Preparation method of quartz glass input window blackening film, glass input window and solar blind ultraviolet image intensifier

Abstract

The invention discloses a preparation method of a black film of a quartz glass input window, the glass input window and a solar-blind ultraviolet image intensifier, the side face, facing a light-emitting face, of the quartz glass input window serves as a substrate material, and the following steps are carried out on the substrate material: 1) manufacturing an aluminum oxide transition layer on the substrate material; 2) manufacturing a titanium oxide film on the aluminum oxide transition layer, and performing annealing treatment to obtain a titanium oxide film layer; and 3) doping sodium ions into the surface of the titanium oxide film layer, and polishing to remove the blackened films on the light incident surface and the light emergent surface of the quartz glass input window. The blackened film is sequentially composed of a transition layer and a titanium oxide film, the blackened film of the structure can be used for quartz glass, a hydrogen treatment method is not needed, sodium ions are doped into the titanium oxide film, the black film is formed, and the effect of reducing stray light is achieved; meanwhile, the imaging effect of the solar blind ultraviolet image intensifier adopting the input window is improved, and stripe light and bright spots are reduced.

Description

Technical Field

[0001] The present application relates to the technical field of glass window manufacturing, and in particular to a method for preparing a blackening film of a quartz glass input window, and a glass input window and a solar-blind ultraviolet image intensifier thereof. Background Art

[0002] Solar-blind ultraviolet image intensifiers primarily identify targets by passively receiving ultraviolet radiation. Compared to infrared detection, ultraviolet detection systems are not only less susceptible to long-wave electromagnetic interference, but can also operate in environments with strong electromagnetic radiation. They are also unresponsive to visible light, offering excellent concealment. Therefore, solar-blind ultraviolet image intensifiers are widely used in a variety of military and civilian fields, including missile early warning and tracking, ultraviolet communications, astronomical observation, and power system inspection. The operating principle of a solar-blind ultraviolet image intensifier is as follows: UV light passes through a quartz glass input window and is converted to electrons by the photocathode. These electrons are multiplied and read out by a fluorescent screen or detector, enabling detection of the UV light.

[0003] Common glass input window shapes can be flat, spherical, stepped, convex, concave, or other shapes. When incident light enters a glass input window of an existing shape, it will be reflected and scattered at the edges of the glass input window, generating harmful non-imaging light (i.e., stray light).

[0004] In order to avoid the reduction of optical instrument resolution, it is necessary to reduce stray light to ensure the observation effect and the use efficiency of optical instruments. The existing technical means is to blacken the edge of the glass window to form a black layer (or matte layer) to eliminate stray light.

[0005] Common materials used for existing glass windows are borosilicate glass, quartz glass, etc. Borosilicate glass contains trace amounts of arsenic trioxide, antimony trioxide, very trace amounts of halogen ions such as chlorine, fluorine or iodine, and a small amount of heavy metal or precious metal element ions; hydrogen treatment produces a blackened film on the surface of the glass window material to absorb stray light.

[0006] However, quartz glass is mainly composed of silicon oxide, so hydrogen treatment cannot be used to prepare blackened films. Therefore, existing glass blackening film technology has requirements for the type and material of glass. In addition, the existing hydrogen treatment method for forming blackened films has a high safety risk because the gas source used is hydrogen, which has the potential for explosion.

[0007] The information disclosed in the background section is only intended to enhance understanding of the overall background of the invention and should not be considered as an admission or any form of suggestion that the information constitutes the prior art already known to a person of ordinary skill in the art. Summary of the invention

[0008] The present application provides a method for preparing a blackening film for a quartz glass input window, its glass input window, and a solar-blind ultraviolet image intensifier. The blackening film is successively composed of a transition layer and a titanium oxide film. The blackening film with this structure can be used for quartz glass without using a hydrogen treatment method. By doping sodium ions into the titanium oxide film, a black film is formed to achieve the effect of reducing stray light, and at the same time, the imaging effect of the solar-blind ultraviolet image intensifier using this input window is improved, and streak light and bright spots are reduced.

[0009] The present application provides a method for preparing a blackening film for a quartz glass input window. Taking the side surface of the quartz glass input window facing the light-emitting surface as the base material, the following steps are carried out on the base material:

[0010] 1) Fabricate an aluminum oxide transition layer on the base material;

[0011] 2) Fabricate a titanium oxide film on the aluminum oxide transition layer and perform annealing treatment to obtain a titanium oxide film layer;

[0012] 3) After doping sodium ions on the surface of the titanium oxide film layer, polish and remove the blackening film on the incident surface and the light-emitting surface of the quartz glass input window;

[0013] The operation of "doping sodium ions" is as follows: Under the condition that the vacuum degree is not less than 2×10 -8 mbar, the temperature is 180°C to 200°C, apply a current of 5100 mA to 5600 mA to sodium chromate salt, and dope sodium ions into the titanium oxide film layer for 10 min to 30 min;

[0014] The thickness of the obtained blackening film is 4 nm to 400 nm.

[0015] Preferably, the fabrication conditions of the aluminum oxide transition layer are as follows: Using trimethylaluminum as the precursor source of Al element, using H2O as the precursor source of O, using nitrogen as the carrier gas, and performing deposition by atomic layer deposition pulse; The deposition operation includes: at least 50 cycles;

[0016] The deposition sequence of each cycle is a trimethylaluminum pulse time of 0.1 s, a purge time of 5 s, then an H2O pulse time of 0.1 s, and a purge time of 5 s.

[0017] Preferably, when fabricating the aluminum oxide transition layer, the temperature of the atomic layer deposition chamber is 190 to 210°C.

[0018] Preferably, the titanium oxide film is prepared under the following conditions: TiCl4 is used as the precursor source of the Ti element, H2O is used as the precursor source of the O element, nitrogen is used as the carrier gas, and atomic layer deposition pulses are used for at least 100 cycles. The deposition sequence of each cycle is: TiCl4 is deposited for a pulse time of 0.1s, followed by a purge for 5s, and then H2O is deposited for a pulse time of 0.1s, followed by a purge for 5s.

[0019] Preferably, when manufacturing the titanium oxide thin film, the temperature of the atomic layer deposition chamber is 220-240°C.

[0020] Preferably, the annealing conditions of the titanium oxide film are: at 410°C and a vacuum degree of 1×10 -7 mba~5×10 - 7 Under the conditions of mba, the titanium oxide film is annealed for 30 minutes to 60 minutes.

[0021] Preferably, a step surface is provided on the periphery of the quartz glass input window; and a blackening film is provided on the surface of the step surface facing the light emitting surface.

[0022] Another aspect of the present application provides a glass input window, comprising: a quartz glass input window, and a blackened film obtained by the above method; the quartz glass input window comprises: a body, a light incident surface, a step surface, and a light emitting surface; the side of the body facing the incidence of photons is the light incident surface; the other side of the body is the light emitting surface; the step surface is arranged on the periphery of the body and is arranged toward the light emitting surface; the blackened film is arranged on the surface of the step surface.

[0023] Preferably, the step surface includes: a boss and a slope; the slope extends obliquely from the periphery of the light-emitting surface toward the inner edge of the boss; the boss is arranged on the periphery of the body; and a blackening film is provided on the surfaces of the boss and the slope.

[0024] Another aspect of the present application provides a solar-blind ultraviolet image intensifier, comprising: the glass input window as described above.

[0025] The beneficial effects of this application include:

[0026] 1) The method for preparing the blackening film of the quartz glass input window provided in this application can realize the provision of a blackening film that meets the use requirements on the quartz glass input window. This method is relatively safe and can be used in the fields of low-light image intensifiers, optical lenses, etc. This preparation method has good promotion value.

[0027] 2) The preparation method of the blackening film for the quartz glass input window provided by this application can set a blackening film with good shielding effect on stray light on the step surface of the quartz glass input window. After setting this film layer, the transmittance of the obtained quartz glass input window to stray light is lower than 3%. And after assembling the solar-blind ultraviolet image intensifier with this input window, the imaging effect is good, which can effectively reduce the bright stripes and bright spots formed by stray light during imaging and improve the imaging effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic cross-sectional structure diagram of the blackening film obtained in Embodiment 1 provided by the present invention;

[0029] Figure 2 It is a schematic cross-sectional structure diagram of the quartz glass input window with a blackening film provided by the present invention on the step surface;

[0030] Figure 3 It is a schematic transmission spectrum diagram of the quartz glass input window without a blackening film in Comparative Example 1 provided by the present invention;

[0031] Figure 4 It is a schematic transmission spectrum diagram of the obtained quartz glass input window in Embodiment 1 provided by the present invention;

[0032] Figure 5 It is an imaging effect diagram of the solar-blind ultraviolet image intensifier assembled with the obtained quartz glass input window in Embodiment 1 provided by the present invention;

[0033] Figure 6 It is an imaging effect diagram of the solar-blind ultraviolet image intensifier assembled with the obtained quartz glass input window in Comparative Example 1 provided by the present invention.

[0034] Legend Explanation:

[0035] Quartz glass input window 1, aluminum oxide transition layer 2, titanium oxide thin film layer 3, light incident surface 4, step surface 5, light exit surface (photoelectric cathode production substrate) 6, light ray with a smaller incident angle 13, light ray with a larger incident angle 14, angle between the incident ray and the normal of the incident surface 15. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0036] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. Usually, the components of the embodiments of the present invention described and illustrated herein can be arranged and designed in various different configurations.

[0037] Accordingly, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts fall within the scope of protection of the present invention.

[0038] Technical means not detailed in this application and not used to solve the technical problems of this application are set according to common general knowledge in the art, and various ways of setting common general knowledge can be implemented.

[0039] See Figures 1 to 6 , the method for preparing the blackening film of the quartz glass input window provided by this application includes the following steps:

[0040] 1) Fabricate an Al2O3 transition layer 2 on the substrate of the quartz glass input window. Trimethylaluminum and H2O are used as the precursor sources of Al and O respectively, and high-purity nitrogen is used as the carrier gas. The deposition sequence of each cycle of the atomic layer deposition pulse of the Al2O3 transition layer film is: trimethylaluminum pulse time 0.1 s, purge time 5 s, then H2O pulse time 0.1 s, purge time 5 s. The total number of cycles is 50, and the temperature of the atomic layer deposition chamber is 200 °C.

[0041] 2) Fabricate a titanium oxide film layer 3: TiCl4 and H2O are used as the precursor sources of Ti and O respectively, and high-purity nitrogen is used as the carrier gas. The deposition sequence of each cycle of the atomic layer deposition pulse of the titanium oxide film is as follows in sequence: TiCl4 pulse time 0.1 s, then purge time 5 s, then H2O pulse time 0.1 s, and then purge time 5 s; The total number of cycles of this sequence is 100 times, and the temperature of the atomic layer deposition chamber is 230 °C.

[0042] 3) Annealing treatment of the titanium oxide film: After the titanium oxide film is prepared, it is annealed at a temperature of 410 °C and a vacuum degree of 1×10 - 7 mba to 5×10 -7 mba for 30 min to 60 min.

[0043] 4) Incorporate sodium ions on the surface of the titanium oxide film layer: Under the conditions of a vacuum degree not less than 2×10 -8 mba and a temperature of 180 °C to 200 °C, apply a current of 5100 mA to 5600 mA to sodium chromate salt to incorporate sodium ions into the titanium oxide film layer 3 for 10 min to 30 min.

[0044] 5) Polish to remove the blackening film on the light incident surface 4 and the light exit surface 6 of the fused silica input window 1. The polishing liquid used is a common chemical-based polishing liquid for silicon wafers. Only the surface of the step surface 5 facing the light exit surface 6 is provided with a blackening film. The thickness of the obtained blackening film is 4 nm to 400 nm.

[0045] By adopting this method, a blackening film can be set on the fused silica input window 1, and the obtained blackening film has good adhesion reliability and meets the use requirements.

[0046] See Figures 1-2 , on the other hand, the present application also provides a fused silica input window. The fused silica input window is a wafer, and the side view cross-sectional view is as Figure 2 shown. A step surface 5 is provided on the periphery of the fused silica input window. The fused silica input window is used for a solar-blind ultraviolet image intensifier (such as Figure 2 shown). A blackening film prepared by the above method is provided on the step surface 5. The thickness of the provided blackening film is 4 nm to 400 nm.

[0047] In this embodiment, a fused silica input window is used as the substrate to fabricate a blackening film. The blackening film includes: an aluminum oxide transition layer 2 and a titanium oxide thin film layer 3 provided on the light exit surface side of the fused silica input window 1; the titanium oxide thin film layer 3 is provided on the outer sidewall of the aluminum oxide transition layer 2.

[0048] In a specific embodiment, a step surface 5 is provided on the periphery of the fused silica input window; a blackening film is provided on the surface of the step surface 5 facing the light exit surface 6.

[0049] In a specific embodiment, the fused silica input window 1 includes: a body, a light incident surface 4, a step surface 5, and a light exit surface 6; the side surface of the body facing the photon incidence is the light incident surface 4; the light exit surface 6 is on the other side surface of the body; the step surface 5 is provided on the periphery of the body and faces the light exit surface 6; the blackening film is provided on the surface of the step surface 5. By providing the blackening film on the step surface 5, a better effect of eliminating stray light can be achieved, and the stray light transmittance of the fused silica input window can be only 3%.

[0050] In a specific embodiment, the step surface 5 includes: a convex platform and an inclined surface; the inclined surface extends obliquely from the periphery of the light exit surface 6 towards the inner edge of the convex platform; the convex platform is provided on the periphery of the body; the blackening film is provided on the surfaces of the convex platform and the inclined surface.

[0051] When there is no blackening film made on the step surface 5 of the quartz glass input window, light within a certain angle range enters the quartz glass input window 1 from the light incident surface 4. The light ray 14 with a larger incident angle (the angle between the incident light ray and the normal line 15 of the incident surface) is reflected by the step surface 5, enters the light exit surface 6 and then enters the photocathode to be detected by the photocathode, forming noise that affects the imaging quality. At this time, the solar-blind ultraviolet image intensifier will be interfered by stray light. The light ray 13 with a smaller incident angle passes through the light exit surface 6 and is detected by the photocathode to form a signal, which will not affect the imaging quality.

[0052] The glass input window provided by this application can avoid the imaging noise formed by the reflection of the light ray 14 with a larger incident angle by the step surface 5 through setting a blackening film on the step surface, and improve the imaging quality.

[0053] On the other hand, this application also provides a solar-blind ultraviolet image intensifier, including: a quartz glass input window with the above-mentioned blackening film layer structure. The specific assembly method is assembled according to the existing method, which will not be elaborated here. In the imaging effect of the obtained solar-blind ultraviolet image intensifier, the bright spots and stripe lights formed by stray light can be completely avoided, and the imaging quality is improved.

[0054] Embodiment

[0055] In the following embodiments, the materials and instruments used are obtained from commercial channels without special instructions; the detection methods used are existing methods without special instructions.

[0056] Embodiment 1

[0057] 1) Fabricate an Al2O3 transition layer 2 on the substrate of the quartz glass input window. Trimethylaluminum and H2O are used as the precursor sources of Al and O respectively, and high-purity nitrogen is used as the carrier gas. The deposition sequence of each cycle of the atomic layer deposition pulse of the Al2O3 transition layer thin film is: trimethylaluminum pulse time 0.1 s, purge time 5 s, then H2O pulse time 0.1 s, purge time 5 s, and the total number of cycles is 50. The temperature of the atomic layer deposition chamber is 200 °C.

[0058] 2) Fabricate a titanium oxide thin film: TiCl4 and H2O are used as the precursor sources of Ti and O respectively, and high-purity nitrogen is used as the carrier gas. The deposition sequence of each cycle of the atomic layer deposition pulse of the titanium oxide thin film is carried out in sequence: TiCl4 pulse time 0.1 s, then purge time 5 s, then H2O pulse time 0.1 s, and then purge time 5 s; this sequence is cycled 100 times in total, and the temperature of the atomic layer deposition chamber is 230 °C.

[0059] 3) Annealing treatment of the titanium oxide thin film: After the titanium oxide thin film is prepared, it is annealed for 50 min at a temperature of 410 °C and a vacuum degree of 3×10 - 7 mba.

[0060] 4) Incorporating sodium ions on the surface of the titanium oxide film layer: Under a vacuum of 2×10 -8 mbar and a temperature of 190 °C, a current of 5500 mA is applied to the sodium chromate salt to incorporate sodium ions into the titanium oxide thin film layer 3 for 20 min.

[0061] 5) Polishing to remove the blackening film on the light incident surface 4 and the light exiting surface 6 of the quartz glass input window 1. The polishing liquid used is a general chemical-based silicon wafer polishing liquid. Only the surface of the step surface 5 facing the light exiting surface 6 is provided with a blackening film. The thickness of the obtained blackening film is 300 nm.

[0062] Comparative Example 1

[0063] The quartz glass input window 1 that has not undergone the operations in Example 1 has the same structure, except that no blackening film is provided on the step surface 5.

[0064] Detection:

[0065] 1. Using a UV-2550 spectrophotometer produced by Shimadzu Corporation, the obtained quartz glass input windows 1 in Example 1 and Comparative Example 1 are respectively tested, and the transmittances of the step surface 5 of the quartz glass input window with and without the blackening film prepared are compared. The obtained results are shown in Figures 3-4 . As can be seen from the figure, the transmittance of the step surface 5 of the quartz glass input window 1 with the blackening film prepared in Example 1 is less than 3% in the wavelength range of 250 nm to 1000 nm (as Figure 4 shown); while the transmittance of the step surface 5 of the quartz glass input window without the blackening film prepared in Comparative Example 1 is above 92% in the wavelength range of 250 nm to 1000 nm (as Figure 3 shown).

[0066] It shows that the above method can prepare a blackening film on the step surface 5 of the quartz glass input window 1 that has a good shielding effect on stray light.

[0067] 2. The obtained quartz glass input window with the blackening film prepared in Example 1 is assembled into a solar-blind ultraviolet image intensifier. The specific assembly method and structure refer to the existing solar-blind ultraviolet image intensifier and will not be elaborated here.

[0068] Test its imaging effect (as Figure 5 shown). The obtained image has no bright imaging stripes formed by stray light, indicating that the glass input window obtained by this method can be used on a solar-blind ultraviolet image intensifier to better reduce the adverse interference of stray light on the imaging effect.

[0069] The obtained quartz glass input window without the blackening film prepared in Comparative Example 1 is assembled into a solar-blind ultraviolet image intensifier, and its imaging effect is tested (as Figure 6as shown in Figure 6 It can be seen that obvious disordered bright stripes, bright spots, etc. appear inside the fluorescent screen.

[0070] Comparing the imaging quality of the solar-blind ultraviolet image intensifier assembled with the input window obtained in Comparative Example 1 and Example 1, the imaging quality of the solar-blind ultraviolet image intensifier with the quartz glass input window having a blackening film obtained in Example 1 is better.

[0071] Example 2

[0072] The difference from Example 1 is that the atomic layer deposition chamber temperature when making the titanium oxide film is 190 °C. The atomic layer deposition chamber temperature for making the titanium oxide film is 220 °C.

[0073] The operation of "doping with sodium ions" is as follows: at a vacuum of not less than 2×10 -8 mbar and a temperature of 200 °C, applying a current of 5100 mA to the sodium chromate salt to dope sodium ions into the titanium oxide film layer for 10 min.

[0074] The annealing treatment conditions for the titanium oxide film are: at 410 °C and a vacuum of 5×10 -7 mbar, annealing the titanium oxide film for 60 min. The thickness of the obtained blackening film is 400 nm.

[0075] Example 3

[0076] The difference from Example 1 is that the atomic layer deposition chamber temperature when making the titanium oxide film is 210 °C. The atomic layer deposition chamber temperature for making the titanium oxide film is 240 °C.

[0077] The operation of "doping with sodium ions" is as follows: at a vacuum of not less than 2×10 -8 mbar and a temperature of 180 °C, applying a current of 5600 mA to the sodium chromate salt to dope sodium ions into the titanium oxide film layer for 30 min.

[0078] The annealing treatment conditions for the titanium oxide film are: at 410 °C and a vacuum of 1×10 -7 mbar, annealing the titanium oxide film for 30 min. The thickness of the obtained blackening film is 4 nm.

[0079] Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A method for preparing a blackening film for a fused silica input window, characterized in that, Taking the side of the quartz glass input window facing the light-emitting surface (6) as the base material, the following steps are carried out on the base material: 1) Fabricate an aluminum oxide transition layer (2) on the base material; 2) Fabricate a titanium oxide thin film on the aluminum oxide transition layer (2) and perform annealing treatment to obtain a titanium oxide thin film layer (3); 3) After doping sodium ions on the surface of the titanium oxide thin film layer (3), polish to remove the blackening thin film on the light-incident surface (4) and the light-emitting surface (6) of the quartz glass input window; The operation of "incorporating sodium ions" is as follows: under the condition that the vacuum degree is not lower than 2×10 -8 mba and the temperature is 180°C to 200°C, apply a current of 5100 mA to 5600 mA to sodium chromate salt to incorporate sodium ions into the titanium oxide thin film layer (3), and the time is 10 min to 30 min; The thickness of the obtained blackening thin film is 4 nm to 400 nm.

2. The preparation method of the blackening film for the fused silica input window according to claim 1, characterized in that, The fabrication conditions of the aluminum oxide transition layer (2) are: using trimethylaluminum as the precursor source of Al element, using H2O as the precursor source of O, using nitrogen as the carrier gas, and depositing by atomic layer deposition pulses; The deposition operation includes: at least 50 cycles; The deposition sequence for each cycle is a trimethylaluminum pulse time of 0.1 s, a purge time of 5 s, then an H2O pulse time of 0.1 s, and a purge time of 5 s.

3. The preparation method of the blackening film for the fused silica input window according to claim 2, wherein, When fabricating the aluminum oxide transition layer (2), the temperature of the atomic layer deposition chamber is 190 - 210 °C.

4. The preparation method of the blackening film for the quartz glass input window according to claim 1, characterized in that, The fabrication conditions of the titanium oxide thin film: using TiCl4 as the precursor source of Ti element, using H2O as the precursor source of O element, using nitrogen as the carrier gas, and performing atomic layer deposition pulses for at least 100 cycles. The deposition sequence for each cycle is: depositing a TiCl4 pulse time of 0.1 s, then purging for 5 s, and then depositing an H2O pulse time of 0.1 s, and purging for 5 s.

5. The preparation method of the blackening film for the fused silica input window according to claim 4, characterized in that, When fabricating the titanium oxide thin film, the temperature of the atomic layer deposition chamber is 220 - 240 °C.

6. The preparation method of the blackening film for the quartz glass input window according to claim 1, characterized in that, The annealing treatment conditions for the titanium oxide film are as follows: at 410 °C and a vacuum degree of 1×10 -7 mba to 5×10 -7 mba, anneal the titanium oxide film for 30 min to 60 min.

7. The preparation method of the blackening film for the quartz glass input window according to claim 1, characterized in that, A stepped surface (5) is provided on the periphery of the quartz glass input window; a blackening film is provided on the surface of the stepped surface (5) facing the light-emitting surface (6) side.

8. A glass input window, characterized in that, Including: A quartz glass input window (1), a blackening film obtained by the method according to any one of claims 1 - 7; The quartz glass input window (1) includes: a body, a light-incident surface (4), a stepped surface (5), a light-emitting surface (6); One side of the body facing the photon incidence is the light-incident surface (4); the other side of the body is the light-emitting surface (6); the stepped surface (5) is provided on the periphery of the body and faces the light-emitting surface (6); the blackening film is provided on the surface of the stepped surface (5).

9. The glass input window according to claim 8, wherein, The stepped surface (5) includes: a convex platform, an inclined surface; the inclined surface extends obliquely from the periphery of the light-emitting surface (6) towards the inner edge of the convex platform; the convex platform is provided on the periphery of the body; the blackening film is provided on the surfaces of the convex platform and the inclined surface.

10. A solar-blind ultraviolet image intensifier, characterized in that, Including: The glass input window according to claim 8 or 9.

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