Etching equipment capable of being vertically placed, continuously rotating workpieces and having short-distance applying, sucking, blowing and heating processing functions

Abstract

The invention discloses etching equipment which is vertically placed, continuously rotates workpieces and has the processing functions of applying, sucking, blowing and heating. The etching equipment consists of a processing bin, a supply bin, a tool for clamping the workpieces, and a loading and unloading bin, the processing bin is composed of an etching liquid and an accommodating structure thereof, an etching liquid spraying main pipe, a driving gear, a liquid feeding pipe, a liquid collecting pipe, an air blowing head and a heating head; the supply bin comprises an etching liquid tank, a motor and a driving device which are used for driving a driving gear and a conveying chain, a pumping device for applying and sucking an etching liquid, an air source and a heat source which are used for blowing and heating, a pumping device for spraying, adding and discharging the etching liquid, and an integral electric control system of a power supply of electronic and electrical parts and software carriers; gear teeth are arranged on the outer edge of the tool; in the machining process, a workpiece is vertically placed and continuously rotates, and etching liquid is applied and sucked through a liquid feeding pipe and a liquid collecting pipe; gas and heat energy are delivered by the gas blowing pipe and the heating pipe; isolation mechanisms or isolation areas are arranged between the bins. According to the invention, the pool effect existing in the existing etching technology can be eliminated, lateral erosion is reduced, and the etching quality and efficiency are improved; the etching solution is not only suitable for etching products such as circuit boards, but also suitable for wet processing processes of electroless plating such as copper deposition, direct plating of initial conductive layer coating, blackening, browning, developing, film removing, micro-etching, cleaning, drying and the like.

Description

Technical Field

[0001] The present invention relates to an etching device for vertically placing and continuously rotating a workpiece, with functions of applying, sucking, blowing, and heating at a short distance, belonging to the technical field of professional equipment manufacturing. Background Art

[0002] Etching is used to selectively remove part of the material of a workpiece to manufacture a certain structure according to design requirements. It is a basic processing method with wide applications and is very important for the manufacturing industry.

[0003] Existing etching technologies, especially in the process of manufacturing circuit boards, have the following two problems: the pool effect and the side etching effect.

[0004] The pool effect refers to the phenomenon that during the etching process, the etching agent on the surface of a specific part of the workpiece is updated and exchanged more slowly than that on the surfaces of other parts, resulting in different etching effects on different parts of the workpiece and affecting the consistency of the overall workpiece processing.

[0005] The side etching effect refers to the phenomenon that during the etching process, the etching solution not only removes the etched material in the vertical direction but also diffuses to both sides to remove the etched material that should not be removed, resulting in the edges of the selected etching profile becoming rough and affecting the accuracy of the etching process.

[0006] In order to improve the overall consistency, conformal, or conformability, that is, the precision of the shape that meets the design requirements, of etching, existing technologies have made various attempts in terms of equipment, chemical solutions, and process parameter control. So far, there is still no universal solution.

[0007] In view of the above deficiencies in the technology, the present invention is committed to designing and manufacturing a new type of etching device to solve the above two problems. Summary of the Invention

[0008] The device of the present invention vertically places and continuously rotates the workpiece during the etching process, and is supplemented with a liquid supply pipe and a liquid collection pipe to apply and suck the etching solution at a short distance, and a blowing head and a heating head to dry and clean the surface of the workpiece at a short distance, which can improve the ability of uniform etching, that is, overall uniform etching, and the ability of fine etching, that is, conformal etching.

[0009] 1. Overall Structure of the Device

[0010] The device consists of a processing chamber, a supply chamber, a fixture for clamping the workpiece, and a loading and unloading chamber. The device is provided with a unified operation area, and each chamber is provided with its own operation panel.

[0011] The processing chamber consists of an etching solution and its accommodating structure, a main etching solution injection pipe, a driving gear, a liquid supply pipe, a liquid collection pipe, a blowing head, a heating head, etc. The present invention is suitable for processing both sides of a workpiece simultaneously. Each processing device is symmetrically arranged with the workpiece rotation plane as the boundary. Of course, the present invention can also set each processing head only on one side of the workpiece rotation plane to suit the occasion of processing only one side of the workpiece. Similar to the prior art, the processing chamber is made of plastic sheets into a trough body, with a visual observation window, and a structure convenient for maintenance and repair is also provided.

[0012] The supply chamber includes an etching solution tank, a motor and its driving device for driving the driving gear and the conveying chain, a pumping device for the close application and suction of the etching solution, a gas source and a heat source for blowing and heating, a pumping device for the injection, addition and discharge of the etching solution, and an overall electronic control system for the motion control of the equipment, the electronic and electrical components and the power supply of the software carrier and other components. The supply chamber is partitioned, with an etching solution tank area, a pumping device area, and an electrical and electronic device area. Similar to the prior art, the supply chamber is provided with a visual observation window, a detection and addition device for the liquid medicine, and a structure convenient for maintenance, repair, etc.

[0013] The fixture for clamping the workpiece has an inner square and an outer circle, and the outer edge is provided with teeth; during the processing, the workpiece is placed vertically, and the workpiece rotates continuously. In addition to the main injection pipe applying the etching solution, the etching solution is also applied and sucked at close range by the liquid supply pipe and the liquid collection pipe respectively, and high-speed gas and high-density heat energy are also delivered at close range by the blowing head and the heating head.

[0014] The loading and unloading chambers are respectively configured as processing chambers for the necessary processing procedures before and after etching, which are similar to the structure of the etching processing chamber. A manipulator can also be set to clamp the workpiece that has undergone the necessary processing before and after etching.

[0015] An isolation mechanism or an isolation area is provided at the interface between each chamber to dynamically realize the transportation and connection of objects, liquids and gases.

[0016] 2. Workpiece clamping fixture

[0017] The fixture for clamping the workpiece, made of a plate with an inner square and an outer circle, is an important part of the present invention. Its function is to act as a driven wheel to drive the workpiece to always be in a vertical but overall fixed position, and through continuous rotation, to achieve the relative motion effect with the processing head.

[0018] The fixture for clamping the workpiece of the present invention has an inner square and an outer circle, is made of a plate, and is placed vertically after loading the workpiece.

[0019] The contour of the outer circle of the fixture is a tooth-shaped circle symmetric about two sides, and together with the side walls sandwiched between the two surfaces, it forms gear teeth. As a driven gear, it is used to mesh with the conveying chain to transfer workpieces inside the equipment; the gear formed together with the side walls sandwiched between the two surfaces is also used to mesh with the teeth of the driving gear to drive the workpiece to rotate continuously.

[0020] The outer edge of the inner-square and outer-round fixture is provided with a wheel disc plane part, and a circular protrusion is arranged on this wheel disc plane part. The top surface of the protrusion structure is smooth. In the case of uneven workpiece surfaces, it is used to limit the minimum distance between the liquid supply pipe, the liquid collection pipe and the protruding parts of the workpiece surface, and to support the smooth movement of the liquid supply pipe, the liquid collection pipe and the air blowing head, ensuring that the liquid supply pipe, the liquid collection pipe and the air blowing head are as parallel to the workpiece as possible in space.

[0021] A elastic structure for clamping the circuit board is arranged between the outer frame and the inner frame of the fixture, which is used to clamp and fix the workpiece.

[0022] 3. The mechanism for driving the workpiece

[0023] The equipment of the present invention has the function of the workpiece rotating in place at the processing position, which is realized by the driving gear; it also has the function of transferring the workpiece in different parts of the equipment, which is realized by the conveying chain.

[0024] A driving gear that makes a rotational motion is provided, which is used to mesh with the teeth on the outer edge of the fixture to drive the workpiece fixture and the workpiece to rotate in place; the driving gear is fixedly connected to the transmission shaft, and the transmission shaft passes through the processing chamber and the supply chamber of the equipment through a liquid seal structure; the part of the transmission shaft in the supply chamber is driven by a motor in the supply chamber to make a rotational motion, driving the driving gear in the processing chamber to rotate, and then driving the fixture clamping the workpiece to rotate, thereby driving the workpiece to rotate.

[0025] Chains that move in a cycle are arranged at the top of the processing chamber and the loading and unloading chamber, which are used to convert the rotational motion into a linear motion and convey the fixture loaded with the workpiece to different positions; the structure of the chain matches the tooth shape of the driven gear formed by the workpiece fixture, and both ends of it are fixed and meshed by gears driven by a transmission motor, and are controlled by the motion control system of the equipment; the conveying chain is fixedly installed and runs through the processing chamber and the loading and unloading chamber. At the interface where the conveying chain passes between the chambers, free baffle curtains are provided to reduce the cross-flow of substances between the chambers.

[0026] 4. The liquid supply pipe and the liquid collection pipe for improving the etching ability

[0027] Setting the liquid supply pipe and the liquid collection pipe is an important feature of the present invention. Because during processing, the workpiece rotates in place continuously. By applying the liquid supply pipe and the liquid collection pipe that are integrally fixed and stationary, fresh etching liquid can be sprayed onto the workpiece surface in a close-range scanning manner, and the exhausted liquid can also be discharged in a close-range scanning manner, greatly improving the consistency, accuracy and processing speed of etching.

[0028] In the present invention, the spatial positions of the liquid supply pipe and the liquid collection pipe should correspond to the spatial position of the fixture and be set at a short distance. Among them, the liquid supply pipe is used to apply the etching solution to the surface of the workpiece with a certain pressure, so as to press the etching solution to the side walls and the surface of the workpiece with fine structures such as holes, depressions, and obstructions, thereby improving the processing ability without spatial dead corners in the concave-convex and blocked parts of the workpiece; the liquid collection pipe has a suction effect, which is used to withdraw the etching solution on the surface of the workpiece, especially in the area where the etching solution is prone to stagnate and produce a pool effect in the middle of the geometric shape of the workpiece, as well as the etching solution on the side walls and the surface of the workpiece with fine structures such as holes, depressions, obstructions, and clamping grooves, to form a local negative pressure area, promote the microscopic exchange speed of the etching solution at the working interface, and thus improve the uniform etching ability of the entire surface of the etching process.

[0029] The liquid supply pipe and the liquid collection pipe are fixed in the processing chamber by a clamping structure with adjustable distance, parallel to the workpiece fixture placed vertically and the workpiece clamped, and pointing from the outer contour line of the fixture to the center of the outer contour line; the clamping structure with adjustable distance consists of two parts. One part is the fixed part, which is fixedly connected to the processing chamber and is the support body of the adjustable part, and is a rod-shaped structure; the other part of the clamping structure with adjustable distance is a support pipe sleeve whose position can be adjusted. The support pipe sleeve is sleeved on the rod-shaped structure; the surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece fixture and the workpiece it clamps; a release and locking structure is provided between the support pipe sleeve whose position can be adjusted and the rod-shaped structure to adjust its position on the rod-shaped structure; the inner contour and size of the pipe sleeve part of the support pipe sleeve whose position can be adjusted match the outer contour and size of the liquid supply pipe and the liquid collection pipe. After sleeving and clamping the liquid supply pipe and the liquid collection pipe, by releasing and sliding its position on the rod-shaped structure and then locking, the parallel distance between the liquid supply pipe, the liquid collection pipe and the workpiece is adjusted, and the effects of applying the etching solution to the workpiece surface and sucking the etching solution from the workpiece surface are changed.

[0030] The ends of the liquid supply pipe and the liquid collection pipe are transfer liquid pipes, which penetrate between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner; in the supply chamber, the transfer liquid pipes are respectively connected to the pumping devices for applying and sucking; after the liquid supply pipe is connected to the liquid application pumping system and the etching solution tank through the transfer liquid pipe, it conveys and applies and distributes the etching solution to the surface of the workpiece in the processing chamber at a short distance; after the liquid collection pipe is connected to the liquid suction pumping system and the etching solution tank through the transfer liquid pipe, it sucks the etching solution from the surface of the workpiece in the processing chamber and returns the exhausted etching solution that has played its role to the etching solution tank.

[0031] The lengths of the liquid supply pipe and the liquid collection pipe correspond to their processing ranges. Slits are axially formed or holes are densely arranged in the liquid supply and collection sections corresponding to their processing ranges for liquid spraying and suction. The cross-sections of the slits and holes have various forms, which can be single rectangular or trapezoidal, or segmented as rectangular connected to trapezoidal. Different cross-sectional forms of the slits and holes are suitable for different working conditions, enabling the liquid flow to be ejected in the form of a long strip knife edge or fan shape, or the liquid to be sucked in the form of direct suction or confluence suction. Preferably, a number of liquid supply pipes and liquid collection pipes with the same or different processing ranges are provided to match and compensate for the difference in processing effects caused by the different linear velocities of each region in the radial direction of the workpiece due to the rotation of the workpiece, ensuring the consistency of the whole plate processing.

[0032] 5. The air blowing head and the heating head that can further remove the retained liquid and can dry and clean the workpiece energy-efficiently

[0033] Similar to the working principle of the liquid supply pipe and the liquid collection pipe, in the present invention, a scanning relative motion is generated between the air blowing head and the heating head and the workpiece that rotates in place without stopping. By applying the air blowing head and the heating head that are integrally fixed and stationary, the surface of the workpiece can be scanned and traversed, and the surface of the workpiece can be acted on in a close-range focusing manner to more thoroughly remove the etching solution and moisture on the surface of the workpiece. Moreover, laser heating belongs to anisotropic energy transfer, which can avoid the loss of other isotropic energy transfer; the Venturi effect design of the air blowing head has an air volume amplification exhaust and suction effect, both of which are energy-efficient processing.

[0034] In the present invention, the spatial positions of the air blowing head and the heating head should correspond to the spatial position of the fixture and be set at a close distance. Among them, the air blowing head is used to deliver a high-speed gas flow along the surface of the workpiece to form a long strip air knife, generating negative pressure to achieve taking the liquid away from the surface of the workpiece, thereby improving the liquid discharge effect without spatial dead angles in the concave-convex and shielded parts of the workpiece; the heating head is used to deliver high-density heat energy perpendicular to the surface of the workpiece to form a long strip hot knife, thermally interacting with the material to heat, vaporize and dry the material on the surface of the workpiece, thereby improving the cleaning and drying treatment ability of the workpiece.

[0035] The blowing head and the heating head are fixed in the processing chamber by a clamping structure with adjustable distance, parallel to the workpiece fixture placed vertically and the clamped workpiece, and pointing from the outer circular contour line of the fixture to the center of the outer edge contour line; the clamping structure with adjustable distance consists of two parts. One part is the fixed part, fixedly connected to the processing chamber, which is the support body of the adjustable part and is in a rod shape; the other part of the clamping structure with adjustable distance is a support sleeve with adjustable position, and the support sleeve is sleeved on the rod-shaped structure; the surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece fixture and the workpiece it clamps; a release and locking structure is provided between the support sleeve with adjustable position and the rod-shaped structure to adjust its position on the rod-shaped structure; after the sleeve part of the support sleeve with adjustable position is fixedly connected to the blowing head and the heating head tube, by releasing and sliding its position on the rod-shaped structure and then locking it, the parallel distance between the blowing head, the heating head and the workpiece is adjusted, changing the effect of delivering gas along the workpiece surface and delivering heat energy perpendicular to the workpiece surface.

[0036] The length of the blowing head corresponds to its processing range. A slit is axially opened or holes are densely arranged in the blowing head corresponding to its processing range for ejecting high-speed gas; in order to achieve the effect of ejecting a high-speed gas flow in the shape of a long blade along the workpiece surface to generate negative pressure for carrying away the liquid, the cross-section of the slit and the holes is designed with the aim of generating the Venturi effect; the end of the blowing head is a conducting air pipe, which penetrates between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner. In the supply chamber, the conducting air pipe is connected to the gas generation and pumping device; preferably, several blowing heads with the same or different processing ranges are provided to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece due to the rotation of the workpiece, ensuring the consistency of the whole plate processing.

[0037] The heating head in the present invention can be a device based on the principles of electrothermal or photothermal. The present invention preferably uses a photothermal principle device, and particularly preferably a device that generates laser by a semiconductor laser or a fiber laser and then projects it onto the workpiece surface to be absorbed by the surface substance to produce a photothermal effect. Preferably, a device that first shapes the light spot emitted by the laser source into a strip shape and then projects it onto the workpiece surface; the length of the heating head corresponds to its processing range. Preferably, several heating heads with the same or different processing ranges are provided to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece due to the rotation of the workpiece, ensuring the consistency of the whole plate processing.

[0038] 6. A multi-workpiece and multi-processing unit simultaneous processing structure for improving efficiency and supporting mass production

[0039] The present invention not only supports loading one workpiece with one workpiece fixture, but also the workpiece fixture can load sub-workpiece fixtures to load more workpieces simultaneously.

[0040] Take the fixture for loading workpieces as the main fixture, match or change the functions, internal shapes, and internal dimensions of the main fixture, and set a fixture that is smaller in external shape than the main fixture but can load multiple workpieces simultaneously as the sub-fixture to load multiple discrete workpieces for simultaneous processing. In this way, the main fixture can meet the requirements for processing large-format tools or large-format layout; the sub-fixture can meet the requirements for simultaneous processing of multiple discrete workpieces of small-format workpieces or small-format layout.

[0041] The present invention not only supports a single-unit processing structure in which a fixture for clamping a workpiece loads one workpiece or a sub-fixture for loading workpieces to load more workpieces simultaneously, but also can select a structure for simultaneous processing of multiple processing units with single bins, multiple bins, or a mixture of single bins and multiple bins, supporting mass production.

[0042] Multiple processing and supply units are provided in the processing bin and the supply bin. In a structure with multiple units in one bin, it can accommodate and support multiple fixtures for clamping workpieces for simultaneous processing, improving the production efficiency of the equipment; several single-unit processing bins, supply bins, and fixtures for clamping workpieces are connected together. In a structure with interconnected multiple single-unit bins, it can accommodate and support multiple fixtures for clamping workpieces for simultaneous processing, improving the production efficiency of the equipment; several structures with multiple units in one bin and structures with interconnected multiple single-unit bins are connected together to accommodate and support multiple fixtures for clamping workpieces for simultaneous processing, improving the production efficiency of the equipment.

[0043] The advantages and effects of the present invention are:

[0044] 1. The workpieces are placed vertically, and the processing effects on both sides of the workpieces are the same;

[0045] 2. The workpieces rotate continuously, and the processing effects on the top, bottom, left, and right of the workpieces are symmetrical;

[0046] 3. Liquid supply pipes and liquid collection pipes are provided to apply and suck liquid at a short distance, improving the etching ability and efficiency;

[0047] 4. Air blowing heads and heating heads are provided to remove liquid at a short distance, enabling energy-saving and efficient cleaning and drying of workpieces. Description of the Drawings

[0048] By describing the embodiments of the present application in more detail in conjunction with the drawings, the above and other objects, features, and advantages of the present application will become more obvious. The drawings are used to provide a further understanding of the embodiments of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation to the present application. In the drawings, the same reference numerals generally represent the same components or steps.

[0049] Figure 1 The front view of the etching equipment provided by an embodiment of the present application is shown.

[0050] Figure 2 As shownFigure 1 Schematic diagram of the internal structure of the etching equipment shown

[0051] Figure 3 As shown Figure 1 Schematic diagram of the internal structure of the etching equipment from another perspective shown

[0052] Figure 4 As shown Figure 1 Schematic diagram of the partial internal structure of the etching equipment shown

[0053] Figure 5 As shown Figure 1 Schematic diagram of the working principle of the etching process of the etching equipment shown

[0054] Figure 6 As shown Figure 1 Schematic diagram of the working principle of the drying process of the etching equipment shown

[0055] Figure 7 As shown Figure 1 Schematic diagram of the structure of the clamping fixture of the etching equipment shown

[0056] Reference numerals:

[0057] 1. Clamping fixture; 101. Main fixture; 102. Sub-fixture; 103. Card slot; 2. Workpiece; 3. Transmission chain; 4. Sprocket; 5. Fixed block; 6. Support rod; 7. Liquid collection pipe; 8. Sliding support block; 9. Liquid collection hole; 10. Heating head; 11. Air blowing head; 12. Liquid supply pipe; 13. Etching solution; 15. Main etching solution injection pipe; 16. Spent liquid; 17. Airflow; 18. Thermal energy; 19. Driving gear Detailed implementation manners

[0058] The present invention will be further described below in conjunction with implementation examples. The following implementation examples are illustrative and not restrictive, and the protection scope of the present invention cannot be limited by the following implementation examples

[0059] Figure 1 The front view of the etching equipment provided by an embodiment of the present application is shown Figure 2 As shown Figure 1 Schematic diagram of the internal structure of the etching equipment shown Figure 3 As shown Figure 1 Schematic diagram of the internal structure of the etching equipment from another perspective shown Figure 4 As shown Figure 1 Schematic diagram of the partial internal structure of the etching equipment shown Figure 5 As shown Figure 1 Schematic diagram of the working principle of the etching process of the etching equipment shown Figure 6 As shown Figure 1Schematic diagram of the working principle of the drying process of the etching equipment shown

[0060] As Figures 1 to 6 shown, an etching equipment for vertically placing and continuously rotating workpieces, with functions of close-range application, suction, blowing, and heating processing, consists of a processing chamber, a supply chamber, a clamping fixture 1 for clamping the workpiece 2, and a loading and unloading chamber; the processing chamber consists of an etching solution 13 and its accommodating structure, an etching solution injection main pipe 15, a driving gear 19, a liquid supply pipe 12, a liquid collection pipe 7, a blowing head 11, a heating head 10, etc.; the supply chamber includes an etching solution tank, a motor and its driving device for driving the driving gear and the conveying chain, a pumping device for close-range application and suction of the etching solution 13, a gas source and a heat source for blowing and heating, a pumping device for etching solution 13 injection, addition, and discharge, and an overall electronic control system for the movement control of the equipment, electronic and electrical components, software carriers, and the power supply of other components; the fixture for clamping the workpiece 2 has an inner square and an outer circle, and the outer edge is provided with teeth; during the processing, the workpiece 2 is vertically placed and continuously rotated. In addition to the injection main pipe applying the etching solution 13, the etching solution 13 is also applied and sucked at close range by the liquid supply pipe 12 and the liquid collection pipe 7 respectively, and high-speed gas and high-density heat energy 18 are also delivered at close range by the blowing head and the heating head 10; the loading and unloading chambers are respectively configured as processing chambers for necessary processing procedures before and after etching, which are similar to the structure of the etching processing chamber, and a manipulator can also be set to load and unload the workpiece 2 that has undergone necessary pre- and post-etching treatments; an isolation mechanism or an isolation area is provided at the interface between each chamber to dynamically realize the transportation and connection of objects, liquids, and gases.

[0061] A clamping fixture 1 for clamping the workpiece 2 made of a plate with an inner square and an outer circle is provided, and it is vertically placed after loading the workpiece 2; the outer contour of the fixture is a tooth-shaped circle symmetric about two sides, and together with the side walls clamped by the two surfaces, it forms teeth, serving as a driven wheel for meshing with the conveying chain to transfer the workpiece 2 in the equipment; the gear formed together with the side walls clamped by the two surfaces is also used for meshing with the teeth of the driving wheel to drive the workpiece 2 to rotate continuously; a disc plane part is provided at the outer edge of the inner-square and outer-circle fixture, and a circular protrusion is provided on this disc plane part. The top surface of the protrusion structure is smooth. In the case of uneven surface of the workpiece 2, it is used to limit the minimum distance between the liquid supply pipe 12, the liquid collection pipe 7 and the protruding part of the workpiece 2 surface, and to support the smooth movement of the liquid supply pipe 12, the liquid collection pipe 7, and the blowing head, ensuring that the liquid supply pipe 12, the liquid collection pipe 7, and the blowing head are as parallel to the workpiece 2 as possible in space.

[0062] A elastic structure for clamping the circuit board is provided between the outer frame and the inner frame of the clamping fixture 1 for clamping and fixing the workpiece 2.

[0063] An active gear that makes a rotational motion is provided, which is used to mesh with the outer edge teeth of the fixture to drive the workpiece 2 fixture and the workpiece 2 to rotate in place; the active gear is fixedly connected to a transmission shaft, and the transmission shaft penetrates between the processing chamber and the supply chamber of the equipment through a liquid seal structure; the part of the transmission shaft in the supply chamber is driven by a motor in the supply chamber to make a rotational motion, driving the active gear in the processing chamber to rotate, and then driving the fixture clamping the workpiece 2 to rotate, thereby driving the workpiece 2 to rotate.

[0064] Corresponding to the spatial position of the fixture, a liquid supply pipe 12 and a liquid collection pipe 7 are arranged at a short distance. Among them, the liquid supply pipe 12 is used to apply the etching solution 13 to the surface of the workpiece 2 with a certain pressure, so as to press the etching solution 13 liquid to the side walls and surfaces of the workpiece 2 with fine structures such as holes, depressions, and occlusions, thereby improving the processing ability without spatial dead corners for the concave-convex occlusion and other parts of the workpiece 2; the liquid collection pipe 7 has a suction effect, which is used to withdraw the etching solution 13 on the surface of the workpiece 2, especially in the area where the etching solution 13 is prone to stagnate and produce a pool effect in the middle of the geometric shape of the workpiece 2, as well as the etching solution 13 on the side walls and surfaces with fine structures such as holes, depressions, occlusions, and clamping nests, forming a local negative pressure area, promoting the microscopic exchange speed of the etching solution 13 at the working interface, and taking away the spent liquid 16, thereby improving the uniform etching ability of the entire surface of the etching process.

[0065] The liquid supply pipe 12 and the liquid collection pipe 7 are fixed in the processing chamber by an adjustable distance clamping structure, parallel to the vertically placed workpiece 2 fixture and the clamped workpiece 2, and pointing from the outer contour line of the fixture to the center of the outer edge contour line; the adjustable distance clamping structure consists of two parts. One part is the fixed part, which is fixedly connected to the processing chamber and is the support body of the adjustable part, and is a rod-shaped structure; the other part of the adjustable distance clamping structure is a position-adjustable support pipe sleeve, which is sleeved on the rod-shaped structure. For example, the support rod 6, one end of the support rod 6 is connected to the fixed block 5 arranged on the side wall of the processing chamber B; the surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece 2 fixture and the workpiece 2 it clamps; a release and locking structure is arranged between the position-adjustable support pipe sleeve and the rod-shaped structure to adjust its position on the rod-shaped structure; the inner contour and size of the pipe sleeve part of the position-adjustable support pipe sleeve match the outer contour and size of the liquid supply pipe 12 and the liquid collection pipe 7. After sleeving and clamping the liquid supply pipe 12 and the liquid collection pipe 7, by releasing and sliding its position on the rod-shaped structure and then locking, the parallel distance between the liquid supply pipe 12, the liquid collection pipe 7 and the workpiece 2 is adjusted, and the effects of applying the etching solution 13 to the surface of the workpiece 2 and sucking the etching solution 13 from the surface of the workpiece 2 are changed. A sliding support block 8 is arranged on the support rod 6 to connect and fix the liquid supply pipe or the liquid collection pipe.

[0066] The ends of the liquid delivery pipe 12 and the liquid collection pipe 7 are transfer liquid pipes, which penetrate between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner; in the supply chamber, the transfer liquid pipes are respectively connected to the pumping devices for application and suction; after the liquid delivery pipe 12 is connected to the liquid application pumping system and the etching solution tank through the transfer liquid pipe, it conveys and closely applies and distributes the etching solution 13 to the surface of the workpiece 2 in the processing chamber; after the liquid collection pipe 7 is connected to the liquid suction pumping system and the etching solution tank through the transfer liquid pipe, it sucks the etching solution 13 from the surface of the workpiece 2 in the processing chamber and returns the exhausted etching solution 13 that has played its role to the etching solution tank.

[0067] The lengths of the liquid delivery pipe 12 and the liquid collection pipe 7 correspond to their processing ranges. Slits are axially opened or holes are densely arranged in the liquid delivery and collection sections corresponding to their processing ranges for liquid spraying and suction; the cross-sections of the slits and holes have various forms, which can be single rectangular or trapezoidal, or segmented as rectangular connected to trapezoidal; different forms of the cross-sections of the slits and holes are suitable for different working conditions, realizing the ejection of liquid flows in the form of long strip knife edges or fans, or the suction of liquids in the form of direct suction or confluence; preferably, a number of liquid delivery pipes 12 and liquid collection pipes 7 with the same or different processing ranges are provided to match and compensate for the processing effect differences caused by the different linear velocities of each area in the radial direction of the rotating workpiece 2, ensuring the consistency of the whole plate processing.

[0068] Corresponding to the spatial position of the fixture, the air blowing head and the heating head 10 are closely arranged. Among them, the air blowing head is used to deliver a high-speed gas flow along the surface of the workpiece 2 to form a long strip air knife, generating negative pressure to achieve the effect of taking the liquid away from the surface of the workpiece 2, thereby enhancing the liquid drainage effect without spatial dead corners for the concave and convex parts of the workpiece 2; the heating head 10 is used to deliver high-density heat energy 18 perpendicular to the surface of the workpiece 2 to form a long strip heat knife, thermally interacting with the material to heat, vaporize and dry the material on the surface of the workpiece 2, thereby enhancing the cleaning and drying treatment ability of the workpiece 2.

[0069] The blowing head and the heating head 10 are fixed in the processing chamber by an adjustable-distance clamping structure, parallel to the workpiece 2 fixture placed vertically and the clamped workpiece 2, and pointing from the outer contour line of the fixture to the center of the outer edge contour line. The adjustable-distance clamping structure consists of two parts. One part is the fixed part, fixedly connected to the processing chamber, which is the support body of the adjustable part and is in a rod shape. The other part of the adjustable-distance clamping structure is the support tube sleeve whose position can be adjusted. The support tube sleeve is sleeved on the rod-shaped structure. The surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece 2 fixture and the workpiece 2 clamped thereon. A release and locking structure is provided between the support tube sleeve whose position can be adjusted and the rod-shaped structure to adjust its position on the rod-shaped structure. After the tube sleeve part of the support tube sleeve whose position can be adjusted is fixedly connected to the blowing head and the heating head 10 tube, by releasing and sliding its position on the rod-shaped structure and then locking it, the parallel distance between the blowing head, the heating head 10 and the workpiece 2 is adjusted, and the effects of delivering gas along the surface of the workpiece 2 and delivering heat energy 18 perpendicular to the surface of the workpiece 2 are changed.

[0070] The length of the blowing head corresponds to its processing range. A slit is axially opened in the blowing head corresponding to its processing range, or holes are densely arranged, for ejecting high-speed gas. In order to achieve the effect of ejecting a high-speed gas flow in the shape of a long blade along the surface of the workpiece 2 to generate negative pressure to carry away the liquid, the cross-section of the slit and the holes is designed to achieve the Venturi effect. The end of the blowing head is a conducting air pipe, which penetrates between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner. In the supply chamber, the conducting air pipe is connected to the gas generation and pumping device. Preferably, several blowing heads with the same or different processing ranges are provided to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece 2 during rotation, and to ensure the consistency of the whole-board processing.

[0071] The heating head 10 can be a device based on the principles of electrothermal or photothermal. Preferably, it is a photothermal principle device, and particularly preferably a device that generates laser by a semiconductor laser or a fiber laser and then projects it onto the surface of the workpiece 2 to cause photothermal action by being absorbed by the surface substance. Preferably, a device that first shapes the light spot emitted by the laser source into a strip shape and then projects it onto the surface of the workpiece 2. The length of the heating head 10 corresponds to its processing range. Preferably, several heating heads 10 with the same or different processing ranges are provided to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece 2 during rotation, and to ensure the consistency of the whole-board processing.

[0072] A chain that moves in a cycle is provided at the top of the processing chamber and the loading and unloading chambers, which is used to convert rotational motion into linear motion and convey the fixture holding the workpiece 2 to different positions. The structure of the chain matches the tooth profile of the passive gear formed by the fixture of the workpiece 2, and its two ends are fixed and meshed by gears driven by a transmission motor, and is controlled by the motion control system of the equipment. The conveying chain is fixedly installed and runs through the processing chamber and the loading and unloading chambers. At the interface where the conveying chain passes between the chambers, a free baffle curtain is provided to reduce the cross-flow of materials between the chambers.

[0073] Figure 7 As shown in Figure 1 the structural schematic diagram of the clamping fixture of the etching equipment shown.

[0074] As Figure 7 shown, take the fixture loading the workpiece 2 as the main fixture 101, match or change the function, inner structure, and inner size of the main fixture, and set a fixture that is smaller in outer shape than the main fixture but can load multiple workpieces 2 at the same time as the sub-fixture 102 to load multiple discrete workpieces 2 and process them simultaneously. Optionally, the main fixture 101 is provided with a card slot 103 for connecting the sub-fixture 102.

[0075] Multiple processing and supply units are provided in the processing chamber and the supply chamber. In the structure of multiple units in one chamber, it can accommodate and support multiple fixtures clamping the workpiece 2 and process them simultaneously to improve the production efficiency of the equipment. Connect several single-unit processing chambers, supply chambers, and fixtures clamping the workpiece 2 together. In the interconnected structure of multiple single-unit chambers, it can accommodate and support multiple fixtures clamping the workpiece 2 and process them simultaneously to improve the production efficiency of the equipment. Connect several structures of multiple units in one chamber and the interconnected structure of multiple single-unit chambers together to accommodate and support multiple fixtures clamping the workpiece 2 and process them simultaneously to improve the production efficiency of the equipment.

[0076] The technical solutions of the present application will be further elaborated below in conjunction with some specific embodiments. It should be noted that these specific embodiments are only for the convenience of those skilled in the art to better understand the technical solutions of the present application and should not be regarded as an inappropriate limitation of the protection scope of the present application.

[0077] Embodiment 1

[0078] The workpiece to be processed in this embodiment is a circuit board in-process product to be subjected to an etching process. The original copper thickness of this in-process product is 70 microns, and the overall copper thickness is 95 microns after full-plate electroplating thickening. Using a traditional horizontal acid etching line body, the line width error on the upper and lower surfaces is usually about 100 microns, the average undercut width on the upper and lower surfaces is about 50 microns, and the etching time is usually about 10 minutes. In this embodiment, an etching equipment with the functions of vertically placing and continuously rotating the workpiece, and applying, sucking, blowing, and heating processing at close range is used, and it can easily achieve a line width error of 20 microns on both sides, an undercut width of 10 microns, and an etching time of about 2 minutes, which is significantly better than the traditional mode. Its specific implementation plan is as follows:

[0079] Step 1: Complete all processes before the acid etching of the double-sided board according to the traditional processing technology, including all processes such as drilling, copper deposition, full-board electroplating, pattern transfer, and development.

[0080] Step 2: Fix the work-in-progress at the center of the clamping fixture with an inner square and outer circle, and fix it well. The clamping fixture reaches the reference position of the processing chamber vertically through the transmission chain.

[0081] Step 3: The clamping fixture starts to rotate driven by the driving gear, and the edge rotation linear velocity is 10 m / min. At the same time, the spray main pipe starts to spray liquid at a pressure of 3 kg / cm2. The 1 mm * 5 mm square slits evenly distributed on the liquid delivery pipe that closely adheres to the surface of the work-in-progress and diverges from the center spray the etching solution at a pressure of 10 kg / cm2 at a short distance. The round holes with a diameter of 1 mm and a spacing of 5 mm on the liquid collection pipe with the same distribution suck in the etching solution at a negative pressure of 8 kg / cm2 at a short distance.

[0082] Step 4: After etching for 2 minutes, stop rotation and spraying. Observe through the observation window whether the etching is clean. If it is not clean, it can be etched again for about 0.5 minutes. After complete etching, stagnate and drip water for 1 minute. The clamping fixture automatically reaches other processes such as subsequent water washing and film removal through the transmission chain. The water washing, film removal, etc. can also be continuously completed by the same vertical rotation equipment.

[0083] Example 2

[0084] The workpiece to be processed in this example is a work-in-progress circuit board to be subjected to black hole processing. The purpose of black hole processing is to coat an initial conductive layer inside the holes before electroplating, providing the conductive ability and the base for the subsequent electroplating copper thickening. The work-in-progress is a double-sided FR4 circuit board with a thickness of 2.4 mm and a minimum hole of 0.2 mm. For products with a thickness-to-diameter ratio reaching 12 times, the greatest risk is the voids inside the holes after electroplating. The traditional black hole process in circuit board factories can usually achieve 8 times, and the yield rate for 12 times is usually lower than 30%. And even for the metallized holes that are conductive, there are many dot-shaped voids on the hole walls. In this example, a black hole device with the functions of vertically placing and continuously rotating the workpiece, and applying, sucking, blowing, and heating at a short distance is used, and it is easy to achieve a yield rate of more than 95%, and there are very few dot-shaped voids on the hole walls, which are basically difficult to find. In addition, in order to improve efficiency in this example, this example also adopts the method of mounting four sub-fixtures at equal distances around the main fixture. The specific implementation plan is as follows:

[0085] Step 1: Complete all processes before black hole processing according to the traditional processing technology, including processes such as drilling and deburring.

[0086] Step 2: Fix the work-in-progress at the center of the clamping fixture with an inner square and outer round shape and fix it firmly. The clamping fixture reaches the reference position of the processing chamber vertically through the conveyor chain.

[0087] Step 3: The clamping fixture rotates at an edge linear speed of 1 m / min. At the same time, the main spraying pipe sprays liquid at a pressure of 3 kg / cm2. On the liquid supply pipes arranged in a central divergent pattern, there are round holes with a diameter of 2 mm, and the spacing between the round holes is inversely proportional to the distance from the center, that is, the spacing of the round holes gradually becomes denser from the center to the edge. The black hole liquid is sprayed at a pressure of 5 kg / cm2 at a short distance, and the round holes with a diameter of 2 mm on the liquid collection pipes with the same spacing absorb the black hole liquid at a negative pressure of 8 kg / cm2 at a short distance.

[0088] Step 4: After the main spraying pipe, the liquid supply pipes and the liquid collection pipes work continuously for 2 minutes, stop spraying and liquid supply, and automatically turn on the air blowing head and the heating head. The air outlet of the air blowing head is a slit with a length close to the diameter of the clamping fixture, and the slit width is proportional to the distance from the center point, that is, wider on the outside and narrower at the center, and its average wind speed is 70 m / s. The heat dissipation holes of the heating head are basically close to those of the air blowing head, and the laser used is a semiconductor blue laser with a power of 1000W.

[0089] Step 5: After blowing and heating for 2 minutes, change back to the spraying, liquid supply and liquid collection mode again, and the processing parameters are the same as those in Step 3.

[0090] Step 6: After the spraying, liquid supply and liquid collection mode operates for 1 minute, change back to the blowing and heating mode again. [[ID=?]]

[0091] Step 7: After the blowing and heating mode operates for 2 minutes, complete the black hole process operation. The work-in-progress is conveyed to the blanking chamber through the chain and waits for the subsequent direct electroplating operation.

[0092] The air blowing and heating device of this embodiment can more thoroughly remove the water droplets inside the carbon film layer, facilitate the filling of the voids by copper atoms during the electroplating process and the integrated growth with carbon atoms, improve the bonding force of the coating, and at the same time reduce the resistance of the coating. Repeatedly performing spraying and drying twice in this embodiment is beneficial to further improve the reliability and the yield rate.

Claims

1. An etching device for vertically placing and continuously rotating a workpiece, with functions of applying, sucking, blowing, and heating at a short distance, characterized in that: It consists of a processing chamber, a supply chamber, a fixture for clamping the workpiece, and a loading and unloading chamber; the processing chamber consists of an etching solution and its accommodating structure, a main etching solution injection pipe, a driving gear, a liquid supply pipe, a liquid collection pipe, a blowing head, and a heating head; the supply chamber includes an etching solution tank, a motor and its driving device for driving the driving gear and the conveying chain, a pumping device for the close application and suction of the etching solution, a gas source and a heat source for blowing and heating, a pumping device for the injection, addition, and discharge of the etching solution, and an overall electronic control system for the motion control, electronic and electrical components, software carrier, and power supply of the equipment; the fixture for clamping the workpiece has an inner square and an outer circle, and the outer edge is provided with teeth; during the processing, the workpiece is placed vertically and rotates continuously. In addition to the main injection pipe applying the etching solution, the etching solution is also closely applied and sucked by the liquid supply pipe and the liquid collection pipe respectively, and the blowing head and the heating head also deliver gas and heat energy; a manipulator is also provided for loading and unloading the workpiece before and after etching; an isolation mechanism or an isolation area is provided at the interface between each chamber to dynamically realize the transportation and connection of objects, liquids, and gases.

2. The etching equipment for vertically placing and continuously rotating workpieces with functions of applying, sucking, blowing, and heating at close range according to claim 1, characterized in that: A fixture for clamping the workpiece made of a plate with an inner square and an outer circle is provided. After loading the workpiece, it is placed vertically; the outer contour of the fixture is a tooth-shaped circle symmetrical on both sides, and together with the side walls clamped between the two surfaces, it forms teeth, serving as a driven gear for meshing with the conveying chain to transfer the workpiece inside the equipment; the gear formed together with the side walls clamped between the two surfaces is also used for meshing with the teeth of the driving wheel to drive the workpiece to rotate continuously; a disc plane part is provided at the outer edge of the inner-square and outer-circle fixture, and a circular protrusion is provided on this disc plane part. The top surface of the protrusion structure is smooth. In the case of uneven workpiece surface, it is used to limit the minimum distance between the liquid supply pipe, the liquid collection pipe and the protruding part of the workpiece surface, and to support the smooth movement of the liquid supply pipe, the liquid collection pipe, and the blowing head, ensuring that the liquid supply pipe, the liquid collection pipe, and the blowing head are parallel to the workpiece in space. Preferably, an elastic structure for clamping the circuit board is provided between the outer frame and the inner frame of the fixture for clamping and fixing the workpiece.

3. The etching equipment for vertically placing and continuously rotating workpieces with functions of applying, sucking, blowing, and heating at close range, as claimed in claim 1, is characterized in that: A driving gear that makes a rotational motion is provided, which is used for meshing with the teeth on the outer edge of the fixture to drive the workpiece fixture and the workpiece to rotate in place; the driving gear is fixedly connected to the transmission shaft, and the transmission shaft passes through the processing chamber and the supply chamber of the equipment through a liquid seal structure; the part of the transmission shaft in the supply chamber is driven by a motor in the supply chamber to make a rotational motion, driving the driving gear in the processing chamber to rotate, and then driving the fixture for clamping the workpiece to rotate, thereby driving the workpiece to rotate.

4. The etching equipment for vertically placing and continuously rotating workpieces, with functions of applying, sucking, blowing, and heating at close range, as claimed in claim 1, wherein: Corresponding to the spatial position of the fixture, the liquid supply pipe and the liquid recovery pipe are arranged at a short distance. The liquid supply pipe is used to apply the etching solution to the surface of the workpiece with a certain pressure, so as to press the etching solution to the side walls and the surface of the workpiece with holes, depressions, and shielded microstructures, thereby improving the processing ability without spatial dead corners for the concave-convex and shielded parts of the workpiece; the liquid recovery pipe has a suction effect, and is used to withdraw the etching solution that is prone to retention and produce a pool effect in the middle of the surface of the workpiece and the geometric shape of the workpiece, as well as the etching solution on the side walls and the surface with holes, depressions, shields, and clamping grooves microstructures, forming a local negative pressure area to promote the microscopic exchange speed of the etching solution at the working interface, thereby improving the uniform etching ability of the entire surface of the etching process; Preferably, the liquid supply pipe and the liquid recovery pipe are fixed in the processing chamber by an adjustable distance clamping structure, parallel to the workpiece fixture placed vertically and the clamped workpiece, and pointing from the outer contour line of the fixture to the center of the outer edge contour line; the adjustable distance clamping structure consists of two parts. One part is the fixed part, which is fixedly connected to the processing chamber and is the support body of the adjustable part, and is a rod-shaped structure; the other part of the adjustable distance clamping structure is a support pipe sleeve with an adjustable position, and the support pipe sleeve is sleeved on the rod-shaped structure; the surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece fixture and the workpiece it clamps; a release and locking structure is provided between the support pipe sleeve with an adjustable position and the rod-shaped structure to adjust its position on the rod-shaped structure; the inner contour dimension of the pipe sleeve part of the support pipe sleeve with an adjustable position matches the outer contour dimensions of the liquid supply pipe and the liquid recovery pipe. After sleeving and clamping the liquid supply pipe and the liquid recovery pipe, by releasing and sliding its position on the rod-shaped structure and then locking, the parallel distance between the liquid supply pipe, the liquid recovery pipe and the workpiece is adjusted, and the effects of applying the etching solution to the workpiece surface and sucking the etching solution from the workpiece surface are changed; Preferably, the ends of the liquid supply pipe and the liquid recovery pipe are transfer liquid pipes, which penetrate between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner; in the supply chamber, the transfer liquid pipes are respectively connected to the pumping devices for application and suction; after the liquid supply pipe is connected to the liquid application pumping system and the etching solution tank through the transfer liquid pipe, it conveys and applies and distributes the etching solution to the surface of the workpiece in the processing chamber at a short distance; after the liquid recovery pipe is connected to the liquid suction pumping system and the etching solution tank through the transfer liquid pipe, it sucks the etching solution from the surface of the workpiece in the processing chamber and returns the exhausted etching solution that has played its role to the etching solution tank; Preferably, the lengths of the liquid supply pipe and the liquid recovery pipe correspond to their processing ranges. Slits or densely arranged holes are axially opened in the liquid supply section and the liquid recovery section corresponding to their processing ranges for spraying and sucking liquid; the cross-sections of the slits and holes are single rectangles or trapezoids, or are segmented into rectangles connected to trapezoids; different forms of the cross-sections of the slits and holes are suitable for different working conditions, realizing spraying liquid flows in the form of long strip knife shapes and fans, or sucking liquid in the form of direct suction and confluence; preferably, a number of liquid supply pipes and liquid recovery pipes with the same or different processing ranges are set to match and compensate for the processing effect differences caused by the different linear velocities of each region in the radial direction of the workpiece due to the rotation of the workpiece, and ensure the consistency of the whole plate processing.

5. The etching equipment for vertically placing and continuously rotating workpieces with functions of close-range application, suction, blowing, and heating processing according to claim 1, characterized in that: The air blowing head and the heating head are arranged corresponding to the spatial position of the fixture. Among them, the air blowing head is used to deliver a gas flow along the surface of the workpiece, forming a strip-shaped air knife, generating negative pressure, so as to achieve the effect of taking the liquid away from the surface of the workpiece, thereby improving the liquid drainage effect without spatial dead angles in the concave-convex and shielded parts of the workpiece; the heating head is used to deliver heat energy perpendicular to the surface of the workpiece, forming a strip-shaped hot knife, and having a thermal interaction with the material to heat, vaporize and dry the material on the surface of the workpiece, thereby improving the cleaning and drying treatment ability of the workpiece. Preferably, the air blowing head and the heating head are fixed in the processing chamber by a clamping structure with adjustable distance, parallel to the workpiece fixture placed vertically and the workpiece clamped, and pointing from the outer contour line of the fixture to the center of the outer edge contour line; the clamping structure with adjustable distance consists of two parts. One part is the fixed part, fixedly connected to the processing chamber, which is the support body of the adjustable part and is a rod-shaped structure; the other part of the clamping structure with adjustable distance is a support sleeve with adjustable position, and the support sleeve is sleeved on the rod-shaped structure; the surface of the rod-shaped structure is smooth and perpendicular to the direction of the workpiece fixture and the workpiece clamped by it; a release and locking structure is arranged between the support sleeve with adjustable position and the rod-shaped structure to adjust its position on the rod-shaped structure; after the sleeve part of the support sleeve with adjustable position is fixedly connected to the air blowing head and the heating head tube, by releasing and sliding its position on the rod-shaped structure and then locking, the parallel distance between the air blowing head, the heating head and the workpiece is adjusted, and the effects of delivering gas along the surface of the workpiece and delivering heat energy perpendicular to the surface of the workpiece are changed.

6. The etching equipment for vertically placing and continuously rotating workpieces with functions of applying, sucking, blowing, and heating at close range according to claim 1, characterized in that: The length of the air blowing head corresponds to its processing range. A slit is opened axially on the air blowing head corresponding to its processing range, or holes are densely arranged, for jetting gas; the cross-section of the slit and the holes is a Venturi structure to achieve the effect of jetting a high-speed gas flow in the shape of a long strip knife edge along the surface of the workpiece and generating negative pressure to take away the liquid; the end of the air blowing head is a conduction air pipe, which penetrates between the processing chamber and the supply chamber of the equipment in a liquid-tight installation manner. In the supply chamber, the conduction air pipe is connected to the gas generation and pumping device; preferably, a number of air blowing heads with the same or different processing ranges are arranged to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece due to the rotation of the workpiece, and to ensure the consistency of the whole plate processing.

7. The etching equipment for vertically placing and continuously rotating workpieces with functions of applying, sucking, blowing, and heating at close range according to claim 1, characterized in that: The heating head is a device based on the principle of electrothermal or photothermal; preferably, the heating head is a device based on the principle of photothermal; preferably, the heating head is a semiconductor laser or a fiber laser, which is a device that generates laser and projects it on the surface of the workpiece to be absorbed by the surface material to generate a photothermal effect; preferably, a device that first shapes the light spot sent out by the laser source into a strip shape and then projects it on the surface of the workpiece; the length of the heating head corresponds to its processing range; preferably, a number of heating heads with the same or different processing ranges are arranged to match and compensate for the difference in processing effects caused by the different linear velocities of each area in the radial direction of the workpiece due to the rotation of the workpiece, and to ensure the consistency of the whole plate processing.

8. The etching equipment for vertically placing and continuously rotating workpieces with functions of applying, sucking, blowing, and heating at close range according to claim 1, characterized in that: A chain with circular motion is provided at the top of the processing bin and the loading and unloading bin, which is used to convert rotational motion into linear motion and convey the fixture loaded with workpieces to different positions; the structure of the chain matches the tooth profile of the passive gear formed by the workpiece fixture, and its two ends are fixed and engaged by the gears driven by the transmission motor, and is controlled by the motion control system of the equipment; the conveying chain is fixedly installed and runs through the processing bin and the loading and unloading bin, and at the interface where the conveying chain passes between the bins, a free baffle curtain is provided to reduce the cross-flow of materials between the bins.

9. The etching equipment for vertically placing and continuously rotating workpieces with functions of close-range application, suction, blowing, and heating processing according to claim 1, characterized in that: Take the fixture loaded with workpieces as the main fixture, match or change the functions, internal structure, and internal dimensions of the main fixture, and set a fixture that is smaller in external shape than the main fixture but can load multiple workpieces at the same time as the sub-fixture to load multiple discrete workpieces for simultaneous processing.

10. The etching equipment for vertically placing and continuously rotating workpieces with functions of close-range application, suction, blowing, and heating processing according to claim 1, characterized in that: Multiple processing and supply units are provided in the processing bin and the supply bin. With the structure of multiple units in one bin, it can accommodate and support multiple fixtures for clamping workpieces for simultaneous processing to improve the production efficiency of the equipment; or connect several single-unit processing bins, supply bins, and fixtures for clamping workpieces together in the structure of interconnected multiple single-unit bins to accommodate and support multiple fixtures for clamping workpieces for simultaneous processing to improve the production efficiency of the equipment; or connect several structures of multiple units in one bin and interconnected multiple single-unit bins together to accommodate and support multiple fixtures for clamping workpieces for simultaneous processing to improve the production efficiency of the equipment.

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