Method for prolonging service life of lens of photoetching machine

Abstract

The invention relates to the technical field of photoetching machines, in particular to a method for prolonging the service life of a lens of a photoetching machine. Comprising the following steps: S1, preparation work: pouring tetrachloroethylene into a cleaning tank, and heating; s2, cleaning process: soaking the projection lens of the photoetching machine to be cleaned in tetrachloroethylene; s3, flushing: after cleaning is completed, taking out the lens, and flushing the lens with a solvent; s4, drying: drying by using inert gas, or naturally airing in a well ventilated place; s5, safe operation: personal protection equipment is worn during operation; s6, waste treatment, wherein used tetrachloroethylene is subjected to waste collection treatment, and pollution to the environment is avoided; s7, emergency measures are taken, wherein the emergency measures are taken immediately when tetrachloroethylene leakage or personnel poisoning occurs. According to the method, the lens of the photoetching machine can be cleaned, the service life of the photoetching machine is prolonged, the cost is greatly reduced, and the downtime of equipment is shortened. The method is mainly applied to cleaning of the lens of the photoetching machine.

Description

Technical Field

[0001] The present invention relates to the technical field of lithography machines, and more specifically, to a method for extending the lifespan of a lithography machine lens. Background Art

[0002] In the field of semiconductor manufacturing, a lithography exposure machine is one of the core devices for integrated circuit manufacturing, and its performance directly affects the process accuracy and production efficiency of chips. However, the service life of the exposure machine is often restricted by key optical components, especially the degradation problem of the projection lens. This phenomenon is particularly prominent in deep ultraviolet (DUV) lithography systems because the 248nm short-wavelength photons output by the DUV light source have a high energy density, which will interact with optical materials in a complex way and cause damage to the optical lens itself or the coating surface.

[0003] After degradation, currently, only the projection lens can be replaced. However, for an exposure machine, the cost of replacing the projection lens is almost equivalent to purchasing a new device.

[0004] Therefore, if the projection lens can be restored by cleaning without replacement, it will be able to significantly reduce costs and shorten the equipment downtime. Summary of the Invention

[0005] To overcome the deficiencies in the above-mentioned prior art, the present invention provides a method for extending the lifespan of a lithography machine lens. This method can clean the lithography machine lens, improve the lifespan of the lithography machine, significantly reduce costs and shorten the equipment downtime.

[0006] To solve the above technical problems, the technical solution adopted by the present invention is as follows: A method for extending the lifespan of a lithography machine lens, comprising the following steps: S1. Preparation: Pour tetrachloroethylene into a cleaning tank, heat it, and turn on the ventilation equipment to ensure good ventilation and avoid harm to the human body; S2. Cleaning process: Completely immerse the lithography machine projection lens to be cleaned in tetrachloroethylene; S3. Rinsing: After cleaning, take out the lens and rinse the lens with a solvent to remove the residual tetrachloroethylene and impurities; S4. Drying: Dry it with an inert gas or let it air dry naturally in a well-ventilated place; S5. Safe operation: Tetrachloroethylene has high volatility and toxicity. Wear personal protective equipment, such as protective gloves, goggles, and protective clothing, during operation; S6. Waste treatment: Collect and dispose of the used tetrachloroethylene to avoid environmental pollution; S7. First Aid Measures: In case of a leakage of tetrachloroethylene or poisoning of personnel, immediately take emergency measures, including flushing the contaminated skin or eyes with water and seeking medical assistance in a timely manner.

[0007] In step S1 described above, the tetrachloroethylene in the cleaning tank is heated to 50°C - 60°C.

[0008] In step S2 described above, during the cleaning process, according to the nature of the lens and the cleaning requirements, mechanical stirring or ultrasonic cleaning methods are adopted.

[0009] In step S3 described above, the rinsing solvent is anhydrous ethanol.

[0010] In step S4 described above, the inert gas used for drying is nitrogen.

[0011] In step S5 described above, during the cleaning process, direct contact with the skin and breathing of the gas should be avoided, and keep away from the environment where fire sources and static electricity are generated.

[0012] In step S6 described above, during the process of waste collection and treatment of tetrachloroethylene, avoid discharging tetrachloroethylene into water bodies or the air.

[0013] In step S6 described above, the waste disposal of tetrachloroethylene is carried out by incineration, and ensure that hydrogen halide is removed through an acid scrubber.

[0014] In step S3 described above, the cleaning should also be carried out in a dust-free environment to avoid introducing new pollutants.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows: High-efficiency Cleaning and Life Extension: Using tetrachloroethylene as a cleaning agent, its strong solubility and high-efficiency removal ability of oil-based dirt can thoroughly remove organic pollutants on the surface of the projection lens of the lithography machine, avoid the decline of imaging quality or lens damage caused by dirt accumulation, and significantly extend the service life of the lens; through the preferred methods of mechanical stirring or ultrasonic cleaning, the cleaning process can be flexibly adjusted according to the lens material and pollution degree, improving the cleaning efficiency while reducing the risk of mechanical damage; adopting rinsing with anhydrous ethanol combined with drying with inert gas or treatment in a dust-free environment can effectively remove solvent residues and prevent secondary pollution, ensuring that the cleanliness of the lens surface meets the high standards required by the lithography process. This method can clean the lens of the lithography machine, improve the service life of the lithography machine, greatly reduce costs and shorten the equipment downtime. Description of the Drawings

[0016] Figure 1 It is a schematic flow diagram of the present invention. Detailed Embodiments

[0017] To more clearly understand the above objects, features, and advantages of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be noted that, without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other.

[0018] In the following description, many specific details are set forth in order to fully understand the present invention. However, the present invention can also be implemented in other ways different from those described herein. Therefore, the protection scope of the present invention is not limited by the specific embodiments disclosed below.

[0019] As Figure 1 shown, a method for extending the life of a lithography machine lens includes the following steps: S1. Preparation: Pour tetrachloroethylene into the cleaning tank, heat it, and turn on the ventilation equipment to ensure good ventilation and avoid harm to the human body; it should be noted that tetrachloroethylene has potential hazards to human health, including inhibitory effects on the central nervous system, which may cause symptoms such as headache, nausea, and vomiting.

[0020] S2. Cleaning process: Completely immerse the projection lens of the lithography machine to be cleaned in tetrachloroethylene; S3. Rinsing: After cleaning, take out the lens and rinse the lens with a solvent to remove the residual tetrachloroethylene and impurities; S4. Drying: Dry it with an inert gas or let it air dry naturally in a well-ventilated place; S5. Safe operation: Tetrachloroethylene has high volatility and toxicity. Wear personal protective equipment, such as protective gloves, goggles, and protective clothing, during operation; S6. Waste treatment: Collect and dispose of the used tetrachloroethylene to avoid environmental pollution; S7. First aid measures: In case of tetrachloroethylene leakage or personnel poisoning, immediately take emergency measures, including rinsing the contaminated skin or eyes with water and seeking medical assistance in a timely manner.

[0021] Preferably, in step S1, the tetrachloroethylene in the cleaning tank is heated to 50°C - 60°C.

[0022] Preferably, in step S2, during the cleaning process, according to the nature of the lens and the cleaning requirements, mechanical stirring or ultrasonic cleaning is adopted.

[0023] Preferably, in step S3, the rinsing solvent is anhydrous ethanol.

[0024] Preferably, in step S4, the inert gas used for drying is nitrogen.

[0025] Preferably, in step S5, during the cleaning process, direct contact with the skin and inhalation of gases should be avoided, and the environment should be kept away from fire sources and static electricity generation.

[0026] Preferably, in step S6, during the process of waste collection and treatment of tetrachloroethylene, the discharge of tetrachloroethylene into water bodies or the air should be avoided.

[0027] Preferably, in step S6, the waste disposal of tetrachloroethylene is carried out by incineration, and it is ensured that hydrogen halide is removed through an acid scrubber.

[0028] Preferably, in step S3, the cleaning should also be carried out in a dust-free environment to avoid introducing new pollutants.

[0029] The specific gravity of tetrachloroethylene is 1.627. It is an organic solvent with strong dissolving ability and is the best solvent for removing stains among dry-cleaning solvents. It is mainly used as a dry-cleaning agent and a metal degreasing solvent in industry. Due to its high solubility in oil-based dirt, tetrachloroethylene can efficiently clean various items.

[0030] The use of tetrachloroethylene requires strict compliance with safety operating procedures because it has certain toxicity and volatility and may affect human health and the environment. Therefore, when considering using tetrachloroethylene to clean the projection lens of a lithography machine, the following points should be noted: 1. Ensure good ventilation conditions to reduce the risk of inhaling tetrachloroethylene vapor; 2. Take appropriate personal protective measures, such as wearing protective clothing, gloves, and goggles; 3. The used tetrachloroethylene should be properly treated to avoid environmental pollution; 4. The items after cleaning should be thoroughly rinsed to remove residual tetrachloroethylene.

[0031] Only the preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those of ordinary skill in the art, various changes can be made without departing from the spirit of the present invention, and all such changes should be included within the protection scope of the present invention.

Claims

1. A method for extending the life of a lithography machine lens, characterized in that It includes the following steps: S1. Preparation: Pour tetrachloroethylene into the cleaning tank, heat it, and turn on the ventilation equipment to ensure good ventilation and avoid harm to the human body; S2. Cleaning process: Completely immerse the projection lens of the lithography machine to be cleaned in tetrachloroethylene; S3. Rinsing: After cleaning, take out the lens and rinse the lens with a solvent to remove the residual tetrachloroethylene and impurities; S4. Drying: Dry it with an inert gas or let it air dry naturally in a well-ventilated place; S5. Safe operation: Tetrachloroethylene has high volatility and toxicity. Wear personal protective equipment during operation, including protective gloves, goggles and protective clothing; S6. Waste treatment: Collect and treat the used tetrachloroethylene to avoid environmental pollution; S7. First aid measures: In case of tetrachloroethylene leakage or personnel poisoning, immediately take emergency measures, including rinsing the contaminated skin or eyes with water and seeking medical assistance in time.

2. The method for extending the lifespan of a lithography machine lens according to claim 1, wherein: In step S1, the tetrachloroethylene in the cleaning tank is heated to 50°C - 60°C.

3. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S2, during the cleaning process, mechanical stirring or ultrasonic cleaning is adopted according to the nature of the lens and the cleaning requirements.

4. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S3, the rinsing solvent is anhydrous ethanol.

5. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S4, the inert gas used for drying is nitrogen.

6. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S5, during the cleaning process, avoid direct contact with the skin and breathing of the gas, and keep away from the environment where fire and static electricity are generated.

7. A method for extending the lifespan of a lithography machine lens as described in claim 1, characterized in that: In step S6, during the process of waste collection and treatment of tetrachloroethylene, avoid discharging tetrachloroethylene into water bodies or the air.

8. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S6, the waste disposal of tetrachloroethylene is carried out by incineration method, and ensure that hydrogen halide is removed through an acid scrubber.

9. A method for extending the lifespan of a lithography machine lens according to claim 1, characterized in that: In step S3, the cleaning should also be carried out in a dust-free environment to avoid introducing new pollutants.

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