Liquid ejecting system

Abstract

The invention provides a liquid discharge system which appropriately and easily determines the waveform of a drive signal for driving a piezoelectric element. The liquid ejection system includes a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head has a nozzle. A piezoelectric element driven by being supplied with a drive signal; a vibration plate that vibrates by being driven by the piezoelectric element; a pressure chamber which is filled with ink and to which pressure for ejecting the ink from the nozzle is applied by vibration of the vibration plate; and a detection circuit that detects residual vibration of the vibration plate after the piezoelectric element is driven. The transmission control unit transmits, to the server, residual vibration information indicating the residual vibration detected by the detection circuit. The reception control unit receives, from the server, adjustment information that is generated on the basis of the residual vibration indicated by the residual vibration information and that is used to adjust the waveform of the drive signal.

Description

Technical Field

[0001] The present invention relates to a liquid ejection system. Background Art

[0002] There is known a liquid ejection device that ejects a liquid such as ink from a nozzle by using a piezoelectric element to print an image. For example, the liquid ejection device has a liquid ejection head that vibrates a diaphragm forming part of a pressure chamber by using a piezoelectric element, thereby ejecting the liquid filled in the pressure chamber from the nozzle. Here, as parameters for determining the waveform of a drive signal for driving the piezoelectric element, parameters related to the operation state of the ink, such as the natural vibration period of the pressure chamber, are known. Further, for example, the natural vibration period of the pressure chamber is determined by the shape of the pressure chamber, etc., and due to the assembly accuracy during the manufacture of the liquid ejection head and the dimensional accuracy of the components, there are variations in each liquid ejection head. The variation in the natural vibration period of the pressure chamber causes a variation in the ejection characteristics of the liquid. Therefore, for example, in the method for manufacturing a recording head disclosed in Patent Document 1, the natural vibration period is measured for each assembled recording head, and the recording head is classified into any one of a plurality of grades based on the measured natural vibration period. The grade of the natural vibration period corresponding to the recording head is used, for example, to determine the waveform of the drive signal for driving the piezoelectric element.

[0003] However, for parameters related to the operation state of the ink, such as the natural vibration period of the pressure chamber, in addition to deviations caused by manufacturing deviations of the liquid ejection head, they also vary depending on the usage conditions of the liquid ejection head. For example, parameters related to the operation state of the ink also vary depending on ink conditions such as the type of ink. Here, for example, consider a business model in which a head manufacturer that manufactures a liquid ejection head sells it to a printing apparatus manufacturer, and the printing apparatus manufacturer assembles a liquid ejection device. In this business model, in most cases, the usage conditions of the liquid ejection head, such as ink conditions, are determined not by the head manufacturer but by the printing apparatus manufacturer. When the head manufacturer assembles it into the liquid ejection device, since the head manufacturer also determines the usage conditions, the natural vibration period can be specifically specified. In contrast, in the above business model, at the stage where the head manufacturer manufactures and sells the liquid ejection head, it may not be possible for the head manufacturer to appropriately specifically specify the natural vibration period. In this case, it is difficult for the head manufacturer to determine the waveform of an appropriate drive signal based on the natural vibration period. Therefore, in the above business model, the printing apparatus manufacturer needs to determine the waveform of an appropriate drive signal based on the natural vibration period by itself, which may impose a relatively large burden on the printing apparatus manufacturer. Therefore, in the above business model, it is desired to be able to appropriately and easily determine the waveform of the drive signal for driving the piezoelectric element. In addition, even if the manufacturer of the liquid ejection device and the manufacturer of the liquid ejection head have the same business model, it is desired to be able to appropriately and easily determine the waveform of the drive signal for driving the piezoelectric element, although the degree is relatively small. Also consider the case where a user independently sets usage conditions different from those originally envisioned by the manufacturer of the liquid ejection head or the liquid ejection device, and the same problem will arise in this case.

[0004] Patent Document 1: Japanese Patent Application Laid-Open No. 2004-351703 Summary of the Invention

[0005] To solve the above problems, a liquid ejection system according to the present invention includes a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head includes: a nozzle; a piezoelectric element that is driven by being supplied with a drive signal; a vibration plate that vibrates by driving of the piezoelectric element; a pressure chamber that is filled with a liquid and is applied with a pressure for ejecting the liquid from the nozzle by vibration of the vibration plate; a detection unit that detects residual vibration of the vibration plate after driving of the piezoelectric element. The transmission control unit transmits residual vibration information indicating the residual vibration detected by the detection unit to a server, and the reception control unit receives adjustment information generated based on the residual vibration indicated by the residual vibration information from the server and used for adjusting the waveform of the drive signal. BRIEF DESCRIPTION OF THE DRAWINGS

[0006] Figure 1 FIG. 1 is a block diagram showing an example of the structure of a liquid ejection system according to an embodiment of the present invention.

[0007] Figure 2 FIG. 2 is a diagram showing an example of the structure of a server.

[0008] Figure 3 FIG. 3 is a schematic structural diagram of a liquid ejection device.

[0009] Figure 4 FIG. 4 is an exploded perspective view of a liquid ejection head.

[0010] Figure 5 FIG. 5 is a Figure 4 cross-sectional view taken along line III-III shown in FIG.

[0011] Figure 6 FIG. 6 is a block diagram showing an example of the structure of a liquid ejection head.

[0012] Figure 7 FIG. 7 is a timing diagram showing an example of the operation of the liquid ejection device during a unit period.

[0013] Figure 8 FIG. 8 is a diagram for explaining adjustment information for adjusting the waveform of a drive signal.

[0014] Figure 9 FIG. 9 is a diagram showing an example of the waveform of a residual vibration signal.

[0015] Figure 10 FIG. 10 is a diagram for explaining differences in the waveform of the residual vibration signal caused by the usage conditions of the liquid ejection head.

[0016] Figure 11 FIG. 11 is a diagram showing an example of the operation of the liquid ejection system when adjusting the waveform of the drive signal.

[0017] Figure 12 FIG. 12 is a diagram showing another example of the operation of the liquid ejection system when adjusting the waveform of the drive signal. DETAILED DESCRIPTION OF THE INVENTION

[0018] Hereinafter, a mode for carrying out the present invention will be described with reference to the drawings. However, in each drawing, the dimensions and scales of the respective parts are appropriately different from the actual situation. In addition, although the embodiments described below are preferred specific examples of the present invention and are thus subject to various technically preferred limitations, the scope of the present invention is not limited to these modes as long as there is no description to the contrary specifically limiting the present invention in the following description.

[0019] 1. Embodiment

[0020] First, while referring to Figure 1 , an overview of the liquid ejection system SYS according to this embodiment will be described. In this embodiment, as an example, it is assumed that the liquid ejection device 100 included in the liquid ejection system SYS is an inkjet printer that ejects ink onto a medium PP to form an image. In this embodiment, as the medium PP, the recording paper shown in Figure 3 described later is assumed.

[0021] Figure 1 FIG. is a block diagram showing an example of the structure of the liquid ejection system SYS according to the embodiment of the present invention. The liquid ejection system SYS includes, for example, a liquid ejection device 100, a display device 120, and a server 200 communicably connected to the liquid ejection device 100. In addition, the liquid ejection system SYS may be defined as not including one or both of the display device 120 and the server 200.

[0022] In the liquid ejection device 100, for example, print data IMG representing an image that the liquid ejection device 100 should form is supplied from a host computer such as a personal computer or a digital camera. The liquid ejection device 100 performs a printing process of forming the image represented by the print data IMG supplied from the host computer on the medium PP.

[0023] The liquid ejection device 100 includes a liquid ejection head 1 provided with an ejection portion D including nozzles N for ejecting ink, a drive signal generation unit 2 that generates a plurality of drive signals COM for driving the ejection portion D, and a generation circuit 3 that generates residual vibration information Vinf described later. In addition, regarding the nozzles N, it will be described later in Figure 4 and Figure 5 . Further, the liquid ejection device 100 includes a control unit 4 that controls each part of the liquid ejection device 100, a storage unit 5 that stores various information such as the print data IMG and the control program PG1 of the liquid ejection device 100, and a communication unit 6 for communicating with other devices. Further, the liquid ejection device 100 includes a maintenance unit 7 that performs a maintenance process of the liquid ejection head 1, a medium conveyance mechanism 8 that conveys the medium PP, a carriage conveyance mechanism 9 that reciprocates the carriage 91, and an ink container CT that stores ink. In addition, regarding the carriage 91, it will be described later in Figure 3 . Ink is an example of a "liquid".

[0024] In addition, in the present embodiment, it is assumed that the liquid ejection head 1 and the drive signal generation unit 2 correspond to each other, and the liquid ejection head 1 and the generation circuit 3 correspond to each other. For example, the liquid ejection device 100 may also include a plurality of liquid ejection heads 1, a plurality of drive signal generation units 2, and a plurality of generation circuits 3. In this case, for example, the plurality of drive signal generation units 2 correspond one-to-one with the plurality of liquid ejection heads 1, and the plurality of generation circuits 3 correspond one-to-one with the plurality of liquid ejection heads 1. Alternatively, the liquid ejection device 100 may also include one liquid ejection head 1, one drive signal generation unit 2 corresponding to the liquid ejection head 1, and one generation circuit 3 corresponding to the liquid ejection head 1.

[0025] In the present embodiment, it is assumed that the liquid ejection device 100 includes four liquid ejection heads 1 corresponding to four types of inks, namely cyan, magenta, yellow, and black, respectively. That is, in the present embodiment, it is assumed that the liquid ejection device 100 includes four liquid ejection heads 1, four drive signal generation units 2, and four generation circuits 3. However, hereinafter, for the sake of convenience of explanation, as Figure 1 illustrated, sometimes the description will focus on one liquid ejection head 1 among the four liquid ejection heads 1 and one drive signal generation unit 2 corresponding to the one liquid ejection head 1.

[0026] First, before explaining the liquid ejection head 1, the control unit 4, the drive signal generation unit 2, the storage unit 5, and the communication unit 6 will be explained.

[0027] The control unit 4 is configured to include one or more CPUs (Central Processing Unit). In addition, the control unit 4 may also be configured to include a programmable logic device such as an FPGA (field-programmable gate array) instead of, or in addition to, the CPU. Furthermore, for example, the control unit 4 operates by following the control program PG1 stored in the storage unit 5, thereby generating signals such as a print signal SI and a waveform designation signal dCOM for controlling the operation of each part of the liquid ejection device 100.

[0028] Here, the waveform designation signal dCOM is a digital signal that defines the waveforms of the plurality of drive signals COM. In addition, each drive signal COM is an analog signal for driving the ejection unit D. In the present embodiment, as described later Figure 6As shown in the like, it is assumed that a plurality of drive signals COM include drive signals COMa and COMb. Further, the printing signal SI is a digital signal for designating the type of operation of the ejection unit D. Specifically, the printing signal SI is a signal for designating the type of operation of the ejection unit D by designating whether each drive signal COM is supplied to the ejection unit D.

[0029] Further, in the present embodiment, the control unit 4 operates by following the control program PG1 stored in the storage unit 5, and functions as a processing control unit 40, a transmission control unit 42, and a reception control unit 44. In addition, the processing control unit 40 is an example of an "accepting unit". The processing control unit 40, the transmission control unit 42, and the reception control unit 44 execute, for example, processing for adjusting the waveform of the drive signal COM. For example, the transmission control unit 42 transmits the residual vibration information Vinf generated by the generation circuit 3 to the server 200 via the communication unit 6. Further, for example, the reception control unit 44 receives the adjustment information Ainf for adjusting the waveform of the drive signal COM from the server 200 via the communication unit 6. The detailed contents of the operations of the processing control unit 40, the transmission control unit 42, and the reception control unit 44 will be described in Figure 11 and Figure 12 will be described.

[0030] For example, the drive signal generation unit 2 includes, for example, a DAC (Digital Analog Converter), and generates a plurality of drive signals COM based on the waveform designation signal dCOM supplied from the control unit 4. For example, each of the plurality of drive signals COM generated by the drive signal generation unit 2 includes a waveform specified by the waveform designation signal dCOM. The drive signal generation unit 2 outputs the plurality of drive signals COM generated based on the waveform designation signal dCOM to the switching circuit 18 included in the liquid ejection head 1. In addition, the waveform specified by the waveform designation signal dCOM is, for example, a waveform adjusted based on the adjustment information Ainf.

[0031] The storage unit 5 is configured to include one or both of volatile memories such as RAM (Random Access Memory) and non-volatile memories such as ROM (Read Only Memory), EEPROM (Electrically Erasable Programmable Read-Only Memory), or PROM (Programmable ROM). Additionally, the storage unit 5 may be included in the control unit 4.

[0032] The communication unit 6 is hardware for communicating with other devices such as the server 200. For example, under the control implemented by the control unit 4, the communication unit 6 communicates with the server 200 via a network NW such as a LAN (Local Area Network), WAN (Wide Area Network), and the Internet. The communication unit 6 is also referred to as, for example, a network device, network controller, network card, or communication module.

[0033] The liquid ejection head 1 includes a switching circuit 18, a recording head 10, and a detection circuit 19. The detection circuit 19 is an example of a "detection unit".

[0034] The recording head 10 has M ejection units D. In the present embodiment, it is assumed that the value of M is an even number of 2 or more. Hereinafter, the m-th ejection unit D among the M ejection units D provided in the recording head 10 may be referred to as the ejection unit D[m]. Here, the variable m is a natural number satisfying "1 ≤ m ≤ M". Further, hereinafter, when a structural element or signal of the liquid ejection device 100 corresponds to the ejection unit D[m] among the M ejection units D, a suffix [m] may be added to the symbol for expressing the structural element or signal.

[0035] The switching circuit 18 switches whether to supply each drive signal COM to the ejection unit D[m] based on the printing signal SI. Additionally, hereinafter, as described later Figure 6As shown, etc., sometimes, among the plurality of drive signals COM, the drive signal COM supplied to the ejection unit D[m] is referred to as an independent drive signal Vin[m]. Further, the switching circuit 18 switches whether to electrically connect the ejection unit D[m] and the detection circuit 19 based on the printing signal SI. When the ejection unit D[m] and the detection circuit 19 are electrically connected, for example, the detection signal Vout[m] detected from the ejection unit D[m] is supplied to the detection circuit 19 via the switching circuit 18. The detection signal Vout[m] is, for example, an analog signal representing the waveform of the residual vibration remaining in the ejection unit D[m] after being driven by the independent drive signal Vin[m]. Specifically, for example, the detection signal Vout[m] represents the waveform of the residual vibration of the diaphragm 14 after the piezoelectric element PZ[m] is driven. Regarding the piezoelectric element PZ and the diaphragm 14, they will be described later in Figure 4 and Figure 5 in the following text.

[0036] The detection circuit 19 generates a residual vibration signal Vd[m] based on the detection signal Vout[m]. For example, the detection circuit 19 shapes the detection signal Vout[m] into a waveform suitable for processing in the generation circuit 3 by amplifying the amplitude of the detection signal Vout[m] or removing the noise components included in the detection signal Vout[m]. Thereby, the residual vibration signal Vd[m] is generated. For example, the detection circuit 19 may have a structure including a negative feedback type amplifier for amplifying the detection signal Vout[m], a low-pass filter for attenuating the high-frequency components of the detection signal Vout[m], and a voltage follower for converting the impedance and outputting the low-impedance residual vibration signal Vd[m], etc.

[0037] For example, the residual vibration signal Vd[m] generated based on the detection signal Vout[m] is an analog signal representing the waveform of the residual vibration of the diaphragm 14 after the piezoelectric element PZ[m] is driven by the independent drive signal Vin[m]. The detection circuit 19 outputs the residual vibration signal Vd[m] generated based on the detection signal Vout[m] to the generation circuit 3. Thus, the detection circuit 19 detects the residual vibration of the diaphragm 14 after the piezoelectric element PZ[m] is driven based on the detection signal Vout[m].

[0038] The generation circuit 3 includes, for example, an ADC (Analog to Digital Converter), and converts the analog residual vibration signal Vd[m] into a digital signal. For example, the generation circuit 3 generates the residual vibration information Vinf by converting the analog residual vibration signal Vd[m] into a digital signal. The residual vibration information Vinf is, for example, a digital signal representing the waveform of the residual vibration of the vibration plate 14 after the piezoelectric element PZ[m] is driven. The generation circuit 3 outputs the residual vibration information Vinf generated by converting the analog residual vibration signal Vd[m] into a digital signal to the control unit 4. Additionally, the generation circuit 3 may also be included in the control unit 4. For example, when the control unit 4 includes an ADC, the control unit 4 may also function as the generation circuit 3 by operating in accordance with the control program PG1 stored in the storage unit 5.

[0039] Furthermore, in the present embodiment, as described above, the maintenance unit 7 performs the maintenance process. For example, the maintenance unit 7 performs the maintenance process under the control implemented by the control unit 4. The maintenance process includes, for example, a flushing process of discharging ink from the ejection unit D, a wiping process of wiping foreign substances such as ink adhering to the vicinity of the nozzle N of the ejection unit D using a wiper, and a suction process of sucking the ink inside the ejection unit D using a tube pump or the like.

[0040] The maintenance unit 7 has a discharged ink receiving portion for receiving the discharged ink when the ink inside the ejection unit D is discharged during the flushing process, a wiper for wiping foreign substances such as ink adhering to the vicinity of the nozzle N of the ejection unit D, and a tube pump for sucking the ink or air bubbles or the like inside the ejection unit D. Additionally, the illustration of the discharged ink receiving portion, the wiper, and the tube pump is omitted.

[0041] The display device 120 is an output device such as a display for outputting to the outside, and is communicably connected to the liquid ejection device 100. For example, the display device 120 displays an image under the control implemented by the control unit 4. Additionally, the display device 120 may also be included in the liquid ejection device 100. Furthermore, the display device 120 may also function as an input device for receiving an input from the outside. For example, as the display device 120, a touch panel display in which the input device and the output device are integrated may also be employed.

[0042] The server 200 is, for example, any information processing device capable of communicating with other devices. For example, the server 200 receives, via the network NW, a digital signal representing the waveform of the residual vibration of the diaphragm 14, i.e., the residual vibration information Vinf, from the liquid ejection device 100. Then, the server 200 analyzes the residual vibration shown by the residual vibration information Vinf, and generates adjustment information Ainf for adjusting the waveform of the drive signal COM based on the analysis result of the residual vibration. In addition, the server 200 sends the adjustment information Ainf to the liquid ejection device 100 via the network NW. The adjustment information Ainf represents, for example, adjustment values for adjusting the waveform of the drive signal COM as described later Figure 8 as shown.

[0043] In addition, although in the present embodiment, it is assumed that the analysis of the residual vibration and the determination of the adjustment value represented by the adjustment information Ainf are performed by the server 200, the analysis of the residual vibration and the determination of the adjustment value represented by the adjustment information Ainf may not be performed in the server 200. For example, the user of the server 200 or the like may also perform the analysis of the residual vibration and the determination of the adjustment value represented by the adjustment information Ainf. In this case, the server 200 acquires the adjustment information Ainf representing the adjustment value determined by the user of the server 200 or the like, and sends the acquired adjustment information Ainf to the liquid ejection device 100 via the network NW. As the user of the server 200, for example, it corresponds to an employee of the head manufacturer that manufactures the liquid ejection head 1 or the like. In addition, the head manufacturer that manufactures the liquid ejection head 1 may also be understood as the user of the server 200. Furthermore, the method for analyzing the residual vibration is not particularly limited, and known methods can be adopted.

[0044] Next, while referring to Figure 2 the overall structure of the server 200 will be described.

[0045] Figure 2 is a diagram showing an example of the structure of the server 200.

[0046] The server 200, for example, has a control unit 204 that controls the entire server 200, a storage unit 205 that stores various information such as the control program PG2 of the server 200, and a communication unit 206 for implementing communication with other devices.

[0047] The control unit 204 is configured, for example, to Figure 1It is the same as the control unit 4 of the liquid ejection device 100 described in []. For example, the control unit 204 is configured to include one or more CPUs. Additionally, the control unit 204 may also be configured to include a programmable logic device such as an FPGA instead of a CPU or in addition to a CPU. The control unit 204 operates, for example, by following the control program PG2 stored in the storage unit 205, and thus functions as a control unit for controlling the storage unit 205, the communication unit 206, etc. Further, in the present embodiment, the control unit 204 operates by following the control program PG2, and thus functions as an adjustment control unit 210 for sending the adjustment information Ainf to the liquid ejection device 100. Details of the operation of the adjustment control unit 210 will be described in Figure 11 and Figure 12 will be described in [].

[0048] The storage unit 205 is configured, for example, to be the same as the storage unit 5 of the liquid ejection device 100 described in Figure 1 []. For example, the storage unit 205 is configured to include one or both of a volatile memory such as a RAM and a non-volatile memory such as a ROM, an EEPROM, or a PROM. Additionally, the storage unit 205 may be included in the control unit 204. Further, in the present embodiment, the storage unit 205 stores the database DB in addition to the control program PG2. The database DB stores, for example, the adoption result of the adjustment information Ainf, etc., in a manner corresponding to the adjustment information Ainf. Additionally, the database DB may be stored in an external storage unit communicably connected to the server 200. The database DB is an example of a "storage unit". Further, the storage unit 5 storing the database DB may also be understood as a "storage unit".

[0049] The communication unit 206 is configured, for example, to be the same as the communication unit 6 of the liquid ejection device 100 described in Figure 1 []. For example, the communication unit 206 is hardware for communicating with other devices such as the liquid ejection device 100. For example, the communication unit 206 communicates with the liquid ejection device 100 via the network NW under the control implemented by the control unit 204.

[0050] Additionally, the structure of the server 200 is not limited to the Figure 2 example shown. For example, the server 200 may also have one or both of an input device such as a keyboard for accepting input from the outside and an output device such as a display for performing output to the outside.

[0051] Next, with reference to Figure 3Meanwhile, the schematic overall structure of the liquid ejection device 100 will be described.

[0052] Figure 3 FIG. is a structural diagram schematically showing the liquid ejection device 100. In Figure 3 this, the description will be centered around the ink container CT, the medium conveyance mechanism 8, and the carriage conveyance mechanism 9.

[0053] The ink container CT stores ink. As the ink container CT, for example, a cartridge detachable from the liquid ejection device 100, a bag-shaped ink bag formed of a flexible film, or an ink tank capable of replenishing ink can be used. In addition, the type of ink stored in the ink container CT is not particularly limited and is arbitrary. In the present embodiment, as described above, it is assumed that the liquid ejection device 100 has four liquid ejection heads 1 corresponding to four types of ink: cyan, magenta, yellow, and black. Therefore, in the present embodiment, the ink container CT stores four types of ink: cyan, magenta, yellow, and black. Further, the ink container CT supplies the stored ink to the liquid ejection head 1.

[0054] The medium conveyance mechanism 8 conveys the medium PP in the Y1 direction along the Y axis under the control of the control unit 4. Hereinafter, the Y1 direction and the Y2 direction opposite to the Y1 direction are collectively referred to as the Y-axis direction. Further, hereinafter, the X1 direction along the X axis intersecting the Y axis and the X2 direction opposite to the X1 direction are collectively referred to as the X-axis direction. Further, hereinafter, the Z1 direction along the Z axis intersecting the X axis and the Y axis and the Z2 direction opposite to the Z1 direction are collectively referred to as the Z-axis direction. In the present embodiment, as an example, it is assumed that the X axis, the Y axis, and the Z axis are orthogonal to each other for description. However, the present invention is not limited to such a manner. The X axis, the Y axis, and the Z axis only need to intersect each other.

[0055] The carriage conveyance mechanism 9 reciprocally moves the plurality of liquid ejection heads 1 in the X1 direction and the X2 direction under the control of the control unit 4. As Figure 3 shown, the carriage conveyance mechanism 9 has a substantially box-shaped carriage 91 that houses the plurality of liquid ejection heads 1, and an endless belt 92 that fixes the carriage 91. In addition, the ink container CT may be housed on the carriage 91 together with the liquid ejection head 1.

[0056] The liquid ejection head 1 is driven by a drive signal COM under the control of a printing signal SI, so that ink is ejected from a part or all of a plurality of nozzles N provided on the liquid ejection head 1 in the Z1 direction. That is, the liquid ejection head 1 ejects ink from a part or all of the plurality of nozzles N in a manner linked to the conveyance of the medium PP by the medium conveyance mechanism 8 and the reciprocating movement of the liquid ejection head 1 by the carriage conveyance mechanism 9, and causes the ejected ink to be ejected onto the surface of the medium PP, thereby forming a desired image on the surface of the medium PP. In the present embodiment, as described above, the Z1 direction is set as the ink ejection direction of the ink ejected from the nozzle N.

[0057] Next, while referring to Figure 4 and Figure 5 , a schematic structure of the liquid ejection head 1 will be described.

[0058] Figure 4 FIG. is an exploded perspective view of the liquid ejection head 1. ​ FIG. is ​ a cross-sectional view taken along line III-III shown in FIG. The cross-section of line III-III is parallel to the XZ plane and passes through the inlets HL1 and HL2 described later. In addition, in ​ and ​ , in order to distinguish between the two nozzle rows Ln described later, the number "1" or "2" is added to the end of the symbol of the nozzle row Ln. In addition, in ​ and ​ , in order to facilitate understanding of the description, the number "1" is added to the end of the symbol of the nozzle N included in the nozzle row Ln1, and the number "2" is added to the end of the symbol of the nozzle N included in the nozzle row Ln2.

[0059] As shown in ​ and ​ , the liquid ejection head 1 includes a nozzle substrate 11, plastic sheets CS1 and CS2, a communication plate 12, a pressure chamber substrate 13, a diaphragm 14, a sealing substrate 15, a flow path forming substrate 16, and a wiring substrate 17 on which electronic components EC are mounted. The electronic components EC include electrical circuits such as a switching circuit 18 and a detection circuit 19, for example. For example, the recording head 10 is electrically connected to the switching circuit 18 and the detection circuit 19 via the wiring substrate 17.

[0060] As shown in ​ , the recording head 10 includes, for example, a nozzle substrate 11, plastic sheets CS1 and CS2, a communication plate 12, a pressure chamber substrate 13, a diaphragm 14, a sealing substrate 15, and a flow path forming substrate 16.

[0061] The nozzle substrate 11 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane. Here, the term "substantially parallel" includes not only the case of being completely parallel but also the concept of being regarded as parallel when considering errors. In the present embodiment, the term "substantially parallel" is set to include the concept of being regarded as parallel when considering an error of about 10%. Similarly to "substantially parallel", the term "substantially perpendicular" described later also includes not only the case of being completely perpendicular but also the concept of being regarded as perpendicular when considering errors. Although the nozzle substrate 11 is manufactured by processing a single crystal silicon substrate using semiconductor manufacturing techniques such as etching, known materials and manufacturing methods can be arbitrarily adopted in the manufacture of the nozzle substrate 11.

[0062] On the nozzle substrate 11, M nozzles N are formed. Here, the nozzle N is a through hole provided on the nozzle substrate 11. In the present embodiment, it is assumed that the plurality of nozzles N formed on the nozzle substrate 11 include a plurality of nozzles N1 arranged to extend in the Y-axis direction and a plurality of nozzles N2 arranged to extend in the Y-axis direction at positions in the X2 direction when observed from the plurality of nozzles N1. Hereinafter, the plurality of nozzles N1 extending in the Y-axis direction are referred to as nozzle row Ln1, and the plurality of nozzles N2 extending in the Y-axis direction are referred to as nozzle row Ln2. For example, the number of nozzles N included in each of the nozzle rows LN1 and Ln2 is a number that is half of the value M. Hereinafter, the nozzle row Ln1 and the nozzle row Ln2 may be collectively referred to as the nozzle row Ln. In addition, ​ and ​ in order to facilitate understanding of the description, the number "1" is added to the end of the symbol of the structural element corresponding to the nozzle row Ln1 in the liquid ejection head 1, and the number "2" is added to the end of the symbol of the structural element corresponding to the nozzle row Ln2.

[0063] As ​ and ​ shown, a communication plate 12 is provided at a position in the Z2 direction when observed from the nozzle substrate 11. The communication plate 12 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane. Although the communication plate 12 is manufactured by processing a single crystal silicon substrate using semiconductor manufacturing techniques, known materials and manufacturing methods can be arbitrarily adopted in the manufacture of the communication plate 12.

[0064] In the connection plate 12, an ink flow path is formed. Specifically, in the connection plate 12, a supply flow path BA1 arranged to extend in the Y-axis direction and a supply flow path BA2 arranged to extend in the Y-axis direction at a position in the X2 direction when viewed from the supply flow path BA1 are formed. In addition, in the connection plate 12, a plurality of connection flow paths BK1 corresponding to a plurality of nozzles N1, a plurality of connection flow paths BK2 corresponding to a plurality of nozzles N2, a plurality of communication flow paths BR1 corresponding to a plurality of nozzles N1, and a plurality of communication flow paths BR2 corresponding to a plurality of nozzles N2 are formed.

[0065] As ​ shown, the connection flow path BK1 is arranged to communicate with the supply flow path BA1 and extend in the Z-axis direction at a position in the X2 direction when viewed from the supply flow path BA1. The communication flow path BR1 is arranged to extend in the Z-axis direction at a position in the X2 direction when viewed from the connection flow path BK1. The communication flow path BR1 communicates with the nozzle N1 corresponding to the communication flow path BR1. The connection flow path BK2 is arranged to communicate with the supply flow path BA2 and extend in the Z-axis direction at a position in the X1 direction when viewed from the supply flow path BA2. The communication flow path BR2 is arranged to extend in the Z-axis direction at a position in the X1 direction when viewed from the connection flow path BK2 and at a position in the X2 direction when viewed from the communication flow path BR1. The communication flow path BR2 communicates with the nozzle N2 corresponding to the communication flow path BR2.

[0066] In addition, the supply flow paths BA1 and BA2 are both referred to as the supply flow path BA under the condition of not being particularly distinguished, the connection flow paths BK1 and BK2 are both referred to as the connection flow path BK under the condition of not being particularly distinguished, and the communication flow paths BR1 and BR2 are both referred to as the communication flow path BR under the condition of not being particularly distinguished.

[0067] As ​ and ​ shown, a pressure chamber substrate 13 is provided at a position in the Z2 direction when viewed from the connection plate 12. The pressure chamber substrate 13 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane. Although the pressure chamber substrate 13 is manufactured, for example, by processing a single crystal substrate of silicon using semiconductor manufacturing technology, known materials and manufacturing methods can also be arbitrarily adopted in the manufacturing of the pressure chamber substrate 13.

[0068] In the pressure chamber substrate 13, flow channels for the ink are formed. Specifically, in the pressure chamber substrate 13, a plurality of pressure chambers CV1 corresponding to a plurality of nozzles N1 and a plurality of pressure chambers CV2 corresponding to a plurality of nozzles N2 are formed. Among them, the pressure chamber CV1 is arranged such that when observed in the Z-axis direction, it connects the end portion in the X2 direction of the connection flow channel BK1 and the end portion in the X1 direction of the communication flow channel BR1 and extends in the X-axis direction. The pressure chamber CV2 is arranged such that when observed in the Z-axis direction, it connects the end portion in the X1 direction of the connection flow channel BK2 and the end portion in the X2 direction of the communication flow channel BR2 and extends in the X-axis direction. In addition, the pressure chambers CV1 and CV2 are both referred to as the pressure chamber CV under the condition that they are not particularly distinguished.

[0069] As ​ and ​ shown, a diaphragm 14 is provided at a position in the Z2 direction when observed from the pressure chamber substrate 13. The diaphragm 14 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane, and is a member that can vibrate elastically. In the present embodiment, the diaphragm 14 has, for example, an elastic layer made of silicon oxide and an insulating layer made of zirconia provided at a position in the Z2 direction when observed from the elastic layer. That is, in the present embodiment, the surface in the Z2 direction of the diaphragm 14 is formed of a non-conductive member. Here, the surface in the first direction of element A is the surface of element A that is substantially perpendicular to the first direction and is visible when observing element A from the first direction to the second direction. The second direction is the direction opposite to the first direction. In addition, the elastic layer of the diaphragm 14 is not limited to the elastic layer made of silicon oxide. Similarly, the insulating layer of the diaphragm 14 is not limited to the insulating layer made of zirconia.

[0070] As ​ and ​ shown, a plurality of piezoelectric elements PZ1 corresponding to a plurality of pressure chambers CV1 and a plurality of piezoelectric elements PZ2 corresponding to a plurality of pressure chambers CV2 are provided at positions in the Z2 direction when observed from the diaphragm 14. In addition, the piezoelectric elements PZ1 and PZ2 are both referred to as the piezoelectric element PZ under the condition that they are not particularly distinguished. The piezoelectric element PZ is driven by being supplied with a drive signal COM.

[0071] For the piezoelectric element PZ, although not shown in ​ and ​ it is as shown in ​As shown, it has a common electrode Zc supplied with a predetermined bias potential VBS, an independent electrode Za supplied with an independent drive signal Vin, and a piezoelectric body Zb disposed between the independent electrode Za and the common electrode Zc. For example, the independent electrode Za, the piezoelectric body Zb, and the common electrode Zc are arranged in this order along the Z2 direction on the surface of the diaphragm 14 in the Z2 direction. Here, in this specification, the expression "element B is formed on the surface of element A" does not limit the main idea to a structure where element A and element B are in direct contact. That is, even in a structure where element C is formed on the surface of element A and element B is formed on the surface of element C, as long as at least a part of element A and element B overlaps in a top view, it is included in the concept of "element B is formed on the surface of element A". In addition, although in this embodiment, the common electrode Zc is a so-called upper electrode and the independent electrode Za is a so-called lower electrode, it is also possible that the common electrode Zc is a lower electrode and the independent electrode Za is an upper electrode.

[0072] The piezoelectric element PZ is a passive element that deforms according to the potential change of the drive signal COM supplied to the independent electrode Za as an independent drive signal Vin. In other words, the piezoelectric element PZ is an example of an energy conversion element that converts the electrical energy of the drive signal COM into kinetic energy. Specifically, the piezoelectric element PZ is driven and deforms according to the potential change of the drive signal COM.

[0073] As ​ and ​ As shown, since the piezoelectric element PZ is provided on the surface of the diaphragm 14 in the Z2 direction, the diaphragm 14 vibrates in a manner linked to the deformation of the piezoelectric element PZ. That is, the diaphragm 14 vibrates by the drive of the piezoelectric element PZ. When the diaphragm 14 vibrates, the pressure in the pressure chamber CV changes. Then, due to the change in the pressure in the pressure chamber CV, the ink filled inside the pressure chamber CV is ejected from the nozzle N through the communication flow path BR. Thus, in the pressure chamber CV, ink is filled, and pressure for ejecting the ink from the nozzle N is applied by the vibration of the diaphragm 14. In addition, the vibration remaining in the ejection part D[m] described in ​ can also be understood as, for example, the vibration in the ink remaining in the pressure chamber CV of the ejection part D.

[0074] As ​ and ​As shown, at the position in the Z2 direction when observing from the pressure chamber substrate 13, a sealing substrate 15 for protecting the plurality of piezoelectric elements PZ1 and the plurality of piezoelectric elements PZ2 is provided. The sealing substrate 15 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane. Although the sealing substrate 15 is manufactured, for example, by processing a single-crystal substrate of silicon using semiconductor manufacturing technology, known materials and manufacturing methods can also be arbitrarily adopted in the manufacture of the sealing substrate 15.

[0075] As ​ shown, on the surface of the sealing substrate 15 in the Z1 direction, there are provided a recess for covering the plurality of piezoelectric elements PZ1 and a recess for covering the plurality of piezoelectric elements PZ2. Hereinafter, the sealing space formed between the diaphragm 14 and the sealing substrate 15 and covering the plurality of piezoelectric elements PZ1 will be referred to as the sealing space SP1, and the sealing space formed between the diaphragm 14 and the sealing substrate 15 and covering the plurality of piezoelectric elements PZ2 will be referred to as the sealing space SP2. In addition, the sealing spaces SP1 and SP2 are both referred to as the sealing space SP without special distinction. The sealing space SP is a space for sealing the piezoelectric element PZ and preventing the piezoelectric element PZ from deteriorating due to the influence of moisture or the like.

[0076] On the sealing substrate 15, a through hole 15h is provided. The through hole 15h is a hole that is located between the sealing space SP1 and the sealing space SP2 when observing the sealing substrate 15 in the Z1 direction and penetrates from the surface of the sealing substrate 15 in the Z1 direction to the surface of the sealing substrate 15 in the Z2 direction. A wiring substrate 17 is inserted through the through hole 15h.

[0077] As ​ and ​ shown, at the position in the Z2 direction when observing from the communication plate 12, a flow path forming substrate 16 is provided. The flow path forming substrate 16 is a plate-shaped member that is long in the Y-axis direction and extends substantially parallel to the XY plane. Although the flow path forming substrate 16 is formed, for example, by injection molding of a resin material, known materials and manufacturing methods can also be arbitrarily adopted in the manufacture of the flow path forming substrate 16.

[0078] As ​As shown, in the flow channel forming substrate 16, flow channels for ink are formed. Specifically, in the flow channel forming substrate 16, a supply flow channel BB1 and a supply flow channel BB2 are formed. Among them, the supply flow channel BB1 is arranged to communicate with the supply flow channel BA1 and extends in the Y-axis direction at a position in the Z2 direction when observed from the supply flow channel BA1. The supply flow channel BB2 is arranged to communicate with the supply flow channel BA2 and extends in the Y-axis direction at a position in the Z2 direction when observed from the supply flow channel BA2 and at a position in the X2 direction when observed from the supply flow channel BB1. In addition, the supply flow channels BB1 and BB2 are both referred to as the supply flow channel BB without special distinction.

[0079] In the flow channel forming substrate 16, an inlet HL1 communicating with the supply flow channel BB1 and an inlet HL2 communicating with the supply flow channel BB2 are provided. And in the supply flow channel BB1, ink is supplied from the ink container CT via the inlet HL1. The ink supplied from the ink container CT to the supply flow channel BB1 via the inlet HL1 flows into the supply flow channel BA1. A part of the ink flowing into the supply flow channel BA1 fills the pressure chamber CV1 via the connecting flow channel BK1. When the piezoelectric element PZ1 is driven by the drive signal COM, a part of the ink filled in the pressure chamber CV1 is ejected from the nozzle N1 via the communication flow channel BR1.

[0080] In addition, in the supply flow channel BB2, ink is supplied from the ink container CT via the inlet HL2. The ink supplied from the ink container CT to the supply flow channel BB2 via the inlet HL2 flows into the supply flow channel BA2. A part of the ink flowing into the supply flow channel BA2 fills the pressure chamber CV2 via the connecting flow channel BK2. When the piezoelectric element PZ2 is driven by the drive signal COM, a part of the ink filled in the pressure chamber CV2 is ejected from the nozzle N2 via the communication flow channel BR2.

[0081] On the flow channel forming substrate 16, a through hole 16h is provided. The through hole 16h is a hole that is located between the supply flow channel BB1 and the supply flow channel BB2 when observing the flow channel forming substrate 16 in the Z1 direction and penetrates from the Z1-direction surface of the flow channel forming substrate 16 to the Z2-direction surface of the flow channel forming substrate 16. A wiring substrate 17 is inserted through the through hole 16h.

[0082] As ​ and ​As shown, a wiring board 17 is mounted on the surface of the vibration plate 14 in the Z2 direction. The wiring board 17 is a component for electrically connecting the liquid ejection head 1 and the control unit 4. As the wiring board 17, a flexible wiring board such as an FPC (Flexible Printed Circuit) or an FFC (Flexible Flat Cable) can be preferably used. As described above, electronic components EC including a switching circuit 18 and a detection circuit 19 are mounted on the wiring board 17.

[0083] As ​ and ​ shown, at the position in the Z1 direction when viewed from the communication board 12, a plastic sheet CS1 is provided so as to block the supply flow path BA1 and the connection flow path BK1, and a plastic sheet CS2 is provided so as to block the supply flow path BA2 and the connection flow path BK2. In addition, the plastic sheets CS1 and CS2 are both referred to as the plastic sheet CS without special distinction. The plastic sheet CS is a plate-shaped component that is long in the Y-axis direction and extends substantially parallel to the XY plane. The plastic sheet CS is formed of an elastic material and absorbs the pressure fluctuations of the ink in the supply flow path BA and the connection flow path BK.

[0084] Here, as ​ shown, the ejection part D1 has a piezoelectric element PZ1, a pressure chamber CV1, a nozzle N1 communicating with the pressure chamber CV1, and a part of the vibration plate 14 that contacts the piezoelectric element PZ1. Similarly, the ejection part D2 has a piezoelectric element PZ2, a pressure chamber CV2, a nozzle N2 communicating with the pressure chamber CV2, and a part of the vibration plate 14 that contacts the piezoelectric element PZ2. In addition, the ejection parts D1 and D2 are both referred to as the ejection part D without special distinction. Therefore, the residual vibration of the ejection part D can also be understood as the residual vibration corresponding to the nozzle N.

[0085] In addition, although not shown in the drawings, the liquid ejection head 1 has a cover for sealing the nozzle surface, which is the surface of the nozzle substrate 11 in the Z1 direction. During the period when ink is not ejected from the nozzle N, the cover seals the nozzle surface of the nozzle substrate 11 on which the nozzle N is formed.

[0086] Next, while referring to ​ the structure of the liquid ejection head 1 will be described.

[0087] ​ is a block diagram showing an example of the structure of the liquid ejection head 1.

[0088] As in ​As described above, the liquid ejection head 1 includes a recording head 10, a switching circuit 18, and a detection circuit 19. In addition, the liquid ejection head 1 has a wiring La supplied with a drive signal COMa from the drive signal generation unit 2, and a wiring Lb supplied with a drive signal COMb from the drive signal generation unit 2. Further, the liquid ejection head 1 has a wiring Ls for supplying a detection signal Vout to the detection circuit 19, a wiring Li[m] for supplying an independent drive signal Vin[m] to the ejection unit D[m], and a wiring Ld supplied with a bias potential VBS.

[0089] The switching circuit 18 includes M switches SWa[1] to SWa[M] corresponding one-to-one to the M ejection units D[1] to D[M], M switches SWb[1] to SWb[M] corresponding one-to-one to the M ejection units D[1] to D[M], and M switches SWs[1] to SWs[M] corresponding one-to-one to the M ejection units D[1] to D[M].

[0090] In addition, the switching circuit 18 includes a connection state specifying circuit CSC. The connection state specifying circuit CSC specifies the connection state of each of the M switches SWa, the M switches SWb, and the M switches SWs. For example, the connection state specifying circuit CSC generates connection state specifying signals Qa[m], Qb[m], and Qs[m] based on at least a part of signals among a print signal SI, a latch signal LAT, and a period specifying signal Tsig supplied from the control unit 4.

[0091] For example, the connection state specifying signal Qa[m] is a signal for specifying the on / off state of the switch SWa[m], and the connection state specifying signal Qb[m] is a signal for specifying the on / off state of the switch SWb[m]. In addition, the connection state specifying signal Qs[m] is a signal for specifying the on / off state of the switch SWs[m].

[0092] The switch SWa[m] switches the conduction and non-conduction between the wiring La and the independent electrode Za[m] of the piezoelectric element PZ[m] provided in the ejection unit D[m] based on the connection state specifying signal Qa[m]. That is, the switch SWa[m] switches the conduction and non-conduction between the wiring La and the wiring Li[m] connected to the independent electrode Za[m] based on the connection state specifying signal Qa[m]. In the present embodiment, the switch SWa[m] is turned on when the connection state specifying signal Qa[m] is at a high level and turned off when at a low level. When the switch SWa[m] is turned on, the drive signal COMa supplied to the wiring La is supplied as an independent drive signal Vin[m] to the independent electrode Za[m] of the ejection unit D[m] via the wiring Li[m].

[0093] The switch SWb[m] designates the connection state specifying signal Qb[m], thereby switching the conduction and non-conduction of the independent electrode Za[m] of the piezoelectric element PZ[m] provided in the wiring Lb and the ejection unit D[m]. That is, the switch SWb[m] switches the conduction and non-conduction of the wiring Lb and the wiring Li[m] connected to the independent electrode Za[m] based on the connection state specifying signal Qb[m]. In the present embodiment, the switch SWb[m] is turned on when the connection state specifying signal Qb[m] is at a high level and turned off when it is at a low level. When the switch SWb[m] is turned on, the drive signal COMb supplied to the wiring Lb is supplied as an independent drive signal Vin[m] to the independent electrode Za[m] of the ejection unit D[m] via the wiring Li[m].

[0094] The switch SWs[m] designates the connection state specifying signal Qs[m], thereby switching the conduction and non-conduction of the independent electrode Za[m] of the piezoelectric element PZ[m] provided in the wiring Ls and the ejection unit D[m]. That is, the switch SWs[m] switches the conduction and non-conduction of the wiring Ls and the wiring Li[m] connected to the independent electrode Za[m] based on the connection state specifying signal Qs[m]. In the present embodiment, the switch SWs[m] is turned on when the connection state specifying signal Qs[m] is at a high level and turned off when it is at a low level.

[0095] For example, when detecting the residual vibration of the ejection unit D[m], the connection state specifying signal Qs[m] becomes a high level. Hereinafter, the ejection unit D in which residual vibration is detected is sometimes referred to as the ejection unit D of the detection target. By turning on the switch SWs[m], the detection signal Vout[m] indicating the potential of the independent electrode Za[m] of the piezoelectric element PZ[m] provided in the ejection unit D[m] of the detection target is supplied to the detection circuit 19 via the wiring Li[m] and the wiring Ls. The detection circuit 19 generates a residual vibration signal Vd[m] based on the detection signal Vout[m].

[0096] In addition, as described above, the independent drive signal Vin[m] is a signal among the drive signals COMa and COMb that is supplied to the piezoelectric element PZ[m] provided in the ejection unit D[m] via the switch SWa[m] or SWb[m].

[0097] Next, while referring to ​ the operation of the liquid ejection device 100 in the unit period Tu will be described.

[0098] ​It is a timing chart showing an example of the operation of the liquid ejection device 100 during the unit period Tu. In the present embodiment, when the liquid ejection device 100 performs printing processing, a printing processing period including one or more unit periods Tu is set as the operation period of the liquid ejection device 100. The liquid ejection device 100 according to the present embodiment can drive each ejection unit D for printing processing within each unit period Tu. Further, the liquid ejection device 100 according to the present embodiment can drive the ejection unit D to be detected and detect the detection signal Vout[m] from the ejection unit D to be detected within each unit period Tu.

[0099] The control unit 4 outputs a latch signal LAT having a pulse PLL. Thereby, the control unit 4 defines the unit period Tu as the period from the rising edge of the pulse PLL to the rising edge of the next pulse PLL.

[0100] The printing signal SI includes, for example, M independent designation signals Sd[1] to Sd[M] corresponding one-to-one to M ejection units D[1] to D[M]. The independent designation signal Sd[m] designates the driving mode of the ejection unit D[m] in each unit period Tu when the liquid ejection device 100 performs printing processing.

[0101] Before each unit period Tu in which printing processing is performed, the control unit 4 supplies the printing signal SI including the independent designation signals Sd[1] to Sd[M] to the connection state designation circuit CSC in synchronization with the clock signal CL. Then, within the unit period Tu, the connection state designation circuit CSC generates connection state designation signals Qa[m], Qb[m], and Qs[m] based on the independent designation signal Sd[m].

[0102] For example, within the unit period Tu in which printing processing is performed, the ejection unit D[m] is designated as any one of the ejection unit D forming a dot, the ejection unit D not forming a dot, and the ejection unit D to be detected by the independent designation signal Sd[m].

[0103] First, the operation of the connection state designation circuit CSC and the like in the case where the driving mode of the ejection unit D designated as the ejection unit D forming a dot by the independent designation signal Sd[m] will be described.

[0104] The drive signal generation unit 2 outputs a drive signal COMa having a pulse PA. The pulse PA is, for example, a pulse for ejecting ink from the nozzle N. The pulse PA is a waveform in which the potential of the drive signal COMa starts from the potential V0, passes through a potential Vla lower than the potential V0 and a potential VHa higher than the potential V0, and then returns to the potential V0. The potential V0 is the potential at the start and end of the pulse PA and is the reference potential of the drive signal COMa.

[0105] For example, the pulse PA has a waveform element Pa1 in which the potential changes from the potential V0 to the potential VLa, a waveform element Pa2 in which the potential is maintained at the potential VLa at the end of the waveform element Pa1, and a waveform element Pa3 in which the potential changes from the potential VLa to the potential VHa. Further, the pulse PA includes a waveform element Pa4 in which the potential is maintained at the potential VHa at the end of the waveform element Pa3, and a waveform element Pa5 in which the potential changes from the potential VHa to the potential V0.

[0106] The waveform elements Pa1 and Pa5 are expansion elements for displacing the piezoelectric body Zb in the Z2 direction. In the expansion element, the potential of the drive signal COMa changes in order to drive the piezoelectric element PZ so as to expand the volume of the pressure chamber CV. Therefore, in the waveform elements Pa1 and Pa5, the potential of the drive signal COMa changes in a manner that expands the volume of the pressure chamber CV. When the volume of the pressure chamber CV expands, the surface of the ink in the nozzle N is pulled in the direction opposite to the ejection direction, that is, the Z2 direction. Hereinafter, the case where the surface of the ink in the nozzle N is pulled in the direction opposite to the ejection direction may be referred to as pull.

[0107] In addition, the waveform element Pa3 is a contraction element for displacing the piezoelectric body Zb in the Z1 direction. In the contraction element, the potential of the drive signal COMa changes in order to drive the piezoelectric element PZ so as to contract the volume of the pressure chamber CV. Therefore, in the waveform element Pa3, the potential of the drive signal COMa changes in a manner that contracts the volume of the pressure chamber CV. When the volume of the pressure chamber CV contracts, the surface of the ink in the nozzle N is pushed in the ejection direction, that is, the Z1 direction. Hereinafter, the case where the surface of the ink in the nozzle N is pushed in the ejection direction may be referred to as push.

[0108] In addition, the waveform elements Pa2 and Pa4 are maintenance elements for maintaining the position of the piezoelectric body Zb in the Z-axis direction. For example, in the waveform element Pa2, the piezoelectric element PZ is driven in such a way as to maintain the volume of the pressure chamber CV expanded by the waveform element Pa1, thereby maintaining the potential of the drive signal COMa. Further, for example, in the waveform element Pa4, the piezoelectric element PZ is driven in such a way as to maintain the volume of the pressure chamber CV contracted by the waveform element Pa3, thereby maintaining the potential of the drive signal COMa.

[0109] Thus, the pulse PA is a so-called pull·push·pull waveform. However, the waveform of the drive signal COMa for ejecting the ink from the nozzle N is not limited to the pull·push·pull waveform.

[0110] The pulse PA is defined such that when an independent drive signal Vin[m] having the pulse PA is supplied to the ejection unit D[m], a predetermined amount of ink is ejected from the ejection unit D[m]. In addition, in the present embodiment, it is assumed that when the potential of the independent drive signal Vin[m] is high, the volume of the pressure chamber CV provided in the ejection unit D[m] becomes smaller than in the case where the potential is low. Therefore, when the ejection unit D[m] is driven by the independent drive signal Vin[m] having the pulse PA, the ink in the ejection unit D[m] is ejected from the nozzle N by the waveform element Pa3 in which the potential of the independent drive signal Vin[m] changes from low to high.

[0111] For example, the waveform elements Pa1, Pa2, Pa3, Pa4, and Pa5 included in the pulse PA are defined based on the ink ejection characteristics of the ejection unit D and the like. The ink ejection characteristics are, for example, the amount of ink ejected as ink droplets and the ejection speed of the ejected ink droplets.

[0112] Here, a deviation in parameters related to the operation state of the ink, such as the natural vibration period of the pressure chamber CV, causes a deviation in the ejection characteristics of the ink. The natural vibration period of the pressure chamber CV is specifically specified, for example, based on the residual vibration of the vibration plate 14 detected by the detection circuit 19. Therefore, in the present embodiment, for example, based on the residual vibration information Vinf representing the waveform of the residual vibration of the vibration plate 14, the waveform of the drive signal COMa, that is, the waveform of the pulse PA, is determined. In the present embodiment, it is assumed that the length TA1 of the waveform element Pa2 and the length TA2 of the waveform element Pa4 are adjusted based on the residual vibration information Vinf with respect to the reference waveform of the pulse PA that is predetermined. Further, in the present embodiment, it is assumed that the start timing of the waveform element Pa2 and the start timing of the waveform element Pa4 when starting from the start timing of the waveform element Pa1 do not change before and after the adjustment of the lengths TA1 and TA2.

[0113] Therefore, for example, when the length TA1 is longer, the amount of potential change per unit time of the waveform element Pa3, that is, the inclination of the waveform element Pa3, becomes larger than when the length TA1 is shorter. For example, when the inclination of the waveform element Pa3 is larger, the ejection speed of the ink droplets becomes faster than when the inclination of the waveform element Pa3 is smaller. Further, for example, when the length TA2 is longer, the amount of potential change per unit time of the waveform element Pa5, that is, the inclination of the waveform element Pa5, becomes larger than when the length TA2 is shorter. When the inclination of the waveform element Pa5 is larger, the damping ability to attenuate the residual vibration of the ejection unit D becomes higher than when the inclination of the waveform element Pa5 is smaller. In addition, the method for adjusting the waveform of the pulse PA, that is, the method for determining the waveform of the pulse PA, is not limited to the adjustment of the length TA1 of the waveform element Pa2 and the length TA2 of the waveform element Pa4. For example, with respect to the reference waveform of the pulse PA, one or both of the potentials VHa and VLa may be adjusted based on the residual vibration information Vinf. Further, for example, with respect to the reference waveform of the pulse PA, without changing the length TA1 of the waveform element Pa2 and the length TA2 of the waveform element Pa4, the inclination of the waveform element Pa3 and the inclination of the waveform element Pa5 may be adjusted based on the residual vibration information Vinf. Further, for example, with respect to the reference waveform of the pulse PA, based on the residual vibration information Vinf, a part or all of the potential VHa, the potential VLa, the length TA1, the length TA2, the inclination of the waveform element Pa3, and the inclination of the waveform element Pa5 may be adjusted.

[0114] In addition, the residual vibration represented by the residual vibration information Vinf used in determining the waveform of the pulse PA is the residual vibration representing the residual vibrations of the M ejection units D. For example, the residual vibration representing the residual vibrations of the M ejection units D may also be the residual vibration of one of the M ejection units D. Alternatively, the residual vibration representing the residual vibrations of the M ejection units D may be specifically specified statistically using the residual vibrations of K ejection units D. For example, the residual vibration representing the residual vibrations of the M ejection units D may be either the average value of the residual vibrations of the K ejection units D or the maximum or minimum value among the residual vibrations of the K ejection units D. In addition, the value K is a natural number satisfying "2 ≤ K ≤ M".

[0115] Next, the operation of the connection state specifying circuit CSC and the like in the case where the drive mode of the ejection unit D to be detected is specified by the independent specifying signal Sd[m] will be described.

[0116] For example, the drive signal generation unit 2 outputs a drive signal COMb having a pulse PS. The pulse PS is a waveform in which the potential of the drive signal COMb starts from the potential V0, passes through a potential VLs lower than the potential V0 and a potential VHs higher than the potential V0, and then returns to the potential V0. In addition, in the present embodiment, the pulse PS is defined such that the potential difference between the highest potential VHs and the lowest potential VLs of the pulse PS is smaller than the potential difference between the highest potential VHa and the lowest potential VLa of the pulse PA. Specifically, the waveform of the pulse PS is defined such that when the drive signal COMb having the pulse PS is supplied to the ejection unit D[m], the ejection unit D[m] is driven so as not to eject ink from the ejection unit D[m]. In addition, the potentials at the start and end of the pulse PS are set to the potential V0.

[0117] In addition, the control unit 4 outputs a period specifying signal Tsig having a pulse PLSt1 and a pulse PLSt2. Thereby, the control unit 4 divides the unit period Tu into a control period TSS1 from the start of the pulse PLL to the start of the pulse PLSt1, a control period TSS2 from the start of the pulse PLSt1 to the start of the pulse PLSt2, and a control period TSS3 from the start of the pulse PLSt2 to the start of the next pulse PLL.

[0118] And, for example, when the independent designation signal Sd[m] designates the ejection unit D[m] as the ejection unit D to be detected, the connection state designation circuit CSC sets the connection state designation signal Qa[m] to a low level within the unit period Tu. Further, the connection state designation circuit CSC sets the connection state designation signal Qb[m] to a high level within the control periods TSS1 and TSS3, respectively, and to a low level within the control period TSS2. Further, the connection state designation circuit CSC sets the connection state designation signal Qs[m] to a low level within the control periods TSS1 and TSS3, respectively, and to a high level within the control period TSS2.

[0119] In this case, the piezoelectric element PZ[m] included in the ejection unit D[m] to be detected is driven by the pulse PS of the drive signal COMb within the control period TSS1. Specifically, the piezoelectric element PZ[m] is displaced by the pulse PS of the drive signal COMb within the control period TSS1. As a result, vibration is generated in the ejection unit D[m] to be detected. The vibration generated within the control period TSS1 remains even within the control period TSS2. Then, within the control period TSS2, the potential of the independent electrode Za[m] of the piezoelectric element PZ[m] included in the ejection unit D[m] to be detected changes according to the residual vibration that has been generated in the ejection unit D[m]. That is, within the control period TSS2, the potential of the independent electrode Za of the piezoelectric element PZ included in the ejection unit D to be detected becomes a potential corresponding to the electromotive force of the piezoelectric element PZ due to the residual vibration that has been generated in the ejection unit D to be detected. Then, the potential of this independent electrode Za is detected as the detection signal Vout within the control period TSS2.

[0120] Further, when the drive method of the ejection unit D that does not form a dot is designated by the independent designation signal Sd[m], for example, the connection state designation circuit CSC sets the connection state designation signals Qa[m], Qb[m], and Qs[m] to a low level within the unit period Tu.

[0121] In addition, the operation of the liquid ejection device 100 is not limited to ​ the example shown. For example, although in ​ it is illustrated that there is one drive signal COM for ejecting ink from the nozzle N, the present invention is not limited to such a method. For example, as the drive signal COM for ejecting ink from the nozzle N, a plurality of drive signals COM corresponding to the size of the dot may be used. Further, the plurality of drive signals COM may also include a drive signal COM having a micro-vibration waveform for preventing thickening of the ink.

[0122] In addition, although in ​In this case, an example is shown in which a detection signal Vout representing the residual vibration of the ejection unit D of the detection target is generated during the printing process. However, the detection signal Vout can also be generated during a period different from the printing process. That is, the process of detecting the residual vibration of the ejection unit D of the detection target can also be performed during a period different from the printing process.

[0123] Next, while referring to ​ the adjustment information Ainf for adjusting the waveform of the drive signal COMa will be described.

[0124] ​ FIG. is a diagram for explaining the adjustment information Ainf for adjusting the waveform of the drive signal COMa. In addition, in ​ the waveform of the drive signal COMa is shown as a note. In the present embodiment, it is assumed that one adjustment information Ainf is adopted for each liquid ejection head 1. In ​ for the sake of easy understanding of the description, a plurality of adjustment information Ainf are shown.

[0125] In the present embodiment, as described in ​ the length TA1 of the waveform element Pa2 and the length TA2 of the waveform element Pa4 of the pulse PA will be adjusted based on the residual vibration represented by the residual vibration information Vinf with respect to the reference waveform of the pulse PA. Hereinafter, the length TA1 of the waveform element Pa2 in the reference waveform of the pulse PA is also referred to as the length TA1 of the waveform element Pa2 of the reference waveform, and the length TA2 of the waveform element Pa4 in the reference waveform of the pulse PA is also referred to as the length TA2 of the waveform element Pa4 of the reference waveform. For example, in the present embodiment, as ​ shown, the adjustment information Ainf represents the adjustment value for the length TA1 of the waveform element Pa2 of the reference waveform and the adjustment value for the length TA2 of the waveform element Pa4 of the reference waveform.

[0126] In ​ the example shown, the length TA1 of the waveform element Pa2 is determined as the value obtained by multiplying the length TA1 of the waveform element Pa2 of the reference waveform by the adjustment value of the length TA1, and the length TA2 of the waveform element Pa4 is determined as the value obtained by multiplying the length TA2 of the waveform element Pa4 of the reference waveform by the adjustment value of the length TA2. In addition, the adjustment of the lengths TA1 and TA2 does not necessarily have to be adjusted by multiplication, and other methods such as addition and subtraction operations can also be used for adjustment.

[0127] For example, in adjustment information Ainf1, the adjustment value of length TA1 is 0.9, and the adjustment value of length TA2 is 0.8. In addition, in adjustment information Ainf2, both the adjustment value of length TA1 and the adjustment value of length TA2 are 1.0. In addition, in adjustment information Ainf3, the adjustment value of length TA1 is 1.2, and the adjustment value of length TA2 is 1.1. In ​ the illustrated example, in the liquid ejection head 1 that has adopted the adjustment information Ainf2, a drive signal COMa having a waveform of the pulse PA as a reference waveform is supplied.

[0128] In addition, the content of the adjustment information Ainf is not limited to ​ the illustrated example. For example, the adjustment value of length TA1 and the adjustment value of length TA2 may also be ​ numerical values other than the numerical value examples shown. It can also be appropriately changed according to the adjustment method. In addition, for the determination of the waveform of the drive signal COMa, it can also be performed under the condition of not using the reference waveform of the pulse PA. For example, the adjustment information Ainf may also be a waveform designation signal dCOM that defines the waveform of the pulse PA.

[0129] Next, while referring to ​ the following, an outline of the residual vibration signal Vd will be described.

[0130] ​ FIG. is a diagram showing an example of the waveform of the residual vibration signal Vd. In ​ it, an example of the waveform of the residual vibration signal Vd, that is, an example of the waveform of the residual vibration represented by the residual vibration information Vinf, is schematically shown. The vertical axis of the drawing represents the potential of the residual vibration signal Vd, and the horizontal axis represents time.

[0131] As described above, the residual vibration signal Vd represents the residual vibration generated in the ejection part D of the detection object, that is, the waveform corresponding to the residual vibration of the vibration plate 14. Specifically, the residual vibration signal Vd represents a period corresponding to the period of the residual vibration of the vibration plate 14, represents an amplitude corresponding to the amplitude of the residual vibration of the vibration plate 14, and represents a phase corresponding to the phase of the residual vibration of the vibration plate 14.

[0132] In ​In the example shown, the peak values VPp1 and VPp2 represent the peak value VPp at which the potential of the residual vibration signal Vd becomes a maximum value, that is, the peak value VPp at which the waveform of the residual vibration signal Vd becomes a peak. In addition, the peak values VPm1 and VPm2 represent the peak value VPm at which the potential of the residual vibration signal Vd becomes a minimum value, that is, the peak value VPm at which the waveform of the residual vibration signal Vd becomes a trough. The potential Vc represents the reference potential of the residual vibration signal Vd. For example, the potential Vc can be either the potential of the residual vibration signal Vd when the residual vibration of the vibration plate 14 decays and the residual vibration converges, or the intermediate potential between the potential of the peak value VPp and the potential of the peak value VPm.

[0133] In addition, the timing Tc1 represents the timing at which the potential of the residual vibration signal Vd becomes the potential Vc when the potential of the residual vibration signal Vd changes from the potential of the peak value VPp1 to the potential of the peak value Vpm1. The timing Tc2 represents the timing at which the potential of the residual vibration signal Vd becomes the potential Vc when the potential of the residual vibration signal Vd changes from the potential of the peak value VPp2 to the potential of the peak value Vpm2. And, the time length TPc represents the time from the timing Tc1 to the timing Tc2. That is, the time length TPc is specifically specified based on the timing at which the potential of the residual vibration signal Vd becomes the potential Vc. In addition, the time length TPm represents the time from the timing Tm1 of the peak value VPm1 to the timing Tm2 of the peak value VPm2. That is, the time length TPm is specifically specified based on the timing of the peak value VPm.

[0134] For example, in the analysis of the residual vibration in ​ the step S220 described later, the period of the residual vibration signal Vd is specifically specified as the period of the residual vibration of the vibration plate 14. The period of the residual vibration signal Vd can be, for example, either the time length TPc or the time length TPm. Or, the period of the residual vibration signal Vd can also be the time from the timing Tv1 to the timing Tv2, that is, the time length TPv. The timing Tv1 is the intermediate timing of the timing at which the potential of the residual vibration signal Vd becomes an arbitrary potential VV1 between the potential Vc and the potential of the peak value VPm1 around the timing Tm1. The timing Tv2 is the intermediate timing of the timing at which the potential of the residual vibration signal Vd becomes an arbitrary potential VV2 between the potential Vc and the potential of the peak value VPm2 around the timing Tm2. In addition, the potential Vc can be set to the potential VV1 and the potential VV2. In the method of setting the time length TPv as the period of the residual vibration signal Vd, even when the waveform of the residual vibration signal Vd is distorted, it is possible to expect that the influence of the distortion becomes smaller.

[0135] In addition, the method for specifically designating the period of the residual vibration signal Vd is not limited to the above examples, and known methods can be adopted. For example, the period of the residual vibration signal Vd can be the average of a plurality of time lengths specifically designated based on the timing when the potential of the residual vibration signal Vd becomes the potential Vc, or can be the average of a plurality of time lengths specifically designated based on the timing of the peak VPm. Alternatively, the period of the residual vibration signal Vd can be the time length specifically designated based on the timing of the peak VPp, or can be the average of a plurality of time lengths specifically designated based on the timing of the peak VPp.

[0136] In addition, for example, in the analysis of the residual vibration, the amplitude of the residual vibration signal Vd is specifically designated as the amplitude of the residual vibration of the vibration plate 14. The amplitude of the residual vibration signal Vd can be, for example, the amplitude of the peak VPp or the amplitude of the peak VPm. The amplitude λc of the peak VPm1 is the absolute value of the difference between the potential of the peak VPm1 and the potential Vc.

[0137] In addition, the method for specifically designating the amplitude of the residual vibration signal Vd is not limited to the above examples, and known methods can be adopted. For example, the amplitude of the residual vibration signal Vd can be the amplitude of the first or second peak VPp, or can be the average of the amplitudes of a plurality of peaks VPp. Alternatively, the amplitude of the residual vibration signal Vd can be the amplitude of the first or second peak VPm, or can be the average of the amplitudes of a plurality of peaks VPm. In addition, the amplitude of the residual vibration signal Vd can also be the average of the amplitudes of one or more peaks VPp and the amplitudes of one or more peaks VPm. In addition, the attenuation rate of the amplitude of the residual vibration signal Vd can also be specifically designated as the attenuation rate of the amplitude of the residual vibration of the vibration plate 14.

[0138] In addition, for example, in the analysis of the residual vibration, the phase of the residual vibration signal Vd is specifically designated as the phase of the residual vibration of the vibration plate 14. The method for specifically designating the phase of the residual vibration signal Vd is not particularly limited, and known methods can be adopted.

[0139] The waveform of the drive signal COMa is adjusted based on, for example, at least one of the period, amplitude, amplitude attenuation rate, and phase of the residual vibration. For example, the waveform of the drive signal COMa can be adjusted based on the period of the residual vibration, or can be adjusted based on the period and amplitude of the residual vibration. In addition, the analysis result of the residual vibration used in the adjustment of the waveform of the drive signal COMa is not limited to the period, amplitude, amplitude attenuation rate, and phase of the residual vibration.

[0140] Next, with reference to ​Meanwhile, the differences in the waveforms of the residual vibration signal Vd caused by the usage conditions of the liquid ejection head 1 are described.

[0141] ​ This is a figure for explaining the differences in the waveforms of the residual vibration signal Vd caused by the usage conditions of the liquid ejection head 1. In ​ the first example, an example of the waveform of the residual vibration signal Vd assumed at the head manufacturer is schematically shown. In ​ the second example, an example of the waveform of the residual vibration signal Vd not assumed at the head manufacturer is schematically shown. The vertical axis of the drawing represents the potential of the residual vibration signal Vd, and the horizontal axis represents time.

[0142] For example, when using the ink recommended by the head manufacturer, even if the ink conditions such as the type of ink are different, as shown in the first example, residual vibrations related to the period and amplitude to some extent can be detected. In the first example, the cases of using the first ink, the second ink, and the third ink recommended by the head manufacturer are assumed. For example, the residual vibration signal Vd1 is the residual vibration signal Vd representing the residual vibration detected in the state where the first ink is filled in the pressure chamber CV. The residual vibration signal Vd2 is the residual vibration signal Vd representing the residual vibration detected in the state where the second ink is filled in the pressure chamber CV. In addition, the residual vibration signal Vd3 is the residual vibration signal Vd representing the residual vibration detected in the state where the third ink is filled in the pressure chamber CV.

[0143] Although in ​ the first example, the periods of the residual vibration signal Vd are the same among the three types of inks, the amplitudes λc of the residual vibration signal Vd are different among the three types of inks. For example, among the amplitudes λc1 of the residual vibration signal Vd1, the amplitudes λc2 of the residual vibration signal Vd2, and the amplitudes λc3 of the residual vibration signal Vd3, the amplitude λc1 of the residual vibration signal Vd1 is the largest, and the amplitude λc3 of the residual vibration signal Vd3 is the smallest.

[0144] Since the action states of the residual vibrations remaining in the ink in the pressure chamber CV of the ejection part D are different among the three types of inks, it is considered that the appropriate waveforms of the drive signal COMa for driving the ejection part D are also different among the three types of inks. In addition, as described above, since the waveforms of the multiple residual vibration signals Vd shown in the first example are the waveforms assumed at the head manufacturer, the head manufacturer can also prepare in advance multiple adjustment information Ainf corresponding to the multiple residual vibration signals Vd shown in the first example.

[0145] In contrast, for example, when a special ink that the head manufacturer did not envision is used, the operating state of the ink in the pressure chamber CV may be very different from the case where the ink recommended by the head manufacturer is used. In this case, it is conceivable that, as shown in the second example, the waveform of the residual vibration signal Vd4 is also very different from the waveform envisioned by the head manufacturer. For example, the residual vibration signal Vd4 shown in the second example is a residual vibration signal Vd representing the residual vibration detected when a special ink that the head manufacturer did not envision is used.

[0146] For a residual vibration signal Vd that is very different from the waveform envisioned by the head manufacturer, it is difficult for the head manufacturer to prepare in advance adjustment information Ainf corresponding to the residual vibration signal Vd. Therefore, in a liquid ejection device in which the adjustment information Ainf is prepared in advance by the head manufacturer, it is difficult to appropriately adjust the waveform of the drive signal COMa when the waveform of the residual vibration signal Vd is very different from the waveform envisioned by the head manufacturer.

[0147] Therefore, in the present embodiment, the residual vibration information Vinf representing the residual vibration detected by the detection circuit 19 is transmitted to the server 200, and the adjustment information Ainf is generated by the head manufacturer based on the residual vibration information Vinf. Thus, in the present embodiment, even when the waveform of the residual vibration detected by the detection circuit 19 is very different from the waveform envisioned by the head manufacturer, adjustment information Ainf for appropriately adjusting the waveform of the drive signal COMa is generated by the head manufacturer.

[0148] In addition, generating the adjustment information Ainf at the head manufacturer means not only that the residual vibration information Vinf is generated in the server 200, but also that the residual vibration information Vinf is generated by a user or the like of the server 200. As described in ​ and the like, the adjustment information Ainf generated at the head manufacturer is transmitted from the server 200 to the liquid ejection device 100. As a result, in the present embodiment, even when the waveform of the residual vibration signal Vd is very different from the waveform envisioned by the head manufacturer, the waveform of the drive signal COMa can be appropriately adjusted. In addition, in the present embodiment, regardless of whether the waveform of the residual vibration signal Vd is the waveform envisioned by the head manufacturer, the residual vibration information Vinf is transmitted from the liquid ejection device 100 to the server 200.

[0149] Next, while referring to ​ the operation of the liquid ejection system SYS when adjusting the waveform of the drive signal COMa will be described.

[0150] ​A diagram showing an example of the operation of the liquid ejection system SYS when adjusting the waveform of the drive signal COMa. ​ The operation shown is performed, for example, for each of the plurality of liquid ejection heads 1. Additionally, ​ the timing at which the operation shown is performed is not particularly limited, but is preferably performed when the liquid ejection device 100 is used for the first time or when the usage conditions of the liquid ejection device 100 are changed due to a change in the type of ink used or the like. Additionally, the usage conditions of the liquid ejection device 100 also include the usage conditions of the liquid ejection head 1.

[0151] The usage conditions of the liquid ejection head 1 include, for example, some or all of the ink conditions related to the type of ink, the temperature conditions related to temperature, and the pressure conditions related to pressure. Additionally, the usage conditions of the liquid ejection head 1 may also be conditions other than the ink conditions, temperature conditions, and pressure conditions. The temperature of the temperature conditions may be the temperature of the ink or the temperature of the liquid ejection head 1. Furthermore, the pressure of the pressure conditions may be the pressure near the pressure chamber CV or the pressure in the ink flow path. In the present embodiment, it is assumed that the temperature and pressure are respectively detected by a temperature sensor and a pressure sensor provided near the pressure chamber CV. However, the temperature and pressure may also be detected by methods other than the method using the temperature sensor and the pressure sensor provided near the pressure chamber CV. For example, the temperature and pressure may also be respectively detected by a thermistor within the liquid ejection device 100 and a pressure sensor provided in the flow path outside the liquid ejection head 1.

[0152] Furthermore, in ​ the operation shown, it is assumed that the condition information Cinf, the residual vibration information Vinf, and the adjustment information Ainf related to the usage conditions of the liquid ejection head 1 are stored in the database DB in a manner that they are mutually correlated. The condition information Cinf includes, for example, some or all of the information related to the type of ink, the information related to temperature, and the information related to pressure. That is, the condition information Cinf includes some or all of the information indicating the ink conditions, the information indicating the temperature conditions, and the information indicating the pressure conditions. Additionally, in ​ the description, the user refers to the user of the liquid ejection device 100 among the users of the liquid ejection device 100 and the server 200. That is, hereinafter, the user of the liquid ejection device 100 is only referred to as the user.

[0153] The control unit 4 of the liquid ejection device 100 is in ​In the steps S100, S110, S112, S120, S140, S142, and S150 shown, it functions as the processing control unit 40. In addition, the control unit 4 ​ functions as the transmission control unit 42 in the steps S114 and S122 shown, and functions as the reception control unit 44 in the step S130.

[0154] In addition, the control unit 204 of the server 200 ​ functions as the adjustment control unit 210 in each of the steps S200 to S240 shown.

[0155] First, in step S100, the liquid ejection device 100 determines whether to perform waveform adjustment such as determining an adjustment value for adjusting the waveform of the drive signal COMa by the head manufacturer. For example, the processing control unit 40 displays the following operation buttons on the display device 120 as a GUI (Graphical User Interface), and the operation buttons select whether to perform waveform adjustment by the head manufacturer. And when it is selected by the operation button to perform waveform adjustment by the head manufacturer, the processing control unit 40 determines that the head manufacturer performs waveform adjustment. In addition, when it is selected by the operation button not to perform waveform adjustment by the head manufacturer, the processing control unit 40 determines not to perform waveform adjustment by the head manufacturer. In addition, for the head manufacturer to perform waveform adjustment, for example, it can be that the server 200 performs waveform adjustment or the user of the server 200 performs waveform adjustment.

[0156] When the result of the determination in step S100 is affirmative, the processing control unit 40 transfers the processing to step S110. On the other hand, when the result of the determination in step S100 is negative, the processing control unit 40 transfers the processing to step S150.

[0157] In step S110, the liquid ejection device 100 receives the selection of whether to send the condition information Cinf related to the usage conditions of the liquid ejection head 1. For example, the processing control unit 40 displays an operation button for selecting whether to send the condition information Cinf to the server 200 on the display device 120 as a GUI. In this way, the processing control unit 40 receives the user's selection regarding whether to send the condition information Cinf to the server 200. Thereby, it is possible to prevent the situation where the condition information Cinf is sent to the server 200 against the user's intention.

[0158] Next, in step S112, the processing control unit 40 determines whether to send the condition information Cinf to the server 200 based on the acceptance result in the processing of step S110. For example, when it is selected in step S110 to send the condition information Cinf to the server 200, the processing control unit 40 determines to send the condition information Cinf to the server 200. In addition, when it is selected in step S110 not to send the condition information Cinf to the server 200, the processing control unit 40 determines not to send the condition information Cinf to the server 200.

[0159] When the result of the determination in step S112 is affirmative, the processing control unit 40 transfers the processing to step S114. On the other hand, when the result of the determination in step S112 is negative, the processing control unit 40 transfers the processing to step S120.

[0160] In step S114, the liquid ejection device 100 sends the condition information Cinf to the server 200. For example, the transmission control unit 42 sends the condition information Cinf to the server 200 via the communication unit 6.

[0161] By executing the processing of step S114, in step S200, the server 200 receives the condition information Cinf. For example, in step S200, the adjustment control unit 210 receives the condition information Cinf from the liquid ejection device 100 via the communication unit 206.

[0162] In addition, after executing the processing of step S114, the transmission control unit 42 transfers the processing to step S120.

[0163] In step S120, the liquid ejection device 100 detects the residual vibration of the vibration plate 14. For example, the processing control unit 40 causes the detection circuit 19 to detect the residual vibration. Specifically, the processing control unit 40 drives the ejection part D[m] which is the detection object of the residual vibration in the driving method of the ejection part D which is described as the detection object in ​ Thereby, the detection circuit 19 detects the residual vibration of the vibration plate 14 after driving the piezoelectric element PZ[m] based on the detection signal Vout[m].

[0164] Next, in step S122, the liquid ejection device 100 sends the residual vibration information Vinf indicating the waveform of the residual vibration detected by the detection circuit 19 to the server 200. For example, the transmission control unit 42 sends the residual vibration information Vinf to the server 200 via the communication unit 6.

[0165] By performing the process of step S122, in step S202, the server 200 receives the residual vibration information Vinf. For example, in step S202, the adjustment control unit 210 receives the residual vibration information Vinf from the liquid ejection device 100 via the communication unit 206. After receiving the residual vibration information Vinf, the adjustment control unit 210 transfers the process to step S210.

[0166] In step S210, the adjustment control unit 210 determines whether the condition information Cinf has been received from the liquid ejection device 100. If the result of the determination in step S210 is negative, the adjustment control unit 210 transfers the process to step S220. On the other hand, if the result of the determination in step S210 is positive, the adjustment control unit 210 transfers the process to step S212.

[0167] In step S212, the adjustment control unit 210 determines whether a usage condition similar to the usage condition indicated by the condition information Cinf received in step S200 has been registered in the database DB. For example, the adjustment control unit 210 determines whether the condition information Cinf indicating a usage condition similar to the usage condition indicated by the condition information Cinf received in step S200 has been stored in the database DB. In addition, among the usage conditions similar to the usage condition indicated by the condition information Cinf, the usage condition identical to the usage condition indicated by the condition information Cinf is also included. Hereinafter, the condition information Cinf indicating a usage condition similar to the usage condition indicated by one condition information Cinf is also referred to as the condition information Cinf similar to one condition information Cinf.

[0168] If the result of the determination in step S212 is negative, the adjustment control unit 210 transfers the process to step S220. On the other hand, if the result of the determination in step S212 is positive, the adjustment control unit 210 transfers the process to step S214. That is, when the condition information Cinf indicating a usage condition similar to the usage condition indicated by the condition information Cinf received in step S200 is retrieved from the database DB, the process of step S214 is executed.

[0169] In step S214, the adjustment control unit 210 determines whether residual vibrations similar to the residual vibrations represented by the residual vibration information Vinf received in step S202 are registered in a specific search target of the database DB. The specific search target of the database DB is, for example, the residual vibration information Vinf corresponding to the condition information Cinf retrieved in step S212. For example, the adjustment control unit 210 determines whether there are residual vibrations similar to the residual vibrations represented by the residual vibration information Vinf received in step S202 among the residual vibrations represented by the residual vibration information Vinf corresponding to the condition information Cinf retrieved in step S212. In addition, for residual vibrations similar to the residual vibrations represented by the residual vibration information Vinf, for example, if detection errors such as noise during detection of the residual vibrations are considered, they are residual vibrations that can be regarded as being consistent with the residual vibrations represented by the residual vibration information Vinf. Furthermore, among the residual vibrations similar to the residual vibrations represented by the residual vibration information Vinf, there are also residual vibrations that are consistent with the residual vibrations represented by the residual vibration information Vinf. Hereinafter, the residual vibration information Vinf representing residual vibrations similar to the residual vibrations represented by one piece of residual vibration information Vinf is also referred to as residual vibration information Vinf similar to one piece of residual vibration information Vinf.

[0170] When the result of the determination in step S214 is negative, the adjustment control unit 210 transfers the process to step S220. On the other hand, when the result of the determination in step S214 is positive, the adjustment control unit 210 transfers the process to step S216. That is, when residual vibration information Vinf representing residual vibrations similar to the residual vibrations represented by the residual vibration information Vinf received in step S202 is retrieved from the specific search target of the database DB, the process of step S216 is executed.

[0171] In step S216, the adjustment control unit 210 obtains adjustment information Ainf from the database DB, and the adjustment information Ainf corresponds to the residual vibration information Vinf of a specific residual vibration similar to the residual vibrations represented by the residual vibration information Vinf received in step S202. The residual vibration information Vinf representing the specific residual vibration is the residual vibration information Vinf retrieved in step S214.

[0172] The adjustment information Ainf obtained in step S216 is an example of "specific adjustment information". For example, the adjustment information Ainf obtained in step S216 is sent to the liquid ejection device 100 in the subsequent step S240. Thus, in the present embodiment, for example, even when the residual vibration represented by the residual vibration information Vinf received in step S202 includes detection errors such as noise, it is possible to suppress a decrease in the accuracy of adjusting the waveform of the drive signal COMa.

[0173] After performing the process of step S216, the adjustment control unit 210 transfers the process to step S220.

[0174] In step S220, the adjustment control unit 210 analyzes the residual vibration represented by the residual vibration information Vinf received in step S202. Thus, for example, as described in ​ the period, amplitude, attenuation rate of the amplitude, and phase of the residual vibration are specifically specified.

[0175] Next, in step S222, the adjustment control unit 210 generates at least one adjustment information Ainf for adjusting the waveform of the drive signal COMa based on the analysis result of the residual vibration.

[0176] Then, in step S240, the adjustment control unit 210 sends the adjustment information Ainf to the liquid ejection device 100 via the communication unit 206. For example, when the process of step S216 is performed, the adjustment control unit 210 sends the adjustment information Ainf generated in step S222 and the adjustment information Ainf obtained in step S216 to the liquid ejection device 100 via the communication unit 206. In addition, for example, when the process of step S216 is not performed, the adjustment control unit 210 sends the adjustment information Ainf generated in step S222 to the liquid ejection device 100 via the communication unit 206. Further, for example, when a plurality of adjustment information Ainf is generated in step S222, the plurality of adjustment information Ainf is sent from the server 200 to the liquid ejection device 100. Similarly, for example, when a plurality of adjustment information Ainf is obtained in step S216, the plurality of adjustment information Ainf is sent from the server 200 to the liquid ejection device 100. Hereinafter, without particularly distinguishing between the adjustment information Ainf obtained in step S216 and the adjustment information Ainf generated in step S222, it is sometimes referred to as the residual vibration information Vinf generated at the head manufacturer.

[0177] Thus, by performing the series of processes from step S110 to step S122 in the liquid ejection device 100, the header information required for waveform adjustment is provided from the liquid ejection device 100 to the server 200. The header information required for waveform adjustment includes the residual vibration information Vinf indicating the waveform of the residual vibration detected by the detection circuit 19, the condition information Cinf related to the usage conditions of the liquid ejection head 1, and the like. In addition, by performing the series of processes from step S210 to step S240 in the server 200, the adjustment information Ainf is provided from the server 200 to the liquid ejection device 100. Hereinafter, the series of processes from step S110 to step S122 is also referred to as the header information provision process, and the series of processes from step S210 to step S240 is also referred to as the adjustment information provision process.

[0178] By performing the process of step S240, in step S130, the liquid ejection device 100 receives the residual vibration information Vinf generated at the head manufacturer. That is, in step S130, the reception control unit 44 receives, via the communication unit 6, the adjustment information Ainf generated at the head manufacturer from the server 200.

[0179] For example, when the transmission control unit 42 only transmits the residual vibration information Vinf among the residual vibration information Vinf and the condition information Cinf, the reception control unit 44 receives, via the communication unit 6, the adjustment information Ainf generated based on the residual vibration information Vinf from the server 200. Additionally, for example, when the transmission control unit 42 transmits the residual vibration information Vinf and the condition information Cinf, depending on whether the specific adjustment information Ainf corresponding to the condition information Cinf has been stored in the database DB, the type of the residual vibration information Vinf received by the reception control unit 44 is different. For example, when the specific adjustment information Ainf corresponding to the condition information Cinf is not stored in the database DB, the reception control unit 44 receives, via the communication unit 6, the adjustment information Ainf generated based on the residual vibration information Vinf from the server 200. Further, for example, when the specific adjustment information Ainf corresponding to the condition information Cinf is stored in the database DB, the reception control unit 44 receives, via the communication unit 6, the specific adjustment information Ainf and the adjustment information Ainf generated based on the residual vibration information Vinf from the server 200. Here, in ​ the example shown, the specific adjustment information Ainf is the adjustment information Ainf in which the corresponding condition information Cinf and the residual vibration information Vinf are respectively similar to the condition information Cinf and the residual vibration information Vinf transmitted from the transmission control unit 42.

[0180] After receiving the adjustment information Ainf, the reception control unit 44 transfers the process to step S140.

[0181] In step S140, the liquid ejection device 100 receives a selection of whether to adopt the adjustment information Ainf sent from the server 200. For example, the process control unit 40 causes an operation button for selecting whether to adopt the adjustment information Ainf to be displayed on the display device 120 as a GUI. In this way, the process control unit 40 receives the user's selection regarding whether to adopt the adjustment information Ainf.

[0182] In addition, when a plurality of adjustment information Ainf is sent from the server 200, in step S140, the process control unit 40 receives the user's selection regarding whether to adopt each of the plurality of adjustment information Ainf. Further, in step S140, the process control unit 40 may also provide the user with the waveform of the drive signal COMa adjusted based on the adjustment information Ainf. For example, the process control unit 40 may cause the display device 120 to display an image representing the waveform of the drive signal COMa adjusted based on the adjustment information Ainf.

[0183] Alternatively, in step S140, the process control unit 40 may also perform a test print using the drive signal COMa adjusted based on the adjustment information Ainf. In this case, the user can refer to the result of the test print to select whether to adopt the adjustment information Ainf.

[0184] Next, in step S142, the process control unit 40 determines whether to adopt the adjustment information Ainf based on the acceptance result in step S140. For example, when it is selected to adopt the adjustment information Ainf in step S140, the process control unit 40 determines to adopt the adjustment information Ainf. In addition, when it is selected not to adopt the adjustment information Ainf in step S140, the process control unit 40 determines not to adopt the adjustment information Ainf.

[0185] When the result of the determination in step S142 is affirmative, the operation of the liquid ejection system SYS for adjusting the waveform of the drive signal COMa ends. On the other hand, when the result of the determination in step S142 is negative, the process control unit 40 transfers the process to step S150.

[0186] In step S150, the processing control unit 40 causes the display device 120 to display a waveform adjustment screen for adjusting the waveform of the drive signal COMa. Thereby, the user can manually adjust the waveform of the drive signal COMa. Thus, in the present embodiment, the user can choose whether to have the head manufacturer adjust the waveform of the drive signal COMa or to manually adjust the waveform of the drive signal COMa by the user. As a result, in the present embodiment, the usability of the liquid ejection device 100 can be improved. After the user has manually adjusted the waveform of the drive signal COMa, the operation of the liquid ejection system SYS for adjusting the waveform of the drive signal COMa ends.

[0187] Thus, in the present embodiment, the head manufacturer can generate adjustment information Ainf for adjusting the waveform of the drive signal COMa based on the residual vibration detected by the detection circuit 19. As a result, in the present embodiment, even when the waveform of the residual vibration is very different from the waveform envisioned by the head manufacturer, the waveform of the drive signal COMa for driving the piezoelectric element PZ can be appropriately adjusted.

[0188] In addition, the operation of the liquid ejection system SYS is not limited to ​ the example shown. For example, the series of processes in steps S120 and S122 may be executed before the series of processes in steps S110 to S114, or may be executed in parallel with the series of processes in steps S110 to S114. In this case, the adjustment control unit 210 of the server 200 may also execute the determination in step S210 after a predetermined time has elapsed since the reception of the residual vibration information Vinf.

[0189] Furthermore, for example, part or all of the process in step S100, the series of processes in steps S140 and S142, and the process in step S150 may also be omitted. In the mode where the process in step S150 is omitted, the processing control unit 40 may also end without adjusting the waveform of the drive signal COMa when the result of the determination in step S100 is negative or when the result of the determination in step S142 is negative. ​ the operation shown.

[0190] Furthermore, for example, the series of processes in steps S110 to S114, the process in step S200, and the series of processes in steps S210 to S116 may also be omitted.

[0191] In addition, for example, the process of step S214 may also be omitted. In this case, for example, in step S216, the adjustment control unit 210 may also obtain adjustment information Ainf corresponding to the condition information Cinf retrieved in step S212 from the database DB. It can be considered that, for example, when the adjustment values represented by the adjustment information Ainf in the database DB have been verified by the head manufacturer for each usage condition represented by the condition information Cinf, even if the process of step S214 is omitted, appropriate adjustment information Ainf can still be obtained. For example, the probability that the adjustment information Ainf corresponding to the condition information Cinf retrieved in step S212 is appropriate is relatively high. Additionally, in the case where the process of step S214 is omitted, a specific adjustment information Ainf is, for example, adjustment information Ainf in which the corresponding condition information Cinf is similar to the condition information Cinf transmitted from the transmission control unit 42.

[0192] In addition, for example, the liquid ejection device 100 may also temporarily end the operation for adjusting the waveform of the drive signal COMa after performing the process of step S122. In this case, the server 200 may also notify the liquid ejection device 100 that the adjustment information Ainf is ready before performing the process of step S240. Then, after being notified that the adjustment information Ainf is ready, the liquid ejection device 100 may, at an arbitrary timing, request the server 200 to send the adjustment information Ainf, thereby restarting the operation for adjusting the waveform of the drive signal COMa. For example, the server 200 requested to send the adjustment information Ainf performs the process of step S240.

[0193] In addition, for example, the liquid ejection system SYS may also ​ as shown, feedback the adoption result of the adjustment information Ainf generated at the head manufacturer to the head manufacturer.

[0194] ​ FIG. For showing another example of the operation of the liquid ejection system SYS when adjusting the waveform of the drive signal COMa. In ​ the shown operation, in addition to a series of processes from step S160 to step S164 and a series of processes of step S260 and S262 being added to ​ the shown operation, the rest are the same as ​ the shown operation. Additionally, in ​ , for the convenience of viewing the figure, a series of processes from step S110 to step S122 are uniformly illustrated as the head information providing process, and a series of processes from step S210 to step S240 are uniformly illustrated as the adjustment information providing process.

[0195] In ​ this, a series of processes from step S160 to step S164 and a series of processes of steps S260 and S262 are described. The control unit 4 of the liquid ejection device 100 functions as a processing control unit 40 in each step from step S160 to step S164. In addition, the control unit 204 of the server 200 functions as an adjustment control unit 210 in each step of steps S260 and S262.

[0196] The process of step S160 is executed when the result of the determination in step S142 is affirmative or after the process of step S150 is executed.

[0197] In step S160, the processing control unit 40 receives the selection of whether to feedback the adoption result of the adjustment information Ainf to the head manufacturer. For example, the processing control unit 40 causes an operation button for selecting whether to feedback the adoption result of the adjustment information Ainf to the head manufacturer to be displayed on the display device 120 as a GUI. In this way, the processing control unit 40 receives the user's selection regarding whether to feedback the adoption result of the adjustment information Ainf to the head manufacturer.

[0198] Next, in step S162, the processing control unit 40 determines whether to send feedback information Fbinf including adoption information indicating the adoption result of the adjustment information Ainf to the server 200 based on the reception result in the process of step S160. For example, when it is selected in step S160 to send the feedback information Fbinf to the server 200, the processing control unit 40 determines to send the feedback information Fbinf to the server 200. In addition, when it is selected in step S160 not to send the feedback information Fbinf to the server 200, the processing control unit 40 determines not to send the feedback information Fbinf to the server 200.

[0199] In addition, the feedback information FBinf may include reason information indicating the reason for the adoptability of the adjustment information Ainf in addition to the adoption information. In this case, for example, in step S160, the processing control unit 40 also receives the user's selection regarding whether to feedback the reason for the adoptability of the adjustment information Ainf to the head manufacturer.

[0200] When the result of the determination in step S162 is affirmative, the processing control unit 40 transfers the process to step S164. On the other hand, when the result of the determination in step S162 is negative, the operation of the liquid ejection system SYS for adjusting the waveform of the drive signal COMa ends.

[0201] In step S164, the liquid ejection device 100 sends feedback information Fbinf to the server 200. For example, the transmission control unit 42 sends the feedback information FBinf to the server 200 via the communication unit 6.

[0202] By executing the process of step S164, in step S260, the server 200 receives the feedback information FBinf. For example, in step S260, the adjustment control unit 210 receives the feedback information FBinf from the liquid ejection device 100 via the communication unit 206. After receiving the feedback information FBinf, the adjustment control unit 210 transfers the process to step S262.

[0203] In step S262, the adjustment control unit 210 updates the database DB based on the feedback information FBinf. For example, the adjustment control unit 210 stores the adoption information indicating the adoption result of the adjustment information Ainf, the adjustment information Ainf, the condition information Cinf, and the residual vibration information Vinf in the database DB in a corresponding relationship with each other. In addition, when the reason information indicating the reason for the adoptability of the adjustment information Ainf is included in the feedback information FBinf, the adjustment control unit 210 may also store the reason information in the database DB in a corresponding relationship with the residual vibration information Vinf, etc. in step S262. By executing the process of step S262, the operation of the liquid ejection system SYS for adjusting the waveform of the drive signal COMa ends.

[0204] Thus, in ​ the operation shown, since the adoption result of the adjustment information Ainf, etc. is fed back to the head manufacturer, the adjustment accuracy of the waveform of the drive signal COMa adjusted based on the adjustment information Ainf generated at the head manufacturer can be improved. In addition, in order to execute the feedback effectively, a privilege or the like may be given to the user who has permitted the feedback.

[0205] As described above, in the present embodiment, the liquid ejection system SYS includes a liquid ejection head 1, a transmission control unit 42, and a reception control unit 44. The liquid ejection head 1 has: a nozzle N; a piezoelectric element PZ that is driven by being supplied with a drive signal COM; a diaphragm 14 that vibrates by the drive of the piezoelectric element PZ; a pressure chamber CV that is filled with ink and is applied with a pressure for ejecting the ink from the nozzle N by the vibration of the diaphragm 14; and a detection circuit 19 that detects the residual vibration of the diaphragm 14 after the drive of the piezoelectric element PZ. The transmission control unit 42 transmits residual vibration information Vinf indicating the residual vibration detected by the detection circuit 19 to the server 200. The reception control unit 44 receives from the server 200 adjustment information Ainf that is generated based on the residual vibration indicated by the residual vibration information Vinf and is used to adjust the waveform of the drive signal COM.

[0206] Thus, in the present embodiment, adjustment information Ainf that is generated based on the residual vibration indicated by the residual vibration information Vinf and is used to adjust the waveform of the drive signal COM is provided from the server 200. Accordingly, in the present embodiment, even when the manufacturer using the liquid ejection head 1 does not have technical knowledge related to the adjustment of the waveform of the drive signal COM, the waveform of the drive signal COMa can be appropriately adjusted based on the adjustment information Ainf provided from the server 200. Therefore, in the present embodiment, the waveform of the drive signal COMa for driving the piezoelectric element PZ can be appropriately and easily determined.

[0207] In addition, in the present embodiment, a processing control unit 40 may also be provided, and the processing control unit 40 accepts a user's selection regarding whether to transmit condition information Cinf related to the usage conditions of the liquid ejection head 1 to the server 200. When it is selected to transmit the condition information Cinf to the server 200, the transmission control unit 42 transmits the condition information Cinf to the server 200. Thereby, in this mode, the reception control unit 44 can obtain from the server 200 adjustment information Ainf based on the usage conditions of the liquid ejection head 1. As a result, in this mode, adjustment information Ainf for appropriately adjusting the waveform of the drive signal COMa can be efficiently provided to the reception control unit 44. Further, in the present embodiment, since the user can be allowed to select whether to transmit the condition information Cinf to the server 200, it is possible to prevent the condition information Cinf from being transmitted to the server 200 against the user's intention.

[0208] In addition, in the present embodiment, the condition information Cinf may also include information related to the type of ink. In this case, adjustment information Ainf corresponding to the type of ink can be efficiently provided to the reception control unit 44.

[0209] In addition, in the present embodiment, the condition information Cinf may also include information related to temperature. In this case, the adjustment information Ainf corresponding to the temperature of the ink or the like in the liquid ejection head 1 can be efficiently provided to the reception control unit 44.

[0210] In addition, in the present embodiment, the condition information Cinf may also include information related to pressure. In this case, the adjustment information Ainf corresponding to the pressure in the pressure chamber CV or the like can be efficiently provided to the reception control unit 44.

[0211] In addition, in the present embodiment, the reception control unit 44 may also receive the specific adjustment information Ainf from the server 200 when the transmission control unit 42 has transmitted the residual vibration information Vinf and the condition information Cinf, and when the specific adjustment information Ainf corresponding to the condition information Cinf has been stored in the database DB referred to by the server 200. In this case, even when the residual vibration represented by the residual vibration information Vinf transmitted by the transmission control unit 42 includes detection errors such as noise, the reduction in the adjustment accuracy of the waveform of the drive signal COMa can be suppressed by using the specific adjustment information Ainf.

[0212] In addition, in the present embodiment, a processing control unit 40 may also be provided, which accepts the user's selection regarding whether to adopt the adjustment information Ainf. The transmission control unit 42 transmits adoption information indicating the adoption result of the adjustment information Ainf to the server 200. In this case, since the adoption result of the adjustment information Ainf and the like are fed back to the server 200, the adjustment accuracy of the waveform of the drive signal COMa adjusted based on the adjustment information Ainf transmitted to the server 200 can be improved.

[0213] In addition, in the present embodiment, the server 200 may also store the adoption information in the database DB in a manner corresponding to the residual vibration information Vinf. In this case, since the adoption results of multiple adjustment information Ainf are accumulated in the database DB, the adjustment accuracy of the waveform of the drive signal COMa adjusted using the adjustment information Ainf transmitted from the server 200 can be improved.

[0214] In addition, in the present embodiment, the liquid ejection head 1 has a plurality of nozzles N. The transmission control unit 42 may also transmit, as the residual vibration information Vinf, only the information indicating the residual vibration corresponding to one nozzle N representing the plurality of nozzles N to the server 200. In this case, in order to adjust the waveform of the drive signal COMa, since it is not necessary to detect the residual vibration in the plurality of nozzles N, it is possible to suppress the complication of the detection of the residual vibration. In addition, the adjustment of the waveform of the drive signal COMa is specified for each liquid ejection head 1. Therefore, even when adjusting the waveform of the drive signal COMa using the adjustment information Ainf generated based on the residual vibration corresponding to one nozzle N, it is possible to appropriately adjust the waveform of the drive signal COMa.

[0215] 2. Modification Example

[0216] Each of the above-described embodiments can be variously modified. Specific modification methods are exemplified below. Two or more methods arbitrarily selected from the following examples can be appropriately combined within a non-conflicting range. In addition, for elements having the same functions as those in the embodiments in the modification examples exemplified below, the reference symbols used in the above description will be used, and their detailed descriptions will be appropriately omitted.

[0217] First Modification Example

[0218] In the above-described embodiment, the server 200 may also determine the ejection state of the nozzles N of the liquid ejection head 1. For example, the server 200 may determine the ejection state of each of the plurality of nozzles N based on the residual vibration corresponding to each nozzle N. In this case, the detection circuit 19 of the liquid ejection head 1 detects, for example, the residual vibrations of the plurality of ejection portions D corresponding to the plurality of nozzles N separately. Then, the transmission control unit 42 separately transmits, via the communication unit 6, the residual vibration information Vinf indicating the respective residual vibrations of the plurality of ejection portions D to the server 200. Therefore, in the present modification example, for example, when adjusting the waveform of the drive signal COMa, only the residual vibration corresponding to one nozzle N representing the plurality of nozzles N is detected, and when determining the ejection state of the nozzles N, the residual vibration is detected for the plurality of nozzles N.

[0219] As described above, even in the present modification example, the same effects as those of the above-described embodiment can be obtained. Further, in the present modification example, it is possible to cause the server 200 to determine the ejection state of the plurality of nozzles N.

[0220] Second Modification Example

[0221] In the above-described embodiments and modified examples, even when the adjustment information Ainf is not adopted, the head manufacturer can also repeatedly generate the adjustment information Ainf. For example, when the result of the determination in step S142 is negative, the processing control unit 40 of the liquid ejection head 1 can also cause the server 200 to execute again a series of processes from step S210 to step S240, that is, the adjustment information providing process. In this case, the transmission control unit 42 of the liquid ejection head 1 can also transmit, via the communication unit 6, information indicating the result of the test printing performed by the drive signal COMa adjusted based on the non-adopted adjustment information Ainf to the server 200. Further, the transmission control unit 42 can also transmit, via the communication unit 6, condition information Cinf indicating the usage conditions of the liquid ejection head 1 during the test printing to the server 200. Alternatively, when the result of the determination in step S142 is negative, the processing control unit 40 of the liquid ejection head 1 can also return the process to step S100. Even in the above-described modified example of the present invention, the same effects as those of the above-described embodiments and modified examples can be obtained. In addition, in this modified example of the present invention, since the server 200 can repeatedly execute the adjustment information providing process, the possibility of providing appropriate adjustment information Ainf from the server 200 can be increased.

[0222] 3rd Modified Example

[0223] Although in the above-described embodiments and modified examples, the case where one piezoelectric element PZ, one pressure chamber CV, and one nozzle N are provided for one ejection unit D has been illustrated, the present invention is not limited to such a configuration. For example, one ejection unit D may have two piezoelectric elements PZ, two pressure chambers CV, and one nozzle N. Even in the above-described modified example of the present invention, the same effects as those of the above-described embodiments and modified examples can be obtained.

[0224] 4th Modified Example

[0225] Although in the above-described embodiments and modified examples, the serial liquid ejection device 100 in which the carriage 91 carrying the liquid ejection head 1 reciprocates in the X-axis direction has been illustrated, the present invention is not limited to such a configuration. For example, the liquid ejection device 100 may be a line-type liquid ejection device in which a plurality of nozzles N are distributed over the entire width of the medium PP. Even in the above-described modified example of the present invention, the same effects as those of the above-described embodiments and modified examples can be obtained.

[0226] 5th Modified Example

[0227] In addition to being used exclusively for printing equipment, the liquid ejection device 100 exemplified in the above-described embodiments and modified examples can also be adopted by various devices such as facsimile machines and copying machines. Of course, the use of the liquid ejection device of the present invention is not limited to printing. For example, a liquid ejection device that ejects a solution of a color material can be used as a manufacturing device for forming a color filter of a liquid crystal display device. In addition, a liquid ejection device that ejects a solution of a conductive material can be used as a manufacturing device for forming wirings or electrodes of a wiring substrate. Even in the present modified example, the same effects as those of the above-described embodiments and modified examples can be obtained.

[0228] 3. Supplementary Note

[0229] From the methods exemplified above, for example, the following structures can be grasped.

[0230] The liquid ejection system according to Mode 1, which is a preferred mode, includes a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head has: a nozzle; a piezoelectric element that is driven by being supplied with a drive signal; a diaphragm that vibrates by the drive of the piezoelectric element; a pressure chamber that is filled with a liquid and is applied with a pressure for ejecting the liquid from the nozzle by the vibration of the diaphragm; a detection unit that detects the residual vibration of the diaphragm after the piezoelectric element is driven. The transmission control unit transmits residual vibration information indicating the residual vibration detected by the detection unit to a server, and the reception control unit receives adjustment information generated based on the residual vibration indicated by the residual vibration information from the server and used for adjusting the waveform of the drive signal.

[0231] According to Mode 1, the waveform of the drive signal can be adjusted appropriately and easily based on the adjustment information provided by the server. That is, in this mode, the waveform of the drive signal for driving the piezoelectric element can be determined appropriately and easily.

[0232] The liquid ejection system according to Mode 2, which is a specific example of Mode 1, further has a reception unit that receives a user's selection regarding whether to send condition information related to the usage conditions of the liquid ejection head to the server. When it is selected to send the condition information to the server, the transmission control unit sends the condition information to the server.

[0233] According to Mode 2, adjustment information based on the usage conditions of the liquid ejection head can be obtained from the server. In addition, in this mode, since the user can be allowed to select whether to send the condition information to the server, it is possible to prevent the situation where the condition information is sent to the server against the user's intention.

[0234] In the liquid ejection system according to Mode 3, which is a specific example of Mode 2, the condition information includes information related to the type of liquid.

[0235] According to Mode 3, it is possible to efficiently provide adjustment information corresponding to the type of liquid to the receiving control unit.

[0236] In the liquid ejection system according to Mode 4, which is a specific example of Mode 2 or Mode 3, the condition information includes information related to temperature.

[0237] According to Mode 4, it is possible to efficiently provide adjustment information corresponding to the temperature of the liquid in the liquid ejection head or the like to the receiving control unit.

[0238] In the liquid ejection system according to Mode 5, which is a specific example of any one of Modes 2 to 4, the condition information includes information related to pressure.

[0239] According to Mode 5, it is possible to efficiently provide adjustment information corresponding to the pressure in the pressure chamber or the like to the receiving control unit.

[0240] In the liquid ejection system according to Mode 6, which is a specific example of any one of Modes 2 to 5, when the transmission control unit transmits the residual vibration information and the condition information, and when specific adjustment information corresponding to the condition information is stored in the database referred to by the server, the receiving control unit receives the specific adjustment information from the server.

[0241] According to Mode 6, even when the residual vibration represented by the residual vibration information transmitted by the transmission control unit includes detection errors such as noise, it is possible to suppress a decrease in the accuracy of adjusting the waveform of the drive signal by using the specific adjustment information.

[0242] In the liquid ejection system according to Mode 7, which is a specific example of Mode 6, when the transmission control unit transmits only the residual vibration information among the residual vibration information and the condition information, the receiving control unit receives the adjustment information generated based on the residual vibration information from the server.

[0243] Even in Mode 7, it is possible to suppress a decrease in the accuracy of adjusting the waveform of the drive signal.

[0244] The liquid ejection system according to Mode 8, which is a specific example of any one of Modes 1 to 7, further includes a receiving unit that receives a user's selection regarding whether to adopt the adjustment information, and the transmission control unit transmits adoption information indicating the adoption result of the adjustment information to the server.

[0245] According to Mode 8, since the adoption result of the adjustment information is fed back to the server, it is possible to improve the adjustment accuracy of the waveform of the drive signal adjusted using the adjustment information generated based on the residual vibration information sent to the server.

[0246] In the liquid ejection system according to Mode 9, which is a specific example of Mode 8, the server stores the adoption information in the storage unit in a manner corresponding to the residual vibration information.

[0247] According to Mode 9, since the adoption results of a plurality of adjustment information are stored in the storage unit, it is possible to improve the adjustment accuracy of the waveform of the drive signal adjusted using the adjustment information sent from the server.

[0248] In the liquid ejection system according to Mode 10, which is a specific example of any one of Modes 1 to 9, the liquid ejection head has a plurality of the nozzles, and the transmission control unit transmits, as the residual vibration information, only the information indicating the residual vibration corresponding to one nozzle representing the plurality of nozzles to the server.

[0249] According to Mode 10, in the case of detecting the residual vibration in order to adjust the waveform of the drive signal, it is possible to suppress the complexity of the detection of the residual vibration.

[0250] In the liquid ejection system according to Mode 11, which is a specific example of Mode 10, when the server determines the ejection states of the plurality of nozzles, the detection unit separately detects the residual vibration corresponding to each of the plurality of nozzles, and the transmission control unit separately transmits the residual vibration information indicating the residual vibration corresponding to each of the plurality of nozzles to the server.

[0251] According to Mode 11, it is possible to enable the server to determine the ejection states of a plurality of nozzles.

[0252] As a liquid ejection system according to another preferred embodiment, Mode 12, it includes a communication device for communicating with a server, a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head has: a nozzle; a piezoelectric element that is driven by being supplied with a drive signal; a diaphragm that vibrates by the drive of the piezoelectric element; a pressure chamber that is filled with a liquid and is applied with a pressure for ejecting the liquid from the nozzle by the vibration of the diaphragm; a detection unit that detects the residual vibration of the diaphragm after the piezoelectric element is driven. The transmission control unit transmits residual vibration information indicating the residual vibration detected by the detection unit to the server via the communication device. The reception control unit receives, from the server via the communication device, adjustment information that is generated based on the residual vibration indicated by the residual vibration information and is used to adjust the waveform of the drive signal.

[0253] Even in Mode 12, it is possible to appropriately and easily determine the waveform of the drive signal for driving the piezoelectric element.

[0254] Furthermore, as a liquid ejection device according to a preferred embodiment, Mode 13, it includes a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head has: a nozzle; a piezoelectric element that is driven by being supplied with a drive signal; a diaphragm that vibrates by the drive of the piezoelectric element; a pressure chamber that is filled with a liquid and is applied with a pressure for ejecting the liquid from the nozzle by the vibration of the diaphragm; a detection unit that detects the residual vibration of the diaphragm after the piezoelectric element is driven. The transmission control unit transmits residual vibration information indicating the residual vibration detected by the detection unit to the server. The reception control unit receives, from the server, adjustment information that is generated based on the residual vibration indicated by the residual vibration information and is used to adjust the waveform of the drive signal.

[0255] Even in Mode 13, it is possible to appropriately and easily determine the waveform of the drive signal for driving the piezoelectric element.

[0256] Reference Signs

[0257] 1... Liquid ejection head; 2... Drive signal generation unit; 3... Generation circuit; 4... Control unit; 5... Storage unit; 7... Maintenance unit; 8... Medium conveyance mechanism; 9... Carriage conveyance mechanism; 10... Recording head; 18... Switching circuit; 19... Detection circuit; 40... Processing control section; 42... Transmission control section; 44... Reception control section; 100... Liquid ejection device; 120... Display device; 200... Server; 204... Control unit; 205... Storage unit; 206... Communication unit; 210... Adjustment control section; CT... Ink container; CV... Pressure chamber; D... Ejection section; N... Nozzle; PP... Medium; PZ... Piezoelectric element.

Claims

1. A liquid ejection system, characterized in that, It includes a liquid ejection head, a transmission control unit, and a reception control unit. The liquid ejection head has: Nozzles; Piezoelectric elements that are driven by being supplied with drive signals; A diaphragm that vibrates by the drive of the piezoelectric elements; A pressure chamber that is filled with liquid and is applied with a pressure for ejecting the liquid from the nozzles by the vibration of the diaphragm; A detection unit that detects the residual vibration of the diaphragm after the drive of the piezoelectric elements, The transmission control unit transmits residual vibration information indicating the residual vibration detected by the detection unit to the server, The reception control unit receives, from the server, adjustment information that is generated based on the residual vibration indicated by the residual vibration information and is used to adjust the waveform of the drive signal.

2. The liquid ejection system according to claim 1, wherein: It further has a reception unit that receives a user's selection on whether to send condition information related to the usage conditions of the liquid ejection head to the server, When it is selected to send the condition information to the server, the transmission control unit sends the condition information to the server.

3. The liquid ejection system according to claim 2, wherein: The condition information includes information related to the type of liquid.

4. The liquid ejection system according to claim 2, wherein: The condition information includes information related to temperature.

5. The liquid ejection system according to claim 2, wherein: The condition information includes information related to pressure.

6. The liquid ejection system according to claim 2, wherein: When the transmission control unit has sent the residual vibration information and the condition information, and when specific adjustment information corresponding to the condition information is stored in a database referred to by the server, the reception control unit receives the specific adjustment information from the server.

7. The liquid ejection system according to claim 1 or 2, wherein: It further has a reception unit that receives a user's selection on whether to adopt the adjustment information, The transmission control unit sends adoption information indicating the adoption result of the adjustment information to the server.

8. The liquid ejection system according to claim 7, wherein: The server stores the adoption information in a storage unit in a manner corresponding to the residual vibration information.

9. The liquid ejection system according to claim 1, wherein: The liquid ejection head has a plurality of the nozzles, The transmission control unit sends, as the residual vibration information, only the information indicating the residual vibration corresponding to one nozzle representing the plurality of nozzles to the server.

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