A laser galvanometer fly-cutting system profile error compensation method, system, device and medium

Abstract

The application provides a laser galvanometer fly machining system profile error compensation method, system, device and medium, belongs to the laser galvanometer fly machining technical field, determines the actual output track under the target track, analyzes the profile error, and judges whether the profile error is within the maximum compensation range of the micro platform, if not within the range, iterative compensation is carried out by adjusting the control input of the macro platform, the profile error is adjusted, until the profile error is reduced to the maximum compensation range of the micro platform, when the profile error meets the maximum compensation range condition of the micro platform, the error amount generated by the macro platform is introduced into the motion instruction of the micro platform, and the offline compensation is completed by the micro platform, whether the actual position after compensation reaches the preset position requirement is verified, if not up to standard, the compensation process is repeatedly executed, until the compensation accuracy meets the requirement, and the demand of machining on precision is met.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of laser galvanometer fly machining, and particularly relates to a laser galvanometer fly machining system profile error compensation method, system, device and medium. BACKGROUND

[0002] The laser galvanometer fly machining system is composed of a numerical control machine tool (macro platform) and a laser galvanometer (micro platform), and through macro-micro collaborative motion, the advantages of flexible numerical control machine tool, large working space and high-speed and high-response laser galvanometer can be fully exerted, and high-speed, high acceleration and high-precision laser machining of complex profiles can be realized.

[0003] However, in the related art, the laser galvanometer fly machining system often adopts a simple point-to-point error calculation method, ignores the influence of motion geometric characteristics on profile error, and cannot accurately reflect the error conditions of curves and complex profiles in actual machining. For example, when machining a circular arc or the like, only the straight line distance error between points is calculated, and key error factors such as curve curvature deviation are missed, resulting in lack of accurate quantitative basis for subsequent compensation and poor compensation effect.

[0004] During machining, unexpected error disturbances may be generated due to mechanical vibration, part loosening and other sudden factors, but the prior art often lacks real-time monitoring and correction capability. There is also a lack of effective feedback optimization mechanism, which cannot adjust the compensation in a targeted manner, resulting in difficulty in improving machining precision. SUMMARY

[0005] The application provides a laser galvanometer fly machining system profile error compensation method, which improves the precision, efficiency, reliability and adaptability of the machining system, and can meet the requirements of complex and precise machining in the manufacturing field.

[0006] The method comprises the following steps:

[0007] S101: determining a target trajectory of the macro platform according to a machining task, and predicting an actual output trajectory of the macro platform under the target trajectory based on a system dynamics model;

[0008] S102: analyzing profile error between the actual output trajectory of the macro platform and the target trajectory, and determining whether the profile error is within the maximum compensation range of the micro platform;

[0009] S103: if the profile error is not within the range, iteratively compensating by adjusting the control input of the macro platform to adjust the profile error until the profile error is reduced to within the maximum compensation range of the micro platform;

[0010] S104: after the profile error meets the maximum compensation range condition of the micro platform, introducing the error amount generated by the macro platform into the motion instruction of the micro platform, and completing offline compensation by the micro platform;

[0011] S105: verifying whether the compensated actual position meets the preset position requirement, and repeating steps S102 to S104 until the compensation accuracy meets the requirement.

[0012] It should be further explained that step S101 specifically includes:

[0013] Step S1011: determining the target trajectory direction and range of the macro platform according to the laser galvanometer fly machining task information, analyzing the profile shape, dimensional accuracy and machining speed of the machining task;

[0014] Step S1012: inputting the initial trajectory into the system dynamics model, simulating the motion state of the macro platform under the initial trajectory, and predicting the actual output trajectory of the macro platform;

[0015] Step S1013: comparing and analyzing the predicted actual output trajectory with the target trajectory, evaluating the size and distribution of the profile error, and adjusting the target trajectory of the macro platform based on the same;

[0016] Step S1104: combining the adjusted target trajectory of the macro platform, and again using the system dynamics model for verification prediction to ensure that the matching degree of the predicted actual output trajectory and the target trajectory is within the preset range.

[0017] It should be further explained that step S102 specifically includes:

[0018] Based on the spatial position relationship between the actual output trajectory of the macro platform and the target trajectory, the profile error formula is obtained as:

[0019]

[0020] wherein, r is the radius of the inscribed circle C, is the linear motion profile error, is the curve motion profile error.

[0021] It should be further explained that step S103 specifically includes:

[0022] S1031: when it is determined that the profile error exceeds the maximum compensation range of the micro platform, extracting the current control input parameters of the macro platform;

[0023] S1032: determining the adjustment direction of the control input parameters according to the characteristics of the profile error;

[0024] S1033: preliminarily adjusting the macro platform control input according to the determined adjustment direction to generate a new control input combination;

[0025] S1034: Apply the new control input set to the macro platform, and predict the actual output trajectory of the macro platform again based on the system dynamics model, and enter the next round of contour error judgment until the contour error is reduced to the maximum compensation range of the micro platform.

[0026] Further need to explain is, the step S104 specifically includes:

[0027] Step S1041: Based on the spatial distribution characteristics of the macro platform error, the error is decomposed into linear segment offset and curve segment curvature deviation, and the compensation priority of the micro platform is set respectively;

[0028] Step S1042: According to the current error type and the real-time load state of the micro platform, adjust the compensation step and direction of the micro platform;

[0029] Step S1043: Real-time acquisition of position deviation and vibration response in the micro platform compensation process, and correction of compensation instruction to offset unforeseen error disturbance;

[0030] Step S1044: After the compensation is completed, record the compensation trajectory and compensation effect data of the micro platform, and feed back to the macro platform control strategy optimization module to form a closed loop compensation.

[0031] Further need to explain is, the step S1043 specifically includes:

[0032] S10431: In the micro platform compensation process, the position deviation and vibration response data of the micro platform in X, Y, Z axis direction and rotation freedom are collected through the acceleration sensor and displacement sensor arranged on the micro platform;

[0033] S10432: Compare the collected real-time data with the pre-set standard compensation data, identify the unforeseen error disturbance caused by the mechanical deformation of the device and the environmental vibration;

[0034] S10433: Display the identified error disturbance information, and adjust the compensation instruction input to the micro platform, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve;

[0035] S10434: Send the adjusted compensation instruction to the micro platform driving device, and continuously monitor the compensation effect, if there is still error, repeat steps S10431-S10433 until the error disturbance is offset.

[0036] Further need to explain is, the step S105 specifically includes:

[0037] S1051: Real-time acquisition of the actual position signal of the compensated macro-micro platform cooperative motion through the position detection device of the laser galvanometer flying machining system, recording the X / Y axis coordinate values and trajectory tracking curve at each time point;

[0038] S1052: retrieve preset verification information from the machining process file;

[0039] S1053: compare the collected actual position data with each index in the preset verification information;

[0040] S1054: if all preset indexes are met, it is determined that the compensation is up to standard, and the compensation process is ended;

[0041] If any index is not met, the specific deviation value of the unmet index is recorded, the repeated compensation mechanism is triggered, and steps S102 to S104 are re-executed until all indexes are up to standard or the maximum number of repetitions is reached.

[0042] The application also provides a laser galvanometer fly machining system profile error compensation system, which comprises:

[0043] A trajectory planning and prediction module is configured to determine a target trajectory of the macro platform according to a machining task, and predict an actual output trajectory of the macro platform under the target trajectory based on a system dynamics model;

[0044] The trajectory planning and prediction module is configured to analyze a profile error between the actual output trajectory of the macro platform and the target trajectory, and determine whether the profile error is within a maximum compensation range of the micro platform;

[0045] A macro platform iterative compensation module is configured to perform iterative compensation by adjusting the control input of the macro platform to adjust the profile error until the profile error is reduced to within the maximum compensation range of the micro platform;

[0046] A micro platform offline compensation module is configured to introduce the error amount generated by the macro platform into the motion instruction of the micro platform to complete offline compensation by the micro platform when the profile error meets the maximum compensation range condition of the micro platform;

[0047] A compensation effect verification and feedback module is configured to verify whether the actual position after compensation meets the preset position requirement, and if not, repeat the compensation process until the compensation accuracy meets the requirement.

[0048] According to another embodiment of the application, an electronic device is provided, which comprises a memory, a processor, and a computer program stored on the memory and executable on the processor, wherein the processor implements the steps of the laser galvanometer fly machining system profile error compensation method when executing the program.

[0049] According to another embodiment of the application, an electronic device is provided, which comprises a memory, a processor, and a computer program stored on the memory and executable on the processor, wherein the processor implements the steps of the laser galvanometer fly machining system profile error compensation method when executing the program.

[0050] From the above technical solution can be seen, the present application has the following advantages:

[0051] The laser galvanometer fly machining system profile error compensation method provided by the application controls the profile error of the laser galvanometer fly machining system in a very small range by calculating the profile error based on geometric relations, macro-micro platform cooperative compensation, and multi-dimensional verification, meeting the precision requirements of machining. The macro platform iterative compensation adjusts the control input according to the profile error characteristics, and the micro platform compensation adjusts the compensation strategy in combination with the real-time load state and error disturbance, so that the system can adapt to complex working conditions such as different machining tasks, equipment aging, and environmental changes.

[0052] The macro platform preferentially processes large errors, quickly reduces the profile error to the compensable range of the micro platform, and reduces the compensation pressure of the micro platform; the micro platform performs high-precision correction on residual errors, and the closed-loop verification monitors the compensation effect in real time, discovers problems in time and starts repeated compensation, avoids rework caused by errors found after machining is completed, and improves machining efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0053] In order to more clearly illustrate the technical solutions of the application, the drawings required to be used in the description will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0054] Figure 1 The profile error compensation method flow chart for the laser galvanometer fly machining system is shown in the figure.

[0055] Figure 2 The linear motion profile error calculation schematic diagram is shown in the figure.

[0056] Figure 3 The curve motion profile error calculation schematic diagram is shown in the figure.

[0057] Figure 4 The macro platform iterative compensation method flow chart is shown in the figure.

[0058] Figure 5 The electronic device schematic diagram is shown in the figure. DETAILED DESCRIPTION

[0059] The laser galvanometer fly machining system profile error compensation method provided by the application solves the problem that the existing single macro platform error compensation method can reduce the profile error in the actual machining process to a certain extent, but has the problems of slow convergence speed and limited compensation effect on rapidly changing errors.

[0060] In view of the above problems, the present application considers the macro-micro coupling characteristics of the laser galvanometer fly-cutting system, proposes a profile error compensation method based on the macro-micro coupling characteristics, and uses the high precision and fast response characteristics of the micro platform to compensate for the shortcomings of the single macro platform iterative compensation method.

[0061] The profile error compensation method of the laser galvanometer fly-cutting system related to the present application will be described in detail below. In order to illustrate but not to limit, specific details such as specific system structure, technology, etc. are proposed to thoroughly understand the embodiments of the present application. However, it should be clear to those skilled in the art that the present application can also be implemented in other embodiments without these specific details.

[0062] It should be understood that when used in the specification of the present application, the term "comprising" indicates the existence of the described features, integers, steps, operations, elements, and / or components, but does not exclude one or more other features, integers, steps, operations, elements, components, and / or sets thereof. The terms "comprise", "include", "have" and their variants mean "including but not limited to", unless otherwise specifically emphasized.

[0063] The phrase "one embodiment" or "some embodiments" appearing in the specification of the present application means that the specific feature, structure or characteristic described in the embodiment is included in one or more embodiments of the present application. Therefore, the phrases "in one embodiment", "in some embodiments", "in other some embodiments", "in further some embodiments" appearing in the specification are not necessarily all referring to the same embodiment, but mean "one or more but not all embodiments", unless otherwise specifically emphasized.

[0064] In the embodiments of the present application, computer program code for performing the operations of the present disclosure can be written in one or more programming languages or combinations thereof, including but not limited to object-oriented programming languages such as Java, Smalltalk, C++, and conventional procedural programming languages such as "C" language or similar programming languages. The program code can be executed entirely on a user computer, partially on a user computer, as an independent software package, partially on a user computer and partially on a remote computer, or entirely on a remote computer. In the case of remote computers, the remote computer can be connected to the user computer through any kind of network, including local area network (LAN) or wide area network (WAN), or can be connected to an external computer (for example, connected to the Internet through an Internet service provider).

[0065] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all the other embodiments obtained by a person of ordinary skill in the art without creative effort are within the scope of the present application.

[0066] Please refer to Figure 1 Fig. 1 is a flow chart of a profile error compensation method of a laser galvanometer fly machining system in an embodiment, and the method comprises the following steps:

[0067] Step S101: determining a target trajectory of the macro platform according to a machining task, and predicting an actual output trajectory of the macro platform under the target trajectory based on a system dynamics model.

[0068] In some embodiments, after receiving the machining task, the system first reads various parameters in the task, including shape, size, speed requirement and other information of the machining. The system here can be an operating system in a numerical control machine tool, or a control system responsible for the execution of the machining task, etc.

[0069] According to the received information, the embodiment determines the target trajectory of the macro platform in combination with the motion characteristics of the macro platform. Then, the target trajectory related parameters are input into the system dynamics model, which considers factors such as the mechanical structure of the macro platform, the inertia of the moving parts, the friction force, etc. By simulating the motion process of the macro platform under the target trajectory, the actual output trajectory of the macro platform is predicted.

[0070] In some specific embodiments, step S101 specifically comprises:

[0071] Step S1011: determining the target trajectory direction and range of the macro platform according to the profile shape, size accuracy and machining speed of the laser galvanometer fly machining task information.

[0072] Step S1012: inputting the initial trajectory into the system dynamics model, simulating the motion state of the macro platform under the initial trajectory, and predicting the actual output trajectory of the macro platform.

[0073] Step S1013: comparing and analyzing the predicted actual output trajectory with the target trajectory, evaluating the size and distribution of the profile error, and adjusting the target trajectory of the macro platform based on the evaluation.

[0074] Step S1104: combining the adjusted target trajectory of the macro platform, and again using the system dynamics model for verification prediction to ensure that the matching degree of the predicted actual output trajectory and the target trajectory is within a preset range.

[0075] In this embodiment, the predicted actual output trajectory is compared with the target trajectory to analyze the profile error size and distribution, and the difference between the macro platform motion trajectory and the ideal state can be intuitively understood. Based on this, the target trajectory is adjusted to realize the optimization of the trajectory planning.

[0076] For example, if it is found that the error of a certain curve trajectory is large, the curvature, speed and other parameters of this section of trajectory can be adjusted to make the macro platform target trajectory more suitable for actual processing requirements. The adjusted target trajectory is then used again to verify the predictive system dynamics model, which can test the effect of the target trajectory adjustment and ensure that the matching degree between the final predicted actual output trajectory and the target trajectory is within a reasonable range. This avoids processing errors caused by unreasonable adjustments to the target trajectory.

[0077] For example, for a complex curved surface processing task, the system can plan the motion path of the macro platform according to the curvature change of the curved surface and the processing speed requirement, and predict the possible position deviation of the macro platform in actual motion. Based on the demand parameters of the processing task and the motion performance of the macro platform, this embodiment formulates a reasonable target trajectory. The motion of the macro platform is simulated using the system dynamics model, and various physical factors in the motion process of the macro platform are considered, such as the limitations of the mechanical structure and the inertia of the moving parts, to predict the actual output of the macro platform when executing the target trajectory. This process is similar to virtual simulation before actual processing, which can help to know the motion performance of the macro platform in advance. This improves the accuracy and efficiency of processing.

[0078] Step S102: Analyze the profile error between the actual output trajectory of the macro platform and the target trajectory, and determine whether the profile error is within the maximum compensation range of the micro platform.

[0079] In some embodiments, the actual output trajectory of the macro platform obtained in step S101 is compared with the target trajectory point by point, and the profile error between the actual trajectory point and the target trajectory point is calculated to analyze the profile error between the actual output trajectory of the macro platform and the target trajectory. The profile error can be manifested as the deviation of a straight line segment or the shape deviation of a curve segment. After calculating the profile error, it is compared with the pre-set maximum compensation range of the micro platform to determine whether the profile error is within the range that can be effectively compensated by the micro platform.

[0080] For example, if the maximum compensation range of the micro platform is ±0.05mm and the maximum value of the calculated profile error is 0.1mm, it is determined that the profile error exceeds the compensation range of the micro platform. In this way, the pre-set maximum compensation range of the micro platform is used as a judgment standard to evaluate whether the current profile error is within the processing capacity of the micro platform. This improves the pertinence and effectiveness of error compensation.

[0081] Step S103: If not in the range, iterative compensation is performed by adjusting the control input of the macro platform, adjusting the profile error, until the profile error is reduced to the maximum compensation range of the micro platform; if the profile error is in the maximum compensation range of the micro platform, the micro platform performs offline compensation.

[0082] In some embodiments, if step S102 determines that the profile error is not in the maximum compensation range of the micro platform, i.e., the profile error exceeds the processing capacity of the micro platform, the macro platform iterative compensation process is entered. In the iterative compensation process, the system adjusts the control input parameters of the macro platform according to the current profile error situation. The input parameters here can involve speed, acceleration, position control parameters, etc.

[0083] This embodiment re-predicts the actual output trajectory of the macro platform based on the system dynamics model after each adjustment, and calculates the profile error again. The new profile error is compared with the maximum compensation range of the micro platform.

[0084] The process of adjustment, prediction, calculation and judgment is repeated until the profile error is reduced to the maximum compensation range of the micro platform. If step S102 determines that the profile error is in the maximum compensation range of the micro platform, the micro platform directly performs offline compensation. The micro platform generates corresponding compensation motion instructions according to the size and direction of the profile error to correct the error generated by the macro platform. In this way, the macro platform and the micro platform work together according to the profile error situation to achieve effective error compensation.

[0085] For larger profile errors, macro platform iterative compensation can fully utilize the characteristics of large stroke and strong carrying capacity of the macro platform to quickly reduce the error to the range that can be handled by the micro platform, improving the efficiency of error compensation. For smaller profile errors, direct compensation by the micro platform utilizes the high precision advantage of the micro platform to ensure the final machining precision.

[0086] As an implementation manner of the present application:

[0087] Step S103 specifically includes:

[0088] S1031: When it is determined that the profile error exceeds the maximum compensation range of the micro platform, the current control input parameters of the macro platform are extracted;

[0089] S1032: According to the characteristics of the profile error, the adjustment direction of the control input parameters is determined;

[0090] S1033: According to the determined adjustment direction, the macro platform control input is preliminarily adjusted to generate a new control input combination;

[0091] S1034: Apply the new control input combination to the macro platform, and predict the actual output trajectory of the macro platform again based on the system dynamics model, and enter the next round of contour error judgment until the contour error is reduced to the maximum compensation range of the micro platform.

[0092] In this embodiment, the adjustment direction of the control input is determined according to the trajectory lag, lead, and offset direction of the contour error, for example, if the error is a straight line segment trajectory offset, the position control parameter is adjusted first; if the error is a curve segment curvature deviation, the speed planning parameter is adjusted. This reduces the risk of improper parameter adjustment and improves the effectiveness of the compensation strategy.

[0093] In this embodiment, the contour error can be systematically corrected by generating a new control input combination to reconstruct the macro platform motion. This minimizes the disruptive modification of the original control logic and ensures smooth transition of the macro platform motion.

[0094] In the iterative process of adjusting the control input, predicting the trajectory, and judging the error, the contour error can be gradually converged to the micro platform compensation range. Each iteration is based on the dynamics model to predict the trajectory, avoiding the trial and error cost in actual processing. Here, for larger errors that exceed the micro platform compensation range, the error can be reduced to the target range through 3-5 iterations.

[0095] Step S104: When the contour error meets the maximum compensation range of the micro platform, the error amount generated by the macro platform is introduced into the motion instruction of the micro platform, and the offline compensation is completed by the micro platform.

[0096] In some embodiments, when the contour error meets the maximum compensation range of the micro platform, the system extracts the error amount information generated by the macro platform, including the size, direction, and spatial distribution of the error. According to the motion control instruction format of the micro platform, the error amount is converted into motion instruction parameters that the micro platform can recognize and execute. Then these parameters are embedded into the motion instruction of the micro platform, and the micro platform receives the instruction and executes the offline compensation action according to the instruction requirements, correcting the residual error of the macro platform during processing.

[0097] Optionally, if the macro platform generates a 0.03mm offset error at a certain position, the system converts the error into a displacement instruction of the micro platform to control the micro platform to move 0.03mm in the opposite direction to offset the error.

[0098] Here, the high-precision motion control capability of the micro platform is used to convert the error amount generated by the macro platform into a motion instruction of the micro platform, and the residual error of the macro platform is compensated by the additional motion of the micro platform. The micro platform independently executes the compensation action without affecting the overall processing flow, achieving accurate correction of the error.

[0099] Step S105: verifying whether the compensated actual position meets the preset position requirement, and repeating steps S102 to S104 until the compensation accuracy meets the requirement if not.

[0100] In some embodiments, after the offline compensation of the micro-platform is completed, the system measures the actual position of the processed workpiece through a laser interferometer, a grating ruler, etc. The measured actual position data is compared with the preset position requirement, and the deviation between the actual position and the preset position is calculated.

[0101] If the deviation is within the allowable error range, it is considered that the compensation accuracy meets the requirement, and the processing task is completed. If the deviation exceeds the allowable error range, steps S102 to S104 are re-executed, and error analysis, judgment and compensation are performed again until the compensated actual position meets the preset position requirement.

[0102] As can be seen, the actual position information after processing is obtained through a high-precision position detection device, compared with the preset position requirement, and the effect of error compensation is evaluated. If the compensation effect is not ideal, the error compensation process is restarted, forming a closed-loop control process, and the error compensation strategy is continuously adjusted and optimized until the processing accuracy requirement is met.

[0103] In an embodiment of the present application, based on step S104, a possible embodiment will be given below to illustrate the specific implementation scheme.

[0104] Step S104 specifically includes:

[0105] Step S1041: based on the spatial distribution characteristics of the macro-platform error, the error is decomposed into linear segment offset and curve segment curvature deviation, and the corresponding compensation priority of the micro-platform is set respectively.

[0106] Step S1042: adjusting the compensation step and direction of the micro-platform according to the current error type and real-time load state of the micro-platform.

[0107] Step S1043: real-time acquisition of position deviation and vibration response in the micro-platform compensation process, and correction of the compensation instruction to offset unforeseen error disturbance.

[0108] Step S1043 specifically includes:

[0109] S10431: in the micro-platform compensation process, the position deviation and vibration response data of the micro-platform in X, Y, Z axis directions and rotational degrees of freedom are collected through the acceleration sensor and displacement sensor arranged on the micro-platform.

[0110] S10432: Compare the collected real-time data with the pre-set standard compensation data, and identify unforeseen error disturbances caused by equipment mechanical deformation and environmental vibration.

[0111] S10433: Display the identified error disturbance information, and obtain compensation instructions input to the micro-platform for adjustment, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve.

[0112] S10434: Send the adjusted compensation instructions to the micro-platform driving device, and continuously monitor the compensation effect. If there is still an error, repeat steps S10431-S10433 until the error disturbance is eliminated.

[0113] Step S1044: After the compensation is completed, record the compensation trajectory and compensation effect data of the micro-platform, and feed back to the macro-platform control strategy optimization module to form a closed-loop compensation.

[0114] As can be seen, according to the spatial distribution difference of the macro-platform error in the straight line segment and the curve segment, the error is decomposed into straight line offset and curvature deviation, and the micro-platform is set to preferentially correct the error affecting the key area of machining precision, ensuring reasonable allocation of compensation resources. Combined with the current error type and the real-time load state of the micro-platform, small step fine compensation is adopted for small errors, and large step quick correction and direction are adopted for large errors, avoiding response lag or overshoot caused by fixed compensation strategy. Based on the disturbance characteristics, the inflection point of the compensation path is modified to avoid the vibration sensitive area, and the speed curve is adjusted to reduce the mechanical impact, realizing adaptive correction of the compensation trajectory. After the compensation is completed, the motion path, correction amount and error residual value of each axis of the micro-platform are recorded and fed back to the macro-platform control strategy optimization module for updating the dynamic model parameters or adjusting the macro-platform iterative compensation, forming a closed-loop compensation mode. Avoiding the mechanical overload or motion conflict that may be caused by the traditional fixed compensation mode. The closed-loop mechanism ensures that each compensation is verified for effect, improving the machining success rate and product consistency.

[0115] In an embodiment of the present application, based on step S105, a possible embodiment will be given below to illustrate the specific implementation scheme.

[0116] Step S105 specifically includes:

[0117] S1051: Real-time acquisition of actual position signals of the compensated macro-micro platform cooperative motion through the position detection device of the laser galvanometer fly cutting system, recording the X / Y axis coordinate values and trajectory tracking curves at each time point.

[0118] S1052: Retrieve the pre-set verification information from the machining process file.

[0119] The preset verification information includes absolute position tolerance, relative position error and trajectory constraints, forming a multi-dimensional verification indicator set.

[0120] S1053: Compare the collected actual location data with various indicators in the preset verification information.

[0121] Here, it is possible to detect whether the absolute position falls within the tolerance band of the target position; whether the position deviation of adjacent processing points exceeds the relative error limit, etc.

[0122] S1054: If all preset indicators are met, the compensation is determined to be up to standard and the compensation process ends.

[0123] If any indicator is not met, the specific deviation value of the unmet item is recorded, and the repeated compensation mechanism is triggered, and steps S102 to S104 are re-executed until all indicators are met or the maximum number of repetitions is reached.

[0124] This embodiment captures the actual position information of the macro-micro platform after the coordinated movement in real time, records the X / Y axis coordinates and trajectory curves at each moment, and provides raw data for the evaluation of the compensation effect. Multi-dimensional verification standards such as absolute position tolerance, relative position error, trajectory constraint, etc. are extracted from the processing technology file to form a complete indicator system covering processing accuracy, position continuity and motion stability. The collected actual position data is compared with the preset verification indicators item by item, and a comprehensive inspection is carried out from the three key dimensions of absolute position deviation, relative error of adjacent points, and trajectory speed stability to identify the error problems that still exist after compensation. If the actual data meets all the preset indicators, it is determined that the compensation meets the standard; if there are non-standard items, the specific deviation value is recorded and the repeated compensation mechanism is triggered, and the error analysis and macro-micro compensation process are re-executed. The compensation method is optimized through multiple iterations until the processing accuracy requirements are met or the set repetition limit is reached. Targeted corrections can be made to errors that do not meet the standards, and the gap between the actual position and the target position is gradually narrowed through multiple iterations, ultimately improving the processing accuracy.

[0125] Furthermore, as an extension of the specific implementation method of the above-mentioned laser galvanometer flight processing system contour error compensation method, in order to effectively compensate for the contour error, the contour error of the system is calculated. This embodiment establishes a mathematical expression of the contour error based on the approximate estimation method of the geometric relationship, providing a quantitative basis for error compensation. According to the geometric characteristics of motion, the contour error is divided into linear motion contour error and curve motion profile error , the calculation diagram is as attached Figure 2 and Figure 3 As shown in Figure 2, the contour error can be derived from the geometric relationship as follows:

[0126]

[0127] wherein, r is the radius of the inscribed circle of the area enclosed by the actual trajectory and the desired trajectory,

[0128] In the profile error analysis of the laser galvanometer fly-cutting system, the actual output trajectory and the desired trajectory form a deviation area. r is the radius of the largest inscribed circle in the deviation area, which is used to quantify the local maximum range of the actual trajectory deviating from the target trajectory, and assists in deriving the geometric relationship between the profile error and the position deviation and , the trajectory direction angle and .

[0129] and respectively represent the position deviation of the actual trajectory point and the desired trajectory point in the X-axis and Y-axis directions.

[0130] Based on Figure 2 , is the horizontal distance between the actual point P1 and the corresponding point of the desired trajectory along the X-axis direction, is the vertical distance along the Y-axis direction, which together describes the position deviation of the actual trajectory relative to the desired trajectory.

[0131] Related to linear motion profile error, is the angle between the desired profile curve L1 and the positive direction of the X-axis, which is used to determine the projection relationship of the error in the profile direction when moving in a straight line. In the calculation of linear motion profile error, it assists in converting the X and Y axis direction deviation to the calculation dimension of the profile error.

[0132] Related to curve motion profile error, is an angle parameter related to the local geometric features of the curve in the curve motion scenario, which is used in the calculation of the curve motion profile error. It is related to the inscribed circle radius r and modifies the X and Y axis direction deviation to accurately calculate the profile error on the curve trajectory.

[0133] The error compensation method based on the macro-micro coupling characteristics in this embodiment considers the macro platform iterative compensation. The macro iterative compensation method adjusts the control input of the macro platform according to the dynamic model, introduces an iterative compensation amount, so as to ensure that the output trajectory of the macro platform after each iteration is as close to the target trajectory as possible, thereby gradually reducing the profile error, so that the profile error reaches the compensation range of the micro platform, and lays a foundation for collaborative compensation.

[0134] The specific process is as follows: the actual response of the system is predicted by forward simulation of the precise dynamic model, the contour error relative to the target instruction trajectory is calculated according to the actual response, and then the error is fed back to the target trajectory for correction. The new instruction trajectory after correction is input into the dynamic model again to test the compensation effect. The above process is repeated until the actual position output meets the accuracy requirement. If it meets the requirement, the compensation is completed; if it does not meet the requirement, the above steps are continued to be repeated until the required accuracy is reached, as shown in the accompanying Figure 4 .

[0135] For a given target trajectory, the respective motion trajectories of the macro-micro platform are planned by the trajectory planning method, the target trajectory of the macro platform is predicted by the dynamic model of the laser galvanometer flying machining system as , and the actual output trajectory of the macro platform is obtained by the dynamic model prediction as , wherein t is a time variable. The contour error can be expressed as: .

[0136] In the compensation process, the size of the contour error directly determines the selection of the compensation strategy. The micro platform has high compensation accuracy, but its compensation range is relatively limited. Assuming that the maximum compensation range of the micro platform is , when the calculated contour error satisfies , the micro platform can be directly used for compensation. At this time, the compensation amount of the micro platform is the negative value of the contour error:

[0137]

[0138] For the macro-micro platform collaborative compensation mode, if the contour error of the macro platform exceeds the compensation capability of the micro platform in a certain machining task. At this time, the error needs to be reduced to the range that can be compensated by the micro platform through the macro platform iterative compensation method, that is, , and then the micro platform is used for offline compensation, that is, the error generated by the macro platform is introduced into the instruction of the micro platform to realize the final effective compensation.

[0139] The entire compensation process can be summarized as follows:

[0140] (a) According to the machining task requirements, the target trajectory of the macro platform is determined .

[0141] (b) The actual output of the macro platform under the target trajectory is predicted by using the established dynamic model, and is obtained.

[0142] (c) The contour error and determine whether it is within the micro-platform compensation range, i.e. .

[0143] (d) If the condition is met, directly compensate offline by the micro-platform, and the compensation amount is

[0144] (e) If the condition is not met, start the iterative compensation process of the macro-platform, gradually reduce the profile error by adjusting the control input of the macro-platform, and then compensate by the micro-platform after the micro-platform compensation condition is met.

[0145] It should be understood that the size of the serial number of each step in the above embodiments does not mean the order of execution, and the execution order of each process should be determined according to its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

[0146] The following is an embodiment of the laser galvanometer fly machining system profile error compensation system provided by the embodiment of the present disclosure. The system and the laser galvanometer fly machining system profile error compensation method of each embodiment described above belong to the same inventive concept. The details not described in the embodiment of the laser galvanometer fly machining system profile error compensation system can be referred to the embodiment of the laser galvanometer fly machining system profile error compensation method described above.

[0147] The system comprises a trajectory planning and prediction module for determining the target trajectory of the macro-platform according to the machining task, and predicting the actual output trajectory of the macro-platform under the target trajectory based on the system dynamics model.

[0148] The trajectory planning and prediction module is configured to analyze the profile error between the actual output trajectory of the macro-platform and the target trajectory, and determine whether the profile error is within the maximum compensation range of the micro-platform.

[0149] The macro-platform iterative compensation module is configured to adjust the control input of the macro-platform for iterative compensation, and adjust the profile error until the profile error is reduced to within the maximum compensation range of the micro-platform.

[0150] The micro-platform offline compensation module is configured to introduce the error amount generated by the macro-platform into the motion instruction of the micro-platform after the profile error meets the maximum compensation range condition of the micro-platform, and complete offline compensation by the micro-platform.

[0151] The compensation effect verification and feedback module is configured to verify whether the actual position after compensation meets the preset position requirement, and if not, repeat the compensation process until the compensation accuracy meets the requirement.

[0152] As Figure 5As shown, the present application also provides an electronic device, comprising a display module 103, a memory 102, a processor 101, and a computer program stored in the memory and capable of running on the processor 101, wherein the processor 101 implements the steps of the laser galvanometer fly machining system profile error compensation method when executing the program.

[0153] In embodiments of the present application, the electronic device includes, but is not limited to, a laptop computer, a desktop computer, a workstation, a personal digital assistant, a server, a blade server, a mainframe computer, and other suitable computers. The electronic device can also represent various forms of mobile devices such as personal digital processors, cellular phones, smart phones, wearable devices, and other similar computing devices. The components shown herein, their connections, and relationships, and their functions, are shown as examples only and are not meant to limit implementations of the embodiments described and / or claimed herein.

[0154] In embodiments of the present application, the processor 101 can be implemented by using at least one of an application-specific integrated circuit, a programmable logic device, a field programmable gate array, a processor, a controller, a microcontroller, a microprocessor, an electronic unit designed to perform the functions described herein, and in some cases, such implementation can be implemented in a controller. For software implementation, the implementation of such as processes or functions can be implemented with separate software modules allowing at least one function or operation to be performed, and the software code can be implemented by a software application (or program) written in any appropriate programming language and stored in a memory and executed by a controller.

[0155] The display module 103 is used to display information input by a user or information provided to a user. The display module 103 can include a display panel, which can be configured in the form of a liquid crystal display, an organic light emitting diode, etc.

[0156] The memory 102 can be used to store software programs and various data. The memory 102 can include a high-speed random access memory, and can also include a non-volatile memory such as at least one magnetic disk storage device, a flash memory device, or other volatile solid-state memory device.

[0157] The present application also provides a storage medium having a computer program stored thereon, wherein the computer program is executed by a processor to implement the steps of the laser galvanometer fly machining system profile error compensation method.

[0158] The storage medium can be any available medium that can be accessed by a general purpose or special purpose computer. By way of example, and not limitation, such computer-readable media can comprise RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store desired program code means in the form of instructions or data structures and that can be accessed by a general-purpose or special-purpose computer, or a general-purpose or special-purpose processor. Also, any connection is properly termed a computer-readable medium. For example, if the software is transmitted from a website, server, or other remote source using a coaxial cable, fiber optic cable, twisted pair, digital subscriber line (DSL), or other

[0159] In this document, the terms "computer-readable medium" or "computer- readable media" is used to generally refer to media such as removable storage, volatile memory, non-volatile memory, or any other storage medium readable by a computer or a general purpose or special purpose computer. Exemplary computer-readable storage media includes storage mediums such as a magnetic, optical or semiconductor storage. The exemplary storage medium also can be any available medium that is located on a processing system, that can be accessed controllably by a processing system, or that includes one or more portions that are usable by a processing system such as main memory, ROM, or flash memory.

[0160] The foregoing description of the disclosed embodiments enables a person skilled in the art to implement or use the application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and generic principles defined herein can be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A method of profile error compensation for a laser galvanometer fly-cutting system, the method comprising: The method comprises: S101: determining a target trajectory of the macro platform according to a machining task, and predicting an actual output trajectory of the macro platform under the target trajectory based on a system dynamics model; S102: analyzing a profile error between the actual output trajectory of the macro platform and the target trajectory, and judging whether the profile error is within a maximum compensation range of the micro platform; Specifically, based on the spatial position relationship between the actual output trajectory of the macro platform and the target trajectory, the profile error formula is obtained as: wherein, r is the radius of the inscribed circle of the area enclosed by the actual trajectory and the desired trajectory, is the linear motion profile error, is the curve motion profile error, and respectively represent the position deviation of the actual trajectory point and the desired trajectory point in the X-axis and Y-axis directions, is the angle between the desired profile curve and the positive direction of the X-axis; is the angle parameter related to the local geometric features of the curve in the curve motion scenario; S103: if the profile error is not within the range, iterative compensation is performed by adjusting the control input of the macro platform to adjust the profile error until the profile error is reduced to be within the maximum compensation range of the micro platform; Specifically, it comprises: S1031: when it is determined that the profile error exceeds the maximum compensation range of the micro platform, the current control input parameter of the macro platform is extracted; S1032: according to the characteristics of the profile error, the adjustment direction of the control input parameter is determined; S1033: according to the determined adjustment direction, the control input of the macro platform is preliminarily adjusted to generate a new control input combination; S1034: the new control input combination is applied to the macro platform, and the actual output trajectory of the macro platform is predicted again based on the system dynamics model, and the next round of profile error judgment is entered until the profile error is reduced to be within the maximum compensation range of the micro platform; S104: when the profile error meets the maximum compensation range condition of the micro platform, the error amount generated by the macro platform is introduced into the motion instruction of the micro platform, and the offline compensation is completed by the micro platform; Step S104 specifically comprises: S1041: based on the spatial distribution characteristics of the macro platform error, the error is decomposed into linear segment offset and curve segment curvature deviation, and the corresponding compensation priority of the micro platform is set respectively; S1042: according to the current error type and the real-time load state of the micro platform, the compensation step and direction of the micro platform are adjusted; S1043: the position deviation and vibration response in the micro platform compensation process are collected in real time, and the compensation instruction is corrected to offset the unforeseen error disturbance; S1044: after the compensation is completed, the compensation trajectory and compensation effect data of the micro platform are recorded, and are fed back to the macro platform control strategy optimization module to form a closed loop compensation; S105: verifying whether the actual position after compensation meets the preset position requirement, if not, repeating steps S102 to S104 until the compensation accuracy meets the requirement.

2. The laser galvanometer fly-cutting system profile error compensation method of claim 1, wherein, Step S101 specifically comprises: S1011: according to the laser galvanometer fly machining task information, the profile shape, size accuracy and machining speed of the machining task are analyzed, and the target trajectory direction and range of the macro platform are determined; S1012: according to the system dynamics model, the initial trajectory is input, the motion state of the macro platform under the initial trajectory is simulated, and the actual output trajectory of the macro platform is predicted; S1013: the predicted actual output trajectory is compared and analyzed with the target trajectory, the size and distribution of the profile error are evaluated, and the target trajectory of the macro platform is adjusted accordingly; S1104: combined with the adjusted target trajectory of the macro platform, the system dynamics model is used again for verification prediction to ensure that the matching degree of the predicted actual output trajectory and the target trajectory is within the preset range.

3. The laser galvanometer fly-cutting system profile error compensation method of claim 1, wherein, Step S1043 specifically comprises: S10431: In the micro-platform compensation process, the position deviation and vibration response data of the micro-platform in the X, Y, Z axis directions and the rotational freedom are collected by the acceleration sensor and the displacement sensor arranged on the micro-platform; S10432: The collected real-time data is compared with the pre-set standard compensation data, and the unforeseen error disturbance caused by the mechanical deformation of the device and the environmental vibration is identified; S10433: The identified error disturbance information is displayed, and the compensation instruction input to the micro-platform is adjusted, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve; S10434: The adjusted compensation instruction is sent to the micro-platform driving device, and the compensation effect is continuously monitored, and if there is still error, steps S10431-S10433 are repeated until the error disturbance is offset.

4. The laser galvanometer fly-cutting system profile error compensation method of claim 1, wherein, Step S105 specifically includes: S1051: The actual position signal of the compensated macro-micro platform cooperative motion is obtained in real time by the position detection device of the laser galvanometer flying machining system, and the X / Y axis coordinate values and the trajectory tracking curve at each time point are recorded; S1052: The pre-set verification information is called from the machining process file; S1053: The collected actual position data is compared with each index in the pre-set verification information; S1054: If all pre-set indexes meet, it is determined that the compensation is up to standard, and the compensation process is ended; If any index does not meet, the specific deviation value of the unqualified item is recorded, the repeated compensation mechanism is triggered, and steps S102 to S104 are re-executed until all indexes meet or the maximum number of repetitions is reached.

5. A laser galvanometer fly-cutting system profile error compensation system, characterized by, The system is used to realize the laser galvanometer flying machining system contour error compensation method according to any one of claims 1 to 4; The system includes: A trajectory planning and prediction module for determining the target trajectory of the macro-platform according to the machining task, and predicting the actual output trajectory of the macro-platform under the target trajectory based on a system dynamics model; A trajectory planning and prediction module for analyzing the contour error between the actual output trajectory of the macro-platform and the target trajectory, and determining whether the contour error is within the maximum compensation range of the micro-platform; A macro-platform iterative compensation module for adjusting the control input of the macro-platform for iterative compensation to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro-platform; A micro-platform offline compensation module for introducing the error amount generated by the macro-platform into the motion instruction of the micro-platform to complete offline compensation by the micro-platform when the contour error meets the maximum compensation range of the micro-platform; A compensation effect verification and feedback module for verifying whether the actual position after compensation meets the pre-set position requirement, and repeating the compensation process if it does not meet the requirement until the compensation accuracy meets the requirement.

6. An electronic device comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, characterized in that, The processor executes the program to implement the steps of the laser galvanometer flying machining system contour error compensation method according to any one of claims 1 to 4.

7. A storage medium having stored thereon a computer program, characterized in that The computer program is executed by the processor to implement the steps of the laser galvanometer flying machining system contour error compensation method according to any one of claims 1 to 4.

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