructions from an operator and notifies the received instructions to the CPU 201 of the control unit 200. Examples include buttons provided on the housing of the substrate processing apparatus 10 and operation accessories connected to the substrate processing apparatus 10. In addition, the display unit 213 is a display device that displays information on the substrate processing apparatus 10. Examples include a liquid crystal display or an organic EL (Electro Luminescence) display, etc.

[0082] In addition, regarding the display unit 213 and the operation unit 212, as will be described later in this embodiment Figure 4 as shown, a touch panel that can be operated by an operator touching the screen will be taken as an example for explanation. In other words, in this embodiment, the touch panel is a device that serves as both the display unit 213 and the operation unit 212. The specific description of what is displayed on the touch panel will be described later.

[0083] In addition, each structure connected to the I / O port 205 is an example, and a structure corresponding to the function of the substrate processing apparatus 10 is connected. In addition, a structure represents an execution unit that executes processing in accordance with the control of a processor such as the CPU 201 and the RAM 202.

[0084] (Display unit)

[0085] As Figure 4 shown, a transfer axis selection area 215, a start order display area 217, a job order display area 216, and a progress status display area 218 are displayed on the screen of the display unit 213.

[0086] As Figure 4 and as will be described later Figure 8 shown, items AI of the transfer mechanism included in the substrate processing apparatus 10 are displayed in the transfer axis selection area 215. More specifically, in the transfer axis selection area 215, as an example of item AI, the names of the transfer mechanisms included in the substrate processing apparatus 10 are arranged and displayed in the vertical direction. In addition, the item AI of the transfer mechanism displayed in the transfer axis selection area 215 can be selected by the operator using the touch panel. In addition, the control unit 200 differentiates the item AI selected by the operator from the unselected item AI by surrounding it with a frame F. In addition, a mark indicating the state of the transfer mechanism is attached to the item AI. In other words, the control unit 200 switches the display of the selected item AI by attaching the frame F to the selected item AI. In addition, the frame F is a mark for differentiating the selected item AI from the unselected item AI, and it may not be a frame, but the background of the area shown by the frame F, that is, the selected area of the selected item AI, may be set to a different display from the unselected item AI.

[0087] For example, as Figure 4 and as will be described later Figure 8As shown, when the conveyance mechanism is calibrated and the distance from the origin position in the machine coordinates of the substrate processing apparatus 10 is determined, a mark C indicating the completion of position setting is attached to the conveyance mechanism. Further, when the conveyance mechanism is not calibrated and the distance from the origin position in the machine coordinates of the substrate processing apparatus 10 is unknown, a mark I indicating the incomplete state of position setting is attached to the conveyance mechanism. Further, assuming that the substrate processing apparatus 10 is being assembled and the conveyance mechanism is not assembled to the substrate processing apparatus 10, in other words, in the case of a circuit break, a mark A indicating the circuit cut state is attached to the conveyance mechanism.

[0088] Further, in the present embodiment, when the conveyance mechanism cannot be selected for the following reasons, the item AI indicating the conveyance mechanism is set to the non-selectable indication D and displayed faintly, thereby indicating the situation where selection is impossible. For example, in Figure 4 the conveyance mechanisms other than the first linear motion mechanism 141 are set to the non-selectable indication D and displayed faintly.

[0089] In addition, in the present embodiment, there are cases where the operator can select multiple conveyance mechanisms together when calibrating the conveyance mechanism. The case where multiple conveyance mechanisms can be selected together and the display of the conveyance axis selection area 215 in this case will be described later.

[0090] In the start order display area 217, a list of the order from the preparation before calibration to the preservation of the initial position until the completion of calibration of the conveyance axis selected in the conveyance axis selection area 215 is displayed. Further, as Figure 4 and described later Figure 8 shown, for the order in the process of execution in the list of orders, a frame F is attached for display.

[0091] In the operation order display area 216, for the conveyance mechanism selected by the operator in the conveyance axis selection area 215, the operation order of the processing content in the order indicated by the frame F in the start order display area 217 is displayed as the operation item WI. In other words, the control unit 200 switches the operation item WI indicating the operation in the process of execution to a display different from other operation items WI by attaching the frame F to the operation item AI. In other words, the control unit 200 switches the display of the operation order according to the operation in the process of execution by attaching the frame F to the operation item WI.

[0092] In the progress status display area 218, the actions performed in the calibration operation shown in the operation sequence display area 216 of the transport mechanism selected by the operator in the transport axis selection area 215 are displayed. More specifically, in the progress status display area 218, the operation contents started to be executed by the control unit 200 for the transport mechanism in the order of the calibration operation and the operations that have been completed are displayed. For example, in Figure 8 In one example, as the start and end of the execution of the actions shown in the operation sequence display area 216 for the first rotating mechanism 142, the second linear motion mechanism 143, and the third linear motion mechanism 144, "fast forward execution start" and "fast forward execution end" are shown for each transport axis unit. In addition, in Figure 8 In one example, since the operation for the first rotating mechanism 142 is being further advanced, "origin movement execution start" is also shown. In addition, in the case where the operation is not normally completed due to an error or timeout, etc., the main idea of abnormal end can also be displayed.

[0093] In addition, in the progress status display area 218, when the order executed by the control unit 200 changes, items are newly added and displayed. In other words, the control unit 200 switches and displays the operation progress status corresponding to the operation during execution for the display in the progress status display area 218 by newly adding and displaying items.

[0094] Next, the operation of the substrate processing apparatus 10 will be described.

[0095] (Transport operation)

[0096] When the container 4 is placed on the placement unit 20 at the loading / unloading position, the placement unit 20 is moved to the transfer position by the transport mechanism 22. Along with this, the container 4 is carried into the substrate processing apparatus main body 12 from the loading / unloading port 16.

[0097] The container 4 carried into the substrate processing apparatus main body 12 is transferred from the placement unit 20 to a predetermined position on the buffer rack 30 or the container storage rack 50 by the container transport device 70 and is temporarily stored. The containers 4 stored in the buffer rack 30 and the container storage rack 50 are transported to a predetermined substrate loading port 60 by the container transport device 70. In addition, it can also be directly transported from the placement unit 20 to the substrate loading port 60.

[0098] The lid of the container 4 transported to the substrate loading port 60 is opened by the container opening / closing device 62. In parallel, other containers 4 are transported to the other substrate loading port 60.

[0099] When a transfer operation of transferring another container 4 to the lower substrate loading port 60 is performed during an opening operation of the container 4 at the upper substrate loading port 60, the standby time due to the replacement operation of the container 4 can be shortened as compared with the case where this structure is not provided.

[0100] When the lid of the container 4 is opened at the substrate loading port 60, the substrate 2 accommodated in the container 4 is transferred (loaded) to the boat 104 by the substrate transfer device 110.

[0101] (Processing operation)

[0102] The container 4 is repeatedly supplied to the substrate loading port 60, and the substrates 2 accommodated in these multiple containers 4 are batch-processed while being held in the boat 104.

[0103] When a predetermined number of substrates 2 are held on the boat 104, the boat 104 is raised by the support transfer device 100 and carried into the process tube 92. At this time, the lid 102 holding the boat 104 seals the lower end opening of the process tube 92, and the inside of the process tube 92 is hermetically sealed.

[0104] When the processing chamber of the process tube 92 is hermetically sealed, it is evacuated to a predetermined vacuum degree through the exhaust pipe 96 and heated to a predetermined temperature by the heater unit 90. Then, a predetermined source gas is supplied at a predetermined flow rate through the gas introduction pipe 94. In this way, a predetermined process (for example, formation of a CVD film) is performed on the substrate 2.

[0105] When a predetermined processing time has elapsed, the boat 104 is lowered by the support transfer device 100, and the boat 104 is carried out to the standby position. In parallel with the loading / unloading operation and the processing operation of the boat 104 with respect to the process tube 92, a transfer operation of the container 4 is performed by the container transfer device 70. In addition, the processing time in this specification represents the time during which this processing is continuously performed. The same applies to the following description.

[0106] The processed substrate 2 held on the boat 104 is transferred (unloaded) to the container 4 waiting at the substrate loading port 60 by the substrate transfer device 110.

[0107] Next, the lid of the container 4 is closed by the container opening / closing device 62.

[0108] The container 4 containing the processed substrate 2 is carried to the buffer rack 30 or the container storage rack 50 by the container transfer device 70.

[0109] The transfer operation of the processed substrate 2 is performed as follows: The container 4 is repeatedly supplied to the substrate loading port 60, and the processed substrate 2 is accommodated from the boat 104 with respect to these multiple containers 4.

[0110] At this time, in parallel with the operation of transferring the substrate 2 from the boat 104 to one of the substrate loading ports 60 (upper side or lower side), the operation of transporting the container 4 to the other substrate loading port 60 is performed. Thus, compared with the case without this structure, the standby time caused by the replacement operation of the container 4 is shortened.

[0111] The container 4 accommodating the processed substrate 2 is transferred from the buffer rack 30 or the container storage rack 50 to the placement unit 20 at the handover position by the container transfer device 70. Then, the placement unit 20 is transported to the loading / unloading position by the transport mechanism 22, and the container 4 is unloaded outside the substrate processing apparatus main body 12.

[0112] In addition, the container 4 accommodating the processed substrate 2 can also be directly transferred from the substrate loading port 60 to the placement unit 20.

[0113] These operations are performed in the order specified in the program executed by the above-mentioned CPU.

[0114] (Calibration operation)

[0115] In addition, there is a case where an operator or user using the substrate processing apparatus 10 performs a calibration operation on the transport units (substrate transfer device 110, container transfer device 70, container storage rack 50, and support transfer device 100) of the substrate processing apparatus 10 in order to grasp the movement amount of the transport mechanism. Specifically, in order to normally transport the object to be transported, the control unit 200 identifies the origin positions in each transport mechanism so that the actual position of the object to be transported can be identified. In the present embodiment, the origin positions of the respective transport mechanisms are examples of the initial positions in the present embodiment, and causing the control unit 200 to identify the origin positions of the respective transport mechanisms is an example of the setting of the initial positions.

[0116] Next, in the present invention, with reference to Figure 5 the order of the calibration operation in each transport mechanism will be described.

[0117] (Order of calibration operation)

[0118] First, the CPU 201 reads the program from the storage unit 204 and starts the execution of the calibration operation order. Then, the CPU 201 transfers to step S102.

[0119] In step S102, the CPU 201, in accordance with the program, as Figure 4 shown, displays the origin position setting screen on the screen of the touch panel. Then, the CPU 201 transfers to step S104.

[0120] Next, in step S104, the CPU 201 waits for the operator to select a transfer mechanism. More specifically, the CPU 201 waits for the operator to select one of the transfer mechanisms displayed in the transfer axis selection area 215. When the operator selects a certain transfer mechanism, the CPU 201 displays the setting order of the origin position in the transfer mechanism in the operation order display area 216. That is, the order of step S104 is an example of a selection process of using the operation unit 212 to select a plurality of transfer units that transfer the substrate 2 or the container 4 accommodating the substrate 2. Then, the CPU 201 transfers to step S106.

[0121] Next, in step S106, the CPU 201 performs the setting of the origin position. More specifically, for the order displayed in the operation order display area 216 by the operator, the CPU 201 waits for the input of an execution instruction. In addition, when the execution instruction is input, the CPU 201 causes the transfer object of the selected transfer mechanism to move to the origin position according to the program. For example, in Figure 4 , for the first linear motion mechanism 141, the CPU 201 causes the clamp to fast forward until the clamp is at the origin position. Then, when it is confirmed that the selected transfer mechanism (the clamp of the first linear motion mechanism 141 in Figure 4 ) is at the origin position, the CPU 201 transfers to step S108.

[0122] Next, in step S108, the CPU 201 stores the fact that the selected transfer mechanism has been moved to the origin position and the calibration is completed as origin position setting information in the storage unit 204. More specifically, the CPU 201 stores the fact that the selected transfer mechanism has been moved to the origin position and the error between the origin of the machine coordinates in the storage unit 204.

[0123] That is, the order from step S106 to step S108 is an example of a setting process of using the operation unit 212 to perform the initial setting of the selected transfer mechanism. And after the CPU 201 completes step S108, it ends the calibration operation order. In addition, although the first linear motion mechanism 141 is described above, the same applies to other transfer mechanisms (the second linear motion mechanism 143 to the seventh linear motion mechanism 149, and the first rotation mechanism 142 or the second rotation mechanism 148).

[0124] In addition, the fact that the selected transfer mechanism has been moved to the origin position and the calibration operation is completed is an example of the case where the setting at the initial position is set normally completed in the present embodiment.

[0125] However, among the transfer mechanisms included in the substrate processing apparatus 10, there are also transfer mechanisms that have a period during which the above-described calibration operation cannot be performed.

[0126] Specifically, in the present embodiment, when the second linear motion mechanism 143, the third linear motion mechanism 144, or the first rotational mechanism 142 is driven while the first linear motion mechanism 141 is not in the origin position, there is a possibility that the clamp-like member collides with other structures (such as the support member transfer device 100, etc.) and is damaged. In this case, after the operator first moves the first linear motion mechanism 141 to the origin position for correction, the second linear motion mechanism 143, the third linear motion mechanism 144, and the first rotational mechanism 142 are corrected.

[0127] Further, for example, in order to confirm whether each transfer mechanism operates normally during the assembly of the substrate processing apparatus 10, there is a case where, instead of installing all the drive shafts, the transfer mechanism is experimentally operated in a state where only any one transfer mechanism is assembled.

[0128] In such a case, it is preferable to limit the transfer mechanism operable by the operator to a predetermined transfer mechanism. For example, in the present embodiment, the determination unit 203 constituted by a program executed by the CPU 201 of the control unit 200 determines that the correction operation can be performed on other transfer mechanisms when the operator has completed the correction operation of the first linear motion mechanism 141. On the other hand, the determination unit 203 determines that the correction operation cannot be performed on other transfer mechanisms when the operator has not completed the correction operation of the first linear motion mechanism 141. In addition, the first linear motion mechanism 141 can be said to be the predetermined transfer unit in the present embodiment.

[0129] However, in the case where the operator is a skilled technician, there is also a case where multiple transfer mechanisms are driven simultaneously in the above correction order, and the origin positions are set for the multiple transfer mechanisms together to shorten the operation time.

[0130] In such a case, it is not desirable to limit the transfer mechanism operable by the operator to a specific transfer mechanism and force the correction to be performed one by one.

[0131] Next, with reference to Figures 6 to 8 The operation of the control unit 200 in the substrate processing apparatus 10 of the present embodiment will be described.

[0132] (Initial position setting operation of the present embodiment)

[0133] Figure 6 is a correspondence table stored in the storage unit 204 of the present embodiment, indicating the transfer mechanisms that can be selected simultaneously for each transfer mechanism. More specifically, when the operator selects a certain transfer mechanism in the left column in Figure 6 , the CPU 201 makes the transfer mechanisms other than those described in the right column corresponding to the selected transfer mechanism non-selectable. For example, inFigure 6 In the case where the first rotating mechanism 142 is selected, the conveying mechanisms other than the second linear motion mechanism 143, the third linear motion mechanism 144, the seventh linear motion mechanism 149, and the second rotating mechanism 148 are set to be non-selectable. Additionally, for example, in Figure 6 in the case where the first linear motion mechanism 141 is selected, the other conveying mechanisms are set to be non-selectable. That is, in the present embodiment Figure 6 the correspondence table shown is an example of the predefined parameters in the present embodiment.

[0134] More specifically, the CPU 201, by executing a program, switches the identifier of the display unit 213 together with other structures, thereby notifying the display unit 213 of the selectability of the other conveying mechanisms. Refer to Figure 7 to illustrate the order of execution by the control unit 200.

[0135] First, as Figure 7 shown, when an operator selects one of the conveying mechanisms displayed in the conveying axis selection area 215, the operation unit 212 notifies the determination unit 203 of the selected conveying mechanism as a sequence (sequence) S202. Additionally, the operation unit 212 notifies the display unit 213 of the selected conveying mechanism as a sequence S204.

[0136] Next, in sequence S206, the determination unit 203 determines, based on the correspondence table, whether there is a conveying mechanism that can be selected simultaneously with the selected conveying mechanism. In other words, in sequence S206, the determination unit 203 determines whether it is valid for the other conveying mechanisms. That is, the order of sequence S206 is an example of a determination process in the present embodiment for making a determination on the completion of setting the initial position of the conveying mechanism selected by the operation unit 212 and a determination on whether the initial position of the other conveying mechanisms can be set in parallel with the selected conveying mechanism.

[0137] Additionally, in sequence S208, the display unit 213 displays the selected conveying mechanism by means of a marking frame F for the selected conveying mechanism among the conveying mechanisms displayed in the conveying axis selection area 215.

[0138] Furthermore, when there is another selectable conveying mechanism in sequence S206, the determination unit 203 sends the determination result of sequence S206 to the display unit 213 in sequence S212. That is, the order of sequence S212 is an example of a process for notifying the determination result in the determination process in the present embodiment.

[0139] Then, in sequence S214, the display unit 213 sets the other conveying mechanisms other than the other selectable conveying mechanisms sent from the determination unit 203 in sequence S212 to be non-selectable. More specifically, the display unit 213, as Figure 8As shown in the middle transport axis selection area 215, in sequence S214, the transport mechanisms other than the selectable transport mechanisms are displayed as unselectable marks D and are dimmed.

[0140] Furthermore, when the judgment unit 203 judges that other transport mechanisms are not effective in the sequence S206, the sequence S212 is not executed. In other words, when the sequence S212 is not executed, the display of all other transport mechanisms except the selectable transport mechanisms is dimmed. That is, the fact that the judgment unit 203 does not execute the sequence S212 and does not send other selectable transport mechanisms to the display unit 213 is another example of the process of notifying the judgment result in the judgment process in this embodiment.

[0141] The control unit 200 in this embodiment calibrates a plurality of conveying units having a plurality of conveying mechanisms by executing the above series of procedures by the CPU 201. In addition, the above series of procedures can be executed for each of the conveying mechanisms of the substrate processing device 10, so it can be said that the plurality of conveying mechanisms are initially set by the above selection sequence.

[0142] (Processing process)

[0143] Furthermore, in the substrate processing apparatus 10 of the present embodiment, the substrate 2 is processed using the transport unit whose transport mechanism has been calibrated by the calibration operation described above. More specifically, after completing the calibration operation of all transport mechanisms, the operator inputs to the operation unit 212 to cause the control unit 200 to execute the above-mentioned transport operation and processing operation, and the substrate 2 is processed and the semiconductor device is manufactured.

[0144] According to the present embodiment, one or more of the following effects are achieved.

[0145] (Function and Effect)

[0146] Before starting the substrate processing apparatus 10, the initial position of each of the plurality of conveying mechanisms of the plurality of conveying units is set in advance. In addition, if the initial positions of the plurality of conveying mechanisms of the plurality of conveying units are set in the wrong order, the substrate processing apparatus 10 may not operate normally.

[0147] Here, in the substrate processing apparatus 10 of the present embodiment, since the transfer mechanisms displayed on the display unit 213 can be viewed and one or more transfer mechanisms for setting the initial position can be selected using the operation unit 212, the burden on the operator can be reduced. In addition, even if the operator erroneously selects a transfer mechanism for setting the initial position, since the determination unit 203 determines the validity / invalidity of the setting of the initial position of the selected transfer mechanism, the control unit 200 controls to perform only the initial setting of the transfer mechanism for the drive shafts determined to be valid, and in the case of being determined to be invalid, notifies that the setting of the initial position of the selected transfer mechanism is invalid. Therefore, the occurrence of defects during the initial position setting operation can be suppressed.

[0148] In addition, according to the substrate processing apparatus 10 of the present embodiment, by confirming whether the initial position has been set for a predetermined transfer mechanism before operating other transfer mechanisms, collisions between the transfer units can be avoided, and the safety of the operation can be improved.

[0149] In addition, according to the substrate processing apparatus 10 of the present embodiment, other selectable axes are set for the selected axis in the parameters, and it is easy to refer to the parameters to confirm multiple selectable other axes for the selected axis. In addition, the parameters can be edited, and the selectable axes can be set according to the device structure.

[0150] There are various transfer devices in each transfer unit, and there are multiple transfer mechanisms in each transfer device.

[0151] Here, according to the substrate processing apparatus 10 of the present embodiment, the initial settings of the respective axes of the various transfer devices are displayed together, the initial positions of multiple drive shafts can be set in parallel, the burden on the operator can be reduced, and omission of the setting of the drive shafts can be avoided.

[0152] In addition, according to the substrate processing apparatus 10 of the present embodiment, there are multiple transfer mechanisms in each transfer unit, and the initial positions of the multiple transfer mechanisms can be set in the display unit 213. Thereby, the burden on the operator can be reduced, and omission of the setting can be avoided.

[0153] In addition, according to the substrate processing apparatus 10 of the present embodiment, multiple transfer mechanisms for which the initial position can be set can be selected, which can contribute to improving the operation efficiency during device assembly.

[0154] In addition, according to the substrate processing apparatus 10 of the present embodiment, when a specific axis is selected, other axes that can be set in parallel can be selected with reference to the parameters. Moreover, the initial setting can be executed by also selecting multiple other axes to change the selected respective axes.

[0155] Therefore, in the substrate processing apparatus 10 according to the present embodiment, by setting the initial positions of multiple axes in parallel, it is possible to contribute to reducing the working hours for the initial setting of the axes.

[0156] Here, as the transfer unit, the initial position of the substrate transfer apparatus 110 is also set. In the substrate processing apparatus 10 according to the present embodiment, since the initial position can be set in parallel with other transfer mechanisms, it is possible to contribute to improving the working efficiency. In addition, since the initial positions of multiple transfer mechanisms are set within the range where safety is confirmed by the determination unit 203, problems such as collision between the transfer mechanisms can be avoided.

[0157] Here, as the transfer unit, the initial position of the container transfer apparatus 70 is also set. Since the initial position can be set in parallel with other transfer mechanisms, it is possible to contribute to improving the working efficiency. In addition, since the initial positions of multiple transfer mechanisms are set within the range where safety is confirmed by the determination unit 203, problems such as collision between the transfer mechanisms can be avoided.

[0158] In addition, in the substrate processing apparatus 10 according to the present embodiment, the transfer mechanism can be made clear, and it is easy for the operator to confirm the transfer mechanism.

[0159] In addition, in the substrate processing apparatus 10 according to the present embodiment, the transfer mechanism can be selected, and it is easy for the operator to set the initial position of the transfer mechanism.

[0160] In addition, in the substrate processing apparatus 10 according to the present embodiment, the selected transfer mechanism can be made clear and is easy to confirm.

[0161] In addition, in the substrate processing apparatus 10 according to the present embodiment, by displaying the operation sequence in the operation sequence display area 216, the operation process becomes clear, and even an unskilled operator can confirm the operation.

[0162] In addition, in the substrate processing apparatus 10 according to the present embodiment, by making the operation being executed clear, it is easy for the operator to confirm, and even an unskilled operator can confirm the operation.

[0163] In addition, in the substrate processing apparatus 10 according to the present embodiment, by displaying the detailed information in the currently executed operation, the detailed operation process becomes clear. In addition, in the substrate processing apparatus 10 according to the present embodiment, when multiple transfer mechanisms are selected, the status of each transfer mechanism can be confirmed.

[0164] In addition, in the substrate processing apparatus 10 according to the present embodiment, by confirming the state of the transfer mechanism, it becomes clear which transfer mechanism's initial position is to be set.

[0165] In addition, in the substrate processing apparatus 10 according to the present embodiment, by clarifying the transfer mechanism for which the initial position cannot be set, it is possible to contribute to reducing incorrect operations.

[0166] In addition, in the substrate processing apparatus 10 according to the present embodiment, by storing the setting information of the transfer mechanism that has been normally completed in the storage unit 204, it is possible to prevent an operator from omitting the saving of the setting information at the time of normal completion.

[0167] In addition, the method for manufacturing a semiconductor device according to the present embodiment includes: a selection step of selecting a plurality of transfer units using the operation unit 212, where the plurality of transfer units include one or more transfer mechanisms and transfer the substrate 2 or the container 4 accommodating the substrate 2; a setting step of performing an initial setting of the selected transfer mechanism using the operation unit 212; a determination step of determining whether the initial position setting of the transfer mechanism selected by the operation unit 212 is completed and whether the initial position of another transfer mechanism can be set in parallel with the selected transfer mechanism; a step of notifying the determination result in the determination step; and a processing step of transferring the substrate 2 using the transfer unit that has been initially set in the selection step and performing processing on the substrate 2.

[0168] According to the method for manufacturing a semiconductor device of the present embodiment, it is possible to suppress a decrease in operation efficiency in the initial position setting operation of the substrate processing apparatus 10.

[0169] In addition, the program of the present embodiment causes the control unit 200 to execute the following steps: a selection step of selecting a plurality of transfer units using the operation unit 212, where the plurality of transfer units include one or more transfer mechanisms and transfer the substrate 2 or the container 4 accommodating the substrate 2, a setting step of performing an initial setting of the selected transfer mechanism using the operation unit 212; a determination step of determining whether the initial position setting of the transfer mechanism selected by the operation unit 212 is completed and whether it is possible to set the initial position of another transfer mechanism in parallel with the selected transfer mechanism; a step of notifying the determination result in the determination step; and a processing step of transferring the substrate 2 using the transfer unit that has been initially set in the selection step and performing processing on the substrate 2.

[0170] According to the program of the present embodiment, it is possible to suppress a decrease in operation efficiency in the initial position setting operation of the substrate processing apparatus 10.

[0171] [Modification Example]

[0172] In addition, in the above description, the determination of whether the initial positions of other transfer mechanisms in the determination unit 203 can be set is made based on whether the setting to the initial positions has been completed for the transfer mechanisms determined in advance, but the technology of the present invention is not limited to this. For example, the determination unit 203 can also make a determination based on the input from the operator to the operation unit 212 according to whether the setting to the initial positions has been completed.

[0173] In addition, in the above description, the determination of whether the initial positions of the transfer mechanisms can be set is made based on the predefined parameters and the states of the selected transfer mechanisms, but the technology of the present invention is not limited to this. For example, the determination unit 203 can also make a determination based on the input from the operator to the operation unit 212 according to whether the setting to the initial positions is completed.

[0174] In addition, in the above description, the multiple transfer units include the container transfer device 70, the container storage rack 50, the substrate transfer device 110, and the support member transfer device 100, but the technology of the present invention is not limited to this. For example, as long as the substrate processing device 10 can transfer the substrate 2, one of the above transfer devices can be omitted.

[0175] In addition, in the above description, the operation unit 212 can select multiple transfer mechanisms, but the technology of the present invention is not limited to this. For example, the operation unit 212 can also accept the selection of only one transfer mechanism at a time.

[0176] In addition, in the above description, the control unit 200 can be controlled to perform the initial position setting operations for the selected multiple transfer mechanisms in parallel, but the technology of the present invention is not limited to this. For example, the control unit 200 can also execute the initial position setting operations for the selected multiple transfer mechanisms not in parallel but in the order of each transfer mechanism (sequentially).

[0177] In addition, in the above description, the transfer unit includes the substrate transfer unit for transferring the substrate 2, but the technology of the present invention is not limited to this. For example, the substrate transfer unit may not be included in the transfer unit.

[0178] In addition, in the above description, the transfer unit includes the container transfer unit for transferring the container 4, but the technology of the present invention is not limited to this. For example, the container transfer unit may not be included in the transfer unit.

[0179] In addition, in the above description, the display unit 213 has the transfer axis selection area 215 where multiple items AI can be arranged and displayed, but the technology of the present invention is not limited to this. For example, the display unit 213 can also be multiple lights, and each transfer unit corresponds to each light.

[0180] In addition, in the above description, the item AI of the conveyance mechanism is displayed on the display unit 213, but the technology of the present invention is not limited to this. For example, it may also be that the display unit 213 does not have screen display, but the conveyance mechanism indicates by lighting and extinguishing of a lamp.

[0181] In addition, in the above description, when the item AI is operated, the conveyance mechanism corresponding to the item AI is selected, but the technology of the present invention is not limited to this. For example, it may also be a state in which the display unit 213 and the operation unit 212 are separate, and the conveyance mechanism is not selected even when the item AI of the display unit 213 is operated.

[0182] In addition, in the above description, the control unit 200 makes the display of the item AI of the selected conveyance mechanism different from the display of the item AI of the unselected conveyance mechanism, but the technology of the present invention is not limited to this. For example, the control unit 200 may also maintain a state in which the display of the item AI of the selected conveyance mechanism and the display of the item AI of the unselected conveyance mechanism are the same.

[0183] In addition, in the above description, the control unit 200 arranges and displays the work item WI indicating the initial position setting work order of the conveyance mechanism selected in the conveyance axis selection area 215 in the work order display area 216, but the technology of the present invention is not limited to this. For example, the control unit 200 may also be set to a state in which the work item WI indicating the initial position setting work order of the conveyance mechanism is not displayed in the work order display area 216. In addition, the control unit 200 is not limited to the selected conveyance mechanism, and may also display the work item WI of all conveyance mechanisms in the work order display area 216.

[0184] In addition, in the above description, the control unit 200 switches the work item WI being executed displayed in the work order display area 216 to a display different from other work items WI corresponding to the work being executed, but the technology of the present invention is not limited to this. For example, the control unit 200 may also maintain a state in which the display of the work item WI of the selected conveyance mechanism and the display of the work item WI of the unselected conveyance mechanism are the same.

[0185] In addition, in the above description, the control unit 200 switches and displays the work progress status corresponding to the work being executed, but the technology of the present invention is not limited to this. For example, the control unit 200 may also not display the work progress status on the screen.

[0186] In addition, in the above description, the display unit 213 can display the line cut-off state, the position setting incomplete state, and the position setting complete state, but the technology of the present invention is not limited to this. For example, the display unit 213 may also not display the line cut-off state, the position setting incomplete state, and the position setting complete state. In addition, it may also be set to a state in which a certain state is not displayed.

[0187] In addition, in the above description, when the line of a certain transfer mechanism is interrupted, the control unit 200 sets that transfer mechanism as non-selectable. However, the technology of the present invention is not limited to this. For example, even when the line of the transfer mechanism is interrupted, the control unit 200 may not switch the screen display and set it as selectable.

[0188] In addition, in the above description, the operation unit 212 can be controlled such that when the setting of the initial position is normally completed, the information of the initial position is stored in the storage unit 204. However, the technology of the present invention is not limited to this. For example, the setting of the initial position can also be in a state where the operation unit 212 does not accept the operation of the operator and the control unit 200 automatically stores it in the storage unit 204.

[0189] In addition, in the above description, the program is stored in the storage unit 204. However, the method of providing the program of the present invention is not limited to this. For example, the program can also be recorded on a computer-readable recording medium and provided together with the recording medium.

[0190] Regarding these modification examples, it is also possible to suppress a decrease in operation efficiency in the initial position setting operation of the substrate processing apparatus 10.

[0191] In the above manner, an example of forming a film using a batch-type substrate processing apparatus that processes multiple substrates at once has been described. The present invention is not limited to the above manner. For example, it can also be suitably applied to a case of forming a film using a single-wafer substrate processing apparatus that processes one or more substrates at once. In addition, in the above manner, an example of forming a film using a substrate processing apparatus having a hot-wall type processing furnace has been described. The present invention is not limited to the above manner and can also be suitably applied to a case of forming a film using a substrate processing apparatus having a cold-wall type processing furnace.

[0192] Even when using these substrate processing apparatuses, each process can be performed in the same processing order and processing conditions as in the above manner and modification examples, and the same effects as in the above manner and modification examples can be obtained.

[0193] [Other Modification Examples]

[0194] In the above embodiment, a case where the substrate processing apparatus 10 constitutes a batch-type vertical CVD apparatus has been described. However, it is not limited to this, and it can also be applied to all semiconductor manufacturing apparatuses such as a batch-type vertical diffusion apparatus.

[0195] In addition, a case where the container 4 is used as the substrate container for the substrate 2 has been described. However, it is not limited to this, and a cassette without an opening / closing lid can also be used. When a cassette is used as the substrate container, the setting of the container opening / closing device 62 can be omitted.

[0196] It is also possible to separately provide a loading section for loading a substrate into the main body 12 of the substrate processing apparatus and an unloading section for unloading the substrate from the main body 12 of the substrate processing apparatus, and a transfer mechanism 22 may be provided in at least one of them.

[0197] The substrate loading ports 60 are not limited to upper and lower two layers, and may be provided with only one layer, or may be provided with three or more layers such as upper, middle and lower three layers.

Claims

1. A substrate processing apparatus, characterized in that, Comprising: A plurality of transfer units, each having one or more transfer shafts for transferring a substrate or a container accommodating the substrate; An operation unit that can select one or more of the transfer shafts and set the initial positions of the transfer shafts; A display unit that displays the setting status of the initial positions of the transfer shafts; And A control unit having a determination unit that determines whether the setting of the initial position of the transfer shaft selected by the operation unit is completed and whether the initial position of another transfer shaft can be set in parallel with the selected transfer shaft, and the control unit can be controlled to notify the result determined by the determination unit.

2. The substrate processing apparatus according to claim 1, wherein The determination in the determination unit as to whether the initial position of the other transfer shaft can be set is made based on whether the setting of the initial position has been completed for the transfer shaft determined in advance.

3. The substrate processing apparatus according to claim 1, wherein The determination in the determination unit as to whether the initial position of the transfer shaft can be set is made based on predefined parameters and the state of the selected transfer shaft.

4. The substrate processing apparatus according to claim 1, wherein The plurality of transfer units include: a container transfer device that transfers the container placed on the rack or places the container on the rack; a container storage rack for storing the container by the container transfer device; a substrate transfer device that extracts a substrate from the container transferred by the container transfer device or accommodates the substrate in the container; and a support member transfer device that moves the substrate received from the substrate transfer device into the processing container.

5. The substrate processing apparatus according to claim 1, wherein The plurality of transfer shafts of the transfer unit are at least one of a left-right shaft that can move in the left-right direction, a front-back shaft that can move in the front-back direction, a vertical shaft that can move in the up-down direction, and a rotation shaft that can rotate.

6. The substrate processing apparatus according to claim 1, wherein The operation unit can select a plurality of the transfer shafts.

7. The substrate processing apparatus according to claim 6, wherein The control unit can be controlled to perform the initial position setting operation in parallel for the selected plurality of transfer shafts.

8. The substrate processing apparatus according to claim 1, wherein The transfer unit includes a substrate transfer unit for transferring the substrate.

9. The substrate processing apparatus according to claim 1, wherein The transfer unit includes a container transfer unit for transferring the container.

10. The substrate processing apparatus according to claim 1, wherein Items of the transfer shaft are displayed on the display unit.

11. The substrate processing apparatus according to claim 10, wherein When the item is operated, the transfer shaft corresponding to the item is selected.

12. The substrate processing apparatus according to claim 11, wherein The display unit has a transfer shaft selection area in which a plurality of the items can be arranged and displayed. The control unit makes the display of the items of the selected transfer axis different from the display of the items of the unselected transfer axis.

13. The substrate processing apparatus according to claim 12, wherein the display unit further has an operation order display area indicating the operation order of the initial position setting of the selected transfer axis, the control unit arranges and displays the operation items of the initial position setting of the transfer axis selected in the transfer axis selection area in the operation order display area.

14. The substrate processing apparatus according to claim 13, wherein the control unit switches the operation item being executed displayed in the operation order display area to a display different from other operation items corresponding to the operation being executed.

15. The substrate processing apparatus according to claim 13, wherein the display unit further has a progress status display area for displaying the progress status of the operation being executed, the control unit switches and displays the operation progress status corresponding to the operation being executed.

16. The substrate processing apparatus according to claim 1, wherein the display unit can display a line cut-off state indicating that the line of the transfer axis is interrupted, a position setting incomplete state indicating that the initial position of the transfer axis is not completed, or a position setting completed state indicating that the position setting completed state of the transfer axis is completed.

17. The substrate processing apparatus according to claim 16, wherein when the line of a certain transfer axis is interrupted, the control unit makes that transfer axis non-selectable.

18. The substrate processing apparatus according to claim 1, wherein it further has a storage unit for storing the information of the initial position, the operation unit can be controlled such that when the initial position is set normally and completed, the information of the initial position is stored in the storage unit.

19. A method for manufacturing a semiconductor device, characterized in that, It includes the following steps: A selection step of using an operation unit to select a plurality of transfer units, where the plurality of transfer units each have one or more transfer axes and transfer a substrate or a container containing the substrate; A setting step of using the operation unit to perform an initial setting of the selected transfer axis; A judgment step of judging whether the initial position setting of the transfer axis selected by the operation unit is completed and judging whether the initial position of other transfer axes can be set in parallel with the selected transfer axis; A step of notifying the judgment result in the judgment step; and A processing step of using the transfer unit that has been initially set in the selection step to transfer the substrate and perform processing on the substrate.

20. A recording medium, which is a computer-readable recording medium, characterized in that, There is a program recorded for causing a computer to make a substrate processing apparatus execute the following steps: A selection step of using an operation unit to select a plurality of transfer units, where the plurality of transfer units each have one or more transfer axes and transfer a substrate or a container containing the substrate; A setting step of using the operation unit to perform an initial setting of the selected transfer axis; A determination step for determining whether the setting of the initial position of the selected transfer shaft by the operation unit is completed and whether the initial position of another transfer shaft can be set in parallel with the selected transfer shaft; A step for notifying the determination result in the determination process; And A processing step for transferring the substrate by the transfer unit whose initial setting has been performed through the selection step and performing processing on the substrate.

Citation Information

Patent Citations

  • Substrate processing device and method of manufacturing semiconductor device

    JP2012169534A