Flexible polishing device and control method thereof

Abstract

The invention discloses a flexible polishing device and a control method of the flexible polishing device, and relates to the technical field of mechanical polishing, the flexible polishing device comprises a mounting seat, a transfer assembly, a polishing assembly and a control device, and a mounting side is formed on one side of the mounting seat in the horizontal direction; the transferring assembly comprises a transferring part, the transferring part is used for picking up and transferring a to-be-machined part, the polishing assembly comprises a base and two polishing wheels, the two polishing wheels are spaced in the vertical direction and coaxially rotate along the axis extending in the vertical direction, and the roughness of one polishing wheel is larger than that of the other polishing wheel; one end of the base in the horizontal direction is mounted to the mounting side through a floating structure; the acting force in the horizontal direction drives the floating structure to move, the acting force in the vertical direction has certain loss, the situation that the polishing effect is affected due to the fact that the counter-acting force is too large is avoided, it is guaranteed that the part and the polishing wheel are in a constant-pressure contact state all the time during polishing, and the problem that the polishing removal amount is unstable due to the part size difference is solved.

Description

Technical Field

[0001] The present invention relates to the technical field of mechanical polishing, and particularly relates to a flexible polishing device and a control method for the flexible polishing device. Background Art

[0002] Because mechanical polishing is far more efficient, has a higher yield, and is more stable than manual polishing, more and more product polishing solutions use mechanical polishing instead of manual polishing. However, in the mechanical polishing method, the polishing process can only move fixedly along preset points, and it cannot flexibly adjust the downward pressure and the polishing position according to the current state of the product like manual polishing. Therefore, even for the same product, limited by the product repeat clamping error, consumable error, and the dimensional error of the product to be processed, it is very easy to have the problem that individual products are not polished in place or the polishing removal amount of batch products is unstable after polishing. Summary of the Invention

[0003] The main object of the present invention is to propose a flexible polishing device and a control method for the flexible polishing device, which are mainly applicable to soft polishing consumables such as cloth wheels and wind wheels. By floating up and down during the polishing process, the clamping error and the product dimensional error are compensated, the polishing stability is improved, and the polishing yield of the product is increased.

[0004] To achieve the above object, the present invention proposes a flexible polishing device, including:

[0005] A mounting seat, forming a mounting side on one side in the horizontal direction;

[0006] A transfer assembly, including a transfer part, the transfer part can move relative to the mounting seat in the horizontal direction and in the up and down direction, and the transfer part is used to pick up and transfer the part to be processed

[0007] A polishing assembly, including a base and two polishing wheels. The two polishing wheels are spaced apart in the up and down direction, and the axes extending in the up and down direction rotate coaxially. The roughness of one of the polishing wheels is set to be greater than that of the other polishing wheel. One end of the base in the horizontal direction is mounted to the mounting side through a floating structure; and,

[0008] A control device, electrically connected to the transfer assembly and the polishing assembly;

[0009] Wherein, the transfer part can abut the surface of one of the polishing wheels against the part to be processed, and cooperate with the corresponding polishing wheel to form a force in the horizontal direction during rotation, so that the base can float in the horizontal direction relative to the mounting side.

[0010] In an embodiment, the transfer assembly further includes a multi-axis drive structure, and the multi-axis drive structure is connected to the transfer part to drive the transfer part to move; and / or,

[0011] The polishing assembly includes a motor, the housing of the motor is fixed to the base, and the main shaft of the motor is connected to the two polishing wheels; and / or,

[0012] A plurality of limiting blocks are arranged between the two polishing wheels.

[0013] In one embodiment, the floating structure includes:

[0014] A support seat, fixed to the mounting side, which is spaced from the base in the horizontal direction; and,

[0015] A plurality of elastic members, located between the support seat and the base, and opposite ends of each elastic member in the horizontal direction respectively abut against the support seat and the base.

[0016] In one embodiment, a plurality of through holes are formed in the end face of the base facing the support seat;

[0017] The floating structure further includes:

[0018] A plurality of guide posts, corresponding to the plurality of through holes, one end of each guide post in the horizontal direction is fixed to the support seat, and the other end extends out of the corresponding through hole;

[0019] A plurality of limiting members, corresponding to the plurality of guide posts, each limiting member is fixed to the end of the corresponding guide post extending out of the through hole, and can abut against the corresponding side face of the base.

[0020] In one embodiment, each elastic member is provided as a spring, and each spring is sleeved on the outer surface of each guide post; and / or,

[0021] A linear bearing is arranged between each guide post and the corresponding through hole.

[0022] In one embodiment, the transfer part includes:

[0023] A bracket, movably mounted to the mounting seat in the horizontal direction and in the up and down direction;

[0024] A main body, a through hole is formed in the middle of the main body, and one end of the main body is fixed to the bracket,

[0025] A plurality of movable blocks are arranged at intervals along the circumference of the main body at the other end of the main body. The plurality of movable blocks together define a fitting channel communicating with the through hole. The fitting channel is tapered in a direction away from the main body to form a first inclined annular surface. The plurality of movable blocks have a moving form of approaching or separating from each other to jointly tighten the inner wall surface of the part to be processed; and,

[0026] The lifting part is movably installed on the bracket along the extending direction of the through hole. A second inclined ring surface adapted to the first inclined ring surface is arranged on the outer side of the lifting part. During the movement of the lifting part, there is a spreading position where it passes through the through hole so that the second inclined ring surface abuts against the first inclined ring surface to drive the plurality of movable blocks to move away from each other, and a releasing position where it retracts into the through hole to separate from the plurality of movable blocks.

[0027] In one embodiment, the flexible polishing device further includes:

[0028] A first detection member, arranged on the transfer part and electrically connected to the control device, for detecting the torque of the transfer part; and / or,

[0029] A second detection member, arranged on the base and / or the installation side and electrically connected to the control device, for detecting the distance between the base and the installation side.

[0030] In one embodiment, the flexible polishing device further includes a correction assembly, and the correction assembly includes:

[0031] A bearing seat, arranged on one side of the polishing assembly in the horizontal direction. The bearing seat includes a bearing platform, and a positioning groove is formed on the bearing platform for placing the parts to be processed transferred by the transfer part; and,

[0032] Two pushing parts are movably installed on the bearing seat. The two pushing parts are arranged on opposite sides of the bearing platform in the horizontal direction and have a moving stroke of approaching or separating from each other. The two pushing parts approach each other to jointly hold and correct the posture of the parts to be processed on the positioning groove.

[0033] The present invention also provides a control method for a flexible polishing device. Based on the above flexible polishing device, the flexible polishing device includes a mounting seat, a transfer assembly, a polishing assembly and a control device. An installation side is formed on one side of the mounting seat in the horizontal direction; the transfer assembly includes a transfer part, and the transfer part can move relative to the mounting seat in the horizontal direction and in the vertical direction. The transfer part is used for picking up and transferring the parts to be processed. The polishing assembly includes a base and two polishing wheels. The two polishing wheels are spaced apart in the vertical direction and rotate coaxially along the axis extending in the vertical direction. The roughness of one of the polishing wheels is set to be greater than that of the other polishing wheel. One end of the base in the horizontal direction is installed on the installation side through a floating structure; the control device is electrically connected to the transfer assembly and the polishing assembly; wherein, the transfer part can abut the surface of one of the polishing wheels with the parts to be processed, and cooperate with the corresponding polishing wheel to form a force in the horizontal direction during rotation, so that the base can float relative to the installation side in the horizontal direction;

[0034] The control method of the flexible polishing device includes the following steps:

[0035] Confirm the target polishing wheel according to the received polishing instruction, and confirm the polishing surface processing parameters according to the target polishing wheel, wherein the polishing surface processing parameters include the target torque of the transfer part, the target distance between the base and the installation side, and the preset polishing duration;

[0036] After receiving the polishing instruction, control the transfer part to drive the surface to be polished of the part to be processed to contact the target polishing wheel, and control the transfer part to work according to the polishing surface processing parameters.

[0037] In one embodiment, the flexible polishing device further includes a first detection part and a second detection part;

[0038] The step of, after receiving the polishing instruction, controlling the transfer part to drive the part to be processed to contact the target polishing wheel and controlling the transfer part to work according to the polishing surface processing parameters includes:

[0039] Control the transfer part to press the surface to be polished of the part to be processed against the target polishing wheel;

[0040] Obtain the real-time torque of the transfer part measured by the first detection part, and the actual distance between the base and the installation side measured by the second detection part;

[0041] When the real-time torque reaches the target torque and the actual distance reaches the target distance, or when the actual distance reaches the target distance;

[0042] Control the transfer part to work for the preset polishing duration and then complete the polishing.

[0043] In one embodiment, there are multiple surfaces to be polished of the part to be processed;

[0044] The step of confirming the target polishing wheel according to the received polishing instruction and confirming the polishing surface processing parameters according to the target polishing wheel includes:

[0045] Confirm the target polishing wheel of each polishing surface according to the received polishing instruction, and confirm the polishing surface processing parameters corresponding to each polishing surface.

[0046] In one embodiment, the flexible polishing device further includes a correction component;

[0047] Before the step of, after receiving the polishing instruction, controlling the transfer part to drive the surface to be polished of the part to be processed to contact the target polishing wheel and controlling the transfer part to work according to the polishing surface processing parameters, further includes:

[0048] Control the transfer unit to place the part to be processed at the correction component;

[0049] Control the transfer unit to pick up and transfer the part to be processed whose posture has been corrected by the correction component to the position to be polished corresponding to the polishing component.

[0050] In the technical solution of the present invention, the two polishing wheels rotate coaxially, and synchronous control can be achieved through one drive. By controlling the moving position and torque of the transfer unit, the transfer unit can take out the part to be processed from the material tray and transfer it to contact the edge of one of the polishing wheels. At this time, the transfer unit drives the part to be processed to abut against the surface of the polishing wheel and apply a downward pressure. During the rotation of the polishing wheel, a horizontal force is formed. After the driving force is transmitted to the base, the base is driven to float horizontally relative to the installation side. By adjusting the pressing force of the transfer unit, the distance between the base and the installation side can be adjusted. Since the floating structure is a horizontal float, the force value needs to change direction during the conduction process. The horizontal acting force drives the floating structure to move, and there will be a certain loss of the acting force in the up and down directions. Therefore, it is more suitable for soft polishing consumables and can avoid the excessive reaction force from affecting the polishing effect. This structural form enables the automatic compensation of the part size difference through horizontal floating when the processed part size fluctuates within a certain range, ensuring that the part and the polishing wheel are always in contact under a constant pressure during polishing, avoiding the problem of unstable polishing removal amount caused by part size differences, and at the same time, the floating stroke of the base can be controlled according to different polishing processes. Description of the Drawings

[0051] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on the structures shown in these drawings.

[0052] Figure 1 Schematic structural diagram of an embodiment of the flexible polishing device provided by the present invention;

[0053] Figure 2 For Figure 1 Schematic structural diagram of an embodiment of the floating structure in;

[0054] Figure 3 For Figure 1 Schematic structural diagram of another embodiment of the floating structure in;

[0055] Figure 4 For Figure 1 Schematic structural diagram of the transfer unit in;

[0056] Figure 5 is Figure 1 a schematic structural view of the cooperation between the main body and the movable block in

[0057] Figure 6 is Figure 1 a schematic structural view of the correction component in

[0058] Figure 7 is a schematic flow chart of an embodiment of the control method of the flexible polishing device provided by the present invention.

[0059] Explanation of the reference numerals in the drawings:

[0060] 100, flexible polishing device; 1, mounting base; 1a, mounting side; 11, support; 2, transfer component; 21, transfer part; 211, bracket; 2121, main body; 2122, movable block; 212a, first inclined ring surface; 213, mating channel; 214, lifting part; 214a, second inclined ring surface; 22, multi-axis drive structure; 3, polishing component; 31, base; 32, motor; 33, polishing wheel; 34, limit block; 4, floating structure; 41, support seat; 42, elastic member; 43, guide post; 44, limiting member; 45, linear bearing; 5, correction component; 51, bearing seat; 511, bearing platform; 52, pushing part.

[0061] The realization, functional features and advantages of the object of the present invention will be further described in conjunction with the embodiments with reference to the drawings. Specific embodiments

[0062] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0063] It should be noted that if there are directional indications involved in the embodiments of the present invention, the directional indications are only used to explain the relative position relationship and movement conditions between the components in a certain specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0064] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, such descriptions of "first", "second", etc. are only for descriptive purposes and should not be construed as indicating or implying their relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions between various embodiments may be combined with each other, but it must be based on the ability of those of ordinary skill in the art to implement. When the combination of technical solutions results in contradictions or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0065] Since mechanical polishing is much more efficient, has a higher yield, and is more stable than manual polishing in terms of efficiency, yield, and stability, more and more product polishing solutions use mechanical polishing instead of manual polishing. However, the mechanical polishing method has the following problems:

[0066] During the polishing process, it can only move fixedly along the preset points, and cannot flexibly adjust the downward pressure and the polishing position according to the current state of the product like manual polishing, so the flexibility is poor;

[0067] Limited by the repeated clamping error of the product, the consumable error, and the dimensional error of the product to be processed, the polished product is very likely to have problems such as insufficient polishing or excessive polishing removal. In the lightest case, it needs to be repaired, and in the worst case, it will be scrapped.

[0068] Based on the above situation, during the mechanical polishing process, the machine adjuster needs to frequently adjust the machine, which not only wastes time, but also the generation of scrap limits the yield, greatly affects the processing efficiency of the product, and reduces the yield of robotic arm polishing.

[0069] The present invention provides a flexible polishing device and a control method for the flexible polishing device, which achieve the effect of flexible polishing by adding a floating structure, so that the product and the polishing consumable are always in a stable contact state during the polishing process, solving the problem of unstable polishing removal amount of the robotic arm polishing caused by the repeated clamping error of the product, the consumable error, and the unstable dimensional stability of the product to be processed, and can greatly improve the polishing yield of the product.

[0070] Specifically, in the technical solution of the present invention, the polishing consumable can perform linear floating in the horizontal direction for polishing, which is mainly applicable to soft polishing consumables such as cloth wheels and wind wheels, and uses the side edge of the polishing consumable for polishing, mainly for the roughing process of polishing or wire drawing at the end and the circumferential part of the product.

[0071] Please refer to Figures 1 to 2, the flexible polishing device 100 includes a mounting base 1, a transfer assembly 2, a polishing assembly 3 and a control device. The mounting base 1 forms a mounting side 1a on one side in the horizontal direction; the transfer assembly 2 includes a transfer part 21 which can move relative to the mounting base 1 in the horizontal direction and in the vertical direction. The transfer part 21 is used to pick up and transfer the parts to be processed. The polishing assembly 3 includes a base 31 and two polishing wheels 33. The two polishing wheels 33 are spaced apart in the vertical direction and rotate coaxially about an axis extending in the vertical direction. The roughness of one of the polishing wheels 33 is set to be greater than that of the other polishing wheel 33. One end of the base 31 in the horizontal direction is mounted to the mounting side through a floating structure 4; the control device is electrically connected to the transfer assembly 2 and the polishing assembly 3; wherein, the transfer part 21 can abut the surface of one of the polishing wheels 33 against the parts to be processed, and cooperate with the corresponding polishing wheel 33 to form a force in the horizontal direction during rotation, so that the base 31 can float in the horizontal direction relative to the mounting side 1a.

[0072] Hard polishing consumables mainly refer to high-hardness materials, which are mainly used to quickly remove surface defects (such as burrs and scratches) during the polishing stage. Therefore, they are more used for rough polishing or medium polishing, while soft polishing consumables refer to materials with relatively soft texture or precision components, which can achieve a mirror effect in the polishing process, so they are mostly used for fine polishing to improve the surface gloss. In the technical solution of the present invention, based on the polishing wheel 33 being a soft polishing consumable, the material generally contacts the outer edge of the polishing wheel during polishing. Therefore, two polishing wheels 33 with different roughness levels can be set simultaneously to meet different polishing requirements. Also, due to the orientation difference of the soft polishing consumables, during the polishing process, when contacting any one of the polishing wheels 33, the other polishing wheel 33 will not cause interference.

[0073] In the technical solution of the present invention, the two polishing wheels 33 rotate coaxially, and synchronous control can be achieved through one drive. By controlling the moving position and torque of the transfer part 21, the transfer part 21 takes out the part to be processed from the tray and transfers it to contact the edge of one of the polishing wheels 33. At this time, the transfer part 21 drives the part to be processed to abut against the surface of the polishing wheel 33 and applies a downward pressure. After the pressure is transmitted from top to bottom to the base 31, it is then transmitted horizontally to the floating structure 4, so that the base 31 can float horizontally relative to the mounting base 1. By adjusting the pressing force of the transfer part 21, the distance between the base 31 and the mounting side 1a can be adjusted. Since the floating structure 4 floats horizontally, the force value needs to change direction during the conduction process, which will cause a certain loss. Therefore, the degree of horizontal floating is smaller than that when the floating structure is directly arranged directly below the polishing wheel 33, so it is more suitable for soft polishing consumables and can avoid the excessive reaction force from affecting the polishing effect. This structural form enables the automatic compensation of the part size difference through horizontal floating when the processed part size fluctuates within a certain range, ensuring that the part and the polishing wheel 44 are always in contact under a constant pressure during polishing, avoiding the problem of unstable polishing removal amount caused by part size differences, and at the same time, the floating stroke of the base 31 can be controlled according to different polishing processes.

[0074] The present invention does not limit the driving device for the transfer part 21 to move. In some embodiments, the transfer assembly 2 further includes a multi-axis driving structure 22. The multi-axis driving structure 22 is connected to the transfer part 21. The multi-axis driving structure 22 can directly be a robotic arm, or a three-axis driving structure or a four-axis driving structure. This structural form is more flexible. Thus, after the transfer part 21 picks up the part to be processed, the part to be processed, the fixture, and the driving component are taken as a whole, facilitating the control of the polishing actions at different stages.

[0075] Further, the polishing assembly 3 includes a motor 32. The housing of the motor 32 is fixed to the base 31, and the main shaft of the motor 32 is connected to the two polishing wheels 33. It can also be other related structures capable of realizing rotational drive. The present invention does not make any limitation in this regard.

[0076] It should be understood that the diameter of the lower polishing wheel 33 is larger than that of the upper polishing wheel 33, so as to provide a larger polishing operation space. Moreover, a plurality of limiting blocks are arranged between the two polishing wheels 33, so that when replacing different polishing wheels, the distance between the two polishing wheels 33 can be limited by reasonably setting the number of limiting blocks.

[0077] It should be noted that the polishing process itself has relatively high requirements for the flatness of the polishing wheel 33. Therefore, the floating structure 4 is arranged below the base 31 instead of between the polishing wheel 33 and the motor 32, in order to balance the flatness requirements of the polishing wheel 33 and the floating requirements of the overall structure.

[0078] The specific form of the floating structure 4 is not limited. It can be realized by means of elastic connection or by means of a fitting clearance. In some embodiments, please refer to Figure 2 , the floating structure 4 includes a support seat 41 and a plurality of elastic members 42, which are fixed to the installation side 1a and are arranged at a horizontal interval from the base; the plurality of elastic members 42 are located between the support seat 41 and the base 31, and opposite ends of each elastic member 42 in the horizontal direction respectively abut against the support seat 41 and the base 31. The elastic member 42 itself has the property of being compressed and deformed under force and recovering when the force is removed. The support seat 41 plays a supporting role. When the base 31 receives pressure and transmits it to the elastic member 42, the elastic member 42 is compressed and deformed, so that the distance between the base 31 and the support seat 41 is reduced. At this time, the polishing wheel 33 and the part to be processed always bear the reaction force of the elastic member 42, thus ensuring a tightly fitting effect.

[0079] It should be understood that the floating amount of the base 31 can be controlled by controlling the pressing distance of the transfer part 21 or replacing the elastic members 42 with different elastic coefficients.

[0080] The specific material of the elastic member 42 is not limited. It can be a spring, a spring sheet, a sponge, or a silicone member with good elasticity. The present invention does not limit this.

[0081] It should be understood that since the elastic member 42 is horizontally arranged, the gravity will cause the base and the support seat to be displaced in the up and down direction, resulting in uncontrollable floating. Based on this, in some embodiments, please refer to Figure 2, a plurality of through holes are formed in the end face of the base 31 facing the support base 41; the floating structure 4 further includes a plurality of guide posts 43 and a plurality of limit members 44. The plurality of guide posts 43 are arranged corresponding to the plurality of through holes. One end of each guide post 43 in the horizontal direction is fixed to the support base 41, and the other end extends out of the corresponding through hole; the plurality of limit members 44 are arranged corresponding to the plurality of guide posts 43. Each limit member 44 is fixed to the end of the corresponding guide post 43 extending out of the through hole and can abut against the corresponding side surface of the base 31. The plurality of guide posts 43 function to connect, support and guide horizontally, and the plurality of limit members 44 function to limit. In the initial state, the limit member 44 abuts against the base 31 for limiting, so that the elastic member 42 is in a pre-compressed state. Due to the limitation of the guide post 43, the base 31 can only float in the horizontal direction and will not deflect in the up and down direction, and the base 31 will not shake either. When the transfer part 21 provides a downward pressure, the elastic member 42 is compressed and deformed, and at this time the base 31 moves and moves relative to the guide post 43, so that the limit member 44 is separated from the base 31. It should be noted that in this embodiment, the size of the limit member 44 should be larger than the size of the through hole.

[0082] Based on the above embodiment, when the elastic member 42 is set as a spring, each spring is sleeved on the outer surface of each guide post 43.

[0083] Please refer to Figure 3 , a linear bearing 45 can be arranged between each guide post 43 and the corresponding through hole. The mutual cooperation of the linear bearing 45 and the guide post 43 can ensure accurate positioning of the base 31 while allowing smooth floating. Specifically, the upper end of the linear bearing 45 extends outward to form a limit ring, and the limit ring abuts against the surface of the base 31 and is fixed by bolts. At this time, the limit member 44 only needs to abut against the limit post to achieve stop and limit. That is, in this embodiment, the size of the limit member 44 can be smaller than the size of the through hole, but needs to be larger than the inner hole of the linear bearing 45.

[0084] The transfer part 21 should be able to realize the picking function of the product. Considering that the product is always subject to friction during the polishing process, it is necessary to ensure the absolute fixed cooperation between the transfer part 21 and the product, and the mechanical clamping method is preferably adopted. Considering the outer surface of the product corresponding to the polishing, in order to avoid the problem of covering the polishing surface caused by clamping on the outer wall of the product, please refer to Figures 4 to 5, the transfer part includes a bracket 211, a main body 2121, a plurality of movable blocks 2122 and a jacking part 214. The bracket 211 is movably installed on the mounting base in the horizontal direction and in the vertical direction; a through hole is provided in the middle of the main body 2121. One end of the main body 2121 is fixed to the bracket 211. A plurality of movable blocks 2122 are arranged at intervals along the circumferential direction of the main body 2121 at the other end of the main body 2121. The plurality of movable blocks 2122 jointly define a mating channel 213 communicating with the through hole. The mating channel 213 is arranged to gradually expand in a direction away from the main body 2121 to form a first inclined annular surface 212a. The plurality of movable blocks 2122 have a movable form of approaching or separating from each other to jointly tighten the inner wall surface of the part to be processed; the plurality of movable blocks 2122 cooperate with each other to jointly tighten and fix the inner hole of the part to be processed in an inner support form, so that the outside of the part to be processed can be completely exposed. The jacking part is movably installed on the bracket 211 along the extending direction of the through hole. A second inclined annular surface 214a adapted to the first inclined annular surface 212a is provided on the outer side of the jacking part. During the movement of the jacking part, there is a spreading position where it passes through the through hole so that the second inclined annular surface 214a abuts against the first inclined annular surface 212a to drive the plurality of movable blocks 2122 to move away from each other, and a release position where it retracts into the through hole to separate from the plurality of movable blocks 2122. The first inclined annular surface 212a and the second inclined annular surface 214a achieve a wedge fit, so as to actively drive the movable block 2122 to switch from the release position to the spreading position.

[0085] The above-mentioned mating channel 213 is a spatial concept and does not limit that the mating channel 213 is a closed structure. The inner side walls of the plurality of movable blocks 2122 jointly form the inner wall surface of the mating channel 213. When in the spreading position, the inner wall surface of the mating channel 213 is discontinuous because a gap is formed between two adjacent movable blocks 2122. When in the release position, the inner wall surface of the mating channel 213 can be continuous or discontinuous, that is, the plurality of movable blocks 2122 can be adjacent to each other or have a gap.

[0086] It should be noted that the jacking part 214 can be driven by a cylinder. The cylinder barrel of the cylinder is fixed on the bracket 211, and the cylinder rod is connected to the jacking part 214. At this time, a guide sleeve can be added to the bracket 211 for the cylinder rod to movably pass through, so as to improve stability.

[0087] Specifically, corresponding grooves can be provided on the main body 2121 as the linear movement guide of the movable blocks 2122. The reset of the plurality of movable blocks 2122 can be realized by adding elastic pull rods or other pushing structures.

[0088] In other embodiments, the main body 2121 and the movable block 2122 can be formed by partially cutting the end of the spring steel, that is, not completely cutting it off, and the number of cutting points set at a reasonable size of the spring steel can control the number of movable blocks 2122 formed. The main body 2121 and the movable block 2122 can also be made of different materials, and the two are connected by assembly, that is, at least the movable block 2122 needs to be made of elastic material, and then deformed to the expanded position through the oblique fit with the lifting part 214. After the lifting part 214 is reset, the multiple movable blocks 2122 can automatically reset to the released position under the action of elasticity.

[0089] Please refer to Figure 5 The outer diameters of the plurality of movable blocks 2122 are variable, so that the plurality of movable blocks 2122 can adapt to the size and shape of the parts to be processed. Specifically, the end of each movable block 2122 facing away from the main body 2121 is arranged in a stepped manner, so as to adapt to the inner hole diameter of the parts to be processed.

[0090] In order to ensure the consistency of the floating of the base 31 during the polishing of different parts or different surfaces of the same part under the same polishing amount requirement, the flexible polishing device 100 also includes a first detection member (not shown in the figure), which is arranged on the transfer part 21 and is electrically connected to the control device for detecting the torque of the transfer part 21. Specifically, the torque of the transfer part 21 is controlled by the driving force of the multi-axis driving structure 22, and is detected and controlled by real-time feedback of the numerical value. The first detection member can be a torque wrench or other torque detection instrument, as long as it can realize the functions of numerical detection and data transmission.

[0091] Considering that the elastic force of the elastic member 42 will gradually weaken during continuous use, the displacement of the base 31 may be different under the same torque as the use time of the device is delayed. Therefore, the flexible polishing device 100 also includes a second detection member (not shown), which is provided on the base 31 and / or the mounting side 1a, and is used to detect the distance between the base and the mounting side 1a. The second detection member can be a proximity switch, a laser rangefinder, etc., which can detect the distance between the base 31 and the mounting side 1a, thereby reflecting the polishing amount of the current part.

[0092] In this embodiment, a first detection member and a second detection member are provided simultaneously, and the two can record the torque and the floating stroke simultaneously. By referring to the two values simultaneously, the state of the elastic member 42 can be timely reflected, so that the operator can replace it in time.

[0093] Further, considering the installation of the floating structure 3, please refer to Figure 1 and Figure 2, a support 11 is detachably mounted on the mounting base 1. One side surface of the support 11 in the horizontal direction forms a mounting side 1a. The mounting side 1a and the support base are connected by screws. A plurality of through holes are provided on both opposite sides of the support 11 in the horizontal direction, so that the position of the mounting side 1a and the mounting orientation of the base 31 can be flexibly adjusted according to the orientation of the robotic arm.

[0094] During the actual use of the device, the transfer unit 21 generally picks up materials from the trays. Some trays isolate every other part separately, and some trays place multiple parts scattered. In this case, the postures of the parts picked up by the transfer unit 21 may be different. Therefore, the flexible polishing device 100 further includes a correction assembly 5. The correction assembly 5 includes a bearing seat 51 and two pushing parts 52. The bearing seat 51 is arranged on one side of the polishing assembly 3 in the horizontal direction. The bearing seat 51 includes a bearing platform 511. A positioning groove is formed on the bearing platform 511 for placing the parts to be processed transferred by the transfer unit 21. The two pushing parts 52 are movably mounted on the bearing seat 51. The two pushing parts 52 are respectively arranged on two opposite sides of the bearing platform 511 in the horizontal direction and have a moving stroke of approaching or separating from each other. The two pushing parts 52 approach each other to jointly hold and correct the posture of the parts to be processed on the positioning groove. After the transfer unit 21 picks up the product from the tray, it is first placed in the positioning groove of the bearing platform 511. The transfer unit 21 releases the product and waits aside. The two pushing parts 52 perform unilateral positioning on the product in the positioning groove, thereby correcting the posture of the product. In this way, the posture of the parts picked up by the transfer unit 21 from the bearing platform 511 each time will be the same.

[0095] It should be noted that a buffer structure can be provided below the bearing seat 51. The buffer structure can be composed of a spring and a guide rod in cooperation.

[0096] In other embodiments, the correction assembly 5 can be positioned by an L-shaped positioning member and a linear push rod. Specifically, the transfer unit 21 places the part on the platform and makes the part contact one of the positioning edges of the L-shaped positioning member. The part is pushed by the linear push rod so that the part contacts both positioning edges of the L-shaped positioning member at the same time. At this time, the positioning is completed, and the transfer unit 21 can take away the part.

[0097] The control device can be an industrial control computer. Specifically, the control device may include a processing device (such as a central processing unit, a graphics processing unit, etc.), which can execute various appropriate actions and processes according to the program stored in the read-only memory (ROM: Read Only Memory) or the program loaded from the storage device into the random access memory (RAM: Random Access Memory). In the RAM, various programs and data required for the operation of the control device are also stored. The processing device, ROM, and RAM are connected to each other through a bus. The input / output (I / O) interface is also connected to the bus. Usually, the following systems can be connected to the I / O interface: input devices including, for example, a touch screen, a touchpad, a keyboard, a mouse, an image sensor, a microphone, an accelerometer, a gyroscope, etc.; output devices including, for example, a liquid crystal display (LCD: Liquid Crystal Display), a speaker, a vibrator, etc.; storage devices including, for example, magnetic tape, a hard disk, etc.; and a communication device. The communication device can allow the control device to communicate with other devices wirelessly or wiredly to exchange data. Although the figure shows a control device with various systems, it should be understood that it is not required to implement or have all the shown systems. Instead, more or fewer systems can be implemented or had.

[0098] Based on this, an embodiment of the present application provides a control method for a flexible polishing device. Figure 7 It is a schematic flowchart of the first embodiment of the control method for the flexible polishing device of the present application.

[0099] In this embodiment, the control method for the flexible polishing device specifically includes the following steps:

[0100] Step S10, confirm the target polishing wheel according to the received polishing instruction, and confirm the polishing surface processing parameters according to the target polishing wheel;

[0101] Among them, the polishing surface processing parameters include the target torque of the transfer part, the target distance between the base 31 and the installation side 1a, and the preset polishing duration;

[0102] It should be noted that since the two polishing wheels 33 rotate coaxially, therefore, even if one of the polishing wheels 33 is selected as the target polishing wheel, the two polishing wheels 33 can rotate simultaneously in the working state.

[0103] It should be noted that the polishing surface processing parameters are for the processing requirements of one of the polishing surfaces of the part. This is because the processing requirements for different polishing surfaces of the same product may be different, that is, the required polishing amounts are different. For the same product, when there are multiple polishing surfaces of the part to be processed, it is necessary to confirm the target polishing wheel for each polishing surface according to the received polishing instruction, and confirm the polishing surface processing parameters corresponding to each polishing surface. Correspondingly, among the polishing surface processing parameters of the multiple polishing surfaces of the part to be processed, the numerical values of the target torque of the transfer part 21 and the target distance of the base 31 can be the same, with only the preset polishing duration being different, or the preset polishing duration can be the same but the numerical values of the target torque of the transfer part 21 and the target distance of the base 31 being different.

[0104] It should be understood that the polishing instruction can be the polishing amount requirement directly selected by the user on the operation interface, or the parameter information of different levels of polishing degrees is pre-stored in the memory. When the user selects the polishing degree option, a polishing instruction is generated.

[0105] Step S30, after receiving the polishing instruction, control the transfer part to drive the polishing surface of the part to be processed to contact the target polishing wheel, and control the transfer part to work according to the polishing surface processing parameters.

[0106] It should be noted that based on the above information, control the transfer part 21 to press down the polishing wheel 33 with the target torque until the base 31 moves horizontally to reach the target distance. If the polishing wheel 33 does not rotate, control the polishing wheel 33 to rotate and then start timing until the preset polishing duration is reached. If the polishing wheel 33 is already in a rotating state, start timing immediately when the relevant numerical value is reached until the preset polishing duration is reached.

[0107] It should be noted that there is a certain correlation between the target torque and the target distance. Theoretically, when the transfer part 21 reaches the target torque, the distance between the base and the mounting seat satisfies the target distance.

[0108] It should be understood that when the processing of this polishing surface is completed, it is necessary to re-determine the target polishing wheel according to the new polishing surface, because the gloss requirements for different polishing surfaces of the same product may be different. Therefore, the same product may need to switch between two polishing wheels for polishing.

[0109] In the technical solution of the present invention, based on the structural characteristics of the flexible polishing device 100, the consistency and stability of part polishing are ensured by identifying relevant parameters. Thus, during the polishing process, the polishing surface of the part and the polishing wheel are always in a contact state with a constant pressure, avoiding the problem of unstable polishing removal amount caused by product size differences.

[0110] Further, step S30 includes:

[0111] Step S31, control the transfer unit to press the surface to be polished of the part to be processed against the target polishing wheel;

[0112] Step S32, obtain the real-time torque of the transfer unit measured by the first detector and the actual distance between the base and the mounting side 1a measured by the second detector;

[0113] It should be noted that the transfer unit 21 drives the part to contact and press down on the polishing wheel 33, applying a downward pressure on the polishing wheel 33 and compressing the spring to a certain length. At this time, although the product and the polishing wheel 33 always bear the reaction force provided by the spring, the current actual torque and the floating stroke at this real-time torque do not reach the target distance, that is, the downward pressure on the polishing wheel 33 should be gradually increased.

[0114] Step S33, when the real-time torque reaches the target torque and the actual distance reaches the target distance, or when the actual distance reaches the target distance;

[0115] It should be noted that when the elastic force value of the elastic member 42 is stable, when the actual torque reaches the target torque, the actual distance will surely reach the target distance. However, if the elastic member 42 is highly fatigued after long-term use and its elastic force weakens, at this time when the actual torque reaches the target torque, the actual distance may have exceeded the target distance. That is, under the same torque condition, the downward pressure distance of the polishing wheel 33 is greater, which will cause a decrease in the polishing amount. Therefore, it should be controlled based on the distance between the base and the mounting side 1a. When the actual distance reaches the target distance, even if the actual torque does not reach the target torque, it is determined that the processing requirement is met.

[0116] Step S34, control the transfer unit to work for a preset polishing duration and then complete the polishing.

[0117] It should be noted that the completion of polishing here refers to the completion of the polishing of this polished surface, and the polishing of the entire part may not be completed.

[0118] After the polishing is completed, if the current polished surface is the first polished surface, it is necessary to repeat steps S31 - S32 after changing the product posture. If the current polished surface is the last polished surface of the product, stop the polishing.

[0119] Furthermore, before step S30, it also includes:

[0120] Step S21, control the transfer unit 21 to place the part to be processed on the correction component 5;

[0121] It should be noted that the transfer unit 21 is set with a path so that it can place the part in the positioning groove of the correction component 5 each time. After the part placement action is completed, the transfer unit 21 moves to the side of the positioning groove to avoid interference;

[0122] Step S22: Control the transfer unit 21 to pick up the workpiece after its posture is corrected by the correction component 5 and transfer it to the position to be polished corresponding to the polishing component 3.

[0123] Specifically, after the part is placed in the positioning groove, the posture of the part is corrected by the pushing part 52, so that the posture of the product taken away by the transfer unit 21 from the correction component 5 each time is consistent, which is beneficial to ensuring the polishing consistency of products in the same batch.

[0124] In the solution of the present invention, the cooperation between the floating structure 4 and the transfer unit 21 can ensure that when the product size fluctuates within a certain range, the difference in product size is automatically compensated by the elastic device, and ensure that the product and the polishing wheel are always in contact with a constant pressure during polishing, thus solving the problem of unstable removal amount of the robot polishing caused by the repeated clamping error of the product, the consumable error, and the unstable size of the workpiece to be processed, and greatly improving the polishing yield of the product. It should be understood that according to different product processes (rough polishing, medium polishing, fine polishing), the pressure between the product and the polishing consumable can be adjusted by controlling the pressing distance of the robotic arm or replacing the elastic member 42 with a greater or smaller elastic force, so as to control the size of the removal amount.

[0125] The above are only the preferred embodiments of the present invention, and do not limit the patent scope of the present invention accordingly. Any equivalent structural transformation made by using the content of the specification and drawings of the present invention under the inventive concept of the present invention, or direct / indirect application in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A flexible polishing device, characterized in that, Comprising: A mounting base, which forms a mounting side on one side in the horizontal direction; A transfer assembly, including a transfer part, which can move relative to the mounting base in the horizontal direction and in the vertical direction, and the transfer part is used for picking up and transferring the parts to be processed; A polishing assembly, including a base and two polishing wheels. The two polishing wheels are spaced apart in the vertical direction and rotate coaxially around an axis extending in the vertical direction. The roughness of one of the polishing wheels is set to be greater than that of the other polishing wheel. One end of the base in the horizontal direction is mounted to the mounting side through a floating structure; and A control device, which is electrically connected to the transfer assembly and the polishing assembly; Wherein, the transfer part can abut against the surface of one of the polishing wheels with the part to be processed, and cooperate with the corresponding polishing wheel to form a force in the horizontal direction during rotation, so that the base can float in the horizontal direction relative to the mounting side.

2. The flexible polishing device according to claim 1, wherein The transfer assembly further includes a multi-axis drive structure, and the multi-axis drive structure is connected to the transfer part to drive the transfer part to move; and / or The polishing assembly includes a motor, the housing of the motor is fixed on the base, and the main shaft of the motor is connected to the two polishing wheels; and / or A plurality of limiting blocks are arranged between the two polishing wheels.

3. The flexible polishing device according to claim 1, wherein, The floating structure includes: A support seat, which is fixed to the mounting side and is spaced from the base in the horizontal direction; and A plurality of elastic members, which are located between the support seat and the base, and the opposite ends of each elastic member in the horizontal direction respectively abut against the support seat and the base.

4. The flexible polishing device according to claim 3, wherein, A plurality of through holes are formed in the end face of the base facing the support seat; The floating structure further includes: A plurality of guide posts, which are arranged corresponding to the plurality of through holes. One end of each guide post in the horizontal direction is fixed to the support seat, and the other end extends out of the corresponding through hole; A plurality of limit members, which are arranged corresponding to the plurality of guide posts. Each limit member is fixed to the end of the corresponding guide post extending out of the through hole and can abut against the corresponding side face of the base.

5. The flexible polishing device according to claim 4, wherein Each elastic member is set as a spring, and each spring is sleeved on the outer surface of each guide post; and / or A linear bearing is arranged between each guide post and the corresponding through hole.

6. The flexible polishing device according to claim 1, characterized in that, The transfer part includes: A bracket, which is movably mounted to the mounting base in the horizontal direction and in the vertical direction; A main body, a through hole is formed in the middle of the main body, and one end of the main body is fixed to the bracket, A plurality of movable blocks, which are arranged at intervals along the circumference of the main body at the other end of the main body. The plurality of movable blocks jointly define a fitting channel communicating with the through hole. The fitting channel is gradually expanded in the direction away from the main body to form a first inclined annular surface. The plurality of movable blocks have a movable form of approaching or separating from each other to jointly tighten the inner wall surface of the part to be processed; and The lifting part is movably installed on the bracket along the extending direction of the through hole. A second inclined ring surface adapted to the first inclined ring surface is arranged on the outer side of the lifting part. During the movement of the lifting part, there is a spreading position where it passes through the through hole so that the second inclined ring surface abuts against the first inclined ring surface to drive the plurality of movable blocks to move away from each other, and a releasing position where it retracts into the through hole to separate from the plurality of movable blocks.

7. The flexible polishing device according to claim 1, characterized in that The flexible polishing device further includes: A first detection member, arranged on the transfer part and electrically connected to the control device, for detecting the torque of the transfer part; and / or, A second detection member, arranged on the base and / or the installation side and electrically connected to the control device, for detecting the distance between the base and the installation side.

8. The flexible polishing device according to claim 1, characterized in that, The flexible polishing device further includes a correction assembly, and the correction assembly includes: A carrier seat, arranged on one side of the polishing assembly in the horizontal direction. The carrier seat includes a carrier platform, and a positioning groove is formed on the carrier platform for placing the workpiece to be processed transferred by the transfer part; and, Two pushing parts, movably installed on the carrier seat. The two pushing parts are arranged on opposite sides of the carrier platform in the horizontal direction and have a moving stroke of approaching or separating from each other. The two pushing parts approach each other to jointly hold and correct the posture of the workpiece to be processed on the positioning groove.

9. A control method for a flexible polishing device, based on the flexible polishing device according to any one of claims 1 to 8, characterized in that The control method of the flexible polishing device includes the following steps: Confirm the target polishing wheel according to the received polishing instruction, and confirm the polishing surface processing parameters according to the target polishing wheel, wherein the polishing surface processing parameters include the target torque of the transfer part, the target distance between the base and the installation side, and the preset polishing duration; After receiving the polishing instruction, control the transfer part to drive the surface to be polished of the workpiece to be processed to contact the target polishing wheel, and control the transfer part to work according to the polishing surface processing parameters.

10. The control method of the flexible polishing device according to claim 9, characterized in that, The flexible polishing device further includes a first detection member and a second detection member; The step of, after receiving the polishing instruction, controlling the transfer part to drive the workpiece to be processed to contact the target polishing wheel and controlling the transfer part to work according to the polishing surface processing parameters includes: Controlling the transfer part to press the surface to be polished of the workpiece to be processed tightly against the target polishing wheel; Obtaining the real-time torque of the transfer part measured by the first detection member, and the actual distance between the base and the installation side measured by the second detection member; When the real-time torque reaches the target torque and the actual distance reaches the target distance, or when the actual distance reaches the target distance; Controlling the transfer part to work for a preset polishing duration and then completing the polishing.

11. The control method of the flexible polishing device according to claim 9, characterized in that, There are multiple surfaces to be polished of the workpiece to be processed; The step of confirming the target polishing wheel according to the received polishing instruction and confirming the polishing surface processing parameters according to the target polishing wheel includes: Confirming the target polishing wheel of each polishing surface according to the received polishing instruction, and confirming the polishing surface processing parameters corresponding to each polishing surface.

12. The control method of the flexible polishing device according to claim 9, characterized in that, The flexible polishing device further includes a correction assembly; Before the step of, after receiving a polishing instruction, controlling the transfer unit to drive the surface to be polished of the part to be processed into contact with the target polishing wheel and controlling the transfer unit to work according to the polishing surface processing parameters, the following steps are further included: Controlling the transfer unit to place the part to be processed at the correction assembly; Controlling the transfer unit to pick up and transfer the part to be processed whose posture has been corrected by the correction assembly to the position to be polished corresponding to the polishing assembly.

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