Silicon-zirconium-aluminum target material for Low-E glass and preparation method of silicon-zirconium-aluminum target material

Abstract

The invention belongs to the technical field of target materials, and particularly discloses a silicon-zirconium-aluminum target material for Low-E glass and a preparation method of the silicon-zirconium-aluminum target material for Low-E glass, and the silicon-zirconium-aluminum target material for Low-E glass comprises the following components in parts by weight: 55-60 parts of silicon powder, 34-40 parts of zirconium powder, 4-8 parts of aluminum powder, 1-2 parts of modified graphene, 2-3 parts of high-entropy alloy powder, 0.5-1.2 parts of chromium powder, 0.4-1 part of molybdenum powder and 0.2-0.6 part of nickel powder. The silicon-zirconium-aluminum target material has an excellent energy-saving effect, the heat transfer coefficient and the shading coefficient can be remarkably reduced, and relative heat increase is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of target materials, and particularly relates to a silicon-zirconium-aluminum target material for Low-E glass and a preparation method thereof. Background Art

[0002] With the increasingly serious problem of energy consumption, building energy conservation has become an important topic worldwide. Low-E glass (low-emissivity glass) is widely used in buildings due to its excellent heat insulation and heat preservation properties.

[0003] Commonly used Low-E glass target materials are mostly composed of metal powders and glass substrates. In terms of improving energy-saving effects, traditional Low-E glass relies on the control and adjustment of the glass surface coating, and the selection of the glass target material and its composition play a key role in enhancing the glass performance. Therefore, developing new energy-saving target materials has become an important way to improve the energy-saving effect of Low-E glass.

[0004] In view of this, the present application is proposed. Summary of the Invention

[0005] The present invention provides a silicon-zirconium-aluminum target material for Low-E glass and a preparation method thereof. The silicon-zirconium-aluminum target material of the present invention has excellent energy-saving effects, can significantly reduce the heat transfer coefficient and shading coefficient, and reduce the relative heat gain.

[0006] The present invention solves its technical problems by adopting the following technical solutions: A silicon-zirconium-aluminum target material for Low-E glass, comprising the following components in parts by weight: 55 - 60 parts of silicon powder, 34 - 40 parts of zirconium powder, 4 - 8 parts of aluminum powder, 1 - 2 parts of modified graphene, 2 - 3 parts of high-entropy alloy powder, 0.5 - 1.2 parts of chromium powder, 0.4 - 1 part of molybdenum powder, 0.2 - 0.6 part of nickel powder.

[0007] The silicon-zirconium-aluminum target material of the present invention has excellent energy-saving effects, can significantly reduce the heat transfer coefficient and shading coefficient, reduce the relative heat gain, can reduce heat loss in winter, improve the heat preservation effect, save heating energy consumption, effectively block solar heat, reduce air-conditioning load, save cooling energy consumption, and at the same time reduce the heat increase caused by solar radiation in summer, realize energy savings in different seasons, reduce unnecessary heat transfer, block the entry of external heat, optimize building energy efficiency, and has broad application prospects.

[0008] Silicon, zirconium, and aluminum: These elements are the main components of the target material. The reasonable ratio of silicon powder, zirconium powder, and aluminum powder can optimize the structure and performance of the thin film, thereby reducing the heat transfer coefficient of the glass, increasing the reflectivity of the glass, and thus reducing the absorption and transmission of solar heat radiation. Especially aluminum powder has good reflection ability, can effectively increase the shading effect of the glass, reduce the relative heat gain of the glass, and play a heat insulation role.

[0009] High-entropy alloy powder: It can increase the reflectivity of the glass surface, help improve the shading coefficient of the glass. Especially under high temperature and strong sunlight, it can effectively prevent the penetration of solar heat radiation, reduce heat conduction, improve the thermal insulation of the glass, increase the surface reflectivity of the glass, reduce heat absorption, and lower the relative heat gain.

[0010] As a preferred embodiment of the present invention, the high-entropy alloy powder comprises the following components in parts by weight: 30-40 parts of silicon carbide powder, 25-35 parts of titanium powder, 15-25 parts of zinc powder, 5-15 parts of lanthanum powder, 2-8 parts of titanium nitride powder.

[0011] As a preferred embodiment of the present invention, the preparation method of the high-entropy alloy powder is: ball-mill and mix silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder evenly to obtain the high-entropy alloy powder.

[0012] As a preferred embodiment of the present invention, the preparation method of the modified graphene is: Add aluminum nitrate and silver nitrate into an ethanol solution, mix evenly to obtain a mixed solution, add graphene into the mixed solution, stir evenly, dry, place the dried product in a tube furnace, introduce a mixed gas of oxygen and nitrogen, and perform heat treatment to obtain the modified graphene.

[0013] In the present invention, by adding aluminum nitrate and silver nitrate into an ethanol solution, then adding graphene, and finally performing heat treatment in an oxygen atmosphere, a composite coating layer of aluminum oxide and silver oxide is formed on the surface of the graphene, which can optimize its distribution and structure in the glass, effectively improve the thermal conductivity of the glass, and at the same time improve its local thermal insulation ability by adjusting the dispersion degree, and improve the infrared reflectivity of the glass, which can effectively reduce heat absorption, thereby reducing the relative heat gain and enhancing the heat insulation effect.

[0014] As a preferred embodiment of the present invention, the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1: (0.5-2): (20-40): (4-8).

[0015] Among them, the mass concentration of the ethanol solution is 60-90 wt%.

[0016] As a preferred embodiment of the present invention, the volume ratio of oxygen to nitrogen is 1: (3-6); the flow rate of the mixed gas is 30-50 sccm.

[0017] As a preferred embodiment of the present invention, the heat treatment temperature is 950-980 °C, and the heat treatment time is 2-6 h.

[0018] The present invention also provides a preparation method of a silicon-zirconium-aluminum target for Low-E glass, comprising the following steps: Melt silicon powder, high-entropy alloy powder, and aluminum powder at 1480 - 1520 °C, heat up to 1900 - 2000 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to obtain alloy powder; Mix the alloy powder and modified graphene evenly and grind to obtain a precursor; Spray the precursor onto a stainless-steel backing tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target.

[0019] As a preferred embodiment of the present invention, the particle size of the alloy powder is 200 - 600 mesh; The particle size of the precursor is 200 - 600 mesh.

[0020] As a preferred embodiment of the present invention, the process parameters of the plasma spraying are as follows: main gas flow rate 1500 - 1550 L / h, secondary gas flow rate 100 - 120 L / h, spraying voltage 60 - 65 V, spraying current 520 - 550 A, gun distance 100 - 120 mm, backing tube rotation speed 100 r / min, gun movement speed 6 - 9 mm / s.

[0021] Advantages of the present invention: The silicon-zirconium-aluminum target described in the present invention has excellent energy-saving effects, can significantly reduce the heat transfer coefficient and shading coefficient, reduce relative heat gain, can reduce heat loss in winter, improve the heat preservation effect, save heating energy consumption, effectively block solar heat, reduce air-conditioning load, save cooling energy consumption, and at the same time reduce the heat increase caused by solar radiation in summer, achieve energy savings in different seasons, reduce unnecessary heat transfer, and block the entry of external heat, optimize building energy efficiency, and has broad application prospects. Detailed Embodiments

[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Apparently, the described embodiments are some, but not all, of the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0023] In the present invention, among the technically characterized described in an open-ended manner, there are included closed technical solutions composed of the listed features, as well as open technical solutions including the listed features.

[0024] In the present invention, when it comes to numerical ranges, unless otherwise specified, the above numerical ranges are considered continuous and include the minimum and maximum values of the range, as well as each value between such minimum and maximum values. Further, when the range refers to integers, it includes each integer between the minimum and maximum values of the range. In addition, when multiple ranges are provided to describe features or characteristics, the ranges can be combined. In other words, unless otherwise indicated, all ranges disclosed herein should be understood to include any and all sub-ranges subsumed therein.

[0025] In the present invention, there is no particular limitation on the specific dispersion and stirring treatment methods.

[0026] For the reagents or instruments used in the present invention, if the manufacturer is not specified, they are all conventional products that can be obtained through commercial purchase. The raw materials used in each comparative example and the raw materials used in the parallel experiments of each example are the same commercially available products unless otherwise specified.

[0027] Example 1 A silicon-zirconium-aluminum target for Low-E glass, comprising the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of modified graphene, 2.5 parts of high-entropy alloy powder, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0028] The high-entropy alloy powder comprises the following components in parts by weight: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0029] The preparation method of the high-entropy alloy powder is as follows: (1) Weigh the following components in parts by weight according to the ratio: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0030] (2) Ball-mill and mix the silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder at a speed of 600 rpm for 2 h to obtain the high-entropy alloy powder.

[0031] The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate to an 80 wt% ethanol solution, mix at 200 rpm for 60 min to obtain a mixed solution, add graphene to the mixed solution, mix at 200 rpm for 60 min, dry at 90 °C for 2 h, place the dried product in a tube furnace, introduce a mixed gas of oxygen and nitrogen, perform heat treatment at 960 °C for 4 h to obtain modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1:1:25:5; the volume ratio of oxygen and nitrogen is 1:4; the flow rate of the mixed gas is 40 sccm.

[0032] The preparation method of the silicon-zirconium-aluminum target for Low-E glass comprises the following steps: Melt silicon powder, high-entropy alloy powder, and aluminum powder at 1500 °C, raise the temperature to 1950 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to 400 mesh to obtain alloy powder; Mix the alloy powder and modified graphene evenly and grind to 400 mesh to obtain a precursor; Spray the precursor onto a stainless-steel backing tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target. The process parameters of the plasma spraying are as follows: main gas flow rate 1500 L / h, secondary gas flow rate 110 L / h, spraying voltage 62 V, spraying current 540 A, gun distance 110 mm, backing tube rotation speed 100 r / min, and gun movement speed 8 mm / s.

[0033] Example 2 A silicon-zirconium-aluminum target for Low-E glass, comprising the following components in parts by weight: 55 parts of silicon powder, 40 parts of zirconium powder, 4 parts of aluminum powder, 1 part of modified graphene, 2 parts of high-entropy alloy powder, 0.5 part of chromium powder, 0.1 part of molybdenum powder, and 0.2 part of nickel powder.

[0034] The high-entropy alloy powder comprises the following components in parts by weight: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0035] The preparation method of the high-entropy alloy powder is as follows: (1) Weigh the following components in parts by weight according to the ratio: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0036] (2) Ball-mill and mix silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder at a speed of 600 rpm for 2 h to obtain high-entropy alloy powder.

[0037] The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate to an 80 wt% ethanol solution, mix at 200 rpm for 60 min to obtain a mixed solution, add graphene to the mixed solution, mix at 200 rpm for 60 min, dry at 90 °C for 2 h, place the dried product in a tube furnace, introduce a mixed gas of oxygen and nitrogen, and perform heat treatment at 960 °C for 4 h to obtain modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1:1:25:5; the volume ratio of oxygen and nitrogen is 1:4; the flow rate of the mixed gas is 40 sccm.

[0038] The preparation method of the silicon-zirconium-aluminum target for Low-E glass comprises the following steps: Melt silicon powder, high-entropy alloy powder, and aluminum powder at 1500 °C, raise the temperature to 1950 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to 400 mesh to obtain alloy powder; Mix the alloy powder and modified graphene evenly and grind to 400 mesh to obtain a precursor; Spray the precursor onto a stainless steel backing tube by plasma spraying process to obtain a silicon-zirconium-aluminum target. The process parameters of the plasma spraying are as follows: main gas flow rate 1500 L / h, secondary gas flow rate 110 L / h, spraying voltage 62 V, spraying current 540 A, gun distance 110 mm, backing tube rotation speed 100 r / min, gun moving speed 8 mm / s.

[0039] Example 3 A silicon-zirconium-aluminum target for Low-E glass, comprising the following components in parts by weight: 60 parts of silicon powder, 34 parts of zirconium powder, 8 parts of aluminum powder, 2 parts of modified graphene, 3 parts of high-entropy alloy powder, 1.2 parts of chromium powder, 0.4 parts of molybdenum powder, 0.6 parts of nickel powder.

[0040] The high-entropy alloy powder comprises the following components in parts by weight: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, 5 parts of titanium nitride powder.

[0041] The preparation method of the high-entropy alloy powder is as follows: (1) Weigh the following components in parts by weight according to the ratio: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, 5 parts of titanium nitride powder.

[0042] (2) Ball-mill and mix the silicon carbide powder, titanium powder, zinc powder, lanthanum powder and titanium nitride powder at a speed of 600 rpm for 2 h to obtain the high-entropy alloy powder.

[0043] The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate into an 80 wt% ethanol solution, mix at 200 rpm for 60 min to obtain a mixed solution, add graphene into the mixed solution, mix at 200 rpm for 60 min, dry at 90 °C for 2 h, place the dried product in a tubular furnace, introduce a mixed gas of oxygen and nitrogen, and heat-treat at 960 °C for 4 h to obtain the modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution and graphene is 1:1:25:5; the volume ratio of oxygen and nitrogen is 1:4; the flow rate of the mixed gas is 40 sccm.

[0044] The preparation method of the silicon-zirconium-aluminum target for Low-E glass comprises the following steps: Melt the silicon powder, high-entropy alloy powder and aluminum powder at 1500 °C, raise the temperature to 1950 °C, add chromium powder, molybdenum powder and nickel powder, melt, cool, and crush to 400 mesh to obtain the alloy powder; Mix the alloy powder and modified graphene evenly and grind to 400 mesh to obtain a precursor; The precursor is sprayed on the stainless-steel back tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target. The process parameters of the plasma spraying are as follows: the main gas flow rate is 1500 L / h, the secondary gas flow rate is 110 L / h, the spraying voltage is 62 V, the spraying current is 540 A, the gun distance is 110 mm, the back tube rotation speed is 100 r / min, and the gun moving speed is 8 mm / s.

[0045] Example 4 A silicon-zirconium-aluminum target for Low-E glass, comprising the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of modified graphene, 2.5 parts of high-entropy alloy powder, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0046] The high-entropy alloy powder comprises the following components in parts by weight: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0047] The preparation method of the high-entropy alloy powder is as follows: (1) Weigh the following components in parts by weight according to the ratio: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0048] (2) Ball-mill and mix the silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder at a rotation speed of 600 rpm for 2 h to obtain the high-entropy alloy powder.

[0049] The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate to an 80 wt% ethanol solution, mix at 200 rpm for 60 min to obtain a mixed solution, add graphene to the mixed solution, mix at 200 rpm for 60 min, dry at 90 °C for 2 h, place the dried product in a tube furnace, introduce a mixed gas of oxygen and nitrogen, and perform heat treatment at 960 °C for 4 h to obtain the modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1:2:25:4; the volume ratio of oxygen and nitrogen is 1:4; the introduction amount of the mixed gas is 40 sccm.

[0050] The preparation method of the silicon-zirconium-aluminum target for Low-E glass comprises the following steps: Melt the silicon powder, high-entropy alloy powder, and aluminum powder at 1500 °C, raise the temperature to 1950 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to 400 mesh to obtain an alloy powder; Mix the alloy powder and the modified graphene evenly and grind to 400 mesh to obtain a precursor; The precursor is sprayed on a stainless steel back tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target. The process parameters of the plasma spraying are as follows: main gas flow rate 1500 L / h, secondary gas flow rate 110 L / h, spraying voltage 62 V, spraying current 540 A, gun distance 110 mm, back tube rotation speed 100 r / min, and gun moving speed 8 mm / s.

[0051] Example 5 A silicon-zirconium-aluminum target for Low-E glass, comprising the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of modified graphene, 2.5 parts of high-entropy alloy powder, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0052] The high-entropy alloy powder comprises the following components in parts by weight: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0053] The preparation method of the high-entropy alloy powder is as follows: (1) Weigh the following components in parts by weight according to the ratio: 35 parts of silicon carbide powder, 30 parts of titanium powder, 20 parts of zinc powder, 10 parts of lanthanum powder, and 5 parts of titanium nitride powder.

[0054] (2) Ball-mill and mix the silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder at a rotation speed of 600 rpm for 2 h to obtain the high-entropy alloy powder.

[0055] The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate to an 80 wt% ethanol solution, mix at 200 rpm for 60 min to obtain a mixed solution, add graphene to the mixed solution, mix at 200 rpm for 60 min, dry at 90 °C for 2 h, place the dried product in a tubular furnace, introduce a mixed gas of oxygen and nitrogen, and perform heat treatment at 960 °C for 4 h to obtain the modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1:0.5:25:8; the volume ratio of oxygen and nitrogen is 1:4; the flow rate of the mixed gas is 40 sccm.

[0056] The preparation method of the silicon-zirconium-aluminum target for Low-E glass comprises the following steps: Melt the silicon powder, high-entropy alloy powder, and aluminum powder at 1500 °C, raise the temperature to 1950 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to 400 mesh to obtain alloy powder; Mix the alloy powder and the modified graphene evenly and grind to 400 mesh to obtain a precursor; The precursor is sprayed onto a stainless-steel back tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target. The process parameters of the plasma spraying are as follows: the main gas flow rate is 1500 L / h, the secondary gas flow rate is 110 L / h, the spraying voltage is 62 V, the spraying current is 540 A, the gun distance is 110 mm, the back tube rotation speed is 100 r / min, and the gun movement speed is 8 mm / s.

[0057] Comparative Example 1

[0058] The difference between Comparative Example 1 and Example 1 is that in Comparative Example 1, graphene is used to replace the modified graphene, and the others are the same.

[0059] A silicon-zirconium-aluminum target for Low-E glass comprises the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of graphene, 2.5 parts of high-entropy alloy powder, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0060] Comparative Example 2

[0061] The difference between Comparative Example 2 and Example 1 is that the preparation method of the modified graphene in Comparative Example 2 is different from that in Example 1, and the others are the same.

[0062] The preparation method of the modified graphene is as follows: Aluminum nitrate and silver nitrate are added to an 80 wt% ethanol solution, and mixed at 200 rpm for 60 min to obtain a mixed solution. Graphene is added to the mixed solution and mixed at 200 rpm for 60 min, and then dried at 90 °C for 2 h to obtain the modified graphene; the mass ratio of aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1:1:25:5.

[0063] Comparative Example 3

[0064] The difference between Comparative Example 3 and Example 1 is that in Comparative Example 3, the high-entropy alloy powder is not added, and the others are the same.

[0065] A silicon-zirconium-aluminum target for Low-E glass comprises the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of modified graphene, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0066] Comparative Example 4

[0067] The difference between Comparative Example 4 and Example 1 is that in Comparative Example 4, an equal amount of silicon carbide powder is used to replace the high-entropy alloy powder, and the others are the same.

[0068] A silicon-zirconium-aluminum target for Low-E glass comprises the following components in parts by weight: 58.5 parts of silicon powder, 36.5 parts of zirconium powder, 5 parts of aluminum powder, 1.6 parts of modified graphene, 2.5 parts of silicon carbide powder, 1 part of chromium powder, 0.5 part of molybdenum powder, and 0.4 part of nickel powder.

[0069] Test example

[0070] Deposit the target materials of the examples and comparative examples on the glass substrate with a deposition thickness of 15 nm for testing.

[0071] Test the heat transfer coefficient K value, shading coefficient SC and relative heat gain according to GB / T2680-94 (test temperature is 25 °C, irradiation intensity is 783 W / m 2 )

[0072]

[0073] It can be seen from Table 1 that the silicon-zirconium-aluminum target material described in the present invention has excellent energy-saving effects, can significantly reduce the heat transfer coefficient and shading coefficient, and reduce the relative heat gain.

[0074] By comparing Example 1 with Comparative Examples 1-2, it can be seen that the modified graphene described in the present invention can significantly reduce the heat transfer coefficient and shading coefficient, and reduce the relative heat gain.

[0075] By comparing Example 1 with Comparative Examples 3-4, it can be seen that the high-entropy alloy powder described in the present invention can significantly reduce the heat transfer coefficient and shading coefficient, and reduce the relative heat gain.

[0076] Finally, it should be noted that the above examples are used to illustrate the technical solutions of the present invention rather than to limit the protection scope of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced without departing from the essence and scope of the technical solutions of the present invention.

Claims

1. A silicon-zirconium-aluminum target for Low-E glass, characterized in that, It comprises components in the following parts by weight: 55 to 60 parts of silicon powder, 34 to 40 parts of zirconium powder, 4 to 8 parts of aluminum powder, 1 to 2 parts of modified graphene, 2 to 3 parts of high-entropy alloy powder, 0.5 to 1.2 parts of chromium powder, 0.4 to 1 part of molybdenum powder, and 0.2 to 0.6 part of nickel powder.

2. The silicon-zirconium-aluminum target for Low-E glass according to claim 1, characterized in that, The high-entropy alloy powder comprises components in the following parts by weight: 30 to 40 parts of silicon carbide powder, 25 to 35 parts of titanium powder, 15 to 25 parts of zinc powder, 5 to 15 parts of lanthanum powder, and 2 to 8 parts of titanium nitride powder.

3. The silicon-zirconium-aluminum target for Low-E glass according to claim 2, characterized in that, The preparation method of the high-entropy alloy powder is as follows: ball-mill and mix silicon carbide powder, titanium powder, zinc powder, lanthanum powder, and titanium nitride powder evenly to obtain the high-entropy alloy powder.

4. The silicon-zirconium-aluminum target for Low-E glass according to claim 1, characterized in that, The preparation method of the modified graphene is as follows: Add aluminum nitrate and silver nitrate into an ethanol solution, mix evenly to obtain a mixed solution, add graphene into the mixed solution, stir evenly, dry, place the dried product in a tubular furnace, introduce a mixed gas of oxygen and nitrogen, and perform heat treatment to obtain the modified graphene.

5. The silicon-zirconium-aluminum target for Low-E glass according to claim 4, characterized in that, The mass ratio of the aluminum nitrate, silver nitrate, ethanol solution, and graphene is 1: (0.5 to 2): (20 to 40): (4 to 8).

6. The silicon-zirconium-aluminum target for Low-E glass according to claim 4, characterized in that, The volume ratio of the oxygen and nitrogen is 1: (3 to 6); the flow rate of the mixed gas introduced is 30 to 50 sccm.

7. The silicon-zirconium-aluminum target for Low-E glass according to claim 4, characterized in that, The heat treatment temperature is 950 to 980 °C, and the heat treatment time is 2 to 6 h.

8. The preparation method of the silicon-zirconium-aluminum target for Low-E glass according to any one of claims 1 to 7, characterized in that, It includes the following steps: Melt the silicon powder, high-entropy alloy powder, and aluminum powder at 1480 to 1520 °C, raise the temperature to 1900 to 2000 °C, add chromium powder, molybdenum powder, and nickel powder, melt, cool, and pulverize to obtain alloy powder; Mix the alloy powder and the modified graphene evenly and grind to obtain a precursor; Spray the precursor on a stainless steel back tube through a plasma spraying process to obtain a silicon-zirconium-aluminum target.

9. The preparation method of the silicon-zirconium-aluminum target for Low-E glass according to claim 8, characterized in that The particle size of the alloy powder is 200 to 600 mesh; The particle size of the precursor is 200 to 600 mesh.

10. The preparation method of the silicon-zirconium-aluminum target for Low-E glass according to claim 8, characterized in that, The process parameters of the plasma spraying are as follows: main gas flow rate 1500 to 1550 L / h, secondary gas flow rate 100 to 120 L / h, spraying voltage 60 to 65 V, spraying current 520 to 550 A, gun distance 100 to 120 mm, back tube rotation speed 100 r / min, and gun movement speed 6 to 9 mm / s.

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