Particle trapping device suitable for evaporation over-current experiment and use method of particle trapping device
By designing an adjustable particle capture device, the problem that existing devices cannot study overcurrent behavior and measure ion ratio is solved, and accurate measurement of particle overcurrent distribution characteristics and modular maintenance of the device are achieved.
Patent Information
- Application Number
- CN202510328243.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-19
- Publication Date
- 2025-07-29
AI Technical Summary
The existing particle trapping device has a fixed structure, and it is impossible to study the impact of the device geometric configuration on overcurrent behavior, and it is impossible to measure the spatial distribution characteristics and ion ratio of vapor overcurrent.
A particle capture device including a main cage frame, a rectangular hole beam plate, a trap structure space adjustment module, an insulating support plate and a distributed capture sampling module is designed. By adjusting the spatial position and high-pressure loading of the module, the measurement of the particle overcurrent distribution characteristics and ion ratio is realized.
It realizes accurate measurement of particle overcurrent distribution characteristics and ion ratio, supports optimization of evaporation parameters, and the modular design of the device is convenient for maintenance and functional expansion.
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Figure CN120385531A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of metal evaporation test research, and particularly to a particle trapping device suitable for evaporation over-current experiments and a using method thereof. Background Art
[0002] Electron beam physical vapor deposition (EB-PVD) is a technology that uses the energy of an electron beam to evaporate the metal on the surface area of a metal ingot, and the evaporated atoms are deposited on a substrate to form a coating. It has extensive applications in fields such as the preparation of micro-layer composite materials and the coating of high-temperature superconducting film layers. Electron beam metal evaporation is a key process of this technology. The divergence of the metal vapor beam current and the spatial distribution characteristics of metal atoms during the evaporation process have a significant impact on the final product quality and the utilization rate of metal atoms. It is of great significance to clarify the relevant action mechanisms through evaporation over-current experiments for the selection of evaporation parameters and the determination of final process parameters. Therefore, it is necessary to develop a particle trapping device suitable for evaporation over-current experiments. The current particle trapping device has a fixed structure and cannot study the influence of the device geometric configuration on the over-current behavior. At the same time, the original trapping and sampling module does not divide the trapping area, and the spatial distribution characteristics of vapor over-current cannot be obtained. In addition, during the metal evaporation process, the thermoelectron emission effect accompanied by high temperature makes there be a small amount of ions in the particle flow in addition to the main metal atoms. The ion ratio is also an important characteristic of the beam current characteristics in evaporation research, but the original device cannot evaluate this parameter. Summary of the Invention
[0003] The purpose of the present invention is to provide a particle trapping device suitable for evaporation over-current experiments in view of the technical defects existing in the prior art.
[0004] Another purpose of the present invention is to provide a using method of the particle trapping device.
[0005] The technical solution adopted to achieve the purpose of the present invention is as follows:
[0006] A particle trapping device applicable to evaporation overcurrent experiments, comprising a main body cage frame, a rectangular hole beam plate, two trapping structure space adjustment modules, two insulating support plates, two distributed trapping and sampling modules, and an atomic deposition structure mounted on the main body cage frame. The atomic deposition structure and the rectangular hole beam plate are arranged opposite to each other up and down. The atomic deposition structure includes a deposition plate movably installed for depositing evaporated atoms. The rectangular hole beam plate is provided with beam holes. The two trapping structure space adjustment modules are symmetrically arranged left and right. On the opposite surfaces of the two trapping structure space adjustment modules, a distributed trapping and sampling module is installed through an insulating support plate. The trapping structure space adjustment module is used to adjust the height and tilt angle of the two distributed trapping and sampling modules to adjust the spatial position between the two distributed trapping and sampling modules. The distributed trapping and sampling module is used to deposit the main body evaporation particle beam.
[0007] In the above technical solution, the trapping structure space adjustment module includes a support back plate, a first space adjustment mechanism installed on the upper back surface of the support back plate, and a second space adjustment mechanism installed on the lower back surface of the support back plate. The front surface of the support back plate is connected to the distributed trapping and sampling module through an insulating support plate. The first space adjustment mechanism and the second space adjustment mechanism are used to adjust the height of the two distributed trapping and sampling modules and the spatial position between them.
[0008] In the above technical solution, the first space adjustment mechanism includes a first linear drive structure, a limit chute structure, an upper connecting member, and an upper longitudinal rod. Two opposite limit chute structures are provided above the back of the support back plate. The two ends of the upper connecting member are respectively sleeved in the limit chute structures, and a connecting block is fixed at each end. Each connecting block is sleeved on the upper guide sleeve fixed on the frame through the upper longitudinal rod. The first linear drive structure drives the upper connecting member to move linearly along the upper longitudinal rod.
[0009] In the above technical solution, the second space adjustment mechanism includes a second linear drive structure, a lower connecting member, and a lower longitudinal rod. The bottom of the support back plate is hinged to the lower connecting member. The two ends of the lower connecting member are respectively fixed with a lower guide sleeve. Each lower guide sleeve is slidably connected to the lower longitudinal rod fixed on the frame. The second linear drive structure drives the lower connecting member to move linearly along the lower longitudinal rod.
[0010] In the above technical solution, the first linear drive structure and the second linear drive structure are the same, and both include a rotating handwheel, a transmission rod, a gear box, and a lead screw and nut structure. The rotating handwheel is fixedly installed at the end of the transmission rod. Two bevel gears perpendicular to each other and meshing are arranged in the gear box. One of the bevel gears is driven by the transmission rod, and the other bevel gear drives the lead screw in the lead screw and nut structure to rotate. When the nut in the lead screw and nut structure moves linearly along the lead screw, it drives the upper connecting member or the lower connecting member to move linearly.
[0011] In the above technical solution, the four corners of the rectangular hole beam plate are installed on the main cage frame by screws, and the size of the beam holes can be adjusted according to actual requirements to achieve the adjustment of the beam effect.
[0012] In the above technical solution, the distributed capture sampling module includes a backplane pin, a capture backplane, a carrier sheet, and a sampling box. The backplane pin is installed on the back of the capture backplane and is inserted into the insulating support plate. A groove is opened at the top of the capture backplane, and the carrier sheet is suspended in the groove through a hook provided at the top. Multiple rows of rectangular grooves are provided on the front surface of the carrier sheet, and the sampling box is inserted into the rectangular grooves.
[0013] In the above technical solution, a plug-in groove with one end open is opened on the insulating support plate, and edge grooves are opened on the outer sides of the remaining three groove walls of the plug-in groove. The plug-in groove matches the backplane pin for inserting the backplane pin.
[0014] In the above technical solution, the atomic deposition structure includes a heat preservation layer, a lower support frame, and a deposition plate inserted between the heat preservation layer and the lower support frame, and the distance between the heat preservation layer and the lower support frame is adjustable.
[0015] Another aspect of the present invention further includes a method for using the particle capture device suitable for evaporation overcurrent experiments, comprising the following steps:
[0016] Step 1: Install the particle capture device suitable for evaporation overcurrent experiments above the evaporator in the vacuum chamber, rotate 4 rotary handwheels to adjust the height of the lower edge of the capture backplane of the distributed capture sampling modules on the left and right sides, the upper edge spacing and the lower edge spacing between the capture backplanes on the left and right sides, and at the same time adjust the height of the atomic deposition structure to meet the experimental requirements, and weigh the deposition plate of the atomic deposition structure;
[0017] Step 2: Weigh the unused sampling boxes separately, then insert them into the respective rectangular grooves of the carrier sheet of the distributed capture sampling module, clamp the electrode connection wire duckbill clips on the capture backplane, and use a multimeter to measure the continuity to ensure that the sampling boxes are conductive to the high-voltage electrode and insulated from the ground;
[0018] Step 3: After completing the preparation work for the evaporation deposition experiment, close the vacuum chamber and initially load the thermionic high voltage for a withstand voltage test. After passing the test, evacuate until the experimental requirements are met, turn on the thermionic power supply and load the voltage according to the experimental requirements, and evaporate and deposit on the sampling boxes and the deposition plate until the experiment is completed;
[0019] Step 4: After the experiment is completed, evacuate the air, remove the duckbill clip, take out the rectangular hole beam plate, remove the distributed capture sampling module and the sampling box, draw out the deposition plate, weigh the rectangular hole beam plate, each sampling box and the deposition plate respectively, and then perform ICP-MS analysis on the above components to obtain the evaporation particle deposition amount for the analysis of the evaporation overcurrent situation.
[0020] Compared with the prior art, the beneficial effects of the present invention are as follows:
[0021] 1. By using the distributed capture sampling module capable of loading high voltage and the capture structure space adjustment module, and the capture structure space adjustment module can adjust the spatial position between the distributed capture sampling modules, the measurement of the ion ratio and the study of the particle overcurrent distribution characteristics can be realized during the metal evaporation experiment.
[0022] 2. Through the cooperation of two bevel gears and the cooperation of the lead screw and nut structure, each distributed capture sampling module can be adjusted in the position of 0 - 60 mm and the support back plate can be adjusted relative to the vertical plane by 0 - 30°, which is convenient for studying the influence of the configuration of two symmetric distributed capture sampling modules on the overcurrent behavior; the array sampling box design meets the measurement requirements of the overcurrent spatial distribution characteristics within a single-sided area; the insulating support plate and the conductor distributed capture sampling module enable the device to have the function of loading high voltage and measuring the evaporation ion ratio.
[0023] 3. The main body cage frame of the present invention adopts a cage structure, and the split modular design makes each component relatively independent, which is convenient for maintenance and installation, and provides sufficient space for subsequent function expansion and performance improvement. Description of the Drawings
[0024] Figure 1 It is the overall structure diagram of Embodiment 1 of the present invention.
[0025] Figure 2 It is the front view of the whole of Embodiment 1 of the present invention.
[0026] Figure 3 It is the partial structure schematic diagram of Embodiment 1 of the present invention.
[0027] Figure 4 It is the structure diagram of the capture structure space adjustment module.
[0028] Figure 5 It is the exploded view of the distributed capture sampling module.
[0029] Figure 6 It is the structure diagram of the insulating support plate.
[0030] Among them, 1: rectangular hole beam plate, 2: capture structure space adjustment module, 3: insulating support plate, 4: distributed capture sampling module, 5: atomic deposition structure, 6: crossbeam chassis, 7: support backplane, 8: upper longitudinal rod, 9: upper connecting piece, 10: limit chute structure, 11: connecting block, 12: upper guide sleeve, 13: lower connecting piece, 14: lower longitudinal rod, 15: lower guide sleeve, 16: rotary handwheel, 17: transmission rod, 18: lead screw and nut structure, 19: gear box, 20: backplane bolt, 21: capture backplane, 22: carrier slice, 23: sampling box, 24: beam hole, 25: insertion groove, 26: edge groove. Detailed implementation mode
[0031] The present invention will be further described in detail below with reference to specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.
[0032] Embodiment 1
[0033] As Figures 1-6 shown, a particle capture device suitable for evaporation overcurrent experiments includes a main body cage frame and a rectangular hole beam plate 1, two capture structure space adjustment modules 2, two insulating support plates 3, two distributed capture sampling modules 4 and an atomic deposition structure 5 installed on the main body cage frame. The atomic deposition structure 5 and the rectangular hole beam plate 1 are arranged opposite to each other up and down. The rectangular hole beam plate 1 is used to limit the divergence degree of the evaporation particle beam. The two capture structure space adjustment modules 2 are symmetrically arranged left and right. On the opposite surfaces of the two capture structure space adjustment modules 2, a distributed capture sampling module 4 is installed through an insulating support plate 3. The capture structure space adjustment module 2 is used to adjust the height and tilt angle of the distributed capture sampling module 4, so as to adjust the spatial position between the two distributed capture sampling modules 4. The distributed capture sampling module 4 is used to deposit the main body evaporation particle beam.
[0034] Specifically, a beam hole 24 is opened in the middle of the rectangular hole beam plate 1, which is made of stainless steel. The four corners of the rectangular hole beam plate 1 are installed on the main body cage frame by screws. The size of the beam hole 24 can be adjusted according to actual requirements to achieve the adjustment of the beam effect.
[0035] Specifically, as Figure 4As shown in the figure, the capture structure space adjustment module 2 includes a support backplane 7, a first space adjustment mechanism installed on the upper back of the support backplane 7, and a second space adjustment mechanism installed on the lower back of the support backplane 7. The front of the support backplane 7 is connected to the distributed capture sampling module 4 through an insulating support plate 3. The first space adjustment mechanism includes a first linear drive structure, a limit chute structure 10, an upper connecting member 9, and an upper longitudinal rod 8. Two opposite limit chute structures 10 are provided above the back of the support backplane 7. The two ends of the upper connecting member 9 are respectively sleeved in the limit chute structures 10, and a connecting block 11 is fixed at each end. Each connecting block 11 is sleeved in an upper guide sleeve 12 fixed on the frame through an upper longitudinal rod 8. The first linear drive structure drives the upper connecting member 9 to move linearly along the upper longitudinal rod 8. The second space adjustment mechanism includes a second linear drive structure, a lower connecting member 13, and a lower longitudinal rod 14. The bottom of the support backplane 7 is hinged to the lower connecting member 13. Two lower guide sleeves 15 are respectively fixed at the two ends of the lower connecting member 13. Each lower guide sleeve 15 is slidably connected to a lower longitudinal rod 14 fixed on the frame (preferably, the lower longitudinal rod 14 is marked with scales with a resolution of 0.5 mm and a range of 20 cm). The second linear drive structure drives the lower connecting member 13 to move linearly along the lower longitudinal rod 14. Through the movement of the first adjustment mechanism and the second space adjustment mechanism of the two capture structure space adjustment modules 2, the height and pitch angle of the support backplane 7 of the two symmetrically arranged capture structure space adjustment modules 2 are adjusted, and the angle adjustment range is 0 - 30°.
[0036] The first linear drive structure and the second linear drive structure are the same, and both include a rotating handwheel 16, a transmission rod 17, a gear box 19, and a lead screw and nut structure 18. The rotating handwheel 16 is fixedly installed at the end of the transmission rod 17. Two bevel gears that are perpendicular to each other and meshed are provided in the gear box 19. One of the bevel gears is driven by the transmission rod 17, and the other bevel gear drives the lead screw in the lead screw and nut structure 18 to rotate. When the nut in the lead screw and nut structure 18 moves linearly along the lead screw, it drives the upper connecting member 9 or the lower connecting member 13 to move linearly.
[0037] Specifically, as Figure 5As shown, the distributed capture and sampling module 4 includes a backplane pin 20, a capture backplane 21, a carrier sheet 22, and a sampling box 23. The backplane pin 20 is installed on the back of the capture backplane 21 and is plugged into the insulating support plate 3. A groove is provided at the top of the capture backplane 21, and the carrier sheet 22 is suspended in the groove by a hook provided at the top. A plurality of rows of rectangular grooves (12 rectangular grooves in 3 rows and 4 columns in this embodiment) are provided on the front of the carrier sheet 22, and the sampling box 23 is plugged into the rectangular grooves. Further, the rectangular grooves can also be other mounting structures for detachably mounting the sampling box 23. An electrode connection alligator clip is clamped on the capture backplane 21 of the distributed capture and sampling module 4 for high-voltage loading, and ions generated during the evaporation process are attracted by the electric field effect to be deposited. By changing the voltage loading condition, the measurement of the ion ratio can be realized.
[0038] Embodiment 2
[0039] On the basis of Embodiment 1, further, as Figure 6 shown, a plugging groove 25 with one end open is provided on the insulating support plate 3. Edge grooves 26 are provided on the outer sides of the other three groove walls of the plugging groove 25. The cross-section of the edge groove 26 is a 1 mm × 2 mm rectangle to increase the creepage distance, and a withstand voltage insulation of not less than 6 kV can be achieved. The plugging groove 25 matches the backplane pin 20 for plugging the backplane pin 20.
[0040] Further, two crossbeam bottom frames 6 are provided at the bottom of the main body cage frame, and the entire particle capture device is installed above the evaporator in the vacuum chamber through the crossbeam bottom frames 6.
[0041] Further, the height of the atomic deposition structure 5 is adjustable. The atomic deposition structure 5 includes a heat insulation layer, a lower support frame, and a deposition plate plugged between the heat insulation layer and the lower support frame. The distance between the heat insulation layer and the lower support frame is adjustable, so that the deposition plate can be taken out, replaced, and the relative height of the deposition plate can be adjusted before and after the experiment by pulling. And the deposition plate is parallel to the evaporation liquid surface. The function of the heat insulation layer is to prevent the temperature of the deposition plate from changing rapidly during the evaporation start and stop stages, avoid thermal stress damage to the deposition plate and peeling of the deposited metal film. The deposition plate is used for particle deposition.
[0042] Embodiment 3
[0043] This embodiment provides a method for using the particle capture device applicable to the evaporation overcurrent experiment described in Embodiment 1 and Embodiment 2, including the following steps:
[0044] Step 1: Install the particle trapping device applicable to the evaporation overcurrent experiment above the evaporator in the vacuum chamber. Rotate the 4 rotary handwheels 16 to adjust the height of the lower edge of the trapping backplane 21 of the distributed trapping and sampling module 4 on the left and right sides, the upper edge spacing and the lower edge spacing between the trapping backplanes 21 on the left and right sides. At the same time, adjust the height of the atomic deposition structure 5 to meet the experimental requirements, and weigh the deposition plate of the atomic deposition structure 5.
[0045] Step 2: Weigh the unused sampling boxes 23 separately, and then insert them into the respective rectangular grooves of the specimen carriers 22 of the distributed trapping and sampling module 4. Clamp the electrode connection wire alligator clips on the trapping backplane 21, and use a multimeter to measure the continuity to ensure that the sampling boxes 23 are conductive to the high-voltage electrode and insulated from the ground.
[0046] Step 3: After completing the preparation work for the evaporation deposition experiment, close the vacuum chamber, initially load the thermionic high voltage for the withstand voltage test. After passing the test, evacuate until the experimental requirements are met. According to the experimental requirements, turn on the thermionic power supply and apply voltage for evaporation deposition on the sampling boxes 23 and the deposition plate until the experiment is completed.
[0047] Step 4: After the experiment is completed, expose to air, remove the alligator clips, take out the rectangular hole beam plate 1, remove the distributed trapping and sampling module 4 and the sampling boxes 23, take out the deposition plate, weigh the rectangular hole beam plate 1, each sampling box 23 and the deposition plate respectively, and then perform ICP-MS analysis on the above components to obtain the evaporation particle deposition amount for the analysis of the evaporation overcurrent situation.
[0048] The above is only the preferred embodiment of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and refinements can be made, and these improvements and refinements should also be regarded as the protection scope of the present invention.
Claims
1. A particle trapping device applicable to an evaporation overcurrent experiment, characterized in that It includes a main body cage frame, a rectangular hole beam plate, an atomic deposition structure, two trapping structure space adjustment modules, two insulating support plates, and two distributed trapping and sampling modules mounted on the main body cage frame. The atomic deposition structure and the rectangular hole beam plate are arranged opposite to each other vertically. The atomic deposition structure includes a movably mounted deposition plate. The rectangular hole beam plate is provided with beam holes. The two trapping structure space adjustment modules are symmetrically arranged left and right. On the opposite surfaces of the two trapping structure space adjustment modules, a distributed trapping and sampling module is installed through an insulating support plate. The trapping structure space adjustment module is used to adjust the height and tilt angle of the two distributed trapping and sampling modules to adjust the spatial position between the two distributed trapping and sampling modules. The distributed trapping and sampling module is used to deposit the main body evaporation particle beam.
2. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The trapping structure space adjustment module includes a support back plate, a first space adjustment mechanism mounted on the upper back surface of the support back plate, and a second space adjustment mechanism mounted on the lower back surface of the support back plate. The front surface of the support back plate is connected to the distributed trapping and sampling module through an insulating support plate.
3. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The first space adjustment mechanism includes a first linear drive structure, a limit chute structure, an upper connecting member, and an upper longitudinal rod. Two opposite limit chute structures are provided above the back of the support back plate. The two ends of the upper connecting member are respectively sleeved in the limit chute structures, and a connecting block is fixed at each end. Each connecting block is sleeved on the upper guide sleeve fixed on the frame through the upper longitudinal rod. The first linear drive structure drives the upper connecting member to move linearly along the upper longitudinal rod.
4. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The second space adjustment mechanism includes a second linear drive structure, a lower connecting member, and a lower longitudinal rod. The bottom of the support back plate is hinged to the lower connecting member. The two ends of the lower connecting member are respectively fixed with a lower guide sleeve. Each lower guide sleeve is slidably connected to the lower longitudinal rod fixed on the frame. The second linear drive structure drives the lower connecting member to move linearly along the lower longitudinal rod.
5. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The first linear drive structure and the second linear drive structure are the same, and both include a rotary handwheel, a transmission rod, a gear box, and a lead screw and nut structure. The rotary handwheel is fixedly installed at the end of the transmission rod. In the gear box, there are two bevel gears that are perpendicular to each other and meshed. One of the bevel gears is driven by the transmission rod, and the other bevel gear drives the lead screw in the lead screw and nut structure to rotate. When the nut in the lead screw and nut structure moves linearly along the lead screw, it drives the upper connecting member or the lower connecting member to move linearly.
6. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The four corners of the rectangular hole beam plate are installed on the main body cage frame through screws. The size of the beam holes can be adjusted according to actual requirements to achieve the adjustment of the beam effect.
7. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, The distributed trapping and sampling module includes a back plate pin, a trapping back plate, a carrier sheet, and a sampling box. The back plate pin is installed on the back of the trapping back plate and is inserted into the insulating support plate. A groove is opened at the top end of the trapping back plate. The carrier sheet is suspended in the groove through a hook provided at the top. Multiple rows of rectangular grooves are provided on the front surface of the carrier sheet. The sampling box is inserted into the rectangular grooves.
8. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, characterized in that, An insertion groove with one end open is formed on the insulating support plate, and edge grooves are formed on the outer sides of the other three groove walls of the insertion groove. The insertion groove is matched with the backplane pin for inserting the backplane pin.
9. The particle trapping device applicable to the evaporation overcurrent experiment according to claim 1, wherein The atomic deposition structure includes a heat preservation layer, a lower support frame, and a deposition plate inserted between the heat preservation layer and the lower support frame, and the distance between the heat preservation layer and the lower support frame is adjustable.
10. The method for using the particle trapping device applicable to the evaporation overcurrent experiment according to any one of claims 1 to 9, characterized in that, It includes the following steps: Step 1: Install the particle trapping device suitable for the evaporation overcurrent experiment above the evaporator in the vacuum chamber. Rotate the rotary handwheel to adjust the height of the lower edge of the trapping backplane of the distributed trapping and sampling modules on the left and right sides, the upper edge spacing and the lower edge spacing between the trapping backplanes on the left and right sides. At the same time, adjust the height of the atomic deposition structure to meet the experimental requirements, and weigh the deposition plate of the atomic deposition structure. Step 2: After weighing the unused sampling boxes separately, insert them into the respective rectangular grooves of the carriers of the distributed trapping and sampling modules. Clamp the electrode connection wire duckbill clips on the trapping backplane, and use a multimeter to measure the continuity to ensure that the sampling boxes are conductive to the high-voltage electrode and insulated from the ground. Step 3: After completing the preparation work for the evaporation deposition experiment, close the vacuum chamber, initially load the hot ion high voltage for the withstand voltage test. After passing the test, evacuate until the experimental requirements are met. According to the experimental requirements, turn on the hot ion power supply and apply voltage for evaporation deposition on the sampling boxes and the deposition plate until the experiment is completed. Step 4: After the experiment is completed, expose to the air, remove the duckbill clips, take out the rectangular hole beam current plate, remove the distributed trapping and sampling module and the sampling boxes, take out the deposition plate, weigh the rectangular hole beam current plate, each sampling box and the deposition plate respectively, and then perform ICP-MS analysis on the above components to obtain the evaporation particle deposition amount for the analysis of the evaporation overcurrent situation.