Automatic cleaning device for reaction chamber of epitaxial furnace

Abstract

The invention belongs to the technical field of epitaxial furnaces, and particularly relates to an epitaxial furnace reaction cavity automatic cleaning device which comprises a cleaning trolley, an extension frame is arranged above the cleaning trolley, a connecting frame is mounted on the side wall of the extension frame, and a cleaning frame is mounted on the side, away from the extension frame, of the connecting frame; the cleaning frames can move up and down on the inner wall of the reaction cavity of the epitaxial furnace, the two sets of cleaning frames are symmetrically arranged up and down relative to the connecting frame, air supply pipelines are arranged at the ends of the cleaning frames, multiple sets of air supply nozzles are installed at the ends of the air supply pipelines, and the air outlet ends of the air supply nozzles face one side of the wall of the reaction cavity of the epitaxial furnace; pollutants on the inner wall of the cavity and components of the cavity are decomposed and stripped through high-temperature chemical reaction, and finally stripped products are purged out through nitrogen, so that compared with cleaning through chemical cleaning liquid, the problem of cavity epitaxial layer defects caused by liquid residues and poor compatibility between the cleaning liquid and the cavity can be avoided.

Description

Technical Field

[0001] The present invention belongs to the technical field of epitaxial furnaces, and more specifically, it is an automatic cleaning device for the reaction chamber of an epitaxial furnace. Background Art

[0002] During the epitaxial reaction process, as the reaction gas continuously reacts and deposits, the reaction gas will also undergo a deposition reaction on the inner wall of the reaction chamber of the epitaxial furnace to form impurities attached to the inner wall of the reaction chamber. Excessive accumulation of impurities or their falling off may cause epitaxial defects and surface particles on the epitaxial wafer, seriously affecting the epitaxial quality and yield. Therefore, the epitaxial furnace needs to regularly clean the reaction chamber to remove the impurities on the inner wall of the reaction chamber. If not cleaned, particle contamination will lead to an increase in surface roughness, causing device short circuits or lithography alignment failures; carbon deposition may change the growth rate, resulting in uneven film thickness.

[0003] Currently, when cleaning the epitaxial furnace, the traditional method requires disassembling the cavity for pickling or cleaning with ultrasonic equipment. This method has a long cleaning time and is prone to introducing secondary contamination. Another method is cleaning with a chemical cleaning solution. When cleaning with a chemical cleaning solution, it may cause epitaxial layer defects, such as metal ion contamination, and has poor compatibility with the high-temperature cavity material, which is not conducive to the continued use of the subsequent reaction chamber.

[0004] Therefore, the present invention provides an automatic cleaning device for the reaction chamber of an epitaxial furnace. Summary of the Invention

[0005] In order to make up for the deficiencies of the prior art and solve at least one of the technical problems proposed in the background art.

[0006] The technical solution adopted by the present invention to solve its technical problems is as follows: An automatic cleaning device for the reaction chamber of an epitaxial furnace according to the present invention includes a cleaning cart. An extension frame is provided above the cleaning cart. A connecting frame is installed on the side wall of the extension frame. A cleaning frame is installed on the side of the connecting frame away from the extension frame. The cleaning frame can move up and down on the inner wall of the reaction chamber of the epitaxial furnace. Two groups of cleaning frames are provided and are symmetrically arranged up and down with respect to the connecting frame. An air supply pipe is provided at the end of the cleaning frame. A plurality of air supply nozzles are installed at the end of the air supply pipe. The air outlet end of the air supply nozzle faces the side of the reaction chamber wall of the epitaxial furnace.

[0007] Preferably, a rotating disk is installed on the side wall of the extension frame, the side wall of the rotating disk is connected to the output end of an external driving motor, the side of the cleaning frame is installed on the side wall of the rotating disk through a support rod, the extension frame is slidably arranged on the upper end surface of the cleaning trolley, and a reciprocating cylinder is installed on the upper end surface of the cleaning trolley. The telescopic end of the reciprocating cylinder is connected to the side wall of the extension frame; the air supply nozzle faces the cavity of the reaction chamber, so that the contact area between nitrogen and the residues on the inner wall of the cavity can be increased. Moreover, when the extension frame is located inside the reaction chamber, at this time, the rotating disk can be driven to rotate by an external driving motor, and the rotating disk drives the cleaning frame and the air supply nozzle to rotate, that is, the air supply nozzle will rotate along the inner wall of the reaction chamber cavity, thereby improving the contact effect between nitrogen and the inside of the cavity. Moreover, the extension frame is driven to move by the telescopic end of the reciprocating cylinder, so that the extension frame moves inside the reaction chamber, so as to facilitate the treatment of the entire inside of the reaction chamber.

[0008] Preferably, a first bi-directional reciprocating cylinder is installed on the side of the connecting frame. The telescopic ends of the first bi-directional reciprocating cylinder are respectively connected to the ends of two groups of cleaning frames. The length of the extension frame is smaller than the diameter of the reaction chamber of the epitaxial furnace; during operation, when the extension frame is located inside the reaction chamber, at this time, first control the telescopic ends of the first bi-directional reciprocating cylinder to move, so that the first bi-directional reciprocating cylinder drives the cleaning frames to move respectively, and the cleaning frames will move towards the side close to the reaction chamber, which is beneficial to removing the attachments on the chamber wall by nitrogen and can also be applicable to reaction chambers of different sizes of epitaxial furnaces.

[0009] Preferably, cross shafts are fixedly installed at the ends of the two groups of cleaning frames. A support frame is rotatably arranged on the outer peripheral surface of the cross shaft. A spherical fitting wheel is rotatably arranged at the edge of the end of the support frame. The spherical fitting wheel is used to contact the wall of the reaction chamber of the epitaxial furnace. The air supply pipe is arranged outside the support frame; during operation, when the first bi-directional reciprocating cylinder drives the cleaning frames to move and contact the reaction chamber wall respectively, that is, after the spherical fitting wheel moves, it will contact the wall of the reaction chamber of the epitaxial furnace. In this way, when the rotating disk rotates, the spherical fitting wheel can rotate while fitting the wall of the reaction chamber of the epitaxial furnace, so as to facilitate the air supply nozzle to face the reaction chamber wall at a short distance.

[0010] Preferably, an elastic telescopic rod is installed on the side of the support frame. The side of the elastic telescopic rod away from the support frame is connected to the outer peripheral surface of the cross shaft. A spring is sleeved on the outer peripheral surface of the elastic telescopic rod. A rotating unit is arranged on the side of the support frame. The rotating unit is used to drive the air supply pipe to rotate; during operation, when the spherical fitting wheel moves and contacts the wall of the reaction chamber of the epitaxial furnace, if the wall of the reaction chamber of the epitaxial furnace is irregular, when the spherical fitting wheel contacts the convex part of the chamber wall, since the support frame is rotatably arranged on the outer surface of the cross shaft, when the spherical fitting wheel contacts the convex part of the chamber wall, the support frame will rotate to a certain extent on the outer surface of the cross shaft, so it can be applicable to reaction chambers of different shapes and sizes and improve the cleaning effect.

[0011] Preferably, the rotation unit includes a fixed frame plate installed on the side of the support frame. The fixed frame plate is installed on the side of the support frame through a bracket. A driving gear is rotatably installed on the side of the fixed frame plate. The end of the driving gear is connected to the output end of an external driving motor. A driven tooth ring is installed on the side of the fixed frame plate. The driving gear and the driven tooth ring are meshed and connected. The air supply pipe is installed inside the driven tooth ring. When working, when the spherical fitting wheel contacts the wall of the epitaxial furnace reaction chamber and the rotating disk rotates, at this time, the driving gear is controlled to rotate through an external drive. The driving gear drives the driven tooth ring to rotate. The driven tooth ring drives the air supply pipe and multiple air supply nozzles to rotate, so that during the rotation of the air supply nozzles, the contact area between each position of the wall of the epitaxial furnace reaction chamber and nitrogen is increased, the gas coverage range is expanded, and it is also beneficial to purge the highly polluted area under high impact force.

[0012] Preferably, a heat-resistant ring is installed on the side of the driven tooth ring. The air supply pipe passes through the inside of the heat-resistant ring. Each air supply nozzle passes through the inner wall of the heat-resistant ring and faces the cavity of the epitaxial furnace reaction chamber. Circular grooves adapted to the air supply nozzles are provided on the inner wall of the heat-resistant ring. When working, the heat-resistant ring is provided, which is convenient for the driven tooth ring to drive the air supply pipe and each air supply nozzle to rotate.

[0013] Preferably, a limiting circular frame is installed on the side of the fixed frame plate. A limiting ring plate is installed on the side of the driven tooth ring away from the heat-resistant ring. The limiting ring plate is arranged inside the limiting circular frame. When working, when the driven tooth ring rotates, the driven tooth ring will drive the limiting ring plate to rotate at the same time. The limiting ring plate will rotate inside the limiting circular frame. Thus, under the mutual limitation of the limiting ring plate and the limiting circular frame, the stability of the driven tooth ring during rotation is improved, and it is convenient for the treatment of the attachments on the reaction chamber wall.

[0014] Preferably, a cleaning ring is installed on the outside of the cleaning frame. The shape of the cleaning ring is annular. When working, when the cleaning frame moves along with the telescopic end of the first double-acting cylinder, the cleaning frame will drive the cleaning ring to move at the same time, so that the cleaning ring contacts the chamber wall. In this way, when nitrogen contacts the attachments on the chamber wall, the cleaning ring can sweep away the loosened particulate matter, which is convenient for subsequent high-temperature chemical reactions to decompose these particulate matters.

[0015] Preferably, guiding circular wheels are provided at the contact positions between the limiting ring plate and the inner wall of the limiting circular frame, and multiple groups of guiding circular wheels are provided.

[0016] The beneficial effects of the present invention are as follows: 1. An automatic cleaning device for the reaction chamber of an epitaxial furnace according to the present invention, when the spherical fitting wheel contacts the convex part of the chamber wall, since the support frame is rotatably arranged on the outer surface of the horizontal axis, when the spherical fitting wheel contacts the convex part of the chamber wall, the support frame will rotate to a certain extent on the outer surface of the horizontal axis, so it can be applied to reaction chambers of different shapes and sizes, and improve the cleaning effect.

[0017] 2. An automatic cleaning device for the reaction chamber of an epitaxial furnace according to the present invention, when the spherical fitting wheel contacts the reaction chamber wall of the epitaxial furnace and the rotating disk rotates, at this time, the driving gear is controlled to rotate through an external drive, the driving gear drives the driven tooth ring to rotate, and the driven tooth ring will drive the air supply pipeline and multiple groups of air supply nozzles to rotate, so that during the rotation of the air supply nozzles, the contact area between each position of the reaction chamber wall of the epitaxial furnace and nitrogen is increased, the gas coverage range is expanded, and it is also beneficial to purging the highly polluted area under high impact force. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention will be further described below with reference to the accompanying drawings.

[0019] Figure 1 is a perspective view of the present invention; Figure 2 is a schematic structural diagram of the cleaning rack in the present invention; Figure 3 is a schematic structural diagram of the cleaning rack when it is located on the inner wall of the reaction chamber in the present invention; Figure 4 is a partial structural schematic diagram of the connecting rack in the present invention; Figure 5 is a schematic structural diagram of the spherical fitting wheel in the present invention; Figure 6 is a schematic structural diagram of the elastic telescopic rod in the present invention; Figure 7 is a schematic structural diagram of the driven tooth ring in the present invention; Figure 8 is a schematic structural diagram of the temperature-resistant ring in the present invention; Figure 9 is a schematic structural diagram of the air supply nozzle in the present invention; Figure 10 is a schematic structural diagram of the limiting circular frame in the present invention.

[0020] In the figure: 1. Cleaning cart; 2. Extension rack; 3. Connecting rack; 301. Cleaning rack; 4. Air supply pipeline; 401. Air supply nozzle; 5. Rotating disk; 6. Reciprocating cylinder; 7. First double-acting reciprocating cylinder; 8. Horizontal axis; 9. Support frame; 10. Spherical fitting wheel; 11. Elastic telescopic rod; 12. Fixed frame plate; 121. Driven tooth ring; 13. Driving gear; 14. Temperature-resistant ring; 15. Limiting circular frame; 16. Limiting ring plate; 17. Cleaning ring. DETAILED DESCRIPTION OF THE INVENTION

[0021] In order to make the technical means, creative features, achieved purposes and effects realized by the present invention easy to understand, the present invention will be further described below in conjunction with specific embodiments.

[0022] As Figures 1 to 4 shown, an automatic cleaning device for an epitaxial furnace reaction chamber according to an embodiment of the present invention includes a cleaning cart 1, an extension frame 2 is arranged above the cleaning cart 1, a connecting frame 3 is installed on the side wall of the extension frame 2, and a cleaning frame 301 is installed on the side of the connecting frame 3 away from the extension frame 2. The cleaning frame 301 can move up and down on the inner wall of the epitaxial furnace reaction chamber. Two groups of cleaning frames 301 are provided and are symmetrically arranged up and down with respect to the connecting frame 3. An air supply pipe 4 is arranged at the end of the cleaning frame 301, and a plurality of air supply nozzles 401 are installed at the end of the air supply pipe 4. The air outlet end of the air supply nozzle 401 faces the side of the epitaxial furnace reaction chamber wall; During epitaxial growth, when precursors such as silane decompose to form a single crystal silicon layer, amorphous silicon or polycrystalline silicon particles may be generated. These substances will adhere to the surfaces of components such as the chamber wall and the susceptor. If not cleaned, particle contamination will cause an increase in surface roughness, leading to device short circuits or lithography alignment failures; carbon deposition may change the growth rate, resulting in uneven film thickness; Specifically, when cleaning the epitaxial furnace reaction chamber, first move the cleaning cart 1 to one side close to the opening of the epitaxial furnace reaction chamber, so that the cleaning frame 301, the air supply pipe 4 and the air supply nozzles 401 are sent into the reaction chamber cavity, and the air supply pipe 4 and the air supply nozzles 401 spray nitrogen, and nitrogen is used to blow the reaction chamber for 2-4 hours at a flow rate of 25-30 L / min to remove the particulate matter inside the reaction chamber and the pipeline. Then repeat the nitrogen blowing step at high temperature, and then introduce hydrogen for baking to decompose and strip the pollutants on the inner wall of the chamber and its components through high-temperature chemical reactions. Finally, the stripped products are blown out by nitrogen blowing. In this way, compared with cleaning with a chemical cleaning solution, it can avoid the problems of epitaxial layer defects in the chamber caused by liquid residues and poor compatibility between the cleaning solution and the chamber, and at the same time, there is no need to disassemble the chamber for pickling or ultrasonic equipment cleaning by traditional methods.

[0023] A rotating disk 5 is installed on the side wall of the extension frame 2. The side wall of the rotating disk 5 is connected to the output end of an external driving motor. The side of the cleaning frame 301 is installed on the side wall of the rotating disk 5 through a support rod. The extension frame 2 is slidably arranged on the upper end surface of the cleaning cart 1. A reciprocating cylinder 6 is installed on the upper end surface of the cleaning cart 1, and the telescopic end of the reciprocating cylinder 6 is connected to the side wall of the extension frame 2; During operation, refer to the attached Figure 3As shown, the gas supply nozzle 401 faces the cavity of the reaction chamber, which can increase the contact area between the nitrogen and the residue on the inner wall of the cavity. When the extension frame 2 is located inside the reaction chamber, the rotating disk 5 can be driven to rotate by an external drive motor, and the rotating disk 5 drives the cleaning frame 301 and the gas supply nozzle 401 to rotate, that is, the gas supply nozzle 401 will rotate along the inner wall of the reaction chamber, thereby improving the contact effect between the nitrogen and the inside of the cavity. The extension frame 2 is driven to move by the telescopic end of the reciprocating cylinder 6, so that the extension frame 2 moves inside the reaction chamber, which is convenient for processing the entire inside of the reaction chamber.

[0024] like Figures 2 to 6 As shown, a two-way reciprocating cylinder 7 is installed on the side of the connecting frame 3, and the telescopic ends of the two-way reciprocating cylinder 7 are respectively connected to the ends of the two groups of cleaning racks 301, and the length of the extension frame 2 is smaller than the diameter of the epitaxial furnace reaction chamber; during operation, when the extension frame 2 is located inside the reaction chamber, the telescopic end of the two-way reciprocating cylinder 7 is first controlled to move, so that the two-way reciprocating cylinder 7 drives the cleaning rack 301 to move respectively, and the cleaning rack 301 will move to the side close to the reaction chamber, which is beneficial to the removal of nitrogen and the attachments on the chamber wall, and can also be suitable for epitaxial furnace reaction chambers of different sizes.

[0025] The ends of the two groups of cleaning racks 301 are fixedly installed with a horizontal axis 8, and a support frame 9 is rotatably set on the outer peripheral surface of the horizontal axis 8. A spherical fitting wheel 10 is rotatably set at the end edge of the support frame 9. The spherical fitting wheel 10 is used to contact the wall of the reaction chamber of the epitaxial furnace, and the air supply pipeline 4 is arranged on the outside of the support frame 9; when working, when the two-way reciprocating cylinder 7 drives the cleaning rack 301 to move and contact the wall of the reaction chamber, the spherical fitting wheel 10 will contact the wall of the reaction chamber of the epitaxial furnace after moving, so that when the rotating disk 5 rotates, the spherical fitting wheel 10 can rotate in contact with the wall of the reaction chamber of the epitaxial furnace, thereby facilitating the air supply nozzle 401 to face the reaction chamber wall at a close distance.

[0026] like Figures 3 to 10 As shown, an elastic telescopic rod 11 is installed on the side of the support frame 9, and the side of the elastic telescopic rod 11 away from the support frame 9 is connected to the outer peripheral surface of the horizontal axis 8, and a spring is sleeved on the outer peripheral surface of the elastic telescopic rod 11. A rotating unit is provided on the side of the support frame 9, and the rotating unit is used to drive the air supply pipe 4 to rotate; During operation, when the spherical bonding wheel 10 moves and contacts the wall of the epitaxial furnace reaction chamber, if the wall of the epitaxial furnace reaction chamber is an irregular shape, when the spherical bonding wheel 10 contacts the protrusion of the chamber wall, since the support frame 9 is rotatably arranged on the outer surface of the horizontal axis 8, when the spherical bonding wheel 10 contacts the protrusion of the chamber wall, the support frame 9 will rotate on the outer surface of the horizontal axis 8 with a certain amplitude, so it can be suitable for reaction chambers of different shapes and sizes, and improve the cleaning effect.

[0027] The rotation unit includes a fixed frame plate 12 installed on the side of the support frame 9. The fixed frame plate 12 is installed on the side of the support frame 9 through a bracket. A driving gear 13 is rotatably installed on the side of the fixed frame plate 12. The end of the driving gear 13 is connected to the output end of an external driving motor. A driven tooth ring 121 is installed on the side of the fixed frame plate 12. The driving gear 13 and the driven tooth ring 121 are meshed and connected. The air supply pipeline 4 is installed inside the driven tooth ring 121. During operation, when the spherical fitting wheel 10 contacts the wall of the epitaxial furnace reaction chamber and the rotating disk 5 rotates, at this time, the driving gear 13 is controlled to rotate through an external drive. The driving gear 13 drives the driven tooth ring 121 to rotate. The driven tooth ring 121 will drive the air supply pipeline 4 and multiple air supply nozzles 401 to rotate, so that during the rotation of the air supply nozzles 401, the contact area between each position on the wall of the epitaxial furnace reaction chamber and nitrogen is increased, the gas coverage range is expanded, and it is also beneficial to purge the highly polluted area under high impact force. It should be noted that the rotation speed of the driven tooth ring 121 is greater than that of the rotating disk 5. In this way, while rotating circumferentially on the inner wall of the reaction chamber cavity, the purging effect on the attachments on the chamber wall can be improved, which is convenient for subsequent high-temperature chemical reactions to decompose and strip the pollutants on the inner wall of the chamber and its components, and the cleaning effect is improved.

[0028] A temperature-resistant ring 14 is installed on the side of the driven tooth ring 121. The air supply pipeline 4 passes through the inside of the temperature-resistant ring 14. Each air supply nozzle 401 passes through the inner wall of the temperature-resistant ring 14 and faces the cavity of the epitaxial furnace reaction chamber. Circular grooves adapted to the air supply nozzles 401 are provided on the inner wall of the temperature-resistant ring 14. During operation, the temperature-resistant ring 14 is provided, which is convenient for the driven tooth ring 121 to drive the air supply pipeline 4 and each air supply nozzle 401 to rotate.

[0029] As Figures 5 to 10 shown, a limiting circular frame 15 is installed on the side of the fixed frame plate 12. A limiting ring plate 16 is installed on the side of the driven tooth ring 121 away from the temperature-resistant ring 14. The limiting ring plate 16 is arranged inside the limiting circular frame 15. Guide wheels are provided at the contact positions between the limiting ring plate 16 and the inner wall of the limiting circular frame 15, and multiple groups of guide wheels are provided. During operation, referring to the attached Figure 10 shown, when the driven tooth ring 121 rotates, the driven tooth ring 121 will drive the limiting ring plate 16 to rotate at the same time. The limiting ring plate 16 will rotate inside the limiting circular frame 15. Thus, under the mutual limitation of the limiting ring plate 16 and the limiting circular frame 15, the stability of the driven tooth ring 121 during rotation is improved, and it is convenient to handle the attachments on the reaction chamber wall.

[0030] A cleaning ring 17 is installed on the outer side of the cleaning rack 301, and the shape of the cleaning ring 17 is annular; during operation, when the cleaning rack 301 moves along with the telescopic end of the double-acting reciprocating cylinder 7, the cleaning rack 301 will drive the cleaning ring 17 to move at the same time, so that the cleaning ring 17 contacts the cavity wall. In this way, when nitrogen gas contacts the attachments on the cavity wall, the cleaning ring 17 can sweep away the loosened particulate matter, which facilitates the subsequent high-temperature chemical reaction to decompose these particulate matters.

[0031] It should be noted that all the mechanisms mentioned in the embodiments of the present invention are high-temperature resistant structures, which facilitates the cleaning of the reaction cavity wall.

[0032] During operation, specifically when cleaning the epitaxial furnace reaction cavity, first move the cleaning cart 1 to one side close to the opening of the epitaxial furnace reaction cavity, so that the cleaning rack 301, the gas supply pipeline 4 and the gas supply nozzle 401 are sent into the reaction cavity. Then, the gas supply pipeline 4 and the gas supply nozzle 401 spray nitrogen gas, and the nitrogen gas is used to purge the reaction cavity for 2-4 hours at a flow rate of 25-30 L / min to remove the particulate matter inside the reaction cavity and the pipeline. After that, repeat the nitrogen gas purging step at high temperature, and then introduce hydrogen for baking to decompose and strip the pollutants on the inner wall of the cavity and its components through high-temperature chemical reactions. Finally, blow out the stripped products through nitrogen gas purging. In this way, compared with cleaning with chemical cleaning liquid, it can avoid the problem of epitaxial layer defects in the cavity caused by liquid residue and poor compatibility between the cleaning liquid and the cavity. Refer to the attached Figure 3 As shown, the gas supply nozzle 401 faces the cavity of the reaction cavity, which can increase the contact area between nitrogen gas and the residues on the inner wall of the cavity. Moreover, when the extension rack 2 is located inside the reaction cavity, the rotating disk 5 can be driven to rotate by an external driving motor at this time. The rotating disk 5 drives the cleaning rack 301 and the gas supply nozzle 401 to rotate, that is, the gas supply nozzle 401 rotates along the inner wall of the reaction cavity, thereby improving the contact effect between nitrogen gas and the inside of the cavity. In addition, the extension rack 2 is driven to move by the telescopic end of the reciprocating cylinder 6, so that the extension rack 2 moves inside the reaction cavity, which facilitates the treatment of the entire inside of the reaction cavity; when the extension rack 2 is located inside the reaction cavity, first control the telescopic end of the double-acting reciprocating cylinder 7 to move, so that the double-acting reciprocating cylinder 7 drives the cleaning rack 301 to move respectively, and the cleaning rack 301 will move towards the side close to the reaction cavity, which is conducive to removing the attachments on the cavity wall by nitrogen gas and can also be applied to epitaxial furnace reaction cavities of different sizes. When the two-way reciprocating cylinder 7 drives the cleaning rack 301 to move and contact with the reaction chamber wall, that is, the spherical bonding wheel 10 will contact with the reaction chamber wall of the epitaxial furnace after moving, so that when the rotating disk 5 rotates, the spherical bonding wheel 10 can adhere to the reaction chamber wall of the epitaxial furnace and rotate, so as to facilitate the gas supply nozzle 401 to face the reaction chamber wall at a close distance; when the spherical bonding wheel 10 moves and contacts with the reaction chamber wall of the epitaxial furnace, if the reaction chamber wall of the epitaxial furnace is an irregular shape, when the spherical bonding wheel 10 contacts with the protrusion of the chamber wall, since the support frame 9 is rotatably arranged on the outer surface of the horizontal axis 8, when the spherical bonding wheel 10 contacts with the protrusion of the chamber wall, the support frame 9 will rotate on the outer surface of the horizontal axis 8 with a certain amplitude, so it can be suitable for reaction chambers of different shapes and sizes, and improve the cleaning effect; When the spherical fitting wheel 10 contacts the wall of the epitaxial furnace reaction chamber, and the rotating disk 5 rotates, the driving gear 13 is rotated by the external driving control, and the driving gear 13 drives the driven gear ring 121 to rotate, and the driven gear ring 121 drives the gas supply pipe 4 and the multiple groups of gas supply nozzles 401 to rotate, so that the gas supply nozzles 401 increase the contact area of each part of the epitaxial furnace reaction chamber wall with nitrogen during the rotation process, expand the gas coverage range, and are also conducive to purging high-pollution areas under high impact; When the driven gear ring 121 rotates, the driven gear ring 121 will simultaneously drive the limiting ring plate 16 to rotate, and the limiting ring plate 16 will rotate inside the limiting circular frame 15, so that under the mutual limitation of the limiting ring plate 16 and the limiting circular frame 15, the stability of the driven gear ring 121 during the rotation process is improved, and it is convenient to deal with the attachments on the reaction chamber wall; when the cleaning rack 301 moves following the telescopic end of the two-way reciprocating cylinder 17, the cleaning rack 301 will simultaneously drive the cleaning ring 17 to move, so that the cleaning ring 17 contacts with the chamber wall, so that when the nitrogen contacts the attachments on the chamber wall, the cleaning ring 17 can sweep away the loose particles, thereby facilitating the subsequent high-temperature chemical reaction to decompose these particles.

[0033] The above shows and describes the basic principles, main features and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. An automatic cleaning device for an epitaxial furnace reaction chamber, characterized in that: It includes a cleaning trolley, above which there is an extension frame. A connecting frame is installed on the side wall of the extension frame. A cleaning frame is installed on the side of the connecting frame away from the extension frame. The cleaning frame can move up and down along the inner wall of the reaction chamber of the epitaxial furnace. There are two groups of cleaning frames, which are symmetrically arranged up and down relative to the connecting frame. An air supply pipeline is arranged at the end of the cleaning frame, and a plurality of air supply nozzles are installed at the end of the air supply pipeline. The air outlet end of the air supply nozzle faces the side of the wall of the reaction chamber of the epitaxial furnace.

2. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 1, wherein: A rotating disc is installed on the side wall of the extension frame. The side wall of the rotating disc is connected to the output end of an external driving motor. The side of the cleaning frame is installed on the side wall of the rotating disc through a support rod. The extension frame is slidably arranged on the upper end surface of the cleaning trolley. A reciprocating cylinder is installed on the upper end surface of the cleaning trolley, and the telescopic end of the reciprocating cylinder is connected to the side wall of the extension frame.

3. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 2, characterized in that: A double-acting reciprocating cylinder I is installed on the side of the connecting frame. The telescopic ends of the double-acting reciprocating cylinder I are respectively connected to the ends of the two groups of cleaning frames. The length of the extension frame is less than the diameter of the reaction chamber of the epitaxial furnace.

4. An automatic cleaning device for an epitaxial furnace reaction chamber according to claim 2, characterized in that: Cross shafts are fixedly installed at the ends of the two groups of cleaning frames. A support frame is rotatably arranged on the outer peripheral surface of the cross shaft. A spherical fitting wheel is rotatably arranged at the edge of the end of the support frame. The spherical fitting wheel is used to contact the wall of the reaction chamber of the epitaxial furnace. The air supply pipeline is arranged outside the support frame.

5. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 4, characterized in that: An elastic telescopic rod is installed on the side of the support frame. The side of the elastic telescopic rod away from the support frame is connected to the outer peripheral surface of the cross shaft. A spring is sleeved on the outer peripheral surface of the elastic telescopic rod. A rotating unit is arranged on the side of the support frame, and the rotating unit is used to drive the air supply pipeline to rotate.

6. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 5, wherein: The rotating unit includes a fixed frame plate installed on the side of the support frame. The fixed frame plate is installed on the side of the support frame through a bracket. A driving gear is rotatably installed on the side of the fixed frame plate. The end of the driving gear is connected to the output end of an external driving motor. A driven toothed ring is installed on the side of the fixed frame plate. The driving gear and the driven toothed ring are meshed and connected. The air supply pipeline is installed inside the driven toothed ring.

7. An automatic cleaning device for an epitaxial furnace reaction chamber according to claim 6, characterized in that: A temperature-resistant ring is installed on the side of the driven toothed ring. The air supply pipeline passes through the inside of the temperature-resistant ring. Each air supply nozzle passes through the inner wall of the temperature-resistant ring and faces the cavity of the reaction chamber of the epitaxial furnace. Circular grooves adapted to the air supply nozzles are formed on the inner wall of the temperature-resistant ring.

8. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 7, characterized in that: A limiting circular frame is installed on the side of the fixed frame plate. A limiting ring plate is installed on the side of the driven toothed ring away from the temperature-resistant ring. The limiting ring plate is arranged inside the limiting circular frame.

9. The automatic cleaning device for the reaction chamber of an epitaxial furnace according to claim 3, wherein: A cleaning ring is installed outside the cleaning frame, and the shape of the cleaning ring is annular.

10. An automatic cleaning device for an epitaxial furnace reaction chamber according to claim 8, characterized in that: Guide wheels are arranged at the positions where the limiting ring plate contacts the inner wall of the limiting circular frame, and multiple groups of guide wheels are arranged.

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